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CN1971904A - The stacked structure of semiconductor components embedded in the carrier board - Google Patents

The stacked structure of semiconductor components embedded in the carrier board Download PDF

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Publication number
CN1971904A
CN1971904A CNA2005101259067A CN200510125906A CN1971904A CN 1971904 A CN1971904 A CN 1971904A CN A2005101259067 A CNA2005101259067 A CN A2005101259067A CN 200510125906 A CN200510125906 A CN 200510125906A CN 1971904 A CN1971904 A CN 1971904A
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carrier
layer
carrier board
embedded
semiconductor element
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CN100552940C (en
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许诗滨
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Phoenix Precision Technology Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73267Layer and HDI connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92244Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18162Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)

Abstract

The invention discloses a splicing structure of a semiconductor element embedded bearing plate, which comprises: two bearing plates, each bearing plate is provided with at least one opening; at least two semiconductor elements fixed in the opening of the bearing plate; at least one dielectric layer formed on the active surface of the semiconductor element and the surface of the bearing plate and at least one conductive structure formed in the opening of the dielectric layer, at least one circuit layer formed on the surface of the dielectric layer, the circuit layer electrically connected to the electrode pad of the semiconductor element by the conductive structure; the splicing structure of the semiconductor element embedded bearing plate can be a three-dimensional combined modular structure so as to greatly improve the storage capacity, integrate the semiconductor element in the bearing plate so as to effectively reduce the size of a module, and flexibly change and combine the semiconductor element and the bearing plate according to the use requirement so as to form the required storage capacity.

Description

半导体元件埋入承载板的叠接结构The stacked structure of semiconductor components embedded in the carrier board

技术领域technical field

一种半导体元件埋入承载板的叠接结构,特别是关于一种将半导体元件先埋入承载板,再叠接该承载板的结构。The invention relates to a lamination structure in which semiconductor elements are embedded in a carrying plate, in particular to a structure in which semiconductor elements are first embedded in a carrying plate, and then the carrying plate is laminated.

背景技术Background technique

随着电子产业的蓬勃发展,电子产品也逐渐进入多功能、高性能的研发方向,以满足半导体封装件高集成度(Integration)及微型化(Miniaturization)的封装需求,且为求提升单一半导体封装件的性能与容量,以符合电子产品小型化、大容量与高速化的趋势,现有技术是将半导体封装件以多芯片模块化(Multi Chip Module;MCM)的形式呈现,这种封装件也可缩减整体封装件体积并提升电性功能,目前已成为一种封装的主流。它是在单一封装件的芯片承载件上接置至少两个半导体芯片(semiconductor chip),且每一个半导体芯片与承载件之间均是以堆栈(stack)方式接置,这种堆栈式芯片封装结构已见于美国第6,798,049号专利案中。With the vigorous development of the electronics industry, electronic products have gradually entered the direction of multi-functional and high-performance research and development to meet the packaging needs of high integration and miniaturization of semiconductor packages, and in order to improve the single semiconductor package The performance and capacity of the components, in order to meet the trend of miniaturization, large capacity and high speed of electronic products, the existing technology is to present the semiconductor package in the form of multi-chip modular (Multi Chip Module; MCM), this package is also It can reduce the volume of the overall package and improve the electrical function, which has become the mainstream of a package at present. It is to connect at least two semiconductor chips (semiconductor chips) on the chip carrier of a single package, and each semiconductor chip and the carrier are connected in a stack (stack) manner. This stacked chip package Structures have been found in US Patent No. 6,798,049.

图1所示即是美国第6,798,049号专利案揭示的CDBGA封装件剖视图,它是在一具有线路层11的电路板10上形成有一开口101,并在该电路板10的至少一面形成一具有电性连接垫11a及焊线垫11b(boundpad)的线路层11,在该开口101内结合两个叠置的半导体芯片121、122,且该半导体芯片121、122之间是以焊接层13(bounding layer)电性连接,又该半导体芯片122以如金线的导电装置14电性连接到线路层11的焊线垫11b,再以封装胶体15填入电路板10的开口101,并包覆半导体芯片121、122及导电装置14,且在该电路板的线路层11上形成有一绝缘保护层16,在该绝缘保护层16上形成有多个开口16a借以显露出该电性连接垫11a,并在该绝缘保护层16的开口16a形成一是如锡球的导电元件17,以完成封装工序。As shown in Fig. 1, it is a cross-sectional view of the CDBGA package disclosed in U.S. Patent No. 6,798,049. It forms an opening 101 on a circuit board 10 with a circuit layer 11, and forms a circuit board 10 with an electrical The circuit layer 11 of the connection pad 11a and the bonding wire pad 11b (bounding pad), the two stacked semiconductor chips 121, 122 are combined in the opening 101, and the semiconductor chips 121, 122 are connected by a soldering layer 13 (bounding pad). layer) is electrically connected, and the semiconductor chip 122 is electrically connected to the wire pad 11b of the circuit layer 11 with a conductive device 14 such as a gold wire, and then the opening 101 of the circuit board 10 is filled with the encapsulant 15, and the semiconductor chip is covered. Chips 121, 122 and conductive device 14, and an insulating protective layer 16 is formed on the circuit layer 11 of the circuit board, and a plurality of openings 16a are formed on the insulating protective layer 16 to expose the electrical connection pad 11a, and A conductive element 17 such as a solder ball is formed in the opening 16a of the insulating protection layer 16 to complete the packaging process.

然而,对于此类封装件,该堆栈的半导体芯片121及122是以打线接合(Wire bond)方式电性连接到线路层11,打线接合的结构因线弧高度使得封装高度增加,如此即无法实现轻薄短小的目的。并且该半导体芯片121及122之间必须以芯片级连接的焊接层13进行电性连接,即该半导体芯片121及122必须先在芯片厂作电性连接的叠接工序,然后再送至封装厂作封装,使得工序较为复杂,增加了制造成本。However, for this type of package, the stacked semiconductor chips 121 and 122 are electrically connected to the circuit layer 11 by wire bonding. The structure of wire bonding increases the height of the package due to the height of the wire loop, so that Can't realize the light and small purpose. Moreover, the semiconductor chips 121 and 122 must be electrically connected with the solder layer 13 connected at the chip level, that is, the semiconductor chips 121 and 122 must first be electrically connected in the chip factory for a stacking process, and then sent to the packaging factory for further processing. Packaging makes the process more complicated and increases the manufacturing cost.

且借由堆栈的方式增加电性功能与模块化性能的方式,若要再提高性能,则必须再进行堆栈,如此一来,除了增加封装厚度外,并且也增加线路层11的复杂度,且也必须增加线路层11的焊线垫11b的数量,在有限或固定的使用面积内要提高线路密度及焊线垫11b的数量,则用以承载半导体芯片121及122的电路板必须达到细线路,方可达到薄小封装的要求。但借由细线路以达到缩小电路板面积的效果有限,且借由直接堆栈半导体芯片121、122的方式增加电性功能与模块化性能,则因堆栈的芯片数量有限,并无法连续扩充增加,且也无法达到薄小封装的目的。And by means of stacking to increase electrical functions and modular performance, if the performance is to be further improved, stacking must be performed again. In this way, in addition to increasing the thickness of the package, it also increases the complexity of the circuit layer 11, and It is also necessary to increase the number of wire bonding pads 11b of the circuit layer 11. To increase the circuit density and the number of wire bonding pads 11b within a limited or fixed area of use, the circuit board used to carry the semiconductor chips 121 and 122 must reach a thin line. , in order to meet the requirements of thin and small packages. However, the effect of reducing the area of the circuit board by using thin lines is limited, and by directly stacking the semiconductor chips 121 and 122 to increase electrical functions and modular performance, the number of stacked chips is limited and cannot be continuously expanded. Moreover, the purpose of thin and small package cannot be achieved.

为求提高多芯片模块化接置在多层电路板上的密度,减少半导体芯片接置在多层电路板上的面积,进而缩小封装体积的目的,提高储存容量,已成为电路板业界的重要课题。In order to increase the density of multi-chip modularization on multi-layer circuit boards, reduce the area of semiconductor chips on multi-layer circuit boards, reduce the packaging volume, and increase storage capacity, it has become an important issue in the circuit board industry. topic.

发明内容Contents of the invention

为克服上述现有技术的缺失,本发明的主要目的在于提供一种半导体元件埋入承载板的叠接结构,可将半导体元件埋入承载板以成为一模块化结构。In order to overcome the shortcomings of the prior art, the main purpose of the present invention is to provide a stacked structure in which semiconductor components are embedded in a carrier board, which can form a modular structure by embedding semiconductor devices in a carrier board.

本发明的又一目的在于提供一种半导体元件埋入承载板的叠接结构,可依需要弹性变换半导体元件的数量,有较好的组合变换弹性。Another object of the present invention is to provide a lamination structure in which semiconductor elements are embedded in a carrier board, which can flexibly change the number of semiconductor elements according to needs, and has better combination and transformation flexibility.

本发明的另一目的在于提供一种半导体元件埋入承载板的叠接结构,能够缩小模块化的体积。Another object of the present invention is to provide a stacked structure in which semiconductor elements are embedded in a carrier board, which can reduce the modular volume.

为达上述及其它目的,本发明的半导体元件埋入承载板的叠接结构包括:二个承载板,在该承载板各形成有至少一开口,且该承载板是借由一连接层叠接成一体;至少二个半导体元件,固设在该承载板的开口内,其中,该半导体元件包括具有多个电极垫的作用面及相对于该作用面的非作用面;至少一介电层,形成于该半导体元件的作用面及承载板的表面,其中,至少一开孔是形成于该介电层对应到该电极垫上方;以及至少一导电结构,形成于该介电层的开孔中,至少一线路层是形成于该介电层表面,该线路层是借由该导电结构以电性连接到该半导体元件的电极垫。这些承载板之间是以一连接层叠接,以组成一模块化的结构,可依需要变换组合不同的半导体元件及数量,以实现不同变换的使用需求,有较佳的变换组合弹性。In order to achieve the above and other purposes, the stacking structure of the semiconductor element embedded in the carrier board of the present invention includes: two carrier boards, each of which is formed with at least one opening, and the carrier boards are laminated by a connecting layer. Integral; at least two semiconductor elements are fixed in the opening of the carrier plate, wherein the semiconductor element includes an active surface with a plurality of electrode pads and a non-active surface opposite to the active surface; at least one dielectric layer forms On the active surface of the semiconductor element and the surface of the carrier plate, at least one opening is formed on the dielectric layer corresponding to the electrode pad; and at least one conductive structure is formed in the opening of the dielectric layer, At least one circuit layer is formed on the surface of the dielectric layer, and the circuit layer is electrically connected to the electrode pad of the semiconductor element through the conductive structure. These carrier boards are stacked with a connecting layer to form a modular structure, and different semiconductor elements and quantities can be changed and combined according to needs, so as to realize different changing use requirements, and have better changing and combining flexibility.

由于将半导体元件接置于承载板的开口中,然后叠接该承载板,再在该半导体元件的作用面及承载板表面形成一介电层、线路层及导电结构,且该导电结构电性连接到该半导体元件的电极垫,成为一叠接的模块化结构,可免除现有技术中直接堆栈导致厚度增加,并可免除打线接合(wire bounding)的缺失,进而能缩小体积以实现薄小的使用目的。Since the semiconductor element is placed in the opening of the carrier board, and then the carrier board is laminated, a dielectric layer, a circuit layer and a conductive structure are formed on the active surface of the semiconductor element and the surface of the carrier board, and the conductive structure is electrically conductive. The electrode pads connected to the semiconductor element form a stacked modular structure, which can avoid the increase in thickness caused by direct stacking in the prior art, and can avoid the lack of wire bonding (wire bounding), thereby reducing the volume to achieve thin small purpose of use.

又在该介电层、线路层、连接层及至少二个承载板贯穿至少一电镀导通孔(PTH),将至少两个承载板中的半导体元件借由线路层及电镀导通孔电性连接。At least one plated through hole (PTH) is penetrated through the dielectric layer, the circuit layer, the connection layer and at least two carrier plates, and the semiconductor elements in the at least two carrier plates are electrically connected through the circuit layer and the plated through hole. connect.

本发明进一步可在该介电层、线路层的表面形成一线路增层结构,且该线路增层结构中形成有多个导电结构以电性连接到该线路层,并在该线路增层结构表面形成有连接垫;又在该线路增层结构表面具有一防焊层,且该防焊层表面具有多个开口,以显露线路增层结构的连接垫,并在该防焊层的开口形成电性连接该连接垫的导电元件。以构成一将半导体元件封装在承载板中的电路板结构。The present invention can further form a line build-up structure on the surface of the dielectric layer and the circuit layer, and a plurality of conductive structures are formed in the line build-up structure to be electrically connected to the line layer, and the line build-up structure A connection pad is formed on the surface; there is a solder resist layer on the surface of the circuit build-up structure, and the surface of the solder resist layer has a plurality of openings to expose the connection pads of the circuit build-up structure, and a solder mask is formed in the opening of the solder resist layer The conductive element is electrically connected to the connection pad. To form a circuit board structure in which the semiconductor element is packaged in the carrier board.

其中该线路增层结构包括介电层、叠置在该介电层上的线路层以及形成于该介电层中的导电盲孔。Wherein the circuit build-up structure includes a dielectric layer, a circuit layer stacked on the dielectric layer and conductive blind holes formed in the dielectric layer.

由于该半导体元件埋置在承载板中,并在半导体元件的作用面及承载板表面形成一介电层、线路层及电性连接该半导体元件的电极垫,成为一模块化结构,再在其上形成线路增层结构,可依使用需求弹性变化组合以组成所需的储存容量。Since the semiconductor element is embedded in the carrier board, and a dielectric layer, a circuit layer and an electrode pad electrically connected to the semiconductor element are formed on the active surface of the semiconductor element and the surface of the carrier board, it becomes a modular structure, and then the A layered structure is formed on the circuit, which can be flexibly combined according to the use demand to form the required storage capacity.

附图说明Description of drawings

图1是美国专利第6,798,049号的剖视图;Figure 1 is a cross-sectional view of US Patent No. 6,798,049;

图2A至图2D本发明的半导体元件埋入承载板的叠接结构的实施例1剖视图;2A to 2D are cross-sectional views of Embodiment 1 of the stacked structure of the semiconductor element embedded in the carrier plate of the present invention;

图3A及图3B是本发明的半导体元件埋入承载板的叠接结构的实施例2剖视图;3A and 3B are cross-sectional views of Embodiment 2 of the stacked structure of semiconductor elements embedded in the carrier board of the present invention;

图4A及图4B是本发明的半导体元件埋入承载板的叠接结构的实施例3剖视图;4A and 4B are cross-sectional views of Embodiment 3 of the stacked structure of the semiconductor element embedded in the carrier plate of the present invention;

图5A至图5D是本发明的半导体元件埋入承载板的叠接结构的实施例4剖视图;以及5A to 5D are cross-sectional views of Embodiment 4 of the stacked structure of the semiconductor element embedded in the carrier plate of the present invention; and

图6是本发明的半导体元件埋入承载板的叠接结构的实施例5剖视图。FIG. 6 is a cross-sectional view of Embodiment 5 of the stacked structure of the semiconductor element embedded in the carrier board of the present invention.

具体实施方式Detailed ways

实施例1Example 1

请参阅图2A至图2C,它是本发明的半导体元件埋入承载板的叠接结构的剖面示意图。Please refer to FIG. 2A to FIG. 2C , which are schematic cross-sectional views of the stacked structure of the semiconductor device embedded in the carrier board of the present invention.

请参阅图2A,至少二个承载板21具有第一表面21a及第二表面21b,在该承载板21上形成有至少一贯穿第一及第二表面21a、21b的开口21c,该承载板21是一绝缘板或具有线路的电路板,在这些开口21c内接置有至少一半导体元件22,它可借由一粘着材料(未标出)将半导体元件22固着在承载板21的开口21c内,该半导体元件22例如是由主动元件或被动元件组成群组中的一种,其中该主动元件例如是存储器,该被动元件例如是电阻、电容或电感等电子元件,且该半导体元件22具有一作用面22a及相对于该作用面的非作用面22b,在该作用面22a上具有多个电极垫22c,这些半导体元件22的作用面22a是以相同方向固设在同一承载板21的开口21c中。Please refer to FIG. 2A, at least two bearing plates 21 have a first surface 21a and a second surface 21b, and at least one opening 21c that runs through the first and second surfaces 21a, 21b is formed on the bearing plate 21. It is an insulating board or a circuit board with lines, and at least one semiconductor element 22 is connected in these openings 21c, and it can fix the semiconductor element 22 in the opening 21c of the carrier plate 21 by means of an adhesive material (not shown). , the semiconductor element 22 is, for example, one of active elements or passive elements, wherein the active element is, for example, a memory, and the passive element is, for example, electronic elements such as resistors, capacitors or inductors, and the semiconductor element 22 has a The active surface 22a and the non-active surface 22b corresponding to the active surface have a plurality of electrode pads 22c on the active surface 22a, and the active surfaces 22a of these semiconductor elements 22 are fixed on the opening 21c of the same carrier plate 21 in the same direction middle.

请参阅图2B,在该半导体元件22的作用面22a及承载板21的第一表面21a上形成一介电层23,并在该介电层23表面形成有一线路层24,且该线路层24具有形成于介电层23中的导电结构24a,该导电结构24a是电性连接到该半导体元件22的电极垫22c。2B, a dielectric layer 23 is formed on the active surface 22a of the semiconductor element 22 and the first surface 21a of the carrier plate 21, and a circuit layer 24 is formed on the surface of the dielectric layer 23, and the circuit layer 24 There is a conductive structure 24 a formed in the dielectric layer 23 , and the conductive structure 24 a is electrically connected to the electrode pad 22 c of the semiconductor device 22 .

请参阅图2C及图2D,该嵌埋有半导体元件22的至少二个承载板21之间是以一连接层25叠接,该连接层25可以是一有机粘着层,该承载板21是以第二表面21b叠接另一承载板21的第二表面21b,成为上下反方向叠接成一体,如图2C所示;或该承载板21以第一表面21a叠接另一承载板21的第一表面21a,同样为上下反方向叠接的构造(图未标出);或这些承载板21是以第一表面21a上的介电层23及线路层24叠接在另一承载板的第二表面21b,成为上下同方向叠接,如图2D所示;且该介电层23、线路层24、连接层25及二个承载板21是以至少一电镀导通孔26贯穿其间,并使该电镀导通孔26电性连接线路层24,使埋设在承载板21中的这些半导体元件22之间可以电性连接,可成为一模块化结构。Please refer to FIG. 2C and FIG. 2D, at least two carrier plates 21 embedded with semiconductor elements 22 are stacked with a connection layer 25, the connection layer 25 may be an organic adhesive layer, and the carrier plate 21 is based on The second surface 21b is overlapped with the second surface 21b of the other carrier plate 21 to form an integrated body, as shown in FIG. 2C; or the carrier plate 21 is overlapped with the first surface 21a of the other carrier plate 21. The first surface 21a is similarly stacked up and down (not shown); or these carrier boards 21 are laminated on another carrier board with the dielectric layer 23 and the circuit layer 24 on the first surface 21a The second surface 21b is stacked up and down in the same direction, as shown in FIG. 2D; and the dielectric layer 23, the circuit layer 24, the connecting layer 25 and the two carrier plates 21 are penetrated by at least one plated via hole 26, And the plated via hole 26 is electrically connected to the circuit layer 24, so that the semiconductor elements 22 embedded in the carrier board 21 can be electrically connected, and a modular structure can be formed.

该半导体元件22是埋设在承载板21的开口21c中,可在承载板21中埋设多个半导体元件22,借以增加半导体元件22接置在承载板21的数量,增加其储存容量。又在该半导体元件22的作用面22a及承载板21的第一表面21a再形成介电层23及具有导电结构24a的线路层24,且该导电结构24a电性连接到该半导体元件22的电极垫22c,再将至少二个承载板21以连接层25叠接成一体,并以电镀导通孔26连接该线路层24,可电性连接更多数量的半导体元件22,且可缩小整体的体积,并可免除现有直接叠接芯片及打线接合的缺失。The semiconductor element 22 is embedded in the opening 21c of the carrier plate 21. Multiple semiconductor elements 22 can be embedded in the carrier plate 21, thereby increasing the number of semiconductor elements 22 connected to the carrier plate 21 and increasing its storage capacity. Form a dielectric layer 23 and a circuit layer 24 with a conductive structure 24a on the active surface 22a of the semiconductor element 22 and the first surface 21a of the carrier plate 21, and the conductive structure 24a is electrically connected to the electrode of the semiconductor element 22 Pad 22c, and then at least two carrier boards 21 are stacked together with a connection layer 25, and the circuit layer 24 is connected with a plated via hole 26, so that a larger number of semiconductor elements 22 can be electrically connected, and the overall size can be reduced. volume, and can avoid the lack of existing direct chip stacking and wire bonding.

且将半导体元件22嵌埋在承载板21中,然后再叠接承载板21,可依需要作不同的组合及变更,以因应不同的使用需要,因而有较好的变换弹性。And the semiconductor element 22 is embedded in the carrier board 21, and then the carrier board 21 is laminated, and different combinations and changes can be made according to the needs, so as to meet different use needs, so it has better conversion flexibility.

实施例2Example 2

请参阅图3A及图3B,它是本发明的半导体元件埋入承载板的叠接结构实施例2的剖面示意图,与实施例1不同之处在于,该半导体元件的作用面在同一承载板内是以不同方向埋设在承载板的开口中。Please refer to Fig. 3A and Fig. 3B, which is a schematic cross-sectional view of Embodiment 2 of the stacked structure of the semiconductor element embedded in the carrier plate of the present invention. The difference from Embodiment 1 is that the active surface of the semiconductor element is in the same carrier plate It is embedded in the opening of the bearing plate in different directions.

请参阅图3A,在该承载板31的多个开口31c中分别置入半导体元件32,它可借由一粘着材料(图未标出)将半导体元件32固着在承载板31的开口31c内,且该半导体元件32的作用面32a是选择性形成于承载板31的第一表面31a及第二表面31b,使该承载板31的第一及第二表面分31a、31b别具有半导体元件32的作用面32a。Referring to FIG. 3A , semiconductor elements 32 are respectively placed in a plurality of openings 31c of the carrier plate 31, which can fix the semiconductor elements 32 in the openings 31c of the carrier plate 31 by means of an adhesive material (not shown). And the active surface 32a of the semiconductor element 32 is selectively formed on the first surface 31a and the second surface 31b of the carrier plate 31, so that the first and second surfaces 31a, 31b of the carrier plate 31 have the semiconductor element 32 respectively. Active surface 32a.

请参阅图3B,再在该承载板31的第一及第二表面31a、31b分别形成介电层33及具有导电结构34a的线路层34,且使该导电结构34a电性连接到该半导体元件32的电极垫32b,如此即可使该承载板31的上下两面分别具有线路层34,可将线路分散在该承载板31的两面。Referring to FIG. 3B, a dielectric layer 33 and a circuit layer 34 having a conductive structure 34a are formed on the first and second surfaces 31a, 31b of the carrier board 31, respectively, and the conductive structure 34a is electrically connected to the semiconductor element. 32 electrode pads 32b, so that the upper and lower sides of the carrier board 31 have circuit layers 34 respectively, and the circuits can be dispersed on both sides of the carrier board 31.

该两面具有线路的承载板31则可依需要叠接,再以电镀导通孔36连接各层的线路层34,借以提高半导体元件32电性连接的数量,提高电性功能或增加模块化性能,并可缩小整体的体积以实现薄小的目的,并可有较大的变换组合弹性,以因应不同的使用需要。The carrier board 31 with circuits on both sides can be stacked as required, and then the circuit layer 34 of each layer is connected with the plated via hole 36, so as to increase the number of electrical connections of the semiconductor element 32, improve the electrical function or increase the modularization performance. , and can reduce the overall volume to achieve the purpose of thinness, and can have greater flexibility in transformation and combination to meet different use needs.

实施例3Example 3

请参阅图4A及图4B,它是本发明的半导体元件埋入承载板的叠接结构实施例3的剖面示意图,与上述实施例不同之处在于,该承载板41的开口41c是非贯穿,且该开口41c的方向是选择性形成于承载板41的第一表面41a或第二表面41b,可在该开口41c内接置半导体元件42,使该半导体元件42的作用面42a可全部朝同一方向或朝向不同方向,可在该半导体元件42的作用面42a及承载板41表面形成介电层43及具有导电结构44a的线路层44,且使该导电结构44a电性连接到该半导体元件42的电极垫42b,同样实现上述可缩小整体的体积目的,并可有较大的变换组合弹性,以因应不同的使用需要。Please refer to FIG. 4A and FIG. 4B , which are schematic cross-sectional views of Embodiment 3 of the stacked structure of the semiconductor element embedded in the carrier plate of the present invention. The difference from the above embodiment is that the opening 41c of the carrier plate 41 is non-through, and The direction of the opening 41c is selectively formed on the first surface 41a or the second surface 41b of the carrier plate 41, and the semiconductor element 42 can be placed in the opening 41c, so that the active surfaces 42a of the semiconductor element 42 can all face the same direction. Or in different directions, a dielectric layer 43 and a circuit layer 44 with a conductive structure 44a can be formed on the active surface 42a of the semiconductor element 42 and the surface of the carrier plate 41, and the conductive structure 44a is electrically connected to the semiconductor element 42. The electrode pad 42b also achieves the above-mentioned purpose of reducing the overall volume, and has greater flexibility in changing combinations to meet different usage needs.

实施例4Example 4

请参阅图5A至图5C,它是本发明的半导体元件埋入承载板的叠接结构实施例4的剖面示意图,与上述实施例不同之处在于,该承载板的开口是非贯穿,且可选择性形成于承载板的第一表面及第二表面。Please refer to Figures 5A to 5C, which are cross-sectional schematic views of Embodiment 4 of the stacked structure of the semiconductor element embedded in the carrier plate of the present invention. The properties are formed on the first surface and the second surface of the bearing plate.

请参阅图5A,在至少二个承载板51上各形成有至少一非贯穿的开口51c,且该开口51c的开口方向是选择性形成于承载板51的第一表面51a及第二表面51b,在该开口51c内接置有一半导体元件52,且该半导体元件52具有电极垫52b的作用面52a是曝露于该承载板51的开口51c外而固设于其内,使该承载板51的上下两面皆具有半导体元件52的作用面52a。Please refer to FIG. 5A, at least one non-penetrating opening 51c is formed on each of at least two carrying plates 51, and the opening direction of the opening 51c is selectively formed on the first surface 51a and the second surface 51b of the carrying plate 51, A semiconductor element 52 is connected in the opening 51c, and the active surface 52a of the semiconductor element 52 with the electrode pad 52b is exposed outside the opening 51c of the carrier plate 51 and fixed in it, so that the upper and lower sides of the carrier plate 51 Both surfaces have the active surface 52a of the semiconductor element 52 .

请参阅图5B,在该承载板51的第一及第二表面51a、51b及该半导体元件52的作用面52a分别形成一介电层53,并在该介电层53表面形成有一线路层54,且该线路层54具有形成于介电层53中的导电结构54a,该导电结构54a电性连接到该半导体元件52的电极垫52b,使该承载板51的第一及第二表面51a、51b具有线路层54。Please refer to FIG. 5B, a dielectric layer 53 is formed on the first and second surfaces 51a, 51b of the carrier board 51 and the active surface 52a of the semiconductor element 52, and a circuit layer 54 is formed on the surface of the dielectric layer 53. , and the circuit layer 54 has a conductive structure 54a formed in the dielectric layer 53, the conductive structure 54a is electrically connected to the electrode pad 52b of the semiconductor element 52, so that the first and second surfaces 51a, 51a, and 51b has a wiring layer 54 .

请参阅图5C及图5D,该嵌埋有半导体元件52的至少二个承载板51之间是以一连接层55叠接,以将该承载板51以第一表面51a的一方叠接另一承载板51的第二表面51b的一方,成为上下同方向叠接(如图5C所示);或以承载板51以第二表面51b的一方叠接另一承载板51的第二表面51b的一方,成为上下反方向叠接(如图5D所示);且该介电层53、线路层54、连接层55及至少二个承载板51是以至少一电镀导通孔56贯穿其间,可借由该电镀导通孔56电性连接各个线路层54,使埋设在承载板51中的这些半导体元件52之间电性连接以成为一模块化结构。Please refer to FIG. 5C and FIG. 5D, at least two carrier plates 51 embedded with semiconductor elements 52 are stacked with a connection layer 55, so that the carrier plate 51 is stacked on the other side with the first surface 51a. One side of the second surface 51b of the carrying plate 51 becomes overlapping up and down in the same direction (as shown in FIG. 5C ); On the one hand, it is stacked up and down (as shown in FIG. 5D ); and the dielectric layer 53, the circuit layer 54, the connection layer 55 and at least two carrier plates 51 are penetrated by at least one plated via hole 56, which can The electroplated via holes 56 are used to electrically connect each circuit layer 54 , so that the semiconductor elements 52 embedded in the carrier board 51 are electrically connected to form a modular structure.

实施例5Example 5

请参阅图6,它是本发明的半导体元件埋入承载板的叠接结构实施例5的剖面示意图,在承载板61设有开口61a,在该开口61a中埋设有半导体元件62,且在半导体元件62的作用面62a及承载板61表面形成有一介电层63,及在该介电层63表形成一具有导电结构64a的线路层64,且该导电结构64a电性连接到该半导体元件62的电极垫62b,并以至少一连接层65叠接承载板61,再以至少一电镀导通孔66电性连接该线路层64。如图所示的结构是提供说明使用,但并不以此为限,成为上述的各式叠接结构。Please refer to FIG. 6 , which is a schematic cross-sectional view of Embodiment 5 of a stacked structure in which a semiconductor element is embedded in a carrier plate of the present invention. An opening 61a is provided on the carrier plate 61, and a semiconductor element 62 is embedded in the opening 61a. A dielectric layer 63 is formed on the active surface 62a of the element 62 and the surface of the carrier plate 61, and a circuit layer 64 with a conductive structure 64a is formed on the surface of the dielectric layer 63, and the conductive structure 64a is electrically connected to the semiconductor element 62 The electrode pads 62b are stacked on the carrier board 61 with at least one connection layer 65 , and the circuit layer 64 is electrically connected with at least one plated via hole 66 . The structures shown in the figure are provided for illustration, but are not limited thereto, and become the above-mentioned various overlapping structures.

再在该线路层64及介电层63表面形成至少一线路增层结构67,该线路增层结构67包括有介电层67a、叠置在该介电层67a上的线路层67b以及形成于该介电层67a中的导电盲孔67c,且该导电盲孔67c电性连接到该线路层64;又在该线路增层结构67表面具有一防焊层68,且在该防焊层68表面位于该叠接结构边缘处具有至少一个开口68a,以显露线路增层结构67的线路层67b作为与外界导电元件(图未标出)导接的电性连接垫67d。Then at least one circuit build-up structure 67 is formed on the surface of the circuit layer 64 and the dielectric layer 63. The circuit build-up structure 67 includes a dielectric layer 67a, a circuit layer 67b stacked on the dielectric layer 67a, and a circuit layer 67b formed on the dielectric layer 67a. The conductive blind hole 67c in the dielectric layer 67a, and the conductive blind hole 67c is electrically connected to the circuit layer 64; there is a solder resist layer 68 on the surface of the circuit layer build-up structure 67, and the solder resist layer 68 There is at least one opening 68a on the surface at the edge of the stacking structure to expose the circuit layer 67b of the circuit build-up structure 67 as an electrical connection pad 67d for conducting with external conductive elements (not shown).

该半导体元件62嵌埋在承载板61的开口61a中,并在该半导体元件62的作用面62a及承载板61表面形成介电层63及线路层64,然后叠接及以电镀导通孔66连接而成为一模块化结构,再在其上形成线路增层结构67,可将半导体元件62封装在承载板61中,免除现有技术中必须打线接合及封胶工序,故可降低制造成本,并且将半导体元件62直接嵌埋在承载板61中,可缩小整体体积以实现薄小的目的。The semiconductor element 62 is embedded in the opening 61a of the carrier plate 61, and a dielectric layer 63 and a circuit layer 64 are formed on the active surface 62a of the semiconductor element 62 and the surface of the carrier plate 61, and then the via hole 66 is laminated and plated. Connect to form a modular structure, and then form a circuit build-up structure 67 on it, the semiconductor element 62 can be packaged in the carrier board 61, eliminating the necessary wire bonding and sealing processes in the prior art, so the manufacturing cost can be reduced , and the semiconductor element 62 is directly embedded in the carrier board 61, the overall volume can be reduced to achieve the purpose of thinness.

本发明的半导体元件埋入承载板的叠接结构是将半导体元件接置在承载板的开口中,然后叠接该承载板,再在该半导体元件的作用面及承载板表面形成一介电层、线路层及导电结构,且该导电结构电性连接到该半导体元件的电极垫,成为一叠接的模块化结构,可免除现有技术中直接堆栈导致厚度增加,并可免除打线接合及封装导致无法缩小体积的缺失。又在该介电层、线路层、连接层及至少二个承载板贯穿至少一电镀导通孔(PTH),将至少两个承载板中的半导体元件借由线路层及电镀导通孔电性连接,增加其储存容量。并可依使用需求弹性变化组合以组成所需的储存容量。In the stacking structure of the semiconductor element embedded in the carrier plate of the present invention, the semiconductor element is placed in the opening of the carrier plate, and then the carrier plate is stacked, and then a dielectric layer is formed on the active surface of the semiconductor element and the surface of the carrier plate , circuit layer and conductive structure, and the conductive structure is electrically connected to the electrode pad of the semiconductor element to form a stacked modular structure, which can avoid the increase in thickness caused by direct stacking in the prior art, and can avoid wire bonding and Encapsulation leads to a loss that cannot be reduced in size. At least one plated through hole (PTH) is penetrated through the dielectric layer, the circuit layer, the connection layer and at least two carrier plates, and the semiconductor elements in the at least two carrier plates are electrically connected through the circuit layer and the plated through hole. connection to increase its storage capacity. And it can be flexibly combined according to the usage demand to form the required storage capacity.

Claims (13)

1.一种半导体元件埋入承载板的叠接结构,其特征在于,该半导体元件埋入承载板的叠接结构包括:1. A stacking structure in which a semiconductor element is embedded in a carrier plate, is characterized in that, the stacking structure in which the semiconductor element is embedded in a carrier plate comprises: 二个承载板,在该承载板各形成有至少一开口,且该承载板是借由一连接层叠接成一体;Two bearing plates, each of which is formed with at least one opening, and the bearing plates are laminated into one body by a connecting layer; 至少二个半导体元件,固设在该承载板的开口内,其中,该半导体元件包括具有多个电极垫的作用面及相对于该作用面的非作用面;At least two semiconductor elements are fixed in the opening of the carrier plate, wherein the semiconductor element includes an active surface with a plurality of electrode pads and a non-active surface opposite to the active surface; 至少一介电层,形成于该半导体元件的作用面及承载板的表面,其中,至少一开孔是形成于该介电层对应到该电极垫上方;以及At least one dielectric layer is formed on the active surface of the semiconductor element and the surface of the carrier plate, wherein at least one opening is formed on the dielectric layer corresponding to the electrode pad; and 至少一导电结构,形成于该介电层的开孔中,至少一线路层是形成于该介电层表面,该线路层是借由该导电结构以电性连接到该半导体元件的电极垫。At least one conductive structure is formed in the opening of the dielectric layer. At least one circuit layer is formed on the surface of the dielectric layer. The circuit layer is electrically connected to the electrode pad of the semiconductor element through the conductive structure. 2.如权利要求1所述的半导体元件埋入承载板的叠接结构,其特征在于,该承载板是一绝缘板或具有线路的电路板。2 . The stacked structure of semiconductor components embedded in a carrier board as claimed in claim 1 , wherein the carrier board is an insulating board or a circuit board with circuits. 3 . 3.如权利要求1所述的半导体元件埋入承载板的叠接结构,其特征在于,该承载板的开口是一非贯穿或贯穿开口。3 . The stacked structure of semiconductor devices embedded in a carrier plate as claimed in claim 1 , wherein the opening of the carrier plate is a non-through or through opening. 4 . 4.如权利要求3所述的半导体元件埋入承载板的叠接结构,其特征在于,该承载板具有第一表面及第二表面。4 . The stacked structure of semiconductor devices embedded in a carrier board as claimed in claim 3 , wherein the carrier board has a first surface and a second surface. 5.如权利要求4所述的半导体元件埋入承载板的叠接结构,其特征在于,该承载板的开口是形成于承载板的第一表面及第二表面组成群组中的一种。5 . The stacked structure of semiconductor devices embedded in a carrier board as claimed in claim 4 , wherein the opening of the carrier board is one of the groups formed on the first surface and the second surface of the carrier board. 5 . 6.如权利要求5所述的半导体元件埋入承载板的叠接结构,其特征在于,这些承载板是以第一表面的一方叠接另一承载板的第二表面,成为上下同方向叠接。6. The stacking structure of semiconductor elements embedded in carrier boards as claimed in claim 5, characterized in that, these carrier boards are stacked on the second surface of another carrier board with one side of the first surface, so that they are stacked in the same direction up and down. catch. 7.如权利要求5所述的半导体元件埋入承载板的叠接结构,其特征在于,这些承载板是以第二表面的一方叠接另一承载板的第二表面的一方,成为上下相反方向叠接。7. The stacked structure for embedding semiconductor elements in carrier boards as claimed in claim 5, characterized in that, for these carrier boards, one side of the second surface is laminated to the second surface of another carrier board, which is opposite up and down. direction overlap. 8.如权利要求5所述的半导体元件埋入承载板的叠接结构,其特征在于,这些承载板是以第一表面的一方叠接另一承载板的第一表面的一方,成为上下相反方向叠接。8. The stacking structure for embedding semiconductor elements in carrier boards as claimed in claim 5, characterized in that, these carrier boards are one side of the first surface to be laminated to the first surface of another carrier board, which is opposite up and down. direction overlap. 9.如权利要求1所述的半导体元件埋入承载板的叠接结构,其特征在于,该连接层是一有机粘着材料构成。9. The lamination structure for embedding semiconductor devices in a carrier board as claimed in claim 1, wherein the connection layer is formed of an organic adhesive material. 10.如权利要求1所述的半导体元件埋入承载板的叠接结构,其特征在于,该半导体元件埋入承载板的叠接结构还包括至少一电镀导通孔贯穿该介电层、线路层、连接层及二个承载板,以电性连接该半导体元件。10. The stacked structure of semiconductor elements embedded in a carrier board according to claim 1, characterized in that, the stacked structure of semiconductor elements embedded in a carrier board further comprises at least one plated via hole penetrating through the dielectric layer, circuit layer, connection layer and two carrier boards to electrically connect the semiconductor element. 11.如权利要求10所述的半导体元件埋入承载板的叠接结构,其特征在于,该半导体元件埋入承载板的叠接结构还包括在该介电层、线路层的表面形成至少一线路增层结构,且该线路增层结构中形成有多条导电盲孔以电性连接到该线路层,并在该线路增层结构表面形成有连接垫。11. The superimposed structure of semiconductor elements embedded in a carrier board according to claim 10, characterized in that, the superimposed structure of semiconductor elements embedded in a carrier board further comprises forming at least one layer on the surface of the dielectric layer and the circuit layer. A circuit build-up structure, and a plurality of conductive blind holes are formed in the circuit build-up structure to electrically connect to the circuit layer, and a connection pad is formed on the surface of the circuit build-up structure. 12.如权利要求11所述的半导体元件埋入承载板的叠接结构,其特征在于,该半导体元件埋入承载板的叠接结构还包括在该线路增层结构表面具有一防焊层,且该防焊层表面位于该叠接结构边缘处具有至少一个开口,以显露该线路增层结构表面的线路层作为与其它导电元件导接的电性连接垫。12. The stacked structure of semiconductor elements embedded in a carrier board according to claim 11, wherein the stacked structure of semiconductor elements embedded in a carrier board further comprises a solder resist layer on the surface of the circuit build-up structure, And the surface of the solder resist layer has at least one opening at the edge of the lamination structure to expose the circuit layer on the surface of the circuit build-up structure as an electrical connection pad for conducting with other conductive elements. 13.如权利要求12所述的半导体元件埋入承载板的叠接结构,其特征在于,该线路增层结构包括介电层、叠置在该介电层上的线路层以及形成于该介电层中的导电盲孔。13. The stacked structure of semiconductor elements embedded in a carrier board according to claim 12, wherein the circuit build-up structure comprises a dielectric layer, a circuit layer stacked on the dielectric layer, and a circuit layer formed on the dielectric layer. Conductive blind vias in electrical layers.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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CN103094242A (en) * 2011-11-01 2013-05-08 欣兴电子股份有限公司 Packaging substrate with embedded capacitor assembly and manufacturing method thereof
CN103646880A (en) * 2013-09-29 2014-03-19 华进半导体封装先导技术研发中心有限公司 Packaging technology based on board-level functional substrate and packaging structure
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Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0134648B1 (en) * 1994-06-09 1998-04-20 김광호 Low Noise Multilayer Chip Package
US6180881B1 (en) * 1998-05-05 2001-01-30 Harlan Ruben Isaak Chip stack and method of making same
JP2001077301A (en) * 1999-08-24 2001-03-23 Amkor Technology Korea Inc Semiconductor package and its manufacturing method
US6404043B1 (en) * 2000-06-21 2002-06-11 Dense-Pac Microsystems, Inc. Panel stacking of BGA devices to form three-dimensional modules
WO2003067656A1 (en) * 2002-02-06 2003-08-14 Ibiden Co., Ltd. Semiconductor chip mounting board, its manufacturing method, and semiconductor module
CN2613046Y (en) * 2003-04-17 2004-04-21 威盛电子股份有限公司 Chip packaging structure

Cited By (5)

* Cited by examiner, † Cited by third party
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CN103094242A (en) * 2011-11-01 2013-05-08 欣兴电子股份有限公司 Packaging substrate with embedded capacitor assembly and manufacturing method thereof
CN103094242B (en) * 2011-11-01 2015-09-09 欣兴电子股份有限公司 Packaging substrate with embedded capacitor assembly and manufacturing method thereof
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