CN204195523U - With the polishing machine of burnishing device micro-adjusting mechanism - Google Patents
With the polishing machine of burnishing device micro-adjusting mechanism Download PDFInfo
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- CN204195523U CN204195523U CN201420621749.3U CN201420621749U CN204195523U CN 204195523 U CN204195523 U CN 204195523U CN 201420621749 U CN201420621749 U CN 201420621749U CN 204195523 U CN204195523 U CN 204195523U
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- 238000005498 polishing Methods 0.000 title claims abstract description 78
- 230000007246 mechanism Effects 0.000 title claims abstract description 23
- 230000005540 biological transmission Effects 0.000 claims description 13
- 230000008878 coupling Effects 0.000 claims description 7
- 238000010168 coupling process Methods 0.000 claims description 7
- 238000005859 coupling reaction Methods 0.000 claims description 7
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
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Abstract
本实用新型公开了一种带抛光装置微调机构的抛光机,包括机座以及抛光装置,抛光装置下方设置有工件台,机座上设置有转动装置,转动装置的转动端设置有转动架板,转动架板上设置有微调机构,微调机构包括滑动座以及设置在滑动座上的滑动板Ⅰ,滑动座与所述滑动板Ⅰ之间设置有滑动导轨Ⅰ,所述抛光装置固定在所述滑动板Ⅰ上;当抛光装置发生偏移时,通过滑动板Ⅰ沿着滑动导轨Ⅰ滑动,则使抛光装置与滑动座发生相对滑动,调整抛光装置的位置,实现抛光装置的偏移补偿,操作方便,无需对抛光装置及抛光工件重新定位,也无需调整机座或工件台这些大型机构的位置,实现了在转动完成之后,能够迅速地调整抛光装置的位置,以便于下一步抛光的进行。
The utility model discloses a polishing machine with a fine-tuning mechanism of a polishing device, which comprises a machine base and a polishing device, a workpiece platform is arranged under the polishing device, a rotating device is arranged on the machine base, and a turret plate is arranged at the rotating end of the rotating device. A fine-tuning mechanism is arranged on the turret plate, and the fine-tuning mechanism includes a sliding seat and a sliding plate I arranged on the sliding seat. A sliding guide rail I is arranged between the sliding seat and the sliding plate I, and the polishing device is fixed on the sliding plate I. When the polishing device is offset, the sliding plate Ⅰ slides along the sliding guide rail Ⅰ, so that the polishing device and the sliding seat will slide relative to each other, adjust the position of the polishing device, and realize the offset compensation of the polishing device, which is easy to operate , it is not necessary to reposition the polishing device and the polished workpiece, and it is not necessary to adjust the positions of large mechanisms such as the machine base or the workpiece table. After the rotation is completed, the position of the polishing device can be quickly adjusted to facilitate the next step of polishing.
Description
技术领域technical field
本实用新型涉及一种抛光机,尤其涉及一种带抛光装置微调机构的抛光机。The utility model relates to a polishing machine, in particular to a polishing machine with a fine-tuning mechanism of a polishing device.
背景技术Background technique
目前,市场上的抛光机都包括有机座,机座上设置有可转动的抛光装置,抛光装置下方设置有夹装工件的工件台;使用时,通过转动抛光装置即可相对调整抛光装置与抛光工件之间的相对角度,使抛光装置可以从不同的角度进行抛光。但在抛光装置完成转动之后,抛光装置相对工件的位置会发生偏移,此时,必须要调整抛光装置与抛光工件的相对位置,使抛光装置与工件接触才能实现抛光。而现有技术中的抛光机,只能通过移动机座或工件台来进行调整,这相当于是对抛光装置及抛光工件重新定位,并且机座或者工件台这些大型机构较为笨重、体积较大,调节起来不方便,不利于操作者的使用。At present, the polishing machines on the market all include an organic base, and a rotatable polishing device is arranged on the base, and a workpiece table for clamping workpieces is arranged under the polishing device; when in use, the polishing device and the polishing device can be relatively adjusted by rotating the polishing device. The relative angle between the workpieces enables the polishing device to polish from different angles. However, after the polishing device completes the rotation, the position of the polishing device relative to the workpiece will deviate. At this time, the relative position of the polishing device and the polished workpiece must be adjusted so that the polishing device can be in contact with the workpiece to achieve polishing. However, the polishing machine in the prior art can only be adjusted by moving the base or the workpiece table, which is equivalent to repositioning the polishing device and the polished workpiece, and these large mechanisms such as the base or the workpiece table are relatively heavy and bulky. It is inconvenient to adjust and is not conducive to the use of the operator.
发明内容Contents of the invention
为了克服现有技术的不足,本实用新型提供一种能够实现抛光装置微调补偿的抛光机。In order to overcome the shortcomings of the prior art, the utility model provides a polishing machine capable of fine-tuning and compensating the polishing device.
本实用新型解决其技术问题所采用的技术方案是:The technical scheme that the utility model solves its technical problem adopts is:
一种带抛光装置微调机构的抛光机,包括机座以及抛光装置,抛光装置下方设置有工件台,所述机座上设置有转动装置,所述转动装置的转动端设置有转动架板,转动架板上设置有微调机构,微调机构包括滑动座以及设置在所述滑动座上的滑动板Ⅰ,所述滑动座与所述滑动板Ⅰ之间设置有滑动导轨Ⅰ,所述抛光装置固定在所述滑动板Ⅰ上。A polishing machine with a fine-tuning mechanism for a polishing device, comprising a machine base and a polishing device, a workpiece table is arranged under the polishing device, a rotating device is arranged on the machine base, a turret plate is arranged at the rotating end of the rotating device, and A fine-tuning mechanism is arranged on the frame plate, and the fine-tuning mechanism includes a sliding seat and a sliding plate I arranged on the sliding seat, a sliding guide rail I is arranged between the sliding seat and the sliding plate I, and the polishing device is fixed on on the sliding plate I.
所述滑动座包括横向滑动座以及设置在横向滑动座上的纵向滑动座,所述横向滑动座与所述纵向滑动座之间设置有横向导轨,所述滑动板Ⅰ设置在所述纵向滑动座上,所述滑动导轨Ⅰ为设置在所述纵向滑动座与所述滑动板Ⅰ之间的纵向导轨。The sliding seat includes a horizontal sliding seat and a longitudinal sliding seat arranged on the horizontal sliding seat, a transverse guide rail is arranged between the horizontal sliding seat and the longitudinal sliding seat, and the sliding plate I is arranged on the longitudinal sliding seat Above, the sliding guide rail I is a longitudinal guide rail arranged between the longitudinal sliding seat and the sliding plate I.
所述横向滑动座上设置有横向滚珠螺杆,横向滚珠螺杆的螺帽与所述纵向滑动座固定连接,所述纵向滑动座上设置有纵向滚珠螺杆,纵向滚珠螺杆的螺帽与所述滑动板Ⅰ固定连接,所述横向滚珠螺杆和纵向滚珠螺杆的输入端分别设置有伺服电机。The horizontal sliding seat is provided with a horizontal ball screw, the nut of the horizontal ball screw is fixedly connected with the longitudinal sliding seat, the longitudinal sliding seat is provided with a longitudinal ball screw, and the nut of the longitudinal ball screw is connected with the sliding plate I is fixedly connected, and the input ends of the horizontal ball screw and the vertical ball screw are respectively provided with servo motors.
所述转动装置包括驱动单元、轴承座以及传动轴,传动轴穿过所述轴承座,一端与所述驱动单元的输出端连接,另一端与所述转动架板固定连接。The rotating device includes a drive unit, a bearing seat and a transmission shaft, the transmission shaft passes through the bearing seat, one end is connected to the output end of the drive unit, and the other end is fixedly connected to the turret plate.
所述传动轴另一端为法兰盘Ⅰ,所述转动架板上设置有法兰盘Ⅱ,法兰盘Ⅰ与法兰盘Ⅱ配合固定连接。The other end of the drive shaft is a flange I, and the turret plate is provided with a flange II, and the flange I is fixedly connected with the flange II.
所述驱动单元包括依次连接的驱动电机、减速箱以及联轴器,联轴器与所述传动轴一端固定连接。The driving unit includes a driving motor, a reduction box and a coupling connected in sequence, and the coupling is fixedly connected to one end of the transmission shaft.
所述机座包括底座以及设置在底座上的滑动板Ⅱ,所述底座与所述滑动板Ⅱ之间设置有滑动导轨Ⅱ,所述转动装置设置在所述滑动板Ⅱ上。The machine base includes a base and a sliding plate II arranged on the base, a sliding guide rail II is arranged between the base and the sliding plate II, and the rotating device is arranged on the sliding plate II.
所述工件台上设置有可调整工件台位置的滑动导轨Ⅲ。The work table is provided with a sliding guide rail III which can adjust the position of the work table.
本实用新型的有益效果是:本实用新型通过将转动架板设置在机座转动装置的转动端,且该转动架板上设置有微调机构,微调机构上设置有抛光装置,这样,即可通过转动架板带动微调机构以及抛光装置进行转动,而当抛光装置发生偏移时,通过滑动板Ⅰ沿着滑动导轨Ⅰ滑动,则使抛光装置与转动架板上的滑动座发生相对滑动,调整抛光装置与抛光工件的相对位置,实现抛光装置的偏移补偿,操作方便,无需对抛光装置及抛光工件重新定位,也无需调整机座或工件台这些大型机构的位置,实现了在转动架板完成转动之后,能够迅速地调整抛光装置与抛光工件的相对位置,以便于对抛光工件进行下一步的抛光。The beneficial effects of the utility model are: the utility model is provided with a turret plate on the rotating end of the machine base rotating device, and the turret plate is provided with a fine-tuning mechanism, and the fine-tuning mechanism is provided with a polishing device, so that the The turret plate drives the fine-tuning mechanism and the polishing device to rotate, and when the polishing device deviates, the sliding plate Ⅰ slides along the sliding guide rail Ⅰ, so that the polishing device and the sliding seat on the turret plate slide relative to each other to adjust the polishing The relative position of the polishing device and the polishing workpiece realizes the offset compensation of the polishing device. After the rotation, the relative position of the polishing device and the polishing workpiece can be quickly adjusted so as to facilitate the next step of polishing the polishing workpiece.
附图说明Description of drawings
下面结合附图和实施例对本实用新型进一步说明。Below in conjunction with accompanying drawing and embodiment the utility model is further described.
图1是本实用新型的结构示意图;Fig. 1 is a structural representation of the utility model;
图2是本实用新型微调机构的拆分图;Fig. 2 is a disassembled view of the fine-tuning mechanism of the present utility model;
图3是本实用新型转动装置的拆分图。Fig. 3 is an exploded view of the rotating device of the present invention.
具体实施方式Detailed ways
参照图1,一种带抛光装置微调机构的抛光机,包括机座1以及抛光装置2,抛光装置2下方设置有工件台3,所述机座1上设置有转动装置4,所述转动装置4的转动端设置有转动架板5,所述转动架板5上设置有微调机构6,微调机构6包括滑动座61以及设置在所述滑动座61上的滑动板Ⅰ62,所述滑动座61与所述滑动板Ⅰ62之间设置有滑动导轨Ⅰ66,所述抛光装置2固定在所述滑动板Ⅰ62上。With reference to Fig. 1, a kind of polishing machine with fine-tuning mechanism of polishing device comprises machine base 1 and polishing device 2, and polishing device 2 below is provided with workpiece table 3, and described machine base 1 is provided with rotating device 4, and described rotating device The rotating end of 4 is provided with a turret plate 5, and the turret plate 5 is provided with a fine-tuning mechanism 6, and the fine-tuning mechanism 6 includes a sliding seat 61 and a sliding plate I62 arranged on the sliding seat 61, and the sliding seat 61 A sliding guide rail I66 is arranged between the sliding plate I62, and the polishing device 2 is fixed on the sliding plate I62.
本实用新型通过上述的结构设置,即可通过转动架板5带动微调机构6以及抛光装置2进行转动,而当抛光装置2发生偏移时,通过滑动板Ⅰ62沿着滑动导轨Ⅰ66滑动,则使抛光装置2与转动架板5上的滑动座61发生相对滑动,调整抛光装置2与抛光工件的相对位置,实现抛光装置2的偏移补偿,操作方便,无需对抛光装置2及抛光工件重新定位,也无需调整机座1或工件台3这些大型机构的位置,实现了在转动架板5完成转动之后,能够迅速地调整抛光装置2与抛光工件的相对位置,以便于对抛光工件进行下一步的抛光。The utility model can drive the fine-tuning mechanism 6 and the polishing device 2 to rotate through the turret plate 5 through the above-mentioned structural setting, and when the polishing device 2 deviates, the sliding plate I62 slides along the sliding guide rail I66, so that The polishing device 2 and the sliding seat 61 on the turret plate 5 slide relative to each other, adjust the relative position of the polishing device 2 and the polishing workpiece, and realize the offset compensation of the polishing device 2, which is easy to operate and does not need to reposition the polishing device 2 and the polishing workpiece , and there is no need to adjust the positions of these large mechanisms such as the machine base 1 or the workpiece table 3, so that after the turret plate 5 completes the rotation, the relative position of the polishing device 2 and the polished workpiece can be quickly adjusted, so that the next step can be performed on the polished workpiece of polishing.
本实用新型滑动座61的结构可以有多种,作为本实用新型的优选实施例,参照图2,所述滑动座61包括横向滑动座63以及设置在横向滑动座63上的纵向滑动座64,所述横向滑动座63与所述纵向滑动座64之间设置有横向导轨65,所述滑动板Ⅰ62设置在所述纵向滑动座64上,所述滑动导轨Ⅰ66为设置在所述纵向滑动座64与所述滑动板Ⅰ62之间的纵向导轨;这样,纵向滑动座64就可以相对横向滑动座63滑动,滑动板Ⅰ62就可以相对纵向滑动座64滑动,实现微调机构6从两个方向上进行微调补偿,更便于抛光装置2位置的调整。The structure of the utility model sliding seat 61 can have multiple, as a preferred embodiment of the present utility model, with reference to Fig. 2, described sliding seat 61 comprises horizontal sliding seat 63 and the vertical sliding seat 64 that is arranged on the horizontal sliding seat 63, A horizontal guide rail 65 is arranged between the horizontal sliding seat 63 and the longitudinal sliding seat 64, the sliding plate I62 is arranged on the longitudinal sliding seat 64, and the sliding guide rail I66 is arranged on the longitudinal sliding seat 64. and the longitudinal guide rail between the sliding plate I62; in this way, the longitudinal sliding seat 64 can slide relative to the horizontal sliding seat 63, and the sliding plate I62 can slide relative to the longitudinal sliding seat 64, so that the fine-tuning mechanism 6 can be fine-tuned from two directions Compensation makes it easier to adjust the position of the polishing device 2.
本实施例中,所述横向滑动座63上设置有横向滚珠螺杆67,横向滚珠螺杆67的螺帽与所述纵向滑动座64固定连接,所述纵向滑动座64上设置有纵向滚珠螺杆68,纵向滚珠螺杆68的螺帽与所述滑动板Ⅰ62固定连接,所述横向滚珠螺杆67和纵向滚珠螺杆68的输入端分别设置有伺服电机69,结构简单,便于操作使用;并且,通过伺服电机69可以同时控制横向滚珠螺杆67和纵向滚珠螺杆68转动,使纵向滑动座64相对横向滑动座63的滑动以及滑动板Ⅰ62相对纵向滑动座64的滑动可以同时进行,则实现了两个方向上同时微调补偿,提高了效率。In this embodiment, the horizontal sliding seat 63 is provided with a horizontal ball screw 67, the nut of the horizontal ball screw 67 is fixedly connected with the longitudinal sliding seat 64, and the longitudinal sliding seat 64 is provided with a longitudinal ball screw 68, The nut of the longitudinal ball screw 68 is fixedly connected to the sliding plate I 62, and the input ends of the transverse ball screw 67 and the longitudinal ball screw 68 are respectively provided with servo motors 69, which are simple in structure and easy to operate and use; and, through the servo motor 69 The rotation of the horizontal ball screw 67 and the vertical ball screw 68 can be controlled at the same time, so that the sliding of the vertical sliding seat 64 relative to the horizontal sliding seat 63 and the sliding of the sliding plate I 62 relative to the longitudinal sliding seat 64 can be carried out simultaneously, thus achieving simultaneous fine-tuning in two directions Compensation improves efficiency.
同样地,本实用新型转动装置的结构也可以有多种,作为本实用新型的优选实施例,所述转动装置4包括驱动单元41、轴承座42以及传动轴43,传动轴43穿过所述轴承座42,一端与所述驱动单元41的输出端连接,另一端与所述转动架板5固定连接;本实用新型结合了轴承座42承载能力强的特点,将轴承座42应用在转动装置4上,大大地增强了抛光机的结构稳定性,有效地避免了因转动装置4转动端的承载较大或者抛光过程中所产生的震动而带来结构不稳定的问题。Similarly, the structure of the rotating device of the present utility model can also have various types. As a preferred embodiment of the present utility model, the rotating device 4 includes a driving unit 41, a bearing seat 42 and a transmission shaft 43, and the transmission shaft 43 passes through the Bearing seat 42, one end is connected to the output end of the drive unit 41, and the other end is fixedly connected to the turret plate 5; the utility model combines the characteristics of strong bearing capacity of the bearing seat 42, and applies the bearing seat 42 to the rotating device 4, the structural stability of the polishing machine is greatly enhanced, effectively avoiding the problem of structural instability caused by the large load on the rotating end of the rotating device 4 or the vibration generated during the polishing process.
本实施例中,所述传动轴43另一端为法兰盘Ⅰ44,所述转动架板5上设置有法兰盘Ⅱ51,转动架板5通过法兰盘Ⅰ44与法兰盘Ⅱ51配合,而固定连接在传动轴43另一端,也是利用法兰配合稳定性强的特点,来增强结构的稳固性。In this embodiment, the other end of the transmission shaft 43 is a flange I44, and the turret plate 5 is provided with a flange II51, and the turret plate 5 is fixed through the cooperation of the flange I44 and the flange II51. Connecting to the other end of the transmission shaft 43 also utilizes the characteristics of strong flange fit stability to enhance the stability of the structure.
所述驱动单元41包括依次连接的驱动电机45、减速箱46以及联轴器47,联轴器47与所述传动轴43一端固定连接,驱动力通过减速箱46、联轴器47即可传递至传动轴43,结构简单。The drive unit 41 includes a drive motor 45, a reduction box 46 and a shaft coupling 47 connected in sequence. The shaft coupling 47 is fixedly connected to one end of the transmission shaft 43, and the driving force can be transmitted through the reduction box 46 and the shaft coupling 47. To the power transmission shaft 43, the structure is simple.
所述机座1包括底座11以及设置在底座11上的滑动板Ⅱ12,所述底座11与所述滑动板Ⅱ12之间设置有滑动导轨Ⅱ13,所述转动装置4设置在所述滑动板Ⅱ12上;则通过滑动板Ⅱ12沿着滑动导轨Ⅱ13滑动即可调整转动装置4以及抛光装置2的位置;所述工件台3上设置有可调整工件台3位置的滑动导轨Ⅲ31;通过工件台3沿着滑动导轨Ⅲ31滑动即可调整工件台3的位置。The base 1 includes a base 11 and a sliding plate II12 arranged on the base 11, a sliding guide rail II13 is arranged between the base 11 and the sliding plate II12, and the rotating device 4 is arranged on the sliding plate II12 ; Then the position of the rotating device 4 and the polishing device 2 can be adjusted by sliding the sliding plate II12 along the sliding guide rail II13; the workpiece table 3 is provided with a sliding guide rail III31 that can adjust the position of the workpiece table 3; The position of the workpiece table 3 can be adjusted by sliding the sliding guide rail III 31 .
本实用新型能够在抛光装置2发生转动偏移后,实现抛光装置2的微调补偿,可广泛应用于各种抛光机之中。The utility model can realize the fine-tuning compensation of the polishing device 2 after the rotation deviation of the polishing device 2 occurs, and can be widely used in various polishing machines.
Claims (8)
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Cited By (1)
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CN107584414A (en) * | 2017-09-07 | 2018-01-16 | 潘汉祥 | A kind of polishing machine autocompensation installation |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN107584414A (en) * | 2017-09-07 | 2018-01-16 | 潘汉祥 | A kind of polishing machine autocompensation installation |
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