CN118119864A - Optical film, polarizing plate, surface plate, image display panel, image display device, method for producing and selecting optical film, and method for evaluating fingerprint wiping property - Google Patents
Optical film, polarizing plate, surface plate, image display panel, image display device, method for producing and selecting optical film, and method for evaluating fingerprint wiping property Download PDFInfo
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Abstract
The invention provides an optical film with excellent antiglare property and good fingerprint wiping property. The optical film has a 1 st surface and a 2 nd surface which is a surface on the opposite side of the 1 st surface, wherein the optical film has an antireflection layer and an antiglare layer in this order from the 1 st surface toward the 2 nd surface, the 1 st surface has a concave-convex shape, and the 1 st surface is composed of ISO 25178-2:2012 is 0.05 μm or more, the 1 st surface satisfies the following formula 1, sw×Vmp is 2.00 (formula 1), where "Sw" is an inclination angle (degree) at which 30 μl of pure water in the 1 st surface flows down, and "Vmp" is an inclination angle (degree) of the 1 st surface defined by ISO 25178-2:2012, protruding peak solid volume (ml/m 2).
Description
Technical Field
The present disclosure relates to an optical film, and a polarizing plate, a surface plate, an image display panel, and an image display device using the optical film, and a method for manufacturing the optical film, a method for selecting the optical film, and a method for evaluating fingerprint wiping.
Background
An optical film may be provided on the surface of an image display device such as a display screen of a television, a notebook PC, or a desktop PC in order to suppress reflection of the background such as illumination and a person, or to suppress reflection on the surface.
As the optical film, patent documents 1 to 3 and the like have been proposed, for example.
Prior art literature
Patent literature
Patent document 1: international publication No. 2019/026466
Patent document 2: international publication No. 2019/026471
Patent document 3: japanese patent laid-open publication No. 2019-85473
Disclosure of Invention
Problems to be solved by the invention
The optical films of patent documents 1 and 2 are antiglare films having an antiglare layer with irregularities formed on the surface. In the optical film having the concave-convex shape on the surface, the fingerprint tends to enter the concave-convex shape, and thus the fingerprint wiping property tends to be lowered. The better the antiglare property is, the higher the tendency of the antiglare film to decrease in fingerprint wiping property is. The optical films of patent documents 1 and 2 have not been studied for antifouling properties.
The optical film of patent document 3 is a coating film in which the slip angle of oleic acid is 32 ° or less. The coating film of patent document 3 has a problem of easy wiping of fingerprints, but it cannot be said that the fingerprint wiping property is good.
If the fingerprint attached to the optical film is not sufficiently wiped, the optical characteristics of the portion having the fingerprint component and the portion having no fingerprint component are compared, and therefore the aesthetic property of the optical film is reduced. Particularly in the case of an optical film having an antireflection layer, the reflectance ratio of a portion having a fingerprint component to a portion having no fingerprint component increases, and the aesthetic properties of the optical film are greatly reduced.
The object of the present disclosure is to provide an optical film having an uneven surface and an antireflection layer on the surface, which has excellent antiglare properties and good fingerprint wiping properties. The present disclosure addresses the problem of providing a polarizing plate, a surface plate, an image display panel, and an image display device, each of which has excellent antiglare properties and good fingerprint wiping properties. The object of the present disclosure is to provide a method for producing an optical film having excellent antiglare properties and good fingerprint wiping properties. The object of the present disclosure is to provide a method for selecting an optical film having excellent antiglare properties and good fingerprint wiping properties. The present disclosure addresses the problem of providing an evaluation method that can easily evaluate fingerprint wiping properties.
Means for solving the problems
The present disclosure provides the following [1] to [15].
[1] An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, the unit of the tilt angle is degrees, and the unit of the protruding-peak solid volume is ml/m 2.
[2] A polarizing plate comprising a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material,
At least one of the first transparent protective plate and the second transparent protective plate is the optical film according to [1], and the 2 nd surface of the optical film is disposed so as to face the polarizer.
[3] A surface plate for an image display device, which is formed by laminating a protective film on a resin plate or a glass plate,
The protective film is the optical film according to [1], wherein the 2 nd surface of the optical film is disposed so as to face the resin plate or the glass plate.
[4] An image display panel having a display element and an optical film disposed on a light exit surface side of the display element, wherein the image display panel includes the optical film of [1] as the optical film.
[5] An image display device comprising the image display panel of [4 ].
[6] A method for producing an optical film according to [1], wherein,
The optical film manufacturing method comprises the following steps: a step 1 of forming an antiglare layer on a substrate; and a step 2 of forming an antireflection layer on the antiglare layer.
[7] A method for selecting an optical film, which selects an optical film satisfying the following selected conditions,
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, the unit of the tilt angle is degrees, and the unit of the protruding-peak solid volume is ml/m 2.
[8] An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
[9] A polarizing plate comprising a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material,
At least one of the first transparent protective plate and the second transparent protective plate is the optical film according to [8], and the 2 nd surface of the optical film is disposed so as to face the polarizer.
[10] A surface plate for an image display device, which is formed by laminating a protective film on a resin plate or a glass plate, wherein the protective film is the optical film of [8], and the 2 nd surface of the optical film is disposed to face the resin plate or the glass plate.
[11] An image display panel having a display element and an optical film disposed on a light exit surface side of the display element, wherein the image display panel comprises the optical film of [8] as the optical film.
[12] An image display device comprising the image display panel of [11 ].
[13] The method for producing an optical film according to [8], wherein the method for producing an optical film comprises: a step 1 of forming an antiglare layer on a substrate; and a step 2 of forming an antireflection layer on the antiglare layer.
[14] A method for selecting an optical film, which selects an optical film satisfying the following selected conditions,
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
[15] A method for evaluating fingerprint wiping properties, which comprises using a falling contact angle value measured by the following measurement as an evaluation index,
< Measurement of drop-down contact Angle >
A liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the surface of the object to be measured, and the liquid drop was dropped from a direction perpendicular to the surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
ADVANTAGEOUS EFFECTS OF INVENTION
The optical film, polarizing plate, surface plate, image display panel and image display device of the present disclosure are excellent in antiglare properties and can make fingerprint wiping properties good. The method for producing an optical film of the present disclosure can easily produce an optical film having excellent antiglare properties and good fingerprint wiping properties. The method for selecting an optical film of the present disclosure can efficiently select an optical film having excellent antiglare properties and good fingerprint wiping properties. The method for evaluating fingerprint erasability of the present disclosure can easily evaluate fingerprint erasability of a measurement object.
Drawings
Fig. 1 is a schematic cross-sectional view showing one embodiment of an optical film of the present disclosure.
Fig. 2 is a cross-sectional view illustrating one embodiment of an image display panel of the present disclosure.
Fig. 3 is a view for explaining the inclination angle (degree) of the pure water when the liquid drops flow down.
Fig. 4 is a schematic cross-sectional view showing one embodiment of an optical film of the present disclosure.
Fig. 5 is a cross-sectional view showing one embodiment of an image display panel of the present disclosure.
Detailed Description
Hereinafter, embodiments of the present disclosure will be described.
[ Optical film of embodiment 1]
The optical film of embodiment 1 of the present disclosure is as follows.
An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, the unit of the tilt angle is degrees, and the unit of the protruding-peak solid volume is ml/m 2.
Fig. 1 is a schematic cross-sectional view of the cross-sectional shape of an optical film 100 according to embodiment 1 of the present disclosure.
The optical film 100 of fig. 1 has: 1 st surface having a concave-convex shape; and a 2 nd surface which is a surface on the opposite side of the 1 st surface. In fig. 1, the upper surface is the 1 st surface, and the lower surface is the 2 nd surface.
The optical film of fig. 1 has an antireflection layer 30, an antiglare layer 20, and a substrate 10 in this order from the 1 st surface to the 2 nd surface.
Fig. 1 is a schematic cross-sectional view. That is, the scale of each layer and the scale of the uneven shape constituting the optical film 100 are schematically shown for ease of illustration, and are different from actual scales. Fig. 2 and 3 are also identical.
The optical film of embodiment 1 of the present disclosure is not limited to the laminated structure of fig. 1. For example, the optical film of embodiment 1 of the present disclosure may have a laminated structure without a base material. The optical film of embodiment 1 of the present disclosure may have layers other than the base material, the antiglare layer, and the antireflection layer.
< 1 St side >
The optical film of embodiment 1 of the present disclosure has a1 st face. Regarding the optical film of embodiment 1 of the present disclosure, it is preferable that the surface of the antireflection layer is the 1 st surface.
The optical film of embodiment 1 has a concave-convex shape on the 1 st side, and is manufactured by ISO 25178-2:2012 is 0.05 μm or more. When the 1 st surface has no uneven shape, the antiglare property of the optical film cannot be improved. By providing the 1 st surface with a concave-convex shape and providing the Sa of 0.05 μm or more, the antiglare property of the optical film can be easily improved.
The Sa in embodiment 1, item 1, is preferably 0.10 μm or more, more preferably 0.20 μm or more, and even more preferably 0.30 μm or more.
When Sa of the 1 st aspect is too large, scratch resistance of the optical film may be reduced. Therefore, sa in the 1 st aspect is preferably 0.80 μm or less, more preferably 0.60 μm or less, and still more preferably 0.45 μm or less.
The range of Sa in the 1 st aspect may be 0.05 μm or more and 0.80 μm or less, 0.05 μm or more and 0.60 μm or less, 0.05 μm or more and 0.45 μm or less, 0.10 μm or more and 0.80 μm or less, 0.10 μm or more and 0.60 μm or less, 0.10 μm or more and 0.45 μm or less, 0.20 μm or more and 0.80 μm or less, 0.20 μm or more and 0.60 μm or less, 0.20 μm or more and 0.45 μm or less, 0.30 μm or more and 0.80 μm or less, 0.30 μm or more and 0.60 μm or less, and 0.30 μm or more and 0.45 μm or less.
The 1 st side of the optical film of embodiment 1 satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle (degree) at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, protruding peak solid volume (ml/m 2).
In embodiment 1, by setting the value of sw×vmp in the 1 st surface to 2.00 or more, fingerprint wiping performance can be easily improved. Hereinafter, a relationship between sw×vmp and fingerprint wiping performance will be described.
Sw is the tilt angle (degree) at which 30. Mu.l of pure water in the 1 st plane flows down. In the present specification, the "inclination angle (degree) at which the droplets of 30. Mu.l of pure water flow down" is sometimes referred to as "pure water falling inclination angle". The fingerprint contains a large amount of moisture. Therefore, the smaller Sw of the 1 st surface, the weaker the adhesion of the 1 st surface to the fingerprint, and the tendency is that the fingerprint is easily removed. However, if Sw on the 1 st surface is only reduced, fingerprint wiping performance may not be satisfactory. In particular, when the antiglare property of the optical film is to be improved, it is difficult to improve the fingerprint wiping property by reducing the Sw of the 1 st surface.
Vmp is defined by ISO 25178-2:2012, protruding peak solid volume (ml/m 2). Vmp is a parameter indicating the volume of the protruding portion having a height higher than the core. The core corresponds to a portion having an average height in the concave-convex shape. The larger Vmp means the larger volume of the portion protruding from the core. In the present specification, the "portion protruding from the core portion" is sometimes referred to as a "protruding boss". Sa is not necessarily related to Vmp, but if Sa is increased to improve antiglare properties, vmp tends to be large. Further, when Vmp becomes large, the fingerprint easily enters between the protruding convex portions, and thus the fingerprint wiping property easily decreases. If Vmp on the 1 st surface is reduced in order to suppress the penetration of the fingerprint between the protruding projections, it is difficult to improve the antiglare property of the optical film. Further, it is difficult to make the fingerprint wiping property of the optical film good by reducing only the Vmp of the 1 st surface.
As described above, it is difficult to make the fingerprint wiping property of the optical film having antiglare property good by adjusting only Sw and only Vmp. Therefore, the optical film of embodiment 1 of the present disclosure has a value of sw×vmp of 2.00 or less, thereby improving fingerprint wiping performance. A Sw. Times. Vmp of 2.00 or less means that: sw and Vmp do not become extremely large, and at least any one of Sw and Vmp is small. Therefore, when sw×vmp is 2.00 or less, the fingerprint wiping performance of the optical film can be improved.
In embodiment 1, sw×Vmp is preferably 1.60 or less, more preferably 1.40 or less, and further preferably 1.20 or less.
Too small swx Vmp means that at least either of Sw and Vmp is too small. When Sw is too small, the content of the fluorine compound and the silicone compound in the antireflection layer increases, and the scratch resistance of the optical film tends to decrease. When Vmp is too small, sa becomes small, and antiglare properties tend to decrease. Therefore, sw×Vmp is preferably 0.15 or more, more preferably 0.25 or more, still more preferably 0.40 or more, and still more preferably 0.60 or more.
In embodiment 1, embodiments in the range of sw×vmp in the 1 st surface include 0.15 to 2.00, 0.15 to 1.60, 0.15 to 1.40, 0.15 to 1.20, 0.25 to 2.00, 0.25 to 1.60, 0.25 to 1.40, 0.25 to 1.20, 0.40 to 2.00, 0.40 to 1.40, 0.40 to 1.20, 0.60 to 2.00, 0.60 to 1.60, 0.60 to 1.40.
In embodiment 1, in order to easily make sw×vmp 1.60 or less, sw on the 1 st surface is preferably 65 (degrees) or less, more preferably 40 (degrees) or less, and further preferably 30 (degrees) or less.
In embodiment 1, in order to suppress the deterioration of the scratch resistance of the optical film, sw of the 1 st surface is preferably 10 (degrees) or more, more preferably 13 (degrees) or more, and still more preferably 17 (degrees) or more.
In embodiment 1, embodiments in the range of Sw in the 1 st aspect include 10 degrees to 65 degrees, 10 degrees to 40 degrees, 10 degrees to 30 degrees, 13 degrees to 65 degrees, 13 degrees to 40 degrees, 13 degrees to 30 degrees, 17 degrees to 65 degrees, 17 degrees to 40 degrees, and 17 degrees to 30 degrees.
Regarding the optical film of embodiment 1 of the present disclosure, the pure water contact angle of the 1 st surface is preferably 100 degrees or more and 120 degrees or less, more preferably 110 degrees or more and 115 degrees or less.
In the present specification, 1.0. Mu.L of pure water was dropped on the 1 st surface side surface with respect to the contact angle of pure water, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
In embodiment 1, in order to easily make Sw×Vmp 1.60 or less, the Vmp on the 1 st plane is preferably 0.100 (ml/m 2) or less, more preferably 0.080 (ml/m 2) or less, still more preferably 0.060 (ml/m 2) or less, and still more preferably 0.045 (ml/m 2) or less.
In embodiment 1, in order to make antiglare properties satisfactory, the Vmp on the 1 st surface is preferably 0.005 (ml/m 2) or more, more preferably 0.007 (ml/m 2) or more, still more preferably 0.010 (ml/m 2) or more, and still more preferably 0.020 (ml/m 2) or more.
The embodiment of the range of Vmp in the 1 st aspect may be from 0.005ml/m 2 to 0.100ml/m 2, from 0.005ml/m 2 to 0.080ml/m 2, from 0.005ml/m 2 to 0.060ml/m 2, from 0.005ml/m 2 to 0.045ml/m 2, from 0.007ml/m 2 to 0.100ml/m 2, and, 0.007ml/m 2 or more and 0.080ml/m 2 or less, 0.007ml/m 2 or more and 0.060ml/m 2 or less, 0.007ml/m 2 or more and 0.045ml/m 2 or less, 0.010ml/m 2 or more and 0.100ml/m 2 or less, 0.010ml/m 2 or more and 0.080ml/m 2 or less, 0.010ml/m 2 -0.060 ml/m 2, 0.010ml/m 2 -0.045 ml/m 2 -0.020 ml/m 2 -0.100 ml/m 2 -0.020 ml/m 2 -0.080 ml/m 2 -0.020 ml/m 2 -0.060 ml/m 2 -0, 0.020ml/m 2 or more and 0.045ml/m 2 or less.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In the present specification, the "pure water falling inclination angle" of the optical film is measured according to the following steps (1) to (3). The measurement of the steps (1) to (3) below can be performed, for example, by using the product of the "DropMaster" series of the synergetic interface science company, the product number of which is "DMo-701", and using "SA-301" as an accessory.
As the pure water, general pure water can be used. In general, the resistivity of pure water is 0.1 M.OMEGA.cm or more and 15 M.OMEGA.cm or less.
(1) Samples of 2cm x 8cm size were cut from the optical film. A double-sided tape was attached to the 2 nd surface side of the sample, and the sample was fixed to a horizontal stage having an inclination angle of 0 degrees via the double-sided tape. The size of the double-sided adhesive tape is more than 8cm long and 5mm wide. When the sample is fixed to the stage, the sample is prevented from wrinkling, and no air bubbles are introduced between the sample and the stage.
(2) 30. Mu.l of pure water was dropped onto the 1 st surface of the sample.
(3) The stage on which the sample was placed was gradually tilted at a speed of 2 °/1 sec. When the end of the droplet was moved by 0.2835mm or more, it was determined that the droplet was flowing down. The angle of the stage at which the liquid droplets flow down is referred to as "pure water falling inclination angle". "stage angle" refers to the angle that a horizontal plane makes with the plane of the stage.
Fig. 3 is a view for explaining the inclination angle (degree) of the pure water when the liquid drops flow down. "θ" in fig. 3 corresponds to the angle of the stage. In fig. 3, reference numeral 200 denotes a horizontal plane, reference numeral 300 denotes a plane of a stage, and reference numeral 400 denotes a droplet. In fig. 3, the optical film between the stage plane 300 and the liquid 400 is omitted.
In the present specification, vmp, vvc, and Vvv are calculated by setting the load area ratio for separating the core portion from the protruding peak portion to 10% and the load area ratio for separating the core portion from the protruding valley portion to 80%.
In the present specification, sxp described later refers to a difference between a height having a load area ratio of 2.5% and a height having a load area ratio of 50%.
Regarding "in this specification, xxx. The term "refers to the description common to embodiment 1 and embodiment 2 unless otherwise specified. For example, the definition of Vmp and the like described above is a description common to embodiment 1 and embodiment 2.
In the present specification, the surface shapes of Sa, vmp, vvv, vvc, sxp and Sal and the like are measured using a confocal laser microscope. Examples of confocal laser microscopes include the "VK-X" series of KEYENCE corporation. By using the "multi-file analysis application" of the "VK-X" series, sa, vmp, vvv, vvc, sxp and Sal can be calculated easily.
The measurement conditions for the "VK-X" series measurement Sa, vmp, vvv, vvc, sxp and Sal are preferably the same as those described in the examples. For example, the F-operation is preferably set to planar inclination correction (region specification). The measurement region is preferably rectangular with one side of 50 μm or more and 200 μm or less, and the measurement points are preferably 500 points or more and 2000 points or less on each side.
In the present specification, unless otherwise specified, the surface shape (Sa, vmp, vvv, vvc, sxp and Sal), angle (pure water falling inclination angle, pure water contact angle, falling contact angle), element ratio (F/inorganic Si, organic Si/inorganic Si, F/organic Si, etc.), optical physical properties (R SCI, haze, total light transmittance, transmission image sharpness, etc.), and average value of measured values at 14 points after removing maximum value and minimum value from measured values at 16 points are referred to.
In the present specification, regarding the 16 measurement sites, a region 1cm from the outer edge of the measurement sample was removed as a margin, and regarding the remaining region, 16 sites, which are intersections when lines dividing the longitudinal direction and the lateral direction by 5 are drawn, were taken as the centers of measurement. For example, when the measurement sample is rectangular, a region of 0.5cm from the outer edge of the rectangle is removed as a margin, and measurement is performed centering on 16 points of intersection of broken lines which are 5 equal parts in the longitudinal direction and the lateral direction of the remaining region. Then, the average value of 14 measured values obtained by removing the maximum value and the minimum value from the measured values at 16 was taken as the value of the parameter. In the case where the measurement sample has a shape other than a rectangle, such as a circle, an ellipse, a triangle, and a pentagon, a rectangle inscribed in the shape is drawn, and the measurement is performed at 16 points by the above-described method with respect to the rectangle.
In the present specification, the surface shape (Sa, vmp, vvv, vvc, sxp and Sal), the angle (pure water falling inclination angle, pure water contact angle, falling contact angle), the surface tension, the element ratio (F/inorganic Si, organic Si/inorganic Si, F/organic Si, etc.), the optical properties (R SCI, haze, total light transmittance, transmission image sharpness, etc.), and unless otherwise specified, are measured under conditions of a temperature of 23.+ -. 5 ℃ and a relative humidity of 40% to 65%. Before each measurement is started, the target sample is exposed to the atmosphere for 30 minutes to 60 minutes, and then the measurement is performed.
Regarding the optical film of embodiment 1 of the present disclosure, the 1 st side is composed of ISO 25178-2:2012 is 0.005ml/m 2 or more and 0.100ml/m 2 or less. Vvv is a parameter indicating the volume of the protruding portion having a depth deeper than the core. By setting Vvv to 0.005ml/m 2 or more, antiglare properties can be easily improved. By setting Vvv to 0.100ml/m 2 or less, fingerprint wiping properties can be easily improved.
The lower limit of Vvv is more preferably 0.007ml/m 2 or more, still more preferably 0.010ml/m 2 or more. The upper limit of Vvv is more preferably 0.080ml/m 2 or less, still more preferably 0.060ml/m 2 or less.
The embodiment of Vvv in the 1 st aspect may be from 0.005ml/m 2 to 0.100ml/m 2, from 0.005ml/m 2 to 0.080ml/m 2, from 0.005ml/m 2 to 0.060ml/m 2, from 0.007ml/m 2 to 0.100ml/m 2, from 0.007ml/m 2 to 0.080ml/m 2, from 0.007ml/m 2 to 0.060ml/m 2, from 0.010ml/m 2 to 0.100ml/m 2, from 0.010ml/m 2 to 0.080ml/m 2.
In embodiment 1, with respect to the 1 st face, vvv of the optical film of the present disclosure, and the film is manufactured by ISO 25178-2:2012 (Vvv/Vvc) is preferably 0.10 or less. By setting Vvv/Vvc to 0.10 or less, fingerprint wiping properties can be easily improved. Vvv/Vvc is more preferably 0.09 or less, still more preferably 0.08 or less.
In embodiment 1, the ratio of Vmp to Vvc (Vmp/Vvc) is preferably 0.10 or less with respect to the 1 st plane of the optical film of the present disclosure. By setting Vmp/Vvc to 0.10 or less, fingerprint wiping performance can be easily improved. Vvv/Vvc is more preferably 0.09 or less, still more preferably 0.08 or less.
In embodiment 1, regarding the 1 st side of the optical film of the present disclosure, the optical film is manufactured by ISO 25178-2:2012 is preferably 4.0 μm or more and 12.0 μm or less.
Sal is a parameter that looks at the lateral direction. The smaller Sal is, the denser the surface 1 has, the larger Sal is, and the wider the interval between the surface 1 and the concavity is. The value of "average length RSm of roughness curve element" specified in JIS B0601 is hardly affected by fine irregularities, and only large irregularities are affected. On the other hand, the value of Sal is different from RSm in that not only large irregularities but also fine irregularities are affected. Further, even if the interval between the projections and the depressions is wide, sal tends to be small if the projections are small or the shapes of the projections and the depressions are complex. In addition, if the convex portion has a monotonous shape, sal tends to be large.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
When Sal is 4.0 μm or more, fingerprint wiping properties can be easily improved. When Sal is 12.0 μm or less, antiglare properties can be easily improved.
The lower limit of Sal is more preferably 5.0 μm or more, and still more preferably 6.0 μm or more. The upper limit of Sal is more preferably 11.0 μm or less, and still more preferably 10.0 μm or less.
The Sal of the 1 st aspect may be in the range of 4.0 μm or more and 12.0 μm or less, 4.0 μm or more and 11.0 μm or less, 4.0 μm or more and 10.0 μm or less, 5.0 μm or more and 12.0 μm or less, 5.0 μm or more and 11.0 μm or less, 5.0 μm or more and 10.0 μm or less, 6.0 μm or more and 12.0 μm or less, 6.0 μm or more and 11.0 μm or less, 6.0 μm or more and 10.0 μm or less.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, regarding the optical film of the present disclosure, it is preferable that the element ratio obtained by analyzing the surface region on the 1 st plane side by X-ray photoelectron spectroscopy satisfies the following formulas 2 to 4.
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
In the formulas 2 to 4, "F" is a ratio of fluorine element, "inorganic Si" is a ratio of silicon element attributed to inorganic silicon compound, and "organic Si" is a ratio of silicon element attributed to organic silicon compound.
In the present specification, "surface area on the 1 st surface side" means an area from the surface on the 1 st surface side to a depth of 10 nm. In the present specification, "X-ray photoelectron spectroscopy" is sometimes referred to as "XPS". In the present specification, the element ratio of the surface region on the 1 st surface side can be measured by the method described in examples.
The inorganic Si of the surface area of the 1 st side of the optical film is mainly derived from silica particles. The organic Si and F in the surface area of the 1 st side of the optical film are mainly derived from leveling agents.
The inorganic Si and the organic Si can be separated by peak separation of the inorganic component and the organic component from the X-ray photoelectron spectrum of the Si2p orbit.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In the surface region of the 1 st surface of the optical film, inorganic Si can lower the refractive index of the 1 st surface, and on the other hand, fingerprint wiping properties tend to be deteriorated. Further, by including a predetermined amount or more of organic Si and F with respect to inorganic Si in the surface region of the 1 st surface of the optical film, fingerprint wiping performance tends to be improved. Further, by incorporating the machines Si and F in the surface region of the 1 st surface of the optical film with good balance, fingerprint wiping performance tends to be good. Therefore, when F/inorganic Si is 3.5 or more, organic Si/inorganic Si is 0.08 or more, and F/organic Si is 5.0 or more and 50.0 or less, sw can be easily reduced, and equation 1 can be easily satisfied.
Further, by setting the F/inorganic Si to 10.0 or less and the organic Si/inorganic Si to 1.00 or less, it is possible to easily suppress a decrease in the coatability of the antireflection layer.
The lower limit of F/inorganic Si is more preferably 4.0 or more, still more preferably 4.5 or more, and the upper limit thereof is more preferably 9.0 or less, still more preferably 8.0 or less.
The lower limit of the organic Si/inorganic Si is more preferably 0.10 or more, still more preferably 0.15 or more, and the upper limit thereof is more preferably 0.80 or less, still more preferably 0.50 or less.
The lower limit of F/organic Si is more preferably 10.0 or more, still more preferably 15.0 or more, still more preferably 22.0 or more, and the upper limit thereof is more preferably 40.0 or less, still more preferably 35.0 or less.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Examples of the range of F/inorganic Si include 3.5 to 10.0, 3.5 to 9.0, 3.5 to 8.0, 4.0 to 10.0, 4.0 to 9.0, 4.0 to 8.0, 4.5 to 10.0, 4.5 to 9.0, 4.5 to 4.0, and 4.5 to 8.0.
Examples of the organic Si/inorganic Si range include 0.08 to 1.00, 0.08 to 0.80, 0.08 to 0.50, 0.10 to 1.00, 0.10 to 0.80, 0.10 to 0.50, 0.15 to 1.00, 0.15 to 0.80, and 0.15 to 0.50.
Examples of the range of F/organic Si include 5.0 to 50.0, 5.0 to 40.0, 5.0 to 35.0, 10.0 to 50.0, 10.0 to 40.0, 10.0 to 35.0, 15.0 to 50.0, 15.0 to 40.0, 15.0 to 35.0, 22.0 to 22.0, 22.0 to 40.0, and 35.0.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In the optical film of the present disclosure, the ratio of the inorganic Si to the total element is preferably 2 at% or more and 20 at% or less with respect to the element ratio obtained by analyzing the surface region on the 1 st plane side by X-ray photoelectron spectroscopy. When the proportion of the inorganic Si to the total elements is 2 atomic% or more, the refractive index of the 1 st plane can be easily reduced, and thus the antireflection property of the optical film can be easily improved. By setting the ratio of inorganic Si to 20 at% or less, it is possible to easily set the F/inorganic Si to 3.5 or more and the organic Si/inorganic Si to 0.08 or more.
The lower limit of the proportion of the inorganic Si to all elements is more preferably 3 at% or more, still more preferably 4 at% or more, and the upper limit thereof is more preferably 15 at% or less, still more preferably 12 at% or less.
Examples of the ratio range of the inorganic Si to all elements include 2 atomic% to 20 atomic%, 2 atomic% to 15 atomic%, 2 atomic% to 12 atomic%, 3 atomic% to 20 atomic%, 3 atomic% to 15 atomic%, 3 atomic% to 12 atomic%, 4 atomic% to 20 atomic%, 4 atomic% to 15 atomic%, and 4 atomic% to 12 atomic%.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
< Laminated Structure >
The optical film of embodiment 1 of the present disclosure has an antireflection layer and an antiglare layer in order from the 1 st face toward the 2 nd face. The outermost surface on the 1 st surface side of the optical film of embodiment 1 is preferably an antireflection layer.
The optical film of the present disclosure may also have layers other than the antireflection layer and the antiglare layer. Examples of the layer other than the antireflection layer and the antiglare layer include a base material, an antistatic layer, and an adhesive layer.
The optical film of the present disclosure preferably has an antireflection layer, an antiglare layer, and a base material in this order from the 1 st surface to the 2 nd surface.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Base material
For ease of production and handleability, the optical film of embodiment 1 preferably has a base material.
The base material preferably has light transmittance, smoothness, heat resistance, and excellent mechanical strength. Examples of such a substrate include plastic films such as polyester, triacetyl cellulose (TAC), cellulose diacetate, cellulose acetate butyrate, polyamide, polyimide, polyether sulfone, polysulfone, polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl acetal, polyether ketone, polymethyl methacrylate, polycarbonate, polyurethane, and amorphous Olefin (COP). The base material may be formed by bonding 2 or more plastic films.
Among the plastic films, the polyester film obtained by stretching is preferable for mechanical strength and dimensional stability, and the polyester film obtained by biaxial stretching is more preferable. Examples of the polyester film include polyethylene terephthalate film and polyethylene naphthalate film. TAC films and acrylic films are preferred because they are easy to make light transmittance and optical isotropy good. COP films and polyester films are preferable because they are excellent in weather resistance.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The thickness of the base material is preferably 5 μm or more and 300 μm or less, more preferably 20 μm or more and 200 μm or less, and still more preferably 30 μm or more and 120 μm or less.
When the optical film is to be thinned, the upper limit of the thickness of the base material is preferably 100 μm or less, and more preferably 80 μm or less. In the case where the substrate is a low moisture permeability substrate such as polyester, COP, or acrylic, the upper limit of the thickness of the substrate for thinning is preferably 60 μm or less, and more preferably 40 μm or less. Even in the case of a large screen, if the upper limit of the thickness of the base material is in the above range, it is preferable in that deformation can be made difficult.
In the present specification, the thickness of the substrate is measured by a film thickness measuring instrument. Examples of the film thickness measuring instrument include a digital display standard outside micrometer (model: MDC-25 SX) from Sanfeng corporation. The thickness of the substrate may be any value as long as the average value obtained by measuring 10 points at random is the above value.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Regarding the base material, JIS K7361-1: the total light transmittance of 1997 is preferably 70% or more, more preferably 80% or more, and further preferably 85% or more.
Regarding the base material, JIS K7136: the haze of 2000 is preferably 10% or less, more preferably 5% or less, and further preferably 3% or less.
In order to improve the adhesion, the surface of the base material may be subjected to physical treatment such as corona discharge treatment or chemical treatment. The substrate may have an easily adhesive layer on the surface.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Anti-dazzle layer
In embodiment 1, the antiglare layer is a layer that takes on the center of antiglare properties.
In embodiment 1, the antiglare layer can be formed by, for example, (a) a method using an embossing roller, (B) an etching treatment, (C) molding by a mold, (D) formation of a coating film by application, or the like. The mold-based molding of (C) is preferable for easy obtaining of stable surface shape, and the coating film formation by coating of (D) is preferable for improving productivity and coping with various kinds.
In the method (C), for example, the antiglare layer can be formed by flowing a resin into a mold and taking out the molded resin from the mold. The molded resin taken out of the mold may be disposed on a substrate. As the mold, a mold in which the surface shape of the antiglare layer is reversed is used. Such a mold can be produced, for example, by the following methods (c 1-1) to (c 1-2) or (c 2) below.
(C 1-1) producing a shape in which Sa, vmp, and the like are within a predetermined range by simulation. Further, the simulated shape is inverted.
(C 1-2) engraving the surface of the metal with a laser or processing the surface of the metal with photolithography so that the inverted shape is reflected, thereby obtaining a mold.
(C2) The antiglare layer produced by (D) was molded by a general electroforming method to reverse the shape of the antiglare layer.
In the case of forming the antiglare layer by (D), for example, the following methods (D1) and (D2) are exemplified. (d1) The range of the surface shape such as Sa and Vmp is preferable in that it is easier to adjust than (d 2).
(D1) A method of forming an antiglare layer having particle-based irregularities by coating and drying a coating liquid containing a binder resin and particles.
(D2) A method of forming irregularities by applying a coating liquid containing any resin and a resin having poor compatibility with the resin and separating the resin phase.
Thickness-
In order to achieve balance with curl suppression, mechanical strength, hardness, and toughness, the thickness T of the antiglare layer is preferably 2.0 μm or more and 10.0 μm or less, more preferably 3.0 μm or more and 8.0 μm or less, and still more preferably 4.0 μm or more and 6.0 μm or less.
In the present specification, the thickness of the antiglare layer can be calculated by selecting arbitrary 20 sites on a cross-sectional photograph of an optical film obtained by a scanning transmission electron microscope, and calculating the average value thereof. Preferably, the acceleration voltage of STEM is 10kV to 30kV, and the magnification of STEM is 1000 times to 7000 times.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Component-
The antiglare layer preferably mainly contains a resin component. The antiglare layer may further include, if necessary: particles such as organic particles and inorganic particles; a nano-unit of particles; refractive index regulator, antistatic agent, leveling agent, ultraviolet absorber, light stabilizer, antioxidant, viscosity regulator, and other components such as thermal polymerization initiator.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The antiglare layer preferably comprises a binder resin and particles.
As the particles, organic particles and inorganic particles can be cited, and inorganic particles are preferable. That is, the antiglare layer preferably contains a binder resin and inorganic particles. In addition, the antiglare layer more preferably contains a binder resin, inorganic particles, and organic particles.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Particles-
Examples of the inorganic particles include silica, alumina, zirconia, and titania, and silica is preferable. Among the inorganic particles, amorphous inorganic particles are preferable, and amorphous silica is more preferable.
Examples of the organic particles include particles containing 1 or more resins selected from polymethyl methacrylate, polyacrylic acid-styrene copolymer, melamine resin, polycarbonate, polystyrene, polyvinyl chloride, benzoguanamine-melamine-formaldehyde condensate, silicone, fluorine-based resin, polyester-based resin, and the like.
The amorphous inorganic particles are inorganic particles having no specific shape, which are obtained by pulverizing inorganic particles having a large particle diameter and classifying them.
As the particles, inorganic particles are preferably contained. Further, the particles are more preferably amorphous inorganic particles, and further preferably amorphous inorganic particles and organic particles. As the amorphous inorganic particles, amorphous silica is preferable.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Amorphous inorganic particles have a tendency to easily increase Sa and easily decrease Sal compared to spherical particles. However, if the particle size distribution of the amorphous inorganic particles is too wide, vmp tends to be large, and it is difficult to satisfy formula 1. In particular, if the amorphous inorganic particles are aggregated, vmp becomes larger, and it becomes more difficult to satisfy formula 1. On the other hand, if the particle size distribution of the amorphous inorganic particles is too narrow, coating suitability tends to be lowered. Therefore, the cumulative distribution of the volume basis of the particle diameter of the amorphous inorganic particles is preferably in the range described later. However, if the inorganic particles are used alone, aggregation tends to occur. Therefore, in embodiment 1, in order to easily satisfy Sa and formula 1, it is preferable to use organic particles in combination with the particle size distribution of the amorphous particles in the range described later.
In embodiment 1, regarding inorganic particles such as amorphous inorganic particles, it is preferable that the cumulative distribution d10 of the volume basis of the particle diameter, the cumulative distribution d50 of the volume basis of the particle diameter, and the cumulative distribution d90 of the volume basis of the particle diameter satisfy the following relationships of (1) and (2).
1.5≤d50/d10≤4.0 (1)
1.0≤d90/d50≤3.0 (2)
A d50/d10 of 1.5 or more means that the particle size distribution of the inorganic particles in the region where the particle size is equal to or smaller than the average is broad. When d50/d10 is 1.5 or more, fine irregularities are easily provided on the surface of the irregularities, and therefore Sal can be easily reduced. By setting d50/d10 to 4.0 or less, an increase in the amount of inorganic particles buried in the antiglare layer can be suppressed, and the efficiency of adding inorganic particles can be improved.
A d90/d50 of 1.0 or more means that the particle size distribution of the inorganic particles in the region where the particle size is equal to or greater than the average particle size is broad. By setting d90/d50 to 1.0 or more, vmp can be easily increased and Sal can be easily increased. When d90/d50 is 3.0 or less, it is possible to easily suppress that Vmp becomes excessively large and Sal becomes excessively large.
The lower limit of d50/d10 is more preferably 2.0 or more, still more preferably 2.3 or more, and the upper limit is more preferably 3.5 or less, still more preferably 3.2 or less.
The lower limit of d90/d50 is more preferably 1.3 or more, still more preferably 1.5 or more, and the upper limit is more preferably 2.5 or less, still more preferably 2.0 or less.
In this specification, d10, d50 and d90 of inorganic particles such as amorphous inorganic particles are measured by a laser diffraction method.
In embodiment 1, the cumulative distribution d50 of the volume basis of the particle diameters of inorganic particles such as amorphous inorganic particles is preferably 2.5 μm or more and 5.5 μm or less, more preferably 3.0 μm or more and 5.0 μm or less, and still more preferably 3.3 μm or more and 4.7 μm or less.
When the d50 is 2.5 μm or more, an excessive increase in the number of inorganic particles can be suppressed, and therefore Sal can be easily suppressed from becoming too small. When the d50 is 5.5 μm or less, the excessive decrease in the number of inorganic particles can be suppressed, and therefore, the excessive increase in Sal can be easily suppressed.
The thickness T of the antiglare layer and d50 of inorganic particles such as amorphous inorganic particles are preferably 0.55 to 1.00, more preferably 0.60 to 0.95, and still more preferably 0.70 to 0.90.
By setting the d50/T to 0.55 or more, sal can be easily reduced. By setting d50/T to 1.00 or less, sal can be easily increased.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The thickness T of the antiglare layer and d90, d90/T of inorganic particles such as amorphous inorganic particles are preferably 1.00 to 1.50, more preferably 1.08 to 1.45, and still more preferably 1.20 to 1.40.
By setting d90/T to 1.00 or more, vmp can be easily increased. By setting d90/T to 1.50 or less, vmp can be easily reduced.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The content of the inorganic particles such as the amorphous inorganic particles is preferably 8 parts by mass or more and 40 parts by mass or less, more preferably 12 parts by mass or more and 30 parts by mass or less, and still more preferably 15 parts by mass or more and 28 parts by mass or less, with respect to 100 parts by mass of the binder resin.
By setting the content of inorganic particles such as amorphous inorganic particles to 8 parts by mass or more, excessive reduction in the number of inorganic particles can be suppressed, and thus the inorganic particles are densely arranged, and valleys are formed between the inorganic particles. Therefore, vvv is equal to or larger than a predetermined value, and further Sal does not become excessively large, so that antiglare property can be easily improved.
By setting the content of inorganic particles such as amorphous inorganic particles to 40 parts by mass or less, an excessive increase in the number of inorganic particles can be suppressed, and therefore, sal can be easily suppressed from becoming excessively small.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, the content of the organic particles is preferably 1 part by mass or more and 25 parts by mass or less, more preferably 3 parts by mass or more and 18 parts by mass or less, and still more preferably 8 parts by mass or more and 14 parts by mass or less, with respect to 100 parts by mass of the binder resin.
By setting the content of the organic particles to 1 part by mass or more, aggregation of the inorganic particles can be easily suppressed. Further, by setting the content of the organic particles to 1 part by mass or more, it is possible to suppress excessive reduction in the number of the organic particles, and thus it is possible to easily suppress excessive increase in Vmp.
Since the particle size distribution of the organic particles is relatively uniform, the Sal tends to be smaller as the content of the organic particles increases. Therefore, when the content of the organic particles is 25 parts by mass or less, sal can be suppressed from becoming too small, and fingerprint wiping properties can be easily improved.
In embodiment 1, the average particle diameter of the organic particles is preferably 1.0 μm or more and 5.0 μm or less, more preferably 1.2 μm or more and 3.0 μm or less, and still more preferably 1.3 μm or more and 2.5 μm or less.
By setting the average particle diameter of the organic particles to 1.0 μm or more, an excessive increase in the number of the organic particles can be suppressed, and therefore, sal can be easily suppressed from becoming excessively small. Therefore, by setting the average particle diameter of the organic particles to 1.0 μm or more, fingerprint wiping properties can be easily improved. By setting the average particle diameter of the organic particles to 5.0 μm or less, excessive reduction in the number of the organic particles can be suppressed, and hence, excessive increase in Vmp can be easily suppressed.
In the present specification, the average particle diameter of the organic particles is a value obtained as a volume average value d50 in the laser diffraction method.
In embodiment 1, the particle size distribution of the organic particles is preferably narrow. Specifically, in embodiment 1, the proportion of the particles within the range of ±0.5 μm of the average particle diameter of the organic particles is preferably 80% by volume or more, more preferably 85% by volume or more, and still more preferably 90% or more of the total amount of the organic particles. By widening the particle size distribution of inorganic particles such as amorphous inorganic particles and narrowing the particle size distribution of organic particles, vmp can be reduced, and equation 1 can be easily satisfied.
Examples of the shape of the organic particles include spherical, disk-like, rugby-ball-like, and amorphous. Among these shapes, spherical organic particles are preferable for easy control of particle size distribution.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, the ratio of the average particle diameter of the organic particles to the thickness of the antiglare layer (average particle diameter of the organic particles/thickness of the antiglare layer) is preferably 0.20 or more and 0.70 or less, more preferably 0.23 or more and 0.50 or less, and still more preferably 0.25 or more and 0.35 or less. By setting the average particle diameter of the organic particles/the thickness of the antiglare layer to the above range, vmp, sa, and Sal can be easily set to the above range.
Inorganic particles
The antiglare layer may further contain inorganic fine particles in addition to the binder resin and the particles. In the present specification, the inorganic fine particles and the above-mentioned particles can be distinguished by average particle diameters.
By including the inorganic fine particles in the antiglare layer, the difference between the refractive index of the particles and the refractive index of the composition of the antiglare layer other than the particles becomes small, and the internal haze can be easily reduced.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Examples of the inorganic fine particles include fine particles composed of silica, alumina, zirconia, titania, and the like. Among them, silica which easily suppresses the generation of internal haze is preferable.
The average particle diameter of the inorganic fine particles is preferably 1nm to 200nm, more preferably 2nm to 100nm, still more preferably 5nm to 50 nm.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Binder resin-
In order to easily improve the scratch resistance, the binder resin preferably contains a cured product of a curable resin composition such as a cured product of a thermosetting resin composition or a cured product of an ionizing radiation curable resin composition, and more preferably contains a cured product of an ionizing radiation curable resin composition.
The binder resin may contain a thermoplastic resin within a range that does not impair the effects of the present disclosure.
In order to easily improve the scratch resistance, the ratio of the cured product of the curable resin composition to the total amount of the binder resin is preferably 80% by mass or more, more preferably 90% by mass or more, and still more preferably 100% by mass.
The thermosetting resin composition is a composition containing at least a thermosetting resin, and is a resin composition cured by heating.
Examples of the thermosetting resin include acrylic resin, urethane resin, phenol resin, urea melamine resin, epoxy resin, unsaturated polyester resin, and silicone resin. To the thermosetting resin composition, a curing agent is added as necessary to these curable resins.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The ionizing radiation-curable resin composition is a composition containing a compound having an ionizing radiation-curable functional group (hereinafter, also referred to as "ionizing radiation-curable compound").
Examples of the ionizing radiation-curable functional group include an ethylenically unsaturated bond group such as a (meth) acryloyl group, a vinyl group, and an allyl group, an epoxy group, and an oxetanyl group. The ionizing radiation-curable compound is preferably a compound having an ethylenically unsaturated bond group, more preferably a compound having 2 or more ethylenically unsaturated bond groups, and particularly preferably a polyfunctional (meth) acrylate compound having 2 or more ethylenically unsaturated bond groups. As the polyfunctional (meth) acrylate compound, any of monomers and oligomers can be used.
In the present specification, ionizing radiation refers to electromagnetic waves or charged particle beams having energy quanta capable of polymerizing or crosslinking molecules among the electromagnetic waves or charged particle beams. For the ionizing radiation, ultraviolet (UV) or Electron Beam (EB) is generally used, and charged particle beams such as electromagnetic waves such as X-rays and γ -rays, α -rays and ion rays may be used.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Among the polyfunctional (meth) acrylate-based compounds, examples of the 2-functional (meth) acrylate-based monomer include ethylene glycol di (meth) acrylate, bisphenol a tetraethoxy diacrylate, bisphenol a tetrapropoxy diacrylate, and 1, 6-hexanediol diacrylate.
Examples of the 3-functional or higher (meth) acrylate monomer include trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol tetra (meth) acrylate, and isocyanuric acid modified tri (meth) acrylate.
The (meth) acrylate monomer may be a monomer modified in part of the molecular skeleton. For example, as the (meth) acrylic acid ester monomer, a monomer in which a part of the molecular skeleton is modified with ethylene oxide, propylene oxide, caprolactone, isocyanuric acid, an alkyl group, a cyclic alkyl group, an aromatic group, bisphenol, or the like may be used.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
Examples of the multifunctional (meth) acrylate oligomer include acrylate polymers such as urethane (meth) acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, and polyether (meth) acrylate.
The urethane (meth) acrylate can be obtained, for example, by reacting a polyol and an organic diisocyanate with a hydroxy (meth) acrylate.
Preferred epoxy (meth) acrylates are: (meth) acrylic esters obtained by reacting (meth) acrylic acid with 3-functional or higher aromatic epoxy resins, alicyclic epoxy resins, aliphatic epoxy resins, and the like; (meth) acrylic esters obtained by reacting a polybasic acid and a (meth) acrylic acid with an aromatic epoxy resin, a cycloaliphatic epoxy resin, an aliphatic epoxy resin, or the like having 2 or more functions; and (meth) acrylic esters obtained by reacting phenols and (meth) acrylic acid with an aromatic epoxy resin, alicyclic epoxy resin, aliphatic epoxy resin or the like having 2 or more functions.
The weight average molecular weight of the multifunctional (meth) acrylate oligomer is preferably 500 to 3000, more preferably 700 to 2500.
In the present specification, the weight average molecular weight is measured by GPC analysis, and is the average molecular weight converted with standard polystyrene.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
For the purpose of adjusting the viscosity of the antiglare layer coating liquid, etc., a monofunctional (meth) acrylate may be used in combination as the ionizing radiation-curable compound. Examples of the monofunctional (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, and isobornyl (meth) acrylate.
As the ionizing radiation-curable compound, 1 or 2 or more kinds may be used singly or in combination.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
When the ionizing radiation-curable compound is an ultraviolet-curable compound, the ionizing radiation-curable composition preferably contains an additive such as a photopolymerization initiator or a photopolymerization accelerator.
The photopolymerization initiator may be 1 or more selected from acetophenone, benzophenone, α -hydroxyalkylbenzophenone, michler's ketone, benzoin, benzil dimethyl ketal, benzoyl benzoate, α -acyl oxime ester, thioxanthone, and the like.
The photopolymerization accelerator can reduce polymerization inhibition caused by air during curing and can accelerate the curing speed. Examples of the accelerator include isoamyl p-dimethylaminobenzoate and ethyl p-dimethylaminobenzoate.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, when the binder resin contains a cured product of an ionizing radiation-curable resin composition, the ionizing radiation-curable resin composition preferably contains a polyfunctional (meth) acrylate monomer and a polyfunctional (meth) acrylate oligomer.
In embodiment 1, the mass ratio of the multifunctional (meth) acrylate monomer to the multifunctional (meth) acrylate oligomer is preferably 5: 95-60: 40, more preferably 20: 80-60: 40, more preferably 40: 60-60: 40.
By setting the polyfunctional (meth) acrylate monomer to a predetermined ratio or more, the scratch resistance of the antiglare layer can be easily improved.
By setting the multifunctional (meth) acrylate oligomer to a predetermined ratio or more, the viscosity of the coating liquid for the antiglare layer can be increased, the particles can be easily suppressed from sinking below the antiglare layer, and the binder resin can be easily suppressed from flowing down between the projections based on the particles. Therefore, sa and Vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less. On the other hand, if the proportion of the multifunctional (meth) acrylate oligomer is too large, the strength of the antiglare layer may be lowered. In addition, if the viscosity of the coating liquid for the antiglare layer is too high, vmp may become too large or Sal may become too small. Therefore, the ionizing radiation-curable resin composition preferably contains a prescribed amount of the multifunctional (meth) acrylate oligomer and a prescribed amount of the multifunctional (meth) acrylate monomer.
Solvent, drying conditions-
In order to adjust the viscosity or to enable dissolution or dispersion of the respective components, the antiglare layer coating liquid preferably contains a solvent. The surface shape of the antiglare layer after coating and drying differs depending on the type of solvent, and therefore, the solvent is preferably selected in consideration of the saturated vapor pressure of the solvent, the permeability of the solvent with respect to the base material, and the like.
Specifically, examples of the solvent include ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), cyclohexanone, etc.), ethers (dioxane, tetrahydrofuran, etc.), aliphatic hydrocarbons (hexane, etc.), alicyclic hydrocarbons (cyclohexane, etc.), aromatic hydrocarbons (toluene, xylene, etc.), halocarbons (dichloromethane, dichloroethane, etc.), esters (methyl acetate, ethyl acetate, butyl acetate, etc.), alcohols (isopropanol, butanol, cyclohexanol, etc.), cellosolves (methyl cellosolve, ethyl cellosolve, etc.), glycol ethers (propylene glycol monomethyl ether acetate, etc.), cellosolve acetate, sulfoxides (dimethyl sulfoxide, etc.), amides (dimethylformamide, dimethylacetamide, etc.), and the like, and mixtures thereof.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, the solvent in the antiglare layer coating liquid preferably contains a solvent having a high evaporation rate as a main component. By increasing the evaporation rate of the solvent, the particles can be suppressed from sinking into the lower part of the antiglare layer, and the binder resin can be easily suppressed from flowing down between the projections based on the particles. Therefore, sa and Vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less.
The main component is 50% by mass or more, preferably 70% by mass or more, more preferably 90% by mass or more, and still more preferably 97% by mass or more of the total amount of the solvent.
In the present specification, the solvent having a high evaporation rate means a solvent having an evaporation rate of 100 or more when the evaporation rate of butyl acetate is 100. The evaporation rate of the solvent having a high evaporation rate is more preferably 120 to 300, still more preferably 150 to 220.
Examples of the solvent having a high evaporation rate include methyl isobutyl ketone (evaporation rate 160), toluene (evaporation rate 200), and methyl ethyl ketone (evaporation rate 370).
On the other hand, examples of the solvent having a low evaporation rate of less than 100 include cyclohexanone (evaporation rate of 32) and propylene glycol monomethyl ether acetate (evaporation rate of 44).
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, when the antiglare layer is formed from the antiglare layer coating liquid, it is preferable to control the drying conditions.
The drying conditions can be controlled by the drying temperature and the air speed in the dryer. The drying temperature is preferably 30 ℃ to 120 ℃ inclusive, and the drying air speed is preferably 0.2m/s to 50m/s inclusive. In order to control the surface shape of the antiglare layer by drying, it is preferable to irradiate the ionizing radiation after drying the coating liquid.
Regarding the drying conditions, it is preferable to perform 2-stage drying in the above-described temperature range and air speed range. In addition, it is preferable that the drying temperature is set to be high and the wind speed is increased in the drying in the 2 nd stage as compared with the drying in the 1 st stage. By slowly drying in the 1 st stage, the shape of the amorphous inorganic particles can be easily reflected on the surface of the binder resin when the binder resin covers the surface of the amorphous inorganic particles. In addition, by increasing the wind speed by making the drying temperature in the 2 nd stage higher than the drying temperature in the 1 st stage, the aggregation of the organic particles can be easily suppressed. Therefore, by adopting 2-stage drying, it is possible to easily suppress the Vmp from becoming excessively large and to easily set Sal to a predetermined value or less.
In the drying in the 1 st stage, it is preferable that the drying temperature is set to 30℃or higher and less than 60℃and the drying air speed is set to 0.2m/s or higher and less than 7m/s. In the drying in the 2 nd stage, it is preferable that the drying temperature is set to 60℃or higher and 120℃or lower, and the drying air speed is set to 7m/s or higher and 50m/s or lower.
Anti-reflection layer
In embodiment 1, the antireflection layer is preferably located on the outermost surface on the 1 st surface side.
Examples of the antireflection layer include: a single layer structure of the low refractive index layer; a 2-layer structure of a high refractive index layer and a low refractive index layer; and a multilayer structure of 3 layers or more. The low refractive index layer and the high refractive index layer may be formed by a general wet method or a dry method, or the like. In the case of the wet method, the above-described single-layer structure or 2-layer structure is preferable, and in the case of the dry method, the above-described multi-layer structure is preferable.
The wet method is superior to the dry method in terms of productivity and chemical resistance.
In the optical film of the present disclosure, the antireflection layer is preferably a single-layer structure of the low refractive index layer in order to easily maintain the uneven shape of the antiglare layer.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In the case of a single-layer structure or a 2-layer structure
The single-layer structure is a single layer of the low refractive index layer, and the 2-layer structure is formed of the high refractive index layer and the low refractive index layer. The single layer structure or the 2-layer structure is preferably formed by a wet method.
As a method for forming an antireflection layer by a wet method, there is mentioned: a method of forming by a sol-gel method using a metal alkoxide or the like; a method of coating a resin having a low refractive index such as a fluororesin; and a method of coating a coating liquid containing low refractive index particles or high refractive index particles in the binder resin composition.
In the wet process, in order to improve the close adhesion and scratch resistance, it is also preferable to form the antireflection layer using a coating liquid containing low refractive index particles or high refractive index particles in the binder resin composition. That is, the low refractive index layer preferably contains a binder resin and low refractive index particles. In addition, the high refractive index layer preferably contains a binder resin and high refractive index particles.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The lower limit of the refractive index of the low refractive index layer is preferably 1.10 or more, more preferably 1.20 or more, more preferably 1.26 or more, more preferably 1.28 or more, more preferably 1.30 or more, and the upper limit is preferably 1.48 or less, more preferably 1.45 or less, more preferably 1.40 or less, more preferably 1.38 or less, more preferably 1.32 or less.
In the present specification, the refractive index means a value at a wavelength of 550 nm.
The lower limit of the thickness of the low refractive index layer is preferably 80nm or more, more preferably 85nm or more, more preferably 90nm or more, and the upper limit is preferably 150nm or less, more preferably 110nm or less, more preferably 105nm or less.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In order to improve the scratch resistance, the binder resin of the low refractive index layer preferably contains a cured product of a curable resin composition such as a cured product of a thermosetting resin composition or a cured product of an ionizing radiation curable resin composition, and more preferably contains a cured product of an ionizing radiation curable resin composition.
The binder resin of the low refractive index layer may also contain a thermoplastic resin within a range that does not hinder the effects of the present disclosure.
The cured product of the curable resin composition for the low refractive index layer may be the same as the cured product of the curable resin composition exemplified in the antiglare layer.
The ratio of the cured product of the curable resin composition to the total amount of the binder resin of the low refractive index layer is preferably 80% by mass or more, more preferably 90% by mass or more, and still more preferably 97% by mass or more.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, the binder resin of the low refractive index layer may also contain a thermoplastic resin. By including the thermoplastic resin as the binder resin, the viscosity of the coating liquid for the low refractive index layer is increased, and the coating liquid for the low refractive index layer is less likely to flow down between the projections of the antiglare layer. Therefore, by including a thermoplastic resin as the binder resin, sa and Vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less. Further, since organic Si and fluorine are easily left in the vicinity of the surface of the 1 st plane, the element ratios of the formulae 2 to 4 can be easily satisfied. On the other hand, if the viscosity of the coating liquid for the low refractive index layer becomes too high, defects may occur on the surface of the antiglare layer when the coating liquid for the antireflection layer is applied.
The content of the thermoplastic resin is preferably 0.1 mass% or more and 3.0 mass% or less, more preferably 0.2 mass% or more and 1.5 mass% or less, and still more preferably 0.3 mass% or more and 0.7 mass% or less of the total amount of the binder resin, due to the above-described action and the coating film strength.
Examples of the thermoplastic resin include polystyrene-based resins, polyolefin-based resins, ABS resins (including heat-resistant ABS resins), AS resins, AN resins, polyphenylene ether-based resins, polycarbonate-based resins, polyacetal-based resins, acrylic resins, polyethylene terephthalate-based resins, polybutylene terephthalate-based resins, polysulfone-based resins, and polyphenylene sulfide-based resins, and acrylic resins are preferable from the viewpoint of transparency.
The weight average molecular weight of the thermoplastic resin is preferably 2 to 20 tens of thousands, more preferably 3 to 15 tens of thousands, and still more preferably 5 to 10 tens of thousands.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
As the low refractive index particles, hollow particles and solid particles can be cited. As the low refractive index particles, either one of hollow particles and solid particles may be contained, but in order to reduce the refractive index, hollow particles are preferably contained. In order to suppress the decrease in the coating film strength of the low refractive index layer, solid particles may be contained in addition to the hollow particles. The effect of the present disclosure can be easily exerted by including only hollow particles without including solid particles.
The hollow particles and the solid particles may be made of any of inorganic compounds such as silica and magnesium fluoride, and organic compounds, but silica is preferable for lowering the refractive index and strength. That is, the low refractive index layer preferably contains hollow silica particles. In addition, it is also preferable that the low refractive index layer contains solid silica particles in addition to hollow silica particles.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The average primary particle diameter of the hollow particles is preferably smaller than the thickness of the low refractive index layer, and examples thereof include 1nm to 150 nm. The average primary particle diameter of the hollow particles is preferably 35nm to 100nm, more preferably 50nm to 100nm, still more preferably 60nm to 80 nm.
The average primary particle diameter of the solid particles is preferably smaller than the thickness of the low refractive index layer, and examples thereof include 0.5nm to 100 nm. The average primary particle diameter of the solid particles is preferably 1nm to 30nm, more preferably 5nm to 20nm, still more preferably 10nm to 15 nm.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The average primary particle diameters of the hollow particles, solid particles described later, and high refractive particles described later were calculated by the following operations (A1) to (A3).
(A1) A cross section of the antireflective member is photographed by TEM or STEM. Preferably, the accelerating voltage of TEM or STEM is 10 kV-30 kV, and the multiplying power is 5-30 ten thousand times.
(A2) The arbitrary 10 particles were extracted from the observation image, and the particle diameters of the respective particles were calculated. The particle diameter is measured as the distance between straight lines in a combination of two straight lines in which the distance between the two straight lines becomes maximum when the cross section of the particle is sandwiched between two arbitrary parallel straight lines.
(A3) The same procedure was performed 5 times on the observation image of the other screen of the same sample, and the value obtained by the number average of the total 50 particle diameters was used as the average primary particle diameter of the particles.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The higher the content of hollow particles, the higher the filling rate of hollow particles in the binder resin, and the lower the refractive index of the low refractive index layer. Accordingly, the content of the hollow particles is preferably 100 parts by mass or more, more preferably 150 parts by mass or more, relative to 100 parts by mass of the binder resin.
On the other hand, if the content of the hollow particles is too large, the hollow particles are liable to be damaged or detached, and the mechanical strength such as scratch resistance of the low refractive index layer tends to be lowered. If the content of the hollow particles is too large, it may be difficult to satisfy the above-mentioned formulas 2 and 3. Accordingly, the content of the hollow particles is preferably 300 parts by mass or less, more preferably 250 parts by mass or less, with respect to 100 parts by mass of the binder resin.
In order to improve the scratch resistance of the low refractive index layer, the content of the solid particles is preferably 20 parts by mass or more, more preferably 40 parts by mass or more, relative to 100 parts by mass of the binder resin.
On the other hand, if the content of the solid particles is too large, the solid particles are likely to agglomerate. If the content of the solid particles is too large, it may be difficult to satisfy the above-mentioned formulas 2 and 3. Therefore, the content of the solid particles is preferably 100 parts by mass or less, more preferably 60 parts by mass or less, relative to 100 parts by mass of the binder resin.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In embodiment 1, in order to easily satisfy the element ratio of the above-described formulae 2 to 4 on the 1 st surface, the low refractive index layer preferably contains a leveling agent containing organic Si and fluorine.
The leveling agent containing organic Si and fluorine may be a compound containing organic Si and fluorine in the molecule. In addition, as the leveling agent containing organic Si and fluorine, a compound containing organic Si in a molecule and a compound containing fluorine in a molecule may be used in combination. In order to make the compatibility with the binder resin good, the low refractive index layer preferably contains a compound containing organic Si and fluorine in 1 molecule as a leveling agent. The leveling agent preferably has a functional group having reactivity with the binder resin in a molecule.
The element ratios of the above formulas 2 to 4 can be adjusted mainly by the content of the leveling agent and the ratio of organic Si and fluorine in the leveling agent. However, it is difficult to control the amount of the coating liquid for the low refractive index layer flowing down between the projections of the antiglare layer only by the content of the leveling agent and the ratio of organic Si and fluorine in the leveling agent. In order to easily satisfy the element ratios of the above formulas 2 to 4, it is preferable to increase the viscosity of the coating liquid for the low refractive index layer or to control the drying condition of the coating liquid for the low refractive index layer so as to reduce the amount of the coating liquid for the low refractive index layer flowing down between the projections of the antiglare layer.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The preferable content of the leveling agent is preferably adjusted so as to satisfy the element ratios of the above formulas 2 to 4 according to the ratio of organic Si and fluorine in the leveling agent.
In one embodiment of the present disclosure, the content of the leveling agent is preferably 10 mass% or more and 40 mass% or less, more preferably 15 mass% or more and 40 mass% or less, and still more preferably 20 mass% or more and 40 mass% or less, with respect to the total solid Cheng Fenlai of the low refractive index layer.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The high refractive index layer is preferably arranged on the antiglare layer side than the low refractive index layer.
The lower limit of the refractive index of the high refractive index layer is preferably 1.53 or more, more preferably 1.54 or more, more preferably 1.55 or more, more preferably 1.56 or more, and the upper limit is preferably 1.85 or less, more preferably 1.80 or less, more preferably 1.75 or less, more preferably 1.70 or less.
The upper limit of the thickness of the high refractive index layer is preferably 200nm or less, more preferably 180nm or less, further preferably 150nm or less, and the lower limit is preferably 50nm or more, further preferably 70nm or more.
As the binder resin of the high refractive index layer, the same binder resin as that of the low refractive index layer can be mentioned.
Examples of the high refractive index particles include antimony pentoxide, zinc oxide, titanium oxide, cerium oxide, tin-doped indium oxide, antimony-doped tin oxide, yttrium oxide, zirconium oxide, and the like.
The average primary particle diameter of the high refractive index particles is preferably 2nm or more, more preferably 5nm or more, and still more preferably 10nm or more. The average primary particle diameter of the high refractive index particles is preferably 200nm or less, more preferably 100nm or less, still more preferably 80nm or less, still more preferably 60nm or less, still more preferably 30nm or less, from the viewpoint of suppressing whitening and improving transparency.
The content of the high refractive index particles may be such that the refractive index of the high refractive index layer falls within the above range.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
When forming an antireflection layer such as a low refractive index layer and a high refractive index layer by a wet method, it is preferable to increase the viscosity of the coating liquid for an antireflection layer. By increasing the viscosity of the coating liquid for an antireflection layer, the coating liquid for an antireflection layer is less likely to flow down between the projections of the antiglare layer, and therefore, even if the antireflection layer is formed on the antiglare layer, the surface shape of the antiglare layer can be easily maintained. Therefore, by appropriately increasing the viscosity of the coating liquid for the antireflection layer, sa and Vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less. Further, since organic Si and fluorine are easily left in the vicinity of the surface of the 1 st plane, the element ratios of the formulae 2 to 4 can be easily satisfied. For example, by adding a thermoplastic resin as a binder resin, increasing the ratio of an oligomer as an ionizing radiation curable resin composition, or selecting a solvent having a high viscosity as a solvent, the viscosity of the coating liquid for an antireflection layer can be increased.
On the other hand, if the viscosity of the coating liquid for an antireflection layer is excessively increased, defects may occur on the surface of the antiglare layer when the coating liquid for an antireflection layer is applied.
Therefore, the viscosity of the coating liquid for an antireflection layer at 23 ℃ is preferably 0.1 mPas or more and 5.0 mPas or less.
The solvent of the coating liquid for an antireflection layer may be the same as that of the embodiment of the coating liquid for an antiglare layer.
When the antiglare layer is formed from the coating liquid for an antireflection layer, the drying conditions are preferably controlled.
For the drying conditions, it is possible to control by the drying temperature and the wind speed in the dryer. The drying temperature is preferably 30 ℃ to 70 ℃ inclusive, and the drying wind speed is preferably 10m/s to 30m/s inclusive. By setting the drying temperature to a low temperature, the viscosity of the coating liquid for the antireflection layer can be easily increased. In addition, by increasing the wind speed, the viscosity of the coating liquid for the antireflection layer can be rapidly increased. Therefore, by drying the coating liquid for the antireflection layer at a low temperature and a high wind speed, the coating liquid for the antireflection layer can be made less likely to flow down between the projections of the antiglare layer. That is, by drying the coating liquid for the antireflection layer at a relatively low temperature and a relatively high wind speed, the surface shape of Sa or the like on the 1 st surface can be easily brought into the above-described range, and the equations 1 to 4 can be easily satisfied.
The irradiation of the ionizing radiation is preferably performed after the anti-reflection layer coating liquid is dried.
Case of multilayer structure of 3 layers or more
The multilayer structure preferably formed by the dry method is a structure in which high refractive index layers and low refractive index layers are alternately laminated by 3 or more layers in total. In the multilayer structure, the low refractive index layer is also preferably disposed on the outermost surface of the optical film.
The high refractive index layer preferably has a thickness of 10nm to 200nm, and the refractive index is preferably 2.10 to 2.40. The thickness of the high refractive index layer is more preferably 20nm to 70 nm.
The low refractive index layer preferably has a thickness of 5nm to 200nm, and the refractive index is preferably 1.33 to 1.53. The thickness of the low refractive index layer is more preferably 20nm to 120 nm.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
< Optical Property >
Regarding the optical film of embodiment 1, it is preferable that the total light reflectance R SCI measured by the following method is 3.0% or less,
[ Measurement of total light reflectance (R SCI) ]
A sample was produced by bonding a black plate to the 2 nd surface side of the optical film via a transparent adhesive. The total light reflectance (R SCI) was measured with the optical film side of the sample as a light incidence plane.
By setting R SCI to 3.0% or less, the black color tone of the black display portion can be easily improved in an environment where light having a strong illuminance does not enter the 1 st plane, and thus the contrast can be easily improved. The R SCI of the optical film is more preferably 2.5% or less, and still more preferably 2.0% or less. The lower limit of R SCI of the optical film is not particularly limited, and is usually 0.1% or more.
In general, when R SCI is 3.0% or less, the contrast of the reflectance of the portion having the fingerprint component and the portion having no fingerprint component increases, and the aesthetic properties of the optical film tend to be significantly reduced. However, in the optical film of the present disclosure, since the fingerprint wiping property is good by satisfying the formula 1, even if R SCI is 3.0% or less, the deterioration of the aesthetic property of the optical film can be easily suppressed.
R SCI is the reflected light measured by applying light to the sample surface from all directions using an integrating sphere and closing the optical trap corresponding to the regular reflection direction.
A representative measurement device for R SCI is according to JIS Z8722:2009 geometry c. More specifically, the representative measurement device of R SCI uses D65 as the light source of the integrating sphere spectrophotometer, the position of the light receiver is +8 degrees with respect to the normal line of the sample, the opening angle of the light receiver is 10 degrees, the position of the optical trap is-8 degrees with respect to the normal line of the sample, and the viewing angle is 2 degrees or 10 degrees. In this specification, the viewing angle is set to 2 degrees.
As a measuring device satisfying the above conditions, for example, an integrating sphere spectrophotometer (trade name: CM-2002) manufactured by Konikoku Meida Co.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The difference between the refractive index of the transparent adhesive of the sample and the refractive index of the layer on the 2 nd surface side of the optical film is preferably 0.05 or less, more preferably 0.03 or less, and still more preferably 0.01 or less. The difference between the refractive index of the transparent adhesive of the sample and the refractive index of the adhesive resin of the black sheet is preferably 0.05 or less, more preferably 0.03 or less, and still more preferably 0.01 or less.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
JIS K7361-1 for optical film: the total light transmittance of 1997 is preferably 80% or more, more preferably 85% or more, and still more preferably 90% or more.
The light incident surface at the time of measuring the total light transmittance and haze was the 2 nd surface side of the optical film.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
JIS K7136 of optical film: the haze of 2000 is preferably 20% or more and 75% or less. The lower limit of the haze is more preferably 30% or more, still more preferably 40% or more, still more preferably 50% or more, and the upper limit is more preferably 70% or less, still more preferably 65% or less.
By setting the haze to 20% or more, the antiglare property can be easily improved. In addition, by setting the haze to 75% or less, the resolution of the image can be easily suppressed from decreasing.
Examples of the haze of the optical film include 20% to 75%, 20% to 70%, 20% to 65%, 30% to 75%, 30% to 70%, 30% to 65%, 40% to 75%, 40% to 70%, 40% to 65%, 50% to 75%, 50% to 70%, 50% to 65%.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In order to easily improve the resolution and contrast of the image, the internal haze of the optical film is preferably 20% or less, more preferably 15% or less, and further preferably 10% or less.
The internal haze can be measured by a general method, for example, by bonding a transparent sheet or the like to the 1 st surface of the optical film via a transparent adhesive layer to collapse the irregularities of the 1 st surface.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
The optical film was prepared according to JIS K7374:2007, the values of C 0.125、C0.25、C0.5、C1.0 and C 2.0 are preferably in the following ranges, when the transmission image sharpness of 0.125mm in width of the optical comb is defined as C 0.125, the transmission image sharpness of 0.25mm in width of the optical comb is defined as C 0.25, the transmission image sharpness of 0.5mm in width of the optical comb is defined as C 0.5, the transmission image sharpness of 1.0mm in width of the optical comb is defined as C 1.0, and the transmission image sharpness of 2.0mm in width of the optical comb is defined as C 2.0.
In order to improve antiglare properties, C 0.125 is preferably 50% or less, more preferably 40% or less, still more preferably 30% or less, and still more preferably 20% or less. In order to obtain a good resolution, C 0.125 is preferably 1.0% or more. The range of C 0.125 is 1.0% to 50%, 1.0% to 40%, 1.0% to 30%, 1.0% to 20%.
In order to improve antiglare properties, C 0.25 is preferably 50% or less, more preferably 40% or less, still more preferably 30% or less, and still more preferably 20% or less. In order to obtain a good resolution, C 0.25 is preferably 1.0% or more. The range of C 0.25 is 1.0% to 50%, 1.0% to 40%, 1.0% to 30%, 1.0% to 20%.
In order to improve antiglare properties, C 0.5 is preferably 50% or less, more preferably 40% or less, still more preferably 30% or less, and still more preferably 20% or less. In order to obtain a good resolution, C 0.5 is preferably 1.0% or more. The range of C 0.5 is 1.0% to 50%, 1.0% to 40%, 1.0% to 30%, 1.0% to 20%.
In order to improve antiglare properties, C 1.0 is preferably 50% or less, more preferably 40% or less, still more preferably 30% or less, and still more preferably 20% or less. In order to obtain a good resolution, C 1.0 is preferably 1.0% or more. The range of C 1.0 is 1.0% to 50%, 1.0% to 40%, 1.0% to 30%, 1.0% to 20%.
In order to improve antiglare properties, C 2.0 is preferably 50% or less, more preferably 40% or less, still more preferably 30% or less, and still more preferably 20% or less. In order to obtain a good resolution, C 2.0 is preferably 5.0% or more. The range of C 2.0 is 5.0% to 50%, 5.0% to 40%, 5.0% to 30%, 5.0% to 20%.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
In order to improve antiglare properties, the total of C 0.125、C0.5、C1.0 and C 2.0 of the optical film is preferably 200% or less, more preferably 150% or less, still more preferably 100% or less, and still more preferably 80% or less. In order to improve the resolution, the total is preferably 10.0% or more. The total range is 10.0% to 200%, 10.0% to 150%, 10.0% to 100%, 10.0% to 80%.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
< Size, shape, etc.)
The optical film may be cut into a sheet of a predetermined size, or may be wound into a roll. The size of the single sheet is not particularly limited, but the maximum diameter is about 2 inches to 500 inches. "maximum diameter" refers to the maximum length when joining any 2 points of an optical film. For example, in the case where the optical film is rectangular, the diagonal line of the region becomes the maximum diameter. In the case where the optical film is circular, the diameter of the circle becomes the maximum diameter.
The width and length of the roll are not particularly limited, but are usually 500 to 3000mm, 500 to 5000m, respectively. The optical film in a roll form may be cut into individual pieces according to the size of an image display device or the like. During cutting, the end portion of the roll, which is unstable in physical properties, is preferably removed.
The shape of the single sheet is not particularly limited, and examples thereof include polygonal shapes such as triangles, quadrilaterals, pentagons, and the like, circular shapes, random amorphous shapes, and the like. More specifically, in the case where the optical film is quadrangular, the aspect ratio is not particularly limited as long as there is no problem as a display screen. For example, a transverse bar may be mentioned: vertical = 1: 1. 4: 3. 16: 10. 16: 9. 2:1, etc., but is not limited to such aspect ratio in the use of the vehicle-mounted device or the digital signage device having a high design.
The surface shape of the 2 nd surface of the optical film is not particularly limited, but is preferably substantially smooth. Substantially smooth means JIS B0601 at a cutoff of 0.8 mm: 1994 has an arithmetic average roughness Ra of less than 0.03 μm, preferably 0.02 μm or less.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
[ Method for producing optical film of embodiment 1]
The method for producing an optical film according to embodiment 1 of the present disclosure is the method for producing an optical film according to the present disclosure described above, and includes step 1 of forming an antiglare layer on a substrate, and step 2 of forming an antireflection layer on the antiglare layer.
Examples of the means for forming the antiglare layer on the substrate include (a) the method using an embossing roll, (B) etching treatment, (C) mold-based molding, and (D) coating film formation by application.
In the case of the method (a), for example, by forming a resin layer on a substrate and shaping the resin layer by using an embossing roll, an antiglare layer can be formed on the substrate.
In the case of the method (B), for example, an antiglare layer can be formed on a substrate by forming a layer of a photocurable resin on the substrate and performing photolithography.
In the case of the method (C), for example, by flowing the resin into a mold, the molded resin is taken out from the mold and placed on a substrate, whereby an antiglare layer can be formed on the substrate.
In the case of the method (D), for example, by forming a coating film on a substrate by the method of (D1) or (D2) described above, an antiglare layer can be formed on the substrate.
Examples of the means for forming the antireflection layer on the antiglare layer include the wet method and the dry method described above.
[ Polarizing plate of embodiment 1]
The polarizing plate according to embodiment 1 of the present disclosure includes a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material,
At least one of the first transparent protective plate and the second transparent protective plate is the optical film of embodiment 1 of the present disclosure, and the 2 nd surface of the optical film is disposed so as to face the polarizer.
< Polarizing Material >
Examples of the polarizing material include: a sheet-type polarizing material such as a polyvinyl alcohol film, a polyvinyl formal film, a polyvinyl acetal film, an ethylene-vinyl acetate copolymer-based saponified film, which is obtained by dyeing with iodine or the like and stretching; a wire grid type polarizer composed of a plurality of metal wires arranged in parallel; a coated polarizer coated with a lyotropic liquid crystal or dichroic guest-host material; multilayer thin film type polarizers, and the like. These polarizers may be reflective polarizers having a function of reflecting an opaque polarizing component.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
< Transparent protective plate >
A first transparent protective plate is disposed on one side of the polarizer, and a second transparent protective plate is disposed on the other side. At least one of the first transparent protective plate and the second transparent protective plate is the optical film of embodiment 1 of the present disclosure described above.
In the polarizing plate of the present disclosure, one of the first transparent protective plate and the second transparent protective plate may be the optical film of embodiment 1 of the present disclosure, or both of the first transparent protective plate and the second transparent protective plate may be the optical film of embodiment 1 of the present disclosure.
As the transparent protective plate other than the optical film of embodiment 1 of the present disclosure, a general-purpose plastic film, glass, or the like can be used among the first transparent protective plate and the second transparent protective plate.
The polarizer and the transparent protective plate are preferably bonded together via an adhesive. As the adhesive, a general-purpose adhesive, preferably a PVA-based adhesive, can be used.
[ Surface plate for image display device of embodiment 1]
The surface plate for an image display device according to embodiment 1 of the present disclosure is a surface plate for an image display device, which is formed by laminating a protective film on a resin plate or a glass plate, wherein the protective film is the optical film according to embodiment 1 of the present disclosure, and the 2 nd surface of the optical film is disposed so as to face the resin plate or the glass plate.
As the resin plate or the glass plate, a resin plate or a glass plate that is generally used as a surface plate of an image display device may be used.
In order to improve the strength, the thickness of the resin plate or glass plate is preferably 10 μm or more. The upper limit of the thickness of the resin plate or glass plate is usually 5000 μm or less. For the purpose of thickness reduction, the upper limit of the thickness of the resin plate or glass plate is preferably 1000 μm or less, more preferably 500 μm or less, and still more preferably 100 μm or less.
Examples of the thickness range of the resin sheet or the glass sheet include 10 μm to 5000 μm, 10 μm to 1000 μm, 10 μm to 500 μm, 10 μm to 100 μm, and the like.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
[ Image display Panel of embodiment 1]
The image display panel according to embodiment 1 of the present disclosure includes a display element and an optical film disposed on a light emission surface side of the display element, and includes the optical film according to embodiment 1 of the present disclosure described above as the optical film (see fig. 2).
In the image display panel, the optical film of embodiment 1 of the present disclosure is preferably arranged such that the 2 nd surface side faces the display element side.
In the image display panel, the optical film of embodiment 1 of the present disclosure is preferably disposed on the outermost surface of the display element on the light emission surface side.
The display element includes a liquid crystal display element, an EL display element (organic EL display element, inorganic EL display element), a plasma display element, and an LED display element such as a micro LED display element. These display elements may have a touch panel function inside the display elements.
Examples of the liquid crystal display modes of the liquid crystal display element include IPS mode, VA mode, multi-domain mode, OCB mode, STN mode, TSTN mode, and the like.
In addition, the image display panel of the present disclosure may be a touch panel-equipped image display panel having a touch panel between a display element and an optical film.
The size of the image display panel is not particularly limited, but the maximum diameter is about 2 inches or more and 500 inches or less. The maximum diameter is the maximum length when any two points in the plane of the image display panel are connected.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
[ Image display device of embodiment 1]
The image display device of embodiment 1 of the present disclosure includes the image display panel of embodiment 1 of the present disclosure.
The image display device according to embodiment 1 of the present disclosure is not particularly limited as long as it includes the image display panel according to embodiment 1 of the present disclosure. The image display device according to embodiment 1 of the present disclosure preferably includes the image display panel according to embodiment 1 of the present disclosure, a drive control unit electrically connected to the image display panel, and a case accommodating them.
When the display element is a liquid crystal display element, a backlight is required in the image display device of the present disclosure. The backlight is disposed on the opposite side of the liquid crystal display element from the light exit surface side.
The size of the image display device is not particularly limited, but the maximum diameter of the effective display area is about 2 inches or more and 500 inches or less.
The effective display area of the image display device is an area capable of displaying an image. For example, in the case where the image display device has a case surrounding the display element, an area inside the case becomes an effective image area.
The maximum diameter of the effective image area is the maximum length when any 2 points in the effective image area are connected. For example, when the effective image area is rectangular, the diagonal line of the area becomes the maximum diameter. In addition, in the case where the effective image area is circular, the diameter of the area is the maximum diameter.
The description in this paragraph is a description common to embodiment 1 and embodiment 2.
[ Method for selecting optical film of embodiment 1]
The method of selecting an optical film according to embodiment 1 of the present disclosure selects an optical film that satisfies the following selected conditions.
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle (degree) at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, protruding peak solid volume (ml/m 2).
In the method for selecting an optical film according to embodiment 1 of the present disclosure, additional conditions may be selected. As additional conditions for selection, preferred embodiments of the optical film of embodiment 1 are exemplified. Examples of additional conditions include the following a to D.
A: the Vmp is more than 0.005ml/m 2 and less than 0.100ml/m 2.
B: the optical film has the antireflection layer, the antiglare layer, and a base material in this order from the 1 st surface toward the 2 nd surface.
C: the element ratio satisfies the following formulas 2 to 4.
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
D: the total light reflectance R SCI measured by the following method is 3.0% or less,
[ Measurement of total light reflectance (R SCI) ]
A sample was produced by bonding a black plate to the 2 nd surface side of the optical film via a transparent adhesive. Total light reflectance (R SCI) was measured with the optical film side of the sample as a light incidence plane.
According to the method for selecting an optical film of embodiment 1 of the present disclosure, an optical film excellent in antiglare property and good in fingerprint wiping property can be efficiently selected.
[ Optical film of embodiment 2]
The optical film of embodiment 2 of the present disclosure is as follows.
An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
Fig. 4 is a schematic cross-sectional view of the cross-sectional shape of the optical film 100 of embodiment 2 of the present disclosure.
The optical film 100 of fig. 4 has: 1 st surface having a concave-convex shape; and a 2 nd surface which is a surface on the opposite side of the 1 st surface. In fig. 4, the upper surface is the 1 st surface, and the lower surface is the 2 nd surface.
The optical film of fig. 4 has an antireflection layer 30, an antiglare layer 20, and a base material 10 in this order from the 1 st surface toward the 2 nd surface.
Fig. 4 is a schematic cross-sectional view. That is, the scale of each layer and the scale of the concave-convex shape constituting the optical film 100 are schematically shown for ease of illustration, and are different from actual scales. The same is true of fig. 5.
The optical film of embodiment 2 of the present disclosure is not limited to the laminated structure of fig. 1. For example, the optical film of embodiment 2 of the present disclosure may have a laminated structure without a base material. The optical film of embodiment 2 of the present disclosure may have layers other than the base material, the antiglare layer, and the antireflection layer.
< 1 St side >
The optical film of embodiment 2 of the present disclosure has a1 st face. Regarding the optical film of embodiment 2 of the present disclosure, it is preferable that the surface of the antireflection layer is the 1 st surface.
The optical film of embodiment 2 has a concave-convex shape on the 1 st side, and is manufactured by ISO 25178-2:2012 is 0.005ml/m 2 or more. When the 1 st surface has no uneven shape, the antiglare property of the optical film cannot be improved. By making the 1 st surface have a concave-convex shape and Vvv to 0.005ml/m 2 or more, the antiglare property of the optical film can be easily improved.
Vvv is preferably 0.007ml/m 2 or more, more preferably 0.010ml/m 2 or more, more preferably 0.020ml/m 2 or more, and more preferably 0.030ml/m 2 or more.
If Vvv is too large, it tends to be difficult to make the falling contact angle 30.0 degrees or more. Therefore, vvv is preferably 0.100ml/m 2 or less, more preferably 0.080ml/m 2 or less, still more preferably 0.060ml/m 2 or less, still more preferably 0.045ml/m 2 or less.
As for the embodiment in the Vvv range of the 1 st aspect, there may be mentioned 0.005ml/m 2 or more and 0.100ml/m 2 or less, 0.005ml/m 2 or more and 0.080ml/m 2 or less, 0.005ml/m 2 or more and 0.060ml/m 2 or less, 0.005ml/m 2 or more and 0.045ml/m 2 or less, 0.007ml/m 2 or more and 0.100ml/m 2 or less, 0.007ml/m 2 or more and 0.080ml/m 2 or less, 0.007ml/m 2 or more and 0.060ml/m 2 or less, 0.007ml/m 2 or more and 0.045ml/m 2 or less, 0.010ml/m 2 or more and 0.100ml/m 2 or less, 0.010ml/m 2 or more and 0.080ml/m 2 or less, 0.010ml/m 2 -0.060 ml/m 2, 0.010ml/m 2 -0.045 ml/m 2 -0.020 ml/m 2 -0.100 ml/m 2 -0.020 ml/m 2 -0.080 ml/m 2 -0.020 ml/m 2 -0.060 ml/m 2 -0, 0.020ml/m 2 or more and 0.045ml/m 2 or less, 0.030ml/m 2 or more and 0.100ml/m 2 or less, 0.030ml/m 2 or more and 0.080ml/m 2 or less, 0.030ml/m 2 or more and 0.060ml/m 2 or less, 0.030ml/m 2 or more and 0.045ml/m 2 or less.
The falling contact angle of the 1 st surface of the optical film of embodiment 2 is 30.0 degrees or more, as measured by the following method.
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
By setting the falling contact angle of the 1 st surface to 30.0 degrees or more, fingerprint wiping properties can be easily improved. The relationship between the falling contact angle and the fingerprint wiping property is described below.
In the measurement of the falling contact angle of the present disclosure, the droplet was allowed to fall from a height of 45mm with respect to the 1 st face of the optical film. The drop falling on the 1 st surface is crushed by the impact at the time of falling, and therefore the contact angle of the drop immediately after falling tends to be small. In particular, in the case of an optical film having a concave-convex shape of Vvv or more, since the droplet is easily wet-spread, the contact angle of the droplet immediately after falling tends to be small.
On the 1 st surface of the optical film, the liquid present in the crushed shape is difficult to wipe. In the measurement of the falling contact angle of the present disclosure, the static contact angle after 10 seconds of landing was measured by the θ/2 method. Further, the falling contact angle of the optical film of the present disclosure is 30.0 degrees or more. That is, the optical film of embodiment 2 of the present disclosure having a falling contact angle of 30.0 degrees or more means: the liquid droplets having crushed shapes due to the impact at the time of falling are restored to a nearly spherical shape. Therefore, the optical film according to embodiment 2 of the present disclosure has a concavo-convex shape Vvv of 0.005ml/m 2 or more, but can also provide good fingerprint wiping properties.
When the surface of the optical film is touched with a finger, the fingerprint component penetrates into the concave-convex shape due to the pressure at the time of touching. In the measurement of the drop contact angle of the present disclosure, the reason why the droplet is dropped from the height of 45mm is because the aforementioned phenomenon (the phenomenon in which the fingerprint component penetrates into the inside of the concave-convex shape due to pressure) is considered.
In the measurement of the drop contact angle, the amount of dropped droplets was 5.0. Mu.l.
The fingerprint contains not only water but also sebum and the like. Therefore, in the measurement of the falling contact angle of the present disclosure, a liquid having a surface tension of 30mN/m was used instead of pure water. In the present specification, as a liquid having a surface tension of 30mN/m, a liquid having the following composition was used. In the present specification, the surface tension means a surface tension obtained by the method described in JIS K2241:2017, a Wilhelmy surface tension meter.
< Composition of liquid having surface tension of 30mN/m >
Which is a liquid containing 100 mass% of ethylene glycol monoethyl ether.
The drop contact angle is preferably 40.0 degrees or more, more preferably 45.0 degrees or more, and still more preferably 50.0 degrees or more.
When the drop contact angle is too large, the content of the fluorine compound and the silicone compound in the antireflection layer increases, and the scratch resistance of the optical film tends to decrease. Accordingly, the falling contact angle is preferably 70.0 degrees or less, more preferably 60.0 degrees or less, and further preferably 55.0 degrees or less.
Examples of the falling contact angle range of the 1 st surface include 30.0 degrees to 70.0 degrees, 30.0 degrees to 60.0 degrees, 30.0 degrees to 55.0 degrees, 40.0 degrees to 70.0 degrees, 40.0 degrees to 60.0 degrees, 40.0 degrees to 55.0 degrees, 45.0 degrees to 70.0 degrees, 45.0 degrees to 60.0 degrees, 45.0 degrees to 55.0 degrees, 50.0 degrees to 70.0 degrees, 50.0 degrees to 60.0 degrees, and 50.0 degrees to 55.0 degrees.
The pure water contact angle of the 1 st surface of the optical film according to embodiment 2 of the present disclosure is preferably 100 degrees or more and 120 degrees or less, more preferably 110 degrees or more and 115 degrees or less.
In embodiment 2, vvv of the 1 st side of the optical film of the present disclosure is as defined by ISO 25178-2:2012 (Vvv/Vvc) is preferably 0.10 or less. By setting Vvv/Vvc to 0.10 or less, fingerprint wiping properties can be easily improved. Vvv/Vvc is more preferably 0.09 or less, still more preferably 0.08 or less.
In embodiment 2, regarding the 1 st face of the optical film of the present disclosure, it is preferable that the film is produced by ISO 25178-2:2012 is 0.005ml/m 2 or more and 0.100ml/m 2 or less.
By setting the Vmp of the 1 st plane to 0.005ml/m 2 or more, the antiglare property can be easily improved. The Vmp is more preferably 0.007ml/m 2 or more, still more preferably 0.010ml/m 2 or more, still more preferably 0.020ml/m 2 or more.
By setting the Vmp of the 1 st surface to 0.100ml/m 2 or less, the scratch resistance of the optical film can be easily improved. The Vmp is more preferably 0.080 (ml/m 2) or less, still more preferably 0.060 (ml/m 2) or less, still more preferably 0.045 (ml/m 2) or less.
In embodiment 2, regarding the 1 st face of the optical film of the present disclosure, it is preferable that the film is produced by ISO 25178-2:2012 is set to a minimum autocorrelation length Sal of 4.0 μm or more and 12.0 μm or less.
When Sal is 4.0 μm or more, fingerprint wiping properties can be easily improved. When Sal is 12.0 μm or less, antiglare properties can be easily improved.
The lower limit of Sal is more preferably 5.0 μm or more, and still more preferably 6.0 μm or more. The upper limit of Sal is more preferably 11.0 μm or less, and still more preferably 10.0 μm or less.
In embodiment 2, the optical film of the present disclosure on side 1 is manufactured by ISO 25178-2:2012 is preferably 0.15 μm or more and 2.00 μm or less.
Sxp is a parameter indicating the difference between the average surface of the concave-convex shape and the convex portion after removing the convex portion having a particularly high concave-convex shape. When Sxp is 0.15 μm or more, antiglare properties can be easily improved. By setting Sxp to 2.00 μm or less, fingerprint wiping performance can be easily improved.
The lower limit of Sxp is more preferably 0.20 μm or more, still more preferably 0.25 μm or more, still more preferably 0.50 μm or more, still more preferably 0.70 μm or more. The upper limit of Sxp is more preferably 1.80 μm or less, still more preferably 1.50 μm or less, still more preferably 1.40 μm or less.
The Sxp of the 1 st aspect may be in the range of 0.15 μm or more and 2.00 μm or less, 0.15 μm or more and 1.80 μm or less, 0.15 μm or more and 1.50 μm or less, 0.15 μm or more and 1.40 μm or less, 0.20 μm or more and 2.00 μm or less, 0.20 μm or more and 1.80 μm or less, 0.20 μm or more and 1.50 μm or less, 0.20 μm or more and 1.40 μm or less, 0.25 μm or more and 2.00 μm or less, 0.25 μm or more and 1.80 μm or less, 0.25 μm or more and 1.50 μm or less, 0.25 μm or more and 1.40 μm or less, 0.50 μm or more and 2.00 μm or less, 0.20 μm or more and 1.80 μm or more and 1.40 μm or less, 0.50 μm or more and 0.70 μm or more, 0.50 μm or more and 1.40 μm or more, 0.40 μm or more and 1.40 μm or more.
In embodiment 2, regarding the optical film of the present disclosure, it is preferable that the element ratio obtained by analyzing the surface region on the 1 st plane side by X-ray photoelectron spectroscopy satisfies the following formulas 2 to 4.
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
In the formulas 2 to 4, "F" is a ratio of fluorine element, "inorganic Si" is a ratio of silicon element attributed to inorganic silicon compound, and "organic Si" is a ratio of silicon element attributed to organic silicon compound.
In the surface region of the 1 st surface of the optical film, inorganic Si can lower the refractive index of the 1 st surface, and on the other hand, fingerprint wiping properties tend to be deteriorated. Further, the surface region of the 1 st surface of the optical film contains a predetermined amount or more of organic Si and F with respect to inorganic Si, whereby fingerprint wiping performance tends to be improved. Further, by incorporating the machines Si and F in the surface region of the 1 st surface of the optical film with good balance, fingerprint wiping performance tends to be good. Therefore, by setting the F/inorganic Si to 3.5 or more, the organic Si/inorganic Si to 0.08 or more, and the F/organic Si to 5.0 or more and 50.0 or less, the drop contact angle can be easily set to 30.0 degrees or more, and the fingerprint wiping property can be easily made good.
Further, by setting the F/inorganic Si to 10.0 or less and the organic Si/inorganic Si to 1.00 or less, it is possible to easily suppress a decrease in the coatability of the antireflection layer.
The preferred ranges of F/inorganic Si, organic Si/inorganic Si, F/organic Si are as described above.
The embodiment of the range of the ratio of inorganic Si to the total elements of the surface region of the 1 st face of the optical film is as described above.
< Laminated Structure >
The optical film of embodiment 2 of the present disclosure has an antireflection layer and an antiglare layer in this order from the 1 st surface to the 2 nd surface. The outermost surface on the 1 st surface side of the optical film of embodiment 2 is preferably an antireflection layer.
As described above, the optical film of the present disclosure may also have layers other than the antireflection layer and the antiglare layer. Embodiments of the layers other than the antireflection layer and the antiglare layer are as described above.
Base material
For ease of production and handleability, the optical film of embodiment 2 preferably has a base material.
The embodiments of the material of the substrate, the constitution of the substrate, the thickness of the substrate, the total light transmittance of the substrate, the haze of the substrate, and the surface treatment of the substrate are as described above.
Anti-dazzle layer
In embodiment 2, the antiglare layer is a layer that takes on the center of antiglare properties.
In embodiment 2, the antiglare layer can be formed by, for example, (a) a method using an embossing roller, (B) an etching treatment, (C) molding by a mold, (D) formation of a coating film by application, or the like. In order to easily obtain a stable surface shape, the mold-based molding of (C) is preferable, and the coating-based film formation of (D) is preferable in order to improve productivity and cope with various kinds.
In the method (C), for example, the antiglare layer can be formed by flowing a resin into a mold and taking out the molded resin from the mold. The molded resin taken out of the mold may be disposed on a substrate. As the mold, a mold in which the surface shape of the antiglare layer is reversed is used. Such a mold can be produced, for example, by the following methods (c 1-1) to (c 1-2) or (c 2) below.
(C 1-1) producing Vvv or the like into a shape within a predetermined range by simulation. Further, the simulated shape is inverted.
(C 1-2) engraving the surface of the metal with a laser or processing the surface of the metal with photolithography so that the inverted shape is reflected, thereby obtaining a mold.
(C2) The antiglare layer produced by (D) was molded by a general electroforming method to reverse the shape of the antiglare layer.
In the case of forming the antiglare layer by (D), for example, the following methods (D1) and (D2) are exemplified. (d1) The range of the surface shape such as Vvv is preferable in that it is easier to adjust than (d 2).
(D1) A method of forming an antiglare layer having particle-based irregularities by coating and drying a coating liquid containing a binder resin and particles.
(D2) A method of forming irregularities by applying a coating liquid containing any resin and a resin having poor compatibility with the resin and separating the resin phase.
Thickness-
The embodiment of the range of the thickness T of the antiglare layer is as described above.
Component-
As described above, the antiglare layer preferably mainly contains a resin component. The antiglare layer may contain the other components as necessary.
As described above, the antiglare layer preferably contains a binder resin and particles.
The particles include organic particles and inorganic particles, and inorganic particles are preferable. That is, the antiglare layer preferably contains a binder resin and inorganic particles. The antiglare layer more preferably contains a binder resin, inorganic particles, and organic particles.
Particles-
The embodiments of the materials of the inorganic particles and the organic particles, and the embodiments of the shapes of the inorganic particles and the organic particles are as described above unless otherwise mentioned.
The amorphous inorganic particles have a tendency to easily increase Vvv and easily decrease Sal, as compared with spherical particles. However, if the particle size distribution of the amorphous inorganic particles is too wide, vvv tends to be large, and thus fingerprint wiping properties tend to be low. In particular, if the amorphous inorganic particles are aggregated, vvv becomes larger, and fingerprint wiping property becomes more likely to be lowered. On the other hand, if the particle size distribution of the amorphous inorganic particles is too narrow, coating suitability tends to be lowered. Therefore, the cumulative distribution of the volume basis of the particle diameter of the amorphous inorganic particles is preferably in the range described later. However, if the inorganic particles are used alone, aggregation tends to occur. Therefore, in embodiment 2, in order to make Vvv the above range and to easily make fingerprint wiping property good, it is preferable to use organic particles in combination with the particle size distribution of amorphous particles in the range described later.
In embodiment 2, regarding inorganic particles such as amorphous inorganic particles, it is preferable that the cumulative distribution d10 of the volume basis of the particle diameter, the cumulative distribution d50 of the volume basis of the particle diameter, and the cumulative distribution d90 of the volume basis of the particle diameter satisfy the following relationships of (1) and (2).
1.5≤d50/d10≤4.0 (1)
1.0≤d90/d50≤3.0 (2)
A d50/d10 of 1.5 or more means that the particle size distribution of the inorganic particles in the region where the particle size is equal to or smaller than the average is broad. When d50/d10 is 1.5 or more, fine irregularities are easily provided on the surface of the irregularities, and therefore Sal can be easily reduced. By setting d50/d10 to 4.0 or less, an increase in the amount of inorganic particles buried in the antiglare layer can be suppressed, and the efficiency of adding inorganic particles can be improved.
A d90/d50 of 1.0 or more means that the particle size distribution of the inorganic particles in the region where the particle size is equal to or greater than the average particle size is broad. By setting d90/d50 to 1.0 or more, vvv can be easily increased and Sal can be easily increased. When the d90/d50 is 3.0 or less, it is easy to suppress that Vvv becomes excessively large and Sal becomes excessively large.
The lower limit of d50/d10 is more preferably 1.8 or more, still more preferably 2.0 or more, and the upper limit is more preferably 3.5 or less, still more preferably 3.0 or less.
The lower limit of d90/d50 is more preferably 1.3 or more, still more preferably 1.5 or more, and the upper limit is more preferably 2.5 or less, still more preferably 2.0 or less.
The d10, d50 and d90 of inorganic particles such as amorphous inorganic particles can be measured by a laser diffraction method.
In embodiment 2, the cumulative distribution d50 of the volume basis of the particle diameters of inorganic particles such as amorphous inorganic particles is preferably 2.5 μm or more and 5.5 μm or less, more preferably 3.0 μm or more and 5.0 μm or less, and still more preferably 3.3 μm or more and 4.7 μm or less.
When the d50 is 2.5 μm or more, an excessive increase in the number of inorganic particles can be suppressed, and therefore Sal can be easily suppressed from becoming too small. When the d50 is 5.5 μm or less, the excessive decrease in the number of inorganic particles can be suppressed, and therefore, the excessive increase in Sal can be easily suppressed. Further, since the number of inorganic particles is suppressed from excessively decreasing, valleys can be easily formed between the particles, and Vvv can be easily increased.
The embodiment of the range of the ratio (d 50/T) of the thickness T of the antiglare layer to the d50 of the inorganic particles such as amorphous inorganic particles is as described above.
The embodiment of the range of the ratio (d 90/T) of the thickness T of the antiglare layer to d90 of inorganic particles such as amorphous inorganic particles is as described above.
Embodiments of the range of the content of inorganic particles such as amorphous inorganic particles are as described above.
In embodiment 2, the content of the organic particles is preferably 1 part by mass or more and 25 parts by mass or less, more preferably 3 parts by mass or more and 18 parts by mass or less, still more preferably 8 parts by mass or more and 14 parts by mass or less, with respect to 100 parts by mass of the binder resin.
By setting the content of the organic particles to 1 part by mass or more, aggregation of the inorganic particles can be easily suppressed. In addition, by setting the content of the organic particles to 1 part by mass or more, an excessive decrease in the number of the organic particles can be suppressed, and therefore, valleys can be easily formed between the particles. Therefore, vvv can be easily increased. When the number of particles decreases, vmp tends to increase.
Since the particle size distribution of the organic particles is relatively uniform, the Sal tends to be smaller as the content of the organic particles increases. Therefore, by setting the content of the organic particles to 25 parts by mass or less, sal can be suppressed from becoming too small, and fingerprint wiping properties can be easily improved.
In embodiment 2, the average particle diameter of the organic particles is preferably 1.0 μm or more and 5.0 μm or less, more preferably 1.2 μm or more and 3.0 μm or less, and still more preferably 1.3 μm or more and 2.5 μm or less.
By setting the average particle diameter of the organic particles to 1.0 μm or more, an excessive increase in the number of the organic particles can be suppressed, and therefore, sal can be easily suppressed from becoming excessively small. Therefore, by setting the average particle diameter of the organic particles to 1.0 μm or more, fingerprint wiping properties can be easily improved. By setting the average particle diameter of the organic particles to 5.0 μm or less, excessive reduction in the number of the organic particles can be suppressed, and therefore, valleys can be easily formed between the particles. Therefore, vvv can be easily increased. When the number of particles decreases, vmp tends to increase.
In embodiment 2, regarding the organic particles, it is preferable that the particle size distribution is narrow. Specifically, in embodiment 2, the proportion of the particles within the range of ±0.5 μm of the average particle diameter of the organic particles is preferably 80% by volume or more, more preferably 85% by volume or more, and still more preferably 90% or more of the total amount of the organic particles. By narrowing the particle size distribution of the organic particles, the organic particles having a uniform particle diameter are densely arranged, and hence Vvv is easily suppressed from becoming excessively large.
The embodiment of the shape of the organic particles is as described above.
In embodiment 2, the ratio of the average particle diameter of the organic particles to the thickness of the antiglare layer (average particle diameter of the organic particles/thickness of the antiglare layer) is preferably 0.20 or more and 0.70 or less, more preferably 0.23 or more and 0.50 or less, and still more preferably 0.25 or more and 0.35 or less. By setting the average particle diameter of the organic particles and the thickness of the antiglare layer to the above ranges, vvv and Sal can be easily set to the above ranges.
Inorganic particles
As described above, the antiglare layer may further contain inorganic fine particles in addition to the binder resin and the particles.
The material and the average particle diameter of the inorganic fine particles are as described above.
Binder resin-
As described above, in order to easily improve the scratch resistance, the binder resin preferably contains a cured product of a curable resin composition such as a cured product of a thermosetting resin composition or a cured product of an ionizing radiation curable resin composition, and more preferably contains a cured product of an ionizing radiation curable resin composition.
As described above, the binder resin may also contain a thermoplastic resin within a range that does not hinder the effects of the present disclosure.
The embodiments of the curable resin composition cured product and the binder resin such as thermoplastic resin are as described above unless otherwise mentioned.
In embodiment 2, when the binder resin contains a cured product of an ionizing radiation-curable resin composition, the ionizing radiation-curable resin composition preferably contains a polyfunctional (meth) acrylate monomer and a polyfunctional (meth) acrylate oligomer.
In embodiment 2, the mass ratio of the multifunctional (meth) acrylate monomer to the multifunctional (meth) acrylate oligomer is preferably 5: 95-60: 40, more preferably 20: 80-60: 40, more preferably 40: 60-60: 40.
By setting the polyfunctional (meth) acrylate monomer to a predetermined ratio or more, the scratch resistance of the antiglare layer can be easily improved.
By setting the multifunctional (meth) acrylate oligomer to a predetermined ratio or more, the viscosity of the coating liquid for the antiglare layer can be increased, the particles can be easily suppressed from sinking below the antiglare layer, and the binder resin can be easily suppressed from flowing down between the projections based on the particles. Therefore, vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less. On the other hand, if the proportion of the multifunctional (meth) acrylate oligomer is too large, the strength of the antiglare layer may be lowered. In addition, if the viscosity of the coating liquid for the antiglare layer is too high, vmp may become too large or Sal may become too small. Therefore, the ionizing radiation-curable resin composition preferably contains a prescribed amount of the multifunctional (meth) acrylate oligomer and a prescribed amount of the multifunctional (meth) acrylate monomer.
Solvent, drying conditions-
As described above, the antiglare layer coating liquid preferably contains a solvent in order to adjust the viscosity or to enable dissolution or dispersion of each component.
The embodiments of the kind and the mixing amount of the solvent and the like are as described above, unless otherwise mentioned.
In embodiment 2, the solvent in the antiglare layer coating liquid preferably contains a solvent having a high evaporation rate as a main component. By increasing the evaporation rate of the solvent, the particles can be suppressed from sinking into the lower part of the antiglare layer, and the binder resin can be easily suppressed from flowing down between the projections based on the particles. Therefore, vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less.
In embodiment 2, when the antiglare layer is formed from the antiglare layer coating liquid, it is preferable to control the drying conditions.
The drying conditions can be controlled by the drying temperature and the air speed in the dryer. The drying temperature is preferably 30 ℃ to 120 ℃ inclusive, and the drying air speed is preferably 0.2m/s to 50m/s inclusive. In order to control the surface shape of the antiglare layer by drying, it is preferable to irradiate the ionizing radiation after drying the coating liquid.
Regarding the drying conditions, it is preferable to perform 2-stage drying in the above-described temperature range and air speed range. In addition, it is preferable that the drying temperature is set to be high and the wind speed is increased in the drying in the 2 nd stage as compared with the drying in the 1 st stage. By slowly drying in the 1 st stage, the shape of the amorphous inorganic particles can be easily reflected on the surface of the binder resin when the binder resin covers the surface of the amorphous inorganic particles. In addition, since the agglomeration of the organic particles can be easily suppressed by increasing the wind speed by increasing the drying temperature in the 2 nd stage to be higher than the drying temperature in the 1 st stage, the organic particles can be easily and densely arranged. Accordingly, by setting the drying to 2 stages, vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less.
In the drying in the 1 st stage, it is preferable that the drying temperature is set to 30℃or higher and less than 60℃and the drying air speed is set to 0.2m/s or higher and less than 7m/s. In the drying in the 2 nd stage, it is preferable that the drying temperature is set to 60℃or higher and 120℃or lower, and the drying air speed is set to 7m/s or higher and 50m/s or lower.
Anti-reflection layer
In embodiment 2, the antireflection layer is preferably located on the outermost surface on the 1 st surface side.
The structure of the antireflection layer, the method of forming the antireflection layer such as the low refractive index layer and the high refractive index layer, and the embodiments of the material for forming the low refractive index layer and the high refractive index layer are as described above unless otherwise mentioned.
The refractive index of the low refractive index layer, the thickness of the low refractive index layer, and the binder resin of the low refractive index layer are as described above.
In embodiment 2, the binder resin of the low refractive index layer may also contain a thermoplastic resin. By including the thermoplastic resin as the binder resin, the viscosity of the coating liquid for the low refractive index layer is increased, and the coating liquid for the low refractive index layer is less likely to flow down between the projections of the antiglare layer. Therefore, by including a thermoplastic resin as the binder resin, vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less. Further, since organic Si and fluorine are easily left in the vicinity of the surface of the 1 st plane, the element ratios of the formulae 2 to 4 can be easily satisfied. On the other hand, if the viscosity of the coating liquid for the low refractive index layer becomes too high, defects may occur on the surface of the antiglare layer when the coating liquid for the antireflection layer is applied.
The content of the thermoplastic resin is preferably 0.1 mass% or more and 3.0 mass% or less, more preferably 0.2 mass% or more and 1.5 mass% or less, and still more preferably 0.3 mass% or more and 0.7 mass% or less of the total amount of the binder resin, due to the above-described action and the coating film strength.
The types and weight average molecular weight of the thermoplastic resin are as described above.
The embodiments of the low refractive index particles such as hollow particles and solid particles are as described above unless otherwise mentioned.
The embodiments of the average primary particle diameters of the hollow particles and the solid particles, and the contents of the hollow particles and the solid particles are as described above.
In embodiment 2, in order to make the 1 st surface easily satisfy the element ratio of the above formulae 2 to 4, the low refractive index layer preferably contains a leveling agent containing organic Si and fluorine.
The embodiments of the constitution of the leveling agent, the content of the leveling agent, and the like are as described above.
As described above, the high refractive index layer is preferably arranged on the antiglare layer side than the low refractive index layer.
The embodiments of the refractive index of the high refractive index layer, the thickness of the high refractive index layer, the binder resin of the high refractive index layer, the high refractive index particles, the average primary particle diameter of the high refractive index particles, and the content of the high refractive index particles are as described above.
When forming an antireflection layer such as a low refractive index layer and a high refractive index layer by a wet method, it is preferable to increase the viscosity of the coating liquid for an antireflection layer. By increasing the viscosity of the coating liquid for an antireflection layer, the coating liquid for an antireflection layer is less likely to flow down between the projections of the antiglare layer, and therefore, even if the antireflection layer is formed on the antiglare layer, the surface shape of the antiglare layer can be easily maintained. Therefore, by appropriately increasing the viscosity of the coating liquid for the antireflection layer, vvv can be easily set to a predetermined value or more and Sal can be easily set to a predetermined value or less. Further, since organic Si and fluorine are easily left in the vicinity of the surface of the 1 st plane, the element ratios of the formulae 2 to 4 can be easily satisfied. For example, by adding a thermoplastic resin as a binder resin, increasing the ratio of an oligomer as an ionizing radiation curable resin composition, or selecting a solvent having a high viscosity as a solvent, the viscosity of the coating liquid for an antireflection layer can be increased.
On the other hand, if the viscosity of the coating liquid for an antireflection layer is excessively increased, defects may occur on the surface of the antiglare layer when the coating liquid for an antireflection layer is applied.
Therefore, the viscosity of the coating liquid for an antireflection layer at 23 ℃ is preferably 0.1 mPas or more and 5.0 mPas or less.
The solvent of the coating liquid for an antireflection layer may be the same as that of the embodiment of the solvent of the coating liquid for an antiglare layer.
When the antiglare layer is formed from the coating liquid for an antireflection layer, the drying conditions are preferably controlled.
For the drying conditions, it is possible to control by the drying temperature and the wind speed in the dryer. The drying temperature is preferably 30 ℃ to 70 ℃ inclusive, and the drying wind speed is preferably 10m/s to 30m/s inclusive. By setting the drying temperature to a low temperature, the viscosity of the coating liquid for the antireflection layer can be easily increased. In addition, by increasing the wind speed, the viscosity of the coating liquid for the antireflection layer can be rapidly increased. Therefore, by drying the coating liquid for the antireflection layer at a low temperature and a high wind speed, the coating liquid for the antireflection layer can be made less likely to flow down between the projections of the antiglare layer. That is, by drying the coating liquid for the antireflection layer at a relatively low temperature and a relatively high wind speed, the surface shape of Vvv or the like on the 1 st surface can be easily set to the above-described range, and the equations 1 to 4 can be easily satisfied.
The irradiation of the ionizing radiation is preferably performed after the anti-reflection layer coating liquid is dried.
Case of multilayer structure of 3 layers or more
The embodiment of the laminated structure of the antireflection layer having a 3-layer structure or more and the thickness of each layer is as described above.
< Optical Property >
Regarding the optical film of embodiment 2, the total light reflectance R SCI measured by the following method is preferably 3.0% or less.
[ Measurement of total light reflectance (R SCI) ]
A sample was produced by bonding a black plate to the 2 nd surface side of the optical film via a transparent adhesive. Total light reflectance (R SCI) was measured with the optical film side of the sample as a light incidence plane.
By setting R SCI to 3.0% or less, the black color tone of the black display portion can be easily improved in an environment where light having a strong illuminance does not enter the 1 st plane, and thus the contrast can be easily improved. The R SCI of the optical film is more preferably 2.5% or less, and still more preferably 2.0% or less. The lower limit of R SCI of the optical film is not particularly limited, and is usually 0.1% or more.
In general, when R SCI is 3.0% or less, the contrast of the reflectance of the portion having the fingerprint component and the portion having no fingerprint component increases, and the aesthetic properties of the optical film tend to be significantly reduced. However, in the optical film of the present disclosure, the drop contact angle is improved, and thus the fingerprint wiping property is good, and therefore, even if R SCI is 3.0% or less, the deterioration of the aesthetic property of the optical film can be easily suppressed.
R SCI is the reflected light measured by applying light to the sample surface from all directions using an integrating sphere and closing the optical trap corresponding to the regular reflection direction.
The embodiment of the measuring device for R SCI and the sample used in measuring R SCI are as described above.
JIS K7361-1 for optical film: 1997 is preferably in the above range. JIS K7136 of optical film: the haze of 2000 is preferably in the above range. The internal haze of the optical film is preferably in the above range.
The optical film was prepared according to JIS K7374:2007, C 0.125、C0.25、C0.5、C1.0 and C 2.0 are preferably the above ranges. The total of C 0.125、C0.5、C1.0 and C 2.0 of the optical film is preferably in the above range.
< Size, shape, etc.)
The embodiments of the size of the optical film, the shape of the optical film, and the surface shape of the 2 nd surface of the optical film are as described above.
[ Method for producing optical film of embodiment 2 ]
The method for producing an optical film according to embodiment 2 of the present disclosure is the method for producing an optical film according to the present disclosure described above, and includes step 1 of forming an antiglare layer on a substrate, and step 2 of forming an antireflection layer on the antiglare layer.
Examples of the means for forming the antiglare layer on the substrate include (a) the method using an embossing roll, (B) etching treatment, (C) mold-based molding, and (D) coating film formation by application.
In the case of the method (a), for example, by forming a resin layer on a substrate and shaping the resin layer by using an embossing roll, an antiglare layer can be formed on the substrate.
In the case of the method (B), for example, an antiglare layer can be formed on a substrate by forming a layer of a photocurable resin on the substrate and performing photolithography.
In the case of the method (C), for example, by flowing the resin into a mold, the molded resin is taken out from the mold and placed on a substrate, whereby an antiglare layer can be formed on the substrate.
In the case of the method (D), for example, by forming a coating film on a substrate by the method of (D1) or (D2) described above, an antiglare layer can be formed on the substrate.
Examples of the means for forming the antireflection layer on the antiglare layer include the wet method and the dry method described above.
[ Polarizing plate of embodiment 2 ]
The polarizing plate according to embodiment 2 of the present disclosure includes a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material, wherein at least one of the first transparent protective plate and the second transparent protective plate is the optical film according to embodiment 2 of the present disclosure described above, and the 2 nd surface of the optical film is disposed so as to face the polarizing material.
< Polarizing Material >
Embodiments of the polarizer are described above.
< Transparent protective plate >
A first transparent protective plate is disposed on one side of the polarizer, and a second transparent protective plate is disposed on the other side. At least one of the first transparent protective plate and the second transparent protective plate is the optical film of embodiment 2 of the present disclosure described above.
In the polarizing plate of the present disclosure, one of the first transparent protective plate and the second transparent protective plate may be the optical film of embodiment 2 of the present disclosure, or both of the first transparent protective plate and the second transparent protective plate may be the optical film of embodiment 2 of the present disclosure.
As the transparent protective plate other than the optical film of embodiment 2 of the present disclosure, a general-purpose plastic film, glass, or the like can be used among the first transparent protective plate and the second transparent protective plate.
The polarizer and the transparent protective plate are preferably bonded together via an adhesive. As the adhesive, a general-purpose adhesive, preferably a PVA-based adhesive, can be used.
[ Surface plate for image display device of embodiment 2 ]
The surface plate for an image display device according to embodiment 2 of the present disclosure is a surface plate for an image display device in which a protective film is laminated on a resin plate or a glass plate, wherein the protective film is the optical film according to embodiment 2 of the present disclosure, and the 2 nd surface of the optical film is disposed so as to face the resin plate or the glass plate.
The embodiments of the resin sheet or the glass sheet are as described above.
[ Image display Panel of embodiment 2]
An image display panel according to embodiment 2 of the present disclosure is an image display panel including a display element and an optical film disposed on a light emission surface side of the display element, wherein the image display panel includes the optical film according to embodiment 2 of the present disclosure described above as the optical film (see fig. 5).
In the image display panel, the optical film of embodiment 2 of the present disclosure is preferably arranged such that the 2 nd surface side faces the display element side.
In the image display panel, the optical film of embodiment 2 of the present disclosure is preferably disposed on the outermost surface of the display element on the light emission surface side.
Embodiments of the display element and the size of the image display panel are as described above. The embodiments of the image display panel with a touch panel are described above.
[ Image display device of embodiment 2]
The image display device of embodiment 2 of the present disclosure includes the image display panel of embodiment 2 of the present disclosure.
The image display device according to embodiment 2 of the present disclosure is not particularly limited as long as it includes the image display panel according to embodiment 2 of the present disclosure. The image display device according to embodiment 2 of the present disclosure preferably includes the image display panel according to embodiment 2 of the present disclosure, a drive control unit electrically connected to the image display panel, and a case accommodating them.
Embodiments of the backlight and the size of the image display device are as described above.
[ Method for selecting optical film of embodiment 2 ]
The method of selecting an optical film according to embodiment 2 of the present disclosure selects an optical film that satisfies the following selected conditions.
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
An image display panel comprising the present disclosure.
In the method for selecting an optical film according to embodiment 2 of the present disclosure, additional conditions may be selected. As additional conditions for selection, preferred embodiments of the optical film according to embodiment 2 are exemplified. Examples of additional conditions include the following a to D.
A: vvv/Vvc is 0.10 or less.
B: the optical film has the antireflection layer, the antiglare layer, and a base material in this order from the 1 st surface toward the 2 nd surface.
C: the element ratio satisfies the following formulas 2 to 4.
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
D: the total light reflectance R SCI measured by the following method is 3.0% or less,
[ Measurement of total light reflectance (R SCI) ]
A sample was produced by bonding a black plate to the 2 nd surface side of the optical film via a transparent adhesive. Total light reflectance (R SCI) was measured with the optical film side of the sample as a light incidence plane.
According to the method for selecting an optical film of embodiment 2 of the present disclosure, an optical film excellent in antiglare property and good in fingerprint wiping property can be efficiently selected.
[ Method for evaluating fingerprint Wipe Property ]
The method for evaluating fingerprint wiping property of the present disclosure uses a value of a falling contact angle measured by the following measurement as an evaluation index.
< Measurement of drop-down contact Angle >
A liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the surface of the object to be measured, and the liquid drop was dropped from a direction perpendicular to the surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
According to the method for evaluating fingerprint erasability of the present disclosure, fingerprint erasability of a measurement object can be easily evaluated. Specifically, the smaller the value of the drop contact angle, the better the fingerprint wiping performance can be evaluated.
The present disclosure includes the following [1] to [34].
[1] An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, the unit of the tilt angle is degrees, and the unit of the protruding-peak solid volume is ml/m 2.
[2] The optical film according to [1], wherein the Vmp of the 1 st face is 0.005ml/m 2 or more and 0.100ml/m 2 or less.
[3] The optical film according to [1] or [2], wherein the optical film of [1] is produced by ISO 25178-2:2012, and the protrusion valley space volume Vvv calculated by setting the load area ratio of the core portion to be separated from the protrusion valley to 80% is 0.005ml/m 2 or more and 0.100ml/m 2 or less.
[4] The optical film of [3], wherein Vvv of the 1 st side is different from the optical film of ISO 25178-2:2012 is 0.10 or less.
[5] The optical film according to any one of [1] to [4], wherein the 1 st face is composed of ISO 25178-2:2012 is set to a minimum autocorrelation length Sal of 4.0 μm or more and 12.0 μm or less.
[6] The optical film according to any one of [1] to [5], wherein the optical film has the antireflection layer, the antiglare layer, and a base material in this order from the 1 st surface toward the 2 nd surface.
[7] The optical film according to any one of [1] to [6], wherein the antiglare layer comprises a binder resin and particles.
[8] The optical film according to any one of [1] to [6], wherein an element ratio of the optical film obtained by analyzing the surface region on the 1 st surface side by X-ray photoelectron spectroscopy satisfies the following formulas 2 to 4,
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
In the formulas 2 to 4, "F" is a ratio of fluorine element, "inorganic Si" is a ratio of silicon element attributed to inorganic silicon compound, and "organic Si" is a ratio of silicon element attributed to organic silicon compound.
[9] The optical film according to [8], wherein the ratio of the inorganic Si to the total element is 2 at% or more and 20 at% or less, with respect to the element ratio obtained by the analysis by the X-ray photoelectron spectroscopy.
[10] The optical film according to any one of [1] to [9], wherein the optical film has a total light reflectance R SCI of 3.0% or less as measured by the following method,
[ Measurement of total light reflectance R SCI ]
A sample was produced in which a black plate was attached to the 2 nd surface side of the optical film via a transparent adhesive, and the total light reflectance R SCI was measured using the optical film side of the sample as a light incident surface.
[11] The optical film according to any one of [1] to [10], wherein the optical film has JIS K7136:2000 has a haze of 20% to 75%.
[12] A polarizing plate comprising a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material,
The optical film according to any one of [1] to [11], wherein the 2 nd surface of the optical film is disposed so as to face the polarizer.
[13] A surface plate for an image display device, which is formed by laminating a protective film on a resin plate or a glass plate, wherein the protective film is an optical film according to any one of [1] to [11], and the 2 nd surface of the optical film is disposed to face the resin plate or the glass plate.
[14] An image display panel comprising a display element and an optical film disposed on a light emission surface side of the display element, wherein the image display panel comprises any one of [1] to [11] as the optical film.
[15] An image display device comprising the image display panel of [14 ].
[16] A method for producing an optical film according to any one of [1] to [11], wherein,
The optical film manufacturing method comprises the following steps: a step 1 of forming an antiglare layer on a substrate; and a step 2 of forming an antireflection layer on the antiglare layer.
[17] A method for selecting an optical film, which selects an optical film satisfying the following selected conditions,
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, the unit of the tilt angle is degrees, and the unit of the protruding-peak solid volume is ml/m 2.
[18] An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
[19] The optical film of [18], wherein Vvv of the 1 st side is different from the optical film of ISO 25178-2:2012 is 0.10 or less.
[20] The optical film according to [18] or [19], wherein the optical film of the 1 st aspect is produced by ISO 25178-2:2012 is set to a minimum autocorrelation length Sal of 4.0 μm or more and 12.0 μm or less.
[21] The optical film according to any one of [18] to [20], wherein a pole height Sxp of the 1 st plane is 0.15 μm or more and 2.00 μm or less, the pole height Sxp being defined by ISO 25178-2:2012, a difference between a height having a load area ratio of 2.5% and a height having a load area ratio of 50%.
[22] The optical film according to any one of [18] to [21], wherein the optical film has the antireflection layer, the antiglare layer, and a base material in this order from the 1 st surface toward the 2 nd surface.
[23] The optical film according to any one of [18] to [22], wherein the antiglare layer comprises a binder resin and particles.
[24] The optical film according to any one of [18] to [23], wherein an element ratio of the optical film obtained by analyzing the surface region on the 1 st surface side by X-ray photoelectron spectroscopy satisfies the following formulas 2 to 4,
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
In the formulas 2 to 4, "F" is a ratio of fluorine element, "inorganic Si" is a ratio of silicon element attributed to inorganic silicon compound, and "organic Si" is a ratio of silicon element attributed to organic silicon compound.
[25] The optical film according to [24], wherein the ratio of the inorganic Si to the total element is 2 at% or more and 20 at% or less with respect to the element ratio obtained by the analysis by the X-ray photoelectron spectroscopy.
[26] The optical film according to any one of [18] to [25], wherein the optical film has a total light reflectance R SCI of 3.0% or less as measured by the following method,
[ Measurement of total light reflectance R SCI ]
A sample was produced in which a black plate was attached to the 2 nd surface side of the optical film via a transparent adhesive, and the total light reflectance R SCI was measured using the optical film side of the sample as a light incident surface.
[27] The optical film according to any one of [18] to [26], wherein the optical film has JIS K7136:2000 has a haze of 20% to 75%.
[28] A polarizing plate comprising a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material,
The optical film according to any one of [18] to [27] of the first transparent protective plate and the second transparent protective plate, wherein the 2 nd surface of the optical film is disposed so as to face the polarizer.
[29] A surface plate for an image display device, which is formed by laminating a protective film on a resin plate or a glass plate, wherein the protective film is an optical film according to any one of [18] to [27], and the 2 nd surface of the optical film is disposed to face the resin plate or the glass plate.
[30] An image display panel comprising a display element and an optical film disposed on a light emission surface side of the display element, wherein the image display panel comprises any one of [18] to [27] as the optical film.
[31] An image display device comprising the image display panel of [30 ].
[32] A method for producing an optical film according to [18], wherein,
The optical film manufacturing method comprises the following steps: a step 1 of forming an antiglare layer on a substrate; and a step 2 of forming an antireflection layer on the antiglare layer.
[33] A method for selecting an optical film, which selects an optical film satisfying the following selected conditions,
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
[34] A method for evaluating fingerprint wiping properties, which comprises using a falling contact angle value measured by the following measurement as an evaluation index,
< Measurement of drop-down contact Angle >
A liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the surface of the object to be measured, and the liquid drop was dropped from a direction perpendicular to the surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
Examples (example)
Next, the present disclosure is described in more detail by way of examples, but the present disclosure is not limited by any of these examples. Unless otherwise specified, "parts" and "%" are mass references.
Examples and comparative examples of embodiment 1
1. Measurement and evaluation
The optical films of examples and comparative examples were measured and evaluated as follows. The atmosphere at each measurement and evaluation was: the temperature is 23+ -5deg.C, and the relative humidity is 40% or more and 65% or less. In addition, before each measurement and evaluation is started, the object sample is exposed to the atmosphere for 30 minutes to 60 minutes, and then the measurement and evaluation are performed. The results are shown in tables 1 or 2.
1-1 Measurement of surface shape
The optical films of examples and comparative examples were cut into 10cm×10cm pieces. The cutting sites were selected from random sites, after visually confirming that there were no abnormal points such as dirt and flaws. Sample 1 was prepared as follows: the cut optical film was bonded to a glass plate (thickness: 2.0 mm) having a size of 10cm in the longitudinal direction and 10cm in the transverse direction via an optically transparent pressure-sensitive adhesive sheet (trade name: PANACLEAN PD-S1, thickness: 25 μm) from PANAC.
After the confocal laser microscope (VK-X250 (control unit) and VK-X260 (measurement unit)) was used and set so that the sample 1 was in a fixed state and in close contact with the measurement table, the surface shape of the 1 st surface of each sample was measured and analyzed under the following measurement condition 1, image processing condition 1, and analysis condition 1. For the measurement/analysis software, a multi-file analysis application (version 1.3.1.120) was used.
(Measurement condition 1)
Laser wavelength: 408nm
Optical system for measurement: confocal optical system
An objective lens: 150 times
Zoom:1 time of
Measurement area: 93.95 μm X70.44. Mu.m
Number of measurement points: 1024×768 dots
Measurement conditions: transparent body surface shape/high precision/presence double scan
(Image processing condition 1)
DCL/BCL: dcl=13000, bcl=65535, processing method: supplementing from surrounding pixels
High cut-off level: strong strength
(Analysis condition 1)
Region: whole area
Filter class: gauss (Gauss)
S-Filter: 0.25 μm
F-operation: plane tilt correction (zone designation)
L-Filter: without any means for
Correction of terminal effects: ON (ON)
S when calculating Sal: s=0.20
P, q when calculating Sxp: p=2.5%, q=50.0%
"Sa", "Vmp", "Vvv", "Vvc", "Sal", "Sxp" of each measurement region are displayed by the analysis software and taken as measurement values.
1-2 Contact angle
< Contact Angle in general >
The optical films of examples and comparative examples were cut into 10cm squares. The substrate side of the optical film after cutting was bonded to a glass plate (10 cm in the longitudinal direction by 10cm in the transverse direction, and 2.0mm in thickness) via a transparent adhesive sheet, and a sample for measurement was prepared. After visually confirming that the cut portions have no abnormal points such as dirt and flaws, the cut portions are selected from random portions of the optical film. When the optical film is bonded to the glass plate, the optical film is prevented from wrinkling, and no air bubbles are introduced between the optical film and the glass plate.
Using a contact angle meter (DM-300, co., ltd.) 1.0. Mu.L of pure water was dropped onto the 1 st surface side of each sample, and the static contact angle after landing for 10 seconds was measured by the θ/2 method. In the dripping of pure water, a syringe having a needle portion coated with a fluororesin was used.
< Pure water falling inclination angle >
According to the procedures (1) to (3) of the text of the specification, the pure water falling inclination angle Sw of each sample was measured. For the measuring device, a contact angle meter (product No. DMo-701 of "DropMaster" series of co-ordinated interface science company. Use "SA-301" as an accessory) was used.
1-3 Element ratio
The measurement sheets were cut out from the optical films of examples and comparative examples. Using an X-ray photoelectron spectroscopy apparatus, the X-ray photoelectron spectra of the C1s orbit, O1s orbit, si2p orbit, and F1s orbit of the surface region on the 1 st surface side of each measurement piece were measured under the conditions described below. The X-ray photoelectron spectra were subjected to peak separation to determine the ratio of the F element to the Si element. The ratio of the Si element (inorganic Si) belonging to the inorganic silicon compound to the Si element (organic Si) belonging to the organic silicon compound was determined from the X-ray photoelectron spectrum of the Si2p orbital.
< Measurement >
The device comprises: device manufactured by Shimadzu corporation under the trade name "Kratos Nova
An X-ray source: alK alpha
X-ray output: 150W
Emission current: 10mA
Acceleration voltage: 15kV
Measurement area: 300X 700 mu m
Charge neutralization mechanism: ON (ON)
By energy (narrow spectrum measurement): 40eV
1-4 Total light reflectance (R SCI)
The optical films of examples and comparative examples were cut into 10cm×10cm pieces. The cutting sites were selected from random sites, after visually confirming that there were no abnormal points such as dirt and flaws. Sample 2 was prepared as follows: the cut optical film was laminated on a black plate (Kuraray, trade name: comoglass DFA CG 502K (black system, thickness: 2 mm) having a size of 10cm in the longitudinal direction and 10cm in the transverse direction via an optically transparent pressure-sensitive adhesive sheet (trade name: PANACLEAN PD-S1) from PANAC.
The total light reflectance (R SCI) was measured from the 1 st surface side of sample 2 using an integrating sphere spectrophotometer (trade name: CM-2002, product of Konikoku Meida Co.). The light source of the integrating sphere spectrophotometer is D65, the position of the light receiver is +8 degrees relative to the normal line of the sample, the opening angle of the light receiver is 10 degrees, the position of the light trap is-8 degrees relative to the normal line of the sample, and the viewing angle is 2 degrees.
1-5 Haze (Hz)
The optical films of examples and comparative examples were cut into 10cm squares. The cutting sites were selected from random sites, after visually confirming that there were no abnormal points such as dirt and flaws. JIS K7136 was measured for each sample using a haze meter (HM-150, manufactured by color technology research, village): haze of 2000.
In order to stabilize the light source, the calibration is performed without setting anything in the inlet opening after waiting for 15 minutes or more after the power switch of the apparatus is turned on in advance, and then the measurement sample is set in the inlet opening to perform the measurement. The light incident surface is set as the substrate side.
The total light transmittance of the optical films of examples and comparative examples was 90% or more.
1-6. Transmitted image definition
The optical films of examples and comparative examples were cut into 10cm squares. The cutting sites were selected from random sites, after visually confirming that there were no abnormal points such as dirt and flaws. An image measuring instrument (trade name: ICM-1T) manufactured by Suga tester Co., ltd.) was used in accordance with JIS K7374:2007 the transmitted image sharpness of the sample was measured. The width of the optical comb is 5 widths of 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0 mm. The light incident surface at the time of measurement was set to the substrate side. Table 2 shows the values of C 0.125、C0.25、C0.5、C1.0 and C 2.0, and the total value of C 0.125、C0.5、C1.0 and C 2.0.
1-7. Black tone
As the sample, sample 2 prepared in 1 to 4 was used. The sample was observed in the same manner as 1 to 4 except that the line of sight of the observer was changed to about 160cm from the ground.
The 20 subjects were evaluated based on the following evaluation scores. Regarding 20 subjects, 5 subjects were each in each age range of 20 years to 50 years. Average scores of the 20-person evaluations were calculated and ranked according to the following criteria. It can be said that the higher the ranking of the below-described criteria, the better the black tone of the black display portion.
< Evaluation score >
(1) Whiteness was not perceived and black was fully perceived: 3 minutes
(2) Although black, a slight perceived whiteness: 2 minutes
(3) Note the whiteness: 1 minute
< Evaluation criterion >
A: average is above 2.5
B: average is more than 2.0 and less than 2.5
C: average is 1.5 or more and less than 2.0
D: average score is less than 1.5
1-8 Antiglare properties
In a bright room environment, the sample 2 prepared in 1-4 was placed on a horizontal stage having a height of 70cm with its concave-convex surface facing upward. At this time, the sample was set so as to be substantially directly below the illumination light. The sample was observed from the front (wherein the observer did not block the illumination light), and reflection of the illumination light onto the concave-convex surface was evaluated according to the following evaluation criteria.
For illumination, a straight-tube three-wavelength solar color fluorescent lamp of Hf32 type was used, and the illumination position was set to a height of 2m upward in the vertical direction from the horizontal stand. The evaluation was performed in a range of illuminance of 500lux or more and 1000lux or less on the uneven surface of the sample. The line of sight of the observer is about 120cm from the ground. Observers were healthy, 30-year-old people with a vision of 0.7 or more.
< Evaluation criterion >
A: without the outline of the illumination, nor the position
B: without illuminated contours, but with ambiguous knowledge of position
C: ambiguously knowing the outline and location of the illumination
D: the ambiguity of the illumination profile is weak and the position is also clearly known
1-9 Fingerprint Wipe
0.1Ml of artificial soil described below was allowed to infiltrate into the waste cloth. The infiltration time was 10 seconds. As the waste cloth, a product of japan paper Crecia corporation under the trade name "water absorbing wipe" is used.
The artificial dirt permeated into the waste cloth was transferred to the surface of the rubber with a load of 300g/cm 2. The shape of the rubber was a cylindrical shape with a diameter of 12 mm. The transfer time was 5 seconds. The artificial soil transferred to the surface of the rubber was transferred to the 1 st side of sample 2 with a load of 300g/cm 2. The transfer time was 5 seconds. The L * value, the a * value, and the b * value of the total light reflection SCI of the site where the artificial dirt was transferred were measured from the 1 st surface side of the sample 2 using a spectrocolorimeter (trade name: CM-600d, manufactured by Konikoku Meida Co., ltd.). The obtained L * value, a * value, and b * value were taken as L1, a1, and b1.
Next, the black plate side of sample 2 to which artificial dirt was transferred was attached to a base of a vibration abrasion tester (manufactured by TESTER SANGYO Co., ltd., product name "AB-301"). The waste cloth was attached to the friction material of the tester, and the artificial dirt transferred to the 1 st surface of the sample 2 was wiped off under the following wiping conditions. For the revocation, a commodity of the trade name "ASPURE PROPREA II" of the AS ONE company is used. The L * value, the a * value, and the b * value of the total light reflection SCI of the part from which the artificial dirt was wiped off were measured from the 1 st surface side of the sample 2 using a spectrocolorimeter (trade name: CM-600d, manufactured by Konikoku Meida Co., ltd.). The resulting values of L *, a * and b * were taken as L2, a2 and b2.
The color difference (Δe) is calculated by the following expression, and the order is determined according to the following criteria based on the color difference value. The higher the ranking of the below-described criteria, the better the fingerprint wiping can be said.
ΔE={(L1-L2)2+(a1-a2)2+(b1-b2)2}1/2
< Artificial soil >
Is a liquid (artificial soil manufactured by Yi Hui Corp. (contaminated liquid according to JIS C9606:2007)) containing about 45% by mass of oleic acid, about 25% by mass of glyceryl trioleate, about 20% by mass of oleic cholesterol, about 4% by mass of liquid paraffin, about 4% by mass of squalene, and about 2% by mass of cholesterol.
< Wiping conditions >
Speed of movement: 100 mm/sec
Load: 150g/cm 2
Number of wipes: one pass 1 time
< Evaluation criterion >
A: the color difference is below 2
B: the color difference exceeds 2 and is below 4
C: the color difference exceeds 4 and is below 7
D: color difference exceeding 7
1-10. Comprehensive evaluation
Based on 2 evaluations of antiglare property and fingerprint wiping property, comprehensive evaluation was performed according to the following criteria.
< Evaluation criterion >
A: all 2 evaluations were a.
B: one of the two evaluations was a and one was B.
C:2 out of 2 evaluations were B.
D: at least 1 of the 2 evaluations were C or D.
2. Fabrication of optical films
Examples 1 to 1
The following antiglare layer coating liquid 1-1 was applied to a substrate (triacetyl cellulose resin film having a thickness of 80 μm, fuji photo film Co.). Next, the mixture was dried at 50℃and a wind speed of 2m/s for 40 seconds, and further dried at 70℃and a wind speed of 15m/s for 45 seconds. Next, ultraviolet rays were irradiated under a nitrogen atmosphere having an oxygen concentration of 200ppm or less so that the cumulative light amount became 50mJ/cm 2, thereby forming an antiglare layer having a thickness of 5.5. Mu.m.
Next, the low refractive index layer coating liquid 1-1 described below was coated on the antiglare layer. Next, the mixture was dried at 40℃and a wind speed of 20m/s for 15 seconds, and further dried at 70℃and a wind speed of 15m/s for 30 seconds. Next, ultraviolet rays were irradiated under a nitrogen atmosphere having an oxygen concentration of 200ppm or less so that the cumulative light amount became 150mJ/cm 2, and a low refractive index layer having a thickness of 0.10 μm was formed, thereby obtaining an optical film of example 1-1. The refractive index of the low refractive index layer was 1.31.
< Antiglare layer coating liquid 1-1>
Polyurethane acrylate A50 parts
( Xinzhongcun chemical industry company, trade name: U-1100H: molecular weight 800 and number of functional groups of 6 )
Polyurethane acrylate B10 parts
( Xinzhongcun chemical industry company, trade name: u-15HA: molecular weight 2300 and number of functional groups 15 )
Pentaerythritol triacrylate 40 parts
(East Asia Synthesis, trade name: M-305)
23 Parts of silica particles
( Surface-treating amorphous silica, d10:1.2 μm, d50:3.8 μm, d90:6.5 μm )
Organic particles B8 parts
(Spherical polyacrylic acid-styrene copolymer, average particle diameter of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts
(IGM RESINS B.V. company, trade name: omnirad 184)
Photopolymerization initiator 1.0 part
(IGM RESINS B. V. Company, trade name: omnirad 907)
0.1 Part of organosilicon leveling agent
( Momentive Performance Materials company, trade name: TSF 4460 )
195 Parts of solvent (toluene)
5 Parts of solvent (cyclohexanone)
15 Parts of solvent (methyl isobutyl ketone)
< Coating liquid for Low refractive index layer 1-1>
100 Parts of multifunctional acrylate
(Trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
Acrylic Polymer 0.5 parts (weight-average molecular weight: 40000)
180 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
600 Parts of fluorine-based organosilicon leveling agent having reactive functional groups
( The trade name "KY 1203", solid component: 20%, solvent: methyl isobutyl ketone )
Photopolymerization initiator 5.0 parts
(IGM RESINS company, trade name "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
Examples 1-2, 1-3, 1-5, 1-6
Optical films of examples 1-2, 1-3, 1-5 and 1-6 were obtained in the same manner as in example 1-1 except that the antiglare layer coating liquid 1-1 was changed to the antiglare layer coating liquids 1-2 to 1-5 described below.
Examples 1 to 4
An optical film of example 1-4 was obtained in the same manner as in example 1-1 except that the antiglare layer coating liquid 1-1 was changed to the antiglare layer coating liquid 1-2 described below and the low refractive index layer coating liquid 1-1 was changed to the low refractive index layer coating liquid 1-2 described below.
Examples 1 to 7
An optical film of examples 1 to 7 was obtained in the same manner as in example 1-1 except that the antiglare layer coating liquid 1-1 was changed to the antiglare layer coating liquid 1-6 described below and the antiglare layer thickness was set to 4.8. Mu.m.
Examples 1 to 8
An optical film of example 1-8 was obtained in the same manner as in example 1-1 except that the antiglare layer coating liquid 1-1 was changed to the antiglare layer coating liquid 1-2 described below and the low refractive index layer coating liquid 1-1 was changed to the low refractive index layer coating liquid 1-3 described below. The refractive index of the low refractive index layer was 1.36.
Comparative examples 1 to 1
An optical film of comparative example 1-1 was obtained in the same manner as in example 1-1 except that the low refractive index layer coating liquid 1-1 was changed to the low refractive index layer coating liquid 1-4 described below.
Comparative examples 1-2 to 1-3
Optical films of comparative examples 1-2 to 1-3 were obtained in the same manner as in comparative example 1-1 except that the antiglare layer coating liquid 1-1 was changed to the antiglare layer coating liquids 1-2 to 1-3 described below.
Comparative examples 1 to 4
An optical film of comparative examples 1 to 4 was obtained in the same manner as in example 1-1 except that the antiglare layer coating liquid 1-1 was changed to the antiglare layer coating liquid 1-7 described below and the antiglare layer thickness was 5.0. Mu.m.
< Antiglare layer coating liquid 1-2>
Polyurethane acrylate A50 parts
( Xinzhongcun chemical industry company, trade name: U-1100H: molecular weight 800 and number of functional groups of 6 )
Polyurethane acrylate B10 parts
( Xinzhongcun chemical industry company, trade name: u-15HA: molecular weight 2300 and number of functional groups 15 )
Pentaerythritol triacrylate 40 parts
(East Asia Synthesis, trade name: M-305)
21 Parts of silica particles
( Surface-treating amorphous silica, d10:1.2 μm, d50:3.8 μm, d90:6.5 μm )
Organic particles B10 parts
(Spherical polyacrylic acid-styrene copolymer, average particle diameter of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
185 Parts of solvent (toluene)
15 Parts of solvent (cyclohexanone)
15 Parts of solvent (methyl isobutyl ketone)
< Antiglare layer coating liquid 1-3>
50 Parts of urethane acrylate A (New Zhongcun chemical industry Co., ltd., trade name: U-1100H: molecular weight 800, functional group number 6) 10 parts of urethane acrylate B (New Zhongcun chemical industry Co., trade name: U-15HA: molecular weight 2300, functional group number 15) 40 parts of pentaerythritol triacrylate (east Asia Synthesis Co., trade name: M-305)
Silica particles 19 parts (surface-treated amorphous silica, d10:1.2. Mu.m, d50:3.8. Mu.m, d90:6.5. Mu.m) organic particles A3 parts (spherical polyacrylic acid-styrene copolymer, average particle size 1.5. Mu.m, refractive index 1.515) organic particles B5 parts (spherical polyacrylic acid-styrene copolymer, average particle size 1.5. Mu.m, refractive index 1.595) photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name Omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
165 Parts of solvent (toluene)
Solvent (cyclohexanone) 20 parts
30 Parts of solvent (methyl isobutyl ketone)
< Antiglare layer coating liquid 1-4>
50 Parts of urethane acrylate A (New Zhongcun chemical industry Co., ltd., trade name: U-1100H: molecular weight 800, functional group number 6) 10 parts of urethane acrylate B (New Zhongcun chemical industry Co., trade name: U-15HA: molecular weight 2300, functional group number 15) 40 parts of pentaerythritol triacrylate (east Asia Synthesis Co., trade name: M-305)
20 Parts of silica particles (surface-treated amorphous silica, d10:1.2. Mu.m, d50:3.8. Mu.m, d90:6.5. Mu.m) organic particles A8 parts (spherical polyacrylic acid-styrene copolymer, average particle size 1.5. Mu.m, refractive index 1.515) organic particles B2 parts (spherical polyacrylic acid-styrene copolymer, average particle size 1.5. Mu.m, refractive index 1.595) photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
190 Parts of solvent (toluene)
10 Parts of solvent (cyclohexanone)
15 Parts of solvent (methyl isobutyl ketone)
< Antiglare layer coating liquid 1-5>
50 Parts of urethane acrylate A (New Zhongcun chemical industry Co., ltd., trade name: U-1100H: molecular weight 800, functional group number 6) 10 parts of urethane acrylate B (New Zhongcun chemical industry Co., trade name: U-15HA: molecular weight 2300, functional group number 15) 40 parts of pentaerythritol triacrylate (east Asia Synthesis Co., trade name: M-305)
10 Parts of silica particles (surface-treated amorphous silica, d10:1.0 μm, d50:3.0 μm, d90:4.8 μm) organic particles A5 parts (spherical polyacrylic acid-styrene copolymer, average particle diameter of 1.5 μm, refractive index of 1.515)
5 Parts of organic particles B (spherical polyacrylic acid-styrene copolymer, average particle size of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
170 Parts of solvent (toluene)
40 Parts of solvent (cyclohexanone)
5 Parts of solvent (methyl isobutyl ketone)
< Antiglare layer coating liquid 1-6>
Polyurethane acrylic ester C50 parts (Mitsubishi chemical Co., trade name: U-1700B: molecular weight 2000, functional group number 10)
Pentaerythritol triacrylate 50 parts (trade name: M-305, east Asia Synthesis Co., ltd.)
11 Parts of organic particles C (spherical polyacrylic acid-styrene copolymer, average particle diameter of 3.0 μm, refractive index of 1.595)
70 Parts of inorganic ultrafine particles (silica having a reactive functional group introduced into the surface thereof, solvent: MIBK, solid content: 30%) (average primary particle diameter: 12 nm)
Photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
170 Parts of solvent (toluene)
25 Parts of solvent (cyclohexanone)
< Antiglare layer coating liquid 1-7>
30 Parts of urethane acrylate A (Mitsubishi chemical company, trade name: U-1700B: molecular weight 2000, functional group number 10)
10 Parts of urethane acrylate B (New Zhongcun chemical industry Co., trade name: U-15HA: molecular weight 2300, functional group number 15) 60 parts of pentaerythritol triacrylate (east Asia Synthesis Co., trade name: M-305)
3 Parts of silica particles (surface-treated amorphous silica, d10:1.0 μm, d50:3.0 μm, d90:4.8 μm). 0.5 parts of organic particles B (spherical polyacrylic acid-styrene copolymer, average particle diameter of 1.5 μm, refractive index of 1.595). 5.0 parts of photopolymerization initiator (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
180 Parts of solvent (toluene)
5 Parts of solvent (cyclohexanone)
25 Parts of solvent (methyl isobutyl ketone)
< Coating liquid for Low refractive index layer 1-2>
180 Parts of multifunctional acrylate (trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
100 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
600 Parts of fluorine-based organosilicon leveling agent having reactive functional groups
( The trade name "KY 1203", solid component: 20%, solvent: methyl isobutyl ketone )
Photopolymerization initiator 5 parts
(IGM RESINS company, trade name "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
< Coating liquid for Low refractive index layer 1-3>
100 Parts of multifunctional acrylate
(Trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
100 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
Acrylic Polymer 0.5 parts (weight-average molecular weight: 40000)
250 Parts of fluorine-containing organosilicon leveling agent having reactive functional groups
( The trade name "KY 1203", solid component: 20%, solvent: methyl isobutyl ketone )
Photopolymerization initiator 5 parts
(IGM RESINS company, trade name "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
< Coating liquid for Low refractive index layer 1-4>
100 Parts of multifunctional acrylate
(Trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
Acrylic Polymer 0.5 parts (weight-average molecular weight: 40000)
180 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
150 Parts of a fluorine-containing silicone leveling agent having a reactive functional group (Xinyue chemical Co., ltd., "KY 1203", solid content: 20%, solvent: methyl isobutyl ketone) & photopolymerization initiator 5.0 parts (IGM RESINS Co., ltd., "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
TABLE 1
TABLE 2
From the results of table 1, it was confirmed that the optical film of example 1 can provide excellent antiglare properties and fingerprint wiping properties.
Examples and comparative examples of embodiment 2
3. Measurement and evaluation
The optical films of examples and comparative examples were measured and evaluated as follows. The atmosphere at each measurement and evaluation was: the temperature is 23+ -5deg.C, and the relative humidity is 40% or more and 65% or less. In addition, before each measurement and evaluation is started, the object sample is exposed to the atmosphere for 30 minutes to 60 minutes, and then the measurement and evaluation are performed. The results are shown in tables 3 or 4.
3-1 Measurement of surface shape
The surface shapes of the optical films of examples and comparative examples were measured by the same method as in 1-1 above.
3-2 Contact angle
< Contact Angle in general >
The typical contact angles of the optical films of examples and comparative examples were measured by the same method as in 1-2 above.
< Falling contact Angle >
The droplets having a surface tension of 30mN/m were placed in a syringe, and the needle portion of the syringe was coated with a fluorine resin. For the 1 st surface of each sample, a droplet having a surface tension of 30mN/m was naturally dropped from a height of 45 mm. The amount of the dropped droplets was 5.0. Mu.l. As the liquid, a liquid having the following composition was used. The droplets were allowed to fall from the vertical direction of the 1 st surface. The static contact angle after landing for 10 seconds was measured by the θ/2 method. As the measuring device, a contact angle meter (model: DM-300, co., ltd.) was used.
< Composition of liquid >
It is a liquid containing 100% by mass of ethylene glycol monoethyl ether (Fuji film and optical purity chemical Co., ltd., model: liquid mixture No.30 for wetting tension test)
3-3 Element ratio
The element ratios of the surface areas on the 1 st side of the optical films of examples and comparative examples were measured by the same method as in 1-3 above.
3-4 Total light reflectance (R SCI)
The total light reflectance (R SCI) of the optical films of examples and comparative examples was measured by the same method as that of 1 to 4 above.
3-5 Haze (Hz)
The haze of the optical films of examples and comparative examples was measured by the same method as in 1 to 5 above.
The total light transmittance of the optical films of examples and comparative examples was 90% or more.
3-6. Transmitted image definition
The transmission image sharpness of the optical films of examples and comparative examples was measured by the same method as in 1 to 6 above.
3-7. Black tone
The optical films of examples and comparative examples were evaluated for black tone by the same method as in 1 to 7 above.
3-8 Antiglare properties
The antiglare properties of the optical films of examples and comparative examples were evaluated by the same methods as those of 1 to 8 described above.
3-9 Fingerprint Wipe
The optical films of examples and comparative examples were evaluated for fingerprint wiping properties by the same methods as those of 1 to 9.
3-10. Comprehensive evaluation
The optical films of examples and comparative examples were comprehensively evaluated on the basis of the same criteria as those of 1 to 10.
4. Fabrication of optical films
Examples 2 to 1
The following antiglare layer coating liquid 2-1 was applied to a substrate (triacetyl cellulose resin film having a thickness of 80 μm, fuji photo film Co.). Next, the mixture was dried at 50℃and a wind speed of 2m/s for 40 seconds, and further dried at 70℃and a wind speed of 15m/s for 45 seconds. Next, ultraviolet rays were irradiated under a nitrogen atmosphere having an oxygen concentration of 200ppm or less so that the cumulative light amount became 50mJ/cm 2, thereby forming an antiglare layer having a thickness of 5.5. Mu.m.
Next, the low refractive index layer coating liquid 2-1 described below was coated on the antiglare layer. Next, the mixture was dried at 40℃and a wind speed of 20m/s for 15 seconds, and further dried at 70℃and a wind speed of 15m/s for 30 seconds. Next, ultraviolet rays were irradiated under a nitrogen atmosphere having an oxygen concentration of 200ppm or less so that the cumulative light amount became 150mJ/cm 2, and a low refractive index layer having a thickness of 0.10 μm was formed, thereby obtaining an optical film of example 2-1. The refractive index of the low refractive index layer was 1.31.
< Antiglare layer coating liquid 2-1>
Polyurethane acrylate A30 parts
( Mitsubishi chemical corporation, trade name: U-1700B: molecular weight 2000 and number of functional groups 10 )
Polyurethane acrylate B10 parts
( Xinzhongcun chemical industry company, trade name: u-15HA: molecular weight 2300 and number of functional groups 15 )
Pentaerythritol triacrylate 60 parts
(East Asia Synthesis, trade name: M-305)
23 Parts of silica particles
( Surface-treating amorphous silica, d10:1.2 μm, d50:3.7 μm, d90:6.2 μm )
Organic particles B8 parts
(Spherical polyacrylic acid-styrene copolymer, average particle diameter of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts
(IGM RESINS B.V. company, trade name: omnirad 184)
Photopolymerization initiator 1.0 part
(IGM RESINS B. V. Company, trade name: omnirad 907)
0.1 Part of organosilicon leveling agent
( Momentive Performance Materials company, trade name: TSF 4460 )
190 Parts of solvent (toluene)
5 Parts of solvent (cyclohexanone)
Solvent (methyl isobutyl ketone) 20 parts
< Coating liquid for Low refractive index layer 2-1>
100 Parts of multifunctional acrylate
(Trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
Acrylic Polymer 0.5 parts (weight-average molecular weight: 40000)
180 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
600 Parts of fluorine-based organosilicon leveling agent having reactive functional groups
( The trade name "KY 1203", solid component: 20%, solvent: methyl isobutyl ketone )
Photopolymerization initiator 5.0 parts
(IGM RESINS company, trade name "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
Examples 2-2, 2-3, 2-5, 2-6
Optical films of examples 2-2, 2-3, 2-5 and 2-6 were obtained in the same manner as in example 2-1 except that the antiglare layer coating liquid 2-1 was changed to the antiglare layer coating liquids 2-2 to 2-5 described below.
Examples 2 to 4
An optical film of example 2-4 was obtained in the same manner as in example 2-1, except that the antiglare layer coating liquid 2-1 was changed to the antiglare layer coating liquid 2-2 described below and the low refractive index layer coating liquid 2-1 was changed to the low refractive index layer coating liquid 2-2 described below.
Examples 2 to 7
An optical film of example 2-7 was obtained in the same manner as in example 2-1 except that the antiglare layer coating liquid 2-1 was changed to the antiglare layer coating liquid 2-6 described below and the antiglare layer thickness was set to 4.8. Mu.m.
Examples 2 to 8
An optical film of example 2-8 was obtained in the same manner as in example 2-1, except that the antiglare layer coating liquid 2-1 was changed to the antiglare layer coating liquid 2-2 described below and the low refractive index layer coating liquid 2-1 was changed to the low refractive index layer coating liquid 2-3 described below. The refractive index of the low refractive index layer was 1.36.
Comparative examples 2 to 1
An optical film of comparative example 2-1 was obtained in the same manner as in example 2-1 except that the low refractive index layer coating liquid 2-1 was changed to the low refractive index layer coating liquid 2-4 described below.
Comparative examples 2-2 to 2-3
Optical films of comparative examples 2-2 to 2-3 were obtained in the same manner as in comparative example 2-1 except that the antiglare layer coating liquid 2-1 was changed to the antiglare layer coating liquids 2-2 to 2-3 described below.
Comparative examples 2 to 4
An optical film of comparative example 2-4 was obtained in the same manner as in example 2-1 except that the antiglare layer coating liquid 2-1 was changed to the antiglare layer coating liquid 2-7 described below and the antiglare layer thickness was set to 5.0. Mu.m.
< Antiglare layer coating liquid 2-2>
Polyurethane acrylate A30 parts
( Mitsubishi chemical corporation, trade name: U-1700B: molecular weight 2000 and number of functional groups 10 )
Polyurethane acrylate B10 parts
( Xinzhongcun chemical industry company, trade name: u-15HA: molecular weight 2300 and number of functional groups 15 )
Pentaerythritol triacrylate 60 parts
(East Asia Synthesis, trade name: M-305)
21 Parts of silica particles
( Surface-treating amorphous silica, d10:1.2 μm, d50:3.7 μm, d90:6.2 μm )
Organic particles B10 parts
(Spherical polyacrylic acid-styrene copolymer, average particle diameter of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts
(IGM RESINS B.V. company, trade name: omnirad 184)
Photopolymerization initiator 1.0 part
(IGM RESINS B. V. Company, trade name: omnirad 907)
0.1 Part of organosilicon leveling agent
( Momentive Performance Materials company, trade name: TSF 4460 )
180 Parts of solvent (toluene)
15 Parts of solvent (cyclohexanone)
Solvent (methyl isobutyl ketone) 20 parts
< Antiglare layer coating liquid 2-3>
Polyurethane acrylate A30 parts
( Mitsubishi chemical corporation, trade name: U-1700B: molecular weight 2000 and number of functional groups 10 )
Polyurethane acrylate B10 parts
( Xinzhongcun chemical industry company, trade name: u-15HA: molecular weight 2300, number of functional groups 15). Pentaerythritol triacrylate 60 parts (east asian synthesis, trade name: m-305 )
Silica particles 19 parts (surface-treated amorphous silica, d10:1.2. Mu.m, d50:3.7. Mu.m, d90:6.2. Mu.m) organic particles A3 parts (spherical polyacrylic acid-styrene copolymer, average particle size 1.5. Mu.m, refractive index 1.515) organic particles B5 parts (spherical polyacrylic acid-styrene copolymer, average particle size 1.5. Mu.m, refractive index 1.595) photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name Omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
175 Parts of solvent (toluene)
15 Parts of solvent (cyclohexanone)
25 Parts of solvent (methyl isobutyl ketone)
< Antiglare layer coating liquid 2-4>
30 Parts of urethane acrylate A (Mitsubishi chemical company, trade name: U-1700B: molecular weight 2000, functional group number 10)
10 Parts of urethane acrylate B (New Zhongcun chemical industry Co., trade name: U-15HA: molecular weight 2300, functional group number 15) 60 parts of pentaerythritol triacrylate (east Asia Synthesis Co., trade name: M-305)
20 Parts of silica particles (surface-treated amorphous silica, d50:3.5 μm)
Organic particles A8 parts (spherical polyacrylic acid-styrene copolymer, average particle size of 1.5 μm, refractive index of 1.515) and organic particles B2 parts (spherical polyacrylic acid-styrene copolymer, average particle size of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
200 Parts of solvent (toluene)
5 Parts of solvent (cyclohexanone)
Solvent (methyl isobutyl ketone) 10 parts
< Antiglare layer coating liquid 2-5>
30 Parts of urethane acrylate A (Mitsubishi chemical company, trade name: U-1700B: molecular weight 2000, functional group number 10)
10 Parts of urethane acrylate B (New Zhongcun chemical industry Co., trade name: U-15HA: molecular weight 2300, functional group number 15) 60 parts of pentaerythritol triacrylate (east Asia Synthesis Co., trade name: M-305)
10 Parts of silica particles (surface-treated amorphous silica, d10:0.08 μm, d50:2.8 μm, d90:4.5 μm) organic particles A5 parts (spherical polyacrylic acid-styrene copolymer, average particle size of 1.5 μm, refractive index of 1.515)
5 Parts of organic particles B (spherical polyacrylic acid-styrene copolymer, average particle size of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
180 Parts of solvent (toluene)
30 Parts of solvent (cyclohexanone)
5 Parts of solvent (methyl isobutyl ketone)
< Antiglare layer coating liquid 2-6>
Polyurethane acrylic acid ester C60 parts (trade name: U-1100H: molecular weight 800, functional group number 6) pentaerythritol triacrylate 40 parts (trade name: M-305 of east Asia Synthesis Co., ltd.)
11 Parts of organic particles C (spherical polyacrylic acid-styrene copolymer, average particle diameter of 3.0 μm, refractive index of 1.595)
70 Parts of inorganic ultrafine particles (silica having a reactive functional group introduced into the surface thereof, solvent: MIBK, solid content: 30%) (average primary particle diameter: 12 nm)
Photopolymerization initiator 5.0 parts (IGM RESINS B.V. Co., trade name: omnirad 184)
Photopolymerization initiator 1.0 part (IGM RESINS B.V. Co., trade name: omnirad 907)
0.1 Part of organosilicon leveling agent (Momentive Performance Materials, trade name: TSF 4460)
180 Parts of solvent (toluene)
15 Parts of solvent (cyclohexanone)
< Antiglare layer coating liquid 2-7>
30 Parts of urethane acrylate A (Mitsubishi chemical company, trade name: U-1700B: molecular weight 2000, functional group number 10)
10 Parts of urethane acrylate B (New Zhongcun chemical industry Co., trade name: U-15HA: molecular weight 2300, functional group number 15) 60 parts of pentaerythritol triacrylate (east Asia Synthesis Co., trade name: M-305)
3 Parts of silica particles
( Surface-treating amorphous silica, d10:0.08 μm, d50:2.8 μm, d90:4.5 μm )
0.5 Part of organic particles B
(Spherical polyacrylic acid-styrene copolymer, average particle diameter of 1.5 μm, refractive index of 1.595)
Photopolymerization initiator 5.0 parts
(IGM RESINS B.V. company, trade name: omnirad 184)
Photopolymerization initiator 1.0 part
(IGM RESINS B. V. Company, trade name: omnirad 907)
0.1 Part of organosilicon leveling agent
( Momentive Performance Materials company, trade name: TSF 4460 )
180 Parts of solvent (toluene)
5 Parts of solvent (cyclohexanone)
25 Parts of solvent (methyl isobutyl ketone)
< Coating liquid for Low refractive index layer 2-2>
180 Parts of multifunctional acrylate
(Trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
100 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
600 Parts of fluorine-based organosilicon leveling agent having reactive functional groups
( The trade name "KY 1203", solid component: 20%, solvent: methyl isobutyl ketone )
Photopolymerization initiator 5 parts
(IGM RESINS company, trade name "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
< Coating liquid for Low refractive index layer 2-3>
100 Parts of multifunctional acrylate
(Trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
Acrylic Polymer 0.5 parts (weight-average molecular weight: 40000)
100 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
250 Parts of fluorine-containing organosilicon leveling agent having reactive functional groups
( The trade name "KY 1203", solid component: 20%, solvent: methyl isobutyl ketone )
Photopolymerization initiator 5 parts
(IGM RESINS company, trade name "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
< Coating liquid for Low refractive index layer 2-4>
100 Parts of multifunctional acrylate
(Trade name "Aronix M-400", manufactured by east Asia Synthesis Co., ltd.)
Acrylic Polymer 0.5 parts (weight-average molecular weight: 40000)
180 Parts of hollow silica particles
(Particles having an average primary particle diameter of 75nm and surface-treated with a silane coupling agent having a methacryloyl group)
150 Parts of fluorine-containing organosilicon leveling agent having reactive functional groups
( The trade name "KY 1203", solid component: 20%, solvent: methyl isobutyl ketone )
Photopolymerization initiator 5.0 parts
(IGM RESINS company, trade name "Omnirad 127")
11000 Parts of solvent (methyl isobutyl ketone)
1300 Parts of solvent (1-methoxy-2-propyl acetate)
TABLE 3
TABLE 4
From the results of table 3, it was confirmed that the optical film of example 2 can provide excellent antiglare properties and fingerprint wiping properties.
Description of the reference numerals
10: A substrate;
20: an antiglare layer;
30: an anti-reflection layer;
100: an optical film;
110: a display element;
120: an image display panel;
200: a horizontal plane;
300: a plane of the table;
400: and (3) liquid drops.
Claims (34)
1. An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, the unit of the tilt angle is degrees, and the unit of the protruding-peak solid volume is ml/m 2.
2. The optical film according to claim 1, wherein,
The Vmp of the 1 st surface is more than 0.005ml/m 2 and less than 0.100ml/m 2.
3. The optical film according to claim 1 or 2, wherein,
The following ISO 25178-2:2012, and the protrusion valley space volume Vvv calculated by setting the load area ratio of the core portion to be separated from the protrusion valley to 80% is 0.005ml/m 2 or more and 0.100ml/m 2 or less.
4. The optical film according to claim 3, wherein,
Vvv of said 1 st side is described by ISO 25178-2:2012 is 0.10 or less.
5. The optical film according to claim 1 or 2, wherein,
The following ISO 25178-2:2012 is set to a minimum autocorrelation length Sal of 4.0 μm or more and 12.0 μm or less.
6. The optical film according to claim 1 or 2, wherein,
The optical film has the antireflection layer, the antiglare layer, and a base material in this order from the 1 st surface toward the 2 nd surface.
7. The optical film according to claim 1 or 2, wherein,
The antiglare layer includes a binder resin and particles.
8. The optical film according to claim 1 or 2, wherein,
The element ratio of the optical film obtained by analyzing the surface area on the 1 st surface side by X-ray photoelectron spectroscopy satisfies the following formulas 2 to 4,
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
In the formulas 2 to 4, "F" is a ratio of fluorine element, "inorganic Si" is a ratio of silicon element attributed to inorganic silicon compound, and "organic Si" is a ratio of silicon element attributed to organic silicon compound.
9. The optical film of claim 8, wherein,
The ratio of the inorganic Si to the total elements is 2 at% or more and 20 at% or less, with respect to the element ratio obtained by the analysis by the X-ray photoelectron spectroscopy.
10. The optical film according to claim 1 or 2, wherein,
The total light reflectance R SCI of the optical film measured by the following method is 3.0% or less,
[ Measurement of total light reflectance R SCI ]
A sample was produced in which a black plate was attached to the 2 nd surface side of the optical film via a transparent adhesive, and the total light reflectance R SCI was measured using the optical film side of the sample as a light incident surface.
11. The optical film according to claim 1 or 2, wherein,
JIS K7136 of the optical film: 2000 has a haze of 20% to 75%.
12. A polarizing plate comprising a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material,
At least one of the first transparent protective plate and the second transparent protective plate is the optical film according to claim 1 or2, wherein the 2 nd surface of the optical film is disposed so as to face the polarizer.
13. A surface plate for an image display device, which is formed by laminating a protective film on a resin plate or a glass plate,
The protective film is the optical film according to claim 1 or 2, wherein the 2 nd surface of the optical film is disposed so as to face the resin plate or the glass plate.
14. An image display panel having a display element and an optical film disposed on a light exit surface side of the display element, wherein,
As the optical film, the image display panel includes the optical film according to claim 1 or 2.
15. An image display device, wherein,
The image display device comprising the image display panel of claim 14.
16. A method for producing an optical film according to claim 1, wherein,
The optical film manufacturing method comprises the following steps: a step 1 of forming an antiglare layer on a substrate; and a step 2 of forming an antireflection layer on the antiglare layer.
17. A method for selecting an optical film, which selects an optical film satisfying the following selected conditions,
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.05 μm or more,
The 1 st surface satisfies the following formula 1,
SwXVmp is less than or equal to 2.00 (1),
In formula 1, "Sw" is an inclination angle at which a droplet of 30 μl of pure water flows down in the 1 st plane, and in formula 1, "Vmp" is a value calculated by ISO 25178-2 for the 1 st plane: 2012, the unit of the tilt angle is degrees, and the unit of the protruding-peak solid volume is ml/m 2.
18. An optical film having a1 st surface and a2 nd surface which is a surface on the opposite side of the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
19. The optical film of claim 18, wherein,
Vvv of said 1 st side is described by ISO 25178-2:2012 is 0.10 or less.
20. The optical film according to claim 18 or 19, wherein,
The following ISO 25178-2:2012 is set to a minimum autocorrelation length Sal of 4.0 μm or more and 12.0 μm or less.
21. The optical film according to claim 18 or 19, wherein,
The pole height Sxp of the 1 st plane is above 0.15 μm and below 2.00 μm, and the pole height Sxp is defined by ISO 25178-2:2012, a difference between a height having a load area ratio of 2.5% and a height having a load area ratio of 50%.
22. The optical film according to claim 18 or 19, wherein,
The optical film has the antireflection layer, the antiglare layer, and a base material in this order from the 1 st surface toward the 2 nd surface.
23. The optical film according to claim 18 or 19, wherein,
The antiglare layer includes a binder resin and particles.
24. The optical film according to claim 18 or 19, wherein,
The element ratio of the optical film obtained by analyzing the surface area on the 1 st surface side by X-ray photoelectron spectroscopy satisfies the following formulas 2 to 4,
F is more than or equal to 3.5 and inorganic Si is more than or equal to 10.0 (formula 2),
Organic Si/inorganic Si of more than or equal to 0.08 and less than or equal to 1.00 (formula 3),
F is more than or equal to 5.0 and organic Si is more than or equal to 50.0 (formula 4),
In the formulas 2 to 4, "F" is a ratio of fluorine element, "inorganic Si" is a ratio of silicon element attributed to inorganic silicon compound, and "organic Si" is a ratio of silicon element attributed to organic silicon compound.
25. The optical film of claim 24 wherein,
The ratio of the inorganic Si to the total elements is 2 at% or more and 20 at% or less, with respect to the element ratio obtained by the analysis by the X-ray photoelectron spectroscopy.
26. The optical film according to claim 18 or 19, wherein,
The total light reflectance R SCI of the optical film measured by the following method is 3.0% or less,
[ Measurement of total light reflectance R SCI ]
A sample was produced in which a black plate was attached to the 2 nd surface side of the optical film via a transparent adhesive, and the total light reflectance R SCI was measured using the optical film side of the sample as a light incident surface.
27. The optical film according to claim 18 or 19, wherein,
JIS K7136 of the optical film: 2000 has a haze of 20% to 75%.
28. A polarizing plate comprising a polarizing material, a first transparent protective plate disposed on one side of the polarizing material, and a second transparent protective plate disposed on the other side of the polarizing material,
At least one of the first transparent protective plate and the second transparent protective plate is the optical film according to claim 18 or 19, wherein the 2 nd surface of the optical film is disposed so as to face the polarizer.
29. A surface plate for an image display device, which is formed by laminating a protective film on a resin plate or a glass plate,
The protective film is the optical film according to claim 18 or 19, wherein the 2 nd surface of the optical film is disposed so as to face the resin plate or the glass plate.
30. An image display panel having a display element and an optical film disposed on a light exit surface side of the display element, wherein,
As the optical film, the image display panel includes the optical film according to claim 18 or 19.
31. An image display device, wherein,
The image display device comprising the image display panel of claim 30.
32. A method for producing an optical film according to claim 18, wherein,
The optical film manufacturing method comprises the following steps: a step 1 of forming an antiglare layer on a substrate; and a step 2 of forming an antireflection layer on the antiglare layer.
33. A method for selecting an optical film, which selects an optical film satisfying the following selected conditions,
(Selected conditions of optical film)
The optical film has a1 st surface and a2 nd surface which is a surface on the opposite side to the 1 st surface, wherein,
The optical film is provided with an anti-reflection layer and an anti-dazzle layer in sequence from the 1 st surface to the 2 nd surface,
The 1 st surface has a concave-convex shape,
The following ISO 25178-2:2012 is 0.005ml/m 2 or more,
The falling contact angle measured by the method described below is 30.0 degrees or more,
< Measurement of drop-down contact Angle >
The liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the 1 st surface of the optical film, and the liquid drop was dropped from a direction perpendicular to the 1 st surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
34. A method for evaluating fingerprint wiping properties, which comprises using a falling contact angle value measured by the following measurement as an evaluation index,
< Measurement of drop-down contact Angle >
A liquid drop having a surface tension of 30mN/m was dropped from a height of 45mm with respect to the surface of the object to be measured, and the liquid drop was dropped from a direction perpendicular to the surface, and the static contact angle after landing for 10 seconds was measured by the θ/2 method.
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CN202410375596.7A CN118033794B (en) | 2022-09-30 | 2023-09-25 | Optical film, polarizing plate, surface plate, image display panel and image display device using the same, method for producing and selecting the same, method for evaluating fingerprint wiping properties |
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PCT/JP2023/034628 WO2024070996A1 (en) | 2022-09-30 | 2023-09-25 | Optical film, polarizing plate, surface plate, image display panel, and image display device using said optical film, method for manufacturing said optical film, method for selecting optical film, and method for evaluating fingerprint wipe-off properties |
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