CN118028962B - Application of ionic liquids in electrolytic polishing of metal solids - Google Patents
Application of ionic liquids in electrolytic polishing of metal solids Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/18—Polishing of light metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/18—Polishing of light metals
- C25F3/20—Polishing of light metals of aluminium
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/24—Polishing of heavy metals of iron or steel
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Abstract
The invention discloses an application of ionic liquid in metal solid electrolytic polishing. The invention adopts the ionic liquid to be applied to metal solid electrolytic polishing, has the characteristics of low carbon, environmental protection and high efficiency, and can realize quick and good polishing effect. Particularly, for high-strength corrosion-resistant metal materials such as titanium alloy, nickel alloy, tungsten alloy, copper alloy, aluminum alloy, magnesium alloy or steel, and the like, the ionic liquid is adopted for metal electrolytic polishing treatment, so that excellent polishing effect is obtained, the application range is wide, and the application value is high.
Description
Technical Field
The invention relates to the technical field of metal surface treatment, in particular to application of ionic liquid in metal solid electrolytic polishing.
Background
With the development of society, metal with bright surfaces is increasingly emphasized. The metal with bright surface can improve the beauty, reduce friction force, improve mechanical precision, improve cutting performance and prolong service life. In precision manufacturing and high-end consumer goods industries, there is a stringent requirement for the degree of brightness of metal surfaces. Materials such as titanium alloy, nickel alloy, tungsten alloy, copper alloy, aluminum alloy, magnesium alloy, steel and the like can reach a smooth surface through multi-step manual polishing due to excellent corrosion resistance, high strength and high toughness, and the general chemical polishing and electrochemical polishing processes do not work. The high strength of the material also causes great increase of the difficulty of manual polishing, the construction period is long, unified standards and lower reject ratio are difficult to obtain, and higher grinding effect on corners, gaps and other parts is difficult to achieve.
How to find a polishing medium suitable for metal polishing, in particular for metal solid electrolytic polishing, becomes a technical problem to be solved in the present technology.
Disclosure of Invention
The present invention aims to solve at least one of the above technical problems in the prior art. Therefore, one of the purposes of the invention is to provide an application of the ionic liquid in metal solid electrolytic polishing, the other purpose of the invention is to provide a polishing medium containing the ionic liquid for metal solid electrolytic polishing, and the other purpose of the invention is to provide a method for applying the ionic liquid to metal solid electrolytic polishing.
The inventor finds that the ionic liquid is applied to metal solid electrolytic polishing, has good polishing effect, and has the advantages of low carbon, environmental protection, rapidness and high efficiency.
In order to achieve the above purpose, the technical scheme adopted by the invention is as follows:
The first aspect of the invention provides the use of an ionic liquid in the electropolishing of metal solids.
Preferably, the ionic liquid is used as an electrolyte and/or a solvent in the electrolytic polishing of metal solids, and further preferably, the ionic liquid is used as an electrolyte, a solvent or both electrolyte and solvent in the electrolytic polishing of metal solids.
Preferably, the resistivity of the ionic liquid is less than or equal to 5 multiplied by 10 5 ohm/cm, and further preferably, the resistivity of the ionic liquid is less than or equal to 1 multiplied by 10 5 ohm/cm.
Preferably, the ionic liquid comprises at least one of imidazole ionic liquid, quaternary ammonium salt ionic liquid, quaternary phosphonium salt ionic liquid, pyrrole ionic liquid and piperidine ionic liquid.
Preferably, the ionic liquid is a halogenated ionic liquid, namely an ionic liquid containing halogen, and further preferably, the ionic liquid is at least one of a chlorinated ionic liquid and a brominated ionic liquid.
Preferably, the ionic liquid comprises at least one of ethyl 1-ethyl-3-methylimidazole sulfate, dimethyl 1-ethyl-3-methylimidazole phosphate, diethyl 1-ethyl-3-methylimidazole phosphate, dibutyl 1-butyl-3-methylimidazole phosphate, 1-ethyl-3-methylimidazole acetate, 1-butyl-3-methylimidazole bromide, 1-ethyl-3-methylimidazole chloride and 1-butyl-3-methylimidazole chloride.
Preferably, the metal comprises at least one of titanium alloy, nickel alloy, tungsten alloy, copper alloy, aluminum alloy, magnesium alloy, steel.
In a second aspect, the invention provides a polishing medium for metal solid electropolishing comprising solid particles comprising an ionic liquid for use in accordance with the first aspect of the invention.
Preferably, the ionic liquid is located inside the solid particulate matter, or inside and on the surface. The ionic liquid can adjust the conductivity and the ion exchange rate of solid particles and can play roles in conducting and transmitting ions.
Preferably, in the polishing medium, the mass ratio of the solid particles to the ionic liquid is 100 (0.1-100), more preferably, the mass ratio of the solid particles to the ionic liquid is 100 (1-100), still more preferably, the mass ratio of the solid particles to the ionic liquid is 100 (1-50), still more preferably, the mass ratio of the solid particles to the ionic liquid is 100 (10-50).
Preferably, in the polishing medium, the solid particles have a porous structure, and groups that adsorb and complex metal ions.
Further, in the polishing medium, the solid particles have a porous structure, are hydrophilic and have a certain hardness, cannot be easily broken under the condition of slight collision with metal, can adsorb a certain amount of solution to have conductivity and ion exchange performance, and can not have conductivity. The solid particles are provided with groups capable of adsorbing and complexing metal ions, so that the effect of fixing the metal ions is achieved, the concentration of the metal ions in the electrolyte is reduced, the overpotential is reduced, and the oxidation process of the metal surface is promoted.
Preferably, the groups in the solid particles that adsorb and complex the metal ions include at least one of carboxyl groups, amine groups, and hydroxyl groups.
Preferably, in the polishing medium, the solid particulate matter comprises one or more of ion exchange resin, silica gel, and molecular sieve.
Further preferably, the solid particulate matter includes an acrylic-type ion exchange resin containing at least one of a carboxyl group, a hydroxyl group, and an amine group. The acrylic acid type ion exchange resin containing at least one of carboxyl, hydroxyl and amino can be prepared by polymerizing monomers containing carboxyl, hydroxyl or amino and acrylic acid (ester) monomers, etc., and belongs to the conventional method in the field, for example, refer to the disclosure of CN114908409A, CN114908410A, CN115029768A, and can also be directly purchased from commercial products.
Preferably, the solid particulate matter is a carboxylic acid type acrylic acid ion exchange resin containing COOH/COO - groups.
Preferably, the solid particulate matter is carboxylic acid type acrylic acid ion exchange resin with pH value of 5-7.
Preferably, the polishing medium further comprises at least one of a salt, a brightening agent, and a solvent.
Preferably, the salt comprises at least one of sulfate, chloride, zinc salt, sodium salt, potassium salt and ammonium salt, and further preferably, the salt comprises at least one of sodium sulfate, potassium sulfate, zinc sulfate, ammonium sulfate, sodium chloride, potassium chloride, zinc chloride, ammonium chloride, sodium fluoride, sodium nitrate, sodium phosphate and disodium ethylenediamine tetraacetate.
Preferably, the brightening agent comprises at least one of glucose, saccharin, starch, sucrose and benzotriazole.
Preferably, the solvent includes at least one of water, small molecule alcohol, small molecule ketone, dimethyl sulfoxide (DMSO), dimethylformamide (DMF), tetrahydrofuran (THF), dioxane. Further preferably, the small molecule alcohol comprises at least one of methanol, ethanol, n-propanol, isopropanol, butanol and butanediol, and the small molecule ketone comprises at least one of acetone, butanone and cyclohexanone.
Preferably, the mass ratio of the solid particles to the salt in the polishing medium is 100 (0.1-30), more preferably, the mass ratio of the solid particles to the salt is 100 (0.1-15), still more preferably, the mass ratio of the solid particles to the salt is 100 (0.5-10), still more preferably, the mass ratio of the solid particles to the salt is 100 (0.8-5).
Preferably, in the polishing medium, the mass ratio of the solid particles to the brightening agent is 100 (0.01-20), more preferably, the mass ratio of the solid particles to the brightening agent is 100 (0.1-15), still more preferably, the mass ratio of the solid particles to the brightening agent is 100 (0.5-10), still more preferably, the mass ratio of the solid particles to the brightening agent is 100 (0.8-5).
Preferably, the mass ratio of the solid particles to the solvent in the polishing medium is 100 (0.001-100), more preferably, the mass ratio of the solid particles to the solvent is 100 (0.01-50), still more preferably, the mass ratio of the solid particles to the solvent is 100 (0.1-30), still more preferably, the mass ratio of the solid particles to the solvent is 100 (1-20).
It should be noted that, in the electrolytic polishing, metal is immersed in a special chemical solution composed of various components, and the metal is oxidized by means of high electrochemical potential energy to obtain a smooth and bright surface, and the chemical solution used in conventional electrolytic polishing is a strong acid or a strong volatile liquid, so that the chemical solution is inconvenient to transport and store, and is harmful to workers, and the waste liquid treatment is also a big problem. The solid electrolytic polishing is to replace electrolyte with solid particles with ion adsorption/exchange/complexing capacity and inside conducting solution, and the solid particles contact with the metal part to be polished to polish the surface of the metal part. Although the solid particles are in contact with the metal piece to be polished, the relative movement rate of the contact is low, and the hardness of the solid particles is lower than that of the metal piece, so that the physical mechanical polishing process is negligible.
In a third aspect, the present invention provides a method for solid electrolytic polishing of metals, which uses the polishing medium according to the second aspect of the present invention to perform solid electrolytic polishing on metals.
Preferably, the method for electropolishing a metal solid comprises the steps of:
1) Placing a metal to be polished and a polishing medium for metal solid electrolytic polishing according to the second aspect of the invention into an electrochemical polishing device, wherein the metal to be polished is connected with a positive electrode of a power supply of the electrochemical polishing device, and the polishing medium for metal solid electrolytic polishing is connected with a negative electrode of the power supply of the electrochemical polishing device;
2) And electrifying the electrochemical polishing device to carry out electrolytic polishing, wherein the metal to be polished and a polishing medium subjected to metal solid electrolytic polishing generate relative friction motion during electrolytic polishing.
Preferably, the voltage of the electrolytic polishing is 10V-110V, more preferably, the voltage of the electrolytic polishing is 30V-100V, still more preferably, the voltage of the electrolytic polishing is 45V-90V, still more preferably, the voltage of the electrolytic polishing is 50V-70V.
Preferably, the electrolytic polishing time is 5 min-90 min, more preferably, the electrolytic polishing time is 10 min-80 min, and still more preferably, the electrolytic polishing time is 30 min-60 min.
Preferably, in the electrolytic polishing, the relative friction movement rate is 30 r/min-120 r/min, more preferably, the relative friction movement rate is 50 r/min-100 r/min, still more preferably, the relative friction movement rate is 60 r/min-90 r/min.
The beneficial effects of the invention are as follows:
The invention adopts the ionic liquid to be applied to metal solid electrolytic polishing, has the characteristics of low carbon, environmental protection and high efficiency, and can realize quick and good polishing effect. Particularly, for high-strength corrosion-resistant metal materials such as titanium alloy, nickel alloy, tungsten alloy, copper alloy, aluminum alloy, magnesium alloy or steel, and the like, the ionic liquid is adopted for metal electrolytic polishing treatment, so that excellent polishing effect is obtained, the application range is wide, and the application value is high.
In particular, the ionic liquid is composed of anions and cations, so that the ionic liquid has higher conductivity and can simultaneously play roles of conducting and transmitting ions. In addition, the ionic liquid is in a liquid state, has lower viscosity and can play a role of a solvent. Therefore, the ionic body fluid can simultaneously play roles of the solvent and the electrolyte, can be used independently, and can also be mixed with other solvents and electrolytes for use. Meanwhile, the ionic liquid does not contain water, so that oxides or hydroxides are not formed after the metal is electrolyzed, the smooth surface is protected, and the ionic liquid has better polishing effect than a water system for metals which can be oxidized and hydrolyzed, such as magnesium, aluminum, copper, titanium and the like. In addition, the ionic liquid has lower vapor pressure, is difficult to volatilize, does not cause solvent volatilization pollution, does not need to add new solvent in the long-time polishing process, and has good effects of environmental protection and process reduction. Therefore, the ionic liquid is applied to metal solid electrolytic polishing, and has wide market prospect.
Detailed Description
The present invention will be described in further detail with reference to specific examples. The starting materials, reagents or apparatus used in the examples and comparative examples were either commercially available from conventional sources or may be obtained by prior art methods unless specifically indicated. Unless otherwise indicated, assays or testing methods are routine in the art.
The carboxylic acid type acrylic acid ion exchange resin adopted below refers to the preparation method of the polyacrylate porous resin microsphere with carboxyl disclosed in the CN114908409A concrete embodiment, and then the COOH type acrylic acid ion exchange resin is prepared. The same resins were used for the carboxylic acid type acrylic acid ion exchange resins used for the preparation of solid particulates in the examples and comparative examples.
In the ionic liquid used in the following examples, the resistivity of ethyl 1-ethyl-3-methylimidazole sulfate was 7.4X10- 4. OMEGA/cm, and the resistivity of 1-ethyl-3-methylimidazole chloride was 8.1X10- 4. OMEGA/cm.
The "parts" hereinafter refer to parts by mass unless otherwise specified.
The compositions of examples 1-4 of the metal electropolishing media are shown in Table 1.
TABLE 1 compositions of examples 1-4 of metal solid electropolishing media
Example 1
Referring to table 1, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6 and 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
And (3) soaking the carboxylic acid type acrylic acid ion exchange resin in a sodium hydroxide aqueous solution, after the pH is stabilized to 6, airing at room temperature, washing with ethanol, and airing at room temperature to obtain the carboxylic acid type acrylic acid ion exchange resin with the pH of=6.
100 Parts of carboxylic acid type acrylic acid ion exchange resin with pH=6 and 10 parts of ionic liquid 1-ethyl-3-methylimidazole ethyl sulfate are uniformly mixed to obtain solid particles subjected to solid electrolytic polishing in the example.
Example 2
Referring to table 1, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6 and 1 part of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate. This example differs from example 1 only in the amount of ionic liquid used, the remainder being the same as example 1. The preparation method of the carboxylic acid type acrylic acid ion exchange resin in the following examples or comparative examples is the same as that of the carboxylic acid type acrylic acid ion exchange resin having ph=6 in example 1, unless otherwise specified.
Example 3
Referring to table 1, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6 and 20 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate. This example differs from example 1 only in the amount of ionic liquid used, the remainder being the same as example 1.
Example 4
Referring to table 1, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6 and 10 parts of ionic liquid 1-ethyl-3-methylimidazole chloride. This example differs from example 1 only in the type of ionic liquid, and the remainder is the same as example 1.
The compositions of examples 5-8, which are electropolishing media, are shown in Table 2.
TABLE 2 compositions of examples 5 to 8 of metal solid electrolytic polishing media
Example 5
Referring to table 2, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate and 3 parts of sodium sulfate.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin and 3 parts of sodium sulfate and 10 parts of ionic liquid 1-ethyl-3-methylimidazole ethyl sulfate are mixed to obtain the metal solid electrolytic polishing medium of the example.
Example 6
Referring to table 2, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate and 1 part of sodium sulfate. This example differs from example 5 only in the amount of ionic liquid used, the remainder being the same as example 5.
Example 7
Referring to table 2, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate and 3 parts of sodium chloride.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin and 3 parts of sodium chloride and 10 parts of ionic liquid 1-ethyl-3-methylimidazole ethyl sulfate are mixed to obtain the metal solid electrolytic polishing medium of the example.
Example 8
Referring to table 2, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate and 1 part of sodium chloride. This example differs from example 7 only in the amount of ionic liquid used, the remainder being the same as example 7.
The compositions of examples 9-11 and comparative examples 1-3 of the metal electropolishing media are shown in Table 2.
TABLE 3 compositions of metal solid electropolishing Medium examples 9-11 and comparative examples 1-3
Example 9
Referring to table 3, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid type acrylic acid ion exchange resin at ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate and 10 parts of ethanol.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin and 10 parts of ethanol and 10 parts of ionic liquid 1-ethyl-3-methylimidazole ethyl sulfate are mixed to obtain the metal solid electrolytic polishing medium of the example.
Example 10
Referring to table 3, the metal solid electropolishing medium of this example consisted of 100 parts of carboxylic acid type acrylic acid ion exchange resin with ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate and 10 parts of DMF.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin and 10 parts of DMF and 10 parts of ionic liquid 1-ethyl-3-methylimidazole ethyl sulfate are mixed to obtain the metal solid electrolytic polishing medium of the example.
Example 11
Referring to table 3, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid type acrylic acid ion exchange resin at ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate, 10 parts of ethanol and 3 parts of sodium chloride.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin is mixed with 3 parts of sodium chloride, 10 parts of ethanol and 10 parts of ionic liquid 1-ethyl-3-methylimidazole ethyl sulfate to obtain the metal solid electrolytic polishing medium of the example.
Comparative example 1
Referring to table 3, the metal solid electropolishing media of this example consisted of 100 parts of carboxylic acid type acrylic acid ion exchange resin at ph=6 and 10 parts of ethanol.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin was mixed with 10 parts of ethanol solution to obtain a metal solid electrolytic polishing medium of this example.
Comparative example 2
Referring to table 3, the metal solid electropolishing media of this example consisted of 100 parts of carboxylic acid type acrylic acid ion exchange resin at ph=6, 10 parts of ethanol, and 3 parts of sodium chloride.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin, 3 parts of sodium chloride and 10 ethanol are mixed to obtain the metal solid electrolytic polishing medium of the example.
Comparative example 3
Referring to table 3, the metal solid electropolishing media of this example consisted of 100 parts of carboxylic acid type acrylic acid ion exchange resin with ph=6 and 10 parts of DMF.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin was mixed with 10 parts of DMF to obtain the metal solid electrolytic polishing medium of this example.
The composition of metal electropolishing media example 12 is shown in table 4.
TABLE 4 composition of metal solid electropolishing Medium example 12
Example 12
Referring to table 4, the present example metal solid electropolishing media consisted of 100 parts of carboxylic acid acrylic acid ion exchange resin at ph=6, 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate, 3 parts of glucose and 3 parts of sodium chloride.
The preparation method of the metal solid electrolytic polishing medium comprises the following steps:
100 parts of carboxylic acid type acrylic acid ion exchange resin was mixed with 3 parts of sodium chloride, 3 parts of glucose and 10 parts of ionic liquid ethyl 1-ethyl-3-methylimidazole sulfate to obtain a metal solid electrolytic polishing medium of this example.
Titanium alloy metal solid electrolytic polishing experiment
Titanium alloy solid electrolytic polishing application experiments are respectively carried out by adopting the prepared metal solid electrolytic polishing medium examples 1-12 and comparative examples 1-3. The titanium alloys used in the application experiments were all the same, and the surface roughness before polishing was 5.64 μm. The surface roughness is the result of a roughness test performed on the surface of the titanium alloy piece by using an optical profiler.
The method for solid electrolytic polishing of the titanium alloy piece comprises the following steps:
The titanium alloy piece was connected with the positive electrode of the power supply of the electrochemical polishing device, and the metal solid electrolytic polishing medium examples 1 to 12 and comparative examples 1 to 3 were respectively placed in a metal net bag and connected with the negative electrode of the power supply of the electrochemical polishing device. And electrifying the electrochemical polishing device to carry out electrolytic polishing, wherein the titanium alloy piece to be polished and the metal electrolytic polishing medium generate relative friction movement during electrolytic polishing. The voltage is applied at 60V, the relative movement rate is 90r/min, and the polishing time is 60min.
Metal solid electropolishing media examples 1-12 and comparative examples 1-3 the results of metal solid electropolishing experiments applied to titanium alloys are shown in table 5.
TABLE 5 titanium alloy metal solid electrolytic polishing experiment results
According to the experimental results of table 5:
1. From the experimental results of examples 1 to 4, it can be seen that the ionic liquid is used as the electrolyte and the solvent for metal solid electrolytic polishing, so that the polishing effect is good, and the polishing effect of the ionic liquid containing chlorine is better.
2. From the experimental results of examples 5 to 8, it was found that the polishing effect was further improved by adding an inorganic salt based on example 1. Among them, the effect of using chlorine salt is better because chlorine salt can enhance etching effect, enhance conductivity, and thus make polishing effect better.
3. From the experimental results of examples 9 to 10, it can be seen that the polishing effect can be improved by adding the organic solvent ethanol or DMF on the basis of example 1. This is because, after the addition of the organic solvent, the viscosity can be reduced, and the ion exchange can be accelerated, thereby improving the polishing effect.
4. As can be seen from the experimental results of example 11 and example 7, the polishing effect can be improved by adding small-molecule alcohol based on the chlorine salt in example 7, and the viscosity can be reduced and the ion exchange can be accelerated by adding the organic solvent.
5. From the experimental results of example 12, it can be seen that the polishing brightness can be further improved by adding a brightening agent. On the basis of example 7, the surface roughness of the polished titanium alloy piece can be further reduced from 0.79 μm to 0.41 μm by adding the saccharide type brightening agent.
6. As can be seen from the experimental results of comparative examples 1 to 3, the use of the organic solvents of ethanol and DMF gave too low a current and poor polishing effect, which was inferior to that of the examples using ionic liquids.
Brass metal solid electrolytic polishing experiment
Brass solid electrolytic polishing application experiments were conducted using the metal solid electrolytic polishing medium example 7 prepared as described above. The surface roughness of the brass before polishing was 1.86 μm.
The method for the solid electrolytic polishing of brass parts comprises the following steps:
The brass piece was connected to the positive power supply of the electrochemical polishing apparatus, and metal solid electrolytic polishing medium example 7 was connected to the negative power supply of the electrochemical polishing apparatus in a metal mesh. And electrifying the electrochemical polishing device to carry out electrolytic polishing, wherein the brass piece to be polished and the metal electrolytic polishing medium generate relative friction movement during electrolytic polishing. The voltage is applied at 60V, the relative movement rate is 90r/min, and the polishing time is 60min.
As a result of the brass metal solid electrolytic polishing experiment, it was found that the surface roughness of brass polished by the metal solid electrolytic polishing medium of example 7 was reduced from 1.86 μm before polishing to 0.19 μm after polishing.
Stainless steel metal solid electrolytic polishing experiment
The application experiment of stainless steel 316 solid electrolytic polishing was performed using the metal solid electrolytic polishing medium example 7 prepared as described above. The surface roughness of the stainless steel 316 before polishing was 2.97 μm.
The method for solid electrolytic polishing of the stainless steel piece comprises the following steps:
Stainless steel piece 316 was connected to the positive power supply of the electrochemical polishing apparatus, and metal solid electrolytic polishing medium example 7 was connected to the negative power supply of the electrochemical polishing apparatus in a metal mesh bag. And electrifying the electrochemical polishing device to carry out electrolytic polishing, wherein the stainless steel piece to be polished and the metal electrolytic polishing medium generate relative friction movement during electrolytic polishing. The voltage is applied at 60V, the relative movement rate is 90r/min, and the polishing time is 60min.
As a result of the metal solid electrolytic polishing experiment for stainless steel 316, it was found that the surface roughness of the stainless steel after polishing by using the metal solid electrolytic polishing medium of example 7 was reduced from 2.97 μm before polishing to 0.37 μm after polishing.
Solid electrolytic polishing experiment for aluminum alloy metal
The metal solid electrolytic polishing medium example 7 prepared as described above was used for the aluminum alloy solid electrolytic polishing application experiment. The surface roughness of the aluminum alloy before polishing was 1.58 μm.
The solid electrolytic polishing method of the aluminum alloy part comprises the following steps:
The aluminum alloy piece was connected to the positive electrode of the power supply of the electrochemical polishing apparatus, and the metal solid electrolytic polishing medium example 7 was connected to the negative electrode of the power supply of the electrochemical polishing apparatus in a metal net bag. And electrifying the electrochemical polishing device to carry out electrolytic polishing, wherein the aluminum alloy part to be polished and the metal electrolytic polishing medium generate relative friction movement during electrolytic polishing. The voltage is applied at 60V, the relative movement rate is 90r/min, and the polishing time is 60min.
As a result of the solid electrolytic polishing experiment for aluminum alloy metal, it was found that the surface roughness of the aluminum alloy after polishing with the solid electrolytic polishing medium for metal of example 7 was reduced from 1.58 μm before polishing to 0.24 μm after polishing.
According to the experimental results, the ionic liquid is applied to solid electrolytic polishing of high-strength corrosion-resistant metals such as titanium alloy, nickel alloy, tungsten alloy, copper alloy, aluminum alloy, magnesium alloy or steel, and the like, so that a rapid and good polishing effect can be realized, and the ionic liquid has the characteristics of low carbon, environmental protection and high efficiency, and has a wide application prospect.
The above examples are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above examples, and any other changes, modifications, substitutions, combinations, and simplifications that do not depart from the spirit and principle of the present invention should be made in the equivalent manner, and the embodiments are included in the protection scope of the present invention.
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