CN118814135A - A device for forming a silicon carbide coating on the surface of a graphite product - Google Patents
A device for forming a silicon carbide coating on the surface of a graphite product Download PDFInfo
- Publication number
- CN118814135A CN118814135A CN202411290273.4A CN202411290273A CN118814135A CN 118814135 A CN118814135 A CN 118814135A CN 202411290273 A CN202411290273 A CN 202411290273A CN 118814135 A CN118814135 A CN 118814135A
- Authority
- CN
- China
- Prior art keywords
- silicon carbide
- graphite product
- carbide coating
- plate
- graphite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 110
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 109
- 239000010439 graphite Substances 0.000 title claims abstract description 109
- 238000000576 coating method Methods 0.000 title claims abstract description 58
- 239000011248 coating agent Substances 0.000 title claims abstract description 55
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 51
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 51
- 239000012495 reaction gas Substances 0.000 claims abstract description 47
- 230000005540 biological transmission Effects 0.000 claims abstract description 7
- 239000007789 gas Substances 0.000 claims description 36
- 230000000903 blocking effect Effects 0.000 claims description 7
- 239000011229 interlayer Substances 0.000 claims 3
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 230000033001 locomotion Effects 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 2
- 238000004381 surface treatment Methods 0.000 abstract description 2
- 238000005192 partition Methods 0.000 description 15
- 238000005516 engineering process Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 1
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 1
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 1
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 1
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
Landscapes
- Carbon And Carbon Compounds (AREA)
Abstract
Description
技术领域Technical Field
本发明涉及材料表面处理技术领域,尤其涉及一种用于石墨制品表面形成碳化硅涂层的设备。The invention relates to the technical field of material surface treatment, and in particular to a device for forming a silicon carbide coating on the surface of a graphite product.
背景技术Background Art
随着科技的不断发展,石墨制品在众多领域中得到了广泛应用,如冶金、化工、电子等,然而,石墨制品在某些特定环境下存在一些不足之处,例如抗氧化性差、耐磨性不足等,为了提高石墨制品的性能和使用寿命,在其表面形成碳化硅涂层成为一种有效的解决方案。With the continuous development of science and technology, graphite products have been widely used in many fields, such as metallurgy, chemical industry, electronics, etc. However, graphite products have some shortcomings in certain specific environments, such as poor oxidation resistance and insufficient wear resistance. In order to improve the performance and service life of graphite products, forming a silicon carbide coating on its surface has become an effective solution.
立式沉积炉是一种利用化学气相沉积法制备涂层的设备,一般由炉体、底座和位于炉体内部用于放置工件的架体组成,炉体和底座之间为可拆卸式连接,通过使炉体和底座分离实现工件的放置与取出,使用时工件放置于架体上,然后将含有硅和碳的反应气体引入炉体内部,在一定的温度和压力条件下,使气体发生化学反应并在石墨制品表面沉积形成碳化硅涂层。A vertical deposition furnace is a device that uses chemical vapor deposition to prepare coatings. It is generally composed of a furnace body, a base, and a frame inside the furnace body for placing workpieces. The furnace body and the base are detachably connected, and the placement and removal of workpieces are achieved by separating the furnace body and the base. When in use, the workpiece is placed on the frame, and then the reaction gas containing silicon and carbon is introduced into the furnace body. Under certain temperature and pressure conditions, the gas undergoes a chemical reaction and is deposited on the surface of the graphite product to form a silicon carbide coating.
传统的立式沉积炉在对开设有贯穿孔的石墨制品制备碳化硅涂层时,由于石墨制品上的孔洞狭小,相较于在石墨制品周围流动,反应气体穿过孔洞会受到更大的阻力,因此反应气体难以进入孔洞内部,导致石墨制品的孔洞内壁上形成碳化硅涂层厚度显著小于石墨制品外表面的碳化硅涂层厚度,使得石墨制品上的碳化硅涂层厚度不均,降低了工件的涂层制备效果。When a traditional vertical deposition furnace is used to prepare a silicon carbide coating on a graphite product with through holes, the holes on the graphite product are narrow and the reaction gas encounters greater resistance when passing through the holes than when flowing around the graphite product. Therefore, it is difficult for the reaction gas to enter the holes, resulting in the silicon carbide coating thickness formed on the inner wall of the hole of the graphite product being significantly smaller than the silicon carbide coating thickness on the outer surface of the graphite product, making the silicon carbide coating thickness on the graphite product uneven, thereby reducing the coating preparation effect of the workpiece.
发明内容Summary of the invention
本发明的目的在于:为了解决传统的立式沉积炉在对开设有贯穿孔的石墨制品制备碳化硅涂层时,由于石墨制品上的孔洞狭小,相较于在石墨制品周围流动,反应气体穿过孔洞会受到更大的阻力,因此反应气体难以进入孔洞内部,导致石墨制品的孔洞内壁上形成碳化硅涂层厚度显著小于石墨制品外表面的碳化硅涂层厚度的问题,而提出的一种用于石墨制品表面形成碳化硅涂层的设备。The purpose of the present invention is to solve the problem that when a traditional vertical deposition furnace is used to prepare a silicon carbide coating on a graphite product with through holes, due to the narrow holes on the graphite product, the reaction gas will encounter greater resistance when passing through the holes than flowing around the graphite product. Therefore, it is difficult for the reaction gas to enter the holes, resulting in the thickness of the silicon carbide coating formed on the inner wall of the hole of the graphite product being significantly smaller than the thickness of the silicon carbide coating on the outer surface of the graphite product. A device for forming a silicon carbide coating on the surface of a graphite product is proposed.
为了实现上述目的,本发明采用了如下技术一种用于石墨制品表面形成碳化硅涂层的设备:包括底座和放置于底座上的外炉体,所述外炉体的顶部固定安装有输气管,还包括:In order to achieve the above-mentioned purpose, the present invention adopts the following technology: a device for forming a silicon carbide coating on the surface of a graphite product, comprising a base and an outer furnace body placed on the base, a gas delivery pipe is fixedly installed on the top of the outer furnace body, and further comprising:
导气机构,所述导气机构包括与输气管固定连通的连通盒,所述连通盒的顶部设置有进气管;An air guide mechanism, the air guide mechanism comprising a connecting box fixedly connected to the air delivery pipe, and an air inlet pipe is arranged on the top of the connecting box;
传动组件,所述传动组件包括转动连接于连通盒内部的叶轮,所述叶轮的底部固定安装有上部转轴,所述底座上转动连接有开设有连接孔的下部转轴,所述下部转轴和上部转轴的内部分别设置有相连通的出气通道,所述下部转轴上开设有条形槽,所述下部转轴上套接有凸轮件,所述凸轮件的内部滑动连接有嵌入条形槽内部的插销;A transmission assembly, the transmission assembly includes an impeller rotatably connected to the inside of the connecting box, an upper rotating shaft is fixedly installed at the bottom of the impeller, a lower rotating shaft with a connecting hole is rotatably connected to the base, the lower rotating shaft and the upper rotating shaft are respectively provided with connected air outlet channels, a strip groove is provided on the lower rotating shaft, a cam member is sleeved on the lower rotating shaft, and a latch embedded in the strip groove is slidably connected to the inside of the cam member;
控流机构,所述控流机构包括套接于下部转轴上的放置板,所述放置板的内部开设有腔体,所述腔体的底部开设有出气口,所述腔体的内部滑动连接有推板,所述推板和腔体的内壁之间设置有弹簧c,所述放置板的底部固定连接有下部孔板,所述下部孔板内部的孔洞中滚动安装有滚珠,所述下部孔板的内部宽度大于滚珠的半径且小于滚珠的直径;A flow control mechanism, the flow control mechanism comprises a placement plate sleeved on the lower rotating shaft, a cavity is provided inside the placement plate, an air outlet is provided at the bottom of the cavity, a push plate is slidably connected inside the cavity, a spring c is provided between the push plate and the inner wall of the cavity, a lower orifice plate is fixedly connected to the bottom of the placement plate, a ball is rotatably installed in the hole inside the lower orifice plate, and the inner width of the lower orifice plate is greater than the radius of the ball and smaller than the diameter of the ball;
所述下部孔板放置于石墨制品上方后,所述滚珠被石墨制品顶入下部孔板的内部,所述滚珠与下部孔板的孔洞之间产生缝隙,所述推板往复滑动将反应气体吸入腔体中然后使反应气体从出气口中吹出,反应气体经过滚珠与下部孔板孔洞之间的缝隙吹出至石墨制品的孔洞中。After the lower orifice plate is placed above the graphite product, the ball is pushed into the interior of the lower orifice plate by the graphite product, and a gap is generated between the ball and the hole of the lower orifice plate. The push plate slides back and forth to suck the reaction gas into the cavity and then blows the reaction gas out from the gas outlet. The reaction gas is blown into the hole of the graphite product through the gap between the ball and the hole of the lower orifice plate.
作为上述技术一种用于石墨制品表面形成碳化硅涂层的设备的进一步描述:所述放置板的顶部滑动连接有上部孔板,所述上部孔板的底部固定连接有支撑板,所述支撑板贯穿并延伸至腔体的内部,所述推板的顶部倾斜。As a further description of the above technology, a device for forming a silicon carbide coating on the surface of a graphite product is as follows: the top of the placement plate is slidably connected to an upper orifice plate, the bottom of the upper orifice plate is fixedly connected to a support plate, the support plate passes through and extends to the interior of the cavity, and the top of the push plate is inclined.
作为上述技术一种用于石墨制品表面形成碳化硅涂层的设备的进一步描述:所述凸轮件转动连接于放置板的内部,所述推板靠近凸轮件的一侧固定连接有穿过弹簧c的推杆,所述推杆靠近凸轮件的一端转动连接有滚轮。As a further description of the above technology, a device for forming a silicon carbide coating on the surface of a graphite product is as follows: the cam member is rotatably connected to the inside of a placement plate, a push rod passing through a spring c is fixedly connected to one side of the push plate close to the cam member, and a roller is rotatably connected to one end of the push rod close to the cam member.
作为上述技术一种用于石墨制品表面形成碳化硅涂层的设备的进一步描述:所述放置板的底面转动连接有垫片,所述垫片的边沿固定连接有等距圆周排布的叶片,所述叶片位于出气口的正下方。As a further description of the above technology, a device for forming a silicon carbide coating on the surface of a graphite product is as follows: a gasket is rotatably connected to the bottom surface of the placement plate, and blades equidistantly arranged in a circumferential manner are fixedly connected to the edge of the gasket, and the blades are located directly below the air outlet.
作为上述技术一种用于石墨制品表面形成碳化硅涂层的设备的进一步描述:所述外炉体的内部固定连接有内隔层,所述内隔层和外炉体内壁之间形成输气腔,所述输气管贯穿外炉体与输气腔连通,所述内隔层上开设有若干组进气孔,相邻所述放置板之间的一组进气孔中固定装配有外壳,其余所述进气孔中安装有封闭塞,所述外壳的内部滑动连接有阻挡板,所述阻挡板和外壳内壁之间设置有弹簧a。As a further description of the above-mentioned technology, an equipment for forming a silicon carbide coating on the surface of a graphite product is as follows: an inner partition is fixedly connected to the inside of the outer furnace body, a gas delivery cavity is formed between the inner partition and the inner wall of the outer furnace body, the gas delivery pipe passes through the outer furnace body and is connected to the gas delivery cavity, a plurality of groups of air inlet holes are opened on the inner partition, a shell is fixedly assembled in a group of air inlet holes between adjacent placement plates, and closing plugs are installed in the other air inlet holes, a blocking plate is slidably connected to the inside of the shell, and a spring a is arranged between the blocking plate and the inner wall of the shell.
作为上述技术一种用于石墨制品表面形成碳化硅涂层的设备的进一步描述:所述外炉体的顶部固定连接有与上部转轴转动连接的转接件,所述上部转轴内部的出气通道与转接件相连通。As a further description of the above technology, a device for forming a silicon carbide coating on the surface of a graphite product is as follows: a connecting piece rotatably connected to the upper rotating shaft is fixedly connected to the top of the outer furnace body, and the air outlet channel inside the upper rotating shaft is connected to the connecting piece.
作为上述技术一种用于石墨制品表面形成碳化硅涂层的设备的进一步描述:所述下部转轴的顶部固定连接有嵌块,所述嵌块嵌入于上部转轴的底部。As a further description of the above technology, a device for forming a silicon carbide coating on the surface of a graphite product is provided: an insert is fixedly connected to the top of the lower rotating shaft, and the insert is embedded in the bottom of the upper rotating shaft.
作为上述技术一种用于石墨制品表面形成碳化硅涂层的设备的进一步描述:所述插销和凸轮件的内壁之间安装有弹簧b,所述插销靠近下部转轴的一侧为锥形。As a further description of the above-mentioned technology, a device for forming a silicon carbide coating on the surface of a graphite product is as follows: a spring b is installed between the latch and the inner wall of the cam member, and the side of the latch close to the lower rotating shaft is tapered.
综上所述,由于采用了上述技术一种用于石墨制品表面形成碳化硅涂层的设备,本发明的有益效果是:In summary, due to the use of the above-mentioned technology, the device for forming a silicon carbide coating on the surface of a graphite product has the following beneficial effects:
通过推板的移动对气流进行输送,气流的动能增加,从而使反应气体在流动过程中更容易从石墨制品的孔洞内部经过,进而使得石墨制品上的孔洞内壁上能够充分形成碳化硅涂层,解决了现有装置难以在石墨制品孔洞内壁上形成碳化硅涂层的问题,使石墨制品上各个位置处的碳化硅涂层厚度趋于一致,从而提高涂层的制备效果,此外,只有与石墨制品接触的滚珠才会被顶起,从而与下部孔板的孔洞之间形成缝隙,因此反应气体只会从位于石墨制品上方位置处的孔洞中喷出,该种设计能够根据石墨制品的放置位置控制反应气体的喷出位置,从而针对每个石墨制品进行孔洞内部涂层强化,避免出现不必要的气流输送,提高使用效果,并且反应气体从石墨制品上方喷出,使石墨制品顶面各处与反应气体接触更加均匀,提高石墨制品顶面碳化硅涂层的均匀性;The airflow is transported by the movement of the push plate, and the kinetic energy of the airflow is increased, so that the reaction gas can pass through the inside of the holes of the graphite product more easily during the flow, so that the silicon carbide coating can be fully formed on the inner wall of the hole on the graphite product, which solves the problem that the existing device is difficult to form a silicon carbide coating on the inner wall of the hole of the graphite product, so that the thickness of the silicon carbide coating at various positions on the graphite product tends to be consistent, thereby improving the preparation effect of the coating. In addition, only the ball in contact with the graphite product will be lifted up, thereby forming a gap between the hole and the lower hole plate, so the reaction gas will only be ejected from the hole located above the graphite product. This design can control the ejection position of the reaction gas according to the placement position of the graphite product, so as to strengthen the coating inside the hole of each graphite product, avoid unnecessary airflow transportation, and improve the use effect. In addition, the reaction gas is ejected from the top of the graphite product, so that the top surface of the graphite product is more evenly contacted with the reaction gas, thereby improving the uniformity of the silicon carbide coating on the top surface of the graphite product;
推板的移动不断将反应气体吸入和喷出,使石墨制品周边的反应气体始终处于被扰动状态,从而提高了反应气体分布的均匀性,提高石墨制品上碳化硅涂层的均匀性;The movement of the push plate continuously inhales and ejects the reaction gas, so that the reaction gas around the graphite product is always in a disturbed state, thereby improving the uniformity of the reaction gas distribution and the uniformity of the silicon carbide coating on the graphite product;
在反应气体被输送的过程中,上部孔板向上移动,使上部孔板的孔洞与之内部的滚珠之间形成缝隙,减少上部孔板对石墨制品底部的遮挡,便于反应气体从石墨制品的顶部或底部进入其上的孔洞,进一步提高孔洞内壁的碳化硅涂层的形成效果,并且使石墨制品底面各处与反应气体接触更加均匀,提高石墨制品底面碳化硅涂层的均匀性;During the process of conveying the reaction gas, the upper orifice plate moves upward, so that a gap is formed between the holes of the upper orifice plate and the balls inside it, reducing the shielding of the bottom of the graphite product by the upper orifice plate, making it easier for the reaction gas to enter the holes on the graphite product from the top or bottom, further improving the formation effect of the silicon carbide coating on the inner wall of the hole, and making the bottom surface of the graphite product more evenly in contact with the reaction gas, thereby improving the uniformity of the silicon carbide coating on the bottom surface of the graphite product;
该装置利用滚珠对石墨制品进行架空,大大减小了石墨制品与外界设备之间的接触面积,从而减小石墨制品形成涂层时的死角,便于碳化硅涂层对石墨制品表面充分覆盖,提高涂层效果,并且反应气体在流动的过程中推动叶片使垫片转动,从而使滚珠滚动,带动石墨制品移动,使滚珠与石墨制品之间进行位置切换,避免石墨制品与滚珠的接触位置无法形成碳化硅涂层,确保石墨制品表面被碳化硅涂层完全覆盖;The device uses balls to suspend graphite products, greatly reducing the contact area between graphite products and external equipment, thereby reducing the dead angle when the graphite products are coated, making it easier for the silicon carbide coating to fully cover the surface of the graphite products, improving the coating effect, and the reaction gas pushes the blades to rotate the gasket during the flow process, so that the balls roll, driving the graphite products to move, and switching the positions between the balls and the graphite products, avoiding the failure to form silicon carbide coatings at the contact position between the graphite products and the balls, and ensuring that the surface of the graphite products is completely covered by the silicon carbide coatings;
放置板套接于下部转轴上,安装简单且便于适配石墨制品的高度,使外炉体的内部空间能够被充分利用,进而提高了该装置对石墨制品的涂层加工效率,并且多个放置板对内隔层的内部空间进行分隔,使各个独立空间中的石墨制品互不影响,提高各个石墨制品加工质量的一致性;The placement plate is sleeved on the lower rotating shaft, which is easy to install and easy to adapt to the height of the graphite product, so that the internal space of the outer furnace body can be fully utilized, thereby improving the coating processing efficiency of the device for graphite products, and multiple placement plates separate the internal space of the inner partition, so that the graphite products in each independent space do not affect each other, thereby improving the consistency of the processing quality of each graphite product;
通过外壳、阻挡板和弹簧a,使得输气腔中的气压在达到目标大小后方能进入内隔层的内部,该种设计能够避免靠近输气管出气端的石墨制品率先与反应气体接触,导致不同位置处的石墨制品的碳化硅涂层效果不一,确保所有石墨制品的涂层效果统一。Through the outer shell, the blocking plate and the spring a, the gas pressure in the gas delivery cavity can enter the interior of the inner partition only after reaching the target size. This design can prevent the graphite products close to the gas outlet end of the gas delivery pipe from contacting the reaction gas first, resulting in different silicon carbide coating effects on graphite products at different positions, thereby ensuring that the coating effects of all graphite products are uniform.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1示出了根据本发明实施例提供的整体结构示意图;FIG1 is a schematic diagram showing an overall structure according to an embodiment of the present invention;
图2示出了根据本发明实施例提供的内部结构示意图;FIG2 shows a schematic diagram of an internal structure provided according to an embodiment of the present invention;
图3示出了根据本发明实施例提供的图2中A处放大示意图;FIG3 shows an enlarged schematic diagram of point A in FIG2 provided according to an embodiment of the present invention;
图4示出了根据本发明实施例提供的外壳剖面示意图;FIG4 shows a schematic cross-sectional view of a housing provided according to an embodiment of the present invention;
图5示出了根据本发明实施例提供的控流机构爆炸示意图;FIG5 shows an exploded schematic diagram of a flow control mechanism provided in an embodiment of the present invention;
图6示出了根据本发明实施例提供的放置板剖面立体图;FIG6 shows a cross-sectional perspective view of a placement plate provided in an embodiment of the present invention;
图7示出了根据本发明实施例提供的放置板剖面平面图;FIG7 shows a cross-sectional plan view of a placement plate provided according to an embodiment of the present invention;
图8示出了根据本发明实施例提供的凸轮件结构示意图;FIG8 shows a schematic structural diagram of a cam member according to an embodiment of the present invention;
图9示出了根据本发明实施例提供的图8中B处放大示意图;FIG9 shows an enlarged schematic diagram of point B in FIG8 provided according to an embodiment of the present invention;
图10示出了根据本发明实施例提供的插销结构示意图。FIG. 10 is a schematic diagram showing a latch structure according to an embodiment of the present invention.
图例说明:Legend:
10、底座;11、外炉体;12、输气管;10. Base; 11. External furnace body; 12. Gas pipe;
20、导气机构;21、连通盒;22、内隔层;23、输气腔;24、外壳;25、阻挡板;26、弹簧a;27、封闭塞;28、转接件;29、出气通道;20. air guide mechanism; 21. connecting box; 22. inner partition; 23. air delivery cavity; 24. outer shell; 25. blocking plate; 26. spring a; 27. closing plug; 28. adapter; 29. air outlet channel;
30、传动组件;31、叶轮;32、上部转轴;33、下部转轴;34、嵌块;35、条形槽;36、凸轮件;37、弹簧b;38、插销;30. Transmission assembly; 31. Impeller; 32. Upper rotating shaft; 33. Lower rotating shaft; 34. Insert; 35. Strip groove; 36. Cam member; 37. Spring b; 38. Latch;
40、控流机构;41、放置板;42、上部孔板;43、支撑板;44、下部孔板;45、滚珠;46、推杆;47、滚轮;48、推板;49、弹簧c;410、腔体;411、出气口;412、垫片;413、叶片。40. Flow control mechanism; 41. Placement plate; 42. Upper orifice plate; 43. Support plate; 44. Lower orifice plate; 45. Ball; 46. Push rod; 47. Roller; 48. Push plate; 49. Spring c; 410. Cavity; 411. Air outlet; 412. Gasket; 413. Blade.
具体实施方式DETAILED DESCRIPTION
下面将结合本发明实施例中的附图,对本发明实施例中的技术一种用于石墨制品表面形成碳化硅涂层的设备进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其它实施例,都属于本发明保护的范围。The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technology in the embodiments of the present invention, a device for forming a silicon carbide coating on the surface of a graphite product. Obviously, the described embodiment is only a part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
如图1-图10所示,本发明提供的:一种用于石墨制品表面形成碳化硅涂层的设备:包括底座10和放置于底座10上的外炉体11,外炉体11的顶部固定安装有输气管12,还包括:As shown in FIGS. 1 to 10 , the present invention provides: an apparatus for forming a silicon carbide coating on the surface of a graphite product: comprising a base 10 and an outer furnace body 11 placed on the base 10, a gas delivery pipe 12 being fixedly installed on the top of the outer furnace body 11, and further comprising:
导气机构20,导气机构20包括与输气管12固定连通的连通盒21,连通盒21的顶部设置有进气管;The air guide mechanism 20 includes a connecting box 21 fixedly connected to the air delivery pipe 12, and an air inlet pipe is arranged on the top of the connecting box 21;
传动组件30,传动组件30包括转动连接于连通盒21内部的叶轮31,反应气体通过进气管进入连通盒21的内部后会推动叶轮31发生转动,叶轮31的底部固定安装有上部转轴32,底座10上转动连接有开设有连接孔的下部转轴33,下部转轴33和上部转轴32的内部分别设置有相连通的出气通道29,下部转轴33上开设有条形槽35,下部转轴33上套接有凸轮件36,凸轮件36的内部滑动连接有嵌入条形槽35内部的插销38,下部转轴33在转动时能够带动嵌入条形槽35中的插销38转动,从而带动凸轮件36发生转动;The transmission assembly 30 includes an impeller 31 rotatably connected to the inside of the connecting box 21. After the reaction gas enters the inside of the connecting box 21 through the air inlet pipe, it will push the impeller 31 to rotate. An upper rotating shaft 32 is fixedly installed at the bottom of the impeller 31. A lower rotating shaft 33 with a connecting hole is rotatably connected to the base 10. The lower rotating shaft 33 and the upper rotating shaft 32 are respectively provided with interconnected gas outlet channels 29. A strip groove 35 is provided on the lower rotating shaft 33. A cam member 36 is sleeved on the lower rotating shaft 33. A latch 38 embedded in the strip groove 35 is slidably connected to the inside of the cam member 36. When the lower rotating shaft 33 rotates, it can drive the latch 38 embedded in the strip groove 35 to rotate, thereby driving the cam member 36 to rotate.
控流机构40,控流机构40包括套接于下部转轴33上的放置板41,放置板41的内部开设有腔体410,腔体410的底部开设有出气口411,腔体410的内部滑动连接有推板48,推板48在腔体410的内部移动能够增大或者减小腔体410的内部气压,从而使外界的反应气体进入腔体410和被从腔体410中输出,推板48和腔体410的内壁之间设置有弹簧c49,放置板41的底部固定连接有下部孔板44,下部孔板44内部的孔洞中滚动安装有滚珠45,下部孔板44的内部宽度大于滚珠45的半径且小于滚珠45的直径,目的是使滚珠45在被石墨制品顶起后,滚珠45仍然有部分位置位于下部孔板44的孔洞中,使下部孔板44的每个孔洞始终与每个滚珠45一一对应,避免滚珠45在下部孔板44的内部随意滚动;The flow control mechanism 40 includes a placement plate 41 sleeved on the lower rotating shaft 33, a cavity 410 is provided inside the placement plate 41, an air outlet 411 is provided at the bottom of the cavity 410, a push plate 48 is slidably connected inside the cavity 410, and the push plate 48 moves inside the cavity 410 to increase or decrease the internal air pressure of the cavity 410, so that the external reaction gas enters the cavity 410 and is output from the cavity 410, and a spring is provided between the push plate 48 and the inner wall of the cavity 410. Spring c49, the bottom of the placement plate 41 is fixedly connected with a lower orifice plate 44, and a ball 45 is rollingly installed in the hole inside the lower orifice plate 44. The inner width of the lower orifice plate 44 is greater than the radius of the ball 45 and smaller than the diameter of the ball 45. The purpose is to make the ball 45 still partially located in the hole of the lower orifice plate 44 after being lifted by the graphite product, so that each hole of the lower orifice plate 44 always corresponds to each ball 45 one by one, so as to prevent the ball 45 from rolling randomly inside the lower orifice plate 44;
下部孔板44放置于石墨制品上方后,滚珠45被石墨制品顶入下部孔板44的内部,滚珠45与下部孔板44的孔洞之间产生缝隙,推板48往复滑动将反应气体吸入腔体410中然后使反应气体从出气口411中吹出,反应气体经过滚珠45与下部孔板44孔洞之间的缝隙吹出至石墨制品的孔洞中。After the lower orifice plate 44 is placed above the graphite product, the ball 45 is pushed into the interior of the lower orifice plate 44 by the graphite product, and a gap is generated between the ball 45 and the hole of the lower orifice plate 44. The push plate 48 slides back and forth to suck the reaction gas into the cavity 410 and then blows the reaction gas out from the gas outlet 411. The reaction gas is blown into the holes of the graphite product through the gap between the ball 45 and the hole of the lower orifice plate 44.
参照图5-图7,放置板41的顶部滑动连接有上部孔板42,上部孔板42的底部固定连接有支撑板43,支撑板43贯穿并延伸至腔体410的内部,推板48的顶部倾斜,推板48在移动过程中推动支撑板43带动上部孔板42向上移动,使上部孔板42的孔洞与孔洞中的滚珠45分离并产生缝隙,从而减少上部孔板42对其上方石墨制品底部的遮蔽,便于反应气体从石墨制品上的孔洞中穿过,存在有另外的滚珠45滚动安装于上部孔板42的孔洞中。5-7, the top of the placement plate 41 is slidably connected to the upper orifice plate 42, and the bottom of the upper orifice plate 42 is fixedly connected to the support plate 43, which penetrates and extends to the interior of the cavity 410. The top of the push plate 48 is inclined, and the push plate 48 pushes the support plate 43 during the movement to drive the upper orifice plate 42 to move upward, so that the holes of the upper orifice plate 42 are separated from the balls 45 in the holes and gaps are generated, thereby reducing the shielding of the bottom of the graphite product above it by the upper orifice plate 42, making it easier for the reaction gas to pass through the holes on the graphite product. There are other balls 45 rollingly installed in the holes of the upper orifice plate 42.
参照图8,凸轮件36转动连接于放置板41的内部,推板48靠近凸轮件36的一侧固定连接有穿过弹簧c49的推杆46,推杆46靠近凸轮件36的一端转动连接有滚轮47,凸轮件36在转动过程中通过外部凸起推动滚轮47、推杆46和推板48,此时弹簧c49被拉伸,在凸轮件36的凸起与滚轮47交错后,弹簧c49的收缩弹力将推板48拉回,以此实现推板48的往复运动,凸轮件36转动能带动滚轮47在其外部滚动,减小凸轮件36转动时与推杆46之间的摩擦力。Referring to Figure 8, the cam member 36 is rotatably connected to the inside of the placement plate 41, and a push rod 46 passing through a spring c49 is fixedly connected to one side of the push plate 48 close to the cam member 36. The push rod 46 is rotatably connected to one end of the push rod 46 close to the cam member 36. The roller 47, the push rod 46 and the push plate 48 are pushed by the external protrusion during the rotation. At this time, the spring c49 is stretched. After the protrusion of the cam member 36 is interlaced with the roller 47, the contraction elastic force of the spring c49 pulls the push plate 48 back, thereby realizing the reciprocating motion of the push plate 48. The rotation of the cam member 36 can drive the roller 47 to roll on its outside, thereby reducing the friction between the cam member 36 and the push rod 46 when the cam member 36 rotates.
参照图7和图9,放置板41的底面转动连接有垫片412,垫片412的边沿固定连接有等距圆周排布的叶片413,叶片413位于出气口411的正下方且倾斜设置,气流从出气口411中流出时会推动叶片413,从而使垫片412发生转动,带动石墨制品顶起的与垫片412接触的滚珠45发生滚动,从而实现滚珠45与石墨制品之间的位置切换,使碳化硅对石墨制品表面各处进行充分覆盖。7 and 9, the bottom surface of the placement plate 41 is rotatably connected to a gasket 412, and the edge of the gasket 412 is fixedly connected to blades 413 that are equidistantly arranged in a circumferential manner. The blades 413 are located directly below the air outlet 411 and are tilted. When the airflow flows out of the air outlet 411, it pushes the blades 413, thereby causing the gasket 412 to rotate, driving the ball 45 that is lifted up by the graphite product and in contact with the gasket 412 to roll, thereby realizing the position switching between the ball 45 and the graphite product, so that the silicon carbide fully covers all parts of the surface of the graphite product.
参照图2和图4,外炉体11的内部固定连接有内隔层22,放置板41滑动连接于内隔层22的内部,内隔层22和外炉体11内壁之间形成输气腔23,输气管12贯穿外炉体11与输气腔23连通,内隔层22上开设有若干组进气孔,相邻放置板41之间的一组进气孔中固定装配有外壳24,其余进气孔中安装有封闭塞27,通过若干组进气孔方便根据石墨制品的高度和位置控制内隔层22的进气位置,从而使反应气体能够分别进入各个被放置板41隔开的独立空间中,提高反应气体分布的均匀性,有利于提高涂层的均匀性,外壳24的内部滑动连接有阻挡板25,阻挡板25和外壳24内壁之间设置有弹簧a26,随着输气腔23内部气压的增大,气压会推动阻挡板25,使阻挡板25与外壳24之间产生间隙,此时输气腔23内部的反应气体方可通过间隙进入内隔层22的内部,该种设计能够避免靠近输气管12出气端的石墨制品率先与反应气体接触,导致不同位置处的石墨制品的碳化硅涂层效果不一。2 and 4, the inner partition 22 is fixedly connected to the inside of the outer furnace body 11, and the placement plate 41 is slidably connected to the inside of the inner partition 22. A gas delivery cavity 23 is formed between the inner partition 22 and the inner wall of the outer furnace body 11. The gas delivery pipe 12 passes through the outer furnace body 11 and is connected to the gas delivery cavity 23. A plurality of groups of air inlet holes are opened on the inner partition 22. A shell 24 is fixedly installed in a group of air inlet holes between adjacent placement plates 41, and a closing plug 27 is installed in the remaining air inlet holes. Through the plurality of groups of air inlet holes, it is convenient to control the air inlet position of the inner partition 22 according to the height and position of the graphite product, so that the reaction gas can enter each of the air inlet holes separated by the placement plate 41. In the independent space opened, the uniformity of the reaction gas distribution is improved, which is beneficial to improving the uniformity of the coating. The inner part of the shell 24 is slidably connected with a baffle plate 25, and a spring a26 is arranged between the baffle plate 25 and the inner wall of the shell 24. As the air pressure inside the gas delivery cavity 23 increases, the air pressure will push the baffle plate 25, so that a gap is generated between the baffle plate 25 and the shell 24. At this time, the reaction gas inside the gas delivery cavity 23 can enter the inner partition 22 through the gap. This design can prevent the graphite product near the gas outlet end of the gas delivery pipe 12 from contacting the reaction gas first, resulting in different silicon carbide coating effects on graphite products at different positions.
参照图3,外炉体11的顶部固定连接有与上部转轴32转动连接的转接件28,上部转轴32内部的出气通道29与转接件28相连通,进入内隔层22内部的反应气体在使用后,通过下部转轴33上的孔洞进入出气通道29中,最后通过上部转轴32内部的出气通道29进入转接件28中完成排出,实现反应气体的循环。3 , the top of the outer furnace body 11 is fixedly connected with an adapter 28 rotatably connected to the upper rotating shaft 32. The gas outlet channel 29 inside the upper rotating shaft 32 is communicated with the adapter 28. After use, the reaction gas entering the inner partition 22 enters the gas outlet channel 29 through the holes on the lower rotating shaft 33, and finally enters the adapter 28 through the gas outlet channel 29 inside the upper rotating shaft 32 to complete the discharge, thereby realizing the circulation of the reaction gas.
下部转轴33的顶部固定连接有嵌块34,嵌块34嵌入于上部转轴32的底部,上部转轴32转动带动嵌块34转动,从而带动下部转轴33发生转动,并且该种设计便于外炉体11和底座10之间的分离和组装,在外炉体11抬升后,下部转轴33与上部转轴32分离,此时下部转轴33上的放置板41和放置板41上的石墨制品能够取下,方便石墨制品的上料和下料。The top of the lower rotating shaft 33 is fixedly connected with an insert 34, and the insert 34 is embedded in the bottom of the upper rotating shaft 32. The rotation of the upper rotating shaft 32 drives the insert 34 to rotate, thereby driving the lower rotating shaft 33 to rotate. This design facilitates the separation and assembly between the outer furnace body 11 and the base 10. After the outer furnace body 11 is lifted, the lower rotating shaft 33 is separated from the upper rotating shaft 32. At this time, the placement plate 41 on the lower rotating shaft 33 and the graphite product on the placement plate 41 can be removed, which is convenient for loading and unloading of graphite products.
参照图10,插销38和凸轮件36的内壁之间安装有弹簧b37,插销38靠近下部转轴33的一侧为锥形,目的是在将放置板41套接于下部转轴33上时能够无需将插销38与条形槽35对齐,简化放置板41的安装步骤,在放置板41安装时直接套接于下部转轴33上,此时插销38的斜面受压收缩至凸轮件36的内部,然后转动凸轮件36直至插销38与条形槽35对齐,弹簧b37将插销38弹出至条形槽35中。Referring to Figure 10, a spring b37 is installed between the inner wall of the latch 38 and the cam member 36. The side of the latch 38 close to the lower shaft 33 is tapered. The purpose is to eliminate the need to align the latch 38 with the strip groove 35 when the placement plate 41 is sleeved on the lower shaft 33, thereby simplifying the installation steps of the placement plate 41. When the placement plate 41 is installed, it is directly sleeved on the lower shaft 33. At this time, the inclined surface of the latch 38 is compressed and contracted to the inside of the cam member 36, and then the cam member 36 is rotated until the latch 38 is aligned with the strip groove 35, and the spring b37 pops the latch 38 into the strip groove 35.
工作原理:初始状态下,外炉体11与底座10处于分离状态,放置板41未套接于下部转轴33上;Working principle: In the initial state, the outer furnace body 11 and the base 10 are in a separated state, and the placement plate 41 is not sleeved on the lower rotating shaft 33;
将第一个放置板41套接于下部转轴33上并使之滑落至下部转轴33的最底部,然后在该放置板41顶部的滚珠45上均匀放置石墨制品工件,之后在下部转轴33上套接第二个放置板41,并使该放置板41搭设于之前放置的石墨制品上,以此类推实现放置板41与石墨制品的交替放置,在放置板41放置于石墨制品顶部时,位于下部孔板44中的滚珠45被石墨制品向上顶起并与垫片412的底部接触,此时下部孔板44的孔洞与滚珠45之间存在缝隙,石墨纸片放置于放置板41上后,与上部孔板42中的滚珠45接触,该滚珠45在放置板41的支撑下不会发生上下移动,该过程中值得一提的是,插销38未与条形槽35对齐时,放置板41套接于下部转轴33上的过程中,插销38的斜面受到下部转轴33的挤压收缩至凸轮件36的内部,弹簧b37被压缩,然后转动凸轮件36直至插销38与条形槽35对齐,此时弹簧b37自动将插销38弹出至条形槽35中;The first placement plate 41 is sleeved on the lower rotating shaft 33 and made to slide to the bottom of the lower rotating shaft 33, and then the graphite product workpiece is evenly placed on the ball 45 on the top of the placement plate 41, and then the second placement plate 41 is sleeved on the lower rotating shaft 33, and the placement plate 41 is placed on the previously placed graphite product, and so on to achieve the alternate placement of the placement plate 41 and the graphite product. When the placement plate 41 is placed on the top of the graphite product, the ball 45 located in the lower hole plate 44 is lifted up by the graphite product and contacts with the bottom of the gasket 412. At this time, the hole of the lower hole plate 44 is in contact with the ball There is a gap between the upper and lower holes 45. After the graphite paper is placed on the placement plate 41, it contacts the ball 45 in the upper hole plate 42. The ball 45 does not move up and down under the support of the placement plate 41. It is worth mentioning that when the latch 38 is not aligned with the strip groove 35, when the placement plate 41 is sleeved on the lower shaft 33, the inclined surface of the latch 38 is squeezed by the lower shaft 33 and shrinks to the inside of the cam member 36, the spring b37 is compressed, and then the cam member 36 is rotated until the latch 38 is aligned with the strip groove 35. At this time, the spring b37 automatically pops the latch 38 into the strip groove 35.
在外炉体11与底座10拼合后,外炉体11将石墨制品与放置板41容纳进内隔层22的内部,然后将反应气体从连通盒21的进气管输入,反应气体通过连通盒21、输气管12后进入输气腔23中,反应气体进入连通盒21中后会推动叶轮31转动,随着反应气体的输送,输气腔23内部充斥反应气体,输气腔23内部气压逐渐升高,气压推动阻挡板25使之与外壳24之间产生间隙后,反应气体穿过间隙进入内隔层22中的各个放置板41之间的空间中,对石墨制品进行碳化硅涂层加工;After the outer furnace body 11 and the base 10 are assembled, the outer furnace body 11 accommodates the graphite product and the placement plate 41 into the inner partition 22, and then the reaction gas is input from the air inlet pipe of the connecting box 21, and the reaction gas enters the gas delivery cavity 23 after passing through the connecting box 21 and the gas delivery pipe 12. After entering the connecting box 21, the reaction gas will drive the impeller 31 to rotate. With the delivery of the reaction gas, the inside of the gas delivery cavity 23 is filled with the reaction gas, and the gas pressure inside the gas delivery cavity 23 gradually increases. After the gas pressure pushes the blocking plate 25 to generate a gap between it and the outer shell 24, the reaction gas passes through the gap and enters the space between each placement plate 41 in the inner partition 22, and the graphite product is processed with silicon carbide coating;
叶轮31转动带动上部转轴32、嵌块34和下部转轴33转动,下部转轴33转动带动插销38和凸轮件36转动,凸轮件36在转动过程中通过外部凸起推动滚轮47、推杆46和推板48,此时弹簧c49被拉伸,在凸轮件36的凸起与滚轮47交错后,弹簧c49的收缩弹力将推板48拉回,因此推板48在腔体410中往复移动,腔体410通过出气口411、下部孔板44孔洞与滚珠45之间的缝隙与外界连通,因此推板48的往复移动会将反应气体通过下部孔板44孔洞和出气口411吸入腔体410中,再将腔体410中吸入的气体通过出气口411、下部孔板44的孔洞排出,推板48的移动能够加强反应气体的流动,使反应气体被输送过程中更容易进入石墨制品上的孔洞中,为孔洞内壁形成碳化硅涂层;The impeller 31 rotates to drive the upper shaft 32, the insert 34 and the lower shaft 33 to rotate. The lower shaft 33 rotates to drive the latch 38 and the cam member 36 to rotate. The cam member 36 pushes the roller 47, the push rod 46 and the push plate 48 through the external protrusion during the rotation process. At this time, the spring c49 is stretched. After the protrusion of the cam member 36 intersects with the roller 47, the contraction elastic force of the spring c49 pulls the push plate 48 back. Therefore, the push plate 48 reciprocates in the cavity 410, and the cavity 410 passes through the outlet 4 11. The gap between the hole of the lower orifice plate 44 and the ball 45 is connected to the outside, so the reciprocating movement of the push plate 48 will suck the reaction gas into the cavity 410 through the hole of the lower orifice plate 44 and the gas outlet 411, and then discharge the gas sucked into the cavity 410 through the gas outlet 411 and the hole of the lower orifice plate 44. The movement of the push plate 48 can strengthen the flow of the reaction gas, making it easier for the reaction gas to enter the holes on the graphite product during the transportation process, and form a silicon carbide coating on the inner wall of the hole;
推板48移动时通过斜面将支撑板43和上部孔板42向上顶起,此时上部孔板42的孔洞与之内部的滚珠45之间同样形成缝隙,便于气流通过,以此减小了气流从石墨制品孔洞中排出的阻碍,使反应气体更容易从石墨制品孔洞顶部进入孔洞中;When the push plate 48 moves, the support plate 43 and the upper orifice plate 42 are pushed upward by the inclined surface. At this time, a gap is also formed between the holes of the upper orifice plate 42 and the balls 45 inside it, which is convenient for airflow to pass through, thereby reducing the obstruction of airflow from the holes of the graphite product, making it easier for the reaction gas to enter the holes from the top of the holes of the graphite product;
气流经过出气口411的过程中推动叶片413带动垫片412转动,垫片412转动带动与之接触的滚珠45滚动,从而带动顶起滚珠45的石墨制品发生移动,以此切换滚珠45与石墨制品的位置,由于经过出气口411的气流不断往复,因此石墨制品移动后自动复位,避免出现始终单向移动导致移动位置不可控的情况。When the airflow passes through the air outlet 411, the blade 413 is pushed to drive the gasket 412 to rotate. The rotation of the gasket 412 drives the ball 45 in contact with it to roll, thereby driving the graphite product that lifts the ball 45 to move, thereby switching the positions of the ball 45 and the graphite product. Since the airflow through the air outlet 411 is constantly reciprocating, the graphite product automatically resets after moving, avoiding the situation where the moving position is uncontrollable due to always moving in one direction.
以上所述,仅为本发明较佳的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,根据本发明的技术一种用于石墨制品表面形成碳化硅涂层的设备及其发明构思加以等同替换或改变,都应涵盖在本发明的保护范围之内。The above description is only a preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field within the technical scope disclosed by the present invention, according to the technology of the present invention, a device for forming a silicon carbide coating on the surface of a graphite product and its inventive concept, can be equivalently replaced or changed, which should be covered by the protection scope of the present invention.
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202411290273.4A CN118814135B (en) | 2024-09-14 | 2024-09-14 | Equipment for forming silicon carbide coating on surface of graphite product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202411290273.4A CN118814135B (en) | 2024-09-14 | 2024-09-14 | Equipment for forming silicon carbide coating on surface of graphite product |
Publications (2)
Publication Number | Publication Date |
---|---|
CN118814135A true CN118814135A (en) | 2024-10-22 |
CN118814135B CN118814135B (en) | 2024-12-17 |
Family
ID=93073339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202411290273.4A Active CN118814135B (en) | 2024-09-14 | 2024-09-14 | Equipment for forming silicon carbide coating on surface of graphite product |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN118814135B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN119023425A (en) * | 2024-10-28 | 2024-11-26 | 都江堰市苏彭新材料科技有限公司 | A pressure detection device and method for graphite pipe fittings |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61139667A (en) * | 1984-12-08 | 1986-06-26 | Inoue Japax Res Inc | Formation of thin silicon carbide film |
JPH09107024A (en) * | 1995-10-11 | 1997-04-22 | Nippon Carbon Co Ltd | Sic coating graphite product |
JP2004338971A (en) * | 2003-05-13 | 2004-12-02 | Denso Corp | METHOD AND APPARATUS FOR MANUFACTURING SiC SINGLE CRYSTAL |
KR20120074697A (en) * | 2010-12-28 | 2012-07-06 | 한국세라믹기술원 | Apparatus for coating silicon carbide |
CN103290386A (en) * | 2013-06-09 | 2013-09-11 | 中南大学 | C/SiC coating with pore structure and preparation method thereof |
CN203530428U (en) * | 2013-10-29 | 2014-04-09 | 成都润封电碳有限公司 | Vapor deposition furnace for coating silicon carbide on large-scale graphite sleeve |
CN108277476A (en) * | 2018-03-14 | 2018-07-13 | 深圳市志橙半导体材料有限公司 | A kind of depositing SiC processing equipment using thermal cvd |
CN108715449A (en) * | 2018-06-29 | 2018-10-30 | 中国建筑材料科学研究总院有限公司 | Chemical vapor deposition prepares the device of carbonization silicon sponge |
JP2020191346A (en) * | 2019-05-21 | 2020-11-26 | クアーズテック株式会社 | Susceptor and epitaxial growth device |
CN112359342A (en) * | 2020-09-30 | 2021-02-12 | 中钢集团新型材料(浙江)有限公司 | Graphite spare surface deposit carborundum equipment |
CN112458431A (en) * | 2020-11-17 | 2021-03-09 | 欧明桥 | Preparation equipment for enhancing oxidation-resistant coating of graphite product |
CN112663136A (en) * | 2020-12-02 | 2021-04-16 | 中电化合物半导体有限公司 | Silicon carbide crystal growth method and growth device |
CN113005427A (en) * | 2019-12-20 | 2021-06-22 | 中核北方核燃料元件有限公司 | Full-size SiC composite material cladding tube chemical vapor deposition device |
CN113249784A (en) * | 2021-05-12 | 2021-08-13 | 中科汇通(内蒙古)投资控股有限公司 | Silicon carbide single crystal growth device capable of balancing growth system atmosphere |
CN118007093A (en) * | 2024-02-19 | 2024-05-10 | 江苏协鑫特种材料科技有限公司 | Deposition furnace air inlet structure for silicon carbide coating production |
-
2024
- 2024-09-14 CN CN202411290273.4A patent/CN118814135B/en active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61139667A (en) * | 1984-12-08 | 1986-06-26 | Inoue Japax Res Inc | Formation of thin silicon carbide film |
JPH09107024A (en) * | 1995-10-11 | 1997-04-22 | Nippon Carbon Co Ltd | Sic coating graphite product |
JP2004338971A (en) * | 2003-05-13 | 2004-12-02 | Denso Corp | METHOD AND APPARATUS FOR MANUFACTURING SiC SINGLE CRYSTAL |
KR20120074697A (en) * | 2010-12-28 | 2012-07-06 | 한국세라믹기술원 | Apparatus for coating silicon carbide |
CN103290386A (en) * | 2013-06-09 | 2013-09-11 | 中南大学 | C/SiC coating with pore structure and preparation method thereof |
CN203530428U (en) * | 2013-10-29 | 2014-04-09 | 成都润封电碳有限公司 | Vapor deposition furnace for coating silicon carbide on large-scale graphite sleeve |
CN108277476A (en) * | 2018-03-14 | 2018-07-13 | 深圳市志橙半导体材料有限公司 | A kind of depositing SiC processing equipment using thermal cvd |
CN108715449A (en) * | 2018-06-29 | 2018-10-30 | 中国建筑材料科学研究总院有限公司 | Chemical vapor deposition prepares the device of carbonization silicon sponge |
JP2020191346A (en) * | 2019-05-21 | 2020-11-26 | クアーズテック株式会社 | Susceptor and epitaxial growth device |
CN113005427A (en) * | 2019-12-20 | 2021-06-22 | 中核北方核燃料元件有限公司 | Full-size SiC composite material cladding tube chemical vapor deposition device |
CN112359342A (en) * | 2020-09-30 | 2021-02-12 | 中钢集团新型材料(浙江)有限公司 | Graphite spare surface deposit carborundum equipment |
CN112458431A (en) * | 2020-11-17 | 2021-03-09 | 欧明桥 | Preparation equipment for enhancing oxidation-resistant coating of graphite product |
CN112663136A (en) * | 2020-12-02 | 2021-04-16 | 中电化合物半导体有限公司 | Silicon carbide crystal growth method and growth device |
CN113249784A (en) * | 2021-05-12 | 2021-08-13 | 中科汇通(内蒙古)投资控股有限公司 | Silicon carbide single crystal growth device capable of balancing growth system atmosphere |
CN118007093A (en) * | 2024-02-19 | 2024-05-10 | 江苏协鑫特种材料科技有限公司 | Deposition furnace air inlet structure for silicon carbide coating production |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN119023425A (en) * | 2024-10-28 | 2024-11-26 | 都江堰市苏彭新材料科技有限公司 | A pressure detection device and method for graphite pipe fittings |
Also Published As
Publication number | Publication date |
---|---|
CN118814135B (en) | 2024-12-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN118814135A (en) | A device for forming a silicon carbide coating on the surface of a graphite product | |
JP6395494B2 (en) | Sintering cooler | |
JP2013143824A (en) | Electric actuator | |
EP1980505B1 (en) | Apparatus for placing battery plates in a line | |
CA2453120A1 (en) | Process and device for gluing dried fibers designated for the production of fibreboards | |
CN104768891B (en) | Disperse powder cleaning device | |
CN112439625A (en) | Powder coating system and coating process | |
CN112725788A (en) | Centrifugal laser cladding powder feeding device and laser cladding powder feeding method | |
CN115812393A (en) | Horizontal air-suction type seed sowing device and seed sowing method thereof | |
CN219156971U (en) | Exhaust device and coating equipment | |
CN116904970B (en) | Semiconductor processing equipment | |
CN116251953B (en) | Powder metallurgy loading attachment | |
CN115255899B (en) | Screw feeding vacuum dust removing device and equipment | |
CN214515529U (en) | Powder coating system | |
CN110997300A (en) | Housing for a rotor of a tablet press and method for removing excess tablet material from a press chamber of a tablet press | |
CN211924896U (en) | A kind of floating sealing mechanism of feeding tray of dry ice cleaning machine | |
CN211591821U (en) | Glazing machine that facilitates use | |
TWI418503B (en) | Automatic adjustment of sheet conveyance | |
EP0074200A1 (en) | Spray apparatus for metal forming and glassware forming machines | |
CN221184017U (en) | Gasket self-cleaning mechanism | |
CN216731340U (en) | A new type of rotary shot blasting machine | |
CN222312011U (en) | Glass gripping device | |
CN220675055U (en) | Cooling device of coating machine | |
CN220846264U (en) | Spraying device and coating equipment | |
CN217058320U (en) | Waste discharging mechanism used in food drying box |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |