CN119330689A - 一种基于CuAlO2相氧化铝基导电陶瓷的制备方法 - Google Patents
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法 Download PDFInfo
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- 239000000919 ceramic Substances 0.000 title claims abstract description 111
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 title abstract description 19
- 238000002360 preparation method Methods 0.000 title abstract description 19
- 229910018572 CuAlO2 Inorganic materials 0.000 title abstract 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 99
- 238000005245 sintering Methods 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000000203 mixture Substances 0.000 claims abstract description 20
- 238000002156 mixing Methods 0.000 claims abstract description 15
- 238000003825 pressing Methods 0.000 claims abstract description 11
- 238000000498 ball milling Methods 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims description 11
- 239000006258 conductive agent Substances 0.000 claims description 10
- 238000000227 grinding Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 238000005303 weighing Methods 0.000 claims description 10
- 239000004927 clay Substances 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 238000005266 casting Methods 0.000 claims description 2
- 238000000462 isostatic pressing Methods 0.000 claims description 2
- 238000003801 milling Methods 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims description 2
- 238000005096 rolling process Methods 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 25
- 238000010438 heat treatment Methods 0.000 abstract description 23
- QPLDLSVMHZLSFG-UHFFFAOYSA-N CuO Inorganic materials [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 abstract description 19
- 239000000377 silicon dioxide Substances 0.000 abstract description 9
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 7
- 238000005485 electric heating Methods 0.000 abstract description 5
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 238000005265 energy consumption Methods 0.000 abstract description 4
- 239000012212 insulator Substances 0.000 abstract description 3
- 239000011224 oxide ceramic Substances 0.000 abstract 3
- 229910052574 oxide ceramic Inorganic materials 0.000 abstract 3
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 238000002441 X-ray diffraction Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 239000005751 Copper oxide Substances 0.000 description 8
- 229910000431 copper oxide Inorganic materials 0.000 description 8
- 239000004570 mortar (masonry) Substances 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- 150000004645 aluminates Chemical class 0.000 description 6
- 238000001878 scanning electron micrograph Methods 0.000 description 5
- -1 fe 2O3 Chemical compound 0.000 description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000010344 co-firing Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000002354 daily effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 238000009766 low-temperature sintering Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910021343 molybdenum disilicide Inorganic materials 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Abstract
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,属于纳米导电陶瓷制备技术领域。本发明涉及一种通过在氧化铝陶瓷中增加半导体成分CuAlO2相,并通过工艺使其沿氧化铝晶界连续分布而形成导电通路,使氧化铝陶瓷从绝缘体转变为导新型电发热体的方法,该方法是将CuO、SiO2、Al2O3等,按照一定比例混合球磨,压片烧结之后形成新型的氧化铝电发热体。本方法能够大幅度降低氧化铝陶瓷的烧结温度,无需复杂的工艺和设备,因此这种新型氧化铝导电发热陶瓷能耗低、工艺简单、设备要求低、产品性能优良、新型发热体的价格可望大幅度降低。
Description
技术领域
本发明属于纳米导电陶瓷制备技术领域,具体涉及一种基于CuAlO2相氧化铝基导电陶瓷的制备方法。
背景技术
电热材料和相关器件为人们提供了方便、简洁的生活,已经深入到现代社会的方方面面。对其研究与开发就从未止步。依据主要发热与传热的方式,可以把电热材料分为高温发热体和低温发热体。高温发热体主要以辐射传热为主、对流与热传导为辅,诸如工业窑炉等应用,主要材料有碳化硅、二硅化钼、电热金属丝等等。而民用方面,基于安全的考虑,如不能有明火、不能在日常生活中引起火灾等等,越来越倾向于低温发热材料和器件,而主要的传到发生则为热传导和对流传热。这里边有包括膜发热体和块体发热体。主流的材料有以BaTiO3为基的PTCR陶瓷发热体,导电金属或炭质材料与高分子混合的复合材料发热体等等。
PTCR陶瓷发热体的优点有相对电阻丝加热器,要省电,而且热量比较稳定。其技术成熟,结构简单,布置灵活,安装方便。然而钛酸钡基材料的导热系数较低,要将热量传出了必须采用强对流传热,因而造成散热片结构复杂、必须要有强风系统,工作时不可避免引起噪声,在对生活带来方便的同时引入噪声的烦恼。
近些年市场上开发出一种所谓的氧化铝陶瓷发热体MCH(Metal CeramicHeater),是以高热导率氧化铝瓷为基体,耐热难熔金属作为内电极形成发热电路,通过一系列特殊工艺在1600℃高温下共烧而成的一种高新高热节能的发热体。可广泛应用于日常生活方方面面的加热器件。这种发热体并不是氧化铝发热,而是氧化铝中间的金属W或Mo发热,具有耐腐蚀、耐高温、寿命长、高效节能、温度均匀、导热性能良好、热补偿速度快等优点,MCH陶瓷发热体是一种新型高效环保节能陶瓷发热元件,相比PTC陶瓷发热体,具有相同加热效果情况下节约20~30%电能。然而,这种发热体需要金属与氧化铝高温共烧,制备工艺复杂,制备过程能耗高,使成本大幅度上升。
Al2O3陶瓷优良的耐高温、高机械强度、高绝缘性和高导热性而作为导热基板的主流材料之一,我们曾经发现在黑色氧化铝陶瓷的制备过程中,某些掺杂剂易于使氧化铝绝缘性丧失,基于这个方向,通过工艺调整,使其导电性能进一步增加,从而形成氧化铝导电陶瓷。通过研究表明这种氧化铝的导电来源于氧化铝陶瓷晶界的半导体导电相,这就为氧化铝陶瓷发热体的进一步开发和研究提供了新的方向。这种材料作为发热体既具有氧化铝的高导热性和高强度,又可以直接通电发热,一举两得,从而形成真正的新型氧化铝陶瓷发热体。本发明可以大幅度降低氧化铝的烧结温度,从原来的1600℃降低到1300℃以下。没有复杂的工艺,无需昂贵的原料,因此这种新型氧化铝导电发热陶瓷能耗低、工艺简单、设备要求低、产品性能优良、新型发热体的价格可望大幅度降低。
发明内容
针对现有技术的不足,本发明提供一种以CuAlO2为导电相的氧化铝基导电陶瓷的制备方法,通过在氧化铝陶瓷中增加半导体成分CuAlO2相,并使其沿氧化铝晶界连续分布而形成导电通路,使氧化铝陶瓷从绝缘体转变为导电发热体,具体是将导电剂、助烧剂和氧化铝粉末按照一定比例配料、混合球磨并成型后,压片烧结形成氧化铝电发热体。
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取导电剂、助烧剂和氧化铝,按照比例进行配料并混合均匀,得到混合料;
(2)将混合料采用一定的方法成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中进行烧结,随后保温,得到氧化铝基导电陶瓷。
其中:
所述步骤(1)中,导电剂为过渡元素氧化物,选自CuO、Fe2O3、ZnO、MnO2、NiO中的一种或多种,按照质量分数计,导电剂的用量为氧化铝的10%~70%;选用多种导电剂时,多种物质之间的比例为:CuO 10~60%、Fe2O3 0~5%、ZnO 0~20%、MnO2 0~10%、NiO 0~15%。
所述步骤(1)中,助烧剂选自SiO2、粘土的一种或多种,按照质量分数计,助烧剂的用量为氧化铝的0~20%,选用多种助烧剂时,SiO2加入量为0~10%,粘土加入量为0~10%。
所述步骤(1)中,混合的方式为球磨、研磨或震磨。
所述步骤(2)中,成型方式为干压、流延、扎膜或等静压。
所述步骤(3)中,烧结温度为1000~1500℃,保温时间为10~300min。
所述步骤(3)中,制得氧化铝基导电陶瓷的电阻率为0.1~0.8MΩ·cm。
与现有技术相比,本发明的有益效果为:
1.本方法不仅可以实现低温烧结氧化铝陶瓷,一般使氧化铝陶瓷的烧结温度从1600℃,降低到1000~1500℃。
2.氧化铝通常为典型的绝缘体,通过本方法能够使烧结后的氧化铝陶瓷实现从绝缘体向导电体转变。
3.本方法避免了复杂的气氛烧结,仅在空气中烧结完成,就可以实现陶瓷半导化。
4.本方法操作简单,无需复杂的工艺和设备,原料成本及制备所需的能耗低,采用简单的常压成型方法即可制备出方便烧结的陶瓷片,所制得导电发热陶瓷产品性能优良,价格可望大幅度降低。
附图说明
图1本发明实施例1、2、3、4中制得氧化铝基导电陶瓷的XRD图;
图2本发明实施例1中制得氧化铝基导电陶瓷的SEM图;
图3本发明实施例4中制得氧化铝基导电陶瓷的SEM图;
图4本发明实施例5中制得氧化铝基导电陶瓷的XRD图;
图5本发明实施例6中制得氧化铝基导电陶瓷的XRD图;
图6本发明实施例6中制得氧化铝基导电陶瓷的SEM图;
图7本发明实施例7中制得氧化铝基导电陶瓷的XRD图;
图8本发明实施例7中制得氧化铝基导电陶瓷的SEM图;
图9本发明实施例8中制得氧化铝基导电陶瓷的XRD图;
图10本发明实施例8中制得氧化铝基导电陶瓷的SEM图。
具体实施方式
下面结合实施例对该发明做进一步说明:
本发明中采用导电剂为在氧化铝烧结过程形成导电相的物质,如CuAlO2;助烧剂为能够使氧化铝烧结温度降低的原料,如SiO2、粘土。
实施例1
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.5g超细二氧化硅粉末、3g氧化铜粉末和6.5g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1300℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.4MΩ·cm,其XRD图如图1所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸亚铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图如图2所示,从图中可以看出,陶瓷气孔少,颗粒均匀,致密度好。
实施例2
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.5g超细二氧化硅粉末、3.5g氧化铜粉末和6g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1300℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.4MΩ·cm,其XRD图如图1所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸亚铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图与图2相似,所得陶瓷气孔少,颗粒均匀,致密度好。
实施例3
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.5g超细二氧化硅粉末、3.7g氧化铜粉末和5.8g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1300℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.3MΩ·cm,其XRD图如图1所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸亚铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图与图2相似,所得陶瓷气孔少,颗粒均匀,致密度好。
实施例4
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.5g粘土、3.5g氧化铜粉末和6g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1300℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.2MΩ·cm,其XRD图如图1所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸亚铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图如图3所示,从图中可以看出,陶瓷气孔少,颗粒均匀,致密度好。
实施例5
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.5g超细二氧化硅粉末、3.5g氧化铜粉末和6g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1500℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.3MΩ·cm,其XRD图如图4所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸亚铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图与图2相似,所得陶瓷气孔少,颗粒均匀,致密度好。
实施例6
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.5g超细二氧化硅粉末、0.5g粘土、3g氧化铜粉末和6g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1300℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.4MΩ·cm,其XRD图如图5所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图如图6所示,从图中可以看出,陶瓷气孔少,颗粒均匀,致密度好,而且可以看出具有层状结构的铝酸亚铜,主要分布在晶界附近,使氧化铝颗粒彼此之间相互连通,进而实现氧化铝陶瓷的半导化。
实施例7
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.3g超细二氧化硅粉末、0.2g粘土、3.5g氧化铜粉末和6g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1300℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.7MΩ·cm,其XRD图如图7所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图如图8所示,从图中可以看出,陶瓷气孔少,颗粒均匀,致密度好。
实施例8
一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,具体包括以下步骤:
(1)称取0.5g超细二氧化硅粉末、0.5g粘土、3.5g氧化铜粉末和5.5g氧化铝粉末,研磨约30min,使研钵中物质混合均匀,得到混合料;
(2)将混合料在1Mpa下干压成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中1300℃下烧结,随后保温120min,得到氧化铝基导电陶瓷。
本实施例中所制得氧化铝基导电陶瓷的电阻率为0.4MΩ·cm,其XRD图如图9所示,该温度下烧结陶瓷的主要相为氧化铝、铝酸铜和少量的氧化铜以及二氧化硅相;氧化铝基导电陶瓷的SEM图如图10所示,从图中可以看出,陶瓷气孔少,颗粒均匀,致密度好。
Claims (7)
1.一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,其特征在于,具体包括以下步骤:
(1)称取导电剂、助烧剂和氧化铝,按照比例进行配料并混合均匀,得到混合料;
(2)将混合料采用一定的方法成型,得到陶瓷生坯;
(3)将陶瓷生坯在空气中进行烧结,随后保温,得到氧化铝基导电陶瓷。
2.根据权利要求1所述的一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,其特征在于,所述步骤(1)中,导电剂为过渡元素氧化物,选自CuO、Fe2O3、ZnO、MnO2、NiO中的一种或多种,按照质量分数计,导电剂的用量为氧化铝的10%~70%;选用多种导电剂时,多种物质之间的比例为:CuO 10~60%、Fe2O3 0~5%、ZnO 0~20%、MnO2 0~10%、NiO 0~15%。
3.根据权利要求1所述的一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,其特征在于,所述步骤(1)中,助烧剂选自SiO2、粘土的一种或多种,按照质量分数计,助烧剂的用量为氧化铝的0~20%,选用多种助烧剂时,SiO2加入量为0~10%,粘土加入量为0~10%。
4.根据权利要求1所述的一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,其特征在于,所述步骤(1)中,混合的方式为球磨、研磨或震磨。
5.根据权利要求1所述的一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,其特征在于,所述步骤(2)中,成型方式为干压、流延、扎膜或等静压。
6.根据权利要求1所述的一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,其特征在于,所述步骤(3)中,烧结温度为1000~1500℃,保温时间为10~300min。
7.根据权利要求1所述的一种基于CuAlO2相氧化铝基导电陶瓷的制备方法,其特征在于,所述步骤(3)中,制得氧化铝基导电陶瓷的电阻率为0.1~0.8MΩ·cm。
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