CN202246314U - Polysilicon process water treatment system - Google Patents

Abstract

The utility model provides a polycrystalline silicon process water processing system, including former water pretreatment of water device, safety filter ware, reverse osmosis unit, EDI device, ultraviolet germicidal device, precision filter and the CDI device that communicates in proper order. The utility model discloses polycrystalline silicon process water processing system communicates in proper order through former pretreatment of water device, reverse osmosis unit, ultraviolet germicidal device, precision filter, EDI device etc. effectively gets rid of carbon dioxide, remaining trace ion, bacterium etc. in former aquatic, obtains to accord with polycrystalline silicon process water, and the play water yield is high, and impurity is few. The water treatment system for polysilicon production is simple to operate, stable in operation, capable of utilizing the concentrated water in a backflow mode, capable of improving the water utilization rate, saving water resources, environment-friendly and capable of reducing the production cost of polysilicon production water.

Description

A water treatment system for polysilicon production

technical field

The utility model belongs to the technical field of water purification treatment, in particular to a water treatment system for polysilicon production.

Background technique

In the production process of polysilicon (such as the previous production, slicing, and cleaning), a large amount of water is required, and the requirements for the water used are strict. However, the existing water for polysilicon production contains a small amount of harmful impurities such as organic impurities and salt ions, which are serious It affects the production efficiency of polysilicon and reduces the yield and quality. For example, the residual chlorine ions in the existing polysilicon production water can seriously affect the reaction speed of polysilicon and reduce its production efficiency.

In addition, in the current treatment process of polysilicon production water, the concentrated water generated by related equipment is directly discharged, which not only causes harm to the environment, but also wastes water resources and increases the production cost of polysilicon.

Utility model content

The technical problem to be solved by the utility model is to overcome the defects of the prior art and provide a polysilicon production water treatment system with simple operation, stable operation, less impurities in the treated ultrapure water and high water utilization rate.

In order to realize above-mentioned utility model purpose, the technical scheme of the utility model is as follows:

A water treatment system for polysilicon production, comprising a raw water pretreatment device, a security filter, a reverse osmosis device, an EDI device, an ultraviolet sterilizing device, a precision filter and a CDI device connected in sequence.

Preferably, the above-mentioned reverse osmosis device includes a primary high-pressure pump, a primary reverse osmosis device, a primary reverse osmosis water tank, a secondary high-pressure pump, a secondary reverse osmosis device, and a secondary reverse osmosis water tank connected in sequence. The pump communicates with the security filter, and the secondary reverse osmosis water tank communicates with the EDI device.

Further preferably, the concentrated water outlet of the EDI device communicates with the water inlet of the primary reverse osmosis water tank.

Further preferably, the concentrated water outlet of the above-mentioned CDI device communicates with the water inlet of the primary reverse osmosis water tank.

Further preferably, the water outlet of the above-mentioned primary high-pressure pump and/or secondary high-pressure pump is also provided with an electric slow opening valve.

Further preferably, the above polysilicon production water treatment system further includes a raw water tank and a raw water pump connected in sequence, and the raw water pump is connected to the raw water pretreatment device.

Still further preferably, the concentrated water outlet of the above-mentioned secondary reverse osmosis device communicates with the water inlet of the raw water tank.

Still further preferably, the polysilicon production water treatment system further includes a first heat exchanger, and the first heat exchanger is connected between the raw water pretreatment device and the security filter.

Specifically, the above-mentioned raw water pretreatment device includes a multimedia filter and an activated carbon filter connected in sequence, the activated carbon filter communicates with the first heat exchanger, and the multimedia filter communicates with the raw water pump .

Preferably, the water treatment system for polysilicon production further includes a second heat exchanger, a TOC removal device, a polishing mixed bed and a terminal filter connected in sequence.

The above water treatment system for polysilicon production is sequentially connected through raw water pretreatment device, reverse osmosis device, ultraviolet sterilizing device, precision filter, EDI device, etc., to effectively remove carbon dioxide, remaining trace ions, bacteria, etc. in the raw water, and obtain water that meets the requirements of polysilicon production. , high water yield, less impurities. The water treatment system for polysilicon production is simple in operation, stable in operation, and the concentrated water is refluxed for utilization, which improves water utilization, saves water resources, is environmentally friendly, and reduces the production cost of water for polysilicon production.

Description of drawings

Fig. 1 is a kind of optimal structure schematic diagram of the polysilicon production water treatment system of the embodiment of the utility model;

Fig. 2 is a schematic diagram of another preferred structure of the polysilicon production water treatment system according to the embodiment of the present invention.

Detailed ways

In order to make the technical problems, technical solutions and beneficial effects to be solved by the utility model clearer, the utility model will be further described in detail below in combination with the embodiments. It should be understood that the specific embodiments described here are only used to explain the utility model, and are not intended to limit the utility model.

The embodiment of the utility model provides a polysilicon production water treatment system with simple operation, stable operation, less impurities in the treated ultrapure water, and high water utilization rate. As shown in Figure 1 and Figure 2, the polysilicon production water treatment system includes a raw water pretreatment device 3, a security filter 5, a reverse osmosis device 6, an EDI device 7, an ultraviolet sterilizing device 8, a precision filter 9 and a CDI device 10. In this way, the polysilicon production water treatment system is sequentially connected through the raw water pretreatment device 3, the security filter 5, the reverse osmosis device 6, the EDI device 7, the ultraviolet sterilizing device 8, the precision filter 9 and other devices to effectively remove carbon dioxide, The remaining trace ions, bacteria, etc., can be obtained as water for polysilicon production, with high water yield and less impurities. The water treatment system for polysilicon production is simple in operation, stable in operation, concentrated water can be refluxed and utilized, has a high water utilization rate, saves water resources, is environmentally friendly, and reduces the production cost of water for polysilicon production. Among them, the raw water pretreatment device 3 can initially remove suspended solids, particulate impurities and chroma contained in the raw water, and ensure the safety of the security filter 5; the security filter 5 further purifies the primary treated raw water, Ensure the safety and working efficiency of the reverse osmosis device 6, and ensure the stable operation of the system; the reverse osmosis device 3 can effectively remove the salt dissolved in the raw water; the ultraviolet sterilizing device 8 can effectively kill and remove impurities such as microorganisms in the raw water; EDI The device 7 and the CDI device 10 can effectively remove ions in the raw water treated by the reverse osmosis device 3, and the ultrapure water obtained after being treated by the CDI device 10 can be directly introduced into the polysilicon production workshop for production and utilization.

Preferably, as shown in Figure 1, as an embodiment of the present utility model, the above-mentioned reverse osmosis device 6 includes a first-stage high-pressure pump 61, a first-stage reverse osmosis device 62, a first-stage reverse osmosis water tank 63, and a second-stage high-pressure pump connected in sequence. Pump 64, secondary reverse osmosis device 65 and secondary reverse osmosis water tank 66. Wherein, the primary high-pressure pump 61 communicates with the security filter 5, the secondary reverse osmosis water tank 66 communicates with the EDI device 7, and the concentrated water outlets of the EDI device 7 and the CDI device 10 communicate with the water inlet of the primary reverse osmosis water tank 62 respectively, The ultrapure water produced by the CDI device 10 is sent to the polysilicon production workshop through the first ultrapure water tank 11 and the first ultrapure water pump 12 sequentially connected to the water outlet of the CDI device 10 , as shown in FIG. 1 . The reverse osmosis device 6 adopts a two-stage reverse osmosis system, which can effectively remove the salinity in the raw water treated by the security filter 5 . The concentrated water produced by the primary reverse osmosis device 62 can be introduced into a concentrated water storage tank or a concentrated water tank for backwashing, greening, toilet flushing, etc. of the raw water pretreatment device 3 . The concentrated water produced by the secondary reverse osmosis device 65 is preferably introduced into the raw water pretreatment device 3 for backflow and utilization, so as to improve the utilization rate of the raw water of the polysilicon production water treatment system, save water resources and protect the environment. The first-stage high-pressure pump 61 and the second-stage high-pressure pump 64 respectively provide the required reverse osmosis water pressure for the first-stage reverse osmosis device 62 and the second-stage reverse osmosis device 65 to improve reverse osmosis efficiency. The first-stage reverse osmosis water tank 63 and the second-stage reverse osmosis water tank 66 can effectively adjust the water level in the water tanks to ensure the normal operation of the first-stage high-pressure pump 61 and the second-stage high-pressure pump 64 .

Further preferably, in the above preferred embodiment, as shown in FIG. 1 , the concentrated water outlets of the EDI device 7 and the CDI device 10 communicate with the water inlet of the primary reverse osmosis water tank 63 respectively. In this way, the concentrated water produced by the EDI device 7 and the CDI device 10 is refluxed, and the deionization treatment of the secondary reverse osmosis device 65, the EDI device 7 and other devices can be recycled, which improves the efficiency of the polysilicon production water treatment system. The utilization rate of raw water saves water resources, protects the environment, and reduces the production cost of polysilicon production water. Certainly, the concentrated water outlet of any one of the EDI device 7 and the CDI device 10 may also be connected to the water inlet of the primary reverse osmosis water tank 63 according to actual production conditions.

Further preferably, in the above-mentioned preferred embodiment, as shown in FIG. 1 , the above-mentioned polysilicon production water treatment system further includes a raw water tank 1, a raw water pump 2 and a first heat exchanger 4 connected in sequence, and the raw water pretreatment device 3 includes sequentially Connected multimedia filter 31, activated carbon filter 32. Wherein, the raw water pump 2 communicates with the multimedia filter 31 in the raw water pretreatment device 3 , and the activated carbon filter 32 communicates with the first heat exchanger 4 and the safety filter 5 in turn. The raw water pump 2 provides the required water pressure for the raw water pretreatment device 3 . At this time, the concentrated water produced by the secondary reverse osmosis device 65 in the above-mentioned preferred embodiment is returned to the raw water tank 1 to mix with the raw water, and then sent to the raw water pretreatment device 3 through the raw water pump 2 for re-purification treatment, thereby The water utilization rate of the polysilicon production water treatment system is further improved. The multimedia filter 31 can preliminarily purify the raw water, remove suspended solids and particulate impurities in the raw water; the activated carbon filter 32 can further absorb and filter impurities in the raw water, so that the raw water filtered by the activated carbon filter 32 is completely Satisfy the water quality requirements of the security filter 5, reduce the load of the security filter 5, and ensure the working efficiency of the security filter 5. The first heat exchanger 4 can control the temperature of the waste water within a certain range, which is beneficial to the water production rate of the security filter 5 and the reverse osmosis device 3 (especially when the ambient temperature is low). The raw water filtered by the activated carbon filter 32 is filtered by the security filter 5 to further purify the water to ensure the safety and working efficiency of the reverse osmosis device 6 .

Further preferably, in the above-mentioned preferred embodiment, as shown in FIG. 1 , the water outlet of the primary high-pressure pump 61 and/or the secondary high-pressure pump 64 is also provided with an electric slow opening valve (not shown in the figure). The electric slow opening valve can effectively reduce the impact on the reverse osmosis membrane in the first-stage reverse osmosis device 62 and the second-stage reverse osmosis device 65 after the high-pressure pump is started, reduce the damage to the reverse osmosis membrane, and prolong the life of the reverse osmosis device 6. Service life, while meeting the needs of different periods.

Preferably, as shown in Figure 2, as another embodiment of the present invention, the above-mentioned water treatment system for polysilicon production, in addition to all the devices in the previous embodiment, also includes a second heat exchanger 15, TOC Removal device 16, polishing mixed bed 17 and terminal filter 18. The second heat exchanger 15 can control the temperature of the ultrapure water treated by the CDI device 10 within a certain range, which is beneficial to the water production rate of the TOC removal device 16 and the polishing mixed bed 17 . TOC removal device 16, polishing mixed bed 17 and terminal filter 18 further purify ultrapure water and improve the quality of ultrapure water to meet the requirements of higher water quality procedures in the polysilicon production process. Ultrapure water can be directly introduced to the polysilicon production workshop. In addition, in this embodiment, the second ultrapure water tank 13 and the second ultrapure water pump 14 may also be sequentially connected between the CDI device 10 and the second heat exchanger 15, and the second ultrapure water pump 14 is the second ultrapure water pump 14. Heat exchanger 15, TOC removal device 16, polishing mixed bed 17 and terminal filter 18 provide the required water pressure. In order to further improve the water quality of the ultrapure water, the water outlet of the terminal filter 18 can also be connected with the water inlet of the second ultrapure water tank 13, so that the ultrapure water can flow back for further purification. In addition, in the above-mentioned embodiment, the outlet for ultrapure water can be set at the water outlet of the CDI device 10 and the water outlet of the final filter 18 at the same time, wherein the ultrapure water outlet at the water outlet of the CDI device 10 The water outlet of water is connected with the first ultrapure water tank 11 and the first ultrapure water pump 12 in sequence, as shown in FIG. 2 .

In each of the above-mentioned embodiments, the water treatment system for polysilicon production is preferably also equipped with an automatic control system (not shown in the figure). The safety of system operation, remote control and local control set priority control, local control takes precedence over remote control, system settings exceed limits and fault alarms, and will automatically alarm when a certain parameter of the system cannot meet the requirements or the equipment fails , in order to inform the maintenance personnel of the pure water station to repair and maintain the equipment in time, put the equipment into operation in time, and record the data of the system operation completely, so as to provide a strong basis for the maintenance of the equipment in the future.

In each of the above-mentioned embodiments, the cleaning of devices such as the first-stage reverse osmosis device 62 and the second-stage reverse osmosis device 65 in the EDI device 7, the ultraviolet sterilizing device 8, and the reverse osmosis device 6 all preferably adopt the mode of segmental cleaning, avoiding the Secondary pollution during the cleaning process, and basically does not affect the water production. The reverse osmosis device 6 preferably adopts the automatic flushing mode of a separate fast-flush water pump, which not only can perform effective automatic low-pressure and high-flow surface flushing on the membrane group during operation, but also automatically exhausts the membrane group before the system starts, reducing Membrane damage, when the system stops running, the operation mode of automatic concentrated water replacement of the system, the water produced by the primary reverse osmosis device 62 and the secondary reverse osmosis device 65 are all equipped with effective bursting membranes (not shown in the figure) , at the same time adopt double overpressure protection, use pressure detection and solenoid valve (not shown in the figure) matching pressure is too high, automatic pressure relief device, to prevent membrane damage caused by misoperation (caused by the requirements of serial and parallel) . The reverse osmosis device 6 and its related auxiliary equipment all adopt a single-group corresponding mode. The high-pressure pump, reverse osmosis membrane group and related instruments are fully configured in a single group, which is convenient for system control, self-monitoring and testing.

In the above-mentioned embodiments, the raw water pump 2, the first ultrapure water pump 11 and the second ultrapure water pump 14 are preferably GRUNDFOS and LOWARA brand water pumps, and the primary high-pressure pump 61 and the secondary high-pressure pump 64 are preferably vertical stainless steel multi-stage Water pumps, reverse osmosis membranes in the first-stage reverse osmosis device 62 and the second-stage reverse osmosis device 65 use American Hyde Energy PROC10 and CPA3-LD reverse osmosis membranes, the EDI device 7 is preferably IONPURE imported from the United States, and the ultra-pure water part equipment UV185 , UV254 chooses the world's best Aquafine brand imported from the United States. The security filter 5 preferably adopts a quick-opening manufacturing mode, and adopts a quick-installing mode in the design and manufacturing process, so that it can be more convenient and faster to replace the filter element, saving the replacement time. In addition, the above-mentioned first ultrapure water tank 11 Both the second ultrapure water tank 13 and the second ultrapure water tank 13 are preferably provided with a nitrogen sealing device, which can effectively isolate air pollution. Each device is connected by pipelines, and the pipelines connecting each device are preferably flexibly selected according to different pressures. For example, the pipelines connecting each device between the EDI device 7 and the polishing mixed bed 17 are preferably clean-pvc pipes of the ultrapure water system. The pipes connecting the reverse osmosis device 6 are preferably made of stainless steel pipes. The classification of the pipe materials meets the requirements of the process system, taking into account the economy and rationality of the polysilicon production water treatment system, and reduces the cost of the polysilicon production water treatment system. Save investment.

The above descriptions are only preferred embodiments of the present utility model, and are not intended to limit the present utility model. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present utility model shall be included in this utility model. within the scope of protection of utility models.

Claims (10)

1. A water treatment system for polysilicon production, comprising a raw water pretreatment device, a security filter, a reverse osmosis device, an EDI device, an ultraviolet sterilizing device, a precision filter and a CDI device connected in sequence. 2. The water treatment system for polysilicon production as claimed in claim 1, wherein the reverse osmosis device comprises a first-stage high-pressure pump, a first-stage reverse osmosis device, a first-stage reverse osmosis water tank, a second-stage high-pressure pump, A secondary reverse osmosis device and a secondary reverse osmosis water tank, the primary high pressure pump communicates with the security filter, and the secondary reverse osmosis water tank communicates with the EDI device. 3. The water treatment system for polysilicon production according to claim 2, wherein the concentrated water outlet of the EDI device communicates with the water inlet of the primary reverse osmosis water tank. 4. The water treatment system for polysilicon production according to claim 2, characterized in that the concentrated water outlet of the CDI device communicates with the water inlet of the primary reverse osmosis water tank. 5 . The water treatment system for polysilicon production according to claim 2 , wherein the water outlet of the primary high-pressure pump and/or the secondary high-pressure pump is also provided with an electric slow-opening valve. 6 . The water treatment system for polysilicon production according to claim 2 , further comprising a raw water tank and a raw water pump connected in sequence, and the raw water pump communicates with the raw water pretreatment device. 7. The water treatment system for polysilicon production according to claim 6, wherein the concentrated water outlet of the secondary reverse osmosis device communicates with the water inlet of the raw water tank. 8. The water treatment system for polysilicon production according to claim 6, further comprising a first heat exchanger, the first heat exchanger being connected between the raw water pretreatment device and the security filter. 9. The water treatment system for polysilicon production according to claim 8, wherein the raw water pretreatment device comprises a multimedia filter and an activated carbon filter connected in sequence, and the activated carbon filter is connected to the first The heat exchanger is in communication, and the multimedia filter is in communication with the raw water pump. 10. The water treatment system for polysilicon production according to claim 1, further comprising a second heat exchanger, a TOC removal device, a polishing mixed bed and a terminal filter connected in sequence.