CN202189222U - Photomask cleaning device - Google Patents

Abstract

The present invention relates to a mask cleaning device, and more particularly, to a mask cleaning device capable of effectively removing particles and atomized stains attached to a flange of any side of a mask and on a side edge of an outer frame of the flange side; the photomask cleaning device at least comprises a photomask lifting group, a cleaning chuck group, a horizontal displacement group, a cleaning area and a dispenser, can effectively and rapidly remove flanges on any side of the photomask and particles and atomized stains attached to the side edge of an outer frame on the flange side, can save labor and wastewater treatment cost and shorten photomask cleaning time, and further can ensure the cleanliness of the photomask after cleaning, so as to be beneficial to improving the yield of semiconductor manufacturing processes.

Description

Mask cleaning device

technical field

The utility model relates to a photomask cleaning device which cleans the photomask by wiping, in particular to a device which can effectively remove particles and fog attached to the flange on either side of the photomask and the side of the outer frame on the flange side. A photomask cleaning device that eliminates stains.

Background technique

When entering the new century, human life has entered the field of the digital age. Many objects and appliances around us are replaced by digital high-tech products, which not only bring people a lot of convenience, but also enjoy the achievements of high-tech civilization and progress. In the era of digitalization, most electrical items and appliances are related to digital technology or even directly controlled by high-tech IC chips to achieve the purpose of automation. Therefore, some people claim that IC chips are the mother of industries, and IC chips are made of extremely It is composed of precise integrated circuits, and its manufacturing process is completed by using a photomask in a clean room environment and using a high-precision machine to perform high-precision lamination operations on silicon wafers. The manufacturing cost of the machine, workshop, etc. is It is very expensive. Therefore, in the process of manufacturing chips, the product yield rate can determine whether a semiconductor factory is profitable or not. Therefore, it is the most important issue for every semiconductor factory operator to devote itself to improving the product yield rate.

One of the most important factors affecting the yield rate of wafers is whether the mask is polluted. If there are dust particles on the mask, it will cause the contaminated mask to be used in the semiconductor lithography process. Therefore, in order to keep the mask clean, a Pellicle is generally installed on the mask to prevent dust particles from adhering to the mask, while the photomask The mask pellicle is supported by the frame to keep a distance from the photomask, so that the dust particles falling on the photomask are collected on the photomask pellicle, and the lithography process produces a considerable degree of image distortion due to the photomask pellicle, making the photomask Dust particles will not affect the original lithography process.

In the existing photomask cleaning method, a cleaning treatment is performed on the surface of a photomask by manual means. A cleaner places the photomask firmly on a frame, rinses the surface of the photomask with a cleaning solution [such as acetone, ethanol, deionized water, etc.], and brushes off the photomask with a brush The particulate matter on the surface; then, rinse the surface of the photomask with the cleaning solution again, repeat the above-mentioned cleaning steps for several times, and then dry the photomask, thereby removing impurities or residues on the surface of the photomask, and then Ensure the cleanliness of the mask surface.

Generally speaking, the cleaning methods of the above-mentioned existing photomasks have the following disadvantages, for example: each cleaning staff needs to be exposed to the working environment of the cleaning solution for a long time when cleaning the photomask, and it is very easy to inhale or directly contact the chemical substance. , and affect the health of the cleaning personnel; in addition, the cleaning liquid is usually an organic solvent, which needs to be managed and disposed of in a centralized manner, so an additional waste liquid collection device must be added to avoid pollution caused by random discharge. Based on the above reasons, it is indeed necessary to further improve the above-mentioned existing photomask cleaning methods.

Utility model content

In order to solve the above problems, this utility model is based on the above-mentioned current common deficiencies and after overall consideration, it is hoped that the photomask cleaning structure provided by the utility model can simultaneously protect the personal safety of the cleaning personnel, also maintain the cleanliness of the photomask, and can Quickly and effectively shorten the cleaning time, which is beneficial to the use of semiconductor factories and can further improve the efficiency of semiconductor process yield.

A main purpose of this utility model is to provide a device for cleaning the photomask by wiping, which uses the wipe cloth in the wet cleaning area, and at the same time uses the horizontal displacement group and the cleaning chuck group to place the photomask to be cleaned horizontally Move back and forth on the track formed by the displacement group, so that the mask cleaning device can directly wipe the flange on either side of the mask and the side of the outer frame on the flange side with a damp cloth, so as to effectively remove particles and atomized stains , and then move the photomask to be cleaned to the dry cleaning area. At this time, use the dry wipe cloth on the dry cleaning area to wipe off the water stains on the surface, so that the photomask will not leave cleaning water marks or stains after cleaning. Hood cleaning device.

Another main purpose of the present utility model is to provide a mask cleaning device with a wet cleaning zone and a dry cleaning zone two-stage cleaning zone to clean the mask, which can effectively clean the flange on either side of the mask and the flange Particles or atomized stains attached to the side of the side frame, and no cleaning water marks or atomized stains remain after cleaning.

Another main purpose of the present utility model is to provide a photomask cleaning device, which can directly wipe and remove the particles and atomized stains attached to the flange surface on either side of the photomask, and can also be cleaned simultaneously The side of the frame on the flange side of the reticle, cleaning both at the same time, helps to improve cleaning efficiency.

Another main purpose of the present utility model is to provide a photomask cleaning device that can directly wipe off the particles and atomized stains on the surface of the photomask without using a large amount of organic cleaning liquid and without generating a large amount of waste liquid to be treated. Under the premise of cleaning the photomask, it can also maintain environmental safety and reduce processing costs.

According to the above purpose, the utility model provides a photomask cleaning device, which includes: a frame, a horizontal displacement group, which is located on the upper side of the frame, formed by a pair of transmission tracks, and a cleaning chuck group, which is located on the horizontal Above the displacement group, pivotally connected with both ends of the horizontal displacement group, a cleaning area is located in the transmission track formed by the horizontal displacement group, which consists of a wet cleaning area on one side of the cleaning area and a dry cleaning area on the opposite side The area is composed of a dispensing machine, which is located under the cleaning area and is used to control the water output of the wet cleaning area in the cleaning area. A photomask lifting group is located on one side of the frame and is lifted by mechanical action. .

Beneficial effects of the utility model: the photomask cleaning device provided by the utility model can effectively clean particles or atomized stains attached to the flange on either side of the photomask and the side of the outer frame on the flange side, and Cleans without leaving traces of cleaning water or atomizing stains.

Description of drawings

Fig. 1 is the overall structure schematic diagram of the photomask cleaning device of the present utility model;

2 is a schematic diagram of the cleaning area of the mask cleaning device of the present invention;

3 is a partial schematic diagram of the wet cleaning area of the cleaning area of the photomask cleaning device of the present invention;

Fig. 4 is a partial schematic view of the dry cleaning area in the cleaning area of the photomask cleaning device of the present invention;

FIG. 5 is a schematic diagram of the relative positions of the mask and the cleaning area of the mask cleaning device of the present invention.

Description of main component symbols

Mask cleaning device 10

frame 11

Horizontal displacement group 20

Track 21

Cleaning chuck set 30

Cleaning area 40

Wet cleaning area 50

Dry cleaning area 60

Dispenser 70

Mask lifting group 80

Wet process unit 51

Outlet head 52

Wiping cloth 53

Drainage device 54

Dry process unit 61

Mask 90

Frame 100

Detailed ways

In order to have a more complete and clear disclosure of the technical content used in the utility model, the purpose of the utility model and the effects achieved, it will be described in detail below, and please also refer to the disclosed diagrams and figure numbers.

Please refer to Fig. 1 for a specific embodiment of the present utility model, a photomask cleaning device 10, its main structure includes: a frame 11, a horizontal displacement group 20, is to be positioned at the upper side of frame 11, by a pair of transmission tracks 21 Formed, a cleaning chuck group 30 is located above the horizontal displacement group 20, pivotally connected with the two ends of the horizontal displacement group 20, and a cleaning area 40 is located in the transmission track 21 formed by the horizontal displacement group 20, which is formed by The wet cleaning area 50 on one side of the cleaning area 40, and the dry cleaning area 60 on the other side, the dispenser 70 is located below the cleaning area 40 and is used to control the wet cleaning area 50 in the cleaning area 40. The water output and a photomask lifting group 80 are located on one side of the frame 11 and are lifted by mechanical actuation.

Now supplemented by the disclosed diagrams, the cleaning process of the mask 90 is described as follows: firstly, the mask 90 to be cleaned is placed on the mask lifting group 80, and then the cleaning chuck group 30 is moved to the top of the mask lifting group 80 And clamp the mask 90, and the initial position of the mask 90 clamped by the cleaning chuck group 30 determines the size of the area to be cleaned, and the horizontal displacement group 20 is driven by a screw, and the screw can drive the cleaning chuck at the same time group 30, and transport the photomask 90 to be cleaned to the cleaning area 40 for cleaning.

For determining the area to be cleaned of the photomask 90, refer to FIG. 5, which is a schematic diagram of the relative positions of the photomask and the cleaning area of the photomask cleaning device of the present invention, from which it can be seen that the main position for cleaning the photomask 90 lies in the photomask The flange on either side of 90 and the side of the outer frame 100 on the flange side, and the size of the cleaning area on the flange side of the photomask 90 is defined by the initial clamping position of the cleaning chuck set 30 to define the cleaning area.

Then please refer to FIG. 2 , when the process of cleaning the photomask 90 starts, the photomask 90 to be cleaned is first moved to the cleaning area composed of the dry cleaning area 60 and the wet cleaning area 50 with the cleaning chuck set 30 40, the cleaning action is performed. The cleaning procedure is first to move the photomask 90 to be cleaned to the wet cleaning area 50, and then please refer to FIG. The wet process unit 51 is composed of a water outlet 52, a wiping cloth 53, and a drainage device 54, and the two wet process units 51 are arranged in opposite directions.

When performing the cleaning process, the water nozzle 52 of the wet process unit 51 will first discharge about 0.5-1 cc of water. After the wiping cloth 53 is wetted, the mask 90 is cleaned. The material of the wiping cloth 53 may be self-absorbent, And dust-free cloth, dust-free paper, etc. that do not produce particles or fiber peeling are not limited here. At this time, it is the transmission track formed by the cleaning chuck group 30 that has clamped the photomask 90 in the horizontal displacement group 20. 21, adopt the method of moving back and forth to clean, first put the photomask 90 to be cleaned on the wet cleaning area 50, wipe it back and forth with the soaked wiping cloth 53, and then transport it to the dry cleaning area 60, and then remove the excess water stains After cleaning, the test results show that the photomask 90 can reach the cleanliness level with only 0.5μm particle size particles less than one particle per cubic foot, which is the so-called class 1 level of the general clean room.

In the wet cleaning area 50, the water output of the water outlet 52 is controlled by the glue dispenser 70, and the amount of deionized water (DI water) used for cleaning the mask 90 each time is about 0.5-1 cc. If the water output is too much It may infiltrate into the pattern area on the photomask 90, and once the photomask 90 pattern is destroyed, the photomask 90 is equal to being discarded and cannot be used again, so the water output of the water outlet head 52 must be carefully controlled each time.

And the drainage device 54 in the wet cleaning area 50 is to take the way of absorbing or removing moisture to remove too much moisture, and can simultaneously perform air extraction when removing moisture to prevent water droplets from penetrating into the pattern area of the photomask 90, and wipe The cloth 53 is placed tightly by means of the upper and lower frames engaging with each other, so as to maintain the tension of the wiping cloth 53 during the cleaning process of the mask 90, so that the tension of the wiping cloth 53 can be kept consistent each time the mask 90 is wiped back and forth.

Then please refer to shown in Figure 4, which is the dry cleaning area 60 of the present utility model. This area is composed of two dry process units 61, and the dry process unit 61 is composed of a wiping cloth 53 and a drainage device 54. , and the two dry process units 61 are also arranged in opposite directions.

The drainage device 54 in the dry cleaning area 60 can also adopt the method of absorbing or removing water to remove the remaining water on the surface of the photomask 90, and can simultaneously perform air pumping when removing the water, so as to prevent water droplets from penetrating into the pattern area of the photomask 90 , in order to protect the photomask 90, and the wiping cloth 53 is placed tightly by means of the upper and lower frames engaging each other, so as to maintain the tension of the wiping cloth 53 during the cleaning process of the photomask 90, so that each time the photomask 90 moves back and forth Under wiping, the tension of the wiping cloth 53 can be kept consistent.

What is more worth mentioning is the design of the cleaning area 40 here. The central hollowed out part is to prevent the excess particles that have been removed from settling on it. Dust is raised, which affects the cleanliness of the mask 90 after cleaning.

The photomask cleaning device 10 mentioned in the utility model is a part of the overall cleaning process of the photomask 90, which can be further processed by adding air knives, water knives and various cleaning devices to facilitate the follow-up cleaning procedure of the photomask 90. for complete.

Although the utility model is disclosed as above with the aforementioned preferred embodiments, it is not intended to limit the utility model, and anyone familiar with similar skills can make some changes and changes without departing from the spirit and scope of the utility model. Retouching, so the patent protection scope of the utility model must be defined by the claims attached to this specification.

Claims (9)

1. a light shield cleaning device is characterized in that, comprising:

One framework;

One horizontal shift group is the upside that is positioned at this framework, is formed by a pair of transporting rail;

One cleans the chuck group, is to be positioned at this horizontal shift group top, with the two ends pivot joint of this horizontal shift group;

One clear area is to be arranged in this horizontal shift group to form this transporting rail, and it is the wet-cleaning district by this clear area one side, and the dry cleaning district of relative opposite side forms;

One point gum machine is to be positioned at this below, clear area, is used for controlling the aquifer yield in this wet-cleaning district, this clear area;

One light shield up-down group is a side that is positioned at this framework, and is to adopt the mechanical actuation mode to go up and down.

2. light shield cleaning device as claimed in claim 1 is characterized in that, this wet-cleaning district in this clear area is made up of two wet process unit.

3. light shield cleaning device as claimed in claim 2 is characterized in that, this wet process unit is made up of a Water outlet, a cleaning wiping cloth and a drainage arrangement, and this two wet process unit is to be the relative direction configuration.

4. light shield cleaning device as claimed in claim 1 is characterized in that, this dry cleaning district in this clear area is made up of two drying journey unit.

5. light shield cleaning device as claimed in claim 4 is characterized in that, this two drying journeys unit by a cleaning wiping cloth, and a drainage arrangement form, and this two drying journeys unit is to be relative direction to dispose.

6. like claim 3 or 5 described light shield cleaning devices, it is characterized in that this cleaning wiping cloth is by selecting in the combination: from the tool absorbability and do not produce particulate or non-dust cloth or dust-free paper that fiber peels off.

7. like claim 3 or 5 described light shield cleaning devices, it is characterized in that this cleaning wiping cloth is to adopt upper and lower frames to engage mode mutually it is tightened arrangement, is maintained at the tension force of cleaning wiping cloth in the photomask clean process.

8. light shield cleaning device as claimed in claim 3 is characterized in that, this Water outlet aquifer yield is to control the deionized water aquifer yield that each photomask clean uses by this point gum machine.

9. like claim 3 or 5 described light shield cleaning devices, it is characterized in that this drainage arrangement is configurable in this wet-cleaning district; Adopt and absorb or eliminating moisture mode; Excess moisture is removed, and can the effect of bleeding simultaneously when removing moisture, avoid water droplet to infilter the light mask image district.

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