CN118109786B - Device and method for preparing thermal barrier coating by oxygen dissociation assisted physical vapor deposition - Google Patents

Abstract

The invention discloses a device and a method for preparing a thermal barrier coating by oxygen dissociation auxiliary physical vapor deposition, wherein when the thermal barrier coating is prepared by adopting an electron beam physical vapor deposition method, a ceramic target material is bombarded by electron beams with high energy emitted by an electron gun in a preparation cavity deposition chamber in a high-temperature and high-vacuum state, so that the ceramic target material is deposited on a substrate after being melted and evaporated; in the process of bombarding a target material by an electron beam, a certain amount of oxygen is simultaneously introduced into a gas ionization chamber, an external power supply is utilized to form a gas ionization system to apply high pressure to the gas ionization chamber, the introduced oxygen is ionized into oxygen ions, oxygen plasma is formed, and then the oxygen plasma is released into a vacuum deposition chamber; because the oxygen plasma generated by ionization has high chemical activity, the oxygen plasma can be better combined with ionic substances generated by bombardment of the target material by electron beams, and plays a role in fully supplementing oxygen in the physical vapor deposition preparation process of the thermal barrier coating.

Description

Device and method for preparing thermal barrier coating by oxygen dissociation assisted physical vapor deposition

Technical Field

The invention relates to the technical field of electron beam physical vapor deposition preparation of thermal barrier coating materials, in particular to a device and a method for preparing a thermal barrier coating by oxygen dissociation-assisted physical vapor deposition.

Background

Aeroengines are the power plant of an aircraft and are known as the "heart" of an aircraft. In recent years, with the development of the aviation industry, the requirements on the performance of an engine are continuously improved, meanwhile, the working temperature of high-temperature components in the engine is increased, and the engine is developed to a fourth generation fighter plane, wherein the gas inlet temperature of the aviation engine is about 1700 ℃. This places higher demands on the superalloy material of the hot end components of the engine. The current use limit temperature of the advanced single crystal nickel-based superalloy is 1150 ℃, and obviously the requirements of the advanced aeroengine cannot be met by means of a cooling technology and the independent use of a superalloy material. In order to solve the problem, people begin to research a new heat protection technology, namely a heat barrier coating, and the heat barrier coating is subjected to high-speed development for decades, so that the use temperature of a turbine blade can be effectively improved by about 200-300 ℃, and the heat barrier coating technology becomes one of key technologies in the field of heat protection of hot end components of aeroengines. Compared with a plasma spraying preparation process, the thermal barrier coating prepared by the electron beam physical vapor deposition method has a typical columnar crystal structure and shows better strain tolerance, so that the thermal barrier coating is the only feasible preparation method for the most severe high-temperature and high-pressure part of the current aeroengine, namely the turbine working blade. The working principle is that the high-energy electron beam is used to bombard the target material (metal, ceramic, etc.) in vacuum environment, so that the target material is deposited on the substrate after melting and evaporating.

Sufficient oxygen is required to ensure the quality of the prepared thermal barrier coating in the process of preparing certain thermal barrier coating materials by using an electron beam physical vapor deposition method, and the thermal barrier coating is prepared by using the electron beam physical vapor deposition method to supplement oxygen at present mainly by the following two methods: firstly, oxygen is not introduced when the physical vapor deposition equipment is used for preparing, and other processes are adopted to supplement oxygen for the coating after the coating is prepared; and secondly, directly introducing oxygen into the vacuum deposition chamber in the preparation process to supplement oxygen for the coating. For the method, the operation is complicated, and the oxygen is supplemented to the coating after the preparation is finished, so that the quality of the coating can be influenced to a certain extent; for the second method, oxygen is directly introduced into the vacuum deposition chamber to relieve the problem of oxygen deficiency of the coating, but the target material is melted into ionic substances by the electron beam, oxygen molecules are not fully reacted with the ionic substances, oxygen supplementing of the coating is not fully performed, and the quality of the coating is affected. Therefore, the problem of coating hypoxia when preparing thermal barrier coatings using electron beam physical vapor deposition is not thoroughly solved.

Disclosure of Invention

In order to solve the problems, the invention provides a device and a method for preparing a thermal barrier coating by oxygen dissociation-assisted physical vapor deposition, which are used for fully supplementing oxygen in the process of preparing the thermal barrier coating by an electron beam physical vapor deposition method, and improve the quality of preparing the thermal barrier coating by the physical vapor deposition method.

The aim of the invention can be achieved by the following technical scheme:

The device for preparing the thermal barrier coating by oxygen dissociation auxiliary physical vapor deposition comprises a vacuum deposition chamber, wherein a plurality of heaters are arranged in the vacuum deposition chamber, a clamp is also arranged in the vacuum deposition chamber, and a deposition substrate is arranged on the clamp;

The inner wall of the bottom of the vacuum deposition chamber is provided with a gas ionization chamber, the gas ionization chamber is connected with an external power supply through a wire, the external power supply and the gas ionization chamber form a gas ionization system, and the gas ionization chamber is also provided with a gas inlet;

an electron gun is arranged at the bottom of the vacuum deposition chamber, a copper water-cooled crucible is arranged at the center of the inner wall of the bottom of the vacuum deposition chamber, and a ceramic target is placed on the copper water-cooled crucible;

A heat insulation box is embedded and installed on the box door of the vacuum deposition chamber, a detachable filter screen is arranged on one side of the heat insulation box, a cooling fan is fixedly installed on one side of the filter screen, a disk type circulating water pipe is fixedly installed on one side of the cooling fan, two heat insulating boards are symmetrically arranged on one side of the disc type circulating water pipe, electric telescopic rods are arranged at non-adjacent ends of the two heat insulating boards, and exhaust hoods are arranged on one sides of the two heat insulating boards.

As a further scheme of the invention: the inside of the gas ionization chamber is an ionization reaction area, and an ionization opening is arranged in the middle direction of the gas ionization chamber towards the vacuum deposition chamber so that ionized gas can be released to the deposition area; the probe mechanism penetrates through the gas ionization chamber to introduce a front probe into the ionization reaction area, and an external power supply is electrically connected with the probe; the magnet surrounds the ionization reaction region and is arranged around the gas ionization chamber, and an insulating component is connected with the ionization opening end of the gas ionization chamber.

As a further scheme of the invention: one side of the vacuum deposition chamber is provided with a vacuum pump group.

As a further scheme of the invention: the copper water-cooled crucible is of a hollow structure, a water outlet and a water inlet are formed in the inner wall of the crucible, and heat is taken away through the flowing of cooling water.

As a further scheme of the invention: the ceramic target is a yttria stabilized zirconia target or a thermal barrier coating target of other component systems; the deposition substrate is a test piece or blade of different adhesive layers.

As a further scheme of the invention: the heater is graphite temperature-controlled heating, and can control heating current to reach the preparation temperature of the thermal barrier coating.

As a further scheme of the invention: the power of the electron gun is 15KW, and the electron gun can be turned over at 270 degrees, so that the controllable adjustment of electron beams is realized.

As a further scheme of the invention: the fixture comprises a rotating motor, a telescopic cylinder, a gear ring, a sun gear, a planet carrier, planet gears and a connecting sleeve, wherein the rotating motor is fixedly arranged at the end part of a piston rod of the telescopic cylinder, the sun gear is arranged on an output shaft of the rotating motor, the axes of a plurality of planet gears are connected with the planet carrier, the planet carrier is used for keeping the relative positions of the planet gears, and the planet gears rotate on the planet carrier; the sun gear and the planetary gear are meshed with the gear ring in pairs; the connection sleeve is fixedly connected with the planetary gear, and the deposition substrate is arranged on the connection sleeve; the sun gear drives the planetary gear to do circular motion on the gear ring under the drive of the rotating motor, and the planetary gear performs autorotation motion around the respective axes; the revolution and rotation of the deposition substrate on the connection sleeve can be realized.

As a further scheme of the invention: an inner cylinder is fixedly arranged at the center of the inside of the connecting sleeve, a rack is connected onto the inner cylinder in a sliding manner, a movable ring is fixedly arranged at the top of the rack, a plurality of rocker arms are equidistantly arranged on the movable ring, a driving plate is movably connected to the end part of each rocker arm, the driving plate is in sliding connection with a fixed disc, the fixed disc is fixedly arranged at one end of the inner cylinder, and an arc-shaped plate is fixedly arranged at the end part of the driving plate;

The inner cylinder is rotatably connected with a rotating shaft, one end of the rotating shaft extends out of the inner cylinder and is connected with a ratchet gear, the other end of the rotating shaft is fixedly provided with a driving gear, and the driving gear is meshed with the rack.

As a further scheme of the invention: a method for preparing a thermal barrier coating by oxygen dissociation-assisted physical vapor deposition comprises the following steps:

Firstly, driving a clamp to move a vacuum deposition chamber gate, sequentially placing processed deposition substrates on a connecting sleeve for fixing, and resetting the clamp; placing the ceramic target into a vacuum deposition chamber, adjusting the position of the ceramic target, and ensuring the clear visual field during preparation;

step two, a vacuum pump set is adopted to pump the vacuum deposition chamber to a high vacuum state;

Step three, heating the deposition substrate to 800-1000 ℃ by a heater;

Step four, starting an electron gun, setting the voltage and the power of the electron gun according to the preparation requirement, and controlling the high-energy electron beam emitted by the electron gun to focus on the ceramic target;

step five, introducing a proper amount of oxygen into the gas ionization chamber according to the preparation requirement, ionizing the introduced oxygen into oxygen ions by high pressure applied by the gas ionization system, and releasing the generated oxygen plasma into the vacuum deposition chamber through the ionization opening and the insulation component to participate in the deposition process;

step six, depositing the thermal barrier coating in a plasma-assisted atmosphere, setting the deposition time according to the different thicknesses of the thermal barrier coating, and better combining ionic substances generated after the ceramic target is bombarded, melted and evaporated by a high-energy electron beam with oxygen plasma to perform oxygen supplementation more fully so as to obtain the thermal barrier coating with better performance;

And step seven, after the deposition is finished, closing the electron gun, introducing oxygen, heating, gas ionization system and vacuum pump group, cooling the vacuum deposition chamber through a cooling fan and a disk type circulating water pipe, then moving a gate of the vacuum deposition chamber by a clamp, and taking out the prepared thermal barrier coating.

The invention is characterized in that: the ceramic target and the pretreated metal deposition substrate with the bonding layer are placed in a vacuum deposition chamber of physical vapor deposition equipment, the deposition substrate is heated to a preparation temperature by a graphite heater, a high-energy electron beam emitted by an electron gun is adopted to bombard the molten ceramic target, meanwhile, a proper amount of oxygen is introduced into a gas ionization chamber as required, the oxygen is ionized into oxygen ions by high pressure (300-3000V) applied by an external power supply, generated oxygen plasma is released into the vacuum deposition chamber, and the oxygen plasma is better combined with ionic substances generated after the melting and the evaporation of the target, so that the effect of fully supplementing oxygen is achieved, and the thermal barrier coating with better performance is obtained.

The oxygen plasma generated by the oxygen electrolysis not only plays a role of supplementing oxygen in the process of preparing the thermal barrier coating by a physical vapor deposition method, but also can assist the growth of the thermal barrier coating. Meanwhile, the number of the oxygen plasmas can be controlled according to the requirements, and the number of the oxygen plasmas is controlled by controlling the size of an external power supply and the amount of the introduced oxygen.

The invention mainly carries out electrolytic dissociation on the introduced oxygen to realize high-efficiency oxygen supplement in the preparation process of the thermal barrier coating, and can also introduce other gases for auxiliary preparation according to the preparation requirements.

The invention has the beneficial effects that:

Compared with the existing device and method for preparing the thermal barrier coating by directly introducing oxygen into a vacuum chamber or not introducing oxygen into the electron beam physical vapor deposition method, the device and method for preparing the thermal barrier coating by using the oxygen dissociation auxiliary physical vapor deposition method provided by the invention have the advantages that the introduced oxygen is electrolyzed into oxygen plasma through a gas ionization system, and the high-efficiency oxygen supplementing effect of the thermal barrier coating is realized under the vacuum preparation condition; compared with the method that oxygen is directly introduced into the vacuum deposition chamber, the oxygen plasma after the electrolysis has better chemical activity, the oxygen plasma has better oxygen supplementing function than oxygen molecules, and the oxygen supplementing function is achieved in the preparation process of the thermal barrier coating, so that the thermal barrier coating with better performance is obtained. Meanwhile, the gas ionization system provided by the invention is simple in composition, and is simple, practical and convenient in structure by adding an external power supply to apply high-voltage ionized oxygen. Meanwhile, the invention can not only electrolyze oxygen, but also can introduce other gases according to the preparation requirement to electrolyze the electron beam auxiliary physical vapor deposition method for preparing the thermal barrier coating.

Drawings

The invention is further described below with reference to the accompanying drawings.

Fig. 1: schematic equipment for preparing a thermal barrier coating by an oxygen dissociation auxiliary electron beam physical vapor deposition method;

fig. 2: schematic diagram of a gas ionization system;

fig. 3: a schematic structural view of the interior of the vacuum deposition chamber;

fig. 4: a specific structural schematic diagram of the clamp;

fig. 5: schematic diagram of the internal concrete structure of the connecting sleeve;

Fig. 6: thermal barrier coating section microstructure prepared by the embodiment.

In the figure: 1. a vacuum pump unit; 2. copper water-cooled crucible; 3. a ceramic target; 4. a clamp; 5. a vacuum deposition chamber; 51. a heat insulation box; 52. an exhaust hood; 53. a heat insulating plate; 54. a disk-type circulating water pipe; 55. a heat radiation fan; 56. a filter screen; 57. an electric telescopic rod; 58. an air outlet; 59. a partition plate; 6. a heater; 7. depositing a substrate; 8. an electron beam; 9. an external power source; 10. a gas inlet; 11. a gas ionization chamber; 12. an electron gun; 13. an ionization reaction region; 14. an ionization opening; 15. a probe mechanism; 16. a probe; 17. a magnet; 18. an insulating assembly; 41. a rotating electric machine; 42. a telescopic cylinder; 43. a gear ring; 44. a sun gear; 45. a planet carrier; 46. a planetary gear; 47. a connecting sleeve; 471. a rotation shaft; 472. a ratchet gear; 473. a rack; 474. a drive gear; 475. a moving ring; 476. a guide post; 477. a rocker arm; 478. an inner cylinder; 479. a fixed plate; 470. an arc-shaped plate; 4711. and a driving plate.

Detailed Description

The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.

Example 1

Referring to fig. 1-2, the invention relates to a device for preparing a thermal barrier coating by oxygen dissociation-assisted physical vapor deposition, which comprises a vacuum deposition chamber 5, wherein a plurality of heaters 6 are arranged in the vacuum deposition chamber 5, a clamp 4 is also arranged in the vacuum deposition chamber 5, and a deposition substrate 7 is arranged on the clamp 4;

A gas ionization chamber 11 is arranged on the inner wall of the bottom of the vacuum deposition chamber 5, the gas ionization chamber 11 is connected with an external power supply 9 through a wire, the external power supply 9 and the gas ionization chamber 11 form a gas ionization system, and a gas inlet 10 is also arranged on the gas ionization chamber 11;

An electron gun 12 is arranged at the bottom of the vacuum deposition chamber 5, a copper water-cooled crucible 2 is arranged at the center of the inner wall of the bottom of the vacuum deposition chamber 5, and a ceramic target 3 is placed on the copper water-cooled crucible 2; the high-energy electron beam 8 emitted by the electron gun 12 is adopted to bombard the ceramic target material 3, a certain amount of oxygen is introduced into the gas ionization chamber 11 through the gas inlet 10, the oxygen is ionized into oxygen ions through the gas ionization system, the formed oxygen plasma is released into the vacuum deposition chamber 5, the oxygen plasma is better combined with ionic substances generated by the ceramic target material 3 after melting and evaporating, the effect of more fully supplementing oxygen is achieved, and therefore the thermal barrier coating is obtained.

Referring to fig. 3, a heat insulation box 51 is embedded and installed on a door of the vacuum deposition chamber 5, a detachable filter screen 56 is provided on one side of the heat insulation box 51, and can be installed by bolts, so that the vacuum deposition chamber is convenient to replace, a cooling fan 55 is fixedly installed on one side of the filter screen 56, a disk type circulating water pipe 54 is fixedly installed on one side of the cooling fan 55, a water inlet and a water outlet are respectively provided at two ends of the disk type circulating water pipe 54, two heat insulation boards 53 are symmetrically installed on one side of the disk type circulating water pipe 54, electric telescopic rods 57 are respectively provided at non-adjacent ends of the two heat insulation boards 53, and an exhaust hood 52 is provided on one side of the two heat insulation boards 53; an air outlet 58 is formed in the top of the vacuum deposition chamber 5, a partition plate 59 is arranged in the air outlet 58, and the partition plate 59 is driven by an electric telescopic rod I.

In this embodiment, all structures are arranged in the heat insulation box 51 to protect the electrical structure and avoid the damage of the vacuum deposition chamber 5 caused by high temperature, and then, when the interior of the vacuum deposition chamber 5 needs to be cooled, the partition plate 59 is driven, the air outlet 58 is opened, the electric telescopic rod 57 is driven to drive the heat insulation plate 53 to be opened, the heat dissipation fan 55 is started to cool the interior of the equipment, and in the cooling process, the air of the heat dissipation fan 55 is cooled through the disc-type circulating water pipe 54, and then the air blowing area is enlarged by the air exhaust cover 52 to accelerate the temperature cooling of the vacuum deposition chamber 5; the thermal barrier coating is convenient to take out subsequently;

In the cooling process, the clamp 4 can be driven to move towards the heat insulation box 51, the distance is shortened, the clamp 4 is driven to be in direct contact with cold air, the clamp 4 is driven to rotate, the air flow in the vacuum deposition chamber 5 can be quickened while uniform heat dissipation is carried out, the heat dissipation effect is improved, the deposition substrate 7 on the clamp 4 can be taken out after being cooled, complete cooling in the vacuum deposition chamber 5 is not required, and the clamp 4 can be pushed to the vacuum deposition chamber 5 for installation and disassembly.

An ionization reaction area 13 is arranged in the gas ionization chamber 11, and an ionization opening 14 is arranged in the gas ionization chamber 11 towards the middle of the vacuum deposition chamber 5 so that ionized gas can be released to the deposition area; the probe mechanism 15 introduces a front probe 16 into the ionization reaction region 13 through the gas ionization chamber 11, and the external power supply 9 is electrically connected with the probe 16; a magnet 17 is arranged around the ionization reaction region 13 around the gas ionization chamber 11, and an insulating member 18 is connected to the ionization opening 14 end of the gas ionization chamber 11.

One side of the vacuum deposition chamber 5 is provided with a vacuum pump set 1.

The copper water-cooled crucible 2 is of a hollow structure, a water outlet and a water inlet are formed in the inner wall of the crucible, and heat is taken away through the flow of cooling water.

The ceramic target 3 is a yttria stabilized zirconia target or a thermal barrier coating target of other component systems; the deposition substrate 7 is a test piece or blade of different adhesive layers.

The heater 6 is graphite temperature-controlled heating, and can control heating current to reach the preparation temperature of the thermal barrier coating.

The power of the electron gun 12 is 15KW, and the electron gun can be turned over at 270 degrees, so that the controllable adjustment of the electron beam 8 is realized.

Referring to fig. 4, the fixture 4 includes a rotating motor 41, a telescopic cylinder 42, a gear ring 43, a sun gear 44, a planet carrier 45, a planet gear 46 and a connection sleeve 47, the rotating motor 41 is fixedly mounted at the end of a piston rod of the telescopic cylinder 42, the sun gear 44 is provided on an output shaft of the rotating motor 41, the axes of the plurality of planet gears 46 are connected with the planet carrier 45, the planet carrier 45 is used for maintaining the relative positions of the planet gears 46, the planet gears 46 rotate on the planet carrier 45, a plurality of guide rods are arranged at one end of the planet carrier 45 close to the rotating motor 41 in an array manner, and the guide rods are spliced with the vacuum deposition chamber 5 and used for supporting the planet carrier 45 to ensure the rotating stability of the planet carrier 45; sun gear 44 and planetary gear 46, planetary gear 46 and ring gear 43 meshing in pairs; the engagement sleeve 47 is fixedly connected with the planetary gear 46, and the deposition substrate 7 is mounted on the engagement sleeve 47; the sun gear 44 drives the planetary gears 46 to do circular motion on the ring gear 43 under the drive of the rotary motor 41, and the planetary gears 46 do autorotation motion around the respective axes; the revolution and rotation movements of the deposition substrate 7 on the engagement sleeve 47 can be achieved. So that the thermal barrier coating can be deposited uniformly on the deposition substrate 7; when the deposition substrate 7 is installed and detached, the telescopic air cylinder 42 can be driven, the guide rod is used for guiding and pushing the integral clamp 4 to horizontally move to the gate of the vacuum deposition chamber 5, and then the deposition substrate 7 is detached and installed, so that the convenience is realized; the operator does not have to take out the deposition substrate 7 inside the vacuum deposition chamber 5 because the temperature inside the vacuum deposition chamber 5 is relatively high.

Referring to fig. 5, an inner cylinder 478 is fixedly mounted at the inner center of the engagement sleeve 47, a rack 473 is slidably connected to the inner cylinder 478, a moving ring 475 is fixedly mounted at the top of the rack 473, guide posts 476 are disposed between the moving ring 475 and a fixed disk 479, a plurality of rocker arms 477 are equidistantly disposed on the moving ring 475, a driving plate 4711 is movably connected to an end of the rocker arms 477, the driving plate 4711 is slidably connected to the fixed disk 479, the fixed disk 479 is fixedly mounted at one end of the inner cylinder 478, and an arc 470 is fixedly mounted at an end of the driving plate 4711;

The inner cylinder 478 is rotatably connected with a rotating shaft 471, one end of the rotating shaft 471 extends out of the inner cylinder 478 and is connected with the ratchet gear 472, the other end of the rotating shaft 471 is fixedly provided with a driving gear 474, and the driving gear 474 is meshed with the rack 473.

In this embodiment, the deposition substrate 7 is inserted into the inner barrel 478, then the rotation shaft 471 is rotated to drive the ratchet gear 472 and the driving gear 474 to rotate, the driving gear 474 rotates to drive the rack 473 to slide, thereby pushing the moving ring 475 to move, and then the three arc plates 470 are synchronously driven to fix the deposition substrate 7 by driving the rocker 477 and the driving plate 4711, so that the deposition substrate 7 with no diameter is convenient to be applied; meanwhile, due to the arrangement of the ratchet gear 472, the rack 473 is prevented from being reset to cause looseness; during the disassembly process, the ratchet gear 472 is released.

Example 2

On the basis of the embodiment 1, please refer to fig. 1-6, a method for preparing a thermal barrier coating by oxygen dissociation-assisted physical vapor deposition, comprising the following steps:

1. and (5) preparing a ceramic target. The ceramic target 3 used in the embodiment is a 7-8wt% yttria stabilized zirconia 8YSZ target, the purity is 99.9%, and the size of the target is phi 50 multiplied by 30mm;

2. Preparing a deposition substrate. The deposition substrate 7 used in this example is a nickel-based superalloy coated with a NiCrAlY bonding layer;

3. The thermal barrier coating is deposited by using a physical vapor deposition device shown in fig. 1 and 2, and the device mainly comprises a vacuum deposition system, an electron gun and a gas ionization system. The vacuum deposition system consists of a vacuum deposition chamber 5 and a vacuum pump set 1; the gas ionization system is composed of an external power supply 9, an oxygen gas inlet 10, a gas ionization chamber 11, a probe mechanism 15, a probe 16, a magnet 17 and an insulation component 18; the gas ionization system is used for electrolyzing oxygen to generate oxygen plasma, and the specific process for generating the oxygen plasma is as follows: oxygen enters the gas ionization chamber 11 through the gas inlet 10, high voltage is applied to the gas ionization chamber 11 through the external power supply 9, the oxygen entering the gas ionization chamber 11 is electrolyzed into oxygen ions by the applied high voltage, and the formed oxygen plasma is released into the vacuum deposition chamber 5 through the ionization opening 14 and the insulation component 18; the oxygen plasma and the ionic substances generated by melting and evaporating after the high-energy electron beam 8 bombards the target material are better combined, and the specific steps for preparing the high-quality thermal barrier coating by fully supplementing oxygen are as follows:

Firstly, driving a clamp 4 to move a gate of a vacuum deposition chamber 5, sequentially placing processed deposition substrates 7 on a connecting sleeve 47 to be fixed, and resetting the clamp 4; placing the ceramic target 3 into a vacuum deposition chamber 5, adjusting the position of the ceramic target 3, wherein the distance between the ceramic target 3 and a deposition substrate 7 is 300mm, and the ceramic target 3 is positioned at the edge of a copper water-cooled crucible 2, so that the visual field is clear during preparation;

Step two, pumping the vacuum chamber to 2 multiplied by 10 < -4 > Torr by using a three-stage vacuum pump set 1;

Heating the deposition substrate 7 by a graphite heater 6, and heating the deposition substrate 7 to 900 ℃ by adjusting the heater current;

Step four, starting the electron gun 12, setting the voltage of the electron gun 12 to be 8.5V, setting the power of the electron gun 12 to be 15KW, controlling the power percentage of the electron gun 12 to be 50 percent, and controlling the high-energy electron beam 8 emitted by the electron gun 12 to be focused on the ceramic target 3;

Step five, introducing a proper amount of oxygen into the gas ionization chamber 11 according to the preparation requirement, ionizing the oxygen into oxygen ions by the introduced oxygen through a high voltage applied by an external power supply 9 by the gas ionization system, and releasing generated oxygen plasma into the vacuum deposition chamber 5;

Step six, depositing the thermal barrier coating in a plasma-assisted atmosphere, setting the deposition time to be 150 minutes according to the thickness requirement of the thermal barrier coating, and better combining ionic substances generated after the ceramic target material 3 is bombarded, melted and evaporated by the high-energy electron beam 8 with oxygen plasma, so as to fully supplement oxygen and obtain the thermal barrier coating with better performance;

And step seven, after the deposition is finished, closing the electron gun 12, introducing oxygen, heating, gas ionization systems and the vacuum pump set 1, cooling the vacuum deposition chamber 5 through the cooling fan 55 and the disk type circulating water pipe 54, then moving the gate of the vacuum deposition chamber 5 by the clamp 4, and taking out the prepared thermal barrier coating.

The foregoing describes one embodiment of the present invention in detail, but the description is only a preferred embodiment of the present invention and should not be construed as limiting the scope of the invention. All equivalent changes and modifications within the scope of the present invention are intended to be covered by the present invention.

Claims (10)

1. The device for preparing the thermal barrier coating by oxygen dissociation assisted physical vapor deposition is characterized by comprising a vacuum deposition chamber (5), wherein a plurality of heaters (6) are arranged in the vacuum deposition chamber (5), a clamp (4) is also arranged in the vacuum deposition chamber (5), and a deposition substrate (7) is arranged on the clamp (4);

A gas ionization chamber (11) is arranged on the inner wall of the bottom of the vacuum deposition chamber (5), the gas ionization chamber (11) is connected with an external power supply (9) through a wire, the external power supply (9) and the gas ionization chamber (11) form a gas ionization system, and a gas inlet (10) is further arranged on the gas ionization chamber (11);

An electron gun (12) is arranged at the bottom of the vacuum deposition chamber (5), a copper water-cooled crucible (2) is arranged at the center of the inner wall of the bottom of the vacuum deposition chamber (5), and a ceramic target (3) is placed on the copper water-cooled crucible (2);

The vacuum deposition chamber is characterized in that a heat insulation box (51) is embedded and installed on a box door of the vacuum deposition chamber (5), a detachable filter screen (56) is arranged on one side of the heat insulation box (51), a cooling fan (55) is fixedly installed on one side of the filter screen (56), a disc type circulating water pipe (54) is fixedly installed on one side of the cooling fan (55), two heat insulation plates (53) are symmetrically installed on one side of the disc type circulating water pipe (54), electric telescopic rods (57) are arranged at non-adjacent ends of the two heat insulation plates (53), and exhaust hoods (52) are arranged on one sides of the two heat insulation plates (53).

2. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition according to claim 1, wherein an ionization reaction area (13) is arranged inside the gas ionization chamber (11), and an ionization opening (14) is arranged in the middle direction of the vacuum deposition chamber (5) in the gas ionization chamber (11) so that ionized gas is released to the deposition area; the probe mechanism (15) is used for introducing a front probe (16) into the ionization reaction region (13) through the gas ionization chamber (11), and an external power supply (9) is electrically connected with the probe (16); the magnet (17) is arranged around the ionization reaction region (13) around the gas ionization chamber (11), and an insulation component (18) is connected with the ionization opening (14) end of the gas ionization chamber (11).

3. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition according to claim 2, wherein a vacuum pump group (1) is arranged on one side of the vacuum deposition chamber (5).

4. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition according to claim 3, wherein the copper water-cooled crucible (2) is of a hollow structure, a water outlet and a water inlet are formed in the inner wall of the crucible, and heat is taken away by the flow of cooling water.

5. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition according to claim 4, wherein the ceramic target (3) is a yttria-stabilized zirconia target or a thermal barrier coating target of other component systems; the deposition substrate (7) is a test piece or blade of different adhesive layers.

6. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition according to claim 5, wherein the heater (6) is graphite temperature-controlled heating, and heating current can be controlled to reach the preparation temperature of the thermal barrier coating.

7. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition as claimed in claim 6, wherein the power of the electron gun (12) is 15KW, and the electron gun can be turned over by 270 degrees, so that the controllable adjustment of the electron beam (8) is realized.

8. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition according to claim 7, wherein the fixture (4) comprises a rotating motor (41), a telescopic cylinder (42), a gear ring (43), a sun gear (44), a planet carrier (45), a planet gear (46) and a connecting sleeve (47), the rotating motor (41) is fixedly arranged at the end part of a piston rod of the telescopic cylinder (42), the sun gear (44) is arranged on an output shaft of the rotating motor (41), the axes of the plurality of planet gears (46) are connected with the planet carrier (45), the planet carrier (45) is used for keeping the relative positions of the planet gears (46), and the planet gears (46) rotate on the planet carrier (45); the sun gear (44) and the planet gears (46), the planet gears (46) and the gear ring (43) are meshed in pairs; the connecting sleeve (47) is fixedly connected with the planetary gear (46), and the deposition substrate (7) is arranged on the connecting sleeve (47); the sun gear (44) drives the planetary gear (46) to do circular motion on the gear ring (43) under the drive of the rotating motor (41), and the planetary gear (46) does autorotation motion around the respective axes; the revolution and rotation of the deposition substrate (7) on the engagement sleeve (47) can be realized.

9. The device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition according to claim 8, wherein an inner cylinder (478) is fixedly arranged at the inner center of the connecting sleeve (47), a rack (473) is connected to the inner cylinder (478) in a sliding manner, a movable ring (475) is fixedly arranged at the top of the rack (473), a plurality of rocker arms (477) are equidistantly arranged on the movable ring (475), a driving plate (4711) is movably connected to the end part of the rocker arm (477), the driving plate (4711) is connected with a fixed disc (479) in a sliding manner, the fixed disc (479) is fixedly arranged at one end of the inner cylinder (478), and an arc plate (470) is fixedly arranged at the end part of the driving plate (4711);

The inner cylinder (478) is rotatably connected with a rotating shaft (471), one end of the rotating shaft (471) extends out of the inner cylinder (478) and is connected with a ratchet gear (472), the other end of the rotating shaft (471) is fixedly provided with a driving gear (474), and the driving gear (474) is meshed and connected with a rack (473).

10. A method for preparing a thermal barrier coating by oxygen dissociation-assisted physical vapor deposition, which is characterized in that the device for preparing the thermal barrier coating by oxygen dissociation-assisted physical vapor deposition as claimed in claim 9 comprises the following steps:

firstly, driving a clamp (4) to move a gate of a vacuum deposition chamber (5), sequentially placing a processed deposition substrate (7) on a connecting sleeve (47) for fixing, and resetting the clamp (4); placing the ceramic target (3) into a vacuum deposition chamber (5), adjusting the position of the ceramic target (3), and ensuring the clear visual field during preparation;

step two, a vacuum pump set (1) is adopted to pump the vacuum deposition chamber (5) to a high vacuum state;

Step three, heating the deposition substrate (7) to 800-1000 ℃ through a heater (6);

Step four, starting an electron gun (12), setting the voltage and the power of the electron gun (12) according to the preparation requirement, and controlling a high-energy electron beam (8) emitted by the electron gun (12) to focus on a ceramic target (3);

Step five, introducing proper amount of oxygen into the gas ionization chamber (11) according to the preparation requirement, ionizing the introduced oxygen into oxygen ions by high pressure applied by the gas ionization system, and releasing the generated oxygen plasma into the vacuum deposition chamber (5) through the ionization opening (14) and the insulation component (18) to participate in the deposition process;

Step six, the thermal barrier coating is deposited under the auxiliary atmosphere of plasma, the deposition time is set according to the different thickness of the thermal barrier coating, ionic substances generated after the ceramic target (3) are bombarded by high-energy electron beams (8) to be fused and evaporated are better combined with oxygen plasmas, and oxygen supplementing is carried out more fully, so that the thermal barrier coating with better performance is obtained;

and step seven, after the deposition is finished, closing the electron gun (12), introducing oxygen, heating, gas ionization system and a vacuum pump set (1), cooling the vacuum deposition chamber (5) through a cooling fan (55) and a disk type circulating water pipe (54), then moving a gate of the vacuum deposition chamber (5) by a clamp (4), and taking out the prepared thermal barrier coating.