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CN202394881U - Semiconductor package structure for stacking - Google Patents

Semiconductor package structure for stacking Download PDF

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Publication number
CN202394881U
CN202394881U CN201220002043XU CN201220002043U CN202394881U CN 202394881 U CN202394881 U CN 202394881U CN 201220002043X U CN201220002043X U CN 201220002043XU CN 201220002043 U CN201220002043 U CN 201220002043U CN 202394881 U CN202394881 U CN 202394881U
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Prior art keywords
substrate
semiconductor package
protective layer
piling
chip
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刘昭源
翁肇甫
王昱祺
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Advanced Semiconductor Engineering Inc
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Advanced Semiconductor Engineering Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/10All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
    • H01L2225/1011All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
    • H01L2225/1017All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support
    • H01L2225/1023All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support the support being an insulating substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/10All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
    • H01L2225/1011All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
    • H01L2225/1047Details of electrical connections between containers
    • H01L2225/1058Bump or bump-like electrical connections, e.g. balls, pillars, posts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/10All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
    • H01L2225/1011All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
    • H01L2225/1076Shape of the containers
    • H01L2225/1088Arrangements to limit the height of the assembly
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • H01L2924/15331Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18161Exposing the passive side of the semiconductor or solid-state body of a flip chip
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

The utility model discloses a semiconductor packaging structure for stacking, which comprises a substrate; the chip is arranged on the upper surface of the substrate; a protective layer arranged on the upper surface of the substrate to cover the chip and having a thermal expansion coefficient similar to that of the substrate; and a plurality of conductive convex columns which penetrate through the protective layer and are correspondingly connected to the upper surface of the substrate. Because the protective layer and the substrate are components made of similar insulating materials, the warping phenomenon of the substrate caused by stress action can be avoided due to the close thermal expansion coefficients of the protective layer and the substrate, and meanwhile, the arrangement distance required by the conductive convex columns is smaller, which is beneficial to improving the overall circuit layout density of the packaging structure.

Description

堆叠用半导体封装结构Semiconductor package structure for stacking

技术领域 technical field

本实用新型涉及一种封装构造,特别是有关于一种可以避免基板产生翘曲现象且有助于提升整体电路布局密度的堆叠用半导体封装结构。The utility model relates to a package structure, in particular to a semiconductor package structure for stacking which can avoid warpage of the substrate and help to improve the overall circuit layout density.

背景技术 Background technique

现今,半导体封装产业发展出各种不同型式的封装构造,以满足各种需求,而一般来说,封装制程大部分都是在基板上布设芯片,在设置芯片之后,再用封装胶体包覆起来,各种不同的系统封装(system in package,SIP)设计概念常用于架构高密度封装构造,其中一种系统封装方式为封装体上堆叠封装体(package on package,POP)。Nowadays, the semiconductor packaging industry has developed various types of packaging structures to meet various needs. Generally speaking, most of the packaging process is to lay out chips on the substrate. After the chips are installed, they are then covered with encapsulant , various system in package (SIP) design concepts are commonly used in the architecture of high-density packaging structures, one of which is the stacking of packages on packages (package on package, POP).

如图1所示,所述封装体上堆叠封装体(POP)的构造是指先完成一具有第一芯片90、第一基板91及第一封装胶体92的第一封装体,接着再于第一封装体的封装胶体92的上表面堆叠另一具有第二芯片80、第二基板81及第二封装胶体82的完整的第二封装体,其中所述第一封装体的第一封装胶体92会开设数个孔洞,以裸露第一基板91上表面的接垫;第二封装体的第二基板81下表面的接垫会透过第一锡球94及第二锡球83对应电性连接至第一封装体的第一基板91上,因而成为一复合封装构造。第一基板91下表面的接垫另结合有数个外接锡球93,以做为输入/输出端子。As shown in FIG. 1 , the structure of the package-on-package (POP) refers to first completing a first package with a first chip 90, a first substrate 91 and a first packaging compound 92, and then on the first package. The upper surface of the encapsulant 92 of the package is stacked with another complete second package having the second chip 80, the second substrate 81 and the second encapsulant 82, wherein the first encapsulant 92 of the first package will Several holes are opened to expose the pads on the upper surface of the first substrate 91; the pads on the lower surface of the second substrate 81 of the second package are electrically connected to the On the first substrate 91 of the first package, thus forming a composite package structure. The pads on the lower surface of the first substrate 91 are further combined with several external solder balls 93 as input/output terminals.

由于上述第一封装体与第二封装体之间是通过第一锡球94及第二锡球83对应连接,而第一锡球94及第二锡球83通常直径大于100微米,故设置锡球往往需要在第一封装体的第一封装胶体92形成孔径大于100微米的孔洞,从而影响了电路的接垫的数量及接垫间距的布局密度。Since the above-mentioned first package body and the second package body are correspondingly connected through the first solder ball 94 and the second solder ball 83, and the diameter of the first solder ball 94 and the second solder ball 83 is usually greater than 100 microns, so the tin Balls often need to form holes with a diameter greater than 100 microns in the first encapsulant 92 of the first package, which affects the number of pads in the circuit and the layout density of the pad spacing.

再者,由于所述第一封装胶体92与第二封装胶体82材料通常选自环氧树脂,其热膨胀系数(CTE)介于3~4之间;而第一基板91及第二基板81则是选自聚丙烯与玻璃纤维的复合材料,其热膨胀系数约为17,由于热膨胀系数的差异,第一封装胶体92与第二封装胶体82设置于第一基板91及第二基板81时所产生的热涨冷缩应力会使第一基板91及第二基板81发生翘曲(warpage)现象,进而可能造成内部线路断裂(crack),导致不良品产生。Furthermore, since the materials of the first encapsulant 92 and the second encapsulant 82 are usually selected from epoxy resin, their coefficient of thermal expansion (CTE) is between 3 and 4; while the first substrate 91 and the second substrate 81 are It is a composite material selected from polypropylene and glass fiber, and its thermal expansion coefficient is about 17. Due to the difference in thermal expansion coefficient, the first encapsulant 92 and the second encapsulant 82 are disposed on the first substrate 91 and the second substrate 81. The thermal expansion and contraction stress will cause the first substrate 91 and the second substrate 81 to warp, which may cause internal circuit breakage (crack), resulting in defective products.

故,有必要提供一种堆叠用半导体封装结构,以解决现有技术所存在的问题。Therefore, it is necessary to provide a semiconductor package structure for stacking to solve the problems existing in the prior art.

实用新型内容 Utility model content

有鉴于此,本实用新型提供一种堆叠用半导体封装结构,以解决现有封装体上堆叠封装体(POP)结构的电路布局密度有待改进,且基板容易发生翘曲的问题。In view of this, the utility model provides a semiconductor package structure for stacking to solve the problem that the circuit layout density of the existing package-on-package (POP) structure needs to be improved, and the substrate is prone to warping.

本实用新型的主要目的在于提供一种堆叠用半导体封装结构,其封装用的保护层与基板为热膨胀系数一致的绝缘材料所制成的构件,可避免基板发生翘曲现象,同时保护层内部是以导电凸柱取代锡球,其亦有助于提升封装构造的整体电路布局密度。The main purpose of this utility model is to provide a semiconductor package structure for stacking. The protective layer and the substrate for the package are components made of insulating materials with the same thermal expansion coefficient, which can prevent the substrate from warping. At the same time, the inside of the protective layer is Replacing solder balls with conductive bumps also helps to improve the overall circuit layout density of the package structure.

为达成本实用新型的前述目的,本实用新型提供一种堆叠用半导体封装结构,其包含:In order to achieve the aforementioned purpose of the utility model, the utility model provides a semiconductor packaging structure for stacking, which includes:

一基板;a substrate;

一芯片,设于所述基板的上表面;a chip disposed on the upper surface of the substrate;

一保护层,设于所述基板的上表面而覆盖所述芯片,所述保护层与所述基板的热膨胀系数的差异值小于5;以及A protective layer is provided on the upper surface of the substrate to cover the chip, and the difference between the thermal expansion coefficients of the protective layer and the substrate is less than 5; and

数根导电凸柱,穿设于所述保护层内而对应连接至基板上表面。Several conductive studs penetrate through the protection layer and are correspondingly connected to the upper surface of the substrate.

在本实用新型的一实施例中,所述基板与所述保护层包含由玻璃纤维及环氧树脂所共同构成的压合片(prepreg)。In an embodiment of the present invention, the substrate and the protective layer include a prepreg made of glass fiber and epoxy resin.

在本实用新型的一实施例中,所述基板的上表面设有数个电性连接部,所述导电凸柱是对应设于所述基板的电性连接部上。In an embodiment of the present invention, several electrical connection portions are provided on the upper surface of the substrate, and the conductive protrusions are correspondingly provided on the electrical connection portions of the substrate.

在本实用新型的一实施例中,所述电性连接部是数个接垫。In an embodiment of the present invention, the electrical connection part is a plurality of pads.

在本实用新型的一实施例中,所述导电凸柱通过锡膏连接于所述基板的电性连接部上。In an embodiment of the present invention, the conductive protrusions are connected to the electrical connection portion of the substrate through solder paste.

在本实用新型的一实施例中,所述导电凸柱是通过压合工艺对应设于所述基板的电性连接部上,亦即,所述导电凸柱可以视为是穿设于所述保护层内并压合到所述基板的电性连接部上的嵌入式(embedded)导电凸柱。In an embodiment of the present invention, the conductive protrusions are correspondingly arranged on the electrical connection portion of the substrate through a lamination process, that is, the conductive protrusions can be regarded as passing through the An embedded conductive stud is embedded in the protection layer and pressed onto the electrical connection portion of the substrate.

在本实用新型的一实施例中,所述导电凸柱选自铜柱凸块或镍柱凸块。In an embodiment of the present invention, the conductive studs are selected from copper stud bumps or nickel stud bumps.

在本实用新型的一实施例中,所述基板的上表面设有数个芯片连接部;所述芯片具有一有源表面,所述有源表面朝下并设有数个芯片焊垫,其中所述芯片焊垫通过凸块对应电性连接所述基板的上表面的数个芯片连接部。In one embodiment of the present invention, the upper surface of the substrate is provided with several chip connection parts; the chip has an active surface, and the active surface faces downward and is provided with several chip pads, wherein the The chip pads are electrically connected to several chip connection portions on the upper surface of the substrate through bumps.

在本实用新型的一实施例中,所述保护层上表面设有一重布线层,所述重布线层一体连接所述导电凸柱。In an embodiment of the present invention, a redistribution layer is provided on the upper surface of the protection layer, and the redistribution layer is integrally connected to the conductive protrusions.

在本实用新型的一实施例中,每一所述导电凸柱穿设于所述保护层的一孔洞中,所述孔洞的孔径小于100微米。In an embodiment of the present invention, each of the conductive protrusions is disposed in a hole in the protective layer, and the diameter of the hole is less than 100 microns.

附图说明 Description of drawings

图1是一现有封装体上堆叠封装体的封装构造的结构示意图。FIG. 1 is a schematic structural view of a conventional package-on-package package structure.

图2是本实用新型第一实施例的堆叠用半导体封装结构的结构示意图。FIG. 2 is a schematic structural view of the semiconductor package structure for stacking according to the first embodiment of the present invention.

图3A是制作图2的堆叠用半导体封装结构的部份结构示意图,示意芯片连接于基板的结构。FIG. 3A is a schematic diagram of a partial structure of the semiconductor package structure for stacking in FIG. 2 , illustrating a structure in which chips are connected to a substrate.

图3B是接续图3A制作图2的堆叠用半导体封装结构的部份结构示意图,示意保护层设于基板并包覆芯片,同时示意导电凸柱的设置工艺。3B is a partial structural schematic diagram of the semiconductor package structure for stacking in FIG. 2 made following FIG. 3A , showing that the protective layer is disposed on the substrate and covers the chip, and also shows the process of setting the conductive bumps.

图3C是接续图3B制作图2的堆叠用半导体封装结构的部份结构示意图,示意具有导电凸柱的导电层压合于保护层上的结构。FIG. 3C is a partial structural schematic diagram of the semiconductor package structure for stacking in FIG. 2 made following FIG. 3B , showing a structure in which a conductive layer with conductive bumps is laminated on the protective layer.

图3D是本实用新型第二实施例的堆叠用半导体封装结构的结构示意图。FIG. 3D is a schematic structural view of a semiconductor package structure for stacking according to a second embodiment of the present invention.

具体实施方式 Detailed ways

为让本实用新型上述目的、特征及优点更明显易懂,下文特举本实用新型较佳实施例,并配合附图,作详细说明如下。再者,本实用新型所提到的方向用语,例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本实用新型,而非用以限制本实用新型。In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and understandable, the preferred embodiments of the present invention are specifically cited below, together with the accompanying drawings, for a detailed description as follows. Furthermore, the directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc. , are for orientation only with reference to the attached drawings. Therefore, the used directional terms are used to illustrate and understand the present invention, but not to limit the present invention.

请参照图2所示,其概要揭示本实用新型第一实施例的堆叠用半导体封装结构的结构示意图。本实用新型提供一种堆叠用半导体封装结构,其包含一基板10、一芯片20、一保护层11及数根导电凸柱13。Please refer to FIG. 2 , which schematically discloses a structural schematic diagram of a semiconductor package structure for stacking according to a first embodiment of the present invention. The utility model provides a semiconductor packaging structure for stacking, which includes a substrate 10 , a chip 20 , a protective layer 11 and several conductive protrusions 13 .

请参照图2所示,所述基板10是一封装基板,其优选是选自玻璃纤维及环氧树脂所共同构成的构件,所述基板10的上表面设有数个电性连接部100及芯片连接部,其下表面则设有数个焊垫以及连接焊垫的锡球12。所述电性连接部100及芯片连接部优选是数个铜料材质的接垫。Please refer to FIG. 2, the substrate 10 is a packaging substrate, which is preferably a member selected from glass fiber and epoxy resin. The upper surface of the substrate 10 is provided with several electrical connection parts 100 and chips. The lower surface of the connecting portion is provided with several welding pads and solder balls 12 connecting the welding pads. The electrical connection part 100 and the chip connection part are preferably several pads made of copper material.

请参照图2所示,所述芯片20是设于所述基板10的上表面,本实施例中,所述芯片20具有一有源表面,所述有源表面朝下并设有数个芯片焊垫,其中所述芯片焊垫通过凸块200对应电性连接所述基板10的上表面的数个芯片连接部。Please refer to Fig. 2, the chip 20 is arranged on the upper surface of the substrate 10. Pads, wherein the chip pads are electrically connected to several chip connection portions on the upper surface of the substrate 10 through the bumps 200 .

请参照图2所示,所述保护层11设于所述基板10的上表面而覆盖所述芯片20。所述保护层11与所述基板10为热膨胀系数相近的材料制成的构件,且优选是选自玻璃纤维及环氧树脂所共同构成的构件,所述的热膨胀系数相近在此是指两者的热膨胀系数的差异值小于5。Referring to FIG. 2 , the protective layer 11 is disposed on the upper surface of the substrate 10 to cover the chip 20 . The protective layer 11 and the substrate 10 are members made of materials with similar thermal expansion coefficients, and are preferably selected from glass fibers and epoxy resins. The similar thermal expansion coefficients here refer to both The difference in coefficient of thermal expansion is less than 5.

请参照图2所示,所述导电凸柱13穿设于所述保护层11内而对应连接至基板10上表面的电性连接部100上,更详细地,所述保护层11具有数个对应裸露基板10上表面的电性连接部100的孔洞,而所述导电凸柱13通过压合工艺对应穿入保护层11的孔洞而设于所述基板10的电性连接部100上;再者,所述导电凸柱13优选是以其底面通过锡膏130连接于所述基板10的电性连接部100上。再者,所述导电凸柱13选自铜柱凸块或镍柱凸块;所述导电凸柱13穿设于所述保护层11的孔洞的孔径小于100微米。Please refer to FIG. 2, the conductive studs 13 are penetrated in the protective layer 11 and correspondingly connected to the electrical connection portion 100 on the upper surface of the substrate 10. In more detail, the protective layer 11 has several The hole corresponding to the electrical connection portion 100 on the upper surface of the bare substrate 10, and the conductive protrusion 13 is provided on the electrical connection portion 100 of the substrate 10 corresponding to the hole penetrated into the protective layer 11 through a lamination process; Alternatively, the bottom surface of the conductive protrusion 13 is preferably connected to the electrical connection portion 100 of the substrate 10 through the solder paste 130 . Furthermore, the conductive bumps 13 are selected from copper stud bumps or nickel stud bumps; the conductive studs 13 pass through the protection layer 11 with a hole diameter less than 100 microns.

由于所述保护层11与基板10为热膨胀系数一致的材料所制成的构件,故彼此之间可不受热涨冷缩的应力影响,进而可避免基板10发生翘曲现象。再者,所述导电凸柱13穿设于所述保护层11的孔洞的孔径小于100微米,其相较于现有使用锡球设置所需的孔洞孔径较小,故可有助于提升电路的接垫的数量及接垫间距的布局密度。Since the protective layer 11 and the substrate 10 are components made of materials with the same thermal expansion coefficient, they are not affected by the stress of thermal expansion and contraction, thereby preventing the substrate 10 from warping. Furthermore, the hole diameter of the conductive stud 13 pierced through the protective layer 11 is less than 100 microns, which is smaller than the hole diameter required by the existing solder ball arrangement, so it can help to improve the circuit. The number of pads and the layout density of the pad spacing.

请参照图3A~3C所示,其分别概要揭示制作图2实施例的堆叠用半导体封装结构的结构示意图。请参照图3A所示,首先制备所述基板10,并令将所述芯片20设于所述基板10的上表面,其中所述芯片20的有源表面朝下,其芯片焊垫通过凸块200对应电性连接所述基板10的上表面的数个芯片连接部;接续图3A,请参照图3B,于于所述基板10及所述芯片20上通过模具形成所述保护层11,使得所述保护层11设于所述基板10的上表面而覆盖所述芯片20,并且保护层11具有对应裸露所述基板10的电性连接部100的孔洞,同时制备一具有所述导电凸柱13的导电层,透过一载板30承载所述导电层,并与所述保护层11的孔洞对位,以进行压合工艺,其中所述导电凸柱13底面涂有锡膏130;接续图3B,请参照图3C,所述导电层的导电凸柱13通过压合工艺设于所述保护层11的孔洞内并填满孔洞,进而通过锡膏130连接于所述基板10的电性连接部100上;最后再移除导电凸柱13以外的导电层部位,即形成如图2实施例的堆叠用半导体封装结构。Please refer to FIGS. 3A-3C , which respectively schematically disclose the structural schematic diagrams for manufacturing the semiconductor package structure for stacking in the embodiment of FIG. 2 . Please refer to FIG. 3A , first prepare the substrate 10, and set the chip 20 on the upper surface of the substrate 10, wherein the active surface of the chip 20 faces downward, and the chip pads pass through the bumps. 200 corresponds to several chip connection parts electrically connected to the upper surface of the substrate 10; continuing FIG. 3A, please refer to FIG. 3B, the protective layer 11 is formed on the substrate 10 and the chip 20 through a mold, so that The protective layer 11 is disposed on the upper surface of the substrate 10 to cover the chip 20, and the protective layer 11 has holes corresponding to the exposed electrical connection portion 100 of the substrate 10. 13, the conductive layer is carried through a carrier board 30, and is aligned with the hole in the protective layer 11 to perform the lamination process, wherein the bottom surface of the conductive protrusion 13 is coated with solder paste 130; continue 3B, please refer to FIG. 3C, the conductive protrusion 13 of the conductive layer is set in the hole of the protective layer 11 through a lamination process and fills the hole, and then connected to the electrical property of the substrate 10 through the solder paste 130. On the connecting portion 100 ; finally, the conductive layer parts other than the conductive bumps 13 are removed, that is, the semiconductor package structure for stacking as shown in the embodiment shown in FIG. 2 is formed.

请参照图3D所示,其揭示本实用新型第二实施例的堆叠用半导体封装结构的结构示意图,第二实施例的堆叠用半导体封装结构同样是由图3A~3C的步骤形成,惟与第一实施例的不同处在于,图3C的导电层通过蚀刻工艺形成线路,进而在所述保护层11上表面形成与所述导电凸柱一体连接的重布线层131。Please refer to FIG. 3D , which discloses a schematic structural diagram of a semiconductor package structure for stacking in the second embodiment of the present invention. The semiconductor package structure for stacking in the second embodiment is also formed by the steps in FIGS. The difference of one embodiment is that the conductive layer in FIG. 3C is etched to form circuits, and then the redistribution layer 131 integrally connected with the conductive studs is formed on the upper surface of the protective layer 11 .

如上所述,相较于现有封装体上堆叠封装体的封装构造存在因锡球尺寸而使得电路布局密度受到局限,且基板容易发生翘曲现象的技术问题,本实用新型提供了一种堆叠用半导体封装结构,其包含一基板;一芯片,设于所述基板的上表面;一保护层,设于所述基板的上表面而覆盖所述芯片,且与所述基板为热膨胀系数相同材料制成的构件;以及数根导电凸柱,穿设于所述保护层内而对应连接至基板上表面,由于所述保护层与所述基板为相同材料制成的构件,相近的热膨胀系数将可避免基板受到应力作用而发生翘曲现象,同时以导电凸柱取代锡球,所需的设置间距相对较小,亦有助于提升封装构造的整体电路布局密度。As mentioned above, compared with the existing packaging structure of stacking packages on the package, there are technical problems that the circuit layout density is limited due to the size of the solder balls, and the substrate is prone to warping. The utility model provides a stacking A semiconductor packaging structure comprising a substrate; a chip disposed on the upper surface of the substrate; a protective layer disposed on the upper surface of the substrate to cover the chip and made of the same material as the substrate with the same thermal expansion coefficient and several conductive protrusions, which are penetrated in the protective layer and correspondingly connected to the upper surface of the substrate. Since the protective layer and the substrate are made of the same material, the similar thermal expansion coefficient will It can avoid warping of the substrate due to stress, and at the same time, the solder balls are replaced by conductive bumps, which requires a relatively small spacing, and also helps to improve the overall circuit layout density of the packaging structure.

本实用新型已由上述相关实施例加以描述,然而上述实施例仅为实施本实用新型的范例。必需指出的是,已公开的实施例并末限制本实用新型的范围。相反地,包含于权利要求书的精神及范围的修改及均等设置均包括于本实用新型的范围内。The utility model has been described by the above-mentioned relevant embodiments, but the above-mentioned embodiments are only examples for implementing the utility model. It must be pointed out that the disclosed embodiments do not limit the scope of the present invention. On the contrary, modifications and equivalent arrangements included in the spirit and scope of the claims are included in the scope of the present invention.

Claims (10)

1. one kind is piled up and uses semiconductor package, and it is characterized in that: said piling up with semiconductor package comprises:
One substrate;
One chip is located at the upper surface of said substrate;
One protective layer is located at the upper surface of said substrate and is covered said chip, and the difference value of the thermal coefficient of expansion of said protective layer and said substrate is less than 5; And
Several conduction projections are arranged in the said protective layer and correspondence is connected to upper surface of base plate.
2. as claimed in claim 1 piling up used semiconductor package, it is characterized in that: said substrate and said protective layer comprise by glass fiber and pressing sheet that epoxy resin constituted jointly.
3. as claimed in claim 1 piling up used semiconductor package, it is characterized in that: the upper surface of said substrate is provided with several electrical junctions, and said conduction projection is that correspondence is located on the electrical junction of said substrate.
4. as claimed in claim 3 piling up used semiconductor package, it is characterized in that: said electrical junction is several connection pads.
5. as claimed in claim 3 piling up used semiconductor package, it is characterized in that: said conduction projection is connected on the electrical junction of said substrate through tin cream.
6. as claimed in claim 5 piling up used semiconductor package, it is characterized in that: said conduction projection is to be arranged in the said protective layer and to press to the embedded conduction projection on the electrical junction of said substrate.
7. as claimed in claim 6 piling up used semiconductor package, it is characterized in that: said conduction projection is selected from copper post projection or nickel post projection.
8. as claimed in claim 1 piling up used semiconductor package, it is characterized in that: the upper surface of said substrate is provided with several chip connecting portions; Said chip has an active surface, said active surface down and be provided with several chip pad, wherein said chip pad is through corresponding several chip connecting portions that electrically connect the upper surface of said substrate of projection.
9. as claimed in claim 1 piling up used semiconductor package, it is characterized in that: said protective layer upper surface is provided with the layer that reroutes, and the said layer one that reroute connects said conduction projection.
10. as claimed in claim 1 piling up used semiconductor package, it is characterized in that: each said conduction projection is arranged in the hole of said protective layer, and the aperture of described hole is less than 100 microns.
CN201220002043XU 2012-01-04 2012-01-04 Semiconductor package structure for stacking Expired - Lifetime CN202394881U (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103151274A (en) * 2013-01-31 2013-06-12 日月光半导体制造股份有限公司 Semiconductor element and its manufacturing method
CN103762186A (en) * 2013-12-20 2014-04-30 南通富士通微电子股份有限公司 Laminated packaging method for semiconductor
CN103779290A (en) * 2012-10-26 2014-05-07 宏启胜精密电子(秦皇岛)有限公司 Connecting substrate and laminating packaging structure
CN104124213A (en) * 2013-04-28 2014-10-29 无锡华润安盛科技有限公司 Method for balancing stress on DBC (Direct Bonding Copper) board and DBC board package structure
CN111063674A (en) * 2019-12-06 2020-04-24 中国电子科技集团公司第三十八研究所 PoP three-dimensional packaging-oriented vertical interconnection structure and manufacturing method
CN113140520A (en) * 2020-01-19 2021-07-20 江苏长电科技股份有限公司 Packaging structure and forming method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103779290A (en) * 2012-10-26 2014-05-07 宏启胜精密电子(秦皇岛)有限公司 Connecting substrate and laminating packaging structure
CN103779290B (en) * 2012-10-26 2016-12-21 碁鼎科技秦皇岛有限公司 Connect substrate and package-on-package structure
CN103151274A (en) * 2013-01-31 2013-06-12 日月光半导体制造股份有限公司 Semiconductor element and its manufacturing method
CN104124213A (en) * 2013-04-28 2014-10-29 无锡华润安盛科技有限公司 Method for balancing stress on DBC (Direct Bonding Copper) board and DBC board package structure
CN103762186A (en) * 2013-12-20 2014-04-30 南通富士通微电子股份有限公司 Laminated packaging method for semiconductor
CN103762186B (en) * 2013-12-20 2015-05-06 南通富士通微电子股份有限公司 Laminated packaging method for semiconductor
CN111063674A (en) * 2019-12-06 2020-04-24 中国电子科技集团公司第三十八研究所 PoP three-dimensional packaging-oriented vertical interconnection structure and manufacturing method
CN113140520A (en) * 2020-01-19 2021-07-20 江苏长电科技股份有限公司 Packaging structure and forming method thereof

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