CN202824004U - Base plate cleaning device - Google Patents
Base plate cleaning device Download PDFInfo
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- CN202824004U CN202824004U CN 201220520997 CN201220520997U CN202824004U CN 202824004 U CN202824004 U CN 202824004U CN 201220520997 CN201220520997 CN 201220520997 CN 201220520997 U CN201220520997 U CN 201220520997U CN 202824004 U CN202824004 U CN 202824004U
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- baffle
- cleaning
- sealing cover
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Abstract
The utility model provides a base plate cleaning device which comprises a cleaning box which is used for providing an operating space for cleaning technology of the surface of a base plate. The cleaning box comprises a baffle, a cleaning brush, a transmission shaft and a prevention mechanism, the baffle is used for separating the operation space from the outside, and a via hole is formed in the baffle. The cleaning brush is used for being contacted with the surface of the base plate and rotating to clean the surface of the base plate, and arranged inside the cleaning box. The transmission shaft is used driving the cleaning brush to rotate, one end of the transmission shaft stretches out of the cleaning box by the via hole, and the other end of the transmission shaft is connected with the cleaning brush inside the cleaning box. The prevention mechanism is used for preventing liquid inside the cleaning box from flowing out of the via hole of the baffle and arranged on the position of the via hole of the baffle. The prevention mechanism is arranged on the position of the via hole of the baffle of a cleaning groove so as to prevent liquid on the surface of glass from flowing out of the cleaning groove along the transmission shaft from the position of the via hole of the cleaning groove, ensure that the connecting portion of the transmission shaft and the motor works in dry environment, ensure operation stability of equipment, and prolong service life of equipment.
Description
Technical Field
The utility model relates to a substrate cleaning device belongs to and shows technical field.
Background
In the manufacturing process of liquid crystal panels and the production process in the semiconductor field, a cleaning process is one of the processes that must be used. White Glass (barrel Glass) is sealed from the package and then subjected to an Initial cleaning, referred to as Initial Clean, to ensure its surface cleanliness during substrate fabrication.
As shown in fig. 1, in the manufacturing process of a TFT-LCD (Thin Film Transistor Liquid Crystal Display) array glass substrate, when glass is primarily cleaned, the glass enters a cleaning box 100 from a glass inlet a along a certain conveying direction under the action of a conveying mechanism of a substrate cleaning device, and after a glass cleaning process is performed in the cleaning box 100, the glass comes out from a glass outlet N. The cleaning box 100 includes a first buffer zone B, a second buffer zone C, a first spraying zone D, a first cleaning agent zone E, a second cleaning agent zone F, a second spraying zone G, a third spraying zone H, a fourth spraying zone I, a fifth spraying zone J, a sixth spraying zone K, an air knife zone L, a third buffer zone M, and the like, which are sequentially arranged along the glass conveying direction. In each cleaning agent section, the glass is cleaned by brushing the surface of the glass with a rotary cleaning brush provided in the cleaning tank 100.
As shown in fig. 2, the brush 200 in the cleaning tank 100 of the substrate cleaning apparatus is rotated by a driving shaft 400, a motor 500, and the like, wherein one end of the driving shaft 400 is connected to the brush 200 inside the cleaning tank 100, and the other end thereof is connected to the motor 500 outside the cleaning tank 100 by a bolt, a screw, and the like through a through hole 102 in the shutter 101 of the cleaning tank 100. The connection point between the transmission shaft 400 and the motor 500 is located in the drying zone Z outside the cleaning tank 100, and the environment of the drying zone Z is required to be as dry as possible.
However, most cleaning processes (including wet etching and wet stripping) involved in the TFT (Thin Film Transistor) industry require inclined (inclined at an angle of about 15 °) glass. In the manufacturing process of the TFT-LCD array glass substrate, the glass is required to be conveyed obliquely when being primarily cleaned, and the transmission shaft 400 of the cleaning brush 200 is also arranged obliquely at a certain angle. Thus, during the glass conveyance, a large amount of liquid flows down in the oblique direction of the glass. Since no sealing assembly is arranged in the gap between the transmission shaft 400 and the through hole 102 in the baffle 101 of the cleaning box 100 in the conventional substrate cleaning device, the liquid flows out from the through hole 102 in the baffle 101 to the drying section outside the cleaning box 100 along the transmission shaft 400 of the cleaning brush 200; meanwhile, when the liquid is sprayed on the surface of the glass 300, part of the liquid is not sprayed to the gap between the through hole 102 of the baffle plate 101 and the transmission shaft 400; this causes metal parts such as the transmission shaft 400 and the motor 500 to operate in an environment with high humidity for a long time, and if the metal parts are serious, the stability of the motor 500 is affected, and the motor 500 is damaged.
SUMMERY OF THE UTILITY MODEL
In order to solve above-mentioned prior art in the base plate manufacturing process, have liquid and permeate out from base plate belt cleaning device's washing case, and lead to transmission shaft and driving motor to be connected the problem that the position moved in the very big environment of humidity, the utility model provides a base plate belt cleaning device can prevent that liquid from washing case seepage to the outside dry interval of washing case.
The utility model provides a technical scheme does:
a substrate cleaning apparatus, comprising:
the cleaning box is used for providing an operation space for a substrate surface cleaning process, and comprises a baffle plate for separating the operation space from the outside, and a through hole is formed in the baffle plate;
a cleaning brush for cleaning the surface of the substrate by contacting and rotating the surface of the substrate, the cleaning brush being provided inside the cleaning tank;
one end of the transmission shaft is used for driving the cleaning brush to rotate and extends out of the baffle plate through the through hole, and the other end of the transmission shaft is connected with the cleaning brush in the cleaning box;
and the stopping mechanism is used for stopping the liquid in the cleaning box from flowing out of the through hole on the baffle plate and is arranged at the through hole of the baffle plate.
Furthermore, the stopping mechanism comprises an inner sleeve for stopping liquid from flowing to the through hole along the transmission shaft, and the inner sleeve is sleeved on the transmission shaft and is positioned between the cleaning brush and the baffle.
Furthermore, the inner sleeve comprises an annular gasket sleeved on the transmission shaft, and the outer diameter of the gasket is larger than the inner diameter of the through hole in the baffle.
Furthermore, the stopping mechanism further comprises an annular shaft sleeve which is sleeved on the transmission shaft and fixedly connected with an annular gasket into a whole, wherein the gasket is positioned at one end close to the via hole.
Further, the preventing mechanism further comprises a shielding sealing cover for shielding a gap between the transmission shaft and the baffle plate so as to prevent the liquid from flowing out of the gap.
Furthermore, the shielding sealing cover is of a cover-shaped structure and is provided with a first end in an opening shape and a second end with a through hole in the center, the opening area of the first end is larger than that of the through hole of the second end, and a containing cavity is formed between the first end and the second end;
wherein,
the edge of the opening of the first end is fixedly or detachably connected with the baffle, the diameter of the inner edge of the through hole of the second end is larger than the outer diameter of the transmission shaft, and the transmission shaft penetrates through the through hole of the second end;
or,
the opening of the first end of the shielding sealing cover faces the baffle, the edge of the opening of the first end surrounds the periphery of the through hole of the baffle, the edge of the opening of the first end is separated from the baffle, and the inner edge of the through hole of the second end is fixedly or detachably connected with the transmission shaft;
or,
the opening of the first end of the shielding sealing cover faces the cleaning brush, the transmission shaft penetrates through the through hole of the second end of the shielding sealing cover, and the inner edge of the through hole of the second end is fixedly or detachably connected with the baffle or the transmission shaft.
Furthermore, the wall of the accommodating cavity of the shielding sealing cover is provided with at least one drainage port, and the horizontal position of the drainage port is lower than the via hole of the baffle.
Further, the preventing mechanism comprises a fan device for generating air flow blowing towards the inside of the cleaning tank at the through hole of the baffle plate so as to prevent liquid from flowing out of the through hole of the baffle plate.
Furthermore, the fan device is arranged at the through hole and is fixed on the baffle or the transmission shaft.
Further, the fan apparatus includes: the fan impellers are driven by the transmission shaft to rotate, and are evenly distributed on the transmission shaft along the circumferential direction of the transmission shaft.
Furthermore, the substrate cleaning device further comprises a motor for driving the transmission shaft to rotate, and the motor is connected with one end of the transmission shaft extending out of the via hole.
The utility model has the advantages that:
the utility model discloses a base plate cleaning device is provided with a prevention mechanism in the via hole department of the baffle of wasing the case, and the liquid that prevents to wash the incasement flows outside the washing case from the via hole department of baffle to guaranteed that transmission shaft and motor connection position move in being in dry environment, guaranteed equipment operating stability, improve equipment life-span.
Drawings
FIG. 1 is a schematic view of a substrate cleaning apparatus according to the prior art;
FIG. 2 is a schematic view showing an internal structure of a substrate cleaning apparatus according to the prior art;
FIG. 3 is a schematic structural view of a first embodiment of the substrate cleaning apparatus according to the present invention;
FIG. 4 is a schematic structural view of a substrate cleaning apparatus according to a second embodiment of the present invention;
fig. 5 is a schematic structural view of a stopper mechanism in a second embodiment of the substrate cleaning apparatus according to the present invention;
FIG. 6 is a schematic structural view showing a sixth embodiment of the substrate cleaning apparatus according to the present invention;
fig. 7 is a schematic structural view showing a tenth embodiment of the substrate cleaning apparatus of the present invention;
fig. 8 is a schematic structural view showing an eleventh embodiment of a substrate cleaning apparatus according to the present invention;
fig. 9 is a schematic configuration diagram of a substrate cleaning apparatus according to a twelfth embodiment of the present invention.
Detailed Description
The principles and features of the present invention are described below in conjunction with the following drawings, the examples given are only intended to illustrate the present invention and are not intended to limit the scope of the present invention.
In the manufacturing process of the TFT-LCD array substrate, the substrate cleaning device for primarily cleaning glass mainly comprises a cleaning box 100, wherein an operation space is arranged inside the cleaning box 100, and primary cleaning operation of the substrate (glass) can be performed in the operation space. As shown in fig. 1, a conveying mechanism (not shown) for conveying the glass 300 is disposed inside the cleaning box 100, and the cleaning box 100 is sequentially divided into a first buffer zone B, a second buffer zone C, a first spraying zone D, a first cleaning agent zone E, a second cleaning agent zone F, a second spraying zone G, a third spraying zone H, a fourth spraying zone I, a fifth spraying zone J, a sixth spraying zone K, an air knife zone L, a third buffer zone M, and other process zones along the glass conveying direction (indicated by arrows in the figure is the glass conveying direction) according to the glass cleaning process requirements. Of course, the above process intervals may also be adjusted as needed, such as more/less spraying intervals, more/less buffer intervals, and the like.
As shown in fig. 2, in each cleaning agent compartment of the cleaning tank 100, a brush 200 is provided, the brush 200 is rotatable on the surface of the glass 300 while being in contact with the surface of the glass 300, and a spray device (not shown) for spraying a liquid onto the surface of the glass 300 is further provided above the surface of the glass 300, so that the brush 200 is rotated to clean the surface of the glass 300.
As shown in fig. 2, the brush 200 is rotated by driving a driving shaft 400 and a motor 500, wherein the motor 500 is provided outside the cleaning tank 100, one end of the driving shaft 400 is connected to the motor 500 outside the cleaning tank 100, and the other end is connected to the brush 200 inside the cleaning tank 100 through a through hole 102 in the baffle 101 of the cleaning tank 100. Since the glass 300 is transferred at an angle during the preliminary cleaning, as shown in fig. 2, the washing brush 200 for washing the surface of the glass 300 is also disposed at an angle.
In the prior art, the liquid on the surface of the glass 300 of the substrate cleaning device flows along the transmission shaft 400 of the washing brush 200 to the outside of the washing tank 100 through the through hole 102 on the baffle 101 of the washing tank 100, and meanwhile, part of the liquid is splashed to the through hole 102 in the process of cleaning the glass 300, so that the connection part of the transmission shaft 400 and the motor 500 moves in a humid environment, and the stability of the device is affected.
As shown in fig. 3 to 9, the utility model provides a substrate cleaning device is provided with prevention mechanism in via hole 102 department on the baffle 101 of wasing case 100 to the inside liquid of prevention washing case 100 flows out to washing case 100 outside from via hole 102 on the baffle 101, has guaranteed the dry environment at the position of being connected of transmission shaft 400 and motor 500, has guaranteed equipment operating stability, improve equipment life-span.
As shown in fig. 3, in the first embodiment of the present invention, the stopping mechanism includes an inner sleeve 602 disposed on the transmission shaft 400, and the inner sleeve 602 is located between the washing brush 200 and the baffle 101. The inner sleeve 602 is sleeved on the transmission shaft 400 to change the flowing direction of the liquid. When the liquid on the surface of the glass 300 flows downwards along the transmission shaft 400 due to the gravity, the liquid is blocked by the inner sleeve 602, does not flow downwards along the transmission shaft 400 any more, and directly drops into the cleaning box 100, so that the liquid flowing downwards from the surface of the glass 300 is prevented from entering the through hole 102 of the baffle 101.
As shown in fig. 3, the inner housing 602 may include at least one annular spacer 6021 covering the transmission shaft 400 and having a diameter greater than or equal to the inner diameter of the through hole 102 of the baffle 101, and the distance between the spacer 6021 and the baffle 101 is preferably approximately 2-3 mm.
As shown in fig. 3, the inner housing 602 may further include an annular bushing 6022 sleeved on the transmission shaft 400, the bushing 6022 may be fixedly connected to the annular gasket 6021, and the gasket 6021 is located at one end of the through hole 102 near the baffle plate 101. Of course, in practical applications, the inner sleeve 602 is not limited to the form including the spacer 6021 and the sleeve 6022, and may also take other forms, which are not listed here.
Furthermore, in the second embodiment of the present invention, in order to prevent the liquid from flowing out from the space between the transmission shaft 400 and the baffle 101 through the hole 102 and flowing to the connection portion between the transmission shaft 400 and the motor 500, as shown in fig. 4 and 5, on the basis of the first embodiment of the present invention, the preventing mechanism further comprises a shielding sealing cover 601 for shielding the space between the transmission shaft 400 and the baffle 101 to prevent the liquid from flowing out. Preferably, as shown in fig. 4 and 5, the shielding sealing cover 601 is a cover-shaped structure, and has a first end with an opening shape and a second end with a through hole 6012 in the center, the opening area of the first end is larger than the area of the through hole 6012 of the second end, and a cavity is formed between the first end and the second end; wherein,
the opening of the first end of the shielding sealing cover 601 faces the baffle 101, and the edge of the opening surrounds the periphery of the through hole 102 of the baffle 101 and is connected with the baffle 101; the diameter of the inner edge of a through hole 6012 at the second end of the shielding sealing cover 601 is larger than the outer diameter of the transmission shaft 400, and the transmission shaft 400 penetrates through the through hole 6012; the inner sleeve 602 is arranged in the containing cavity; and the maximum outer diameter of the annular gasket 6021 of the inner sleeve 602 is smaller than the inner diameter of the cavity of the shielding sealing cover 601 and larger than the inner diameter of the through hole 6012 at the second end of the shielding sealing cover 601.
According to the shielding sealing cover 601 with the structure, the opening edge of the first end of the shielding sealing cover 601 surrounds the through hole 102 of the baffle 101 and is connected with the baffle 101, and the diameter of the through hole 6012 of the second end is smaller than the outer diameter of the inner sleeve 602, so that the shielding sealing cover 601 can be covered outside the inner sleeve 602 and is buckled at the through hole 102 of the baffle 101, and liquid is well prevented from entering the through hole 102 from a gap between the inner sleeve 602 and the baffle 101.
Furthermore, in the second embodiment provided by the present invention, preferably, the edge of the opening blocking the first end of the sealing cover 601 and the baffle 101 can be connected in a detachable manner, for example, an external thread is disposed on the edge of the opening blocking the first end of the sealing cover 601, an internal thread is correspondingly disposed around the via hole 102 of the baffle 101, the sealing cover 601 is blocked by the external thread and the internal thread, and the detachable connection is disposed on the baffle 101, so as to facilitate the detachment and maintenance. It is understood that, in practical applications, the baffle 101 and the shielding sealing cover 601 may be directly fixed by welding or the like.
It should be understood that in practical applications, the shielding sealing cover 601 may also adopt other structural forms, such as: the shielding sealing cover 601 is a cylindrical structure arranged around the periphery of the inner sleeve 602, one end of the cylindrical structure is fixedly connected with the baffle 101, and the diameter of the other end of the cylindrical structure is equal to that of the inner sleeve 602.
Furthermore, in the second embodiment provided by the present invention, the liquid on the surface of the glass 300 flows downwards along the transmission shaft 400, and a part of the liquid flows into the cavity of the shielding sealing cover 601 through the through hole 6012 at the second end of the shielding sealing cover 601, and the part of the liquid is prevented by the inner sleeve 602 and directly drops below the cavity of the shielding sealing cover 601 when flowing downwards along the transmission shaft 400, in order to prevent the liquid in the cavity of the shielding sealing cover 601 from accumulating too much and overflowing from the via hole 102 of the baffle 101, preferably, at least one drainage hole 6011 is further provided on the cavity wall of the shielding sealing cover 601, and the horizontal position of the drainage hole 6011 is lower than the horizontal position of the via hole 102 of the baffle 101. Due to the arrangement of the drainage port 6011, the liquid in the shielding sealing cover 601 can directly flow back to the cleaning tank 100.
Furthermore, in the second embodiment of the present invention, preferably, as shown in fig. 4 and fig. 5, the annular shaft sleeve 6022 of the inner sleeve 602 can be disposed in the through hole 6012 at the second end of the shielding sealing cover 601, so that on one hand, the annular shaft sleeve 6022 further prevents the liquid from entering the cavity of the shielding sealing cover 601, and on the other hand, the diameter of the annular gasket 6021 is larger than the outer diameter of the annular shaft sleeve 6022, which can play a role of changing the flow direction of the liquid, so as to prevent the liquid from flowing along the transmission shaft 400 and falling into the lower part of the cavity of the shielding sealing cover 601, and the annular gasket 6021 further plays a role of labyrinth seal because the diameter is larger than the diameter of the through hole 6012 at the second end of the shielding sealing cover 601, and further seals the through hole 6012 at the second end of.
Furthermore, in the third embodiment of the present invention, compared to the second embodiment, the shielding sealing cover 601 can also be assembled on the substrate cleaning apparatus in the following manner:
the opening of the first end of the shielding sealing cover 601 faces the baffle 101, the edge of the opening of the first end surrounds the periphery of the through hole 102 of the baffle 101, the edge of the opening of the first end is away from the baffle 101, and the inner edge of the through hole 6012 of the second end is fixedly or detachably connected with the transmission shaft 400, that is, compared with the second embodiment, the opening of the first end of the shielding sealing cover 601 is separated from the baffle 101, so that the shielding sealing cover 602 can rotate along with the transmission shaft 400.
Furthermore, in the fourth embodiment of the present invention, compared to the second embodiment, the shielding sealing cover 601 can also be assembled on the substrate cleaning apparatus in the following manner:
the opening of the first end of the shielding sealing cover 601 faces the cleaning brush 200, the transmission shaft 400 is inserted into the through hole 6012 of the second end, and the inner edge of the through hole 6012 of the second end is connected with the baffle plate 101 in a fixed connection manner or a detachable manner. That is, compared to the second embodiment, the first end and the second end of the shielding sealing cap 601 are reversed, and the shielding sealing cap 601 can rotate with the transmission shaft 400.
Furthermore, in the fifth embodiment of the present invention, compared to the fourth embodiment, the shielding sealing cover 601 can also be assembled on the substrate cleaning apparatus in the following manner:
the opening of the first end of the shielding sealing cover 601 faces the cleaning brush 200, the transmission shaft 400 is inserted into the through hole 6012 of the second end, and the inner edge of the through hole 6012 of the second end is connected with the transmission shaft 400 in a fixed connection manner or a detachable manner. That is, compared to the second embodiment, the first end and the second end of the shielding sealing cover 601 are reversed, and the second end of the shielding sealing cover 601 is fixed to the barrier 101.
In addition, in the sixth embodiment of the present invention, as shown in fig. 6, the blocking mechanism can be only buckled at the position of the through hole 102 of the baffle 101, and the blocking sealing cover 601 sleeved on the transmission shaft 400 is disposed inside the cleaning tank 100 and at least partially blocks the through hole 102 of the baffle 101 to prevent the liquid in the cleaning tank 100 from splashing to the through hole 102 of the baffle 101.
In the sixth embodiment of the present invention, preferably, as shown in fig. 6, the shielding sealing cover 601 has a cover-shaped structure, having a first end with an opening and a second end with a central through hole 6012, and a cavity therein. The opening of the first end of the shielding sealing cover 601 faces the baffle 101, and the edge of the opening surrounds the periphery of the through hole 102 of the baffle 101 and is combined with the baffle 101, so that the shielding sealing cover 601 is buckled at the through hole 102 of the baffle 101; the transmission shaft 400 is inserted into the through hole 6012 covering the second end of the sealing cover 601. By buckling a shielding sealing cover 601 with a containing cavity at the through hole 102 of the baffle 101 of the cleaning tank 100, when liquid on the surface of the glass 300 flows downwards along the transmission shaft 400, the shielding sealing cover 601 plays a role of preventing the liquid from flowing to the through hole 102 of the baffle 101; meanwhile, the shielding sealing cover 601 is buckled around the through hole 102 of the baffle plate 101 to prevent liquid from splashing to the through hole 102.
In the sixth embodiment of the present invention, preferably, the edge of the opening of the first end of the shielding cover 601 is connected to the baffle 101 in a detachable manner, for example, an external thread is provided on the edge of the opening of the first end of the shielding cover 601, an internal thread is correspondingly provided around the via hole 102 of the baffle 101, the shielding cover 601 is matched with the internal thread through the external thread, and the detachable connection is provided on the baffle 101, which facilitates the detachment and maintenance. It is understood that, in practical applications, the baffle 101 and the shielding sealing cover 601 may be directly fixed by welding or the like.
In addition, in this embodiment, as shown in fig. 3, preferably, at least one drainage port 6011 is opened on the wall of the containing cavity of the shielding sealing cover 601, and the horizontal position of the drainage port 6011 is lower than the horizontal position of the through hole 102, so as to allow the liquid entering the containing cavity of the shielding sealing cover 601 to flow back to the inside of the cleaning box 100. Thus, even if some liquid flows along the transmission shaft 400, the liquid enters the shielding sealing cover 601 through the through hole 6012 at the second end of the shielding sealing cover 601, since the opening edge of the first end of the shielding sealing cover 601 is arranged around the through hole 102 on the baffle 101, a liquid collecting cavity is formed between the lower part of the through hole 102 and the shielding sealing cover 601, and the liquid in the liquid collecting cavity flows back to the inside of the cleaning box 100 through the drainage hole 6011.
Similarly, in the seventh embodiment of the present invention, compared to the sixth embodiment, the shielding sealing cover 601 can also be assembled on the substrate cleaning apparatus in the following manner:
the opening of the first end of the shielding sealing cover 601 faces the baffle plate 101, the edge of the opening of the first end surrounds the periphery of the through hole 102 of the baffle plate 101, the edge of the opening of the first end is separated from the baffle plate 101, and the inner edge of the through hole 6012 of the second end is fixedly or detachably connected with the transmission shaft 400. That is, the first end opening of the shield sealing cover 601 is separated from the barrier 101 so that the shield sealing cover 602 can rotate with the driving shaft 400, compared to the sixth embodiment.
Furthermore, in the eighth embodiment of the present invention, compared to the sixth embodiment, the shielding sealing cover 601 can also be assembled on the substrate cleaning apparatus in the following manner:
the opening of the first end of the shielding sealing cover 601 faces the cleaning brush 200, the transmission shaft 400 is inserted into the through hole 6012 of the second end, and the inner edge of the through hole 6012 of the second end is connected with the baffle plate 101 in a fixed connection manner or a detachable manner. That is, compared to the sixth embodiment, the first end and the second end of the shielding sealing cover 601 are reversed, and the shielding sealing cover 601 can rotate with the transmission shaft 400.
Furthermore, in the ninth embodiment, compared to the sixth embodiment, the shielding sealing cover 601 can also be assembled on the substrate cleaning apparatus in the following manner:
the opening of the first end of the shielding sealing cover 601 faces the cleaning brush 200, the transmission shaft 400 is inserted into the through hole 6012 of the second end, and the inner edge of the through hole 6012 of the second end is connected with the transmission shaft 400 in a fixed connection manner or a detachable manner. That is, compared to the sixth embodiment, the first end and the second end of the shield sealing cover 601 are reversed, and the second end of the shield sealing cover 601 is fixed to the barrier 101.
Furthermore, in the tenth embodiment of the present invention, as shown in fig. 7, on the basis of the first embodiment of the present invention, the stopping mechanism may further include a fan device 603, the fan device 603 is disposed at the via hole 102 of the baffle 101, is located outside the cleaning tank 100, and may be fixed on the baffle 101 or on the transmission shaft 400, and is used for generating an airflow blowing toward the inside of the cleaning tank 100 at the via hole 102 of the baffle 101 to stop the liquid from flowing out from the via hole 102 of the baffle 101.
In the tenth embodiment provided by the present invention, preferably, the fan device 603 includes a plurality of fan impellers driven by the transmission shaft 400 to rotate, a bearing is disposed on the transmission shaft 400 near the position of the through hole 102 of the baffle 101, and the plurality of fan impellers are directly inserted into the bearing of the transmission shaft 400 and fixed by bolts; and a plurality of fan impellers are uniformly distributed along the circumferential direction of the transmission shaft 400, preferably, a fan impeller with light weight and good uniformity is selected, and the wind power of the fan impeller is as large as possible, so that a better liquid leakage prevention effect is obtained.
Furthermore, in the eleventh embodiment of the present invention, as shown in fig. 8, on the basis of the second embodiment of the present invention, the stopping mechanism may further include a fan device 603, the fan device 603 is disposed at the via hole 102 of the baffle 101, is located outside the cleaning box 100, and may be fixed on the baffle 101 or on the transmission shaft 400, and is used for generating an airflow blowing toward the inside of the cleaning box 100 at the via hole 102 of the baffle 101 to stop the liquid from flowing out from the via hole 102 of the baffle 101.
In the eleventh embodiment provided by the present invention, preferably, the fan device 603 includes a plurality of fan impellers driven by the transmission shaft 400 to rotate, a bearing is disposed on the transmission shaft 400 near the position of the through hole 102 of the baffle 101, and the plurality of fan impellers are directly inserted into the bearing of the transmission shaft 400 and fixed by bolts; and a plurality of fan impellers are uniformly distributed along the circumferential direction of the transmission shaft 400, preferably, a fan impeller with light weight and good uniformity is selected, and the wind power of the fan impeller is as large as possible, so that a better liquid leakage prevention effect is obtained.
Furthermore, in the twelfth embodiment of the present invention, as shown in fig. 9, on the basis of the sixth embodiment of the present invention, the stopping mechanism may further include a fan device 603, the fan device 603 is disposed at the via hole 102 of the baffle 101, is located outside the cleaning box 100, and may be fixed on the baffle 101 or on the transmission shaft 400, and is used for generating an airflow blowing toward the inside of the cleaning box 100 at the via hole 102 of the baffle 101 to stop the liquid from flowing out from the via hole 102 of the baffle 101.
In the twelfth embodiment provided by the present invention, preferably, the fan device 603 includes a plurality of fan impellers driven by the transmission shaft 400 to rotate, a bearing is disposed on the transmission shaft 400 near the position of the through hole 102 of the baffle 101, and the plurality of fan impellers are directly inserted into the bearing of the transmission shaft 400 and fixed by bolts; and a plurality of fan impellers are uniformly distributed along the circumferential direction of the transmission shaft 400, preferably, a fan impeller with light weight and good uniformity is selected, and the wind power of the fan impeller is as large as possible, so that a better liquid leakage prevention effect is obtained.
It should be understood that in other embodiments of the present invention, a fan device 603 as in the eleventh, twelfth and thirteenth embodiments may also be provided on the basis of the third, fourth, fifth, seventh, eighth or ninth embodiments provided by the present invention; moreover, the substrate cleaning apparatus provided in the above embodiments of the present invention may further include a motor 500 for providing a rotational power to the transmission shaft; the embodiments are not listed here, and those skilled in the art can make corresponding modifications on the basis of the embodiments provided by the present invention.
The foregoing is a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Claims (11)
1. A substrate cleaning apparatus, comprising:
the cleaning box is used for providing an operation space for cleaning the surface of the substrate, and comprises a baffle plate for separating the operation space from the outside, and a through hole is formed in the baffle plate;
a cleaning brush which is positioned inside the cleaning box, contacts with the surface of the substrate and rotates to clean the surface of the substrate;
the transmission shaft is used for driving the cleaning brush to rotate, one end of the transmission shaft extends out of the baffle through the through hole, and the other end of the transmission shaft is connected with the cleaning brush;
characterized in that, the substrate cleaning apparatus further comprises:
and the stopping mechanism is used for stopping the liquid in the cleaning box from flowing out of the through hole on the baffle plate and is arranged at the through hole of the baffle plate.
2. The substrate cleaning apparatus according to claim 1, wherein: the stopping mechanism comprises an inner sleeve used for stopping liquid from flowing to the through hole along the transmission shaft, and the inner sleeve is sleeved on the transmission shaft and is positioned between the cleaning brush and the baffle.
3. The substrate cleaning apparatus according to claim 2, wherein: the inner sleeve comprises an annular gasket sleeved on the transmission shaft, and the outer diameter of the gasket is larger than the inner diameter of the through hole in the baffle.
4. The substrate cleaning apparatus according to claim 3, wherein: the inner sleeve further comprises an annular shaft sleeve sleeved on the transmission shaft and fixedly connected with the annular gasket into a whole, wherein the gasket is located at one end close to the through hole.
5. The substrate cleaning apparatus according to claim 1, wherein: the preventing mechanism comprises a shielding sealing cover for shielding a gap between the transmission shaft and the baffle plate so as to prevent liquid from flowing out of the gap.
6. The substrate cleaning apparatus according to claim 5, wherein: the shielding sealing cover is of a cover-shaped structure and is provided with a first end in an opening shape and a second end with a through hole in the center, the opening area of the first end is larger than that of the through hole of the second end, and a containing cavity is formed between the first end and the second end;
wherein,
the opening of the first end of the shielding sealing cover faces the baffle, the edge of the opening of the first end surrounds the periphery of the through hole of the baffle, the edge of the opening of the first end is fixedly or detachably connected with the baffle, the diameter of the inner edge of the through hole of the second end is larger than the outer diameter of the transmission shaft, and the transmission shaft penetrates through the through hole of the second end;
or,
the opening of the first end of the shielding sealing cover faces the baffle, the edge of the opening of the first end surrounds the periphery of the through hole of the baffle, the edge of the opening of the first end is separated from the baffle, and the inner edge of the through hole of the second end is fixedly or detachably connected with the transmission shaft;
or,
the opening of the first end of the shielding sealing cover faces the cleaning brush, the transmission shaft penetrates through the through hole of the second end of the shielding sealing cover, and the inner edge of the through hole of the second end is fixedly or detachably connected with the baffle or the transmission shaft.
7. The substrate cleaning apparatus according to claim 6, wherein: at least one drainage port is arranged on the wall of the accommodating cavity of the shielding sealing cover, and the horizontal position of the drainage port is lower than the through hole of the baffle.
8. The substrate cleaning apparatus according to claim 1, wherein the prevention mechanism comprises a fan device for generating an air flow at the through hole of the baffle plate toward the inside of the cleaning tank to prevent the liquid from flowing out from the through hole of the baffle plate.
9. The substrate cleaning apparatus of claim 8, wherein the fan device is disposed at the through hole and fixed to the baffle or the transmission shaft.
10. The substrate cleaning apparatus according to claim 8 or 9, wherein the fan device comprises: the fan impellers are driven by the transmission shaft to rotate, and are distributed on the transmission shaft along the circumferential direction of the transmission shaft.
11. The apparatus for cleaning a substrate according to claim 1, further comprising a motor for rotating the transmission shaft, wherein the motor is connected to an end of the transmission shaft extending out of the via hole.
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CN 201220520997 CN202824004U (en) | 2012-10-11 | 2012-10-11 | Base plate cleaning device |
Applications Claiming Priority (1)
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CN 201220520997 CN202824004U (en) | 2012-10-11 | 2012-10-11 | Base plate cleaning device |
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CN202824004U true CN202824004U (en) | 2013-03-27 |
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CN 201220520997 Expired - Lifetime CN202824004U (en) | 2012-10-11 | 2012-10-11 | Base plate cleaning device |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016095299A1 (en) * | 2014-12-18 | 2016-06-23 | 深圳市华星光电技术有限公司 | Cleaning device |
CN106299043A (en) * | 2016-09-05 | 2017-01-04 | 合肥钰芹信息科技有限公司 | A kind of LED wafer cleaning drying device |
WO2018201346A1 (en) * | 2017-05-03 | 2018-11-08 | 深圳市柔宇科技有限公司 | Cleaning device, and apparatus for manufacturing flexible display device |
-
2012
- 2012-10-11 CN CN 201220520997 patent/CN202824004U/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016095299A1 (en) * | 2014-12-18 | 2016-06-23 | 深圳市华星光电技术有限公司 | Cleaning device |
US10173251B2 (en) | 2014-12-18 | 2019-01-08 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Cleaning device for cleaning a glass substrate and a semi-finished array substrate |
CN106299043A (en) * | 2016-09-05 | 2017-01-04 | 合肥钰芹信息科技有限公司 | A kind of LED wafer cleaning drying device |
WO2018201346A1 (en) * | 2017-05-03 | 2018-11-08 | 深圳市柔宇科技有限公司 | Cleaning device, and apparatus for manufacturing flexible display device |
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