CN1305027C - Friction cleaning equipment and method for manufacturing magnetic head spring flap assembly - Google Patents
Friction cleaning equipment and method for manufacturing magnetic head spring flap assembly Download PDFInfo
- Publication number
- CN1305027C CN1305027C CNB008087814A CN00808781A CN1305027C CN 1305027 C CN1305027 C CN 1305027C CN B008087814 A CNB008087814 A CN B008087814A CN 00808781 A CN00808781 A CN 00808781A CN 1305027 C CN1305027 C CN 1305027C
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- CN
- China
- Prior art keywords
- friction
- hga
- cleaning
- solution
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 18
- 230000005291 magnetic effect Effects 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title description 2
- 239000004744 fabric Substances 0.000 claims abstract description 8
- 229920000728 polyester Polymers 0.000 claims abstract description 5
- 238000005201 scrubbing Methods 0.000 claims abstract 3
- 239000003344 environmental pollutant Substances 0.000 claims description 16
- 231100000719 pollutant Toxicity 0.000 claims description 16
- 238000004090 dissolution Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000004945 emulsification Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000003599 detergent Substances 0.000 claims description 2
- 239000000356 contaminant Substances 0.000 claims 2
- 239000000969 carrier Substances 0.000 claims 1
- 230000002925 chemical effect Effects 0.000 claims 1
- 239000010419 fine particle Substances 0.000 claims 1
- 238000001914 filtration Methods 0.000 abstract description 7
- 230000003749 cleanliness Effects 0.000 abstract description 2
- 230000000712 assembly Effects 0.000 abstract 1
- 238000000429 assembly Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 6
- 239000000428 dust Substances 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 3
- 239000005041 Mylar™ Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000009991 scouring Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 231100001240 inorganic pollutant Toxicity 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- -1 particulate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/41—Cleaning of heads
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
The present application describes a new friction cleaning apparatus and method for cleaning HGAs (head gimbal assemblies) to meet the growing need in the disk drive industry for head cleanliness. The HGA friction cleaning device comprises an HGA friction cleaning assembly with a group of HGA bearing pieces, and is used for effectively and simultaneously carrying out friction cleaning on a plurality of HGAs relative to a friction cleaning finger which is wrapped by antistatic polyester cloth and moves back and forth. Multiple HGAs to be cleaned are simultaneously loaded onto the HGA carrier and then immersed in a scrub tank containing a solution. The HGA carrier is driven by a pneumatic cylinder unit that is individually controlled by a programmable controller for additional scrubbing. A plurality of pressure pins also hold the HGA, providing proper friction between the ABS surface of the head and the friction surface. The scrubbing tank has an overflow for solution circulation and filtration, a pump and a filtration vessel with a 0.2 micron filter cartridge, and also has a thermostatically controlled heating wire heater to heat the solution to good conditions.
Description
Technical field
Put it briefly, the present invention relates to a kind of polish cleaning apparatus and method that is used for disk drive industry, specifically, the present invention relates to a kind of equipment and method of making HGA (HGA (head gimbal assembly)) that be applicable to.
Background technology
As everyone knows, thin-film head and data storage disk adapted are in order to read and write data on the recording layer of disk.Usually, magnetic head " circles in the air " with very low " highly " in the surface of disk.The height of the air gap between magnetic head and the disk is generally measured with the part micron, so that has formed a kind of air bearing.
For the disk that utilizes magnetic effect storage data, magnetic head generally includes a RF (radio frequency) coil, in order to send and to receive magnetic field, carries out write and read on recording layer.For the CD that utilizes luminous effect storage data, shaven head can comprise that one focuses on object lens on the recording layer with light beam.
Because the magnetic head of low flight, the dust of surrounding environment just becomes a serious problem.Dirt particle may cause catastrophic " magnetic head is cracked ", damages magnetic head and disk.In addition, a large amount of dust may accumulate on the magnetic head, disturbs magnetic effect and luminous effect.
Because pollutant may cause the maloperation of disc driver, even can not rotate, adopt simultaneously the classics of liquid chemical material and sonic oscillation cleaning, wash with dry cleaning technology and can not provide enough cleaning efficiencies air bearing surface (ABS (air bearing the surface)) surface of magnetic head, therefore along with the disk industrial expansion, the cleanliness on read/write head surface have become one of problem of most critical.Make the method that the commercial city is being sought more effective removal pollutant as possible, always keep cleaning as far as possible to guarantee element and driver.
Authorize people's such as Neville K.Lee U.S. Pat No.5 November 14 nineteen ninety-five, 467,238 disclose and a kind ofly have been used for the cleaning equipment of read/write head of the data of storing on the recording disc of accessing disk driver in order to cleaning.Cleaning equipment comprises the mounting base that adjoins the disk location.Pedestal comprises one in order to rotate the ratchet device of cleaning cushion block mounted thereto.Ratchet device be by one in order to the locating read-write head rotation or linear actuator arm drive.Ratchet device rotates the cleaning cushion block, and read/write head unloads from disk in topworks.A loading ramp is used for making the clean surface perpendicular positioning of read/write head with respect to the cleaning cushion block.
Yet because this traditional cleaning equipment structure is complicated, efficient is lower, and only just uses after the disc driver assembling, and therefore, it is not suitable for the batch process magnetic head.
Summary of the invention
An object of the present invention is to provide the new polish cleaning apparatus of a class, so that can overcome the magnetic head pollution problems that causes by dust or particulate fully in order to the magnetic head of erase head spring tabs assembly (HGA).
Another object of the present invention provides the friction cleaning method that is applicable to this polish cleaning apparatus.
According to an aspect of the present invention, the polish cleaning apparatus of a kind of erase head spring tabs assembly (HGA) comprising:
A frame;
A plurality of bearing parts that are used for accurately placing and keeping HGA respectively, described HGA has a magnetic head ABS surface down that will be rubbed;
A plurality of frictions refer to, are positioned at the below of described bearing part, in a row fixed configurations;
A kind ofly surround the mylar that described friction refers to,, provide a plurality of frictions to clean the rubbing surface of described HGA as friction media;
A plurality of press-on pins on each described bearing part are pressed in respectively on the flexible element of HGA, provide suitable friction between the ABS surface of described magnetic head and friction surface;
A cylinder moving cell makes up with described bearing part, and is controlled by a Programmable Logic Controller, and described bearing part and described a plurality of HGA are moved back and forth along X and Y direction according to the program of customization in advance;
The scouring case that cleaning solution is housed is configured in the top of described frame, and solution is by pump and have the filtering container of imitating cartridge filter and circulate; And
The strip heater that constant temperature is controlled is in order to be heated to required working temperature to described solution.
According to another aspect of the present invention, the friction cleaning method of the equipment of a kind of HGA (HGA) that is applicable to erase head comprises the following steps:
On bearing part, accurately place and keep a plurality of HGA, described HGA that a magnetic head ABS surface down that will be rubbed is arranged;
Wipe pollutant on the dirty surface of the described magnetic head that is cleaning with the polyester cloth of motion, the pollutant with bulk is ground into tiny broken end simultaneously;
Make chemical actions such as the dissolving by washing agent of the described pollutant wiped, emulsification enter solution, select temperature, kind and the concentration of the chemical substance of described solution, to reach maximum cleaning efficiency;
Described solution is stirred in motion by the cylinder unit fully, promotes dissolution;
Utilize filtering container in time to filter out dissolving, that do not suspend pollutant and particulate in the described solution, make that the ABS surface of magnetic head is not contaminated.
Polish cleaning apparatus of the present invention and method provide much higher cleaning efficiency to lip-deep visible or sightless pollutant of magnetic head ABS and particulate.Equipment of the present invention and method are not only general but also effective, so that they are applicable to removal dust, greasy dirt, finger mark and other organic and inorganic pollutant with particulate and form of film.
Description of drawings
Describe above and other objects of the present invention and advantage with reference to the accompanying drawings by most preferred embodiment now, wherein:
Fig. 1 is the top view of polish cleaning apparatus of the present invention;
Fig. 2 is the skeleton view that is positioned at the HGA bearing part that the friction of polish cleaning apparatus of the present invention refers to; And
Fig. 3 is the water cycle figure of polish cleaning apparatus.
Embodiment
As Figure 1-3, polish cleaning apparatus of the present invention mainly comprises four parts: friction refers to, HGA bearing part, cylinder moving cell and dipping are cleaned case.
Consult Fig. 2, disposed two row's frictions and refer to 2 on friction cleaning unit 1 and 8, utilize tension force that a kind of anlistatig polyester cloth entirely is fixed on friction and refer on 2, form the friction clean surface, a plurality of HGA 1 that will effectively be rubbed are contained on the friction cleaning face.
The HGA bearing part has disposed a plurality of cylindrical pressure pins, and these press-on pins are pressed in respectively on the flexure member of HGA.The HGA bearing part keep a plurality of HGA 1 according to basically simultaneously certain program of friction cleaning seesaw, and the common cooperation that refers to by bearing part and friction sees also Fig. 2 for a plurality of HGA 1 provide accurate localization.
The cylinder moving cell respectively comprises X cylinder 4,5 and Y cylinder 3,6, and these cylinders seesaw along X or Y direction respectively according to certain program of customization in advance, and repeatedly HGA bearing part and a plurality of HGA are moved along X and Y direction respectively.
Keep the HGA bearing part of HGA to be dipped in the scouring case that solution is housed, make HGA to be cleaned by friction.Cleaning case has the solution circulation and filters the overflow vent, pump of usefulness and with the filtering container of 0.2 micron cartridge filter, it also has a strip heater that constant temperature is controlled, and solution is heated to suitable working temperature.
Explain friction cleaning method of the present invention now.Friction is the contact clean method that adopts a kind of mylar as cleaning medium, and mylar has good antistatic property, less particulate or do not have particulate, wearing quality.When polish cleaning apparatus is worked, pneumatic cylinder moving cell makes the HGA that just rubbed move back and forth surrounding on the cloth that friction refers to along X and Y direction, so friction magnetic head ABS surface just can reach much higher cleaning efficiency (near 90%), sees also Fig. 1.Cleaning function is from chemistry and physical action and friction cleaning acquisition.It comprises three kinds of processing:
The effect of cloth brushing is first kind of processing, plays main and most important effect in friction is cleaned.In this process, the cloth of motion is wiped the pollutant on the magnetic head dirty surface of cleaning, and simultaneously block pollutant is ground into tiny broken end.
The detergent dissolution effect is second kind of processing, and chemical action such as the dissolving of the pollutant of wiping in this process by washing agent, emulsification enters in the solution.This is similar to traditional cleaning method: the kind of time, temperature and washing agent and concentration are three important parameters that reach maximum cleaning efficiency.Simultaneously, the motion of cylinder is for promoting that dissolution provides abundant stirring.
Filtration is the third processing, and in this process, dissolving, that do not suspend pollutant and particulate are in time filtered out by filtering container in the solution, otherwise they may pollute these products once more, make the latter to clean once more.
HGA is the element of a kind of precision in the disc driver.Traditional ultrasonic cleaning method may cause physical damage under high ultrasonic power, this is restricted with regard to the purposes that makes it, and sufficient cleaning performance can not be provided.Yet, this new friction cleaning technique erase head effectively, and can not have side effects to the performance of HGA.The pollutant that can remove all kinds is basically cleaned in friction, such as dust, particulate, film etc.For the pollutant of all kinds, no matter be the organic or inorganic thing, its clearance is up to 95%, and classical ultrasonic cleaning only is 60% for tiny particle removal, then has no efficient for the pollutant of other kind.
Although the present invention is described by most preferred embodiment, yet foregoing all is exemplary in all respects, and explains restrictive.Obviously those skilled in the art can make various remodeling and correction not departing from the scope of the present invention under the prerequisite.
Claims (2)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2000/000089 WO2001080226A1 (en) | 2000-04-13 | 2000-04-13 | Polish cleaning apparatus and method in manufacture of hga |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1355917A CN1355917A (en) | 2002-06-26 |
| CN1305027C true CN1305027C (en) | 2007-03-14 |
Family
ID=4574649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB008087814A Expired - Lifetime CN1305027C (en) | 2000-04-13 | 2000-04-13 | Friction cleaning equipment and method for manufacturing magnetic head spring flap assembly |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US6645308B2 (en) |
| CN (1) | CN1305027C (en) |
| WO (1) | WO2001080226A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1305027C (en) * | 2000-04-13 | 2007-03-14 | 新科实业有限公司 | Friction cleaning equipment and method for manufacturing magnetic head spring flap assembly |
| JP4347774B2 (en) * | 2004-09-14 | 2009-10-21 | パナソニック株式会社 | Magnetic recording / reproducing device |
| JPWO2011001506A1 (en) * | 2009-06-30 | 2012-12-10 | 富士通フロンテック株式会社 | Magnetic card reader |
| MY180178A (en) | 2013-02-28 | 2020-11-24 | Seagate Technology Llc | Method of cleaning magnetic head slider |
| US20150320503A1 (en) * | 2014-05-06 | 2015-11-12 | Vatche BEZDIKIAN | Sterilization assembly and methods of use |
| CN106205641A (en) * | 2016-06-27 | 2016-12-07 | 东莞市楷德精密机械有限公司 | Magnetic head cleaning device, magnetic head cleaning machine, and magnetic head cleaning method thereof |
| CN114654327B (en) * | 2022-03-28 | 2023-05-02 | 宁波欧达光电有限公司 | Deburring device for solar photovoltaic panel production |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5467238A (en) * | 1993-07-06 | 1995-11-14 | Quantum Corporation | Cleaning apparatus for heads of data storage disks |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4183819A (en) * | 1978-07-12 | 1980-01-15 | Solomon Stolove | Solution and method for cleaning, polishing and lubricating magnetic heads |
| US4374404A (en) * | 1980-08-25 | 1983-02-15 | Innovative Computer Products Corp. | Non-abrasive magnetic head cleaning system |
| US4663686A (en) * | 1984-01-23 | 1987-05-05 | Iomega Corporation | Head cleaning cartridge for magnetic disk drive |
| JPH0682474B2 (en) * | 1985-09-20 | 1994-10-19 | 松下電器産業株式会社 | Cleaning device |
| US5453893A (en) * | 1992-06-15 | 1995-09-26 | Matsushita Electric Industrial Co., Ltd. | Head cleaning device |
| JP3740186B2 (en) * | 1995-05-17 | 2006-02-01 | 株式会社日立グローバルストレージテクノロジーズ | Manufacturing method of magnetic head slider |
| US5850321A (en) * | 1996-09-18 | 1998-12-15 | Maxtor Corporation | Self-cleaning proximity recording interface |
| US6084753A (en) * | 1997-01-02 | 2000-07-04 | International Business Machines Corporation | Method and apparatus for removing debris from a slider in a disk drive using load/unload technology |
| US6217425B1 (en) | 1998-06-12 | 2001-04-17 | Tdk Corporation | Apparatus and method for lapping magnetic heads |
| JP2000173030A (en) * | 1998-12-02 | 2000-06-23 | Nec Corp | Magnetic disk device |
| JP3693847B2 (en) * | 1999-03-26 | 2005-09-14 | Ｎｅｃエレクトロニクス株式会社 | Method and apparatus for storing wafer after polishing |
| US6491204B1 (en) * | 1999-11-30 | 2002-12-10 | Gunter Erdmann | Stencil wiping device |
| CN1305027C (en) * | 2000-04-13 | 2007-03-14 | 新科实业有限公司 | Friction cleaning equipment and method for manufacturing magnetic head spring flap assembly |
-
2000
- 2000-04-13 CN CNB008087814A patent/CN1305027C/en not_active Expired - Lifetime
- 2000-04-13 WO PCT/CN2000/000089 patent/WO2001080226A1/en active Application Filing
-
2001
- 2001-03-16 US US09/810,833 patent/US6645308B2/en not_active Expired - Lifetime
-
2003
- 2003-09-24 US US10/669,621 patent/US7059005B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5467238A (en) * | 1993-07-06 | 1995-11-14 | Quantum Corporation | Cleaning apparatus for heads of data storage disks |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1355917A (en) | 2002-06-26 |
| US7059005B2 (en) | 2006-06-13 |
| US20010030171A1 (en) | 2001-10-18 |
| US6645308B2 (en) | 2003-11-11 |
| US20040058622A1 (en) | 2004-03-25 |
| WO2001080226A1 (en) | 2001-10-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: DONGGUAN SAE TECHNOLOGY R+D CO., LTD. Free format text: FORMER OWNER: NEW TECHTRONIC INDUSTRIES CO. LTD. Effective date: 20091204 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20091204 Address after: Nancheng Hongyuan Industrial Zone, Guangdong, Dongguan, China Patentee after: SAE Technologies Development (Dongguan) Co., Ltd. Address before: Kwai Chung, Hongkong, China Patentee before: Xinke Industry Co., Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20070314 |