CN204097583U - Dot matrix anode type electroreduction metal deposition part 3D prints equipment - Google Patents
Dot matrix anode type electroreduction metal deposition part 3D prints equipment Download PDFInfo
- Publication number
- CN204097583U CN204097583U CN201420478890.2U CN201420478890U CN204097583U CN 204097583 U CN204097583 U CN 204097583U CN 201420478890 U CN201420478890 U CN 201420478890U CN 204097583 U CN204097583 U CN 204097583U
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- Prior art keywords
- anode
- dot matrix
- anodes
- important actor
- metal ion
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- Expired - Lifetime
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- 239000011159 matrix material Substances 0.000 title claims abstract description 60
- 238000001465 metallisation Methods 0.000 title claims description 8
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 44
- 229910052751 metal Inorganic materials 0.000 claims abstract description 36
- 239000002184 metal Substances 0.000 claims abstract description 33
- 238000001802 infusion Methods 0.000 claims abstract description 27
- 238000004070 electrodeposition Methods 0.000 claims abstract description 12
- 238000009826 distribution Methods 0.000 claims abstract description 5
- 230000007246 mechanism Effects 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 9
- 239000012141 concentrate Substances 0.000 claims description 8
- 238000009413 insulation Methods 0.000 claims description 5
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 5
- 238000007639 printing Methods 0.000 abstract description 7
- 230000008901 benefit Effects 0.000 abstract description 6
- 239000007787 solid Substances 0.000 abstract description 4
- 238000005265 energy consumption Methods 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 33
- 238000000034 method Methods 0.000 description 13
- 238000006722 reduction reaction Methods 0.000 description 13
- 239000000843 powder Substances 0.000 description 11
- 230000009467 reduction Effects 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000010146 3D printing Methods 0.000 description 7
- 230000005611 electricity Effects 0.000 description 6
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 235000013350 formula milk Nutrition 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 3
- 235000011941 Tilia x europaea Nutrition 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007812 deficiency Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000004571 lime Substances 0.000 description 3
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical class [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000012266 salt solution Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
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- 238000007493 shaping process Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
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- 230000002159 abnormal effect Effects 0.000 description 1
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- 238000005266 casting Methods 0.000 description 1
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- 238000004146 energy storage Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- KHYBPSFKEHXSLX-UHFFFAOYSA-N iminotitanium Chemical compound [Ti]=N KHYBPSFKEHXSLX-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000007648 laser printing Methods 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910001000 nickel titanium Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/003—3D structures, e.g. superposed patterned layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201420478890.2U CN204097583U (en) | 2014-08-22 | 2014-08-22 | Dot matrix anode type electroreduction metal deposition part 3D prints equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201420478890.2U CN204097583U (en) | 2014-08-22 | 2014-08-22 | Dot matrix anode type electroreduction metal deposition part 3D prints equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
CN204097583U true CN204097583U (en) | 2015-01-14 |
Family
ID=52266028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201420478890.2U Expired - Lifetime CN204097583U (en) | 2014-08-22 | 2014-08-22 | Dot matrix anode type electroreduction metal deposition part 3D prints equipment |
Country Status (1)
Country | Link |
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CN (1) | CN204097583U (en) |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104164683A (en) * | 2014-08-22 | 2014-11-26 | 温州市工业科学研究院 | Dot-matrix-anode-type electroreduction metal deposition part 3D printing device |
CN106191946A (en) * | 2016-08-08 | 2016-12-07 | 江苏大学 | The apparatus and method that a kind of many current potentials imbibition electro-deposition 3D prints |
CN106493357A (en) * | 2016-10-21 | 2017-03-15 | 广东五维科技有限公司 | A kind of 3D printing method reduced based on metal cation |
IT201900013626A1 (en) | 2019-08-01 | 2021-02-01 | Fluid Metal 3D As | PROCEDURE AND SYSTEM OF LOCALIZED ELECTROFORMING BY JETS WITH CLOSED-LOOP FEEDBACK IN REAL TIME |
CN112317766A (en) * | 2020-11-06 | 2021-02-05 | 合肥新杉宇航三维科技有限公司 | Submicron-scale printing equipment and printing method thereof |
WO2021041265A1 (en) * | 2019-08-23 | 2021-03-04 | Fabric8Labs, Inc. | Matrix-controlled printhead for an electrochemical additive manufacturing system |
US10947632B1 (en) * | 2019-08-23 | 2021-03-16 | Fabric8Labs, Inc. | Electrochemical additive manufacturing method using deposition feedback control |
US11232956B2 (en) | 2015-11-19 | 2022-01-25 | Fabric8Labs, Inc. | Electrochemical additive manufacturing of interconnection features |
US11313035B2 (en) | 2019-08-23 | 2022-04-26 | Fabric8Labs, Inc. | Matrix-controlled printhead grid control for an electrochemical additive manufacturing system |
US11512404B2 (en) | 2019-08-23 | 2022-11-29 | Fabric8Labs, Inc. | Matrix-controlled printhead for an electrochemical additive manufacturing system |
US11521864B2 (en) * | 2019-08-23 | 2022-12-06 | Fabric8Labs, Inc. | Electrochemical additive manufacturing method using deposition feedback control |
US11680330B2 (en) | 2021-07-22 | 2023-06-20 | Fabric8Labs, Inc. | Electrochemical-deposition apparatuses and associated methods of electroplating a target electrode |
US11745432B2 (en) | 2021-12-13 | 2023-09-05 | Fabric8Labs, Inc. | Using target maps for current density control in electrochemical-additive manufacturing systems |
US11795561B2 (en) | 2021-08-02 | 2023-10-24 | Fabric8Labs, Inc. | Electrochemical-deposition system, apparatus, and method using optically-controlled deposition electrodes |
US11920251B2 (en) | 2021-09-04 | 2024-03-05 | Fabric8Labs, Inc. | Systems and methods for electrochemical additive manufacturing of parts using multi-purpose build plate |
US11970783B2 (en) | 2021-09-23 | 2024-04-30 | Fabric8Labs, Inc. | Systems and methods for manufacturing electrical components using electrochemical deposition |
US12104264B2 (en) | 2021-12-17 | 2024-10-01 | Fabric8Labs, Inc. | Systems and methods for electrochemical additive manufacturing of parts using capacitive sensing |
US12264405B2 (en) | 2022-08-30 | 2025-04-01 | Fabric8Labs, Inc. | Methods for electrochemical additive manufacturing while modifying electrolyte solutions |
-
2014
- 2014-08-22 CN CN201420478890.2U patent/CN204097583U/en not_active Expired - Lifetime
Cited By (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104164683A (en) * | 2014-08-22 | 2014-11-26 | 温州市工业科学研究院 | Dot-matrix-anode-type electroreduction metal deposition part 3D printing device |
US11232956B2 (en) | 2015-11-19 | 2022-01-25 | Fabric8Labs, Inc. | Electrochemical additive manufacturing of interconnection features |
CN106191946A (en) * | 2016-08-08 | 2016-12-07 | 江苏大学 | The apparatus and method that a kind of many current potentials imbibition electro-deposition 3D prints |
CN106191946B (en) * | 2016-08-08 | 2018-10-09 | 江苏大学 | A kind of device and method of more current potential imbibition electro-deposition 3D printings |
CN106493357A (en) * | 2016-10-21 | 2017-03-15 | 广东五维科技有限公司 | A kind of 3D printing method reduced based on metal cation |
IT201900013626A1 (en) | 2019-08-01 | 2021-02-01 | Fluid Metal 3D As | PROCEDURE AND SYSTEM OF LOCALIZED ELECTROFORMING BY JETS WITH CLOSED-LOOP FEEDBACK IN REAL TIME |
WO2021019449A1 (en) | 2019-08-01 | 2021-02-04 | Fluid Metal 3D As | Real time, closed loop feedback jet-based localized electroforming method and system |
US11521864B2 (en) * | 2019-08-23 | 2022-12-06 | Fabric8Labs, Inc. | Electrochemical additive manufacturing method using deposition feedback control |
US11881412B2 (en) | 2019-08-23 | 2024-01-23 | Fabric8Labs, Inc. | Electrochemical additive manufacturing method using deposition feedback control |
WO2021041265A1 (en) * | 2019-08-23 | 2021-03-04 | Fabric8Labs, Inc. | Matrix-controlled printhead for an electrochemical additive manufacturing system |
US11313035B2 (en) | 2019-08-23 | 2022-04-26 | Fabric8Labs, Inc. | Matrix-controlled printhead grid control for an electrochemical additive manufacturing system |
EP4018018A1 (en) * | 2019-08-23 | 2022-06-29 | Fabric8Labs, Inc. | Matrix-controlled printhead for an electrochemical additive manufacturing system |
US11401603B2 (en) | 2019-08-23 | 2022-08-02 | Fabric8Labs, Inc. | Two part 3D metal printhead assembly method of manufacture |
US11512404B2 (en) | 2019-08-23 | 2022-11-29 | Fabric8Labs, Inc. | Matrix-controlled printhead for an electrochemical additive manufacturing system |
US12049703B2 (en) | 2019-08-23 | 2024-07-30 | Fabric8Labs, Inc. | Matrix-controlled printhead for an electrochemical additive manufacturing system |
US12000038B2 (en) | 2019-08-23 | 2024-06-04 | Fabric8Labs, Inc. | Method for manufacturing an electrochemical deposition printhead with grid control circuit and backplane |
US10947632B1 (en) * | 2019-08-23 | 2021-03-16 | Fabric8Labs, Inc. | Electrochemical additive manufacturing method using deposition feedback control |
CN112317766A (en) * | 2020-11-06 | 2021-02-05 | 合肥新杉宇航三维科技有限公司 | Submicron-scale printing equipment and printing method thereof |
US11680330B2 (en) | 2021-07-22 | 2023-06-20 | Fabric8Labs, Inc. | Electrochemical-deposition apparatuses and associated methods of electroplating a target electrode |
US12104270B2 (en) | 2021-07-22 | 2024-10-01 | Fabric8Labs, Inc. | Methods of electroplating a target electrode |
US12252801B2 (en) | 2021-08-02 | 2025-03-18 | Fabric8Labs, Inc. | Electrochemical-deposition system, apparatus, and method using optically-controlled deposition electrodes |
US11795561B2 (en) | 2021-08-02 | 2023-10-24 | Fabric8Labs, Inc. | Electrochemical-deposition system, apparatus, and method using optically-controlled deposition electrodes |
US12227862B2 (en) | 2021-09-04 | 2025-02-18 | Fabric8Labs, Inc. | Methods for electrochemical additive manufacturing of parts |
US11920251B2 (en) | 2021-09-04 | 2024-03-05 | Fabric8Labs, Inc. | Systems and methods for electrochemical additive manufacturing of parts using multi-purpose build plate |
US11970783B2 (en) | 2021-09-23 | 2024-04-30 | Fabric8Labs, Inc. | Systems and methods for manufacturing electrical components using electrochemical deposition |
US11945170B2 (en) | 2021-12-13 | 2024-04-02 | Fabric8Labs, Inc. | Systems for updating target maps including consideration of linear position change in electrochemical-additive manufacturing systems |
US11745432B2 (en) | 2021-12-13 | 2023-09-05 | Fabric8Labs, Inc. | Using target maps for current density control in electrochemical-additive manufacturing systems |
US12257784B2 (en) | 2021-12-13 | 2025-03-25 | Fabric8Labs, Inc. | Systems for updating target maps including considerations of rotational position in electrochemical-additive manufacturing systems |
US12104264B2 (en) | 2021-12-17 | 2024-10-01 | Fabric8Labs, Inc. | Systems and methods for electrochemical additive manufacturing of parts using capacitive sensing |
US12264405B2 (en) | 2022-08-30 | 2025-04-01 | Fabric8Labs, Inc. | Methods for electrochemical additive manufacturing while modifying electrolyte solutions |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: WENZHOU LIKE ELECTRIC APPLIANCE CO.,LTD. Assignor: WENZHOU INSTITUTE OF INDUSTRY & SCIENCE Contract record no.: X2023980043514 Denomination of utility model: 3D Printing Equipment for Dot Matrix Anode Electroreduction Metal Deposition Parts Granted publication date: 20150114 License type: Common License Record date: 20231018 Assignee: Zhejiang aochang Technology Co.,Ltd. Assignor: WENZHOU INSTITUTE OF INDUSTRY & SCIENCE Contract record no.: X2023980043509 Denomination of utility model: 3D Printing Equipment for Dot Matrix Anode Electroreduction Metal Deposition Parts Granted publication date: 20150114 License type: Common License Record date: 20231018 |
|
EE01 | Entry into force of recordation of patent licensing contract | ||
CX01 | Expiry of patent term |
Granted publication date: 20150114 |
|
CX01 | Expiry of patent term |