CN202054887U - Deposition system for pulse laser - Google Patents
Deposition system for pulse laser Download PDFInfo
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- CN202054887U CN202054887U CN201120009949XU CN201120009949U CN202054887U CN 202054887 U CN202054887 U CN 202054887U CN 201120009949X U CN201120009949X U CN 201120009949XU CN 201120009949 U CN201120009949 U CN 201120009949U CN 202054887 U CN202054887 U CN 202054887U
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- rotating shaft
- galvanometer
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- substrate
- pulse laser
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- 230000008021 deposition Effects 0.000 title claims 9
- 239000000758 substrate Substances 0.000 claims abstract 12
- 239000013077 target material Substances 0.000 claims 1
- 238000004549 pulsed laser deposition Methods 0.000 abstract 2
- 238000005516 engineering process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
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Abstract
本实用新型适用于激光技术领域，提供了一种脉冲激光沉积系统，所述脉冲激光沉积系统包括用于产生脉冲激光的激光器、使所述脉冲激光投射于靶材的振镜、将所述脉冲激光聚焦于所述靶材的聚焦镜、驱动所述振镜振动的振镜转轴、驱动所述靶材旋转的靶材转轴以及驱动基片旋转的基片转轴，所述振镜倾斜设置于所述振镜转轴，所述振镜转轴与投射于所述振镜的脉冲激光束共线，称为同轴振镜；所述靶材转轴和基片转轴不共线。本实用新型采用同轴振镜扫描，各脉冲激光于振镜上的入射角相同，反射率不变，经振镜反射后的能量一致；振镜振动过程中各脉冲激光于靶材上的光斑大小相同，因而产生羽辉的成份、能量及其角度分布一致，沉积薄膜的均匀性佳。
The utility model is applicable to the field of laser technology and provides a pulsed laser deposition system. The pulsed laser deposition system includes a laser for generating pulsed lasers, a vibrating mirror for projecting the pulsed lasers on a target, and a The laser is focused on the focusing mirror of the target, the oscillating mirror rotating shaft driving the vibrating mirror, the target rotating shaft driving the target rotating, and the substrate rotating shaft driving the substrate rotating. The vibrating mirror is arranged obliquely on the The rotating shaft of the vibrating mirror is collinear with the pulsed laser beam projected on the vibrating mirror, which is called a coaxial vibrating mirror; the rotating shaft of the target and the substrate are not collinear. The utility model adopts coaxial galvanometer scanning, the incident angle of each pulse laser on the galvanometer is the same, the reflectivity is constant, and the energy reflected by the galvanometer is consistent; the spot of each pulse laser on the target during the vibration process of the galvanometer The size is the same, so the composition, energy and angle distribution of the plume are consistent, and the uniformity of the deposited film is good.
Description
Technical field
The utility model belongs to laser technology field, relates in particular to a kind of impulse laser deposition system.
Background technology
Pulsed laser deposition (Pulsed Laser Deposition, PLD) be one of method for preparing the high-quality thin film material of developing rapidly in recent years, it has special advantages, but for example prepared composition complexity, fusing point height, film that hardness is big, and film is consistent with the composition of target, film and substrate strong adhesion, compact structure, crystalline quality height, parameter is flexible, widely applicable or the like.But,, have certain difficulty aspect the preparation large area uniform film because LASER SPECKLE is little.
At present, move target or substrate with Controlling System and realize that uniform thin film is a kind of comparatively effectively solution, but system complex, the cost height.And the laser spot microtrabeculae that etching forms on target can cause the direction of plumage brightness deflection incident laser under normal conditions, has influenced the homogeneity of film thickness and composition.Another kind of scheme is that the control LASER SPECKLE scans at target material surface, but all there are some inevitable shortcomings in the present device, incide on the speculum such as laser, because the deflection of speculum makes the input angle of laser constantly change, reflectivity is also in continuous variation, cause the different positions of laser on target to have different energy, influenced the homogeneity of film; More seriously, because galvanometer deflection makes laser each point of application on target different to the distance of condensing lens, cause the LASER SPECKLE size also different, the power density of laser is also just inequality at different point of application, finally causes uniformity of film poor.
The utility model content
The purpose of the utility model embodiment is to provide a kind of impulse laser deposition system, is intended to solve the problem that adopts the uniformity of film difference that existing impulse laser deposition system prepares.
The utility model embodiment realizes like this, a kind of impulse laser deposition system, comprise the laser apparatus that is used to produce pulse laser, make described pulse laser be projeced into the galvanometer of target, with the condensing lens of described pulse laser focusing in described target, drive the galvanometer rotating shaft of described galvanometer vibration, the target rotating shaft and the drive substrate that drive described target rotation make its substrate rotating shaft with respect to described target rotation, described galvanometer is obliquely installed in described galvanometer rotating shaft, described galvanometer rotating shaft be projeced into the pulse laser beam conllinear of described galvanometer, and be parallel to described target rotating shaft and substrate rotating shaft; Each rotating shaft is all around its axis rotation.
The utility model embodiment adopts coaxial vibration mirror scanning, galvanometer is obliquely installed in the galvanometer rotating shaft, make the pulse laser and galvanometer rotating shaft conllinear (coaxial) that are projeced into galvanometer, the galvanometer rotating shaft drives the galvanometer vibration around its axis rotation, the input angle of each pulse laser on galvanometer is identical, reflectivity is constant, the energy coincidence after vibration mirror reflected; Each pulse laser is the bus of same circular cone through the formed track of vibration mirror reflected, point of application on target equates to the distance of condensing lens is strict, the spot size of each pulse laser on target is identical in the galvanometer vibration processes, thereby composition, energy and the angular distribution unanimity thereof of generation plumage brightness, the homogeneity of deposit film is good.
Description of drawings
Fig. 1 is the structural representation of the impulse laser deposition system that provides of the utility model embodiment;
Fig. 2 is the scanning pattern figure of the pulse laser that provides of the utility model embodiment;
Fig. 3 is the contrast effect figure of the pld (pulsed laser deposition) that provides of the utility model embodiment.
Embodiment
In order to make the purpose of this utility model, technical scheme and advantage clearer,, the utility model is further elaborated below in conjunction with drawings and Examples.Should be appreciated that specific embodiment described herein only in order to explanation the utility model, and be not used in qualification the utility model.
The utility model embodiment adopts coaxial vibration mirror scanning, galvanometer is obliquely installed in the galvanometer rotating shaft, make the pulse laser and galvanometer rotating shaft conllinear (coaxial) that are projeced into galvanometer, the galvanometer rotating shaft drives the galvanometer vibration around its axis rotation, the input angle of each pulse laser on galvanometer is identical, reflectivity is constant, the energy coincidence after vibration mirror reflected; Each pulse laser is the bus of same circular cone through the formed track of vibration mirror reflected, point of application on target to the distance of condensing lens equates, the spot size of each pulse laser on target is identical in the galvanometer vibration processes, thereby composition, energy and the angular distribution unanimity thereof of generation plumage brightness, the homogeneity of deposit film is good.
The impulse laser deposition system that the utility model embodiment provides comprises the laser apparatus that is used to produce pulse laser, make described pulse laser be projeced into target galvanometer, described pulse laser focusing is made its substrate rotating shaft with respect to described target rotation in the condensing lens of described target, the galvanometer rotating shaft that drives described galvanometer vibration, the target rotating shaft that drives described target rotation and drive substrate, described galvanometer is obliquely installed in described galvanometer rotating shaft, described galvanometer rotating shaft be projeced into the pulse laser beam conllinear of described galvanometer, and be parallel to described target rotating shaft and substrate rotating shaft; Each rotating shaft is all around its axis rotation.
Below in conjunction with specific embodiment realization of the present utility model is described in detail.
As shown in Figure 1, the impulse laser deposition system that provides of the utility model embodiment comprise the laser apparatus (not shown) that is used to produce pulse laser 1, make this pulse laser 1 be projeced into target 8 galvanometer 3, this pulse laser 1 focused on the condensing lens 2 of target 8, the galvanometer rotating shaft 4 that drives these galvanometer 3 vibrations, the target rotating shaft 9 that drives these target 8 rotations and drive substrate 6 make its substrate rotating shaft 5 with respect to target 8 rotations.This galvanometer 3 is obliquely installed in galvanometer rotating shaft 4, this galvanometer rotating shaft 4 and pulse laser beam 1 conllinear (coaxial) that is projeced into galvanometer 3, and be parallel to target rotating shaft 9 and substrate rotating shaft 5.
Among the utility model embodiment, pulse laser 1 line focus mirror 2 is projected to galvanometer 3, and in galvanometer 3 vibration processes, the angle of its incident beam and galvanometer normal is constant, and promptly the input angle α on galvanometer is constant.When pulse laser is natural light polarization or circularly polarized light, invariable incident angle, reflectivity is constant, and promptly each pulse laser energy after galvanometer 3 reflections is identical.
As shown in Figure 2, galvanometer rotating shaft 4 drives galvanometer 3 and rotates a circle around its axis rotation, and pulse laser formed curved surface after galvanometer 3 reflections is a cone surface.This cone surface is by the planar interception at target 8 places, obtaining one is the summit with the Strahlungseintritt of pulse laser 1 on galvanometer 3, line (as XA, XO, XB) between the point of application on the target 8 is the circular cone of bus in Strahlungseintritt on the galvanometer 3 and pulse laser 1 with pulse laser 1, and each pulse laser is the bus length of this circular cone in the Strahlungseintritt on the galvanometer 3 and its distance between the point of application on the target 8.Therefore each pulse laser equates from the stroke that condensing lens 2 is projected to target 8, input angle β in target 8 surfaces is π-2 α (fixed value) after galvanometer 3 reflections simultaneously, each pulsed laser action is identical in the spot size of target 8, be that each pulsed laser action equates in the power density of target 8, make energy coincidence in each pulse laser 1 and target 8 interactions.Composition, quality, energy, degree of ionization and the angular distribution of the plasma plume brightness that final each pulse laser pounds from target 8 are identical, have fundamentally guaranteed the homogeneity of film.As shown in Figure 3, the homogeneity of this deposit film thickness is good than the homogeneity of other deposition plating modes.
Usually, target 8 and substrate 6 are all perpendicular to each axis of rotation, and substrate 6 is parallel to target 8.
The track that should be appreciated that pulse laser 1 point of application on target 8 is the part of the bottom surface circular arc of above-mentioned circular cone.Pulse laser 1 is in the center of the arc path process target 8 of target material surface scanning; Galvanometer 3 vibration half period, the edge of pulse laser 1 from the centre scan of target 8 to target 8; Galvanometer 3 then vibrates half period, the center of pulse laser 1 from the boundary scan of target 8 to target 8.Along with target rotating shaft 9 drives target 8 rotations, 1 pair of target 8 of pulse laser scans comprehensively.
Galvanometer rotating shaft 4 angular velocity of rotation ω 0 are frequency and a plurality of relating to parameters of galvanometer 3 vibration, as the distance of 6 of target 8 and substrates, the speed of rotation of substrate 6 etc.Center away from substrate 6 needs the area of deposition plating big more, and required plumage brightness 7 numbers are many more.When the repetition rate f of pulse laser was steady state value, plumage brightness 7 vertical projections were in substrate 6, and during the center of the close substrate 6 of the subpoint of its axis, the velocity of rotation height of galvanometer 3 makes the plumage brightness that falls within substrate 6 less; The subpoint of its axis is during away from the center of substrate 6, and the velocity of rotation of galvanometer 3 is low, makes the plumage brightness that falls within substrate 6 more, will be more even in the thickness of whole substrate 6 surface deposition plated films like this.
The utility model embodiment is by adjusting the angle of inclination of galvanometer 3, and making the galvanometer 3 and the angle of galvanometer rotating shaft 4 is 20～30 °.Pulse laser 1 is 30～50 ° through the input angle that galvanometer 3 reflects on target 8, the axis of plumage brightness 7 is perpendicular to target 8 at this moment, and target material surface is difficult for forming microtrabeculae, thereby has eliminated plumage brightness deflection phenomenon, guarantee that each plumage brightness has identical distribution and direction, deposit film is more even.
As preferably, the utility model embodiment adopts from the axle scheme, be target rotating shaft 5 and substrate rotating shaft 9 conllinear not, make the distance of 4 of target rotating shaft 5 and galvanometer rotating shafts equal the distance of 4 of substrate rotating shaft 9 and galvanometer rotating shafts simultaneously, can realize the deposition of large area uniform film.Target 8 vertical projections are when substrate 6, and the edge that is centered close to the target projection plane of substrate 6, the axis of the plumage brightness that sputters from target 8 are perpendicular to substrate 6, and plumage brightness 7 will fully be received and deposition by substrate 6 like this.
The utility model embodiment adopts coaxial vibration mirror scanning, galvanometer is obliquely installed in the galvanometer rotating shaft, make the pulse laser and galvanometer rotating shaft conllinear (coaxial) that are projeced into galvanometer, the galvanometer rotating shaft drives the galvanometer vibration around its axis rotation, the input angle of each pulse laser on galvanometer is identical, reflectivity is constant, the energy coincidence after vibration mirror reflected; Each pulse laser is an element of cone through the formed track of vibration mirror reflected, point of application on target to the distance of condensing lens equates, the spot size of each pulse laser on target is identical in the galvanometer vibration processes, thereby composition, energy and the angular distribution unanimity thereof of generation plumage brightness, the homogeneity of deposit film is good.Simultaneously, keep the repetition rate of pulse laser constant, plumage brightness axis is perpendicular to substrate, and its subpoint is during near the center of substrate, the velocity of rotation height of galvanometer; Its subpoint is during away from the center of substrate, and the velocity of rotation of galvanometer is low, will be more even in the thickness of whole substrate surface deposition plating.In addition, adopt, make distance between target rotating shaft and galvanometer rotating shaft equal distance between substrate rotating shaft and galvanometer rotating shaft, can realize the deposition of large area uniform film from the axle scheme.
The above only is preferred embodiment of the present utility model; not in order to restriction the utility model; all any modifications of within spirit of the present utility model and principle, being done, be equal to and replace and improvement etc., all should be included within the protection domain of the present utility model.
Claims (8)
1. impulse laser deposition system, comprise the laser apparatus that is used to produce pulse laser, make described pulse laser be projeced into target galvanometer, described pulse laser focusing is made its substrate rotating shaft with respect to described target rotation in the condensing lens of described target, the galvanometer rotating shaft that drives described galvanometer vibration, the target rotating shaft that drives described target rotation and drive substrate, it is characterized in that, described galvanometer is obliquely installed in described galvanometer rotating shaft, described galvanometer rotating shaft be projeced into the pulse laser beam conllinear of described galvanometer, and be parallel to described target rotating shaft and substrate rotating shaft; Each rotating shaft is all around its axis rotation.
2. impulse laser deposition system as claimed in claim 1 is characterized in that, described target and substrate are all perpendicular to each axis of rotation, and described substrate parallel is in described target.
3. impulse laser deposition system as claimed in claim 1 or 2 is characterized in that, the pulse laser after described vibration mirror reflected and the angle of described target material surface are 30～50 °.
4. impulse laser deposition system as claimed in claim 3 is characterized in that, the angle of described galvanometer and galvanometer rotating shaft is 20～30 °.
5. impulse laser deposition system as claimed in claim 4 is characterized in that, described pulse laser is the bus of same circular cone through the formed track of described vibration mirror reflected.
6. impulse laser deposition system as claimed in claim 3 is characterized in that, described target rotating shaft is positioned on the different straight lines with the substrate rotating shaft, and the distance between described target rotating shaft and galvanometer rotating shaft equals the distance between described substrate rotating shaft and galvanometer rotating shaft.
7. impulse laser deposition system as claimed in claim 5 is characterized in that, described pulse laser scans the center of the arc path of described target through described target.
8. impulse laser deposition system as claimed in claim 3 is characterized in that, the axis of the plumage brightness that described target as sputter goes out is perpendicular to described substrate, the edge that is centered close to described target projection plane of described substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201120009949XU CN202054887U (en) | 2011-01-13 | 2011-01-13 | Deposition system for pulse laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201120009949XU CN202054887U (en) | 2011-01-13 | 2011-01-13 | Deposition system for pulse laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202054887U true CN202054887U (en) | 2011-11-30 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201120009949XU Expired - Lifetime CN202054887U (en) | 2011-01-13 | 2011-01-13 | Deposition system for pulse laser |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202054887U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104532194A (en) * | 2014-12-29 | 2015-04-22 | 深圳大学 | Manufacturing device of laser depositing film |
| CN108277457A (en) * | 2017-12-27 | 2018-07-13 | 上海超导科技股份有限公司 | Light path device and its pulse laser coating apparatus suitable for pulse laser plated film |
-
2011
- 2011-01-13 CN CN201120009949XU patent/CN202054887U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104532194A (en) * | 2014-12-29 | 2015-04-22 | 深圳大学 | Manufacturing device of laser depositing film |
| CN108277457A (en) * | 2017-12-27 | 2018-07-13 | 上海超导科技股份有限公司 | Light path device and its pulse laser coating apparatus suitable for pulse laser plated film |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20111130 Effective date of abandoning: 20120523 |