CN118938612B - High-precision slide assembly and lithography machine workbench - Google Patents
High-precision slide assembly and lithography machine workbench Download PDFInfo
- Publication number
- CN118938612B CN118938612B CN202411427774.2A CN202411427774A CN118938612B CN 118938612 B CN118938612 B CN 118938612B CN 202411427774 A CN202411427774 A CN 202411427774A CN 118938612 B CN118938612 B CN 118938612B
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- CN
- China
- Prior art keywords
- slide
- sliding table
- guide rail
- bearing
- linear guide
- Prior art date
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Links
- 238000001459 lithography Methods 0.000 title 1
- 230000033001 locomotion Effects 0.000 claims description 9
- 238000000206 photolithography Methods 0.000 claims description 3
- 230000003068 static effect Effects 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 8
- 230000008569 process Effects 0.000 abstract description 8
- 238000001259 photo etching Methods 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 2
- 238000009434 installation Methods 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Machine Tool Units (AREA)
Abstract
The invention provides a high-precision sliding table assembly and a photoetching machine workbench, wherein the high-precision sliding table assembly comprises a base, a sliding table driving part and an adjusting part; the substrate is provided with a linear guide rail, the sliding table is installed on the linear guide rail, and a sliding table driving part is connected with the sliding table to drive the sliding table to move along the linear guide rail. The first end of adjustment portion is connected in slip table drive portion, and the second end of adjustment portion rotates to be connected in the one end of slip table, and adjustment portion can rotate towards the direction that is close to the base or keeps away from the base around the one end of slip table under the drive of slip table drive portion. Slight shaking and friction of the sliding table in the moving process can be avoided, and the static performance of the sliding table and the service life of the sliding table assembly are improved.
Description
Technical Field
The invention relates to the field of integrated circuit manufacturing, in particular to a high-precision sliding table assembly and a photoetching machine workbench.
Background
In the prior art, the components to be adjusted can be directly arranged on a sliding table of a ball screw linear module, and the sliding table can be rigidly connected in a fixed mode, such as screw nut rigid connection, and the sliding table and a linear motor drive a ball screw to drive the sliding table to perform linear motion under the constraint of a linear guide rail. However, due to parallelism tolerance of the ball screw and the linear guide rail, the ball screw and the sliding table can generate interaction component force which is not parallel to the movement direction, static stability performance of the sliding table is affected, and meanwhile mechanical abrasion of the guide rail and the ball screw is aggravated, and service life of equipment is affected.
Therefore, the prior art has the problems of poor static performance of the sliding table and serious mechanical abrasion of equipment.
Disclosure of Invention
The invention provides a high-precision sliding table assembly and a photoetching machine workbench, which solve the problems of poor static performance of a sliding table and serious mechanical abrasion of equipment in the prior art.
The invention provides a high-precision sliding table assembly, which comprises a base, a sliding table driving part and an adjusting part, wherein the sliding table is used for bearing a wafer carrying platform;
The first end of adjustment portion is connected in slip table drive portion, and the second end of adjustment portion rotates to be connected in the one end of slip table, and adjustment portion can rotate towards the direction that is close to the base or keeps away from the base around the one end of slip table under the drive of slip table drive portion.
According to the invention, the adjusting part arranged between the sliding table driving part and the sliding table can rotate around one end of the sliding table when the sliding table is driven by the sliding table driving part, and the component force which is not parallel to the moving direction of the sliding table and is generated by the sliding table driving part due to parallelism tolerance (such as installation error) is absorbed through the rotation, so that only the force parallel to the moving direction of the sliding table is transmitted to the sliding table, thereby ensuring that the driving force borne by the sliding table is always parallel to the moving direction (or can be understood as consistent with the moving direction), avoiding slight shaking and friction of the sliding table in the moving process, and improving the static performance of the sliding table and the service life of the sliding table component.
Optionally, the rotating shaft of the adjusting part rotating around one end of the sliding table is perpendicular to the moving direction of the sliding table and located on the same plane.
Optionally, the sliding table driving part comprises a ball screw and a screw nut, the adjusting part comprises a body, a rotating shaft and a bearing, one end of the body is connected with the screw nut, the bearing is arranged on the sliding table, and one end of the body far away from the screw nut is rotationally connected with the bearing through the rotating shaft.
The high-precision sliding table assembly provided by the embodiment of the invention realizes the rotation of the adjusting part by adopting the rotating shaft and the bearing, and has the advantages of simple structure and low cost.
Optionally, a first mounting hole and a second mounting hole are formed in the sliding table, the first mounting hole and the second mounting hole are symmetrically arranged relative to the ball screw, the rotating shaft comprises a first rotating shaft and a second rotating shaft, the bearing comprises a first bearing and a second bearing, the first bearing is mounted in the first mounting hole, the second bearing is mounted in the second mounting hole, and the first rotating shaft and the second rotating shaft are symmetrically arranged on two sides of the body and are mounted on the first bearing and the second bearing respectively.
According to the high-precision sliding table assembly, compared with a scheme of single-side arrangement or centering arrangement, the transmission of force is more balanced through the first rotating shaft, the second rotating shaft, the first bearing and the second bearing which are symmetrically arranged, errors caused by poor installation positions can be avoided to a certain extent, and the static performance of the sliding table can be further improved.
Optionally, the linear guide rail includes a first guide rail and a second guide rail that are arranged in parallel, the first mounting hole is located between the first guide rail and the ball screw, and the second mounting hole is located between the second guide rail and the ball screw.
According to the high-precision sliding table assembly, the first mounting hole and the second mounting hole are formed between the guide rails and the ball screw, or the first mounting hole and the second mounting hole can be formed in the inner sides of the two guide rails, so that the whole sliding table assembly is more compact in structure, and interference of the adjusting part with other equipment is avoided, and further the static performance of the sliding table is affected.
Optionally, the first rotating shaft and the second rotating shaft are both screw driving plugs.
Optionally, the bottom of slip table is equipped with the slider, and the slider is installed in linear guide and the size of slider matches in linear guide to when making the slip table move along linear guide, the slider laminating is in linear guide's lateral wall.
According to the embodiment of the invention, through the linear guide rail and the sliding block with the matched sizes, the sliding table can be attached to the side wall of the linear guide rail when moving along the linear guide rail, so that nonlinear offset in the horizontal direction in the moving process is avoided, and the static stability of the sliding table is further improved.
Optionally, a mounting groove is formed in a side, facing to the sliding table driving part, of the body of the adjusting part, and the screw nut of the sliding table driving part is mounted in the mounting groove.
The invention also provides a workbench of the photoetching machine, which comprises the high-precision sliding table component related to each embodiment and possible implementation modes.
Drawings
FIG. 1 is a schematic perspective view of a high-precision sliding table assembly according to an embodiment of the present invention;
FIG. 2 is a schematic side view of a high precision slip assembly according to an embodiment of the present invention;
fig. 3 is a schematic view of a partial cross-sectional structure of a precision slip assembly according to an embodiment of the present invention.
Reference numerals illustrate:
1, a high-precision sliding table assembly;
11, a base, 110, a linear guide rail, 1101, a first guide rail, 1102 and a second guide rail;
12, a sliding table, 120, a sliding block, 121, a first mounting hole and 122, a second mounting hole;
131, ball screw, 132, screw nut;
14, an adjusting part, 141, a body, 1410, a mounting groove, 1421, 1422, 1431, a first bearing and 1432, respectively.
Detailed Description
The invention will now be described in detail with reference to the drawings and specific examples. The present embodiment is implemented on the premise of the technical scheme of the present invention, and a detailed implementation manner and a specific operation process are given, but the protection scope of the present invention is not limited to the following examples.
It should be noted that in this specification, like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
In the description of the present embodiment, it should be noted that the azimuth or positional relationship indicated by the terms "upper", "lower", "inner", "bottom", etc. are based on the azimuth or positional relationship shown in the drawings, or the azimuth or positional relationship in which the inventive product is conventionally put in use, are merely for convenience of describing the present invention and simplifying the description, and are not indicative or implying that the apparatus or element to be referred to must have a specific azimuth, be configured and operated in a specific azimuth, and therefore should not be construed as limiting the present invention.
The terms "first," "second," and the like are used merely to distinguish between descriptions and are not to be construed as indicating or implying relative importance.
In the description of the present embodiment, it should also be noted that, unless explicitly specified and limited otherwise, the terms "disposed," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, integrally connected, mechanically connected, electrically connected, directly connected, indirectly connected through an intermediate medium, or communicating between two elements. The specific meaning of the above terms in the present embodiment can be understood in a specific case by those of ordinary skill in the art.
For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in further detail below with reference to the accompanying drawings.
Photolithography is a process in which a pattern on a reticle is transferred to a photoresist by chemical reaction, and then the pattern on the photoresist is transferred to a thin film on a silicon surface by etching. Photolithography requires accurate alignment of patterns present on the wafer surface with patterns on the reticle, extremely high accuracy, errors on the micrometer or even nanometer scale, and therefore extremely high static stability is required for equipment carrying silicon wafers, wafer substrates.
Referring to fig. 1 to 3, the present invention provides a high-precision sliding table assembly 1, which includes a base 11, a sliding table 12, a sliding table driving portion (e.g. a ball screw 131 and a screw nut 132), and an adjusting portion 14. The slide table 12 is used for carrying a wafer stage (specifically, the slide table 12 is used for changing the height of the wedge block so as to adjust the height of the wafer stage). The base 11 is provided with a linear guide 110, and the slide table 12 is mounted on the linear guide 110, and a slide table driving section (e.g., a ball screw 131 and a screw nut 132) is connected to the slide table 12 to drive the slide table 12 to move along the linear guide.
The first end of the adjusting portion 14 is connected to the slide driving portion, specifically, may be connected to a screw nut 132, for example, and the second end of the adjusting portion 14 is rotatably connected to one end of the slide 12, and the adjusting portion 14 can be rotated in a direction approaching the base 11 or moving away from the base 11 around one end of the slide 12 under the driving of the slide driving portion.
With the above scheme, the adjusting part 14 of the invention can rotate around one end of the sliding table 12 when the sliding table 12 is driven by the sliding table driving part, and the component force which is not parallel to the moving direction of the sliding table 12 and is generated by the sliding table driving part due to parallelism tolerance (such as installation error) is absorbed through the rotation, or the component force which is not parallel to the moving direction of the sliding table 12 can be understood to be transferred to the adjusting part 14, and then only the force which is parallel to the moving direction of the sliding table 12 is transferred to the sliding table 12, so that the driving force born by the sliding table 12 is always parallel to the moving direction (or understood to be always consistent with the moving direction), slight shaking and friction of the sliding table 12 in the moving process are avoided, and the static performance of the sliding table 12 and the service life of the sliding table component are improved.
Further, compared with the technical scheme that high-precision materials are needed for avoiding installation errors in the prior art, time and labor are consumed, multiple times of inspection and calibration are needed, and errors are difficult to avoid, the invention has the advantages of simple and exquisite design, low cost and convenience in installation by adding a simple rotatable middle structure as an adjusting part to absorb (or understand to transfer) component force caused by the installation errors.
The sliding table driving part may be the ball screw 131 and the screw nut 132 in the above example, and in other alternative embodiments, the sliding table driving part may also be a mechanism such as a gear rack capable of converting motor driving into linear motion, and further, the installation error may be understood as an installation error of the ball screw 131 or a rack, for example, an included angle between the ball screw 131 and the linear guide 110 in a vertical direction, so as to form a parallelism tolerance.
Specifically, referring to fig. 2, M in fig. 2 indicates a movement direction of the sliding table 12, N indicates a force of the adjusting portion 14 on the sliding table, and P indicates a force of the sliding table driving portion (e.g. the ball screw 131 and the screw nut 132) on the adjusting portion 14, where the ball screw 131 is installed with an error and has a certain included angle with the movement direction M of the sliding table 12. According to the embodiment of the application, the adjusting part 14 is used as a force transmission intermediate piece, and rotates around one end of the sliding table 12 in the moving process of the sliding table 12, so that the force which is not parallel to the moving direction of the sliding table 12 is absorbed, and the sliding table 12 only receives a force in the same direction as the moving direction M of the sliding table 12.
In one embodiment, the rotation axis of the adjusting portion 14 rotating around one end of the sliding table 12 is perpendicular to and on the same plane as the movement direction of the sliding table 12, in one embodiment, the movement direction of the sliding table 12 coincides with the length direction thereof, the width direction of the sliding table 12 is perpendicular to the length direction thereof, and the rotation axis of the adjusting portion 14 may be parallel to the width direction of the sliding table 12 or disposed along the width direction of the sliding table 12. In other alternative embodiments, the direction of the rotation axis may be other directions, so long as one end of the adjustment portion 14 is connected to the slide table 12 and can move around the slide table 12 toward or away from the base (or can be understood to move toward the upper surface of the slide table 12 or toward the lower surface of the slide table 12) under the drive of the slide table driving portion, so long as the force of the driving force applied to the slide table 12 by the slide table driving portion that is not parallel to the movement direction can be absorbed, without departing from the scope of the embodiment of the present invention.
In one embodiment, as shown in fig. 1, a slider 120 is disposed at the bottom of the sliding table 12, the slider 120 is mounted on the linear guide rail 110, and the size of the slider 120 is matched with that of the linear guide rail 110, so that when the sliding table 12 moves along the linear guide rail 110, the slider 120 is attached to the side wall of the linear guide rail 110. In one embodiment, the linear guide 110 has a bar structure, the slider 120 has a U-shaped structure, and is clamped to the outer wall of the linear guide 110, and in other alternative embodiments, the linear guide 110 has a U-shaped structure, and the slider 120 has a bar structure, and is clamped to the inner wall of the linear guide 110.
With the above structure, according to the embodiment of the invention, through the linear guide rail 110 and the sliding block 120 with matched sizes, the sliding table 12 can be attached to the side wall of the linear guide rail 110 when moving along the linear guide rail 110, so that nonlinear offset in the horizontal direction in the moving process is avoided, and the static stability of the sliding table is further improved.
Further, in one embodiment, referring to fig. 1 and 3, the adjusting portion 14 includes a body 141, rotating shafts (e.g., a first rotating shaft 1421 and a second rotating shaft 1422), and bearings (e.g., a first bearing 1431 and a second bearing 1432). One end of the body 141 is connected to the lead screw nut 132, bearings (e.g., a first bearing 1431 and a second bearing 1432) are mounted to the slide table 12, and one end of the body 141 remote from the lead screw nut 132 is rotatably connected to the bearings (e.g., the first bearing 1431 and the second bearing 1432) through rotation shafts (e.g., the first bearing 1431 and the second bearing 1432).
The high-precision sliding table assembly 1 provided by the embodiment of the invention realizes the rotation of the adjusting part 14 by adopting a rotating shaft and a bearing, and has the advantages of simple structure and low cost.
Further, referring to fig. 3, the sliding table 12 is provided with a first mounting hole 121 and a second mounting hole 122, and the first mounting hole 121 and the second mounting hole 122 are symmetrically arranged about the ball screw 131. The first bearing 1431 is mounted to the first mounting hole 121, and the second bearing 1432 is mounted to the second mounting hole 122. The first and second rotating shafts 1421 and 1422 are symmetrically disposed at both sides of the body 141 and are respectively mounted to the first and second bearings 1431 and 1432.
In one embodiment, the first shaft 1421 and the second shaft 1422 are both screws, and are multiplexed into a shaft while playing a role in installation and fixation, and in other alternative embodiments, other connecting members may be used.
It will be appreciated by those skilled in the art that the number of shafts and bearings may be one, and the mounting position thereof may be at an intermediate position of the body 141 or the slide table 12.
In the above embodiment, the first rotating shaft 1421, the second rotating shaft 1422, the first bearing 1431 and the second bearing 1432 which are symmetrically arranged are adopted, so that compared with the scheme of single-side arrangement or central arrangement, the force transmission is more balanced, the error caused by poor installation position can be avoided to a certain extent, and the static performance of the sliding table can be further improved.
In one embodiment, as shown in fig. 1, the body 141 of the adjusting part faces the side of the sliding table driving part, or it can be understood that the side facing away from the sliding table 12 is provided with a mounting groove 1410, and the screw nut 132 of the sliding table driving part is mounted in the mounting groove 1410. The shape of the mounting groove 1410 is not limited, and may be, for example, a circular groove or a polygonal groove, and the lead screw nut 132 may be accommodated and mounted without departing from the scope of the embodiment of the present invention.
Further, in one embodiment, the linear guide 110 includes a first guide 1101 and a second guide 1102 disposed parallel to the surface of the base 11, the first mounting hole 121 on the sliding table 12 is located between the first guide 1101 and the ball screw 131, and the second mounting hole 122 is located between the second guide 1102 and the ball screw 131. Or it can be understood that the first mounting hole 121 and the second mounting hole 122 are located on the inner sides of the first guide rail 1101 and the second guide rail 1102, and the structure can enable the whole sliding table assembly to be more compact, so that the interference of the adjusting part 14 and other devices is avoided, and the static performance of the sliding table is further affected.
In one embodiment, the first rail 1101 and the second rail 1102 may be fixed to the surface of the base 11 by screw mounting, and in other alternative embodiments, the first rail 1101 and the second rail 1102 may be integrally formed on the surface of the base 11.
The invention also provides a working platform of the photoetching machine, which comprises the high-precision sliding table assembly 1 related to the embodiment and possible implementation modes.
The foregoing describes in detail preferred embodiments of the present invention. It should be understood that numerous modifications and variations can be made in accordance with the concepts of the invention by one of ordinary skill in the art without undue burden. Therefore, all technical solutions which can be obtained by logic analysis, reasoning or limited experiments based on the prior art by the person skilled in the art according to the inventive concept shall be within the scope of protection defined by the claims.
Claims (7)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411427774.2A CN118938612B (en) | 2024-10-14 | 2024-10-14 | High-precision slide assembly and lithography machine workbench |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411427774.2A CN118938612B (en) | 2024-10-14 | 2024-10-14 | High-precision slide assembly and lithography machine workbench |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN118938612A CN118938612A (en) | 2024-11-12 |
| CN118938612B true CN118938612B (en) | 2025-01-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202411427774.2A Active CN118938612B (en) | 2024-10-14 | 2024-10-14 | High-precision slide assembly and lithography machine workbench |
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| Country | Link |
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| CN (1) | CN118938612B (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN221378483U (en) * | 2023-11-27 | 2024-07-19 | 杭州芯微影半导体有限公司 | Photo-etching machine camera position adjustment mechanism |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005122242A1 (en) * | 2004-06-07 | 2005-12-22 | Nikon Corporation | Stage apparatus, exposure apparatus, and exposure method |
| EP2675589B1 (en) * | 2011-02-15 | 2014-10-01 | Nanotronics Imaging, Llc. | Continuously scanning xy translation stage |
| JP6040613B2 (en) * | 2012-07-25 | 2016-12-07 | 日本精工株式会社 | Positioning device, exposure device and machine tool |
| CN115128905A (en) * | 2022-06-29 | 2022-09-30 | 江苏泰柯伟尔自动化设备有限公司 | Automatic glue homogenizing and baking device for semiconductor wafer |
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- 2024-10-14 CN CN202411427774.2A patent/CN118938612B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN221378483U (en) * | 2023-11-27 | 2024-07-19 | 杭州芯微影半导体有限公司 | Photo-etching machine camera position adjustment mechanism |
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| CN118938612A (en) | 2024-11-12 |
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