CN118639195B - Anti-skid coating process for notebook computer shell surface - Google Patents
Anti-skid coating process for notebook computer shell surface Download PDFInfo
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- CN118639195B CN118639195B CN202410807082.4A CN202410807082A CN118639195B CN 118639195 B CN118639195 B CN 118639195B CN 202410807082 A CN202410807082 A CN 202410807082A CN 118639195 B CN118639195 B CN 118639195B
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- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract description 22
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- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 12
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 12
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Classifications
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/3464—Sputtering using more than one target
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- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
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- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
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- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/08—Oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B05D2202/00—Metallic substrate
- B05D2202/20—Metallic substrate based on light metals
- B05D2202/25—Metallic substrate based on light metals based on Al
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Abstract
本发明涉及真空镀膜技术领域，更具体的说，它涉及一种笔记本电脑外壳表面的防滑镀膜工艺。一种笔记本电脑外壳表面的防滑镀膜工艺，包括如下步骤：外壳基材预处理、AlMnCe合金靶材制备、表面真空镀膜加工、镀膜层涂覆保护漆制备及镀膜层涂覆保护处理。本发明通过在外壳基材表面依次沉积形成Al‑Ti过渡层、AlMnCe层、氧化铈及二氧化硅混镀层，Al‑Ti过渡层、AlMnCe层、氧化铈及二氧化硅混镀层共同构成镀膜层，有助于增加外壳基材表面的手感阻力，改善外壳基材表面的耐磨性能及防滑性能，并且，将镀膜层涂覆保护漆涂覆于镀膜层的表面，能够进一步增加镀膜层的表面粗糙度，进一步提升笔记本电脑外壳的防滑性能。The present invention relates to the field of vacuum coating technology, and more specifically, it relates to an anti-skid coating process for the surface of a laptop computer shell. An anti-skid coating process for the surface of a laptop computer shell comprises the following steps: shell substrate pretreatment, AlMnCe alloy target material preparation, surface vacuum coating processing, coating layer protective paint preparation and coating layer protective treatment. The present invention forms an Al-Ti transition layer, an AlMnCe layer, a cerium oxide and silicon dioxide mixed coating layer by sequentially depositing on the surface of the shell substrate. The Al-Ti transition layer, the AlMnCe layer, the cerium oxide and silicon dioxide mixed coating layer together constitute the coating layer, which helps to increase the hand resistance of the shell substrate surface, improve the wear resistance and anti-skid performance of the shell substrate surface, and the coating layer is coated with protective paint on the surface of the coating layer, which can further increase the surface roughness of the coating layer and further improve the anti-skid performance of the laptop computer shell.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to an anti-skid coating process for the surface of a notebook computer shell.
Background
The notebook shell is mainly used for protecting the body of the notebook computer, can provide physical protection for sensitive elements in the notebook computer, such as a display screen, a processor, a hard disk, a memory bank and the like, resists external impact, pressure, dust and moisture, prevents damage in the body, and prolongs the service life of equipment. Compared with a desktop computer, the notebook computer is lighter and easy to carry, and can cause unavoidable friction or impact with other objects in the using process of the notebook computer, if the notebook computer shell is not hard enough, the friction of the notebook computer shell is damaged, and the screen is possibly deformed under pressure or the inside of the machine body is damaged, so that the service life of the notebook computer is shortened.
In order to reduce friction or impact between a notebook computer shell and other objects, in the prior art, besides selecting a high-hardness material with good wear resistance as a shell base material, the wear resistance and the anti-slip performance of the notebook computer shell are improved by designing printing textures, laser carving concave-convex patterns or attaching anti-slip rubber gaskets and the like, the friction force between the notebook computer shell and other objects or between the notebook computer shell and the handheld objects is increased, so that the stability of the notebook computer shell when the notebook computer is placed or held is improved, the friction or impact between the notebook computer shell and the other objects is reduced, but the method needs to be processed after the film plating treatment of the notebook computer shell is completed, the surface treatment operation steps of the notebook computer shell are increased, the problems of poor adhesion firmness, long-time touching or scraping, gradual weakening of the wear resistance and the anti-slip performance and the like exist, and long-term effective protection of the notebook computer shell is difficult to achieve.
Therefore, the development of the anti-skid coating process capable of effectively improving the wear resistance and the anti-skid performance of the notebook computer shell in the coating process of the notebook computer shell has important significance.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides an anti-skid coating process for the surface of a notebook computer shell.
An anti-skid coating process for the surface of a notebook computer shell comprises the following steps:
s1, preprocessing a shell substrate, and carrying out ultrasonic cleaning and surface treatment on the shell substrate to ensure that the surface of the shell substrate is kept clean, wherein the roughness Ra of the surface of the shell substrate is less than or equal to 0.5 mu m;
S2, preparing AlMnCe alloy target material, namely smelting, casting, vacuum degassing, cutting and surface polishing high-purity metal Al, mn and Ce serving as initial raw materials to obtain AlMnCe alloy target material, wherein the addition amount of Ce is 8-12% of the total mass of Al and Mn;
S3, performing surface vacuum coating processing, namely placing the shell substrate in a vacuum condition after the pretreatment of the shell substrate is finished, introducing inert gas, sputtering an aluminum target and a titanium target on the surface of the shell substrate, depositing a layer of Al-Ti transition layer, continuously introducing the inert gas, sputtering a AlMnCe alloy target on the surface of the shell substrate, depositing a layer of AlMnCe on the Al-Ti transition layer, introducing inert gas and oxygen, sputtering a silicon target and a cerium target on the surface of the shell substrate, depositing a cerium oxide and silicon dioxide mixed coating on the AlMnCe layer, after coating is finished, introducing oxygen only, heating and heat-preserving the shell substrate, and finishing the surface vacuum coating processing of the shell substrate to obtain the shell substrate after coating processing;
S4, preparing a coating protection paint of a coating layer and coating protection treatment of the coating layer, wherein the coating protection paint of the coating layer is prepared, and the coating protection paint of the coating layer is sprayed on the surface of a shell substrate subjected to coating processing in an electrostatic spraying mode to form a coating protection layer, so that a notebook computer shell subjected to coating protection is obtained;
The coating protective paint for the coating layer is prepared by mixing 50-70 parts by weight of organosilicon acrylic resin, 0.5-3 parts by weight of organosilicon defoamer, 0.3-2 parts by weight of dimethyl siloxane, 4-10 parts by weight of curing agent and 2-8 parts by weight of modified mixed nano particles;
the organic silicon acrylic resin is prepared by uniformly stirring and mixing 20-30 parts by weight of methyl acrylate, 25-40 parts by weight of methyl methacrylate, 20-35 parts by weight of styrene, 5-12 parts by weight of hydroxyethyl acrylate, 2-7 parts by weight of acrylic acid and 0.6-3 parts by weight of dibenzoyl peroxide, slowly dripping the mixture of ethyl acetate, butyl acetate and polydimethylsiloxane into the mixture of ethyl acetate, butyl acetate and polydimethylsiloxane, and carrying out polymerization reaction, wherein the mixture of ethyl acetate, butyl acetate and polydimethylsiloxane is prepared by mixing 25-35 parts by weight of ethyl acetate, 16-40 parts by weight of butyl acetate and 7-18 parts by weight of polydimethylsiloxane;
The modified mixed nano particles are obtained by mixing nano silicon dioxide and nano titanium dioxide and then modifying the mixture by a coupling agent KH-570.
Further, the shell base material is titanium alloy, aluminum magnesium alloy or magnesium aluminum alloy.
Further, the surface treatment is at least one of a sanding operation, a blasting operation, or a peening operation.
Further, the preparation of the alloy target in the step S2AlMnCe specifically comprises the following steps:
S2.1, taking high-purity metals Al, mn and Ce as initial raw materials, wherein the mass ratio of Al to Mn is (10-20): (1-5), the addition amount of Ce is 8-12% of the total mass of Al and Mn, smelting and mixing Al, mn and Ce into alloy liquid in an inert gas atmosphere, pouring the alloy liquid into a mould, and casting to obtain AlMnCe alloy billets;
s2.2, carrying out vacuum degassing on AlMnCe alloy billets, and then cutting and surface polishing to obtain AlMnCe alloy targets.
Further, the step S3 of vacuum coating processing of the surface specifically comprises the following steps:
S3.1, after pretreatment of the shell substrate is completed, placing the shell substrate into a vacuum furnace, exhausting air in the vacuum furnace to background vacuum, wherein the vacuum degree is 3-6 multiplied by 10 -3 Pa, and heating the shell substrate in the vacuum furnace to 70-90 ℃;
S3.2, loading an aluminum target into a sputtering target A, loading a titanium target into a sputtering target B, introducing inert gas into a vacuum furnace, controlling the flow rate of the inert gas to be 200-400 sccm, controlling the air pressure to be 0.1-1 Pa, simultaneously turning on sputtering power supplies of the sputtering target A and the sputtering target B, wherein the current of the sputtering target A is 25-30A, the current of the sputtering target B is 20-25A, and sputtering the aluminum target and the titanium target onto the surface of a shell substrate, so that an Al-Ti transition layer with the thickness of 100-150 nm is deposited on the surface of the shell substrate;
S3.3, replacing an aluminum target in the sputtering target A with a AlMnCe alloy target, continuously introducing inert gas into a vacuum furnace, controlling the flow rate of the inert gas to be 200-400 sccm, controlling the air pressure to be 0.1-1 Pa, turning on a sputtering power supply of the sputtering target A, sputtering the AlMnCe alloy target onto the surface of a shell substrate at the current of 20-30A, and depositing a AlMnCe layer with the thickness of 150-200 nm on the Al-Ti transition layer;
S3.4, replacing AlMnCe alloy targets in the sputtering target A with silicon targets, replacing titanium targets in the sputtering target B with cerium targets, introducing inert gas and oxygen into a vacuum furnace, wherein the flow of the inert gas is 200-400 sccm, the flow of the oxygen is 150-300 sccm, the air pressure is controlled to be 0.5-1.5 Pa, simultaneously turning on sputtering power supplies of the sputtering target A and the sputtering target B, the current of the sputtering target A is 25-30A, the current of the sputtering target B is 25-30A, sputtering the silicon targets and the cerium targets onto the surface of a shell substrate, depositing a cerium oxide and silicon dioxide mixed coating layer with the thickness of 100-200 nm on the AlMnCe layer, and jointly forming a coating layer from bottom to top by an Al-Ti transition layer, a AlMnCe layer, the cerium oxide and the silicon dioxide mixed coating layer;
And S3.5, after the film plating is finished, stopping introducing inert gas, and introducing oxygen into the vacuum furnace only, wherein the oxygen flow is 150-300 sccm, heating the shell substrate, the heating temperature is 400-600 ℃, and preserving heat for 20-30 min, so as to finish the surface vacuum film plating processing of the shell substrate, and the shell substrate after film plating processing is obtained.
Further, the inert gas is any one of helium, neon, argon, krypton or xenon.
Further, the step S4 of preparation of coating protective paint for the coating layer and coating protective treatment for the coating layer specifically comprises the following steps:
S4.1, stirring and mixing 20-30 parts by weight of methyl acrylate, 25-40 parts by weight of methyl methacrylate, 20-35 parts by weight of styrene, 5-12 parts by weight of hydroxyethyl acrylate and 2-7 parts by weight of acrylic acid, adding 0.6-3 parts by weight of dibenzoyl peroxide, and uniformly stirring to obtain an acrylic acid monomer mixture;
S4.2, sequentially adding 25-35 parts by weight of ethyl acetate, 16-40 parts by weight of butyl acetate and 7-18 parts by weight of polydimethylsiloxane into a reaction kettle, heating to 72-80 ℃ under a nitrogen atmosphere, continuously stirring for 20-30 min, heating to 100-110 ℃, slowly dripping the acrylic monomer mixture obtained in the step S4.1 into the reaction kettle, and carrying out polymerization reaction for 1-2 h under the azeotropic distillation condition of 100-110 ℃ to obtain the organosilicon acrylic resin;
S4.3, mixing 1-5 parts by weight of nano silicon dioxide and 1-5 parts by weight of nano titanium dioxide to obtain mixed nano particles, dissolving the mixed nano particles in 20-40 parts by weight of N-methylpyrrolidone, performing ultrasonic dispersion for 20-30 min, slowly dropwise adding 6-30 parts by weight of coupling agent KH-570 under the condition of ultrasonic dispersion, reacting for 1-2 h under the nitrogen atmosphere, and performing centrifugal separation, filtration and washing after the reaction is completed to obtain modified mixed nano particles;
S4.4, adding 50-70 parts by weight of organosilicon acrylic resin, 0.5-3 parts by weight of organosilicon defoamer and 0.3-2 parts by weight of dimethyl siloxane into a reactor, uniformly mixing, adding 4-10 parts by weight of curing agent and 2-8 parts by weight of modified mixed nano particles, and performing ultrasonic dispersion for 20-40min to obtain coating protective paint for a coating layer;
And S4.5, coating protective paint on the surface of the shell substrate subjected to coating processing by adopting an electrostatic spraying mode, then placing the sprayed shell substrate into a drying oven, drying and curing for 2-5 hours at 50-60 ℃ to form a coating protective layer, and finishing coating protective treatment of the coating layer to obtain the notebook computer shell subjected to coating protection.
Further, the diameter of the nano silicon dioxide is 10-80 nm.
Further, the diameter of the nano titanium dioxide is 10-50 nm.
Further, the curing agent is hexamethylene diisocyanate.
The invention has the following advantages:
1. according to the invention, in AlMnCe alloy targets, the content of Ce is regulated to 8-12% of the total mass of Al and Mn, which is beneficial to forming Al 10CeMn2 primary phase, avoiding the formation of coarse columnar dendrite structures caused by overgrowth of Al-Mn precipitation phase, avoiding the brittle cracking problem of the alloy targets in the use process, ensuring normal and effective coating operation, and after vacuum coating processing, by adding Ce, promoting the formation of an amorphous structure of an Al-Mn-based coating, and forming AlMnCe layers with uniform and compact structure, thereby being beneficial to improving the wear resistance of the surface of a shell substrate and the binding force of AlMnCe layers and an Al-Ti transition layer.
2. According to the invention, inert gas and oxygen are introduced under vacuum condition, and the silicon target and the cerium target are sputtered onto the surface of the shell substrate, so that the cerium oxide and silicon dioxide mixed coating formed by sputtering is in a matt frosted texture, thereby being beneficial to increasing the hand feeling resistance of the surface of the shell substrate and improving the anti-skid property of the surface of the shell substrate.
3. According to the invention, the modified mixed nano particles are dispersed and mixed in the organic silicon acrylic resin, and the obtained coating protective paint is coated on the surface of the coating layer, so that the formed coating protective layer can be effectively attached on the surface of the coating layer, the stability and the pollution resistance of the coating layer are enhanced, and the modified mixed nano particles in the coating protective layer can be well dispersed on the surface of the coating layer, the surface roughness of the surface of the coating layer is increased, and the anti-skid performance of a notebook computer shell is further improved.
Detailed Description
In order to enable those skilled in the art to better understand the technical solution of the present invention, the technical solution of the present invention will be clearly and completely described below in connection with the embodiments of the present invention.
Examples
An anti-skid coating process for the surface of a notebook computer shell specifically comprises the following steps:
S1, pretreatment of a shell substrate,
S1.1, placing a shell substrate into an ultrasonic cleaner, and sequentially performing ultrasonic cleaning in petroleum ether and absolute ethyl alcohol for 20min, wherein the ultrasonic cleaning power is 500W so as to remove impurities such as grease, dust, oxide layers and the like on the surface of the shell substrate;
s1.2, putting the cleaned shell substrate into a sand blasting machine, and carrying out sand blasting treatment on the surface of the cleaned shell substrate to ensure that the roughness Ra of the surface of the shell substrate is less than or equal to 0.5 mu m, thereby enhancing the adhesive force of a coating film;
s2, alMnCe alloy target material preparation,
S2.1, smelting and mixing Al, mn and Ce into alloy liquid by using a vacuum induction smelting furnace under the protection of argon, pouring the alloy liquid into a mould prepared in advance, and casting to obtain AlMnCe alloy billets, wherein the high-purity metals Al, mn and Ce are used as initial raw materials, the mass ratio of Al to Mn is 4:1, and the addition amount of Ce is 12% of the total mass of Al and Mn;
s2.2, carrying out vacuum degassing on AlMnCe alloy billets, and cutting and surface polishing to obtain AlMnCe alloy targets;
S3, surface vacuum coating processing,
S3.1, after pretreatment of the shell substrate is completed, placing the shell substrate into a vacuum furnace, exhausting air in the vacuum furnace to background vacuum, wherein the vacuum degree is 6 multiplied by 10 -3 Pa, and heating the shell substrate in the vacuum furnace to 90 ℃ through a heater, so that the metal atom structure on the surface of the shell substrate is changed, and the metal atom is in an active state;
S3.2, loading an aluminum target into a sputtering target A, loading a titanium target into a sputtering target B, introducing argon into a vacuum furnace, controlling the flow rate of the argon to be 400sccm, controlling the air pressure to be 0.8Pa, simultaneously turning on sputtering power supplies of the sputtering target A and the sputtering target B, sputtering the aluminum target and the titanium target onto the surface of a shell substrate, and depositing an Al-Ti transition layer with the thickness of 150nm, wherein the current of the sputtering target A is 30A, and the current of the sputtering target B is 25A;
s3.3, replacing an aluminum target in the sputtering target A with a AlMnCe alloy target, continuously introducing argon into a vacuum furnace, controlling the flow rate of the argon to be 400sccm, controlling the air pressure to be 0.8Pa, turning on a sputtering power supply of the sputtering target A, enabling the current of the sputtering target A to be 30A, sputtering the AlMnCe alloy target onto the surface of a shell substrate, and depositing a AlMnCe layer with the thickness of 200nm on the Al-Ti transition layer;
S3.4, replacing AlMnCe alloy targets in the sputtering target A with silicon targets, replacing titanium targets in the sputtering target B with cerium targets, introducing argon and oxygen into a vacuum furnace, wherein the argon flow is 400sccm, the oxygen flow is 300sccm, the air pressure is controlled to be 1.5Pa, simultaneously, turning on sputtering power supplies of the sputtering target A and the sputtering target B, the current of the sputtering target A is 30A, the current of the sputtering target B is 30A, sputtering the silicon targets and the cerium targets onto the surface of a shell substrate, depositing a cerium oxide and silicon dioxide mixed coating with the thickness of 200nm on AlMnCe layers, and jointly forming a coating layer from bottom to top by an Al-Ti transition layer, a AlMnCe layer, the cerium oxide and the silicon dioxide mixed coating;
S3.5, stopping introducing argon after coating, and introducing oxygen into the vacuum furnace only, wherein the oxygen flow is 300sccm, heating the shell substrate, the heating temperature is 600 ℃, and preserving heat for 30min to finish the surface vacuum coating processing of the shell substrate, thereby obtaining the shell substrate after coating processing;
S4, preparing coating protection paint of the coating layer and coating protection treatment of the coating layer,
S4.1, stirring and mixing 30 parts by weight of methyl acrylate, 40 parts by weight of methyl methacrylate, 35 parts by weight of styrene, 12 parts by weight of hydroxyethyl acrylate and 7 parts by weight of acrylic acid, adding 2 parts by weight of dibenzoyl peroxide, and uniformly stirring to obtain an acrylic acid monomer mixture;
S4.2, sequentially adding 35 parts by weight of ethyl acetate, 40 parts by weight of butyl acetate and 18 parts by weight of polydimethylsiloxane into a reaction kettle, heating to 80 ℃ under a nitrogen atmosphere, continuously stirring for 30min, heating to 110 ℃, slowly dripping the acrylic monomer mixture obtained in the step S4.1 into the reaction kettle, and carrying out polymerization reaction for 2h under the condition of 110 ℃ azeotropic distillation to obtain the organosilicon acrylic resin;
S4.3, mixing 5 parts by weight of nano silicon dioxide and 5 parts by weight of nano titanium dioxide to obtain mixed nano particles, wherein the diameter of the nano silicon dioxide is 50nm, the diameter of the nano titanium dioxide is 50nm, dissolving the mixed nano particles in 40 parts by weight of N-methylpyrrolidone, performing ultrasonic dispersion for 30min, slowly dropwise adding 30 parts by weight of coupling agent KH-570 under the condition of ultrasonic dispersion, reacting for 2h under nitrogen atmosphere, and performing centrifugal separation, filtration and washing after the reaction is completed to obtain modified mixed nano particles;
S4.4, adding 70 parts by weight of organosilicon acrylic resin, 3 parts by weight of organosilicon defoamer and 2 parts by weight of dimethyl siloxane into a reactor, uniformly mixing, adding 10 parts by weight of hexamethylene diisocyanate and 8 parts by weight of modified mixed nano particles, and performing ultrasonic dispersion for 40min to obtain a coating protective paint for a coating layer;
And S4.5, coating protective paint on the surface of the shell substrate subjected to coating processing by adopting an electrostatic spraying mode, then placing the sprayed shell substrate into a drying oven, drying and curing for 3 hours at 60 ℃ to form a coating protective layer, and finishing coating protective treatment of the coating layer to obtain the notebook computer shell subjected to coating protection.
Examples
An anti-skid coating process for the surface of a notebook computer shell specifically comprises the following steps:
S1, pretreatment of a shell substrate,
S1.1, placing a shell substrate into an ultrasonic cleaner, and sequentially performing ultrasonic cleaning in petroleum ether and absolute ethyl alcohol for 20min, wherein the ultrasonic cleaning power is 500W so as to remove impurities such as grease, dust, oxide layers and the like on the surface of the shell substrate;
s1.2, putting the cleaned shell substrate into a sand blasting machine, and carrying out sand blasting treatment on the surface of the cleaned shell substrate to ensure that the roughness Ra of the surface of the shell substrate is less than or equal to 0.5 mu m, thereby enhancing the adhesive force of a coating film;
s2, alMnCe alloy target material preparation,
S2.1, smelting and mixing Al, mn and Ce into alloy liquid by using a vacuum induction smelting furnace under the protection of argon, pouring the alloy liquid into a mould prepared in advance, and casting to obtain AlMnCe alloy billets, wherein the high-purity metals Al, mn and Ce are used as initial raw materials, the mass ratio of Al to Mn is 4:1, and the addition amount of Ce is 12% of the total mass of Al and Mn;
s2.2, carrying out vacuum degassing on AlMnCe alloy billets, and cutting and surface polishing to obtain AlMnCe alloy targets;
S3, surface vacuum coating processing,
S3.1, after pretreatment of the shell substrate is completed, placing the shell substrate into a vacuum furnace, exhausting air in the vacuum furnace to background vacuum, wherein the vacuum degree is 3 multiplied by 10 -3 Pa, and heating the shell substrate in the vacuum furnace to 70 ℃ through a heater, so that the metal atom structure on the surface of the shell substrate is changed, and the metal atom is in an active state;
S3.2, loading an aluminum target into a sputtering target A, loading a titanium target into a sputtering target B, introducing argon into a vacuum furnace, controlling the flow rate of the argon to be 200sccm, controlling the air pressure to be 0.5Pa, simultaneously turning on sputtering power supplies of the sputtering target A and the sputtering target B, sputtering the sputtering target A to be 25A and the sputtering target B to be 20A, sputtering the aluminum target and the titanium target onto the surface of a shell substrate, and depositing an Al-Ti transition layer with the thickness of 100 nm;
S3.3, replacing an aluminum target in the sputtering target A with a AlMnCe alloy target, continuously introducing argon into a vacuum furnace, controlling the flow rate of the argon to be 200sccm, controlling the air pressure to be 0.5Pa, turning on a sputtering power supply of the sputtering target A, sputtering the current of the sputtering target A to be 20A, sputtering the AlMnCe alloy target onto the surface of a shell substrate, and depositing a AlMnCe layer with the thickness of 150nm on the Al-Ti transition layer;
S3.4, replacing AlMnCe alloy targets in the sputtering target A with silicon targets, replacing titanium targets in the sputtering target B with cerium targets, introducing argon and oxygen into a vacuum furnace, controlling the flow of the argon to be 200sccm, the flow of the oxygen to be 150sccm, controlling the air pressure to be 1Pa, simultaneously turning on sputtering power supplies of the sputtering target A and the sputtering target B, enabling the current of the sputtering target A to be 25A, enabling the current of the sputtering target B to be 25A, sputtering the silicon targets and the cerium targets on the surface of a shell substrate, depositing a cerium oxide and silicon dioxide mixed coating with the thickness of 100nm on AlMnCe layers, and jointly forming a coating layer from bottom to top by an Al-Ti transition layer, a AlMnCe layer, a cerium oxide and silicon dioxide mixed coating;
S3.5, stopping introducing argon after coating, and introducing oxygen into the vacuum furnace only, wherein the oxygen flow is 150sccm, heating the shell substrate at 500 ℃, and preserving heat for 20min to finish the surface vacuum coating processing of the shell substrate, thereby obtaining the shell substrate after coating processing;
S4, preparing coating protection paint of the coating layer and coating protection treatment of the coating layer,
S4.1, stirring and mixing 30 parts by weight of methyl acrylate, 40 parts by weight of methyl methacrylate, 35 parts by weight of styrene, 12 parts by weight of hydroxyethyl acrylate and 7 parts by weight of acrylic acid, adding 2 parts by weight of dibenzoyl peroxide, and uniformly stirring to obtain an acrylic acid monomer mixture;
S4.2, sequentially adding 35 parts by weight of ethyl acetate, 40 parts by weight of butyl acetate and 18 parts by weight of polydimethylsiloxane into a reaction kettle, heating to 72 ℃ under a nitrogen atmosphere, continuously stirring for 20min, heating to 100 ℃, slowly dripping the acrylic monomer mixture obtained in the step S4.1 into the reaction kettle, and carrying out polymerization reaction for 1h under the azeotropic distillation condition of 100 ℃ to obtain the organosilicon acrylic resin;
S4.3, mixing 5 parts by weight of nano silicon dioxide and 5 parts by weight of nano titanium dioxide to obtain mixed nano particles, wherein the diameter of the nano silicon dioxide is 50nm, the diameter of the nano titanium dioxide is 50nm, dissolving the mixed nano particles in 40 parts by weight of N-methylpyrrolidone, performing ultrasonic dispersion for 20min, slowly dropwise adding 30 parts by weight of coupling agent KH-570 under the condition of ultrasonic dispersion, reacting for 1h under nitrogen atmosphere, and performing centrifugal separation, filtration and washing to obtain modified mixed nano particles after the reaction is completed;
s4.4, adding 70 parts by weight of organosilicon acrylic resin, 3 parts by weight of organosilicon defoamer and 2 parts by weight of dimethyl siloxane into a reactor, uniformly mixing, adding 10 parts by weight of hexamethylene diisocyanate and 8 parts by weight of modified mixed nano particles, and performing ultrasonic dispersion for 20min to obtain a coating protective paint for a coating layer;
And S4.5, coating protective paint on the surface of the shell substrate subjected to coating processing by adopting an electrostatic spraying mode, then placing the sprayed shell substrate into a drying oven, drying and curing for 3 hours at 50 ℃ to form a coating protective layer, and finishing coating protective treatment of the coating layer to obtain the notebook computer shell subjected to coating protection.
Examples
An anti-skid coating process for the surface of a notebook computer shell specifically comprises the following steps:
S1, pretreatment of a shell substrate,
S1.1, placing a shell substrate into an ultrasonic cleaner, and sequentially performing ultrasonic cleaning in petroleum ether and absolute ethyl alcohol for 20min, wherein the ultrasonic cleaning power is 500W so as to remove impurities such as grease, dust, oxide layers and the like on the surface of the shell substrate;
s1.2, putting the cleaned shell substrate into a sand blasting machine, and carrying out sand blasting treatment on the surface of the cleaned shell substrate to ensure that the roughness Ra of the surface of the shell substrate is less than or equal to 0.5 mu m, thereby enhancing the adhesive force of a coating film;
s2, alMnCe alloy target material preparation,
S2.1, smelting and mixing Al, mn and Ce into alloy liquid by using a vacuum induction smelting furnace under the protection of argon, pouring the alloy liquid into a mould prepared in advance, and casting to obtain AlMnCe alloy billets, wherein the high-purity metals Al, mn and Ce are used as initial raw materials, the mass ratio of Al to Mn is 10:1, and the addition amount of Ce is 8% of the total mass of Al and Mn;
s2.2, carrying out vacuum degassing on AlMnCe alloy billets, and cutting and surface polishing to obtain AlMnCe alloy targets;
S3, surface vacuum coating processing,
S3.1, after pretreatment of the shell substrate is completed, placing the shell substrate into a vacuum furnace, exhausting air in the vacuum furnace to background vacuum, wherein the vacuum degree is 6 multiplied by 10 -3 Pa, and heating the shell substrate in the vacuum furnace to 90 ℃ through a heater, so that the metal atom structure on the surface of the shell substrate is changed, and the metal atom is in an active state;
S3.2, loading an aluminum target into a sputtering target A, loading a titanium target into a sputtering target B, introducing argon into a vacuum furnace, controlling the flow rate of the argon to be 400sccm, controlling the air pressure to be 0.8Pa, simultaneously turning on sputtering power supplies of the sputtering target A and the sputtering target B, sputtering the aluminum target and the titanium target onto the surface of a shell substrate, and depositing an Al-Ti transition layer with the thickness of 150nm, wherein the current of the sputtering target A is 30A, and the current of the sputtering target B is 25A;
s3.3, replacing an aluminum target in the sputtering target A with a AlMnCe alloy target, continuously introducing argon into a vacuum furnace, controlling the flow rate of the argon to be 400sccm, controlling the air pressure to be 0.8Pa, turning on a sputtering power supply of the sputtering target A, enabling the current of the sputtering target A to be 30A, sputtering the AlMnCe alloy target onto the surface of a shell substrate, and depositing a AlMnCe layer with the thickness of 200nm on the Al-Ti transition layer;
S3.4, replacing AlMnCe alloy targets in the sputtering target A with silicon targets, replacing titanium targets in the sputtering target B with cerium targets, introducing argon and oxygen into a vacuum furnace, wherein the argon flow is 400sccm, the oxygen flow is 300sccm, the air pressure is controlled to be 1.5Pa, simultaneously, turning on sputtering power supplies of the sputtering target A and the sputtering target B, the current of the sputtering target A is 30A, the current of the sputtering target B is 30A, sputtering the silicon targets and the cerium targets onto the surface of a shell substrate, depositing a cerium oxide and silicon dioxide mixed coating with the thickness of 200nm on AlMnCe layers, and jointly forming a coating layer from bottom to top by an Al-Ti transition layer, a AlMnCe layer, the cerium oxide and the silicon dioxide mixed coating;
S3.5, stopping introducing argon after coating, and introducing oxygen into the vacuum furnace only, wherein the oxygen flow is 300sccm, heating the shell substrate, the heating temperature is 600 ℃, and preserving heat for 30min to finish the surface vacuum coating processing of the shell substrate, thereby obtaining the shell substrate after coating processing;
S4, preparing coating protection paint of the coating layer and coating protection treatment of the coating layer,
S4.1, stirring and mixing 20 parts by weight of methyl acrylate, 25 parts by weight of methyl methacrylate, 20 parts by weight of styrene, 5 parts by weight of hydroxyethyl acrylate and 2 parts by weight of acrylic acid, adding 0.6 part by weight of dibenzoyl peroxide, and uniformly stirring to obtain an acrylic acid monomer mixture;
s4.2, sequentially adding 25 parts by weight of ethyl acetate, 16 parts by weight of butyl acetate and 7 parts by weight of polydimethylsiloxane into a reaction kettle, heating to 80 ℃ under a nitrogen atmosphere, continuously stirring for 30min, heating to 110 ℃, slowly dripping the acrylic monomer mixture obtained in the step S4.1 into the reaction kettle, and carrying out polymerization reaction for 2h under the condition of 110 ℃ azeotropic distillation to obtain the organosilicon acrylic resin;
s4.3, mixing 1 part by weight of nano silicon dioxide and 1 part by weight of nano titanium dioxide to obtain mixed nano particles, wherein the diameter of the nano silicon dioxide is 50nm, the diameter of the nano titanium dioxide is 50nm, dissolving the mixed nano particles in 20 parts by weight of N-methylpyrrolidone, performing ultrasonic dispersion for 30min, slowly dropwise adding 6 parts by weight of coupling agent KH-570 under the condition of ultrasonic dispersion, reacting for 2h under nitrogen atmosphere, and performing centrifugal separation, filtration and washing after the reaction is completed to obtain modified mixed nano particles;
S4.4, adding 50 parts by weight of organosilicon acrylic resin, 0.5 part by weight of organosilicon defoamer and 0.3 part by weight of dimethyl siloxane into a reactor, uniformly mixing, adding 4 parts by weight of hexamethylene diisocyanate and 2 parts by weight of modified mixed nano particles, and performing ultrasonic dispersion for 40min to obtain coating protective paint for a coating film layer;
And S4.5, coating protective paint on the surface of the shell substrate subjected to coating processing by adopting an electrostatic spraying mode, then placing the sprayed shell substrate into a drying oven, drying and curing for 3 hours at 60 ℃ to form a coating protective layer, and finishing coating protective treatment of the coating layer to obtain the notebook computer shell subjected to coating protection.
Comparative example 1
The comparative example differs from example 1 in that the amount of Ce added in AlMnCe alloy target was adjusted to 6% of the total mass of Al and Mn, the remaining steps were unchanged, alMnCe alloy target was prepared, and an al—ti transition layer and AlMnCe layer were sequentially deposited on the surface of the housing substrate, which was designated as comparative example 1.
Comparative example 2
The comparative example differs from example 1 in that the amount of Ce added in AlMnCe alloy target was adjusted to 15% of the total mass of Al and Mn, the remaining steps were unchanged, alMnCe alloy target was prepared, and an al—ti transition layer and AlMnCe layer were sequentially deposited on the surface of the housing substrate, which was designated as comparative example 2.
Comparative example 3
The difference between this comparative example and example 1 is that the Ce component in AlMnCe alloy target was removed, the rest of the steps were unchanged, an AlMn alloy target was prepared, alMnCe alloy target in step S3.3 was replaced with an AlMn alloy target, and an al—ti transition layer and an AlMn layer were sequentially deposited on the surface of the housing substrate, denoted as comparative example 3.
In examples 1 to 3, after depositing Al-Ti transition layers and AlMnCe layers in this order on the surface of the casing base material, the examples 1 to 3 and comparative examples 1 to 3 were followed by grouping, and 4 of the casing base materials having Al-Ti transition layers and AlMnCe layers attached thereto in examples 1 to 3, the casing base materials having Al-Ti transition layers and AlMnCe layers attached thereto in comparative examples 1 to 3, and the casing base materials having Al-Ti transition layers and AlMn layers attached thereto in comparative example 3 were each selected as test samples.
The adhesive force test is carried out on 2 test samples in each group according to the GB/T9286-2021 standard, the abrasion resistance test is carried out on the rest 2 test samples in each group, a contact angle measuring instrument is adopted firstly to test the contact angle of water on each group of test samples, the average value of the contact angle before the friction of each group of test samples is recorded, then each group of test samples is taken out from the contact angle measuring instrument, steel wool is respectively attached to the surfaces of each group of test samples, the steel wool is pushed back and forth to rub the surfaces of each group of test samples, the applied friction force is the same, after the friction is carried out back and forth for 500 times, the contact angle measuring instrument is adopted again to test the contact angle of water on each test sample, and the average value of the contact angle after the friction of each group of test samples is recorded. The results (the abrasion resistance was evaluated by the magnitude of the contact angle change before and after abrasion) are shown in Table 1 below.
As can be seen from table 1, in comparative examples 1 and 3, after the addition amount of Ce was adjusted to 6% and 0% of the total mass of Al and Mn, respectively, on the basis of example 1, the adhesion of the plating layer was significantly reduced, while the adhesion of the AlMnCe layers of examples 1 to 3 was good, which indicates that the bonding force between the al—ti transition layer and the AlMnCe layer could be effectively improved by adding Ce to the alloy target and setting the addition amount of Ce in the AlMnCe alloy target to 8 to 12% of the total mass of Al and Mn. Furthermore, after the abrasion resistance test, the contact angle test results of AlMnCe layers of examples 1-3 before and after the abrasion are changed slightly, which indicates that the abrasion resistance is excellent, and the contact angle test results of comparative examples 1-3 before and after the abrasion are changed relatively remarkably, namely abrasion to a large extent occurs, so that the Ce addition amount in AlMnCe alloy target is controlled to be 8-12% of the total mass of Al and Mn, and the abrasion resistance of AlMnCe layers to the surface of an external substrate can be effectively ensured.
Comparative example 4
The difference between this comparative example and example 1 is that in step S3.4, only the sputtering power supply of the sputtering target a is turned on, the silicon target is sputtered onto the surface of the housing base material, a silicon oxide coating layer is deposited on the AlMnCe layers, the coating layer is composed of al—ti transition layer, alMnCe layers and silicon oxide coating layer from bottom to top, and the remaining steps are unchanged, and the housing base material after coating processing is prepared and denoted as comparative example 4.
Comparative example 5
The difference between this comparative example and example 1 is that in step S3.4, only the sputtering power supply of the sputtering target B is turned on, the cerium target is sputtered onto the surface of the housing base material, a cerium oxide plating layer is deposited on the AlMnCe layers, the plating layer is composed of al—ti transition layer, alMnCe layers, and cerium oxide plating layer from bottom to top, and the rest steps are unchanged, and the housing base material after plating processing is prepared and is denoted as comparative example 5.
Al-Ti transition layers, alMnCe layers, cerium oxide and silicon dioxide mixed plating layers are sequentially deposited on the surfaces of the shell base materials in the embodiments 1-3, the shell base materials after coating processing are obtained, grouping is carried out according to the embodiments 1-3 and the comparative examples 4-5, 1 shell base material after coating processing is selected as a test object from the shell base materials after coating processing of each group, friction coefficient measurement is carried out on the test objects of each group by adopting a friction coefficient tester, namely, the coating layers of the test objects are horizontally upwards placed in the friction coefficient tester, then a200 g weight is placed on the upper surfaces of the test objects, friction force between the test objects and the weights is measured, and friction coefficients of the test objects of each group are recorded. The results (of evaluating the anti-skid property by the magnitude of the friction coefficient) are shown in Table 2 below.
As can be seen from table 2, the test objects of examples 1-3 have friction coefficients >1.3 after being measured by the friction coefficient tester, and the friction coefficient test results of comparative examples 4-5 are significantly smaller than those of examples 1-3, which indicates that the cerium oxide and silicon dioxide mixed coating can effectively improve the friction coefficient of the surface of the shell substrate, thereby improving the anti-skid performance. Compared with the single deposition of the silicon dioxide coating or the cerium oxide coating, the cerium oxide and silicon dioxide mixed coating is more beneficial to increasing the friction coefficient of the surface of the shell substrate, and the cerium oxide and silicon dioxide components are mutually synergistic, so that the anti-skid performance is more beneficial to improvement.
Comparative example 6
The difference between this comparative example and example 1 is that the modified mixed nanoparticles in step S4.4 were removed during the preparation of the coating layer coated with the protective paint, and the remaining steps were unchanged, and a notebook computer case after the coating protection was prepared, which was denoted as comparative example 6.
The test samples were prepared by grouping the test samples according to examples 1 to 3 and comparative example 6, and selecting 3 coated and protected notebook computer cases from examples 1 to 3 and comparative example 6. And selecting one test sample from each group as a test object, and measuring and calculating the friction coefficient of the test objects in each group by adopting a friction coefficient tester, wherein a coating layer of the test object is horizontally upwards placed in the friction coefficient tester, and then a 200g weight is placed on the upper surface of the test object, so that the friction force between the test object and the weight is measured. The coefficient of friction of each group of test subjects was recorded. (evaluation of anti-slip Property by the Friction coefficient)
The abrasion resistance test is carried out on the rest 2 test samples in each group, namely, the contact angle of water on each group of test samples is firstly tested by adopting a contact angle measuring instrument, the average value of the contact angles before the test samples are rubbed is recorded, then, steel wool is respectively attached to the surfaces of the test samples in each group, the steel wool is pushed back and forth, the surfaces of the test samples in each group are rubbed, the applied friction force is the same in magnitude, after the friction force is rubbed back and forth for 500 times, the contact angle measuring instrument is adopted again, the contact angle of the test water on each test sample is recorded, and the average value of the contact angles after the test samples in each group are rubbed is recorded. The results (abrasion and stain resistance, generally greater than 150 degrees, with strong stain resistance, as judged by the magnitude of the contact angle change before and after rubbing) are shown in Table 3 below.
As can be seen from table 3, the test objects of examples 1 to 3 have friction coefficients of >1.52 after being measured by the friction coefficient tester, and the friction coefficient test result of comparative example 6 is 1.41, which is smaller than the test result of examples 1 to 3, which shows that the coating protection treatment of the coating layer can further increase the friction coefficient, improve the surface anti-slip performance of the notebook computer casing after the coating protection, and the modified mixed nano particles in the coating protection paint play a main anti-slip synergistic effect, further improve the anti-slip performance of the notebook computer casing. Moreover, as can be seen from the contact angle results before and after friction, the contact angle of the surface of the notebook computer shell after the coating protection in the embodiments 1-3 is more than 150 degrees, the contact angle change before and after friction is smaller, only slight abrasion exists, and the wear resistance is excellent, which indicates that the coating protection layer attached to the surface of the coating layer of the notebook computer shell after the coating protection in the embodiments 1-3 can effectively improve the wear resistance and the pollution resistance of the coating layer, and avoid the damage or the surface pollution of the coating layer.
It will be understood that modifications and variations will be apparent to those skilled in the art from the foregoing description, and it is intended that all such modifications and variations be included within the scope of the following claims. Parts of the specification not described in detail belong to the prior art known to those skilled in the art.
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