CN202989354U - High-temperature pressure reducing diffusion furnace - Google Patents
High-temperature pressure reducing diffusion furnace Download PDFInfo
- Publication number
- CN202989354U CN202989354U CN2012205501898U CN201220550189U CN202989354U CN 202989354 U CN202989354 U CN 202989354U CN 2012205501898 U CN2012205501898 U CN 2012205501898U CN 201220550189 U CN201220550189 U CN 201220550189U CN 202989354 U CN202989354 U CN 202989354U
- Authority
- CN
- China
- Prior art keywords
- door
- stainless steel
- quartz
- silica tube
- quartzy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000009792 diffusion process Methods 0.000 title claims abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 110
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 31
- 239000010935 stainless steel Substances 0.000 claims abstract description 31
- 239000010453 quartz Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims abstract description 21
- 239000000377 silicon dioxide Substances 0.000 claims description 41
- 239000007789 gas Substances 0.000 claims description 28
- 238000007789 sealing Methods 0.000 claims description 18
- 238000010408 sweeping Methods 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 238000013022 venting Methods 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 4
- 239000000835 fiber Substances 0.000 claims description 4
- 230000007704 transition Effects 0.000 abstract description 6
- 238000013461 design Methods 0.000 abstract description 5
- 238000007664 blowing Methods 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 229920002449 FKM Polymers 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000002631 hypothermal effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000000699 topical effect Effects 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Images
Landscapes
- Furnace Details (AREA)
Abstract
The utility model relates to a high-temperature pressure reducing diffusion furnace which comprises a quartz tube. One end of the quartz tube is a quartz tube opening. A quartz door is arranged at the quartz tube opening. The other end of the quartz tube is connected with a process gas exhaust pipe. The quartz tube opening comprises a quartz tube inner end opening and a quartz tube outer end opening which share the same circle center. The quartz tube outer end opening is placed on the outer side of the quartz tube inner end opening. The radius of the quartz tube outer end opening is larger than the radius of the quartz tube inner end opening. The quartz door is arranged at the quartz tube inner end opening. The quartz tube outer end opening is provided with a stainless steel furnace door. The quartz door and the stainless steel furnace door form a transition cavity. A buffer fixing device is arranged between the quartz door and the stainless steel furnace door in the transition cavity. The stainless steel door is provided with an air blowing air inlet through which air is led into the transition cavity and an air blowing air outlet through which air is exhausted from the transition cavity. According to the high-temperature pressure reducing diffusion furnace, the transition sealed cavity is arranged, pressure difference at two ends of the quartz door and stress on the quartz door are greatly reduced, design of the quartz door is simplified, and stress damage of quartz is greatly lowered.
Description
Technical field
The utility model relates to semiconductor devices, specifically refers to the high-temperature pressure-reduction diffusion furnace.
Background technology
The high-temperature pressure-reduction diffusion furnace is compared with traditional high-temperature pressure diffusion furnace, has that output is high, technique sheet good uniformity, lattice imperfection are few, chemical and the advantages such as special gas loss significantly reduces, maintenance intervals is long.
The high-temperature pressure-reduction diffusion furnace adopts high temperature negative pressure (0.2bar left and right) technique, and the stopping property in its quartz reaction chamber seems particularly crucial, poorly sealed silica tube, quartz boat, the wafer contamination that will cause in high-temperature technology.Size maximization along with silicon chip, the diameter of the silica tube of high-temperature pressure-reduction diffusion/oxidized still is greater than φ 300mm, and in the situation that temperature can reach 1000 ℃, the sealing of the quartzy mouth of pipe also must repeatedly seal and separate before and after technique each time, and this sealing to the quartzy mouth of pipe of high-temperature pressure-reduction diffusion furnace is had higher requirement.
At present just at the sealing means of the widely used high-temperature pressure-reduction diffusion/oxidized still quartz mouth of pipe, main by lengthen silica tube with trim away from the high-temperature zone, the quartzy heat insulation of suitable length is set, to drop to the use temperature scope of viton seal ring simultaneously between fire door and high-temperature zone.Simultaneously the quartzy mouth of pipe is processed into Flange-shaped Parts, after the corrosion-and high-temp-resistant viton seal ring being installed to the dovetail-indent on quartzy door, quartzy the end face of flange with silica tube that sealing-ring is housed being adjacent to forming a sealed structure.
Be used in this structure protecting sealing-ring the Design on thermal insulation of topical hypothermia easily make quartzy mouth of pipe condensation metaphosphoric acid in the diffusion technique of liquid phosphorus source, affect processing quality.Although and this design can guarantee that reaction chamber is in sealed state the time sealing-ring be in the use temperature scope, and in moment of oven door opening, be in malleation due to the pressure in silica tube when the quartzy oven door opening and enter reaction tubes to prevent impurity, and the interior high-temperature gas (up to more than 600 ℃) of pipe this moment rushes at trim in the moment of oven door opening, easily cause the viton seal ring carbonization to be lost efficacy, very easily cause the risk of wafer contamination.In addition, the dovetail-indent difficulty of processing of quartzy fire door is large, and after finding time in reaction tubes, (0.2bar left and right) is stressed very large, easily explosion.
Summary of the invention
The technical problems to be solved in the utility model is, for the deficiencies in the prior art, provides a kind of high-temperature pressure-reduction diffusion furnace, reduces the stress damage of quartzy door, prevents the pollution of negative pressure technique.
The technical solution of the utility model is, a kind of high-temperature pressure-reduction diffusion furnace, comprise silica tube, one end of silica tube is the quartzy mouth of pipe and at the quartzy door of quartzy mouth of pipe place dress, and the other end of silica tube is connected with the process gas vapor pipe, the described quartzy mouth of pipe comprise the silica tube inner port of concentric and be placed in the silica tube inner port outside and radius greater than the silica tube external port of silica tube inner port radius; Described quartzy door is arranged on the silica tube inner port, and the silica tube external port is installed the stainless steel fire door, and described quartzy door consists of adapter cavity with the stainless steel fire door, and between the quartzy door in adapter cavity and stainless steel fire door, buffer fixer is installed; Described stainless steel door is provided with the sweeping gas inlet mouth that passes into gas in the adapter cavity and the sweeping gas venting port of emission gases in the adapter cavity.
The stainless steel fire door corresponding with the external port tube wall is provided with sealing groove, and in sealing groove, sealing-ring is installed.
Be provided with into water interface and water outlet mouthpiece outside the stainless steel fire door corresponding with sealing groove, and be provided with the water-cooling groove that is connected with water outlet mouthpiece with the interface of intaking in the stainless steel fire door.
Described sweeping gas venting port is connected to the process gas vapor pipe by vapor pipe.
Described quartzy door inside is hollow, and at the inner stuffed heat insulated fiber of quartzy door.
Fire door mechanism closes in the process that puts in place, and quartzy fire door first contacts with the silica tube inner port, and coordinates with the silica tube inner port by the preliminary tension that buffer fixer provides, to the primary seal of silica tube interruption-forming quartz to quartz; Then the silica tube external port coordinates the formation secondary seal with viton seal ring on the stainless steel fire door, and forms an adapter cavity.In technological process, the pressure-controlling of adapter cavity is (usually in the 0.25bar left and right) between silica tube internal pressure (0.2bar) and normal atmosphere, this has significantly reduced the pressure difference at quartzy door two ends and stressed, simplified the design of quartzy door, and the hard contact seal that has reduced primary seal is because of the stressed excessive damage that brings.Secondary seal is owing to adopting the viton sealed structure to guarantee the reliability of sealing, prevented that air from entering adapter cavity, and in technological process, the purging inlet mouth of high pure nitrogen by the stainless steel fire door passes into adapter cavity, keeping the steady positive pressure in the relative silica tube of adapter cavity, and make little leakage of primary seal can not pollute silicon chip.After technique finishes, vacuum pump cuts out after silica tube is found time, then passes into nitrogen by process gas inlet pipe 5, until be in barotropic state in silica tube 10, the nitrogen that purge use this moment can purge the micro-waste gas that leaks out from primary seal, has prevented its corrosion to stainless steel fire door 1.
Compared with prior art there is following advantage in the utility model owing to having adopted above technical scheme:
1, a kind of two stage sealing device that is applicable to the high-temperature pressure-reduction diffusion furnace described in the utility model, by the transition annular seal space is set, significantly reduce the stressed of the pressure difference at quartzy door two ends and quartzy door, simplified the design of quartzy door, significantly reduced quartzy stress damage.
2, a kind of two stage sealing device that is applicable to the high-temperature pressure-reduction diffusion furnace described in the utility model, secondary seal adopts the stainless steel fire door to coordinate the sealing means sealing of viton seal ring reliable, prevented the pollution problem of negative pressure technique, purge nitrogen in whole technological process and be full of adapter cavity, prevented the corrosion of stainless steel fire door.
Description of drawings
Fig. 1 is the structural representation of high-temperature pressure-reduction diffusion furnace described in the utility model;
In the drawings:
1. stainless steel fire door; 2. sweeping gas inlet mouth;
3. sweeping gas venting port; 4. viton seal ring; 5. silicon chip;
6. process gas inlet pipe; 7. buffer fixer; 8. quartzy;
9. heat insulation fiber; 10. silica tube; 11. vapor pipe;
12. process gas vapor pipe; 13. dry filtrating equipment; 14. vacuum pump;
15. adapter cavity; 16. water inlet interface; 17. water outlet mouthpiece;
18. sealing groove; 19. water-cooling groove; 20. quartzy mouth of pipe inner port;
21. quartzy mouth of pipe external port.
Embodiment
As shown in Figure 1, a kind of high-temperature pressure-reduction diffusion furnace, comprise silica tube 10, one end of silica tube 10 is the quartzy mouth of pipe and quartzy door 8 is installed at quartzy mouth of pipe place, and the other end of silica tube 10 is connected with process gas vapor pipe 12, the quartzy mouth of pipe comprise the silica tube inner port 20 of concentric and be placed in silica tube inner port 20 outsides and radius greater than the silica tube external port 21 of silica tube inner port 20 radiuses; Described quartzy door 8 is arranged on silica tube inner port 20, and silica tube external port 21 is installed stainless steel fire door 1, described quartzy door 8 consists of adapter cavity 15 with stainless steel fire door 1, and between the quartzy door 8 in adapter cavity 15 and stainless steel fire door 1, buffer fixer 7 is installed; Described stainless steel door 1 is provided with the sweeping gas inlet mouth 2 that passes into gas in the adapter cavity 15 and from the sweeping gas venting port 3 of adapter cavity 15 interior emission gases.
The stainless steel fire door 1 corresponding with the external port tube wall is provided with sealing groove 18, and at the interior installation viton seal ring 4 of sealing groove 18.
Corresponding with sealing groove 18 stainless steel fire door 1 outside is provided with into water interface 16 and water outlet mouthpiece 17, and is provided with in stainless steel fire door 1 with the interface 16 of intaking and is connected the water-cooling groove 19 that is connected with water outlet mouthpiece.
Sweeping gas venting port 3 is connected to process gas vapor pipe 12 by vapor pipe 11.
Claims (5)
1. high-temperature pressure-reduction diffusion furnace, comprise silica tube (10), one end of silica tube (10) is the quartzy mouth of pipe and at the quartzy mouth of pipe place quartzy door of dress (8), and the other end of silica tube (10) is connected with process gas vapor pipe (12), it is characterized in that, the described quartzy mouth of pipe comprise the silica tube inner port (20) of concentric and be placed in silica tube inner port (20) outside and radius greater than the silica tube external port (21) of silica tube inner port (20) radius; Described quartzy door (8) is arranged on silica tube inner port (20), and silica tube external port (21) is installed stainless steel fire door (1), described quartzy door (8) consists of adapter cavity (15) with stainless steel fire door (1), and between the quartzy door (8) in adapter cavity (15) and stainless steel fire door (1), buffer fixer (7) is installed; Described stainless steel door (1) is provided with the sweeping gas inlet mouth (2) that passes into gas in the adapter cavity (15) and from the sweeping gas venting port (3) of the interior emission gases of adapter cavity (15).
2. high-temperature pressure-reduction diffusion furnace according to claim 1, is characterized in that, the stainless steel fire door (1) corresponding with the external port tube wall is provided with sealing groove (18), and in sealing groove (18), sealing-ring (4) is installed.
3. high-temperature pressure-reduction diffusion furnace according to claim 1, it is characterized in that, the stainless steel fire door (1) corresponding with sealing groove (18) outside is provided with into water interface (16) and water outlet mouthpiece (17), and be provided with in stainless steel fire door (1) with the interface of intaking (16) be connected 17 with water outlet mouthpiece) water-cooling groove (19) that is connected.
4. high-temperature pressure-reduction diffusion furnace according to claim 1, is characterized in that, described sweeping gas venting port (3) is connected to process gas vapor pipe (12) by vapor pipe (11).
5. high-temperature pressure-reduction diffusion furnace according to claim 1, is characterized in that, described quartzy door (8) inside be hollow, and at quartz (a 8) inner stuffed heat insulated fiber (9).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2012205501898U CN202989354U (en) | 2012-10-25 | 2012-10-25 | High-temperature pressure reducing diffusion furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2012205501898U CN202989354U (en) | 2012-10-25 | 2012-10-25 | High-temperature pressure reducing diffusion furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
CN202989354U true CN202989354U (en) | 2013-06-12 |
Family
ID=48560550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2012205501898U Expired - Fee Related CN202989354U (en) | 2012-10-25 | 2012-10-25 | High-temperature pressure reducing diffusion furnace |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN202989354U (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105483831A (en) * | 2015-12-04 | 2016-04-13 | 湖南红太阳光电科技有限公司 | Two-grade sealing apparatus used for reduced pressure diffusion systems |
CN105543976A (en) * | 2015-12-14 | 2016-05-04 | 中国电子科技集团公司第四十八研究所 | Cooling and sealing device for mouth of decompression and diffusion furnace |
CN107090594A (en) * | 2017-04-20 | 2017-08-25 | 通威太阳能(合肥)有限公司 | Sealing device for furnace mouth of pressure reduction diffusion furnace |
CN107201549A (en) * | 2017-04-14 | 2017-09-26 | 中国电子科技集团公司第四十八研究所 | A kind of diffusion furnace for lifting fire door silicon chip sheet resistance uniformity |
CN109423697A (en) * | 2017-08-25 | 2019-03-05 | 中国电子科技集团公司第四十八研究所 | A kind of stove gate device and low pressure diffusion furnace for low pressure diffusion furnace |
CN110528084A (en) * | 2018-12-03 | 2019-12-03 | 北京北方华创微电子装备有限公司 | The sealing system and encapsulating method of low pressure diffusion furnace |
CN111486712A (en) * | 2020-06-01 | 2020-08-04 | 青岛赛瑞达电子装备股份有限公司 | Quartz double-furnace door structure |
CN112210831A (en) * | 2020-09-14 | 2021-01-12 | 阳忠海 | Diffusion furnace for manufacturing photovoltaic cell |
-
2012
- 2012-10-25 CN CN2012205501898U patent/CN202989354U/en not_active Expired - Fee Related
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105483831A (en) * | 2015-12-04 | 2016-04-13 | 湖南红太阳光电科技有限公司 | Two-grade sealing apparatus used for reduced pressure diffusion systems |
CN105483831B (en) * | 2015-12-04 | 2017-12-12 | 湖南红太阳光电科技有限公司 | For depressurizing the two stage sealing device of diffusion system |
CN105543976A (en) * | 2015-12-14 | 2016-05-04 | 中国电子科技集团公司第四十八研究所 | Cooling and sealing device for mouth of decompression and diffusion furnace |
CN105543976B (en) * | 2015-12-14 | 2018-07-24 | 中国电子科技集团公司第四十八研究所 | A kind of decompression diffusion furnace fire door cooling sealing device |
CN107201549A (en) * | 2017-04-14 | 2017-09-26 | 中国电子科技集团公司第四十八研究所 | A kind of diffusion furnace for lifting fire door silicon chip sheet resistance uniformity |
CN107090594A (en) * | 2017-04-20 | 2017-08-25 | 通威太阳能(合肥)有限公司 | Sealing device for furnace mouth of pressure reduction diffusion furnace |
CN109423697A (en) * | 2017-08-25 | 2019-03-05 | 中国电子科技集团公司第四十八研究所 | A kind of stove gate device and low pressure diffusion furnace for low pressure diffusion furnace |
CN109423697B (en) * | 2017-08-25 | 2021-02-23 | 中国电子科技集团公司第四十八研究所 | A furnace door device for low pressure diffusion furnace and low pressure diffusion furnace |
CN110528084A (en) * | 2018-12-03 | 2019-12-03 | 北京北方华创微电子装备有限公司 | The sealing system and encapsulating method of low pressure diffusion furnace |
CN111486712A (en) * | 2020-06-01 | 2020-08-04 | 青岛赛瑞达电子装备股份有限公司 | Quartz double-furnace door structure |
CN112210831A (en) * | 2020-09-14 | 2021-01-12 | 阳忠海 | Diffusion furnace for manufacturing photovoltaic cell |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN202989354U (en) | High-temperature pressure reducing diffusion furnace | |
CN109338333B (en) | Tubular LPCVD vacuum reaction chamber | |
TWI710658B (en) | Manufacturing chamber and heat treatment furnace for SiC high temperature oxidation process | |
CN204039548U (en) | A kind of decompression diffusion furnace furnace mouth seal device | |
CN211595791U (en) | LPCVD double-layer furnace tube structure | |
CN114427685A (en) | An oxygen supplementary flange and a liquid-cooled semiconductor exhaust gas removal combustion cylinder | |
CN203855684U (en) | Reduced pressure diffusion furnace | |
CN112382553A (en) | Double-layer reaction cavity structure | |
WO2022160547A1 (en) | Reaction chamber of silicon carbide epitaxial furnace | |
WO2020078147A1 (en) | Chamber sealing assembly and growth furnace | |
CN105349755A (en) | Sealing and waste gas treatment device used for reaction tube of hydrogen annealing furnace | |
CN213845292U (en) | Double-layer reaction cavity structure | |
CN105483831A (en) | Two-grade sealing apparatus used for reduced pressure diffusion systems | |
CN209819883U (en) | High-purity nitrogen heater for wafer drying process | |
WO2019233063A1 (en) | Oxidizing furnace | |
CN217636703U (en) | Diffusion equipment | |
CN203687639U (en) | Gas inlet device | |
CN215163103U (en) | Reaction chamber and furnace tube equipment | |
CN110527987A (en) | Reaction chamber | |
CN210110718U (en) | Be applied to semiconductor exhaust-gas treatment equipment's waste gas reaction cavity | |
RU2824074C1 (en) | Silicon carbide epitaxial reactor combustion chamber | |
CN220491865U (en) | Processing equipment with rod structure | |
CN220116727U (en) | Quartz tube heat insulation structure | |
CN220202036U (en) | Silicon wafer deposition furnace | |
CN221797741U (en) | A sealing structure of epitaxial quartz bell jar |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130612 Termination date: 20211025 |