CN118884581A - Optical films, polarizers and display panels - Google Patents

Abstract

The present application discloses an optical film, a polarizer and a display panel; the optical film comprises a substrate, a hard layer and an anti-reflection layer; the hard layer is arranged on one side of the substrate; the anti-reflection layer is arranged on the side of the hard layer away from the substrate, and regulating particles are distributed in the anti-reflection layer; wherein, the reflectivity of the optical film to a first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film to a second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780nm, and the preset wavelength is greater than 380nm and less than 780nm; the present application can reduce the fluctuation of the reflectivity of the optical film to visible light and improve the anti-reflection effect of the optical film.

Description

Optical films, polarizers and display panels

Technical Field

The present application relates to the field of display technology, and in particular to an optical film, a polarizer and a display panel.

Background Art

The display panel will have a certain degree of reflection under the influence of external ambient light, causing the projection problem of environmental objects on the screen, affecting the image quality of the display. Generally, a functional film, such as anti-reflection film (LowReflection, LR), is attached to the surface of the display to eliminate or reduce the adverse effects of ambient light on the screen, thereby improving the display quality of the display.

However, the reflectivity of the current anti-reflection film in the visible light range fluctuates greatly, which in turn affects the anti-reflection effect and the display effect of the display panel.

Summary of the invention

The embodiments of the present application provide an optical film, a polarizer, and a display panel, which can reduce the fluctuation of the reflectivity of the optical film in the visible light range and improve the anti-reflection effect of the optical film.

The present application provides an optical film, which includes:

Base material;

A hard layer is disposed on one side of the substrate;

An anti-reflection layer is arranged on a side of the hard layer away from the substrate, and regulating particles are distributed in the anti-reflection layer;

Among them, the reflectivity of the optical film to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film to the second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780nm, and the preset wavelength is greater than 380nm and less than 780nm.

In one embodiment of the present application, the preset wavelength is greater than or equal to 500 nm and less than or equal to 650 nm.

In one embodiment of the present application, the average reflectivity of the optical film to the first type of light and the second type of light is greater than or equal to 0.6% and less than or equal to 1.5%.

In one embodiment of the present application, the reflectivity of the optical film to the light with the preset wavelength is greater than or equal to 0.1% and less than or equal to 0.6%.

In one embodiment of the present application, the thickness of the substrate is greater than or equal to 15 microns and less than or equal to 120 microns;

The refractive index of the substrate is greater than or equal to 1.45 and less than or equal to 1.65;

The in-plane retardation value of the material of the substrate is greater than or equal to 0 nm and less than or equal to 1000 nm, or the in-plane retardation value of the material of the substrate is greater than or equal to 3000 nm.

In one embodiment of the present application, the thickness of the hard layer is greater than or equal to 2 microns and less than or equal to 16 microns;

The hardness of the hard layer is greater than or equal to 2H/500g;

The refractive index of the hard layer is greater than or equal to 1.45 and less than or equal to 1.7.

In one embodiment of the present application, the thickness of the anti-reflection layer is greater than or equal to 75 nm and less than or equal to 125 nm;

The refractive index of the anti-reflection layer is greater than or equal to 1.2 and less than or equal to 1.4.

In one embodiment of the present application, the anti-reflection layer includes a resin matrix and the regulating particles distributed in the resin matrix, and a mass ratio of the resin matrix to the regulating particles is greater than or equal to 1:2 and less than or equal to 2:1.

In one embodiment of the present application, the regulating particle is a hollow particle, and the ratio of the shell thickness of the regulating particle to the diameter of the regulating particle is greater than or equal to 1/15 and less than or equal to 1/5.

In one embodiment of the present application, the porosity of the regulating particles is greater than or equal to 40% and less than or equal to 70%;

The diameter of the regulating particles is greater than or equal to 40 nm and less than or equal to 90 nm.

According to the above-mentioned purpose of the present application, an embodiment of the present application further provides a polarizer, which includes a polarizing layer and the optical film, and the optical film is arranged on one side of the polarizing layer.

According to the above-mentioned purpose of the present application, an embodiment of the present application further provides a display panel, which includes a panel body and the polarizer, and the polarizer is arranged on the light emitting side of the panel body.

Beneficial effects of the present application: the reflectivity of the optical film provided by the present application to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film to the second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380nm and less than or equal to the preset wavelength, and the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780nm; thereby, the fluctuation of the reflectivity of the optical film to visible light can be reduced, thereby improving the anti-reflection effect of the optical film.

BRIEF DESCRIPTION OF THE DRAWINGS

The technical solution and other beneficial effects of the present application will be made apparent by describing in detail the specific implementation methods of the present application in conjunction with the accompanying drawings.

FIG1 is a light reflectivity curve diagram of an anti-reflection film provided by an embodiment;

FIG2 is a schematic diagram of a structure of an optical film provided in an embodiment of the present application;

FIG3 is a light reflectance curve diagram of the optical film in Example 1 provided in the embodiments of the present application;

FIG4 is a light reflectance curve diagram of the optical film in Example 2 provided in the embodiments of the present application;

FIG5 is a light reflectance curve diagram of the optical film in Example 3 provided in the embodiments of the present application;

FIG6 is a light reflectance curve diagram of the optical film in Example 4 provided in the embodiments of the present application;

FIG. 7 is a light reflectance curve diagram of the optical film in Example 5 provided in the embodiments of the present application;

FIG8 is a schematic structural diagram of a polarizer provided in an embodiment of the present application;

FIG9 is another schematic diagram of the structure of a polarizer provided in an embodiment of the present application;

FIG. 10 is a schematic diagram of a structure of a display panel provided in an embodiment of the present application.

DETAILED DESCRIPTION

The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

The disclosure below provides many different embodiments or examples to realize the different structures of the present application. In order to simplify the disclosure of the present application, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application. In addition, the present application can repeat reference numbers and/or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, which itself does not indicate the relationship between the various embodiments and/or settings discussed. In addition, the various specific processes and material examples provided by the present application, but those of ordinary skill in the art can appreciate the application of other processes and/or the use of other materials.

Please refer to FIG1 , which is a test curve diagram of the reflectivity of the current anti-reflection film in the visible light range, wherein the visible light wavelength range can be 380nm to 780nm; as shown in FIG1 , the reflectivity of the anti-reflection film to visible light fluctuates greatly and extends in a wavy line, which seriously affects the anti-reflection effect of the anti-reflection film and is not conducive to improving the display effect of the display panel.

Please refer to Figure 2. An embodiment of the present application provides an optical film 10, which includes a substrate 11, a hard layer 12 and an anti-reflection layer 13; the hard layer 12 is arranged on one side of the substrate 11, the anti-reflection layer 13 is arranged on the side of the hard layer 12 away from the substrate 11, and regulating particles 132 are distributed in the anti-reflection layer 13.

Among them, the reflectivity of the optical film 10 to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film 10 to the second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780nm, and the preset wavelength is greater than 380nm and less than 780nm.

During the implementation and application process, the reflectivity of the optical film 10 provided in the embodiment of the present application to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film 10 to the second type of light increases as the wavelength of the second type of light increases. The wavelength of the first type of light is greater than or equal to 380nm and less than or equal to the preset wavelength, and the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780nm; thereby, the fluctuation of the reflectivity of the optical film 10 to visible light can be reduced, thereby avoiding the wave-like fluctuation of the reflectivity of the optical film 10 to visible light, and improving the anti-reflection effect of the optical film 10.

Furthermore, the parameters of each film layer in the optical film 10 provided in the embodiment of the present application are described below in conjunction with specific embodiments.

In some embodiments, the material of the substrate 11 is selected from resin materials. For example, the material of the substrate 11 can be selected from at least one of triacetyl cellulose (TAC), polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), polycycloolefins (COC), cycloolefin polymers (COP), and polyethylene naphthalatetwo formic acid glycol ester (PEN).

In some embodiments, the material of the substrate 11 can be selected from a polymer material having an in-plane retardation value greater than or equal to 0 nm and less than or equal to 1000 nm, or a polymer material having an in-plane retardation value greater than or equal to 3000 nm; for example, the in-plane retardation value of the material of the substrate 11 can be selected from 0 nm, 10 nm, 20 nm, 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, 1000 nm, 3000 nm, 4000 nm, 5000 nm, 6000 nm, 7000 nm, 8000 nm, 9000 nm, 10000 nm, 11000 nm or 12000 nm.

In some embodiments, the thickness of the substrate 11 can be greater than or equal to 15 microns and less than or equal to 120 microns; for example, the thickness of the substrate 11 can be 15 microns, 20 microns, 25 microns, 30 microns, 35 microns, 40 microns, 45 microns, 50 microns, 55 microns, 60 microns, 65 microns, 70 microns, 75 microns, 80 microns, 85 microns, 90 microns, 95 microns, 100 microns, 105 microns, 110 microns, 115 microns or 120 microns, etc.

In some embodiments, the substrate 11 may include at least one sublayer. When the substrate 11 includes multiple sublayers, the material of each sublayer may be independently selected from any one of the above materials; and the thickness of the substrate 11 defined above is the sum of the thicknesses of at least one sublayer.

In some embodiments, the refractive index of the substrate 11 is greater than or equal to 1.45 and less than or equal to 1.65; for example, the refractive index of the substrate 11 may be 1.45, 1.46, 1.47, 1.48, 1.49, 1.50, 1.51, 1.52, 1.53, 1.54, 1.55, 1.56, 1.57, 1.58, 1.59, 1.6, 1.61, 1.62, 1.63, 1.64 or 1.65, etc.

In addition, in some embodiments, the transmittance of the substrate 11 may be greater than or equal to 85%, for example, the transmittance of the substrate 11 may be 85%, 86%, 87%, 88%, 89%, 90%, 91%, 92%, 93%, 94% or 95%, etc.; the haze of the substrate 11 is less than or equal to 8%, for example, the haze of the substrate 11 may be 8%, 7%, 6%, 5%, 4%, 3%, 2%, 1%, 0.9%, 0.8%, 0.7%, 0.6%, 0.5%, 0.4%, 0.3%, 0.2% or 0.1%, etc.

Furthermore, the hard layer 12 is disposed on one surface of the substrate 11 , and the hard layer 12 has a relatively high hardness, and can be used to improve the hardness and mechanical properties of the optical film 10 .

It should be noted that the hard layer 12 can be formed on the substrate 11 by coating. For example, the hard layer 12 can be prepared by micro-concave coating, slit coating, lip coating, etc.

In some embodiments, the material of the hard layer 12 includes resin, for example, may include a curable resin, specifically a polymerizable and cross-linkable resin; wherein the curable resin may include at least one of a thermosetting resin and a photocurable resin.

It is understood that the light irradiated by the photocurable resin during curing may include ultraviolet light, electron beam, etc. When the light irradiated by the photocurable resin during curing is ultraviolet light curing, ultraviolet light emitted by an ultra-high pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a metal halide lamp, etc. may be used. When the light irradiated by the photocurable resin during curing is electron beam curing, electron beam accelerators such as Cockcroftwald type, Vandegraft type, and resonance transformer type may be used.

Furthermore, in some embodiments, the photocurable resin may include at least one of a monomer and an oligomer. Preferably, the photocurable resin includes a combination of a monomer and an oligomer.

In some embodiments, the monomer may include a monomer having a weight average molecular weight of less than 1000; specifically, the monomer may include a monomer having 2 or more functionalities, for example, the monomer may include isobornyl di(meth)acrylate, tripropylene glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol octa(meth)acrylate, and the like.

In some embodiments, the weight average molecular weight of the oligomer is greater than or equal to 1000 and less than 10000; specifically, the oligomer may include a multifunctional oligomer having 2 or more functional groups, for example, the oligomer may include polyester (meth) acrylate, polyurethane (meth) acrylate, polyester-polyurethane (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, epoxy (meth) acrylate, etc.

In some implementations, the thermosetting resin may include a resin having at least one thermosetting functional group. For example, the thermosetting resin may include melamine resin, unsaturated polyester resin, polyurethane resin, epoxy resin, and the like.

In some embodiments, the hardness of the hard layer 12 may be greater than or equal to 2H/500g. For example, the hardness of the hard layer 12 may be 2H/500g, 3H/500g, 4H/500g or 5H/500g.

In some embodiments, the thickness of the hard layer 12 is greater than or equal to 2 microns and less than or equal to 16 microns; for example, the thickness of the hard layer 12 may be 2 microns, 3 microns, 4 microns, 5 microns, 6 microns, 7 microns, 8 microns, 9 microns, 10 microns, 11 microns, 12 microns, 13 microns, 14 microns, 15 microns or 16 microns, etc.; preferably, the thickness of the hard layer 12 may be greater than or equal to 4 and less than or equal to 14μm.

In some embodiments, the refractive index of the hard layer 12 is greater than or equal to 1.45 and less than or equal to 1.7; for example, the refractive index of the hard layer 12 can be 1.45, 1.46, 1.47, 1.48, 1.49, 1.5, 1.51, 1.52, 1.53, 1.54, 1.55, 1.56, 1.57, 1.58, 1.59, 1.60, 1.61, 1.62, 1.63, 1.64, 1.65, 1.66, 1.67, 1.68, 1.69 or 1.7, etc.

Furthermore, the anti-reflection layer 13 is arranged on the side of the hard layer 12 away from the substrate 11. The refractive index of the anti-reflection layer 13 is small and smaller than the refractive index of the substrate 11 and also smaller than the refractive index of the hard layer 12, which can effectively improve the anti-reflection effect of the optical film 10.

It should be noted that the anti-reflection layer 13 can be formed on the hard layer 12 by coating. For example, the anti-reflection layer 13 can be prepared by micro-dimple coating, slit coating, lip coating, etc.

In some embodiments, the anti-reflection layer 13 includes a resin matrix 131 and the regulating particles 132 distributed in the resin matrix 131, and the mass ratio of the resin matrix 131 to the regulating particles 132 is greater than or equal to 1:2 and less than or equal to 2:1; for example, the mass ratio of the resin matrix 131 to the regulating particles 132 can be 1:2, 2:3, 3:4, 1:1, 1:1.5 or 1:2, etc.

In some embodiments, the material of the resin matrix 131 may include a resin material having a refractive index less than or equal to 1.53 and a functionality greater than or equal to 2. Further, the resin matrix 131 may include one or more combinations of monomers and oligomers. For example, the resin matrix 131 may include polyfunctional monomers such as polyethylene glycol diacrylate, ethoxylated trimethylolpropane triacrylate, dipentaerythritol hexaacrylate, polyurethane (meth) acrylate, fluorine-modified polyurethane (meth) acrylate, fluorine-silicon-modified polyurethane (meth) acrylate, etc.

In some embodiments, the material of the regulating particles 132 may include at least one of silicon oxide, silicon carbide, silicon nitride, zinc oxide, magnesium oxide, aluminum oxide, calcium sulfate, calcium carbonate, potassium titanate, and aluminum borate; preferably, the material of the regulating particles 132 in the embodiment of the present application may be silicon dioxide.

Among them, the regulating particle 132 is a hollow particle, that is, the regulating particle 132 contains a hollow space and a shell layer covering the hollow space, and thus the regulating particle 132 can not only achieve a low refractive index, but also improve the transmittance of the anti-reflection layer 13, thereby improving the transmittance of the optical film 10. Furthermore, the hollow particle can also reduce the refractive index of the anti-reflection layer 13, thereby reducing the reflectivity of the optical film 10. The ratio of the shell thickness of the regulating particle 132 to the diameter of the regulating particle 132 is greater than or equal to 1/15, and less than or equal to 1/5; for example, the ratio of the shell thickness of the regulating particle 132 to the diameter of the regulating particle 132 can be 1/15, 2/15 or 1/5, etc.

In some embodiments, the porosity of the regulating particles 132 is greater than or equal to 40% and less than or equal to 70%; for example, the porosity of the regulating particles 132 may be 40%, 45%, 50%, 55%, 60%, 65% or 70%, etc.

In some embodiments, the diameter of the regulating particle 132 is greater than or equal to 40nm and less than or equal to 90nm. For example, the diameter of the regulating particle 132 can be 40nm, 45nm, 50nm, 55nm, 60nm, 65nm, 70nm, 75nm, 80nm, 85nm or 90nm, etc.

It can be understood that the diameter of the regulating particle 132 in the above embodiment includes the shell thickness of the regulating particle 132 .

Furthermore, in the embodiment of the present application, the surface of the regulating particles 132 is modified to help the dispersibility of the regulating particles 132 in the resin matrix 131 or to enhance the functionality of the regulating particles 132, such as toughness.

In some embodiments, when the regulating particle 132 is surface-modified, the surface of the regulating particle 132 is modified by at least one of inorganic cations, inorganic anions, polymers, coupling agents or surfactants, that is, the surface of the regulating particle 132 includes at least one of inorganic cationic groups, inorganic anionic groups, polymer groups, coupling agent groups or surfactant groups.

In some embodiments, the surface of the regulating particle 132 is modified by at least one of inorganic magnesium salt, inorganic calcium salt, inorganic barium salt, inorganic strontium salt, stearic acid, stearate, sulfonic acid surfactant, thio surfactant, silane coupling agent, titanate coupling agent, aluminate coupling agent, metal composite coupling agent, phosphate coupling agent, borate coupling agent, polyacrylamide, alkyl phosphate, aryl phosphate, alkyl phosphate, aryl phosphate, alkyl alcohol amide phosphate, alkyl alcohol amide phosphate, imidazoline phosphate, imidazoline phosphate, high polyphosphate and siloxane phosphate.

In some embodiments, the material of the anti-reflection layer 13 may further include a leveling agent and other functional additives. For example, the leveling agent may include siloxane, fluorine, fluorocarbon, etc.

In some embodiments, the mass fraction range of the resin matrix 131 is greater than or equal to 30% and less than or equal to 60%, the mass fraction of the regulating particles 132 is greater than or equal to 30% and less than or equal to 60%, and the mass fraction of the leveling agent in the material of the anti-reflection layer 13 can be greater than or equal to 0.1% and less than or equal to 2%.

In some embodiments, the thickness of the anti-reflection layer 13 is greater than or equal to 75 nm and less than or equal to 125 nm; for example, the thickness of the anti-reflection layer 13 can be 75 nm, 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 105 nm, 110 nm, 115 nm, 120 nm or 125 nm, etc.

In some embodiments, the refractive index of the anti-reflection layer 13 is greater than or equal to 1.2 and less than or equal to 1.4; for example, the refractive index of the anti-reflection layer 13 may be 1.2, 1.25, 1.3, 1.35 or 1.4.

It should be noted that an easy-bonding layer may be provided on one side of the substrate 11 close to the hard layer 12 to adjust the surface tension of the substrate 11 close to the hard layer 12 so as to improve the adhesion of the hard layer 12, that is, the adhesion between the hard layer 12 and the easy-bonding layer is greater than the adhesion between the hard layer 12 and the substrate 11; in some embodiments, the material of the easy-bonding layer may include at least one of polyester, polyurethane and acrylate.

In addition, the side of the substrate 11 close to the hard layer 12 may be subjected to corona treatment to activate the surface of the side of the substrate 11 close to the hard layer 12 , which may also increase the adhesion between the substrate 11 and the hard layer 12 .

In addition, in some embodiments, the hardness of the optical film 10 is greater than or equal to 2H/500g, for example, the hardness of the optical film 10 may be 2H/500g, 3H/500g, 4H/500g or 5H/500g, etc.; the water drop angle of the optical film 10 is greater than or equal to 100° and less than or equal to 130°, for example, the water drop angle of the optical film 10 may be 100°, 105°, 110°, 115°, 120°, 125° or 130, etc.; the light transmittance of the optical film 10 is greater than or equal to 94%, for example, the light transmittance of the optical film 10 may be 94%, 95%, 96%, 97%, 98% or 99%, etc.; the haze of the optical film 10 is less than or equal to 6%, for example, the haze of the optical film 10 may be 6%, 5%, 4%, 3%, 2%, 1%, 0.5% or 0.1%, etc.

As mentioned above, the embodiments of the present application improve the smoothness of the light reflectance curve of the optical film 10 by setting the parameters of the film layer in the optical film 10, and the embodiments of the present application provide embodiments 1 to 5 to verify the light reflectance curve of the optical film 10 provided by the embodiments of the present application.

In Example 1, the material of the substrate 11 includes polyethylene terephthalate (PET), the thickness of the substrate 11 is 50 microns, the refractive index of the substrate 11 is 1.61, the transmittance of the substrate 11 is 91.5%, the haze of the substrate 11 is 0.9%, the in-plane retardation value of the substrate 11 is 780nm, and the easy-bonding layer is provided on the side of the substrate 11 close to the hard layer 12.

The hard layer 12 is cured by ultraviolet light. The material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate. The thickness of the hard layer 12 is 8 micrometers. The refractive index of the hard layer 12 is 1.5.

The mass ratio of the resin matrix 131 and the regulating particles 132 in the anti-reflection layer 13 is 1:1, the diameter of the regulating particles 132 is 70 nm, the porosity of the regulating particles 132 is 65%, the refractive index of the anti-reflection layer 13 is 1.35, the thickness of the anti-reflection layer 13 is 100 nm, the material of the resin matrix 131 is a mixture of (methyl) acrylate and modified acrylate, and the material of the regulating particles 132 is silicon oxide.

In Example 2, the material of the substrate 11 includes polymethyl methacrylate (PMMA), the thickness of the substrate 11 is 40 microns, the refractive index of the substrate 11 is 1.5, the transmittance of the substrate 11 is 92.2%, the haze of the substrate 11 is 0.2%, and the in-plane retardation value of the substrate 11 is 0.5nm.

The hard layer 12 is cured by heat. The material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate. The thickness of the hard layer 12 is 15 micrometers. The refractive index of the hard layer 12 is 1.53.

The mass ratio of the resin matrix 131 and the regulating particles 132 in the anti-reflection layer 13 is 1:1.5, the diameter of the regulating particles 132 is 70 nm, the porosity of the regulating particles 132 is 65%, the refractive index of the anti-reflection layer 13 is 1.3, the thickness of the anti-reflection layer 13 is 85 nm, the material of the resin matrix 131 is a mixture of (methyl) acrylate and modified acrylate, and the material of the regulating particles 132 is silicon oxide.

In Example 3, the material of the substrate 11 includes triacetyl cellulose (TAC), the thickness of the substrate 11 is 60 microns, the refractive index of the substrate 11 is 1.5, the transmittance of the substrate 11 is 92.7%, the haze of the substrate 11 is 0.2%, and the in-plane retardation value of the substrate 11 is 27nm.

The hard layer 12 is cured by ultraviolet light. The material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate. The thickness of the hard layer 12 is 10 micrometers. The refractive index of the hard layer 12 is 1.5.

The mass ratio of the resin matrix 131 and the regulating particles 132 in the anti-reflection layer 13 is 1:1, the diameter of the regulating particles 132 is 50 nm, the porosity of the regulating particles 132 is 50%, the refractive index of the anti-reflection layer 13 is 1.38, the thickness of the anti-reflection layer 13 is 100 nm, the material of the resin matrix 131 is a mixture of (methyl) acrylate and modified acrylate, and the material of the regulating particles 132 is silicon oxide.

In Example 4, the material of the substrate 11 includes cycloolefin polymer (COP, Cyclic OlefinPolymer), the thickness of the substrate 11 is 40 microns, the refractive index of the substrate 11 is 1.52, the transmittance of the substrate 11 is 93.1%, the haze of the substrate 11 is 0.1%, the in-plane retardation value of the substrate 11 is 1.5 nm, and the side of the substrate 11 close to the hard layer 12 is corona treated.

The hard layer 12 is cured by ultraviolet light. The material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate. The thickness of the hard layer 12 is 10 micrometers. The refractive index of the hard layer 12 is 1.5.

The mass ratio of the resin matrix 131 and the regulating particles 132 in the anti-reflection layer 13 is 1:1, the diameter of the regulating particles 132 is 70 nm, the porosity of the regulating particles 132 is 65%, the refractive index of the anti-reflection layer 13 is 1.35, the thickness of the anti-reflection layer 13 is 120 nm, the material of the resin matrix 131 is a mixture of (methyl) acrylate and modified acrylate, and the material of the regulating particles 132 is silicon oxide.

In Example 5, the material of the substrate 11 includes polyethylene terephthalate (PET), the thickness of the substrate 11 is 80 microns, the refractive index of the substrate 11 is 1.61, the transmittance of the substrate 11 is 91.9%, the haze of the substrate 11 is 1.5%, the in-plane retardation value of the substrate 11 is 8450nm, and the easy-bonding layer is provided on the side of the substrate 11 close to the hard layer 12.

The hard layer 12 is cured by electron beam. The material of the hard layer 12 is a mixture of (meth)acrylate and modified acrylate. The thickness of the hard layer 12 is 5 micrometers. The refractive index of the hard layer 12 is 1.5.

The mass ratio of the resin matrix 131 and the regulating particles 132 in the anti-reflection layer 13 is 1:1.3, the diameter of the regulating particles 132 is 70 nm, the porosity of the regulating particles 132 is 65%, the refractive index of the anti-reflection layer 13 is 1.33, the thickness of the anti-reflection layer 13 is 90 nm, the material of the resin matrix 131 is a mixture of (methyl) acrylate and modified acrylate, and the material of the regulating particles 132 is silicon oxide.

The parameters of the optical film 10 in Examples 1 to 5 are shown in Tables 1 and 2 below.

Table 1

Table 2

After verification, the following curves are obtained as shown in Table 3 and Figures 2, 3, 4, 5 and 6.

Wherein, the reflectivity test method includes: cutting the optical film 10 provided in Examples 1 to 5 into a size of 5cm×5cm, and paying attention that the film cutting process should not pollute or damage the surface coating. Use the black tape (product model: MTT-BB50) produced by Xinlun Optoelectronics (Changzhou) Co., Ltd. to tear off one side of the release film, and adhere it to the substrate 11 side of the optical film 10. Pay attention to the need to adhere flatly without bubbles and wrinkles. Use a spectrophotometer (Shimadzu, Japan, model: UV-3600plus) to measure the reflectivity at a 5° angle of regular reflection within a wavelength range of 380nm-780nm (the perpendicular direction to the surface of the low refractive index coating is 0°). The conditions for measuring the reflectivity: C light source, viewing angle 2°.

Table 3

hardness Average reflectivity Minimum reflectivity Light transmittance Haze Water drop angle Reflectivity curve Example 1 2H 1.25% 0.61% 94.50% 0.90% 105° smooth Example 2 2H 0.90% 0.38% 95.50% 0.50% 110° smooth Example 3 3H 1.36% 0.69% 95.10% 0.50% 110° smooth Example 4 2H 1.22% 0.62% 95.70% 0.30% 105° smooth Example 5 3H 0.95% 0.45% 95.40% 0.90% 110° smooth

It can be seen from Table 3 and the curves shown in Figures 3, 4, 5, 6 and 7 that the light reflection curve of the optical film 10 provided in the embodiment of the present application is a smooth curve, which can effectively reduce the fluctuation of the reflectivity of the optical film 10 to visible light, avoid the wave-like fluctuation of the reflectivity of the optical film 10 to visible light, and improve the anti-reflection effect of the optical film 10.

In an embodiment of the present application, the reflectivity of the optical film 10 to a first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film 10 to a second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780nm, and the preset wavelength is greater than 380nm and less than 780nm; that is, the reflectivity of the optical film 10 to light in the range of wavelength from 380nm to the preset wavelength decreases as the wavelength of the light increases, and the reflectivity of the optical film 10 to light in the range of wavelength from the preset wavelength to 780nm increases as the wavelength of the light increases.

It can be understood that within the visible light wavelength range, the reflectivity of the optical film 10 provided in the embodiment of the present application to light shows a trend of first decreasing and then increasing, and the process of decreasing and increasing is a smooth curve.

In some embodiments, the preset wavelength is greater than or equal to 500nm and less than or equal to 650nm; that is, the optical film 10 provided in the embodiment of the present application has the lowest reflectivity in the wavelength range of 500nm to 650nm, and the light in this wavelength range is the range in which the human eye is more sensitive. Therefore, the optical film 10 provided in the embodiment of the present application can further reduce the impact of reflected light on the user when using the optical film 10.

Furthermore, in some embodiments, the reflectivity of the optical film 10 to the light having the preset wavelength is greater than or equal to 0.1% and less than or equal to 0.6%, that is, the optical film 10 provided in the embodiment of the present application effectively reduces the reflectivity of the light within the wavelength range that the human eye is sensitive to, thereby improving the display effect of the display panel having the optical film 10.

In some embodiments, the average reflectivity of the optical film 10 to the first type of light and the second type of light is greater than or equal to 0.6% and less than or equal to 1.5%.

In summary, the reflectivity of the optical film 10 provided in the embodiment of the present application to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film 10 to the second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380nm, and less than or equal to the preset wavelength, and the wavelength of the second type of light is greater than or equal to the preset wavelength, and less than or equal to 780nm; thereby, the fluctuation of the reflectivity of the optical film 10 to visible light can be reduced, thereby avoiding the wave-like fluctuation of the reflectivity of the optical film 10 to visible light, and improving the anti-reflection effect of the optical film 10.

In addition, referring to FIG. 8 , the embodiment of the present application further provides a polarizer 100 , wherein the polarizer 100 includes a polarizing layer 20 and the optical film 10 , wherein the optical film 10 is disposed on one side of the polarizing layer 20 .

In some embodiments, the polarizing layer 20 is located on a side of the substrate 11 away from the hard layer 12 , and the polarizer 100 further includes a compensation layer 31 disposed on a side of the polarizing layer 20 away from the substrate 11 , and an adhesive layer 32 disposed on a side of the compensation layer 31 away from the polarizing layer 20 .

It should be noted that an easy-bonding layer may be provided on one side of the substrate 11 close to the polarizing layer 20 to adjust the surface tension of the side of the substrate 11 close to the polarizing layer 20 so as to improve the adhesion of the polarizing layer 20, that is, the adhesion between the polarizing layer 20 and the easy-bonding layer is greater than the adhesion between the polarizing layer 20 and the substrate 11; in some embodiments, the material of the easy-bonding layer may include at least one of polyester, polyurethane and acrylate.

In addition, the side of the substrate 11 close to the polarizing layer 20 may be subjected to corona treatment to activate the surface of the side of the substrate 11 close to the polarizing layer 20 , which may also increase the adhesion between the substrate 11 and the polarizing layer 20 .

In some embodiments, the material of the adhesive layer 32 can be selected from at least one of water glue, pressure sensitive adhesive, and UV glue. The material of the water glue can be selected from polyvinyl alcohol, the material of the pressure sensitive adhesive can be selected from acrylate copolymers, and the material of the UV glue can be selected from multifunctional acrylate monomers.

In some embodiments, the polarizer 100 also includes a release film 33 disposed on the side of the adhesive layer 32 away from the polarizing layer 20 and a protective film 34 disposed on the side of the optical film 10 away from the polarizing layer 20, and the release film 33 and the protective film 34 can be removed during the use of the polarizer 100, and the side provided with the adhesive layer 32 can be bonded to the surface of the display.

In another embodiment of the present application, please refer to Figure 9. In this embodiment, the polarizer 100 also includes an adhesive layer 32 arranged on the side of the polarizing layer 20 away from the substrate 11, that is, the difference between the polarizer 100 provided in this embodiment and the embodiment shown in Figure 7 is that the compensation layer 31 is not arranged in the polarizer 100.

As mentioned above, the polarizer 100 provided in the embodiment of the present application contains the optical film 10 provided in the above embodiment, thereby effectively improving the anti-reflection effect of the polarizer 100 and improving the display effect of the display using the polarizer 100.

In addition, referring to FIG. 10 , an embodiment of the present application further provides a display panel, which includes a panel body 200 and the polarizer 100 , wherein the polarizer 100 is disposed on the light emitting side of the panel body 200 .

In some embodiments, the display panel may be a liquid crystal display panel or an organic light emitting diode display panel.

It is understandable that, since the display panel contains the polarizer 100 described in the above embodiment, that is, contains the optical film 10 described in the above embodiment, the embodiment of the present application can effectively improve the anti-reflection effect of the display panel and improve the display effect of the display panel.

In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

The above is a detailed introduction to an optical film, a polarizer and a display panel provided in the embodiments of the present application. Specific examples are used herein to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the technical solutions and core ideas of the present application. Ordinary technicians in this field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or replace some of the technical features therein with equivalents; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims (12)

1. An optical film, comprising: Base material; A hard layer is disposed on one side of the substrate; An anti-reflection layer is arranged on a side of the hard layer away from the substrate, and regulating particles are distributed in the anti-reflection layer; Among them, the reflectivity of the optical film to the first type of light decreases as the wavelength of the first type of light increases, and the reflectivity of the optical film to the second type of light increases as the wavelength of the second type of light increases, the wavelength of the first type of light is greater than or equal to 380nm and less than or equal to a preset wavelength, the wavelength of the second type of light is greater than or equal to the preset wavelength and less than or equal to 780nm, and the preset wavelength is greater than 380nm and less than 780nm. 2 . The optical film according to claim 1 , wherein the preset wavelength is greater than or equal to 500 nm and less than or equal to 650 nm. 3 . The optical film according to claim 1 , wherein an average reflectivity of the optical film to the first type of light and the second type of light is greater than or equal to 0.6% and less than or equal to 1.5%. 4 . The optical film according to claim 1 , wherein the reflectivity of the optical film to the light with the preset wavelength is greater than or equal to 0.1% and less than or equal to 0.6%. 5. The optical film according to claim 1, wherein the thickness of the substrate is greater than or equal to 15 microns and less than or equal to 120 microns; The refractive index of the substrate is greater than or equal to 1.45 and less than or equal to 1.65; The in-plane retardation value of the material of the substrate is greater than or equal to 0 nm and less than or equal to 1000 nm, or the in-plane retardation value of the material of the substrate is greater than or equal to 3000 nm. 6. The optical film according to claim 1, wherein the thickness of the hard layer is greater than or equal to 2 microns and less than or equal to 16 microns; The hardness of the hard layer is greater than or equal to 2H/500g; The refractive index of the hard layer is greater than or equal to 1.45 and less than or equal to 1.7. 7. The optical film according to claim 1, wherein the thickness of the anti-reflection layer is greater than or equal to 75 nm and less than or equal to 125 nm; The refractive index of the anti-reflection layer is greater than or equal to 1.2 and less than or equal to 1.4. 8. The optical film according to claim 1 is characterized in that the anti-reflection layer comprises a resin matrix and the regulating particles distributed in the resin matrix, and a mass ratio of the resin matrix to the regulating particles is greater than or equal to 1:2 and less than or equal to 2:1. 9 . The optical film according to claim 1 , wherein the regulating particles are hollow particles, and the ratio of the shell thickness of the regulating particles to the diameter of the regulating particles is greater than or equal to 1/15 and less than or equal to 1/5. 10. The optical film according to claim 9, characterized in that the porosity of the regulating particles is greater than or equal to 40% and less than or equal to 70%; The diameter of the regulating particles is greater than or equal to 40 nm and less than or equal to 90 nm. 11 . A polarizer, characterized in that the polarizer comprises a polarizing layer and the optical film according to any one of claims 1 to 10 , wherein the optical film is arranged on one side of the polarizing layer. 12. A display panel, characterized in that the display panel comprises a panel body and the polarizer according to claim 11, wherein the polarizer is arranged on a light emitting side of the panel body.