CN119413351A - Wide-range vacuum measurement composite gauge - Google Patents
Wide-range vacuum measurement composite gauge Download PDFInfo
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- CN119413351A CN119413351A CN202411690838.8A CN202411690838A CN119413351A CN 119413351 A CN119413351 A CN 119413351A CN 202411690838 A CN202411690838 A CN 202411690838A CN 119413351 A CN119413351 A CN 119413351A
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Abstract
本申请涉及真空测量技术领域，具体而言，涉及一种宽量程真空测量复合规管，包括超高真空传感组件、中真空传感组件、低真空传感组件以及屏蔽组件，其中：屏蔽组件包括屏蔽板、屏蔽筒和外屏蔽法兰筒，屏蔽板设置在外屏蔽法兰筒内部的中间位置，屏蔽筒的一端与屏蔽板连接，另一端以密封贯穿的形式固定在外屏蔽法兰筒的底面；超真空传感组件固定设置在屏蔽板的上方；中真空传感组件固定设置在屏蔽板的下方，并且位于屏蔽筒的一侧；低真空传感组件固定设置在屏蔽板的下方，并且位于屏蔽筒的另一侧。本申请通过将中低真空传感组件与超高真空组件相互复合，可实现大气压到超高真空范围的宽量程精确测量，并且可以开展规管原位标定。
The present application relates to the field of vacuum measurement technology, and specifically, to a wide-range vacuum measurement composite gauge, including an ultra-high vacuum sensor component, a medium vacuum sensor component, a low vacuum sensor component, and a shielding component, wherein: the shielding component includes a shielding plate, a shielding cylinder, and an outer shielding flange cylinder, the shielding plate is arranged in the middle position inside the outer shielding flange cylinder, one end of the shielding cylinder is connected to the shielding plate, and the other end is fixed to the bottom surface of the outer shielding flange cylinder in the form of a sealed penetration; the ultra-vacuum sensor component is fixedly arranged above the shielding plate; the medium vacuum sensor component is fixedly arranged below the shielding plate and is located on one side of the shielding cylinder; the low vacuum sensor component is fixedly arranged below the shielding plate and is located on the other side of the shielding cylinder. The present application can realize wide-range accurate measurement from atmospheric pressure to ultra-high vacuum by combining the medium and low vacuum sensor components with the ultra-high vacuum components, and can carry out in-situ calibration of the gauge.
Description
Technical Field
The application relates to the technical field of vacuum measurement, in particular to a wide-range vacuum measurement composite gauge.
Background
Vacuum is a thin gas state lower than 1 standard atmosphere, is widely used in heavy projects such as semiconductors and accelerators, and is an important special environment in the fields of scientific research and high-end manufacturing. In the integrated circuit manufacturing process, the dynamic range of vacuum pressure is 10 -9Pa-105 Pa, the vacuum pressure of an accelerator is lower than 10 -8 Pa, the service life of beam current is guaranteed, and the working conditions of high-end precision instruments such as a mass spectrometer, an electron microscope and the like are also 10 -9pa-105 Pa, so that high-precision wide-range vacuum measuring instruments in the range of 10 -9Pa-105 Pa are required in the fields.
The vacuum gauge with a single principle is difficult to realize wide-range vacuum pressure measurement, and 2-3 kinds of sensors with different principles are usually selected at home and abroad to realize wide-range measurement. For example, a Pirani gauge, a piezoelectric vacuum sensor, a cold-hot cathode ionization vacuum gauge or the like is compounded with the Pirani gauge and the ionization vacuum gauge in the most common way, but the Pirani gauge and the ionization vacuum gauge are not absolute vacuum measuring instruments, have great sensitivity change for different gases and cannot be evaluated, can only be calibrated by simulating a vacuum environment applying field conditions, and bring great resistance to high-precision, low-cost and high-efficiency vacuum measurement.
Paul C.Arnold et al invents a wide-range vacuum measuring instrument (a wide-range composite vacuum gauge, 2008, U.S. Pat. No. 7418869) combining an ionization vacuum gauge, a Pirani vacuum gauge, a differential pressure type film vacuum gauge and a pressure gauge, wherein the vacuum gauge comprises a vacuum measuring device which adopts hot cathode ionization vacuum estimation to realize the range of 10 -7 Pa-2Pa, the Pirani vacuum gauge measures 0.2 Pa-6.5X10 3 Pa, the differential pressure type film vacuum gauge and the pressure gauge are matched to realize the measurement of 5X 10 2Pa-105 Pa, the vacuum gauge adopts three sensors to realize the measurement from ultra-high vacuum to atmospheric pressure, but the problems of pressure difference, temperature error and the like introduced by a hot cathode gassing and heat radiation and a partition structure cause that each sensor cannot realize accurate pressure measurement of the same measuring area, on one hand, the measurement linearity of different measuring ranges is inconsistent, and on the other hand, the design cannot realize self calibration and calibration in the long-term working process of a gauge tube.
Disclosure of Invention
The application provides a wide-range vacuum measurement composite gauge which can realize wide-range vacuum measurement in a range of 10 -9Pa-105 Pa and can ensure that the measurement ranges of all sensing components are effectively connected.
In order to achieve the aim, the application provides a wide-range vacuum measurement composite gauge which comprises an ultrahigh vacuum sensing component, a medium vacuum sensing component, a low vacuum sensing component and a shielding component, wherein the shielding component comprises a shielding plate, a shielding cylinder and an outer shielding flange cylinder, the shielding plate is arranged in the middle of the inner part of the outer shielding flange cylinder, the shielding cylinder is arranged right below the shielding plate, one end of the shielding cylinder is connected with the shielding plate, the other end of the shielding cylinder is fixed on the bottom surface of the outer shielding flange cylinder in a sealing penetrating mode, the ultrahigh vacuum sensing component is an ionization type vacuum component and is fixedly arranged above the shielding plate, the medium vacuum sensing component is a medium vacuum MEMS capacitance film type vacuum component and is fixedly arranged below the shielding plate and is positioned on one side of the shielding cylinder, and the low vacuum sensing component is a low vacuum MEMS capacitance film type vacuum component and is fixedly arranged below the shielding plate and is positioned on the other side of the shielding cylinder.
Further, the outer shielding flange cylinder comprises a knife edge flange, a metal cylinder and a kovar bottom plate, wherein the knife edge flange is arranged on two sides of the outer part of the top end of the metal cylinder, and the kovar bottom plate is arranged at the bottom of the metal cylinder.
The ultra-vacuum sensing assembly comprises a cathode, an anode grid and an ion collector, wherein the cathode is a carbon nano tube field emission electron source and is arranged on the side face of the anode grid, the anode grid is a metal grid and is fixedly arranged above the shielding plate in an insulating mode, and the ion collector is a metal filament and is arranged inside the anode grid and is fixedly arranged on the shielding plate.
The middle vacuum sensing assembly comprises a first shielding cover, a first MEMS membrane, a first temperature sensor and a first wiring terminal, wherein the first shielding cover is arranged on one side of a shielding cylinder and is connected with a shielding plate through a screw, the first MEMS membrane is arranged in the first shielding cover, an opening of the first MEMS membrane is exposed in vacuum, the first temperature sensor is arranged on the inner wall of the first shielding cover, and the first wiring terminal is respectively arranged below the first MEMS membrane and the first temperature sensor.
Further, the first MEMS diaphragm has a measurement range of 0.1Pa-10 2 Pa.
Further, the low vacuum sensing assembly comprises a second shielding cover, a second MEMS membrane, a second temperature sensor and a second wiring terminal, wherein the second shielding cover is arranged on the other side of the shielding cylinder and is connected with the shielding plate through a screw, the second MEMS membrane is arranged in the second shielding cover, an opening of the second MEMS membrane is exposed in vacuum, the second temperature sensor is arranged on the inner wall of the second shielding cover, and the second wiring terminal is respectively arranged below the second MEMS membrane and the second temperature sensor.
Further, the second MEMS diaphragm has a measurement range of 10 2pa-105 Pa.
Further, the connector also comprises a connector post, the connector post penetrates through the kovar base plate in a vacuum sealing mode, and the connector post is connected with the first connector post and the second connector post respectively.
Further, the first MEMS membrane and the second MEMS membrane are formed by combining etched monocrystalline silicon and glass.
Further, the first temperature sensor and the second temperature sensor achieve accurate measurement of temperatures in the range of 0-100 ℃.
The wide-range vacuum measurement composite gauge provided by the application has the following beneficial effects:
The application can realize wide-range accurate measurement from atmospheric pressure to ultrahigh vacuum range by compounding the medium-low vacuum sensing component and the ultrahigh vacuum component, can complete absolute vacuum pressure measurement from 0.1Pa to atmospheric pressure by the medium-low vacuum sensing component and can carry out in-situ calibration of a gauge, can ensure accurate and reliable ion flow measurement of the ultrahigh vacuum component by the structure of the shielding plate and the shielding cylinder, and can ensure that an electronic motion track is strictly restricted in an ionization region, so that the sensitivity is stable, can protect an MEMS membrane from interference of peripheral electromagnetic field and thermal radiation by the shielding cover, ensures stable performance of the membrane, ensures reliable and real measurement result, can carry out accurate calibration and correction in the process of inverting pressure data, and effectively solves the technical problems of difficult expansion of the measurement range, low sensitivity and no in-situ calibration means in the field of vacuum measurement.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application, are incorporated in and constitute a part of this specification. The drawings and their description are illustrative of the application and are not to be construed as unduly limiting the application. In the drawings:
FIG. 1 is a schematic diagram of a wide-range vacuum measurement composite gauge provided according to an embodiment of the present application;
FIG. 2 is a schematic diagram of a medium vacuum sensor assembly provided according to an embodiment of the present application;
FIG. 3 is a schematic diagram of a low vacuum sensing assembly provided in accordance with an embodiment of the present application;
FIG. 4 is a graph of ultra-high vacuum sensing assembly calibration results provided in accordance with an embodiment of the present application;
FIG. 5 is a graph of a calibration result of a medium vacuum sensing assembly provided in accordance with an embodiment of the present application;
FIG. 6 is a graph of low vacuum sensor assembly calibration results provided in accordance with an embodiment of the present application;
In the figure, a 1-ultra-high vacuum sensing component, a 11-cathode, a 12-anode grid, a 13-ion collector, a 2-medium vacuum sensing component, a 21-first shielding cover, a 22-first MEMS membrane, a 23-first temperature sensor, a 24-first wiring terminal, a 3-low vacuum sensing component, a 31-second shielding cover, a 32-second MEMS membrane, a 33-second temperature sensor, a 34-second wiring terminal, a 4-shielding plate, a 5-shielding cylinder, a 6-outer shielding flange cylinder, a 61-knife edge flange, a 62-metal cylinder, a 63-kovar bottom plate and a 7-binding post are shown.
Detailed Description
In order that those skilled in the art will better understand the present application, a technical solution in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present application, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present application without making any inventive effort, shall fall within the scope of the present application.
It should be noted that the terms "first," "second," and the like in the description and the claims of the present application and the above figures are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate in order to describe the embodiments of the application herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
In the present application, the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate an azimuth or a positional relationship based on that shown in the drawings. These terms are only used to better describe the present application and its embodiments and are not intended to limit the scope of the indicated devices, elements or components to the particular orientations or to configure and operate in the particular orientations.
Also, some of the terms described above may be used to indicate other meanings in addition to orientation or positional relationships, for example, the term "upper" may also be used to indicate some sort of attachment or connection in some cases. The specific meaning of these terms in the present application will be understood by those of ordinary skill in the art according to the specific circumstances.
In addition, the term "plurality" shall mean two as well as more than two.
It should be noted that, without conflict, the embodiments of the present application and features of the embodiments may be combined with each other. The application will be described in detail below with reference to the drawings in connection with embodiments.
As shown in fig. 1, the application provides a wide-range vacuum measurement composite gauge, which comprises an ultrahigh vacuum sensing component 1, a medium vacuum sensing component 2, a low vacuum sensing component 3 and a shielding component, wherein the shielding component comprises a shielding plate 4, a shielding cylinder 5 and an outer shielding flange cylinder 6, the shielding plate 4 is arranged at the middle position inside the outer shielding flange cylinder 6, the shielding cylinder 5 is arranged right below the shielding plate 4, one end of the shielding cylinder 5 is connected with the shielding plate 4, the other end of the shielding cylinder is fixed on the bottom surface of the outer shielding flange cylinder 6 in a sealing penetrating mode, the ultrahigh vacuum sensing component is an ionization type vacuum component and is fixedly arranged above the shielding plate 4, the medium vacuum sensing component 2 is a medium vacuum MEMS capacitance film type vacuum component and is fixedly arranged below the shielding plate 4 and is positioned on one side of the shielding cylinder 5, and the low vacuum sensing component 3 is a low vacuum MEMS capacitance film type vacuum component and is fixedly arranged below the shielding plate 4 and is positioned on the other side of the shielding cylinder 5.
Specifically, the wide-range vacuum measurement composite gauge provided by the embodiment of the application can realize vacuum pressure measurement from atmospheric pressure to ultra-high vacuum range (10 -9Pa-105 Pa), can be matched with different vacuum gauge control systems for use according to different measurement requirements, has good electromagnetic shielding and heat shielding effects, and has high measurement accuracy. The ultrahigh vacuum sensing assembly 1 adopts an ionization type vacuum assembly, can invert the vacuum pressure in the range of 10 -9 Pa-1Pa, achieves the vibration control of a motion track by the pressure background interference caused by the electron excitation desorption effect, the soft X-ray effect, the electrode material outgassing effect and the like of the ionization type vacuum assembly reaching the magnitude of 10 -10 Pa, ensures that the sensitivity is higher than 0.1Pa -1, adopts a medium vacuum MEMS capacitance film type vacuum assembly for the medium vacuum sensing assembly 2, can achieve the measurement of the vacuum pressure in the range of 0.1Pa-10 2 Pa, adopts a low vacuum MEMS capacitance film type vacuum assembly for the low vacuum sensing assembly 3, can achieve the measurement of the vacuum pressure in the range of 10 2Pa-105 Pa, mainly plays a role of shielding except the role of fixed support, can effectively reduce electromagnetic field interference, thermal radiation interference and gas flow state disturbance generated by a charge electrode in each vacuum sensing assembly, and the electrostatic field formed by the shielding cylinder 5 and the shielding plate 4 can ensure that gas phase ions are effectively collected by the ion collector 13 and effectively inhibit the influence of the electromagnetic interference.
Further, the outer shielding flange cylinder 6 comprises a knife edge flange 61, a metal cylinder 62 and a kovar bottom plate 63, wherein the knife edge flange 61 is arranged on two sides of the outer part of the top end of the metal cylinder 62, and the kovar bottom plate 63 is arranged at the bottom of the metal cylinder 62. The whole outer shielding flange cylinder 6 adopts a stainless steel knife opening sealing structure of stainless steel-kovar-ceramic transitional sealing, mainly plays roles of protection and shielding, the flange is not plated with nickel, the original metal property of the stainless steel is kept, the air release rate is less than 10 -11Pam3/s, and low air release is realized.
Further, the ultra-vacuum sensing assembly comprises a cathode 11, an anode grid 12 and an ion collector 13, wherein the cathode 11 is a carbon nano tube field emission electron source and is arranged on the side face of the anode grid 12, the anode grid 12 is a metal grid and is fixedly arranged above the shielding plate 4 in an insulating mode, and the ion collector 13 is a metal filament and is arranged inside the anode grid 12 and is fixedly arranged on the shielding plate 4. As shown in fig. 4, the ionization type vacuum gauge shows good measurement linearity from 10 -9 Pa to 1Pa, which is an actual calibration result obtained by calibrating the ultra-vacuum sensor assembly on the vacuum standard device.
Specifically, the cathode 11 may be a thermionic emission cathode, the working temperature is usually higher than 1000K, the material may be yttrium oxide coated iridium wire, thorium oxide coated iridium wire, etc., the structure may be a single straight wire, V-shaped filament or spiral filament, the cathode 11 may also be an emission array cathode, the macroscopic working temperature is room temperature, the material may be a carbon nanotube array or a metal cone array, etc., and the structure is usually planar or approximately punctiform. In the embodiment of the application, the cathode 11 is preferably a carbon nanotube field emission electron source and is positioned on the side surface of the anode grid 12, the anode grid 12 is a metal grid and is fixedly supported above the shielding plate 4 in an insulating manner, and the ion collector 13 is a metal filament. Electrons are led out from the cathode 11 under the action of a high-strength electric field, interference of macroscopic thermal radiation and light radiation effects is effectively inhibited, the emitted electrons enter the grid through the anode grid 12, and under the electric field formed by the combined action of the anode grid 12, the shielding plate 4, the ion collector 13 and the outer shielding flange cylinder 6, electron beams emitted by the cathode 11 reciprocate in the anode grid 12, collide with gas molecules and are ionized in the electron oscillation movement process, ions are received by the ion collector 13 under the action of the electric field, and vacuum pressure in the range of 10 -9 Pa-1Pa is inverted.
More specifically, in the embodiment of the present application, the cathode 11 is a carbon nanotube electron source, which has advantages of no thermal effect, fast response, etc., and is installed outside the anode grid 12 with a spacing of 1.5mm, and the top of the cathode 11 is 5mm from the top of the anode grid 12. The anode is made of platinum iridium alloy, the diameter is 22mm, the height is 50mm, the pitch is 3mm, the anode grid 12 is connected with the conductive core column through resistance welding, the diameter of the shielding plate 4 is 30mm, a conical hole of 2mm is formed in the center, the ion collector 13 is a tungsten wire of 0.05mm and is positioned on the central axis of the cage grid, the ion collector has good ion collection efficiency, the grounded shielding cylinder 5 is arranged on the outer side of the ion collector 13, the shielding plate 4 is fixed at the top of the shielding cylinder 5, interference of an ionization space electromagnetic field on gas-phase ions can be effectively restrained, and meanwhile, the effective movement path of electrons is ensured based on a unique electromagnetic field structure.
Further, as shown in fig. 2, the medium vacuum sensor assembly 2 comprises a first shielding case 21, a first MEMS diaphragm 22, a first temperature sensor 23 and a first connection terminal 24, wherein the first shielding case 21 is arranged on one side of the shielding cylinder 5 and is connected with the shielding plate 4 through a screw, the first MEMS diaphragm 22 is arranged inside the first shielding case 21, an opening of the first MEMS diaphragm 22 is exposed in vacuum, the first temperature sensor 23 is arranged on the inner wall of the first shielding case 21, and the first connection terminal 24 is respectively arranged below the first MEMS diaphragm 22 and the first temperature sensor 23.
Further, the first MEMS diaphragm 22 has a measurement range of 0.1Pa-10 2 Pa.
Further, as shown in fig. 3, the low vacuum sensing assembly 3 includes a second shield 31, a second MEMS diaphragm 32, a second temperature sensor 33, and a second connection terminal 34, wherein the second shield 31 is disposed at the other side of the shield cylinder 5 and is connected to the shield plate 4 by a screw, the second MEMS diaphragm 32 is disposed inside the second shield 31 with its opening exposed in vacuum, the second temperature sensor 33 is disposed on the inner wall of the second shield 31, and the second connection terminal 34 is disposed under the second MEMS diaphragm 32 and the second temperature sensor 33, respectively.
Further, the measurement range of the second MEMS diaphragm 32 is 10 2Pa-105 Pa.
Specifically, the middle vacuum sensing component 2 and the low vacuum sensing component 3 both adopt MEMS capacitance film vacuum structures, each MEMS capacitance film vacuum component comprises a shielding cover, MEMS films, a temperature sensor and a wiring terminal, the two MEMS capacitance film vacuum components with different measuring ranges are symmetrically arranged below the shielding plate 4, the MEMS films prepared from silicon-based materials are fixed on a ceramic base and fixedly connected with a wiring terminal 7 below through the wiring terminal, the surface-mounted temperature sensor is fixed on the upper surface of the shielding cover, and the design of a double-capacitance differential measurement mode can inhibit measurement errors caused by temperature change. The shielding cover and the shielding plate 4 are connected through screws to achieve equipotential and mechanical fixation, the outer surface of the shielding cover is subjected to high-brightness polishing, the shielding cover has high emission characteristic of heat radiation, the heat effect from an ionization type vacuum assembly is effectively restrained, an opening of an MEMS membrane is exposed in vacuum, gas molecules generate macroscopic pressure in the MEMS membrane, the vacuum pressure is reflected through deformation of the membrane, the measuring range of the first MEMS membrane 22 is 0.1Pa-10 2 Pa, the actual calibration result of the middle vacuum sensing assembly 2 on a vacuum standard device is shown in fig. 5, the accurate measurement of the pressure in the measuring range of 0.1Pa-10 2 Pa is achieved, good linearity is shown, the measuring range of the second MEMS membrane 32 is 10 2Pa-105 Pa, the actual calibration result of the low vacuum sensing assembly 3 on the vacuum standard device is shown in fig. 6, accurate measurement of the pressure in the measuring range of 10 2Pa-105 Pa is completed, good linearity is shown, a temperature sensor is adhered on the inner wall of the shielding cover, the temperature sensor is used for accurately measuring the rarefaction gas temperature of a local space, and correction effect caused by temperature difference of the MEMS capacitance membrane assembly is achieved.
Further, the connector 7 is further included, the connector 7 penetrates through the kovar base plate 63 in a vacuum sealing mode, and the connector 7 is connected with the first connecting terminal 24 and the second connecting terminal 34 respectively. The binding post 7 integrally penetrates through the kovar bottom plate 63 at the bottom of the metal cylinder 62 and is connected with a binding post to provide electric connection and mechanical connection for the MEMS membrane, the shielding cylinder 5 and the temperature sensor.
Further, first MEMS diaphragm 22 and second MEMS diaphragm 32 are each formed from etched monocrystalline silicon and glass. MEMS membranes are mainly used for pressure sensing in the medium and low vacuum range.
Further, the first temperature sensor 23 and the second temperature sensor 33 achieve accurate measurement of temperature in the range of 0-100 ℃. The temperature sensor is used for directly measuring the local temperature of the medium-low vacuum sensing component, the measuring range is 0-100 ℃, and the temperature sensor is used for accurately correcting in the pressure inversion process.
Specifically, the wide-range vacuum measurement composite gauge provided by the embodiment of the application has the advantages that the measurement range of the wide-range vacuum measurement composite gauge covers 10 -9Pa-105 Pa, the full-range from atmospheric pressure to ultra-high vacuum is realized, in-situ calibration of an ionization vacuum assembly can be completed by utilizing the MEMS capacitance film vacuum structure, the problem that measurement data of different sensors of a wide-range vacuum measurement instrument cannot be connected and fused is solved, meanwhile, the temperature measurement function is implanted, the influence of heat flow escape effect induced by the heat effect of the ionization vacuum gauge for a long time is effectively overcome, and the accurate correction of temperature can be realized in the inversion process of pressure data.
The above description is only of the preferred embodiments of the present application and is not intended to limit the present application, but various modifications and variations can be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (10)
1. The utility model provides a wide range vacuum measurement composite gauge, its characterized in that includes ultra-high vacuum sensing subassembly, well vacuum sensing subassembly, low vacuum sensing subassembly and shielding assembly, wherein:
The shielding assembly comprises a shielding plate, a shielding cylinder and an outer shielding flange cylinder, wherein the shielding plate is arranged in the middle position inside the outer shielding flange cylinder, the shielding cylinder is arranged right below the shielding plate, one end of the shielding cylinder is connected with the shielding plate, and the other end of the shielding cylinder is fixed on the bottom surface of the outer shielding flange cylinder in a sealing penetrating mode;
the ultra-vacuum sensing component is an ionization type vacuum component and is fixedly arranged above the shielding plate;
the medium vacuum sensing component is a medium vacuum MEMS capacitance film type vacuum component, is fixedly arranged below the shielding plate and is positioned at one side of the shielding cylinder;
the low vacuum sensing component is a low vacuum MEMS capacitance film type vacuum component, is fixedly arranged below the shielding plate and is positioned on the other side of the shielding cylinder.
2. The wide-range vacuum measurement composite gauge of claim 1, wherein the outer shielding flange cylinder comprises a knife edge flange, a metal cylinder, and a kovar floor, wherein:
The knife edge flanges are arranged on two sides of the outer part of the top end of the metal cylinder;
The kovar bottom plate is arranged at the bottom of the metal cylinder.
3. The wide-range vacuum measurement composite gauge of claim 2, wherein the ultra-vacuum sensing assembly comprises a cathode, an anode grid, and an ion collector, wherein:
The cathode is a carbon nano tube field emission electron source and is arranged on the side surface of the anode grid;
The anode grid is a metal grid and is fixedly arranged above the shielding plate in an insulating mode;
the ion collector is a metal filament, is arranged in the anode grid mesh and is fixed on the shielding plate.
4. The wide-range vacuum measurement composite gauge of claim 3, wherein the medium vacuum sensing assembly comprises a first shield, a first MEMS diaphragm, a first temperature sensor, and a first terminal, wherein:
the first shielding cover is arranged on one side of the shielding cylinder and is connected with the shielding plate through a screw;
The first MEMS membrane is arranged inside the first shielding cover, and the opening of the first MEMS membrane is exposed in vacuum;
The first temperature sensor is arranged on the inner wall of the first shielding cover;
the first wiring terminals are respectively arranged below the first MEMS membrane and the first temperature sensor.
5. The wide-range vacuum measurement composite gauge according to claim 4, wherein the first MEMS diaphragm has a measurement range of 0.1Pa-10 2 Pa.
6. The wide-range vacuum measurement composite gauge of claim 5, wherein the low vacuum sensing assembly comprises a second shield, a second MEMS diaphragm, a second temperature sensor, and a second terminal, wherein:
the second shielding cover is arranged on the other side of the shielding cylinder and is connected with the shielding plate through a screw;
The second MEMS membrane is arranged inside the second shielding cover, and the opening of the second MEMS membrane is exposed in vacuum;
The second temperature sensor is arranged on the inner wall of the second shielding cover;
The second wiring terminals are respectively arranged below the second MEMS membrane and the second temperature sensor.
7. The wide-range vacuum measurement composite gauge of claim 6, wherein the second MEMS diaphragm has a measurement range of 10 2Pa-105 Pa.
8. The wide-range vacuum measurement composite gauge according to claim 7, further comprising a terminal post penetrating through the kovar base plate in a vacuum sealing manner, wherein the terminal post is connected with the first terminal post and the second terminal post respectively.
9. The wide-range vacuum measurement composite gauge of claim 8, wherein the first MEMS diaphragm and the second MEMS diaphragm are each composed of etched monocrystalline silicon and glass.
10. The wide-range vacuum measurement composite gauge of claim 9, wherein the first temperature sensor and the second temperature sensor achieve accurate measurement of temperatures in the range of 0-100 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202411690838.8A CN119413351A (en) | 2024-11-23 | 2024-11-23 | Wide-range vacuum measurement composite gauge |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202411690838.8A CN119413351A (en) | 2024-11-23 | 2024-11-23 | Wide-range vacuum measurement composite gauge |
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| CN119413351A true CN119413351A (en) | 2025-02-11 |
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