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CN202808380U - Silicon tetrachloride hydrogenating device - Google Patents

Silicon tetrachloride hydrogenating device Download PDF

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CN202808380U
CN202808380U CN 201220338470 CN201220338470U CN202808380U CN 202808380 U CN202808380 U CN 202808380U CN 201220338470 CN201220338470 CN 201220338470 CN 201220338470 U CN201220338470 U CN 201220338470U CN 202808380 U CN202808380 U CN 202808380U
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tail gas
silicon tetrachloride
hydrogenation
heat exchange
gas heat
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冯泽民
潘和平
谭忠芳
田先瑞
陈文吉
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Xinjiang Daqo New Energy Co Ltd
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Abstract

本实用新型公开了一种四氯化硅氢化装置,包括:氢化炉,所述氢化炉包括:炉体及发热体,所述发热体用于对炉体内气体进行加热;反应料液蒸发器,所述反应料液蒸发器用于将四氯化硅气化并将气化后的四氯化硅与氢气按照设定比例混合均匀后通过输气管道通入所述氢化炉;尾气换热管,所述尾气换热管用于将所述氢化炉中反应后的尾气进行冷却降温;其中,所述尾气换热管的长度不小于4m。所述四氯化硅氢化装置可通过设定所述尾气换热管的长度控制尾气的温度,使流经所述尾气换热管的尾气的温度迅速降低至设定的温度范围,从而提高四氯化硅的转化率;同时,避免了由于尾气温度过高导致输气管道热膨胀而发生的尾气泄漏事故的发生,安全性好。

Figure 201220338470

The utility model discloses a silicon tetrachloride hydrogenation device, comprising: a hydrogenation furnace, the hydrogenation furnace includes: a furnace body and a heating element, the heating element is used to heat the gas in the furnace body; a reaction material liquid evaporator, The reaction feed liquid evaporator is used to gasify silicon tetrachloride and mix the gasified silicon tetrachloride and hydrogen uniformly according to the set ratio and then pass it into the hydrogenation furnace through the gas pipeline; the tail gas heat exchange tube, The tail gas heat exchange tube is used to cool down the tail gas after reaction in the hydrogenation furnace; wherein, the length of the tail gas heat exchange tube is not less than 4m. The silicon tetrachloride hydrogenation device can control the temperature of the tail gas by setting the length of the tail gas heat exchange tube, so that the temperature of the tail gas flowing through the tail gas heat exchange tube can be quickly reduced to the set temperature range, thereby increasing the four The conversion rate of silicon chloride is high; at the same time, it avoids the occurrence of exhaust gas leakage accidents caused by the thermal expansion of gas pipelines due to excessive exhaust gas temperature, and has good safety.

Figure 201220338470

Description

一种四氯化硅氢化装置A kind of silicon tetrachloride hydrogenation device

技术领域 technical field

本实用新型涉及多晶硅制作工艺技术领域,更具体地说,涉及一种四氯化硅氢化装置。The utility model relates to the technical field of polysilicon production technology, in particular to a silicon tetrachloride hydrogenation device.

背景技术 Background technique

多晶硅是电子工业和太阳能光伏行业的基础原料,随着信息技术及太阳能光伏行业的飞速发展,高纯度多晶硅的需求量涨迅猛,多晶硅生产成为业界投资者的投资热点。Polysilicon is the basic raw material of the electronics industry and solar photovoltaic industry. With the rapid development of information technology and solar photovoltaic industry, the demand for high-purity polysilicon is increasing rapidly, and polysilicon production has become a hot spot for investors in the industry.

在多晶硅生产过程之中产生的大量有害的副产物四氯化硅,对四氯化硅的处理成为多晶硅生产企业生产过程中的瓶颈问题。目前对四氯化硅处理的方法主要是利用氢化技术将其转化为三氯氢硅,四氯化硅氢化后的产物是三氯氢硅和氯化氢。其中,三氯氢硅是多晶硅生产的原料,将四氯化硅转化为三氯氢硅,实现四氯化硅的循环再利用,提高了原料的利用率,降低了生产成本;副产物氯化氢是重要的化工原料,增加了企业的额外收益。A large amount of harmful by-product silicon tetrachloride is produced in the polysilicon production process, and the treatment of silicon tetrachloride has become a bottleneck problem in the production process of polysilicon production enterprises. The current method for treating silicon tetrachloride is mainly to convert it into trichlorosilane by hydrogenation technology, and the products after hydrogenation of silicon tetrachloride are trichlorosilane and hydrogen chloride. Among them, trichlorosilane is the raw material for polysilicon production, and silicon tetrachloride is converted into trichlorosilane to realize the recycling of silicon tetrachloride, which improves the utilization rate of raw materials and reduces production costs; the by-product hydrogen chloride is Important chemical raw materials increase the extra income of the enterprise.

现有技术在对四氯化硅进行氢化处理时,一般采用热氢技术,将其气化与氢气按照设定比例混合均匀后在氢化装置中进行反应,反应在高温下进行,反应后对尾气进行冷却分离。氢化装置中的氢化反应的反应方程式为:In the prior art, when silicon tetrachloride is hydrogenated, hot hydrogen technology is generally used, and its vaporization and hydrogen are mixed evenly according to the set ratio and then reacted in the hydrogenation device. The reaction is carried out at high temperature, and the exhaust gas Cool and separate. The reaction equation of the hydrogenation reaction in the hydrogenation unit is:

Figure BDA00001875394900011
Figure BDA00001875394900011

上述反应为可逆反应,所以反应后的尾气为上述反应方程式中四种物质的混合气体。现有的氢化装置不能及时的对尾气进行有效的冷却降温,高温下,尾气会发生上述反应的逆反应,使得四氯化硅的转化率较低;同时,温度高会导致输气管道接口处发生热膨胀,从而产生缝隙,导致气体泄漏,造成安全隐患。The above reaction is a reversible reaction, so the tail gas after the reaction is a mixed gas of the four substances in the above reaction equation. The existing hydrogenation device cannot effectively cool the tail gas in time. At high temperature, the tail gas will undergo the reverse reaction of the above reaction, making the conversion rate of silicon tetrachloride low; at the same time, the high temperature will lead to gas pipeline interface Thermal expansion, thereby creating gaps, resulting in gas leakage, causing safety hazards.

实用新型内容 Utility model content

为解决上述技术问题,本实用新型提供一种四氯化硅氢化装置,所述装置四氯化硅的转化率较高,且安全性好。In order to solve the above technical problems, the utility model provides a silicon tetrachloride hydrogenation device, the conversion rate of silicon tetrachloride of the device is high, and the safety is good.

为实现上述目的,本实用新型提供如下技术方案:In order to achieve the above object, the utility model provides the following technical solutions:

一种四氯化硅氢化装置,该装置包括:A silicon tetrachloride hydrogenation device, the device comprising:

氢化炉,所述氢化炉包括:炉体及发热体,所述发热体用于对炉体内气体进行加热;A hydrogenation furnace, the hydrogenation furnace includes: a furnace body and a heating element, the heating element is used to heat the gas in the furnace body;

反应料液蒸发器,所述反应料液蒸发器用于将四氯化硅气化并将气化后的四氯化硅与氢气按照设定比例混合均匀后通过输气管道通入所述氢化炉;Reaction feed liquid evaporator, the reaction feed liquid evaporator is used to gasify silicon tetrachloride and mix the gasified silicon tetrachloride and hydrogen evenly according to the set ratio, and then pass it into the hydrogenation furnace through the gas pipeline ;

尾气换热管,所述尾气换热管用于将所述氢化炉中反应后的尾气进行冷却降温;tail gas heat exchange tubes, the tail gas heat exchange tubes are used to cool down the tail gas reacted in the hydrogenation furnace;

其中,所述尾气换热管的长度不小于4m。Wherein, the length of the exhaust gas heat exchange tube is not less than 4m.

优选的,上述装置中,所述尾气换热管的长度为4m-8m。Preferably, in the above device, the length of the tail gas heat exchange tube is 4m-8m.

优选的,上述装置中,所述尾气换热管为螺旋形管道或折线形管道。Preferably, in the above device, the tail gas heat exchange tube is a spiral tube or a zigzag tube.

优选的,上述装置中,所述氢化炉还包括:Preferably, in the above-mentioned device, the hydrogenation furnace also includes:

设置在所述炉体内部的外保温罩;An external heat preservation cover arranged inside the furnace body;

设置在外保温罩内部的石墨内胆;A graphite liner arranged inside the outer heat preservation cover;

其中,所述发热体设置在所述石墨内胆的内部。Wherein, the heating element is arranged inside the graphite liner.

优选的,上述装置中,所述发热体的加热功率为300kW-500kW。Preferably, in the above device, the heating power of the heating element is 300kW-500kW.

优选的,上述装置中,所述尾气换热管为耐腐蚀的316L不锈钢管。Preferably, in the above device, the exhaust gas heat exchange tube is a corrosion-resistant 316L stainless steel tube.

优选的,上述装置中,所述发热体为石墨发热体。Preferably, in the above device, the heating element is a graphite heating element.

优选的,上述装置中,所述尾气换热管包括:内管以及设置在所述内管外的外管;Preferably, in the above device, the tail gas heat exchange tube includes: an inner tube and an outer tube arranged outside the inner tube;

其中,所述内管的外壁与所述外管的内壁之间具有流动的冷却水,通过所述冷却水对所述尾气进行冷却降温。Wherein, there is cooling water flowing between the outer wall of the inner tube and the inner wall of the outer tube, and the exhaust gas is cooled by the cooling water.

优选的,上述装置中,进行氢化反应时,所述氢化炉中氢气与四氯化硅的摩尔比为2-3。Preferably, in the above device, when the hydrogenation reaction is carried out, the molar ratio of hydrogen to silicon tetrachloride in the hydrogenation furnace is 2-3.

从上述技术方案可以看出,本实用新型所提供的四氯化硅氢化装置包括:氢化炉,所述氢化炉包括:炉体及发热体,所述发热体用于对炉体内气体进行加热;反应料液蒸发器,所述反应料液蒸发器用于将四氯化硅气化并将气化后的四氯化硅与氢气按照设定比例混合均匀后通过输气管道通入所述氢化炉;尾气换热管,所述尾气换热管用于将所述氢化炉中反应后的尾气进行冷却降温;其中,所述尾气换热管的长度不小于4m。It can be seen from the above technical scheme that the silicon tetrachloride hydrogenation device provided by the utility model includes: a hydrogenation furnace, and the hydrogenation furnace includes: a furnace body and a heating element, and the heating element is used to heat the gas in the furnace body; Reaction feed liquid evaporator, the reaction feed liquid evaporator is used to gasify silicon tetrachloride and mix the gasified silicon tetrachloride and hydrogen evenly according to the set ratio, and then pass it into the hydrogenation furnace through the gas pipeline ; Tail gas heat exchange tube, the tail gas heat exchange tube is used to cool down the tail gas after reaction in the hydrogenation furnace; wherein, the length of the tail gas heat exchange tube is not less than 4m.

所述四氯化硅氢化装置通过尾气换热管对反应后的尾气进行冷却降温,所述尾气换热管的长度不小于4m,可通过设定所述尾气换热管的长度控制尾气的温度,使流经所述尾气换热管的尾气的温度迅速降低至设定的温度范围,避免由于尾气温度过高致使尾气发生氢化反应的逆反应,保证了四氯化硅的转化率;而且由于所述尾气换热管能够有效降低尾气的温度,所以能够提高所述氢化装置的发热体的发热功率,升高氢化炉内温度,从而提高四氯化硅的转化率;同时,由于能够有效的对尾气进行降温,避免了由于尾气温度过高导致输气管道热膨胀而发生的尾气泄漏事故的发生,安全性好。The silicon tetrachloride hydrogenation device cools the tail gas after the reaction through the tail gas heat exchange tube, the length of the tail gas heat exchange tube is not less than 4m, and the temperature of the tail gas can be controlled by setting the length of the tail gas heat exchange tube , the temperature of the tail gas flowing through the tail gas heat exchange tube is rapidly reduced to a set temperature range, avoiding the reverse reaction of the hydrogenation reaction of the tail gas due to the excessively high tail gas temperature, and ensuring the conversion rate of silicon tetrachloride; and due to the The tail gas heat exchange tube can effectively reduce the temperature of the tail gas, so the heating power of the heating element of the hydrogenation device can be improved, and the temperature in the hydrogenation furnace can be increased, thereby improving the conversion rate of silicon tetrachloride; at the same time, because it can effectively treat The temperature of the tail gas is cooled, which avoids the occurrence of the tail gas leakage accident caused by the thermal expansion of the gas transmission pipeline due to the excessively high tail gas temperature, and has good safety.

附图说明 Description of drawings

为了更清楚地说明本实用新型实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本实用新型的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description These are only some embodiments of the utility model, and those skilled in the art can also obtain other drawings based on these drawings without creative work.

图1为本实用新型所提供的一种四氯化硅氢化装置的结构示意图。Fig. 1 is the structural representation of a kind of silicon tetrachloride hydrogenation device provided by the utility model.

具体实施方式 Detailed ways

正如背景技术部分所述,现有的氢化装置不能及时的对尾气进行有效的冷却降温,高温下,尾气会发生上述反应的逆反应,使得四氯化硅的转化率较低;同时,温度高会导致输气管道接口处发生热膨胀,从而产生缝隙,导致气体泄漏,造成安全隐患。As mentioned in the background technology section, the existing hydrogenation device cannot effectively cool the tail gas in time. At high temperature, the tail gas will undergo the reverse reaction of the above reaction, making the conversion rate of silicon tetrachloride low; at the same time, high temperature will This will lead to thermal expansion at the interface of the gas pipeline, resulting in gaps, resulting in gas leakage and potential safety hazards.

氢化炉中反应需要的温度一般在1200℃,从氢化炉的底部排出的反应后的尾气温度一般在700℃-900℃。现有的四氯化硅氢化装置的尾气换热管的长度在3m左右,其第一端口与氢化炉底座的排气口连通,所述第一端口与所述底座焊接在一起或是为一体成型结构,不会由于受热膨胀产生缝隙;但是其第二端口需要通过接口法兰与所述氢化装置的其他部件连接,如果尾气不能有效的冷却降温,所述接口法兰将会受热膨胀,从而导致所述第二端口与其他部件之间的连接出现缝隙,造成尾气泄漏。The temperature required for the reaction in the hydrogenation furnace is generally 1200°C, and the temperature of the reacted tail gas discharged from the bottom of the hydrogenation furnace is generally 700°C-900°C. The length of the tail gas heat exchange tube of the existing silicon tetrachloride hydrogenation device is about 3m, and its first port communicates with the exhaust port of the base of the hydrogenation furnace, and the first port is welded or integrated with the base Formed structure, no gaps will be generated due to thermal expansion; but its second port needs to be connected to other parts of the hydrogenation device through an interface flange. If the exhaust gas cannot be effectively cooled, the interface flange will be thermally expanded, thereby As a result, gaps appear in the connection between the second port and other components, resulting in exhaust gas leakage.

尾气换热器一般通过其内管与外管之间的高温冷却水来降低在所述内管之间输送的尾气的温度。虽然通过降低冷却水的温度能够快速降低尾气的温度,但是较低温度的冷却水为尾气进行冷却降温时,较低温度冷却水的体积差变化很大,且会产生大量的水蒸气,可能会大致所述尾气换热管炸裂。因此,一般不采用上述方法。现有同类装置中尾气换热管长度一般都较短,小于4m,经过尾气换热器冷却后的尾气到达反应料液蒸发器后的温度仍可达到400摄氏度左右,不能够有效地降低氢化装置反应后的尾气温度,易造成反应料液蒸发器与尾气换热管连接法兰处发生热膨胀或形变,造成尾气泄露。The tail gas heat exchanger generally lowers the temperature of the tail gas conveyed between the inner pipes and the outer pipes through high-temperature cooling water between the inner pipes and the outer pipes. Although the temperature of the exhaust gas can be quickly lowered by reducing the temperature of the cooling water, when the lower temperature cooling water cools the exhaust gas, the volume difference of the lower temperature cooling water changes greatly, and a large amount of water vapor will be generated, which may cause Probably the exhaust gas heat exchange tube burst. Therefore, the above method is generally not used. In the existing similar devices, the tail gas heat exchange tube length is generally short, less than 4m, and the temperature of the tail gas cooled by the tail gas heat exchanger after reaching the reaction feed liquid evaporator can still reach about 400 degrees Celsius, which cannot effectively reduce the hydrogenation device. The temperature of the tail gas after the reaction may easily cause thermal expansion or deformation at the flange connecting the reaction feed liquid evaporator and the tail gas heat exchange tube, resulting in tail gas leakage.

为解决尾气换热管与反应料液蒸发器连接处极易发生尾气泄露的问题,同时为了提高四氯化硅的转化率,发明人通过长期实践研究发现,增加尾气换热管的长度,加大夹套内高温冷却水与尾气的换热面积,降低尾气到达反应料液蒸发器与尾气换热管连接处的温度可有效地解决反应料液蒸发器与尾气换热管连接法兰处长发生尾气泄露的问题、也可实现尾气的急速降温,减少四氯化硅氢化逆反应的发生。当所述尾气换热管的长度不小于4m时,可有效的将尾气温度降低至250摄氏度以下,避免由于热膨胀而导致的尾气泄漏;而且,避免了由于尾气温度过高致使尾气发生氢化反应的逆反应,保证了四氯化硅的转化率;同时,由于所述尾气换热管能够有效降低尾气的温度,所以能够提高所述氢化装置的发热体的发热功率,升高氢化炉内温度,从而提高四氯化硅的转化率。In order to solve the problem that the exhaust gas leaks easily at the joint between the tail gas heat exchange tube and the reaction feed liquid evaporator, and at the same time in order to improve the conversion rate of silicon tetrachloride, the inventors have found through long-term practice and research that increasing the length of the tail gas heat exchange tube increases the The heat exchange area between the high-temperature cooling water and the tail gas in the large jacket can reduce the temperature of the tail gas reaching the connection between the reaction feed liquid evaporator and the tail gas heat exchange tube, which can effectively solve the problem of the length of the connecting flange between the reaction feed liquid evaporator and the tail gas heat exchange tube. If the problem of exhaust gas leakage occurs, it can also realize the rapid cooling of the exhaust gas and reduce the occurrence of the reverse reaction of silicon tetrachloride hydrogenation. When the length of the tail gas heat exchange tube is not less than 4m, the temperature of the tail gas can be effectively reduced to below 250 degrees Celsius, avoiding the leakage of the tail gas caused by thermal expansion; moreover, avoiding the hydrogenation reaction of the tail gas due to the excessively high tail gas temperature The reverse reaction ensures the conversion rate of silicon tetrachloride; at the same time, because the tail gas heat exchange tube can effectively reduce the temperature of the tail gas, it can increase the heating power of the heating element of the hydrogenation device and increase the temperature in the hydrogenation furnace, thereby Improve the conversion rate of silicon tetrachloride.

基于上述研究的基础上,本实用新型提供了一种四氯化硅氢化装置,该装置包括:On the basis of above-mentioned research, the utility model provides a kind of silicon tetrachloride hydrogenation device, and this device comprises:

氢化炉,所述氢化炉包括:炉体及发热体,所述发热体用于对炉体内气体进行加热;A hydrogenation furnace, the hydrogenation furnace includes: a furnace body and a heating element, the heating element is used to heat the gas in the furnace body;

反应料液蒸发器,所述反应料液蒸发器用于将四氯化硅气化并将气化后的四氯化硅与氢气按照设定比例混合均匀后通过输气管道通入所述氢化炉;Reaction feed liquid evaporator, the reaction feed liquid evaporator is used to gasify silicon tetrachloride and mix the gasified silicon tetrachloride and hydrogen evenly according to the set ratio, and then pass it into the hydrogenation furnace through the gas pipeline ;

尾气换热管,所述尾气换热管用于将所述氢化炉中反应后的尾气进行冷却降温;tail gas heat exchange tubes, the tail gas heat exchange tubes are used to cool down the tail gas reacted in the hydrogenation furnace;

其中,所述尾气换热管的长度不小于4m。Wherein, the length of the exhaust gas heat exchange tube is not less than 4m.

本实用新型实施例所提供的四氯化硅氢化装置通过尾气换热管对反应后的尾气进行冷却降温,所述尾气换热管的长度不小于4m,通过设定所述尾气换热管的长度控制尾气的温度,使流经所述尾气换热管的尾气的温度迅速降低至设定的温度范围,避免由于尾气温度过高致使尾气发生氢化反应的逆反应,保证了四氯化硅的转化率;而且由于所述尾气换热管能够有效降低尾气的温度,所以能够提高所述氢化装置的发热体的发热功率,升高氢化炉内温度,从而提高四氯化硅的转化率;同时,由于能够有效的对尾气进行降温,避免了由于尾气温度过高导致输气管道热膨胀而发生的尾气泄漏事故的发生,安全性好。The silicon tetrachloride hydrogenation device provided by the embodiment of the utility model cools the tail gas after the reaction through the tail gas heat exchange tube. The length of the tail gas heat exchange tube is not less than 4m. By setting the tail gas heat exchange tube The length controls the temperature of the tail gas, so that the temperature of the tail gas flowing through the tail gas heat exchange tube is quickly reduced to the set temperature range, avoiding the reverse reaction of the hydrogenation reaction of the tail gas due to the excessively high tail gas temperature, and ensuring the conversion of silicon tetrachloride rate; and because the tail gas heat exchange tube can effectively reduce the temperature of the tail gas, so the heating power of the heating element of the hydrogenation device can be improved, and the temperature in the hydrogenation furnace can be increased, thereby improving the conversion rate of silicon tetrachloride; at the same time, Because the exhaust gas can be effectively cooled, the exhaust gas leakage accidents caused by the thermal expansion of the gas pipeline caused by the excessively high exhaust gas temperature are avoided, and the safety is good.

以上是本申请的核心思想,下面将结合本实用新型实施例中的附图,对本实用新型实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本实用新型一部分实施例,而不是全部的实施例。基于本实用新型中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本实用新型保护的范围。The above is the core idea of the present application. The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the present invention. Examples, not all examples. Based on the embodiments of the present utility model, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present utility model.

在下面的描述中阐述了很多具体细节以便于充分理解本实用新型,但是本实用新型还可以采用其他不同于在此描述的其它方式来实施,本领域技术人员可以在不违背本实用新型内涵的情况下做类似推广,因此本实用新型不受下面公开的具体实施例的限制。In the following description, a lot of specific details have been set forth in order to fully understand the utility model, but the utility model can also be implemented in other ways that are different from those described here, and those skilled in the art can do so without violating the connotation of the utility model. Under the circumstances, similar promotion is done, so the utility model is not limited by the specific embodiments disclosed below.

其次,本实用新型结合示意图进行详细描述,在详述本实用新型实施例时,为便于说明,表示装置件结构的剖面图会不依一般比例作局部放大,而且所述示意图只是示例,其在此不应限制本实用新型保护的范围。此外,在实际制作中应包含长度、宽度及高度的三维空间尺寸。Secondly, the utility model is described in detail in conjunction with the schematic diagram. When describing the embodiment of the utility model in detail, for the convenience of explanation, the section view showing the structure of the device will not be partially enlarged according to the general scale, and the schematic diagram is only an example, which is here The protection scope of the utility model should not be limited. In addition, the three-dimensional space dimensions of length, width and height should be included in actual production.

基于上述思想,本实用新型实施例提供了一种四氯化硅氢化装置,参考图1,包括:Based on the above thought, the embodiment of the utility model provides a silicon tetrachloride hydrogenation device, with reference to Fig. 1, comprising:

氢化炉,所述氢化炉包括:炉体;设置在所述炉体内部的发热体15。其中,所述炉体由钟罩12以及底座17组成,所述发热体15设置在所述底座17上。进行氢化反应时,将按照设定比例混合均匀的反应气体(氢气和气态四氯化硅)通过钟罩12顶部的进料口11进入钟罩12内,通过发热体15加热进行氢化反应。A hydrogenation furnace, the hydrogenation furnace includes: a furnace body; a heating element 15 arranged inside the furnace body. Wherein, the furnace body is composed of a bell jar 12 and a base 17 , and the heating element 15 is arranged on the base 17 . During the hydrogenation reaction, the reaction gas (hydrogen and gaseous silicon tetrachloride) mixed uniformly according to the set ratio enters the bell jar 12 through the feed port 11 at the top of the bell jar 12, and is heated by the heating element 15 to carry out the hydrogenation reaction.

为了避免钟罩12温度过高,在钟罩12与发热体15之间设置有外保温罩13,所述外保温罩13与所述底座17之间设置有通气口,从所述进料口11通入的反应气体通过所述通气口进入外保温罩13内,通过所述发热体15加热后发生氢化反应。所述外保温罩13在保护所述钟罩12温度不至于过高的同时还起到保温作用,使其内部温度保持在设定的反应温度。In order to prevent the bell jar 12 from being too high in temperature, an outer heat preservation cover 13 is arranged between the bell jar 12 and the heating element 15, and an air vent is provided between the outer heat preservation cover 13 and the base 17, and from the feed inlet 11 The reaction gas passed through the vent enters into the outer heat preservation cover 13, and after being heated by the heating element 15, a hydrogenation reaction occurs. The outer heat preservation cover 13 protects the temperature of the bell jar 12 from being too high and also plays a role of heat preservation, so that the internal temperature thereof is kept at the set reaction temperature.

同时,为了使得所述外保温罩12内热场均匀,在所述发热体15与所述外保温罩12之间设置有,所述墨内胆14为横截面是八边形的筒状结构,通过对热量的散射,使得所述外保温罩13内温度均匀。所述两个为一对,呈工字型分布于所述石墨内胆14内,即成对的两个发热体15相互平行。本实施例所述氢化装置共有18对发热体分布于所述石墨内胆14内。Simultaneously, in order to make the thermal field in the outer heat preservation cover 12 uniform, between the heating element 15 and the outer heat preservation cover 12, the ink liner 14 is a cylindrical structure with an octagonal cross section. Through the scattering of heat, the temperature inside the outer heat preservation cover 13 is made uniform. The two are a pair, which are distributed in the graphite liner 14 in an I-shape, that is, the paired two heating elements 15 are parallel to each other. The hydrogenation device in this embodiment has 18 pairs of heating elements distributed in the graphite liner 14 .

其中,所述发热体15为石墨发热体,所述石墨发热体化学性质稳定,不与氢化炉中反应气体发生化学反应。所述发热体15通过电极16与外部电源连接,所述电极16为导电性能良好的铜质电极,在所述铜质电极表面镀有金属银,用于保护所述铜质电极。通过外部电源为所述发热体15施加电场后,发热体15发热对氢化炉内反应气体加热。可通过控制外部电源输出的强度控制发热体15的发热功率,从而控制氢化炉内的反应温度值。Wherein, the heating element 15 is a graphite heating element, which has stable chemical properties and does not chemically react with the reaction gas in the hydrogenation furnace. The heating element 15 is connected to an external power source through an electrode 16. The electrode 16 is a copper electrode with good electrical conductivity, and the surface of the copper electrode is plated with metallic silver to protect the copper electrode. After an electric field is applied to the heating element 15 by an external power source, the heating element 15 generates heat to heat the reaction gas in the hydrogenation furnace. The heating power of the heating element 15 can be controlled by controlling the output intensity of the external power supply, thereby controlling the reaction temperature value in the hydrogenation furnace.

所述氢化装置还包括:用于对反应后的尾气进行冷却降温的尾气换热管;用于为所述氢化炉提供反应气体的反应料液蒸发器。The hydrogenation device also includes: a tail gas heat exchange tube for cooling the reacted tail gas; and a reaction material liquid evaporator for providing reaction gas to the hydrogenation furnace.

所述尾气换热管的第一端口通过所述底座17上的导气孔与所述氢化炉连通。反应后的尾气通过设置在所述底座17上的导气孔进入所述尾气换热管,在所述尾气换热管内进行冷却降温。所述尾气换热管由内管22以及设置在所述内管22外的外管23组成。所述外管23靠近所述尾气换热管的第二端口的侧壁上设置有高温冷却水进口24,高温冷却水通过所述高温冷却水进口24进入内管22与外管23的管壁缝隙之间,所述高温冷却水通过所述管壁缝隙后再经过设置在所述底座17内部的冷却水管道(图中未示出)后通过高温冷却水出口21排出所述氢化装置。The first port of the tail gas heat exchange tube communicates with the hydrogenation furnace through the air hole on the base 17 . The reacted tail gas enters the tail gas heat exchange tube through the air guide hole provided on the base 17, and is cooled in the tail gas heat exchange tube. The exhaust gas heat exchange tube is composed of an inner tube 22 and an outer tube 23 arranged outside the inner tube 22 . A high-temperature cooling water inlet 24 is provided on the side wall of the outer tube 23 close to the second port of the exhaust gas heat exchange tube, and the high-temperature cooling water enters the tube walls of the inner tube 22 and the outer tube 23 through the high-temperature cooling water inlet 24 Between the gaps, the high-temperature cooling water passes through the gaps in the pipe wall, then passes through the cooling water pipe (not shown in the figure) arranged inside the base 17, and then exits the hydrogenation device through the high-temperature cooling water outlet 21.

所述反应料液蒸发器将四氯化硅加热气化后,将气态的四氯化硅与氢气按照设定的比例混合均匀后通入所述氢化炉内。具体的,所述反应料液蒸发器设置包括:冷凝水出口37、氢气进口36、四氯化硅进口35、水蒸气进口34、反应气体出口33。After the reaction material liquid evaporator heats and vaporizes silicon tetrachloride, gaseous silicon tetrachloride and hydrogen are uniformly mixed according to a set ratio and then passed into the hydrogenation furnace. Specifically, the configuration of the reaction feed liquid evaporator includes: a condensed water outlet 37 , a hydrogen inlet 36 , a silicon tetrachloride inlet 35 , a water vapor inlet 34 , and a reaction gas outlet 33 .

所述反应料液蒸发器的侧壁为中空结构,在进行工作时,将常温下的呈液态的四氯化硅通过所述四氯化硅进口35注入所述反应料液蒸发器的第一腔室内,并通过所述氢气进口36以设定的气体流速向所述第一腔室内;同时,通过所述水蒸气进口34向所述反应料液蒸发器的侧壁内通入高温水蒸气,对其内部的液态四氯化硅加热使其气化,与氢气混合均匀后通过与所述反应气体进料口11连接的输气管道(图中未示出)进入所述氢化炉内。在所述反应料液蒸发器侧壁内,由所述水蒸气冷却形成的冷凝水通过所述冷凝水出口37排出所述氢化装置。The side wall of the reaction feed liquid evaporator is a hollow structure, and when working, liquid silicon tetrachloride at normal temperature is injected into the first part of the reaction feed liquid evaporator through the silicon tetrachloride inlet 35. chamber, and through the hydrogen inlet 36 to the first chamber at a set gas flow rate; at the same time, through the water vapor inlet 34 into the side wall of the reaction feed liquid evaporator into high-temperature water vapor , heat the liquid silicon tetrachloride inside to vaporize it, mix it with hydrogen evenly, and then enter the hydrogenation furnace through a gas pipeline (not shown in the figure) connected to the reaction gas feed port 11. In the side wall of the reaction feed liquid evaporator, the condensed water formed by the cooling of the water vapor is discharged from the hydrogenation device through the condensed water outlet 37 .

混合均匀的反应气体中,氢气与四氯化硅的摩尔比为2-3,使反应气体中氢气的体积含量大于气态的四氯化硅的体积含量,促使氢化炉中反应向生成三氯氢硅的方向进行,增加四氯化硅的转化率。In the uniformly mixed reaction gas, the molar ratio of hydrogen to silicon tetrachloride is 2-3, so that the volume content of hydrogen in the reaction gas is greater than the volume content of gaseous silicon tetrachloride, which promotes the reaction in the hydrogenation furnace to generate trichlorohydrogen The direction of silicon is carried out, increasing the conversion rate of silicon tetrachloride.

所述反应料液蒸发器还包括第二腔室,所述第二腔室设置有尾气进口31和尾气出口32,所述尾气换热管的第二端口通过法兰311与所述尾气进口31连接,所述尾气换热管内的尾气经过所述第二腔室后通过与所述尾气出口32连通的输气管道(图中未示出)进入尾气收集分离装置。其中,所述输气管道以及尾气收集分离装置图中未示出。尾气流经所述第二腔室时可对所述第一腔室内的四氯化硅进行辅助加热,加快四氯化硅的气化。The reaction feed liquid evaporator also includes a second chamber, the second chamber is provided with a tail gas inlet 31 and a tail gas outlet 32, and the second port of the tail gas heat exchange tube is connected to the tail gas inlet 31 through a flange 311. connected, the tail gas in the tail gas heat exchange tube passes through the second chamber and then enters the tail gas collection and separation device through a gas pipeline (not shown in the figure) communicated with the tail gas outlet 32 . Wherein, the gas transmission pipeline and the exhaust gas collection and separation device are not shown in the figure. When the tail gas flows through the second chamber, the silicon tetrachloride in the first chamber can be auxiliary heated to accelerate the gasification of the silicon tetrachloride.

在对尾气进行降温冷却时一般采用高温冷却水,而不采用温度较低的冷却水,避免输气管道炸裂等问题的发生。所以,为了有效降低尾气的温度可通过增加尾气换热管的长度来实现。在一定范围内,尾气的温度与所述尾气换热管的长度成反比,即尾气换热管的长度越长,经过其冷却后的为的温度越低。When cooling the exhaust gas, high-temperature cooling water is generally used instead of lower-temperature cooling water to avoid problems such as bursting of gas pipelines. Therefore, in order to effectively reduce the temperature of the exhaust gas, it can be realized by increasing the length of the exhaust gas heat exchange tube. Within a certain range, the temperature of the exhaust gas is inversely proportional to the length of the exhaust gas heat exchange tube, that is, the longer the exhaust gas heat exchange tube is, the lower the temperature of the exhaust gas after cooling.

本实施例所述氢化装置的尾气换热管不小于4m,相对于现有的3m左右的尾气换热管能够更大幅度的降低尾气的温度,对尾气进行有效的降温冷却,避免温度过高导致尾气发生氢化反应的逆反应,保障了四氯化硅的转化率。The tail gas heat exchange tube of the hydrogenation device described in this embodiment is not less than 4m, and compared with the existing tail gas heat exchange tube of about 3m, it can reduce the temperature of the tail gas more significantly, effectively cool down the tail gas, and avoid excessive temperature The reverse reaction leading to the hydrogenation reaction of the tail gas ensures the conversion rate of silicon tetrachloride.

同时,所述氢化装置可对所述发热体施加更大的功率(所述发热体的加热功率为300kW-500kW),将氢化炉内的反应温度增加到1200℃-1300℃,增加氢化炉内反应气体的反应速度以及四氯化硅的转化率,虽然此时排出的尾气温度相应增高,但是由于所述尾气换热管能够有效降的对尾气进行冷却降温,避免温度过高导致尾气发生氢化反应的逆反应,整体上提高了四氯化硅的转化率。At the same time, the hydrogenation device can apply greater power to the heating element (the heating power of the heating element is 300kW-500kW), increasing the reaction temperature in the hydrogenation furnace to 1200°C-1300°C, increasing the The reaction speed of the reaction gas and the conversion rate of silicon tetrachloride, although the temperature of the tail gas discharged at this time is correspondingly increased, but because the tail gas heat exchange tube can effectively reduce the temperature of the tail gas, avoid the hydrogenation of the tail gas caused by the high temperature The reverse reaction of the reaction improves the conversion rate of silicon tetrachloride on the whole.

而且,当所述尾气换热管的长度不小于4m时,可有效的将尾气温度降低至250摄氏度以下,避免由于热膨胀而导致的尾气泄漏。如本实施例中,避免了所述法兰311由于热膨胀产生缝隙导致所述尾气换热管与所述尾气进气口31产生缝隙,进而避免了尾气泄漏问题的发生,安全性更高。Moreover, when the length of the tail gas heat exchange tube is not less than 4m, the temperature of the tail gas can be effectively reduced to below 250 degrees Celsius, and the leakage of the tail gas caused by thermal expansion can be avoided. As in this embodiment, gaps between the exhaust gas heat exchange tubes and the exhaust gas inlet 31 due to thermal expansion of the flange 311 are avoided, thereby avoiding the occurrence of exhaust gas leakage and higher safety.

优选的本实施例所述尾气换热管的长度为4m-8m,所述长度的尾气换热管能够将尾气温度降低至150℃-250℃,一方面能够避免由于尾气温度过高而发生氢化反应的逆反应,从而保证四氯化硅的转化率;另一方面,使冷却后的尾气中的三氯氢硅处于气体状态,避免由于温度过低导致三氯氢硅冷凝为液体粘附于尾气换热管内壁。Preferably, the length of the tail gas heat exchange tube described in this embodiment is 4m-8m, and the length of the tail gas heat exchange tube can reduce the temperature of the tail gas to 150°C-250°C, on the one hand, it can avoid hydrogenation due to excessively high tail gas temperature The reverse reaction of the reaction, so as to ensure the conversion rate of silicon tetrachloride; on the other hand, make the trichlorosilane in the cooled tail gas be in a gas state, so as to avoid the condensation of trichlorosilane into liquid and adhere to the tail gas due to the low temperature The inner wall of the heat exchange tube.

本实施例采用冷却后的尾气对液态的四氯化硅进行辅助加热是为了充分利用能量,该方式为优选实施方式,还可以将所述尾气换热管的第二端口通过法兰直接与尾气收集分离装置连接,而只采用蒸汽对四氯化硅进行加热。In this embodiment, the cooling tail gas is used to assist the heating of liquid silicon tetrachloride in order to make full use of energy. The collection and separation device is connected, and only steam is used to heat silicon tetrachloride.

所述尾气换热管以及输气管道采用耐高温、耐腐蚀的316L不锈钢管。为了降低所述氢化装置对占据的空间,将所述尾气换热管设计为折线形管道或是螺旋形管道。The exhaust gas heat exchange tubes and gas pipelines are made of high temperature resistant and corrosion resistant 316L stainless steel tubes. In order to reduce the space occupied by the hydrogenation unit, the tail gas heat exchange tube is designed as a zigzag pipe or a spiral pipe.

需要说明的是,本实用新型所述四氯化硅转化率是指四氯化管转化为三氯氢硅的转化率。It should be noted that the conversion rate of silicon tetrachloride mentioned in the utility model refers to the conversion rate of tetrachloride tube into trichlorosilane.

通过上述描述可知,本实施例所述四氯化硅氢化装置能够有效的对反应后的尾气进行冷却降温,提高了四氯化硅的转化率;同时,保证了生产的安全性。It can be seen from the above description that the silicon tetrachloride hydrogenation device described in this embodiment can effectively cool down the tail gas after the reaction, improve the conversion rate of silicon tetrachloride, and at the same time ensure the safety of production.

对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本实用新型。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本实用新型的精神或范围的情况下,在其它实施例中实现。因此,本实用新型将不会被限制于本文所示的这些实施例,而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。The above description of the disclosed embodiments enables those skilled in the art to realize or use the utility model. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention will not be limited to these embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims (8)

1. a hydrogenation of silicon tetrachloride device is characterized in that, comprising:
Hydrogenation furnace, described hydrogenation furnace comprises: body of heater and heating element, described heating element are used for gas in the body of heater is heated;
Reaction feed liquid vaporizer, described reaction feed liquid vaporizer are used for the silicon tetrachloride gasification and the silicon tetrachloride after will gasify and hydrogen mix afterwards according to preset proportion and passes into described hydrogenation furnace by gas pipe line;
Tail gas heat transfer tube, described tail gas heat transfer tube are used for the reacted tail gas of described hydrogenation furnace is cooled;
Wherein, the length of described tail gas heat transfer tube is not less than 4m.
2. device according to claim 1 is characterized in that, the length of described tail gas heat transfer tube is 4m-8m.
3. device according to claim 1 is characterized in that, described tail gas heat transfer tube is spirality pipe or fold-line-shaped pipeline.
4. device according to claim 1 is characterized in that, described hydrogenation furnace also comprises:
Be arranged on the outer stay-warm case of described body of heater inside;
Be arranged on the graphite inner bag of outer stay-warm case inside;
Wherein, described heating element is arranged on the inside of described graphite inner bag.
5. device according to claim 1 is characterized in that, the heating power of described heating element is 300kW-500kW.
6. device according to claim 1 is characterized in that, described tail gas heat transfer tube is corrosion resistant 316L stainless steel tube.
7. device according to claim 1 is characterized in that, described heating element is graphite heater.
8. device according to claim 1 is characterized in that, described tail gas heat transfer tube comprises: inner tube and be arranged on the outer outer tube of described inner tube;
Wherein, have mobile water coolant between the outer wall of described inner tube and the inwall of described outer tube, by described water coolant described tail gas is cooled.
CN 201220338470 2012-07-11 2012-07-11 Silicon tetrachloride hydrogenating device Expired - Lifetime CN202808380U (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104891501A (en) * 2014-03-07 2015-09-09 新特能源股份有限公司 Silicon tetrachloride high-temperature hydrogenation method and device
CN105066716A (en) * 2015-07-28 2015-11-18 中国恩菲工程技术有限公司 Waste heat recycling method of reduction furnace
CN109369003A (en) * 2018-12-28 2019-02-22 江苏通鼎光棒有限公司 A kind of inlet duct and its air inlet method of the sintering of preform female rod
CN110817884A (en) * 2019-12-10 2020-02-21 唐山三孚硅业股份有限公司 Silicon tetrachloride synthetic furnace of high conversion

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104891501A (en) * 2014-03-07 2015-09-09 新特能源股份有限公司 Silicon tetrachloride high-temperature hydrogenation method and device
CN105066716A (en) * 2015-07-28 2015-11-18 中国恩菲工程技术有限公司 Waste heat recycling method of reduction furnace
CN105066716B (en) * 2015-07-28 2018-02-02 中国恩菲工程技术有限公司 The method that afterheat of reducing furnace recycles
CN109369003A (en) * 2018-12-28 2019-02-22 江苏通鼎光棒有限公司 A kind of inlet duct and its air inlet method of the sintering of preform female rod
CN110817884A (en) * 2019-12-10 2020-02-21 唐山三孚硅业股份有限公司 Silicon tetrachloride synthetic furnace of high conversion

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