CN206332001U - A kind of vacuum atmosphere processing unit and sample observation system - Google Patents
A kind of vacuum atmosphere processing unit and sample observation system Download PDFInfo
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- CN206332001U CN206332001U CN201621309552.1U CN201621309552U CN206332001U CN 206332001 U CN206332001 U CN 206332001U CN 201621309552 U CN201621309552 U CN 201621309552U CN 206332001 U CN206332001 U CN 206332001U
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Abstract
The utility model discloses a kind of vacuum atmosphere processing unit, the top of described device is connected with outside particle beams generation device, it is characterised in that described device includes：First gas controller that bottom is connected with outside testing sample or the sucker of the contact with platform of the carrying testing sample, with outside air supply system, the second gas controller being connected with the extract system of outside；Wherein, window is provided with the top of described device, the window is used to make the particle beams of outside enter described device；The first gas controller, for connecting the air supply system and the sucker；The second gas controller, for connecting the extract system and the sucker.The invention also discloses a kind of sample observation system.
Description
Technical Field
The utility model relates to a charged particle beam microscope field especially relates to a vacuum atmosphere processing apparatus and sample observation system.
Background
In the 60 s of the 20 th century, Scanning Electron Microscopes (SEM) were invented for observing micro-or nano-scale micro-objects or structures; however, in the conventional SEM observation, the sample is usually placed in a high vacuum sample chamber, and therefore, when the sample is observed by the SEM, special treatments such as drying, freezing, or plating gold are required to be performed on the sample; a special sample such as a sample that is difficult to sample, a liquid sample, or a biological living body sample cannot be observed by SEM.
An Environmental Scanning Electron Microscope (ESEM) is a major breakthrough in SEM development, and when a sample is observed by using the ESEM, the sample does not need to be placed in a high-vacuum sample chamber, various gases can be filled in the sample chamber, and the pressure of the gas in the sample chamber is usually between 0.1 torr and 50 torr; therefore, observing the sample with ESEM is a major improvement over traditional SEM in sample preparation, probing and signal processing, mainly in: the sample can be a moist sample such as a biological sample and a non-conductive sample, and the sample does not need to be dried, frozen, vacuum-packed and other special treatments, namely, the ESEM realizes the in-situ observation of the sample;
however, a sample chamber is still needed when a sample is observed by using the ESEM, and the problem that the sample needs to be frequently exchanged when a large-size sample is observed and observed is still not solved.
The American B-nano company provides an Atmospheric Scanning Electron Microscope (ASEM), and the ASEM can be used for directly observing a sample in the Air, although the defects existing in the ESEM for observing the sample are overcome; however, under atmospheric pressure, the mean free path of electrons in air is small, and the working distance is only tens of micrometers, so that when a sample is observed by using the ASEM, the requirements on the appearance and the size of the sample are high, and the sample with an uneven surface cannot be observed.
SUMMERY OF THE UTILITY MODEL
In view of this, the embodiments of the present invention are expected to provide a vacuum atmosphere processing apparatus and a sample observation system, which can measure samples with various sizes and surface morphologies, and can provide various testing environments for the samples to be tested.
The embodiment of the utility model provides a technical scheme is so realized:
the utility model provides a vacuum atmosphere processing apparatus, the top of device is connected with outside particle beam production device, the device includes: the device comprises a sucker, a first gas controller and a second gas controller, wherein the bottom of the sucker is in contact with an external sample to be detected or a platform bearing the sample to be detected; wherein,
the top of the device is provided with a window, and the window is used for enabling an external particle beam to enter the device;
the first gas controller is used for connecting the gas supply system and the sucker;
the second gas controller is used for connecting the air exhaust system and the sucker.
In the above scheme, the sucking disc includes: the metal corrugated pipe comprises a metal corrugated pipe, a spring structure at least comprising a circle of springs and a sealing structure; wherein,
the spring structure is positioned inside the corrugation of the metal corrugated pipe and used for supporting the metal corrugated pipe;
the bottom of the metal corrugated pipe is connected with the sealing structure;
the sealing structure is in contact with the sample to be detected or a platform bearing the sample to be detected.
In the above scheme, the gas supplied to the device by the gas supply system is pure gas or mixed gas.
The utility model also provides a sample observation system, the system includes: a charged particle beam generating device, a vacuum atmosphere processing device and a sample; wherein,
the bottom of the lens cone of the charged particle beam generating device is fixedly connected with the top of the vacuum atmosphere processing device;
the sample or the platform carrying the sample is in contact with the bottom of the vacuum atmosphere treatment device;
the vacuum atmosphere processing apparatus includes: a chuck in contact with the sample or a platform carrying the sample, a first gas controller connected to an external gas supply system, and a second gas controller connected to an external gas evacuation system;
the top of the vacuum atmosphere processing device is provided with a window, the window is positioned below a first vacuum window at the bottom of the charged particle beam generating device and is used for observing a sample in the vacuum atmosphere processing device after the particle beam generated by the charged particle beam generating device passes through the first vacuum window;
the first gas controller is used for connecting the gas supply system and the sucker and supplying gas to the vacuum atmosphere processing device;
and the second gas controller is used for connecting the air exhaust system and the sucker and exhausting the vacuum atmosphere processing device.
In the above scheme, the sucking disc includes: the metal corrugated pipe comprises a metal corrugated pipe, a spring structure at least comprising a circle of springs and a sealing structure; wherein,
the spring structure is positioned inside the corrugation of the metal corrugated pipe and used for supporting the metal corrugated pipe;
the bottom of the metal corrugated pipe is connected with the sealing structure;
the sealing structure is in contact with the sample to be detected or a platform bearing the sample to be detected.
In the above scheme, the gas supplied to the device by the gas supply system is pure gas or mixed gas.
In the above solution, the system further includes at least one detector, the detector is horizontally or obliquely located at the top end of the vacuum atmosphere processing apparatus, and is used for detecting a signal generated after the particle beam acts on the sample.
In the above scheme, the system further comprises a magnetic shielding device mounted on the outer wall of the lens barrel, and the lower end of the magnetic shielding device is close to the sealing structure and is used for carrying out magnetic isolation on the vacuum atmosphere treatment device.
In the above scheme, the platform is provided with a multi-degree-of-freedom displacement table, and the displacement table is used for adjusting the sample with the multi-degree-of-freedom.
In the above scheme, the platform is provided with a heating module and/or a refrigerating module for adjusting the ambient temperature of the sample.
In the above scheme, the platform is provided with the scanning transmission device, the upper surface of a transmission particle detection cavity in the scanning transmission device is provided with a second vacuum window, and a detector is arranged in the transmission particle detection cavity and used for detecting particle beams acting on a sample.
In the above scheme, the system further includes a laser radar module located outside the lens barrel, and the laser radar module is configured to determine a suction position of the suction cup when the charged particle beam generating device moves.
The embodiment of the utility model provides a vacuum atmosphere processing apparatus and sample observation system, the top and the outside particle beam of device produce the device and are connected, the device includes: the device comprises a sucker, a first gas controller and a second gas controller, wherein the bottom of the sucker is in contact with an external sample to be detected or a platform bearing the sample to be detected; wherein the top of the device is provided with a window for an external particle beam to enter the device; the first gas controller is used for connecting the gas supply system and the sucker; the second gas controller is used for connecting the air exhaust system and the sucker. In this manner, the gas supply system supplies gas to the device through the first gas controller, and the gas exhaust system exhausts gas from the device through the second gas controller so that a local gas environment is formed inside the device; the pressure inside the device is controlled by adjusting a vacuum pump, the air exhaust speed and the like used by the air exhaust system, so that the sample is in an ideal observation environment; meanwhile, the bottom of the sucker of the device is in contact with a sample to be measured or a platform for bearing the sample to be measured to form a sample area to be measured, so that the device can measure samples with various sizes and surface appearances.
Drawings
FIG. 1 is a schematic cross-sectional view of a vacuum atmosphere processing apparatus according to an embodiment of the present invention;
FIG. 2A is a schematic view of a chuck in contact with a sample surface having a depression according to an embodiment of the present invention;
FIG. 2B is a schematic view of a chuck contacting a sample surface having protrusions in accordance with an embodiment of the present invention;
FIG. 2C is a schematic view of a chuck in contact with a sample surface having a through hole according to an embodiment of the present invention;
FIG. 2D is a schematic view of a chuck contacting a sample surface having a step structure thereon according to an embodiment of the present invention;
FIG. 3 is a schematic cross-sectional view of the second sample observation system according to the embodiment of the present invention;
FIG. 4 is a schematic structural view of a robot arm according to an embodiment of the present invention;
FIG. 5 is a schematic view of a gantry structure according to an embodiment of the present invention;
fig. 6A is a schematic view illustrating the multi-degree-of-freedom displacement table according to the embodiment of the present invention adjusting a large-sized sample;
fig. 6B is a schematic diagram of the multi-degree-of-freedom displacement table according to the embodiment of the present invention for adjusting a small-sized sample;
fig. 7 is a schematic structural diagram of a scanning transmission device according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of the installation of a detector according to an embodiment of the present invention;
fig. 9 is a schematic view of the installation of the magnetic shielding device and the laser radar module according to the embodiment of the present invention;
fig. 10 is a schematic processing flow diagram of a seven-sample observation method according to an embodiment of the present invention.
Detailed Description
The invention is further illustrated by the following figures and examples.
Example one
The first embodiment of the present invention provides a vacuum atmosphere processing apparatus, a cross-sectional view of a composition structure of the vacuum atmosphere processing apparatus 100 is shown in fig. 1, a top of the vacuum atmosphere processing apparatus 100 is connected with an external particle beam generating apparatus; the vacuum atmosphere processing apparatus 100 includes: the device comprises a sucker 101 with the bottom contacting with an external sample to be detected or a platform bearing the sample to be detected, a first gas controller 103 connected with an external gas supply system 102, and a second gas controller 112 connected with an external gas extraction system 104; wherein,
a window 111 is arranged on the top of the vacuum atmosphere processing device 100, and the window 111 is used for enabling an external particle beam to enter the vacuum atmosphere processing device 100;
the first gas controller 103 is used for connecting the gas supply system 102 and the suction cup 101;
the second gas controller 112 is used to connect the gas evacuation system 102 and the chuck 101.
In fig. 1, 113 is a sample to be measured, and 106 is a region of the sample to be measured.
In one embodiment, the functions of the first gas controller 103 and the second gas controller 112 may be performed by gas valves or by ventilation pipes.
In one embodiment, the vacuum processing apparatus 100 may be an axisymmetric structure, such as: axisymmetric cylinders, axisymmetric cuboids, axisymmetric multilaterals, and the like.
In one embodiment, the chuck 101 may be in direct contact with the surface of a large-sized sample or in contact with a platform carrying a small-sized sample, such that the sample is within a local space 105.
The suction cup 101 includes: a metal bellows 107, a sealing structure 108 and a spring structure 109 comprising at least one ring of springs; wherein,
the spring structure is positioned inside the corrugation of the metal corrugated pipe and is used for supporting the metal corrugated pipe 107, so that the metal corrugated pipe can bear the pressure difference inside and outside the local space 105;
the bottom of the metal corrugated pipe is connected with the sealing structure;
the sealing structure is contacted with the sample to be detected or a platform for bearing the sample to be detected;
here, the material for manufacturing the sealing structure is generally soft material, such as silicon rubber; a local space 105 is formed between the suction cup and the sample, or between the suction cup and the platform carrying the sample, by the contact of the sealing structure made of soft material with the sample or the platform carrying the sample to be measured.
In one embodiment, the gas supplied by the gas supply system 102 to the local space 105 through the first gas controller 103 may be pure gas or mixed gas; the gas isBodies include, but are not limited to, N2、He、Ar、O2And H2O。
In the embodiment of the present invention, the internal pressure of the local space 105 can be specifically changed by controlling the parameters of the vacuum pump, the pumping speed, etc. of the pumping system 102, so far, the local space 105 with variable pressure and various atmospheres is created.
In one embodiment, when He is the gas supplied into the local space 105, taking the charged particles as the example, the electrons still have a large mean free path in He in low vacuum, and thus, the method is suitable for observing a sample which cannot withstand a high vacuum environment; such as: the mean free path of electrons in He can reach 10mm at a pressure of one atmosphere at electron energies of 20 to 30 KeV.
In one embodiment, the gas supplied to the partial space 105 is O2When using O2The sample is plasma cleaned by oxygen plasma generated by interaction with the particle beam.
After gas is introduced into the local space 105, charged particles generated by interaction of gas molecules and particles can also be used for neutralizing residual charges in the sample, so that the scanning imaging quality of the charged particle beam generation device on the sample is improved, and particularly the scanning imaging quality of the charged particle beam generation device on a non-conductive sample can be improved; here, the charged particle beam generating apparatus includes: a conventional scanning electron microscope or an ambient scanning electron microscope or other charged particle generating device.
When a sample is observed by using a traditional scanning electron microscope or an environmental scanning electron microscope, a large-size sample chamber is usually required for placing the sample, and one or more pressure difference diaphragms are usually arranged between the sample chamber and a lens cone of the scanning electron microscope or the environmental scanning electron microscope; therefore, before observing the sample, the lens barrel and the sample chamber of the scanning electron microscope or the environmental scanning electron microscope need to be simultaneously vacuumizedEmpty; the time for vacuuming takes at least several tens of minutes or more. The top of the vacuum atmosphere processing device provided by the embodiment of the invention is connected with the first vacuum window at the bottom of the lens cone of the charged particle beam generating device, namely, the lens cone and the local space are separated by a vacuum window; because the lens cone is vacuumized in advance and kept under the high vacuum condition, only the local space 105 with a smaller space needs to be vacuumized when a sample is tested, the time is taken for one minute or even shorter, and the pressure change in the local space 105 can be within one atmosphere to 10-6Varying within the torr range.
In a specific embodiment, the suction cup 101 in the vacuum atmosphere processing apparatus 100 can adapt to the surface topography of various samples, and the shape of the metal bellows 107 changes according to the surface topography of the samples; wherein, fig. 2A is a schematic view of the contact between the sucker 101 and a sample surface having a recess; FIG. 2B is a schematic view of the chuck 101 contacting a sample surface having protrusions; fig. 2C is a schematic view of the contact between the sucker 101 and the surface of the sample with through hole, when the sample is sealed on the other side of the sample by the sealing member 201, wherein the sealing member 201 comprises a supporting structure with high hardness and a flexible structure with high sealing performance; FIG. 2D shows a step structure 202 near the area 206 to be observed of the sample, where the chuck 101 is redesigned to fit the shape of the step sample; fig. 2A, 2B, 2C, and 2D show 206 the region of the sample to be measured.
Example two
The embodiment of the utility model provides a second provides a sample observation system 400, the component structure cross-sectional diagram of system, as shown in FIG. 3, include: a vacuum atmosphere processing apparatus 100, a charged particle beam generating apparatus 200, and a sample 300; wherein, the bottom of the lens barrel 201 of the charged particle beam generating device 200 is fixedly connected with the top of the vacuum atmosphere processing device 100;
the sample 300 or the platform carrying the sample 300 is in contact with the bottom of the vacuum atmosphere processing apparatus 100;
the vacuum atmosphere processing apparatus 100 includes: a chuck 101 in contact with the sample or a platform carrying the sample, a first gas controller 103 connected to an external gas supply system 102, and a second gas controller 112 connected to an external gas evacuation system 104;
a window 111 is arranged at the top of the vacuum atmosphere processing apparatus 100, the window 111 is positioned below a first vacuum window 203 at the bottom of the charged particle beam generating apparatus 200, and is used for observing a sample 300 in the vacuum atmosphere processing apparatus 100 after the particle beam generated by the charged particle beam generating apparatus passes through the first vacuum window 203;
the first gas controller 103 is used for connecting the gas supply system 102 and the suction cup 101 and supplying gas to the vacuum atmosphere processing device 100;
the second gas controller 112 is configured to connect the gas pumping system 104 and the chuck 101, and pump the vacuum atmosphere processing apparatus 100.
A window 111 is arranged on the top of the vacuum atmosphere processing apparatus 100, and the window 111 is used for enabling the particle beam 202 generated by the particle source 212 inside the charged particle beam generating apparatus 200 to enter the vacuum atmosphere processing apparatus 100;
the first gas controller 103 is used for connecting the gas supply system 102 and the suction cup 101;
the second gas controller 112 is used to connect the gas evacuation system 102 and the chuck 101.
In one embodiment, the functions of the first gas controller 103 and the second gas controller 112 may be performed by gas valves or by ventilation pipes.
In one embodiment, the vacuum processing apparatus 100 may be an axisymmetric structure, such as: axisymmetric cylinders, axisymmetric cuboids, axisymmetric multilaterals, and the like.
In one embodiment, the chuck 101 may be in direct contact with the surface of a large-sized sample or in contact with a platform carrying a small-sized sample, such that the sample is within a local space 105.
The suction cup 101 includes: a metal bellows 107, a sealing structure 108 and a spring structure 109 comprising at least one ring of springs; wherein,
the spring structure is positioned inside the corrugation of the metal corrugated pipe and is used for supporting the metal corrugated pipe 107, so that the metal corrugated pipe can bear the pressure difference inside and outside the local space 105;
the bottom of the metal corrugated pipe is connected with the sealing structure;
the utility model structure is contacted with the sample to be measured or the platform for bearing the sample to be measured;
here, the material for manufacturing the sealing structure is generally soft material, such as silicon rubber; a local space 105 is formed between the suction cup and the sample, or between the suction cup and the platform carrying the sample, by the contact of the sealing structure made of soft material with the sample or the platform carrying the sample to be measured.
In one embodiment, the gas supplied by the gas supply system 102 to the local space 105 through the first gas controller 103 may be pure gas or mixed gas; including but not limited to N2、He、Ar、O2And H2O。
In the embodiment of the present invention, the internal pressure of the local space 105 can be specifically changed by controlling the parameters of the vacuum pump, the pumping speed, etc. of the pumping system 102, so far, the local space 105 with variable pressure and various atmospheres is created.
In one embodiment, when He is the gas supplied into the local space 105, taking the charged particles as the example, the electrons still have a large mean free path in He in low vacuum, and thus, the method is suitable for observing a sample which cannot withstand a high vacuum environment; such as: the mean free path of electrons in He can reach 10mm at a pressure of one atmosphere at electron energies of 20 to 30 KeV.
In one embodiment, the gas supplied to the partial space 105 is O2When using O2The sample is plasma cleaned by oxygen plasma generated by interaction with the particle beam.
After the gas is introduced into the local space 105, the charged particles generated by the interaction between the gas molecules and the electrons can also be used for neutralizing the residual charges in the sample, so that the quality of the scanning imaging of the charged particle beam generating device on the sample can be improved, and particularly the quality of the scanning imaging of the charged particle beam generating device on the non-conductive sample can be improved.
When a sample is observed by using a traditional scanning electron microscope or an environmental scanning electron microscope, a large-size sample chamber is usually required for placing the sample, and one or more pressure difference diaphragms are usually arranged between the sample chamber and a lens cone of the scanning electron microscope or the environmental scanning electron microscope; therefore, before observing a sample, the lens barrel and the sample chamber of the scanning electron microscope or the environmental scanning electron microscope need to be simultaneously vacuumized; the time for vacuuming takes at least several tens of minutes or more. The top of the vacuum atmosphere processing device provided by the embodiment of the invention is connected with the first vacuum window at the bottom of the lens cone of the charged particle beam generating device, namely, the lens cone and the local space are separated by a vacuum window; because the lens cone is vacuumized in advance and kept under the high vacuum condition, only the local space 105 with a smaller space needs to be vacuumized when a sample is tested, the time is taken for one minute or even shorter, and the pressure change in the local space 105 can be within one atmosphere to 10-6Range of supportAn internal variation.
In a specific embodiment, the suction cup 101 in the vacuum atmosphere processing apparatus 100 can adapt to the surface topography of various samples, and the shape of the metal bellows 107 changes according to the surface topography of the samples; wherein, fig. 2A is a schematic view of the contact between the sucker 101 and a sample surface having a recess; FIG. 2B is a schematic view of the chuck 101 contacting a sample surface having protrusions; fig. 2C is a schematic view of the contact between the sucker 101 and the surface of the sample with through hole, when the sample is sealed on the other side of the sample by the sealing member 201, wherein the sealing member 201 comprises a supporting structure with high hardness and a flexible structure with high sealing performance; FIG. 2D shows a step structure 202 near the area 206 to be observed of the sample, where the chuck 101 is redesigned to fit the shape of the step sample; fig. 2A, 2B, 2C, and 2D show 206 the region of the sample to be measured.
In the embodiment of the present invention, the particle beam generated by the particle source 212 of the charged particle beam generating device 200 is accelerated, deflected and focused by the accelerating electrode, the deflecting device and the objective lens in the charged particle beam generating device 200; here, the bottom of the lens barrel 201 is provided with a first vacuum window 203 sealed by a thin film, and the first vacuum window 203 may be made of SixNy、SiO2Or a graphene film, the shape and size of the first vacuum window 203 may be changed according to actual application conditions; at this time, the first vacuum window 203 has two functions: the first is to allow the particle beam 202 to pass through the first vacuum window 203 with as little scattering as possible; the second is that when the lens barrel 201 is sealed by using the first vacuum window 203, the inside of the lens barrel 201 can maintain high vacuum, so that an external vacuum control system for controlling the lens barrel 201 is simplified as much as possible, so that the lens barrel 201 can be mounted on a mechanical arm or a gantry structure.
Specifically, the schematic structural diagram of the mechanical arm is shown in fig. 4, and the schematic structural diagram of the gantry is shown in fig. 5.
Here, the charged particle beam generating apparatus 200 may be a conventional scanning electron microscope, an environmental scanning electron microscope, or another particle beam generating apparatus.
EXAMPLE III
Based on the embodiment of the utility model provides a second sample observation system, embodiment three embodiment two sample observation system's basis on increase multi freedom's displacement platform, the displacement platform is used for right the sample carries out multi freedom's regulation.
Specifically, a sample having a radial dimension of the surface of the sample 300 larger than that of the chuck is defined as a large-sized sample, and fig. 6A is a schematic diagram illustrating the adjustment of the sample by using the multi-degree-of-freedom displacement stage; at this time, the sample 300 is fixed on a displacement table 601, the observed surface of the sample is used as the sealing surface of the sucker 101, and the position of the sample 300 is adjusted by using the displacement table with multiple degrees of freedom before the sample 300 is contacted with the sucker 101; after the sample 300 is in contact with the suction cup 101, i.e. after the sample 300 is sucked to the suction cup 101, the sample 300 is slightly adjusted by the deformation of the suction cup, so as to facilitate better observation of the sample 300. For unmovable jumbo size sample, can with the utility model discloses charged particle beam produces the device and installs on the arm or install on gantry structure, through the arm or the gantry junction removes charged particle beam produces the device, realizes to jumbo size, unmovable sample's observation.
Here, the displacement stage with multiple degrees of freedom may be one or more mechanical or piezoelectric displacement stages, and the adjustment of the position of the sample 300 as shown in fig. 6A includes: x, Y and Z, as well as tilt and rotation.
Defining a sample having a radial dimension of the surface of the sample 300 smaller than the radial dimension of the chuck as a small-sized sample; at this time, as shown in fig. 6B, when the sample 300 is observed and used on the multifunctional workbench 602 provided by the present invention, the suction cup 101 contacts with the upper surface of the workbench 602 to form a closed chamber 105; a multi-degree-of-freedom displacement table 601B is installed in the multifunctional workbench 602, and the sample 300 is placed on the displacement table and is adjusted by the displacement table.
Here, the displacement stage with multiple degrees of freedom may be one or more mechanical or piezoelectric displacement stages, and the adjustment of the position of the sample 300 as shown in fig. 6B includes: x, Y and Z, as well as tilt and rotation.
For ultra-thin samples of small size that need to be observed by scanning transmission particle microscopy, the multi-functional stage can be a stage 700 with a scanning transmission detection chamber, as shown in FIG. 7. In this case, the charged particle beam generating apparatus 200 can be used as a scanning transmission particle microscope; the upper surface of the worktable 700 is in contact with the sucker 101 to form a sealed chamber 105, and the ultrathin sample 300 is placed on a displacement table of the sealed chamber 105; the stage 700 further comprises a transmissive particle detection chamber 705, a second vacuum window 701 is disposed above the detection chamber 705, and the vacuum window 701 has two functions: one to allow the particle beam transmitted through the ultra-thin sample 300 to enter the detection chamber 705 with minimal scattering, and the other to seal the detection chamber 705; the lower part of the detection chamber 705 is connected with an external air exhaust system through a third gas controller 706, and the detection chamber 705 is exhausted; meanwhile, two transmission particle detectors 702 and 703 are arranged in the detection chamber 705, and particles are detected, so that scanning transmission imaging of the ultrathin sample is realized.
The second vacuum window can be made of SixNy、SiO2Or a graphene film, the shape and size of the second vacuum window 701 may be changed according to practical applications. Both the transmissive particle detection cavity 705 and the local region 105 should be under high vacuum conditions to reduce particle scattering.
In a preferred embodiment, a heating module and/or a cooling module may be mounted on the platform in fig. 6B and 7 for adjusting the ambient temperature to which the sample is exposed.
Here, the function of the heating module may be implemented by an electric heating plate, and the function of the refrigerating module may be implemented by a liquid nitrogen bath.
Therefore, the embodiment of the utility model provides a sample observation system can observe arbitrary surface size's sample.
Because the embodiment of the utility model provides a third sample observation system be based on the utility model discloses the sample observation system of two records provides, consequently, the utility model provides an all characteristics of the sample observation system of two records all are applicable to the embodiment of the utility model provides a three sample observation systems that provide.
Example four
Based on the sample observation system provided by the second embodiment and the third embodiment of the present invention, the fourth embodiment of the present invention further provides a sample observation system, wherein at least one detector is added on the basis of the sample observation system provided by the second embodiment or the third embodiment, and the detector is arranged at the top end inside the vacuum atmosphere processing device according to the type level of the detector or the inclination of the detector, and is used for detecting the signal generated after the particle beam acts on the sample;
here, the probe includes, but is not limited to: a backscatter particle detector, a secondary particle detector, a gas detector, an energy scattering spectrum detector, a cathode ray fluorescence detector, and the like.
In the embodiment of the present invention, the installation schematic diagram of the detector is shown in fig. 8, the back scattering particle detector 801 and the gas detector 802 are disposed in the inside top of the vacuum atmosphere processing apparatus 1, the secondary particle detector 803 and the energy scattering spectrum detector 804 are disposed in the inside top of the vacuum atmosphere processing apparatus 1 with a certain angle tilt symmetry.
Because the embodiment of the utility model provides a four sample observation system be based on the utility model discloses the sample observation system of two or three records in embodiment provides, consequently, the utility model provides an all characteristics of the sample observation system of four records all are applicable to the utility model provides a sample observation system that two or three embodiment provided.
EXAMPLE five
Based on the sample observation systems provided by the second embodiment, the third embodiment and the fourth embodiment of the present invention, the fifth embodiment of the present invention further provides a sample observation system, and the sample observation system further includes a magnetic shielding device, as shown in fig. 9, the magnetic shielding device is installed on the outer wall of the lens barrel 201, the lower end of the magnetic shielding device is close to the sealing structure, the whole suction cup 100 is covered therein, and can be adjusted up and down; the magnetic shield 900 can move up and down as the sample 300 moves and magnetically isolate the chuck 100 using active or passive magnetic shielding.
Because the embodiment of the utility model provides a five sample observation system be based on the utility model discloses the sample observation system of embodiment two, embodiment three or embodiment four records proposes, consequently, the utility model discloses all characteristics of the sample observation system of five records all are applicable to the utility model provides a sample observation system of embodiment two, embodiment three or embodiment four proposes.
EXAMPLE six
Based on the utility model discloses embodiment two, embodiment three, embodiment four and the sample observation system that embodiment five provided, the utility model provides a six still provide a sample observation system, sample observation system still includes the lidar module, as shown in fig. 9, lidar module 901 arranges in the outside of lens cone is adjusted through arm or gantry structure when charged particle beam produces device 200 and moves, lidar module 901 is used for confirming the position of sample 300 to make vacuum atmosphere controlling means 100 can accurately find the position that the sample waited to measure the point, avoid carrying out violent collision with the sample simultaneously.
Because the embodiment of the utility model provides a six sample observation system be based on the utility model discloses the sample observation system of embodiment two, embodiment three, embodiment four or five records in embodiment provides, consequently, the utility model discloses all characteristics of the sample observation system of five records in embodiment all are applicable to the utility model discloses the sample observation system of embodiment two, embodiment three, embodiment four and five proposals in embodiment.
EXAMPLE seven
Based on the utility model discloses above-mentioned vacuum atmosphere processing apparatus and sample observation system of embodiment, the utility model provides a seventh provides a sample observation method, sample observation method is applied to the utility model provides an two to embodiment six arbitrary sample observation system, the processing procedure of sample observation method, as shown in fig. 10, including following step:
101, forming a local gas environment in the vacuum atmosphere processing device through the first gas controller and the second gas controller, and controlling the pressure of the vacuum atmosphere processing device;
specifically, firstly, a sucker of the vacuum atmosphere processing device is adsorbed on the surface of a sample or the surface of a platform for bearing the sample to form a closed space; then, the gas supply system supplies gas to the vacuum atmosphere processing device through the first gas controller, and the gas extraction system extracts gas from the vacuum atmosphere processing device through the second gas controller, so that a local gas environment is formed in the vacuum atmosphere processing device; and adjusting the pressure of the gas in the local gas environment by adjusting a vacuum pump, a pumping speed and the like used by the pumping system.
Here, the gas supplied by the gas supply system may be a pure gas or a mixed gas; wherein the gas includes, but is not limited to: he. Ar, N2、H2O、O2And the like;
wherein, the realization process that the sucker of the vacuum atmosphere processing device is adsorbed on the surface of a sample or the surface of a platform bearing the sample comprises the following steps: firstly, detecting the position of a sample by using a laser radar module; then, the charged particle beam generating device is moved to the upper part of a sample or a platform for bearing the sample by using a mechanical arm or a gantry structure; and finally, adsorbing the sample on the surface of the sample by using a sucking disc of the vacuum atmosphere treatment device or on the surface of a platform for bearing the sample. At this time, the position of the sample can be adjusted in multiple dimensions by using the displacement stage, so that the external particle beam can be accurately irradiated to the position to be measured of the sample.
In a preferred embodiment, when He is the supplied gas, taking the charged particles as electrons as an example, the electrons still have a large mean free path in He in low vacuum, and thus, the method is suitable for observing a sample which cannot bear a high vacuum environment; such as: the mean free path of electrons in He can reach 10mm at a pressure of one atmosphere at electron energies of 20 to 30 KeV.
In one embodiment, the gas fed is O2When using O2The sample is plasma cleaned by oxygen plasma generated by interaction with the particle beam. After the gas is introduced into the local space 105, charged particles generated by interaction of gas molecules and particles can also be used for neutralizing residual charges in the sample, so that the scanning imaging quality of the charged particle beam generating device on the sample is improved; here, the charged particle beam generating apparatus includes: a conventional scanning electron microscope, an ambient scanning electron microscope or other particle beam generating device.
When a sample is observed by using a traditional scanning electron microscope or an environmental scanning electron microscope, a large-size sample chamber is usually required for placing the sample, and one or more pressure difference diaphragms are usually arranged between the sample chamber and a lens cone of the scanning electron microscope or the environmental scanning electron microscope; therefore, before observing a sample, the lens barrel and the sample chamber of the scanning electron microscope or the environmental scanning electron microscope need to be simultaneously vacuumized; the time for vacuuming takes at least several tens of minutes or more.
The top of the vacuum atmosphere processing device provided by the embodiment of the invention is connected with the first vacuum window at the bottom of the lens cone of the charged particle beam generating device, namely, the lens cone and the local space are separated by a vacuum window; because the lens cone is vacuumized in advance and kept under the high vacuum condition, only a local space with a small space needs to be vacuumized when a sample is tested, the time is taken for one minute or even shorter, and the pressure change in the local space can be from one atmosphere to 10-6Varying within the torr range.
And 102, enabling the particle beam generated by the charged particle beam generating device to pass through a first vacuum window at the bottom of a lens barrel of the charged particle beam generating device to act on a sample in the vacuum atmosphere processing device so as to observe the sample.
In a preferred embodiment, the sample observation system further comprises at least one probe positioned horizontally or obliquely at the inner top end of the vacuum atmosphere processing apparatus; correspondingly, the method further comprises the following steps:
103, detecting a signal generated after the particle beam acts on a sample;
here, the probe includes, but is not limited to: a back scattering particle detector, a secondary particle detector, a gas detector, an energy scattering spectrum detector, a cathode ray fluorescence detector and the like;
the detector is horizontally or obliquely arranged at the top end of the interior of the vacuum atmosphere processing device according to the type of the detector, and detects a signal generated after the particle beam acts on a sample;
in the embodiment of the present invention, the installation schematic diagram of the detector is shown in fig. 8, the back scattering particle detector and the gas detector are disposed in the inside top of the vacuum atmosphere processing apparatus, the secondary particle detector and the energy scattering spectrum detector 804 are disposed in the inside top of the vacuum atmosphere processing apparatus with a certain angle tilt symmetry.
In a preferred embodiment, the sample observation system further comprises a magnetic shielding device; correspondingly, the method further comprises the following steps:
104, carrying out magnetic isolation on the vacuum atmosphere processing device;
specifically, as shown in fig. 8, the magnetic shielding device is mounted on the outer wall of the lens barrel, the lower end of the magnetic shielding device is close to the sealing structure, and the whole sucker is covered therein, and the magnetic shielding device can also be adjusted up and down; when the sample moves, the magnetic shielding device can move up and down, and the vacuum atmosphere processing device is magnetically isolated by adopting active magnetic shielding or passive magnetic shielding.
In a preferred embodiment, the sample observation system further comprises a heating module and/or a cooling module; correspondingly, the method further comprises the following steps:
step 105, adjusting the ambient temperature of the sample by using the heating module and/or the refrigerating module;
here, the heating module and/or the cooling module is installed in the multifunctional workbench;
the function of the heating module can be realized by an electric heating plate, and the function of the refrigerating module can be realized by a liquid nitrogen pool.
In a preferred embodiment, the sample observation system further comprises a lidar module; correspondingly, when the area to be measured of the sample is changed, the method further comprises the following steps:
step 106, determining the position of the sample by using the laser radar module;
specifically, as shown in fig. 9, the laser radar module is disposed outside the lens barrel, and when the charged particle beam generating device is adjusted to move by the mechanical arm or the gantry structure, the laser radar module is configured to determine the suction position of the suction cup, that is, the position of the sample, so that the vacuum atmosphere control device can accurately find the position of the point to be measured of the sample, and avoid severe collision with the sample.
In the embodiment of the utility model, the sample with the radial size of the sample surface larger than that of the sucker is defined as a large-size sample; the surface of the sample is taken as a sealing surface of the sucker, and the position of the sample is adjusted by using a multi-degree-of-freedom displacement table before the sample is contacted with the sucker; after the sample contacts with the sucking disc, namely the sample adsorbs behind the sucking disc, utilize the deformation of sucking disc to right the sample carries out small adjustment to it carries out better observation to the sample. For unmovable jumbo size sample, can with the utility model discloses charged particle beam produces the device and installs on the arm or install on gantry structure, through the arm or the gantry junction removes charged particle beam produces the device, realizes to jumbo size, unmovable sample's observation.
Here, the adjustment of the position of the sample by the multi-degree-of-freedom displacement stage includes: x, Y and Z, as well as tilt and rotation.
Defining a sample with a radial dimension of the sample surface smaller than the radial dimension of the chuck as a small-sized sample; at this time, the sample needs to be placed on a displacement table in the multifunctional workbench as shown in fig. 6B, the suction cup and the surface of the workbench form a sealing structure, and the sample is accurately positioned by using the displacement table with multiple degrees of freedom.
For an ultrathin sample with small size, the sample observation system further comprises a scanning transmission device, and the scanning transmission device is positioned on the workbench; as shown in fig. 7, the charged particle beam generating apparatus can be used as a scanning transmission particle microscope; a transmission particle detection cavity 705 is arranged in the workbench, and a second vacuum window 701 is arranged on the upper surface of the transmission particle detection cavity 705; accordingly, the method can be used for solving the problems that,
the method further comprises the following steps:
in step 107, the particle beam after the interaction with the sample is detected by the detector through the second vacuum window.
It should be noted that, in the seventh embodiment of the present invention, there is no execution sequence or dependency relationship between step 103 and step 107, that is, the embodiment may include any one or more operations from step 103 to step 107; the charged particle beam generating device according to the above embodiment of the present invention may be a conventional scanning electron microscope, an environmental scanning electron microscope, or other particle beam generating devices.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention.
Claims (12)
1. A vacuum atmosphere processing apparatus, the top of the apparatus being connected to an external particle beam generating apparatus, the apparatus comprising: the device comprises a sucker, a first gas controller and a second gas controller, wherein the bottom of the sucker is in contact with an external sample to be detected or a platform bearing the sample to be detected; wherein,
the top of the device is provided with a window, and the window is used for enabling an external particle beam to enter the device;
the first gas controller is used for connecting the gas supply system and the sucker;
the second gas controller is used for connecting the air exhaust system and the sucker.
2. The apparatus of claim 1, wherein the suction cup comprises: the metal corrugated pipe comprises a metal corrugated pipe, a spring structure at least comprising a circle of springs and a sealing structure; wherein,
the spring structure is positioned inside the corrugation of the metal corrugated pipe and used for supporting the metal corrugated pipe;
the bottom of the metal corrugated pipe is connected with the sealing structure;
the sealing structure is in contact with the sample to be detected or a platform bearing the sample to be detected.
3. The device of claim 1 or 2, wherein the gas supply system supplies pure gas or mixed gas to the device.
4. A sample observation system, the system comprising: a charged particle beam generating device, a vacuum atmosphere processing device and a sample; wherein,
the bottom of the lens cone of the charged particle beam generating device is fixedly connected with the top of the vacuum atmosphere processing device;
the sample or the platform carrying the sample is in contact with the bottom of the vacuum atmosphere treatment device;
the vacuum atmosphere processing apparatus includes: a chuck in contact with the sample or a platform carrying the sample, a first gas controller connected to an external gas supply system, and a second gas controller connected to an external gas evacuation system;
the top of the vacuum atmosphere processing device is provided with a window, the window is positioned below a first vacuum window at the bottom of the charged particle beam generating device and is used for observing a sample in the vacuum atmosphere processing device after the particle beam generated by the charged particle beam generating device passes through the first vacuum window;
the first gas controller is used for connecting the gas supply system and the sucker and supplying gas to the vacuum atmosphere processing device;
and the second gas controller is used for connecting the air exhaust system and the sucker and exhausting the vacuum atmosphere processing device.
5. The system of claim 4, wherein the suction cup comprises: the metal corrugated pipe comprises a metal corrugated pipe, a spring structure at least comprising a circle of springs and a sealing structure; wherein,
the spring structure is positioned inside the corrugation of the metal corrugated pipe and used for supporting the metal corrugated pipe;
the bottom of the metal corrugated pipe is connected with the sealing structure;
the sealing structure is in contact with the sample or a platform carrying the sample.
6. The system of claim 4 or 5, wherein the gas supplied to the device by the gas supply system is pure gas or mixed gas.
7. The system according to claim 4 or 5, further comprising at least one detector positioned horizontally or obliquely at the inner top end of the vacuum atmosphere processing apparatus for detecting a signal generated after the particle beam has acted on the sample.
8. The system according to claim 5, further comprising a magnetic shielding device mounted on an outer wall of the lens barrel, a lower end of the magnetic shielding device being adjacent to the sealing structure for magnetically isolating the vacuum atmosphere processing device.
9. The system of claim 4 or 5, wherein the platform is provided with a multi-degree-of-freedom displacement stage for adjusting the sample.
10. The system of claim 4 or 5, wherein the platform is provided with a heating module and/or a cooling module for adjusting the ambient temperature of the sample.
11. The system according to claim 4 or 5, wherein the platform is provided with a scanning transmission device, a second vacuum window is arranged on the upper surface of a transmission particle detection cavity in the scanning transmission device, and a detector is arranged in the transmission particle detection cavity and used for detecting the particle beam after acting on the sample.
12. The system according to claim 4 or 5, further comprising a lidar module located outside the lens barrel for determining a suction position of the chuck when the charged particle beam generating device is moved.
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| CN201621309552.1U CN206332001U (en) | 2016-12-01 | 2016-12-01 | A kind of vacuum atmosphere processing unit and sample observation system |
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| CN201621309552.1U CN206332001U (en) | 2016-12-01 | 2016-12-01 | A kind of vacuum atmosphere processing unit and sample observation system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106783493A (en) * | 2016-12-01 | 2017-05-31 | 聚束科技（北京）有限公司 | A kind of vacuum atmosphere processing unit, sample observation system and method |
| JP2020004586A (en) * | 2018-06-27 | 2020-01-09 | 株式会社ニューフレアテクノロジー | Charged particle beam image acquisition device |
-
2016
- 2016-12-01 CN CN201621309552.1U patent/CN206332001U/en not_active Withdrawn - After Issue
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106783493A (en) * | 2016-12-01 | 2017-05-31 | 聚束科技（北京）有限公司 | A kind of vacuum atmosphere processing unit, sample observation system and method |
| WO2018099156A1 (en) * | 2016-12-01 | 2018-06-07 | Focus-Ebeam Technology (Beijing) Co., Ltd. | Vacuum condition processing apparatus, system and method for specimen observation |
| CN106783493B (en) * | 2016-12-01 | 2018-07-10 | 聚束科技（北京）有限公司 | A kind of vacuum atmosphere processing unit, sample observation system and method |
| US10903039B2 (en) | 2016-12-01 | 2021-01-26 | Focus-Ebeam Technology (Beijing) Co., Ltd. | Vacuum condition processing apparatus, system and method for specimen observation |
| JP2020004586A (en) * | 2018-06-27 | 2020-01-09 | 株式会社ニューフレアテクノロジー | Charged particle beam image acquisition device |
| JP7093242B2 (en) | 2018-06-27 | 2022-06-29 | 株式会社ニューフレアテクノロジー | Charged particle beam image acquisition device |
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