CN201648562U - Czochralski silicon furnace device - Google Patents
Czochralski silicon furnace device Download PDFInfo
- Publication number
- CN201648562U CN201648562U CN2010201829372U CN201020182937U CN201648562U CN 201648562 U CN201648562 U CN 201648562U CN 2010201829372 U CN2010201829372 U CN 2010201829372U CN 201020182937 U CN201020182937 U CN 201020182937U CN 201648562 U CN201648562 U CN 201648562U
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- cover body
- silicon
- single crystal
- furnace
- czochralski
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 118
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 118
- 239000010703 silicon Substances 0.000 title claims abstract description 118
- 239000013078 crystal Substances 0.000 claims abstract description 81
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims abstract description 18
- 239000007788 liquid Substances 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000010453 quartz Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 239000010439 graphite Substances 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims description 5
- 240000003936 Plumbago auriculata Species 0.000 claims 1
- 238000000034 method Methods 0.000 description 34
- 239000007789 gas Substances 0.000 description 16
- 230000012010 growth Effects 0.000 description 11
- 239000012535 impurity Substances 0.000 description 9
- 238000013022 venting Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 241000209456 Plumbago Species 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 230000003698 anagen phase Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The utility model provides a Czochralski silicon furnace device capable of improving the purity of monocrystalline silicon. The Czochralski silicon furnace device is characterized in that a cover body (5) with long-cylindrical openings at two ends is arranged above a silicon melt (14) in a furnace cavity (16), the upper end of the cover body (5) is arranged at the upper part of a furnace cavity, the opening just faces to an auxiliary chamber or arranged in the auxiliary chamber (1), and a space exists between one end of the cover body (5) close to the liquid level of the silicon melt (14) and the liquid level of the silicon melt (14). The purity of the monocrystalline silicon prepared by using the single silicon furnace with the cover body is improved by more than 10 times compared with the single crystal furnace of the prior art, and the purity deviation of all parts of a single crystal silicon ingot is smaller.
Description
Technical field
The utility model relates to a kind of device for preparing silicon single crystal, particularly, relates to a kind of czochralski silicon monocrystal furnace apparatus.
Background technology
21 century, the world energy sources crisis has promoted the development in photovoltaic market, and crystal silicon solar energy battery is the leading product of photovoltaic industry, accounts for 90% of the market share.Under the pulling of world market, China's solar energy power generating industry development is rapid, and China's solar cell annual production 1% develops into more than 10% of world's share by what accounted for world's share originally.Compare with other crystal silicon solar energy batteries, the transformation efficiency of monocrystaline silicon solar cell is higher, but its production cost is also high.Along with the further attention of countries in the world to the photovoltaic industry, particularly developed country has formulated a series of support policy, encourage development and use sun power, in addition, continuous expansion along with the silicon solar cell application surface, the demand of solar cell is increasing, and the demand of silicon single crystal material enlarges on year-on-year basis.
The monocrystalline silicon growing technology has two kinds, zone melting method (FZ) and vertical pulling method (CZ), and wherein vertical pulling method is most widely used general.The process of growth of vertical pulling method silicon single crystal is: polysilicon is put into the monocrystal growing furnace heating and melting, in the fused polysilicon, insert a seed crystal, adjust the temperature of molten silicon liquid level, make it near melting temperature, drive seed crystal then and stretch into molten silicon and rotation from top to bottom, upper lifting seed crystalline substance slowly then, then monocrystalline silicon body enters the growth of conical part, when cone diameter during near required aimed dia, improve the pulling speed of seed crystal, then the monocrystalline silicon body diameter no longer increases and enters growth phase in the middle part of the crystalline; Growth improves the pulling speed of seed crystal during near last stage again, and monocrystalline silicon body breaks away from molten silicon gradually, forms lower cone and finishes growth.The silicon single crystal that grows out in this way, it is shaped as the tapered right cylinder in two ends, and this right cylinder section is promptly obtained the silicon single crystal raw semiconductor, and this circular single crystal silicon chip is suitable for doing integrated circuit material.
Silicon single crystal is the material foundation stone of microelectronics, and is more and more higher to the requirement of silicon single crystal quality, and this has also proposed strict more requirement to crystal technique.Pulling of silicon single crystal is in low vacuum state in the process of growth in single crystal growing furnace; and constantly in single crystal growing furnace, charge into inert protective gas to take away because crystallization latent heat and silicon melt evaporable silicon monoxide particle that silicon single crystal distributes during crystallization from melt; discharge from the single crystal growing furnace bleeding point then, Fig. 1 is the flow schematic diagram of the shielding gas of this device.Number of patent application is to disclose a kind of czochralski crystal growing furnace with protection gas control system device among the 200620148936.X, and its venting port is arranged on graphite insulation upper cartridge.But no matter where venting port is arranged on, and shielding gas all can not break away from the impurity in the single crystal growing furnace monocrystalline silicon surface in the growth well, thereby the concentration of pollutent increases, and makes the purity of silicon single crystal can not reach requirement.In sum, the present czochralski crystal growing furnace institute pulled crystal silicon that uses, its purity is not high, and the purity deviation of its whole silicon single crystal different sites is bigger, in view of the above-mentioned defective of prior art, has proposed pulling of crystals device of the present utility model.
Summary of the invention
A purpose of the present utility model provides a kind of czochralski silicon monocrystal furnace apparatus, the purity height of this single crystal silicon device pulled crystal silicon.
Another purpose of the present utility model provides a kind of pulling of crystals method that improves silicon single crystal purity; utilize this method can make silicon single crystal in process of growth; be in fully under the protection of rare gas element in the surrounding environment, thereby the purity of the silicon single crystal that draws out that makes improves.
For realizing first purpose of the utility model, a kind of czochralski silicon monocrystal furnace apparatus is provided, it comprises concubine, furnace chamber, heat shielding back up pad, heat shielding, thermal insulation layer, quartz crucible, plumbago crucible, well heater, wherein, in furnace chamber silicon melt above the cover body of a both ends open is set, described cover body faces the direction setting of silicon single crystal along the opening of the direction of monocrystalline silicon growing and cover body, and an end and silicon melt level that cover body and silicon melt level are approaching have a spacing.
Or/and concubine is connected, the upper end of its preferred cover body is connected with furnace chamber or concubine described cover body with furnace chamber, and more preferably the upper end of cover body is connected with concubine.
Cover body described in the utility model and furnace chamber are or/and the mode of connection of concubine can have multiplely, as long as cover body can be fixed in the furnace chamber, the direction that faces silicon single crystal along the opening of the direction of monocrystalline silicon growing and cover body gets final product.For example, the upper end of described cover body is set to outside flange, and this flange is overlapped on the saddle of concubine or furnace chamber, and cover body is fixed; Several holes perhaps are set on cover body uniformly, on the wall of concubine, groove are set simultaneously, utilize pin that cover body is fixed in the furnace chamber with corresponding position, the hole of cover body; Perhaps cover body is fixed in the furnace chamber, also has number of ways can realize above-mentioned connection, as long as cover body of the present utility model can be fixed in the suitable position of furnace chamber by a fixed ring.
An end and silicon melt level that cover body of the present utility model and silicon melt level are approaching have a spacing, as long as this spacing can separate introduced contaminants and monocrystalline.The end that wherein preferred cover body and silicon melt level are approaching and the distance of silicon melt level are greater than 0 and less than 100mm.
Described cover body be shaped as long tubular.
The cross section of the cover body of described long tubular is prismatic, cylindrical or oval cylinder etc., its pref. cylindrical.
Described cover body is to be combined by the cover body more than a section or two sections.
The material of described cover body is all resistant to elevated temperatures materials, and the utility model is preferably quartzy.
The fusing point of quartzy material can reach 1730 ℃, and in single crystal growing furnace for a long time under the high temperature, it can fusion, simultaneously, is convenient to observe the growing state of silicon single crystal.Described cover body also can be made by other high temperature resistant, transparent materials.
The method of a kind of czochralski silicon monocrystal of another purpose of the present utility model, may further comprise the steps: molten silicon crystal, monocrystalline silicon growing under inert gas environment, wherein, in the monocrystalline silicon growing process, the flow direction of rare gas element is that the direction of growth against silicon single crystal forms gas column round silicon single crystal in furnace chamber, rare gas element flows to furnace chamber from the nearer cover body bottom of distance silicon melt then, finally discharges through venting port.
In the monocrystalline silicon growing process, described silicon single crystal is along upwards growth of cover body in cover body; Described rare gas element is to flow to cover body by concubine, flows to silicon melt level along cover body again, finally discharges through venting port.
Add a cover body by silicon single crystal outside in growth, in the fusing of silicon raw material, silicon single crystal shouldering and process of growth, a lot of impurity are arranged in the single crystal growing furnace, a cover body is set outside silicon single crystal, its rare gas element flows down through cover body from concubine, can avoid above-mentioned impurity that silicon single crystal is polluted, improve the purity of silicon single crystal; Simultaneously, the latent heat that this gas produces in the time of silicon single-crystal better being distributed crystallization so that crystallization velocity is faster, has improved the production rate of silicon single crystal.
Flow velocity by gas in the cover body does not have unusual effect to the raising of silicon single crystal purity.
Under the identical situation of rare gas element flow velocity, each institute's pulled crystal silicon of single crystal furnace device shown in Figure 1 and single crystal furnace device shown in Figure 2, its purity by device pulled crystal silicon rod shown in Figure 2 all is higher than under the equal conditions purity by device pulled crystal silicon rod shown in Figure 1, and device pulled crystal silicon rod shown in Figure 2 laterally, the purity deviation is very little longitudinally.
Pulling of crystals method of the present utility model and device thereof, because in the process of monocrystalline silicon growing, be subjected to the protection of cover body, impurity in the single crystal growing furnace only has on a small quantity can enter cover body, simultaneously, the rare gas element that feeds from concubine is arranged in the cover body, can be rapidly, timely a spot of impurity is taken to outside the cover body, discharge from venting port, so pulled crystal silicon has improved more than 10 times than the purity of the silicon single crystal of prior art, the performance of its silicon single crystal more is well positioned to meet market demand thereupon; This device is installed very simply on the basis of existing technology, and cost is low, and the purity of the whole silicon single crystal rod of drawing is all very high, all can meet the demands.
Description of drawings
Fig. 1 is the single crystal growing furnace structural representation of prior art vertical pulling method pulling monocrystal silicon;
Fig. 2 is the single crystal growing furnace structural representation of the utility model embodiment 1-4 vertical pulling method pulling monocrystal silicon;
Fig. 3 is the utility model embodiment 1-4 cover body structural representation.
Embodiment
Below the utility model is further described, can helps better understanding the utility model and advantage, effect with indefiniteness embodiment.
1, concubine; 2, suspension ring; 3, saddle; 4, flange; 5, cover body; 6, heat shielding back up pad; 7, heat shielding; 8, seed crystal; 9, silicon crystal bar; 10, quartz crucible; 11, plumbago crucible; 12, venting port; 13, well heater; 14, silicon melt; 15, thermal insulation layer; 16, furnace chamber; 18, quartz tube.
As shown in Figure 2, czochralski crystal growing furnace comprises concubine 1 (all not drawing) and furnace chamber 16, concubine 1 is provided with saddle 3, wherein saddle 3 is in order to support cover body 5, Fig. 3 is the synoptic diagram of cover body, the upper end of described cover body 5 is a flange 4, flange 4 is overlapped on the saddle 3, cover body 5 is fixing, also be provided with suspension ring 2 on the flange of described cover body 5, it uses when cover body is installed, and cover body 5 also can be fixed in the furnace chamber 16 by other mode of connection, as long as cover body of the present utility model can be fixed in the suitable position of furnace chamber.Described cover body 5 is made by quartz, and other are high temperature resistant and material transparent also can be made cover body 5; In furnace chamber 16, be provided with heat shielding back up pad 6, thermal insulation layer 15, well heater 13, quartz crucible 10, plumbago crucible 11 and the venting port 12 etc. that support heat shielding 7.
In the pulling single crystal silicon process, rare gas element such as argon gas are from concubine 1 cover body 5 of flowing through, finally carrying secretly and covering intravital impurity from venting port 12 discharge furnace chambers 16, because the existence of cover body 5, the impurity that in fusion or pulling monocrystal process, produces, most of impurity is separated and the cover body outside by cover body 5, have only indivisible entering in the cover body, simultaneously, along with inert gas directly flows to cover body 5, make it carrying secretly very soon impurity and flow out, discharge furnace chamber through venting port 12 then from cover body 5 lower ends, and from making the purity of pulled crystal silicon improve.
The distance of the following end distance silicon melt level of used in this embodiment cover body 5 is 20mm, the length of cover body can be adjusted according to actual needs, the length of the cover body of this embodiment is 80% of institute's monocrystal pulling silicon rod total length, and being shaped as of cover body is cylindrical, is to be made of one section silica tube.
Aforesaid method pulled crystal silicon is compared with the silicon single crystal rod that the drawing method that uses the known pulling monocrystal silicon of those skilled in the art draws out, and its purity is higher than 12 times of pulling monocrystal silicon purity of prior art.
Embodiment 2
Other working method and cover body be fully with embodiment 1, and different is, being shaped as of cover body is cylindrical, and the distance of 5 times end distance silicon melt level of cover body is 40mm, and the length of cover body is 100% of institute's monocrystal pulling silicon rod total length.
Aforesaid method pulled crystal silicon is compared with the silicon single crystal rod that the drawing method that uses the known pulling monocrystal silicon of those skilled in the art draws out, and its purity is higher than 10 times of pulling monocrystal silicon purity of prior art.
Embodiment 3
Other working method and cover body be fully with embodiment 1, and different is, being shaped as of cover body is cylindrical, and the distance of the following end distance silicon melt level of cover body 5 is 60mm, and the length of cover body 5 is 70% of institute's monocrystal pulling silicon rod total length.
Aforesaid method pulled crystal silicon is compared with the silicon single crystal rod that the drawing method that uses the known pulling monocrystal silicon of those skilled in the art draws out, and its purity is higher than 11 times of pulling monocrystal silicon purity of prior art.
Embodiment 4
Other working method and cover body be fully with embodiment 1, and different is, the distance of the following end distance silicon melt level of cover body 5 is 30mm, and the length of cover body 5 is 90% of institute's monocrystal pulling silicon rod total length, and being shaped as of cover body 5 is cylindrical.
Aforesaid method pulled crystal silicon is compared with the silicon single crystal rod that the drawing method that uses the known pulling monocrystal silicon of those skilled in the art draws out, and its purity is higher than 11 times of pulling monocrystal silicon purity of prior art.
Embodiment 5
Other working method of present embodiment and cover body 5 are fully with embodiment 1, and different is that cover body 5 is what combined by two sections cover bodies.Its purity of the silicon single crystal rod of producing Billy improves 10 times with the purity of prior art pulled crystal silicon.
Other working method of present embodiment and cover body be fully with embodiment 1, and different is, cover body 5 be shaped as quadrangular.Its purity of the silicon single crystal rod of producing Billy improves 10 times with the purity of prior art.
Embodiment 7
Other working method of present embodiment and cover body are fully with embodiment 1, and different is that cover body 5 is arranged on the furnace chamber 16.Its purity of the silicon single crystal rod of producing Billy improves 10 times with the purity of prior art pulled crystal silicon.
Above-mentioned specific embodiment is just to more detailed description content of the present utility model; do not limit its protection domain, those skilled in the art only use for reference the change that the utility model content makes or substitute after technical scheme all do not break away from invention essence of the present utility model and protection domain.
Claims (9)
1. czochralski silicon monocrystal furnace apparatus, it comprises concubine (1), furnace chamber (16), heat shielding back up pad (6), heat shielding (7), thermal insulation layer (15), quartz crucible (10), plumbago crucible (11), well heater (13), it is characterized in that, the top of silicon melt (14) is provided with the cover body (5) of a both ends open in furnace chamber (16), described cover body (5) faces the direction setting of silicon single crystal along the opening of the direction of monocrystalline silicon growing and cover body (5), and an approaching end and silicon melt (14) liquid level of cover body (5) and silicon melt (14) liquid level has a spacing.
2. czochralski silicon monocrystal furnace apparatus according to claim 1 is characterized in that, described cover body (5) is connected with furnace chamber (16) or/and concubine (1).
3. czochralski silicon monocrystal furnace apparatus according to claim 2 is characterized in that, the upper end of described cover body (5) is connected with furnace chamber (16) or concubine (1).
4. according to claim 2 or 3 described czochralski silicon monocrystal furnace apparatus, it is characterized in that the upper end of described cover body (5) is connected with concubine (1).
5. czochralski silicon monocrystal furnace apparatus according to claim 1 is characterized in that, the end that described cover body (5) and silicon melt (14) liquid level are approaching and the distance of silicon melt (14) liquid level are greater than 0 and less than 100mm.
6. czochralski silicon monocrystal furnace apparatus according to claim 1 is characterized in that, described cover body (5) be shaped as long tubular.
7. czochralski silicon monocrystal furnace apparatus according to claim 6 is characterized in that, the cross section of the cover body of described long tubular (5) is prismatic, cylindrical or oval cylinder.
8. czochralski silicon monocrystal furnace apparatus according to claim 7 is characterized in that, the cross section of the cover body of described long tubular (5) is columniform cylinder.
9. czochralski silicon monocrystal furnace apparatus according to claim 1 is characterized in that, described cover body (5) is to be combined by the cover body more than a section or two sections.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201829372U CN201648562U (en) | 2010-05-07 | 2010-05-07 | Czochralski silicon furnace device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201829372U CN201648562U (en) | 2010-05-07 | 2010-05-07 | Czochralski silicon furnace device |
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| Publication Number | Publication Date |
|---|---|
| CN201648562U true CN201648562U (en) | 2010-11-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010201829372U Expired - Lifetime CN201648562U (en) | 2010-05-07 | 2010-05-07 | Czochralski silicon furnace device |
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| CN (1) | CN201648562U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102206853A (en) * | 2011-05-20 | 2011-10-05 | 浙江星宇能源科技有限公司 | Method for taking monocrystal bar out of monocrystal furnace |
| CN102234836A (en) * | 2010-05-07 | 2011-11-09 | 内蒙古晟纳吉光伏材料有限公司 | Czochralski silicon single-crystal furnace device and silicon single-crystal drawing method |
-
2010
- 2010-05-07 CN CN2010201829372U patent/CN201648562U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102234836A (en) * | 2010-05-07 | 2011-11-09 | 内蒙古晟纳吉光伏材料有限公司 | Czochralski silicon single-crystal furnace device and silicon single-crystal drawing method |
| CN102234836B (en) * | 2010-05-07 | 2014-04-09 | 上海晶美电子技术有限公司 | Czochralski silicon single-crystal furnace device and silicon single-crystal drawing method |
| CN102206853A (en) * | 2011-05-20 | 2011-10-05 | 浙江星宇能源科技有限公司 | Method for taking monocrystal bar out of monocrystal furnace |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20101124 Effective date of abandoning: 20140409 |
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| RGAV | Abandon patent right to avoid regrant |