CN202587573U - High frequency induction plasma generator - Google Patents
High frequency induction plasma generator Download PDFInfo
- Publication number
- CN202587573U CN202587573U CN 201220161746 CN201220161746U CN202587573U CN 202587573 U CN202587573 U CN 202587573U CN 201220161746 CN201220161746 CN 201220161746 CN 201220161746 U CN201220161746 U CN 201220161746U CN 202587573 U CN202587573 U CN 202587573U
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- China
- Prior art keywords
- air inlet
- quartz ampoule
- generator
- tangent line
- plasma generator
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 230000006698 induction Effects 0.000 title claims abstract description 21
- 239000010453 quartz Substances 0.000 claims abstract description 69
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 69
- 230000001681 protective effect Effects 0.000 claims abstract description 23
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 10
- 239000003708 ampul Substances 0.000 claims description 64
- 239000000463 material Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 abstract description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 10
- 238000000746 purification Methods 0.000 abstract description 9
- 229920005591 polysilicon Polymers 0.000 abstract description 7
- 229910052786 argon Inorganic materials 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000010884 ion-beam technique Methods 0.000 abstract description 2
- 238000007254 oxidation reaction Methods 0.000 abstract description 2
- 210000002381 plasma Anatomy 0.000 abstract 6
- 239000003344 environmental pollutant Substances 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 231100000719 pollutant Toxicity 0.000 abstract 1
- 238000007670 refining Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 47
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000005272 metallurgy Methods 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002893 slag Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000001241 arc-discharge method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002367 phosphate rock Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Plasma Technology (AREA)
Abstract
The utility model relates to a high frequency induction plasma generator which is a novel-structured high frequency induction plasma generator used for polysilicon purification. The generator is composed of coaxial quartz tubes of inner and outer layers, a work air inlet, a protective air inlet, a tangential line air inlet and an air inlet. Argon is used to cool the plasma generator, which improves the security and ensures that oxidization air stably and evenly enters the generator to generate stable and even plasmas, thus the problem that polysilicon is easy to be polluted in a refining process is solved, and the security in a production process can be ensured. The generator can provide a stable and reliable ion beam, has the advantages of no pollutant, high temperature resistance, good insulation, uneasy damage and smooth and even flow, and ensures that the generator is not burned out and the plasmas are evenly generated and discharged, thus the role of the plasmas is well played.
Description
Technical field
The utility model relates to a kind of high-frequency induction plasma generator, is specifically related to the high-frequency induction plasma generator that uses in the polysilicon purification process.
Background technology
In polysilicon purification field, the metallurgy purification method has development prospect very much in numerous methods at present.In plasma oxidation atmosphere, to remove boron impurity be vital processing step to silicon solution in the metallurgy method purification process.
The method that produces plasma mainly contains: dc arc discharge method, AC power frequency electric discharge, high-frequency induction electric discharge, low pressure discharge method and firing method.In the technology of metallurgy method purifying polycrystalline silicon, adopt the high-frequency induction plasma method, flash-over characteristic is high frequency reaction arc discharge, and this method of purification brings other contaminating impurity can for silicon liquid.
The employed plasma generator of high-frequency induction electric discharge has metal (aluminium or copper) and quartzy supporting or complete quartzy water-cooled light fixture at present; These two kinds of light fixtures in use all have the place of a lot of inconveniences; Especially there is the danger of leaking; If light fixture leaks in the course of work, water can be blasted with the reaction of silicon liquid, has potential safety hazard.In addition, the cooling generator deionized water that in purification process, feeds makes beam-plasma unstable; The plasma arc body extinguishes easily, can not satisfy quantity-produced requirement on the technology, and the high-frequency discharge effect takes place; The replacing generator is pretty troublesome; In case generator damages cooling water and is leaked in the body of heater, light product rejection then, heavy then cooling water high temperature decomposition are rapidly blasted.
Deficiency according to present plasma generator; The utility model provides a kind of high-frequency induction plasma generator; This generator is the air cooling generator of being processed by quartzy material; This generator has overcome the deficiency of above-mentioned light fixture, adopts argon gas to cool off and has guaranteed also when plasma generator has improved fail safe that the stable and uniform that oxidizability gas divides gets into generator, produces the stabilized uniform plasma; Promptly solved in the polysilicon extractive process and be vulnerable to pollution problems, can guarantee fail safe in process of production again.
High-frequency plasma is existing many-sided application in industry, particularly at aspects such as plasma chemical industry, metallurgy and optical material purifications.The titanium ore that China is metallurgical, need in the mining firm to handle, to contain the slag that vanadium slag, rock phosphate in powder and industrial infusibility waste material contain exotic material a lot; Adopting the high-frequency plasma torch is quite promising smelting means, can therefrom produce useful metal and rare element.
Summary of the invention
The purpose of the utility model is; A kind of high-frequency induction plasma generator that polysilicon is purified that is used for is provided; This generator is made up of inside and outside two-layer coaxial quartz tube, working gas air inlet, protective gas air inlet, tangent line air inlet; Adopt argon gas to cool off and guaranteed also when plasma generator has improved fail safe that the stable and uniform that oxidizability gas divides gets into generator; Produce the stabilized uniform plasma, promptly solved in the polysilicon extractive process and be vulnerable to pollution problems, can guarantee fail safe in process of production again.This generator can provide stable, reliable ion beam, has not produce polluter, high temperature resistant, and good insulating, not fragile, air-flow is steadily even, and the assurance generator is not burnt out with plasma evenly produces discharge, better brings into play the effect of plasma.
The described a kind of high-frequency induction plasma generator of the utility model; This generator is made up of inside and outside two-layer coaxial quartz tube, working gas air inlet, protective gas air inlet, tangent line air inlet and air inlet; The upper end that places interior quartz ampoule (1) of working gas air inlet pipe (6); The two ends of working gas air inlet pipe (6) are fixed on and are tangent line air inlet (3) and tangent line air inlet (4) on the tube wall of interior quartz ampoule (1); Tangent line air inlet (3) becomes 180 ° with tangent line air inlet (4), on working gas air inlet pipe (6), is provided with working gas air inlet (2); The upper end that is placed at outer quartz ampoule (5) of protective gas air inlet pipe (7); The two ends of protective gas air inlet pipe (7) are fixed on and are tangent line air inlet (8) and tangent line air inlet (9) on the tube wall of outer quartz ampoule (5); Tangent line air inlet (8) becomes 180 ° with tangent line air inlet (9), on protective gas air inlet pipe (7), is provided with protective gas air inlet (10).
Interior quartz ampoule (1) in the said plasma generator is inserted in the outer interior quartz ampoule (5), and two-layer quartz ampoule is a concentric, and interior quartz ampoule (1) and outer quartz ampoule (5) are respectively dextrorotation and the air inlet of derotation tangent line.
The diameter of the outer quartz ampoule (5) in the said plasma generator is 50-90mm, and the diameter of interior quartz ampoule (1) is 30-70mm, and the wall thickness of quartz ampoule is 2mm.
Protective gas air inlet pipe (7) on working gas air inlet pipe (6) on the interior quartz ampoule (1) in the said plasma generator and the outer quartz ampoule (5) is for being arranged in parallel up and down.
The air inlet (10) of the outer quartz ampoule (5) in the said plasma generator is under the air inlet (2) of interior quartz ampoule (1).
The circular hole that to have a diameter on the top of interior quartz ampoule (1) in the said plasma generator be 20-30mm.
Said plasma generator, this generator are that quartzy material is processed.
The described a kind of high-frequency induction plasma generator that is used for purifying polycrystalline silicon of the utility model, this generator high-frequency induction plasma generator utilize electrodeless induction coupling, are input to the energy of high frequency electric source and carry out high-frequency discharge in the continuous air-flow.High-frequency plasma generator and technique for applying thereof have following new feature:
1. have only induction coil, do not have electrode, so electrodeless loss problem.Generator can produce extremely pure plasma, under plasma high-temperature, does not exist by the electrode material pollution problems owing to participate in the material of reaction.
2. the high frequency plasma rate of flow of fluid is lower, and the arc column diameter is bigger.Reactant in the high-temperature region time of staying long, make gas-phase reaction very abundant.
Description of drawings:
Fig. 1 is the structural representation of utility model
Embodiment:
Further describe and provide embodiment below in conjunction with width of cloth figure
The described a kind of high-frequency induction plasma generator of the utility model; This generator is made up of inside and outside two-layer coaxial quartz tube, working gas air inlet, protective gas air inlet, tangent line air inlet and air inlet; The upper end that places interior quartz ampoule 1 of working gas air inlet pipe 6; In being fixed on, the two ends of working gas air inlet pipe 6 are tangent line air inlet 3 and tangent line air inlet 4 on the tube wall of quartz ampoule 1; Tangent line air inlet 3 and 4 one-tenth 180 ° of tangent line air inlets are provided with working gas air inlet 2 on working gas air inlet pipe 6; The upper end that is placed at outer quartz ampoule 5 of protective gas air inlet pipe 7; The two ends of protective gas air inlet pipe 7 are fixed on and are tangent line air inlet 8 and tangent line air inlet 9 on the tube wall of outer quartz ampoule 5; Tangent line air inlet 8 and 9 one-tenth 180 ° of tangent line air inlets are provided with protective gas air inlet 10 on protective gas air inlet pipe 7; Interior quartz ampoule 1 is inserted in the outer interior quartz ampoule 5, and two-layer quartz ampoule is a concentric, and interior quartz ampoule 1 adopts dextrorotation and the air inlet of derotation tangent line respectively with outer quartz ampoule 5; The diameter of outer quartz ampoule 5 is 50-90mm, and the diameter of interior quartz ampoule 1 is 30-70mm, and the wall thickness of quartz ampoule is 2mm; Working gas air inlet pipe 6 on the interior quartz ampoule 1 and the protective gas air inlet pipe 7 on the outer quartz ampoule 5 are for being arranged in parallel up and down; The air inlet 10 of outer quartz ampoule 5 is under the air inlet 2 of interior quartz ampoule 1; The circular hole that to have a diameter on the top of interior quartz ampoule 1 be 20-30mm; Be used for adding metallic silicon at purification process, said plasma generator is that quartzy material is processed, and has prevented that effectively beam-plasma from receiving pollution; And it is quick for installation to have light weight, cleans easily.
In when work, be to add in the circular hole of 20-30mm the diameter of metallic silicon through the top of interior quartz ampoule 1, be with a 3-4 circle induction coil of processing by thin copper pipe in the periphery of generator; Through under the high voltage source effect, producing high-frequency current, in induction coil, produce high-frequency alternating magnetic field, magnetic flux change induces electromotive force; Gas is produced electrodless discharge by ionization, forms plasma arc, and this plasma arc stably is constrained in the space of generator; At this moment; The live gas that flows into generator is constantly by ionization, and the protective gas air inlet pipe 7 on the working gas air inlet pipe 6 on the interior quartz ampoule 1 and the outer quartz ampoule 5 is for being arranged in parallel up and down, and the air inlet 10 of outer quartz ampoule 5 is under the air inlet 2 of interior quartz ampoule 1; Working gas is inserted the air inlet 2 of interior quartz ampoule 1; Cooling protection gas inserts the air inlet 10 of outer quartz ampoule 5, adopts dextrorotation and derotation tangent line intake method, and the cooling protection gas that outer quartz ampoule 5 feeds is argon gas; If power demand is bigger during work; Can also add the cold air cooling, in the quartz ampoule 5, the plasma working gas of interior quartz ampoule 1 is oxygen, argon or the mist of concentrating gas to cooled protective gas outside tube wall tangent line air inlet 8 and tangent line air inlet 9 flow into; In working gas flows into along tube wall tangent line air inlet 3 and tangent line air inlet 4 in the quartz ampoule 1, guarantee like this that generator is not burnt out with plasma evenly to produce discharge.During work, the protective gas air inflow of outer quartz ampoule 5 is 12m
3/ h, the working gas air inflow of interior quartz ampoule 1 is 4 m
3/ h when high-frequency current passes through coil, produces axial magnetic field; At this moment if produce spark with high frequency ignition, the charge carrier of formation (ion and electronics) is under electromagnetic field effect, with atomic collision and make it ionization; Form more charge carrier, when charge carrier how when being enough to make gas that enough conductances arranged, will generate the eddy current in the closed circle path of flowing through on perpendicular to the cross section of magnetic direction; Powerful electric current produces high heat again with gas heated; Moment makes gas formation maximum temperature can reach 10000 ℃ stable plasmatorch, and induction coil is coupled energy to plasma, and keeps plasmatorch.When carrier gas carrier band sample aerosol passes through plasma, be heated to more than 3000 ℃ by the latter.Key in summary of the invention herein and describe paragraph.
Claims (7)
1. high-frequency induction plasma generator that is used for purifying polycrystalline silicon; It is characterized in that this generator is made up of inside and outside two-layer coaxial quartz tube, working gas air inlet, protective gas air inlet, tangent line air inlet and air inlet; Working gas air inlet pipe (6) places the upper end of interior quartz ampoule (1); The two ends of working gas air inlet pipe (6) are fixed on and are tangent line air inlet (3) and tangent line air inlet (4) on the tube wall of interior quartz ampoule (1); Tangent line air inlet (3) becomes 180 ° with tangent line air inlet (4), on working gas air inlet pipe (6), is provided with working gas air inlet (2); Protective gas air inlet pipe (7) places the upper end of outer quartz ampoule (5); The two ends of protective gas air inlet pipe (7) are fixed on and are tangent line air inlet (8) and tangent line air inlet (9) on the tube wall of outer quartz ampoule (5); Tangent line air inlet (8) becomes 180 ° with tangent line air inlet (9), on protective gas air inlet pipe (7), is provided with protective gas air inlet (10).
2. according to the said plasma generator of claim 1, it is characterized in that interior quartz ampoule (1) is inserted in the outer interior quartz ampoule (5), two-layer quartz ampoule is a concentric, and interior quartz ampoule (1) and outer quartz ampoule (5) are respectively dextrorotation and the air inlet of derotation tangent line.
3. according to the said plasma generator of claim 2, the diameter that it is characterized in that outer quartz ampoule (5) is 50-90mm, and the diameter of interior quartz ampoule (1) is 30-70mm, and the wall thickness of quartz ampoule is 2mm.
4. according to the said plasma generator of claim 3, it is characterized in that protective gas air inlet pipe (7) on working gas air inlet pipe (6) and the outer quartz ampoule (5) on the interior quartz ampoule (1) is for being arranged in parallel up and down.
5. according to the said plasma generator of claim 4, the air inlet (10) that it is characterized in that outer quartz ampoule (5) is under the air inlet (2) of interior quartz ampoule (1).
6. according to the said plasma generator of claim 5, it is characterized in that having a diameter circular hole that is 20-30mm on the top of interior quartz ampoule (1).
7. according to the said plasma generator of claim 1, it is characterized in that this generator is that quartzy material is processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220161746 CN202587573U (en) | 2012-04-17 | 2012-04-17 | High frequency induction plasma generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220161746 CN202587573U (en) | 2012-04-17 | 2012-04-17 | High frequency induction plasma generator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202587573U true CN202587573U (en) | 2012-12-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220161746 Expired - Fee Related CN202587573U (en) | 2012-04-17 | 2012-04-17 | High frequency induction plasma generator |
Country Status (1)
| Country | Link |
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| CN (1) | CN202587573U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103736435A (en) * | 2013-12-27 | 2014-04-23 | 中国神华能源股份有限公司 | Device and system for spheroidizing powder by using alternating-current plasmas |
| CN107969061A (en) * | 2017-12-23 | 2018-04-27 | 四川大学 | A kind of air inductively coupled plasma generator for processing silica-base material |
-
2012
- 2012-04-17 CN CN 201220161746 patent/CN202587573U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103736435A (en) * | 2013-12-27 | 2014-04-23 | 中国神华能源股份有限公司 | Device and system for spheroidizing powder by using alternating-current plasmas |
| CN103736435B (en) * | 2013-12-27 | 2015-11-18 | 中国神华能源股份有限公司 | A kind of equipment and system utilizing ac plasma nodularization powder |
| CN107969061A (en) * | 2017-12-23 | 2018-04-27 | 四川大学 | A kind of air inductively coupled plasma generator for processing silica-base material |
| CN107969061B (en) * | 2017-12-23 | 2023-09-19 | 四川大学 | An atmospheric induction coupled plasma generator for processing silicon-based materials |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121205 Termination date: 20150417 |
|
| EXPY | Termination of patent right or utility model |