CN204625834U - Reaction tubes and adopt the silicon core growth furnace of this reaction tubes - Google Patents
Reaction tubes and adopt the silicon core growth furnace of this reaction tubes Download PDFInfo
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- CN204625834U CN204625834U CN201520197435.XU CN201520197435U CN204625834U CN 204625834 U CN204625834 U CN 204625834U CN 201520197435 U CN201520197435 U CN 201520197435U CN 204625834 U CN204625834 U CN 204625834U
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Abstract
本实用新型提出了一种反应管,用于设于一硅芯生长炉内,该反应管为氮化硅管,其包括一第一管体、设于该管体顶端的端部及设于第一管体底端的第二管体,所述端部连接设于第一管体的顶部,且为漏斗状结构,所述第二管体为至少一个,每个第二管体的两端口分别形成相互配合的凸部及凹部。本实用新型中反应管,由于其端部的设置,所放置的硅料除放满管体内外还设于端部内,硅料于管体内熔化成液体而体积变小,该端部内的硅料弥补于管体内,最终使熔化成液态的硅料完全处于管体内,从而防止管体内硅料不足而影响产品的问题。
The utility model proposes a reaction tube for setting in a silicon core growth furnace. The reaction tube is a silicon nitride tube, which includes a first tube body, an end part arranged at the top of the tube body and a The second pipe body at the bottom end of the first pipe body, the end is connected to the top of the first pipe body, and is a funnel-shaped structure, there is at least one second pipe body, and each second pipe body has two ports A convex portion and a concave portion that cooperate with each other are formed respectively. In the reaction tube of the present invention, due to the setting of its end, the placed silicon material is also arranged in the end in addition to being filled with the inside of the tube. The silicon material melts into a liquid in the tube and becomes smaller in volume. The silicon material in the end Make up in the tube body, and finally make the silicon material melted into liquid completely in the tube body, so as to prevent the shortage of silicon material in the tube body and affect the product.
Description
技术领域technical field
本实用新型涉及一种硅材料制作工业技术领域,特别是指一种反应管及采用该反应管的硅芯生长炉。The utility model relates to the industrial technical field of silicon material production, in particular to a reaction tube and a silicon core growth furnace using the reaction tube.
背景技术Background technique
多晶硅是制备半导体器件和太阳能电池的原材料,是全球电子工业及光伏产业的基石。目前制备多晶硅主要利用化学气相沉积技术,采用反应管,将硅芯作为发热体及硅的沉积载体,用三氯氢硅作为反应气体,氢气作还原气体,待硅芯升高到一定温度后,三氯氢硅与氢气在硅芯表面反应生成硅并沉积在硅芯表面,最终得到想要的多晶硅。然而,现有的反应管通常为一直筒状的管体,由于硅料熔化后体积会变小,常常使得硅料不足而影响产品质量。Polysilicon is the raw material for the preparation of semiconductor devices and solar cells, and is the cornerstone of the global electronics industry and photovoltaic industry. At present, the preparation of polysilicon mainly uses chemical vapor deposition technology, adopts reaction tube, uses silicon core as heating element and silicon deposition carrier, uses trichlorosilane as reaction gas, and hydrogen as reducing gas. After the silicon core rises to a certain temperature, Trichlorosilane reacts with hydrogen to generate silicon on the surface of the silicon core and deposits on the surface of the silicon core to finally obtain the desired polysilicon. However, the existing reaction tube is usually a straight cylindrical tube body, and since the volume of the silicon material becomes smaller after melting, the silicon material is often insufficient to affect the product quality.
实用新型内容Utility model content
本实用新型提出一种反应管及采用该反应管的硅芯生长炉,解决了现有技术中硅料不足的问题。The utility model provides a reaction tube and a silicon core growth furnace adopting the reaction tube, which solves the problem of insufficient silicon material in the prior art.
本实用新型的技术方案是这样实现的:The technical scheme of the utility model is achieved in that:
一种反应管,用于设于一硅芯生长炉内,该反应管为氮化硅管,其包括一第一管体、设于该管体顶端的端部及设于第一管体底端的第二管体,所述端部连接设于第一管体的顶部,且为漏斗状结构,所述第二管体为至少一个,每个第二管体的两端口分别形成相互配合的凸部及凹部。A reaction tube for setting in a silicon core growth furnace, the reaction tube is a silicon nitride tube, which includes a first tube body, an end part arranged at the top of the tube body and a bottom part of the first tube body The second pipe body at the end, the end is connected to the top of the first pipe body, and is a funnel-shaped structure, the second pipe body is at least one, and the two ports of each second pipe body form a mutually matched Convex and concave.
优选方案为,所述反应管内还可设有一层氮化硅涂层。Preferably, a layer of silicon nitride coating can also be provided in the reaction tube.
优选方案为,所述端部的内径由其顶端向其底端逐渐缩小,且底端的内径与管体的内径相同,所述管体的内径由上向下各处均相等。A preferred solution is that the inner diameter of the end gradually decreases from the top end to the bottom end, and the inner diameter of the bottom end is the same as the inner diameter of the tube body, and the inner diameter of the tube body is equal from top to bottom.
一种硅芯生长炉,包括底座、设于该底座上的保温炉及设于该保温炉内的反应管,该保温炉上分别设有进气口及出气口,该反应管包括一管体及设于该管体顶端的端部,该管体的底部为封闭状态,顶部为开口状态,所述端部连接设于管体的顶部,且为漏斗状结构。A silicon core growth furnace, comprising a base, a holding furnace arranged on the base, and a reaction tube arranged in the holding furnace, the holding furnace is respectively provided with an air inlet and an air outlet, and the reaction tube includes a tube body And the end portion arranged at the top of the pipe body, the bottom of the pipe body is in a closed state, and the top is in an open state, and the end portion is connected to the top of the pipe body and has a funnel-shaped structure.
优选方案为,所述保温炉内由下向上依次设有衬板、第一限位板及第二限位板,所述第一限位板与第二限位板上分别对应设有若干限位孔,所述反应管依次穿设于第一限位板与第二限位板的限位孔内,并使其底端抵靠于衬板上。The preferred solution is that the lining board, the first limiting plate and the second limiting plate are arranged in sequence from bottom to top in the holding furnace, and the first limiting plate and the second limiting plate are respectively provided with a number of limiting plates. Positioning holes, the reaction tubes are sequentially set in the limiting holes of the first limiting plate and the second limiting plate, and make their bottom ends lean against the lining plate.
优选方案为,所述保温炉内壁在竖直方向排列有多个且彼此相互独立的发热体。A preferred solution is that the inner wall of the holding furnace is vertically arranged with a plurality of heating elements independent of each other.
本实用新型的有益效果为:The beneficial effects of the utility model are:
本实用新型中的反应管,由于其端部的设置,所放置的硅料除放满管体内外还设于端部内,硅料于管体内熔化成液体而体积变小,该端部内的硅料弥补于管体内,最终使熔化成液态的硅料完全处于管体内,从而防止管体内硅料不足而影响产品的问题。In the reaction tube of the utility model, due to the setting of its end, the placed silicon material is also arranged in the end in addition to being filled with the inside of the tube. The silicon material melts into a liquid in the tube and becomes smaller in volume. The silicon in the end The material is filled in the tube body, and finally the silicon material melted into liquid is completely in the tube body, so as to prevent the shortage of silicon material in the tube and affect the product.
附图说明Description of drawings
为了更清楚地说明本实用新型实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本实用新型的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description These are only some embodiments of the utility model, and those skilled in the art can also obtain other drawings based on these drawings without creative work.
图1为本实用新型反应管的剖视图;Fig. 1 is the sectional view of reaction tube of the present utility model;
图2为设有图1反应管的硅芯生长炉的剖视图。Fig. 2 is a cross-sectional view of the silicon core growth furnace provided with the reaction tube shown in Fig. 1 .
图中:In the picture:
10、反应管;11、第一管体;13、端部;15、第二管体;110、卡槽;20、硅芯生长炉;21、底座;22、保温炉;23、衬板;24、第一限位板;25、第二限位板;26、进气口;27、出气口;28、发热体;29、限位孔。10. Reaction tube; 11. First tube body; 13. End; 15. Second tube body; 110. Card slot; 20. Silicon core growth furnace; 21. Base; 22. Holding furnace; 23. Lining plate; 24, the first limiting plate; 25, the second limiting plate; 26, the air inlet; 27, the air outlet; 28, the heating element; 29, the limiting hole.
具体实施方式Detailed ways
下面将结合本实用新型实施例中的附图,对本实用新型实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本实用新型一部分实施例,而不是全部的实施例。基于本实用新型中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本实用新型保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. example. Based on the embodiments of the present utility model, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present utility model.
如图1所示,该反应管10用于设于一硅芯生长炉20内,包括一第一管体11、设于该第一管体11顶端的端部13及设于第一管体11底端的第二管体15。该反应管10为氮化硅管。As shown in Figure 1, the reaction tube 10 is used to be arranged in a silicon core growth furnace 20, and includes a first tube body 11, an end portion 13 arranged at the top of the first tube body 11 and a 11 the second pipe body 15 of bottom end. The reaction tube 10 is a silicon nitride tube.
该第一管体11的横截面为“U”字形,其顶部为开口状态。该第一管体11的内径由上向下各处均相等。该第一管体11底端的外周面上设有一卡槽110。The cross-section of the first pipe body 11 is "U"-shaped, and its top is open. The inner diameter of the first pipe body 11 is equal from top to bottom. An engaging groove 110 is formed on the outer peripheral surface of the bottom end of the first tube body 11 .
该端部13连接设于第一管体11的顶部,并与第一管体11一体设置。该端部13为漏斗状结构,即端部13的内径由其顶端向其底端逐渐缩小,其底端的内径与第一管体11的内径相同。The end portion 13 is connected to the top of the first pipe body 11 and is integrated with the first pipe body 11 . The end portion 13 is a funnel-shaped structure, that is, the inner diameter of the end portion 13 gradually decreases from the top end to the bottom end, and the inner diameter of the bottom end is the same as the inner diameter of the first pipe body 11 .
该第二管体15设于第一管体11的底端,并与第一管体11固定连接。该第二管体15可为一个、两个或多个,具体可根据具体反应管10所需要制作的长度来决定。每个第二管体15的两端口分别形成相互配合的凸部150及凹部151,以实现各第二管体15之间的相互连接。The second pipe body 15 is located at the bottom end of the first pipe body 11 and is fixedly connected with the first pipe body 11 . The second tube body 15 can be one, two or more, which can be determined according to the length of the specific reaction tube 10 to be manufactured. The two ports of each second tube body 15 respectively form a protruding part 150 and a concave part 151 that cooperate with each other, so as to realize the mutual connection between the second tube bodies 15 .
该反应管10内还可设有一层氮化硅涂层,以便于后续反应管10于硅芯的分离。A layer of silicon nitride coating can also be provided inside the reaction tube 10 to facilitate subsequent separation of the reaction tube 10 from the silicon core.
在制备硅芯过程中,需向反应管10内放置硅料,所放置的硅料除放满管体11内外还设于端部13内,在反应管10于硅芯生长炉20内反应时,硅料于反应管10内熔化成液体而体积变小,该端部13内的硅料弥补于管体11内,最终使熔化成液态的硅料完全处于管体11内,从而防止反应管10内硅料不足而影响产品的问题。In the process of preparing the silicon core, silicon material needs to be placed in the reaction tube 10. The placed silicon material is not only filled inside and outside the tube body 11, but also placed in the end 13. When the reaction tube 10 reacts in the silicon core growth furnace 20 , the silicon material melts into a liquid in the reaction tube 10 and the volume becomes smaller, and the silicon material in the end 13 is filled in the tube body 11, and finally the silicon material melted into a liquid state is completely in the tube body 11, thereby preventing the reaction tube Insufficient silicon material in 10 affects the product.
如图2所示,该硅芯生长炉20包括底座21、设于该底座21上的保温炉22、设于该保温炉22内的衬板23、第一限位板24、第二限位板25及设于第一限位板24与第二限位板25上的反应管10。As shown in Figure 2, the silicon core growth furnace 20 includes a base 21, a holding furnace 22 arranged on the base 21, a lining plate 23 arranged in the holding furnace 22, a first limiting plate 24, a second limiting plate The plate 25 and the reaction tubes 10 disposed on the first limiting plate 24 and the second limiting plate 25 .
所述保温炉22为采用保温层做成中空状的腔体结构,其顶端设有一进气口26,侧壁于靠近其底端位置设有一出气口27。该保温炉22的内壁在竖直方向设有多个排列且彼此相互独立的发热体28。所述衬板23水平设于保温炉22的底部。所述第一限位板24与第二限位板25相互平行间隔设于保温炉22中部,该第一限位板24与第二限位板25的两侧与保温炉22的炉体内壁相连接,该第一限位板24与第二限位板25上分别对应设有若干限位孔29,所述限位孔29内用于固定反应管10,使得反应管10处于竖直状态并使其底部抵靠与衬板23上,也可通过卡槽110卡设于衬板23内。该硅芯生长炉20可一次生产较多数量的硅芯,从而提高硅芯的制备效率,且硅芯的制备过程简单,不会造成硅料的浪费。The holding furnace 22 is a hollow cavity structure made of an insulating layer, an air inlet 26 is arranged on the top, and an air outlet 27 is arranged on the side wall near the bottom. The inner wall of the holding furnace 22 is vertically provided with a plurality of heating elements 28 arranged and independent from each other. The liner 23 is horizontally arranged at the bottom of the holding furnace 22 . The first limiting plate 24 and the second limiting plate 25 are arranged in the middle of the holding furnace 22 at intervals parallel to each other. connected, the first limiting plate 24 and the second limiting plate 25 are respectively provided with a plurality of limiting holes 29, and the limiting holes 29 are used to fix the reaction tube 10 so that the reaction tube 10 is in a vertical state And make its bottom abut against the liner 23 , and also can be clamped in the liner 23 through the slot 110 . The silicon core growth furnace 20 can produce a large number of silicon cores at one time, thereby improving the production efficiency of the silicon cores, and the production process of the silicon cores is simple and does not cause waste of silicon materials.
以上所述仅为本实用新型的较佳实施例而已,并不用以限制本实用新型,凡在本实用新型的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本实用新型的保护范围之内。The above descriptions are only preferred embodiments of the present utility model, and are not intended to limit the present utility model. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present utility model shall be included in the Within the protection scope of the present utility model.
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CN114132931A (en) * | 2021-12-17 | 2022-03-04 | 亚洲硅业(青海)股份有限公司 | Silicon core preparation device and method for polycrystalline silicon production |
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CN114132931A (en) * | 2021-12-17 | 2022-03-04 | 亚洲硅业(青海)股份有限公司 | Silicon core preparation device and method for polycrystalline silicon production |
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