CN119392208A - Cleaning device for graphite disc in semiconductor industry - Google Patents
Cleaning device for graphite disc in semiconductor industry Download PDFInfo
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- CN119392208A CN119392208A CN202411973841.0A CN202411973841A CN119392208A CN 119392208 A CN119392208 A CN 119392208A CN 202411973841 A CN202411973841 A CN 202411973841A CN 119392208 A CN119392208 A CN 119392208A
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Abstract
The invention discloses a cleaning device for a graphite disc in the semiconductor industry, which comprises an upper substrate and the graphite disc, wherein the graphite disc is arranged on one side of the upper substrate, and relates to the technical field of semiconductor epitaxy. The invention can clean the deposited particles on the graphite disc in time after the production of the graphite disc process is completed, thereby improving the use frequency of the graphite disc, improving the efficiency of the epitaxial process, and reducing the influence of the deposition of the graphite disc on the performance of the wafer when the graphite disc is recycled.
Description
Technical Field
The invention relates to the technical field of semiconductor epitaxy, in particular to a cleaning device for a graphite disc in the semiconductor industry.
Background
In the field of epitaxy in the semiconductor industry, it is generally necessary to place a wafer in a graphite disk and then place the wafer in a process chamber for epitaxial growth. In the epitaxial growth process, the compound can be deposited on the wafer and particles can be deposited on the graphite disk, so that the sediment on the surface of the graphite disk needs to be cleaned in time, otherwise, the sediment on the surface of the graphite disk can seriously influence the epitaxial quality of subsequent growth during epitaxial growth, and the performance of the wafer is greatly influenced.
In the prior art, the graphite disc needs to be cleaned in time after the epitaxial growth is finished, if a new graphite disc is replaced after each process treatment is finished, the graphite disc can not be reused to seriously influence the efficiency of processing the wafer, and if a scheme of recycling the graphite disc is adopted, the follow-up epitaxial quality is difficult to be guaranteed well.
Therefore, the problems of cleaning the graphite disc in time after the process, increasing the use frequency of the graphite disc and effectively improving the processing efficiency of the wafer process in the prior art are required to be improved in time, and the influence of the deposition of the graphite disc on the wafer performance is reduced.
Disclosure of Invention
The invention aims to provide a cleaning device for a graphite disc in the semiconductor industry, which aims to solve the problems in the background technology.
In order to achieve the purpose, the technical scheme is that the cleaning device for the graphite disc in the semiconductor industry comprises an upper substrate and the graphite disc, wherein the graphite disc is arranged on one side of the upper substrate, a rotating assembly is arranged at the center of the other side of the upper substrate, a swing arm centering assembly and a cleaning assembly are arranged at the edge of the upper substrate, the rotating assembly is used for bearing the graphite disc on one side of the upper substrate, a plurality of groups of swing arm centering assemblies are used for abutting and transferring at the circumference of the graphite disc, and the cleaning assembly is used for cleaning the graphite disc.
As a still further scheme of the invention, the swing arm centering assembly comprises a swing arm driving part, a swing arm rotary driven part, a swing arm part, a sensor connecting piece and an on-site sensor, wherein the swing arm driving part is arranged on one side of the upper substrate and drives a plurality of groups of swing arm parts to rotate through the swing arm rotary driven part, and the sensor connecting piece and the on-site sensor are used for on-site detection of the graphite disc.
As a still further scheme of the invention, the swing arm driving part comprises a swing arm rotation driving motor, a synchronizing wheel, a first synchronizing belt and a first swing arm wheel, wherein the swing arm rotation driving motor is fixedly arranged on one side of the upper substrate, the output end of the swing arm rotation driving motor is fixedly connected with the synchronizing wheel, the first swing arm wheel is in transmission connection with the swing arm rotation driven part, and the synchronizing wheel is in transmission connection with the first swing arm wheel through the first synchronizing belt.
The swing arm rotation driven part comprises a first rotating rod, a second rotating rod, a third rotating rod, a second swing arm wheel, a third swing arm wheel, a fourth swing arm wheel and a second synchronous belt, wherein one end of the first rotating rod penetrates through the second swing arm wheel and is fixedly connected with the first swing arm wheel, the other end of the first rotating rod is fixedly connected with the first swing arm, annular arrays of the second swing arm wheel, the third swing arm wheel and the fourth swing arm wheel are distributed on one side of the upper substrate, one end of the second rotating rod is fixedly connected with the third swing arm wheel, one end of the third rotating rod is fixedly connected with the fourth swing arm wheel, the other end of the third swing arm wheel or the fourth swing arm wheel is fixedly connected with the first swing arm respectively, and the second synchronous belt is arranged around the outer sides of the second swing arm wheel, the third swing arm wheel and the fourth swing arm wheel.
As a still further scheme of the invention, the swing arm part comprises a first swing arm and a silica gel bearing, one end of the first swing arm far away from the second swing arm wheel, the third swing arm wheel or the fourth swing arm wheel is rotationally connected with the silica gel bearing, the silica gel bearing is movably connected with the graphite disc, and the contact surfaces of the synchronous belts and the swing arm wheels are roughened.
As a still further proposal of the invention, the sensor connecting piece is fixedly arranged at one side of the upper substrate, and the in-situ sensor is electrically connected with the sensor connecting piece.
As a still further scheme of the invention, the rotary assembly comprises a disc rotary driving motor, a rotary flange and a support column, wherein the disc rotary driving motor is fixedly arranged on one side of an upper substrate, the output end of the disc rotary driving motor is fixedly connected with the rotary flange, one side of the support column is fixedly connected with the rotary flange, and the other side of the support column is movably connected with the graphite disc.
As a still further scheme of the invention, the cleaning assembly comprises a cantilever rotary driving motor, a cleaning cantilever and a vacuum generator, wherein the cantilever rotary driving motor is fixedly arranged on one side of the upper substrate, the cleaning cantilever is suspended above the graphite disc, the cleaning cantilever is in transmission connection with the output end of the cantilever rotary driving motor, and the vacuum generator is fixedly arranged on one side of the upper substrate and the output end of the vacuum generator is communicated with the cleaning cantilever.
As a still further scheme of the invention, the cleaning cantilever comprises a supporting rod hoop, a cantilever supporting rod, a first cantilever and a quick connector, wherein one end of the supporting rod hoop is fixedly connected with the output end of a cantilever rotation driving motor, the other end of the supporting rod hoop is fixedly connected with the cantilever supporting rod, the quick connector is fixedly arranged in the cantilever supporting rod, the quick connector is communicated with the output end of a vacuum generator, and cleaning dense holes are formed in the first cantilever.
As a still further proposal of the invention, the invention also comprises a vision device which is arranged at one side of the graphite disc and used for monitoring the graphite disc.
Compared with the prior art, the method has the beneficial effects that deposited particles on the graphite disc can be cleaned in time after the production of the graphite disc process is completed, so that the use frequency of the graphite disc is increased, the efficiency of an epitaxial process is improved, and the influence of graphite disc deposits on the performance of a wafer when the graphite disc is recycled is reduced.
Specifically, the invention firstly detects the existence of the graphite disc through the position sensor, starts to calibrate and center the graphite disc through the given signal, then the cleaning swing arm of the cleaning assembly rotates to the center position of the graphite disc after calibration and centering, positive pressure gas is introduced into the vacuum generator, so that the cleaning swing arm generates vacuum, and the rotating assembly drives the graphite disc to rotate for at least one circle, so that deposited particles on the graphite disc after the process are completely cleaned.
Drawings
FIG. 1 is a front view of an embodiment of the present invention;
FIG. 2 is a top view of an embodiment of the present invention;
FIG. 3 is a schematic view of a structure for cleaning dense holes according to an embodiment of the present invention;
FIG. 4 is a schematic view of a structure for cleaning a long waist hole according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of an embodiment of an in-situ sensor;
FIG. 6 is a schematic diagram of a visual device according to an embodiment of the present invention;
in the figure, 1, an upper base plate, 20, a swing arm centering assembly, 30, a rotating assembly, 40, a cleaning assembly, 5, a graphite disc and 6, a vision device;
21. A swing arm driving section; 22, a swing arm rotation driven part, 23, a swing arm part, 24, a sensor connecting piece, 25, an on-site sensor, 41, a cantilever rotation driving motor, 42, a cleaning cantilever, 43 and a vacuum generator;
211. the swing arm rotary driving motor, 212, the synchronizing wheel, 213, the first synchronizing belt, 214, the first swing arm wheel;
221. first rotary rod 222, second rotary rod 223, third rotary rod 224, second swing arm wheel 225, third swing arm wheel 226, fourth swing arm wheel 227, second synchronous belt;
231. 232, a silica gel bearing;
301. a disk rotation driving motor; 302, a rotary flange 303, a support column;
421. the device comprises a supporting rod hoop, 422, a cantilever supporting rod, 423, a first cantilever, 424, a quick connector, 425, a dense hole cleaning, 426, and a long waist hole cleaning.
Detailed Description
The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings.
In the embodiment of the invention, referring to fig. 1, 2 and 5, a cleaning device for a graphite disc in the semiconductor industry comprises an upper substrate 1 and a graphite disc 5, wherein the graphite disc 5 is arranged on one side of the upper substrate 1, a rotating component 30 is arranged at the center of the other side of the upper substrate 1, a swing arm centering component 20 and a cleaning component 40 are arranged at the edge of the rotating component, the rotating component 30 is used for bearing the graphite disc 5 on one side of the upper substrate 1, a plurality of groups of the swing arm centering components 20 are used for abutting and transferring at the circumference of the graphite disc 5, the cleaning component 40 is used for cleaning the graphite disc 5, and the swing arm centering component 20 comprises a swing arm driving part 21, The graphite rotary device comprises an upper substrate 1, a sensor connecting piece 24 and an on-site sensor 25, wherein a swing arm driving part 21 is arranged on one side of the upper substrate 1 and drives a plurality of groups of swing arm parts 23 to rotate through the swing arm rotary driven part 22, the sensor connecting piece 24 and the on-site sensor 25 are used for detecting the on-site of a graphite disc 5, the swing arm driving part 21 is arranged on one side of the upper substrate 1 and drives the plurality of groups of swing arm parts 23 to rotate through the swing arm rotary driven part 22, the swing arm driving part 21 comprises a swing arm rotary driving motor 211, a synchronous wheel 212, a first synchronous belt 213 and a first swing arm wheel 214, the swing arm rotary driving motor 211 is fixedly arranged on one side of the upper substrate 1, the output end of the swing arm rotary driving motor 211 is fixedly connected with the synchronous wheel 212, the first swing arm wheel 214 is in transmission connection with the swing arm rotary driven part 22, the synchronous wheel 212 is in transmission connection with the first swing arm wheel 214 through the first synchronous belt 213, and the swing arm rotary driven part 22 comprises a first rotary rod 221, The second rotary rod 222, the third rotary rod 223, the second swing arm wheel 224, the third swing arm wheel 225, the fourth swing arm wheel 226 and the second hold-in range 227, the one end of first rotary rod 221 pass behind the second swing arm wheel 224 with first swing arm wheel 214 fixed connection, the other end and the first swing arm 231 fixed connection of first rotary rod 221, second swing arm wheel 224, third swing arm wheel 225 and fourth swing arm wheel 226 annular array distributes in one side of last base plate 1, the one end and the third swing arm wheel 225 fixed connection of second rotary rod 222, the one end and the fourth swing arm wheel 226 fixed connection of third rotary rod 223, the other end and the first swing arm 231 fixed connection of third swing arm wheel 225 or fourth swing arm wheel 226 respectively, the second hold-in range 227 encircles second swing arm wheel 224, The outer sides of the third swing arm wheel 225 and the fourth swing arm wheel 226 are respectively provided with a contact surface of each synchronous belt and each swing arm wheel subjected to roughening treatment, namely, the first swing arm wheel 214 is fixedly connected with the first rotating rod 221, the second swing arm wheel 224 is fixedly connected with the first rotating rod 221 on the upper side of the first swing arm wheel 214, meanwhile, the second rotating rod 222 is fixedly connected with the third swing arm wheel 225, the third rotating rod 223 is fixedly connected with the fourth swing arm wheel 226, and the second synchronous belt 227 can surround the outer sides of the second swing arm wheel 224, the third swing arm wheel 225 and the fourth swing arm wheel 226 in a surrounding mode as shown in fig. 2.
Therefore, the swing arm driving part 21 drives the swing arm rotation driving motor 211 and the synchronizing wheel 212 to rotate, the first swing arm wheel 214 is driven to rotate by the first synchronous belt 213 wrapping the outside of the synchronizing wheel 212 after the rotation, and in addition, because the first swing arm wheel 214 is coaxially arranged with the second swing arm wheel 224, the first rotating rod 221 and the first swing arm 231, the second swing arm wheel 224 drives the third swing arm wheel 225 and the fourth swing arm wheel 226 to move by the second synchronous belt 227, one end of the third swing arm wheel 225 is fixedly connected with the first swing arm 231 by the second rotating rod 222, and one end of the fourth swing arm wheel 226 is fixedly connected with the first swing arm 231 by the third rotating rod 223, so that the three groups of the first swing arms 231 can move and contact and support the graphite disc 5, and the carrying operation of the graphite disc 5 is realized.
Referring to fig. 2, in a top view, the swing arm portion 23 includes a first swing arm 231 and a silicone bearing 232, one end of the first swing arm 231 far from the second swing arm wheel 224, the third swing arm wheel 225 or the fourth swing arm wheel 226 is rotatably connected with the silicone bearing 232, the silicone bearing 232 is movably connected with the graphite disc 5, and the second synchronous belt 227 may be circumferentially disposed around the outer sides of the second swing arm wheel 224, the third swing arm wheel 225 and the fourth swing arm wheel 226 as shown in fig. 2, so that the first swing arm 231 contacts the silicone bearing 232, the silicone bearing 232 contacts the graphite disc 5, and the three groups of silicone bearings 232 may be used to perform clamping and supporting of the graphite disc 5, and the three groups of silicone bearings 232 may also be used to perform positioning during rotation of the graphite disc 5, so as to ensure that the graphite disc 5 cannot be separated from the apparatus due to centrifugal force generated by the operation of the rotating assembly 30.
In other embodiments of the present invention, referring to fig. 1 and 5, the sensor connector 24 is fixedly installed at one side of the upper substrate 1, and the in-situ sensor 25 is electrically connected to the sensor connector 24.
Referring to fig. 1, in other embodiments of the present invention, the rotating assembly 30 includes a disc rotation driving motor 301, a rotation flange 302, and a support column 303, where the disc rotation driving motor 301 is fixedly installed on one side of the upper substrate 1, and the output end of the disc rotation driving motor is fixedly connected to the rotation flange 302, one side of the support column 303 is fixedly connected to the rotation flange 302, and the other side of the support column 303 is movably connected to the graphite disc 5, so that the graphite disc 5 can be placed at one end of the support column 303 far away from the rotation flange 302, and after the rotation flange 302 is driven by the disc rotation driving motor 301 to rotate and the rotation flange 302 drives the support column 303 to rotate, power can be synchronously transmitted to one side of the graphite disc 5, thereby realizing the rotation effect of the graphite disc 5.
Other embodiments of the invention: referring to fig. 1,2, 3 and 4, the cleaning assembly 40 includes a cantilever rotation driving motor 41, a cleaning cantilever 42 and a vacuum generator 43, the cantilever rotation driving motor 41 is fixedly installed at one side of the upper substrate 1, the cleaning cantilever 42 is suspended above the graphite disk 5, the cleaning cantilever 42 is in driving connection with an output end of the cantilever rotation driving motor 41, wherein the vacuum generator 43 can generate a vacuum environment so as to suck deposited particles on the graphite disk 5, the vacuum generator 43 is fixedly installed at one side of the upper substrate 1 and the output end is communicated with the cleaning cantilever 42, the cleaning cantilever 42 includes a support bar anchor 421, a cantilever support bar 422, a first cantilever 423 and a quick connector 424, one end of the support bar anchor 421 is fixedly connected with an output end of the cantilever rotation driving motor 41, the other end of the supporting rod hoop 421 is fixedly connected with the cantilever supporting rod 422, the quick connector 424 is fixedly arranged in the cantilever supporting rod 422, the quick connector 424 is communicated with the output end of the vacuum generator 43, and the cleaning dense holes 425 or cleaning long waist holes 426 are formed in the first cantilever 423, namely, the cleaning cantilever 42 fixedly connects the cantilever supporting rod 422 with the output end of the cantilever rotary driving motor 41 to ensure the rotation function of the first cantilever 423, the quick connector 424 communicates the output end of the vacuum generator 43 with the first cantilever 423 to ensure the vacuum adsorption function of the first cantilever 423, meanwhile, the vacuum adsorption function of the first cantilever 423 can be well realized by the cleaning dense holes 425 or the cleaning long waist holes 426, in addition, the cleaning mode of the first cantilever 423 in the cleaning assembly 40 can be vacuum cleaning or positive pressure blowing cleaning, the openings in the first cantilever 423 near the graphite disk 5 may be long waist holes or dense small holes, and the first cantilever 423 may be rotated or lifted for cleaning, so this is only exemplary, and those skilled in the art may make the above corresponding adjustments to the first cantilever 423 according to the actual situation, but such changes do not depart from the scope of the present disclosure.
In other embodiments of the present invention, referring to fig. 6, the present invention further includes a vision device 6, where the vision device 6 is disposed on one side of the graphite disk 5 and is used for monitoring the graphite disk 5, specifically, the vision device 6 can monitor the graphite residue remained on the graphite disk 5, and the principle is to detect the flatness of the graphite disk 5, and when foreign matters such as graphite residue exist on the graphite disk 5, the flatness of the graphite disk 5 is affected, so as to cause an alarm of the vision device 6 to remind personnel of processing.
The working principle of the invention is that in actual work, referring to fig. 1 and 2, the swing arm rotation driving motor 211 drives the three swing arm parts 23 to rotate in the same direction to complete clamping centering of the graphite disc 5, and after the position sensor 25 sends out a signal, the cantilever rotation driving motor 41 can drive the first cantilever 423 to rotate to the center position of the graphite disc 5, then the vacuum generator 43 is started to enable the first cantilever 423 to generate vacuum gas, and at the moment, the disc rotation driving motor 301 is driven to drive the graphite disc 5 to rotate at least one circle, so that the cleaning operation of the whole graphite disc 5 can be completed.
The foregoing description is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical solution of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.
Claims (10)
1. The utility model provides a cleaning device of semiconductor trade graphite disc, its characterized in that, includes upper substrate (1) and graphite disc (5), graphite disc (5) set up one side of upper substrate (1), the opposite side center department of upper substrate (1) is provided with rotating assembly (30), edge is provided with swing arm centering component (20) and cleans subassembly (40), rotating assembly (30) are used in the bearing of graphite disc (5) of upper substrate (1) one side, multiunit swing arm centering component (20) supply graphite disc (5) circumference department butt and transportation to use, clean subassembly (40) and supply graphite disc (5) to clean and use.
2. The cleaning device for graphite discs in the semiconductor industry according to claim 1, wherein the swing arm centering assembly (20) comprises a swing arm driving part (21), a swing arm rotation driven part (22), a swing arm part (23), a sensor connecting piece (24) and an in-place sensor (25), the swing arm driving part (21) is arranged on one side of the upper substrate (1) and drives a plurality of groups of swing arm parts (23) to rotate through the swing arm rotation driven part (22), and the sensor connecting piece (24) and the in-place sensor (25) are used for in-place detection of the graphite discs (5).
3. The cleaning device for the graphite disc in the semiconductor industry according to claim 2, wherein the swing arm driving part (21) comprises a swing arm rotation driving motor (211), a synchronizing wheel (212), a first synchronizing belt (213) and a first swing arm wheel (214), the swing arm rotation driving motor (211) is fixedly arranged on one side of the upper substrate (1), the output end of the swing arm rotation driving motor (211) is fixedly connected with the synchronizing wheel (212), the first swing arm wheel (214) is in transmission connection with the swing arm rotation driven part (22), and the synchronizing wheel (212) is in transmission connection with the first swing arm wheel (214) through the first synchronizing belt (213).
4. A cleaning device for a graphite disc in the semiconductor industry according to claim 3, characterized in that the swing arm rotation driven part (22) comprises a first rotating rod (221), a second rotating rod (222), a third rotating rod (223), a second swing arm wheel (224), a third swing arm wheel (225), a fourth swing arm wheel (226) and a second synchronous belt (227), one end of the first rotating rod (221) passes through the second swing arm wheel (224) and then is fixedly connected with the first swing arm wheel (214), the other end of the first rotating rod (221) is fixedly connected with the first swing arm (231), the second swing arm wheel (224), the third swing arm wheel (225) and the fourth swing arm wheel (226) are distributed on one side of the upper substrate (1) in an annular array mode, one end of the second rotating rod (222) is fixedly connected with the third swing arm wheel (225), one end of the third rotating rod (223) is fixedly connected with the fourth swing arm wheel (226), the other end of the third swing arm wheel (225) or the fourth swing arm wheel (226) is fixedly connected with the first swing arm wheel (231) respectively, and the second swing arm wheel (225) and the third swing arm wheel (226) are arranged around the outer side of the second swing arm wheel (226).
5. The cleaning device for the graphite disc in the semiconductor industry according to claim 4, wherein the swing arm part (23) comprises a first swing arm (231) and a silica gel bearing (232), one end of the first swing arm (231) far away from the second swing arm wheel (224), the third swing arm wheel (225) or the fourth swing arm wheel (226) is rotationally connected with the silica gel bearing (232), the silica gel bearing (232) is movably connected with the graphite disc (5), and the contact surface of each synchronous belt and the swing arm wheel is roughened.
6. The cleaning device for graphite discs in the semiconductor industry as claimed in claim 5, wherein the sensor connector (24) is fixedly installed on one side of the upper substrate (1), and the in-place sensor (25) is electrically connected with the sensor connector (24).
7. The cleaning device for graphite discs in the semiconductor industry according to claim 6, wherein the rotating assembly (30) comprises a disc rotating driving motor (301), a rotating flange (302) and a supporting column (303), the disc rotating driving motor (301) is fixedly installed on one side of the upper substrate (1), the output end is fixedly connected with the rotating flange (302), one side of the supporting column (303) is fixedly connected with the rotating flange (302), and the other side of the supporting column (303) is movably connected with the graphite disc (5).
8. The cleaning device for the graphite disc in the semiconductor industry according to claim 7, wherein the cleaning component (40) comprises a cantilever rotary driving motor (41), a cleaning cantilever (42) and a vacuum generator (43), the cantilever rotary driving motor (41) is fixedly arranged on one side of the upper substrate (1), the cleaning cantilever (42) is suspended above the graphite disc (5), the cleaning cantilever (42) is in transmission connection with the output end of the cantilever rotary driving motor (41), and the vacuum generator (43) is fixedly arranged on one side of the upper substrate (1) and the output end of the vacuum generator is communicated with the cleaning cantilever (42).
9. The cleaning device for a graphite disc in the semiconductor industry according to claim 8, wherein the cleaning cantilever (42) comprises a supporting rod hoop (421), a cantilever supporting rod (422), a first cantilever (423) and a quick connector (424), one end of the supporting rod hoop (421) is fixedly connected with the output end of the cantilever rotary driving motor (41), the other end of the supporting rod hoop (421) is fixedly connected with the cantilever supporting rod (422), the quick connector (424) is fixedly installed inside the cantilever supporting rod (422), the quick connector (424) is communicated with the output end of the vacuum generator (43), and cleaning dense holes (425) are formed in the first cantilever (423).
10. The cleaning device for graphite discs in the semiconductor industry as claimed in claim 9, further comprising a vision device (6), wherein the vision device (6) is arranged on one side of the graphite disc (5) and is used for monitoring the graphite disc (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411973841.0A CN119392208A (en) | 2024-12-30 | 2024-12-30 | Cleaning device for graphite disc in semiconductor industry |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411973841.0A CN119392208A (en) | 2024-12-30 | 2024-12-30 | Cleaning device for graphite disc in semiconductor industry |
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| Publication Number | Publication Date |
|---|---|
| CN119392208A true CN119392208A (en) | 2025-02-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202411973841.0A Pending CN119392208A (en) | 2024-12-30 | 2024-12-30 | Cleaning device for graphite disc in semiconductor industry |
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| CN (1) | CN119392208A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08330217A (en) * | 1995-06-02 | 1996-12-13 | Nikon Corp | Cleaning device |
| TW200507979A (en) * | 2003-08-07 | 2005-03-01 | Ebara Corp | Substrate processing apparatus, substrate processing method, and substrate holding apparatus |
| CN102728580A (en) * | 2011-03-31 | 2012-10-17 | 东京毅力科创株式会社 | Substrate cleaning apparatus and vacuum processing system |
| JP2013171918A (en) * | 2012-02-20 | 2013-09-02 | Toshiba Corp | Substrate rotating/holding device and substrate processing device |
| TWM611157U (en) * | 2020-10-30 | 2021-05-01 | 天虹科技股份有限公司 | Wafer fixing mechanism and wafer pre-cleaning machine using the same |
| CN114369811A (en) * | 2021-08-16 | 2022-04-19 | 芜湖启迪半导体有限公司 | MOCVD reaction chamber cleaning device and cleaning method |
-
2024
- 2024-12-30 CN CN202411973841.0A patent/CN119392208A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08330217A (en) * | 1995-06-02 | 1996-12-13 | Nikon Corp | Cleaning device |
| TW200507979A (en) * | 2003-08-07 | 2005-03-01 | Ebara Corp | Substrate processing apparatus, substrate processing method, and substrate holding apparatus |
| CN102728580A (en) * | 2011-03-31 | 2012-10-17 | 东京毅力科创株式会社 | Substrate cleaning apparatus and vacuum processing system |
| JP2013171918A (en) * | 2012-02-20 | 2013-09-02 | Toshiba Corp | Substrate rotating/holding device and substrate processing device |
| TWM611157U (en) * | 2020-10-30 | 2021-05-01 | 天虹科技股份有限公司 | Wafer fixing mechanism and wafer pre-cleaning machine using the same |
| CN114369811A (en) * | 2021-08-16 | 2022-04-19 | 芜湖启迪半导体有限公司 | MOCVD reaction chamber cleaning device and cleaning method |
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