CN119164989B - Scanning electron microscope sample stage - Google Patents
Scanning electron microscope sample stage Download PDFInfo
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- CN119164989B CN119164989B CN202411669274.XA CN202411669274A CN119164989B CN 119164989 B CN119164989 B CN 119164989B CN 202411669274 A CN202411669274 A CN 202411669274A CN 119164989 B CN119164989 B CN 119164989B
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- 230000002093 peripheral effect Effects 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 abstract description 12
- 238000010586 diagram Methods 0.000 description 10
- 230000009286 beneficial effect Effects 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2204—Specimen supports therefor; Sample conveying means therefore
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20292—Means for position and/or orientation registration
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- General Health & Medical Sciences (AREA)
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- Analysing Materials By The Use Of Radiation (AREA)
Abstract
本发明涉及扫描电镜技术领域，公开了一种扫描电镜样品台，包括：待测样品位于R轴组件上，R轴组件带动待测样品在水平面旋转；R轴组件设置于X轴组件上，X轴组件带动R轴组件沿X轴移动；X轴组件设置于Y轴组件上，Y轴组件带动X轴组件沿Y轴移动；Y轴组件设置于T轴组件上，T轴组件带动Y轴组件绕T轴旋转；T轴与待测样品表面扫描位置位于同一直线；T轴组件设置于Z轴组件上，Z轴带动T轴组件沿Z轴移动。本申请将T轴组件设置于Z轴组件上，避免由于Z轴组件升降，在T轴组件旋转时，原处于视野中心的待测样品表面扫描位置失焦，导致重新调整电子束方向或重新调整五轴自动样品台，严重占用扫描时间。
The present invention relates to the technical field of scanning electron microscopes, and discloses a scanning electron microscope sample stage, comprising: a sample to be tested is located on an R-axis assembly, and the R-axis assembly drives the sample to be tested to rotate in a horizontal plane; the R-axis assembly is arranged on an X-axis assembly, and the X-axis assembly drives the R-axis assembly to move along the X-axis; the X-axis assembly is arranged on a Y-axis assembly, and the Y-axis assembly drives the X-axis assembly to move along the Y-axis; the Y-axis assembly is arranged on a T-axis assembly, and the T-axis assembly drives the Y-axis assembly to rotate around the T-axis; the T-axis and the surface scanning position of the sample to be tested are located in the same straight line; the T-axis assembly is arranged on a Z-axis assembly, and the Z-axis drives the T-axis assembly to move along the Z-axis. In the present application, the T-axis assembly is arranged on the Z-axis assembly to avoid the surface scanning position of the sample to be tested originally in the center of the field of view being out of focus due to the lifting and lowering of the Z-axis assembly when the T-axis assembly rotates, resulting in readjustment of the electron beam direction or readjustment of the five-axis automatic sample stage, which seriously occupies the scanning time.
Description
Technical Field
The invention relates to the technical field of scanning electron microscope, in particular to a scanning electron microscope sample stage.
Background
With the rapid development of science and technology, a scanning electron microscope is called a scanning electron microscope for short, and is used as a high-precision and high-resolution microscopic observation tool to play an irreplaceable role in various fields such as material science, biomedicine, semiconductor manufacturing, geological exploration and the like. The scanning electron microscope can generate high-quality images for microstructure analysis and component detection by carrying out electron beam scanning on the surface of the sample. In practical application of the scanning electron microscope, the effect of sample observation is affected by various factors. The stability and flexibility of the sample platform, which is used as a key component for bearing and adjusting the sample, directly determine the accuracy, stability and reliability of the observed result.
The existing sample stage can generally adopt a five-axis automatic sample stage to realize the bearing and adjustment of samples. The five-axis automatic sample stage is driven by a motor generally, and the conventional operations of automatic translation, tilting, rotation, lifting or lowering of the sample stage can be realized by clicking a mouse or inputting coordinates in the software by utilizing software matched with the five-axis automatic sample stage. As shown in fig. 1 and 2, a schematic diagram of an arrangement of five-axis automatic sample stages is shown. The sample 1 to be measured is located on the R-axis assembly 2, and the R-axis assembly 2 is suitable for driving the sample 1 to be measured to rotate in a horizontal plane. The R-axis assembly 2 is positioned on the X-axis assembly 3, and the X-axis assembly 3 is suitable for driving the R-axis assembly 2 to move along the X-axis in a horizontal plane. The X-axis assembly 3 is positioned on a Y-axis assembly 4, and the Y-axis assembly 4 is suitable for driving the X-axis assembly 3 to move along the Y-axis in a horizontal plane. The X axis and the Y axis are mutually perpendicular. The Y-axis assembly 4 is arranged on the Z-axis assembly 5, and the Z-axis assembly 5 is suitable for driving the Y-axis assembly 4 to move up and down along the Z-axis. The Z axis is perpendicular to the X axis and the Y axis. The Z-axis assembly 5 is arranged on a T-axis assembly 6, and the T-axis assembly 6 is suitable for driving the Z-axis assembly 5 to rotate around the T-axis. The T axis is perpendicular to the Z axis. In fig. 1 and 2, the vertically downward arrow indicates the direction of the electron beam scanning the surface of the sample 1 to be measured, the dotted line indicates the T-axis, i.e., the rotation center line of the T-axis assembly 6, and the curved arrow indicates the direction in which the T-axis assembly 6 rotates about the T-axis. In fig. 1, the scanning position of the surface of the sample 1 to be measured is in the same straight line, the electron beam is downward and is opposite to the scanning position of the surface of the sample 1 to be measured, the scanning position of the surface of the sample 1 to be measured is located at the center of the field of view, and at this time, when the T-axis assembly rotates, the sample 1 to be measured rotates around the same axis, and the scanning position is unchanged. However, as the Z-axis assembly 5 moves up and down, the scanning position of the surface of the sample 1 to be measured changes, and the T-axis and the scanning position are not in the same straight line. As shown in fig. 2, when the Z-axis assembly 5 is lifted, the scanning position of the surface of the sample 1 to be measured is higher than the T-axis, and at this time, when the T-axis assembly 6 is rotated, the sample 1 to be measured is also rotated around the T-axis, and the scanning position of the surface of the sample 1 to be measured is deviated from the direction of the electron beam due to the unchanged direction of the electron beam. The scanning position of the surface of the sample 1 to be measured, which is originally positioned in the center of the visual field, is defocused and blurred, so that the scanning position of the surface of the sample 1 to be measured needs to be focused by readjusting the direction of the electron beam or the scanning position of the surface of the sample 1 to be measured needs to be focused by readjusting the five-axis automatic sample stage, the scanning observation time is seriously occupied, the scanning observation efficiency is reduced, and great inconvenience is caused to the scanning observation of a user.
Disclosure of Invention
In view of this, the present invention provides a scanning electron microscope sample stage to solve the problem that after the existing five-axis automatic sample stage moves up and down on the Z-axis assembly, the scanning position of the surface of the sample to be measured is not in the same straight line, and when the T-axis assembly rotates, the sample to be measured also rotates around the T-axis, and because the direction of the electron beam is unchanged, the scanning position of the surface of the sample to be measured deviates from the direction of the electron beam. The scanning position of the surface of the sample to be measured, which is originally positioned in the center of the visual field, is defocused and blurred, so that the scanning position of the surface of the sample to be measured needs to be readjusted in the direction of the electron beam or the scanning position of the surface of the sample to be measured needs to be readjusted by the five-axis automatic sample stage, the scanning observation time is seriously occupied, and the scanning observation efficiency is reduced and great inconvenience is caused to the scanning observation of a user.
The invention provides a scanning electron microscope sample stage, which comprises:
The R-axis assembly is suitable for driving the sample to be tested to rotate in a horizontal plane;
the X-axis assembly is arranged on the X-axis assembly and is suitable for driving the R-axis assembly to move along the X-axis in a horizontal plane;
the X-axis component is arranged on the Y-axis component and is suitable for driving the X-axis component to move along the Y-axis in a horizontal plane, and the X-axis and the Y-axis are mutually perpendicular;
The Y-axis assembly is arranged on the T-axis assembly and is suitable for driving the Y-axis assembly to rotate around the T-axis, and the T-axis and the scanning position of the surface of the sample to be detected are positioned on the same straight line;
The Z-axis assembly is arranged on the Z-axis assembly, the Z-axis assembly is suitable for driving the T-axis assembly to move up and down along the Z-axis, the Z-axis is perpendicular to the X-axis and the Y-axis, and the T-axis is perpendicular to the Z-axis. The application has the beneficial effects that by adopting the technical scheme, the existing five-axis automatic sample stage is improved, the T-axis assembly is arranged on the Z-axis assembly, and the phenomenon that the scanning positions of the T-axis and the surface of the sample to be detected are deviated in the height direction due to the lifting of the Z-axis assembly is avoided, so that when the T-axis assembly rotates, the scanning positions of the surface of the sample to be detected, which is originally positioned in the center of a visual field, are defocused and become fuzzy, the scanning positions of the surface of the sample to be detected need to be focused by readjusting the direction of an electron beam or the scanning positions of the surface of the sample to be detected need to be focused by readjusting the five-axis automatic sample stage, the scanning observation time is seriously occupied, and the scanning observation efficiency is reduced and great inconvenience is caused to the scanning observation of a user. The technical scheme of the application ensures the accuracy and stability of scanning electron microscope observation.
Optionally, the method further comprises:
The Z-axis assembly, the T-axis assembly, the X-axis assembly, the Y-axis assembly and the R-axis assembly are all positioned in the accommodating bin. The application has the beneficial effects that by adopting the technical scheme, the X-axis assembly, the Y-axis assembly, the Z-axis assembly, the R-axis assembly and the T-axis assembly are protected by arranging the accommodating bin, and meanwhile, the accommodating bin is conveniently arranged in a vacuum environment.
Optionally, the method further comprises:
The bearing assembly is arranged on the R-axis assembly, the sample to be detected is positioned on the bearing assembly, and the bearing assembly is suitable for adjusting the height of the sample to be detected, so that the scanning positions of the T-axis and the surface of the sample to be detected are positioned on the same horizontal plane. The application has the beneficial effects that by adopting the technical scheme, the height-adjustable bearing assembly is convenient to adjust the scanning position of the surface of the sample to be measured and the T-axis to be positioned on the same horizontal plane, so that the scanning position of the surface of the sample to be measured, which is originally positioned in the center of the visual field, is not defocused and blurred when the T-axis assembly rotates in cooperation with the rotation of the T-axis assembly. According to the application, the flexibility of height adjustment of the sample to be measured is improved through the bearing component, the height of the sample to be measured is not limited, and the scanning position of the surface of the sample to be measured and the T-axis can be ensured to be coplanar after the height of the sample to be measured is easily adjusted.
Optionally, the X-axis component and/or the Y-axis component are/is adjusted to move so that the T-axis and the scanning position of the surface of the sample to be measured are located on the same straight line.
Optionally, the carrier assembly includes:
The device comprises a fixed seat, a plurality of sample cups, a plurality of fixing holes and a plurality of fixing holes, wherein the plurality of fixing holes are formed in the top surface of the fixed seat and close to the edge of the fixed seat so as to respectively install the plurality of sample cups, and a sample to be tested is positioned on one sample cup;
The top end of the screw rod is fixedly connected with the bottom surface of the fixing seat, the screw rod is in threaded connection with the R-axis assembly, and the bearing assembly is suitable for driving the sample to be tested to ascend or descend when the fixing seat and the screw rod are rotated. The application has the beneficial effects that by adopting the technical scheme, the simultaneous observation of the samples to be measured is not understood by arranging the plurality of sample cups, and the scanning observation efficiency is improved.
Optionally, the carrier assembly further comprises:
The limiting piece is sleeved on part of the thread length of the screw rod and is positioned between the fixed seat and the R shaft assembly, and the limiting piece is in a first state for limiting the rotation of the fixed seat and the screw rod when screwed to be abutted with the top surface of the R shaft assembly and in a second state for enabling the fixed seat and the screw rod to rotate when unscrewed to be in a gap with the top surface of the R shaft assembly. The application has the beneficial effects that by adopting the technical scheme, the height positions of the fixing seat and the screw rod can be stabilized in the first state and can be conveniently adjusted in the second state through the limiting piece, and the operation is simple and the stability is high.
Optionally, a plane along the height direction is arranged on the periphery of the screw, and a score line for identifying the height is arranged on the plane. The application has the beneficial effects that by adopting the technical scheme, the height of the fixing seat can be conveniently and accurately adjusted by arranging the score lines.
Alternatively, the pitch of adjacent score lines represents a height difference of 1 millimeter.
Optionally, the bearing assembly further comprises a plurality of jackscrews, a plurality of threaded holes which are correspondingly communicated with the plurality of mounting holes are formed in the peripheral wall of the fixing seat respectively, the jackscrews are arranged in the plurality of threaded holes respectively, and the jackscrews are suitable for fixing a plurality of sample cups respectively.
Optionally, the fixing seat and the screw are integrally manufactured.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are needed in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the present invention, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a five-axis automated sample stage arrangement in the prior art;
FIG. 2 is a schematic diagram II of a five-axis automated sample stage arrangement in the prior art;
FIG. 3 is a schematic diagram of an arrangement of a sample stage of a scanning electron microscope according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a partial perspective view of a sample stage of a scanning electron microscope according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of a partial front view of a sample stage of a scanning electron microscope according to an embodiment of the present invention;
FIG. 6 is a right side view of the schematic diagram of FIG. 5;
FIG. 7 is a schematic cross-sectional view of a load bearing assembly provided in an embodiment of the present invention;
FIG. 8 is a schematic view of a partial perspective view of a carrier assembly according to an embodiment of the present invention;
FIG. 9 is a schematic partial front view of a carrier assembly according to an embodiment of the present invention;
FIG. 10 is a schematic diagram showing a partial perspective view of a sample stage of a scanning electron microscope according to the embodiment of the present invention;
FIG. 11 is a schematic diagram of a partial top view of a scanning electron microscope sample stage according to an embodiment of the present invention;
FIG. 12 is a schematic diagram of a second cross-sectional configuration of a load bearing assembly according to an embodiment of the present invention;
fig. 13 is a schematic front view of a carrier assembly according to an embodiment of the present invention.
Reference numerals illustrate:
1. the device comprises a sample to be tested, a2, R-axis component, a3, X-axis component, a 4, Y-axis component, a 5, Z-axis component, a 6, T-axis component, a 7, a first half accommodating bin, a 8, a bearing component, a 9, a fixing seat, a 10, a screw, a 11, a limiting piece, a 12, a score line, a 13, a cantilever, a 14, an R-axis turbine, a 15, a mounting hole, a 16 and a threaded hole.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The existing bearing assembly for bearing the sample to be tested generally adopts a fixed height, and can meet the basic placing requirement of the sample to be tested, but when analyzing the sample to be tested with special shapes with different heights, the heights of the five-axis automatic sample stage are often required to be replaced or readjusted for multiple times, so that the sample replacing time is increased or the observation analysis efficiency is reduced. Also for the reasons stated above, the present application proposes an improved scanning electron microscope sample stage.
One embodiment of a scanning electron microscope sample stage as shown in fig. 3 to 13 comprises an R-axis assembly 2, an X-axis assembly 3, a Y-axis assembly 4, a T-axis assembly 6, a Z-axis assembly 5, a receiving bin and a carrying assembly 8. The scanning electron microscope sample stage is used for scanning a sample 1 to be detected by a scanning electron microscope.
As shown in fig. 3, 5 and 6, the sample 1 to be measured may be located on the R-axis assembly 2, and the R-axis assembly 2 is adapted to drive the sample 1 to be measured to rotate in a horizontal plane. The R-axis assembly 2 is arranged on the X-axis assembly 3, and the X-axis assembly 3 is suitable for driving the R-axis assembly 2 to move along the X-axis in a horizontal plane. The X-axis assembly 3 is arranged on the Y-axis assembly 4, the Y-axis assembly 4 is suitable for driving the X-axis assembly 3 to move along the Y-axis in a horizontal plane, and the X-axis and the Y-axis are mutually perpendicular. The Y-axis assembly 4 is disposed on the T-axis assembly 6, and the T-axis assembly 6 is adapted to drive the Y-axis assembly 4 to rotate around the T-axis, specifically, as shown in fig. 5, the T-axis assembly 6 is provided with a cantilever 13, and the T-axis assembly 6 drives the Y-axis assembly 4 to rotate around the T-axis through the cantilever 13. And the T axis and the scanning position of the surface of the sample 1 to be detected are positioned on the same straight line. The T-axis assembly 6 is arranged on the Z-axis assembly 5, the Z-axis assembly 5 is suitable for driving the T-axis assembly 6 to move up and down along the Z-axis, the Z-axis is perpendicular to the X-axis and the Y-axis, and the T-axis is perpendicular to the Z-axis. In fig. 3, 5 and 6, the vertical downward arrow indicates the direction of the electron beam scanning the surface of the sample 1 to be measured, the dotted line indicates the T-axis, i.e., the rotation center line of the T-axis assembly 6, and the curved arrow indicates the direction in which the T-axis assembly 6 rotates around the T-axis.
As shown in fig. 4, the accommodating bin consists of a first half accommodating bin 7 and a second half accommodating bin which are suitable for being mutually and hermetically buckled, and the Z-axis assembly 5, the T-axis assembly 6, the X-axis assembly 3, the Y-axis assembly 4, the R-axis assembly 2 and the bearing assembly 8 are all positioned in the accommodating bin. The containment vessel is adapted to maintain a vacuum environment.
As shown in fig. 10 to 13, the bearing assembly 8 is disposed on the R-axis assembly 2, preferably, the sample 1 to be measured is disposed on the bearing assembly 8, and specifically, the bearing assembly 8 is disposed on an R-axis turbine 14 on the R-axis assembly 2. The bearing component 8 is suitable for adjusting the height of the sample 1 to be tested so that the scanning positions of the T-axis and the surface of the sample 1 to be tested are located on the same horizontal plane, and the T-axis is the rotation center of the T-axis component 6. Further, the X-axis component 3 and/or the Y-axis component 4 are/is adjusted to move so that the scanning positions of the T-axis and the surface of the sample 1 to be detected are positioned in the same straight line, and the scanning positions of the surface of the sample 1 to be detected are observation points.
As shown in fig. 7 to 9, 12 and 13, the bearing assembly 8 comprises a fixed seat 9, a screw 10, a limiting piece 11 and a plurality of jackscrews. The top surface of the fixing seat 9 is provided with a plurality of mounting holes 15 near the edge so as to respectively mount a plurality of sample cups, and specifically, the mounting holes 15 are round holes with the diameter of 3.4mm, so that the sample cups can be basically adapted to sample cups of various manufacturers and models. The sample 1 to be tested is positioned on one sample cup, and specifically, seven mounting holes are formed and seven sample cups are respectively mounted. The sample cup comprises a support flat plate positioned at the upper part and a support column positioned at the lower part, wherein the support flat plate is connected with the support column, or the support flat plate and the support column are integrally arranged, and the sample 1 to be measured is positioned on the support flat plate. The top end of the screw rod 10 is fixedly connected with the bottom surface of the fixed seat 9, the screw rod 10 is in threaded connection with the R-axis assembly 2, and specifically, the screw rod 10 is in threaded connection with the R-axis turbine 14 of the R-axis assembly 2. The bearing component 8 is suitable for driving the sample 1 to be tested to rise or fall when the fixing seat 9 and the screw rod 10 are rotated. The limiting piece 11 is in threaded sleeve connection with part of the threaded length of the screw rod 10, the limiting piece 11 is located between the fixed seat 9 and the R shaft assembly 2, the limiting piece 11 is in a first state of limiting rotation of the fixed seat 9 and the screw rod 10 when screwed to be abutted with the top surface of the R shaft assembly 2, and is in a second state of enabling the fixed seat 9 and the screw rod 10 to rotate when unscrewed to be in clearance with the top surface of the R shaft assembly 2. A plurality of threaded holes 16 correspondingly communicated with a plurality of mounting holes 15 are respectively arranged on the peripheral wall of the fixed seat 9, a plurality of jackscrews are respectively arranged in the threaded holes 16, and the jackscrews are respectively suitable for fixing support columns of a plurality of sample cups so as to fix the sample cups. Further, a plane along the height direction is provided on the outer periphery of the screw 10, and a score line 12 for identifying the height is provided on the plane. The pitch of adjacent score lines 12 represents a1 millimeter height difference. The fixing seat 9 and the screw 10 can be integrally manufactured.
The use process of the scanning electron microscope sample stage is briefly described below. Firstly, the limiting piece 11 is adjusted to a second state, the top surface of the adjusting fixing seat 9 is coplanar with the T axis, and then the limiting piece 11 is adjusted to a first state. The horizontal straight line shown in fig. 5 is the top surface of the fixing base 9. After the sample 1 to be measured is placed on the sample cup, the limiting piece 11 is adjusted to a second state according to the scanning position of the sample 1 to be measured, the height of the fixing seat 9 is adjusted, the scanning position of the sample 1 to be measured is coplanar with the T axis, and then the limiting piece 11 is adjusted to a first state. The X-axis assembly 3 and/or the Y-axis assembly 4 are/is adjusted to move so that the T-axis and the scanning position of the surface of the sample 1 to be detected are positioned on the same straight line. The height of the holder 9 can be adjusted in combination with the score line 12.
Although embodiments of the present invention have been described in connection with the accompanying drawings, various modifications and variations may be made by those skilled in the art without departing from the spirit and scope of the invention, and such modifications and variations fall within the scope of the invention as defined by the appended claims.
Claims (5)
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| Application Number | Priority Date | Filing Date | Title |
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| CN202411669274.XA CN119164989B (en) | 2024-11-21 | 2024-11-21 | Scanning electron microscope sample stage |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411669274.XA CN119164989B (en) | 2024-11-21 | 2024-11-21 | Scanning electron microscope sample stage |
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| CN119164989A CN119164989A (en) | 2024-12-20 |
| CN119164989B true CN119164989B (en) | 2025-03-11 |
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| US6403968B1 (en) * | 1998-07-06 | 2002-06-11 | Hitachi, Ltd. | Scanning electron microscope |
| CN211208384U (en) * | 2020-03-16 | 2020-08-07 | 北京城市学院 | Collector for scanning electron microscope sample stage |
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| JP4612706B2 (en) * | 2008-05-01 | 2011-01-12 | タキゲン製造株式会社 | Equipment fixing device |
| JP2010184621A (en) * | 2009-02-13 | 2010-08-26 | Nissan Motor Co Ltd | Battery fixing device and battery changing device |
| CN103700562A (en) * | 2013-12-25 | 2014-04-02 | 苏州新锐合金工具股份有限公司 | Height adjustment type scanning electron microscope sampler holder |
| KR101539738B1 (en) * | 2013-12-27 | 2015-08-06 | 구정회 | Scanning Electron Microscope |
| CN104715990B (en) * | 2015-01-31 | 2017-04-05 | 西安科技大学 | A kind of SEM comprehensive auxiliary imaging system and method |
| CN107490590A (en) * | 2017-07-03 | 2017-12-19 | 中南大学 | A kind of neutron diffraction stress spectrometer sample stage |
| CN108303792A (en) * | 2018-04-04 | 2018-07-20 | 殷跃锋 | It is a kind of can the vertical microscopical method of adjustment of two level adjustment |
| CN213041763U (en) * | 2020-07-03 | 2021-04-23 | 重庆市展未微科技服务有限公司 | Tool for pre-adjusting height of scanning electron microscope sample |
| CN215335289U (en) * | 2021-04-13 | 2021-12-28 | 欧波同科技产业有限公司 | Rotating mechanism for scanning electron microscope |
| CN214624964U (en) * | 2021-04-16 | 2021-11-05 | 天津迈特赛思科技有限公司 | A Scanning Electron Microscope Sample Stage Supporting Multiple Samples Simultaneously |
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| CN220170189U (en) * | 2023-06-28 | 2023-12-12 | 松山湖材料实验室 | Detection of load-bearing devices and step gauges |
| CN220331093U (en) * | 2023-06-30 | 2024-01-12 | 苏州卫生职业技术学院 | Clamping mechanism and angle-adjustable pre-tilting table |
| CN118073158B (en) * | 2024-01-10 | 2024-08-20 | 北京中科科仪股份有限公司 | Vacuum inner detection device and scanning electron microscope |
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| US6403968B1 (en) * | 1998-07-06 | 2002-06-11 | Hitachi, Ltd. | Scanning electron microscope |
| CN211208384U (en) * | 2020-03-16 | 2020-08-07 | 北京城市学院 | Collector for scanning electron microscope sample stage |
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