CN118266636A - Heating atomization control method, electronic atomization device and storage medium - Google Patents

Abstract

The present application discloses a heating atomization control method, an electronic atomization device, and a storage medium. The atomizer includes multiple liquid storage chambers and a heating component; the liquid storage chamber stores a medium to be atomized, and at least part of the multiple liquid storage chambers stores different media to be atomized; the heating component includes a substrate and a heating element, and the heating element is arranged on the atomization surface of the substrate; or the heating component includes a substrate and the substrate is at least partially conductive to serve as a heating element; the substrate has multiple atomization areas, and the multiple atomization areas are arranged one by one with multiple liquid storage chambers. The heating atomization control method includes receiving a heating start signal; in response to receiving the heating start signal, controlling the heating element to heat and atomize the media to be atomized in the multiple liquid storage chambers based on a preset strategy; the preset strategy is related to the media to be atomized stored in the liquid storage chamber corresponding to the atomization area, so as to differentiate the atomization according to the characteristics of different media to be atomized, and realize targeted atomization.

Description

Heating atomization control method, electronic atomization device, and storage medium

Technical Field

The present application relates to the field of atomization technology, and in particular to a heating atomization control method, an electronic atomization device, and a storage medium.

Background technique

The electronic atomization device includes a liquid storage chamber and a heating component. The liquid storage chamber stores flavor liquid, and the heating component is in liquid communication with the liquid storage chamber, and the heating component is used to atomize the flavor liquid. As the core component of the electronic atomization device, the characteristics of the heating component determine the atomization effect and user experience of the electronic atomization device.

Flavored liquid is a mixture, usually including solvents and additives, common additives include propylene glycol, glycerol, nicotine salts, flavors and fragrances, flavor additives, plant extracts, etc. The volatility characteristics of various components of flavored liquid are different. Existing electronic atomization devices all use a heating component to perform physical differential atomization on various components, which affects the volatility of some components and affects the taste.

Summary of the invention

The heating atomization control method, electronic atomization device, and storage medium provided in the present application are used to effectively atomize different components in the flavor liquid to improve the taste.

In order to solve the above technical problems, the first technical solution provided in the present application is: to provide a heating atomization control method for controlling the heating atomization of an atomizer, wherein the atomizer includes multiple liquid storage chambers and a heating component; the liquid storage chamber stores a medium to be atomized, and at least part of the multiple liquid storage chambers stores different media to be atomized; the heating component includes a substrate and a heating element, and the heating element is arranged on the atomization surface of the substrate; or the heating component includes a substrate and the substrate is at least partially conductive to serve as a heating element; the substrate has multiple atomization areas, and the multiple atomization areas are arranged in a one-to-one correspondence with the multiple liquid storage chambers; the method includes: receiving a heating start signal; in response to receiving the heating start signal, controlling the heating element to heat and atomize the media to be atomized in the multiple liquid storage chambers based on a preset strategy; wherein the preset strategy is related to the media to be atomized stored in the liquid storage chamber corresponding to the atomization area.

In one embodiment, the parameters of the substrate in different parts corresponding to the atomization areas are different; wherein the preset strategy is related to the medium to be atomized stored in the liquid storage cavity corresponding to the atomization area and the parameters of the substrate in the part corresponding to the atomization area.

In one embodiment, the substrate has a plurality of liquid guide holes, and the liquid guide holes located in different atomization zones have different apertures; wherein the preset strategy includes:

Controlling the heating element to heat the plurality of atomization zones to different atomization temperatures, wherein the atomization temperatures of the plurality of atomization zones are positively correlated with the boiling points of the to-be-atomized media corresponding to the plurality of atomization zones, and the atomization temperatures of the plurality of atomization zones are negatively correlated with the apertures of the liquid guide holes in the plurality of atomization zones; or,

The substrate has a plurality of liquid guide holes, and the liquid guide holes located in different atomization zones have different lengths; wherein the preset strategy includes:

The heating element is controlled to heat the multiple atomization zones to different atomization temperatures, the atomization temperatures of the multiple atomization zones are positively correlated with the boiling points of the to-be-atomized media corresponding to the multiple atomization zones, and the atomization temperatures of the multiple atomization zones are positively correlated with the lengths of the liquid guide holes in the multiple atomization zones.

In one embodiment, the atomizer includes a first liquid storage chamber and a second liquid storage chamber; a first medium to be atomized is stored in the first liquid storage chamber, a second medium to be atomized is stored in the second liquid storage chamber, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized; the substrate has a first atomization area and a second atomization area, the first atomization area is arranged corresponding to the first liquid storage chamber, and the second atomization area is arranged corresponding to the second liquid storage chamber; the substrate has a plurality of first liquid guide holes located in the first atomization area and a plurality of second liquid guide holes located in the second atomization area; wherein the aperture of the first liquid guide hole is larger than the aperture of the second liquid guide hole, and/or the length of the first liquid guide hole is smaller than the length of the second liquid guide hole; the preset strategy includes:

The first atomization zone is heated to a first atomization temperature to atomize the first medium to be atomized, and the second atomization zone is heated to a second atomization temperature to atomize the second medium to be atomized, wherein the first atomization temperature is lower than the second atomization temperature.

In one embodiment, the preset strategy includes:

In response to the time of receiving the heating start signal reaching a first preset time, starting to continuously heat the first atomization area to atomize the first medium to be atomized and continuously atomizing for a first atomization time;

In response to the time of receiving the heating start signal reaching a second preset time, starting to continuously heat the second atomization area to atomize the second medium to be atomized and continuing to atomize for a second atomization time;

Wherein, the first preset time is the same as the second preset time, or the first preset time is greater than the first preset time; and/or, the first atomization time is the same as or different from the second atomization time.

In one embodiment, the first atomization time is a fixed value or the first atomization time is the time from the start of atomization in the first atomization area to the end of puffing; and/or,

The second atomization time is a fixed value or the second atomization time is the time from the start of atomization in the second atomization area to the end of inhalation.

In one embodiment, the preset strategy includes:

In response to the time of receiving the heating start signal reaching a first preset time, starting to intermittently heat the first atomization area to atomize the first medium to be atomized, and controlling the atomization time of the first atomization area to atomize for a first interval time;

In response to the time of receiving the heating start signal reaching a second preset time, starting to intermittently heat the second atomization area to atomize the second medium to be atomized, and controlling the second atomization area to atomize for a second atomization time at every second interval time;

Among them, the first preset time is the same as the second preset time, or the first preset time is greater than the first preset time; and/or, the first atomization time is the same as or different from the second atomization time; and/or, the first interval time is the same as or different from the second interval time.

In one embodiment, the first preset time and the second preset time are both 0; or,

The second preset time is the same as the first preset time, the second preset time is greater than 0 and less than the first time threshold; the first time threshold is 2s-5s; or,

The second preset time is greater than 0 and less than the first time threshold; the first preset time is greater than the second preset time and less than the first time threshold; the first time threshold is 2s-5s.

In one embodiment, the atomizer includes a first liquid storage chamber, a second liquid storage chamber and a third liquid storage chamber; the first liquid storage chamber stores a first medium to be atomized, the second liquid storage chamber stores a second medium to be atomized, the third liquid storage chamber stores a third medium to be atomized, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized, and the boiling point of the second medium to be atomized is lower than the boiling point of the third medium to be atomized; the substrate has a first atomization area, a second atomization area and a third atomization area, the first atomization area is arranged corresponding to the first liquid storage chamber, and the second atomization area is arranged corresponding to the first liquid storage chamber. The second liquid storage cavity is correspondingly arranged, and the third atomization area is correspondingly arranged with the third liquid storage cavity; the base body has a plurality of first liquid guide holes located in the first atomization area, a plurality of second liquid guide holes located in the second atomization area, and a plurality of third liquid guide holes located in the third atomization area, and the aperture of the first liquid guide hole is larger than the aperture of the second liquid guide hole, and the aperture of the second liquid guide hole is larger than the aperture of the third liquid guide hole; and/or, the length of the first liquid guide hole is smaller than the length of the second liquid guide hole, and the length of the second liquid guide hole is smaller than the length of the third liquid guide hole; the preset strategy includes:

The first atomization zone is heated to a first atomization temperature to atomize the first medium to be atomized, the second atomization zone is heated to a second atomization temperature to atomize the second medium to be atomized, and the third atomization zone is heated to a third atomization temperature to atomize the third medium to be atomized, wherein the first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature.

In one embodiment, the preset strategy includes:

In response to the time of receiving the heating start signal reaching a first preset time, starting to continuously heat the first atomization area to atomize the first medium to be atomized and continuously atomizing for a first atomization time;

In response to the time of receiving the heating start signal reaching a second preset time, starting to continuously heat the second atomization area to atomize the second medium to be atomized and continuing to atomize for a second atomization time;

In response to the time of receiving the heating start signal reaching a third preset time, starting to continuously heat the third atomization zone to atomize the third medium to be atomized and continuously atomizing for a third atomization time;

Wherein, the first preset time, the second preset time and the third preset time are the same; or, the first preset time is equal to the second preset time, and the second preset time is greater than the third preset time; or, the first preset time is greater than the second preset time, and the second preset time is greater than the third preset time; and/or,

At least two of the first atomization time, the second atomization time and the third atomization time are different, or the first atomization time, the second atomization time and the third atomization time are the same.

In one embodiment, the first atomization time is a fixed value or the first atomization time is the time from the start of atomization in the first atomization area to the end of puffing; and/or,

The second atomization time is a fixed value or the second atomization time is the time from the start of atomization in the second atomization area to the end of puffing; and/or,

The third atomization time is a fixed value or the third atomization time is the time from the start of atomization in the third atomization area to the end of suction.

In one embodiment, the preset strategy includes:

In response to the time of receiving the heating start signal reaching a first preset time, starting to intermittently heat the first atomization area to atomize the first medium to be atomized, and controlling the atomization time of the first atomization area to atomize for a first interval time;

In response to the time of receiving the heating start signal reaching a second preset time, starting to intermittently heat the second atomization area to atomize the second medium to be atomized, and controlling the second atomization area to atomize for a second atomization time at every second interval time;

In response to the time of receiving the heating start signal reaching a third preset time, starting to intermittently heat the third atomization zone to atomize the third medium to be atomized, and controlling the third atomization zone to atomize for a third atomization time at every third interval time;

Wherein, the first preset time, the second preset time and the third preset time are the same; or, the first preset time is equal to the second preset time, and the second preset time is greater than the third preset time; or, the first preset time is greater than the second preset time, and the second preset time is greater than the third preset time; and/or,

At least two of the first atomization time, the second atomization time and the third atomization time are different, or the first atomization time, the second atomization time and the third atomization time are the same; and/or,

At least two of the first interval time, the second interval time and the third interval time are different, or the first interval time, the second interval time and the third interval time are the same.

In one embodiment, the first preset time, the second preset time, and the third preset time are all 0; or

The third preset time is 0; the second preset time is greater than 0 and less than the first time threshold; the first preset time is greater than the second preset time and less than the first time threshold; the first time threshold is 2s-5s; or

The third preset time is 0; the second preset time is the same as the first preset time, the second preset time is greater than 0 and less than the first time threshold; the first time threshold is 2-5s.

In one embodiment, the atomizer includes a first liquid storage chamber, a second liquid storage chamber and a third liquid storage chamber; a first medium to be atomized is stored in the first liquid storage chamber, a second medium to be atomized is stored in the second liquid storage chamber, and a third medium to be atomized is stored in the third liquid storage chamber, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized, and the boiling point of the second medium to be atomized is lower than the boiling point of the third medium to be atomized; the first medium to be atomized and the second medium to be atomized both include propylene glycol and glycerol; the content of propylene glycol and glycerol in the first medium to be atomized is different from the content of propylene glycol and glycerol in the second medium to be atomized; the third medium to be atomized includes a sweetener;

The substrate has a first atomization area, a second atomization area and a third atomization area, the first atomization area is arranged corresponding to the first liquid storage cavity, the second atomization area is arranged corresponding to the second liquid storage cavity, and the third atomization area is arranged corresponding to the third liquid storage cavity; the substrate has a plurality of first liquid guide holes located in the first atomization area, a plurality of second liquid guide holes located in the second atomization area, and a plurality of third liquid guide holes located in the third atomization area, and the aperture of the first liquid guide hole is larger than the aperture of the second liquid guide hole, and/or the length of the first liquid guide hole is smaller than the length of the second liquid guide hole; the preset strategy includes:

The first atomization zone is heated to a first atomization temperature to atomize the first medium to be atomized, the second atomization zone is heated to a second atomization temperature to atomize the second medium to be atomized, and the third atomization zone is heated to a third atomization temperature to atomize the third medium to be atomized; wherein the first atomization temperature is lower than the second atomization temperature, and the third atomization temperature is lower than the first atomization temperature; or, the first atomization temperature is lower than the third atomization temperature, and the third atomization temperature is higher than the first atomization temperature and lower than the second atomization temperature.

In one embodiment, the heating element includes a plurality of micro-heating elements disposed on the atomization surface of the substrate; each atomization area is provided with a plurality of the micro-heating elements; and the preset strategy includes:

The number of the micro heating elements that start to generate heat among the plurality of micro heating elements corresponding to different atomization areas is controlled.

In order to solve the above technical problems, the second technical solution provided by the present application is: to provide an electronic atomization device, comprising multiple liquid storage chambers, a heating component memory and a processor; the liquid storage chamber stores a medium to be atomized; the medium to be atomized stored in different liquid storage chambers is different; the heating component comprises a substrate and a heating element, and the heating element is arranged on the atomization surface of the substrate; or the heating component comprises a substrate and the substrate is at least partially conductive to serve as a heating element; the substrate has multiple atomization areas, and the multiple atomization areas are arranged one-to-one with the multiple liquid storage chambers; the memory stores program instructions; the processor calls the program instructions from the memory to execute the heating atomization control method as described in any one of the above items.

In order to solve the above technical problems, the third technical solution provided in the present application is: providing a computer-readable storage medium, wherein the computer-readable storage medium is used to store program instructions, and when the program instructions are executed by a processor, they are used to implement the heating atomization control method as described in any one of the above items.

Beneficial effects of the present application: Different from the prior art, the present application discloses a heating atomization control method, an electronic atomization device, and a storage medium, wherein the heating atomization control method is used to control the heating atomization of the atomizer; wherein the atomizer comprises a plurality of liquid storage chambers and a heating component; the liquid storage chamber stores a medium to be atomized, and at least part of the plurality of liquid storage chambers stores different media to be atomized; the heating component comprises a substrate and a heating element, and the heating element is arranged on the atomization surface of the substrate; or the heating component comprises a substrate and the substrate is at least partially conductive to serve as a heating element; the substrate has a plurality of atomization areas, and the plurality of atomization areas are arranged one-to-one with the plurality of liquid storage chambers; the heating atomization control method comprises receiving a heating start signal; in response to receiving the heating start signal, controlling the heating element based on a preset strategy to heat and atomize the media to be atomized in the plurality of liquid storage chambers; wherein the preset strategy is related to the media to be atomized stored in the liquid storage chamber corresponding to the atomization area, so as to perform differential atomization according to the characteristics of different media to be atomized, thereby achieving targeted atomization and improving the taste.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

FIG1 is a schematic diagram of the structure of an electronic atomization device provided in an embodiment of the present application;

FIG2 is a schematic structural diagram of a first embodiment of an atomizer provided by the present application;

FIG3 is a schematic structural diagram of a heating component of the atomizer shown in FIG2 ;

FIG4 is a schematic structural diagram of an embodiment of a base of the heating component shown in FIG3 ;

FIG5 is a schematic structural diagram of another embodiment of the base of the heating component shown in FIG3 ;

FIG6 is a schematic structural diagram of another embodiment of the base of the heating component shown in FIG3 ;

FIG7 is a schematic structural diagram of an embodiment of a heating element of the heating assembly shown in FIG3 ;

FIG8 is a schematic structural diagram of another embodiment of the heating element of the heating assembly shown in FIG3 ;

FIG9 is a schematic structural diagram of another embodiment of the heating element of the heating assembly shown in FIG3 ;

FIG10 is a schematic structural diagram of another embodiment of the heating element of the heating assembly shown in FIG3 ;

FIG11 is a schematic structural diagram of a second embodiment of an atomizer provided by the present application;

FIG12 is a schematic structural diagram of a heating component of the atomizer shown in FIG11 ;

FIG13 is a schematic structural diagram of an embodiment of a base of the heating component shown in FIG12 ;

FIG14 is a schematic structural diagram of another embodiment of the base of the heating component shown in FIG12;

FIG15 is a schematic structural diagram of an embodiment of a heating element of the heating assembly shown in FIG12;

FIG16 is a schematic structural diagram of another embodiment of the heating element of the heating assembly shown in FIG12;

FIG17 is a schematic structural diagram of another embodiment of the heating element of the heating assembly shown in FIG12;

FIG18 is a schematic structural diagram of another embodiment of the heating element of the heating assembly shown in FIG12;

FIG19 is a schematic diagram of a partial structure of a heating component of a third embodiment of an atomizer provided by the present application;

FIG20 is a schematic diagram of a top view of the liquid storage chamber of a fourth embodiment of the atomizer provided by the present application;

FIG21 is a schematic structural diagram of an embodiment of a heating element of a heating assembly provided by the present application;

FIG22 is a schematic diagram of a flow chart of a heating atomization control method provided in an embodiment of the present application;

FIG23 is a schematic flow chart of an embodiment of step S02 of the heating atomization control method provided in FIG22 ;

FIG24 is a flow chart of another embodiment of step S02 of the heating atomization control method provided in FIG22 ;

FIG25 is a schematic flow chart of another embodiment of step S02 of the heating atomization control method provided in FIG22 ;

FIG26 is a flow chart of another embodiment of step S02 of the heating atomization control method provided in FIG22 ;

FIG27 is a schematic diagram of a computer-readable storage medium according to an embodiment of the present application;

FIG28 is a schematic diagram of the structure of the liquid storage chamber provided in the specific embodiment 1 of the present application;

FIG29 is a schematic structural diagram of a base of a heating component provided in specific embodiment 1 of the present application;

FIG30 is a schematic structural diagram of the liquid storage chamber and the base of the heating component after assembly provided in the specific embodiment 1 of the present application;

FIG31 is a schematic diagram of the structure of the liquid storage chamber provided in specific embodiment 2 of the present application;

FIG32 is a schematic structural diagram of a base of a heating component provided in specific embodiment 2 of the present application;

Figure 33 is a schematic diagram of the structure of the liquid storage chamber and the base of the heating component after assembly provided in specific embodiment 2 of the present application.

Detailed ways

The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

In the following description, for the purpose of explanation rather than limitation, specific details such as specific system structures, interfaces, and technologies are provided to facilitate a thorough understanding of the present application.

The terms "first", "second", and "third" in this application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined as "first", "second", and "third" can explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined. All directional indications in the embodiments of this application (such as up, down, left, right, front, back...) are only used to explain the relative position relationship, movement, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication also changes accordingly. The terms "including" and "having" in the embodiments of this application and any of their variations are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units that are not listed, or optionally also includes other steps or components inherent to these processes, methods, products, or devices.

Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

The present application is described in detail below with reference to the accompanying drawings and embodiments.

Please refer to FIG. 1 , which is a schematic diagram of the structure of an electronic atomization device provided in an embodiment of the present application.

In this embodiment, an electronic atomization device 100 is provided. The electronic atomization device 100 can be used for atomizing a medium to be atomized. The electronic atomization device 100 includes an atomizer 1 and a host 2 which are electrically connected to each other.

The atomizer 1 is used to store the medium to be atomized and atomize the medium to be atomized to form an aerosol that can be inhaled by the user. The atomizer 1 can be used in different fields, such as medical treatment, beauty, leisure smoking, etc. In a specific embodiment, the atomizer 1 can be used in an electronic aerosolization device to atomize the medium to be atomized and generate an aerosol for the smoker to inhale. The following embodiments all take this leisure smoking as an example.

The specific structure and function of the atomizer 1 may refer to the specific structure and function of the atomizer 1 involved in the following embodiments, and the same or similar technical effects can be achieved, which will not be repeated here.

The host 2 includes a battery 21 and a processor 22. The battery 21 is used to provide power for the operation of the atomizer 1, so that the atomizer 1 can atomize the medium to be atomized to form an aerosol; the processor 22 is used to control the operation of the atomizer 1, that is, to control the atomizer 1 to atomize the medium to be atomized. The host 2 also includes other components such as a battery holder and an airflow sensor.

The atomizer 1 and the host 2 can be integrally arranged or detachably connected, and can be designed according to specific needs.

Please refer to Figures 2-10, Figure 2 is a structural schematic diagram of the first embodiment of the atomizer provided by the present application, Figure 3 is a structural schematic diagram of the heating component of the atomizer shown in Figure 2, Figure 4 is a structural schematic diagram of an embodiment of the base of the heating component shown in Figure 3, Figure 5 is a structural schematic diagram of another embodiment of the base of the heating component shown in Figure 3, Figure 6 is a structural schematic diagram of another embodiment of the base of the heating component shown in Figure 3, Figure 7 is a structural schematic diagram of an embodiment of the heating element of the heating component shown in Figure 3, Figure 8 is a structural schematic diagram of another embodiment of the heating element of the heating component shown in Figure 3, Figure 9 is a structural schematic diagram of another embodiment of the heating element of the heating component shown in Figure 3, and Figure 10 is a structural schematic diagram of another embodiment of the heating element of the heating component shown in Figure 3.

The atomizer 1 includes a plurality of liquid storage chambers 11 and a heating component 12. The liquid storage chamber 11 stores a medium to be atomized, and at least some different liquid storage chambers 11 store different media to be atomized. That is, the media to be atomized stored in all the liquid storage chambers 11 may be different; or the media to be atomized stored in some of the liquid storage chambers 11 may be different, and the media to be atomized stored in another part of the liquid storage chambers 11 may be the same. The heating component 12 includes a substrate 121, and the substrate 121 has a liquid absorption surface 1211 and an atomization surface 1212 that are arranged oppositely. The substrate 121 also has a plurality of liquid guide holes 1213, and the liquid guide holes 1213 are used to guide the medium to be atomized from the liquid absorption surface 1211 to the atomization surface 1212. The atomizing surface 1212 includes a plurality of atomizing areas 1212a, and the plurality of atomizing areas 1212a are arranged in a one-to-one correspondence with the plurality of liquid storage chambers 11, that is, one atomizing area 1212a is arranged corresponding to one liquid storage chamber 11, and one atomizing area 1212a only atomizes the medium to be atomized in one liquid storage chamber 11. The heating component 12 also includes a heating element 122, and the heating element 122 is arranged on the atomizing surface 1212, or at least a portion of the substrate 121 has a conductive heating ability to serve as the heating element 122; the heating element 122 is used to heat the plurality of atomizing areas 1212a to different atomizing temperatures. In the present application, the atomizing temperatures in the same atomizing area 1212a are not the same, therefore, the atomizing temperature in the same atomizing area 1212a refers to the average temperature in the same atomizing area 1212a. The heating element 122 heats the multiple atomization areas 1212a to different atomization temperatures, which means that the average temperatures of the multiple atomization areas 1212a are different after being heated by the heating element 122. The heating component 12 is electrically connected to the host 2, so that the host 2 provides power to the heating component 12 and controls the heating component 12 to atomize the medium to be atomized.

Specifically, by arranging a plurality of liquid storage chambers 11 in the atomizer 1, the atomization surface 1212 includes a plurality of atomization areas 1212a, and the plurality of atomization areas 1212a are arranged one by one in correspondence with the plurality of liquid storage chambers 11. Since different media to be atomized are stored in the plurality of liquid storage chambers 11, one liquid storage chamber 11 provides one medium to be atomized for one atomization area 1212a, and the atomization area 1212a only atomizes the medium to be atomized. The atomization temperatures of different atomization areas 1212a are different, so that the atomization temperature of each atomization area 1212a is designed according to the characteristics of the corresponding medium to be atomized, so as to ensure that the media to be atomized in the plurality of liquid storage chambers 11 can be fully atomized and volatilized. Alternatively, the same medium to be atomized is stored in some liquid storage chambers 11, but the atomization temperatures of the atomization areas 1212a corresponding to the same medium to be atomized are different, so that the same medium to be atomized from different liquid storage chambers 11 is atomized at different temperatures to produce aerosols of different flavors.

It should be noted that the flavor liquid atomized by the electronic atomization device in the prior art is a mixture, and the components in the mixture are distributed as needed into a plurality of the above-mentioned media to be atomized, which are stored in a plurality of liquid storage chambers 11 respectively, and atomized at different atomization temperatures respectively, thereby ensuring sufficient atomization and volatilization of each medium to be atomized, and avoiding the poor taste caused by the indiscriminate atomization of various components of the flavor liquid using the same heating component.

In one embodiment, the plurality of liquid storage chambers 11 and the heating component 12 are an integrated structure, which is specifically manufactured by chip processing technology or semiconductor processing technology.

In one embodiment, the apertures of the liquid guiding holes 1213 in different atomization zones 1212a are different, and/or the lengths of the liquid guiding holes 1213 in different atomization zones 1212a are different, and/or the porosities of the liquid guiding holes 1213 in different atomization zones 1212a are different, so that different atomization zones 1212a have different liquid supply speeds, combined with different atomization temperatures in different atomization zones 1212a, to ensure sufficient atomization of multiple media to be atomized in multiple liquid storage chambers 11.

In one embodiment, the pore size of the liquid guide hole 1213 is 2 μm-100 μm; and/or the porosity of the liquid guide hole 1213 is 10%-70%. It is understood that the pore size and/or porosity of the liquid guide hole 1213 are specifically designed according to the liquid supply requirements of different atomization zones 1212a.

In this embodiment, the atomizer 1 includes two liquid storage chambers 11, namely the first liquid storage chamber 11-1 and the second liquid storage chamber 11-2. The first liquid storage chamber 11-1 stores the first medium to be atomized, and the second liquid storage chamber 11-2 stores the second medium to be atomized, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized. The substrate 121 includes a first sub-substrate 121-1 and a second sub-substrate 121-2 connected to each other, the first sub-substrate 121-1 has a first atomization area 1212a-1, and the second sub-substrate 121-2 has a second atomization area 1212a-2; the first atomization area 1212a-1 is correspondingly arranged with the first liquid storage chamber 11-1, and is used to atomize the first medium to be atomized; the second atomization area 1212a-2 is correspondingly arranged with the second liquid storage chamber 11-2, and is used to atomize the second medium to be atomized. The heating component 12 includes a heating element 122 disposed on the atomizing surface 1212, and the heating element 122 is used to heat the first atomizing area 1212a-1 to a first atomizing temperature and to heat the second atomizing area 1212a-2 to a second atomizing temperature; since the boiling point of the first atomizing medium to be atomized in the first atomizing area 1212a-1 is lower than the boiling point of the second atomizing medium to be atomized in the second atomizing area 1212a-2, the first atomizing temperature of the first atomizing area 1212a-1 is lower than the second atomizing temperature of the second atomizing area 1212a-2. It should be noted that the heating element 122 and the liquid storage chamber 11 are located on both sides of the base 121. The first liquid storage chamber 11-1 and the second liquid storage chamber 11-2 have the same structural meaning as the liquid storage chamber 11, and the introduction of the first liquid storage chamber 11-1 and the second liquid storage chamber 11-2 is only for the convenience of description; the first atomization area 1212a-1 and the second atomization area 1212a-2 have the same structural meaning as the atomization area 1212a, and the introduction of the first atomization area 1212a-1 and the second atomization area 1212a-2 is only for the convenience of description.

The first medium to be atomized is a system of multiple low-boiling-point flavor solutes, and the first atomization zone 1212a-1 corresponding to the first medium to be atomized is mainly used for volatilization of low-boiling-point aromas. The second medium to be atomized is a system of multiple high-boiling-point flavor solutes, and the second atomization zone 1212a-2 corresponding to the second medium to be atomized is used for generating aerosols and volatilization of high-boiling-point aromas.

In one embodiment, the boiling point of the first medium to be atomized is 20°C-250°C, and the boiling point of the second medium to be atomized is 250°C-360°C.

In one embodiment, the first medium to be atomized and the second medium to be atomized both include propylene glycol and glycerol, and the content of propylene glycol and glycerol in the first medium to be atomized is different from the content of propylene glycol and glycerol in the second medium to be atomized. The boiling point of propylene glycol is 188°C, and the boiling point of glycerol is 290°C.

Optionally, the content of propylene glycol in the first medium to be atomized is greater than the content of glycerol, and the content of glycerol in the second medium to be atomized is greater than the content of propylene glycol.

Optionally, the first medium to be atomized further includes nicotine and nicotine salt, and/or the second medium to be atomized further includes nicotine and nicotine salt.

Optionally, the first medium to be atomized further includes a sweetener, and/or the second medium to be atomized further includes a sweetener.

Optionally, the first medium to be atomized also includes a low-boiling point flavor.

Optionally, the second medium to be atomized also includes high-boiling point flavors and spices.

In one embodiment, the first sub-base 121-1 has a plurality of first liquid-conducting holes 1213-1, and the second sub-base 121-2 has a plurality of second liquid-conducting holes 1213-2. The first sub-base 121-1 and the second sub-base 121-2121-2 meet one or more of the following conditions (1)-(4):

(1) The aperture of the first liquid guiding hole 1213-1 is larger than the aperture of the second liquid guiding hole 1213-2;

(2) The ratio of the thickness of the first sub-base 121-1 to the aperture of the first liquid guiding hole 1213-1 is smaller than the ratio of the thickness of the second sub-base 121-2 to the aperture of the second liquid guiding hole 1213-2;

(3) The length of the first liquid guide hole 1213-1 is smaller than the length of the second sub-base 121-2;

(4) The porosity of the first sub-base 121 - 1 is greater than the porosity of the second sub-base 121 - 2 .

For example, the aperture of the first liquid guide hole 1213-1 is larger than that of the second liquid guide hole 1213-2. By making the aperture of the first liquid guide hole 1213-1 larger, it has a lower energy density and thus a lower temperature field to atomize the first medium to be atomized with a lower boiling point; the aperture of the second liquid guide hole 1213-2 is smaller, it has a higher energy density (usually greater than 1mW/ ^cm2 ), and thus a higher temperature field to atomize the second medium to be atomized with a higher boiling point. Specifically, under the condition that the thickness of the first sub-base 121-1 and the second sub-base 121-2 are the same, the aperture of the first liquid guide hole 1213-1 is larger and the liquid supply speed is larger, so the liquid supply of the first atomization zone 1212a-1 is more sufficient, and the first atomization temperature of the first atomization zone 1212a-1 is relatively low; the aperture of the second liquid guide hole 1213-2 is smaller and the liquid supply speed is smaller, so the liquid supply of the second atomization zone 1212a-2 is relatively insufficient, and the second atomization temperature of the second atomization zone 1212a-2 is relatively low; therefore, the first atomization temperature for atomizing the first medium to be atomized is lower than the second atomization temperature for atomizing the second medium to be atomized. It should be noted that the first liquid guide hole 1213-1, the second liquid guide hole 1213-2 and the liquid guide hole 1213 have the same structural meaning, and the introduction of the first liquid guide hole 1213-1 and the second liquid guide hole 1213-2 is only for the convenience of description.

In one embodiment, the material of the first sub-substrate 121-1 and the material of the second sub-substrate 121-2 are both dense materials, for example, dense ceramics, glass, metal, silicon, etc. The first liquid guide hole 1213-1 and the second liquid guide hole 1213-2 are both straight through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212. The straight through holes can be through holes formed by laser induction and corrosion. Multiple straight through holes can be arranged in an orderly manner (for example, distributed in an array) or distributed in a disordered manner (for example, randomly distributed). The aperture of the first liquid guide hole 1213-1 is larger than the aperture of the second liquid guide hole 1213-2. The aperture of the first liquid guide hole 1213-1 is greater than or equal to 20μm; in a specific embodiment, the aperture of the first liquid guide hole 1213-1 is greater than or equal to 20μm and less than or equal to 60μm; in a specific embodiment, the aperture of the first liquid guide hole 1213-1 is greater than or equal to 30μm. The pore size of the second liquid conducting hole 1213-2 is less than or equal to 30 μm; in a specific embodiment, the pore size of the second liquid conducting hole 1213-2 is greater than or equal to 2 μm and less than or equal to 30 μm; in a specific embodiment, the pore size of the second liquid conducting hole 1213-2 is less than or equal to 20 μm.

And/or, the ratio of the thickness of the first sub-substrate 121-1 to the aperture of the first liquid guide hole 1213-1 is smaller than the ratio of the thickness of the second sub-substrate 121-1 to the aperture of the second liquid guide hole 1213-2. It can be understood that when the power of the heating element 122 is the same, the larger the ratio of the thickness of the substrate to the aperture of the liquid guide hole, the smaller the liquid supply speed, the slower the heat consumption, and the higher the atomization temperature of the corresponding atomization area; conversely, the smaller the ratio of the thickness of the substrate to the aperture of the liquid guide hole, the larger the liquid supply speed, the faster the heat consumption, and the lower the atomization temperature of the corresponding atomization area. In a specific embodiment, the ratio of the thickness of the first sub-substrate 121-1 to the aperture of the first liquid guide hole 1213-1 is less than 10:1. In a specific embodiment, the ratio of the thickness of the first sub-substrate 121-1 to the aperture of the first liquid guide hole 1213-1 is less than 5:1. In one embodiment, the ratio of the thickness of the second sub-base 121-2 to the diameter of the second liquid-conducting hole 1213-2 is greater than 10: 1. In one embodiment, the ratio of the thickness of the second sub-base 121-2 to the diameter of the second liquid-conducting hole 1213-2 is greater than 15:1.

Optionally, the length of the first liquid guide hole 1213-1 is the same as the length of the first liquid guide hole 1213-2 (as shown in FIG4 ). Specifically, the liquid absorption surface 1211 and the atomization surface 1212 of the substrate 121 are both planes and parallel to each other, and the thickness of the first sub-substrate 121-1 is the same as the thickness of the second sub-substrate 121-2; the axis of the first liquid guide hole 1213-1 is parallel to the thickness direction of the first sub-substrate 121-1, and at this time, the length of the first liquid guide hole 1213-1 is the same as the thickness of the first sub-substrate 121-1; the axis of the second liquid guide hole 1213-2 is parallel to the thickness direction of the second sub-substrate 121-2, and at this time, the length of the second liquid guide hole 1213-2 is the same as the thickness of the second sub-substrate 121-2; the axis of the first liquid guide hole 1213-1 is parallel to the axis of the second liquid guide hole 1213-2. Since the thickness of the first sub-base 121 - 1 is the same as the thickness of the second sub-base 121 - 2 , the length of the first liquid guiding hole 1213 - 1 is the same as the length of the second liquid guiding hole 1213 - 2 .

Optionally, the length of the first liquid guide hole 1213-1 is less than the length of the second liquid guide hole 1213-2 (as shown in FIG5 ). Specifically, the atomization surface 1212 of the substrate 121 is a plane, the liquid absorption surface 1211 is a step surface, and the thickness of the first sub-substrate 121-1 is less than the thickness of the second sub-substrate 121-2; the surface of the first sub-substrate 121-1 located on the liquid absorption surface 1211 and the surface of the first sub-substrate 121-1 located on the atomization surface 1212 are both planes and parallel to each other, and the axis of the first liquid guide hole 1213-1 is parallel to the thickness direction of the first sub-substrate 121-1. At this time, the length of the first liquid guide hole 1213-1 is equal to that of the second sub-substrate 121-2. The thickness of the first sub-base 121-1 is the same; the surface of the second sub-base 121-2 located on the liquid absorption surface 1211 and the surface of the second sub-base 121-2 located on the atomization surface 1212 are both planes and parallel to each other, and the axis of the second liquid guide hole 1213-2 is parallel to the thickness direction of the second sub-base 121-2. At this time, the length of the second liquid guide hole 1213-2 is the same as the thickness of the second sub-base 121-2; the axis of the first liquid guide hole 1213-1 is parallel to the axis of the second liquid guide hole 1213-2. Since the thickness of the first sub-base 121-1 is less than the thickness of the second sub-base 121-2, the length of the first liquid guide hole 1213-1 is less than the length of the second liquid guide hole 1213-2. The atomizing surface 1212 of the substrate 121 is set as a plane, and the liquid absorption surface 1211 is a stepped surface, so that the thickness of the first sub-substrate 121-1 is smaller than the thickness of the second sub-substrate 121-2, and it is convenient to set the heating element 122 on the atomizing surface 1212. The atomizing surface 1212 of the substrate 121 is set as a plane, which is conducive to depositing a continuous heating element 122 (for example, a heating film) on the entire atomizing surface 1212.

It should be noted that the second liquid guide hole 1213-2 has a smaller aperture and a longer aperture, a slower liquid supply speed, a higher second atomization temperature, and smaller aerosol particles generated by atomization. These smaller aerosol particles can enter the alveoli and reach the blood through the alveoli, increasing satisfaction; the first liquid guide hole 1213-1 has a larger aperture and a shorter aperture, a faster liquid supply speed, a lower first atomization temperature, and larger aerosol particles generated by atomization. These larger aerosol particles can be deposited in the oral cavity to increase the taste. Exemplarily, the first medium to be atomized includes a sweetener, and the second medium to be atomized includes nicotine or a plant extract. By setting the first liquid guide hole 1213-1 and the second liquid guide hole 1213-2, the aerosol containing the sweetener can be deposited in the oral cavity to increase the sweet taste, and at the same time, the aerosol containing nicotine or a plant extract can be deposited in the alveoli, increasing satisfaction and improving the user experience.

Optionally, the first sub-base 121-1 and the second sub-base 121-2 are integrally formed. When the thicknesses of the first sub-base 121-1 and the second sub-base 121-2 are different, the thickness of the first sub-base 121-1 can be made smaller than that of the second sub-base 121-2 by grooving or thinning.

In one embodiment, the material of the first sub-substrate 121-1 is a dense material, such as dense ceramic, glass, metal, silicon, etc.; the material of the second sub-substrate 121-2 is a porous material, such as porous ceramic, etc.; the first sub-substrate 121-1 and the second sub-substrate 121-2 are spliced into the substrate 121 (as shown in FIG. 6 ). The multiple first liquid guide holes 1213-1 on the first sub-substrate 121-1 are through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212. The pore size of the first liquid guide hole 1213-1 is greater than or equal to 20 μm; in a specific embodiment, the pore size of the first liquid guide hole 1213-1 is greater than or equal to 20 μm and less than or equal to 60 μm; in a specific embodiment, the pore size of the first liquid guide hole 1213-1 is greater than or equal to 30 μm. The multiple second liquid guide holes 1213-2 on the second sub-substrate 121-2 are disordered pores of the porous material itself. The disordered pores of the porous material itself are irregularly distributed and extended micropores formed in the process of preparing the porous material. The disordered pores of the porous material itself are interconnected, which is different from the straight through holes opened on the substrate. Adjacent straight through holes opened on the substrate are independent of each other unless they are connected by transverse openings. The aperture of the first liquid guide hole 1213-1 is larger than the aperture of the second liquid guide hole 1213-2. The splicing method is not limited, and it can be snapped together by the side; or a mounting hole can be set in one of the first sub-substrate 121-1 and the second sub-substrate 121-2, and the other can be embedded in the mounting hole.

In one embodiment, the heating element 122 is only provided in the second atomization zone 1212a-2 (as shown in FIG7 ). The heat generated by the heating element 122 is transferred to the first atomization zone 1212a-1 by heat conduction, so that the first atomization temperature of the first atomization zone 1212a-1 is lower than the second atomization temperature of the second atomization zone 1212a-2. Optionally, the material of the first sub-base 121-1 corresponding to the first atomization zone 1212a-1 has a higher thermal conductivity. Optionally, the heating element 122 is a heating film; when the material of the second sub-substrate 121-2 is a dense material and the second liquid guide hole 1213-2 is a through hole that penetrates the liquid absorption surface 1211 and the atomization surface 1212, the heating element 122 has a plurality of second through holes 1221-2, and the plurality of second through holes 1221-2 are arranged one-to-one with the plurality of second liquid guide holes 1213-2, and the axis of the second through hole 1221-2 coincides with the axis of the second liquid guide hole 1213-2.

In one embodiment, the heating element 122 includes a heating portion 1222 and a heat conducting portion 1223 connected to each other, the heating portion 1222 is only provided in the second atomization area 1212a-2, and the heat conducting portion 1223 is at least partially provided in the first atomization area 1212a-1 (as shown in FIG8 ). The heat generated by the heating portion 1222 is transferred to the first atomization area 1212a-1 through heat conduction of the heat conducting portion 1223, so that the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2. Optionally, the heating portion 1222 is a heating film, the heat conducting portion 1223 is a heat conducting film, and the heat conducting portion 1223 can be made of insulating material; when the materials of the first sub-base 121-1 and the second sub-base 121-2 are dense materials, and the first liquid guide hole 1213-1 and the second liquid guide hole 1213-2 are through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212, the heating portion 1222 has a plurality of second through holes 1221-2, and the plurality of second The through holes 1221-2 are arranged in one-to-one correspondence with the plurality of second liquid conducting holes 1213-2, and the axis of the second through holes 1221-2 coincides with the axis of the second liquid conducting holes 1213-2; the heat conducting part 1223 has a plurality of first through holes 1221-1, and the plurality of first through holes 1221-1 are arranged in one-to-one correspondence with the plurality of first liquid conducting holes 1213-1, and the axis of the first through holes 1221-1 coincides with the axis of the first liquid conducting holes 1213-1. The heat generating part 1222 and the heat conducting part 1223 can be spliced at the edges or partially stacked.

In one embodiment, the heating element 122 includes a first heating portion 1224 and a second heating portion 1225 connected to each other, that is, the first heating portion 1224 and the second heating portion 1225 are controlled by the same control circuit; the first heating portion 1224 is arranged in the first atomization area 1212a-1, and the second heating portion 1225 is arranged in the second atomization area 1212a-2 (as shown in FIG9 ). The resistance of the first heating portion 1224 is different from the resistance of the second heating portion 1225, and/or the thermal conductivity of the material of the first heating portion 1224 is different from the thermal conductivity of the material of the second heating portion 1225, so that the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2. Among them, the shape or thickness or resistivity of the material of the first heating portion 1224 and the second heating portion 1225 can be designed so that the resistance of the first heating portion 1224 is different from the resistance of the second heating portion 1225. Optionally, the resistance of the second heating portion 1225 is not lower than the resistance of the first heating portion 1224 . Optionally, the first heating part 1224 and the second heating part 1225 are both heating films; when the material of the first sub-base 121-1 and the second sub-base 121-2 is a dense material, and the first liquid guide hole 1213-1 and the second liquid guide hole 1213-2 are through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212, the first heating part 1224 has a plurality of first through holes 1221-1, and the plurality of first through holes 1221-1 are arranged in a one-to-one correspondence with the plurality of first liquid guide holes 1213-1, and the axis of the first through hole 1221-1 coincides with the axis of the plurality of first liquid guide holes 1213-1; the second heating part 1225 has a plurality of second through holes 1221-2, and the plurality of second through holes 1221-2 are arranged in a one-to-one correspondence with the plurality of second liquid guide holes 1213-2, and the axis of the second through hole 1221-2 coincides with the axis of the second liquid guide hole 1213-2.

In one embodiment, the heating element 122 includes a first sub-heating element 1226 and a second sub-heating element 1227 that are independent of each other, that is, the first sub-heating element 1226 and the second sub-heating element 1227 have independent control circuits; the first sub-heating element 1226 is arranged in the first atomization area 1212a-1, and the second sub-heating element 1227 is arranged in the second atomization area 1212a-2 (as shown in Figure 10). Optionally, the first sub-heating element 1226 and the second sub-heating element 1227 are both heating films; when the material of the first sub-substrate 121-1 and the second sub-substrate 121-2 is a dense material, and the first liquid guide hole 1213-1 and the second liquid guide hole 1213-2 are through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212, the first sub-heating element 1226 has a plurality of first through holes 1221-1, and the plurality of first through holes 1221-1 are arranged in a one-to-one correspondence with the plurality of first liquid guide holes 1213-1, and the axis of the first through hole 1221-1 coincides with the axis of the plurality of first liquid guide holes 1213-1; the second sub-heating element 1227 has a plurality of second through holes 1221-2, and the plurality of second through holes 1221-2 are arranged in a one-to-one correspondence with the plurality of second liquid guide holes 1213-2, and the axis of the second through hole 1221-2 coincides with the axis of the second liquid guide hole 1213-2.

In one embodiment, the materials of the heating element 122 corresponding to different atomization areas 1212 a have different thermal conductivities or different liquid conducting properties.

It should be noted that in the above introduction to the heating element 122, the heating element 122 is taken as an example as a component independent of the substrate 121. When the substrate 121 at least partially has a conductive heating capability to serve as the heating element 122, the configuration of the substrate 121 having the conductive heating portion can refer to the configuration when the heating element 122 is an independent component, and will not be repeated here.

The present application realizes targeted atomization by controlling each effective component in the atomization process, controlling the particle size of the aerosol generated by atomization, and accurately depositing the sensory organs where the aerosol reaches. Among them, the controllable components refer to that various flavors and fragrances and drug components are placed in a specific liquid storage cavity 11 as effective substances, and the compound is used as the target organ to be reached in the future as the target of atomization. The purpose of adjustable aerosol particle size is to realize that specific effective components are made into aerosols with controllable specific particle sizes, and then deposited to specific sensory positions according to the deposition principle of respiratory aerosols, for example, aerosol particles with a particle size of about 10μm are deposited in the oral cavity and upper respiratory tract; aerosol particles of about 5μm are deposited in the lower respiratory tract; 2μm aerosol particles can enter the alveoli. Accurate deposition means that the aerosol will depend on the size of the aerosol particle size in the respiratory tract, from large to small, from near to far, from entering the human oral cavity, through the throat, nasal cavity, trachea, bronchi, lung lobes, alveoli and entering the blood circulation system.

Specifically, the present application designs the parameters corresponding to different atomization areas 1212a of the substrate 121 (including the pore size, porosity, length, etc. of the liquid guide hole 1213) and the energy density to adjust the heat flux density and the liquid supply speed to match the medium to be atomized in different liquid storage chambers 11, thereby achieving selective control of the atomized aerosol particle size and composition to obtain the best atomization experience and atomization efficiency.

The atomizer 1 also includes a fog outlet channel (not shown), an atomizing chamber (not shown) and an air inlet channel (not shown) which are interconnected. The aerosol generated by the atomization of the heating element 122 is released into the atomizing chamber. External gas enters from the air inlet channel, carrying the aerosol in the atomizing chamber to the fog outlet channel, and is inhaled by the user. The atomizer 1 also includes structures such as sealing members and conducting members. The arrangement of the sealing members, conducting members, fog outlet channel, atomizing chamber and air inlet channel can refer to the prior art, and can be changed accordingly according to the specific structures of the liquid storage chamber 11 and the heating component 12.

Please refer to Figures 11-18, Figure 11 is a structural schematic diagram of the second embodiment of the atomizer provided in the present application, Figure 12 is a structural schematic diagram of the heating component of the atomizer shown in Figure 11, Figure 13 is a structural schematic diagram of an embodiment of a base of the heating component shown in Figure 12, Figure 14 is a structural schematic diagram of another embodiment of the base of the heating component shown in Figure 12, Figure 15 is a structural schematic diagram of an embodiment of a heating element of the heating component shown in Figure 12, Figure 16 is a structural schematic diagram of another embodiment of the heating element of the heating component shown in Figure 12, Figure 17 is a structural schematic diagram of yet another embodiment of the heating element of the heating component shown in Figure 12, and Figure 18 is a structural schematic diagram of yet another embodiment of the heating element of the heating component shown in Figure 12.

The difference between the second embodiment of the atomizer 1 and the first embodiment of the atomizer 1 is that in the second embodiment of the atomizer 1, the atomizer 1 includes three liquid storage chambers 11, and the atomizing surface 1212 of the heating component 12 includes three atomizing areas 1212a; in the first embodiment of the atomizer 1, the atomizer 1 includes two liquid storage chambers 11, and the atomizing surface 1212 of the heating component 12 includes two atomizing areas 1212a.

In this embodiment, the atomizer 1 includes three liquid storage chambers 11, namely the first liquid storage chamber 11-1, the second liquid storage chamber 11-2, and the third liquid storage chamber 11-3. The first liquid storage chamber 11-1 stores the first medium to be atomized, the second liquid storage chamber 11-2 stores the second medium to be atomized, and the third liquid storage chamber 11-3 stores the third medium to be atomized. The boiling point of the second medium to be atomized is higher than the boiling point of the second medium to be atomized, and the boiling point of the third medium to be atomized is higher than the boiling point of the second medium to be atomized. The substrate 121 includes a first sub-substrate 121-1, a second sub-substrate 121-2, and a third sub-substrate 121-3 connected to each other. The first sub-substrate 121-1 has a first atomization area 1212a-1, the second sub-substrate 121-2 has a second atomization area 1212a-2, and the third sub-substrate 121-3 has a third atomization area 1212a-3. The first atomization area 1212a-1 is arranged corresponding to the first liquid storage chamber 11-1, and is used to atomize the first medium to be atomized; the second atomization area 1212a-2 is arranged corresponding to the second liquid storage chamber 11-2, and is used to atomize the second medium to be atomized; the third atomization area 1212a-3 is arranged corresponding to the third liquid storage chamber 11-3, and is used to atomize the third medium to be atomized. The heating component 12 includes a heating element 122 arranged on the atomization surface 1212, and the heating element 122 is used to heat the first atomization area 1212a-1 to a first atomization temperature, heat the second atomization area 1212a-2 to a second atomization temperature, and heat the third atomization area 1212a-3 to a third atomization temperature. Since the boiling point of the first medium to be atomized atomized in the first atomization zone 1212a-1 is lower than the boiling point of the second medium to be atomized in the second atomization zone 1212a-2, the first atomization temperature of the first atomization zone 1212a-1 is lower than the second atomization temperature of the second atomization zone 1212a-2. The third atomization temperature of the third atomization zone 1212a-3 is higher than the second atomization temperature, or the third atomization temperature is lower than the first atomization temperature, or the third atomization temperature is higher than the first atomization temperature and lower than the second atomization temperature.

It should be noted that the heating element 122 and the liquid storage chamber 11 are located on both sides of the base 121. The first liquid storage chamber 11-1, the second liquid storage chamber 11-2, and the third liquid storage chamber 11-3 have the same structural meaning as the liquid storage chamber 11, and the first liquid storage chamber 11-1, the second liquid storage chamber 11-2, and the third liquid storage chamber 11-3 are introduced only for the convenience of description; the first atomization area 1212a-1, the second atomization area 1212a-2, and the third atomization area 1212a-3 have the same structural meaning as the atomization area 1212a, and the first atomization area 1212a-1, the second atomization area 1212a-2, and the third atomization area 1212a-3 are introduced only for the convenience of description.

The first medium to be atomized is a system of multiple low-boiling point flavor solutes, and the first atomization zone 1212a-1 corresponding to the first medium to be atomized is mainly used for volatilization of low-boiling point aromas. The second medium to be atomized is a system of multiple high-boiling point flavor solutes, and the second atomization zone 1212a-2 corresponding to the second medium to be atomized is used for generating aerosols and volatilization of high-boiling point aromas. The third medium to be atomized includes a sweetener, and the third atomization zone 1212a-3 corresponding to the third medium to be atomized is used for atomizing the sweetener.

In one embodiment, the boiling point of the first medium to be atomized is 20°C-250°C, the boiling point of the second medium to be atomized is 250°C-360°C, and the boiling point of the third medium to be atomized (sweetener) is 400°C-600°C. It should be noted that, since the boiling point of the third medium to be atomized is extremely high, it only needs to be atomized and sprayed, that is, it can be taken out with the aerosol generated by the atomization of the first medium to be atomized and the second medium to be atomized; preferably, the third atomization temperature of the third atomization zone 1212a-3 is lower than the atomization temperature of the first atomization zone 1212a-1. The following content takes this as an example to introduce in detail the parameters of the substrate 121 and the setting method of the heating element 122.

In one embodiment, the first medium to be atomized and the second medium to be atomized both include propylene glycol and glycerol, and the content of propylene glycol and glycerol in the first medium to be atomized is different from the content of propylene glycol and glycerol in the second medium to be atomized. The boiling point of propylene glycol is 188°C, and the boiling point of glycerol is 290°C.

Optionally, the content of propylene glycol in the first medium to be atomized is greater than the content of glycerol, and the content of glycerol in the second medium to be atomized is greater than the content of propylene glycol.

Optionally, the first medium to be atomized further includes nicotine and nicotine salt, and/or the second medium to be atomized further includes nicotine and nicotine salt.

Optionally, the first medium to be atomized also includes a low-boiling point flavor.

Optionally, the second medium to be atomized also includes high-boiling point flavors and spices.

The first sub-base 121-1 has a plurality of first liquid-conducting holes 1213-1, the second sub-base 121-2 has a plurality of second liquid-conducting holes 1213-2, and the third sub-base 121-3 has a plurality of third liquid-conducting holes 1213-3. The arrangement of the first sub-base 121-1 and the plurality of first liquid-conducting holes 1213-1 thereon, and the second sub-base 121-2 and the plurality of second liquid-conducting holes 1213-2 thereon can refer to the introduction in the first embodiment of the atomizer 1, and will not be repeated here.

In one embodiment, the material of the third sub-matrix 121-3 is a dense material, such as dense ceramic, glass, metal, silicon, etc. The third liquid guide hole 1213-3 is a through hole that penetrates the liquid absorption surface 1211 and the atomization surface 1212. In one specific embodiment, the pore size of the third liquid guide hole 1213-3 is not less than 20 μm. In one specific embodiment, the pore size of the third liquid guide hole 1213-3 is not less than 30 μm.

When the materials of the first sub-base 121-1, the second sub-base 121-2 and the third sub-base 121-3 are all dense materials, the first sub-base 121-1, the second sub-base 121-2 and the third sub-base 121-3 are integrally formed.

Optionally, the diameter of the third liquid guiding hole 1213 - 3 is larger than the diameter of the first liquid guiding hole 1213 - 1 .

Optionally, the length of the first liquid guide hole 1213-1, the length of the first liquid guide hole 1213-2 and the length of the third liquid guide hole 1213-3 are the same (as shown in FIG. 13 ). Specifically, the liquid absorption surface 1211 and the atomization surface 1212 of the substrate 121 are both planes and parallel to each other, the thickness of the first sub-substrate 121-1, the thickness of the second sub-substrate 121-2 and the thickness of the third sub-substrate 121-3 are the same; the axis of the first liquid guide hole 1213-1 is parallel to the thickness direction of the first sub-substrate 121-1. In this case, the length of the first liquid guide hole 1213-1 is the same as the thickness of the first sub-substrate 121-1; the axis of the second liquid guide hole 1213-2 is parallel to the thickness direction of the second sub-substrate 121-2. The thickness direction of the sub-base 121-2 is parallel, at this time, the length of the second liquid guide hole 1213-2 is the same as the thickness of the second sub-base 121-2; the axis of the third liquid guide hole 1213-3 is parallel to the thickness direction of the third sub-base 121-3, at this time, the length of the third liquid guide hole 1213-3 is the same as the thickness of the third sub-base 121-3; the axis of the first liquid guide hole 1213-1, the axis of the second liquid guide hole 1213-2 and the axis of the third liquid guide hole 1213-3 are parallel. Since the thickness of the first sub-base 121-1, the thickness of the second sub-base 121-2 and the thickness of the third sub-base 121-3 are the same, the length of the first liquid guide hole 1213-1, the length of the second liquid guide hole 1213-2 and the length of the third liquid guide hole 1213-3 are the same.

Optionally, the aperture of the first liquid guiding hole 1213-1 is larger than the aperture of the second liquid guiding hole 1213-2, and the aperture of the third liquid guiding hole 1213-3 is larger than the aperture of the first liquid guiding hole 1213-1; the length of the first liquid guiding hole 1213-1 is smaller than the length of the second liquid guiding hole 1213-2, and the length of the third liquid guiding hole 1213-3 is smaller than the length of the first liquid guiding hole 1213-1 (as shown in Figure 14). Specifically, the atomizing surface 1212 of the substrate 121 is a plane, the liquid absorption surface 1211 is a stepped surface, the thickness of the first sub-substrate 121-1 is less than the thickness of the second sub-substrate 121-2, and the thickness of the third sub-substrate 121-3 is less than the thickness of the first sub-substrate 121-1; the surface of the first sub-substrate 121-1 located on the liquid absorption surface 1211 and the surface of the first sub-substrate 121-1 located on the atomizing surface 1212 are both planes and parallel to each other, the axis of the first liquid guide hole 1213-1 is parallel to the thickness direction of the first sub-substrate 121-1, at this time, the length of the first liquid guide hole 1213-1 is the same as the thickness of the first sub-substrate 121-1; the second sub-substrate 121-2 is located on the liquid absorption surface The surface of the second sub-base 121-1 and the surface of the second sub-base 121-2 located on the atomization surface 1212 are both planes and parallel to each other, and the axis of the second liquid guide hole 1213-2 is parallel to the thickness direction of the second sub-base 121-2. At this time, the length of the second liquid guide hole 1213-2 is the same as the thickness of the second sub-base 121-2; the surface of the third sub-base 121-3 located on the liquid absorption surface 1211 and the surface of the third sub-base 121-3 located on the atomization surface 1212 are both planes and parallel to each other, and the axis of the third liquid guide hole 1213-3 is parallel to the thickness direction of the third sub-base 121-3. At this time, the length of the third liquid guide hole 1213-3 is the same as the thickness of the third sub-base 121-3. The axis of the first liquid guide hole 1213-1, the axis of the second liquid guide hole 1213-2 and the axis of the third liquid guide hole 1213-3 are parallel. Since the thickness of the first sub-base 121-1 is less than that of the second sub-base 121-2, and the thickness of the third sub-base 121-3 is less than that of the first sub-base 121-1, the length of the first liquid guide hole 1213-1 is less than that of the second liquid guide hole 1213-2, and the length of the third liquid guide hole 1213-3 is less than that of the first liquid guide hole 1213-1. The atomizing surface 1212 of the base 121 is set as a plane, and the liquid absorbing surface 1211 is a step surface, which makes it easy to set the heating element 122 on the atomizing surface 1212 while realizing that the length of the first liquid guide hole 1213-1 is less than that of the second liquid guide hole 1213-2, and the length of the third liquid guide hole 1213-3 is less than that of the first liquid guide hole 1213-1.

It should be noted that, among the first liquid guide hole 1213-1, the second liquid guide hole 1213-2, and the third liquid guide hole 1213-3, the second liquid guide hole 1213-2 has a smaller aperture and a longer hole length, a slower liquid supply speed, a higher second atomization temperature, and smaller aerosol particles generated by atomization. These smaller aerosol particles can enter the alveoli and reach the blood through the alveoli, thereby increasing the sense of satisfaction; the third liquid guide hole 1213-3 has a larger aperture and a shorter aperture, a faster liquid supply speed, a lower third atomization temperature, and larger aerosol particles generated by atomization. These larger aerosol particles can be deposited in the oral cavity, thereby increasing the taste. Exemplarily, the third medium to be atomized includes a sweetener, and the second medium to be atomized includes nicotine or a plant extract. Through the arrangement of the first liquid guide hole 1213-1, the second liquid guide hole 1213-2, and the third liquid guide hole 1213-3, the aerosol containing the sweetener can be deposited in the oral cavity to increase the sweet taste, while the aerosol containing nicotine or the plant extract can be deposited in the alveoli to increase the sense of satisfaction and enhance the user experience.

In one embodiment, the third sub-substrate 121-3 is made of a porous material, such as porous ceramics, etc. The first sub-substrate 121-1, the second sub-substrate 121-2 and the third sub-substrate 121-3 are assembled into the substrate 121. The plurality of third liquid-conducting holes 1213-3 on the third sub-substrate 121-2 are disordered holes of the porous material itself.

In one embodiment, the heating element 122 is only provided in the second atomization zone 1212a-2 (as shown in FIG. 15 ). The heat generated by the heating element 122 is conducted to the first atomization zone 1212a-1 and the third atomization zone 1212a-3 by heat conduction, so that the first atomization temperature of the first atomization zone 1212a-1 is lower than the second atomization temperature of the second atomization zone 1212a-2, and the third atomization temperature of the third atomization zone 1212a-3 is lower than the first atomization temperature of the first atomization zone 1212a-1. Optionally, the material of the first sub-base 121-1 corresponding to the first atomization zone 1212a-1 and the material of the third sub-base 121-3 corresponding to the third atomization zone 1212a-3 have a higher thermal conductivity. Optionally, the heating element 122 is a heating film; when the material of the second sub-substrate 121-2 is a dense material and the second liquid guide hole 1213-2 is a through hole that penetrates the liquid absorption surface 1211 and the atomization surface 1212, the heating element 122 has a plurality of second through holes 1221-2, and the plurality of second through holes 1221-2 are arranged one-to-one with the plurality of second liquid guide holes 1213-2, and the axis of the second through hole 1221-2 coincides with the axis of the second liquid guide hole 1213-2.

In one embodiment, the heating element 122 includes a heating portion 1222 and a heat conducting portion 1223 connected to each other, the heating portion 1222 is only provided in the second atomization area 1212a-2, and the heat conducting portion 1223 is at least partially provided in the first atomization area 1212a-1 and the third atomization area 1212a-3 (as shown in FIG. 16 ). The heat generated by the heating portion 1222 is conducted to the first atomization area 1212a-1 and the third atomization area 1212a-3 by heat conduction of the heat conducting portion 1223, so that the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2, and the third atomization temperature of the third atomization area 1212a-3 is lower than the first atomization temperature of the first atomization area 1212a-1. Optionally, the heating portion 1222 is a heating film, and the heat conducting portion 1223 is a heat conducting film; when the materials of the first sub-substrate 121-1, the second sub-substrate 121-2, and the third sub-substrate 121-3 are dense materials, and the first liquid guide hole 1213-1, the second liquid guide hole 1213-2, and the third liquid guide hole 1213-3 are through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212, the heating portion 1222 has a plurality of second through holes 1221-2, and the plurality of second through holes 1221-2 are arranged one by one with the plurality of second liquid guide holes 1213-2, and the second through holes 1213-1, the second liquid guide holes 1213-2, and the third liquid guide holes 1213-3 are through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212. The axis of the heat conducting portion 1223 coincides with the axis of the second liquid conducting hole 1213-2; the heat conducting portion 1223 has a plurality of first through holes 1221-1 and a plurality of third through holes 1221-3, the plurality of first through holes 1221-1 are arranged in one-to-one correspondence with the plurality of first liquid conducting holes 1213-1, and the axis of the first through hole 1221-1 coincides with the axis of the first liquid conducting hole 1213-1, the plurality of third through holes 1213-3 are arranged in one-to-one correspondence with the plurality of third liquid conducting holes 1213-3, and the axis of the third through hole 1221-3 coincides with the axis of the third liquid conducting hole 1213-3.

In one embodiment, the heating element 122 includes a first heating portion 1224, a second heating portion 1225 and a third heating portion 1228 that are interconnected, that is, the first heating portion 1224, the second heating portion 1225 and the third heating portion 1228 are controlled by the same control circuit; the first heating portion 1224 is arranged in the first atomization area 1212a-1, the second heating portion 1225 is arranged in the second atomization area 1212a-2, and the third heating portion 1228 is arranged in the third atomization area 1212a-3 (as shown in Figure 17). The resistance of the first heating part 1224, the resistance of the second heating part 1225, and the resistance of the third heating part 1228 are different, and/or the thermal conductivity of the material of the first heating part 1224, the thermal conductivity of the material of the second heating part 1225, and the thermal conductivity of the material of the third heating part 1228 are different, so that the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2, and the third atomization temperature of the third atomization area 1212a-3 is lower than the first atomization temperature of the first atomization area 1212a-1. The shape, thickness, or resistivity of the material of the first heating part 1224, the second heating part 1225, and the third heating part 1228 can be designed to make the resistance of the first heating part 1224, the second heating part 1225, and the third heating part 1228 different. Optionally, the resistance of the second heating part 1225 is higher than the resistance of the first heating part 1224, and the resistance of the first heating part 1224 is higher than the resistance of the third heating part 1228. Optionally, the first heating part 1224, the second heating part 1225, and the third heating part 1228 are all heating films; when the materials of the first sub-substrate 121-1, the second sub-substrate 121-2, and the third sub-substrate 121-3 are dense materials, and the first liquid guide hole 1213-1, the second liquid guide hole 1213-2, and the third liquid guide hole 1213-3 are all through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212, the first heating part 1224 has a plurality of first through holes 1221-1, and the plurality of first through holes 1221-1 are arranged one by one with the plurality of first liquid guide holes 1213-1, and the first through holes 1213-1 are arranged one by one with the plurality of first liquid guide holes 1213-1. The axis of the second heating portion 1225 is arranged in a one-to-one correspondence with the second liquid guiding holes 1213-2, and the axis of the second through hole 1221-2 is arranged in a one-to-one correspondence with the second liquid guiding holes 1213-2; the third heating portion 1228 is arranged in a one-to-one correspondence with the third through holes 1221-3, and the axis of the third through hole 1221-3 is arranged in a one-to-one correspondence with the third liquid guiding holes 1213-3.

In one embodiment, the heating element 122 includes a first sub-heating element 1226, a second sub-heating element 1227 and a third sub-heating element 1229 that are independent of each other, that is, the first sub-heating element 1226, the second sub-heating element 1227 and the third sub-heating element 1229 have independent control circuits; the first sub-heating element 1226 is arranged in the first atomization area 1212a-1, the second sub-heating element 1227 is arranged in the second atomization area 1212a-2, and the third sub-heating element 1229 is arranged in the third atomization area 1212a-3 (as shown in Figure 18). Optionally, the first sub-heating element 1226, the second sub-heating element 1227, and the third sub-heating element 1229 are all heating films; when the materials of the first sub-substrate 121-1, the second sub-substrate 121-2, and the third sub-substrate 121-3 are dense materials, and the first liquid guide hole 1213-1, the second liquid guide hole 1213-2, and the third liquid guide hole 1213-3 are through holes that penetrate the liquid absorption surface 1211 and the atomization surface 1212, the first sub-heating element 1226 has a plurality of first through holes 1221-1, and the plurality of first through holes 1221-1 are arranged one by one with the plurality of first liquid guide holes 1213-1, and the first through holes 1213-1 are arranged one by one with the plurality of first liquid guide holes 1213-1. The axis of the second sub-heating element 1227 is composed of a plurality of second through holes 1221-2, which are arranged in a one-to-one correspondence with the plurality of second liquid conducting holes 1213-2, and the axis of the second through hole 1221-2 is coincident with the axis of the second liquid conducting hole 1213-2; the third sub-heating element 1229 is composed of a plurality of third through holes 1221-3, which are arranged in a one-to-one correspondence with the plurality of third liquid conducting holes 1213-3, and the axis of the third through hole 1221-3 is coincident with the axis of the third liquid conducting hole 1213-3.

By designing the structure of the heating element 122 and the position thereof on the substrate 121, as well as the parameters greater than the substrate 121, the second atomization area 1212a-2 has a higher energy density, usually 1-3W/ ^mm2 , and purposefully realizes superheated evaporation atomization to generate a high temperature field and generate aerosols with as small particles as possible (less than 1μm), which can quickly enter the lungs and alveoli; the third atomization area 1212a-3 selects a suitable energy density, purposefully realizes the spray atomization of large-particle aerosols rich in sweeteners (2μm-10μm), which can be deposited on the tongue; the second atomization area 1212a-2 selects a medium energy density to generate an aerosol particle size of about 1μm, which is effectively deposited near the throat and nasal cavity. Based on the above design principle, the heating element 122 generates a controllable temperature field in each atomization area 1212a and matches a specific medium to be atomized, and selectively targets the boiling point of the specific medium to be atomized and the direction of the sensory organ where it is deposited.

Please refer to FIG. 19 , which is a schematic diagram of the partial structure of the heating component of the third embodiment of the atomizer provided in the present application.

The structure of the third embodiment of the atomizer 1 is substantially the same as that of the first embodiment of the atomizer 1 , except that in the third embodiment of the atomizer 1 , the atomizer 1 further includes a plurality of sensors 13 .

Specifically, the sensor 13 is arranged on the base 121, and multiple sensors 13 are arranged in a one-to-one correspondence with multiple atomization areas 1212a. It can be understood that each atomization area 1212a can be provided with one sensor 13, and each atomization area 1212a can also be provided with multiple sensors 13, and it is sufficient to ensure that each atomization area 1212a is provided with a sensor 13, and the specific design is carried out according to needs. The base 121 is also provided with a lead wire to electrically connect the sensor 13 to the host 2.

In one embodiment, the material of the base 121 is a dense material, and the liquid guide hole 1213 is a through hole that penetrates the liquid absorption surface 1211 and the atomization surface 1212. The sensor 13 is arranged on the hole wall of the liquid guide hole 1213. Optionally, the hole wall of the liquid guide hole 1213 is provided with a mounting groove 1213a, and the sensor 13 is arranged in the mounting groove 1213a, and the side of the sensor 13 is flush with the hole wall of the liquid guide hole 1213 to avoid the influence of the sensor 13 on the liquid supply speed.

In one embodiment, the sensor 13 is a temperature sensor, a capacitance sensor, a flow sensor, or a component sensor. The host 2 controls atomization according to the sensor signal. For example, the atomization temperature and atomization speed of different atomization areas 1212a are changed by adjusting the electric power, and the taste can be adjusted according to the user's personal preference.

It should be noted that the sensor 13 provided in the third embodiment of the nebulizer 1 can also be applied to the second embodiment of the nebulizer 1, which will not be described in detail. In other embodiments of the nebulizer 1, the nebulizer 1 includes more than three liquid storage chambers 11, and the heating component 12 of the nebulizer 1 includes more than three atomization areas 1212a. The multiple liquid storage chambers 11 are arranged in a one-to-one correspondence with the multiple atomization areas 1212a. The specific arrangement of the liquid storage chamber 11 and the heating component 12 can refer to the introduction in the above embodiments, and some structures are changed accordingly to achieve targeted atomization.

Please refer to FIG. 20 , which is a schematic diagram of a top view of the liquid storage chamber of the fourth embodiment of the atomizer provided in the present application.

The structure of the fourth embodiment of the atomizer 1 is basically the same as the structure of the second embodiment of the atomizer 1, except that: the arrangement of the multiple atomization areas 1212a is different. Specifically, in the second embodiment of the atomizer 1, the base 121 is rectangular, and the multiple atomization areas 1212a are arranged in parallel, and correspondingly, the multiple liquid storage chambers 11 are also arranged in parallel; in the fourth embodiment of the atomizer 1, the base 121 is annular, such as a circular ring; the multiple atomization areas 1212a are arranged in an annular shape, that is, the annular structure is divided into multiple atomization areas 1212a, and correspondingly, the multiple liquid storage chambers 11 are also arranged in an annular shape. For the parts of the structure of the fourth embodiment of the atomizer 1 that are the same as the structure of the second embodiment of the atomizer 1, refer to the introduction of the second embodiment of the atomizer 1, and no further description will be given.

Please refer to FIG. 21 , which is a schematic structural diagram of an embodiment of a heating element of a heating assembly provided in the present application.

The present application also provides another embodiment of the heating element 122 which is different from the structure of the heating element 122 in the first embodiment of the atomizer 1 and the heating element 122 in the second embodiment of the atomizer 1 .

Specifically, the material of the base 121 is a dense material, and the plurality of liquid guide holes 1213 are arranged in an array. The heating element 122 includes a plurality of micro heating elements 1220, and the plurality of micro heating elements 1220 are arranged in an array.

Optionally, each micro-heating element 1220 is arranged around at least one liquid guide hole 1213 (as shown in FIG. 19 ); for example, a plurality of micro-heating elements 1220 are also arranged in an array, and each micro-heating element 1220 surrounds a liquid guide hole 1213. The micro-heating elements 1220 in each row and/or column are independent of each other; or each micro-heating element 1220 is independent of each other. That is, each micro-heating element 1220 is controlled individually, or each row or column of micro-heating elements 1220 is controlled individually.

Optionally, a plurality of micro heating elements 1220 are disposed on the base 121 , similar to a circuit board.

It should be noted that, by controlling the plurality of micro-heating elements 1220, the first atomization temperature of the first atomization area 1212a-1 is different from the second atomization temperature of the second atomization area 1212a-2 (applied to the first embodiment of the atomizer 1), or the first atomization temperature of the first atomization area 1212a-1, the second atomization temperature of the second atomization area 1212a-2, and the third atomization temperature of the third atomization area 1212a-3 are different (applied to the second embodiment of the atomizer 1). It can be understood that the atomization surface 1212 can be divided into atomization areas 1212a of different numbers and sizes according to the number, position and power of the micro-heating elements 1220 selected by the control circuit to generate heat.

The arrangement of the heating component 12 in the first embodiment of the atomizer 1 and the arrangement of the heating component 12 in the second embodiment of the atomizer 1 are passive adjustment methods (the temperature field is adjusted by designing the parameters, materials of the substrate 121 and the materials, resistance, and arrangement position of the heating element 122), so that there are multiple different temperature fields on the same substrate 121 to correspond to different substrates to be atomized in multiple liquid storage cavities 11; and the arrangement of the heating element 122 provided in this embodiment is an active adjustment method (the temperature field is adjusted by active control of multiple micro-heating bodies 1220), so that there are multiple different temperature fields on the same substrate 121 to correspond to different substrates to be atomized in multiple liquid storage cavities 11.

In addition, in the prior art, for a specific medium to be atomized, it usually has an azeotropic point between 187°C and 290°C. For example, the medium to be atomized is a mixture of propylene glycol and glycerol in a weight ratio of 1:1, and the boiling point is about 236°C. For the area on the heating component where the temperature is lower than the boiling point, atomization cannot occur, resulting in low atomization efficiency. The uniformity of the substrate of the heating component makes the temperature of the substrate only controlled by heat transfer. Under a fixed surface energy, the temperature of the substrate surface is fixed, resulting in the singleness and unadjustability of the atomized flavor. In view of this, the present application provides a heating atomization control method.

Please refer to Figure 22, which is a schematic flow chart of the heating atomization control method provided in an embodiment of the present application.

The heating atomization control method is used to control the heating atomization of the atomizer 1. Among them, the atomizer 1 includes a plurality of liquid storage chambers 11 and a heating component 12; the liquid storage chamber 11 stores a medium to be atomized, and different liquid storage chambers 11 store different media to be atomized; the heating component 12 includes a substrate 121 and a heating element 122, and the heating element 122 is arranged on the atomization surface 1212 of the substrate 121; or the heating component 12 includes a substrate 121 and the substrate 121 is at least partially conductive to serve as a heating element 122; the substrate 121 has a plurality of atomization areas 1212a, and the plurality of atomization areas 1212a are arranged one by one with the plurality of liquid storage chambers 11. It should be noted that the specific structure of the atomizer 1 can be referred to the introduction in the above-mentioned embodiment of the atomizer 1. It can be understood that the heating atomization control method of the present application is not limited to controlling the atomizer 1 in the above-mentioned embodiment.

The heating atomization control method of the present application specifically includes:

Step S01: receiving a heating start signal.

Specifically, the heating start signal can be a suction signal, a pressing signal, a cloud signal, etc., and is designed according to specific needs.

Step S02: in response to receiving a heating start signal, controlling the heating element to heat and atomize the medium to be atomized in the plurality of liquid storage chambers based on a preset strategy; wherein the preset strategy is related to the medium to be atomized stored in the liquid storage chamber corresponding to the atomization area.

Specifically, the preset strategy includes controlling the heating element 122 to heat the multiple atomization areas 1212a to different atomization temperatures, and the atomization temperatures of the multiple atomization areas 1212a are related to the to-be-atomized media corresponding to the multiple atomization areas 1212a.

In one embodiment, the heating element 122 includes a plurality of micro-heating elements 1220 disposed on the atomizing surface 1212 of the substrate 121, and each atomizing area 1212a is provided with a plurality of micro-heating elements 1220. The preset strategy includes controlling the number of micro-heating elements 1220 that start to generate heat among the plurality of micro-heating elements 1220 corresponding to different atomizing areas 1212a, so that the plurality of atomizing areas 1212a are heated to different atomizing temperatures. Optionally, the substrate 121 material is a dense material, the liquid guide hole 1213 is a through hole that passes through the liquid absorption surface 1211 and the atomizing surface 1212, and each micro-heating element 1220 is arranged around at least one liquid guide hole 1213, and the structure is shown in FIG. 21.

In one embodiment, different atomization areas 1212a correspond to different parameters of the substrate 121. In addition to being related to the medium to be atomized stored in the liquid storage chamber 11 corresponding to the atomization area 1212a, the preset strategy is also related to the parameters of the substrate 121 corresponding to the atomization area 1212a (for example, the aperture of the liquid guide hole 1213, the length of the liquid guide hole 1213, etc.).

Optionally, the base 121 has a plurality of liquid guide holes 1213, and the liquid guide holes 1213 located in different atomization zones 1212a have different lengths. The preset strategy includes controlling the heating element 122 to heat the plurality of atomization zones 1212a to different atomization temperatures, the atomization temperatures of the plurality of atomization zones 1212a are positively correlated with the boiling points of the atomization media to be atomized corresponding to the plurality of atomization zones 1212a, and the atomization temperatures of the plurality of atomization zones 1212a are positively correlated with the lengths of the liquid guide holes 1213 in the plurality of atomization zones 1212a.

Optionally, the base 121 has a plurality of liquid guide holes 1213, and the liquid guide holes 1213 located in different atomization zones 1212a have different apertures. The preset strategy includes controlling the heating element 122 to heat the plurality of atomization zones 1212a to different atomization temperatures, the atomization temperatures of the plurality of atomization zones 1212a are positively correlated with the boiling points of the atomization media to be atomized corresponding to the plurality of atomization zones 1212a, and the atomization temperatures of the plurality of atomization zones 1212a are negatively correlated with the apertures of the liquid guide holes 1213 in the plurality of atomization zones 1212a.

Exemplarily, the atomizer 1 includes a first liquid storage chamber 11-1 and a second liquid storage chamber 11-2; the first liquid storage chamber 11-1 stores a first medium to be atomized, the second liquid storage chamber 11-2 stores a second medium to be atomized, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized. The substrate 121 has a first atomization area 1212a-1 and a second atomization area 1212a-2, the first atomization area 1212a-1 is arranged corresponding to the first liquid storage chamber 11-1, and the second atomization area 1212a-2 is arranged corresponding to the second liquid storage chamber 11-2. The base 121 has a plurality of first liquid guide holes 1213-1 located in the first atomization zone 1212a-1 and a plurality of second liquid guide holes 1213-2 located in the second atomization zone 1212a-2, the aperture of the first liquid guide hole 1213-1 is larger than the aperture of the second liquid guide hole 1213-2, and/or the length of the first liquid guide hole 1213-1 is smaller than the length of the second liquid guide hole 1213-2. It should be noted that the detailed introduction of the structure of the atomizer 1 of this embodiment can be found in the first embodiment of the atomizer 1 introduced above, and will not be repeated. At this time, the preset strategy includes heating the first atomization zone 1212a-1 to a first atomization temperature to atomize the first medium to be atomized, heating the second atomization zone 1212a-2 to a second atomization temperature to atomize the second medium to be atomized, and the first atomization temperature is lower than the second atomization temperature.

Please refer to FIG. 23, which is a flow chart of an embodiment of step S02 of the heating atomization control method provided in FIG. 22. In one embodiment, heating the first atomization zone 1212a-1 to a first atomization temperature to atomize the first medium to be atomized, and heating the second atomization zone 1212a-2 to a second atomization temperature to atomize the second medium to be atomized specifically includes:

Step S021: in response to the time of receiving the heating start signal reaching a first preset time, starting to continuously heat the first atomization zone to atomize the first medium to be atomized and continuing to atomize for a first atomization time.

Step S022: in response to the time of receiving the heating start signal reaching the second preset time, start to continuously heat the second atomization zone to atomize the second medium to be atomized and continue to atomize for a second atomization time.

Among them, the first preset time is the same as the second preset time, that is, the time when the heating start signal is received reaches the same time, and the first atomization area 1212a-1 and the second atomization area 1212a-2 are heated at the same time; for example, the first preset time and the second preset time are both 0; for another example, the first preset time is the same as the second preset time, the second preset time is greater than 0 and less than the first time threshold, and the first time threshold is 2s-5s. Or, the first preset time is greater than the second preset time. It can be understood that since the first atomization temperature is lower than the second atomization temperature, it takes more time to heat up to the second atomization temperature. The first preset time is set to be greater than the second preset time, so that the first atomization area 1212a-1 and the second atomization area 1212a-2 are heated to their corresponding atomization temperatures almost at the same time, and aerosols are released at the same time to improve the taste; for example, the second preset time is greater than 0 and less than the first time threshold, the first preset time is greater than the second preset time and less than the first time threshold, and the first time threshold is 2s-5s.

And/or, the first atomization time is the same as or different from the second atomization time. Preferably, the first atomization time is the same as the second atomization time, and the first atomization area 1212a-1 and the second atomization area 1212a-2 always release aerosols at the same time to improve the taste. Optionally, the first atomization time is a fixed value or the first atomization time is the time from the start of atomization in the first atomization area 1212a-1 to the end of puffing. Optionally, the second atomization time is a fixed value or the second atomization time is the time from the start of atomization in the second atomization area 1212a-2 to the end of puffing. It should be noted that the end of puffing means that when the puff interval is detected to be greater than a threshold value, it is determined that the puffing is over; the threshold value is the interval between the current puff and the next puff during normal continuous puffing.

It can be understood that the first preset time, the second preset time, the first atomization time, and the second atomization time are specifically designed according to the user's requirements for taste and flavor.

Please refer to Figure 24, which is a flow chart of another embodiment of step S02 of the heating atomization control method provided in Figure 22. In one embodiment, heating the first atomization zone 1212a-1 to a first atomization temperature to atomize the first medium to be atomized, and heating the second atomization zone 1212a-2 to a second atomization temperature to atomize the second medium to be atomized specifically includes:

Step S121: in response to the time of receiving the heating start signal reaching a first preset time, start to intermittently heat the first atomization zone to atomize the first medium to be atomized, and control the first atomization zone to atomize for a first atomization time at every first interval time.

Step S122: in response to the time of receiving the heating start signal reaching the second preset time, start to intermittently heat the second atomization zone to atomize the second medium to be atomized, and control the second atomization zone to atomize for a second atomization time at every second interval time.

Among them, the first preset time is the same as the second preset time, that is, the time when the heating start signal is received reaches the same time, and the first atomization area 1212a-1 and the second atomization area 1212a-2 are heated at the same time; for example, the first preset time and the second preset time are both 0; for another example, the first preset time is the same as the second preset time, the second preset time is greater than 0 and less than the first time threshold, and the first time threshold is 2s-5s. Or, the first preset time is greater than the second preset time. It can be understood that since the first atomization temperature is lower than the second atomization temperature, it takes more time to heat up to the second atomization temperature. The first preset time is set to be greater than the second preset time, so that the first atomization area 1212a-1 and the second atomization area 1212a-2 are heated to their corresponding atomization temperatures almost at the same time, and aerosols are released at the same time to improve the taste; for example, the second preset time is greater than 0 and less than the first time threshold, the first preset time is greater than the second preset time and less than the first time threshold, and the first time threshold is 2s-5s.

And/or, the first nebulization time is the same as or different from the second nebulization time.

And/or, the first interval time is the same as or different from the second interval time.

It can be understood that the first preset time, the first interval time, the first atomization time, the second preset time, the second interval time, and the second atomization time are specifically designed according to the user's requirements for taste and flavor.

In another exemplary embodiment, the atomizer 1 includes a first liquid storage chamber 11-1, a second liquid storage chamber 11-2, and a third liquid storage chamber 11-3; the first liquid storage chamber 11-1 stores a first medium to be atomized, the second liquid storage chamber 11-2 stores a second medium to be atomized, and the third liquid storage chamber 11-3 stores a third medium to be atomized, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized, and the boiling point of the second medium to be atomized is lower than the boiling point of the third medium to be atomized. The substrate 121 has a first atomization area 1212a-1, a second atomization area 1212a-2, and a third atomization area 1212a-3, the first atomization area 1212a-1 is correspondingly arranged with the first liquid storage chamber 11-1, the second atomization area 1212a-2 is correspondingly arranged with the second liquid storage chamber 11-2, and the third atomization area 1212a-3 is correspondingly arranged with the third liquid storage chamber 11-3. The base 121 has a plurality of first liquid guide holes 1213-1 located in the first atomization area 1212a-1, a plurality of second liquid guide holes 1213-2 located in the second atomization area 1212a-2, and a plurality of third liquid guide holes 1213-3 located in the third atomization area 1212a-3, and the aperture of the first liquid guide hole 1213-1 is larger than the aperture of the second liquid guide hole 1213-2, and the aperture of the second liquid guide hole 1213-2 is larger than the aperture of the third liquid guide hole 1213-3; and/or, the length of the first liquid guide hole 1213-1 is smaller than the length of the second liquid guide hole 1213-2, and the length of the second liquid guide hole 1213-2 is smaller than the length of the third liquid guide hole 1213-3. It should be noted that the detailed description of the structure of the atomizer 1 of this embodiment can be referred to the second embodiment of the atomizer 1 introduced above, and will not be repeated. At this time, the preset strategy includes heating the first atomization zone 1212a-1 to a first atomization temperature to atomize the first medium to be atomized, heating the second atomization zone 1212a-2 to a second atomization temperature to atomize the second medium to be atomized, and heating the third atomization zone 1212a-3 to a third atomization temperature to atomize the third medium to be atomized, the first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature.

Please refer to Figure 25, which is a flow chart of another embodiment of step S02 of the heating atomization control method provided in Figure 22. In one embodiment, heating the first atomization zone 1212a-1 to a first atomization temperature to atomize the first medium to be atomized, heating the second atomization zone 1212a-2 to a second atomization temperature to atomize the second medium to be atomized, and heating the third atomization zone 1212a-3 to a third atomization temperature to atomize the third medium to be atomized specifically includes:

Step S221: in response to the time of receiving the heating start signal reaching the first preset time, start to continuously heat the first atomization zone to atomize the first medium to be atomized and continue to atomize for the first atomization time.

Step S222: in response to the time of receiving the heating start signal reaching the second preset time, start to continuously heat the second atomization zone to atomize the second medium to be atomized and continue to atomize for a second atomization time.

Step S223: in response to the time of receiving the heating start signal reaching the third preset time, start to continuously heat the third atomization zone to atomize the third medium to be atomized and continue to atomize for a third atomization time.

Among them, the first preset time, the second preset time and the third preset time are the same, that is, the time when the heating start signal is received reaches the same time, and the first atomization area 1212a-1, the second atomization area 1212a-2 and the third atomization area 1212a-3 are heated at the same time; for example, the first preset time, the second preset time and the third preset time are all 0. Or, the first preset time is greater than the second preset time, and the second preset time is greater than the third preset time. It can be understood that since the first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature, it takes more time to heat up to the second atomization temperature and the third atomization temperature relative to the first atomization temperature. The first preset time is set to be greater than the second preset time, and the second preset time is greater than the third preset time, so that the first atomization area 1212a-1, the second atomization area 1212a-2 and the third atomization area 1212a-3 are heated to their corresponding atomization temperatures almost at the same time, and aerosols are released at the same time to improve the taste; for example, the third preset time is 0, the second preset time is greater than 0 and less than the first time threshold, the first preset time is greater than the second preset time and less than the first time threshold, and the first time threshold is 2s-5s. Or, the first preset time is equal to the second preset time, and the second preset time is greater than the third preset time. It can be understood that since the first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature, it takes more time to heat up to the third atomization temperature relative to the first atomization temperature and the second atomization temperature. Setting the first preset time equal to the second preset time and the second preset time greater than the third preset time is beneficial to improving the taste; for example, the third preset time is 0, the first preset time is equal to the second preset time, the second preset time is greater than 0 and less than the first time threshold, and the first time threshold is 2s-5s.

And/or, the first atomization time, the second atomization time and the third atomization time are the same or at least two of the first atomization time, the second atomization time and the third atomization time are different. Preferably, the first atomization time, the second atomization time and the third atomization time are the same, and the first atomization area 1212a-1, the second atomization area 1212a-2 and the third atomization area 1212a-3 always release aerosols at the same time to improve the taste. Optionally, the first atomization time is a fixed value or the first atomization time is the time from the first atomization area 1212a-1 to the end of the puff. Optionally, the second atomization time is a fixed value or the second atomization time is the time from the second atomization area 1212a-2 to the end of the puff. Optionally, the third atomization time is a fixed value or the third atomization time is the time from the third atomization area 1212a-3 to the end of the puff. It should be noted that the end of puffing means that the puffing interval is detected to be greater than a threshold, and then it is determined to be the end of puffing; the threshold is the interval between the current puff and the next puff in the normal continuous puffing process.

Please refer to Figure 26, which is a flow chart of another embodiment of step S02 of the heating atomization control method provided in Figure 22. In one embodiment, heating the first atomization zone 1212a-1 to a first atomization temperature to atomize the first medium to be atomized, heating the second atomization zone 1212a-2 to a second atomization temperature to atomize the second medium to be atomized, and heating the third atomization zone 1212a-3 to a third atomization temperature to atomize the third medium to be atomized specifically includes:

Step S321: in response to the time of receiving the heating start signal reaching the first preset time, start to intermittently heat the first atomization zone to atomize the first medium to be atomized, and control the first atomization zone to atomize for a first atomization time at every first interval time.

Step S322: in response to the time of receiving the heating start signal reaching the second preset time, start to intermittently heat the second atomization zone to atomize the second medium to be atomized, and control the second atomization zone to atomize for a second atomization time at every second interval time.

Step S323: in response to the time of receiving the heating start signal reaching the third preset time, start to intermittently heat the third atomization zone to atomize the third medium to be atomized, and control the third atomization zone to atomize for a third atomization time at every third interval time.

Among them, the first preset time, the second preset time and the third preset time are the same, that is, the time when the heating start signal is received reaches the same time, and the first atomization area 1212a-1, the second atomization area 1212a-2 and the third atomization area 1212a-3 are heated at the same time; for example, the first preset time, the second preset time and the third preset time are all 0. Or, the first preset time is greater than the second preset time, and the second preset time is greater than the third preset time. It can be understood that since the first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature, it takes more time to heat up to the second atomization temperature and the third atomization temperature relative to the first atomization temperature. The first preset time is set to be greater than the second preset time, and the second preset time is greater than the third preset time, so that the first atomization area 1212a-1, the second atomization area 1212a-2 and the third atomization area 1212a-3 are heated to their corresponding atomization temperatures almost at the same time, and aerosols are released at the same time to improve the taste; for example, the third preset time is 0, the second preset time is greater than 0 and less than the first time threshold, the first preset time is greater than the second preset time and less than the first time threshold, and the first time threshold is 2s-5s. Or, the first preset time is equal to the second preset time, and the second preset time is greater than the third preset time. It can be understood that since the first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature, it takes more time to heat up to the third atomization temperature relative to the first atomization temperature and the second atomization temperature. Setting the first preset time equal to the second preset time and the second preset time greater than the third preset time is beneficial to improving the taste; for example, the third preset time is 0, the first preset time is equal to the second preset time, the second preset time is greater than 0 and less than the first time threshold, and the first time threshold is 2s-5s.

And/or, at least two of the first atomization time, the second atomization time and the third atomization time are different, or the first atomization time, the second atomization time and the third atomization time are the same.

And/or, at least two of the first interval time, the second interval time and the third interval time are different, or the first interval time, the second interval time and the third interval time are the same.

It can be understood that the first preset time, the first interval time, the first atomization time, the second preset time, the second interval time, the second atomization time, the third preset time, the third interval time, and the third atomization time are specifically designed according to the user's requirements for taste and flavor.

In one embodiment, the preset strategy is only related to the medium to be atomized stored in the liquid storage chamber 11 corresponding to the atomization area 1212a.

Exemplarily, the atomizer 1 includes a first liquid storage chamber 11-1, a second liquid storage chamber 11-2, and a third liquid storage chamber 11-3; the first liquid storage chamber 11-1 stores a first medium to be atomized, the second liquid storage chamber 11-2 stores a second medium to be atomized, and the third liquid storage chamber 11-3 stores a third medium to be atomized, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized, and the boiling point of the second medium to be atomized is lower than the boiling point of the third medium to be atomized. The first medium to be atomized and the second medium to be atomized both include propylene glycol and glycerol; the content of propylene glycol and glycerol in the first medium to be atomized is different from the content of propylene glycol and glycerol in the second medium to be atomized; the third medium to be atomized includes a sweetener. The base 121 has a first atomization area 1212a-1, a second atomization area 1212a-2 and a third atomization area 1212a-3. The first atomization area 1212a-1 is arranged corresponding to the first liquid storage chamber 11-1, the second atomization area 1212a-2 is arranged corresponding to the second liquid storage chamber 11-2, and the third atomization area 1212a-3 is arranged corresponding to the third liquid storage chamber 11-3. The base 121 has a plurality of first liquid guide holes 1213-1 located in the first atomization area 1212a-1, a plurality of second liquid guide holes 1213-2 located in the second atomization area 1212a-2, and a plurality of third liquid guide holes 1213-3 located in the third atomization area 1212a-3, and the aperture of the first liquid guide hole 1213-1 is larger than the aperture of the second liquid guide hole 1213-3, and/or the length of the first liquid guide hole 1213-1 is smaller than the length of the second liquid guide hole 1213-2. It should be noted that the detailed description of the structure of the atomizer 1 of this embodiment can be referred to the second embodiment of the atomizer 1 introduced above, and will not be repeated here. At this time, the preset strategy includes heating the first atomization zone 1212a-1 to a first atomization temperature to atomize the first medium to be atomized, heating the second atomization zone 1212a-2 to a second atomization temperature to atomize the second medium to be atomized, and heating the third atomization zone 1212a-3 to a third atomization temperature to atomize the third medium to be atomized. Wherein, the first atomization temperature is lower than the second atomization temperature, and the third atomization temperature is lower than the first atomization temperature; or, the first atomization temperature is lower than the second atomization temperature, and the third atomization temperature is higher than the first atomization temperature and lower than the second atomization temperature.

The specific implementation of the preset strategy can adopt the method shown in Figure 25 or the method shown in Figure 26, and the relationship between the first preset time, the second preset time and the third preset time needs to be modified accordingly. When the first atomization temperature is lower than the second atomization temperature, and the third atomization temperature is lower than the first atomization temperature, the first preset time, the second preset time and the third preset time are the same; or, the third preset time is equal to the first preset time, and the first preset time is greater than the second preset time; or, the third preset time is greater than the first preset time, and the first preset time is greater than the second preset time. When the first atomization temperature is lower than the second atomization temperature, and the third atomization temperature is greater than the first atomization temperature and lower than the second atomization temperature, the first preset time, the second preset time and the third preset time are the same; or, the third preset time is equal to the first preset time, and the first preset time is greater than the second preset time; or, the first preset time is greater than the third preset time, and the third preset time is greater than the second preset time.

It should be noted that the heating atomization control method of any of the above-mentioned embodiments provided in the present application realizes active control of the temperature field of each microstructure (the microstructure can be the atomization area 1212a or the liquid guide hole 1213) by using multiple micro-heating circuits (multiple micro-heating elements 1220, and multiple rows and/or columns of multiple micro-heating elements 1220 are independently controlled), and matches it with different media to be atomized according to the boiling point and the aerosol particle size to be formed to achieve the final targeted atomization goal.

Continuing to refer to FIG. 1 , the host 2 of the electronic atomization device 100 further includes a memory 23. The memory 23 is used to store program instructions for implementing the heating atomization control method of any of the embodiments described above. The processor 22 is used to execute the program instructions stored in the memory 23; that is, the processor 22 retrieves the program instructions stored in the memory 23 from the memory 23 to execute the heating atomization control method of any of the embodiments described above.

The processor 22 may also be referred to as a CPU (Central Processing Unit). The processor 22 may be an integrated circuit chip having signal processing capabilities. The processor 22 may also be a general-purpose processor, a digital signal processor (DSP), an application-specific integrated circuit (ASIC), a field programmable gate array (FPGA) or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components. The general-purpose processor may be a microprocessor or the processor may also be any conventional processor, etc.

The memory 23 can be a memory stick, a TF card, etc., which can store all the information in the electronic device of the device, including the input raw data, computer programs, intermediate operation results and final operation results are all stored in the memory. It stores and retrieves information according to the location specified by the controller. With the memory 23, the device has a memory function and can ensure normal operation. The memory 23 can be divided into main memory (internal memory) and auxiliary memory (external memory) according to its purpose, and there is also a classification method of dividing it into external memory and internal memory. External memory is usually a magnetic medium or an optical disk, etc., which can store information for a long time. Memory refers to the storage component on the motherboard, which is used to store the data and programs currently being executed, but is only used to temporarily store programs and data. If the power is turned off or the power is cut off, the data will be lost.

Please refer to Figure 27, which is a schematic diagram of the framework of the computer-readable storage medium provided in the embodiment of the present application. The computer-readable storage medium 30 stores program instructions 301 that can be executed by the processor, and the program instructions 301 are used to implement the steps of the heating atomization control method of any of the above embodiments.

In some embodiments, the functions or modules included in the device provided by the embodiments of the present disclosure can be used to execute the method described in the above method embodiments. The specific implementation can refer to the description of the above method embodiments, and for the sake of brevity, it will not be repeated here.

The above description of various embodiments tends to emphasize the differences between the various embodiments. The same or similar aspects can be referenced to each other, and for the sake of brevity, they will not be repeated herein.

In the several embodiments provided in the present application, it should be understood that the disclosed methods and devices can be implemented in other ways. For example, the device implementation described above is only schematic. For example, the division of modules or units is only a logical function division. There may be other division methods in actual implementation, such as units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, and the indirect coupling or communication connection of devices or units can be electrical, mechanical or other forms.

In addition, each functional unit in each embodiment of the present application may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of software functional units.

If the integrated unit is implemented in the form of a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present application, or the part that contributes to the prior art or all or part of the technical solution, can be embodied in the form of a software product, which is stored in a storage medium and includes several instructions for a computer device (which can be a personal computer, server, or network device, etc.) or a processor to perform all or part of the steps of each implementation method of the present application. The aforementioned storage medium includes: U disk, mobile hard disk, read-only memory (ROM, Read-Only Memory), random access memory (RAM, Random Access Memory), disk or optical disk and other media that can store program code.

The following describes the atomizer with two liquid storage chambers and two atomization zones, and the atomizer with three liquid storage chambers and three atomization zones provided by the present application as different specific embodiments.

Example 1

Referring to Figures 28-30, Figure 28 is a schematic diagram of the structure of the liquid storage chamber provided in the specific embodiment 1 of the present application; Figure 29 is a schematic diagram of the structure of the base of the heating component provided in the specific embodiment 1 of the present application; Figure 30 is a schematic diagram of the structure of the liquid storage chamber and the base of the heating component after assembly provided in the specific embodiment 1 of the present application.

As shown in Figures 28-30, the atomizer includes three liquid storage chambers 11, namely the first liquid storage chamber 11-1, the second liquid storage chamber 11-2 and the third liquid storage chamber 11-3. The first liquid storage chamber 11-1 stores the first medium to be atomized, the second liquid storage chamber 11-2 stores the second medium to be atomized, and the third liquid storage chamber 11-3 stores the third medium to be atomized; the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized, and the boiling point of the second medium to be atomized is lower than the boiling point of the third medium to be atomized. The boiling point of the first medium to be atomized is 20℃-250℃, the boiling point of the second medium to be atomized is 250℃-360℃, and the boiling point of the third medium to be atomized is 400℃-600℃. The first medium to be atomized includes propylene glycol, glycerol and low-boiling point aroma substances; the second medium to be atomized includes propylene glycol, glycerol and high-boiling point aroma substances, and the third medium to be atomized includes a sweetener; the content of propylene glycol and glycerol in the first medium to be atomized is different from the content of propylene glycol and glycerol in the second medium to be atomized. The substrate 121 includes a first sub-substrate 121-1, a second sub-substrate 121-2 and a third sub-substrate 121-3 which are interconnected; the first sub-substrate 121-1 has a first atomization area 1212a-1, the second sub-substrate 121-2 has a second atomization area 1212a-2, and the third sub-substrate 121-3 has a third atomization area 1212a-3; the first liquid storage chamber 11-1 is arranged corresponding to the first atomization area 1212a-1, the second liquid storage chamber 11-2 is arranged corresponding to the second atomization area 1212a-2, and the third liquid storage chamber 11-3 is arranged corresponding to the third atomization area 1212a-3.

The heating element (not shown in Figures 28-30) is used to heat the first atomization area 1212a-1 to a first atomization temperature, the second atomization area 1212a-2 to a second atomization temperature, and the third atomization area 1212a-3 to a third atomization temperature. The first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature. The first atomization temperature is the average temperature of the first atomization area 1212a-1, the second atomization temperature is the average temperature of the second atomization area 1212a-2, and the third atomization temperature is the average temperature of the third atomization area 1212a-3.

The first sub-base 121-1 has a plurality of first liquid-conducting holes 1213-1, the second sub-base 121-2 has a plurality of second liquid-conducting holes 1213-2, and the third sub-base 121-3 has a plurality of third liquid-conducting holes 1213-3. The aperture of the first liquid-conducting hole 1213-1 is greater than or equal to 20 μm, the aperture of the second liquid-conducting hole 1213-2 is less than or equal to 30 μm, and the aperture of the third liquid-conducting hole 1213-3 is greater than 20 μm. The first sub-base 121-1, the second sub-base 121-2, and the third sub-base 121-3 have the same thickness. The aperture of the first liquid-conducting hole 1213-1 is greater than the aperture of the second liquid-conducting hole 1213-2, and the aperture of the third liquid-conducting hole 1213-3 is greater than the aperture of the first liquid-conducting hole 1213-1. Specifically, the aperture of the first liquid guide hole 1213-1 is greater than or equal to 30 μm, the aperture of the second liquid guide hole 1213-2 is less than or equal to 20 μm, and the aperture of the third liquid guide hole 1213-3 is greater than 30 μm. The ratio of the thickness of the first sub-base 121-1 to the aperture of the first liquid guide hole 1213-1 is less than 10:1, the ratio of the thickness of the second sub-base 121-2 to the aperture of the second liquid guide hole 1213-2 is greater than 10:1, and the ratio of the thickness of the third sub-base 121-3 to the aperture of the third liquid guide hole 1213-3 is less than 8:1. The first liquid guide hole 1213-1 and the third liquid guide hole 1213-3 are circular holes, and the second liquid guide hole 1213-2 is a square hole. The plurality of first liquid guiding holes 1213 - 1 and the plurality of second liquid guiding holes 1213 - 2 are arranged in an array, and the plurality of third liquid guiding holes 1213 - 3 are arranged in an array with two adjacent rows being staggered.

Since the thickness of the first sub-substrate 121-1 is the same as the thickness of the second sub-substrate 121-2, and the aperture of the first liquid guiding hole 1213-1 is larger than the aperture of the second liquid guiding hole 1213-2, the liquid supply rate of the first liquid guiding hole 1213-1 is greater than the liquid supply rate of the second liquid guiding hole 1213-2, the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2, the first atomization area 1212a-1 and the second atomization area 1212a-2 respectively atomize aerosols of different flavors, and the aerosols of different flavors are mixed and inhaled by users.

Since the third medium to be atomized includes a sweetener and needs to be atomized to form a large-particle aerosol, the aperture of the third liquid guide hole 1213-3 is larger than the aperture of the first liquid guide hole 1213-1 and the aperture of the second liquid guide hole 1213-2. However, since the boiling point of the third medium to be atomized is better, the third atomization temperature of the third atomization area 1212a-3 needs to be higher than the first atomization temperature and the second atomization temperature. Therefore, in this embodiment, by controlling the setting mode or power supply of the heating element, the third atomization temperature of the third atomization area 1212a-3 is higher than the first atomization temperature and the second atomization temperature.

In this embodiment, the heating element includes a first sub-heating element, a second sub-heating element and a third sub-heating element which are independent of each other. The first sub-heating element is arranged in the first atomization area 1212a-1, the second sub-heating element is arranged in the second atomization area 1212a-2, and the third sub-heating element is arranged in the third atomization area 1212a-3. In response to receiving the suction signal, the host 2 controls the third sub-heating element to start heating for a period of time, and then the host 2 controls the first sub-heating element and the second sub-heating element to start heating. Since the third sub-heating element starts heating in advance, the third atomization temperature of the third atomization area 1212a-3 is higher than the first atomization temperature and the second atomization temperature. Since the aperture of the first liquid guide hole 1213-1 is larger than the aperture of the second liquid guide hole 1213-2, the liquid supply rate of the first liquid guide hole 1213-1 is greater than the liquid supply rate of the second liquid guide hole 1213-2, and the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2. Specifically, in this embodiment, the first atomization temperature is 200°C-250°C, the second atomization temperature is 250°C-350°C, and the third atomization temperature is 400°C-550°C.

Example 2

Referring to Figures 31-33, Figure 31 is a schematic diagram of the structure of the liquid storage chamber provided in specific embodiment 2 of the present application; Figure 32 is a schematic diagram of the structure of the base of the heating component provided in specific embodiment 2 of the present application; Figure 33 is a schematic diagram of the structure of the liquid storage chamber and the base of the heating component after assembly provided in specific embodiment 2 of the present application.

31-33 , the structure of the atomizer provided in Example 2 is substantially the same as that of the atomizer provided in Example 1, except that the atomizer provided in Example 2 includes only two liquid storage chambers 11 , and the base 121 includes only two sub-bases.

Specifically, the atomizer provided in Example 2 includes two liquid storage chambers 11, namely a first liquid storage chamber 11-1 and a second liquid storage chamber 11-2; the first liquid storage chamber 11-1 stores a first medium to be atomized, and the second liquid storage chamber 11-2 stores a second medium to be atomized; the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized. Specifically, the boiling point of the first medium to be atomized is 20°C-250°C, and the boiling point of the second medium to be atomized is 250°C-360°C. The first medium to be atomized includes propylene glycol, glycerol and low-boiling point aroma substances; the second medium to be atomized includes propylene glycol, glycerol and high-boiling point aroma substances; the content of propylene glycol and glycerol in the first medium to be atomized is different from the content of propylene glycol and glycerol in the second medium to be atomized. The content of the propylene glycol in the first medium to be atomized is greater than the content of the glycerol; the content of the propylene glycol in the second medium to be atomized is less than the content of the glycerol; the low-boiling point aroma substance includes nicotine or nicotine salt, and the high-boiling point aroma substance includes plant extracts.

The base 121 of the heating component includes a first sub-base 121-1 and a second sub-base 121-2 which are connected to each other. The first sub-base 121-1 has a first atomization area 1212a-1, and the second sub-base 121-2 has a second atomization area 1212a-2; the first liquid storage chamber 11-1 is arranged correspondingly to the first atomization area 1212a-1, and the second liquid storage chamber 11-2 is arranged correspondingly to the second atomization area 1212a-2. The heating element (not shown in Figures 28-30) is used to heat the first atomization area 1212a-1 to a first atomization temperature and to heat the second atomization area 1212a-2 to a second atomization temperature, and the first atomization temperature is lower than the second atomization temperature; wherein the first atomization temperature is the average temperature of the first atomization area 1212a-1, and the second atomization temperature is the average temperature of the second atomization area 1212a-2.

The first sub-base 121-1 has a plurality of first liquid-conducting holes 1213-1, and the second sub-base 121-2 has a plurality of second liquid-conducting holes 1213-2; the aperture of the first liquid-conducting holes 1213-1 is greater than or equal to 20 μm, and the aperture of the second liquid-conducting holes 1213-2 is less than or equal to 30 μm. The thickness of the first sub-base 121-1 is the same as that of the second sub-base 121-2, and the aperture of the first liquid-conducting holes 1213-1 is greater than the aperture of the second liquid-conducting holes 1213-2. Specifically, the first liquid-conducting holes 1213-1 are circular holes, and the second liquid-conducting holes 1213-2 are square holes. The aperture of the first liquid conducting hole 1213-1 is greater than or equal to 30 μm, and the aperture of the second liquid conducting hole 1213-2 is less than or equal to 20 μm; the ratio of the thickness of the first sub-base 121-1 to the aperture of the first liquid conducting hole 1213-1 is less than 10:1, and the ratio of the thickness of the second sub-base 121-2 to the aperture of the second liquid conducting hole 1213-2 is greater than 10:1.

Since the thickness of the first sub-substrate 121-1 is the same as the thickness of the second sub-substrate 121-2, and the aperture of the first liquid guiding hole 1213-1 is larger than the aperture of the second liquid guiding hole 1213-2, the liquid supply rate of the first liquid guiding hole 1213-1 is greater than the liquid supply rate of the second liquid guiding hole 1213-2, the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2, the first atomization area 1212a-1 and the second atomization area 1212a-2 respectively atomize aerosols of different flavors, and the aerosols of different flavors are mixed and inhaled by users.

In this embodiment, a portion of the heating element is disposed in the first atomization area 1212a-1, and the other portion is disposed in the second atomization area 1212a-2. In response to receiving the suction signal, the host 2 controls the heating element to start heating. Since the aperture of the first liquid guide hole 1213-1 is larger than the aperture of the second liquid guide hole 1213-2, the liquid supply rate of the first liquid guide hole 1213-1 is larger than the liquid supply rate of the second liquid guide hole 1213-2, and the first atomization temperature of the first atomization area 1212a-1 is lower than the second atomization temperature of the second atomization area 1212a-2. Specifically, in this embodiment, the first atomization temperature is 200°C-250°C, and the second atomization temperature is 250°C-350°C.

Example 3

The atomizer provided in Example 3 has a basically identical structure to the atomizer provided in Example 2, except that the two liquid storage chambers 11 of the atomizer provided in Example 2 are respectively the first liquid storage chamber 11-1 and the second liquid storage chamber 11-2 of Example 1, correspondingly storing the first medium to be atomized and the second medium to be atomized, and the two sub-substrates of the substrate 121 are respectively the first sub-substrate 121-1 and the second sub-substrate 121-2 of Example 1; and the two liquid storage chambers 11 of the atomizer provided in Example 3 are respectively the first liquid storage chamber 11-1 and the third liquid storage chamber 11-3 of Example 1, correspondingly storing the first medium to be atomized and the third medium to be atomized, and the two sub-substrates of the substrate 121 are respectively the first sub-substrate 121-1 and the third sub-substrate 121-3 of Example 1.

Specifically, the boiling point of the first medium to be atomized is 20°C-250°C; the boiling point of the third medium to be atomized is 400°C-600°C; the first medium to be atomized includes propylene glycol, glycerol and low-boiling point aroma substances, and the third medium to be atomized includes sweeteners. The first sub-matrix 121-1 has a plurality of first liquid guide holes 1213-1, and the third sub-matrix 121-3 has a plurality of third liquid guide holes 1213-3; the aperture of the first liquid guide hole 1213-1 is greater than or equal to 20 μm, and the aperture of the third liquid guide hole 1213-3 is greater than or equal to 20 μm; and the aperture of the third liquid guide hole 1213-3 is greater than the aperture of the first liquid guide hole 1213-1.

In this embodiment, the heating element includes a first sub-heating element and a third sub-heating element that are independent of each other. The first sub-heating element is arranged in the first atomization area 1212a-1, and the third sub-heating element is arranged in the third atomization area 1212a-3. In response to receiving the suction signal, the host 2 controls the first sub-heating element and the third sub-heating element to start heating, but the power of the third sub-heating element is greater than the power of the first sub-heating element. Since the third sub-heating element starts to heat up in advance, the third atomization temperature of the third atomization area 1212a-3 is higher than the first atomization temperature. Specifically, in this embodiment, the first atomization temperature is 200℃-250℃, and the third atomization temperature is 400℃-550℃.

Example 4

The atomizer provided in Example 4 has a basically identical structure to the atomizer provided in Example 2, except that the two liquid storage chambers 11 of the atomizer provided in Example 2 are respectively the first liquid storage chamber 11-1 and the second liquid storage chamber 11-2 of Example 1, correspondingly storing the first medium to be atomized and the second medium to be atomized, and the two sub-substrates of the substrate 121 are respectively the first sub-substrate 121-1 and the second sub-substrate 121-2 of Example 1; and the two liquid storage chambers 11 of the atomizer provided in Example 4 are respectively the second liquid storage chamber 11-2 and the third liquid storage chamber 11-3 of Example 1, correspondingly storing the second medium to be atomized and the third medium to be atomized, and the two sub-substrates of the substrate 121 are respectively the second sub-substrate 121-2 and the third sub-substrate 121-3 of Example 1.

Specifically, the boiling point of the second medium to be atomized is 250°C-360°C; the boiling point of the third medium to be atomized is 400°C-600°C; the second medium to be atomized includes propylene glycol, glycerol and high-boiling point aroma substances, and the third medium to be atomized includes sweeteners. The second sub-matrix 121-2 has a plurality of second liquid guide holes 1213-2, and the third sub-matrix 121-3 has a plurality of third liquid guide holes 1213-3; the aperture of the second liquid guide hole 1213-2 is less than or equal to 20 μm, and the aperture of the third liquid guide hole 1213-3 is greater than or equal to 20 μm; and the aperture of the third liquid guide hole 1213-3 is greater than the aperture of the second liquid guide hole 1213-2.

In this embodiment, the heating element includes a second sub-heating element and a third sub-heating element that are independent of each other. The second sub-heating element is arranged in the second atomization area 1212a-2, and the third sub-heating element is arranged in the third atomization area 1212a-3. In response to receiving the suction signal, the host 2 controls the third sub-heating element to start heating for a period of time, and then the host 2 controls the second sub-heating element to start heating. Since the third sub-heating element starts heating in advance, the third atomization temperature of the third atomization area 1212a-3 is higher than the second atomization temperature. Specifically, in this embodiment, the second atomization temperature is 250℃-350℃, and the third atomization temperature is 400℃-550℃.

The above are only implementation methods of the present application, and are not intended to limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.

Claims (17)

1. A heating atomization control method, used for controlling the heating atomization of an atomizer, wherein the atomizer comprises a plurality of liquid storage chambers and a heating component; the liquid storage chamber stores a medium to be atomized, and at least part of the plurality of liquid storage chambers stores different media to be atomized; the heating component comprises a substrate and a heating element, and the heating element is arranged on the atomization surface of the substrate; or the heating component comprises a substrate and the substrate is at least partially conductive to serve as a heating element; the substrate has a plurality of atomization areas, and the plurality of atomization areas are arranged one-to-one with the plurality of liquid storage chambers; the method comprises: receiving a heating start signal; In response to receiving a heating start signal, the heating element is controlled to heat and atomize the medium to be atomized in the plurality of liquid storage cavities based on a preset strategy; wherein the preset strategy is related to the medium to be atomized stored in the liquid storage cavity corresponding to the atomization area. 2. The control method according to claim 1 is characterized in that the parameters of the substrate in different parts corresponding to the atomization areas are different; wherein the preset strategy is related to the parameters of the medium to be atomized stored in the liquid storage cavity corresponding to the atomization area and the substrate in the part corresponding to the atomization area. 3. The control method according to claim 2, characterized in that the substrate has a plurality of liquid guide holes, and the liquid guide holes located in different atomization zones have different apertures; wherein the preset strategy comprises: Controlling the heating element to heat the plurality of atomization zones to different atomization temperatures, wherein the atomization temperatures of the plurality of atomization zones are positively correlated with the boiling points of the to-be-atomized media corresponding to the plurality of atomization zones, and the atomization temperatures of the plurality of atomization zones are negatively correlated with the apertures of the liquid guide holes in the plurality of atomization zones; or, The substrate has a plurality of liquid guide holes, and the liquid guide holes located in different atomization zones have different lengths; wherein the preset strategy includes: The heating element is controlled to heat the multiple atomization zones to different atomization temperatures, the atomization temperatures of the multiple atomization zones are positively correlated with the boiling points of the to-be-atomized media corresponding to the multiple atomization zones, and the atomization temperatures of the multiple atomization zones are positively correlated with the lengths of the liquid guide holes in the multiple atomization zones. 4. The control method according to claim 3, wherein the atomizer comprises a first liquid storage chamber and a second liquid storage chamber; a first medium to be atomized is stored in the first liquid storage chamber, a second medium to be atomized is stored in the second liquid storage chamber, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized; the substrate comprises a first atomization area and a second atomization area, the first atomization area is arranged corresponding to the first liquid storage chamber, and the second atomization area is arranged corresponding to the second liquid storage chamber; the substrate comprises a plurality of first liquid guide holes located in the first atomization area and a plurality of second liquid guide holes located in the second atomization area; wherein the aperture of the first liquid guide hole is larger than the aperture of the second liquid guide hole, and/or the length of the first liquid guide hole is smaller than the length of the second liquid guide hole; characterized in that the preset strategy comprises: The first atomization zone is heated to a first atomization temperature to atomize the first medium to be atomized, and the second atomization zone is heated to a second atomization temperature to atomize the second medium to be atomized, wherein the first atomization temperature is lower than the second atomization temperature. 5. The control method according to claim 4, characterized in that the preset strategy comprises: In response to the time of receiving the heating start signal reaching a first preset time, starting to continuously heat the first atomization area to atomize the first medium to be atomized and continuously atomizing for a first atomization time; In response to the time of receiving the heating start signal reaching a second preset time, starting to continuously heat the second atomization area to atomize the second medium to be atomized and continuing to atomize for a second atomization time; Wherein, the first preset time is the same as the second preset time, or the first preset time is greater than the first preset time; and/or, the first atomization time is the same as or different from the second atomization time. 6. The control method according to claim 5, characterized in that the first atomization time is a fixed value or the first atomization time is the time from the start of atomization in the first atomization area to the end of suction; and/or, The second atomization time is a fixed value or the second atomization time is the time from the start of atomization in the second atomization area to the end of inhalation. 7. The control method according to claim 4, characterized in that the preset strategy comprises: In response to the time of receiving the heating start signal reaching a first preset time, starting to intermittently heat the first atomization area to atomize the first medium to be atomized, and controlling the atomization time of the first atomization area to atomize for a first interval time; In response to the time of receiving the heating start signal reaching a second preset time, starting to intermittently heat the second atomization area to atomize the second medium to be atomized, and controlling the second atomization area to atomize for a second atomization time at every second interval time; Among them, the first preset time is the same as the second preset time, or the first preset time is greater than the first preset time; and/or, the first atomization time is the same as or different from the second atomization time; and/or, the first interval time is the same as or different from the second interval time. 8. The control method according to any one of claims 5 to 7, characterized in that the first preset time and the second preset time are both 0; or, The second preset time is the same as the first preset time, the second preset time is greater than 0 and less than the first time threshold; the first time threshold is 2s-5s; or, The second preset time is greater than 0 and less than the first time threshold; the first preset time is greater than the second preset time and less than the first time threshold; the first time threshold is 2s-5s. 9. The control method according to claim 3, wherein the atomizer comprises a first liquid storage chamber, a second liquid storage chamber and a third liquid storage chamber; a first medium to be atomized is stored in the first liquid storage chamber, a second medium to be atomized is stored in the second liquid storage chamber, a third medium to be atomized is stored in the third liquid storage chamber, and a boiling point of the first medium to be atomized is lower than a boiling point of the second medium to be atomized, and a boiling point of the second medium to be atomized is lower than a boiling point of the third medium to be atomized; the substrate comprises a first atomization area, a second atomization area and a third atomization area, the first atomization area is arranged corresponding to the first liquid storage chamber, and the second atomization area The third atomization area is arranged corresponding to the second liquid storage cavity, and the third atomization area is arranged corresponding to the third liquid storage cavity; the substrate has a plurality of first liquid guide holes located in the first atomization area, a plurality of second liquid guide holes located in the second atomization area, and a plurality of third liquid guide holes located in the third atomization area, and the aperture of the first liquid guide hole is larger than the aperture of the second liquid guide hole, and the aperture of the second liquid guide hole is larger than the aperture of the third liquid guide hole; and/or, the length of the first liquid guide hole is smaller than the length of the second liquid guide hole, and the length of the second liquid guide hole is smaller than the length of the third liquid guide hole; characterized in that the preset strategy includes: The first atomization zone is heated to a first atomization temperature to atomize the first medium to be atomized, the second atomization zone is heated to a second atomization temperature to atomize the second medium to be atomized, and the third atomization zone is heated to a third atomization temperature to atomize the third medium to be atomized, wherein the first atomization temperature is lower than the second atomization temperature, and the second atomization temperature is lower than the third atomization temperature. 10. The control method according to claim 9, characterized in that the preset strategy comprises: In response to the time of receiving the heating start signal reaching a first preset time, starting to continuously heat the first atomization area to atomize the first medium to be atomized and continuously atomizing for a first atomization time; In response to the time of receiving the heating start signal reaching a second preset time, starting to continuously heat the second atomization area to atomize the second medium to be atomized and continuing to atomize for a second atomization time; In response to the time of receiving the heating start signal reaching a third preset time, starting to continuously heat the third atomization zone to atomize the third medium to be atomized and continuously atomizing for a third atomization time; Wherein, the first preset time, the second preset time and the third preset time are the same; or, the first preset time is equal to the second preset time, and the second preset time is greater than the third preset time; or, the first preset time is greater than the second preset time, and the second preset time is greater than the third preset time; and/or, At least two of the first atomization time, the second atomization time and the third atomization time are different, or the first atomization time, the second atomization time and the third atomization time are the same. 11. The control method according to claim 10, characterized in that the first atomization time is a fixed value or the first atomization time is the time from the start of atomization in the first atomization area to the end of suction; and/or, The second atomization time is a fixed value or the second atomization time is the time from the start of atomization in the second atomization area to the end of puffing; and/or, The third atomization time is a fixed value or the third atomization time is the time from the start of atomization in the third atomization area to the end of suction. 12. The control method according to claim 9, wherein the preset strategy comprises: In response to the time of receiving the heating start signal reaching a first preset time, starting to intermittently heat the first atomization area to atomize the first medium to be atomized, and controlling the atomization time of the first atomization area to atomize for a first interval time; In response to the time of receiving the heating start signal reaching a second preset time, starting to intermittently heat the second atomization area to atomize the second medium to be atomized, and controlling the second atomization area to atomize for a second atomization time at every second interval time; In response to the time of receiving the heating start signal reaching a third preset time, starting to intermittently heat the third atomization zone to atomize the third medium to be atomized, and controlling the third atomization zone to atomize for a third atomization time at every third interval time; Wherein, the first preset time, the second preset time and the third preset time are the same; or, the first preset time is equal to the second preset time, and the second preset time is greater than the third preset time; or, the first preset time is greater than the second preset time, and the second preset time is greater than the third preset time; and/or, At least two of the first atomization time, the second atomization time and the third atomization time are different, or the first atomization time, the second atomization time and the third atomization time are the same; and/or, At least two of the first interval time, the second interval time and the third interval time are different, or the first interval time, the second interval time and the third interval time are the same. 13. The control method according to any one of claims 10 to 12, characterized in that the first preset time, the second preset time, and the third preset time are all 0; or The third preset time is 0; the second preset time is greater than 0 and less than the first time threshold; the first preset time is greater than the second preset time and less than the first time threshold; the first time threshold is 2s-5s; or The third preset time is 0; the second preset time is the same as the first preset time, the second preset time is greater than 0 and less than the first time threshold; the first time threshold is 2-5s. 14. The control method according to claim 1, wherein the atomizer comprises a first liquid storage chamber, a second liquid storage chamber and a third liquid storage chamber; a first medium to be atomized is stored in the first liquid storage chamber, a second medium to be atomized is stored in the second liquid storage chamber, and a third medium to be atomized is stored in the third liquid storage chamber, and the boiling point of the first medium to be atomized is lower than the boiling point of the second medium to be atomized, and the boiling point of the second medium to be atomized is lower than the boiling point of the third medium to be atomized; the first medium to be atomized and the second medium to be atomized both comprise propylene glycol and glycerol; the content of propylene glycol and glycerol in the first medium to be atomized is different from the content of propylene glycol and glycerol in the second medium to be atomized; the third medium to be atomized comprises a sweetener; The substrate has a first atomization area, a second atomization area and a third atomization area, the first atomization area is arranged corresponding to the first liquid storage cavity, the second atomization area is arranged corresponding to the second liquid storage cavity, and the third atomization area is arranged corresponding to the third liquid storage cavity; the substrate has a plurality of first liquid guide holes located in the first atomization area, a plurality of second liquid guide holes located in the second atomization area, and a plurality of third liquid guide holes located in the third atomization area, and the aperture of the first liquid guide hole is larger than the aperture of the second liquid guide hole, and/or the length of the first liquid guide hole is smaller than the length of the second liquid guide hole; characterized in that the preset strategy includes: The first atomization zone is heated to a first atomization temperature to atomize the first medium to be atomized, the second atomization zone is heated to a second atomization temperature to atomize the second medium to be atomized, and the third atomization zone is heated to a third atomization temperature to atomize the third medium to be atomized; wherein the first atomization temperature is lower than the second atomization temperature, and the third atomization temperature is lower than the first atomization temperature; or, the first atomization temperature is lower than the third atomization temperature, and the third atomization temperature is higher than the first atomization temperature and lower than the second atomization temperature. 15. The control method according to any one of claims 1 to 14, wherein the heating element comprises a plurality of micro-heating elements arranged on the atomization surface of the substrate; each of the atomization areas is provided with a plurality of the micro-heating elements; characterized in that: The preset strategies include: The number of the micro heating elements that start to generate heat among the plurality of micro heating elements corresponding to different atomization areas is controlled. 16. An electronic atomization device, characterized in that it comprises A plurality of liquid storage chambers, wherein the liquid storage chambers store a medium to be atomized; different liquid storage chambers store different media to be atomized; A heating component, the heating component comprises a substrate and a heating element, the heating element is arranged on the atomization surface of the substrate; or the heating component comprises a substrate and the substrate is at least partially conductive to serve as a heating element; the substrate has a plurality of atomization areas, and the plurality of atomization areas are arranged in a one-to-one correspondence with the plurality of liquid storage cavities; A memory storing program instructions; The processor retrieves the program instructions from the memory to execute the heating atomization control method as described in any one of claims 1-15. 17. A computer-readable storage medium, characterized in that the computer-readable storage medium is used to store program instructions, and when the program instructions are executed by a processor, they are used to implement the heating atomization control method according to any one of claims 1 to 15.