CN118274737A - A lateral resolution enhancement method based on inclined white light scanning interferometry - Google Patents
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Abstract
The invention discloses a lateral resolution enhancement method based on oblique white light scanning interference, which comprises the following steps: performing vertical scanning measurement on the step structure through a white light interferometer to obtain multi-frame light intensity images; performing height information matrix conversion based on multi-frame light intensity images to obtain a height information matrix, and placing the height information in the matrix according to the same picture position coordinates; analyzing a height information matrix, and dividing a region I and a region II according to the element variance; performing inclination control on the carrying platform until the total variance of the elements in the area I reaches a threshold value, and recording inclination angle data and a height information matrix at the moment; continuously tilting the carrying platform until the number of elements lower than the height of the theoretical calculation formula in the elements in the area I reaches a certain duty ratio, and recording tilt angle data and a height information matrix at the moment; and establishing a geometric model under the condition of twice inclination angles, and calculating the target transverse dimension of the sample to be detected by utilizing the two groups of inclination angle data and the height information matrix.
Description
Technical Field
The invention belongs to the technical field of precise measurement of semiconductor technology, and particularly relates to a transverse resolution enhancement method based on inclined white light scanning interference.
Background
The submicron measurement precision of interferometry meets the high-precision requirement of the precision manufacturing industry represented by the integrated circuit industry for the micro-morphology size. In a white light interferometry system, continuous and broad spectrum light is emitted by a light source to form low coherence fringes with localized characteristics, and measurement and calculation of surface height morphology are realized by using a series of interference images with known reference optical paths. Compared with the full coherence measurement of monochromatic light, when the measurement object is of a stepped structure outside a half wavelength range, the white light interferometry has the characteristics of no phase limitation and high accuracy. At present, the white light scanning interferometry has detection potential in the aspect of detecting the defect of high variation of the surface of the non-pattern wafer due to the sub-nanometer longitudinal measurement precision.
White light interferometry can be classified into white light scanning interferometry, white light phase-shifting interferometry, and white light achromatic phase-shifting interferometry, depending on the differences in the specific measurement principles. For Michelson, mirau, and Linnik interferometry configurations in white light scanning interferometry, these systems can all maintain relative independence from lateral resolution in terms of longitudinal measurement accuracy. With the development of advanced processes in the semiconductor industry, breaking the diffraction limit becomes one of the bottlenecks of optical measurement technology. Critical lateral dimensions such as linewidth measurement and overlay errors in chip fabrication place higher demands on optical interference techniques. White light scanning interferometry systems perform well in the measurement of lateral dimensions, subject to the spectral range and objective numerical aperture of low coherence imaging systems.
From the relativity of transverse and longitudinal definition, the transverse resolution can be converted into the longitudinal resolution by model parameters under the basis of certain feasibility. The inclined white light scanning measurement system has an included angle between the optical axis and the vertical direction of the sample to be measured, and this provides a high-precision difference value for the original horizontal transverse dimension in the height information. While conventional oblique white light scanning systems are commonly used to expand the field of view and scanning efficiency of measurement systems, the present invention contemplates that the angle tilt provides a rise space for the measurement resolution of the lateral dimension. Therefore, the research of the lateral resolution enhancement of the white light interference can be carried out, the application scene of the white light interference in the precision manufacturing industry can be expanded, and the higher precision of the reconstruction of the submicron-level periodic array and the three-dimensional structure difficult to measure by the traditional interferometry is realized.
Disclosure of Invention
In order to solve the technical problems, the invention provides a transverse resolution enhancement method based on inclined white light scanning interference, which converts the transverse resolution which is difficult to be improved by diffraction limit and camera acquisition hardware level in white light interference into a mechanical level, and improves the transverse submicron precision of the white light interferometry technology to a higher level.
To achieve the above object, the present invention provides a lateral resolution enhancement method based on oblique white light scanning interferometry, comprising:
selecting a step structure, placing the step structure on an object carrying platform, and carrying out vertical scanning measurement on the step structure through a white light interferometer to obtain multi-frame light intensity images;
performing height information matrix transformation based on the multi-frame light intensity images to obtain a height information matrix, and placing the height information in the matrix according to the same picture position coordinates;
Analyzing the height information matrix, and dividing a region I and a region II according to the element variance;
Performing inclination control on the carrying platform until the total variance of the elements in the area I reaches a threshold value, and recording inclination angle data and the height information matrix at the moment;
Continuously tilting the carrying platform until the number of elements lower than the height of a theoretical calculation formula in the elements in the area I reaches a certain duty ratio, and recording tilt angle data and the height information matrix at the moment;
And establishing a geometric model under the condition of twice inclination angles, and calculating the target transverse dimension of the sample to be detected by utilizing the two groups of inclination angle data and the height information matrix.
Optionally, selecting a step structure and placing the step structure on an object carrying platform, and performing vertical scanning measurement on the step structure by using a white light interferometer, wherein the method for obtaining multi-frame light intensity images comprises the following steps:
When the step type structure to be measured is inclined to a state of a preset angle along with the horizontal state of the measuring platform, the corresponding white light interferometry envelope signal is changed into an envelope signal corresponding to the inclination state moment; meanwhile, under the condition that the space coordinates are not changed, the object morphology information which is also measured by white light scanning interferometry is obtained, and then the multi-frame light intensity image containing the morphology information is obtained in the object inclination state.
Optionally, the method for converting the height information matrix based on the multi-frame light intensity image to obtain the height information matrix and placing the height information in the matrix according to the same picture position coordinates includes:
Placing a step-type structure of target measurement on the carrying platform, and solving morphology information through light intensity patterns obtained by different reference optical paths;
acquiring height information of a corresponding point in the dimension of the picture by utilizing a peak searching algorithm of white light interference on multi-frame light intensity;
And placing the height information of each point in a matrix form according to the same coordinate sequence of the picture pixel points.
Optionally, the method for analyzing the height information matrix and dividing the area I and the area II according to the element variance comprises the following steps:
Wherein M, N and S, T are the row-column dimensions contained in the matrices in region I and region II, H Ⅰ (i+m, j+n) and H Ⅱ (x+s, y+t) correspond to the height elements in region I and region II, AndThe mean values of the height elements in the corresponding areas I and II, respectively, epsilon and sigma b are artificially set variance thresholds.
Optionally, the tilt control is performed on the carrying platform until the total variance of the elements in the area i reaches a threshold, and the method for recording the tilt angle data and the height information matrix at this time is as follows:
wherein M, N is the row-column dimension contained in the matrix of region I, H Ⅰ (i+m, j+n) is the height element corresponding to region I, For the average value of the height elements in the corresponding region I, σ 1 is the threshold value of the overall variance of the elements within region I.
Optionally, the continuous tilt control is performed on the object carrying platform, until the number of elements lower than the height of the theoretical calculation formula in the elements in the area i reaches a certain duty ratio, the method for recording the tilt angle data and the height information matrix at the moment is as follows:
Wherein, |·| represents the number of aggregate elements, rate θ is a set proportional threshold, ε θ is a constant greater than zero, for defining that the measurement points are transformed in a controllable range during the tilting process, H is the measurement height of the selected measurement object in a horizontal state, H Ι (m, n)' is the height at the coordinates (m, n) during the tilting process, θ 1 is the recorded monitoring angle, and θ is the tilt angle of the object carrying platform.
Optionally, a geometric model under the condition of twice inclination angles is established, and the method for calculating the target transverse dimension of the sample to be measured by using the two groups of inclination angle data and the height information matrix is as follows:
l θ is as follows according to the geometric relationship:
according to the triangle cosine theorem:
The form of the lateral dimension deltax solution is:
Δx＝f(θ1,θ2,h1,h2)
Where x is the distance from the rotation axis, θ 2 is the recorded monitored angle, h 1 and h 2 correspond to the accurate measurement height data at the monitored angle θ 1、θ2, L θ is the link distance between the corresponding edge points in the measurement process, and Δx is the target lateral dimension.
The invention has the technical effects that: the invention discloses a lateral resolution enhancement method based on inclined white light scanning interference, which converts the lateral resolution which is difficult to be improved by diffraction limit and camera acquisition hardware level in white light interference into high-precision measurement which is easy to be realized by mechanical level; carrying out partition monitoring on the height information of the solved point in the white light interferometer, and accurately establishing the relation between the inclination angle and the edge height information under the inclination control of the carrying platform, so as to establish a calculation formula of the transverse dimension; the method bypasses the conventional method of directly obtaining the morphology information to be measured by white light interferometry, and performs mathematical formula equivalent solution by using indirect high-precision data, thereby realizing higher transverse resolution than the original white light interferometry system; the method can be expanded to various transverse dimension measurement with a step structure, and provides reliable precision guarantee for the step structure and the like frequently occurring in the integrated circuit industry.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the application. In the drawings:
FIG. 1 is a schematic flow chart of a lateral resolution enhancement method based on oblique white light scanning interferometry according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of converting white light scanning interferometry into a height information matrix according to an embodiment of the present invention, wherein 1 is a multi-frame different light intensity pattern photographed by a white light scanning interferometer, and 2 is a height information matrix;
FIG. 3 is a schematic diagram illustrating the area division performed on a height information matrix according to an embodiment of the present invention;
Fig. 4 is a change rule of a height information matrix under an inclination operation of the object carrying platform according to an embodiment of the present invention, where (a) the graph is a schematic diagram of measurement signal characteristics of a step structure under an inclination condition, and (b) the graph is a schematic diagram of transferring data characteristics of an area ii toward an area i during the inclination process. Specifically, a single step type rectangular grating structure under the 3-level condition, a white light interference signal corresponding to the single step type rectangular grating structure under the 4-level condition, a region I under the 5-level condition, a height information matrix under the 6-level condition, a region II under the 7-level condition, a schematic lens of an 8-white light interferometer, a 9-inclined carrying platform, a 10-level carrying platform, a height information matrix under the 11-inclined condition, a white light interference signal corresponding to the single step type rectangular grating structure under the 12-inclined condition and a single step type rectangular grating structure under the 13-inclined condition are adopted;
FIG. 5 is a schematic view of a geometric model of an object carrying platform established in an inclination process according to an embodiment of the present invention, wherein (a) is a geometric model area diagram in a horizontal state; (b) Schematic diagram for the connection of the geometrical model and the elements of the height information matrix in the tilting process. Specifically, 14-a rotating shaft area of the carrying platform, 15-a height information gradual change area near the edge of the step structure, 16-a variance larger area containing the edge information of the step structure and 17-a height information matrix;
FIG. 6 is a diagram showing the relationship between the lateral dimension and two sets of tilt angle and height information, wherein (a) is a physical model of the sample at two extreme tilt angles and (b) is a geometric mathematical model corresponding to the diagram of (a).
Detailed Description
It should be noted that, without conflict, the embodiments of the present application and features of the embodiments may be combined with each other. The application will be described in detail below with reference to the drawings in connection with embodiments.
It should be noted that the steps illustrated in the flowcharts of the figures may be performed in a computer system such as a set of computer executable instructions, and that although a logical order is illustrated in the flowcharts, in some cases the steps illustrated or described may be performed in an order other than that illustrated herein.
As shown in fig. 1, the present embodiment provides a lateral resolution enhancement method based on oblique white light scanning interference, which includes:
Selecting a step structure, placing the step structure on a carrying platform, and carrying out vertical scanning measurement on the step structure through a white light interferometer to obtain multi-frame light intensity images;
Performing height information matrix conversion based on multi-frame light intensity images to obtain a height information matrix, and placing the height information in the matrix according to the same picture position coordinates;
analyzing a height information matrix, and dividing a region I and a region II according to the element variance;
Performing inclination control on the carrying platform until the total variance of the elements in the area I reaches a threshold value, and recording inclination angle data and a height information matrix at the moment;
Continuously tilting the carrying platform until the number of elements lower than the height of the theoretical calculation formula in the elements in the area I reaches a certain duty ratio, and recording tilt angle data and a height information matrix at the moment;
And establishing a geometric model under the condition of twice inclination angles, and calculating the target transverse dimension of the sample to be detected by utilizing the two groups of inclination angle data and the height information matrix.
White light scanning interferometry systems perform well in the measurement of lateral dimensions, subject to the spectral range and objective numerical aperture of low coherence imaging systems. In order to solve the development problem in the background technology, the invention mainly embodies a transverse resolution enhancement method based on oblique white light scanning interference. Aiming at improving the sub-micron precision of the lateral direction of the white light interferometry technology to a higher level. In general, there is some similarity to the geometric model build in case of a step-like structure tilt. Specifically, the rectangular convex grating type step structure is selected for analysis, so that the accurate measurement and calculation of the transverse dimension can be realized, and the traditional transverse dimension measurement precision is broken through.
As shown in the method flow in fig. 1. Specifically, a rectangular grating step structure common in the integrated circuit industry is selected for vertical scanning measurement of the Mirau white light interferometer. In a white light interferometry system, light emitted by a broad spectrum light source enters a light path, and beam splitting is achieved under the action of a spectroscope. The position of a reference surface of an interference light path is controlled by a precision displacement mechanism, so that an optical path difference is formed to obtain a coherent light beam, and the coherent light beam enters a CCD camera to collect white light interference fringes after the effect of an objective lens. And carrying out relative height solution on N frames of light intensity image information acquired in the vertical scanning process, and placing the result in a height information matrix H under the same picture position coordinates. The conversion of the light intensity image 1 into the height information matrix 2 is accomplished as shown in fig. 2.
At this time, the height information matrix 2 is analyzed, and the rough division of the region i and the region ii may be performed by the height information matrix 2 having different gradation values. In the optical measurement system, when the distance between two points is smaller than a certain limit, the imaging system cannot accurately separate the information between the two points. When reflected on the left and right sides of the step-like height jump, i.e. a relatively high height measurement does not necessarily represent that the pixel point is the lateral coordinate position of the actual step of the step-like structure.
Based on this, as shown in fig. 3, the total variance calculation is performed on the height information elements in the region i and the region ii to reliably divide the regions i and ii. Wherein, according to the designation in fig. 3, the elements in region i and region ii should satisfy the following formulas, respectively:
Wherein M, N and S, T are the row-column dimensions contained in the matrices in region I and region II, H Ⅰ (i+m, j+n) and H Ⅱ (x+s, y+t) correspond to the height elements in region I and region II, AndThe mean values of the height elements in the corresponding areas I and II, respectively, epsilon and sigma b are artificially set variance thresholds. And adjusting the area according to the total variance value in the area I and the area II. It should be noted that the area i should control the number of included height information matrix elements under the condition that the variance threshold epsilon is satisfied, and the area ii contains edge information of the step structure. Furthermore, this method requires that the two divided regions be as adjacent as possible to avoid the influence of a single pixel-level bump structure in the middle region.
At this time, the areas I and II are divided to monitor the change of the height information within the range. As shown in fig. 4, when a single stepped rectangular grating structure 3 is tilted as shown by the platform 10 toward the platform tilt state 9, its white light interferometry signal 4 will correspond to being varied in accordance with the interferometry signal 14. Correspondingly, in the height information matrix 11 in the case of tilting observed by the interferometer 8, the edge information contained in the region ii 7 is shifted toward the region ii 5.
Further as shown in fig. 5, the object to be measured is rotated around a certain axis within the camera acquisition range, and the variance increase level of the height information matrix in the near rotation axis region 14 is low. While the change will be a jump in the height information matrix element portion of 15 in area i. Whereas the variance of the height information matrix elements of 16 in region ii shows a decreasing trend. When the overall variance of the elements of the height matrix measured by the white light vertical scan in region I is greater than σ 1:
The object edge point a 1 detected during the monitoring process in the area i can be considered, and the inclination angle of the object carrying platform at this time is denoted as θ 1.
At this time, as shown in fig. 5 (b), for the horizontal lateral dimension of the segment L AB of the object to be measured, the following formula should be satisfied during the rotation of the controllable angle θ:
wherein epsilon θ is a levelness determined according to the manufacturing process of the object to be measured. The left side inequality represents that exceeding the set threshold results in the measurement point falling on a higher object surface topography, and the right side inequality represents that exceeding the set threshold results in the measurement point falling on a lower object surface topography.
The continuous tilting of the platform is then continued by the experimenter until the right edge point B 2 of the stepped structure comes within the monitoring range of zone i. Unlike the change caused by point a 1, the overall variance in region i caused by B 2 does not fluctuate much. In this case, it is considered that the right boundary point of the transverse dimension is detected in the region i when the ratio of the measured point data having a measured height lower than the theoretical height reaches a certain ratio. The specific formula can be expressed as:
Where || represents the number of collection elements and Rate θ is the set proportional threshold. The formula expresses the dynamic information of the edge B 2 into the height information matrix area i. And acquiring the inclination angle of the carrying platform at the moment of theta 2 at the same moment when the threshold value is exceeded.
Further, in the triangle Δa 1B1B2 shown in fig. 6, the length of a 1B2 is also required to obtain the quantity a 1B1 to be solved. And h 1 and h 2 are included in the height information matrix corresponding to the inclination angles θ 1 and θ 2. The value can be taken according to the following formula:
and dividing the height information in the region I into two types according to the average value, and obtaining accurate longitudinal measurement data of white light vertical scanning interference corresponding to the edge points A 1 and B 2 according to the formula.
Next, Δa 1B1B2 is analyzed, and as shown in fig. 6 (b), L θ has, according to the geometric relationship:
according to the triangle cosine law:
The form of the lateral dimension deltax solution is:
Δx＝f(θ1,θ2,h1,h2)
It can be seen that the magnitude of Δx is calculated by combining the height information measured by white light interferometry with the angle control of the carrying platform. The formula utilizes the relative independence of the transverse resolution and the longitudinal resolution, and bypasses the conventional solving method of directly acquiring and solving the transverse size information by the CCD camera. Therefore, higher resolution of the interference image acquired by the interference objective can be realized in terms of accuracy by means of the accuracy of the longitudinal measurement result. And the formula shows that deltax is closely related to the angular control accuracy, which gives the possibility of deeper applications for oblique white light interferometry.
The invention is directed to specific application objects and scenarios, for example, the integrated circuit industry may be replaced with other component critical dimension measurements in the micro-fabrication industry, etc.; rectangular grating structures in the integrated circuit industry can also be used for changing the object into the measurement of the transverse dimension of the concave groove and the like under the adjustment of the same principle of the method; the tilting mode of the carrying platform can be replaced by other mechanical structures with the same purpose, and the like.
The present application is not limited to the above-mentioned embodiments, and any changes or substitutions that can be easily understood by those skilled in the art within the technical scope of the present application are intended to be included in the scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.
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