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CN205164880U - A grinder for coating in infra red thermal radiation high temperature furnace - Google Patents

A grinder for coating in infra red thermal radiation high temperature furnace Download PDF

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Publication number
CN205164880U
CN205164880U CN201520856592.7U CN201520856592U CN205164880U CN 205164880 U CN205164880 U CN 205164880U CN 201520856592 U CN201520856592 U CN 201520856592U CN 205164880 U CN205164880 U CN 205164880U
Authority
CN
China
Prior art keywords
reactor
coating
high temperature
temperature furnace
grinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201520856592.7U
Other languages
Chinese (zh)
Inventor
顾同新
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YIXING HANGUANG HIGH-TECH PETROCHEMICAL Co Ltd
Original Assignee
YIXING HANGUANG HIGH-TECH PETROCHEMICAL Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YIXING HANGUANG HIGH-TECH PETROCHEMICAL Co Ltd filed Critical YIXING HANGUANG HIGH-TECH PETROCHEMICAL Co Ltd
Priority to CN201520856592.7U priority Critical patent/CN205164880U/en
Application granted granted Critical
Publication of CN205164880U publication Critical patent/CN205164880U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model discloses a grinder for coating in infra red thermal radiation high temperature furnace, including the reactor, the reactor parallel is equipped with a pair of abrasive sheet, the reactor top is equipped with the pan feeding mouth, and the lateral wall is equipped with the storage water tank, and the storage water tank passes through pipe connection entering reactor, the reactor bottom side is equipped with the discharge gate, and the even cloth in bottom has the through -hole, links to each other through the outer catch basin of pipeline and reactor. The utility model discloses compare with the conventional art, rush out the reactor through the coating water after will grinding to this is avoided coating to glue to make a sound in reaction wall shanghai film studio and use, and the outside effort of rivers is with coating area to discharge gate when collecting the treated water through the water catch bowl simultaneously.

Description

A kind of lapping device for infrared emanation high temperature furnace inside courtyard
Technical field
The utility model belongs to chemical field, is specifically related to a kind of lapping device for infrared emanation high temperature furnace inside courtyard.
Background technology
At petrochemical industry, it is very extensive that high temperature kiln uses.Operationally, due to the oil product of inside high-temperature height caustic poison often, the time one is long very large to kiln injury, and often service life is very short for high temperature kiln.At present, most effective method is at kiln inwall coated with high temperature stove inside courtyard, and this kind of coating is generally that multiple compounds mixes, water insoluble, wet goods liquid.But because kiln inwall requires that flatness is high, therefore the granular size of coating also needs strict control.
Summary of the invention
Goal of the invention: the purpose of this utility model is for the deficiencies in the prior art, provides a kind of lapping device for infrared emanation high temperature furnace inside courtyard.
Technical scheme: in order to reach foregoing invention object, the utility model has specifically come like this: a kind of lapping device for infrared emanation high temperature furnace inside courtyard, comprises reactor, parallelly in described reactor is provided with a pair abrasive sheet; Reactor head is provided with feeding mouth, and sidewall is provided with storage tank, and storage tank enters reactor by pipeline connection; Described reactor bottom side is provided with discharging opening, and bottom even is furnished with through hole, is connected with the collecting-tank outside reactor by pipeline.
Wherein, water pump is provided with between described collecting-tank and reactor.
Beneficial effect: the utility model is compared with conventional art, by the aqueous coating after grinding is gone out reactor, avoid coating to glue with this and affect use on the reactor wall, by the active force outside current direction during water leg collection process water, coating is brought to discharging opening simultaneously.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
Detailed description of the invention
A kind of lapping device for infrared emanation high temperature furnace inside courtyard as shown in Figure 1, comprises reactor 1, parallelly in described reactor 1 is provided with a pair abrasive sheet 2; Reactor 1 top is provided with feeding mouth 3, and sidewall is provided with storage tank 4, and storage tank 4 enters reactor 1 by pipeline 5 connection; Described reactor 1 bottom side is provided with discharging opening 6, and bottom even is furnished with through hole, is connected with the collecting-tank 7 outside reactor 1 by pipeline; Water pump is provided with between described collecting-tank 7 and reactor 1.

Claims (2)

1. for a lapping device for infrared emanation high temperature furnace inside courtyard, comprise reactor (1), it is characterized in that, parallelly in described reactor (1) be provided with a pair abrasive sheet (2); Reactor (1) top is provided with feeding mouth (3), and sidewall is provided with storage tank (4), and storage tank (4) enters reactor (1) by pipeline (5) connection; Described reactor (1) bottom side is provided with discharging opening (6), and bottom even is furnished with through hole, is connected with reactor (1) collecting-tank outward (7) by pipeline.
2. the lapping device for infrared emanation high temperature furnace inside courtyard according to claim 1, is characterized in that, is provided with water pump between described collecting-tank (7) and reactor (1).
CN201520856592.7U 2015-10-29 2015-10-29 A grinder for coating in infra red thermal radiation high temperature furnace Expired - Fee Related CN205164880U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201520856592.7U CN205164880U (en) 2015-10-29 2015-10-29 A grinder for coating in infra red thermal radiation high temperature furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201520856592.7U CN205164880U (en) 2015-10-29 2015-10-29 A grinder for coating in infra red thermal radiation high temperature furnace

Publications (1)

Publication Number Publication Date
CN205164880U true CN205164880U (en) 2016-04-20

Family

ID=55728919

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201520856592.7U Expired - Fee Related CN205164880U (en) 2015-10-29 2015-10-29 A grinder for coating in infra red thermal radiation high temperature furnace

Country Status (1)

Country Link
CN (1) CN205164880U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105195284A (en) * 2015-10-29 2015-12-30 宜兴汉光高新石化有限公司 Grinding device for coating inside infrared thermal-radiation high-temperature furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105195284A (en) * 2015-10-29 2015-12-30 宜兴汉光高新石化有限公司 Grinding device for coating inside infrared thermal-radiation high-temperature furnace

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160420

Termination date: 20171029