CN118858320A - A Micro OLED high-precision mask macro inspection device and its use method - Google Patents
A Micro OLED high-precision mask macro inspection device and its use method Download PDFInfo
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Abstract
本申请提供一种Micro OLED高精度掩模版宏观检查装置及其使用方法,属于掩模版质检设备技术领域,包括由框架与覆盖板拼接形成的长方体结构的检查暗室,覆盖板的顶部一侧设置有过滤组件,框架的内部下方设置有翻转组件,框架的内部上方位置设置有电气组件。上述方案中,通过设置伺服电机一、翻转架一、伺服电机二与翻转架二,丰富掩模版调整的姿态,翻转架一与翻转架二均可提供180°的调节范围,具有灵活的调节效果提高掩膜版宏观检查全面无死角。
The present application provides a Micro OLED high-precision mask macro inspection device and a method of using the same, which belongs to the technical field of mask quality inspection equipment, and includes a rectangular inspection darkroom formed by splicing a frame and a cover plate, a filter component is arranged on one side of the top of the cover plate, a flip component is arranged at the lower part of the frame, and an electrical component is arranged at the upper part of the frame. In the above scheme, by setting servo motor 1, flip frame 1, servo motor 2 and flip frame 2, the postures of mask adjustment are enriched, and flip frame 1 and flip frame 2 can both provide an adjustment range of 180°, with flexible adjustment effect to improve the comprehensiveness of mask macro inspection without dead angles.
Description
技术领域Technical Field
本申请涉及掩模版质检设备技术领域,特别涉及一种Micro OLED高精度掩模版宏观检查装置及其使用方法。The present application relates to the technical field of mask quality inspection equipment, and in particular to a Micro OLED high-precision mask macro inspection device and a method for using the same.
背景技术Background Art
Micro OLED掩模版清洗设备用于去除晶圆蒸镀掩膜版网面可能存在的杂质和膜层材料洗净后再周期重复使用,因而对掩膜版清洗效果有着较高的要求,进而避免杂质影响精密显示屏体良率和产品性能。Micro OLED mask cleaning equipment is used to remove impurities and film materials that may exist on the wafer evaporation mask surface and then reuse it cyclically after cleaning. Therefore, it has high requirements for the mask cleaning effect, thereby preventing impurities from affecting the yield and product performance of precision display screens.
目前,随着微显示产品制造工艺先进程度的持续提升,对晶圆掩膜版表面污染物的控制要求不断提高,现阶段掩膜版在清洗过程中,清洗效果需进行进行检测,常规的AOI微观检测无法检测大面积宏观不良(如水渍、水痕或材料聚集残留)或检出爆量,进而一定程度造成产品不良。At present, with the continuous improvement of the advanced level of micro-display product manufacturing technology, the control requirements for contaminants on the surface of wafer masks are constantly increasing. At this stage, the cleaning effect of the mask needs to be tested during the cleaning process. Conventional AOI micro-inspection cannot detect large-area macro defects (such as water stains, water marks or material accumulation residues) or detect explosions, which will cause product defects to a certain extent.
发明内容Summary of the invention
有鉴于此,本申请的目的是提供一种Micro OLED高精度掩模版宏观检查装置及其使用方法,以全面宏观的检出掩模版不良情况,减少影响产线运营的不良产品。In view of this, the purpose of this application is to provide a Micro OLED high-precision mask macro inspection device and its use method, so as to comprehensively and macroscopically detect defective conditions of the mask and reduce defective products that affect production line operations.
为解决上述技术问题,本申请提供如下技术方案:In order to solve the above technical problems, this application provides the following technical solutions:
一种Micro OLED高精度掩模版宏观检查装置,包括由框架与覆盖板拼接形成的长方体结构的检查暗室,所述覆盖板的顶部一侧设置有过滤组件,所述框架的内部下方设置有翻转组件,所述框架的内部上方位置设置有电气组件;A Micro OLED high-precision mask macro inspection device, comprising an inspection darkroom of a rectangular structure formed by splicing a frame and a cover plate, a filter component is arranged on one side of the top of the cover plate, a flip component is arranged at the lower part of the frame, and an electrical component is arranged at the upper part of the frame;
所述过滤组件包括安装于覆盖板开口部位的风机,以及设置于所述风机出风位置的过滤盒;The filter assembly includes a fan installed at the opening of the cover plate, and a filter box arranged at the air outlet position of the fan;
所述翻转组件包括安装于框架内部右侧的机架,所述机架的一侧固定连接有伺服电机一,所述伺服电机一的输出端固定连接有翻转架一,所述翻转架一的侧壁固定连接有伺服电机二,所述伺服电机二的输出端固定连接有翻转架二;The flip assembly includes a frame installed on the right side of the frame, one side of the frame is fixedly connected to a servo motor 1, the output end of the servo motor 1 is fixedly connected to a flip frame 1, the side wall of the flip frame 1 is fixedly connected to a servo motor 2, and the output end of the servo motor 2 is fixedly connected to a flip frame 2;
所述翻转架二的开口部位设置有滑轨,所述滑轨的内部设置有可滑动的滑块,所述滑块的顶部连接有电动推杆,所述电动推杆的伸缩端固定连接有夹块,所述夹块侧壁设置有三个连续的台阶;The opening of the second flip frame is provided with a slide rail, a slidable slider is provided inside the slide rail, an electric push rod is connected to the top of the slider, a clamping block is fixedly connected to the telescopic end of the electric push rod, and three continuous steps are provided on the side wall of the clamping block;
所述电气组件包括设置于框架内部左上角的安装架,所述安装架的底部固定连接有光源控制器,所述安装架的侧壁设置有位于翻转架一上方的光源一,所述光源一的一侧设置有光源二;The electrical component includes a mounting frame arranged at the upper left corner of the frame, a light source controller is fixedly connected to the bottom of the mounting frame, a light source 1 located above the flip frame 1 is arranged on the side wall of the mounting frame, and a light source 2 is arranged on one side of the light source 1;
所述框架的竖直部位由挡板覆盖,所述挡板的右侧设置有控制屏幕,所述控制屏幕的背面连接有光学检测相机。The vertical part of the frame is covered by a baffle, a control screen is arranged on the right side of the baffle, and an optical detection camera is connected to the back side of the control screen.
优选的,所述滑轨的端部设置有伺服电机三,所述伺服电机三的输出端固定连接有丝杆,所述丝杆贯穿滑块设置。Preferably, a servo motor three is arranged at the end of the slide rail, and a lead screw is fixedly connected to the output end of the servo motor three, and the lead screw runs through the slide block.
优选的,所述夹块包括一个覆盖于电动推杆顶部的台阶一,以及位于台阶一一侧的台阶二以及位于台阶二下方的台阶三;Preferably, the clamping block includes a step 1 covering the top of the electric push rod, a step 2 located on one side of the step 1, and a step 3 located below the step 2;
两个相对的所述台阶三之间连接有托板。A supporting plate is connected between two opposite steps three.
优选的,所述台阶一以及台阶二上均设置有限位块,所述限位块包括一个朝向翻转架二中心点的直角内角。Preferably, a limit block is provided on both the first step and the second step, and the limit block includes a right-angled inner angle facing the center point of the second flip frame.
优选的,所述光源一为UV光源,光源波长优选365nm,紫外光强度优选≥72000μw/cm2,亮度0-100%可任意调节,光亮均一性≥95%,优选配置自动对焦。Preferably, the light source is a UV light source, the wavelength of the light source is preferably 365nm, the ultraviolet light intensity is preferably ≥72000μw/cm2, the brightness can be adjusted arbitrarily from 0-100%, the brightness uniformity is ≥95%, and autofocus is preferably configured.
优选的,所述光源二为LED白光源,光源亮度≥2000lm,亮度0-100%可任意调节,光亮均一性≥95%。Preferably, the second light source is an LED white light source, the light source brightness is ≥2000lm, the brightness can be adjusted arbitrarily from 0 to 100%, and the brightness uniformity is ≥95%.
优选的,所述光学检测相机安装高度与光源一的安装高度一致。Preferably, the installation height of the optical detection camera is consistent with the installation height of light source one.
优选的,所述风机设置于翻转架一的正上方。Preferably, the fan is arranged directly above the first turning frame.
优选的,所述框架的底部设置有镂空的导流板。Preferably, a hollow guide plate is provided at the bottom of the frame.
本申请另一方面提供一种Micro OLED高精度掩模版宏观检查装置的使用方法:On the other hand, the present application provides a method for using a Micro OLED high-precision mask macro inspection device:
S1:根据掩模版的尺寸大小,将其放置于夹块上,通过电动推杆提供夹持力,以达到对掩模版的固定;S1: According to the size of the mask, place it on the clamping block, and use the electric push rod to provide clamping force to fix the mask;
S2:通过伺服电机一带动翻转架一翻转至合适角度,调整掩模版姿态;S2: The servo motor drives the flip frame to flip to a suitable angle to adjust the mask posture;
S3:通过伺服电机二带动翻转架二翻转至合适角度,调整掩模版姿态:S3: Use servo motor 2 to drive flip frame 2 to flip to a suitable angle and adjust the mask posture:
S4:通过光源控制器开启光源一以及光源二,设定光源类型,功率占比;S4: Turn on light source 1 and light source 2 through the light source controller, set the light source type and power ratio;
S5:通过光学检测相机对掩模版进行检查,拍照记录图像呈现在不同视角的影响区域,对比图详库,标定掩模版检查结果。S5: Inspect the mask using an optical inspection camera, take photos to record images of the affected area at different viewing angles, compare with the detailed image library, and calibrate the mask inspection results.
本申请与现有技术相比,至少具有如下有益效果:Compared with the prior art, this application has at least the following beneficial effects:
上述方案中,通过设置伺服电机一、翻转架一、伺服电机二与翻转架二,丰富掩模版调整的姿态,翻转架一与翻转架二均可提供180°的调节范围,具有灵活的调节效果提高掩膜版宏观检查全面无死角。In the above scheme, by setting servo motor 1, flip frame 1, servo motor 2 and flip frame 2, the posture of mask adjustment is enriched. Both flip frame 1 and flip frame 2 can provide an adjustment range of 180°, with flexible adjustment effect to improve the comprehensiveness of mask macro inspection without blind spots.
通过设置伺服电机三、滑轨、滑块与丝杆,丝杆两端分别设置有对称的两段螺纹,通过伺服电机三的正转与反转,调节两个滑块之间的距离,进一步适配对不同尺寸掩模版的固定需要。By setting up servo motor three, slide rails, sliders and screw rods, two symmetrical threads are set at both ends of the screw rod. The distance between the two sliders is adjusted by the forward and reverse rotation of servo motor three to further adapt to the fixing needs of mask plates of different sizes.
通过设置夹块、台阶一、台阶二与台阶三,能够良好的适配掩模版的尺寸大小,充分利用翻转架二内部的空间,能够兼容多种尺寸的掩模版,提高产线效率。By arranging the clamping block, step one, step two and step three, the size of the mask can be well adapted, the space inside the flip frame two is fully utilized, and it can be compatible with masks of various sizes, thereby improving the efficiency of the production line.
通过设置光源一与光源二,丰富光源类型,提高检查效率,降低漏检风险,提高检测准确性,降低复盘运营成本,有效拦截不良掩膜版。By setting light source one and light source two, we can enrich the types of light sources, improve inspection efficiency, reduce the risk of missed detection, improve detection accuracy, reduce the cost of review operations, and effectively intercept defective masks.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
并入本文中并且构成说明书的部分的附图示出了本公开的实施例,并且与说明书一起进一步用来对本公开的原理进行解释,并且使相关领域技术人员能够实施和使用本公开。The accompanying drawings, which are incorporated herein and constitute a part of the specification, illustrate embodiments of the present disclosure and, together with the description, further serve to explain the principles of the present disclosure and to enable those skilled in the relevant art to make and use the present disclosure.
图1为本申请中整体结构示意图;FIG1 is a schematic diagram of the overall structure of the present application;
图2为本申请中框架结构示意图;FIG2 is a schematic diagram of the framework structure in this application;
图3为本申请中翻转架一结构示意图;FIG3 is a schematic diagram of the structure of a flip frame in the present application;
图4为本申请中光学检测相机位置示意图;FIG4 is a schematic diagram of the position of the optical detection camera in this application;
图5为本申请中夹块结构示意图;FIG5 is a schematic diagram of the clamping block structure in this application;
图6为本申请中风机结构示意图;FIG6 is a schematic diagram of the fan structure in this application;
图7为本申请中托板结构示意图。FIG. 7 is a schematic diagram of the support plate structure in this application.
[附图标记][Reference Signs]
1、框架;101、挡板;102、导流板;2、覆盖板;3、风机;301、过滤盒;4、机架;401、伺服电机一;402、翻转架一;403、伺服电机二;404、翻转架二;5、滑轨;501、滑块;502、电动推杆;503、伺服电机三;504、丝杆;6、夹块;601、台阶一;602、台阶二;603、台阶三;604、托板;605、限位块;7、安装架;701、光源控制器;702、光源一;703、光源二;8、控制屏幕;9、光学检测相机。1. Frame; 101. Baffle; 102. Guide plate; 2. Cover plate; 3. Fan; 301. Filter box; 4. Rack; 401. Servo motor one; 402. Turn frame one; 403. Servo motor two; 404. Turn frame two; 5. Slide rail; 501. Slider; 502. Electric push rod; 503. Servo motor three; 504. Screw; 6. Clamp; 601. Step one; 602. Step two; 603. Step three; 604. Support plate; 605. Limit block; 7. Mounting frame; 701. Light source controller; 702. Light source one; 703. Light source two; 8. Control screen; 9. Optical detection camera.
具体实施方式DETAILED DESCRIPTION
下面结合附图和具体实施例对本申请提供的一种Micro OLED高精度掩模版宏观检查装置及其使用方法进行详细描述。同时在这里做以说明的是,为了使实施例更加详尽,下面的实施例为最佳、优选实施例,对于一些公知技术本领域技术人员也可采用其他替代方式而进行实施;而且附图部分仅是为了更具体的描述实施例,而并不旨在对本申请进行具体的限定。The following is a detailed description of a Micro OLED high-precision mask macro inspection device and its use method provided by the present application in combination with the accompanying drawings and specific embodiments. At the same time, it is explained here that in order to make the embodiments more detailed, the following embodiments are the best and preferred embodiments, and those skilled in the art may also adopt other alternative methods to implement some known technologies; and the accompanying drawings are only for a more specific description of the embodiments, and are not intended to specifically limit the present application.
如图1-图7所示的一种Micro OLED高精度掩模版宏观检查装置,本申请的实施例提供,包括由框架1与覆盖板2拼接形成的长方体结构的检查暗室,覆盖板2的顶部一侧设置有过滤组件,框架1的内部下方设置有翻转组件,框架1的内部上方位置设置有电气组件;A Micro OLED high-precision mask macro inspection device as shown in FIG. 1 to FIG. 7 , the embodiment of the present application provides an inspection darkroom having a rectangular structure formed by splicing a frame 1 and a cover plate 2, a filter component is provided on one side of the top of the cover plate 2, a flip component is provided at the lower part of the frame 1, and an electrical component is provided at the upper part of the frame 1;
过滤组件包括安装于覆盖板2开口部位的风机3,以及设置于风机3出风位置的过滤盒301;The filter assembly includes a fan 3 installed at the opening of the cover plate 2, and a filter box 301 arranged at the air outlet position of the fan 3;
翻转组件包括安装于框架1内部右侧的机架4,机架4的一侧固定连接有伺服电机一401,伺服电机一401的输出端固定连接有翻转架一402,翻转架一402的侧壁固定连接有伺服电机二403,伺服电机二403的输出端固定连接有翻转架二404;The flip assembly includes a frame 4 installed on the right side of the frame 1, a servo motor 401 is fixedly connected to one side of the frame 4, an output end of the servo motor 401 is fixedly connected to a flip frame 402, a servo motor 403 is fixedly connected to the side wall of the flip frame 402, and an output end of the servo motor 403 is fixedly connected to a flip frame 404;
翻转架二404的开口部位设置有滑轨5,滑轨5的内部设置有可滑动的滑块501,滑块501的顶部连接有电动推杆502,电动推杆502的伸缩端固定连接有夹块6,夹块6侧壁设置有三个连续的台阶;The opening of the second flip frame 404 is provided with a slide rail 5, a slidable slider 501 is provided inside the slide rail 5, the top of the slider 501 is connected with an electric push rod 502, the telescopic end of the electric push rod 502 is fixedly connected with a clamping block 6, and the side wall of the clamping block 6 is provided with three continuous steps;
电气组件包括设置于框架1内部左上角的安装架7,安装架7的底部固定连接有光源控制器701,安装架7的侧壁设置有位于翻转架一402上方的光源一702,光源一702的一侧设置有光源二703;The electrical assembly includes a mounting frame 7 disposed at the upper left corner of the frame 1, a light source controller 701 is fixedly connected to the bottom of the mounting frame 7, a light source 1 702 located above the flip frame 1 402 is disposed on the side wall of the mounting frame 7, and a light source 2 703 is disposed on one side of the light source 1 702;
框架1的竖直部位由挡板101覆盖,挡板101的右侧设置有控制屏幕8,控制屏幕8的背面连接有光学检测相机9;The vertical part of the frame 1 is covered by a baffle 101, a control screen 8 is arranged on the right side of the baffle 101, and an optical detection camera 9 is connected to the back of the control screen 8;
在实际使用过程中,根据掩模版尺寸大小,选择将其放置于夹块6上合适的台阶上,通过台阶对掩模版进行支撑,通过电动推杆502带动夹块6移动,对侧的两个夹块6相互靠近,以达到夹块6稳定夹持掩模版的效果,三个台阶分别对应三种不同尺寸的掩模版,以使装置整体具有良好的使用灵活性;In actual use, according to the size of the mask, it is placed on a suitable step on the clamping block 6, the mask is supported by the step, the clamping block 6 is driven to move by the electric push rod 502, and the two clamping blocks 6 on the opposite sides are close to each other, so that the clamping block 6 can stably clamp the mask. The three steps correspond to the masks of three different sizes, so that the device as a whole has good flexibility in use.
通过带刹车的伺服电机一401带动翻转架一402转动,调整掩模版的位置以及姿态,进一步的也可通过带刹车的伺服电机二403带动翻转架二404转动,丰富掩模版调整的姿态,翻转架一402与翻转架二404均可提供180°的调节范围,具有灵活的调节效果;The servo motor 1 401 with a brake drives the flip frame 1 402 to rotate, and the position and posture of the mask are adjusted. Further, the servo motor 2 403 with a brake drives the flip frame 2 404 to rotate, and the posture of the mask adjustment is enriched. The flip frame 1 402 and the flip frame 2 404 can both provide an adjustment range of 180°, and have a flexible adjustment effect.
其中,电动推杆502控制夹块6的位置,以从长度方向调节掩模版的位置,而滑块501于滑轨5内部的滑动,可从宽度方向调节掩模版的位置,进一步提高对掩模版的位置调节的灵活性;The electric push rod 502 controls the position of the clamping block 6 to adjust the position of the mask from the length direction, and the sliding block 501 slides inside the slide rail 5 to adjust the position of the mask from the width direction, further improving the flexibility of adjusting the position of the mask.
通过光源控制器701开启光源一702以及光源二703,设定光源类型,功率占比,The light source controller 701 turns on the light source 1 702 and the light source 2 703, sets the light source type and power ratio,
通过光学检测相机9对掩模版进行检查,拍照记录图像呈现在不同视角的影响区域,对比图详库,标定掩模版检查结果,达到对掩模版的宏观检查目的,减少产线运营的不良产品。The mask is inspected by the optical inspection camera 9, and images are recorded in the affected areas at different viewing angles. The inspection results of the mask are calibrated by comparing the detailed image library, so as to achieve the purpose of macroscopic inspection of the mask and reduce defective products in production line operation.
本实施例中,如图3与图6所示:滑轨5的端部设置有伺服电机三503,伺服电机三503的输出端固定连接有丝杆504,丝杆504贯穿滑块501设置;In this embodiment, as shown in FIG. 3 and FIG. 6 , a servo motor 3 503 is disposed at the end of the slide rail 5 , and a screw rod 504 is fixedly connected to the output end of the servo motor 3 503 , and the screw rod 504 is disposed through the slider 501 ;
通过伺服电机三503带动丝杆504转动,以调节滑块501的位置,丝杆504两端分别设置有对称的两段螺纹,通过伺服电机三503的正转与反转,调节两个滑块501之间的距离,进一步适配对不同尺寸掩模版的固定需要。The screw rod 504 is driven to rotate by the servo motor 503 to adjust the position of the slider 501. Two symmetrical threads are provided at both ends of the screw rod 504. The distance between the two sliders 501 is adjusted by the forward and reverse rotation of the servo motor 503 to further adapt to the fixing needs of mask plates of different sizes.
如图5与图7所示,夹块6包括一个覆盖于电动推杆502顶部的台阶一601,以及位于台阶一601一侧的台阶二602以及位于台阶二602下方的台阶三603;As shown in FIG. 5 and FIG. 7 , the clamping block 6 includes a step 1 601 covering the top of the electric push rod 502 , a step 2 602 located on one side of the step 1 601 , and a step 3 603 located below the step 2 602 ;
两个相对的台阶三603之间连接有托板604;A support plate 604 is connected between two opposite steps 603;
台阶一601、台阶二602以及台阶三603的设置,能够良好的适配掩模版的尺寸大小,充分利用翻转架二404内部的空间,能够兼容多种尺寸的掩模版,提高产线效率;The arrangement of step 1 601, step 2 602 and step 3 603 can well adapt to the size of the mask, fully utilize the space inside the flip frame 2 404, can be compatible with masks of various sizes, and improve the production line efficiency;
通过设置托板604以防止掩模版掉落的情况。The support plate 604 is provided to prevent the mask from falling.
如图5与图7所示,台阶一601以及台阶二602上均设置有限位块605,限位块605包括一个朝向翻转架二404中心点的直角内角;As shown in FIG. 5 and FIG. 7 , a limit block 605 is disposed on both the step 1 601 and the step 2 602 , and the limit block 605 includes a right-angled inner angle toward the center point of the flip frame 2 404 ;
台阶一601以及台阶二602上的限位块605能够有效的起到限位作用,进一步减少掩模版滑落的情况。The limiting blocks 605 on the step 1 601 and the step 2 602 can effectively play a limiting role, further reducing the situation where the mask plate slides off.
如图2所示,光源一702为UV光源,光源波长优选365nm,紫外光强度优选≥72000μw/cm2,亮度0-100%可任意调节,光亮均一性≥95%,优选配置自动对焦;As shown in FIG. 2 , light source 1 702 is a UV light source, the wavelength of the light source is preferably 365 nm, the ultraviolet light intensity is preferably ≥ 72000 μw/cm2, the brightness can be adjusted arbitrarily from 0 to 100%, the brightness uniformity is ≥ 95%, and auto focus is preferably configured;
光源二703为LED白光源,光源亮度≥2000lm,亮度0-100%可任意调节,光亮均一性≥95%;Light source 2 703 is LED white light source, light source brightness ≥ 2000lm, brightness 0-100% can be adjusted arbitrarily, brightness uniformity ≥ 95%;
通过光源一702以及光源二703的配合,丰富光源类型,提高检查效率。Through the cooperation of light source 1 702 and light source 2 703, the types of light sources are enriched and the inspection efficiency is improved.
如图1所示,光学检测相机9安装高度与光源一702的安装高度一致;As shown in FIG1 , the installation height of the optical detection camera 9 is consistent with the installation height of the light source 1 702;
以防止光学检测相机9对光源一702以及光源二703的干扰,同时保证良好的成像质量,达到良好的检查效果。This is to prevent the optical detection camera 9 from interfering with the light source 1 702 and the light source 2 703, while ensuring good imaging quality and achieving good inspection results.
如图1与图2所示,风机3设置于翻转架一402的正上方;As shown in FIG. 1 and FIG. 2 , the fan 3 is disposed directly above the flip frame 1 402;
风机3能够为检查暗室中创造正压环境,以减少外界灰尘进入,配合过滤盒301能够有效控制检查暗室中的灰尘数量,减少灰尘对掩模版的影响,提高良品率。The fan 3 can create a positive pressure environment in the inspection darkroom to reduce the entry of external dust. Together with the filter box 301, it can effectively control the amount of dust in the inspection darkroom, reduce the impact of dust on the mask, and improve the yield rate.
如图2所示,框架1的底部设置有镂空的导流板102;As shown in FIG2 , a hollow guide plate 102 is provided at the bottom of the frame 1;
覆盖板2、挡板101以及导流板102封闭了框架1的镂空部位,以保障检查暗室的独立性,减少外部环境对宏观检查过程的干扰,保证检查暗室的洁净。The cover plate 2, the baffle plate 101 and the guide plate 102 close the hollow part of the frame 1 to ensure the independence of the inspection darkroom, reduce the interference of the external environment on the macro inspection process, and ensure the cleanliness of the inspection darkroom.
进一步的,进一步的,一种Micro OLED高精度掩模版宏观检查装置,使用步骤如下:Furthermore, a Micro OLED high-precision mask macro inspection device is used in the following steps:
S1:根据掩模版的尺寸大小,将其放置于夹块6上,通过电动推杆502提供夹持力,以达到对掩模版的固定;S1: according to the size of the mask, place it on the clamping block 6, and use the electric push rod 502 to provide a clamping force to fix the mask;
S2:通过伺服电机一401带动翻转架一402翻转至合适角度,调整掩模版姿态;S2: The servo motor 401 drives the flip frame 402 to flip to a suitable angle to adjust the mask posture;
S3:通过伺服电机二403带动翻转架二404翻转至合适角度,调整掩模版姿态:S3: The servo motor 403 drives the flip frame 404 to flip to a suitable angle, and adjusts the mask posture:
S4:通过光源控制器701开启光源一702以及光源二703,设定光源类型,功率占比;S4: Turn on the light source 1 702 and the light source 2 703 through the light source controller 701, and set the light source type and power ratio;
S5:通过光学检测相机9对掩模版进行检查,拍照记录图像呈现在不同视角的影响区域,对比图详库,标定掩模版检查结果。S5: Inspect the mask by using the optical inspection camera 9, take photos to record images of the affected area at different viewing angles, compare with the detailed image library, and calibrate the mask inspection result.
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