CN117715468B - Display panel and preparation method thereof - Google Patents
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
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- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/805—Electrodes
- H10K59/8052—Cathodes
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Abstract
Description
技术领域Technical Field
本申请涉及显示技术领域,尤其涉及一种显示面板及其制作方法。The present application relates to the field of display technology, and in particular to a display panel and a manufacturing method thereof.
背景技术Background Art
目前,显示面板中的电子传输层一般通过将其材料蒸镀在整个面板制备形成,因此显示面板中的阴极层与走线层一般会被电子传输层间隔。电子传输层一般为有机物,电阻较大,会造成阴极层与走线层搭接不良,或者造成阴极层与走线层之间的电阻较大导致显示面板的功耗变高,最终导致显示面板无法稳定的工作。At present, the electron transport layer in the display panel is generally formed by evaporating its material on the entire panel, so the cathode layer and the wiring layer in the display panel are generally separated by the electron transport layer. The electron transport layer is generally organic and has a large resistance, which will cause poor overlap between the cathode layer and the wiring layer, or cause a large resistance between the cathode layer and the wiring layer, resulting in higher power consumption of the display panel, and ultimately causing the display panel to be unable to work stably.
发明内容Summary of the invention
本申请的实施例提供一种显示面板及其制备方法,能够使阴极层可以与走线层直接接触,提高阴极层与走线层的电连接稳定性,从而使显示面板的工作更加稳定。The embodiments of the present application provide a display panel and a method for manufacturing the same, which can enable the cathode layer to be in direct contact with the wiring layer, thereby improving the electrical connection stability between the cathode layer and the wiring layer, thereby making the operation of the display panel more stable.
第一方面,本申请提供一种显示面板,所述显示面板包括:In a first aspect, the present application provides a display panel, the display panel comprising:
基板;Substrate;
平坦层,包括第一连接面、第一斜面和第二斜面,所述第一连接面与所述基板连接,所述第一斜面和所述第二斜面连接于所述第一连接面的相对两侧,所述第一斜面的延伸方向和所述第二斜面的延伸方向相交;a flat layer, comprising a first connecting surface, a first inclined surface and a second inclined surface, wherein the first connecting surface is connected to the substrate, the first inclined surface and the second inclined surface are connected to opposite sides of the first connecting surface, and an extending direction of the first inclined surface intersects an extending direction of the second inclined surface;
走线层,连接于所述平坦层背离所述基板的表面,所述走线层覆盖所述第一斜面和所述第二斜面;A routing layer connected to a surface of the flat layer facing away from the substrate, the routing layer covering the first inclined surface and the second inclined surface;
电子传输层,连接于所述走线层背离所述平坦层的一侧,所述电子传输层向所述基板的正投影与所述第一斜面错位设置;及an electron transport layer, connected to a side of the routing layer away from the planar layer, wherein an orthographic projection of the electron transport layer onto the substrate is offset from the first inclined surface; and
阴极层,连接于所述走线层背离所述平坦层的一侧,所述阴极层向所述基板的正投影覆盖所述第一斜面。A cathode layer is connected to a side of the wiring layer away from the flat layer, and an orthographic projection of the cathode layer onto the substrate covers the first inclined surface.
在本实施例中,平坦层具有第一斜面和第二斜面。第一斜面和第二斜面相背设置。第一斜面可供电子传输层沉积。第一斜面可供阴极层沉积,第二斜面可供电子传输层沉积,从而使位于第一斜面的阴极层可以直接与走线层接触,避免阴极层与走线层被电子传输层间隔,从而保证阴极层与走线层之间的电连接更加稳定,保证显示面板的工作稳定性。In this embodiment, the flat layer has a first inclined surface and a second inclined surface. The first inclined surface and the second inclined surface are arranged opposite to each other. The first inclined surface can be used for the deposition of the electron transport layer. The first inclined surface can be used for the deposition of the cathode layer, and the second inclined surface can be used for the deposition of the electron transport layer, so that the cathode layer located on the first inclined surface can directly contact the wiring layer, avoiding the cathode layer and the wiring layer being separated by the electron transport layer, thereby ensuring that the electrical connection between the cathode layer and the wiring layer is more stable, and ensuring the working stability of the display panel.
一种可能的实施方式中,所述第一斜面与所述第一连接面的夹角为锐角,所述第二斜面与所述第一连接面的夹角为锐角。In a possible implementation manner, an included angle between the first inclined surface and the first connecting surface is an acute angle, and an included angle between the second inclined surface and the first connecting surface is an acute angle.
一种可能的实施方式中,所述电子传输层向所述基板的正投影覆盖所述第二斜面。In a possible implementation manner, an orthographic projection of the electron transport layer onto the substrate covers the second inclined surface.
一种可能的实施方式中,所述平坦层还包括第二连接面,所述第二连接面连接于所述第一斜面与所述第二斜面之间,所述第二连接面与所述第一连接面相背设置,所述走线层覆盖所述第一连接面。In a possible implementation manner, the planar layer further includes a second connecting surface, the second connecting surface is connected between the first inclined surface and the second inclined surface, the second connecting surface is arranged opposite to the first connecting surface, and the routing layer covers the first connecting surface.
一种可能的实施方式中,所述电子传输层覆盖所述第二连接面。In a possible implementation manner, the electron transport layer covers the second connection surface.
一种可能的实施方式中,部分所述阴极层位于所述电子传输层背离所述第一连接面的一侧,所述阴极层向所述基板的正投影覆盖所述第二连接面。In a possible implementation manner, part of the cathode layer is located on a side of the electron transport layer away from the first connection surface, and an orthographic projection of the cathode layer onto the substrate covers the second connection surface.
一种可能的实施方式中,所述平坦层还包括凸起,所述凸起连接于所述第二连接面,所述凸起由所述第二连接面向远离所述基板的方向延伸,所述走线层覆盖所述凸起。In a possible implementation manner, the planar layer further includes a protrusion, the protrusion is connected to the second connection surface, the protrusion extends from the second connection surface in a direction away from the substrate, and the routing layer covers the protrusion.
第二方面,本申请提供一种显示面板的制备方法,包括:In a second aspect, the present application provides a method for preparing a display panel, comprising:
提供基板;providing a substrate;
在所述基板上形成平坦层,所述平坦层包括第一连接面、第一斜面和第二斜面,所述第一连接面与所述基板接触,所述第一斜面和所述第二斜面连接于所述第一连接面的相对两侧,所述第一斜面的延伸方向和所述第二斜面的延伸方向相交;forming a flat layer on the substrate, the flat layer comprising a first connecting surface, a first inclined surface and a second inclined surface, the first connecting surface contacts the substrate, the first inclined surface and the second inclined surface are connected to opposite sides of the first connecting surface, and an extension direction of the first inclined surface intersects an extension direction of the second inclined surface;
在所述平坦层背离所述基板的一侧形成走线层,所述走线层连接于所述平坦层背离所述基板的表面,所述走线层覆盖所述第一斜面和所述第二斜面;forming a wiring layer on a side of the flat layer away from the substrate, the wiring layer being connected to a surface of the flat layer away from the substrate, and the wiring layer covering the first inclined surface and the second inclined surface;
在所述走线层背离所述平坦层的一侧形成电子传输层,所述电子传输层向所述基板的正投影与所述第一斜面错位设置;及An electron transport layer is formed on a side of the wiring layer away from the flat layer, wherein an orthographic projection of the electron transport layer onto the substrate is staggered with the first inclined surface; and
在所述走线层背离所述平坦层的一侧形成第一阴极子层,所述第一阴极子层向所述基板的正投影覆盖所述第一斜面;forming a first cathode sublayer on a side of the wiring layer away from the flat layer, wherein an orthographic projection of the first cathode sublayer onto the substrate covers the first inclined surface;
在所述电子传输层背离所述走线层的一侧形成第二阴极子层,所述第二阴极子层与所述第一阴极子层连接形成阴极层。A second cathode sublayer is formed on a side of the electron transport layer away from the wiring layer, and the second cathode sublayer is connected to the first cathode sublayer to form a cathode layer.
一种可能的实施方式中,所述电子传输层通过蒸镀工艺形成,所述电子传输层的材料朝向所述第二斜面蒸镀,蒸镀的方向与所述基板的夹角为第一夹角,所述第一斜面与所述基板的夹角为第二夹角,所述第一夹角小于或者等于第二夹角。In one possible embodiment, the electron transport layer is formed by an evaporation process, and the material of the electron transport layer is evaporated toward the second inclined surface. The angle between the evaporation direction and the substrate is a first angle, and the angle between the first inclined surface and the substrate is a second angle, and the first angle is less than or equal to the second angle.
一种可能的实施方式中,所述阴极层通过蒸镀工艺形成,所述阴极层的材料朝向所述第一斜面蒸镀,蒸镀的方向与所述基板的夹角为第三夹角,所述第二斜面与所述基板的夹角为第四夹角,所述第二夹角小于或者等于所述第四夹角。In one possible embodiment, the cathode layer is formed by an evaporation process, and the material of the cathode layer is evaporated toward the first inclined surface. The angle between the evaporation direction and the substrate is a third angle, and the angle between the second inclined surface and the substrate is a fourth angle, and the second angle is less than or equal to the fourth angle.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
为了更清楚地说明本申请的技术方案,下面将对实施方式中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施方式,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以如这些附图获得其他的附图。In order to more clearly illustrate the technical solution of the present application, the drawings required for use in the implementation manner will be briefly introduced below. Obviously, the drawings described below are only some implementation manners of the present application. For ordinary technicians in this field, other drawings can be obtained like these drawings without paying any creative work.
图1是本申请实施例提供的显示面板的结构示意图;FIG1 is a schematic diagram of the structure of a display panel provided in an embodiment of the present application;
图2是图1所示的显示面板的一种剖面示意图;FIG2 is a schematic cross-sectional view of the display panel shown in FIG1 ;
图3是图2所示的显示结构的剖面示意图;FIG3 is a cross-sectional schematic diagram of the display structure shown in FIG2 ;
图4是图1所示的显示面板的另一种截面示意图;FIG4 is another schematic cross-sectional view of the display panel shown in FIG1 ;
图5是本申请实施例提供的一种显示面板的制备方法的流程示意图;FIG5 is a schematic flow chart of a method for manufacturing a display panel provided in an embodiment of the present application;
图6是显示面板的制备方法中完成S300后形成的显示面板的剖面示意图;FIG6 is a schematic cross-sectional view of a display panel formed after S300 is completed in the method for manufacturing a display panel;
图7是显示面板的制备方法中完成S400后形成的显示面板的剖面示意图;7 is a schematic cross-sectional view of a display panel formed after S400 is completed in the method for manufacturing a display panel;
图8是显示面板的制备方法中完成S500后形成的显示面板的剖面示意图;FIG8 is a schematic cross-sectional view of a display panel formed after S500 is completed in the method for manufacturing a display panel;
图9是显示面板的制备方法中完成S600后形成的显示面板的剖面示意图。FIG. 9 is a schematic cross-sectional view of a display panel formed after S600 in the method for manufacturing a display panel.
附图标记:显示装置100、壳体10、显示面板20、基板21、显示结构22、平坦层23、走线层24、电子传输层25、阴极层26、显示区27、非显示区28、阳极层221、空穴传输层222、发光层223、第一连接面231、第二连接面232、第一斜面233、第二斜面234、凸起29、第一侧面291、第二侧面292、第三连接面293、第二夹角α2、第四夹角α4、第一夹角α1、第一阴极子层251、第三夹角α3、第二阴极子层252。Figure numerals: display device 100, shell 10, display panel 20, substrate 21, display structure 22, flat layer 23, wiring layer 24, electron transport layer 25, cathode layer 26, display area 27, non-display area 28, anode layer 221, hole transport layer 222, light-emitting layer 223, first connecting surface 231, second connecting surface 232, first inclined surface 233, second inclined surface 234, protrusion 29, first side surface 291, second side surface 292, third connecting surface 293, second angle α2, fourth angle α4, first angle α1, first cathode sublayer 251, third angle α3, second cathode sublayer 252.
具体实施方式DETAILED DESCRIPTION
为了方便理解,首先对本申请的实施例所涉及的术语进行解释。For ease of understanding, the terms involved in the embodiments of the present application are first explained.
和/或:仅仅是一种描述关联对象的关联关系,表示可以存在三种关系,例如,A和/或B,可以表示:单独存在A,同时存在A和B,单独存在B这三种情况。And/or: It is just a way to describe the association relationship of associated objects, indicating that there can be three relationships. For example, A and/or B can mean: A exists alone, A and B exist at the same time, and B exists alone.
多个:是指两个或多于两个。Multiple: refers to two or more than two.
连接:应做广义理解,例如,A与B连接,可以是A与B直接相连,也可以是A与B通过中间媒介间接相连。Connection: should be understood in a broad sense. For example, A and B are connected, which can be either direct or indirect through an intermediary.
下面将结合附图,对本申请的具体实施方式进行清楚地描述。The specific implementation of the present application will be clearly described below in conjunction with the accompanying drawings.
请结合参阅图1和图2,图1是本申请实施例提供的显示装置100的结构示意图,显示装置100可以包括壳体10和显示面板20。显示面板20固定安装于壳体10。Please refer to FIG. 1 and FIG. 2 . FIG. 1 is a schematic diagram of the structure of a display device 100 provided in an embodiment of the present application. The display device 100 may include a housing 10 and a display panel 20 . The display panel 20 is fixedly mounted on the housing 10 .
图2是图1所示的显示面板20的一种剖面示意图。显示面板20包括基板21、显示结构22、平坦层23、走线层24、电子传输层25和阴极层26。显示结构22、平坦层23、走线层24、电子传输层25、阴极层26设置于基板21上。Fig. 2 is a schematic cross-sectional view of the display panel 20 shown in Fig. 1. The display panel 20 includes a substrate 21, a display structure 22, a planar layer 23, a wiring layer 24, an electron transport layer 25, and a cathode layer 26. The display structure 22, the planar layer 23, the wiring layer 24, the electron transport layer 25, and the cathode layer 26 are disposed on the substrate 21.
显示面板20包括显示区27和非显示区28。显示区27和非显示区28。显示结构22位于显示面板20的显示区27内。平坦层23和走线层24可以位于显示面板20的非显示区28内。电子传输层25和阴极层26位于显示面板20的显示区27和非显示区28内。The display panel 20 includes a display area 27 and a non-display area 28. The display area 27 and the non-display area 28. The display structure 22 is located in the display area 27 of the display panel 20. The planar layer 23 and the wiring layer 24 may be located in the non-display area 28 of the display panel 20. The electron transport layer 25 and the cathode layer 26 are located in the display area 27 and the non-display area 28 of the display panel 20.
其中,显示面板20可以为但不限于手机(cellphone)、笔记本电脑(notebookcomputer)、平板电脑(tablet personal computer)、膝上型电脑(laptop computer)、个人数字助理(personal digital assistant)、可穿戴式设备(wearabledevice)或车载设备(mobiledevice)等电子设备。The display panel 20 may be, but is not limited to, an electronic device such as a cell phone, a notebook computer, a tablet personal computer, a laptop computer, a personal digital assistant, a wearable device, or a mobile device.
示例性的,基板21可以为玻璃基板、蓝宝石基板或者硅晶片基板。或者基板可以为柔性基板,柔性基板可以采用下述材料中的任意一种或多种制成:聚酰亚胺、聚对苯二甲酸乙二醇酯(Polyethylene terephthalate,PET)、聚萘二甲酸乙二醇酯(Polyethylenenaphthalate two formic acid glycol estr,PEN)、环烯烃聚合物(Cyclo-olefinpolymer,COP)、聚碳酸酯(Polycarbonate,PC)、聚苯乙烯(Polystyrene,PS)、聚丙烯(Polypropylene,PP)、聚四氟乙烯(Polytetrafluoroethylene,PTFE)。在其他实现方式中,基板21也可以选用陶瓷基板等,本申请对此不做限制。Exemplarily, the substrate 21 may be a glass substrate, a sapphire substrate or a silicon wafer substrate. Alternatively, the substrate may be a flexible substrate, which may be made of any one or more of the following materials: polyimide, polyethylene terephthalate (PET), polyethylene naphthalate diformic acid glycol ester (PEN), cycloolefin polymer (COP), polycarbonate (PC), polystyrene (PS), polypropylene (PP), polytetrafluoroethylene (PTFE). In other implementations, the substrate 21 may also be a ceramic substrate, etc., which is not limited in the present application.
需说明的是,图2的目的仅在于示意性的描述基板21、显示结构22、平坦层23、走线层24、电子传输层25和阴极层26的连接关系,并非是对各个设备的连接位置、具体构造及数量做具体限定。而本申请实施例示意的结构并不构成对显示面板20的具体限定。在本申请另一些实施例中,显示面板20可以包括比图示更多或更少的部件,或者组合某些部件,或者拆分某些部件,或者不同的部件布置。图示的部件可以以硬件,软件或软件和硬件的组合实现。It should be noted that the purpose of Figure 2 is only to schematically describe the connection relationship between the substrate 21, the display structure 22, the flat layer 23, the wiring layer 24, the electron transport layer 25 and the cathode layer 26, and it does not specifically limit the connection position, specific structure and quantity of each device. The structure illustrated in the embodiment of the present application does not constitute a specific limitation on the display panel 20. In other embodiments of the present application, the display panel 20 may include more or fewer components than shown in the figure, or combine certain components, or split certain components, or arrange the components differently. The illustrated components can be implemented in hardware, software, or a combination of software and hardware.
请参阅图3,图3是图2所示的显示结构22的剖面示意图。显示结构22可以包括阳极层221、空穴传输层222和发光层223。向远离基板21的方向,阳极层221、空穴传输层222和发光层223依次设置。阳极层221背离空穴传输层222的一侧与基板21连接。发光层223背离空穴传输层222的一侧与电子传输层25连接。Please refer to FIG3, which is a cross-sectional schematic diagram of the display structure 22 shown in FIG2. The display structure 22 may include an anode layer 221, a hole transport layer 222, and a light-emitting layer 223. In the direction away from the substrate 21, the anode layer 221, the hole transport layer 222, and the light-emitting layer 223 are arranged in sequence. The side of the anode layer 221 facing away from the hole transport layer 222 is connected to the substrate 21. The side of the light-emitting layer 223 facing away from the hole transport layer 222 is connected to the electron transport layer 25.
在本实施例中,显示结构22和电子传输层25及阴极层26可以形成机发光二极管显示器(Organic Light Emitting Diode,OLED)发光结构。OLED发光的原理是基于有机半导体材料和发光材料在电场驱动下,通过载流子注入和复合导致发光的现象。具体来说,在一定电压驱动下,电子和空穴分别从阴极和阳极注入到电子传输层25和空穴传输层222,电子和空穴分别经过电子传输层25和空穴传输层222迁移到发光层223,并在发光层223中相遇,形成激子并使发光分子激发,后者经过辐射弛豫而发出可见光。由于OLED有机半导体是可调节的,因此可以通过更改阴极层26和阳极层221之间的电压大小来控制光的强度。In this embodiment, the display structure 22, the electron transport layer 25 and the cathode layer 26 can form an organic light emitting diode display (Organic Light Emitting Diode, OLED) light emitting structure. The principle of OLED light emission is based on the phenomenon that organic semiconductor materials and light emitting materials cause light emission through carrier injection and recombination under electric field drive. Specifically, under a certain voltage drive, electrons and holes are injected from the cathode and anode into the electron transport layer 25 and the hole transport layer 222, respectively, and the electrons and holes migrate to the light emitting layer 223 through the electron transport layer 25 and the hole transport layer 222, respectively, and meet in the light emitting layer 223 to form excitons and excite the light emitting molecules, which emit visible light after radiation relaxation. Since OLED organic semiconductors are adjustable, the intensity of light can be controlled by changing the voltage between the cathode layer 26 and the anode layer 221.
第一种可能的实施例中,请再参阅图2,平坦层23包括第一连接面231、第二连接面232、第一斜面233和第二斜面234。示例性的,平坦层23的截面可以为梯形。第一连接面231和第二连接面232相背设置。其中,第二连接面232可以为平面或者弧面。第一斜面233和第二斜面234相背设置。第一斜面233和第二斜面234连接于第一连接面231的相对两侧,第一斜面233的延伸方向和第二斜面234的延伸方向相交。第一斜面233与第一连接面231的夹角可以为锐角,第二斜面234与第一连接面231的夹角可以为锐角。第一连接面231与基板21连接。平坦层23位于显示面板20的非显示区28内。平坦层23与显示结构22间隔设置。第一斜面233和第二斜面234均相对基板21倾斜设置。示例性的,平坦层23可以的截面还可以为多个梯形。In the first possible embodiment, please refer to FIG. 2 again, the flat layer 23 includes a first connecting surface 231, a second connecting surface 232, a first inclined surface 233 and a second inclined surface 234. Exemplarily, the cross section of the flat layer 23 may be a trapezoid. The first connecting surface 231 and the second connecting surface 232 are arranged opposite to each other. Among them, the second connecting surface 232 may be a plane or an arc surface. The first inclined surface 233 and the second inclined surface 234 are arranged opposite to each other. The first inclined surface 233 and the second inclined surface 234 are connected to opposite sides of the first connecting surface 231, and the extension direction of the first inclined surface 233 and the extension direction of the second inclined surface 234 intersect. The angle between the first inclined surface 233 and the first connecting surface 231 may be an acute angle, and the angle between the second inclined surface 234 and the first connecting surface 231 may be an acute angle. The first connecting surface 231 is connected to the substrate 21. The flat layer 23 is located in the non-display area 28 of the display panel 20. The flat layer 23 is spaced apart from the display structure 22. The first inclined surface 233 and the second inclined surface 234 are both arranged to be inclined relative to the substrate 21. For example, the cross section of the planar layer 23 may also be a plurality of trapezoids.
在本实施例中,平坦层23的材料可以为不导电材料。平坦层23表面可以供走线层24连接。In this embodiment, the material of the planar layer 23 may be a non-conductive material. The surface of the planar layer 23 may be connected to the wiring layer 24 .
走线层24连接于平坦层23背离基板21的表面,走线层24覆盖平坦层23。走线与显示结构22间隔设置。走线层24位于显示面板20的非显示区28内。具体而言,走线层24可以覆盖、第二连接面232、第一斜面233和第二斜面234。示例性的,走线层24可以与显示结构22的阳极层221在同一制备步骤中形成,也即为,可以在基板21表面沉积导电层材料,并对该导电层材料进行图案化,从而形成阳极层221和走线层24。The routing layer 24 is connected to the surface of the flat layer 23 facing away from the substrate 21, and the routing layer 24 covers the flat layer 23. The routing is spaced apart from the display structure 22. The routing layer 24 is located in the non-display area 28 of the display panel 20. Specifically, the routing layer 24 can cover the second connecting surface 232, the first inclined surface 233 and the second inclined surface 234. Exemplarily, the routing layer 24 can be formed in the same preparation step as the anode layer 221 of the display structure 22, that is, a conductive layer material can be deposited on the surface of the substrate 21, and the conductive layer material can be patterned to form the anode layer 221 and the routing layer 24.
电子传输层25连接于走线层24背离平坦层23的一侧。电子传输层25位于显示面板20的显示区27和非显示区28。电子传输层25覆盖显示结构22、显示结构22与走线层24之间的基板21和部分走线层24。且电子传输层25向基板21的正投影覆盖第一斜面233和第二连接面232。电子传输层25向基板21的正投影还与第一斜面233错位设置。需要解释的是,错位设置表示二者位置完全错位不重叠。The electron transport layer 25 is connected to the side of the wiring layer 24 away from the flat layer 23. The electron transport layer 25 is located in the display area 27 and the non-display area 28 of the display panel 20. The electron transport layer 25 covers the display structure 22, the substrate 21 between the display structure 22 and the wiring layer 24, and part of the wiring layer 24. And the orthographic projection of the electron transport layer 25 to the substrate 21 covers the first inclined surface 233 and the second connecting surface 232. The orthographic projection of the electron transport layer 25 to the substrate 21 is also staggered with the first inclined surface 233. It should be explained that the staggered setting means that the positions of the two are completely staggered and do not overlap.
阴极层26连接于走线层24背离平坦层23的一侧,部分阴极层26位于电子传输层25背离第一连接面231的一侧,部分阴极层26位于未被电子传输层25覆盖的走线层24背离平坦层23的一侧。阴极层26位于显示面板20的显示区27和非显示区28。阴极层26向基板21的正投影覆盖显示结构22、平坦层23及电子传输层25。其中,阴极层26向基板21的正投影覆盖第一斜面233、第二连接面232和第二斜面234。The cathode layer 26 is connected to the side of the wiring layer 24 away from the flat layer 23, part of the cathode layer 26 is located on the side of the electron transport layer 25 away from the first connection surface 231, and part of the cathode layer 26 is located on the side of the wiring layer 24 not covered by the electron transport layer 25 away from the flat layer 23. The cathode layer 26 is located in the display area 27 and the non-display area 28 of the display panel 20. The orthographic projection of the cathode layer 26 to the substrate 21 covers the display structure 22, the flat layer 23 and the electron transport layer 25. Among them, the orthographic projection of the cathode layer 26 to the substrate 21 covers the first inclined surface 233, the second connection surface 232 and the second inclined surface 234.
随着光电显示技术和半导体制造技术的发展,有机发光二极管显示器(OrganicLight Emitting Diode,OLED)、液晶显示器(Liquid-crystal display,LCD)等显示技术已经大规模量产。OLED显示技术凭借其高色域、高对比、广视角等优势,市场越来越广泛。OLED发光部分,一般是阳极(提供正电压,空穴)、空穴传输层、发光层、电子传输层、阴极(提供负电压,电子)组成,阴极信号一般是在面板边缘通过阴极搭接区,由导电图案将信号传输给阴极。但是,由于OLED材料蒸镀时,电子传输层并不是用精细金属掩模版(Fine MetalMask,FMM),将材料精确蒸镀到像素区域,而是使用的是开放式掩膜版(open mask),会将材料蒸镀到整个基板,因此,电子传输层会夹在阴极层和走线层之间。由于电子传输层一般为有机物,电阻较大,会造成阴极层与走线层搭接不良,或者阴极层与走线层的搭接区电阻较大导致显示面板功耗变高等问题。With the development of optoelectronic display technology and semiconductor manufacturing technology, display technologies such as organic light emitting diode display (OLED) and liquid crystal display (LCD) have been mass-produced. OLED display technology has become more and more popular in the market due to its advantages such as high color gamut, high contrast, and wide viewing angle. The light-emitting part of OLED is generally composed of an anode (providing positive voltage, holes), a hole transport layer, a light-emitting layer, an electron transport layer, and a cathode (providing negative voltage, electrons). The cathode signal is generally transmitted to the cathode by a conductive pattern through the cathode overlap area at the edge of the panel. However, when the OLED material is evaporated, the electron transport layer is not evaporated accurately to the pixel area using a fine metal mask (Fine Metal Mask, FMM), but an open mask is used to evaporate the material to the entire substrate. Therefore, the electron transport layer is sandwiched between the cathode layer and the wiring layer. Since the electron transport layer is generally an organic substance with a large resistance, it may cause poor overlap between the cathode layer and the wiring layer, or a large resistance in the overlap area between the cathode layer and the wiring layer, resulting in higher power consumption of the display panel.
在本实施例中,平坦层23具有第一斜面233和第二斜面234。第一斜面233和第二斜面234相背设置。第一斜面233可供电子传输层25沉积。第一斜面233可供阴极层26沉积,第二斜面234可供电子传输层25沉积,从而使位于第一斜面233的阴极层26可以直接与走线层24接触,避免阴极层26与走线层24被电子传输层25间隔,从而保证阴极层26与走线层24之间的电连接更加稳定,保证显示面板20的工作稳定性。In this embodiment, the planar layer 23 has a first inclined surface 233 and a second inclined surface 234. The first inclined surface 233 and the second inclined surface 234 are arranged opposite to each other. The first inclined surface 233 can be used for the deposition of the electron transport layer 25. The first inclined surface 233 can be used for the deposition of the cathode layer 26, and the second inclined surface 234 can be used for the deposition of the electron transport layer 25, so that the cathode layer 26 located on the first inclined surface 233 can directly contact the wiring layer 24, avoiding the cathode layer 26 and the wiring layer 24 being separated by the electron transport layer 25, thereby ensuring that the electrical connection between the cathode layer 26 and the wiring layer 24 is more stable, and ensuring the working stability of the display panel 20.
第二种可能的实施方式中,请参阅图4,图4是图1所示的显示面板20的另一种截面示意图。本实施例的显示面板20与第一种可能的实施例的显示面板20不同的是,平坦层23还包括凸起29。In a second possible implementation, please refer to FIG4 , which is another cross-sectional schematic diagram of the display panel 20 shown in FIG1 . The display panel 20 of this embodiment is different from the display panel 20 of the first possible embodiment in that the flat layer 23 further includes a protrusion 29 .
凸起29可以连接于第二连接面232与第二斜面234连接的一侧。凸起29由第二连接面232向远离基板21的方向延伸。凸起29背离基板21的一端可以与第一斜面233的延伸方向相交。也即为,凸起29的高度需要达到第一斜面233的延长线。凸起29包括沿其宽度方向相背的第一侧面291、第二侧面292和第三连接面293。第三连接面293连接于第一侧面291和第二侧面292背离第二连接面232的一侧。第一侧面291朝向第一斜面233。第一侧面291可以与第二连接面232连接。第二连接面232远离第一侧面291的一端可以与第一斜面233连接。第二侧面292朝向第二斜面234。第二侧面292可以与第二斜面234背离基板21的一侧连接。The protrusion 29 may be connected to the side where the second connection surface 232 is connected to the second inclined surface 234. The protrusion 29 extends from the second connection surface 232 in a direction away from the substrate 21. The end of the protrusion 29 away from the substrate 21 may intersect with the extension direction of the first inclined surface 233. That is, the height of the protrusion 29 needs to reach the extension line of the first inclined surface 233. The protrusion 29 includes a first side surface 291, a second side surface 292 and a third connection surface 293 opposite to each other along its width direction. The third connection surface 293 is connected to the first side surface 291 and the second side surface 292 away from the second connection surface 232. The first side surface 291 faces the first inclined surface 233. The first side surface 291 may be connected to the second connection surface 232. The end of the second connection surface 232 away from the first side surface 291 may be connected to the first inclined surface 233. The second side surface 292 faces the second inclined surface 234. The second side surface 292 may be connected to the side of the second inclined surface 234 away from the substrate 21.
走线层24覆盖凸起29的第一侧面291、第二侧面292和第三连接面293。电子传输层25向基板21的正投影覆盖凸起29的第二侧面292和第三连接面293。且电子传输层25向基板21的正投影与凸起29的第二侧面292错位设置。阴极层26向基板21的正投影覆盖凸起29的第一侧面291、第二侧面292和第三连接面293。The wiring layer 24 covers the first side surface 291, the second side surface 292 and the third connection surface 293 of the protrusion 29. The orthographic projection of the electron transport layer 25 to the substrate 21 covers the second side surface 292 and the third connection surface 293 of the protrusion 29. The orthographic projection of the electron transport layer 25 to the substrate 21 is staggered with the second side surface 292 of the protrusion 29. The orthographic projection of the cathode layer 26 to the substrate 21 covers the first side surface 291, the second side surface 292 and the third connection surface 293 of the protrusion 29.
在本实施例中,凸起29可以更好的避免电子传输层25的材料在沉积过程中沉积到第一斜面233和第二连接面232。凸起29可以将电子传输层25的材料挡在第二斜面234的一侧,增加阴极层26和走线层24的接触面积,从而保证阴极层26可以直接与走线层24接触,使阴极层26与走线层24具有较好的电连接稳定性,从而使显示面板20不会因阴极层26与走线层24的电连接不良而发生显示异常。In this embodiment, the protrusion 29 can better prevent the material of the electron transport layer 25 from being deposited on the first inclined surface 233 and the second connecting surface 232 during the deposition process. The protrusion 29 can block the material of the electron transport layer 25 on one side of the second inclined surface 234, increase the contact area between the cathode layer 26 and the wiring layer 24, thereby ensuring that the cathode layer 26 can directly contact the wiring layer 24, so that the cathode layer 26 and the wiring layer 24 have good electrical connection stability, so that the display panel 20 will not have display abnormalities due to poor electrical connection between the cathode layer 26 and the wiring layer 24.
请参阅图5,图5是本申请实施例提供的一种显示面板20的制备方法的流程示意图。所述制备方法包括但不限于步骤S100-S600。Please refer to Fig. 5, which is a schematic flow chart of a method for manufacturing a display panel 20 provided in an embodiment of the present application. The manufacturing method includes but is not limited to steps S100-S600.
S100:提供基板21。S100: providing a substrate 21.
S200:在基板21上形成平坦层23,平坦层23包括第一连接面231、第一斜面233和第二斜面234,第一连接面231与基板21接触,第一斜面233和第二斜面234连接于第一连接面231的相对两侧,第一斜面233的延伸方向和第二斜面234的延伸方向相交。S200: A flat layer 23 is formed on the substrate 21, wherein the flat layer 23 includes a first connecting surface 231, a first inclined surface 233 and a second inclined surface 234, wherein the first connecting surface 231 contacts the substrate 21, the first inclined surface 233 and the second inclined surface 234 are connected to opposite sides of the first connecting surface 231, and an extension direction of the first inclined surface 233 intersects with an extension direction of the second inclined surface 234.
其中,平坦层23可以使用半透过掩膜版(Half-Transparent Mask,HTM)制备。平坦层23的截面可以为多个梯形,多个梯形的顶面和侧面可以构成波浪形结构。The planar layer 23 may be prepared using a half-transparent mask (HTM). The cross-section of the planar layer 23 may be a plurality of trapezoids, and the top surfaces and side surfaces of the plurality of trapezoids may form a wavy structure.
S300:在平坦层23背离基板21的一侧形成走线层24,走线层24连接于平坦层23背离基板21的表面,走线层24覆盖第一斜面233和第二斜面234。S300 : forming a wiring layer 24 on a side of the flat layer 23 away from the substrate 21 . The wiring layer 24 is connected to a surface of the flat layer 23 away from the substrate 21 . The wiring layer 24 covers the first inclined surface 233 and the second inclined surface 234 .
其中,走线层24的材料可以为氧化铟锡(Indium Thin Oxide,ITO)。由于平坦层23具有第二连接面232,因此,第一斜面233上的走线层24和第二斜面234上的走线层24可以通过第二连接面232上的走线层24过渡连接,避免走线层24在第一斜面233和第二斜面234之间断线。The material of the wiring layer 24 may be indium tin oxide (ITO). Since the flat layer 23 has the second connecting surface 232, the wiring layer 24 on the first inclined surface 233 and the wiring layer 24 on the second inclined surface 234 may be transitionally connected through the wiring layer 24 on the second connecting surface 232, thereby preventing the wiring layer 24 from being disconnected between the first inclined surface 233 and the second inclined surface 234.
S400:在走线层24背离平坦层23的一侧形成电子传输层25,电子传输层25向基板21的正投影与第一斜面233错位设置。S400 : forming an electron transport layer 25 on a side of the wiring layer 24 away from the planar layer 23 , wherein an orthographic projection of the electron transport layer 25 onto the substrate 21 is offset from the first inclined surface 233 .
其中,电子传输层25通过蒸镀工艺形成,电子传输层25的材料朝向第二斜面234蒸镀,蒸镀的方向与基板21的夹角为第一夹角,第一斜面233与基板21的夹角为第二夹角α2,第一夹角小于或者等于第二夹角α2。Among them, the electron transport layer 25 is formed by an evaporation process, and the material of the electron transport layer 25 is evaporated toward the second inclined surface 234. The angle between the evaporation direction and the substrate 21 is a first angle, and the angle between the first inclined surface 233 and the substrate 21 is a second angle α2. The first angle is less than or equal to the second angle α2.
S500:在走线层24背离平坦层23的一侧形成第一阴极子层,第一阴极子层向基板21的正投影覆盖第一斜面233。S500 : forming a first cathode sublayer on a side of the routing layer 24 away from the planar layer 23 , wherein an orthographic projection of the first cathode sublayer onto the substrate 21 covers the first inclined surface 233 .
S600:在电子传输层背离走线层24的一侧形成第二阴极子层,第二阴极子层与第一阴极子层连接形成阴极层26。S600 : forming a second cathode sublayer on a side of the electron transport layer away from the wiring layer 24 , and connecting the second cathode sublayer to the first cathode sublayer to form a cathode layer 26 .
其中,阴极层26通过蒸镀工艺形成,阴极层26的材料朝向第一斜面233蒸镀,蒸镀的方向与基板21的夹角为第三夹角,第二斜面234与基板21的夹角为第四夹角α4,第三夹角小于或者等于第四夹角α4。Among them, the cathode layer 26 is formed by an evaporation process, and the material of the cathode layer 26 is evaporated toward the first inclined surface 233. The angle between the evaporation direction and the substrate 21 is the third angle, and the angle between the second inclined surface 234 and the substrate 21 is the fourth angle α4. The third angle is less than or equal to the fourth angle α4.
在本实施例中,由于第一斜面233和第二斜面234相对基板21倾斜,因此,电子传输层25的膜层材料可以直接朝向第二斜面234蒸镀。且朝向第二斜面234蒸镀时,蒸镀方向可以避开第一斜面233,因此第一斜面233不会被电子传输层25膜层材料沉积。第一斜面233的走线层24也就不会被电子传输层25覆盖,从而使阴极层26在沉积时可以直接沉积在走线层24的表面,进而使阴极层26与走线层24直接接触,提升阴极层26与走线层24的电连接稳定性。In this embodiment, since the first inclined surface 233 and the second inclined surface 234 are inclined relative to the substrate 21, the film material of the electron transport layer 25 can be directly evaporated toward the second inclined surface 234. When evaporating toward the second inclined surface 234, the evaporation direction can avoid the first inclined surface 233, so the first inclined surface 233 will not be deposited by the film material of the electron transport layer 25. The wiring layer 24 of the first inclined surface 233 will not be covered by the electron transport layer 25, so that the cathode layer 26 can be directly deposited on the surface of the wiring layer 24 during deposition, and then the cathode layer 26 is in direct contact with the wiring layer 24, thereby improving the electrical connection stability between the cathode layer 26 and the wiring layer 24.
以下将对各个步骤分别进行进一步的描述。Each step will be further described below.
以下将结合图来描述上述的步骤S300-S600,请参阅图6,图6是显示面板20的制备方法中完成S300后形成的显示面板20的剖面示意图。The above steps S300 - S600 will be described below in conjunction with the drawings. Please refer to FIG. 6 , which is a cross-sectional schematic diagram of the display panel 20 formed after S300 is completed in the method for manufacturing the display panel 20 .
S300:在平坦层23背离基板21的一侧形成走线层24,走线层24连接于平坦层23背离基板21的表面,走线层24覆盖第一斜面233和第二斜面234。S300 : forming a wiring layer 24 on a side of the flat layer 23 away from the substrate 21 . The wiring layer 24 is connected to a surface of the flat layer 23 away from the substrate 21 . The wiring layer 24 covers the first inclined surface 233 and the second inclined surface 234 .
其中,走线层24可以覆盖平坦层23。走线层24相对平坦层23宽度方向凸出的两侧可以与基板21连接。The wiring layer 24 may cover the flat layer 23. The two sides of the wiring layer 24 protruding relative to the width direction of the flat layer 23 may be connected to the substrate 21.
请参阅图7,图7是显示面板20的制备方法中完成S400后形成的显示面板20的剖面示意图。Please refer to FIG. 7 , which is a schematic cross-sectional view of the display panel 20 formed after S400 in the method for manufacturing the display panel 20 .
S400:在走线层24背离平坦层23的一侧形成电子传输层25,电子传输层25向基板21的正投影与第一斜面233错位设置。S400 : forming an electron transport layer 25 on a side of the wiring layer 24 away from the planar layer 23 , wherein an orthographic projection of the electron transport layer 25 onto the substrate 21 is offset from the first inclined surface 233 .
其中,电子传输层25的膜层材料可以通过倾斜基板21进行蒸镀,蒸镀工艺可以为Open mask蒸镀。蒸镀方向朝向第二斜面234,且与基板21的夹角为第一夹角α1。电子传输层25的蒸镀方式同样适用于OLED显示面板20中的空穴传输层222、电子阻挡层或其他位于阴极层26与走线层24之间的不导电膜层结构。Among them, the film material of the electron transport layer 25 can be evaporated by tilting the substrate 21, and the evaporation process can be open mask evaporation. The evaporation direction is toward the second inclined surface 234, and the angle with the substrate 21 is the first angle α1. The evaporation method of the electron transport layer 25 is also applicable to the hole transport layer 222, the electron blocking layer or other non-conductive film layer structures located between the cathode layer 26 and the wiring layer 24 in the OLED display panel 20.
请参阅图8,图8是显示面板20的制备方法中完成S500后形成的显示面板20的剖面示意图。Please refer to FIG. 8 , which is a cross-sectional schematic diagram of the display panel 20 formed after S500 in the method for manufacturing the display panel 20 .
S500:在走线层24背离平坦层23的一侧形成第一阴极子层251,第一阴极子层251向基板21的正投影覆盖第一斜面233。S500 : forming a first cathode sub-layer 251 on a side of the routing layer 24 away from the planar layer 23 , wherein an orthographic projection of the first cathode sub-layer 251 onto the substrate 21 covers the first inclined surface 233 .
其中,第一阴极子层251的膜层材料可以通过倾斜基板21进行蒸镀,蒸镀工艺可以为Open mask蒸镀。蒸镀方向朝向第一斜面233,且与基板21的夹角为第三夹角α3。The film material of the first cathode sublayer 251 can be evaporated by tilting the substrate 21, and the evaporation process can be open mask evaporation. The evaporation direction is toward the first inclined surface 233, and the angle with the substrate 21 is the third angle α3.
请参阅图9,图9是显示面板20的制备方法中完成S600后形成的显示面板20的剖面示意图。Please refer to FIG. 9 , which is a cross-sectional schematic diagram of the display panel 20 formed after S600 in the method for manufacturing the display panel 20 .
S600:在电子传输层背离走线层24的一侧形成第二阴极子层252,第二阴极子层252与第一阴极子层251连接形成阴极层26。S600 : forming a second cathode sublayer 252 on a side of the electron transport layer away from the wiring layer 24 , and the second cathode sublayer 252 is connected to the first cathode sublayer 251 to form a cathode layer 26 .
其中,第二阴极子层252的膜层材料可以与第一阴极子层251的膜层材料相同。第二阴极子层252在蒸镀过程中,基板21可以与蒸镀方向垂直,从而使第二阴极子层252可以覆盖电子传输层25和第一阴极子层251的表面,并且与第一阴极子层251电连接。The film material of the second cathode sublayer 252 can be the same as the film material of the first cathode sublayer 251. During the evaporation process of the second cathode sublayer 252, the substrate 21 can be perpendicular to the evaporation direction, so that the second cathode sublayer 252 can cover the surface of the electron transport layer 25 and the first cathode sublayer 251, and is electrically connected to the first cathode sublayer 251.
在本实施例中,通过倾斜基板21蒸镀,使电子传输层25和第一阴极子层251可以分别位于平坦层23的第二斜面234的一侧和第一斜面233的一侧。从而使第一阴极子层251与走线层24之间可以直接连接。在第二阴极子层252沉积于第一阴极子层251和电子传输层25表面后,可以使第二阴极子层252与第一阴极子层251电连接,从而使位于显示区27(显示结构22上方)的部分阴极层26可以与走线层24导通。In this embodiment, by evaporating the inclined substrate 21, the electron transport layer 25 and the first cathode sublayer 251 can be respectively located on one side of the second inclined surface 234 and the first inclined surface 233 of the flat layer 23. Thus, the first cathode sublayer 251 can be directly connected to the wiring layer 24. After the second cathode sublayer 252 is deposited on the surface of the first cathode sublayer 251 and the electron transport layer 25, the second cathode sublayer 252 can be electrically connected to the first cathode sublayer 251, so that part of the cathode layer 26 located in the display area 27 (above the display structure 22) can be connected to the wiring layer 24.
以上对本申请实施例进行了详细介绍,本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请的方法及其核心思想;同时,对于本领域的一般技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。The embodiments of the present application are introduced in detail above. Specific examples are used in this article to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the method of the present application and its core idea. At the same time, for general technical personnel in this field, according to the idea of the present application, there will be changes in the specific implementation method and application scope. In summary, the content of this specification should not be understood as a limitation on the present application.
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