CN117954952A - Laser frequency multiplication generating device - Google Patents
Laser frequency multiplication generating device Download PDFInfo
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- CN117954952A CN117954952A CN202410068046.0A CN202410068046A CN117954952A CN 117954952 A CN117954952 A CN 117954952A CN 202410068046 A CN202410068046 A CN 202410068046A CN 117954952 A CN117954952 A CN 117954952A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
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Abstract
The invention discloses a laser frequency multiplication generating device, which sequentially comprises the following components along the propagation direction of laser: the device comprises a fundamental frequency module, a frequency multiplication generating module, a dual-wavelength reflecting mirror, a frequency multiplication laser sampling mirror and a frequency multiplication power sampling sensor; a frequency multiplication temperature control furnace is arranged in the frequency multiplication generation module; the frequency multiplication temperature control furnace clamps nonlinear crystals; the fundamental frequency module is used for providing fundamental frequency laser; the frequency multiplication generation module is used for carrying out nonlinear conversion on the fundamental frequency laser; the frequency multiplication laser sampling mirror is used for reflecting frequency multiplication laser to enter the frequency multiplication power sampling sensor; the frequency multiplication power sampling sensor is used for determining the current power of frequency multiplication laser; and the frequency multiplication temperature control furnace is used for adjusting the temperature of the nonlinear crystal when the current power is smaller than the preset target power so as to enable the current power to reach the target power. The invention can solve the problem of easy mismatch of the angle of double-pass frequency multiplication and improve the conversion efficiency of double-pass frequency multiplication.
Description
Technical Field
The invention relates to the technical field of lasers, in particular to a laser frequency multiplication generating device.
Background
In the prior art, laser frequency multiplication is generally adopted to obtain laser with shorter wavelength, and in a solid laser, nonlinear crystals are utilized to generate secondary nonlinear effect under the action of strong laser to obtain frequency multiplication laser. In order to obtain higher second harmonic conversion efficiency, two-pass frequency multiplication is generally adopted: the fundamental frequency laser passes through the nonlinear crystal twice, the nonlinear action length is increased, and the conversion efficiency can be greatly improved. The reason is that: the divergence of the incoming laser light causes a phase mismatch and the divergence angle needs to be controlled within a certain range, i.e. the acceptance angle. The receiving angle is inversely proportional to the length of the crystal along the optical axis, the longer the crystal is, the smaller the receiving angle is, and the requirement on the beam quality of fundamental frequency light is also high; assuming that for a crystal with the length L, the receiving angle is alpha, adopting a round trip double-pass frequency multiplication scheme, wherein the first pass and the second pass are equivalent to two independent frequency multiplication converters, and the receiving angles are both alpha; if single pass frequency multiplication is used, which corresponds to a crystal length of 2L, but the acceptance angle becomes α/2, which means that the divergence angle of the incident laser must be smaller, i.e. the beam waist is large, the power density is reduced, resulting in a reduction in nonlinear conversion efficiency.
Therefore, under the condition of the same crystal length, the double-pass frequency multiplication can obtain the conversion efficiency of about 2 times of the single-pass frequency multiplication. However, the existing double-pass frequency multiplication device is easy to generate the problem of angle mismatch when in frequency multiplication conversion, and the conversion efficiency of double-pass frequency multiplication is unstable in the nonlinear conversion process, so that the conversion efficiency of double-pass frequency multiplication is greatly reduced.
Disclosure of Invention
The invention provides a laser frequency multiplication generating device, which aims to solve the technical problem that the existing laser frequency multiplication generating device is easy to have angle mismatch, so that the conversion efficiency of double-pass frequency multiplication is low.
In order to solve the above technical problems, an embodiment of the present invention provides a laser frequency multiplication generating device, which sequentially includes, along a propagation direction of laser: the device comprises a fundamental frequency module, a frequency multiplication generating module, a dual-wavelength reflecting mirror, a frequency multiplication laser sampling mirror and a frequency multiplication power sampling sensor;
a frequency multiplication temperature control furnace is arranged in the frequency multiplication generation module; the frequency multiplication temperature control furnace clamps nonlinear crystals;
The fundamental frequency module is used for providing fundamental frequency laser;
The frequency multiplication generating module is used for carrying out first-pass nonlinear conversion and second-pass nonlinear conversion on the fundamental frequency laser to generate frequency multiplication laser;
The dual-wavelength reflecting mirror is used for reflecting the frequency multiplication laser generated by the first-pass nonlinear conversion and the residual fundamental frequency laser back to the frequency multiplication generating module so that the frequency multiplication generating module carries out the second-pass nonlinear conversion on the residual fundamental frequency laser again to generate frequency multiplication laser;
The frequency multiplication laser sampling mirror is used for transmitting the frequency multiplication laser as double-pass frequency multiplication laser and reflecting low-power frequency multiplication laser to enter the frequency multiplication power sampling sensor;
the frequency multiplication power sampling sensor is used for determining the current power of the entered frequency multiplication laser;
The frequency multiplication temperature control furnace is used for providing a constant temperature environment for the nonlinear crystal, and adjusting the temperature of the nonlinear crystal when the current power is smaller than a preset target power so as to enable the current power to reach the target power.
As a preferable mode, the laser frequency doubling generating device further comprises: a PZT two-dimensional adjustment table, a polaroid and a position sensing detector;
the dual-wavelength reflecting mirror is arranged on the PZT two-dimensional adjusting table; the polaroid and the position sensing detector are sequentially arranged behind the frequency multiplication generating module along the propagation direction of laser;
the polaroid is used for reflecting residual fundamental frequency laser after the second-pass nonlinear conversion of the low power to enter the position sensing detector;
the position sensing detector is used for determining the current spot position coordinates of the entered residual fundamental frequency laser;
And the PZT two-dimensional adjusting table is used for adjusting a two-dimensional angle to maximize the efficiency of the second-pass nonlinear conversion, and in the operation process of the laser frequency doubling generating device, when the current light spot position coordinate is inconsistent with the preset target light spot position coordinate, the angle of the dual-wavelength reflecting mirror is adjusted so that the current light spot position coordinate is consistent with the target light spot position coordinate.
As a preferred scheme, the frequency multiplication generating module is further configured to adjust a spatial posture of the frequency multiplication temperature control furnace when the nonlinear crystal is at a preset initial temperature, so that the fundamental frequency laser performs a first-pass nonlinear conversion in the nonlinear crystal to generate frequency multiplication laser, and phase matching is achieved;
Performing second-pass nonlinear conversion on the residual fundamental frequency laser reflected by the dual-wavelength reflecting mirror again to generate frequency doubling laser, and adjusting the pitching and horizontal deflection of the dual-wavelength reflecting mirror to enable the power of the generated frequency doubling laser to reach the maximum value;
when the power of the generated frequency doubling laser reaches the maximum value, the power of the frequency doubling laser determined by the frequency doubling power sampling sensor is taken as the target power, and the current spot position coordinate of the residual fundamental frequency laser determined by the position sensing detector is taken as the target spot position coordinate.
As a preferable mode, the laser frequency doubling generating device further comprises: the system comprises an optical isolator, a first fundamental frequency half-wave plate, a fundamental frequency sampling mirror, a fundamental frequency power sampling sensor, a dichroic mirror, an electric translation lifting platform, a second fundamental frequency half-wave plate and a garbage light collector;
The optical isolator, the first fundamental frequency half-wave plate, the fundamental frequency sampling mirror, the fundamental frequency power sampling sensor and the dichroic mirror are sequentially arranged between the fundamental frequency module and the frequency multiplication generation module along the propagation direction of laser; the second fundamental frequency half-wave plate is arranged in front of the polaroid; the garbage light collector is arranged behind the polaroid;
The incident surface of the dichroic mirror is plated with an antireflection film of fundamental frequency laser, and the emergent surface is plated with a high reflection film of frequency doubling laser;
The optical isolator is used for isolating fundamental frequency laser generated by the fundamental frequency module, isolating fundamental frequency laser transmitted reversely, and transmitting fundamental frequency laser transmitted positively into the first fundamental frequency half-wave plate;
The first fundamental frequency half-wave plate is used for changing the polarization of the fundamental frequency laser into horizontal linear polarization and then entering the fundamental frequency sampling mirror;
the fundamental frequency sampling mirror is used for transmitting fundamental frequency laser into the dichroic mirror and reflecting low-power fundamental frequency laser into the fundamental frequency power sampling sensor;
The fundamental frequency power sampling sensor is used for monitoring whether the entered fundamental frequency laser is normal or not;
The dichroic mirror is used for transmitting fundamental frequency laser to enter the frequency multiplication generating module, reflecting all frequency multiplication laser generated by first-path nonlinear conversion and second-path nonlinear conversion in the frequency multiplication generating module to enter the frequency multiplication laser sampling mirror, sequentially transmitting residual fundamental frequency laser in the frequency multiplication generating module to the first fundamental frequency half-wave plate and the optical isolator, so that the first fundamental frequency half-wave plate and the optical isolator change the polarization of the residual fundamental frequency laser into vertical linear polarization, and then reflecting the residual fundamental frequency laser to enter the second fundamental frequency half-wave plate;
the second fundamental frequency half-wave plate is used for carrying out polarization selection on the rest fundamental frequency laser and then entering the polaroid;
the garbage light collector is used for collecting residual fundamental frequency laser transmitted by the polaroid.
As a preferable mode, the laser frequency doubling generating device further comprises: an electric translation lifting platform;
The dichroic mirror, the frequency multiplication generation module, the dual-wavelength reflecting mirror and the PZT two-dimensional adjusting table are arranged on the electric translation lifting table;
The electric translation lifting platform is used for providing linear motion with vertical dimension for the dichroic mirror, the frequency multiplication generation module, the dual-wavelength reflecting mirror and the PZT two-dimensional adjusting platform.
As a preferable scheme, a temperature control furnace connecting mechanical component is also arranged in the frequency doubling generating module;
the temperature control furnace connecting mechanical component is connected with the frequency doubling temperature control furnace and the electric translation lifting platform through screws respectively;
when the temperature control furnace connecting mechanical component is connected with the frequency doubling temperature control furnace and the electric translation lifting platform, preset debugging and locking requirements are required to be met;
The debug locking requirements include a debug requirement and a locking requirement; the debugging requirements are as follows: after the temperature control furnace connecting mechanical component is connected with the frequency multiplication temperature control furnace, the frequency multiplication temperature control furnace does not generate offset in other directions when rotating clockwise and anticlockwise around the x-axis by a preset angle;
The locking requirement is: when the temperature control furnace connecting mechanical assembly is connected with the frequency multiplication temperature control furnace, the temperature control furnace connecting mechanical assembly is locked with the frequency multiplication temperature control furnace in a fastening way through a screw until the locking distance between the temperature control furnace connecting mechanical assembly and the frequency multiplication temperature control furnace is smaller than a preset interval, and when the temperature control furnace connecting mechanical assembly is connected with the electric translation lifting platform, the temperature control furnace connecting mechanical assembly is locked with the electric translation lifting platform in a fastening way through the screw until the locking distance between the temperature control furnace connecting mechanical assembly and the electric translation lifting platform is smaller than the interval.
Preferably, the nonlinear crystal is treated by:
Cutting wedge angles with the same angle at the input end and the output end of the nonlinear crystal along a preset cutting direction; the wedge angle is used for enabling return light to completely pass through the nonlinear crystal without striking the side face of the nonlinear crystal in each use point of the nonlinear crystal while just separating the return light from the light spot of the main light path.
Preferably, the nonlinear crystal is further processed by:
Adjusting the working temperature of the nonlinear crystal to have an offset from a preset theoretical phase matching temperature value within a preset non-critical phase matching allowable temperature range; the offset is calculated according to an angle required by the nonlinear crystal to exactly separate light with two wavelengths;
and adjusting the spatial attitude of the nonlinear crystal so that the spatial attitude compensates the angle.
Preferably, the nonlinear crystal includes: BBO crystals, LBO crystals, CLBO crystals or KBBF crystals.
Compared with the prior art, the embodiment of the invention has the following beneficial effects:
The invention provides a laser frequency multiplication generating device, which sequentially comprises the following components along the propagation direction of laser: the device comprises a fundamental frequency module, a frequency multiplication generating module, a dual-wavelength reflecting mirror, a frequency multiplication laser sampling mirror and a frequency multiplication power sampling sensor; a frequency multiplication temperature control furnace is arranged in the frequency multiplication generation module; the frequency multiplication temperature control furnace clamps nonlinear crystals; the fundamental frequency module is used for providing fundamental frequency laser; the frequency multiplication generating module is used for carrying out nonlinear conversion on the fundamental frequency laser to generate frequency multiplication laser; the frequency multiplication laser sampling mirror is used for transmitting the frequency multiplication laser as double-pass frequency multiplication laser and reflecting low-power frequency multiplication laser to enter the frequency multiplication power sampling sensor; the frequency multiplication power sampling sensor is used for determining the current power of the entered frequency multiplication laser; and the frequency multiplication temperature control furnace is used for adjusting the temperature of the nonlinear crystal when the current power is smaller than the preset target power so as to enable the current power to reach the target power.
The double-pass frequency multiplication laser sampling device is provided with the frequency multiplication laser sampling mirror and the frequency multiplication power sampling sensor, the frequency multiplication laser sampling mirror can reflect double-pass frequency multiplication laser sampling obtained through conversion in the frequency multiplication generation module to enter the frequency multiplication power sampling sensor, and the frequency multiplication power sampling sensor determines the current power of the double-pass frequency multiplication laser; and then, according to the current power of the double-pass frequency multiplication laser, the current power can be compared with the preset target power, and when the current power is smaller than the preset target power, the temperature of the nonlinear crystal in the frequency multiplication generation module is adjusted in real time, so that the power of the double-pass frequency multiplication laser is increased to the target power, the problem of easy mismatch of the angle of double-pass frequency multiplication is solved, and the conversion efficiency of the double-pass frequency multiplication is improved.
Drawings
Fig. 1 is a schematic structural diagram of a laser frequency doubling generating device according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of the number and extent of crystal shift points;
FIG. 3 is a schematic diagram of the internal structure of the frequency doubling generating module;
FIG. 4 is a schematic diagram of a first mode of processing of a nonlinear crystal;
FIG. 5 is a schematic diagram of a second mode of processing of nonlinear crystals;
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present application more apparent, the technical solutions of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application, and it is apparent that the described embodiments are some embodiments of the present application, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs; the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application; the terms "comprising" and "having" and any variations thereof in the description of the application and the claims and the description of the drawings above are intended to cover a non-exclusive inclusion.
In the description of embodiments of the present application, the technical terms "first," "second," and the like are used merely to distinguish between different objects and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated, a particular order or a primary or secondary relationship. In the description of the embodiments of the present application, the meaning of "plurality" is two or more unless explicitly defined otherwise.
Reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the application. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments.
In the description of the embodiments of the present application, the term "and/or" is merely an association relationship describing an association object, and indicates that three relationships may exist, for example, a and/or B may indicate: a exists alone, A and B exist together, and B exists alone. In addition, the character "/" herein generally indicates that the front and rear associated objects are an "or" relationship.
In the description of the embodiments of the present application, the term "plurality" means two or more (including two), and similarly, "plural sets" means two or more (including two), and "plural sheets" means two or more (including two).
In the description of the embodiments of the present application, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured" and the like should be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally formed; or may be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the embodiments of the present application will be understood by those of ordinary skill in the art according to specific circumstances.
Example 1
Referring to fig. 1, a schematic structural diagram of a laser frequency doubling generating apparatus according to an embodiment of the present invention includes, in order along a propagation direction of laser: the device comprises a fundamental frequency module, a frequency multiplication generating module, a dual-wavelength reflecting mirror, a frequency multiplication laser sampling mirror and a frequency multiplication power sampling sensor;
a frequency multiplication temperature control furnace is arranged in the frequency multiplication generation module; the frequency multiplication temperature control furnace clamps nonlinear crystals;
The fundamental frequency module is used for providing fundamental frequency laser;
The frequency multiplication generating module is used for carrying out first-pass nonlinear conversion and second-pass nonlinear conversion on the fundamental frequency laser to generate frequency multiplication laser;
The dual-wavelength reflecting mirror is used for reflecting the frequency multiplication laser generated by the first-pass nonlinear conversion and the residual fundamental frequency laser back to the frequency multiplication generating module so that the frequency multiplication generating module carries out the second-pass nonlinear conversion on the residual fundamental frequency laser again to generate frequency multiplication laser;
The frequency multiplication laser sampling mirror is used for transmitting the frequency multiplication laser as double-pass frequency multiplication laser and reflecting low-power frequency multiplication laser to enter the frequency multiplication power sampling sensor;
the frequency multiplication power sampling sensor is used for determining the current power of the entered frequency multiplication laser;
The frequency multiplication temperature control furnace is used for providing a constant temperature environment for the nonlinear crystal, and adjusting the temperature of the nonlinear crystal when the current power is smaller than a preset target power so as to enable the current power to reach the target power.
Preferably, the laser frequency doubling generating device further comprises: a PZT two-dimensional adjustment table, a polaroid and a position sensing detector; the dual-wavelength reflecting mirror is arranged on the PZT two-dimensional adjusting table; the polaroid and the position sensing detector are sequentially arranged behind the frequency multiplication generating module along the propagation direction of laser; the polaroid is used for reflecting residual fundamental frequency laser after the second-pass nonlinear conversion of the low power to enter the position sensing detector; the position sensing detector is used for determining the current spot position coordinates of the entered residual fundamental frequency laser; and the PZT two-dimensional adjusting table is used for adjusting a two-dimensional angle to maximize the efficiency of the second-pass nonlinear conversion, and in the operation process of the laser frequency doubling generating device, when the current light spot position coordinate is inconsistent with the preset target light spot position coordinate, the angle of the dual-wavelength reflecting mirror is adjusted so that the current light spot position coordinate is consistent with the target light spot position coordinate.
Preferably, the laser frequency doubling generating device further comprises: the system comprises an optical isolator, a first fundamental frequency half-wave plate, a fundamental frequency sampling mirror, a fundamental frequency power sampling sensor, a dichroic mirror, an electric translation lifting platform, a second fundamental frequency half-wave plate and a garbage light collector; the optical isolator, the first fundamental frequency half-wave plate, the fundamental frequency sampling mirror, the fundamental frequency power sampling sensor and the dichroic mirror are sequentially arranged between the fundamental frequency module and the frequency multiplication generation module along the propagation direction of laser; the second fundamental frequency half-wave plate is arranged in front of the polaroid; the garbage light collector is arranged behind the polaroid; the incident surface of the dichroic mirror is plated with an antireflection film of fundamental frequency laser, and the emergent surface is plated with a high reflection film of frequency doubling laser; the optical isolator is used for isolating fundamental frequency laser generated by the fundamental frequency module, isolating fundamental frequency laser transmitted reversely, and transmitting fundamental frequency laser transmitted positively into the first fundamental frequency half-wave plate; the first fundamental frequency half-wave plate is used for changing the polarization of the fundamental frequency laser into horizontal linear polarization and then entering the fundamental frequency sampling mirror; the fundamental frequency sampling mirror is used for transmitting fundamental frequency laser into the dichroic mirror and reflecting low-power fundamental frequency laser into the fundamental frequency power sampling sensor; the fundamental frequency power sampling sensor is used for monitoring whether the entered fundamental frequency laser is normal or not; the dichroic mirror is used for transmitting fundamental frequency laser to enter the frequency multiplication generating module, reflecting all frequency multiplication laser generated by first-path nonlinear conversion and second-path nonlinear conversion in the frequency multiplication generating module to enter the frequency multiplication laser sampling mirror, sequentially transmitting residual fundamental frequency laser in the frequency multiplication generating module to the first fundamental frequency half-wave plate and the optical isolator, so that the first fundamental frequency half-wave plate and the optical isolator change the polarization of the residual fundamental frequency laser into vertical linear polarization, and then reflecting the residual fundamental frequency laser to enter the second fundamental frequency half-wave plate; the second fundamental frequency half-wave plate is used for carrying out polarization selection on the rest fundamental frequency laser and then entering the polaroid; the garbage light collector is used for collecting residual fundamental frequency laser transmitted by the polaroid.
Two problems exist in the existing double-pass frequency multiplication device: (1) The problem of angle mismatch can easily occur when the frequency multiplication conversion is performed, and the conversion efficiency of the double-pass frequency multiplication is unstable in the nonlinear conversion process, so that the conversion efficiency of the double-pass frequency multiplication is greatly reduced; (2) The frequency multiplication light has low-power reflected light on two light-passing surfaces of the crystal, and the reflected light is reflected in the crystal for multiple times and returns to the base frequency module according to the original light path, so that damage and light beam quality interference can be caused to components on the front light path.
In view of the first problem, the present invention provides a new laser frequency multiplication generating device, which can adaptively solve the problem of easy mismatch of the angle of the double-pass frequency multiplication, and improve the conversion efficiency of the double-pass frequency multiplication. As shown in fig. 1, in the laser frequency doubling generating apparatus according to the present invention, the following are sequentially arranged along the laser emission direction: the system comprises a base frequency module (1), an optical isolator (2), a first base frequency half-wave plate (3), a base frequency sampling mirror (4), a base frequency power sampling sensor (5), a dichroic mirror (6), a frequency multiplication generating module (7), a dual-wavelength 0-degree reflecting mirror (8), a PZT two-dimensional adjusting table (9), an electric translation lifting table (10), a frequency multiplication laser sampling mirror (11), a frequency multiplication power sampling sensor (12), a second base frequency half-wave plate (13), a 45-degree polaroid (14), a position sensing detector (15) and a garbage light collector (16).
The fundamental frequency module (1) is configured to provide a linearly polarized fundamental frequency laser with a certain power, pulse width and repetition frequency, and the polarization state of the fundamental frequency laser shown in fig. 1 is horizontal linear polarization, which may be other polarization states. If the fundamental laser is in other polarization states, a half-wave plate is additionally inserted between the fundamental module (1) and the optical isolator (2) to change the polarization of the fundamental laser and rotate the polarization into horizontal linear polarization.
The fundamental laser light is transmitted through (2) an optical isolator, wherein the (2) optical isolator is used for allowing forward transmission light to pass through and isolating reverse transmission light, and (2) the optical isolator can also be other optical device combinations with the same function. Then through (3) a first fundamental frequency half-wave plate, the fundamental frequency half-wave plate shown in fig. 1 is a 1/2 wave plate designed for fundamental frequency wavelength, and the polarization of the outgoing laser light is changed into horizontal linear polarization by rotating the wave plate to adjust the included angle between the polarization direction of the incoming light and the optical axis of the wave plate. It should be noted that, the rotation polarization direction of the first fundamental frequency half-wave plate (3) is horizontal, because (7) the requirement of the frequency doubling crystal on the fundamental frequency polarization in the frequency doubling generating module is horizontal linear polarization, and (4) the fundamental frequency sampling mirror is not required on the polarization direction.
Then passing through (4) a fundamental frequency sampling mirror, (4) a fundamental frequency sampling mirror for transmitting fundamental frequency laser of most power, reflecting fundamental frequency laser of a small part of power into (5) a fundamental frequency power sampling sensor; (4) Can be any optical element meeting the sampling requirement. (5) The base frequency power sensing detector is used for collecting base frequency laser of small signal power, feeding back the base frequency laser to the monitoring program in real time, and monitoring whether the base frequency light path parts (1) - (3) work normally or not.
(4) The transmitted light of the fundamental frequency sampling mirror is transmitted through the dichroic mirror (6), the dichroic mirror parameter shown in fig. 1 is 45 DEG, the incident surface is plated with a fundamental frequency light antireflection film, the emergent surface is plated with a high reflection film of frequency doubling light, and one beam of dual-wavelength laser is transmitted through the dichroic mirror and reflected by one wavelength. (6) The design incidence angle of the dichroic mirror may be other than 0 deg. and (6) may be other optical elements with the same dichroic effect.
The normal incidence fundamental frequency laser is subjected to first-pass nonlinear conversion in the frequency multiplication generation module (7) to generate first-pass second harmonic. The frequency multiplication laser generated by the first-pass nonlinear conversion and the residual fundamental frequency laser are reflected back to the frequency multiplication generation module (7) along the original light path by the (8) double-wavelength 0-degree reflecting mirror, the residual fundamental frequency laser is converted into second harmonic wave in the nonlinear crystal through the second-pass nonlinear conversion, the second-pass frequency multiplication conversion is completed, and the second-pass nonlinear conversion efficiency and the first-pass nonlinear conversion efficiency are not greatly different. The (8) dual-wavelength reflecting mirror is arranged on the (9) PZT two-dimensional adjusting table, the adjusting frame is manually adjusted to achieve the purpose of adjusting the lens, and the (9) PZT two-dimensional adjusting table is used for receiving the instruction and correcting the return light path by the real-time micro-angle.
The frequency multiplication laser obtained by nonlinear conversion twice and the residual fundamental frequency laser return according to an incident light path, and the incident surface is arranged in front of the dichroic mirror (6): the frequency multiplication laser is reflected by 90 degrees, small power is reflected by the sampling mirror of the frequency multiplication laser (11) and enters the frequency multiplication power sensing detector (12), and the transmitted light of the frequency multiplication laser (11) is the final output laser.
The residual fundamental frequency laser after double-pass frequency multiplication is transmitted by a dichroic mirror (6) and returns according to an original light path, the polarization state of the fundamental frequency laser is rotated into vertical linear polarization through a first fundamental frequency half-wave plate (3) and an optical isolator (2), and the vertical linear polarization is reflected out of the original light path by 90 degrees; the first fundamental frequency half-wave plate and the optical isolator (2) rotate the polarization by 45 degrees in sequence, so that the horizontal-to-vertical conversion is completed.
The polarization state of the fundamental frequency laser converted by the second fundamental frequency half-wave plate (13) enters the 45-degree polaroid (14), and the effect of the second fundamental frequency half-wave plate (13) is to adjust the reflected power of the 45-degree polaroid (14), and the second fundamental frequency half-wave plate can also be other elements with the same functions. By rotating the wave plate to change the polarization direction of the fundamental frequency laser entering the polarizer to enable the fundamental frequency laser to approach to horizontal linear polarization, most of power can be transmitted through the polarizer, and a small part of power can be reflected into the position sensing detector, and the specific rotation angle of the polarization plate is that the power reflected into the position sensing detector is larger, and the power reflected into the position sensing detector is a range value instead of a fixed value according to the power threshold value of the position sensing detector.
(14) The low-power fundamental frequency laser reflected by the 45 DEG polaroid enters the (15) position sensing detector after power attenuation. The position sensor detector (15) is used for calibrating the position coordinates of the laser spots, feeding back the light transmitted by the 45 DEG polaroid (14) in real time, and enabling the light to enter the garbage light collector (16).
Preferably, the laser frequency doubling generating device further comprises: an electric translation lifting platform; the dichroic mirror, the frequency multiplication generation module, the dual-wavelength reflecting mirror and the PZT two-dimensional adjusting table are arranged on the electric translation lifting table; the electric translation lifting platform is used for providing linear motion with vertical dimensions (x and y) for the dichroic mirror, the frequency multiplication generation module, the dual-wavelength reflecting mirror and the PZT two-dimensional adjusting platform.
The laser frequency doubling generating device further comprises: (10) The electric translation lifting platform (6) - (9) is arranged on the electric translation lifting platform (10), and the electric translation lifting platform (10) can translate and lift, so that high-precision linear motion with two vertical dimensions is provided for the dichroic mirror (6), the frequency multiplication generating module (7), the dual-wavelength reflecting mirror (8) and the PZT two-dimensional adjusting platform (9).
The program can write the shift point code, the program controls the electric displacement lifting platform to translate or lift, the synchronous shift point function of the crystal and the fragile device ((6) dichroic mirror and (8) dual-wavelength 0-degree reflecting mirror) is realized, and the service life of the laser generating device can be greatly prolonged by matching with other devices.
The shift point code is described as follows:
The number of moving points and the coordinates of corresponding points are designed according to the size of the input light spot and the size of the crystal, and the points are represented by codes. Referring to fig. 2, the number and range of crystal shift points are schematically shown, and the number of the crystal shift points in fig. 2 is 3×3, and the codes are 1,2,3 … …,9 respectively. (6) The point positions of the dichroic mirror and the (8) dual-wavelength 0-degree reflecting mirror are consistent with the crystal, and the point positions of the crystal are taken as the reference when the point is replaced. When the point is needed to be replaced, point position coordinate codes are input in the program, the program controls the electric lifting translation stage to operate, and drives the (6) - (9) to move together, so that the synchronous point moving of the crystal and the fragile optical piece is realized.
Preferably, a temperature control furnace connecting mechanical assembly is further arranged in the frequency multiplication generating module; the temperature control furnace connecting mechanical component is connected with the frequency doubling temperature control furnace and the electric translation lifting platform through screws respectively; when the temperature control furnace connecting mechanical component is connected with the frequency doubling temperature control furnace and the electric translation lifting platform, preset debugging and locking requirements are required to be met; the debug locking requirements include a debug requirement and a locking requirement; the debugging requirements are as follows: after the temperature control furnace connecting mechanical component is connected with the frequency multiplication temperature control furnace, the frequency multiplication temperature control furnace does not generate offset in other directions when rotating clockwise and anticlockwise around the x-axis by a preset angle; the locking requirement is: when the temperature control furnace connecting mechanical assembly is connected with the frequency multiplication temperature control furnace, the temperature control furnace connecting mechanical assembly is locked with the frequency multiplication temperature control furnace in a fastening way through a screw until the locking distance between the temperature control furnace connecting mechanical assembly and the frequency multiplication temperature control furnace is smaller than a preset interval, and when the temperature control furnace connecting mechanical assembly is connected with the electric translation lifting platform, the temperature control furnace connecting mechanical assembly is locked with the electric translation lifting platform in a fastening way through the screw until the locking distance between the temperature control furnace connecting mechanical assembly and the electric translation lifting platform is smaller than the interval.
Referring to fig. 3, an internal structure diagram of a frequency multiplication generating module is shown, wherein the frequency multiplication generating module (7) mainly comprises a frequency multiplication temperature control furnace (7-1) and a temperature control furnace (7-2) connecting mechanical components. (7-1) the function of the frequency doubling temperature control furnace is to clamp and fix the nonlinear crystal and provide a constant temperature environment, and to realize high-precision temperature adjustment. (7-2) is a set of design mechanical components (comprising 1 or more mechanical parts), and the design function requirement of the components is that the mechanical components can be connected through screw connection (7-1) frequency doubling temperature control furnace and (7-2) temperature control furnace, and the electric displacement lifting platform is connected through screw connection (7-2) and (10), and the debugging and locking requirements are met.
The debugging and locking requirements comprise a debugging requirement and a locking requirement, wherein the debugging requirement is that the (7-1) frequency multiplication temperature control furnace can rotate clockwise and anticlockwise around an x-axis by a certain angle, and in the rotating process, the (7-1) frequency multiplication temperature control furnace is not offset in other directions, and the angle adjusting range is related to different crystal parameters; the locking requirement is that (7-1) after the frequency multiplication temperature control furnace is debugged, the locking precision is less than or equal to 0.01mm through screw fastening, and (7-2) the temperature control furnace connecting mechanical component and (10) the screw fastening locking precision of the electric displacement lifting table is less than or equal to 0.01mm.
Preferably, the nonlinear crystal is treated by: cutting wedge angles with the same angle at the input end and the output end of the nonlinear crystal along a preset cutting direction; the wedge angle is used for enabling return light to completely pass through the nonlinear crystal without striking the side face of the nonlinear crystal in each use point of the nonlinear crystal while just separating the return light from the light spot of the main light path.
Preferably, the nonlinear crystal is further treated by: adjusting the working temperature of the nonlinear crystal to have an offset from a preset theoretical phase matching temperature value within a preset non-critical phase matching allowable temperature range; the offset is calculated according to an angle required by the nonlinear crystal to exactly separate light with two wavelengths;
and adjusting the spatial attitude of the nonlinear crystal so that the spatial attitude compensates the angle.
Preferably, the nonlinear crystal includes: BBO crystals, LBO crystals, CLBO crystals or KBBF crystals.
The nonlinear crystal arranged in the frequency multiplication temperature control furnace (7-1) can be BBO crystal, LBO crystal, CLBO crystal, KBBF crystal or other nonlinear crystals which can be matched in phase, and the nonlinear crystal can be of any suitable size.
Aiming at the second problem, the invention can eliminate the interference of ghost light by carrying out corresponding treatment on the nonlinear crystal in the frequency multiplication generation module (7), wherein the treatment modes of the nonlinear crystal are two:
1. Fig. 4 is a schematic diagram of a first processing method of a nonlinear crystal. The crystal input/output end cuts a wedge angle with the same angle in the y-axis direction, the wedge angle of the crystal is a tiny angle, and when the return light is just separated from the light spot of the main light path, the return light can be ensured to completely pass through the crystal at each using point of the crystal without striking the side surface of the crystal.
2. Fig. 5 is a schematic diagram of a second processing mode of the nonlinear crystal. The nonlinear crystal has no wedge angle at both ends, the azimuth angle phi of the crystal (which is the included angle between the projection of the light propagation direction on the xoy plane and the x axis) is a theoretical value, the included angle between the light propagation direction and the z axis is a small angle, namely theta offset theoretical value, the theoretical phase matching temperature value of the type of non-critical phase matching in the position of 1064nm is 149 ℃, the walk-off angle is 0 DEG, the temperature change is 1 DEG, and the phi angle is changed by 0.4 DEG, so that the working temperature can be designed to offset by a certain value within the allowable temperature range of the type of non-critical phase matching, the corresponding required angle is compensated by adjusting the space posture of the crystal, and the offset of the designed temperature is obtained by just separating the light with two wavelengths by the required angle according to calculation, as shown in fig. 5.
The second processing mode is applicable to nonlinear crystals sensitive to temperature mismatch, and can eliminate walk-off and avoid ghost light in a moderately reciprocal mode through space attitude and temperature. The two crystal processing modes can ensure that returned ghost light is not overlapped with the original fundamental frequency laser light path in front of the frequency doubling generating module (7), and the effects of eliminating the influence of the ghost light and protecting the front light path are achieved.
Preferably, the frequency multiplication generating module is further configured to adjust a spatial posture of the frequency multiplication temperature control furnace when the nonlinear crystal is at a preset initial temperature, so that the fundamental frequency laser performs a first-pass nonlinear conversion in the nonlinear crystal to generate frequency multiplication laser, and phase matching is achieved; performing second-pass nonlinear conversion on the residual fundamental frequency laser reflected by the dual-wavelength reflecting mirror again to generate frequency doubling laser, and adjusting the pitching and horizontal deflection of the dual-wavelength reflecting mirror to enable the power of the generated frequency doubling laser to reach the maximum value; when the power of the generated frequency doubling laser reaches the maximum value, the power of the frequency doubling laser determined by the frequency doubling power sampling sensor is taken as the target power, and the current spot position coordinate of the residual fundamental frequency laser determined by the position sensing detector is taken as the target spot position coordinate.
The invention provides a self-adaptive adjusting function to solve the problem of easy mismatch of the angle of double-pass frequency multiplication, and the self-adaptive adjusting function of the frequency multiplication laser generator is described below.
1. Debugging and calibration stage
In the debugging stage of the frequency doubling laser generator, the working temperature of the nonlinear crystal is set as the initial temperature (the working temperature of the nonlinear crystal is a section, and the initial temperature is set in the section in relation to the cutting angle of the crystal along the crystal axis). Then, the pitching and horizontal deflection of the temperature control furnace (7-1) are regulated to realize the angle phase matching of the first-pass frequency multiplication, which is shown as the maximum frequency multiplication efficiency; the crystal is arranged in the temperature control furnace, so that the crystal and the temperature control furnace are regarded as a whole, and the posture (pitching and horizontal deflection) of the temperature control furnace is adjusted. After the first-pass frequency multiplication debugging is finished, the pitching and horizontal deflection of the (8) dual-wavelength 0-degree reflecting mirror are installed and adjusted, so that the frequency multiplication power reflected at the dichroic mirror (6) is maximum, and the second-pass frequency multiplication debugging is finished. The pitching and horizontal deflection of the first-pass frequency doubling temperature control furnace realize phase matching, namely the highest power; the second-pass frequency multiplication realizes the maximum power output only by adjusting the pitching and the deflection of the dual-wavelength reflecting mirror.
After the laser is debugged, the temperature of the frequency multiplication temperature control furnace (7-1) is calibrated to be the initial temperature; calibrating the power value obtained by the frequency multiplication power sensing detector (12) as an initial power value; and (5) calibrating the frequency multiplication light spot coordinate obtained by the position sensor (15) as an initial coordinate.
2. Stage of use
For nonlinear crystals which can be matched with critical phase and non-critical phase in harmonic generation, the matching of the PZT micro-angle automatic calibration and the nonlinear crystal temperature automatic tuning can be realized through a feedback mechanism, and the constant output power in the life cycle is ensured.
(1) The position sensor may record initial coordinates that calibrate the reflected fundamental laser in the second passband. And then in the operation process of the frequency doubling laser generator, if the position sensing detector (15) detects that the spot coordinate deviation exceeds the allowable range, the angle adjustment compensation is carried out on the dual-wavelength 0-degree reflecting mirror (8) through the two-dimensional micropositioner (10) driven by the piezoelectric ceramic driver (PZT). The device has the advantages that the aim of submicron or nanoscale high-precision displacement can be achieved through a simple control mode, fine adjustment is monitored in real time, the conversion efficiency of second pass frequency multiplication of the laser is guaranteed, and the power stability is improved.
(2) The nonlinear crystal is arranged in a (7-1) frequency multiplication temperature control furnace, and the function of the (7-1) frequency multiplication temperature control furnace is to precisely regulate and control the temperature of the nonlinear crystal so as to realize non-critical phase matching. (12) The frequency doubling power sampling sensor determines the current power of the generated double-pass frequency doubling laser, the current laser is monitored through the PD, if the PD detects that the current power of the frequency doubling laser is reduced in the operation process of the frequency doubling laser generator, the frequency doubling temperature control furnace (7-1) is interfered through ATC (Automat ic Temperature Contro l) functions, and the power correction is achieved through the temperature of the nonlinear crystal of the frequency doubling temperature control furnace (7-1), so that the double-pass frequency doubling conversion efficiency of the laser is ensured, and the power stability is improved.
The foregoing embodiments have been provided for the purpose of illustrating the general principles of the present invention, and are not to be construed as limiting the scope of the invention. It should be noted that any modifications, equivalent substitutions, improvements, etc. made by those skilled in the art without departing from the spirit and principles of the present invention are intended to be included in the scope of the present invention.
Claims (9)
1. A laser frequency multiplication generating device, characterized by comprising, in order along a propagation direction of laser light: the device comprises a fundamental frequency module, a frequency multiplication generating module, a dual-wavelength reflecting mirror, a frequency multiplication laser sampling mirror and a frequency multiplication power sampling sensor;
a frequency multiplication temperature control furnace is arranged in the frequency multiplication generation module; the frequency multiplication temperature control furnace clamps nonlinear crystals;
The fundamental frequency module is used for providing fundamental frequency laser;
The frequency multiplication generating module is used for carrying out first-pass nonlinear conversion and second-pass nonlinear conversion on the fundamental frequency laser to generate frequency multiplication laser;
The dual-wavelength reflecting mirror is used for reflecting the frequency multiplication laser generated by the first-pass nonlinear conversion and the residual fundamental frequency laser back to the frequency multiplication generating module so that the frequency multiplication generating module carries out the second-pass nonlinear conversion on the residual fundamental frequency laser again to generate frequency multiplication laser;
The frequency multiplication laser sampling mirror is used for transmitting the frequency multiplication laser as double-pass frequency multiplication laser and reflecting low-power frequency multiplication laser to enter the frequency multiplication power sampling sensor;
the frequency multiplication power sampling sensor is used for determining the current power of the entered frequency multiplication laser;
The frequency multiplication temperature control furnace is used for providing a constant temperature environment for the nonlinear crystal, and adjusting the temperature of the nonlinear crystal when the current power is smaller than a preset target power so as to enable the current power to reach the target power.
2. The laser frequency doubling generating device according to claim 1, further comprising: a PZT two-dimensional adjustment table, a polaroid and a position sensing detector;
the dual-wavelength reflecting mirror is arranged on the PZT two-dimensional adjusting table; the polaroid and the position sensing detector are sequentially arranged behind the frequency multiplication generating module along the propagation direction of laser;
the polaroid is used for reflecting residual fundamental frequency laser after the second-pass nonlinear conversion of the low power to enter the position sensing detector;
the position sensing detector is used for determining the current spot position coordinates of the entered residual fundamental frequency laser;
And the PZT two-dimensional adjusting table is used for adjusting a two-dimensional angle to maximize the efficiency of the second-pass nonlinear conversion, and in the operation process of the laser frequency doubling generating device, when the current light spot position coordinate is inconsistent with the preset target light spot position coordinate, the angle of the dual-wavelength reflecting mirror is adjusted so that the current light spot position coordinate is consistent with the target light spot position coordinate.
3. The laser frequency doubling generating device according to claim 2, wherein the frequency doubling generating module is further configured to adjust a spatial posture of the frequency doubling temperature control furnace when the nonlinear crystal is at a preset initial temperature, so that the fundamental frequency laser performs a first-pass nonlinear conversion in the nonlinear crystal to generate frequency doubling laser, and phase matching is achieved;
Performing second-pass nonlinear conversion on the residual fundamental frequency laser reflected by the dual-wavelength reflecting mirror again to generate frequency doubling laser, and adjusting the pitching and horizontal deflection of the dual-wavelength reflecting mirror to enable the power of the generated frequency doubling laser to reach the maximum value;
when the power of the generated frequency doubling laser reaches the maximum value, the power of the frequency doubling laser determined by the frequency doubling power sampling sensor is taken as the target power, and the current spot position coordinate of the residual fundamental frequency laser determined by the position sensing detector is taken as the target spot position coordinate.
4. The laser frequency doubling generating device according to claim 3, further comprising: the system comprises an optical isolator, a first fundamental frequency half-wave plate, a fundamental frequency sampling mirror, a fundamental frequency power sampling sensor, a dichroic mirror, an electric translation lifting platform, a second fundamental frequency half-wave plate and a garbage light collector;
The optical isolator, the first fundamental frequency half-wave plate, the fundamental frequency sampling mirror, the fundamental frequency power sampling sensor and the dichroic mirror are sequentially arranged between the fundamental frequency module and the frequency multiplication generation module along the propagation direction of laser; the second fundamental frequency half-wave plate is arranged in front of the polaroid; the garbage light collector is arranged behind the polaroid;
The incident surface of the dichroic mirror is plated with an antireflection film of fundamental frequency laser, and the emergent surface is plated with a high reflection film of frequency doubling laser;
The optical isolator is used for isolating fundamental frequency laser generated by the fundamental frequency module, isolating fundamental frequency laser transmitted reversely, and transmitting fundamental frequency laser transmitted positively into the first fundamental frequency half-wave plate;
The first fundamental frequency half-wave plate is used for changing the polarization of the fundamental frequency laser into horizontal linear polarization and then entering the fundamental frequency sampling mirror;
the fundamental frequency sampling mirror is used for transmitting fundamental frequency laser into the dichroic mirror and reflecting low-power fundamental frequency laser into the fundamental frequency power sampling sensor;
The fundamental frequency power sampling sensor is used for monitoring whether the entered fundamental frequency laser is normal or not;
The dichroic mirror is used for transmitting fundamental frequency laser to enter the frequency multiplication generating module, reflecting all frequency multiplication laser generated by first-path nonlinear conversion and second-path nonlinear conversion in the frequency multiplication generating module to enter the frequency multiplication laser sampling mirror, sequentially transmitting residual fundamental frequency laser in the frequency multiplication generating module to the first fundamental frequency half-wave plate and the optical isolator, so that the first fundamental frequency half-wave plate and the optical isolator change the polarization of the residual fundamental frequency laser into vertical linear polarization, and then reflecting the residual fundamental frequency laser to enter the second fundamental frequency half-wave plate;
the second fundamental frequency half-wave plate is used for carrying out polarization selection on the rest fundamental frequency laser and then entering the polaroid;
the garbage light collector is used for collecting residual fundamental frequency laser transmitted by the polaroid.
5. The laser frequency doubling generating apparatus according to claim 4, further comprising: an electric translation lifting platform;
The dichroic mirror, the frequency multiplication generation module, the dual-wavelength reflecting mirror and the PZT two-dimensional adjusting table are arranged on the electric translation lifting table;
The electric translation lifting platform is used for providing linear motion with vertical dimension for the dichroic mirror, the frequency multiplication generation module, the dual-wavelength reflecting mirror and the PZT two-dimensional adjusting platform.
6. The laser frequency doubling generating device according to claim 5, wherein a temperature control furnace connecting mechanical component is further arranged in the frequency doubling generating module;
the temperature control furnace connecting mechanical component is connected with the frequency doubling temperature control furnace and the electric translation lifting platform through screws respectively;
when the temperature control furnace connecting mechanical component is connected with the frequency doubling temperature control furnace and the electric translation lifting platform, preset debugging and locking requirements are required to be met;
The debug locking requirements include a debug requirement and a locking requirement; the debugging requirements are as follows: after the temperature control furnace connecting mechanical component is connected with the frequency multiplication temperature control furnace, the frequency multiplication temperature control furnace does not generate offset in other directions when rotating clockwise and anticlockwise around the x-axis by a preset angle;
The locking requirement is: when the temperature control furnace connecting mechanical assembly is connected with the frequency multiplication temperature control furnace, the temperature control furnace connecting mechanical assembly is locked with the frequency multiplication temperature control furnace in a fastening way through a screw until the locking distance between the temperature control furnace connecting mechanical assembly and the frequency multiplication temperature control furnace is smaller than a preset interval, and when the temperature control furnace connecting mechanical assembly is connected with the electric translation lifting platform, the temperature control furnace connecting mechanical assembly is locked with the electric translation lifting platform in a fastening way through the screw until the locking distance between the temperature control furnace connecting mechanical assembly and the electric translation lifting platform is smaller than the interval.
7. The laser frequency doubling generating apparatus according to claim 1, wherein the nonlinear crystal is processed by:
Cutting wedge angles with the same angle at the input end and the output end of the nonlinear crystal along a preset cutting direction; the wedge angle is used for enabling return light to completely pass through the nonlinear crystal without striking the side face of the nonlinear crystal in each use point of the nonlinear crystal while just separating the return light from the light spot of the main light path.
8. The laser frequency doubling generating device according to claim 7, wherein the nonlinear crystal is further processed by:
Adjusting the working temperature of the nonlinear crystal to have an offset from a preset theoretical phase matching temperature value within a preset non-critical phase matching allowable temperature range; the offset is calculated according to an angle required by the nonlinear crystal to exactly separate light with two wavelengths;
and adjusting the spatial attitude of the nonlinear crystal so that the spatial attitude compensates the angle.
9. The laser frequency doubling generating device according to claim 8, wherein the nonlinear crystal comprises: BBO crystals, LBO crystals, CLBO crystals or KBBF crystals.
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| CN118472752A (en) * | 2024-07-10 | 2024-08-09 | 北京卓镭激光技术有限公司 | A multi-wavelength laser switching and monitoring device |
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| CN118472752A (en) * | 2024-07-10 | 2024-08-09 | 北京卓镭激光技术有限公司 | A multi-wavelength laser switching and monitoring device |
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