CN118642334A - Exposure equipment - Google Patents
Exposure equipment Download PDFInfo
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- CN118642334A CN118642334A CN202410283183.6A CN202410283183A CN118642334A CN 118642334 A CN118642334 A CN 118642334A CN 202410283183 A CN202410283183 A CN 202410283183A CN 118642334 A CN118642334 A CN 118642334A
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- 239000000758 substrate Substances 0.000 claims description 28
- 238000005286 illumination Methods 0.000 claims description 6
- 238000002955 isolation Methods 0.000 claims description 4
- 230000006835 compression Effects 0.000 claims description 3
- 238000007906 compression Methods 0.000 claims description 3
- 239000013013 elastic material Substances 0.000 claims description 3
- 238000013016 damping Methods 0.000 claims 2
- 238000005339 levitation Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 12
- 238000005259 measurement Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 238000009434 installation Methods 0.000 description 3
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 2
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 2
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 2
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 1
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 1
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
本申请提供了一种曝光设备,该曝光设备包括载物装置以及曝光装置;所述载物装置包括支撑板、驱动单元以及载物台,所述支撑板的底部通过地脚与安装面支撑连接,所述驱动单元设于所述支撑板的顶面,所述载物台与所述驱动单元连接,并可在所述驱动单元的驱动下相对于所述支撑板在水平面内移动;所述曝光装置包括支撑架以及曝光单元,所述支撑架的底部通过地脚与安装面支撑连接,所述曝光单元设于所述支撑架上。本申请实施例提供的曝光设备,其载物装置(可移动载物台)与曝光装置分别与地面支撑,彼此非连接结构,因此可以避免可移动载物台产生振动对曝光装置的影响,提高曝光设备的精度。
The present application provides an exposure device, which includes a carrier and an exposure device; the carrier includes a support plate, a drive unit and a stage, the bottom of the support plate is supported and connected to the mounting surface through a foot, the drive unit is arranged on the top surface of the support plate, the stage is connected to the drive unit, and can move in a horizontal plane relative to the support plate under the drive of the drive unit; the exposure device includes a support frame and an exposure unit, the bottom of the support frame is supported and connected to the mounting surface through a foot, and the exposure unit is arranged on the support frame. The exposure device provided in the embodiment of the present application, its carrier (movable stage) and the exposure device are respectively supported on the ground, and are non-connected structures to each other, so the vibration of the movable stage can be avoided to affect the exposure device, thereby improving the accuracy of the exposure device.
Description
技术领域Technical Field
本申请涉及电子元器件制造设备的技术领域,具体是涉及一种曝光设备。The present application relates to the technical field of electronic component manufacturing equipment, and specifically to an exposure device.
背景技术Background Art
常规曝光设备的技术方案中的,其可移动工件台一般与主工作台固定连接在一起,这就导致可移动工件台在移动过程中产生的振动影响主工作台上的曝光设备,进而影响曝光设备的精度。In the technical solution of conventional exposure equipment, the movable worktable is generally fixedly connected to the main worktable, which causes the vibration generated by the movable worktable during movement to affect the exposure equipment on the main worktable, thereby affecting the accuracy of the exposure equipment.
发明内容Summary of the invention
本申请实施例提供了一种曝光设备,所述曝光设备包括载物装置以及曝光装置;An embodiment of the present application provides an exposure device, the exposure device comprising a loading device and an exposure device;
所述载物装置包括支撑板、驱动单元以及载物台,所述支撑板的底部通过地脚与安装面支撑连接,所述驱动单元设于所述支撑板的顶面,所述载物台与所述驱动单元连接,并可在所述驱动单元的驱动下相对于所述支撑板在水平面内移动;The loading device comprises a support plate, a driving unit and a loading platform, wherein the bottom of the support plate is supported and connected to the mounting surface through a foot, the driving unit is arranged on the top surface of the support plate, the loading platform is connected to the driving unit and can move relative to the support plate in a horizontal plane under the drive of the driving unit;
所述曝光装置包括支撑架以及曝光单元,所述支撑架的底部通过地脚与安装面支撑连接,所述曝光单元设于所述支撑架上。The exposure device comprises a support frame and an exposure unit. The bottom of the support frame is supported and connected to a mounting surface via feet, and the exposure unit is arranged on the support frame.
在一些实施例中,所述驱动单元包括直线电机、丝杠导轨、磁悬浮平面电机、气浮导轨中的任意一种或者多种的组合。In some embodiments, the driving unit includes any one or a combination of a linear motor, a lead screw guide, a magnetically suspended planar motor, and an air-floating guide.
在一些实施例中,所述驱动单元包括滑动连接件、气浮导轨以及直线电机,所述气浮导轨固设于所述支撑板并沿第一方向延伸,所述滑动连接件与所述气浮导轨配合连接,并可沿所述气浮导轨在第一方向上滑动,所述直线电机的定子固设于所述滑动连接件,所述直线电机的动子与所述载物台固定连接,所述直线电机用于驱动所述载物台沿第二方向滑动,其中,所述第一方向与所述第二方向垂直。In some embodiments, the driving unit includes a sliding connection, an air-floating guide rail and a linear motor. The air-floating guide rail is fixed to the support plate and extends along a first direction. The sliding connection is cooperatively connected to the air-floating guide rail and can slide along the air-floating guide rail in the first direction. The stator of the linear motor is fixed to the sliding connection, and the mover of the linear motor is fixedly connected to the stage. The linear motor is used to drive the stage to slide along a second direction, wherein the first direction is perpendicular to the second direction.
在一些实施例中,所述滑动连接件在所述第二方向上的两端分别设有沿所述第一方向延伸的导向轨,所述支撑板上设有与所述导向轨配合的导向槽。In some embodiments, the sliding connector is provided with guide rails extending along the first direction at both ends in the second direction, and the support plate is provided with guide grooves cooperating with the guide rails.
在一些实施例中,所述曝光装置还包括主基板以及减振单元,所述减振单元设于所述主基板与所述支撑架之间;所述曝光单元设于所述主基板上。In some embodiments, the exposure device further includes a main substrate and a vibration reduction unit, wherein the vibration reduction unit is disposed between the main substrate and the support frame; and the exposure unit is disposed on the main substrate.
在一些实施例中,所述减振单元为多个,均布于所述主基板底部边沿,所述减振单元为弹性材料块、压缩弹簧或者主动隔振元件中的任意一种或者多种的组合。In some embodiments, there are multiple vibration reduction units evenly distributed on the bottom edge of the main substrate, and the vibration reduction unit is any one or a combination of multiple of an elastic material block, a compression spring or an active vibration isolation element.
在一些实施例中,所述曝光单元包括物镜及量测组件,所述主基板上设有连接孔,所述物镜及量测组件对应所述连接孔设置并与所述主基板连接,所述物镜及量测组件用于观测所述载物台上的工件。In some embodiments, the exposure unit includes an objective lens and a measuring component. The main substrate is provided with a connecting hole. The objective lens and the measuring component are arranged corresponding to the connecting hole and connected to the main substrate. The objective lens and the measuring component are used to observe the workpiece on the stage.
在一些实施例中,所述曝光单元还包括照明组件以及掩模组件,所述照明组件与所述主基板连接,所述掩模组件设于所述照明组件与所述物镜及量测组件之间。In some embodiments, the exposure unit further includes a lighting component and a mask component, wherein the lighting component is connected to the main substrate, and the mask component is disposed between the lighting component and the objective lens and the measuring component.
在一些实施例中,所述照明组件包括照明支架以及与所述照明支架连接的光源以及导光件。In some embodiments, the lighting assembly includes a lighting bracket, a light source connected to the lighting bracket, and a light guide.
在一些实施例中,所述曝光单元还包括支撑台,所述支撑台设于所述主基板上,所述掩模组件设于所述支撑台上。In some embodiments, the exposure unit further includes a support platform, the support platform is disposed on the main substrate, and the mask assembly is disposed on the support platform.
本申请实施例提供的曝光设备,其载物装置(可移动载物台)与曝光装置分别与地面支撑,彼此非连接结构,因此可以避免可移动载物台产生振动对曝光装置的影响,提高曝光设备的精度。The exposure device provided in the embodiment of the present application has a loading device (movable loading stage) and an exposure device which are respectively supported on the ground and are not connected to each other. Therefore, the influence of vibration generated by the movable loading stage on the exposure device can be avoided, thereby improving the accuracy of the exposure device.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
图1是本申请曝光设备一实施例的整体结构示意图;FIG1 is a schematic diagram of the overall structure of an exposure device according to an embodiment of the present application;
图2是图1实施例中曝光设备的拆分结构示意图;FIG2 is a schematic diagram of the disassembled structure of the exposure device in the embodiment of FIG1 ;
图3是本实施例中载物装置的结构示意图;FIG3 is a schematic structural diagram of the object carrying device in this embodiment;
图4是图3实施例中载物装置的结构拆分示意图;FIG4 is a schematic diagram of the structure disassembly of the object carrying device in the embodiment of FIG3 ;
图5是本实施例中滑动连接件的结构示意图;FIG5 is a schematic structural diagram of a sliding connection member in this embodiment;
图6是本实施例中载物台的结构示意图。FIG. 6 is a schematic diagram of the structure of the loading platform in this embodiment.
具体实施方式DETAILED DESCRIPTION
下面结合附图和实施例,对本申请作进一步的详细描述。特别指出的是,以下实施例仅用于说明本申请,但不对本申请的范围进行限定。同样的,以下实施例仅为本申请的部分实施例而非全部实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其它实施例,都属于本申请保护的范围。The present application is further described in detail below in conjunction with the accompanying drawings and examples. It is particularly noted that the following examples are only used to illustrate the present application, but are not intended to limit the scope of the present application. Similarly, the following examples are only some embodiments of the present application rather than all embodiments, and all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.
本申请实施例中的术语“第一”、“第二”、“第三”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”、“第三”的特征可以明示或者隐含地包括至少一个该特征。本申请的描述中,“多个”的含义是至少两个,例如两个、三个等,除非另有明确具体的限定。本申请实施例中所有方向性指示(诸如上、下、左、右、前、后……)仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。本申请实施例中的术语“包括”和“具有”以及它们任何变形,意图在于覆盖不排他的包含。例如包含了一系列步骤或单元的过程、方法、系统、产品或设备没有限定于已列出的步骤或单元,而是可选地还包括没有列出的步骤或单元,或可选地还包括对于这些过程、方法、产品或设备固有的其它步骤或组件。The terms "first", "second", and "third" in the embodiments of the present application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined as "first", "second", and "third" can expressly or implicitly include at least one of the features. In the description of the present application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined. In the embodiments of the present application, all directional indications (such as up, down, left, right, front, back...) are only used to explain the relative position relationship, movement, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication also changes accordingly. The terms "including" and "having" in the embodiments of the present application and any of their variations are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units that are not listed, or optionally also includes other steps or components inherent to these processes, methods, products, or devices.
在本文中提及“实施例”意味着,结合实施例描述的特定特征、结构或特性可以包含在本申请的至少一个实施例中。在说明书中的各个位置出现该短语并不一定均是指相同的实施例,也不是与其它实施例互斥的独立的或备选的实施例。本领域技术人员显式地和隐式地理解的是,本文所描述的实施例可以与其它实施例相结合。Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.
本申请实施例提供一种曝光设备,请一并参阅图1和图2,图1是本申请曝光设备一实施例的整体结构示意图,图2是图1实施例中曝光设备的拆分结构示意图;本实施例中的曝光设备包括但不限于以下结构:载物装置100以及曝光装置200。An embodiment of the present application provides an exposure device. Please refer to Figures 1 and 2 together. Figure 1 is a schematic diagram of the overall structure of an embodiment of the exposure device of the present application, and Figure 2 is a schematic diagram of the disassembled structure of the exposure device in the embodiment of Figure 1; the exposure device in this embodiment includes but is not limited to the following structures: a carrier device 100 and an exposure device 200.
具体而言,请一并参阅图3和图4,图3是本实施例中载物装置的结构示意图,图4是图3实施例中载物装置的结构拆分示意图,该载物装置100包括支撑板110、驱动单元120以及载物台130,所述支撑板110的底部通过地脚111与安装面(具体可以是地面或者安装台的表面等,此处不做具体限定)支撑连接,所述驱动单元120设于所述支撑板110的顶面,所述载物台130与所述驱动单元120连接,并可在所述驱动单元120的驱动下相对于所述支撑板110在水平面内移动。Specifically, please refer to Figures 3 and 4 together. Figure 3 is a schematic diagram of the structure of the carrying device in this embodiment, and Figure 4 is a schematic diagram of the structural disassembly of the carrying device in the embodiment of Figure 3. The carrying device 100 includes a support plate 110, a drive unit 120 and a loading platform 130. The bottom of the support plate 110 is supported and connected to a mounting surface (specifically, it can be the ground or the surface of a mounting platform, etc., which is not specifically limited here) through a foot 111. The drive unit 120 is arranged on the top surface of the support plate 110. The loading platform 130 is connected to the drive unit 120 and can move in a horizontal plane relative to the support plate 110 under the drive of the drive unit 120.
其中,本实施例中的驱动单元120可以是直线电机、丝杠导轨、磁悬浮平面电机、气浮导轨等中的任意一种或者多种的组合。本实施例中以一种直线电机配合气浮导轨结构为例进行说明。The driving unit 120 in this embodiment can be any one or a combination of a linear motor, a lead screw guide, a magnetic suspension planar motor, an air-floating guide, etc. In this embodiment, a linear motor combined with an air-floating guide structure is used as an example for description.
可选地,本实施例中的驱动单元120包括滑动连接件121、气浮导轨122以及直线电机123,所述气浮导轨122固设于所述支撑板110并沿第一方向(图中X方向)延伸,所述滑动连接件121与所述气浮导轨122配合连接,并可沿所述气浮导轨122在第一方向上滑动。具体可以为滑动连接件121底部设有配合槽1210,配合槽1210与所述气浮导轨122配合连接。Optionally, the driving unit 120 in this embodiment includes a sliding connection 121, an air-floating guide rail 122, and a linear motor 123. The air-floating guide rail 122 is fixed to the support plate 110 and extends along a first direction (direction X in the figure). The sliding connection 121 is connected with the air-floating guide rail 122 and can slide in the first direction along the air-floating guide rail 122. Specifically, a matching groove 1210 is provided at the bottom of the sliding connection 121, and the matching groove 1210 is connected with the air-floating guide rail 122.
请一并参阅图5和图6,图5是本实施例中滑动连接件的结构示意图,图6是本实施例中载物台的结构示意图。该直线电机123的定子1231固设于所述滑动连接件121的顶部,所述载物台130形成贯穿的容纳框体1300,所述直线电机123的动子1232与所述载物台130固定连接并设于所述容纳框体1300内,所述直线电机123用于驱动所述载物台130沿第二方向(图中Y方向)滑动,其中,所述第一方向与所述第二方向垂直。进而实现对载物台130在平面内的位移控制。Please refer to Figures 5 and 6 together. Figure 5 is a schematic diagram of the structure of the sliding connection member in this embodiment, and Figure 6 is a schematic diagram of the structure of the stage in this embodiment. The stator 1231 of the linear motor 123 is fixedly arranged on the top of the sliding connection member 121, and the stage 130 forms a through-containment frame 1300. The mover 1232 of the linear motor 123 is fixedly connected to the stage 130 and arranged in the containment frame 1300. The linear motor 123 is used to drive the stage 130 to slide along the second direction (Y direction in the figure), wherein the first direction is perpendicular to the second direction. In this way, the displacement control of the stage 130 in the plane is realized.
可选地,请继续参阅图3和图5,本实施例中的滑动连接件121在所述第二方向上的两端分别设有沿所述第一方向延伸的导向轨1211,所述支撑板110上设有与所述导向轨1211配合的导向槽1101。导向轨1211与导向槽1101配合,实现对滑动连接件121在第二方向上的导向。Optionally, please continue to refer to Figures 3 and 5. In this embodiment, the sliding connector 121 is provided with guide rails 1211 extending along the first direction at both ends in the second direction, and the support plate 110 is provided with a guide groove 1101 that cooperates with the guide rail 1211. The guide rail 1211 cooperates with the guide groove 1101 to guide the sliding connector 121 in the second direction.
本实施例中的载物装置100与曝光装置200为独立的结构,二者均可以进行单独的调试保养维护,节省人力和时间成本。The object carrier 100 and the exposure device 200 in this embodiment are independent structures, and both can be debugged, maintained and serviced separately, thus saving manpower and time costs.
请继续参阅图3和图4,本实施例中的载物装置100包括可以包括多个气浮垫150,气浮垫150用于使得支撑板110与支撑面(可以为地面)之间形成间隙,方便载物装置100整体移出,便于维修和安装载物装置100。Please continue to refer to Figures 3 and 4. The loading device 100 in this embodiment may include a plurality of air cushions 150. The air cushions 150 are used to form a gap between the support plate 110 and the support surface (which may be the ground), so as to facilitate the overall removal of the loading device 100 and facilitate the maintenance and installation of the loading device 100.
可选地,请继续参阅图1和图2,本实施例中的曝光装置200包括支撑架210以及曝光单元220,所述支撑架210的底部通过地脚211与安装面(具体可以是地面或者安装台的表面等,此处不做具体限定)支撑连接,所述曝光单元220设于所述支撑架210上。其中,图中的隔垫块102是载物装置100的支撑板110与曝光装置200的支撑架210之间辅助安装定位用,在安装结束后可以去除掉,使得载物装置100的支撑板110与曝光装置200的支撑架210之间间隔(非接触)设置。Optionally, please continue to refer to FIG. 1 and FIG. 2 , the exposure device 200 in this embodiment includes a support frame 210 and an exposure unit 220, the bottom of the support frame 210 is supported and connected to a mounting surface (specifically, it can be the ground or the surface of a mounting table, etc., which is not specifically limited here) through a foot 211, and the exposure unit 220 is arranged on the support frame 210. Among them, the spacer block 102 in the figure is used for auxiliary installation and positioning between the support plate 110 of the carrier device 100 and the support frame 210 of the exposure device 200, and can be removed after the installation is completed, so that the support plate 110 of the carrier device 100 and the support frame 210 of the exposure device 200 are arranged with a spacing (non-contact).
可选地,本实施例中的曝光装置200还包括主基板230以及减振单元240,所述减振单元240设于所述主基板230与所述支撑架210之间;所述曝光单元220设于所述主基板230上。可选地,减振单元240可以为多个,均布于所述主基板230的底部边沿,所述减振单元230可以为弹性材料块(譬如橡胶块)或者压缩弹簧等被动隔振元件,另外,还可以是主动隔振元件(譬如隔振器等),此处不做具体限定。减振单元230的作用是阻隔主基板230与支撑架210之间的振动。调节地脚可以保证主基板230与地面的平行度。Optionally, the exposure device 200 in this embodiment further includes a main substrate 230 and a vibration reduction unit 240, wherein the vibration reduction unit 240 is disposed between the main substrate 230 and the support frame 210; and the exposure unit 220 is disposed on the main substrate 230. Optionally, there may be a plurality of vibration reduction units 240, evenly distributed on the bottom edge of the main substrate 230, and the vibration reduction unit 230 may be a passive vibration isolation element such as an elastic material block (such as a rubber block) or a compression spring, and may also be an active vibration isolation element (such as a vibration isolator, etc.), which is not specifically limited here. The function of the vibration reduction unit 230 is to block the vibration between the main substrate 230 and the support frame 210. The parallelism between the main substrate 230 and the ground can be ensured by adjusting the foot.
可选地,本实施例中的曝光单元220可以包括物镜及量测组件221、照明组件222以及掩模组件223。具体而言,该主基板230上设有连接孔2300,所述物镜及量测组件221对应所述连接孔2300设置并与所述主基板230连接,物镜及量测组件221与主基板230具体可以是通过法兰结构2210连接,进而实现物镜及量测组件210相对于主基板230的位置调节以及实现调试物镜及量测组件221对于地面的垂直度。所述物镜及量测组件221用于观测所述载物台130上的工件。Optionally, the exposure unit 220 in this embodiment may include an objective lens and measurement assembly 221, an illumination assembly 222, and a mask assembly 223. Specifically, a connection hole 2300 is provided on the main substrate 230, and the objective lens and measurement assembly 221 is arranged corresponding to the connection hole 2300 and connected to the main substrate 230. The objective lens and measurement assembly 221 and the main substrate 230 may be connected through a flange structure 2210, thereby realizing the position adjustment of the objective lens and measurement assembly 210 relative to the main substrate 230 and realizing the verticality adjustment of the objective lens and measurement assembly 221 to the ground. The objective lens and measurement assembly 221 is used to observe the workpiece on the stage 130.
其中,该照明组件222与所述主基板230连接,所述掩模组件223设于所述照明组件222与所述物镜及量测组件221之间。可选地,本实施例中的曝光单元220还包括支撑台250,所述支撑台250设于所述主基板230上,所述掩模组件223设于所述支撑台250上,可以保证掩模组件223与地面的平行度,其中,掩模组件223具体可以是包括掩模台板和掩模等。The lighting assembly 222 is connected to the main substrate 230, and the mask assembly 223 is disposed between the lighting assembly 222 and the objective lens and measurement assembly 221. Optionally, the exposure unit 220 in this embodiment further includes a support table 250, the support table 250 is disposed on the main substrate 230, and the mask assembly 223 is disposed on the support table 250, which can ensure the parallelism between the mask assembly 223 and the ground, wherein the mask assembly 223 may specifically include a mask platen and a mask.
可选地,本实施例中照明组件222可以包括照明支架2221以及与所述照明支架2221连接的光源以及导光件2222,光源以及导光件2222可以是设于照明支架2221内部。另外,本实施例中的支撑台250上还可以设有子支撑台256,子支撑台256可以是设于支撑台250上,用于对照明支架2221进行支撑,照明支架2221支撑内部的光源以及导光件2222等结构可以,减少振动对光源的影响。Optionally, the lighting assembly 222 in this embodiment may include a lighting bracket 2221, a light source connected to the lighting bracket 2221, and a light guide 2222, and the light source and the light guide 2222 may be arranged inside the lighting bracket 2221. In addition, a sub-supporting platform 256 may be arranged on the supporting platform 250 in this embodiment, and the sub-supporting platform 256 may be arranged on the supporting platform 250 for supporting the lighting bracket 2221. The lighting bracket 2221 supports the light source and the light guide 2222 inside, and the influence of vibration on the light source may be reduced.
本申请实施例提供的曝光设备,其载物装置(可移动载物台)与曝光装置分别与地面支撑,彼此非连接结构,因此可以避免可移动载物台产生振动对曝光装置的影响,提高曝光设备的精度。The exposure device provided in the embodiment of the present application has a loading device (movable loading stage) and an exposure device which are respectively supported on the ground and are not connected to each other. Therefore, the influence of vibration generated by the movable loading stage on the exposure device can be avoided, thereby improving the accuracy of the exposure device.
以上所述仅为本申请的部分实施例,并非因此限制本申请的保护范围,凡是利用本申请说明书及附图内容所作的等效装置或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本申请的专利保护范围内。The above descriptions are only some embodiments of the present application, and do not limit the protection scope of the present application. Any equivalent device or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.
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