CN118765261A - Precipitated silica and method thereof - Google Patents
Precipitated silica and method thereof Download PDFInfo
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- CN118765261A CN118765261A CN202280084500.0A CN202280084500A CN118765261A CN 118765261 A CN118765261 A CN 118765261A CN 202280084500 A CN202280084500 A CN 202280084500A CN 118765261 A CN118765261 A CN 118765261A
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- precipitated silica
- metal silicate
- silicate
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 226
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 104
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000003756 stirring Methods 0.000 claims abstract description 40
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229910052753 mercury Inorganic materials 0.000 claims abstract description 31
- 239000011164 primary particle Substances 0.000 claims abstract description 31
- 239000002253 acid Substances 0.000 claims abstract description 26
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 25
- 238000010521 absorption reaction Methods 0.000 claims abstract description 25
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 24
- 229910052915 alkaline earth metal silicate Inorganic materials 0.000 claims abstract description 23
- 239000000551 dentifrice Substances 0.000 claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 6
- 239000002537 cosmetic Substances 0.000 claims abstract description 5
- 235000013305 food Nutrition 0.000 claims abstract description 5
- 239000002324 mouth wash Substances 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 53
- 239000000203 mixture Substances 0.000 claims description 10
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 7
- 239000007921 spray Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 116
- 239000004115 Sodium Silicate Substances 0.000 description 80
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 80
- 229910052911 sodium silicate Inorganic materials 0.000 description 80
- 239000002245 particle Substances 0.000 description 26
- 239000011148 porous material Substances 0.000 description 20
- 239000003921 oil Substances 0.000 description 15
- 235000019198 oils Nutrition 0.000 description 15
- 229960001927 cetylpyridinium chloride Drugs 0.000 description 14
- YMKDRGPMQRFJGP-UHFFFAOYSA-M cetylpyridinium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 YMKDRGPMQRFJGP-UHFFFAOYSA-M 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- 239000000463 material Substances 0.000 description 12
- 229960000686 benzalkonium chloride Drugs 0.000 description 11
- CADWTSSKOVRVJC-UHFFFAOYSA-N benzyl(dimethyl)azanium;chloride Chemical compound [Cl-].C[NH+](C)CC1=CC=CC=C1 CADWTSSKOVRVJC-UHFFFAOYSA-N 0.000 description 11
- 239000000843 powder Substances 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 9
- 239000011541 reaction mixture Substances 0.000 description 7
- 239000000725 suspension Substances 0.000 description 6
- 239000000796 flavoring agent Substances 0.000 description 5
- 235000019634 flavors Nutrition 0.000 description 5
- 239000011550 stock solution Substances 0.000 description 5
- 239000000606 toothpaste Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000006228 supernatant Substances 0.000 description 4
- 229940034610 toothpaste Drugs 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 238000004448 titration Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000003205 fragrance Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000002459 porosimetry Methods 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- FWPIDFUJEMBDLS-UHFFFAOYSA-L tin(II) chloride dihydrate Chemical compound O.O.Cl[Sn]Cl FWPIDFUJEMBDLS-UHFFFAOYSA-L 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- OCKGFTQIICXDQW-ZEQRLZLVSA-N 5-[(1r)-1-hydroxy-2-[4-[(2r)-2-hydroxy-2-(4-methyl-1-oxo-3h-2-benzofuran-5-yl)ethyl]piperazin-1-yl]ethyl]-4-methyl-3h-2-benzofuran-1-one Chemical compound C1=C2C(=O)OCC2=C(C)C([C@@H](O)CN2CCN(CC2)C[C@H](O)C2=CC=C3C(=O)OCC3=C2C)=C1 OCKGFTQIICXDQW-ZEQRLZLVSA-N 0.000 description 1
- 241001340526 Chrysoclista linneella Species 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- 239000001692 EU approved anti-caking agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000013504 Triton X-100 Substances 0.000 description 1
- 229920004890 Triton X-100 Polymers 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229940027983 antiseptic and disinfectant quaternary ammonium compound Drugs 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000001279 citrus aurantifolia swingle expressed oil Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 238000013480 data collection Methods 0.000 description 1
- 210000004268 dentin Anatomy 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000000338 in vitro Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- IBIKHMZPHNKTHM-RDTXWAMCSA-N merck compound 25 Chemical compound C1C[C@@H](C(O)=O)[C@H](O)CN1C(C1=C(F)C=CC=C11)=NN1C(=O)C1=C(Cl)C=CC=C1C1CC1 IBIKHMZPHNKTHM-RDTXWAMCSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 239000006072 paste Substances 0.000 description 1
- 230000008560 physiological behavior Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000012254 powdered material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- ZSDSQXJSNMTJDA-UHFFFAOYSA-N trifluralin Chemical compound CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O ZSDSQXJSNMTJDA-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Abstract
Description
技术领域Technical Field
本公开总体上涉及沉淀二氧化硅及其制备和使用方法。The present disclosure generally relates to precipitated silica and methods of making and using the same.
背景技术Background Art
多孔沉淀二氧化硅通常通过碱性硅酸盐溶液(例如,硅酸钠)与无机酸的反应制备。商业上主要使用硫酸,虽然也可使用其他酸,诸如盐酸。在搅拌下将酸和硅酸钠溶液同时添加到水中。当二氧化硅因中和反应和副产物钠盐(硫酸钠)的产生而从该分散液中沉淀出时,产生沉淀二氧化硅。沉淀二氧化硅由初级(或最终)胶体二氧化硅粒子的聚集体(次级粒子)组成。初级粒子大多为球形,并且通常具有在5至50nm范围内的直径。聚集体中的初级粒子通过形成硅氧烷键而彼此共价键合。聚集体是这些初级粒子的三维集群。聚集体具有高达500nm的直径。在制备过程期间,聚集体没有化学连接成巨大的凝胶网络。聚集体自身在研磨之前通过在它们表面上的硅醇基团之间形成氢键,可以物理连接至直径高达100μm的较大团聚体。在直径上团聚体中值尺寸为约20–50μm(研磨前)。这些沉淀二氧化硅粒子的孔隙率和表面积随初级粒子的尺寸以及它们如何聚集和团聚的变化而变化。孔由初级粒子和聚集体之间的空间形成。商业的沉淀二氧化硅的典型表面积为5–800m2/g。它们以粉末的形式出售。夯实密度(其是这些多孔粉末重量的量度)在50–500kg/m3的范围内。它们具有约175–320g/100g的高吸收能力。Porous precipitated silica is usually prepared by the reaction of an alkaline silicate solution (e.g., sodium silicate) with an inorganic acid. Sulfuric acid is mainly used commercially, although other acids such as hydrochloric acid may also be used. Acid and sodium silicate solution are added to water simultaneously under stirring. When silica is precipitated from the dispersion due to the neutralization reaction and the generation of a byproduct sodium salt (sodium sulfate), precipitated silica is produced. Precipitated silica is composed of aggregates (secondary particles) of primary (or final) colloidal silica particles. Primary particles are mostly spherical and generally have a diameter in the range of 5 to 50 nm. The primary particles in the aggregates are covalently bonded to each other by forming siloxane bonds. Aggregates are three-dimensional clusters of these primary particles. Aggregates have a diameter of up to 500 nm. During the preparation process, aggregates are not chemically connected to form a huge gel network. Aggregates themselves can be physically connected to larger agglomerates with a diameter of up to 100 μm before grinding by forming hydrogen bonds between silanol groups on their surfaces. The median size of the agglomerates is about 20-50 μm in diameter (before grinding). The porosity and surface area of these precipitated silica particles vary with the size of the primary particles and how they aggregate and agglomerate. The pores are formed by the spaces between the primary particles and the aggregates. The typical surface area of commercial precipitated silicas is 5-800 m2 /g. They are sold in the form of powders. The tapped density, which is a measure of the weight of these porous powders, is in the range of 50-500 kg/ m3 . They have a high absorption capacity of about 175-320 g/100 g.
美国专利号8,597,425报道了初级粒径为10-80nm的多孔沉淀二氧化硅可用于包括以下的应用:橡胶和轮胎、电池隔膜、抗结块剂、用于油墨和油漆的消光剂、用于农产品和饲料的载体、涂层材料、印刷油墨、灭火器粉末、塑料、无压印刷领域(non-impact printingsector)、纸浆或个人护理领域中的物品等。U.S. Pat. No. 8,597,425 reports that porous precipitated silica with a primary particle size of 10-80 nm can be used in applications including rubber and tires, battery separators, anti-caking agents, matting agents for inks and paints, carriers for agricultural products and feed, coating materials, printing inks, fire extinguisher powders, plastics, non-impact printing sectors, articles in the pulp or personal care sectors, etc.
J.Soc Cosmet.Chem August 1978,29,497-521中报道了初级粒径为12-51nm的沉淀二氧化硅可用于包括牙膏的化妆品应用。J. Soc Cosmet. Chem August 1978, 29, 497-521 reports that precipitated silica having a primary particle size of 12-51 nm can be used in cosmetic applications including toothpaste.
可用于食品和饲料应用中作为载体和抗结块自由流动添加剂的商业产品SIPERNAT 22被报道具有18nm的初级粒径(Degussa literature No.64,PhysiologicalBehavior of highly dispersed Oxides of Silicon,Aluminum and Titanium 1978,page 26-27)。The commercial product SIPERNAT 22, which can be used as a carrier and anti-caking free-flowing additive in food and feed applications, is reported to have a primary particle size of 18 nm (Degussa literature No. 64, Physiological Behavior of highly dispersed Oxides of Silicon, Aluminum and Titanium 1978, page 26-27).
美国专利号6,946,119公开了一种包含含有二氧化硅微粒的沉淀二氧化硅产品,该二氧化硅微粒包含在其上支撑表面沉积物的中值直径为1-100微米的二氧化硅粒子,该表面沉积物包含活性的沉淀无定形二氧化硅,一种以有效为二氧化硅微粒提供1至50m2/g的BET比表面积的量存在的材料。沉淀二氧化硅用于口腔护理应用。U.S. Patent No. 6,946,119 discloses a precipitated silica product comprising silica particles having a median diameter of 1 to 100 micrometers supporting a surface deposit thereon, the surface deposit comprising active precipitated amorphous silica, a material present in an amount effective to provide the silica particles with a BET specific surface area of 1 to 50 m2 /g. The precipitated silica is used in oral care applications.
美国专利号7,255,852描述了一种沉淀二氧化硅,其包含具有多孔表面的二氧化硅粒子产品,该二氧化硅粒子具有小于8m2/g的所有直径大于500A的孔的累积表面积(如通过压汞法测量的)、小于约20m2/g的BET比表面积,和大于55%的西吡氯铵相容性百分比(%CPC)。沉淀二氧化硅用于口腔护理应用。U.S. Patent No. 7,255,852 describes a precipitated silica comprising a silica particle product having a porous surface, the silica particles having a cumulative surface area of all pores having a diameter greater than 500 Å less than 8 m2 /g (as measured by mercury intrusion porosimetry), a BET specific surface area less than about 20 m2 /g, and a percent compatibility of cetylpyridinium chloride (%CPC) greater than 55%. The precipitated silica is used in oral care applications.
美国专利号7,438,895公开了其上具有沉淀二氧化硅涂层的磨料沉淀二氧化硅材料,其中所述沉淀二氧化硅涂层比其所施加的材料更致密,且其中所述经涂覆的沉淀二氧化硅材料表现出在5.5和8微米之间的中值粒径、至多约2.4m2/g的直径大于500A的孔的孔面积,和至少90%的在140℉下老化所述材料7天后西吡氯铵相容性百分比。U.S. Patent No. 7,438,895 discloses an abrasive precipitated silica material having a precipitated silica coating thereon, wherein the precipitated silica coating is denser than the material to which it is applied, and wherein the coated precipitated silica material exhibits a median particle size between 5.5 and 8 microns, a pore area of pores having a diameter greater than 500 Å of up to about 2.4 m2 /g, and a cetylpyridinium chloride compatibility percentage of at least 90% after aging the material at 140°F for 7 days.
U.S20080160053描述一种制造磨料二氧化硅材料的方法,其中所述方法包括以下顺序步骤:在高剪切混合条件下,使第一量的硅酸盐和第一量的酸一起任选地在以与第一量的所述硅酸盐的干重相比为5至25%(基于重量/重量)的量存在的至少一种电解质的存在下反应,以形成第一二氧化硅材料;和在所述第一二氧化硅材料的存在下,使第二量的硅酸盐和第二量的酸一起任选地在以与第二量的所述硅酸盐的干重相比为5至25%(基于重量/重量)的量存在的至少一种电解质的存在下反应,以在所述第一二氧化硅材料的表面上形成致密相涂层,从而形成二氧化硅涂覆的二氧化硅材料;其中所述至少一种电解质存在于所述步骤"a"或"b"中的任一个中或两个步骤期间,且其中所述步骤"b"任选地在高剪切混合条件下进行。U.S20080160053 describes a method for making an abrasive silica material, wherein the method comprises the following sequential steps: reacting a first amount of a silicate and a first amount of an acid together, optionally in the presence of at least one electrolyte present in an amount of 5 to 25% (on a weight/weight basis) compared to the dry weight of the first amount of the silicate, under high shear mixing conditions to form a first silica material; and reacting a second amount of a silicate and a second amount of an acid together, optionally in the presence of at least one electrolyte present in an amount of 5 to 25% (on a weight/weight basis) compared to the dry weight of the second amount of the silicate, in the presence of the first silica material, to form a dense phase coating on the surface of the first silica material, thereby forming a silica-coated silica material; wherein the at least one electrolyte is present in either of the steps "a" or "b" or during both steps, and wherein the step "b" is optionally performed under high shear mixing conditions.
美国专利号10,328,002公开一种洁齿剂(dentifrice)组合物,其包含:包含沉淀二氧化硅粒子的磨料,该沉淀二氧化硅粒子的特征在于:在约0.1至约9m2/g范围内的BET表面积;在约35至约55lb/ft3范围内的堆积密度(pack density);在约8至约25mg损失/100,000转范围内的Einlehner磨损值;在约0.4-1.2cc/g范围内的总压汞孔体积;和在约70至约99%范围内的亚锡相容性;其中该磨料包含约1000埃或更大尺寸的大孔并且缺乏尺寸小于约500-1000埃的小孔。U.S. Pat. No. 10,328,002 discloses a dentifrice composition comprising: an abrasive comprising precipitated silica particles characterized by: a BET surface area in the range of about 0.1 to about 9 m2 /g; a pack density in the range of about 35 to about 55 lb/ft3; an Einlehner abrasion value in the range of about 8 to about 25 mg loss/100,000 revolutions; a total mercury intrusion pore volume in the range of about 0.4-1.2 cc/g; and a stannous compatibility in the range of about 70 to about 99%; wherein the abrasive comprises macropores of about 1000 angstroms or greater in size and lacks micropores of less than about 500-1000 angstroms in size.
WO 2018114280描述了二氧化硅粒子,其具有:在约0.1至约7m2/g范围内的BET表面积;在约35至约55lb/ft3范围内的堆积密度;在约8至约25mg损失/100,000转范围内的Einlehner磨损值;在约0.7至约1.2cc/g范围内的总压汞孔体积,和在约70至约99%范围内的亚锡相容性。WO 2018114280 describes silica particles having: a BET surface area in the range of about 0.1 to about 7 m 2 /g; a bulk density in the range of about 35 to about 55 lb/ft 3; an Einlehner abrasion value in the range of about 8 to about 25 mg loss/100,000 revolutions; a total mercury intrusion pore volume in the range of about 0.7 to about 1.2 cc/g, and a stannous compatibility in the range of about 70 to about 99%.
U.S.20190374448公开了一种洁齿剂组合物,其包含:粘合剂;表面活性剂;二氧化硅粒子;其中该二氧化硅粒子包含:在约4至约25μm范围内的d50中值粒径;在0至约10m2/g范围内的BET表面积;和在约0.2至约1.5cc/g范围内的总压汞孔体积。US20190374448 discloses a dentifrice composition comprising: a binder; a surfactant; silica particles; wherein the silica particles comprise: a d50 median particle size in the range of about 4 to about 25 μm; a BET surface area in the range of 0 to about 10 m 2 /g; and a total mercury intrusion pore volume in the range of about 0.2 to about 1.5 cc/g.
WO 2019238777描述了二氧化硅粒子,其特征在于:(i)在约8至约20μm范围内的d50中值粒径;(ii)大于或等于约0.9的球形度系数(S80);(iii)在约0.1至约8m2/g范围内的BET表面积;(iv)在约0.35至约0.8cc/g范围内的总压汞孔体积;(v)在约3至约7重量%范围内的烧失量(LOI)。WO 2019238777 describes silica particles characterized by: (i) a d50 median particle size in the range of about 8 to about 20 μm; (ii) a sphericity coefficient (S80) greater than or equal to about 0.9; (iii) a BET surface area in the range of about 0.1 to about 8 m 2 /g; (iv) a total mercury intrusion pore volume in the range of about 0.35 to about 0.8 cc/g; (v) a loss on ignition (LOI) in the range of about 3 to about 7 weight %.
沉淀二氧化硅提供与成分的相容性,同时提供清洁和磨损的正确平衡,这在牙膏配方中很重要。现有技术均未解决缺乏与其他成分(如CPC和BAC)的相容性和香料相容性的问题,并同时未实现在正常范围内的PCR(80-110)和RDA(100-220)值。Precipitated silica provides compatibility with ingredients while providing the right balance of cleaning and abrasion, which is important in toothpaste formulations. None of the prior art addresses the lack of compatibility with other ingredients (such as CPC and BAC) and flavor compatibility, while also failing to achieve PCR (80-110) and RDA (100-220) values within the normal range.
发明内容Summary of the invention
本发明的发明人现已发现,在具有在当前二氧化硅清洁剂的范围内的可接受PCR/RDA值的口腔护理应用中,具有高的初级粒径的二氧化硅可导致与CPC、BAC和/或香料的高相容性。The inventors of the present invention have now discovered that silica with a high primary particle size can result in high compatibility with CPC, BAC and/or flavors in oral care applications with acceptable PCR/RDA values within the range of current silica cleansers.
因此,本发明的主题为沉淀二氧化硅,其特征在于大于80nm、优选大于90nm、更优选大于100nm、仍优选大于110nm、最优选在120nm和500nm之间的初级粒径均值,10-40m2/g、优选10-26m2/g、更优选10-23m2/g、最优选10-20m2/g的BET表面积,0.75-2.00cc/g、优选0.80-1.80cc/g、更优选0.85-1.65cc/g、更优选0.90-1.50cc/g的总压汞体积,和60-120cc/100g、优选60-110cc/100g、更优选60-100cc/100g、最优选60-90cc/100g的吸油量。The subject of the present invention is therefore a precipitated silica characterized by a mean primary particle size of greater than 80 nm, preferably greater than 90 nm, more preferably greater than 100 nm, still preferably greater than 110 nm, most preferably between 120 nm and 500 nm, a BET surface area of 10-40 m 2 /g, preferably 10-26 m 2 /g, more preferably 10-23 m 2 /g, most preferably 10-20 m 2 /g, a total mercury intrusion volume of 0.75-2.00 cc/g, preferably 0.80-1.80 cc/g, more preferably 0.85-1.65 cc/g, more preferably 0.90-1.50 cc/g, and an oil absorption of 60-120 cc/100 g, preferably 60-110 cc/100 g, more preferably 60-100 cc/100 g, most preferably 60-90 cc/100 g.
本发明的主题也为一种方法,其包括:The subject of the invention is also a method comprising:
(a)在搅拌下将酸和碱金属硅酸盐或碱土金属硅酸盐在硅酸盐添加速率V1和70-96℃的温度下连续地进料到液体介质中以形成二氧化硅粒子,(a) feeding an acid and an alkali metal silicate or an alkaline earth metal silicate continuously into a liquid medium under stirring at a silicate addition rate V1 and a temperature of 70-96° C. to form silica particles,
(b)停止进料碱金属硅酸盐或碱土金属硅酸盐和酸,并且然后在搅拌下将温度升高至90至100℃、优选94至96℃,(b) stopping the feeding of alkali metal silicate or alkaline earth metal silicate and acid, and then raising the temperature to 90 to 100° C., preferably 94 to 96° C., under stirring,
(c)在搅拌下添加碱金属硅酸盐或碱土金属硅酸盐和酸,其中该硅酸盐添加速率为硅酸盐添加速率V1的1至40%、优选1至30%、更优选2至10%、仍优选3至5%,且在碱金属硅酸盐或碱土金属硅酸盐的添加期间,通过调节酸速率,使9.0至10.0、优选9.5至9.9、更优选9.6至9.8的pH值保持恒定,(c) adding alkali metal silicate or alkaline earth metal silicate and acid under stirring, wherein the silicate addition rate is 1 to 40%, preferably 1 to 30%, more preferably 2 to 10%, still preferably 3 to 5% of the silicate addition rate V1, and during the addition of the alkali metal silicate or alkaline earth metal silicate, the pH value of 9.0 to 10.0, preferably 9.5 to 9.9, more preferably 9.6 to 9.8 is kept constant by adjusting the acid rate,
(d)停止添加碱金属硅酸盐或碱土金属硅酸盐,并在搅拌下添加酸直到达到5.0至7.0、优选5.5至6.5的pH。(d) The addition of alkali metal silicate or alkaline earth metal silicate is stopped and acid is added with stirring until a pH of 5.0 to 7.0, preferably 5.5 to 6.5, is reached.
本发明的另一主题为本发明的二氧化硅在化妆品、抗结块自由/流动(anti-caking free/flow)、食品、载体应用、洁齿剂和漱口水中的用途。A further subject of the present invention is the use of the silicas according to the invention in cosmetics, anti-caking free/flow, foods, carrier applications, dentifrices and mouthwashes.
具体实施方式DETAILED DESCRIPTION
本发明的沉淀二氧化硅具有大于80nm、优选大于90nm、更优选大于100nm、仍优选大于110nm、最优选在120nm和500nm之间的初级粒径均值,10-40m2/g、优选10-26m2/g、更优选10-23m2/g、最优选10-20m2/g的BET表面积,0.75-2.00cc/g、优选0.80-1.80cc/g、更优选0.85-1.65cc/g、更优选0.90-1.50cc/g的总压汞体积,和60-120cc/100g、优选60-110cc/100g、更优选60-100cc/100g、最优选60-90cc/100g的吸油量。The precipitated silica of the present invention has a mean primary particle size of greater than 80 nm, preferably greater than 90 nm, more preferably greater than 100 nm, still preferably greater than 110 nm, most preferably between 120 nm and 500 nm, a BET surface area of 10-40 m2 /g, preferably 10-26 m2 /g, more preferably 10-23 m2 /g, most preferably 10-20 m2 /g, a total mercury intrusion volume of 0.75-2.00 cc/g, preferably 0.80-1.80 cc/g, more preferably 0.85-1.65 cc/g, more preferably 0.90-1.50 cc/g, and an oil absorption of 60-120 cc/100 g, preferably 60-110 cc/100 g, more preferably 60-100 cc/100 g, most preferably 60-90 cc/100 g.
本发明的二氧化硅具有高的初级粒径。The silica of the present invention has a high primary particle size.
根据本发明的沉淀二氧化硅可具有10-35m2/g、优选20-30m2/g的CTAB表面积。The precipitated silica according to the invention may have a CTAB surface area of 10 to 35 m 2 /g, preferably 20 to 30 m 2 /g.
根据本发明的沉淀二氧化硅可具有0.40-0.80g/cm3、优选0.48-0.75g/cm3的堆积密度。The precipitated silica according to the present invention may have a bulk density of 0.40-0.80 g/cm 3 , preferably 0.48-0.75 g/cm 3 .
根据本发明的沉淀二氧化硅可具有小于18mg损失/100k转、优选3至18mg损失/100k转的Einlehner值。The precipitated silica according to the invention may have an Einlehner value of less than 18 mg loss/100 k revolutions, preferably from 3 to 18 mg loss/100 k revolutions.
根据本发明的二氧化硅的C含量可低于3%、优选低于1%、更优选0%至0.5%、最优选0%至0.1%。The C content of the silica according to the present invention may be lower than 3%, preferably lower than 1%, more preferably from 0% to 0.5%, most preferably from 0% to 0.1%.
根据本发明的沉淀二氧化硅可具有大于90nm的初级粒径均值、10-26m2/g的BET表面积、0.75-2.00cc/g的总压汞体积(total mercury intruded volume)和60-120cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size greater than 90 nm, a BET surface area of 10-26 m 2 /g, a total mercury intruded volume of 0.75-2.00 cc/g, and an oil absorption of 60-120 cc/100 g.
根据本发明的沉淀二氧化硅可具有大于80nm的初级粒径均值、10-30m2/g的BET表面积、0.80-1.80cc/g的总压汞体积和70-110cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size greater than 80 nm, a BET surface area of 10-30 m 2 /g, a total mercury intrusion volume of 0.80-1.80 cc/g, and an oil absorption of 70-110 cc/100 g.
根据本发明的沉淀二氧化硅可具有大于90nm的初级粒径均值、10-26m2/g的BET表面积、0.80-1.80cc/g的总压汞体积和70-110cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size greater than 90 nm, a BET surface area of 10-26 m 2 /g, a total mercury intrusion volume of 0.80-1.80 cc/g, and an oil absorption of 70-110 cc/100 g.
根据本发明的沉淀二氧化硅可具有大于100nm的初级粒径均值、10-23m2/g的BET表面积、0.75-2.00cc/g的总压汞体积和60-120cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size greater than 100 nm, a BET surface area of 10-23 m 2 /g, a total mercury intrusion volume of 0.75-2.00 cc/g, and an oil absorption of 60-120 cc/100 g.
根据本发明的沉淀二氧化硅可具有大于80nm的初级粒径均值、10-30m2/g的BET表面积、0.85-1.65cc/g的总压汞体积和60-100cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size greater than 80 nm, a BET surface area of 10-30 m2 /g, a total mercury intrusion volume of 0.85-1.65 cc/g, and an oil absorption of 60-100 cc/100 g.
根据本发明的沉淀二氧化硅可具有大于100nm的初级粒径均值、10-23m2/g的BET表面积、0.85-1.65cc/g的总压汞体积和60-100cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size greater than 100 nm, a BET surface area of 10-23 m 2 /g, a total mercury intrusion volume of 0.85-1.65 cc/g, and an oil absorption of 60-100 cc/100 g.
根据本发明的沉淀二氧化硅可具有120-500nm的初级粒径均值、10-20m2/g的BET表面积、0.75-2.00cc/g的总压汞体积和60-120cc/100g的吸油量。The precipitated silica according to the present invention may have a primary particle size mean of 120-500 nm, a BET surface area of 10-20 m 2 /g, a total mercury intrusion volume of 0.75-2.00 cc/g, and an oil absorption of 60-120 cc/100 g.
根据本发明的沉淀二氧化硅可具有大于80nm的初级粒径均值、10-30m2/g的BET表面积、0.90-1.50cc/g的总压汞体积和60-90cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size greater than 80 nm, a BET surface area of 10-30 m2 /g, a total mercury intrusion volume of 0.90-1.50 cc/g, and an oil absorption of 60-90 cc/100 g.
根据本发明的沉淀二氧化硅可具有120-500nm的初级粒径均值、10-20m2/g的BET表面积、0.90-1.50cc/g的总压汞体积和60-90cc/100g的吸油量。The precipitated silica according to the present invention may have a mean primary particle size of 120-500 nm, a BET surface area of 10-20 m 2 /g, a total mercury intrusion volume of 0.90-1.50 cc/g, and an oil absorption of 60-90 cc/100 g.
根据本发明的方法包含至少四个步骤:The method according to the invention comprises at least four steps:
(a)在搅拌下将酸和碱金属硅酸盐或碱土金属硅酸盐在硅酸盐添加速率V1和70-96℃的温度下连续地进料到液体介质中以形成二氧化硅粒子(a) continuously feeding an acid and an alkali metal silicate or an alkaline earth metal silicate into a liquid medium under stirring at a silicate addition rate V1 and a temperature of 70-96° C. to form silica particles
(b)停止进料碱金属硅酸盐或碱土金属硅酸盐和酸,并且然后在搅拌下将温度升高至90至100℃、优选94至96℃,(b) stopping the feeding of alkali metal silicate or alkaline earth metal silicate and acid, and then raising the temperature to 90 to 100° C., preferably 94 to 96° C., under stirring,
(c)在搅拌下添加碱金属硅酸盐或碱土金属硅酸盐和酸,其中该硅酸盐添加速率为硅酸盐添加速率V1的1至40%、优选5至30%、更优选7至25%、仍优选10至20%,且在碱金属硅酸盐或碱土金属硅酸盐的添加期间,通过调节酸速率,使9.0至10.0、优选9.5至9.9、更优选9.6至9.8的pH值保持恒定,(c) adding alkali metal silicate or alkaline earth metal silicate and acid under stirring, wherein the silicate addition rate is 1 to 40%, preferably 5 to 30%, more preferably 7 to 25%, still preferably 10 to 20% of the silicate addition rate V1, and during the addition of the alkali metal silicate or alkaline earth metal silicate, the pH value of 9.0 to 10.0, preferably 9.5 to 9.9, more preferably 9.6 to 9.8 is kept constant by adjusting the acid rate,
(d)停止添加碱金属硅酸盐或碱土金属硅酸盐,并在搅拌下添加酸直到达到5.0至7.0、优选5.5至6.5的pH。(d) The addition of alkali metal silicate or alkaline earth metal silicate is stopped and acid is added with stirring until a pH of 5.0 to 7.0, preferably 5.5 to 6.5, is reached.
步骤(d)的二氧化硅可以例如在压滤机中被过滤(e)。The silica from step (d) can be filtered (e), for example in a filter press.
步骤(e)的二氧化硅可以例如在喷雾干燥器中被干燥(f)。The silicon dioxide of step (e) can be dried (f), for example in a spray dryer.
步骤(f)的二氧化硅可以被研磨。The silica of step (f) may be ground.
优选地在步骤(a)期间添加碱金属硅酸盐或碱土金属硅酸盐的总体积的35至65%。Preferably 35 to 65% of the total volume of the alkali metal silicate or alkaline earth metal silicate is added during step (a).
步骤(a)中的液体介质可以是碱金属硅酸盐或碱土金属硅酸盐和水。The liquid medium in step (a) may be an alkali metal silicate or an alkaline earth metal silicate and water.
步骤(a)中的温度范围可为70至95℃、优选70至90℃、更优选80至90℃。The temperature in step (a) may range from 70 to 95°C, preferably from 70 to 90°C, more preferably from 80 to 90°C.
步骤(a)中的酸速率可足以将pH维持在8.5至10.5之间、更优选9.5至10.2。The acid rate in step (a) may be sufficient to maintain the pH between 8.5 and 10.5, more preferably 9.5 to 10.2.
步骤(c)中的硅酸盐速率可减慢至步骤(a)中速率的5至30%、更优选10至20%。The silicate rate in step (c) may be slowed to 5 to 30%, more preferably 10 to 20% of the rate in step (a).
步骤(a)和(c)中的碱金属硅酸盐可优选为硅酸钠。The alkali metal silicate in steps (a) and (c) may preferably be sodium silicate.
可调节步骤(c)中的硅酸盐添加速率,从而在该步骤中添加的硅酸盐的%/hr小于30%/hr、优选15至25%/hr,基于该批次期间添加的硅酸盐的总量。添加的硅酸盐的%/hr通过以下计算:步骤(c)中使用的硅酸盐的体积/步骤(c)的以小时计的时间/步骤(a)和步骤(c)中使用的硅酸盐的体积*100。The silicate addition rate in step (c) may be adjusted so that the %/hr of silicate added in this step is less than 30%/hr, preferably 15 to 25%/hr, based on the total amount of silicate added during the batch. The %/hr of silicate added is calculated by: volume of silicate used in step (c)/time in hours of step (c)/volume of silicate used in steps (a) and (c)*100.
步骤(a)、(c)和(d)中的酸可优选为硫酸。The acid in steps (a), (c) and (d) may preferably be sulfuric acid.
步骤(c)的时间可为100至500分钟、优选150至300分钟。The time of step (c) may be 100 to 500 minutes, preferably 150 to 300 minutes.
本发明的沉淀二氧化硅可通过本发明的方法制造。The precipitated silica of the present invention can be produced by the method of the present invention.
本发明的沉淀二氧化硅可用于化妆品、抗结块自由/流动、食品、载体应用、洁牙剂和漱口水。The precipitated silica of the present invention can be used in cosmetics, anti-caking free/flowing, food, carrier applications, dentifrices and mouthwashes.
本发明的沉淀二氧化硅在口腔护理应用中具有改善的与西吡氯铵(CPC)、苯扎氯铵(BAC)和香料的相容性。The precipitated silica of the present invention has improved compatibility with cetylpyridinium chloride (CPC), benzalkonium chloride (BAC) and flavors in oral care applications.
实施例Example
通过SEM测定的初级粒径均值The average primary particle size was determined by SEM.
通过扫描电子显微镜以50,000倍的放大率拍摄图像。所述图像用铂进行溅射,并小心谨慎以便溅射不会引起粒子表面的纹理化,因为这可能被误认为初级结构。所述图像必须代表整个样品,且包含最少30个粒子。然后测量初级粒子。如果粒子不是完全圆形,则使用横跨每个粒子的最小直径。不应使用无法完全观察到的图像边缘上的粒子。然后基于数据集计算平均值和中值。Images were taken with a scanning electron microscope at a magnification of 50,000 times. The images were sputtered with platinum and care was taken so that the sputtering did not cause texturing of the particle surface, as this could be mistaken for primary structure. The images had to represent the entire sample and contain a minimum of 30 particles. The primary particles were then measured. If the particles were not completely round, the minimum diameter across each particle was used. Particles on the edges of the image that could not be fully observed should not be used. The mean and median values were then calculated based on the data set.
碳含量Carbon content
碳含量是在LECO SC832碳/硫分析仪上测量的。Carbon content was measured on a LECO SC832 carbon/sulfur analyzer.
亮度brightness
将二氧化硅样品压制成表面光滑的丸粒,并使用Technidyne Brightmeter S-5/BC进行分析。该仪器具有双光束光学系统,其中以45°的角度照射样品,且以0°观察反射光。其符合TAPPI试验方法T452和T646,以及ASTM标准D985。用足够的压力将粉末材料压制成约1cm的丸粒,以使丸粒表面光滑,且没有松散的粒子或光泽。The silica samples were pressed into smooth-surfaced pellets and analyzed using a Technidyne Brightmeter S-5/BC. The instrument has a dual-beam optical system where the sample is illuminated at an angle of 45° and the reflected light is observed at 0°. It complies with TAPPI test methods T452 and T646, and ASTM standard D985. The powdered material was pressed into pellets of approximately 1 cm with sufficient pressure to provide a smooth surface to the pellets without loose particles or sheen.
水分Moisture
通过在105℃下加热二氧化硅2小时来测定水分。Moisture was determined by heating silica at 105°C for 2 hours.
BET表面积BET surface area
本发明的二氧化硅的BET表面积是用Micromeritics TriStar 3020仪器通过Brunaur等人的J.Am.Chem.Soc.,60,309(1938)的BET氮气吸附法测定,这在微粒材料(诸如二氧化硅和硅酸盐材料)的领域是已知的。The BET surface area of the silica of the present invention is determined using a Micromeritics TriStar 3020 instrument by the BET nitrogen adsorption method of Brunaur et al., J. Am. Chem. Soc., 60, 309 (1938), which is known in the art of particulate materials such as silica and silicate materials.
吸油量Oil absorption
吸油量值是根据ASTM D281中描述的擦除法(rub-out method)使用亚麻籽油测定(每100g粒子吸收的油(cc))。通常,较高的吸油量水平指示较高结构的粒子,而较低的值通常指示较低结构的粒子。Oil absorption values are determined using linseed oil (cc of oil absorbed per 100 g of particles) according to the rub-out method described in ASTM D281. Generally, higher oil absorption levels indicate higher structure particles, while lower values generally indicate lower structure particles.
总压汞体积Total mercury intrusion volume
压汞体积或总孔体积(Hg)是使用Micromeritics AutoPore IV 9520(或Micromeritics AutoPore V 9620)设备通过汞孔隙率法(mercury porosimetry)测量。孔直径是通过Washburn等式,使用等于130°的接触角Theta(Θ)和等于484达因/cm的表面张力伽玛计算的。由于压力的作用,汞被迫进入粒子的空隙中,且在每个压力设置下计算每克样品的压入的汞体积。本文表示的总孔体积表示从真空到60,000psi的压力下压入的汞的累积体积。将每个压力设置下的体积增量(cm3/g)相对于对应于该压力设置增量的孔半径或直径作图。压入体积相对孔半径或直径曲线中的峰值对应于孔径分布中的模式,并确定样品中最常见的孔径。具体地,调整样品尺寸以在具有5mL球状物和约1.1mL的柄体积(stemvolume)的粉末针入度测定计(penetrometer)中实现25至90%的柄体积。将样品抽真空至50μm Hg的压力并保持5分钟。汞在4.0至60,000psi的压力下填充孔,每个数据收集点的平衡时间为10秒。如上所述的总孔体积采集由各个粒子内的孔结构产生的粒子内孔隙率的体积,以及由压力下的填充粒子的间隙间隔形成的粒子间孔隙率的体积。为了更好地分离和测量检查所生产的非晶态二氧化硅的实际粒子内孔隙率,可以使用<0.11μm的孔的孔体积。Mercury intrusion volume or total pore volume (Hg) is measured by mercury porosimetry using a Micromeritics AutoPore IV 9520 (or Micromeritics AutoPore V 9620) device. The pore diameter is calculated by the Washburn equation using a contact angle Theta (θ) equal to 130° and a surface tension gamma equal to 484 dynes/cm. Mercury is forced into the voids of the particles due to the pressure, and the volume of mercury intruded per gram of sample is calculated at each pressure setting. The total pore volume expressed herein represents the cumulative volume of mercury intruded at pressures from vacuum to 60,000 psi. The volume increment (cm 3 /g) at each pressure setting is plotted against the pore radius or diameter corresponding to that pressure setting increment. The peak in the intrusion volume versus pore radius or diameter curve corresponds to the mode in the pore size distribution and determines the most common pore size in the sample. Specifically, the sample size is adjusted to achieve a stem volume of 25 to 90% in a powder penetrometer with a 5 mL sphere and a stem volume of about 1.1 mL. The sample is evacuated to a pressure of 50 μm Hg and maintained for 5 minutes. Mercury fills the pores at a pressure of 4.0 to 60,000 psi, with a 10 second equilibrium time for each data collection point. The total pore volume as described above collects the volume of intra-particle porosity generated by the pore structure within each particle, as well as the volume of inter-particle porosity formed by the interstitial spacing of the filled particles under pressure. In order to better separate and measure the actual intra-particle porosity of the produced amorphous silica, the pore volume of pores <0.11 μm can be used.
EinlehnerEinlehner
按如下使用Einlehner AT-1000Abrader:(1)将预先清洁和干燥的Fourdrinier黄铜丝网称重并暴露于10%二氧化硅水悬浮液的作用固定长度的时间,具体地100g的样品在900g的去离子水中;(2)然后将磨损量测定为每100,000转Fourdrinier丝网损失的黄铜毫克数。以mg损失为单位测量的结果被表征为10%黄铜Einlehner(BE)磨损值。The Einlehner AT-1000 Abrader was used as follows: (1) a pre-cleaned and dried Fourdrinier brass screen was weighed and exposed to the action of a 10% silica suspension in water for a fixed length of time, specifically 100 g of sample in 900 g of deionized water; (2) the amount of wear was then measured as milligrams of brass lost per 100,000 revolutions of the Fourdrinier screen. The result measured in mg loss was characterized as the 10% brass Einlehner (BE) wear value.
CTAB表面积CTAB surface area
本文公开的CTAB表面积是通过CTAB(溴化十六烷基三甲基铵)在二氧化硅表面上的吸收、通过离心分离出的过量、和使用表面活性剂电极用十二烷基硫酸钠滴定测定的量来测定。具体地,将约0.5g的二氧化硅粒子置于装有100mL CTAB溶液(5.5g/L)的250mL烧杯中,在电动搅拌盘上混合1小时,然后以10,000RPM离心30分钟。将1mL的10% Triton X-100添加到在100mL烧杯中的5mL澄清上清液中。用0.1N HCl将pH调节到3至3.5,并使用表面活性剂电极(Brinkmann SUR1501-DL)用0.01M十二烷基硫酸钠滴定试样以测定终点。The CTAB surface area disclosed herein is determined by the absorption of CTAB (hexadecyltrimethylammonium bromide) on the silica surface, the excess separated by centrifugation, and the amount measured by titration with sodium dodecyl sulfate using a surfactant electrode. Specifically, about 0.5 g of silica particles are placed in a 250 mL beaker containing 100 mL of CTAB solution (5.5 g/L), mixed on an electric stirring plate for 1 hour, and then centrifuged at 10,000 RPM for 30 minutes. 1 mL of 10% Triton X-100 is added to 5 mL of clear supernatant in a 100 mL beaker. The pH is adjusted to 3 to 3.5 with 0.1 N HCl, and the sample is titrated with 0.01 M sodium dodecyl sulfate using a surfactant electrode (Brinkmann SUR1501-DL) to determine the endpoint.
粒径Particle size
本发明的二氧化硅的粒径的测量是在HORIBA激光散射干燥粒径分布分析仪LA-960上通过散射的激光光线的角度进行。The particle size of the silicon dioxide of the present invention is measured by the angle of scattered laser light using a HORIBA laser scattering dry particle size distribution analyzer LA-960.
水校正的AbC值Water-corrected AbC values
使用来自C.W.Brabender Instruments,Inc.的吸收计“C”扭矩流变仪测定吸水值。将约1/3杯的二氧化硅的样品转移到吸收计的混合室中并以150RPM混合。然后以6mL/min的速率添加水,并记录混合粉末所需的扭矩。当水被粉末吸收时,在粉末从自由流动转变为糊状时,扭矩达到最大值。然后将达到最大扭矩时添加的水的总体积标准化为100g的粉末可吸收的水量。由于粉末是以原样基础上使用的(未预先干燥),因此使用粉末的游离水分值以通过以下等式计算“水分校正的水AbC值”。The water absorption value is determined using an Absorptometer "C" torque rheometer from C.W.Brabender Instruments, Inc. A sample of about 1/3 cup of silica is transferred to the mixing chamber of the Absorptometer and mixed at 150RPM. Water is then added at a rate of 6mL/min, and the torque required to mix the powder is recorded. The torque reaches a maximum value when the powder changes from free flowing to a paste as the water is absorbed by the powder. The total volume of water added when the maximum torque is reached is then standardized to the amount of water that 100g of powder can absorb. Since the powder is used on an as is basis (not pre-dried), the free moisture value of the powder is used to calculate the "moisture-corrected water AbC value" by the following equation.
5重量%pH5 wt% pH
通过称取5.0g的样品(精确到0.1g)并将称重的样品转移到250mL烧杯中来测量5%pH。添加95mL的DI水并将样品搅拌5分钟。然后在搅拌样品的同时用pH计测量pH。5% pH was measured by weighing 5.0 g of sample (accurate to 0.1 g) and transferring the weighed sample into a 250 mL beaker. 95 mL of DI water was added and the sample was stirred for 5 minutes. The pH was then measured with a pH meter while the sample was stirred.
堆积密度和倾倒密度Bulk density and pouring density
通过将20.0g的样品放入具有平坦橡胶底的250mL刻度量筒中来测量堆积密度和倾倒密度。记录初始体积并用于通过将所用样品的重量除以该体积来计算倾倒密度。接着将量筒放在以特定的RPM在凸轮上旋转的振实密度机上。凸轮被设计成每秒将量筒升高和降低5.715cm的距离,直到样品体积恒定,通常持续15分钟。记录该最终体积并用于通过将所用样品的重量除以该体积来计算堆积密度。The sample of 20.0g is put into the 250mL graduated cylinder with flat rubber bottom to measure bulk density and pour density.Record initial volume and be used for calculating pour density by the weight of used sample divided by this volume.Then graduated cylinder is placed on the tap density machine that rotates on cam with specific RPM.Cam is designed to raise and lower the distance of 5.715cm by graduated cylinder per second, until sample volume is constant, usually lasts 15 minutes.Record this final volume and be used for calculating bulk density by the weight of used sample divided by this volume.
实施例1A:(发明实施例)Example 1A: (Inventive Example)
将383mL的硅酸钠(2.65MR,1.193g/mL)和957mL的水添加到7L实验室规模的反应器中,并在来自配备有螺旋桨叶片的顶置式搅拌器的在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以39.0mL/min和16.4mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL)和硫酸(1.121g/mL)持续38分钟。38分钟过后,停止硅酸钠和硫酸的流动,并将反应混合物加热至95℃。一旦达到95℃,就以10.2mL/min添加硅酸钠(2.65MR,1.193g/mL)并以足以维持pH 9.6(+/-0.1)的速率添加硫酸(1.121g/ml)持续额外150分钟。在该额外150分钟过后,停止硅酸钠的流动,并通过以5.1mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并在105℃下干燥过夜。383 mL of sodium silicate (2.65 MR, 1.193 g/mL) and 957 mL of water were added to a 7 L laboratory scale reactor and heated to 85° C. with stirring at 350 RPM from an overhead stirrer equipped with a propeller blade. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 39.0 mL/min and 16.4 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate and sulfuric acid was stopped and the reaction mixture was heated to 95° C. Once 95° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) was added at 10.2 mL/min and sulfuric acid (1.121 g/ml) was added at a rate sufficient to maintain pH 9.6 (+/- 0.1) for an additional 150 minutes. After this additional 150 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 5.1 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and dried at 105°C overnight.
实施例1B:(发明实施例)Example 1B: (Inventive Example)
将273mL的硅酸钠(2.65MR,1.193g/mL)和681mL的水添加到7L实验室规模的反应器中,并在来自配备有螺旋桨叶片的顶置式搅拌器的在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以27.7mL/min和11.7mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL)和硫酸(1.121g/mL)持续38分钟。38分钟过后,停止硅酸钠和硫酸的流动,并将反应混合物加热至95℃。一旦达到95℃,就以10.7mL/min添加硅酸钠(2.65MR,1.193g/mL)并以足以维持pH 9.6(+/-0.1)的速率添加硫酸(1.121g/ml)持续额外210分钟。在该额外210分钟过后,停止硅酸钠的流动,并通过以5.1mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并在105℃下干燥过夜。273 mL of sodium silicate (2.65 MR, 1.193 g/mL) and 681 mL of water were added to a 7 L laboratory scale reactor and heated to 85° C. with stirring at 350 RPM from an overhead stirrer equipped with a propeller blade. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 27.7 mL/min and 11.7 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate and sulfuric acid was stopped and the reaction mixture was heated to 95° C. Once 95° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) was added at 10.7 mL/min and sulfuric acid (1.121 g/ml) was added at a rate sufficient to maintain pH 9.6 (+/- 0.1) for an additional 210 minutes. After this additional 210 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 5.1 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and dried at 105°C overnight.
实施例1C:(发明实施例)Example 1C: (Inventive Example)
将273mL的硅酸钠(2.65MR,1.193g/mL)和681mL的水添加到7L实验室规模的反应器中,并在来自配备有螺旋桨叶片的顶置式搅拌器的在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以43.8mL/min和18.4mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL)和硫酸(1.121g/mL)持续38分钟。38分钟过后,停止硅酸钠和硫酸的流动,并将反应混合物加热至95℃。一旦达到95℃,就以9.8mL/min添加硅酸钠(2.65MR,1.193g/mL)并以足以维持pH 9.6(+/-0.1)的速率添加硫酸(1.121g/ml)持续额外120分钟。在该额外120分钟过后,停止硅酸钠的流动,并通过以4.7mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并在105℃下干燥过夜。273 mL of sodium silicate (2.65 MR, 1.193 g/mL) and 681 mL of water were added to a 7 L laboratory scale reactor and heated to 85° C. with stirring at 350 RPM from an overhead stirrer equipped with a propeller blade. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 43.8 mL/min and 18.4 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate and sulfuric acid was stopped and the reaction mixture was heated to 95° C. Once 95° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) was added at 9.8 mL/min and sulfuric acid (1.121 g/ml) was added at a rate sufficient to maintain pH 9.6 (+/- 0.1) for an additional 120 minutes. After the additional 120 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 4.7 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and dried at 105°C overnight.
实施例2A:(发明实施例)Example 2A: (Inventive Example)
将320mL的硅酸钠(2.65MR,1.193g/mL)和824mL的水添加到7L实验室规模的反应器中,并在来自配备有螺旋桨叶片的顶置式搅拌器的在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以33.8mL/min和15.1mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL)和硫酸(1.121g/mL)持续47分钟。47分钟过后,停止硅酸钠和硫酸的流动,并将反应混合物加热至95℃。一旦达到95℃,就以10.4mL/min添加硅酸钠(2.65MR,1.193g/mL)并以足以维持pH 9.6(+/-0.1)的速率添加硫酸(1.121g/ml)持续额外150分钟。在该额外150分钟过后,停止硅酸钠的流动,并通过以5.0mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并在105℃下干燥过夜。320 mL of sodium silicate (2.65 MR, 1.193 g/mL) and 824 mL of water were added to a 7 L laboratory scale reactor and heated to 85° C. with stirring at 350 RPM from an overhead stirrer equipped with a propeller blade. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 33.8 mL/min and 15.1 mL/min, respectively, for 47 minutes. After 47 minutes, the flow of sodium silicate and sulfuric acid was stopped and the reaction mixture was heated to 95° C. Once 95° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL) was added at 10.4 mL/min and sulfuric acid (1.121 g/ml) was added at a rate sufficient to maintain pH 9.6 (+/- 0.1) for an additional 150 minutes. After this additional 150 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 5.0 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and dried at 105°C overnight.
表1示出了实施例的分析值。Table 1 shows the analysis values of Examples.
表1Table 1
对比例5A:Comparative Example 5A:
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以60.4mL/min和25.3mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以25.3mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1483 mL of water were added to a 7 L reactor and heated to 85° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 25.3 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 25.3 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例5B:Comparative Example 5B:
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以60.4mL/min和21.6mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以21.6mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1483 mL of water were added to a 7 L reactor and heated to 85° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 21.6 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 21.6 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例5C:Comparative Example 5C:
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以60.4mL/min和29.2mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以29.2mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1483 mL of water were added to a 7 L reactor and heated to 85° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 29.2 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 29.2 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例5D:Comparative Example 5D:
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以60.4mL/min和29.2mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以29.2mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1483 mL of water were added to a 7 L reactor and heated to 85° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 29.2 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 29.2 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例5E:Comparative Example 5E:
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至85℃。一旦达到85℃,就分别以60.4mL/min和19.1mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以19.1mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1483 mL of water were added to a 7 L reactor and heated to 85° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 19.1 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 19.1 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
表2示出了实施例的分析值。Table 2 shows the analytical values of Examples.
表2Table 2
对比例6AComparative Example 6A
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至80℃。一旦达到85℃,就分别以60.4mL/min和21.6mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以21.6mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1483 mL of water were added to a 7 L reactor and heated to 80° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 21.6 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 21.6 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例6BComparative Example 6B
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至85℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至90℃。一旦达到85℃,就分别以60.4mL/min和21.6mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至85℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以21.6mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 85° C.) and 1483 mL of water were added to a 7 L reactor and heated to 90° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 85° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 21.6 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 21.6 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例6CComparative Example 6C
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至90℃)和1483mL的水添加到7L反应器中,并在350RPM的搅拌下加热至95℃。一旦达到85℃,就分别以60.4mL/min和21.6mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至90℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以21.6mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 90° C.) and 1483 mL of water were added to a 7 L reactor and heated to 95° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 90° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 21.6 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 21.6 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
表3示出了实施例的分析值。Table 3 shows the analytical values of Examples.
表3Table 3
对比例7A:Comparative Example 7A:
将594mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1483mL的水添加到7L反应器中,并在650RPM的搅拌下加热至85℃。一旦达到85℃,就分别以60.4mL/min和25.4mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以25.4mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。594 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1483 mL of water were added to a 7 L reactor and heated to 85° C. with stirring at 650 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 60.4 mL/min and 25.4 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 25.4 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
表4示出了实施例的分析值。Table 4 shows the analytical values of Examples.
表4Table 4
对比例8AComparative Example 8A
将510mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1310mL的水添加到7L反应器中,并在350RPM的搅拌下加热至80℃。一旦达到85℃,就分别以53.7mL/min和24.0mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以24.0mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。510 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1310 mL of water were added to a 7 L reactor and heated to 80° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 53.7 mL/min and 24.0 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 24.0 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例8BComparative Example 8B
将510mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1310mL的水添加到7L反应器中,并在350RPM的搅拌下加热至80℃。一旦达到85℃,就分别以53.7mL/min和27.5mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以27.5mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。510 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1310 mL of water were added to a 7 L reactor and heated to 80° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 53.7 mL/min and 27.5 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 27.5 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例8CComparative Example 8C
将510mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1310mL的水添加到7L反应器中,并在350RPM的搅拌下加热至80℃。一旦达到85℃,就分别以53.7mL/min和20.4mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以20.4mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。510 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1310 mL of water were added to a 7 L reactor and heated to 80° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 53.7 mL/min and 20.4 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 20.4 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例8DComparative Example 8D
将510mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1310mL的水添加到7L反应器中,并在350RPM的搅拌下加热至80℃。一旦达到85℃,就分别以53.7mL/min和19.2mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以19.2mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。510 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1310 mL of water were added to a 7 L reactor and heated to 80° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 53.7 mL/min and 19.2 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 19.2 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
对比例8EComparative Example 8E
将510mL的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和1310mL的水添加到7L反应器中,并在350RPM的搅拌下加热至80℃。一旦达到85℃,就分别以53.7mL/min和18.0mL/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。在38分钟过后,停止硅酸钠的流动,并通过以18.0mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,用14L的水洗涤并烘箱干燥过夜。510 mL of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 1310 mL of water were added to a 7 L reactor and heated to 80° C. with stirring at 350 RPM. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 53.7 mL/min and 18.0 mL/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 18.0 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed with 14 L of water and oven dried overnight.
表5示出了实施例的分析值。Table 5 shows the analytical values of Examples.
表5Table 5
实施例10A:(发明实施例)Example 10A: (Inventive Example)
将62L的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和154L的水添加到1200L反应器中,并在80RPM的搅拌和80L/min的再循环下加热至85℃。一旦达到85℃,就分别以6.27L/min和2.24L/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。38分钟过后,停止硅酸钠和硫酸的流动,并将反应混合物加热至95℃。一旦达到95℃,就以1.63L/min添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)并以足以维持pH 9.6(+/-0.1)的速率添加硫酸(1.121g/ml)持续额外150分钟。在该额外150分钟过后,停止硅酸钠的流动,并通过以0.82mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,洗涤直到电导率<1500μS,喷雾干燥至5%的目标水分,并研磨至约10μm的粒径。62 L of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 154 L of water were added to the 1200 L reactor and heated to 85° C. with stirring at 80 RPM and recirculation at 80 L/min. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 6.27 L/min and 2.24 L/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate and sulfuric acid was stopped and the reaction mixture was heated to 95° C. Once 95° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) was added at 1.63 L/min and sulfuric acid (1.121 g/ml) was added at a rate sufficient to maintain pH 9.6 (+/- 0.1) for an additional 150 minutes. After the additional 150 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 0.82 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed until the conductivity was <1500 μS, spray dried to a target moisture of 5%, and ground to a particle size of approximately 10 μm.
实施例10B:(发明实施例)Example 10B: (Inventive Example)
将53L的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和133L的水添加到1200L反应器中,并在80RPM的搅拌和80L/min的再循环下加热至85℃。一旦达到85℃,就分别以5.42L/min和1.82L/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。38分钟过后,停止硅酸钠和硫酸的流动,并将反应混合物加热至95℃。一旦达到95℃,就以1.63L/min添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)并以足以维持pH 9.6(+/-0.1)的速率添加硫酸(1.121g/ml)持续额外180分钟。在该额外180分钟过后,停止硅酸钠的流动,并通过以0.82mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,洗涤直到电导率<1500μS,喷雾干燥至5%的目标水分,并研磨至约10μm的粒径。53 L of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 133 L of water were added to the 1200 L reactor and heated to 85° C. with stirring at 80 RPM and recirculation at 80 L/min. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 5.42 L/min and 1.82 L/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate and sulfuric acid was stopped and the reaction mixture was heated to 95° C. Once 95° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) was added at 1.63 L/min and sulfuric acid (1.121 g/ml) was added at a rate sufficient to maintain pH 9.6 (+/- 0.1) for an additional 180 minutes. After this additional 180 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 0.82 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed until the conductivity was <1500 μS, spray dried to a target moisture of 5%, and ground to a particle size of approximately 10 μm.
实施例10C:(发明实施例)Example 10C: (Inventive Example)
将44L的硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和115L的水添加到1200L反应器中,并在80RPM的搅拌和80L/min的再循环下加热至85℃。一旦达到85℃,就分别以4.48L/min和1.51L/min的速率同时添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)和硫酸(1.121g/mL)持续38分钟。38分钟过后,停止硅酸钠和硫酸的流动,并将反应混合物加热至95℃。一旦达到95℃,就以1.73L/min添加硅酸钠(2.65MR,1.193g/mL,被加热至80℃)并以足以维持pH 9.6(+/-0.1)的速率添加硫酸(1.121g/ml)持续额外210分钟。在该额外210分钟过后,停止硅酸钠的流动,并通过以0.82mL/min的速率持续流动硫酸(1.121g/mL)而将pH调节至pH 6.0。一旦pH稳定在pH 6.0,就过滤该批次,洗涤直到电导率<1500μS,喷雾干燥至5%的目标水分,并研磨至约10μm的粒径。44 L of sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and 115 L of water were added to the 1200 L reactor and heated to 85° C. with stirring at 80 RPM and recirculation at 80 L/min. Once 85° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) and sulfuric acid (1.121 g/mL) were added simultaneously at rates of 4.48 L/min and 1.51 L/min, respectively, for 38 minutes. After 38 minutes, the flow of sodium silicate and sulfuric acid was stopped and the reaction mixture was heated to 95° C. Once 95° C. was reached, sodium silicate (2.65 MR, 1.193 g/mL, heated to 80° C.) was added at 1.73 L/min and sulfuric acid (1.121 g/ml) was added at a rate sufficient to maintain pH 9.6 (+/- 0.1) for an additional 210 minutes. After the additional 210 minutes, the flow of sodium silicate was stopped and the pH was adjusted to pH 6.0 by continuing to flow sulfuric acid (1.121 g/mL) at a rate of 0.82 mL/min. Once the pH stabilized at pH 6.0, the batch was filtered, washed until the conductivity was <1500 μS, spray dried to a target moisture of 5%, and ground to a particle size of approximately 10 μm.
表6a和6b示出了实施例的分析值。Tables 6a and 6b show the analytical values for the Examples.
表6aTable 6a
表6bTable 6b
实施例11:牙膏配方Example 11: Toothpaste formulation
将来自以上的本发明二氧化硅掺入牙膏中用于流变性和PCR/RDA测量。配方和结果(表7a)如下所示。本发明实施例的亚锡相容性和氟化物相容性显示于表7b中。The inventive silica from above was incorporated into toothpaste for rheology and PCR/RDA measurements. The formulation and results (Table 7a) are shown below. The stannous compatibility and fluoride compatibility of the inventive examples are shown in Table 7b.
表7aTable 7a
(PCR/RDA在印第安纳大学牙科学院运行)(PCR/RDA run at Indiana University School of Dentistry)
表7bTable 7b
表7a中的数据显示包含本发明的二氧化硅的牙膏实现正常范围内的PCR和RDA值。The data in Table 7a show that toothpastes containing silica of the present invention achieve PCR and RDA values within the normal range.
亚锡相容性(%)Stannous compatibility (%)
按如下测定上述样品的亚锡相容性。制备包含431.11g的70%山梨糖醇、63.62g的脱氧去离子水、2.27g的二水氯化亚锡和3g的葡萄糖酸钠(sodium gluconcate)的储备液。将34g的储备液添加到装有6g待测试二氧化硅样品的50mL离心管中。将离心管置于5RPM的旋转轮(rotating wheel)上,并在40℃下老化1周。老化后,将离心管以12,000RPM离心10分钟,并通过ICP-OES(电感耦合等离子体发射光谱仪)测定上清液中的亚锡浓度。亚锡相容性是通过将样品的亚锡浓度表示为由相同程序制备但未添加二氧化硅的溶液的亚锡浓度的百分比来测定的。The stannous compatibility of the above samples was determined as follows. A stock solution containing 431.11 g of 70% sorbitol, 63.62 g of deoxygenated deionized water, 2.27 g of stannous chloride dihydrate and 3 g of sodium gluconate was prepared. 34 g of the stock solution was added to a 50 mL centrifuge tube containing 6 g of the silica sample to be tested. The centrifuge tube was placed on a rotating wheel at 5 RPM and aged for 1 week at 40° C. After aging, the centrifuge tube was centrifuged at 12,000 RPM for 10 minutes, and the stannous concentration in the supernatant was determined by ICP-OES (inductively coupled plasma emission spectrometer). Stannous compatibility is determined by expressing the stannous concentration of the sample as a percentage of the stannous concentration of a solution prepared by the same procedure but without the addition of silica.
氟化物相容性(%)Fluoride compatibility (%)
按如下测定上述样品的氟化物相容性。制备包含1624ppm的氟化物储备液。将30.0g的储备液添加到装有7.0g待测试二氧化硅样品的50mL离心管中。将离心管置于5RPM(或等效搅拌方式)的旋转轮上,并在60℃下老化1小时。老化后,将离心管以12,000RPM离心10分钟(或直至上清液澄清)。上清液中的氟化物浓度通过首先取等分试样,将其转移到装有磁力搅拌棒和等体积的TISAB II缓冲液的塑料瓶中来测定。然后使用预先校正的氟化物特定离子电极(Orion型号#96-09BN或等效物)测量浓度。氟化物相容性是通过将样品的氟化物浓度表示为储备液的氟化物浓度的百分比来测定的。The fluoride compatibility of the above samples was determined as follows. A fluoride stock solution containing 1624ppm was prepared. 30.0g of the stock solution was added to a 50mL centrifuge tube containing 7.0g of the silica sample to be tested. The centrifuge tube was placed on a rotating wheel at 5RPM (or equivalent stirring mode) and aged for 1 hour at 60°C. After aging, the centrifuge tube was centrifuged at 12,000RPM for 10 minutes (or until the supernatant was clear). The fluoride concentration in the supernatant was determined by first taking an aliquot and transferring it to a plastic bottle containing a magnetic stirring bar and an equal volume of TISAB II buffer. The concentration was then measured using a pre-calibrated fluoride specific ion electrode (Orion model #96-09BN or equivalent). Fluoride compatibility was determined by expressing the fluoride concentration of the sample as a percentage of the fluoride concentration of the stock solution.
相对牙本质磨损(RDA)Relative dentin wear (RDA)
含有本发明的二氧化硅的实施例DC1-DC14的洁齿剂组合物的RDA值是根据Hefferen,Journal of Dental Res.,July-August 1976,55(4),pp.563-573提出以及Wason美国专利号4,340,583、4,420,312和4,421,527中描述的方法测定的,其内容通过引用其整体而并入本文。The RDA values of the dentifrice compositions of Examples DC1-DC14 containing the silica of the present invention were determined according to the method set forth in Hefferen, Journal of Dental Res., July-August 1976, 55(4), pp. 563-573 and described in Wason U.S. Pat. Nos. 4,340,583, 4,420,312 and 4,421,527, the contents of which are incorporated herein by reference in their entirety.
菌膜清洁比(“PCR”)Biofilm Cleaning Ratio (“PCR”)
洁齿剂组合物的清洁性能通常以菌膜清洁比(Pellicle Cleaning Ratio,"PCR")值表示。PCR试验测量洁齿剂组合物在固定的刷牙条件下从牙齿上移除菌膜的能力。PCR试验描述于"In Vitro Removal of Stain with Dentifrice"G.K.Stookey,et al.,J.Dental Res.,61,12-36-9,1982中。PCR和RDA结果均根据洁齿剂组合物的组分的性质和浓度而变化。PCR和RDA值是无单位的。The cleaning performance of a dentifrice composition is usually expressed as a Pellicle Cleaning Ratio ("PCR") value. The PCR test measures the ability of a dentifrice composition to remove bacterial film from teeth under fixed brushing conditions. The PCR test is described in "In Vitro Removal of Stain with Dentifrice" G.K.Stookey, et al., J.Dental Res., 61, 12-36-9, 1982. Both PCR and RDA results vary depending on the nature and concentration of the components of the dentifrice composition. PCR and RDA values are unitless.
实施例12:CPC和BAC相容性Example 12: CPC and BAC Compatibility
为了测定对于季铵化合物的给定二氧化硅电容(capacity),进行了zeta电位滴定。在滴定中,通过取所需量的干燥二氧化硅并用去离子水稀释至160g来制备所需二氧化硅的5重量%悬浮液。为了尽可能接近在160g悬浮液中所需的5重量%(8g)的二氧化硅,调整所使用的原样二氧化硅的量以补偿所存在的游离水分(干燥损失)和硫酸钠的量。将该悬浮液以500rpm磁力搅拌10分钟,以使二氧化硅完全润湿,然后用0.5M NaOH或0.5M HCl将悬浮液调节至~8.5的pH,以帮助初始表面化学的一致性和更直接的对比。In order to determine the given silica capacitance (capacity) for quaternary ammonium compounds, a zeta potential titration was performed. In the titration, a 5 wt% suspension of the desired silica was prepared by taking the required amount of dry silica and diluting to 160 g with deionized water. In order to get as close as possible to the required 5 wt% (8 g) of silica in 160 g of suspension, the amount of raw silica used was adjusted to compensate for the amount of free moisture (drying loss) and sodium sulfate present. The suspension was magnetically stirred at 500 rpm for 10 minutes to completely wet the silica, and then the suspension was adjusted to a pH of ~8.5 with 0.5 M NaOH or 0.5 M HCl to help consistency of initial surface chemistry and more direct comparison.
然后使用0.25mL增量的5重量%西吡氯铵(CPC)或5重量%苯扎氯铵(BAC)滴定悬浮液,每种二氧化硅的电容是通过达到0mV的zeta电位所需的CPC或BAC的体积测定。鉴于大多数试验在接近0mV交叉点时都显示出人为因素,因此电容被定义为zeta电位变为正值的第一个点。然后使用该点处的体积测定每克二氧化硅的CPC或BAC的质量,单位为mg/g。The suspension was then titrated with 0.25 mL increments of either 5 wt% cetylpyridinium chloride (CPC) or 5 wt% benzalkonium chloride (BAC), and the capacitance of each silica was determined by the volume of CPC or BAC required to reach a zeta potential of 0 mV. Given that most experiments showed artifacts near the 0 mV crossover point, the capacitance was defined as the first point at which the zeta potential became positive. The volume at this point was then used to determine the mass of CPC or BAC per gram of silica in mg/g.
发明实施例10A、10B和10C显示较低的CPC和BAC值,且因此显示显示改善的CPC/BAC相容性(表8)。Inventive Examples 10A, 10B and 10C showed lower CPC and BAC values and therefore showed improved CPC/BAC compatibility (Table 8).
表8Table 8
实施例13:香料Example 13: Fragrance
方法:将500mg的二氧化硅置于顶空瓶中。添加10μL的香料(莱姆油,Lot MKCF9356香料基质),并使该顶空瓶平衡过夜。在顶空瓶取样之前,将样品在60℃下轻轻摇动温育60分钟。在GC/MS中分析1mL的顶部空间,该GC/MS配备有柱流速为1.606mL/min的Stabilwax柱(0.25mm x 60m),且在40℃至230℃的温度范围内具有6℃/min的温度梯度(HS取样:在65℃下将1mL的顶部空间采样至气密注射器中)。峰面积相对于113的峰强度进行标准化。Method: 500 mg of silica was placed in a headspace vial. 10 μL of flavor (lime oil, Lot MKCF9356 flavor matrix) was added and the headspace vial was equilibrated overnight. The samples were incubated at 60°C with gentle shaking for 60 minutes before sampling the headspace vial. 1 mL of headspace was analyzed in a GC/MS equipped with a Stabilwax column (0.25 mm x 60 m) with a column flow rate of 1.606 mL/min and a temperature gradient of 6°C/min over the temperature range of 40°C to 230°C (HS sampling: 1 mL of headspace was sampled into a gas-tight syringe at 65°C). Peak areas relative to The peak intensity of 113 was normalized.
发明实施例10A、10B和10C显示较高的值,且因此显示显示改善的香料相容性(表9)。Inventive Examples 10A, 10B and 10C show higher values and therefore show improved fragrance compatibility (Table 9).
表9Table 9
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