CN1500903A - An In-Plane Rotary Device for Thin Film Deposition at High Temperature - Google Patents
An In-Plane Rotary Device for Thin Film Deposition at High Temperature Download PDFInfo
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- CN1500903A CN1500903A CNA021341044A CN02134104A CN1500903A CN 1500903 A CN1500903 A CN 1500903A CN A021341044 A CNA021341044 A CN A021341044A CN 02134104 A CN02134104 A CN 02134104A CN 1500903 A CN1500903 A CN 1500903A
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- high temperature
- gear
- axial support
- thin film
- support disc
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- 238000000427 thin-film deposition Methods 0.000 title claims abstract description 9
- 238000005096 rolling process Methods 0.000 claims abstract description 26
- 230000005540 biological transmission Effects 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 24
- 239000007769 metal material Substances 0.000 claims description 2
- 244000309464 bull Species 0.000 claims 7
- 229910010293 ceramic material Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 20
- 238000005137 deposition process Methods 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 15
- 230000008021 deposition Effects 0.000 description 11
- 230000033001 locomotion Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 239000010409 thin film Substances 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 5
- 239000012528 membrane Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 238000012163 sequencing technique Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
本发明提供了一种用于高温下薄膜沉积的面内旋转装置，它由常规传动部分和面内旋转部分构成，面内旋转部分有轴向支撑盘9、径向支撑盘10通过调距螺杆11固定在一起，其间距可通过调距螺杆11调节，大齿轮6分别与轴向支撑盘9和径向支撑盘10通过滚珠12滚动连接。本发明能用于高、低温的薄膜沉积，使用本发明并结合双源沉积工艺，可以在高温下进行双面膜的两面同时沉积，可保证薄膜两面的一致性，同时可提高薄膜的面内均匀性；这种旋转可提高高温转动的可靠性，防止高温变形导致的错位卡死现象。
The present invention provides an in-plane rotating device for thin film deposition at high temperature, which is composed of a conventional transmission part and an in-plane rotating part. 11 are fixed together, and the distance between them can be adjusted by adjusting the pitch screw 11. The large gear 6 is respectively connected with the axial support disc 9 and the radial support disc 10 through balls 12 in a rolling manner. The present invention can be used for high and low temperature thin film deposition. Using the present invention combined with the dual-source deposition process, both sides of the double film can be deposited simultaneously at high temperature, which can ensure the consistency of both sides of the film and improve the in-plane uniformity of the film. This kind of rotation can improve the reliability of high-temperature rotation and prevent dislocation jamming caused by high-temperature deformation.
Description
Technical field:
The invention belongs to field of mechanical technique, it is specially adapted to the physical vapor deposition of thin-film material.
Background technology:
As everyone knows, the preparation of large area film is a kind of effective means that improves film production efficient.In the method for all physical vapor depositions, as evaporation, sputter, pulsed laser deposition, arc process plated film etc. the spatial distribution of its inherent particle concentration is arranged all, sedimentary uniform thin film is limited in the very little area.So the homogeneity question in the big area is the problem that must solve in the large area film preparation.General all need translation scan, the rotation by substrate, the rotation or the scanning of deposition source, or even the motion of substrate combined with the motion of deposition source enlarge homogeneity range, improve the homogeneity of film.
As the rotary turnplate of often using in evaporation, substrate moves in a circle or planetary motion with respect to evaporation source; The two-dimension translational of the substrate that in sputter, uses and the motion of single axle rotation; Laser beam flying+the target that uses in pulsed laser deposition moves/rotates+motion that substrate rotates; The work rest of the generation revolution of in multi-arc ion plating film, using and the hanger of generation rotation.
In the preparation of two-side film membrane, take two sides sequencing and two sides sedimentary technology simultaneously.Sequencing sedimentary mode in two sides is to deposit a film earlier, and then the other one side of upset deposition.Like this, two sides growth for Thin Film term harmonization is not high, in some cases, also must change the growth for Thin Film condition and substrate and film are carried out suitable protection, and this just makes technological process comparatively complicated.Two sides sedimentary technology of while then easily guarantees the consistence on film two sides.The deposition technique of the single shaft rotation that the combined base face that two deposition sources or single deposition source are arranged that adopts is interior at present, face is outer.It is better that substrate is cooked the two deposition source sputter two sides consistence and the inner evenness of face internal rotation; Though and single deposition source face internal rotation mode is guaranteed to the two sides consistence, the homogeneity in the big area is relatively poor, and face inner rotary mode also has similar characteristics, only is suitable for preparing the small area two-side film membrane.
In some cases, thin film deposition must be carried out under the situation of heating to improve the performance of film.But above these mode of motion, general mechanism complexity, particularly for temperature condition with higher in the deposition process, stuck inefficacy reduces the running gear work reliability because high temperature causes deformation, dislocation often to make the mechanical movement part.
The content of invention:
The purpose of invention provides a kind of inner surface swiveling device that is used for the thin-film material high temperature deposition, uses this device can realize reliable and stable face internal rotation, the dislocation stuck phenomenon of avoiding high temperature deformation to cause; Can be used for single two-sided thin film deposition, help improving the inner evenness of film; Be easy to guarantee the two sides consistence of film when using two deposition source.
Task of the present invention is to realize (as shown in Figure 1, 2) like this: it partly is made of conventional driving part and face internal rotation.Conventional driving part by rotating shaft 1, the active umbrella tooth 2 that links to each other with 1, and the 2 driven umbrella teeth 3 that are coupled, the pinion(gear) 4, the transmitting gear 5 that are enclosed within on 3 form; Its annexation is: rotating shaft 1 is fixedlyed connected with active umbrella tooth 2, and initiatively umbrella tooth 2 is of coupled connections with driven umbrella tooth 3, and driven umbrella tooth 3 is fixedlyed connected with the pinion(gear) 4 that is enclosed within on 3, and the pinion(gear) 4 that is enclosed within on 3 is of coupled connections with transmitting gear 5; Face internal rotation part is formed (as Fig. 1, Fig. 2) by what be carved with rolling groove 17, radial support dish 10, radial support dish 10 on the groove face by being carved with rolling groove 15, adjusting screw 11, ball 12 on the groove face by what be carved with rolling groove 14, fixed substrate anchor clamps 7, substrate 8, axial support dish 9, axial support dish 9 on the groove face 13 by master wheel 6, master wheel 6; Its annexation is: transmitting gear 5 is of coupled connections with master wheel 6, master wheel 6, fixed substrate anchor clamps 7, substrate 8 are by screw retention together, axial support dish 9, radial support dish 10 are fixed together by adjusting screw 11, its spacing is from regulating by adjusting screw 11, the groove face 13 that has of master wheel 6 is connected by ball 12 rollings with radial support dish 10, the no groove face 16 of master wheel 6 rolls by ball 12 with axial support dish 9 and is connected, and constitutes the solution of the present invention one, as shown in Figure 3.
We constitute the solution of the present invention two with the rolling groove on the radial support dish 10 in 20 replacement schemes one of the rolling outer rail on the radial support dish 10 15, as shown in Figure 4 with the rolling groove 14 on the master wheel 6 in rail 19 replacement schemes one in the rolling on the master wheel 6.
Need to prove that when using at low temperatures, ball 12 can use metallic substance; But for the situation that high temperature uses, ball 12 should use stupalith, as alumina-ceramic.
Working process of the present invention is: in physics vapour deposition system, the rotating shaft 1 of driven by motor links to each other with active umbrella tooth 2, and initiatively umbrella tooth 2 is coupled with driven umbrella tooth 3 and drives pinion(gear) 4 rotations that are enclosed within on 3, realizes slowing down first; Pinion(gear) 4 further drives transmitting gear 5 rotations, and transmitting gear 5 and master wheel 6 couplings are realized slowing down for the second time, thereby realize the rotation of master wheel 6.Substrate fixture 7 or substrate 8 are by screw retention on master wheel 6 (as Fig. 2).The location of master wheel 6 is to rely on axial support dish 9 to carry out axial location, radial support dish 10 to carry out gap adjustment that radial location and adjusting screw 11 carry out as shown in Figure 2.Master wheel 6 rolling groove 14 on the groove face 13 arranged, the rolling groove 15 on radial support dish 10 constitutes the rolling groove of ball 12 to master wheel 6 radial locations; The no groove face 16 of master wheel 6 is the plane, contacts with ball 12 in the rolling groove 17 on the axial support dish 9, to master wheel 6 axial location (as shown in Figure 3, Figure 4).Said structure can be when positioning master wheel 6, by the adjusting of adjusting screw 11, allow master wheel 6 that rational movement clearance is arranged, thereby also can overcome the influence of high temperature deformation when this rotating mechanism is at high temperature worked, avoid stuck inefficacy, realize reliable and stable rotation.Whole transmission and rotating mechanism link to each other with the equipment that carries out vapour deposition by bracing frame 18.
The advantage or the positively effect of invention:
The present invention has taken all factors into consideration two aspect factors of Processes and apparatus, has designed and produced the rotating mechanism of high reliability, can be used for the thin film deposition of high and low temperature.Use the present invention and in conjunction with the double source depositing operation, the two sides that can at high temperature carry out double-side membrane deposits simultaneously, can guarantee the consistence on film two sides, can improve the inner evenness of film simultaneously.This internal rotation mechanism can improve the reliability that high temperature rotates greatly, thoroughly prevents the dislocation stuck phenomenon that high temperature deformation causes.
Accompanying drawing and description of drawings:
Fig. 1 apparatus of the present invention synoptic diagram.
Wherein, the 1st, rotating shaft, the 4th, be enclosed within the pinion(gear) on 3, the 5th, transmitting gear, the 6th, master wheel, the 8th, substrate, the 9th, axial support dish, the 10th, radial support dish, the 11st, adjusting screw, the 18th, fixed support.Fig. 2 apparatus of the present invention wiring layout.
Wherein, the 1st, rotating shaft, the 2nd, the active umbrella tooth that links to each other with rotating shaft 1, the 3rd, with the 2 driven umbrella teeth that are coupled, the 4th, be enclosed within the pinion(gear) on 3, the 5th, transmitting gear, the 6th, master wheel, the 7th, substrate fixture, the 8th, substrate, the 9th, axial support dish, the 10th, the radial support dish, the 11st, adjusting screw, the 12nd, ball, the 18th, fixed support.
Rotating element sectional view in the face of Fig. 3 scheme one.
Wherein, the 6th, master wheel, the 9th, axial support dish, the 10th, radial support dish, the 11st, adjusting screw, the 12nd, ball, the 13rd, master wheel 6 groove face, the 14th, the rolling groove on the master wheel 6 arranged, the 15th, the rolling groove on the radial support dish 10, the 16th, the no groove face of master wheel 6, the 17th, the rolling groove on the axial support dish 9, the 18th, fixed support.As can be seen from the figure, by regulate 11 we can regulate distance between 9 and 10 so that 6 can free movements and don't as for breaking away from tracks.We only adopt at radial location face fluting and radial misalignments that another side keeps the planar method can prevent that high temperature deformation from causing is stuck on 6.
Rotating element sectional view in the face of Fig. 4 scheme two.
Wherein, the 6th, master wheel, the 9th, axial support dish, the 10th, radial support dish, the 11st, adjusting screw, the 12nd, ball, the 13rd, master wheel 6 groove face, the 16th, the no groove face of master wheel 6 arranged, the 17th, the rolling groove on the axial support dish 9, the 18th, fixed support, the 19th, rail in the rolling on the master wheel 6, the 20th, the rolling outer rail on the radial support dish 10.As can be seen from the figure, by regulate 11 we can regulate distance between 9 and 10 so that 6 can free movements and don't as for breaking away from tracks.We only adopt at radial location face fluting and radial misalignments that another side keeps the planar method can prevent that high temperature deformation from causing is stuck on 6.
Embodiment:
Because the present invention has reliable, compact construction, at high temperature depositing large-area two-side film membrane realization homogeneity and consistence are highly beneficial.But adopt the present invention in room temperature to 800 ℃ all steady running down.25 ℃, 600 ℃, 700 ℃ and 800 ℃ respectively continuous operation do not have any fault more than 48 hours.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02134104 CN1240871C (en) | 2002-11-19 | 2002-11-19 | Inner surface swiveling device for depositing thin film at high temperature |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02134104 CN1240871C (en) | 2002-11-19 | 2002-11-19 | Inner surface swiveling device for depositing thin film at high temperature |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1500903A true CN1500903A (en) | 2004-06-02 |
| CN1240871C CN1240871C (en) | 2006-02-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02134104 Expired - Fee Related CN1240871C (en) | 2002-11-19 | 2002-11-19 | Inner surface swiveling device for depositing thin film at high temperature |
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| Country | Link |
|---|---|
| CN (1) | CN1240871C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102154690A (en) * | 2011-05-23 | 2011-08-17 | 东莞市天域半导体科技有限公司 | Method and device for forming tray in planetary epitaxial growth equipment |
| CN102555130A (en) * | 2010-12-17 | 2012-07-11 | 中国科学院理化技术研究所 | Method for preparing polymer film by rotating container to form film |
| CN104818468A (en) * | 2015-04-15 | 2015-08-05 | 中国科学院宁波材料技术与工程研究所 | Three-shaft rotation base frame device in vacuum film plating cavity |
-
2002
- 2002-11-19 CN CN 02134104 patent/CN1240871C/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102555130A (en) * | 2010-12-17 | 2012-07-11 | 中国科学院理化技术研究所 | Method for preparing polymer film by rotating container to form film |
| CN102154690A (en) * | 2011-05-23 | 2011-08-17 | 东莞市天域半导体科技有限公司 | Method and device for forming tray in planetary epitaxial growth equipment |
| CN102154690B (en) * | 2011-05-23 | 2012-05-30 | 东莞市天域半导体科技有限公司 | Method and device for forming tray in planetary epitaxial growth equipment |
| CN104818468A (en) * | 2015-04-15 | 2015-08-05 | 中国科学院宁波材料技术与工程研究所 | Three-shaft rotation base frame device in vacuum film plating cavity |
| CN104818468B (en) * | 2015-04-15 | 2017-07-21 | 中国科学院宁波材料技术与工程研究所 | Three axles in vacuum coating cavity turn pedestal device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1240871C (en) | 2006-02-08 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Zhongshan Jintian Packing Printing Co., Ltd. Assignor: University of Electronic Science and Technology of China Contract fulfillment period: 2007.6.20 to 2012.6.20 contract change Contract record no.: 2008440000520 Denomination of invention: Inner surface swiveling device for depositing thin film at high temperature Granted publication date: 20060208 License type: Exclusive license Record date: 20081211 |
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| LIC | Patent licence contract for exploitation submitted for record |
Free format text: EXCLUSIVE LICENSE; TIME LIMIT OF IMPLEMENTING CONTACT: 2007.6.20 TO 2012.6.20; CHANGE OF CONTRACT Name of requester: ZHONGSHAN CITY JINTIAN COATING YINWU CO., LTD. Effective date: 20081211 |
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| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |