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CN205201209U - Magnetostatic moves a magnetic current and becomes polishing mechanism test device - Google Patents

Magnetostatic moves a magnetic current and becomes polishing mechanism test device Download PDF

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Publication number
CN205201209U
CN205201209U CN201521136726.4U CN201521136726U CN205201209U CN 205201209 U CN205201209 U CN 205201209U CN 201521136726 U CN201521136726 U CN 201521136726U CN 205201209 U CN205201209 U CN 205201209U
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fixed
polishing
dynamic field
magnetorheological
disk
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于鹏
潘继生
阎秋生
高伟强
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Guangdong University of Technology
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Guangdong University of Technology
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Abstract

本实用新型涉及一种静磁动场磁流变抛光机理试验装置。本实用新型的装置包括磁流变磨料半固着柔性微磨头发生装置、静磁动场偏心转换装置、抛光盘逆向旋转装置,磁流变磨料半固着柔性微磨头发生装置包括有底座、永磁极、固定套、转盘、抛光盘,静磁动场偏心转换装置包括有垫片、偏心套、内定位环、角接触球轴承、外定位环,抛光盘逆向旋转装置包括有外齿轮、行星轮、内齿轮、支撑件、固定盘、深沟球轴承、安装轴、静止件。本实用新型实现了在不更新磁流变液的情况下对工件实现高效率超光滑恒压力磁流变抛光,所获得的工件表面质量好,加工效率及精度高,而且无表面和亚表面损伤,均匀化程度高,材料耗费少,成本低,可以用于各类光学元件及半导体基片的加工。

The utility model relates to a static magnetic dynamic field magnetorheological polishing mechanism test device. The device of the utility model includes a magnetorheological abrasive semi-fixed flexible micro-grinding head generating device, a static magnetic dynamic field eccentric conversion device, and a polishing disc reverse rotation device. The magnetorheological abrasive semi-fixed flexible micro-grinding head generating device includes a base, a permanent Magnetic pole, fixed sleeve, turntable, polishing disc, static magnetic dynamic field eccentric conversion device includes gasket, eccentric sleeve, inner positioning ring, angular contact ball bearing, outer positioning ring, polishing disc reverse rotation device includes external gear, planetary gear , Internal gears, supports, fixed discs, deep groove ball bearings, mounting shafts, stationary parts. The utility model realizes high-efficiency ultra-smooth constant-pressure magnetorheological polishing on the workpiece without updating the magnetorheological fluid, and the obtained workpiece has good surface quality, high processing efficiency and precision, and no surface and subsurface damage , high degree of homogenization, less material consumption, low cost, and can be used in the processing of various optical components and semiconductor substrates.

Description

一种静磁动场磁流变抛光机理试验装置A static magnetodynamic field magnetorheological polishing mechanism test device

技术领域 technical field

本实用新型涉及一种静磁动场磁流变抛光机理试验装置,特别涉及对一种磨料半固着磁流变柔性微磨头实时在线修整的恒压式光学元件及半导体基片平面研磨抛光装置。 The utility model relates to a static magnetic dynamic field magneto-rheological polishing mechanism test device, in particular to a constant-pressure optical element and semiconductor substrate plane grinding and polishing device for real-time on-line trimming of an abrasive semi-fixed magnetorheological flexible micro-grinding head .

背景技术 Background technique

随着微电子、光电子、太阳能光伏技术的发展以及光学与电子学的不断融合,对硬脆材料构件、光电元件的加工精度要求越来越高,现代光学的透镜、反射镜、功能光电器件等光学表面不仅有面形精度要求还需要达到超光滑表面并且对次表面损伤也要严格控制。而随着信息产业与光电子产业的发展,要求元器件加工成本不断下降,光学元件直径越做越大(如微电子行业的单晶硅片加工,从目前主流的8英寸硅片逐渐向12英寸发展),其表面 With the development of microelectronics, optoelectronics, solar photovoltaic technology and the continuous integration of optics and electronics, the processing precision requirements for hard and brittle material components and optoelectronic components are getting higher and higher. Modern optical lenses, mirrors, functional optoelectronic devices, etc. Optical surfaces not only have surface shape accuracy requirements, but also need to achieve ultra-smooth surfaces and strictly control subsurface damage. With the development of the information industry and the optoelectronics industry, the processing cost of components is required to continue to decrease, and the diameter of optical components is getting larger and larger (for example, the processing of single crystal silicon wafers in the microelectronics industry has gradually changed from the current mainstream 8-inch silicon wafers to 12-inch silicon wafers. development), its surface

的超光滑抛光成为超精密加工技术的一个新挑战。 The ultra-smooth polishing has become a new challenge for ultra-precision machining technology.

在信息产业与光电子产业的发展引领下,为了解决光学表面高效精密研磨抛光加工问题,20世纪90年代初美国Rochester大学光学中心的众多合作者将电磁学、流体动力学、分析化学相结合提出了一种新型的光学元件加工方法-磁流变抛光技术(MRF)。该方法作为一种新型的光学表面加工方法,由于具有抛光效果好、不产生次表面损伤、适合复杂表面加工等传统抛光所不具备的优点,已发展成为一种革命性光学表面超精密加工方法。该项技术至今已有较大的发展,特别是将磁流变抛光与化学刻蚀等技术相结合,提高光学元件抗激光损伤阈值有着广泛的应用前景。目前采用磁流变抛光方法对平面工件进行加工时,主要以美国QED公司研制的各种型号磁流变机床,其原理是被加工工件位于抛光盘上方,被加工工件与抛光盘之间形成一个“凹形空隙”,抛光盘的下方布置一个磁极,在工件与抛光盘所形成的狭小空隙处形成一个梯度磁场。当磁流变液随抛光盘运动到工件与抛光盘形成的空隙附近时,梯度磁场使之凝聚、变硬,形成一缎带凸起,成为粘塑性的Bingham介质。这样具有较高粘度的Bingham介质通过狭小空隙时,对工件表面与之接触的区域产生一定的剪切力,从而使工件的表面材料被去除,达到微量去除的目的。 Under the guidance of the development of the information industry and the optoelectronic industry, in order to solve the problem of high-efficiency and precise grinding and polishing of optical surfaces, in the early 1990s, many collaborators at the Optical Center of the University of Rochester combined electromagnetics, fluid dynamics, and analytical chemistry. A new optical component processing method - magnetorheological polishing technology (MRF). As a new type of optical surface processing method, this method has developed into a revolutionary optical surface ultra-precision processing method due to its advantages that traditional polishing does not have, such as good polishing effect, no sub-surface damage, and suitable for complex surface processing. . This technology has been greatly developed so far, especially the combination of magnetorheological polishing and chemical etching to improve the laser damage resistance threshold of optical components has broad application prospects. At present, when the magnetorheological polishing method is used to process flat workpieces, various types of magnetorheological machine tools developed by the American QED company are mainly used. The principle is that the processed workpiece is located above the polishing disc, and a gap is formed between the processed workpiece and the polishing disc. "Concave gap", a magnetic pole is arranged under the polishing disc, and a gradient magnetic field is formed in the narrow gap formed by the workpiece and the polishing disc. When the magnetorheological fluid moves with the polishing disc to the vicinity of the gap formed by the workpiece and the polishing disc, the gradient magnetic field makes it condense and harden, forming a ribbon protrusion and becoming a viscoplastic Bingham medium. When the Bingham medium with higher viscosity passes through the narrow gap, it will generate a certain shear force on the contact area of the workpiece surface, so that the surface material of the workpiece is removed, and the purpose of micro-removal is achieved.

但是采用上述磁流变加工方法对工件进行加工时,由于各处加工间隙的不一样,梯度磁场也不一样,从而造成加工斑点各部分区域的材料去除率不一样,要解决大面积的平面时加工效率必然底下,同时电磁场发生装置的体积非常大,难以实现多磁极同时加工。 However, when the above-mentioned magnetorheological processing method is used to process the workpiece, due to the different processing gaps, the gradient magnetic field is also different, resulting in different material removal rates in various parts of the processing spots. The processing efficiency is bound to be low, and at the same time, the volume of the electromagnetic field generating device is very large, so it is difficult to realize simultaneous processing of multiple magnetic poles.

专利CN200610132495.9提到的采用永磁铁作为磁场发生装置,易可以进行磁流变抛光,并且很容易实现多点磁极的阵列提高加工效率。但是经过长期的实验验证,发现由于磁流变液固有的黏弹性,使得工件经过微磨头后会把微磨头压下而无法恢复,从而失去了对工件的压力和抛光效果,存在严重丢失抛光压力的问题,导致加工后的工件均匀性难以保证,加工原理及方法还需要质的突破。 Patent CN200610132495.9 mentions the use of permanent magnets as the magnetic field generator, which can easily perform magnetorheological polishing, and it is easy to realize the array of multi-point magnetic poles to improve the processing efficiency. However, after long-term experimental verification, it was found that due to the inherent viscoelasticity of magnetorheological fluid, the micro-grinding head would be pressed down after the workpiece passed through the micro-grinding head and could not be recovered, thus losing the pressure on the workpiece and the polishing effect, and there was a serious loss. The problem of polishing pressure makes it difficult to guarantee the uniformity of the processed workpiece, and the processing principle and method still need a qualitative breakthrough.

发明内容 Contents of the invention

本实用新型的目的是提供一种静磁动场磁流变抛光机理试验装置。本实用新型能对光学元件、半导体基片等硬脆材料在不更换加工装置和磁流变液的基础上进行高效率粗抛、半精抛、精抛,实现静磁动场的转换和动态磁场下微磨头的恢复,达到对工件的恒压力、均匀化、超光滑平面抛光。本实用新型高效率,成本低,获得的工件表面质量好,而且无表面和亚表面损伤,均匀化程度高。 The purpose of the utility model is to provide a static magnetic dynamic field magnetorheological polishing mechanism test device. The utility model can perform high-efficiency rough throwing, semi-fine throwing and fine throwing on the hard and brittle materials such as optical elements and semiconductor substrates without changing the processing device and magnetorheological fluid, and realizes the conversion and dynamic The recovery of the micro-grinding head under the magnetic field achieves constant pressure, homogenization, and ultra-smooth surface polishing on the workpiece. The utility model has the advantages of high efficiency, low cost, good surface quality of the obtained workpiece, no surface and sub-surface damage, and high homogenization degree.

本实用新型的技术方案是:本实用新型的一种静磁动场磁流变抛光机理试验装置,包括磁流变磨料半固着柔性微磨头发生装置、静磁动场偏心转换装置、抛光盘逆向旋转装置,磁流变磨料半固着柔性微磨头发生装置包括有底座、永磁极、固定套、转盘、抛光盘,静磁动场偏心转换装置包括有垫片、偏心套、内定位环、角接触球轴承、外定位环,抛光盘逆向旋转装置包括有外齿轮、行星轮、内齿轮、支撑件、固定盘、深沟球轴承、安装轴、静止件,底座装夹在机床工作台上,转盘套装在底座的外侧,固定套装设在底座的上部,且转盘及固定套与底座连接,转盘及固定套保持与底座同步进行轴向旋转,偏心套套装在固定套所设的内孔,且偏心套与固定套连接,永磁极安装在偏心套内,抛光盘装设在永磁极上方;垫片装设在底座与偏心套之间,内定位环套装在固定套的外侧,且与固定套固定在一起,角接触球轴承套装在内定位环的外侧,外定位环套装在角接触球轴承的外侧,抛光盘和永磁极的运动采用内定位环与外定位环之间的角接触球轴承来分离,外齿轮、三个行星轮以及内齿轮构成行星运动,支撑件装设在转盘的顶部,且支撑件与转盘连接,内齿轮装设在支撑件的顶部,且内齿轮与支撑件连接在一起,安装轴通过深沟球轴承固定在行星轮的内孔,外齿轮与外定位环连接,固定盘套装在外定位环的外侧,且固定盘装设在安装轴的顶部,固定盘与安装轴连接在一起,固定盘与静止件进行锁紧,静止件固定在机床底座上,抛光盘上方需要提供磁流变液。 The technical scheme of the utility model is: a static magnetodynamic field magnetorheological polishing mechanism test device of the utility model, including a magnetorheological abrasive semi-fixed flexible micro-grinding head generator, a static magnetodynamic field eccentric conversion device, a polishing disc Reverse rotation device, magnetorheological abrasive semi-fixed flexible micro-grinding head generating device includes base, permanent magnetic pole, fixed sleeve, turntable, polishing disc, static-magnetic dynamic field eccentric conversion device includes gasket, eccentric sleeve, inner positioning ring, Angular contact ball bearings, outer positioning rings, polishing disc reverse rotation device includes external gears, planetary gears, internal gears, support parts, fixed discs, deep groove ball bearings, installation shafts, stationary parts, and the base is clamped on the machine table , the turntable is set on the outside of the base, the fixed set is set on the upper part of the base, and the turntable and the fixed sleeve are connected with the base, the turntable and the fixed sleeve keep synchronously rotating axially with the base, and the eccentric sleeve is set in the inner hole set by the fixed sleeve. And the eccentric sleeve is connected with the fixed sleeve, the permanent magnetic pole is installed in the eccentric sleeve, the polishing disc is installed above the permanent magnetic pole; the gasket is installed between the base and the eccentric sleeve, and the inner positioning ring is set on the outside of the fixed sleeve, and it is connected with the fixed sleeve. The sleeves are fixed together, the angular contact ball bearing is set on the outer side of the inner positioning ring, the outer positioning ring is set on the outer side of the angular contact ball bearing, the movement of the polishing disc and the permanent magnet pole adopts the angular contact ball between the inner positioning ring and the outer positioning ring The outer gear, the three planetary wheels and the inner gear form a planetary motion, the support is installed on the top of the turntable, and the support is connected with the turntable, the inner gear is installed on the top of the support, and the inner gear and the support Connected together, the installation shaft is fixed in the inner hole of the planetary wheel through deep groove ball bearings, the outer gear is connected with the outer positioning ring, the fixed disc is set on the outside of the outer positioning ring, and the fixed disc is installed on the top of the installation shaft, the fixed disc and the The installation shafts are connected together, the fixed disc is locked with the stationary part, the stationary part is fixed on the machine base, and magnetorheological fluid needs to be provided above the polishing disc.

本实用新型的静磁动场磁流变抛光机理试验装置的磁流变液由微米级的羰基铁粉、微米级的磨料以及甘油或油酸按一定比例混合,在磁场及重力的作用下,磁流变液会沿着磁感线方向迅速形成柔性微磨头。本实用新型的静磁动场磁流变抛光机理试验装置通过偏心旋转小尺寸永磁体将静磁场转变为动态磁场,动态磁场促使微磨头的形貌恢复和磨料的更新自锐,实现对平面工件的恒压力均匀化抛光。本实用新型的静磁动场磁流变抛光机理试验装置采用行星轮机构实现抛光盘和永磁极的旋转方向相反,角接触球安装轴承使永磁极和抛光盘的运动相对独立,当行星轮机构中的三个行星轮均保持静止时,内齿轮和外齿轮的相对旋转方向相反,由此,在内齿轮和外齿轮的驱动下也可以实现两者的运动方向相反。本实用新型实现了在不更换磁流变液的情况下对工件实现粗抛、半精抛到精抛的全过程,该装置抛光效率高,成本低,获得的工件表面质量好,而且无表面和亚表面损伤、均匀化程度高,本实用新型的试验装置可以用于各类光学元件及半导体基片的加工。 The magnetorheological fluid of the static magnetic dynamic field magnetorheological polishing mechanism test device of the present utility model is mixed with micron-sized carbonyl iron powder, micron-sized abrasive, glycerin or oleic acid in a certain proportion, and under the action of magnetic field and gravity, The magnetorheological fluid will quickly form a flexible micro-grinding head along the direction of the magnetic induction line. The static magnetic dynamic field magnetorheological polishing mechanism test device of the utility model converts the static magnetic field into a dynamic magnetic field by eccentrically rotating a small-sized permanent magnet, and the dynamic magnetic field promotes the recovery of the shape of the micro-grinding head and the renewal and self-sharpening of the abrasive, so as to realize the polishing of the flat surface. Constant pressure homogeneous polishing of the workpiece. The static magnetic dynamic field magneto-rheological polishing mechanism test device of the utility model adopts a planetary gear mechanism to realize that the rotation directions of the polishing disc and the permanent magnetic pole are opposite, and the angular contact ball is installed with a bearing so that the movement of the permanent magnetic pole and the polishing disc is relatively independent. When the planetary gear mechanism When the three planetary gears are kept stationary, the relative rotation direction of the internal gear and the external gear is opposite, thus, the direction of motion of the two can also be reversed under the drive of the internal gear and the external gear. The utility model realizes the whole process of rough polishing, semi-finish polishing and fine polishing on the workpiece without replacing the magnetorheological fluid. The device has high polishing efficiency, low cost, and the obtained workpiece has good surface quality and no surface And sub-surface damage, high degree of homogenization, the test device of the utility model can be used in the processing of various optical elements and semiconductor substrates.

附图说明 Description of drawings

图1是本实用新型静磁动场磁流变抛光机理试验装置的三维示意图; Fig. 1 is the three-dimensional schematic diagram of the utility model static magnetic dynamic field magnetorheological polishing mechanism test device;

图2是本实用新型静磁动场磁流变抛光机理试验装置的俯视图; Fig. 2 is the top view of the utility model static magnetic dynamic field magnetorheological polishing mechanism test device;

图3是本实用新型静磁动场磁流变抛光机理试验装置的全剖主视图; Fig. 3 is a full-section front view of the utility model static magnetic dynamic field magnetorheological polishing mechanism test device;

图4是本实用新型静磁动场磁流变抛光机理试验装置的工作原理图; Fig. 4 is a working principle diagram of the utility model static magnetodynamic field magnetorheological polishing mechanism test device;

图5是本实用新型静磁动场磁流变抛光机理试验装置内定位环和偏心套的另一种结构图; Fig. 5 is another structure diagram of the positioning ring and the eccentric sleeve in the test device of the static magnetodynamic field magnetorheological polishing mechanism of the utility model;

图6是本实用新型静磁动场磁流变抛光机理试验装置永磁极静止时的磁力线示意图; Fig. 6 is a schematic diagram of the magnetic lines of force when the permanent magnet poles of the utility model static magnetic dynamic field magnetorheological polishing mechanism test device are stationary;

图7是本实用新型静磁动场磁流变抛光机理试验装置永磁极偏心旋转时的磁力线示意图; Fig. 7 is a schematic diagram of the magnetic field lines when the permanent magnet poles rotate eccentrically in the static magnetodynamic field magnetorheological polishing mechanism test device of the present invention;

图8是本实用新型静磁动场磁流变抛光机理试验装置内定位环的示意图; Fig. 8 is a schematic diagram of the positioning ring in the test device of the static magnetodynamic field magnetorheological polishing mechanism of the utility model;

图中:1.螺钉,2.锁紧螺母,3.抛光盘,4.安装轴,5.行星轮,6.支撑件,7.连接螺钉,8.底座,9.垫片,10.平键,11.外齿轮,12.转盘,13.连接螺钉,14.固定螺栓,15.深沟球轴承,16.内齿轮,17.固定盘,18.静止件,19.锁紧螺钉,20.角接触球轴承,21.内定位环,22.偏心套,23、永磁极,24.固定套,25.外定位环,26、固定螺钉,27、紧定螺钉,28、偏心距,29、定位台阶,30、磁流变液,31、工件,32、主安装轴,33、柔性微磨头,34、螺纹,35、槽口。 In the figure: 1. screw, 2. lock nut, 3. polishing disc, 4. installation shaft, 5. planetary wheel, 6. support piece, 7. connecting screw, 8. base, 9. spacer, 10. flat Key, 11. External gear, 12. Turntable, 13. Connecting screw, 14. Fixing bolt, 15. Deep groove ball bearing, 16. Internal gear, 17. Fixed disc, 18. Stationary part, 19. Locking screw, 20 .Angular contact ball bearing, 21. Inner positioning ring, 22. Eccentric sleeve, 23. Permanent magnetic pole, 24. Fixed sleeve, 25. Outer positioning ring, 26. Fixing screw, 27. Set screw, 28, Eccentric distance, 29 , positioning step, 30, magnetorheological fluid, 31, workpiece, 32, main installation shaft, 33, flexible micro-grinding head, 34, thread, 35, notch.

具体实施方式:detailed description:

下面结合附图及实施例对本实用新型作进一步说明,但本实用新型的实施方式不限于此: The utility model will be further described below in conjunction with accompanying drawing and embodiment, but the embodiment of the utility model is not limited to this:

实施例1: Example 1:

如图1~图3所示,本实用新型的静磁动场磁流变抛光机理试验装置,包括磁流变磨料半固着柔性微磨头发生装置、静磁动场偏心转换装置、抛光盘逆向旋转装置,磁流变磨料半固着柔性微磨头发生装置包括有底座8、永磁极23、固定套24、转盘12、抛光盘3,静磁动场偏心转换装置包括有垫片9、偏心套22、内定位环21、角接触球轴承20、外定位环25,底座8装夹在机床工作台上,转盘12套装在底座8的外侧,固定套24装设在底座8的上部,且转盘12及固定套24与底座8连接,转盘12及固定套24保持与底座8同步进行轴向旋转,偏心套22套装在固定套24所设的内孔,且偏心套22与固定套24连接,永磁极23安装在偏心套22内,抛光盘3装设在永磁极23上方;垫片9装设在底座8与偏心套22之间,内定位环21套装在固定套24的外侧,且与固定套24固定在一起,角接触球轴承20套装在内定位环21的外侧,外定位环25套装在角接触球轴承20的外侧,外定位环25与抛光盘3连接,抛光盘3和永磁极23的运动采用内定位环21与外定位环25之间的角接触球轴承20来分离;抛光盘逆向旋转装置包括有外齿轮11、行星轮5、内齿轮16、支撑件6、固定盘17、深沟球轴承15、安装轴4、静止件18,外齿轮11、三个行星轮5以及内齿轮16构成行星运动,支撑件6装设在转盘12的顶部,且支撑件6与转盘12连接,内齿轮16装设在支撑件6的顶部,且内齿轮16与支撑件6连接在一起,安装轴4通过深沟球轴承15固定在行星轮5的内孔,外齿轮11与外定位环25连接,固定盘17套装在外定位环25的外侧,且固定盘17装设在安装轴4的顶部,固定盘17与安装轴4连接在一起,固定盘17与静止件18进行锁紧,静止件18固定在机床底座上,抛光盘3上方需要提供磁流变液30。 As shown in Figures 1 to 3, the test device for magnetostatic dynamic field magnetorheological polishing mechanism of the present invention includes a magnetorheological abrasive semi-fixed flexible micro-grinding device, a static magnetic dynamic field eccentric conversion device, and a polishing disc inverse The rotating device, the magnetorheological abrasive semi-fixed flexible micro-grinding device includes a base 8, a permanent magnet pole 23, a fixed sleeve 24, a turntable 12, and a polishing disc 3, and the magnetostatic dynamic field eccentric conversion device includes a gasket 9 and an eccentric sleeve 22. The inner positioning ring 21, the angular contact ball bearing 20, the outer positioning ring 25, the base 8 is clamped on the machine tool table, the turntable 12 is set on the outside of the base 8, the fixed sleeve 24 is installed on the upper part of the base 8, and the turntable 12 and the fixed sleeve 24 are connected with the base 8, the rotating disk 12 and the fixed sleeve 24 keep synchronously rotating axially with the base 8, the eccentric sleeve 22 is set in the inner hole provided by the fixed sleeve 24, and the eccentric sleeve 22 is connected with the fixed sleeve 24, The permanent magnetic pole 23 is installed in the eccentric sleeve 22, and the polishing disc 3 is installed above the permanent magnetic pole 23; the gasket 9 is installed between the base 8 and the eccentric sleeve 22, and the inner positioning ring 21 is sleeved on the outside of the fixed sleeve 24, and The fixed sleeve 24 is fixed together, the angular contact ball bearing 20 is set on the outside of the inner locating ring 21, the outer locating ring 25 is set on the outside of the angular contact ball bearing 20, the outer locating ring 25 is connected with the polishing disc 3, the polishing disc 3 and the permanent The movement of the magnetic pole 23 is separated by the angular contact ball bearing 20 between the inner positioning ring 21 and the outer positioning ring 25; 17. Deep groove ball bearing 15, installation shaft 4, stationary part 18, external gear 11, three planetary gears 5 and internal gear 16 form a planetary motion, support 6 is installed on the top of turntable 12, and support 6 and turntable 12 connection, the internal gear 16 is installed on the top of the support 6, and the internal gear 16 is connected with the support 6, the installation shaft 4 is fixed on the inner hole of the planetary wheel 5 through the deep groove ball bearing 15, the external gear 11 and the external The positioning ring 25 is connected, the fixed disc 17 is set on the outside of the outer positioning ring 25, and the fixed disc 17 is installed on the top of the installation shaft 4, the fixed disc 17 is connected with the installation shaft 4, and the fixed disc 17 is locked with the stationary part 18 , the stationary part 18 is fixed on the base of the machine tool, and a magnetorheological fluid 30 needs to be provided above the polishing disc 3 .

本实用新型的静磁动场磁流变抛光机理试验装置的动力只需通过一个步进电机带动底座8运动,角接触球轴承20通过内定位环21定位安装轴承内圈,通过外定位环25和抛光盘3定位外圈,深沟球轴承15通过行星轮5的内孔定位外圈。外齿轮11、内齿轮16以及均布的三个行星轮5相互啮合组成行星轮系统,行星轮固定结构中深沟球轴承15定位在内齿轮16内孔、安装轴4和固定盘17固定在一起,固定盘17通过螺钉19锁紧在静止件18上,从而保持三个行星轮5均为静止状态,实现内齿轮16和外齿轮11相对运动方向相反,永磁极23和底座8运动保持一致,抛光盘3和底座8相对运动方向相反。上述永磁极23装设在偏心套22内实现偏心旋转,偏心套22可以通过改变孔的偏心位置来实现不同的偏心距28。 The power of the static magnetic dynamic field magnetorheological polishing mechanism test device of the present utility model only needs to drive the base 8 to move through a stepping motor, and the angular contact ball bearing 20 is positioned and installed by the inner ring 21 of the bearing inner ring, and by the outer positioning ring 25 The outer ring is positioned with the polishing disc 3, and the deep groove ball bearing 15 is positioned through the inner hole of the planetary wheel 5 to locate the outer ring. The outer gear 11, the inner gear 16 and the three evenly distributed planetary gears 5 mesh with each other to form a planetary gear system. In the fixed structure of the planetary gears, the deep groove ball bearing 15 is positioned in the inner hole of the inner gear 16, and the installation shaft 4 and the fixed disk 17 are fixed on the Together, the fixed disk 17 is locked on the stationary part 18 by the screw 19, so as to keep the three planetary gears 5 in a static state, so that the relative movement direction of the internal gear 16 and the external gear 11 is opposite, and the permanent magnet pole 23 and the base 8 are consistent in movement , the relative movement directions of the polishing disc 3 and the base 8 are opposite. The above-mentioned permanent magnet poles 23 are installed in the eccentric sleeve 22 to realize eccentric rotation, and the eccentric sleeve 22 can realize different eccentric distances 28 by changing the eccentric position of the hole.

本实施例中,上述转盘12通过连接螺钉13和支撑件6固定在一起;转盘12及固定套24通过螺栓7与底座8连接在一起。固定盘17与安装轴4通过螺栓及锁紧螺母2连接在一起,外定位环25与抛光盘3通过螺钉1连接在一起。上述内定位环21通过螺纹34与固定套24安装在一起。 In this embodiment, the above-mentioned turntable 12 is fixed together by connecting screws 13 and the support member 6 ; the turntable 12 and the fixing sleeve 24 are connected together with the base 8 by bolts 7 . The fixed disc 17 is connected with the installation shaft 4 through bolts and lock nuts 2 , and the outer positioning ring 25 is connected with the polishing disc 3 through screws 1 . The above-mentioned inner positioning ring 21 is installed together with the fixing sleeve 24 through the thread 34 .

本实施例中,上述内齿轮16通过固定螺栓14与支撑件6装设在一起,外齿轮11通过锁紧螺钉26和外定位环25固定在一起。 In this embodiment, the above-mentioned internal gear 16 is installed together with the support member 6 through the fixing bolt 14 , and the external gear 11 is fixed together through the locking screw 26 and the outer positioning ring 25 .

本实施例中,上述偏心套22通过平键10与固定套24连接。固定套24通过平键10带动偏心套22和永磁极23进行同步旋转。偏心套22和固定套24之间通过平键10连接的方式,还可以通过改变偏心套22和固定套24的结构,使偏心套22、固定套24、内定位环21固定在一起,实现不同尺寸永磁极23的安装。 In this embodiment, the above-mentioned eccentric sleeve 22 is connected with the fixed sleeve 24 through the flat key 10 . The fixed sleeve 24 drives the eccentric sleeve 22 and the permanent magnet pole 23 to rotate synchronously through the flat key 10 . The eccentric sleeve 22 and the fixed sleeve 24 are connected by the flat key 10, and the eccentric sleeve 22, the fixed sleeve 24, and the inner positioning ring 21 can be fixed together by changing the structure of the eccentric sleeve 22 and the fixed sleeve 24 to realize different Dimensions for the installation of permanent magnet poles 23.

本实施例中,上述内定位环21上端开有槽口35,由于内定位环21和固定套24之间采用螺纹连接,为方便安装和拆卸,故设有槽口35。此外,内定位环21还设有用于定位角接触球轴承20内圈的台阶29,台阶29设置在内定位环21的中部。 In this embodiment, the upper end of the inner positioning ring 21 is provided with a notch 35. Since the inner positioning ring 21 and the fixing sleeve 24 are connected by threads, the notch 35 is provided for the convenience of installation and disassembly. In addition, the inner positioning ring 21 is also provided with a step 29 for positioning the inner ring of the angular contact ball bearing 20 , and the step 29 is arranged in the middle of the inner positioning ring 21 .

本实施例中,上述抛光盘3的形状为凹形,抛光盘3通过螺钉1与外定位环25固定在一起。 In this embodiment, the polishing disc 3 is concave in shape, and the polishing disc 3 is fixed with the outer positioning ring 25 by the screw 1 .

本实施例中,锁紧螺母2和安装轴4的下部还安装轴端定位深沟球轴承15的外圈。 In this embodiment, the outer ring of the shaft end positioning deep groove ball bearing 15 is also installed on the lower part of the lock nut 2 and the installation shaft 4 .

本实施例中,上述永磁极23是直径为5~30mm的圆柱状永磁铁,端面磁感应强度至少为1500GS,永磁极23上端面到抛光盘面距离为0~5mm,偏心套22的偏心距为0~6mm。 In this embodiment, the above-mentioned permanent magnetic pole 23 is a cylindrical permanent magnet with a diameter of 5-30mm, the magnetic induction intensity of the end surface is at least 1500GS, the distance from the upper end surface of the permanent magnetic pole 23 to the surface of the polishing disc is 0-5mm, and the eccentricity of the eccentric sleeve 22 is 0 ~6mm.

本实施例中,上述环形抛光盘3、偏心套22、固定套24、内定位环21、垫片9、外定位环25、底座8、转盘12的材料均为硬铝合金材料。 In this embodiment, the above-mentioned annular polishing disc 3, eccentric sleeve 22, fixed sleeve 24, inner positioning ring 21, gasket 9, outer positioning ring 25, base 8, and turntable 12 are all made of hard aluminum alloy.

本实用新型静磁动场磁流变抛光机理试验装置的平面加工方法,包括如下步骤: The plane processing method of the static magnetic dynamic field magnetorheological polishing mechanism test device of the utility model comprises the following steps:

1)将静磁动场磁流变抛光机理试验装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控系统设定工件与抛光盘之间的加工间隙为0.8mm~1.4mm; 1) Install the static-magnetic-dynamic-field magnetorheological polishing mechanism test device on the CNC milling machine, install the workpiece on the main installation axis of the milling machine, and set the machining gap between the workpiece and the polishing disc at 0.8 mm to 1.4 mm through the CNC system;

2)设定工件转速、以及带动底座的步进电机的转速,启动步进电机,添加磁流变液到抛光盘的上方,在磁场力的作用下磁流变液会沿着磁感线方向迅速形成柔性微磨头; 2) Set the rotation speed of the workpiece and the speed of the stepping motor driving the base, start the stepping motor, add magnetorheological fluid to the top of the polishing disc, and the magnetorheological fluid will follow the direction of the magnetic induction line under the action of the magnetic field force Quickly form a flexible micro-grinding head;

3)启动数控铣床,在静磁动场转换机构和抛光盘逆向旋转装置的作用下产生动态磁场,在动态磁场作用下,柔性微磨头重新恢复,磁性微粒重新分布和积聚,对工件的进行恒压力抛光,实现对工件高效率、均匀化磁流变效应粗抛、半精抛及超光滑精抛。 3) Start the CNC milling machine, and generate a dynamic magnetic field under the action of the static-magnetic dynamic field conversion mechanism and the reverse rotation device of the polishing disc. Under the action of the dynamic magnetic field, the flexible micro-grinding head is restored, and the magnetic particles are redistributed and accumulated. Constant pressure polishing realizes rough polishing, semi-finish polishing and ultra-smooth fine polishing on the workpiece with high efficiency and uniform magneto-rheological effect.

如图6所示,当本实用新型静磁动场磁流变抛光机理试验装置不工作时,永磁极23产生静态磁场;如图7所示,当上述试验装置工作时,永磁极23产生了永磁极23偏心旋转下的动态磁场。 As shown in Figure 6, when the utility model static magnetic dynamic field magneto-rheological polishing mechanism test device was not working, the permanent magnetic pole 23 produced a static magnetic field; as shown in Figure 7, when the above-mentioned test device worked, the permanent magnetic pole 23 produced a The dynamic magnetic field under the eccentric rotation of the permanent magnet pole 23.

本实用新型的一种静磁动场磁流变抛光机理试验装置,工作时,抛光盘3的上方需要添加磁流变液30,磁流变液30制作方法如下: A kind of static magnetic dynamic field magnetorheological polishing mechanism test device of the present utility model, when working, need to add magnetorheological fluid 30 on the top of polishing disk 3, the preparation method of magnetorheological fluid 30 is as follows:

在去离子水中添加质量百分比为2~20%的微米级磨料,质量百分比为15~40%的微米级羰基铁粉,质量百分比1~10%的甘油或油酸等稳定剂以及质量百分比1~10%的防锈剂,充分搅拌后通过超声波震动5~30分钟,磁流变液30进入环形抛光盘3上方后,在磁场及重力的作用下,沿着磁感线方向迅速形成柔性微磨头33。 In deionized water, add 2-20% by mass of micron abrasives, 15-40% by mass of micron-scale carbonyl iron powder, 1-10% by mass of glycerin or oleic acid and other stabilizers and 1-10% by mass 10% anti-rust agent, fully stirred and vibrated by ultrasonic wave for 5-30 minutes, after the magnetorheological fluid 30 enters the top of the annular polishing disc 3, under the action of magnetic field and gravity, it quickly forms a flexible microgrinding along the direction of the magnetic induction line Head 33.

本实施例中,本实用新型通过如下方法制备磁流变液30:在去离子水中添加一定浓度为6~10%、粒径为1.5~7微米的金刚石磨料,浓度为16%的微米级羰基铁粉,质量百分比2%的甘油,浓度为3%的防锈剂,充分搅拌后通过超声波震动10分钟。当磁流变液30进入环形抛光盘3上方后,在磁场及重力的作用下,会沿着磁感线方向迅速形成柔性微磨头33。 In this embodiment, the utility model prepares the magnetorheological fluid 30 through the following method: add a certain concentration of 6-10% in deionized water, a diamond abrasive with a particle size of 1.5-7 microns, and a concentration of 16% of micron-sized carbonyl Iron powder, glycerin with a mass percentage of 2%, and a rust inhibitor with a concentration of 3% are fully stirred and vibrated by ultrasonic waves for 10 minutes. When the magnetorheological fluid 30 enters the top of the annular polishing disc 3 , under the action of the magnetic field and gravity, the flexible micro-grinding head 33 will be rapidly formed along the direction of the magnetic induction line.

如图5所示,本实施例中,上述永磁极23是直径为25mm的圆柱状永磁铁,端面磁感应强度为3000GS,永磁极23上端面到抛光盘面距离为5mm,偏心套22的偏心距为1mm,永磁极23安装在偏心套22内,工件和永磁极23的转速分别为600rpm和400rpm,工件(31)沿X安装轴方向上无偏摆。 As shown in Fig. 5, in the present embodiment, above-mentioned permanent magnetic pole 23 is the cylindrical permanent magnet that diameter is 25mm, and the end surface magnetic induction intensity is 3000GS, and the distance from the upper end surface of permanent magnetic pole 23 to the surface of the polishing disk is 5mm, and the eccentric distance of eccentric sleeve 22 is 1mm, the permanent magnet pole 23 is installed in the eccentric sleeve 22, the rotational speeds of the workpiece and the permanent magnet pole 23 are 600rpm and 400rpm respectively, and the workpiece (31) has no deflection along the X installation axis direction.

本实用新型的工作原理如下:如图4所示,本实用新型静磁动场磁流变抛光机理试验装置只需通过一个电动机带动底座8驱动该装置运动,该试验装置工作时,底座8通过连接螺钉7、固定套24、平键10、偏心套22带动永磁极23进行同步偏心旋转,底座8通过连接螺钉7、转盘12、连接螺钉13、支撑件6、固定螺栓14、行星轮机构、外定位环25带动抛光盘3进行旋转,由于均布的三个行星轮5都保持静止,实现了抛光盘3和底座8、永磁极23运动方向相反,由此,将静磁场转变为动态磁场,动态磁场下会促使柔性微磨头33的形貌恢复和磨料的更新自锐,当机床主安装轴32带动工件31进行旋转,方向与抛光盘3方向相反时,能实现对工件31的恒压力均匀化高效超光滑抛光。 The working principle of the present utility model is as follows: as shown in Figure 4, the utility model static magnetic dynamic field magneto-rheological polishing mechanism test device only needs to drive the base 8 to drive the device through a motor, and when the test device works, the base 8 passes through the The connecting screw 7, the fixed sleeve 24, the flat key 10, and the eccentric sleeve 22 drive the permanent magnet pole 23 to perform synchronous eccentric rotation. The outer positioning ring 25 drives the polishing disc 3 to rotate, and since the three evenly distributed planetary wheels 5 remain stationary, the polishing disc 3 and the base 8 and the permanent magnetic pole 23 move in opposite directions, thereby converting the static magnetic field into a dynamic magnetic field , the dynamic magnetic field will promote the recovery of the shape of the flexible micro-grinding head 33 and the self-sharpening of the abrasive material. When the main installation shaft 32 of the machine tool drives the workpiece 31 to rotate, and the direction is opposite to that of the polishing disc 3, it can realize constant grinding of the workpiece 31. Pressure homogenization for efficient ultra-smooth polishing.

本实施例中,上述的静磁动场磁流变抛光机理试验装置的对工件进行平面加工的方法如下,本实施例中,工件31是单晶6H-SiC基片: In the present embodiment, the above-mentioned static magnetodynamic field magnetorheological polishing mechanism test device carries out the method for plane processing of the workpiece as follows. In the present embodiment, the workpiece 31 is a single crystal 6H-SiC substrate:

1)将该装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为0.8mm,配置金刚石磨料浓度为10%,粒径为7微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对工件进行高效率磁流变粗抛30分钟,获得Ra约为30nm的平坦单晶6H-SiC基片; 1) Install the device on a CNC milling machine, install the workpiece on the main shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 0.8mm, and configure the diamond abrasive concentration as 10%. When the magnetorheological fluid 30 with a particle size of 7 microns is placed above the polishing disc 3, the magnetorheological fluid 30 will quickly form a flexible micro-grinding head 33 along the direction of the magnetic field under the action of a magnetic field, and the shape of the micro-grinding head will be It is pressed down during the processing, but under the action of the static magnetic dynamic field test device, a dynamic magnetic field will be generated. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the renewal and self-sharpening of the abrasive. After rough polishing for 30 minutes, a flat single crystal 6H-SiC substrate with Ra of about 30nm was obtained;

2)将该装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为1mm,配置金刚石磨料浓度为8%,粒径为3.5微米的磁流变液30到抛光盘3上方,磁流变液(30)在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对工件进行高效率磁流变半精抛40分钟,获得Ra约为10nm(除中心区域)的光滑单晶6H-SiC基片; 2) Install the device on a CNC milling machine, install the workpiece on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 1mm, and configure the diamond abrasive concentration to be 8%. The magnetorheological fluid 30 with a diameter of 3.5 microns is placed on the polishing disc 3, and the magnetorheological fluid (30) will quickly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of the magnetic field, and the shape of the micro-grinding head will be It is pressed down during the processing, but under the action of the static magnetic dynamic field test device, a dynamic magnetic field will be generated. The dynamic magnetic field will promote the shape recovery of the micro-grinding head and the renewal and self-sharpening of the abrasive. Change to semi-finish polishing for 40 minutes to obtain a smooth single crystal 6H-SiC substrate with Ra of about 10nm (except for the central region);

3)将该装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为1.2mm,配置金刚石磨料浓度为6%,粒径为1.5微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过高效率磁流变精抛50分钟后,获得Ra约为2nm(除中心区域)的超光滑单晶6H-SiC基片。 3) Install the device on a CNC milling machine, install the workpiece on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 1.2mm, and configure the diamond abrasive concentration to be 6%. When the magnetorheological fluid 30 with a particle size of 1.5 microns is placed above the polishing disc 3, the magnetorheological fluid 30 will quickly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of a magnetic field, and the shape of the micro-grinding head will be It is pressed down during the processing, but under the action of the static magnetic dynamic field test device, a dynamic magnetic field will be generated. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the self-sharpening of the abrasive. After high-efficiency magnetorheological fine polishing 50 Minutes later, an ultra-smooth single crystal 6H-SiC substrate with Ra of about 2nm (except the central region) was obtained.

实施例2: Example 2:

本实用新型与实施例1的结构相同,不同之处在于永磁极23是直径为20mm的圆柱状永磁铁,端面磁感应强度为2500GS,偏心套22的偏心距为2mm,工件和永磁极23的转速分别为800rpm和300rpm,工件31沿X安装轴方向距离中心位置左右偏摆15mm。 The structure of the utility model is the same as that of embodiment 1, the difference is that the permanent magnetic pole 23 is a cylindrical permanent magnet with a diameter of 20mm, the magnetic induction intensity of the end face is 2500GS, the eccentric distance of the eccentric sleeve 22 is 2mm, and the rotating speed of the workpiece and the permanent magnetic pole 23 They are 800rpm and 300rpm respectively, and the workpiece 31 is deflected left and right by 15mm from the center position along the X installation axis direction.

本实用新型通过如下方法制备磁流变液30:在去离子水中添加浓度为4~8%、粒径为1~5微米的碳化硅磨料,浓度为18%的微米级羰基铁粉,质量百分比3%的甘油,浓度为4%的防锈剂,充分搅拌后通过超声波震动15分钟。当磁流变液30进入环形抛光盘3上方后,在磁场及重力的作用下,会沿着磁感线方向迅速形成柔性微磨头33。 The utility model prepares the magnetorheological fluid 30 through the following method: adding silicon carbide abrasives with a concentration of 4 to 8% and a particle size of 1 to 5 microns in deionized water, and micron-level carbonyl iron powder with a concentration of 18%, the mass percentage 3% glycerin, 4% anti-rust agent, fully stirred and vibrated by ultrasonic wave for 15 minutes. When the magnetorheological fluid 30 enters the top of the annular polishing disc 3 , under the action of the magnetic field and gravity, the flexible micro-grinding head 33 will be rapidly formed along the direction of the magnetic induction line.

上述的静磁动场磁流变抛光机理试验装置对单晶硅片的平面加工方法为: The above-mentioned static magnetic dynamic field magnetorheological polishing mechanism test device is used for the plane processing method of single crystal silicon wafers as follows:

1)将该装置安装在数控铣床上,工件31安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为0.9mm,配置碳化硅磨料浓度为8%,粒径为5微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对单晶硅片进行高效率磁流变粗抛20分钟,获得Ra约为25nm的平坦单晶硅片; 1) Install the device on a CNC milling machine, install the workpiece 31 on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 0.9mm, and configure the silicon carbide abrasive concentration to be 8 %, the magnetorheological fluid 30 with a particle size of 5 microns is placed above the polishing disc 3, and the magnetorheological fluid 30 will rapidly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of a magnetic field, and the shape of the micro-rheological head It will be pressed down during the processing, but a dynamic magnetic field will be generated under the action of the static magnetic dynamic field test device. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the self-sharpening of the abrasive. High-efficiency magnetorheological rough polishing for 20 minutes to obtain a flat single crystal silicon wafer with Ra of about 25nm;

2)将该装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为1.1mm,配置碳化硅磨料浓度为6%,粒径为3微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而柔性微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对单晶硅片进行高效率磁流变半精抛30分钟,获得整个工件表面Ra约为10nm的光滑单晶硅片; 2) Install the device on a CNC milling machine, install the workpiece on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 1.1mm, and configure the silicon carbide abrasive concentration to 6% , the magnetorheological fluid 30 with a particle size of 3 microns is placed above the polishing disc 3, and the magnetorheological fluid 30 will rapidly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of a magnetic field, and the shape of the flexible micro-grinding head It will be pressed down during the processing, but a dynamic magnetic field will be generated under the action of the static magnetic dynamic field test device. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the self-sharpening of the abrasive. High-efficiency magnetorheological semi-finish polishing for 30 minutes to obtain a smooth single crystal silicon wafer with Ra of about 10nm on the entire workpiece surface;

3)将该装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为1.3mm,配置碳化硅磨料浓度为4%,粒径为1微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而柔性微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对工件进行高效率磁流变精抛30分钟,获得整个工件表面Ra约为1nm的超光滑单晶硅片。 3) Install the device on a CNC milling machine, install the workpiece on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 1.3mm, and configure the silicon carbide abrasive concentration to 4% , the magnetorheological fluid 30 with a particle size of 1 micron is placed above the polishing disc 3, and the magnetorheological fluid 30 will quickly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of a magnetic field, and the shape of the flexible micro-grinding head It will be pressed down during the processing, but under the action of the static magnetic dynamic field test device, a dynamic magnetic field will be generated. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the self-sharpening of the abrasive. After rheological polishing for 30 minutes, an ultra-smooth single crystal silicon wafer with an Ra of about 1 nm on the entire workpiece surface was obtained.

实施例3: Example 3:

本实用新型与实施例1的结构相同,不同之处在于永磁极23是直径为15mm的圆柱状永磁铁,端面磁感应强度为2000GS,偏心套22的偏心距为3mm,工件和永磁极23的转速分别为1000rpm和200rpm,工件31沿行切轨迹进行加工。 The structure of the utility model is the same as that of embodiment 1, the difference is that the permanent magnetic pole 23 is a cylindrical permanent magnet with a diameter of 15mm, the magnetic induction intensity of the end face is 2000GS, the eccentric distance of the eccentric sleeve 22 is 3mm, and the rotating speed of the workpiece and the permanent magnetic pole 23 1000rpm and 200rpm respectively, the workpiece 31 is processed along the line cutting track.

本实用新型通过如下方法制备磁流变液30:在去离子水中添加浓度为2~6%、粒径为1.5~5微米的氧化铝磨料,浓度为20%的微米级羰基铁粉,质量百分比4%的甘油,浓度为5%的防锈剂,充分搅拌后通过超声波震动20分钟。当磁流变液30进入环形抛光盘3上方后,在磁场及重力的作用下,会沿着磁感线方向迅速形成柔性微磨头33。 The utility model prepares the magnetorheological fluid 30 through the following method: adding alumina abrasives with a concentration of 2 to 6% and a particle size of 1.5 to 5 microns in deionized water, and micron-level carbonyl iron powder with a concentration of 20%, the mass percentage 4% glycerin, 5% anti-rust agent, fully stirred and vibrated by ultrasonic wave for 20 minutes. When the magnetorheological fluid 30 enters the top of the annular polishing disc 3 , under the action of the magnetic field and gravity, the flexible micro-grinding head 33 will be rapidly formed along the direction of the magnetic induction line.

上述的静磁动场磁流变抛光机理试验装置对碳酸锶陶瓷基片的平面加工方法为: The method for planar processing of the strontium carbonate ceramic substrate by the above-mentioned static magnetic dynamic field magnetorheological polishing mechanism test device is as follows:

1)将该装置安装在数控铣床上,工件31安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为1mm,配置氧化铝磨料浓度为6%,粒径为5微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33)而柔性微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对碳酸锶陶瓷基片进行高效率磁流变粗抛30分钟,获得Ra约为20nm的平坦碳酸锶陶瓷基片; 1) Install the device on a CNC milling machine, install the workpiece 31 on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece to 1mm through the CNC milling machine, and configure the concentration of alumina abrasive to 6% , the magnetorheological fluid 30 with a particle size of 5 microns is placed above the polishing disc 3, and the magnetorheological fluid 30 will quickly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of a magnetic field), and the shape of the flexible micro-grinding head It will be pressed down during the processing, but a dynamic magnetic field will be generated under the action of the static magnetic dynamic field test device. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the self-sharpening of the abrasive. After processing the strontium carbonate ceramic substrate Perform high-efficiency magnetorheological rough polishing for 30 minutes to obtain a flat strontium carbonate ceramic substrate with Ra of about 20nm;

2)将该装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为1.2mm,配置氧化铝磨料浓度为4%,粒径为3微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而柔性微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对单晶硅片进行高效率磁流变半精抛20分钟,获得整个工件表面Ra约为10nm的光滑碳酸锶陶瓷基片; 2) Install the device on a CNC milling machine, install the workpiece on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 1.2 mm, and configure the alumina abrasive concentration to 4% , the magnetorheological fluid 30 with a particle size of 3 microns is placed above the polishing disc 3, and the magnetorheological fluid 30 will rapidly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of a magnetic field, and the shape of the flexible micro-grinding head It will be pressed down during the processing, but a dynamic magnetic field will be generated under the action of the static magnetic dynamic field test device. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the self-sharpening of the abrasive. High-efficiency magnetorheological semi-finish polishing for 20 minutes to obtain a smooth strontium carbonate ceramic substrate with Ra of about 10nm on the entire workpiece surface;

3)将该装置安装在数控铣床上,工件安装在铣床主安装轴上,通过数控铣床调整抛光盘3的上表面距离工件下表面之间的距离为1.4mm,配置氧化铝磨料浓度为2%,粒径为1.5微米的磁流变液30到抛光盘3上方,磁流变液30在磁场的作用下会沿着磁感线方向迅速形成柔性微磨头33,而柔性微磨头的形状会在加工过程中被下压,但是在静磁动场试验装置的作用下会产生动态磁场,动态磁场会促使微磨头的形貌恢复和磨料的更新自锐,经过对工件进行高效率磁流变精抛30分钟,获得整个工件表面Ra约为1.5nm的超光滑碳酸锶陶瓷基片。 3) Install the device on a CNC milling machine, install the workpiece on the main installation shaft of the milling machine, adjust the distance between the upper surface of the polishing disc 3 and the lower surface of the workpiece through the CNC milling machine to 1.4mm, and configure the alumina abrasive concentration to 2% , the particle size is 1.5 micron magnetorheological fluid 30 above the polishing disc 3, the magnetorheological fluid 30 will rapidly form a flexible micro-grinding head 33 along the direction of the magnetic field line under the action of a magnetic field, and the shape of the flexible micro-grinding head It will be pressed down during the processing, but under the action of the static magnetic dynamic field test device, a dynamic magnetic field will be generated. The dynamic magnetic field will promote the recovery of the shape of the micro-grinding head and the self-sharpening of the abrasive. After rheological polishing for 30 minutes, an ultra-smooth strontium carbonate ceramic substrate with an Ra of about 1.5 nm on the entire workpiece surface was obtained.

Claims (10)

1. a magnetostatic dynamic field MRF mechanism experimental rig, is characterized in that comprising the flexible micro-bistrique generating means of magnetorheological abrasive material half set, the eccentric conversion equipment in magnetostatic dynamic field, polishing disk counter-rotating device, the flexible micro-bistrique generating means of magnetorheological abrasive material half set includes base (8), permanent-magnet pole (23), fixed cover (24), rotating disk (12), polishing disk (3), the eccentric conversion equipment in magnetostatic dynamic field includes pad (9), eccentric bushing (22), inner position ring (21), angular contact ball bearing (20), outer positioning ring (25), polishing disk counter-rotating device includes external gear (11), planetary gear (5), internal gear (16), support member (6), fixed disk (17), deep groove ball bearing (15), installation shaft (4), static element (18), base (8) clamping is on platen, rotating disk (12) is sleeved on the outside of base (8), fixed cover (24) is installed in the top of base (8), and rotating disk (12) and fixed cover (24) are connected with base (8), rotating disk (12) and fixed cover (24) keep synchronously carrying out axial-rotation with base (8), eccentric bushing (22) is sleeved on the endoporus set by fixed cover (24), and eccentric bushing (22) is connected with fixed cover (24), permanent-magnet pole (23) is arranged in eccentric bushing (22), and polishing disk (3) is installed in permanent-magnet pole (23) top, pad (9) is installed between base (8) and eccentric bushing (22), inner position ring (21) is sleeved on the outside of fixed cover (24), and be fixed together with fixed cover (24), angular contact ball bearing (20) is sleeved on the outside of inner position ring (21), outer positioning ring (25) is sleeved on the outside of angular contact ball bearing (20), and the motion of polishing disk (3) and permanent-magnet pole (23) adopts inner position ring (21) to be separated with the angular contact ball bearing (20) between outer positioning ring (25), external gear (11), three planetary gears (5) and internal gear (16) form planetary motion, support member (6) is installed in the top of rotating disk (12), and support member (6) is connected with rotating disk (12), internal gear (16) is installed in the top of support member (6), and internal gear (16) and support member (6) link together, installation shaft (4) is fixed on the endoporus of planetary gear (5) by deep groove ball bearing (15), external gear (11) is connected with outer positioning ring (25), fixed disk (17) is sleeved on the outside of outer positioning ring (25), and fixed disk (17) is installed in the top of installation shaft (4), fixed disk (17) and installation shaft (4) link together, fixed disk (17) and static element (18) are locked, static element (18) is fixed on lathe base, polishing disk (3) top needs to provide magnetic flow liquid (30).
2. magnetostatic dynamic field according to claim 1 MRF mechanism experimental rig, is characterized in that above-mentioned rotating disk (12) is fixed together by attachment screw (13) and support member (6); Rotating disk (12) and fixed cover (24) are linked together by bolt (7) and base (8).
3. magnetostatic dynamic field according to claim 1 MRF mechanism experimental rig, is characterized in that above-mentioned inner position ring (21) is installed together by screw thread (34) and fixed cover (24).
4. magnetostatic dynamic field according to claim 1 MRF mechanism experimental rig, together with it is characterized in that above-mentioned internal gear (16) to be installed in support member (6) by set bolt (14), external gear (11) is fixed together by lock-screw (26) and outer positioning ring (25).
5. magnetostatic dynamic field according to claim 1 MRF mechanism experimental rig, is characterized in that above-mentioned eccentric bushing (22) is connected with fixed cover (24) by flat key (10).
6. magnetostatic dynamic field according to claim 1 MRF mechanism experimental rig, is characterized in that above-mentioned fixed disk (17) is locked by lock-screw (19) and static element (18).
7. the magnetostatic dynamic field MRF mechanism experimental rig according to any one of claim 1 to 6, is characterized in that above-mentioned inner position ring (21) upper end has notch (35).
8. magnetostatic dynamic field according to claim 7 MRF mechanism experimental rig, is characterized in that above-mentioned inner position ring (21) is also provided with the step (29) for orientation angle contact ball bearing (20) inner ring.
9. magnetostatic dynamic field according to claim 7 MRF mechanism experimental rig, is characterized in that the shape of above-mentioned polishing disk (3) is spill.
10. magnetostatic dynamic field according to claim 7 MRF mechanism experimental rig, is characterized in that above-mentioned polishing disk (3) is fixed together by screw (1) and outer positioning ring (25).
CN201521136726.4U 2015-12-29 2015-12-29 Magnetostatic moves a magnetic current and becomes polishing mechanism test device Withdrawn - After Issue CN205201209U (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105458840A (en) * 2015-12-29 2016-04-06 广东工业大学 Magnetostatic moving field magnetorheological polishing mechanism test device and processing method thereof
CN105904333A (en) * 2016-06-08 2016-08-31 广东工业大学 Double-side polishing device and method capable of controlling rigidity of polishing pad through cluster dynamic magnetic field
CN107024414A (en) * 2017-05-22 2017-08-08 南京航空航天大学 The microcosmic observation method and device of magnetic current and liquid flow variation characteristic
CN108527016A (en) * 2018-06-15 2018-09-14 辽宁科技大学 It is a kind of to utilize low frequency alternating magnetic field ultraprecise magnetic grinder and method
CN110340745A (en) * 2019-07-18 2019-10-18 浙江科惠医疗器械股份有限公司 It is ceramic-lined in a kind of metal acetabulum to use magnetorheological polishing machine
CN114851056A (en) * 2022-05-27 2022-08-05 湖南宇环精密制造有限公司 Eccentric polishing mechanism

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105458840A (en) * 2015-12-29 2016-04-06 广东工业大学 Magnetostatic moving field magnetorheological polishing mechanism test device and processing method thereof
CN105458840B (en) * 2015-12-29 2017-12-29 广东工业大学 A kind of magnetostatic dynamic field MRF mechanism experimental rig and its processing method
CN105904333A (en) * 2016-06-08 2016-08-31 广东工业大学 Double-side polishing device and method capable of controlling rigidity of polishing pad through cluster dynamic magnetic field
WO2017211082A1 (en) * 2016-06-08 2017-12-14 广东工业大学 Double-sided polishing device and method having polishing pad with stiffness controlled by dynamic cluster magnetic field
CN105904333B (en) * 2016-06-08 2018-01-30 广东工业大学 A kind of double-sided polisher and method of cluster dynamic magnetic field control polishing pad rigidity
CN107024414A (en) * 2017-05-22 2017-08-08 南京航空航天大学 The microcosmic observation method and device of magnetic current and liquid flow variation characteristic
CN108527016A (en) * 2018-06-15 2018-09-14 辽宁科技大学 It is a kind of to utilize low frequency alternating magnetic field ultraprecise magnetic grinder and method
CN108527016B (en) * 2018-06-15 2023-10-13 绍兴文理学院 An ultra-precision magnetic grinding device and method using low-frequency alternating magnetic field
CN110340745A (en) * 2019-07-18 2019-10-18 浙江科惠医疗器械股份有限公司 It is ceramic-lined in a kind of metal acetabulum to use magnetorheological polishing machine
CN114851056A (en) * 2022-05-27 2022-08-05 湖南宇环精密制造有限公司 Eccentric polishing mechanism

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