CN118873844A - A plasma repair device - Google Patents
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- A—HUMAN NECESSITIES
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- A61N1/00—Electrotherapy; Circuits therefor
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
- A61B18/12—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating by passing a current through the tissue to be heated, e.g. high-frequency current
- A61B18/14—Probes or electrodes therefor
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B2018/00315—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body for treatment of particular body parts
- A61B2018/00559—Female reproductive organs
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B2018/00571—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body for achieving a particular surgical effect
- A61B2018/00577—Ablation
- A61B2018/00583—Coblation, i.e. ablation using a cold plasma
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Abstract
Description
技术领域Technical Field
本发明涉及等离子体医学技术领域,特别涉及一种等离子体修复装置。The invention relates to the technical field of plasma medicine, and in particular to a plasma repair device.
背景技术Background Art
在现有技术中,一些阴道修复方法利用射频、激光等能量形式进行治疗,以改善阴道松弛、尿失禁等问题。这些技术主要通过热效应刺激胶原蛋白再生和收缩阴道组织,以达到紧致和恢复功能的目的。然而,这些方法存在治疗过程中可能导致烫伤、不适等副作用的风险。In the existing technology, some vaginal repair methods use radio frequency, laser and other energy forms for treatment to improve vaginal relaxation, urinary incontinence and other problems. These technologies mainly stimulate collagen regeneration and shrink vaginal tissue through thermal effects to achieve the purpose of tightening and restoring function. However, these methods have the risk of side effects such as burns and discomfort during treatment.
发明内容Summary of the invention
本发明的主要目的是提出一种等离子体修复装置,旨在解决如何避免阴道在治疗过程中被烫伤、降低治疗过程中不适感的技术问题。The main purpose of the present invention is to provide a plasma repair device, which aims to solve the technical problem of how to avoid vaginal burns during treatment and reduce discomfort during treatment.
为实现上述目的,本发明提出一种等离子体修复装置,包括:To achieve the above object, the present invention provides a plasma repair device, comprising:
外壳,具有容纳腔,所述外壳包括第一扩散区域,所述第一扩散区域设有多个第一气孔,所述第一气孔连通所述容纳腔;A housing having a containing cavity, wherein the housing includes a first diffusion region, wherein the first diffusion region is provided with a plurality of first air holes, and the first air holes are connected to the containing cavity;
等离子体发生组件,设于所述容纳腔,且所述等离子体发生组件配置为能够产生等离子体;A plasma generating assembly is disposed in the containing cavity, and the plasma generating assembly is configured to generate plasma;
射频电极,设置于所述外壳,且所述射频电极配置为能够释放电流;A radio frequency electrode is disposed on the housing and is configured to release current;
其中,所述等离子体发生组件产生的等离子体能够由所述第一气孔流出所述容纳腔。The plasma generated by the plasma generating assembly can flow out of the accommodating cavity through the first air hole.
在一些实施例中,所述第一扩散区域与所述射频电极交替设于所述外壳的周侧。In some embodiments, the first diffusion regions and the radio frequency electrodes are alternately disposed on a circumferential side of the housing.
在一些实施例中,所述外壳设有扩散通道,所述扩散通道垂直于所述外壳的延伸方向,且所述扩散通道贯穿所述外壳并连通所述容纳腔。In some embodiments, the shell is provided with a diffusion channel, the diffusion channel is perpendicular to the extension direction of the shell, and the diffusion channel passes through the shell and is connected to the accommodating cavity.
在一些实施例中,所述扩散通道具有周壁,所述周壁设有多个第二气孔,各所述第二气孔连通所述容纳腔。In some embodiments, the diffusion channel has a peripheral wall, and the peripheral wall is provided with a plurality of second air holes, and each of the second air holes is connected to the accommodating cavity.
在一些实施例中,所述外壳靠近所述扩散通道一端的端面具有第二扩散区域,所述第二扩散区域设有多个第三气孔,至少部分所述第三气孔连通所述扩散通道。In some embodiments, the end surface of the housing close to one end of the diffusion channel has a second diffusion area, and the second diffusion area is provided with a plurality of third air holes, and at least some of the third air holes are connected to the diffusion channel.
在一些实施例中,所述等离子体发生组件包括主体部以及DBD电极片,所述主体部具有容置空间,所述DBD电极片容纳于所述容置空间,且所述主体部设有连通所述容置空间以及所述容纳腔的避让孔,所述DBD电极片配置为通电能够产生等离子体,所述DBD电极片产生的等离子体适于由所述容置空间经所述避让孔流通至所述容纳腔。In some embodiments, the plasma generating assembly includes a main body and a DBD electrode sheet, the main body having a accommodating space, the DBD electrode sheet being accommodated in the accommodating space, and the main body being provided with an avoidance hole connecting the accommodating space and the accommodating cavity, the DBD electrode sheet being configured to generate plasma when energized, and the plasma generated by the DBD electrode sheet being suitable for flowing from the accommodating space to the accommodating cavity through the avoidance hole.
在一些实施例中,所述等离子体发生组件包括导电线,所述主体部设有通孔,且所述通孔连通所述容置空间,所述导电线配置为能够穿设于所述通孔并电连接所述DBD电极片和/或所述射频电极。In some embodiments, the plasma generating assembly includes a conductive wire, the main body is provided with a through hole, and the through hole is connected to the accommodating space, and the conductive wire is configured to be able to pass through the through hole and electrically connect the DBD electrode sheet and/or the RF electrode.
在一些实施例中,所述主体部包括第一支架以及第二支架,所述第一支架与所述第二支架配置为能够彼此扣合并共同限定出所述容置空间,所述第一支架靠近所述容置空间的一侧设有第一安装槽,所述第二支架靠近所述容置空间的一侧设有第二安装槽,所述第二安装槽配置为能够与所述第一安装槽连通,所述DBD电极片卡设于所述第一安装槽以及所述第二安装槽。In some embodiments, the main body includes a first bracket and a second bracket, the first bracket and the second bracket are configured to be able to snap together and jointly define the accommodating space, the first bracket is provided with a first mounting groove on a side close to the accommodating space, the second bracket is provided with a second mounting groove on a side close to the accommodating space, the second mounting groove is configured to be able to communicate with the first mounting groove, and the DBD electrode sheet is clamped in the first mounting groove and the second mounting groove.
在一些实施例中,所述等离子体修复装置包括多个间隔布置的所述DBD电极片,所述避让孔布置于相邻所述DBD电极片之间。In some embodiments, the plasma repair device includes a plurality of DBD electrode sheets arranged at intervals, and the avoidance holes are arranged between adjacent DBD electrode sheets.
在一些实施例中,所述第一支架背离所述容置空间的一侧设有第一销槽,所述第二支架背离所述容置空间的一侧设有第二销槽,所述外壳靠近所述容纳腔的一侧设有卡接凸起,所述卡接凸起配置为能够卡设于所述第一销槽以及所述第二销槽。In some embodiments, a first pin groove is provided on a side of the first bracket facing away from the accommodating space, a second pin groove is provided on a side of the second bracket facing away from the accommodating space, and a snap-in protrusion is provided on a side of the shell close to the accommodating cavity, and the snap-in protrusion is configured to be snapped in the first pin groove and the second pin groove.
在一些实施例中,所述等离子体发生组件包括导电线,所述第一支架和/或所述第二支架设有通孔,且所述通孔连通所述第一安装槽和/或所述第二安装槽。In some embodiments, the plasma generating assembly includes a conductive wire, the first bracket and/or the second bracket is provided with a through hole, and the through hole is connected to the first mounting groove and/or the second mounting groove.
在一些实施例中,所述等离子体发生组件还包括扩散件,所述扩散组件安装于所述主体部,且所述扩散件配置为能够使所述DBD电极片产生的等离子体扩散并由所述第一气孔流出所述容纳腔。In some embodiments, the plasma generating assembly further includes a diffuser, the diffuser assembly is mounted on the main body, and the diffuser is configured to allow the plasma generated by the DBD electrode sheet to diffuse and flow out of the accommodating cavity through the first air hole.
在一些实施例中,所述等离子体修复装置包括治疗部以及连接于所述治疗部一端的控制部,所述外壳、所述等离子发生组件以及所述射频电极均设于所述治疗部;In some embodiments, the plasma repair device includes a treatment part and a control part connected to one end of the treatment part, and the housing, the plasma generating assembly and the radio frequency electrode are all arranged in the treatment part;
所述控制部设有用于调节所述等离子体发生组件输出参数的第一旋钮;The control unit is provided with a first knob for adjusting the output parameters of the plasma generating assembly;
和/或,所述控制部设有用于安全急停的第二旋钮;And/or, the control unit is provided with a second knob for safety emergency stop;
和/或,所述控制部设有用于调节所述射频电极输出参数的第三旋钮;And/or, the control unit is provided with a third knob for adjusting the output parameters of the radio frequency electrode;
和/或,所述控制部设有用于控制所述等离子体修复装置通电或断电的开关;And/or, the control unit is provided with a switch for controlling power on or off of the plasma repair device;
和/或,所述控制部设有显示屏。And/or, the control unit is provided with a display screen.
与现有技术相比,本发明的有益效果是:Compared with the prior art, the present invention has the following beneficial effects:
在本发明的技术方案中,等离子体修复装置包括外壳、等离子体发生组件以及射频电极,其中外壳具有容纳腔,等离子体发生组件设于容纳腔,射频电极设置于外壳,且射频电极能够释放电流,从而对患处进行电刺激治疗。外壳设有第一扩散区域,第一扩散区域设有多个第一气孔,等离子体发生组件配置为能够产生等离子体,等离子体能够由第一气孔流出容纳腔。于是使用本申请的等离子体修复装置对患处进行电刺激治疗时,等离子体能够存在于外壳与黏膜之间,有效降低了射频电极烫伤黏膜的概率,并且,等离子体作用于患处能够起到抑菌维养、修复伤口等作用,进而提高了等离子体修复装置的舒适性。In the technical solution of the present invention, the plasma repair device includes a shell, a plasma generating assembly and a radio frequency electrode, wherein the shell has a accommodating cavity, the plasma generating assembly is arranged in the accommodating cavity, the radio frequency electrode is arranged in the shell, and the radio frequency electrode can release current, thereby performing electrical stimulation treatment on the affected part. The shell is provided with a first diffusion area, the first diffusion area is provided with a plurality of first pores, the plasma generating assembly is configured to generate plasma, and the plasma can flow out of the accommodating cavity through the first pores. Therefore, when the plasma repair device of the present application is used to perform electrical stimulation treatment on the affected part, the plasma can exist between the shell and the mucosa, effectively reducing the probability of the radio frequency electrode scalding the mucosa, and the plasma acting on the affected part can play the role of antibacterial maintenance, wound repair, etc., thereby improving the comfort of the plasma repair device.
除此之外,相较于相关技术中采用其他设备产生等离子体并通过设置输送管道将等离子体输送至患处而言,本申请中等离子体修复装置能够产生等离子体,于是,等离子体直接在等离子体修复装置内部生成并释放至患处,减少了等离子体传输过程中的能量的损失和特性变化,确保了治疗效果的直接性和高效性。并且,本申请中无需设置额外的等离子体生成设备和传输系统,降低了整个等离子体修复装置的复杂性和成本。In addition, compared with the related art that uses other equipment to generate plasma and transmits the plasma to the affected area by setting up a transmission pipeline, the plasma repair device in the present application can generate plasma, so that the plasma is directly generated inside the plasma repair device and released to the affected area, reducing the energy loss and characteristic changes during the plasma transmission process, ensuring the directness and efficiency of the treatment effect. In addition, in the present application, there is no need to set up additional plasma generation equipment and transmission system, reducing the complexity and cost of the entire plasma repair device.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图示出的结构获得其他的附图。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.
图1为本发明一实施例中等离子体修复装置的结构示意图;FIG1 is a schematic structural diagram of a plasma repair device according to an embodiment of the present invention;
图2为本发明一实施例中等离子体修复装置的结构爆炸示意图;FIG2 is a schematic diagram of an exploded view of the structure of a plasma repair device according to an embodiment of the present invention;
图3为本发明一实施例中治疗部的结构示意图;FIG3 is a schematic diagram of the structure of a treatment part in one embodiment of the present invention;
图4为本发明一实施例中等离子体发生组件的结构示意图;FIG4 is a schematic structural diagram of a plasma generating assembly according to an embodiment of the present invention;
图5为本发明一实施例中第一支架、第二支架的结构示意图;FIG5 is a schematic structural diagram of a first bracket and a second bracket in one embodiment of the present invention;
图6为本发明一实施例中外壳的结构示意图;FIG6 is a schematic diagram of the structure of a housing in one embodiment of the present invention;
图7为本发明一实施例中外壳沿图6中A-A方向剖切的剖视图;FIG7 is a cross-sectional view of the housing along the A-A direction in FIG6 according to an embodiment of the present invention;
图8为本发明一实施例中外壳沿图6中B-B方向剖切的剖视图;FIG8 is a cross-sectional view of the housing along the B-B direction in FIG6 according to an embodiment of the present invention;
图9为本发明另一实施例中治疗部的结构示意图;其中射频电极呈环状布置于外壳。FIG. 9 is a schematic diagram of the structure of a treatment part in another embodiment of the present invention, wherein the radio frequency electrodes are arranged in a ring shape on the housing.
附图标号说明:Description of Figure Numbers:
等离子体修复装置100;Plasma repair device 100;
外壳110;Housing 110;
容纳腔111;第一扩散区域112;第一气孔1121;扩散通道113;卡接凸起114;Accommodating cavity 111; first diffusion area 112; first air hole 1121; diffusion channel 113; clamping protrusion 114;
等离子发生组件120;Plasma generating assembly 120;
主体部121;容置空间1211;避让孔1212;通孔1213;第一支架1214;Main body 121; accommodating space 1211; avoidance hole 1212; through hole 1213; first bracket 1214;
第一安装槽12141;第一销槽12142;第二支架1215;第二安装槽12151;First mounting groove 12141; first pin groove 12142; second bracket 1215; second mounting groove 12151;
第二销槽12152;Second pin groove 12152;
DBD电极片122;DBD electrode sheet 122;
扩散件123;Diffuser 123;
射频电极130;Radio frequency electrode 130;
治疗部140;Treatment Department 140;
控制部150;Control unit 150;
第一旋钮151;第二旋钮152;第三旋钮153;开关154;显示屏155;A first knob 151; a second knob 152; a third knob 153; a switch 154; a display screen 155;
线缆接口156。Cable interface 156 .
本发明目的的实现、功能特点及优点将结合实施例,参照附图做进一步说明。The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings.
具体实施方式DETAILED DESCRIPTION
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
压力性尿失禁、阴道松弛综合症、轻度盆腔器官脱垂、萎缩性阴道炎是几种一直困扰着女性尤其是产后女性的常见病、多发病。目前对上述病症的治疗方法有锻炼按摩、药物治疗、手术治疗或其他物理手段治疗。锻炼按摩的治疗周期长且疗效十分不明显,药物治疗容易导致色素沉着且疗效并不明显,手术治疗则存在伤及生理功能和组织功能的隐患。Stress urinary incontinence, vaginal relaxation syndrome, mild pelvic organ prolapse, and atrophic vaginitis are several common and frequently occurring diseases that have been plaguing women, especially postpartum women. Currently, the treatments for the above-mentioned diseases include exercise and massage, drug therapy, surgical treatment, or other physical treatments. Exercise and massage have a long treatment cycle and the effect is not obvious. Drug therapy is prone to pigmentation and the effect is not obvious. Surgical treatment has the risk of damaging physiological and tissue functions.
在相关技术中,通常利用射频、激光等能量形式进行治疗,但由于射频、激光等能量形式在治疗过程中极易产生大量热量而导致患处被灼伤、烫伤,产生强烈不适等副作用。In related technologies, radio frequency, laser and other energy forms are usually used for treatment. However, since radio frequency, laser and other energy forms can easily generate a large amount of heat during the treatment process, the affected area may be burned or scalded, resulting in side effects such as severe discomfort.
而本申请人发现,等离子体是一种气态物质,由电离产生的正负离子组成,低温等离子体在接近室温的条件下可以产生大量活性物质,如活性氧和活性氮等,等离子体作用于人体伤口处,有利于伤口消毒,消炎,愈合,止血。而在阴道治疗中,等离子体除起到杀菌消毒作用外,还可引发生物组织内部的生理反应,促进细胞再生和胶原蛋白生成,从而增强组织紧致度和弹性,且其热渗透低,对组织的损伤极小。The applicant has found that plasma is a gaseous substance composed of positive and negative ions produced by ionization. Low-temperature plasma can produce a large amount of active substances, such as active oxygen and active nitrogen, at near room temperature. Plasma acts on human wounds, which is beneficial to wound disinfection, anti-inflammatory, healing and hemostasis. In vaginal treatment, in addition to sterilization and disinfection, plasma can also induce physiological reactions inside biological tissues, promote cell regeneration and collagen production, thereby enhancing tissue firmness and elasticity. In addition, its thermal penetration is low, causing minimal damage to tissues.
除此之外,本申请人还发现,等离子体在传输过程中,由于其与管道壁或其他介质的摩擦、碰撞以及辐射等原因,会损失部分能量。这种能量损失会导致等离子体的温度、速度和离子浓度等参数发生变化。并且,等离子体中的粒子(如电子、离子等)在传输过程中会发生扩散和混合现象,而扩散和混合会影响等离子体的均匀性和稳定性。等离子体本身是一个复杂的系统,存在着多种不稳定性因素。在传输过程中,这些不稳定性因素可能会被激发或放大,导致等离子体出现波动、黏滞、湍流等现象,等离子体中的带电粒子与中性粒子、带电粒子之间的相互作用(如库仑碰撞)会导致粒子间的能量交换、动量传递和电荷重新分布,进而影响其传输特性。等离子体在传输过程中发生的温度、成分、浓度衰减等多种特性变化,容易导致其在到达治疗部位时的能量和效果降低,限制治疗的深度和范围,导致治疗效果不稳定,容易增加治疗的风险和不确定性。In addition, the applicant has also found that during the transmission process, plasma will lose some energy due to friction, collision and radiation with the pipe wall or other media. This energy loss will cause changes in parameters such as plasma temperature, velocity and ion concentration. In addition, the particles in the plasma (such as electrons, ions, etc.) will diffuse and mix during the transmission process, and diffusion and mixing will affect the uniformity and stability of the plasma. Plasma itself is a complex system with a variety of instability factors. During the transmission process, these instability factors may be excited or amplified, causing fluctuations, viscosity, turbulence and other phenomena in the plasma. The interaction between the charged particles in the plasma and the neutral particles and charged particles (such as Coulomb collisions) will cause energy exchange, momentum transfer and charge redistribution between particles, thereby affecting its transmission characteristics. The changes in the temperature, composition, concentration attenuation and other characteristics of the plasma during the transmission process are likely to reduce its energy and effect when it reaches the treatment site, limit the depth and range of treatment, lead to unstable treatment effects, and easily increase the risk and uncertainty of treatment.
鉴于此,请参阅图1至图9,本发明提供了一种等离子体修复装置100,包括外壳110、等离子体发生组件以及射频电极130。在一些实施方式中,外壳110可以呈符合人体生理结构的扁鸭嘴钳式的扁长柱状结构,请参阅图1和图3。在另一些实施方式中,外壳110也可以呈圆筒状结构,请参阅图9。其中,射频电极130设置于外壳110,且该射频电极130能够释放电流,电流作用于患处,能够对患处产生电刺激,从而起到增强肌肉、修复黏膜的作用。需要说明的是,本发明的等离子体修复装置100还可以采用其他能够释放电流的电极。外壳110具有容纳腔111,等离子体发生组件设置于容纳腔111,且该等离子体发生组件配置为能够产生等离子体。外壳110包括第一扩散区域112,该第一扩散区域112设有多个第一气孔1121,各第一气孔1121均连通容纳腔111。第一气孔1121的截面形状包括但不限于圆形、多边形、椭圆形以及其他不规则形状等。于是,等离子体能够通过第一气孔1121流出容纳腔111,第一方面,等离子体能够弥漫并作用于患处及患处周围,从而对患处及患处周围杀菌消毒,避免患处感染,进而起到治疗炎症、修复伤口的作用。第二方面,等离子体作用于黏膜组织,能够刺激组织内部生理反应,促进细胞再生、胶原蛋白生成从而提高组织紧致度。第三方面,等离子体能够存在于射频电极130与组织或患处之间,从而有效削弱了射频电极130传递至组织或患处的热量,降低了组织或患处被烫伤、灼伤的风险,从而提高了患处治疗过程中的舒适性。第四方面,相较于相关技术中将外部设备产生等离子体输送至患处而言,本发明中,等离子体发生组件在治疗过程中实时产生等离子体,无需设置额外的输送系统,并且避免了等离子体由于过长的传输路径而发生特性变化导致影响治疗效果。In view of this, please refer to Figures 1 to 9. The present invention provides a plasma repair device 100, including a housing 110, a plasma generating assembly, and a radio frequency electrode 130. In some embodiments, the housing 110 may be a flat long columnar structure in a flat duckbill clamp style that conforms to the physiological structure of the human body, please refer to Figures 1 and 3. In other embodiments, the housing 110 may also be a cylindrical structure, please refer to Figure 9. Among them, the radio frequency electrode 130 is arranged on the housing 110, and the radio frequency electrode 130 can release current, and the current acts on the affected part, which can generate electrical stimulation to the affected part, thereby playing a role in strengthening muscles and repairing mucosa. It should be noted that the plasma repair device 100 of the present invention can also use other electrodes that can release current. The housing 110 has a housing cavity 111, the plasma generating assembly is arranged in the housing cavity 111, and the plasma generating assembly is configured to generate plasma. The housing 110 includes a first diffusion region 112, and the first diffusion region 112 is provided with a plurality of first pores 1121, and each first pore 1121 is connected to the housing cavity 111. The cross-sectional shape of the first pore 1121 includes but is not limited to circular, polygonal, elliptical and other irregular shapes. Thus, the plasma can flow out of the accommodating cavity 111 through the first pore 1121. On the one hand, the plasma can diffuse and act on the affected part and the surrounding area of the affected part, thereby sterilizing and disinfecting the affected part and the surrounding area of the affected part, avoiding infection of the affected part, and then playing a role in treating inflammation and repairing wounds. On the second hand, the plasma acts on the mucosal tissue, which can stimulate the physiological response inside the tissue, promote cell regeneration, collagen production, and thus improve tissue firmness. On the third hand, the plasma can exist between the RF electrode 130 and the tissue or the affected part, thereby effectively weakening the heat transferred from the RF electrode 130 to the tissue or the affected part, reducing the risk of scalding or burning the tissue or the affected part, thereby improving the comfort of the affected part during treatment. On the fourth hand, compared with the related art of transmitting plasma generated by an external device to the affected part, in the present invention, the plasma generating assembly generates plasma in real time during the treatment process, without the need to set up an additional delivery system, and avoids the plasma from changing its characteristics due to an excessively long transmission path, which affects the treatment effect.
为了使经第一气孔1121流出容纳腔111的等离子体能够有效存在于外壳110与患处之间,尤其存在于射频电极130与患处之间,第一扩散区域112与射频电极130交替设于外壳110的周侧,从而避免了射频电极130直接作用于患处而导致黏膜组织被烫伤或灼伤。外壳110设有多个第一区域,且等离子体修复装置100包括多个射频电极130。请参阅图3,在一些实施方式中,沿外壳110的周向,各第一区域位于相邻射频电极130之间。请参阅图9,在另一些实施方式中,各第一区域环设于外壳110的周侧,且各射频电极130呈环状设置于外壳110,沿外壳110的延伸方向,各第一区域位于相邻射频电极130之间。In order to allow the plasma flowing out of the accommodating cavity 111 through the first air hole 1121 to effectively exist between the shell 110 and the affected part, especially between the RF electrode 130 and the affected part, the first diffusion region 112 and the RF electrode 130 are alternately arranged on the circumference of the shell 110, thereby preventing the RF electrode 130 from directly acting on the affected part and causing the mucosal tissue to be scalded or burned. The shell 110 is provided with a plurality of first regions, and the plasma repair device 100 includes a plurality of RF electrodes 130. Referring to FIG. 3, in some embodiments, along the circumference of the shell 110, each first region is located between adjacent RF electrodes 130. Referring to FIG. 9, in other embodiments, each first region is arranged on the circumference of the shell 110, and each RF electrode 130 is arranged on the shell 110 in an annular shape, and along the extension direction of the shell 110, each first region is located between adjacent RF electrodes 130.
为增加等离子体由容纳腔111流出的效率,请参阅图3,外壳110设有扩散通道113,该扩散通道113垂直于外壳110的延伸方向,且扩散通道113沿容纳腔111的径向贯穿外壳110,即扩散通道113由外壳110的一侧穿透至相对的另一侧,并且扩散通道113连通容纳腔111。具体的,为便于表述,定义壳体首先靠近患处的一端为治疗端,其中第一区域与射频电极130位于治疗端,在一些实施方式中,扩散通道113位于第一区域靠近治疗端的端面的一侧,扩散通道113在外壳110形成的轮廓形状包括但不限于三角形,并且扩散通道113的轮廓边缘具有圆角结构,以避免黏膜组织被划伤。在另一些实施方式中,扩散通道113位于射频电极130靠近治疗端的端面的一侧,于是经扩散通道113流出容纳腔111的等离子体能够更迅速地存在于射频电极130与黏膜组织之间。扩散通道113结合第一气孔1121的设置有助于快速在患处营造充满等离子体的环境,从而对整个环境进行消毒杀菌,避免射频电极130对患处进行治疗过程中患处受细菌感染,同时,由于整个治疗环境充满等离子体,射频电极130工作过程中产生的热量受等离子体的阻隔而无法完全作用于黏膜组织,从而有效避免了黏膜组织在治疗过程中被烫伤或灼伤。In order to increase the efficiency of plasma flowing out of the accommodating cavity 111, please refer to FIG. 3. The housing 110 is provided with a diffusion channel 113, which is perpendicular to the extension direction of the housing 110, and the diffusion channel 113 penetrates the housing 110 along the radial direction of the accommodating cavity 111, that is, the diffusion channel 113 penetrates from one side of the housing 110 to the other side opposite thereto, and the diffusion channel 113 communicates with the accommodating cavity 111. Specifically, for the convenience of description, the end of the housing first close to the affected part is defined as the treatment end, wherein the first area and the radio frequency electrode 130 are located at the treatment end. In some embodiments, the diffusion channel 113 is located on one side of the end face of the first area close to the treatment end, and the contour shape formed by the diffusion channel 113 on the housing 110 includes but is not limited to a triangle, and the contour edge of the diffusion channel 113 has a rounded structure to avoid scratching the mucosal tissue. In other embodiments, the diffusion channel 113 is located on one side of the end face of the radio frequency electrode 130 close to the treatment end, so that the plasma flowing out of the accommodating cavity 111 through the diffusion channel 113 can be more quickly present between the radio frequency electrode 130 and the mucosal tissue. The setting of the diffusion channel 113 combined with the first air hole 1121 helps to quickly create an environment full of plasma at the affected area, thereby disinfecting and sterilizing the entire environment, preventing the affected area from being infected by bacteria during the treatment of the affected area by the radio frequency electrode 130. At the same time, since the entire treatment environment is full of plasma, the heat generated during the operation of the radio frequency electrode 130 is blocked by the plasma and cannot completely act on the mucosal tissue, thereby effectively preventing the mucosal tissue from being scalded or burned during the treatment process.
进一步的,为避免异物经扩散通道113进入容纳腔111而导致容纳腔111内的元器件被污染的情况,在一些实施方式中,扩散通道113具有周壁,该周壁能够隔断容纳腔111与扩散通道113,从而阻隔了异物经扩散通道113进入容纳腔111的路径,而周壁设有多个第二气孔,各第二气孔连通容纳腔111以及扩散通道113,于是等离子体能够经第二气孔流入扩散通道113,又经扩散通道113流出。周壁以及第二气孔的设置在保证了扩散通道113对等离子体的扩散要求的同时有效提升了等离子体修复装置100的安全性以及清洁便捷性。Furthermore, in order to prevent foreign matter from entering the accommodating cavity 111 through the diffusion channel 113 and causing the components in the accommodating cavity 111 to be contaminated, in some embodiments, the diffusion channel 113 has a peripheral wall, which can separate the accommodating cavity 111 from the diffusion channel 113, thereby blocking the path of foreign matter entering the accommodating cavity 111 through the diffusion channel 113, and the peripheral wall is provided with a plurality of second pores, each of which is connected to the accommodating cavity 111 and the diffusion channel 113, so that plasma can flow into the diffusion channel 113 through the second pores and flow out through the diffusion channel 113. The arrangement of the peripheral wall and the second pores effectively improves the safety and cleaning convenience of the plasma repair device 100 while ensuring the diffusion requirements of the diffusion channel 113 for plasma.
更进一步的,外壳110靠近扩散通道113一端的端面具有第二扩散区域,第二扩散区域设有多个第三气孔,至少部分第三气孔连通扩散通道113。具体的,第二扩散区域位于治疗端的端面,在一些实施方式中,各第三气孔均连通扩散通道113,等离子体经第二气孔流入扩散通道113后,部分等离子体能够经第三气孔流至治疗端的端面一侧,另一部分等离子体能够经扩散通道113两端的开口流出。在另一些实施方式中,部分第三气孔连通扩散通道113,另一部分第三气孔连通容纳腔111。第三气孔的设置使得等离子体能够流至治疗端的端面一侧,于是,在等离子体修复装置100逐渐靠近患处的过程中,治疗端的端面一侧的等离子体能够提前对黏膜组织进行消毒杀菌,营造适宜治疗的环境,并且能够对非患处的其他黏膜组织进行预防性的炎症治疗。Furthermore, the end surface of the housing 110 near one end of the diffusion channel 113 has a second diffusion area, and the second diffusion area is provided with a plurality of third pores, and at least some of the third pores are connected to the diffusion channel 113. Specifically, the second diffusion area is located at the end surface of the treatment end. In some embodiments, each third pore is connected to the diffusion channel 113. After the plasma flows into the diffusion channel 113 through the second pores, part of the plasma can flow to one side of the end surface of the treatment end through the third pores, and the other part of the plasma can flow out through the openings at both ends of the diffusion channel 113. In other embodiments, some of the third pores are connected to the diffusion channel 113, and the other part of the third pores are connected to the accommodating cavity 111. The provision of the third pores enables the plasma to flow to one side of the end surface of the treatment end. Therefore, in the process of the plasma repair device 100 gradually approaching the affected area, the plasma on one side of the end surface of the treatment end can disinfect and sterilize the mucosal tissue in advance, create an environment suitable for treatment, and can prevent inflammation treatment for other mucosal tissues other than the affected area.
在一些实施方式中,第一气孔1121、第二气孔以及第三气孔均设置为直径极小的气孔,仅能通过空气分子,并且由于气体始终由容纳腔111经第一气孔1121、第二气孔以及第三气孔向外壳110的周侧流出,于是,第一气孔1121、第二气孔以及第三气孔处始终存在推力,该推力的存在使得异物难以经第一气孔1121、第二气孔以及第三气孔进入容纳腔111,从而进一步保证了等离子体修复装置100的清洁便捷性以及安全性。在另一些方式中,第一气孔1121、第二气孔以及第三气孔与容纳腔111之间设有防护结构,该防护结构配置为仅能供容纳腔111内的气体流出,于是,第一气孔1121、第二气孔以及第三气孔可以设置为尺寸稍大的孔。In some embodiments, the first air hole 1121, the second air hole and the third air hole are all set as air holes with extremely small diameters, which can only pass air molecules, and because the gas always flows out from the accommodating cavity 111 through the first air hole 1121, the second air hole and the third air hole to the peripheral side of the shell 110, there is always a thrust at the first air hole 1121, the second air hole and the third air hole, and the existence of the thrust makes it difficult for foreign matter to enter the accommodating cavity 111 through the first air hole 1121, the second air hole and the third air hole, thereby further ensuring the cleaning convenience and safety of the plasma repair device 100. In other embodiments, a protective structure is provided between the first air hole 1121, the second air hole and the third air hole and the accommodating cavity 111, and the protective structure is configured to only allow the gas in the accommodating cavity 111 to flow out, so the first air hole 1121, the second air hole and the third air hole can be set as holes with slightly larger sizes.
等离子体发生组件能够产生等离子体,为保证流出容纳腔111的等离子体浓度,等离子体发生组件可以设置于第一扩散区域112背离治疗端的一侧。等离子体发生组件包括主体部121以及DBD(Dielectric Barrier Discharge,介质阻挡放电,是有绝缘介质插入放电空间的一种非平衡态气体放电,又称介质阻挡电晕放电或无声放电。工作气压为10~10000Pa,电源频率可从50Hz至1MHz。)电极片,主体部121具有容置空间1211,DBD电极片122容纳于容置空间1211,主体部121能够对DBD电极片122起到支撑作用,使得DBD电极片122能够稳固地容纳于容纳腔111同时增加DBD电极片122与电离气体的接触面积,确保等离子体生成效率。且主体部121设有连通容置空间1211以及容纳腔111的避让孔1212,DBD电极片122配置为通电能够产生等离子体,DBD电极片122产生的等离子体适于由容置空间1211经避让孔1212流通至容纳腔111。需要说明的是,DBD电极片122可以采用DBD陶瓷电极片,包括但不限于氧化铝陶瓷电极片以及氧化锆陶瓷电极片等。DBD电极片122还可以采用DBD树脂电极片,包括但不限于FR4(Flame-Retardant 4)树脂电极片等。示例性的,DBD电极片122产生等离子体的原理如下(为便于表述,以氧化铝陶瓷电极片为例进行说明):氧化铝陶瓷电极片由两侧的高压金属电极和夹在电极间的氧化铝陶瓷组成,当氧化铝陶瓷电极片通电时,电荷会在陶瓷表面形成电晕放电,电子与气体分子发生碰撞,使气体分子电离成电子和离子,从而形成等离子体。The plasma generating assembly can generate plasma. To ensure the concentration of plasma flowing out of the accommodating cavity 111, the plasma generating assembly can be arranged on the side of the first diffusion region 112 away from the treatment end. The plasma generating assembly includes a main body 121 and a DBD (Dielectric Barrier Discharge, which is a non-equilibrium gas discharge with an insulating medium inserted into the discharge space, also known as dielectric barrier corona discharge or silent discharge. The working gas pressure is 10 to 10000 Pa, and the power supply frequency can be from 50 Hz to 1 MHz.) electrode sheet. The main body 121 has an accommodating space 1211, and the DBD electrode sheet 122 is accommodated in the accommodating space 1211. The main body 121 can support the DBD electrode sheet 122, so that the DBD electrode sheet 122 can be stably accommodated in the accommodating cavity 111 while increasing the contact area between the DBD electrode sheet 122 and the ionized gas, thereby ensuring the plasma generation efficiency. The main body 121 is provided with an avoidance hole 1212 connecting the accommodating space 1211 and the accommodating cavity 111. The DBD electrode sheet 122 is configured to generate plasma when energized. The plasma generated by the DBD electrode sheet 122 is suitable for flowing from the accommodating space 1211 to the accommodating cavity 111 through the avoidance hole 1212. It should be noted that the DBD electrode sheet 122 can be a DBD ceramic electrode sheet, including but not limited to an alumina ceramic electrode sheet and a zirconium oxide ceramic electrode sheet. The DBD electrode sheet 122 can also be a DBD resin electrode sheet, including but not limited to FR4 (Flame-Retardant 4) resin electrode sheet. Exemplarily, the principle of the DBD electrode sheet 122 generating plasma is as follows (for ease of description, the alumina ceramic electrode sheet is used as an example): the alumina ceramic electrode sheet is composed of high-voltage metal electrodes on both sides and alumina ceramics sandwiched between the electrodes. When the alumina ceramic electrode sheet is energized, the charge will form a corona discharge on the ceramic surface, and the electrons will collide with the gas molecules, so that the gas molecules are ionized into electrons and ions, thereby forming plasma.
具体的,等离子体发生组件包括导电线,主体部121设有通孔1213,且通孔1213连通容置空间1211,导电线配置为能够穿设于通孔1213并电连接DBD电极片122和/或射频电极130。通孔1213的设置能够对导电线进行有效收纳,于是,等离子体发生组件在安装于容纳腔111的过程中不会受导电线的干扰从而能够顺畅的安装于容纳腔111。此外,等离子体修复装置100在运输过程中或使用过程中即使受到外部因素影响而发生振动或晃动时,由于导电线收纳于通孔1213,于是,有效避免了导电线对容纳腔111内的其他元器件造成干扰。Specifically, the plasma generating assembly includes a conductive wire, the main body 121 is provided with a through hole 1213, and the through hole 1213 is connected to the accommodating space 1211, and the conductive wire is configured to be able to pass through the through hole 1213 and electrically connect the DBD electrode sheet 122 and/or the RF electrode 130. The provision of the through hole 1213 can effectively accommodate the conductive wire, so that the plasma generating assembly will not be disturbed by the conductive wire during the installation process in the accommodating cavity 111, and can be smoothly installed in the accommodating cavity 111. In addition, even if the plasma repair device 100 is affected by external factors and vibrates or shakes during transportation or use, since the conductive wire is accommodated in the through hole 1213, the conductive wire is effectively prevented from interfering with other components in the accommodating cavity 111.
主体部121包括第一支架1214以及第二支架1215,第一支架1214与第二支架1215配置为能够彼此扣合并共同限定出容置空间1211,第一支架1214靠近容置空间1211的一侧设有第一安装槽12141,第二支架1215靠近容置空间1211的一侧设有第二安装槽12151,第二安装槽12151配置为能够与第一安装槽12141连通,DBD电极片122卡设于第一安装槽12141以及第二安装槽12151。第一支架1214与第二支架1215的设置有利于DBD电极片122与主体部121的组装,避免DBD电极片122在组装过程中被损毁。第一安装槽12141以及第二安装槽12151的设置有利于对DBD电极片122有效固定并限位,避免等离子体修复装置100在外部因素影响产生晃动或振动时,DBD电极片122振动或晃动而导致DBD电极片122被损毁甚至脱落主体部121等情况,有效提高了等离子体修复装置100的安全性。The main body 121 includes a first bracket 1214 and a second bracket 1215. The first bracket 1214 and the second bracket 1215 are configured to be able to buckle with each other and jointly define a receiving space 1211. A first mounting groove 12141 is provided on a side of the first bracket 1214 close to the receiving space 1211, and a second mounting groove 12151 is provided on a side of the second bracket 1215 close to the receiving space 1211. The second mounting groove 12151 is configured to be able to communicate with the first mounting groove 12141. The DBD electrode sheet 122 is clamped in the first mounting groove 12141 and the second mounting groove 12151. The provision of the first bracket 1214 and the second bracket 1215 facilitates the assembly of the DBD electrode sheet 122 and the main body 121, and prevents the DBD electrode sheet 122 from being damaged during the assembly process. The provision of the first mounting groove 12141 and the second mounting groove 12151 is beneficial to effectively fix and limit the DBD electrode sheet 122, thereby preventing the DBD electrode sheet 122 from vibrating or shaking and causing the DBD electrode sheet 122 to be damaged or even fall off the main body 121 when the plasma repair device 100 is shaken or vibrated due to external factors, thereby effectively improving the safety of the plasma repair device 100.
为提高等离子体生成效率,确保治疗过程的顺畅以及效率,请参阅图4,等离子体修复装置100包括多个间隔布置的DBD电极片122,并且避让孔1212布置于相邻DBD电极片122之间,于是,相邻DBD电极片122产生的等离子体能够经避让孔1212及时流出容置空间1211,以便新的电离气体能够作用于DBD电极片122。In order to improve the plasma generation efficiency and ensure the smoothness and efficiency of the treatment process, please refer to Figure 4. The plasma repair device 100 includes a plurality of DBD electrode sheets 122 arranged at intervals, and the avoidance holes 1212 are arranged between adjacent DBD electrode sheets 122. Therefore, the plasma generated by the adjacent DBD electrode sheets 122 can flow out of the accommodating space 1211 through the avoidance holes 1212 in time, so that new ionized gas can act on the DBD electrode sheets 122.
为提高等离子体发生组件与外壳110的连接稳固性,请参阅图4和图5,第一支架1214背离容置空间1211的一侧设有第一销槽12142,第二支架1215背离容置空间1211的一侧设有第二销槽12152,外壳110靠近容纳腔111的一侧设有卡接凸起114,卡接凸起114配置为能够卡设于第一销槽12142以及第二销槽12152。In order to improve the connection stability between the plasma generating assembly and the shell 110, please refer to Figures 4 and 5. A first pin groove 12142 is provided on the side of the first bracket 1214 away from the accommodating space 1211, and a second pin groove 12152 is provided on the side of the second bracket 1215 away from the accommodating space 1211. A snap-fit protrusion 114 is provided on the side of the shell 110 close to the accommodating cavity 111, and the snap-fit protrusion 114 is configured to be snapped in the first pin groove 12142 and the second pin groove 12152.
在一些实施方式中,第一支架1214设有通孔1213,该通孔1213连通第一安装槽12141,导电线能够穿设于该通孔1213并电连接于DBD电极片122。在另一些实施方式中,第二支架1215设有通孔1213,通孔1213连通第二安装槽12151,于是导电线能够穿设于该通孔1213并电连接于DBD电极片122。在又一些实施方式中,第一支架1214以及第二支架1215均设有通孔1213,并且第一支架1214的通孔1213连通第一安装槽12141,第二支架1215的通孔1213连通第二安装槽12151,可以通过第一支架1214的通孔1213容纳导电线以电连接多个DBD电极片122中的几个DBD电极片122,第二支架1215的通孔1213容纳额外的导电线以电连接余下的DBD电极片122或电连接射频电极130。In some embodiments, the first bracket 1214 is provided with a through hole 1213, which is connected to the first mounting groove 12141, and the conductive wire can be passed through the through hole 1213 and electrically connected to the DBD electrode sheet 122. In other embodiments, the second bracket 1215 is provided with a through hole 1213, which is connected to the second mounting groove 12151, so that the conductive wire can be passed through the through hole 1213 and electrically connected to the DBD electrode sheet 122. In some other embodiments, the first bracket 1214 and the second bracket 1215 are both provided with a through hole 1213, and the through hole 1213 of the first bracket 1214 is connected to the first mounting groove 12141, and the through hole 1213 of the second bracket 1215 is connected to the second mounting groove 12151. The through hole 1213 of the first bracket 1214 can be used to accommodate conductive wires to electrically connect several DBD electrode sheets 122 among the multiple DBD electrode sheets 122, and the through hole 1213 of the second bracket 1215 can be used to accommodate additional conductive wires to electrically connect the remaining DBD electrode sheets 122 or to electrically connect the RF electrode 130.
为提升等离子体由容纳腔111排出的效率,请参阅图4,等离子体发生组件还包括扩散件123,扩散组件安装于主体部121,且扩散件123配置为能够使DBD电极片122产生的等离子体扩散并由第一气孔1121流出容纳腔111。具体的,扩散件123包括但不限于风扇,其中扩散件123设置于主体部121远离第一气孔1121的一端,扩撒件能够提升DBD电极片122产生的等离子体经避让孔1212扩散至容纳腔111的效率,从而使得DBD电极片122能够接触于待电离的气体,进而提升等离子体生成效率,并且在扩散件123的作用下,容纳腔111内的等离子体能够充分与气体混合并随气体经第一气孔1121流出容纳腔111。In order to improve the efficiency of plasma discharge from the accommodation chamber 111, please refer to FIG. 4, the plasma generating assembly further includes a diffuser 123, which is mounted on the main body 121, and the diffuser 123 is configured to diffuse the plasma generated by the DBD electrode sheet 122 and flow out of the accommodation chamber 111 through the first air hole 1121. Specifically, the diffuser 123 includes but is not limited to a fan, wherein the diffuser 123 is disposed at one end of the main body 121 away from the first air hole 1121, and the diffuser can improve the efficiency of the plasma generated by the DBD electrode sheet 122 diffusing to the accommodation chamber 111 through the avoidance hole 1212, so that the DBD electrode sheet 122 can contact the gas to be ionized, thereby improving the plasma generation efficiency, and under the action of the diffuser 123, the plasma in the accommodation chamber 111 can be fully mixed with the gas and flow out of the accommodation chamber 111 through the first air hole 1121 with the gas.
请参阅图1和图2,等离子体修复装置100包括治疗部140以及连接于治疗部140一端的控制部150,外壳110、等离子发生组件120以及射频电极130均设于治疗部140。为提升等离子体的利用率,同时确保等离子体的浓度能够达到预期效果,在一些实施方式中,控制部150设有用于调节等离子体发生组件输出参数的第一旋钮151,第一旋钮151配置为能够正转或反转,从而调节等离子体发生组件产生等离子体的效率,进而达到控制等离子体的浓度的效果。为了避免等离子体修复装置100发生突然故障而导致损伤黏膜组织,控制部150还设有用于安全急停的第二旋钮152,以提高等离子体修复装置100的安全性。Referring to FIG. 1 and FIG. 2 , the plasma repair device 100 includes a treatment part 140 and a control part 150 connected to one end of the treatment part 140 , and the housing 110 , the plasma generating assembly 120 and the radio frequency electrode 130 are all arranged in the treatment part 140 . In order to improve the utilization rate of plasma and ensure that the concentration of plasma can achieve the expected effect, in some embodiments, the control part 150 is provided with a first knob 151 for adjusting the output parameters of the plasma generating assembly, and the first knob 151 is configured to be able to rotate forward or reverse, so as to adjust the efficiency of the plasma generating assembly to generate plasma, thereby achieving the effect of controlling the concentration of plasma. In order to avoid sudden failure of the plasma repair device 100 and damage to the mucosal tissue, the control part 150 is also provided with a second knob 152 for safety emergency stop to improve the safety of the plasma repair device 100 .
在一些实施方式中,控制部150设有用于调节射频电极130输出参数的第三旋钮153,第三旋钮153配置为能够调节射频电极130的放电参数,从而调节射频电极130的放电模式,各放电模式可分别对应不同的治疗方法。为便于表述,示例性的,定义射频电极130具有第一放电模式以及第二放电模式,当射频电极130处于第一放电模式时,等离子体修复装置100能够对患处进行功能性电刺激治疗以使新的肌肉群替代或矫正原有肌肉群的功能,即射频电极130释放一定强度的低频脉冲电流通过预先设定的程序刺激目标肌肉的支配神经,诱发肌肉收缩替代或矫正器官及肢体已丧失功能的疗法。当射频电极130处于第二放电模式时,等离子体修复装置100能够对患处进行治疗性电刺激以修复肌肉群的功能,即射频电极130能够释放20-50Hz低频电流刺激特定肌肉群使其抽搐或者收缩,继而达到肌肉群“功能”的修复。于是,本发明提供的等离子体修复装置100能够适用于多种病例的治疗或修复,包括但不限于修复阴道黏膜以及修复盆底肌肉等。In some embodiments, the control unit 150 is provided with a third knob 153 for adjusting the output parameters of the RF electrode 130. The third knob 153 is configured to adjust the discharge parameters of the RF electrode 130, thereby adjusting the discharge mode of the RF electrode 130. Each discharge mode can correspond to a different treatment method. For ease of description, illustratively, the RF electrode 130 is defined as having a first discharge mode and a second discharge mode. When the RF electrode 130 is in the first discharge mode, the plasma repair device 100 can perform functional electrical stimulation treatment on the affected part so that the new muscle group replaces or corrects the function of the original muscle group, that is, the RF electrode 130 releases a low-frequency pulse current of a certain intensity to stimulate the innervating nerve of the target muscle through a pre-set program, and induces muscle contraction to replace or correct the lost function of the organ and limb. When the RF electrode 130 is in the second discharge mode, the plasma repair device 100 can perform therapeutic electrical stimulation on the affected part to repair the function of the muscle group, that is, the RF electrode 130 can release a 20-50Hz low-frequency current to stimulate a specific muscle group to cause it to twitch or contract, thereby achieving the repair of the "function" of the muscle group. Therefore, the plasma repair device 100 provided by the present invention can be applied to the treatment or repair of various cases, including but not limited to repairing vaginal mucosa and repairing pelvic floor muscles.
请参阅图1和图2,控制部150设有用于控制等离子体修复装置100通电或断电的开关154,控制部150还可以设有显示屏155,用户能够通过显示屏155实时获得等离子体修复装置100的各项参数输出情况,以便于及时调整各项参数。Please refer to Figures 1 and 2. The control unit 150 is provided with a switch 154 for controlling the power on or off of the plasma repair device 100. The control unit 150 can also be provided with a display screen 155. The user can obtain the output status of various parameters of the plasma repair device 100 in real time through the display screen 155, so as to adjust the various parameters in time.
控制部150还设有线缆接口156,等离子体修复装置100还包括输入件,该输入件配置为能够连接于线缆接口156并且能够为等离子体修复装置100同时提供电信号及提供待电离气体。需要说明的是,待电离气体包括但不限于惰性气体(氩气、氖气等)、氧气、氮气以及其他气体、混合气体等。控制器设有连通容置空间1211的气流通道,待电离气体经线缆接口156进入气流通道,并在气流通道的引导下流向容置空间1211,于是设于容置空间1211的DBD电极片122能够对待电离气体进行电离而产生等离子体。The control unit 150 is also provided with a cable interface 156, and the plasma repair device 100 also includes an input component, which is configured to be connected to the cable interface 156 and can provide the plasma repair device 100 with an electrical signal and a gas to be ionized at the same time. It should be noted that the gas to be ionized includes but is not limited to inert gas (argon, neon, etc.), oxygen, nitrogen and other gases, mixed gases, etc. The controller is provided with an air flow channel connected to the accommodating space 1211, and the gas to be ionized enters the air flow channel through the cable interface 156 and flows to the accommodating space 1211 under the guidance of the air flow channel, so that the DBD electrode sheet 122 provided in the accommodating space 1211 can ionize the gas to be ionized to generate plasma.
为便于等离子体修复装置100的清洁,在一些实施方式中,控制部150与治疗部140可拆卸的连接,并且,当控制部150安装于治疗部140后,控制部150能够电连接于治疗部140内的射频电极130、等离子体发生组件以及扩散件123等。To facilitate cleaning of the plasma repair device 100, in some embodiments, the control unit 150 is detachably connected to the treatment unit 140, and when the control unit 150 is installed in the treatment unit 140, the control unit 150 can be electrically connected to the RF electrode 130, the plasma generating assembly, the diffuser 123, etc. in the treatment unit 140.
需要说明的是,本发明中经第一气孔1121流出容纳腔111的气体包括但不限于冷大气等离子体(Cold atmospheric plasma,CAP,主要由活性氧(reactive oxygenspecies,ROS)、活性氮(reactive nitrogen species,RNS)等能够实现灭菌、愈合伤口效果的活性物质。等离子体修复装置100通过使用等离子体技术与射频电刺激技术结合治疗阴道的方式,通过设于容纳腔111内的等离子体发生组件产生等离子体,刺激阴道组织内部生理反应,促进细胞再生、胶原蛋白生成从而提高组织紧致度,同时还起到杀菌消毒、治疗炎症的作用。射频电极130释放电流能够激活盆底肌肉,增强肌肉收缩和活力,提高盆底肌肉支撑功能,进一步促进阴道组织的紧致和恢复,同时也起到使老化的私处黏膜剥离并新生,增加自身的胶原、重组受损胶原纤维、弹性纤维的作用。It should be noted that the gas flowing out of the accommodating chamber 111 through the first air hole 1121 in the present invention includes but is not limited to cold atmospheric plasma (CAP, mainly composed of reactive oxygen species (ROS), reactive nitrogen species (RNS) and other active substances that can achieve sterilization and wound healing effects. The plasma repair device 100 combines plasma technology with radio frequency electrical stimulation technology to treat the vagina. The plasma generating assembly disposed in the accommodating chamber 111 generates plasma to stimulate the physiological response inside the vaginal tissue, promote cell regeneration and collagen production, thereby improving tissue firmness, and also plays a role in sterilization and treatment of inflammation. The radio frequency electrode 130 releases electric current to activate the pelvic floor muscles, enhance muscle contraction and vitality, improve the supporting function of the pelvic floor muscles, further promote the firmness and recovery of the vaginal tissue, and also plays a role in peeling off and regenerating the aged private mucosa, increasing its own collagen, and reorganizing damaged collagen fibers and elastic fibers.
需要说明的是,若本发明实施例中有涉及方向性指示(诸如上、下、左、右、前、后……),则该方向性指示仅用于解释在某一特定姿态下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。It should be noted that if the embodiments of the present invention involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture. If the specific posture changes, the directional indication will also change accordingly.
另外,若本发明实施例中有涉及“第一”、“第二”等的描述,则该“第一”、“第二”等的描述仅用于描述目的,而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。另外,若全文中出现的“和/或”、“且/或”或者“及/或”,其含义包括三个并列的方案,以“A和/或B”为例,包括A方案、或B方案、或A和B同时满足的方案。另外,各个实施例之间的技术方案可以相互结合,但是必须是以本领域普通技术人员能够实现为基础,当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在,也不在本发明要求的保护范围之内。In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features limited to "first" and "second" may explicitly or implicitly include at least one of the features. In addition, if "and/or", "and/or" or "and/or" appears in the full text, its meaning includes three parallel schemes. Taking "A and/or B" as an example, it includes scheme A, or scheme B, or a scheme that satisfies both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in the field to implement. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present invention.
以上仅为本发明的优选实施例,并非因此限制本发明的专利范围,凡是在本发明的发明构思下,利用本发明说明书及附图内容所作的等效结构变换,或直接/间接运用在其他相关的技术领域均包括在本发明的专利保护范围内。The above are only preferred embodiments of the present invention, and are not intended to limit the patent scope of the present invention. All equivalent structural changes made using the contents of the present invention's specification and drawings, or directly/indirectly applied in other related technical fields, are included in the patent protection scope of the present invention.
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