CN1269538A - Low-CTE power source and stratum - Google Patents
Low-CTE power source and stratum Download PDFInfo
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
这里公开了具有低热膨胀系数(CTEs)且用于电源和地层的导电材料。金属化具有低CTE的纤维材料(例如,碳、石墨、玻璃、石英、聚乙烯和液晶聚合物纤维),以提供具有低CTE的导电材料。这些纤维在各自的状态下被金属化,然后形成织物,或这些材料可形成织物,然后金属化,或两种金属化结合使用。此外,石墨或碳片可以金属化一面或两面,以提供具有低CTE和高导电性的材料。
Conductive materials having low coefficients of thermal expansion (CTEs) for power sources and formations are disclosed herein. Fiber materials with low CTE (eg, carbon, graphite, glass, quartz, polyethylene, and liquid crystal polymer fibers) are metallized to provide conductive materials with low CTE. These fibers are metallized in their respective states and then formed into fabrics, or these materials can be formed into fabrics and then metallized, or a combination of both metallizations are used. In addition, graphite or carbon sheets can be metallized on one or both sides to provide materials with low CTE and high conductivity.
Description
该申请涉及Japp等人于1999年4月26日申请、系列号为09/300762、题为“POROUS POWER AND GROUND PLANES FORREDUCED PCB DELAMINATION AND BETTER RELIABLITY”的共同等审专利申请,这里引入作参考。This application involves a co-examination patent application filed by Japp et al. on April 26, 1999, serial number 09/300762, entitled "POROUS POWER AND GROUND PLANES FORREDUCED PCB DELAMINATION AND BETTER RELIABLITY", which is hereby incorporated by reference.
本发明一般涉及计算机制造领域,具体涉及减小用于计算机的电路板的热膨胀系数。This invention relates generally to the field of computer manufacturing, and more particularly to reducing the coefficient of thermal expansion of circuit boards used in computers.
计算机和类似的电子设备已在人们的日常生活中随处可见。许多商业机构、银行、政府机构都依赖于计算机从事他们的日常活动。整个社会中大部分需要计算机能可靠、稳定地进行它们的经济、社交和通信活动。与以往任何时候的计算机相比,今天需要计算机运行时间更长,停机时间更短。Computers and similar electronic devices are ubiquitous in people's daily lives. Many businesses, banks, and government agencies rely on computers for their daily activities. Most of society as a whole requires computers to be able to perform their economic, social and communication activities reliably and stably. Computers are required to run longer with less downtime today than computers have ever been.
由于如此需要计算机,所以计算机设计者们更着重于其可靠性。今天的许多系统不允许有较长的停机时间更换构成计算机系统的失效元件。如果每个元件都设计成寿命更长且更可靠,那么仅由这些元件构成的每台计算机的寿命将更长且更可靠。Because computers are so needed, computer designers place greater emphasis on their reliability. Many systems today do not allow for extensive downtime to replace failed components that make up the computer system. If every component is designed to last longer and be more reliable, then every computer built from only those components will live longer and be more reliable.
对元件可靠性的重现也适用于印刷电路板(PCBs)。通过在PCB上设置含半导体芯片的半导体封装或通过在层叠芯片载体(LCCs)上直接设置芯片并连接LCCs与PCB,设计计算机系统中的多数元件。PCBs称之为“印刷的”是由于电路走线或铜线利用最初与新闻纸印刷工艺类似的技术布设于电路板上。这些电路线将各半导体封装或各芯片连接在一起。PCBs可以简单形成为在其一个或两个面上印刷有线路且一个或多个封装固定于其一个或两个面上的绝缘体。然而,PCBs通常变得越来越复杂,一般由导电的金属电源和地层及几个信号层构成,信号层含有夹在几个绝缘层间的电路线,夹层的上下表面上具有金属线和焊盘。上下导体通过镀金属的通孔(PTHs)彼此连接并与内部电路层连接。Reproducibility of component reliability also applies to printed circuit boards (PCBs). Most components in a computer system are designed by placing semiconductor packages containing semiconductor chips on PCBs or by directly placing chips on laminated chip carriers (LCCs) and connecting the LCCs to the PCB. PCBs are called "printed" because the circuit traces or copper wires are laid on the board using a technique originally similar to the newsprint printing process. These circuit lines connect the individual semiconductor packages or the individual chips together. PCBs can be formed simply as insulators with traces printed on one or both sides and one or more packages affixed to one or both sides. However, PCBs are usually becoming more and more complex, generally consisting of conductive metal power and ground planes and several signal layers containing circuit lines sandwiched between several insulating layers, with metal lines and solder on the upper and lower surfaces of the interlayers. plate. The upper and lower conductors are connected to each other and to the internal circuit layers through plated through holes (PTHs).
以此方式制造的PCBs已成为标准电子产品。制造方法的进步已使PCBs相对便宜。而且它们的简单性使它们更可靠。然而,仍存在与PCBs有关的问题。这些问题中的一些的原因之一便是整个PCB和各层的热膨胀系数(CTE)。PCBs manufactured in this way have become standard electronics. Advances in manufacturing methods have made PCBs relatively inexpensive. And their simplicity makes them more reliable. However, there are still problems associated with PCBs. One of the causes of some of these issues is the coefficient of thermal expansion (CTE) of the entire PCB and layers.
许多PCBs尤其是LCCs一般由有机物构成,需要具有较好是与硅芯片的CTE匹配的低CTE。在试图减小PCB的CTE时,可以使用各种低CTE的介质材料。然而,使用这些低CTE介质的效果是有限的,是由于构成PCB的主要部分的电源和地层仍由铜构成。与某些低CTE介质材料相比,铜具有较高的CTE。由于铜的较高CTE,铜的较高用量,及铜的高张力模数,使得电路板或LCC保持高复合CTE。Many PCBs, especially LCCs, are generally composed of organic matter and need to have a low CTE that better matches that of silicon chips. When trying to reduce the CTE of a PCB, various low CTE dielectric materials can be used. However, the effectiveness of using these low CTE dielectrics is limited because the power and ground planes that make up the bulk of the PCB are still composed of copper. Copper has a high CTE compared to some low CTE dielectric materials. Due to the higher CTE of copper, the higher amount of copper used, and the high tensile modulus of copper, the circuit board or LCC maintains a high composite CTE.
高CTE电源和地层导致了PCB的总CTE与这些金属层的CTE类似。由于总CTE相对较高,PCB或LCC自身随着温度的升高会尺寸变长和增大。尺寸的增大意味着PCB或LCC表面上的芯片、封装、线和其它器件需按相同的比例膨胀,或能够允许由于尺寸的失配造成的应力。有时,这些器件或它们间的电连接不能承受这些应力,尤其是重复的温度循环后。High CTE power and ground planes cause the overall CTE of the PCB to be similar to the CTE of these metal layers. Due to the relatively high total CTE, the PCB or LCC itself will become longer and larger in size as the temperature rises. The increase in size means that chips, packages, wires and other devices on the surface of PCB or LCC need to expand in the same proportion, or be able to tolerate the stress caused by the mismatch of size. Sometimes these devices or the electrical connections between them cannot withstand these stresses, especially after repeated temperature cycling.
这些应力尤其会使LCCs变差。芯片通过称做可控熔塌芯片连接(C4)的小焊料突点与LCC相连。而LCC一般通过球栅阵列(BGAs)与PCB相连。在芯片下和其周围进行密封和/或底层涂敷以保护芯片。These stresses especially degrade LCCs. The chip is connected to the LCC by small solder bumps called controlled-collapse chip connections (C4). LCCs are generally connected to PCBs through ball grid arrays (BGAs). Sealing and/or undercoating are performed under and around the chip to protect the chip.
以前的芯片载体几乎都由具有低CTEs的陶瓷构成。低CTE芯片载体不会在芯片上产生那么大的应力,是由于陶瓷层不会膨胀那么多。然而,目前采用叠层材料作芯片载体。层叠材料具有如上所述的较高CTEs,会在与LCC相连的芯片上产生更大应力。不幸的是,由于芯片最初由易破裂的结晶硅构成,这种应力或者使C4连接破裂,或者芯片/LCC的CTE失配将造成已组装封装翘曲,将张力作用于芯片上,可能会使芯片龟裂。Previous chip carriers were almost all composed of ceramics with low CTEs. Low CTE chip carriers do not place as much stress on the chip because the ceramic layers do not expand as much. However, laminated materials are currently used as chip carriers. Laminate materials have higher CTEs as described above, which creates greater stress on the chip connected to the LCC. Unfortunately, since the chip is originally constructed from crack-prone crystalline silicon, this stress will either crack the C4 connection, or the CTE mismatch of the chip/LCC will cause the assembled package to warp, putting tension on the chip, possibly making the Chip cracks.
此外,在PCB制造中常用的金属层具有远高于某些低CTE介质的较高CTE。由于CTEs的差异,温度升高会引起金属以高于介质的速率变长。这种膨胀差异会在介质上产生高应力,而这种应力会导致介质材料龟裂。由于电路线会被拉断,所以介质的龟裂会造成开路。CTE不同造成的另一效应是切力造成的剥离,于是介质从电源/地层上剥落。由于剥离的介质基本上是“悬浮”的,且与金属化电源/地层不连接,因而切力造成的剥离加重了CTE导致的龟裂机制。然而,剥离区的外围与金属化层相连,在金属化层随温度升高而变长时,易与金属层一起移动。在外围区离开剥离介质移动时,龟裂会在外围区周围发展。In addition, metal layers commonly used in PCB manufacturing have higher CTEs that are much higher than some low CTE dielectrics. Due to the difference in CTEs, an increase in temperature causes the metal to elongate at a higher rate than the medium. This difference in expansion creates high stresses on the media, which can cause cracks in the media material. Since the circuit wire will be pulled off, the crack in the medium will cause an open circuit. Another effect caused by the difference in CTE is shear-induced debonding, whereby the dielectric is peeled off from the power/ground plane. Since the stripped dielectric is essentially "suspended" and disconnected from the metallization power/ground plane, the shear-induced stripping exacerbates the CTE-induced cracking mechanism. However, the periphery of the lift-off region is connected to the metallization layer, and tends to move together with the metallization layer when the metallization layer becomes longer with increasing temperature. As the peripheral region moves away from the stripping medium, cracks develop around the peripheral region.
尽管例如铁镍合金、不锈钢、和钼等低CTE金属已用来构成PCBs和LCCs的低CTE电源层,但使用这些替代金属会使制造变复杂。这些复杂性包括电池作用和侵蚀、多步腐蚀及复杂的废物处理。Although low-CTE metals such as iron-nickel alloys, stainless steel, and molybdenum have been used to form the low-CTE power planes of PCBs and LCCs, the use of these alternative metals complicates fabrication. These complexities include galvanic action and erosion, multi-step corrosion, and complex waste handling.
因此,没有办法限制由介质和电源/地层间CTE差异造成的失效和破裂,PCBs和LCCs的较高的总CTE将继续造成大量失效和可靠性问题。Therefore, there is no way to limit failures and cracks caused by CTE differences between dielectric and power/ground planes, and the higher overall CTE of PCBs and LCCs will continue to cause a large number of failures and reliability problems.
因此,本发明的实施例提供具有低热膨胀系数(CTEs)可用于电源和地层的导电材料。金属化纤维材料(例如碳、石墨、玻璃、和液晶聚合物等),以提供具有低CTE的所得的导电材料。这些纤维可以在它们各自的状态下金属化,然后形成织物,或这些材料形成织物,然后金属化,或可以采用两种金属化方法的组合。此外,石墨层可以一面或两面金属化,以提供具有低CTE和高导电性的材料。这些金属化的低CTE电源和地层然后可层叠成复合体用于印刷电路板(PCBs)或用于作为层叠芯片载体的PCBs。本发明可以提供用于PCBs和LCCs且没有与特殊的低CTE金属有关的问题的导体。Accordingly, embodiments of the present invention provide conductive materials having low coefficients of thermal expansion (CTEs) useful for power sources and formations. Fiber materials (such as carbon, graphite, glass, and liquid crystal polymers, etc.) are metallized to provide the resulting conductive material with a low CTE. The fibers can be metallized in their individual state and then formed into a fabric, or the materials can be formed into a fabric and then metalized, or a combination of both metallization methods can be used. In addition, graphite layers can be metallized on one or both sides to provide a material with low CTE and high electrical conductivity. These metallized low CTE power and ground planes can then be laminated into composites for printed circuit boards (PCBs) or for PCBs as stacked chip carriers. The present invention can provide conductors for PCBs and LCCs without the problems associated with particular low CTE metals.
从以下对本发明优选实施例的更具体介绍中,可以清楚本发明的上述和其它优点及特点,如各附图中所介绍的。The above and other advantages and features of the invention will become apparent from the following more particular description of the preferred embodiments of the invention, as illustrated in the accompanying drawings.
下面将结合附图介绍本发明的优选例示实施例,各附图中类似的标记表示类似的元件:Preferred exemplary embodiments of the present invention will be described below in conjunction with the accompanying drawings, in which like numerals represent like elements:
图1是按本发明几个优选实施例的电源或地层的剖面图;Fig. 1 is a sectional view of a power supply or a formation according to several preferred embodiments of the present invention;
图2是按本发明一个优选实施例的六层印刷电路板和构成六层印刷电路板的各层的剖面图;Fig. 2 is a cross-sectional view of a six-layer printed circuit board according to a preferred embodiment of the present invention and each layer that constitutes a six-layer printed circuit board;
图3是本发明优选实施例的制造和使用电源或地层的方法的工艺流程图;Fig. 3 is a process flow diagram of a method for manufacturing and using a power source or formation according to a preferred embodiment of the present invention;
图4是六层印刷电路板和构成六层印刷电路板的各层的剖面图。Fig. 4 is a cross-sectional view of a six-layer printed circuit board and layers constituting the six-layer printed circuit board.
本发明优选的实施例通过提供具有低热膨胀系数(CTEs)的材料用于电源和地层,克服了现有技术的局限。如果需要,电源和地层可形成芯层,并较好是用于印刷电路板(PCBs),或用于作为层叠芯片载体(LCCs)的PCBs。本发明一般涉及PCBs的制造技术。下面给出PCBs一般制造技术的简短介绍,然后是优选实施例。Preferred embodiments of the present invention overcome the limitations of the prior art by providing materials with low coefficients of thermal expansion (CTEs) for power sources and formations. Power and ground planes may form the core, if desired, and are preferably used for printed circuit boards (PCBs), or for PCBs as laminated chip carriers (LCCs). The present invention generally relates to the manufacture of PCBs. A short introduction to general fabrication techniques for PCBs is given below, followed by preferred embodiments.
为了制造印刷电路板,初始材料一般是由玻璃纤维和环氧树脂构成的薄片。由于该纤维在初始处理期间用树脂浸渍,所以这一般称为“半固化片”。树脂主要用作粘合剂,将纤维粘合到板上。代替玻璃纤维布,可以使用压缩纸或其它合适材料。因此,基板是一种将制成最终的印刷电路的扁平刚性或轻度韧柔的介质材料。该初始材料可以与铜薄层或其它金属一起利用合适的粘合剂层叠于板的两面上。这种组合一般叫作敷铜叠片(CCL)。这些CCLs可以变成简单的双面板(具有两面铜线)或可以电路化并以附加介质层叠构成多层复合体。For the manufacture of printed circuit boards, the starting material is typically a thin sheet of fiberglass and epoxy resin. Since the fibers are impregnated with resin during initial processing, this is commonly referred to as "prepreg". The resin is primarily used as a binder, binding the fibers to the board. Instead of fiberglass cloth, compressed paper or other suitable material may be used. Thus, a substrate is a flat rigid or slightly flexible dielectric material that will be made into the final printed circuit. This starting material can be laminated on both sides of the board with a thin layer of copper or other metal using a suitable adhesive. This combination is commonly referred to as a copper clad laminate (CCL). These CCLs can be made simple double-sided (with copper lines on both sides) or can be circuitized and laminated with additional dielectric to form multilayer composites.
多数情况下,穿过这些板形成小孔(一般利用钻孔),以容纳将安装的各种电子元件的电连接。小孔一般利用高速钻孔机钻出,小孔的位置示于附图中或根据板的设计而定。In many cases, small holes are formed through the plates, typically by drilling, to accommodate electrical connections for the various electronic components to be mounted. The small holes are generally drilled by a high-speed drilling machine, and the positions of the small holes are shown in the drawings or depend on the design of the board.
为了形成从铜叠层一面穿过小孔到另一面的电连接,小孔的塑性壁必须制成导电的。这可以通过本行业中公知的例如金属化等化学工艺完成,该工艺由相对复杂的一系列化学试剂槽处理、漂洗和活化步骤构成,以便在孔壁上敷着薄铜层。In order to make an electrical connection from one side of the copper stack through the hole to the other side, the plastic walls of the hole must be made conductive. This can be accomplished by chemical processes known in the industry such as metallization, which consists of a relatively complex series of chemical bath treatment, rinsing and activation steps to deposit a thin layer of copper on the hole walls.
由于利用金属化工艺形成的铜层对于在板的两层间形成合适电桥来说一般太薄,所以要用铜电镀在小孔中淀积厚铜层,以形成运载电流的合适铜截面。铜镀敷后可以进行锡-铅或锡镀敷以改善可焊性。Since the copper layer formed by the metallization process is generally too thin to form a suitable bridge between the two layers of the board, copper electroplating is used to deposit a thick layer of copper in the small hole to form a suitable copper cross-section to carry the current. Copper plating can be followed by tin-lead or tin plating to improve solderability.
金属化后,对需要电路图形的那些表面进行电路处理。电路图形是一种将规格或设计需要应用到已钻孔板的金属表面上的电路设计。通过涂敷有机光刻胶敷层作干膜可以形成图像。通过掩模将紫外(UV)光投射到光刻胶上。该掩模含阻挡UV光的图形。对于负型光刻胶来说,光刻胶的未暴露于UV光的区域,将在随后的显影步骤中被去掉。然后用化学腐蚀去掉暴露的表面金属。然后,剥离剩余的光刻胶,只留下金属图形。After metallization, circuit treatments are applied to those surfaces requiring circuit patterns. A circuit pattern is a circuit design where specifications or design needs are applied to the metal surface of a drilled board. Images can be formed by applying an organic photoresist coating as a dry film. Ultraviolet (UV) light is projected onto the photoresist through a mask. The mask contains patterns that block UV light. For negative tone photoresists, the areas of the photoresist that were not exposed to UV light will be removed in a subsequent development step. The exposed surface metal is then removed by chemical etching. Then, the remaining photoresist is stripped, leaving only the metal pattern.
现参见图4,该图示出了六层PCB和构成该六层PCB的各层的例子。图4中,示出了处于不同制造阶段的PCB的各部分。该例中,六层PCB 120部分用作连接芯片160和PCB/LCC 120与PCB(未示出)的层叠芯片载体(LCC)。六层PCB 120包括通过将两个信号芯层101和130、一个电源芯层111和介质层150和152压在一起(称作“层压”)形成的“复合体”。各芯层各自构图,然后压在一起形成复合PCB。这种层压期间,介质将回流到芯层和介质层间存在的任何间隙中。层压后,给复合体钻孔,去掉敷在暴露的钻过孔的铜层上的环氧,镀敷通孔,并进行处理。为简单起见,图4示出了代替介质含空气时的介质回流区。此外,尽管一般是圆柱形金属孔,但镀敷的通孔(PTHs)示出为固态金属。最后,未示出将用于对准工件与叠层和各层的加工孔(tooling hole)。Referring now to FIG. 4, this figure shows an example of a six-layer PCB and the layers that make up the six-layer PCB. In Fig. 4, parts of a PCB are shown at different stages of manufacture. In this example, the six-
信号芯层100包括夹在两铜层102和105间的介质层104。信号芯层100是没进行过处理的CCL。铜层102和105为其上将形成铜线的信号运载层。铜层102还可以具有焊盘,各芯片或含有芯片的表面安装封装将焊接于其上。信号芯层101表示信号芯层100构图后的信号芯层100。信号芯层101包括铜层102和105,它们已被构图,带有电路、用于PTHs的间隙及其它间隙/加工孔和介质层104。铜层102有两条线(未计数)和两个焊盘107和103,而铜层105具有五条线。此外,铜层105有间隙区域170,在信号芯层101层叠成复合体,进行了钻孔和孔镀敷后,PTH从中穿过。The
图4中的电源芯层110包括夹在两铜层112和115间的介质层114。铜层112和115可以比铜层102和104厚,以便提供额外的电流运载能力。电源芯层110是未进行过处理的CCL。铜层112将变成PCB的电源层,而铜层115将变成PCB的地层(反之亦然)。电源芯层111表示电源芯层110已构图后的电源芯层110。电源芯层111包括已构图的铜层112和115及介质层114。铜层112构图为具有两个间隙区182和179,而铜层115构图成具有两个间隙区184和180。这些间隙区将防止电源和地层与PTHs接触,这些PTH是在电源芯层111层压成复合体,并钻出了小孔和进行了镀敷后,在这些位置钻出的。The
完成的PCB部分图示为六层PCB部分120。由于具有六个导电层,所以一般称这种PCB作“六层”板。PCB部分120正用作LCC,以连接芯片160和PCB(未示出)下面的金属层135。层135和PCB120间的固定(未示出)一般通过栅阵列(BGA)或类似的连接实现。示出了信号芯层101和130、电源芯层111和介质层150和152已层压形成复合体后的六层PCB部分120。该复合体已被钻孔,涂敷的环氧已从孔中去掉。小孔已被镀敷。此外,各元件安装于该完成的LCC上。例如,芯片160已通过可控熔塌芯片连接(C4)球107焊接到信号芯层101的铜层102的焊盘103上。密封或底层填充物162保护芯片160。信号芯层130为与信号芯层101类似构图的信号芯层。信号芯层130包括铜层132和135及介质层134。铜层132和135已构图形成线。已在电源芯层111的电源层(铜层)112和信号芯层101的铜层105之间施加了介质层150,同时已在电源芯层111的地层(铜层)115和信号芯层130的铜层132之间施加了介质层152。每个介质层150、152都可以由一层以上的介质层构成。The completed PCB section is shown as a six-
PCB 120中示出了几种PTHs。PTH 109连接电源层112与C4球107、已构图铜层105上的线及已构图铜层135上的线。间隙区180可以防止PTH 109与地短路。注意,层叠后,间隙区180中将填充回流介质,但为了简便起见,图4中未示出。PTH 108连接铜层102、105、132和135上的线,铜层102上的信号线还连接到C4球107。间隙区184和182可以分别防止PTH 108接触地层115或电源层112。PTH 106连接地层115与铜层135、132和102上的线或焊盘。Several PTHs are shown in
即使层104、150、114、152和134中使用低CTE介质,PCB 120的总热膨胀系数(CTE)也会保持较高。保持了会提高总CTE的高百分比铜。这种较高的总CTE会使PCBs和用作LCCs的PCBs都产生问题。对于前者来说,PCBs会随温度升高经受切力造成的介质材料剥离或龟裂,并且高CTE使PCB膨胀。由于设于PCB上的半导体芯片位于封装中,封装和连接管脚或引线会吸收PCB尺寸增大造成的应力。所以半导体芯片自身一般不受PCB尺寸增大的影响。然而,对于用作LCCs的PCBs来说,半导体芯片直接设于PCB上,没有封装和管脚或引线。芯片自身承受随温度升高PCB区增大产生的应力。Even with low CTE dielectrics used in
这一点可以从图4中看出,其中芯片160直接与PCB 120的金属层102连接。如果PCB随温度升高而膨胀,而较高CTE引起的膨胀使C4球107与PCB一起移动。C4球107与芯片直接相连,芯片必然吸收由于球107间的间距的增大而引起的张力。不幸的是,半导体芯片主要为结晶硅。由于其结构和球也会远离芯片,所以芯片自身易破裂。This can be seen from FIG. 4, where
本发明通过提供用于印刷电路(PCBs)和作为层叠芯片载体LCCs)的PCBs中的电源和地层的低CTEs导电材料,可以克服现有技术的局限。通过提供用于PCBs的电源和地层的低CTE材料,PCB的总CTE降低,进而可以减少芯片失效、介质龟裂、和切力造成剥离的几率。此外,可以完全消除或显著减少与使用特殊低CTE金属有关的问题(例如电池作用和侵蚀、多步腐蚀和复杂的废物处理)。The present invention overcomes the limitations of the prior art by providing conductive materials with low CTEs for power and ground planes in printed circuits (PCBs) and PCBs as stacked chip carriers (LCCs). By providing low CTE materials for the power and ground planes of PCBs, the overall CTE of the PCB is reduced, which in turn reduces the chances of chip failure, dielectric cracking, and shear-induced delamination. In addition, problems associated with the use of special low-CTE metals (such as battery action and erosion, multi-step corrosion, and complex waste disposal) can be completely eliminated or significantly reduced.
在讨论优选实施例之前,有益的是简短地讨论一下术语。如概述部分所述,术语“半固化片”一般包括玻璃纤维和环氧树脂。由于在处理期间要用树脂浸渍纤维,所以经常称之为“半固化片”。含树脂的纤维材料片一般称为“纤维树脂复合体”,纤维材料片可以称作“纤维复合体”。不幸的是,在一个或多个信号层与一个或多个电源/地层层叠时,或在半固化片间层叠电源/地层时,称之为“复合体”。为避免将这种复合结构与纤维复合体或纤维树脂复合体混淆,纤维复合体和纤维树脂复合体将称作“纤维叠片”。术语‘纤维叠片’意在包括所有类型的半固化片、纤维复合体、纤维树脂复合体、介质、绝缘体和在PCB制造中使用的其它材料。此外,本发明的实施例可以使用导电纤维叠片(例如用铜浸渍的半固化片)。还应注意,尽管这里使用了术语“纤维叠片”,但该术语意在表示目前用于构成PCBs的所有类型的热固树脂和热塑聚合物,包括但不限于环氧、双马来酰亚胺三嗪环氧、氰化酯、聚酰亚胺、聚三氟乙烯(PTEE)和其它氟聚合物等,无论它们是否含任何纤维或填料。Before discussing the preferred embodiments, it is helpful to briefly discuss terminology. As mentioned in the overview section, the term "prepreg" generally includes fiberglass and epoxy. Because of the impregnation of the fibers with resin during processing, they are often referred to as "prepregs". A resin-containing fibrous material sheet is generally referred to as a "fiber-resin composite", and a fibrous material sheet may be referred to as a "fibrous composite". Unfortunately, when one or more signal layers are stacked with one or more power/ground layers, or when power/ground layers are stacked between prepregs, it is called a "composite". To avoid confusing such composite structures with fiber composites or fiber-resin composites, the fiber composites and fiber-resin composites will be referred to as "fiber laminates". The term 'fiber laminate' is intended to include all types of prepregs, fiber composites, fiber resin composites, dielectrics, insulators and other materials used in PCB manufacturing. Additionally, embodiments of the present invention may use conductive fiber laminates (eg, prepreg impregnated with copper). It should also be noted that although the term "fiber laminate" is used here, the term is intended to refer to all types of thermosetting resins and thermoplastic polymers currently used to construct PCBs, including but not limited to epoxy, bismaleyl Iminotriazine epoxies, cyanide esters, polyimides, polytrifluoroethylene (PTEE) and other fluoropolymers, etc., whether or not they contain any fibers or fillers.
本发明的优选实施例包括各种可用于电源和地层的导电低CTE材料。例如,金属化其一面或两面的固态低CTE材料芯层(较好是碳基材料,例如石墨)可形成电源/地层的基础。此外,金属化的低CTE纤维(例如玻璃、碳和液晶聚合物纤维)可形成可作为电源/地层的基础的织物,优选导电材料的CTE一般在-5至5PPM/℃之间。优选CTEs小于5PPM/℃的材料。利用这些优选材料形成的电源/地芯层应具有8-12PPM/℃的复合CTE,取决于所用的纤维叠层。在PCB/LCC中使用这些芯层可以得到复合CTE为8-12PPM/℃的PCB/LCC。与从用普通层(即,敷铜叠层(CCL))构成的PCB相比,CTE明显减小。即便是利用低CTE纤维叠层,由于铜的CTE较高,且PCB中铜占相当高百分比(体积或重量),普通PCB的CTE一般也接近或高于17PPM/℃。所以,即便用限制为CTE接近17PPM/℃的那些纤维叠层的低CTE纤维叠层制造PCBs,PCB的CTE一般也高于17PPM/℃。尽管本发明的实施例可以用CTE高于5PPM/℃的导电材料,但所得PCB的复合CTE对于某些应用来说仍太高。本发明的导电材料对于半导体芯片直接固定于LCC上时最有益。芯片的CTE和根据本发明制造的PCBs/LCCs的复合CTE间的较小差异抑制了由于CTE失配造成的芯片破裂。利用具有高CTEs的导电材料,将导致PCB/LCC的较高复合CTE,这将增加芯片缺陷和龟裂的可能性。在介绍了制造和使用低CTE电源/地层的优选方法后,将讨论特定的优选材料。Preferred embodiments of the present invention include a variety of conductive low CTE materials that can be used in power sources and formations. For example, a core layer of solid low CTE material (preferably a carbon-based material such as graphite) metallized on one or both sides may form the basis of the power supply/ground formation. In addition, metallized low CTE fibers such as glass, carbon, and liquid crystal polymer fibers can form fabrics that can serve as the basis for power/ground formations, preferably conductive materials with CTEs typically between -5 and 5 PPM/°C. Materials with CTEs less than 5 PPM/°C are preferred. A power/ground core formed from these preferred materials should have a composite CTE of 8-12 PPM/°C, depending on the fiber layup used. Using these core layers in PCB/LCC can result in a PCB/LCC with a composite CTE of 8-12PPM/°C. The CTE is significantly reduced compared to PCBs constructed from common layers (ie, copper clad laminate (CCL)). Even with low CTE fiber laminates, due to the high CTE of copper and the relatively high percentage (volume or weight) of copper in PCBs, the CTE of ordinary PCBs is generally close to or higher than 17PPM/°C. Therefore, even though PCBs are manufactured with low CTE fiber laminates limited to those fiber laminates with a CTE close to 17PPM/°C, the CTE of the PCB is generally higher than 17PPM/°C. Although embodiments of the present invention can use conductive materials with a CTE higher than 5 PPM/°C, the composite CTE of the resulting PCB is still too high for some applications. The conductive material of the present invention is most beneficial when the semiconductor chip is mounted directly on the LCC. The small difference between the CTE of the chip and the composite CTE of PCBs/LCCs fabricated according to the present invention inhibits chip cracking due to CTE mismatch. Utilizing conductive materials with high CTEs will lead to higher composite CTE of PCB/LCC, which will increase the probability of chip defects and cracks. Specific preferred materials will be discussed after describing preferred methods of making and using low CTE power sources/formations.
用于形成本发明的低CTE电源/地层的一些优选材料,在PCB或LCC制造中的钻孔或运输期间较易碎。例如,纤维材料在钻孔期间可能比金属箔更易受损伤。而且,由于光刻和腐蚀技术不可能构图这些低CTE电源和地层中的某些,所以,较好是对普通的PCB或LCC制造步骤做一些变化。在介绍可用于低CTE电源和地层的优选材料前,先讨论一下涉及利用和制造由低CTE材料构成的低CTE电源/地层的一般步骤。Some preferred materials for forming the low CTE power/ground layers of the present invention are relatively brittle during drilling or shipping in PCB or LCC manufacturing. For example, fibrous materials may be more susceptible to damage during drilling than metal foils. Also, since it is not possible to pattern some of these low CTE power and ground planes with photolithography and etch techniques, it is preferable to make some changes to the normal PCB or LCC fabrication steps. Before describing the preferred materials that can be used in low CTE power sources and formations, a discussion of the general steps involved in utilizing and fabricating low CTE power sources/formations from low CTE materials is discussed.
现参见图1,该图示出了低CTE电源和地层的三个优选结构。每种结构制造和利用PCB/LCC中的低CTE电源或地层的处理步骤稍有不同。低CTE电源和地层的最优选结构表示为电源/地芯层300。电源/地芯层300包括夹在两层纤维叠片302、305间的低CTE层304。示出了两个间隙孔310,这些孔已在电源/地芯层300钻出,以提供电源/地芯层300与另一电源/地芯层及一个或几个信号芯层层叠后用于PTHs的间隙。层叠形成了随后被钻孔和金属化以形成PCB或LCC的复合体。通过在两纤维叠层302和305间层叠低CTE层304,纤维叠层为低CTE层提供了钻孔和运输期间的保护。纤维叠层302、305可以是不导电的,也可以是导电的。在后一实施例情况下,电源/地芯层300将是导电复合体。然后电源/地芯层300叠置在两不导电的纤维叠层之间,形成较大的“芯层”,或电源/地芯层300与其它信号层、电源/地芯层、及不导电纤维叠层叠置成PCB复合体。应注意,层304实际可以在邻接纤维叠层302、305的两面上具有一个或多个金属层。这些层图1中未示出。Referring now to Figure 1, this figure shows three preferred configurations for low CTE power sources and formations. Each structure has slightly different processing steps to fabricate and utilize low CTE power or ground planes in a PCB/LCC. The most preferred structure for the low CTE power and ground formation is denoted power/
图1还示出了较易受钻孔和运输损伤的低CTE电源和地层的第二和第三较不优选的结构。电源/地芯层320包括夹在两低CTE层322、325间的纤维叠层324。另外,纤维叠层324可以是导电的,也可以是不导电的。电源/地芯层320已钻有间隙孔330。电源/地芯层350包括低CTE层352。类似地,电源/地芯层350已钻有间隙孔360。由于低CTE层易受钻孔和运输损伤,所以这些都是较不优选的电源/地芯层的实施例。然而,如果运输和钻孔期间很小心的话,也可以对制造电源/地层的低CTE材料的损伤最小或没有损伤。密封纤维叠层中易受运输或钻孔损伤的低CTE材料,可以减少损伤的可能性,所以较好是这样做。Figure 1 also shows second and third less preferred configurations for low CTE sources and formations that are more susceptible to drilling and transport damage. The power/
这些芯层的每个都可以按稍有不同的方式处理。一般说,电源/地芯层300将在对低CTE层304进行了可选的粘附性增强工艺(利用例如硅烷等化学试剂)后层叠。然后一般在电源/地芯层上钻出间隙孔310。该阶段代替用光刻胶构图和腐蚀,使用钻孔,是由于一般情况下纤维叠层和多数低CTE纤维材料不能腐蚀。此外,该步骤中,间隙孔310中可以填以绝缘体/介质。然后,已钻孔的电源/地芯层300可以与另一电源/地芯层和一个或几个信号芯层层叠成复合体。然后在复合体上钻孔,并金属化(为PTHs),从而形成PCB或LCC。可以选择的是,电源/地芯层350可被钻孔,并用粘附性增强工艺处理,然后与两个纤维叠片层叠成电源/地芯层300。尽管可以机械钻孔电源/地芯层350,以形成间隙孔和加工孔,但优选对易受钻孔损伤的电源/地芯层材料进行激光或其它不易损伤的钻孔方法。Each of these core layers can be processed in a slightly different manner. Typically, the power/
一般说,电源/地芯层320可通过用粘附性增强工艺(选的)处理低CTE层322、325形成。然后纤维叠片(导电或不导电)叠置于两低CTE层之间。然后通常进行钻孔,形成间隙(或加工)孔330。对易受钻孔损伤的电源/地层材料,较好是采用激光或其它不易损伤钻孔技术。该实施例中激光钻孔的附加优点是可以用不同间隙孔图形构图两个导电的低CTE层。然后用绝缘/介质材料填充间隙或加工孔。然后,电源/地芯层320与另一电源/地芯层和一个或几个信号层层叠成复合体。In general, the power/
一般说,可以在电源/地芯层350中钻孔,并用可选的粘附性增强材料(例如硅烷或氧化铜处理)处理,然后与两纤维叠层(导电或不导电)层叠形成芯层300。可以选择的是,可以在电源/地芯层350中钻孔,并用粘附层加强步骤处理,然后与另一电源/地芯层、几层纤维叠层及一个或几个信号芯层层叠形成复合体。例如,为形成六层复合体,从复合体的“上”层到“底”层的各层如下:信号芯层(例如图4的信号芯层101)、一个或几个纤维叠层、电源/地芯层352、一个或几个纤维叠层、电源/地芯层352、一个或几个纤维叠层和第二信号芯层(例如图4中的信号芯层130)。然后钻孔该复合体并金属化形成PCB/LCC。In general, holes can be drilled in the power/
如上所述,较好是导电材料用于将被形成电源/地芯层的易受钻孔或运输损伤的低CTE电源或地层,其中低CTE导电材料夹在或密封在两纤维叠层之间。以此方式形成的电源或地芯层将在钻孔步骤中支撑和保护低CTE层导电材料。这种保护减少了可能因钻孔工艺破裂的纤维材料量。也可以制造象电源芯层320(类似于图4的电源芯层110)或电源芯层350那样的电源芯层,但钻孔和/或运输会造成低CTE材料某种程度上破裂和龟裂。此外,疏松的纤维或碳材料会污染某些处理步骤。通过密封纤维或碳材料和在钻出的孔中填入绝缘体/介质,纤维材料不易污染随后的处理步骤。As mentioned above, it is preferred that the conductive material is used for low CTE power or ground formations that are susceptible to drilling or transportation damage to be formed into the power/earth core layer, wherein the low CTE conductive material is sandwiched or sealed between two fiber stacks . The power or ground core layer formed in this way will support and protect the low CTE layer conductive material during the drilling step. This protection reduces the amount of fibrous material that can be ruptured by the drilling process. Power core layers like power core layer 320 (similar to
参见图2,该图示出了电源和地芯层的几个截面以及由这些芯层构成的六层PCB/LCC。图2是一个例子,展示了电源芯层1000,钻孔的电源芯层1001,地芯层1010,钻孔的地芯层1011,及用作LCC的六层PCB/LCC 1020。通过对低CTE电源层1087进行粘附性增强工艺,然后将该层层叠在两纤维叠层1002和1005之间,从而形成电源芯层1000。这种情况下,低CTE电源层1087是具有形成于其表面上的金属层1097和1098的石墨层1004。然后,钻孔电源芯层1000,形成间隙孔1082和1079。涂敷了光刻胶掩模后,腐蚀一个“标准”CCL电源芯层,形成成像的电源芯层(即,图4的电源芯层111)。由于腐蚀对用于某些用于电源/地层的低CTE导电材料或纤维叠层是不可能的,所以较好是采用钻孔法形成间隙孔。该例中的电源芯层1000和1001主要是夹在两不导电纤维叠层间的低CTE导电层。See Figure 2, which shows several cross-sections of the power and ground core layers and the six-layer PCB/LCC made up of these core layers. Figure 2 is an example showing a power core 1000, a drilled power core 1001, a ground core 1010, a drilled ground core 1011, and a six-layer PCB/LCC 1020 used as an LCC. The power core layer 1000 is formed by subjecting the low CTE power layer 1087 to an adhesion enhancing process and then laminating this layer between two fiber stacks 1002 and 1005 . In this case, the low-CTE power supply layer 1087 is a graphite layer 1004 having metal layers 1097 and 1098 formed on its surface. Then, the power core layer 1000 is drilled to form clearance holes 1082 and 1079 . After applying the photoresist mask, a "standard" CCL power core layer is etched to form an imaged power core layer (ie,
通过对低CTE地层1012、1015(这种情况下,它们是敷金属的纤维材料)进行粘附性增强工艺,然后在一导电纤维叠层的两面上层叠这些层,从而形成地芯层1010。然后,钻孔地芯层1010,形成间隙孔1084和1080。该例中的地芯层1010实质是具有三个导电层的一个导电层(一个导电纤维叠层夹在两个低CTE导电材料层之间)。尽管图2中未示出,但可以在电源芯层1001和地芯层1011中加入介质或其它绝缘体,填充这些芯层中的间隙孔。The core layer 1010 is formed by subjecting the low CTE formations 1012, 1015 (in this case, metallized fiber materials) to an adhesion enhancing process, and then laminating these layers on both sides of a conductive fiber stack. The core layer 1010 is then drilled to form interstitial holes 1084 and 1080 . The core layer 1010 in this example is essentially one conductive layer with three conductive layers (a stack of conductive fibers sandwiched between two layers of low CTE conductive material). Although not shown in FIG. 2 , a dielectric or other insulator may be added to the power core 1001 and the ground core 1011 to fill the interstitial holes in these cores.
关于导电纤维层1014,形成该层的较好方法是在纤维或纤维/树脂层中加入按体积计40%的铜粉。层叠期间,铜应均匀分布于纤维层中。也可以采用其它导电填料及其它类型的层材料,但该填料和层材料的优点是较便宜且为PCB制造中常用的材料。Regarding the conductive fiber layer 1014, a better way to form this layer is to add 40% by volume of copper powder to the fiber or fiber/resin layer. During lamination, the copper should be evenly distributed in the fiber layers. Other conductive fillers and other types of layer materials can also be used, but have the advantage of being less expensive and commonly used materials in PCB manufacturing.
芯层钻孔(如果需要加了绝缘体)后,将电源芯层1001和地芯层1011与已构图的信号芯层101、130及纤维叠层1096、1095和1099压在一起,形成复合体。对该复合体钻孔并金属化形成PTHs。将元件固定于PCB/LCC上后,得到例示的六层PCB/LCC部分1020。纤维叠层1095、1096和1099是不导电介质层,用于隔离信号、电源和地芯层。此外,这些层将电源、地和信号芯层粘附在一起。电源芯层1001具有将用于粘附电源芯层1001与地芯层1011的纤维叠层1005。类似地,电源芯层1001的纤维叠层1002可以粘附到信号芯层101。然而,一般情况下,纤维叠层1005(和1002)将充分固化,意味着另一纤维叠层不得不用于将电源、地和信号芯层粘合在一起。某些纤维一旦固化,将不再回流,足以与另一层充分粘接。可以部分固化这些层,允许其中一些在层叠各芯层时回流。此外,某些纤维叠层将多次回流,并提供两芯层间的足够的粘附性。在这些情况下,纤维层1095和1096不必用于粘附。尽管这些情况下不需要这些纤维叠层用于粘附的目的,但利用附加纤维叠层(例如层1095)可能有其它原因。例如,如果希望较好的电绝缘,附加纤维叠层可以提供这种绝缘。注意,纤维叠层1099一般来说是提供电绝缘(除粘附性外)及提供已构图信号层132和金属化的纤维层1015间的间隙孔1082和1079的填充树脂所必需的。After drilling the cores (and adding insulators if desired), the power core 1001 and ground core 1011 are pressed together with the patterned
PTH1008与图4的PTH 108类似,它连接信号芯层101的信号层102和105的线与信号芯层130的信号层132和135的线。间隙区1082和1084防止地和电源层接触TPH。尽管间隙区1082和1084中填有“空气”,但实际上,这些区中一般填以介质:或者在将电源或地芯层钻孔后,这些区中填以介质,或者在层叠期间用纤维叠层的介质/绝缘体填充这些区。PTH 1008 is similar to
PTH 1009与图4的PTH 109类似,它连接信号芯层130的层135上的焊盘103(和C4球107)和线与电源层1001。该例中,电源层1001包括实际有三个导电层(石墨层1004,两个金属层1097和1098)的导电层1087。该例中,导电层1087的所有三层都与PTH 1099接触。间隙区1080防止PTH 1009连接地芯层1011。类似地,PTH1006与图4的PTH 106类似,它连接信号芯层101的层102上的线和信号芯层130的层135、132上的线与地芯层1011。地芯层1011包括三个导电层(两个低CTE层1012和1015,和一个导电纤维叠层1014),它们都与PTH 1006连接。间隙区1079防止PTH 1006连接电源层1087。PTH 1009 is similar to
在图2的例子中,示出了各芯层上的多数纤维叠层较薄。例如,纤维叠层1002和1005很薄。这只是为了表示,如所属领域技术人员知道的,如果需要可以加更多层、更薄或更厚的纤维叠层。图2的六层PCB/LCC 1020与图4的六层PCB/LCC 120相比,主要的不同在于PCB/LCC 1020有分离的电源和地芯层,以及这些电源/地芯层形成为不同于普通CCL芯层。PCB/LCC 1020还具有包括LCC的大部分的低CTE电源和地层。信号层102、105、132和135尽管具有一些金属,但主要含纤维叠层。因此,信号芯层101和130的总CTE接近纤维叠层104和134的CTE。如果低CTE介质用于这些纤维叠层中,则CTE会很低。这种情况下高PCB的CTE实质是由一般为CCL的电源/地芯层的金属层产生。这种情况下,由于电源和地层中的铜量的缘故,CCL中的铜决定电源/地芯层的CTE。这种高CTE的电源/地芯层会使PCB的总CTE升高,导致可能的切力造成的剥离、介质或芯片龟裂、张力作用于固定在PCB(用作LCC)上的芯片上、和其它不良效应。In the example of Figure 2, the majority of the fiber layups on each core layer are shown to be thin. For example, fiber stacks 1002 and 1005 are very thin. This is just to show that more layers, thinner or thicker fiber layups can be added if desired, as known to those skilled in the art. The main difference between the six-layer PCB/LCC 1020 of FIG. 2 and the six-layer PCB/
然而,图2中地层1011包括敷金属的低CTE纤维材料。此外,电源层1087包括敷金属的石墨片。这些层都含有大量能降低芯层的总CTE的低CTE材料。所以,与同等的CCL芯层相比,两芯层都有较低的总CTE,这些较低的总CTEs减小了PCB/LCC的总CTE。此外,可以在不用会造成包括电池作用和侵蚀、多步骤腐蚀和复杂的废物处理等制造复杂化的替代金属(例如铁镍合金、不锈钢和钼)的情况下,得到这种低CTE芯层。However, formation 1011 in FIG. 2 includes metallized low CTE fiber material. In addition, the power layer 1087 includes a metallized graphite sheet. These layers all contain high amounts of low CTE materials that reduce the overall CTE of the core layer. Therefore, both cores have lower overall CTEs compared to an equivalent CCL core, and these lower overall CTEs reduce the overall CTE of the PCB/LCC. Furthermore, such low CTE core layers can be obtained without alternative metals such as iron-nickel alloys, stainless steel, and molybdenum, which would cause manufacturing complications including battery action and erosion, multi-step corrosion, and complex waste disposal.
图3示出了根据本发明的形成包含低CTE导电材料的电源或地芯层(例如电源芯层1000)的优选方法。图3中的方法400较好用于形成电源和地芯层,以将电源和地芯层结合成复合PCB或LCC。该方法也可用于其中低CTE导电材料夹在两纤维叠层间作为电源层1000的优选实施例。该实施例可以更好地保护内部低CTE的导电材料。此外,纤维叠层可帮助“密封”覆盖以金属的纤维材料和其它疏松材料,这有助于将内部纤维材料保持于叠片上。在可能污染PCB/LCC的各部分和制造工艺的碳材料的情况下这特别有益。方法400开始于在所用低CTE材料上形成可选的薄金属涂层(步骤410)。本发明的敷金属的纤维材料一般为足以运载要求电流的金属;如果要求附加的电流运载能力的话,可以在步骤410在纤维上形成更多金属。FIG. 3 illustrates a preferred method of forming a power or ground core (eg, power core 1000 ) comprising a low CTE conductive material in accordance with the present invention. The
此外,如果本发明的优选低CTE材料没有金属化,则这些材料也可以在该步进行金属化。例如,如果采用未金属化的碳纤维丝束作低CTE材料,则可以在步骤410金属化丝束,并将之形成为纺织织物。然后,如果需要可以在步骤410在该织物上附着附加的金属。在电源芯层1000的特定例子中,石墨层1004的两面都在步骤410涂敷金属,以形成电源层1087。简言之,步骤410可以用于金属化未涂有金属的材料和在已涂有金属的材料上再添加上附加金属。在方法400后,将更详细地讨论用于电源和地层的优选材料类型。Additionally, if the preferred low CTE materials of the present invention are not metallized, these materials may also be metallized at this step. For example, if non-metallized carbon fiber tow is used as the low CTE material, the tow can be metallized at step 410 and formed into a woven fabric. Additional metal can then be attached to the fabric at step 410 if desired. In the particular example of power core layer 1000 , both sides of graphite layer 1004 are metallized at step 410 to form power layer 1087 . Briefly, step 410 may be used to metallize unmetallized material and add additional metal to already metallized material. Following the
然后,用粘附性增强化学工艺或氧化铜处理可选地处理低CTE材料(步骤420)。然后,在两纤维叠层间层叠夹入导体,以形成密封的低CTE电源或地芯层(步骤430)。一般来说,用标准的层叠工艺层叠低CTE地/电源材料。或者,可利用标准的浸渍工艺用树脂浸渍纤维低CTE材料(步骤433)。该标准浸渍工艺基本上密封了纤维材料。该树脂浸渍布然后叠靠于释放片(release sheet)或粗糙的铜箔上。如果使用粗糙铜箔,则可以将之腐蚀掉(步骤437)或通过钻孔(步骤440)剥离。释放片一般在钻孔前被去掉(步骤435)。The low CTE material is then optionally treated with an adhesion enhancing chemical process or copper oxide treatment (step 420). A sandwich conductor is then laminated between the two fiber laminates to form a sealed low CTE power or ground core (step 430). In general, low CTE ground/power materials are laminated using standard lamination processes. Alternatively, the fibrous low CTE material may be impregnated with resin using standard infusion processes (step 433). This standard impregnation process essentially seals the fibrous material. The resin-impregnated cloth is then laminated against a release sheet or roughened copper foil. If rough copper foil is used, it can be etched away (step 437) or stripped by drilling (step 440). The release sheet is typically removed prior to drilling (step 435).
由于纤维叠层一般不能腐蚀形成必需的电间隙孔(和其它开口),所以这些开口形成于电源/地芯层中(步骤440)。一般来说,在叠层和低CTE层内并通过其钻孔间隙孔图形或加工孔,可以形成这些开口。钻孔可利用机械钻孔或利用激光或其它类似的孔形成设备进行。如果粗糙的铜箔已叠于低CTE材料上(步骤435),并且未被去掉(在步骤437),则现在可以通过腐蚀去除之(步骤445)。此时,可以用纯树脂再填充开口,树脂含有不导电填料或其它合适的绝缘体/介质(步骤450)。较好是通过再叠层到或压到一复合板结构上,将电源/地芯层引入到复合体中(步骤460)。如果在步骤450未填充各孔,则在层叠周期中,额外的树脂从纤维叠层流到并填充到钻出的电源层孔中。接着可以再钻孔形成用于PTHs的孔,并金属化这些孔(步骤470)。步骤470后,将形成与PCB/LCC 1020类似的PCB/LCC。These openings are formed in the power/ground core layer (step 440) since fiber stacks generally cannot etch to form the necessary electrical clearance holes (and other openings). Generally, these openings can be formed by drilling clearance hole patterns or machining holes in and through the stack and low CTE layers. Drilling may be performed using mechanical drilling or using a laser or other similar hole forming device. If the rough copper foil was overlaid on the low CTE material (step 435), and was not removed (at step 437), it can now be removed by etching (step 445). At this point, the opening may be refilled with neat resin containing a non-conductive filler or other suitable insulator/medium (step 450). The power/ground core is introduced into the composite, preferably by re-lamination or pressing onto a composite panel structure (step 460). If the holes are not filled at
尽管方法400是用低CTE电源/地层制造PCB/LCC的优选方法,但方法400的步骤可根据所用电源/地芯层的结构稍作变化。例如,两层低CTE导电材料可以叠于例如在图1的电源和地芯层320中先前所示的纤维叠层上。该例中,处理步骤与方法400所示的非常类似。例如,可以分别进行方法400的步骤410和420,以在导电材料上加上附加金属,并加强粘附性。然后纤维叠片(导电或不导电)叠于两低CTE层之间。此外,可以在把纤维叠层层叠于两低CTE导电材料之间之前,进行液态树脂浸渍步骤(步骤433)。然后一般进行钻孔,形成间隙孔或加工孔(步骤440)。对于易受钻孔损伤的电源/地层材料,较好是可以采用激光或其它不易损伤的钻孔方法。该例中激光钻孔的附加优点在于,可以用不同的间隙孔图形构图两导电低CTE层。在该阶段(步骤450)可以用绝缘材料填充间隙或加工孔。然后将电源/地芯层320与另一电源/地芯层、一个或几个信号层和不导电的纤维叠层压成复合体(步骤460)。然后钻孔该复合体并金属化,形成PCB/LCC(步骤470)。Although
此外,也可以用与图1的电源/地芯层350类似的电源/地芯层形成电源或地层。该例中,用于形成电源和地层的处理步骤某种程度上不同于方法400。例如,可以在步骤410(如果进行的话)前或后进行钻孔(步骤440)。然后可以用可选地粘附性增强材料处理低CTE导电层(步骤420),并与两纤维叠层(导电或不导电)叠置,形成图1的芯层300。该例中,由于层叠工艺可以用纤维叠层填充各孔,所以步骤450一般是不必要的。可选择的是,可以钻孔与电源/地芯层350类似的低CTE导电层,并用粘附性增强步骤处理(步骤420),然后与另一电源/地芯层、几个纤维叠层和一个或几个信号芯层压成复合体(步骤460)。然后钻孔该复合体并金属化,形成PCB/LCC(步骤470)。In addition, a power/ground core layer similar to the power/
最后,方法400可应用于除图2所示六层PCB外的其它结构的PCB。通过将方法400的工艺应用于特定数量的层,可以形成更多或更少层数的层。例如,(再参见图2),如果希望四层PCB,则电源芯层1000可以叠于带铜叠层的层1002的外表面上。然后钻孔形成电源芯层1001。类似地,地芯层1010可以叠于带有纤维叠层和铜层的层1015的外表面上。然后钻孔形成地芯层1011。形成于电源和地芯层中的开口中可以填以绝缘体。然后可构图两铜叠层,两电源和地芯层形成复合体。进行钻孔并镀敷PTHs,形成PCB。或者,钻孔的电源芯层1001和钻孔的地芯层1011可形成各层按以下顺序的复合体:铜层、可选的不导电纤维叠层、电源芯层1001、地芯层1011、不导电纤维叠层、和铜层。然后可将两铜构图成信号层,并钻孔和金属化复合体,形成四层PCB。Finally, the
现在已一般意义上讨论了用低CTE材料制造低CTE导电电源和地层的方式。这些方式和材料可用于以下将讨论的任何特定低CTE导电材料。如果存在较好采用的任何附加处理步骤以便材料可形成为电源或地芯层,那么将结合电源/地材料讨论这些步骤。The manner in which low CTE conductive power sources and formations are fabricated from low CTE materials has now been discussed in a general sense. These approaches and materials can be used with any of the specific low CTE conductive materials discussed below. If there are any additional processing steps that are better employed so that the material can be formed into a power or ground core layer, those steps will be discussed in connection with the power/ground material.
含低CTE材料的电源/地层的最优选实施例是其一面或两面上有铜的石墨或碳片。石墨是一种由碳构成的自然形成的导电材料。术语“石墨”是指碳原子的特有的特殊结构。石墨可以自然形成或人工制造。尽管石墨某种程度上具有结晶结构,但石墨的导电性主要是各向异性的。很纯的结晶石墨具有优异的导电导热性和负CTE。体石墨一般具有很低的导电导热性,并具有低的正到负CTE。The most preferred embodiment of a power source/formation containing a low CTE material is a graphite or carbon sheet with copper on one or both sides. Graphite is a naturally occurring conductive material composed of carbon. The term "graphite" refers to a characteristic special structure of carbon atoms. Graphite can be naturally occurring or man-made. Although graphite has a somewhat crystalline structure, the electrical conductivity of graphite is mainly anisotropic. Very pure crystalline graphite has excellent electrical and thermal conductivity and negative CTE. Bulk graphite generally has very low electrical and thermal conductivity and has a low positive to negative CTE.
所属领域的技术人员将认识到,适于作电源/地层的基础材料的石墨或碳片可以按多种方式制造。例如,体石墨可以烧结或压缩成薄石墨片。石墨片可以通过化学汽相淀积制造,这样能够形成极有序的热解石墨。然而,后一种片易碎,并且非常贵。此外,石墨片可通过以下方式形成,将碳纤维绕到芯柱上从而形成碳纤维线轴,然后去掉芯柱,将线轴压平,然后在高热下石墨化线轴。在某些情况下,这会产生一种碳纤维丧失了其所有取向和形状的片,该片基本被很好的结晶化,变为更纯的石墨。形成石墨/碳片的这些方法都是所属领域公知的。Those skilled in the art will recognize that graphite or carbon sheets suitable as a base material for a power source/formation can be fabricated in a variety of ways. For example, bulk graphite can be sintered or compressed into thin graphite sheets. Graphite flakes can be produced by chemical vapor deposition, which can form extremely ordered pyrolytic graphite. However, the latter tablets are fragile and very expensive. Alternatively, graphite sheets can be formed by winding carbon fibers onto a stem to form a carbon fiber bobbin, removing the stem, flattening the bobbin, and graphitizing the bobbin under high heat. In some cases, this produces a sheet in which the carbon fibers lose all their orientation and shape, which is essentially well crystallized into a purer graphite. These methods of forming graphite/carbon sheets are well known in the art.
在石墨或碳片上淀积金属,这种组合材料具有低CTE。金属可利用所属领域技术人员公知的多种方法淀积于石墨上。例如,可以用溅射、蒸发或化学汽相淀积法在石墨上淀积金属。以下将更具体介绍这些金属包敷法。尽管由于金属敷于片两面上可以提供更多金属并提高电流运载能力,所以优选片两面上敷金属,但金属可以敷于石墨片的一面或两面上。The metal is deposited on graphite or carbon flakes, and this composite material has a low CTE. Metals can be deposited on graphite using a variety of methods known to those skilled in the art. For example, metals can be deposited on graphite by sputtering, evaporation or chemical vapor deposition. These metal cladding methods will be described in more detail below. The metallization may be on one or both sides of the graphite sheet, although metallization on both sides of the sheet is preferred because it provides more metal and increases current carrying capability.
可以利用该敷金属的石墨或碳材料,按以上所示和所述方式形成PCBs和用作LCCs的PCBs。例如,可用该导电片制造与电源/地芯层300、320或350类似的电源/地芯层。所得PCBs/LCCs的总CTE降低,可以减少切力造成的剥离及芯片和C4的连接龟裂。The metallized graphite or carbon material can be utilized to form PCBs and PCBs used as LCCs in the manner shown and described above. For example, a power/ground core layer similar to power/ground core layers 300, 320 or 350 can be fabricated using the conductive sheet. The total CTE of the obtained PCBs/LCCs is reduced, which can reduce the peeling caused by shear force and the connection cracks between the chip and C4.
形成低CTE导电电源和地层的附加优选材料大概可以称之为纤维导电材料。这些优选附加材料包括金属化的织物(例如液晶聚合物)、金属化的碳纤维织物、金属化的玻璃纤维。织物还可分成纺织织物(具有一些规则结构的织物)和不规则纸织物。不规则纸织物一般由不规则取向的纤维构成。不规则纸织物没有相同的纤维结构。Additional preferred materials for forming low CTE conductive power sources and formations may be referred to as fibrous conductive materials. These preferred additional materials include metalized fabrics (eg liquid crystal polymers), metalized carbon fiber fabrics, metalized fiberglass. Fabrics can also be divided into woven fabrics (fabrics with some regular structure) and irregular paper fabrics. Random paper webs are generally composed of randomly oriented fibers. Random paper fabrics do not have the same fiber structure.
例如,用于形成低CTE电源/地层的优选材料是敷金属的低CTE有机纤维,例如液晶聚合物(LCPs)。有几个公司制造LCPs,这些纤维中的一些的商标大家都很熟悉。Aramid是DuPont制造的LCP,有时称之为KEVLAR。VECTRAN是Heochst-Celanse制造的LCP。这些纤维的CTEs为约每摄氏度每百万分之(PPM℃)-5到5。此外,这些纤维具有热稳定性。适用于本发明的具有与LCPs所具有的类似CTEs的其它类型有机纤维包括SPECTRA(这是由AlliedSignal制造的聚乙烯)。市场上可以买到这些材料的纺织和不规则纸织物。此外,市场上已经可以买到某些LCPs的敷金属产品。例如,ARACON是DuPont公司的敷金属芳族聚酰胺纤维的商标。For example, a preferred material for forming a low CTE power source/formation is metallized low CTE organic fibers such as liquid crystal polymers (LCPs). Several companies manufacture LCPs, and some of these fibers have familiar trademarks. Aramid is an LCP made by DuPont, sometimes called KEVLAR. VECTRAN is an LCP manufactured by Heochst-Celanse. These fibers have CTEs of about -5 to 5 parts per million per degree Celsius (PPM°C). In addition, these fibers are thermally stable. Other types of organic fibers suitable for use in the present invention having CTEs similar to those of LCPs include SPECTRA (which is a polyethylene manufactured by AlliedSignal). Woven and random paper fabrics of these materials are commercially available. In addition, metallized products of certain LCPs are already commercially available. For example, ARACON is DuPont's trademark for metallized aramid fibers.
尽管可以购得某些有机纤维材料作为涂敷织物,但适用作电源或地层的敷金属有机纤维材料也可以由以下步骤制造。首先,将有机纤维材料设于处理室中,并保持在稍微拉伸和/或平坦位置。使材料被拉伸或平坦可以确保金属均匀地覆盖暴露表面。然后在有机纤维材料上淀积金属。这种淀积可以数种方式进行,包括镀敷、溅射、蒸发或化学汽相淀积。如果工艺需要或必要,有机纤维材料可以翻转,并淀积更多金属。例如,如果采用溅射,则金属一般只淀积有织物的一个表面上。在可以按此方式使用织物时,一般要在织物的另一面上施加更多金属,以增大织物的电流运载能力。或者,可以利用滚动方式,同时在两面上溅射织物。溅射或化学汽相淀积后,可利用常规的镀敷施加更多金属。该附加金属将增强金属纤维织物电源/地层的电流运载能力。这些工艺也可用于用金属涂敷以上讨论的碳或石墨片。此外,这些工艺还可用于用金属涂敷以上讨论的其它优选低CTE材料。另外,这些技术还可用于用金属涂敷以上讨论的碳或石墨片。Although some organic fiber materials are commercially available as coated fabrics, metallized organic fiber materials suitable for use as power sources or formations can also be produced by the following procedure. First, an organic fiber material is placed in a processing chamber and held in a slightly stretched and/or flat position. Having the material stretched or flattened ensures that the metal covers the exposed surface evenly. The metal is then deposited on the organic fibrous material. This deposition can be done in several ways including plating, sputtering, evaporation or chemical vapor deposition. If the process requires or is necessary, the organic fiber material can be turned over and more metal deposited. For example, if sputtering is used, metal is typically deposited on only one surface of the fabric. When fabrics can be used in this way, generally more metal is applied to the other side of the fabric to increase the current carrying capacity of the fabric. Alternatively, the rolling method can be used to spray the fabric on both sides at the same time. After sputtering or chemical vapor deposition, more metal can be applied using conventional plating. This additional metal will enhance the current carrying capability of the metal fiber fabric power supply/formation. These processes can also be used to metal coat the carbon or graphite flakes discussed above. In addition, these processes can also be used to coat the other preferred low CTE materials discussed above with metals. Additionally, these techniques can also be used to coat the carbon or graphite flakes discussed above with metals.
一旦形成金属化纤维片,这些低CTE导电片可用于制造与电源/地芯层300、320或350类似的电源/地芯层。此外,可以进行制造这些芯层和将它们集成为PCB/LCC的上述任何方法。Once metallized fiber sheets are formed, these low CTE conductive sheets can be used to make power/ground cores similar to power/
适用作PCBs或LCCs的电源或地层的另一最优选金属化纤维材料是敷金属的碳或石墨纤维。由于碳或石墨纤维可以作为纺织纱线和单股纱线或丝束,可以在这两种状态下金属化纤维。例如,金属可以淀积于碳或石墨纤维织物上。或者,可以淀积于碳或石墨纤维上和纺织成布或织物的碳或石墨纤维上。已经可以买到碳和石墨纤维的敷金属产品和已形成丝束或纱线的产品。该丝束或纱线可用于纺织较平纺织织物。此外,可以买到碳纤维的不规则纸片。具有低CTE(较好小于2PPM/℃)的任何碳纤维都可以用于本发明的实施例。Another most preferred metallized fiber material suitable for use as a power source or formation for PCBs or LCCs is metallized carbon or graphite fibers. Since carbon or graphite fibers are available as textile yarns and single-ply yarns or tows, it is possible to metallize the fibers in both states. For example, metals can be deposited on carbon or graphite fiber fabrics. Alternatively, deposition may be on carbon or graphite fibers and on carbon or graphite fibers woven into cloth or fabric. Metallized products of carbon and graphite fibers and products already formed into tows or yarns are commercially available. The tow or yarn can be used to weave flat weave fabrics. In addition, irregular sheets of carbon fiber are available. Any carbon fiber with a low CTE (preferably less than 2PPM/°C) can be used in embodiments of the present invention.
作为例子,可以用50-60wt%的铜镀敷1K(每根纱线或丝束有1000根6微米的纤维)石墨/碳纤维。该镀敷的丝束可用于纺织每英寸30×30根线的平纺织织物。如结合图3所介绍的,制造电源/地芯层的一种方法是用粘附性增强步骤例如硅烷耦合剂或氧化铜转化工艺处理该织物。处理过的织物按标准的浸渍工艺用树脂浸渍。该树脂浸渍布然后叠于释放片或粗糙铜箔上。如果使用粗糙铜箔,一般此时将其腐蚀掉。去掉释放片,并用间隙孔图形钻孔该部分。该例中,已构图电源层然后叠于一复合体上并用纤维叠片粘附于其上。然后按通常方式钻孔该复合体并镀敷。在钻透碳/石墨织物的地方,形成PTH连接。织物是致密纺织物,并提供基本连续的层,以便在任何钻出的孔位置形成连接。As an example, 1K (1000 6 micron fibers per yarn or tow) graphite/carbon fibers can be plated with 50-60 wt% copper. The plated tow can be used to weave flat woven fabrics of 30 x 30 threads per inch. As described in connection with Figure 3, one method of making a power/ground core layer is to treat the fabric with an adhesion enhancing step such as a silane coupling agent or a copper oxide conversion process. The treated fabric is impregnated with resin according to standard impregnation procedures. The resin-impregnated cloth is then laminated to a release sheet or roughened copper foil. If rough copper foil is used, it is generally etched away at this point. Remove the release sheet and drill the section with the clearance hole pattern. In this example, the patterned power layer is then laminated to a composite body and adhered thereto with a fiber laminate. The composite is then drilled and plated in the usual manner. Where the carbon/graphite fabric is drilled, a PTH connection is formed. The fabric is a dense woven fabric and provides a substantially continuous layer to form connections at the location of any drilled holes.
该工艺后可以得到敷金属碳纤维占体积的60%的电源层,并且CTE约为9PPM/℃。该CTE已比CTE约为17PPM/℃的固态铜层减小了许多。利用CTE约为2PPM/℃的碳纤维,可以产生9PPM/℃。利用更低CTE石墨纤维甚至也可以得到更低CTEs。碳和石墨纤维的CTEs约为-1.4PPM/℃到约2.0PPM/℃。这样的电源/地层应具有约1盎司纯铜的电流运载能力,但该结构的厚度约为3-4密耳,取代1盎司纯铜的1.4密耳厚度。After this process, a power supply layer in which metal-clad carbon fibers account for 60% of the volume can be obtained, and the CTE is about 9PPM/°C. This CTE is already much lower than that of the solid copper layer, which has a CTE of about 17PPM/°C. Using carbon fibers with a CTE of approximately 2PPM/°C, 9PPM/°C can be produced. Even lower CTEs can be obtained using lower CTE graphite fibers. Carbon and graphite fibers have CTEs of about -1.4 PPM/°C to about 2.0 PPM/°C. Such a power/ground plane should have the current carrying capability of about 1 oz of pure copper, but the structure is about 3-4 mils thick, displacing the 1.4 mil thickness of 1 oz of pure copper.
此外,碳纤维和石墨相对于最标准的PCB化学工艺较不活泼。所以腐蚀和其它工艺不易影响碳纤维和石墨。Additionally, carbon fiber and graphite are less reactive than most standard PCB chemistries. So corrosion and other processes are less likely to affect carbon fiber and graphite.
一旦形成金属化纤维片,这些低CTE的导电片可用于制造与电源/地芯层300、320或350类似的电源/地芯层。此外,可以进行制造这些芯层和将它们集成为PCB/LCC的上述任何方法。Once metallized fiber sheets are formed, these low CTE conductive sheets can be used to make power/ground cores similar to power/
具有低CTE的纤维材料的再一优选实施例是金属化的玻璃或石英纤维。与碳纤维类似,已可以买到玻璃和石英纤维的纱线或纺织片或不规则纸纤维。可以金属化纱股,并形成织物,或可以金属化已形成片的纤维。可以在每种织物上附加附加金属,得到附加电流运载能力。目前,市场上买不到这些纤维的敷金属产品。为形成敷金属纤维或织物,可用先前的方法形成敷金属纤维,或敷金属织物。此外,市场上已能买到不规则纸形式的玻璃纤维片。可以利用先前讨论的金属淀积法金属化这些片。Yet another preferred example of a fiber material with a low CTE is metallized glass or quartz fibers. Similar to carbon fibers, yarns or woven sheets of glass and quartz fibers or random paper fibers are already available. Strands of yarn can be metallized and formed into fabrics, or fibers that have been formed into sheets can be metallized. Additional metals can be added to each fabric for additional current carrying capabilities. Metallized products for these fibers are currently not commercially available. To form metallized fibers or fabrics, metallized fibers, or metallized fabrics, can be formed using previous methods. In addition, fiberglass sheets are commercially available in the form of random paper. The flakes can be metallized using the metal deposition methods discussed previously.
玻璃有许多不同形式,其中的许多是在硅石中加入某种“杂质”形成的。例如,S-玻璃是一种能绕成或不能绕成纤维的硅-铝-镁化合物,E-玻璃是一种主要用于纺织织物中的钙-铝-硼硅(Ca-A12O3-SiO2)化合物,D-玻璃是一种具有低介电常数的玻璃。普通玻璃纤维的CTEs为约1-3PPM/℃。例如,E-玻璃的CTE约为2.8PPM/℃,而S-玻璃的CTE约为1.6-2.2PPM/℃。Glass comes in many different forms, many of which are formed by adding certain "impurities" to silica. For example, S-glass is a silicon-aluminum-magnesium compound that can or cannot be wound into fibers, and E-glass is a calcium-aluminum-borosilicate (Ca-Al 2 O 3 -SiO 2 ) compound, D-glass is a glass with a low dielectric constant. The CTEs of ordinary glass fibers are about 1-3PPM/°C. For example, E-glass has a CTE of about 2.8PPM/°C, while S-glass has a CTE of about 1.6-2.2PPM/°C.
利用敷铜玻璃形成并与树脂层叠的电源/地芯层(如方法400)的CTE在敷金属玻璃纤维占体积的60%时约为12PPM/℃。该CTE已比约17PPM/℃的固态铜层(或固态铜层制造的PCB)的CTE显著减小。The CTE of a power/ground core layer formed using copper-clad glass and laminated with resin (eg, method 400) is approximately 12 PPM/°C when the metal-clad glass fiber occupies 60% by volume. This CTE has been significantly reduced from the CTE of the solid copper layer (or PCB made of solid copper layer) of about 17PPM/°C.
一旦形成金属化纤维片,这些由金属化玻璃纤维制成的低CTE导电片可用于制造与电源/地芯层300、320或350类似的电源/地芯层。此外,可以进行制造这些芯层和将它们集成为PCB/LCC的上述任何方法。Once metallized fiber sheets are formed, these low CTE conductive sheets made of metallized glass fibers can be used to make power/ground cores similar to power/
应注意,用作本发明的电源和地层的纤维材料对于水和其它溶剂来说具有渗透性。对水或其它溶剂具有渗透性减少了纤维叠层的剥离和PCBs中的阴极/阳极丝状生长。在共同待审的EN9-98-002“POROUS POWER AND GROUND PLANES FOR REDUCED PCBDELAMINATION AND BETTER RELIABLITY”中讨论了这种低CTE电源/地层。It should be noted that the fibrous material used as the power source and formation of the present invention is permeable to water and other solvents. Permeability to water or other solvents reduces debonding of the fiber stack and cathode/anode filamentous growth in PCBs. Such low CTE power/ground planes are discussed in co-pending EN9-98-002 "POROUS POWER AND GROUND PLANES FOR REDUCED PCBDELAMINATION AND BETTER RELIABLITY".
所以,本发明的各实施例提供了可用于形成构成PCBs或用作LCCs的PCBs的基础的电源/地芯层的低CTE材料。在形成电源/地层时,这些低CTE材料减小了PCB/LCC各层及固定于其上的芯片和芯片连接上的应力。应力的减小对用作LCCs的PCBs特别有益,是由于芯片直接固定于LCC上,龟裂前不容许很大的张力。本发明纤维材料的实施例具有相对水或其它溶剂具有渗透性的附加优点。Accordingly, embodiments of the present invention provide low CTE materials that can be used to form power/ground core layers that form the basis of PCBs or PCBs used as LCCs. When forming power/ground planes, these low CTE materials reduce the stress on the PCB/LCC layers and the chips and chip connections mounted thereon. The stress reduction is particularly beneficial for PCBs used as LCCs, since chips are mounted directly on the LCC, which does not tolerate high tension before cracking. Embodiments of the fibrous material of the present invention have the added advantage of being permeable to water or other solvents.
尽管主要讨论了铜作为金属化金属,但所属领域的技术人员应认识到,用于淀积铜的技术也可用于淀积银、金、铝、锡等。此外,即使用铜作金属化的基本金属,也可以在某些处理步骤中加入附加量的其它金属。例如,某些制造商将在处理期间加入少量金,以增强基本连接的导电性。Although copper is primarily discussed as the metallization metal, those skilled in the art will recognize that the techniques used to deposit copper can also be used to deposit silver, gold, aluminum, tin, and the like. Furthermore, even when copper is used as the base metal for metallization, additional amounts of other metals may be added during certain processing steps. For example, some manufacturers will add a small amount of gold during processing to enhance the conductivity of the base connection.
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USRE45637E1 (en) | 2005-08-29 | 2015-07-28 | Stablcor Technology, Inc. | Processes for manufacturing printed wiring boards |
TWI407850B (en) * | 2006-07-14 | 2013-09-01 | Stablcor Inc | Build-up printed wiring board substrate having a core layer that is part of a circuit |
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CN103839897A (en) * | 2012-11-20 | 2014-06-04 | 德克萨斯仪器股份有限公司 | Integrated circuit package and method of manufacture |
CN103839897B (en) * | 2012-11-20 | 2018-10-16 | 德克萨斯仪器股份有限公司 | Integrated antenna package and manufacturing method |
US9332632B2 (en) | 2014-08-20 | 2016-05-03 | Stablcor Technology, Inc. | Graphene-based thermal management cores and systems and methods for constructing printed wiring boards |
CN110073730A (en) * | 2016-12-19 | 2019-07-30 | Abb瑞士股份有限公司 | Method for conducting the multiphase busbar connector and its manufacture of electric energy |
CN110459519A (en) * | 2018-05-08 | 2019-11-15 | 日月光半导体制造股份有限公司 | Semiconductor device package and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
US6722031B2 (en) | 2004-04-20 |
MY125928A (en) | 2006-08-30 |
US6329603B1 (en) | 2001-12-11 |
US20020050402A1 (en) | 2002-05-02 |
SG97874A1 (en) | 2003-08-20 |
CN1171514C (en) | 2004-10-13 |
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