CN202622547U - Grinding disc, grinding pad finisher and grinding device - Google Patents
Grinding disc, grinding pad finisher and grinding device Download PDFInfo
- Publication number
- CN202622547U CN202622547U CN 201220175579 CN201220175579U CN202622547U CN 202622547 U CN202622547 U CN 202622547U CN 201220175579 CN201220175579 CN 201220175579 CN 201220175579 U CN201220175579 U CN 201220175579U CN 202622547 U CN202622547 U CN 202622547U
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- inner ring
- outer ring
- abrasive disk
- grinding
- ring
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Abstract
The utility model provides a grinding disc, a grinding pad finisher and a grinding device. The grinding disc comprises an inner ring and an outer ring, wherein the outer ring is arranged at the periphery of the inner ring; a gap is formed between the inner ring and the outer ring; the working surfaces of the inner ring and the outer ring are positioned on the same horizontal plane; a plurality of inner ring grooves gradually enlarged from inside to outside are uniformly distributed in the working surface of the inner ring; and a plurality of outer ring grooves gradually enlarged from inside to outside are uniformly distributed in the working surface of the outer ring. According to the grinding disc, a grinding liquid byproduct on the inner ring can be quickly discharged by utilizing the gap between the inner ring and the outer ring, so as to effectively and quickly discharge the grinding liquid byproduct.
Description
Technical field
The utility model relates to integrated circuit and makes the field, relates in particular to a kind of abrasive disk, grinder pad finisher and lapping device.
Background technology
The CMP technology of usually, in semiconductor technology workshop (fab), being carried out is meant cmp (Chemical Mechanical Polishing) technology or is called chemical-mechanical planarization (Chemical Mechanical Planarization) technology.Chemical mechanical milling tech is the technical process of a complicacy; It is that crystal column surface is contacted with the lapped face of grinding pad; Then; With flattening wafer surface, adopt chemical-mechanical grinding device through the relative motion between crystal column surface and the lapped face usually, be also referred to as lapping device or polishing machine platform and carry out chemical mechanical milling tech.Said lapping device generally includes a cmp head; When carrying out grinding technics, the wafer that will grind is attached on the grinding head, and this wafer to be ground faces down and contact counterrotating grinding pad; The downforce that grinding head provides is pressed onto this wafer on the grinding pad; Said grinding pad is to be pasted on the platform, and when rotating under the drive of this platform at motor, grinding head also carries out corresponding sports; Simultaneously, lapping liquid is transported on the grinding pad through the lapping liquid supply line, and is evenly distributed on the grinding pad through centrifugal force.The employed lapping liquid of grinding technics generally includes chemical mordant and abrasive grains; Chemical reaction through chemical mordant and said surface to be ground generates softer easy to be removed material; Remove from the surface of being ground wafer through the mechanical friction material that these are softer then, reach the effect of overall planarization.
In process of lapping, dirt or the surface phenomenon of grinding away appears in the surface of grinding pad easily, at this moment, need use grinder pad finisher (pad conditioner) that grinding pad is cleaned simultaneously or improves the grinding pad surface appearance, to obtain better grinding effect.
The grinder pad finisher of existing lapping device comprises the abrasive disk and driving arm that is used to put in order grinding pad, and said driving arm is connected in the top of said abrasive disk, and said abrasive disk generally is circular.The working surface of said abrasive disk is provided with abrasive grains and is provided with some grooves from inside to outside, and said groove is used to get rid of the lapping liquid accessory substance.But in use find; Because the groove on the working surface of abrasive disk is longer, be not easy to flow to the outside near the lapping liquid accessory substance of central area through groove, it is not smooth to cause the lapping liquid accessory substance to be got rid of; Influence the arrangement efficient of grinding pad, finally reduce the product yield.
Therefore, how a kind of abrasive disk that can realize effectively, get rid of the lapping liquid accessory substance fast, grinder pad finisher and lapping device being provided is the technical problem that those skilled in the art need to be resolved hurrily.
The utility model content
The purpose of the utility model is to provide a kind of abrasive disk, grinder pad finisher and lapping device, to get rid of the lapping liquid accessory substance on the grinding pad more effectively.
In order to reach above-mentioned purpose, the utility model adopts following technical scheme:
A kind of abrasive disk; Comprise inner ring and outer ring; Said outer ring is arranged at the periphery of said inner ring, has the gap between said inner ring and the outer ring, and the working surface of said inner ring and outer ring is positioned on the same horizontal plane; Even some big inner ring grooves that become gradually from inside to outside that distribute on the working surface of said inner ring, some big outer ring grooves that become gradually from inside to outside evenly distribute on the working surface of said outer ring.
Preferably, in above-mentioned grinder pad finisher, said outer ring is annular.
Preferably, in above-mentioned grinder pad finisher, said inner ring is circular.
Preferably, in above-mentioned grinder pad finisher, said inner ring groove outwards extends to the excircle of said inner ring always from the central area of inner ring, and the groove on the said outer ring extends to the excircle of said outer ring always from the inner periphery of outer ring.
Preferably, in above-mentioned grinder pad finisher, the distance in the gap between said inner ring and the outer ring is 10-20mm.
Preferably, in above-mentioned grinder pad finisher, said outer ring is annular.
Preferably, in above-mentioned grinder pad finisher, said inner ring is circular.
Preferably, in above-mentioned grinder pad finisher, said inner ring is provided with 3 to 8 inner ring grooves.
Preferably, in above-mentioned grinder pad finisher, said outer ring is provided with 5-10 outer ring groove.
The invention also discloses a kind of grinder pad finisher, comprise abrasive disk and drive arm, said driving arm is connected in the top of said abrasive disk, and said abrasive disk adopts as above any one described abrasive disk.
Preferably; In above-mentioned grinder pad finisher; Also comprise rotation motor, be used to the outer ring back shaft that supports the inner ring back shaft of inner ring and be used to support the outer ring; One end of said inner ring back shaft is fixedly set in the inside of said outer ring back shaft, and the other end of said inner ring back shaft is connected with said rotation motor.
The invention also discloses a kind of lapping device, comprise grinding plate and grinding pad, said grinding pad is arranged on the said grinding plate, also comprises the grinder pad finisher of the above, and said grinder pad finisher is arranged on the said grinding pad.
The utility model provides a kind of abrasive disk, grinder pad finisher and lapping device; Through abrasive disk being arranged to concentric two abrasive disk forms in the same way; Be that abrasive disk is made up of inner ring and outer ring; By separately supporting driving shaft driven in rotation, said outer ring is arranged at the periphery of said inner ring respectively for said inner ring and outer ring, and the working surface of said inner ring and outer ring is positioned on the same horizontal plane; Some big inner ring groove and outer ring grooves that become gradually from inside to outside evenly distribute respectively on the working surface of said inner ring and outer ring; Adopt as above structure, can utilize the gap quick drain between inner ring and the outer ring to be positioned at the lapping liquid accessory substance on the inner ring, realize effective, the eliminating fast of lapping liquid accessory substance.
Description of drawings
The abrasive disk of the utility model, grinder pad finisher and lapping device are provided by following embodiment and accompanying drawing.
Fig. 1 is the schematic top plan view of the lapping device of the utility model one embodiment.
Fig. 2 is the elevational schematic view of the abrasive disk of the utility model one embodiment.
Fig. 3 is the abrasive disk of the utility model one embodiment and the schematic side view of back shaft thereof.
Among the figure, 1-grinder pad finisher, 11-abrasive disk, 111-outer ring, 1111-outer ring groove, 112-inner ring, 1121-inner ring groove, 113-gap, 114, inner ring back shaft, 115-outer ring back shaft, 12-drive arm, 2-grinding pad, 3-lapping liquid supply pipe, 4-grinding, 5-lapping liquid accessory substance.
The specific embodiment
Below will do further to describe in detail to abrasive disk, grinder pad finisher and the lapping device of the utility model.
Below with reference to accompanying drawings the utility model is described in more detail, has wherein represented the preferred embodiment of the utility model, should be appreciated that those skilled in the art can revise the utility model described here and still realize the advantageous effects of the utility model.Therefore, following description is appreciated that extensively knowing to those skilled in the art, and not as the restriction to the utility model.
For clear, whole characteristics of practical embodiments are not described.In following description, be not described in detail known function and structure, because they can make the utility model because unnecessary details and confusion.Will be understood that in the exploitation of any practical embodiments, must make a large amount of implementation details, for example, change into another embodiment by an embodiment according to relevant system or relevant commercial restriction to realize developer's specific objective.In addition, will be understood that this development possibly be complicated and time-consuming, but only be routine work to those skilled in the art.
For the purpose, the characteristic that make the utility model is more obviously understandable, be further described below in conjunction with the specific embodiment of accompanying drawing to the utility model.What need explanation is, accompanying drawing all adopts the form of simplifying very much and all uses non-ratio accurately, only in order to convenient, the purpose of aid illustration the utility model embodiment lucidly.
See also Fig. 1, Fig. 2 and Fig. 3, the utility model discloses a kind of lapping device, comprise grinding plate (not indicating among the figure), grinding pad 2, lapping liquid supply pipe 3 and grinding head 4, said grinding pad 2 is arranged on the said grinding plate.
Said lapping device comprises a grinder pad finisher 1, and said grinder pad finisher 1, lapping liquid supply pipe 3 and grinding head 4 are arranged at said grinding pad 2 tops respectively.Said grinder pad finisher 1 comprises abrasive disk 11 and drives arm 12 that said driving arm 12 is connected in the top of said abrasive disk 11.
Please consult Fig. 2 by emphasis; Said abrasive disk 11 comprises inner ring 111 and outer ring 112; Said outer ring 112 is arranged at the periphery of said inner ring 111, has gap 113 between said inner ring 111 and the outer ring 112, and the working surface of said inner ring 111 and outer ring 112 is positioned on the same horizontal plane; Even some big interior ring recess 1111 that become gradually from inside to outside that distribute on the working surface of said inner ring 111, some big outer ring grooves 1121 that become gradually from inside to outside evenly distribute on the working surface of said outer ring 112.Adopt said structure; Can discharge through the gap 113 between inner ring 111 and the outer ring 112 at the lapping liquid accessory substance 5 on the inner ring 111; The lapping liquid accessory substance 5 that is positioned on the outer ring 112 directly is discharged into the outside of outer ring 112, thereby realizes effective, the eliminating fast of lapping liquid accessory substance 5.
Concrete, in the grinder pad finisher of present embodiment, said outer ring 112 is annular, said inner ring 111 is circular.Inner ring groove 1111 on the said inner ring 111 outwards extends to the excircle of said inner ring 111 always from the central area of inner ring 111,112 inner periphery extends to the excircle of said outer ring 112 to the outer ring groove 1121 on the said outer ring 112 always from the outer ring.
Preferably, the distance in the gap 113 between said inner ring 111 and the outer ring 112 is 10-20mm.The gap 112 of this distance helps the discharging of lapping liquid accessory substance 5 more.
Preferably, said inner ring 111 is provided with 3 to 8 inner ring grooves 1111.In the present embodiment, said inner ring 111 is provided with 4 inner ring grooves 1111.So, can further improve the eliminating speed of the lapping liquid accessory substance 5 that is positioned on the inner ring 111.Said outer ring 112 is provided with 5-10 outer ring groove 1121.In the present embodiment, said outer ring 112 is provided with 7 outer ring grooves 1121.So, can further improve the eliminating speed of the lapping liquid accessory substance 5 that is positioned on the outer ring 112.
Said grinder pad finisher 1 also comprises rotation motor (meaning not shown in the figures), be used to the outer ring back shaft 115 that supports the inner ring back shaft 114 of inner ring 111 and be used to support outer ring 112; One end of said inner ring back shaft 114 is fixedly set in the inside of said outer ring back shaft 115; The other end of said inner ring back shaft 114 is connected with said rotation motor; Said rotation motor drives said inner ring back shaft 114 rotations, and then drives the whole abrasive disk rotation of being made up of inner ring 111 and outer ring 112.
In sum; The utility model provides a kind of abrasive disk, grinder pad finisher and lapping device; Through abrasive disk being arranged to one heart two abrasive disk forms in the same way, promptly abrasive disk is made up of inner ring and outer ring, and said inner ring and outer ring are respectively by separately supporting driving shaft driven in rotation; Said outer ring is arranged at the periphery of said inner ring; The working surface of said inner ring and outer ring is positioned on the same horizontal plane, and some big inner ring groove and outer ring grooves that become gradually from inside to outside that evenly distribute respectively on the working surface of said inner ring and outer ring adopt as above structure; Can utilize the gap quick drain between inner ring and the outer ring to be positioned at the lapping liquid accessory substance on the inner ring, realize effective, the eliminating fast of lapping liquid accessory substance.
Obviously, those skilled in the art can carry out various changes and modification to the utility model and not break away from the spirit and the scope of the utility model.Like this, belong within the scope of the utility model claim and equivalent technologies thereof if these of the utility model are revised with modification, then the utility model also is intended to comprise these changes and modification interior.
Claims (10)
1. abrasive disk; It is characterized in that comprise inner ring and outer ring, said outer ring is arranged at the periphery of said inner ring; Has the gap between said inner ring and the outer ring; The working surface of said inner ring and outer ring is positioned on the same horizontal plane, some big inner ring grooves that become gradually from inside to outside that evenly distribute on the working surface of said inner ring, and some big outer ring grooves that become gradually from inside to outside evenly distribute on the working surface of said outer ring.
2. abrasive disk according to claim 1 is characterized in that said outer ring is annular.
3. abrasive disk according to claim 2 is characterized in that said inner ring is circular.
4. abrasive disk according to claim 3 is characterized in that, said inner ring groove outwards extends to the excircle of said inner ring always from the central area of inner ring, and said outer ring groove extends to the excircle of said outer ring always from the inner periphery of said outer ring.
5. abrasive disk according to claim 1 is characterized in that the distance in the gap between said inner ring and the outer ring is 10-20mm.
6. abrasive disk according to claim 1 is characterized in that, said inner ring is provided with 3 to 8 inner ring grooves.
7. abrasive disk according to claim 1 is characterized in that, said outer ring is provided with 5 to 10 outer ring grooves.
8. a grinder pad finisher comprises abrasive disk and drives arm, and said driving arm is connected in the top of said abrasive disk, it is characterized in that, said abrasive disk adopts like any described abrasive disk in the claim 1～7.
9. grinder pad finisher according to claim 8; It is characterized in that; Said grinder pad finisher also comprises rotation motor, be used to the outer ring back shaft that supports the inner ring back shaft of inner ring and be used to support the outer ring; One end of said inner ring back shaft is fixedly set in the inside of said outer ring back shaft, and the other end of said inner ring back shaft is connected with said rotation motor.
10. a lapping device comprises grinding plate and grinding pad, and said grinding pad is arranged on the said grinding plate, it is characterized in that, also comprises grinder pad finisher as claimed in claim 8, and said grinder pad finisher is arranged on the said grinding pad.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220175579 CN202622547U (en) | 2012-04-23 | 2012-04-23 | Grinding disc, grinding pad finisher and grinding device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220175579 CN202622547U (en) | 2012-04-23 | 2012-04-23 | Grinding disc, grinding pad finisher and grinding device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202622547U true CN202622547U (en) | 2012-12-26 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220175579 Expired - Fee Related CN202622547U (en) | 2012-04-23 | 2012-04-23 | Grinding disc, grinding pad finisher and grinding device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202622547U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105081962A (en) * | 2015-07-10 | 2015-11-25 | 河海大学 | Device used for grinding and polishing small sample hard sheets |
-
2012
- 2012-04-23 CN CN 201220175579 patent/CN202622547U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105081962A (en) * | 2015-07-10 | 2015-11-25 | 河海大学 | Device used for grinding and polishing small sample hard sheets |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130503 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20130503 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121226 Termination date: 20180423 |