CN117535741A - Electrolytic copper foil capable of being annealed at low temperature and preparation method and application thereof - Google Patents
Electrolytic copper foil capable of being annealed at low temperature and preparation method and application thereof Download PDFInfo
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Abstract
本发明涉及电解铜箔技术领域,具体公开一种可低温退火的电解铜箔及其制备方法和应用,该电解铜箔的制备方法包括:将铜原料与稀硫酸反应生成硫酸铜溶液,过滤后,加入氯离子和添加剂获得电解液,对电解液进行电解得到生箔;所述的添加剂包括整平剂、光亮剂和走位剂;对生箔进行表面处理得到表面处理后的生箔;所述表面处理包括酸洗、粗化、固化、水洗、防氧化、钝化和喷涂硅烷中的至少一种;将表面处理后的生箔进行两段退火处理,即得可低温退火的电解铜箔。该制备工艺在低温下退火,耗时短、耗能小,制备的电解铜箔具有较高抗拉强度、延伸率和耐弯折性等性能,可用于高频高速领域FCCL的加工。The invention relates to the technical field of electrolytic copper foil, and specifically discloses an electrolytic copper foil that can be annealed at low temperature and its preparation method and application. The preparation method of the electrolytic copper foil includes: reacting copper raw materials with dilute sulfuric acid to generate a copper sulfate solution, and filtering , add chloride ions and additives to obtain an electrolyte, conduct electrolysis to the electrolyte to obtain a raw foil; the additives include a leveling agent, a brightener and a moving agent; perform surface treatment on the raw foil to obtain a surface-treated raw foil; so The surface treatment includes at least one of pickling, roughening, curing, water washing, anti-oxidation, passivation and spraying silane; the surface-treated raw foil is subjected to two-stage annealing treatment to obtain an electrolytic copper foil that can be annealed at low temperature . This preparation process involves annealing at low temperatures, is short in time, and consumes little energy. The prepared electrolytic copper foil has high tensile strength, elongation, bending resistance and other properties, and can be used for processing FCCL in high-frequency and high-speed fields.
Description
技术领域Technical field
本发明属于电解铜箔技术领域,具体涉及一种可低温退火的电解铜箔及其制备方法和应用。The invention belongs to the technical field of electrolytic copper foil, and specifically relates to an electrolytic copper foil that can be annealed at low temperature and its preparation method and application.
背景技术Background technique
挠性覆铜板(Flexible Copper Clad Laminate,FCCL)是挠性印制电路板(Flexible Printed Circuit board,FPC)的加工基板材料,是由挠性绝缘基膜与金属箔组成的。FCCL与刚性覆铜板在产品特性上相比,具有薄、轻和可弯折的优势,制作的FPC具有配线密度高、轻薄、可弯折、可立体组装等特点。FCCL已在航空航天设备、军事制导系统、手机、数码相机、汽车卫星定位装置、液晶电视、笔记本电脑、可穿戴设备等电子产品中得到广泛应用。用于FCCL的绝大部分金属箔是铜箔,包括电解铜箔和压延铜箔。近几年,随着电解铜箔生产技术的提高,电解铜箔的耐弯折性已经十分接近同规格压延铜箔,可实现延伸率较高的同时,表面粗糙度也控制在特定的范围,并且电解铜箔价格方面具有明显的的优势,越来越多的FCCL生产厂家开始使用电解铜箔代替压延铜箔。Flexible Copper Clad Laminate (FCCL) is the processing substrate material of Flexible Printed Circuit Board (FPC). It is composed of flexible insulating base film and metal foil. Compared with rigid copper-clad laminates in terms of product characteristics, FCCL has the advantages of being thin, light, and bendable. The FPC produced has the characteristics of high wiring density, thinness, bendability, and three-dimensional assembly. FCCL has been widely used in aerospace equipment, military guidance systems, mobile phones, digital cameras, automotive satellite positioning devices, LCD TVs, notebook computers, wearable devices and other electronic products. Most metal foils used in FCCL are copper foils, including electrolytic copper foils and rolled copper foils. In recent years, with the improvement of electrolytic copper foil production technology, the bending resistance of electrolytic copper foil has been very close to that of rolled copper foil of the same specification. It can achieve high elongation and control the surface roughness within a specific range. Moreover, electrolytic copper foil has obvious advantages in terms of price. More and more FCCL manufacturers are beginning to use electrolytic copper foil instead of rolled copper foil.
信号高速/高频化是信号传输越来越集中于导线“表层”(称为趋肤效应),如当频率达1GHz时,其信号在导线表面的传输厚度仅为2.1μm;当信号传输频率提高到10GHz时,其信号在导体表面的传输厚度为0.70μm。高速FPC如果继续使用常规粗糙度的电解铜箔,其结果是:随信号传输频率增加,趋肤效应导致的信号“失真”将愈发严重。因此,当前的高速材料上低粗糙度电解铜箔的应用越来越广泛,VLP等级的电解铜箔已成为标配。The high speed/high frequency of signals means that signal transmission is increasingly concentrated on the "surface" of wires (called the skin effect). For example, when the frequency reaches 1GHz, the signal transmission thickness on the surface of the wire is only 2.1μm; when the signal transmission frequency When increasing to 10GHz, the signal transmission thickness on the conductor surface is 0.70μm. If high-speed FPC continues to use electrolytic copper foil with conventional roughness, the result will be: as the signal transmission frequency increases, the signal "distortion" caused by the skin effect will become more and more serious. Therefore, the application of low-roughness electrolytic copper foil on current high-speed materials is becoming more and more widespread, and VLP grade electrolytic copper foil has become the standard.
现有技术中,为了使电解铜箔更适应于高频高速领域的FCCL,电解铜箔需要控制电解铜箔表面粗糙度处于VLP等级(处理面粗糙度Rz≤2.0μm)的前提下,还要采用多种方式调控电解铜箔的力学性能。例如专利申请CN115478305A公开了一种高耐弯折性能锂离子电池用电解铜箔的制备方法及其添加剂,通过筛选添加剂的原料成分包括双苯磺酰亚胺、鱼胶、聚丙二醇、糊精和二甲基甲酰胺基丙烷磺酸钠来改善电解铜箔的耐弯折性性能,但是这种技术方案会使电解铜箔内部存在缺陷及杂质,从而造成电解铜箔的翘曲度过高,甚至产生鱼鳞纹。而专利申请CN106536791A公开了一种电解铜箔及其制造方法、包含该电解铜箔的锂二次电池用的集电体及锂二次电池,该电解铜箔通过将电解铜箔经过退火处理(在190℃退火1小时),从而提高电解铜箔的延伸率及耐弯折性,但该过程退火温度高,耗时过长、耗能过大。In the existing technology, in order to make the electrolytic copper foil more suitable for FCCL in the high-frequency and high-speed field, the electrolytic copper foil needs to control the surface roughness of the electrolytic copper foil to be at the VLP level (processed surface roughness Rz ≤ 2.0 μm). Various methods are used to control the mechanical properties of electrolytic copper foil. For example, patent application CN115478305A discloses a method for preparing electrolytic copper foil for lithium-ion batteries with high bending resistance and its additives. The raw material components of the additives include diphenylsulfonimide, isinglass, polypropylene glycol, dextrin and Sodium dimethylformamidopropane sulfonate is used to improve the bending resistance of electrolytic copper foil. However, this technical solution will cause defects and impurities inside the electrolytic copper foil, resulting in excessive warpage of the electrolytic copper foil. Even fish scales may appear. Patent application CN106536791A discloses an electrolytic copper foil and a manufacturing method thereof, a current collector for lithium secondary batteries containing the electrolytic copper foil, and a lithium secondary battery. The electrolytic copper foil is obtained by subjecting the electrolytic copper foil to an annealing treatment ( Annealing at 190°C for 1 hour), thereby improving the elongation and bending resistance of the electrolytic copper foil. However, this process has a high annealing temperature, takes too long, and consumes too much energy.
因此,当前需要一种可低温退火、耗时短、耗能小且抗拉强度、延伸率和耐弯折性高的电解铜箔的制备工艺。Therefore, there is currently a need for a preparation process for electrolytic copper foil that can be annealed at low temperature, is short in time, consumes little energy, and has high tensile strength, elongation and bending resistance.
发明内容Contents of the invention
本发明针对现有技术存在的问题,提供了一种可低温退火的电解铜箔及其制备方法和应用,该电解铜箔的制备工艺耗时短、耗能小,制得的电解铜箔具有较高抗拉强度、延伸率和耐弯折性。In view of the problems existing in the prior art, the present invention provides an electrolytic copper foil that can be annealed at low temperature and its preparation method and application. The preparation process of the electrolytic copper foil is short in time and energy consumption. The obtained electrolytic copper foil has High tensile strength, elongation and bending resistance.
为实现上述目的,本发明采用的技术方案如下:In order to achieve the above objects, the technical solutions adopted by the present invention are as follows:
一方面,本发明提供了一种可低温退火的电解铜箔的制备方法,包括以下步骤:On the one hand, the present invention provides a method for preparing electrolytic copper foil that can be annealed at low temperature, including the following steps:
S1、制液:将铜原料与稀硫酸反应生成硫酸铜溶液;S1. Liquid preparation: react the copper raw material with dilute sulfuric acid to generate a copper sulfate solution;
S2、电解:过滤硫酸铜溶液后,加入氯离子和添加剂获得电解液,对电解液进行电解生箔,得到生箔;所述的添加剂包括整平剂、光亮剂和走位剂;S2. Electrolysis: After filtering the copper sulfate solution, add chloride ions and additives to obtain an electrolyte, electrolyze the electrolyte to produce foil, and obtain a foil; the additives include leveling agents, brighteners and moving agents;
S3、表面处理:对生箔进行表面处理得到表面处理后的生箔;所述表面处理包括酸洗、粗化、固化、水洗、防氧化、钝化和喷涂硅烷中的至少一种;S3. Surface treatment: Surface treatment is performed on the raw foil to obtain a surface-treated raw foil; the surface treatment includes at least one of pickling, roughening, curing, water washing, anti-oxidation, passivation and silane spraying;
S4、退火处理:将表面处理后的生箔进行两段退火处理,得到所述的可低温退火的电解铜箔。S4. Annealing treatment: The surface-treated raw foil is subjected to two-stage annealing treatment to obtain the electrolytic copper foil that can be annealed at low temperature.
优选地,步骤S1所述的铜原料包括铜线、铜杆、铜块和铜粉中的至少一种。Preferably, the copper raw material in step S1 includes at least one of copper wire, copper rod, copper block and copper powder.
优选地,步骤S2所述电解生箔的条件为:电流密度为60-62A/m2,电解液的流量为30-35m3/h,电解液温度为48-50℃。Preferably, the conditions for electrolytic foil production in step S2 are: current density is 60-62A/m 2 , electrolyte flow rate is 30-35m 3 /h, and electrolyte temperature is 48-50°C.
优选地,步骤S2所述添加剂总量为18-30mg/L。Preferably, the total amount of additives in step S2 is 18-30 mg/L.
优选地,步骤S2所述整平剂、光亮剂和走位剂的质量比为0.5-1:1:1-2。Preferably, the mass ratio of the leveling agent, brightening agent and moving agent in step S2 is 0.5-1:1:1-2.
进一步优选地,步骤S2所述整平剂、光亮剂和走位剂的质量比为0.8-1:1:1-2。Further preferably, the mass ratio of the leveling agent, brightening agent and positioning agent in step S2 is 0.8-1:1:1-2.
最优选地,步骤S2所述整平剂、光亮剂和走位剂的质量比为1:1:1。Most preferably, the mass ratio of the leveling agent, brightening agent and moving agent described in step S2 is 1:1:1.
优选地,步骤S2所述整平剂为四氢噻唑硫酮和/或聚乙烯亚胺;所述光亮剂为己基苄基铵盐、聚二硫二丙烷磺酸钠和巯基咪唑丙磺酸钠中的至少一种;所述走位剂为羟乙基纤维素和/或聚乙二醇。Preferably, the leveling agent in step S2 is tetrahydrothiazolethione and/or polyethyleneimine; the brightening agent is hexyl benzylammonium salt, sodium polydisulfide propane sulfonate and sodium mercaptoimidazole propane sulfonate. At least one of the following; the moving agent is hydroxyethyl cellulose and/or polyethylene glycol.
优选地,所述羟乙基纤维素在20℃时2wt.%的水溶液中的粘度为500mPa.s。Preferably, the viscosity of the hydroxyethyl cellulose in a 2 wt.% aqueous solution at 20° C. is 500 mPa.s.
优选地,所述聚乙二醇的分子量为4000-6000Da;所述聚乙烯亚胺分子量为4000-10000Da。Preferably, the molecular weight of polyethylene glycol is 4000-6000 Da; the molecular weight of polyethyleneimine is 4000-10000 Da.
优选地,所述四氢噻唑硫酮的浓度为4.0-6.0mg/L,所述聚乙烯亚胺的浓度为2.0-4.0mg/L,所述己基苄基铵盐的浓度为1.5-2.5mg/L,所述聚二硫二丙烷磺酸钠的浓度为3.0-5.0mg/L,所述巯基咪唑丙磺酸钠的浓度为1.5-2.5mg/L,所述羟乙基纤维素的浓度为3.0-5.0mg/L,所述聚乙二醇的浓度为2.0-4.0mg/L。Preferably, the concentration of the tetrahydrothiazolethione is 4.0-6.0 mg/L, the concentration of the polyethyleneimine is 2.0-4.0 mg/L, and the concentration of the hexyl benzylammonium salt is 1.5-2.5 mg /L, the concentration of the sodium polydisulfide propane sulfonate is 3.0-5.0 mg/L, the concentration of the sodium mercaptoimidazole propanesulfonate is 1.5-2.5 mg/L, and the concentration of the hydroxyethyl cellulose The concentration of polyethylene glycol is 3.0-5.0 mg/L, and the concentration of polyethylene glycol is 2.0-4.0 mg/L.
优选地,步骤S3所述酸洗的条件为:酸的浓度140-150g/L,温度30-40℃;步骤S3所述固化的条件为:使用固化液进行三次固化,固化液中含浓度为50-56g/L的铜离子和浓度为90-120g/L的硫酸,固化液的温度为40-46℃。Preferably, the pickling conditions in step S3 are: acid concentration 140-150g/L, temperature 30-40°C; the solidification conditions in step S3 are: using solidifying liquid for three solidifications, the solidifying solution contains a concentration of 50-56g/L copper ions and 90-120g/L sulfuric acid, the temperature of the solidifying solution is 40-46°C.
优选地,步骤S3所述粗化的条件为:使用粗化液进行三次粗化,第一次粗化时粗化液含浓度为12-14g/L的铜离子、浓度为120-130g/L的硫酸和浓度为60-80mg/L的钨酸钠,粗化液的温度为30-35℃;第二次粗化时粗化液含浓度为12-16g/L的铜离子和浓度为120-150g/L的硫酸,粗化液的温度为30-34℃;第三次粗化时粗化液含浓度为12-16g/L的铜离子和浓度为120-150g/L的硫酸,粗化液的温度为30-34℃。Preferably, the roughening conditions in step S3 are: use a roughening liquid for three roughenings. During the first roughening, the roughening liquid contains copper ions with a concentration of 12-14g/L and a concentration of 120-130g/L. Sulfuric acid and sodium tungstate with a concentration of 60-80mg/L, the temperature of the roughening liquid is 30-35°C; during the second roughening, the roughening liquid contains copper ions with a concentration of 12-16g/L and a concentration of 120 -150g/L sulfuric acid, the temperature of the roughening liquid is 30-34°C; during the third roughening, the roughening liquid contains copper ions with a concentration of 12-16g/L and sulfuric acid with a concentration of 120-150g/L. The temperature of the liquid is 30-34℃.
优选地,步骤S3所述水洗的条件为:温度25-35℃,pH6.8-7.2,水为超纯水。Preferably, the water washing conditions in step S3 are: temperature 25-35°C, pH 6.8-7.2, and water is ultrapure water.
优选地,步骤S3所述防氧化的条件为:使用防氧化液进行防氧化处理,所述防氧化液含浓度为1.5-2.5g/L的镍离子、浓度为3.5-4.5g/L的锌离子和浓度为70-100g/L的K4P2O7,防氧化液的pH为10-11,温度为25-35℃。Preferably, the anti-oxidation conditions in step S3 are: use an anti-oxidation liquid for anti-oxidation treatment, and the anti-oxidation liquid contains nickel ions with a concentration of 1.5-2.5g/L and zinc with a concentration of 3.5-4.5g/L. The concentration of ions and K 4 P 2 O 7 is 70-100g/L, the pH of the anti-oxidation solution is 10-11, and the temperature is 25-35°C.
优选地,步骤S3所述钝化的条件为:使用钝化液进行钝化处理,所述钝化液中含浓度为2.0-2.5g/L的铬离子和浓度为70-100g/L的K4P2O7,钝化液的pH为11-12,温度为25-35℃。Preferably, the passivation conditions in step S3 are: using a passivation liquid for passivation treatment, the passivation liquid contains chromium ions with a concentration of 2.0-2.5g/L and K with a concentration of 70-100g/L. 4 P 2 O 7 , the pH of the passivation solution is 11-12, and the temperature is 25-35°C.
优选地,所述水需要进行三次:三次固化处理后需要第一次水洗,防氧化处理后进行第二次水洗,钝化处理后进行第三次水洗。Preferably, the water needs to be washed three times: the first water washing is required after three curing treatments, the second water washing is performed after the anti-oxidation treatment, and the third water washing is performed after the passivation treatment.
优选地,步骤S3所述喷涂硅烷的条件为:喷涂有机硅烷偶联剂,所述有机硅烷偶联剂的浓度为1.0-1.5g/L,pH为9-12,温度为25-35℃。Preferably, the conditions for spraying silane in step S3 are: spraying an organosilane coupling agent, the concentration of the organosilane coupling agent is 1.0-1.5g/L, the pH is 9-12, and the temperature is 25-35°C.
优选地,所述有机硅烷偶联剂包括但不限于乙氧基硅烷偶联剂、氨基硅烷偶联剂、甲基丙烯酸基硅烷偶联剂、环氧基硅烷偶联剂、巯基硅烷偶联剂中的至少一种。Preferably, the organosilane coupling agent includes but is not limited to ethoxysilane coupling agent, aminosilane coupling agent, methacrylic silane coupling agent, epoxy silane coupling agent, mercaptosilane coupling agent at least one of them.
优选地,步骤S4所述两段退火处理的条件为:第一段退火处理是电解铜箔收卷过程中经过烘箱烘烤,温度为130-140℃,时间为5-10秒;第二段退火处理是电解铜箔收卷后,与收卷轴一起放入烤炉中烘烤,温度为60-80℃,时间为6-8小时。Preferably, the conditions for the two-stage annealing treatment in step S4 are: the first stage annealing treatment is oven baking during the winding process of the electrolytic copper foil, the temperature is 130-140°C, and the time is 5-10 seconds; the second stage annealing treatment is The annealing treatment is to wind up the electrolytic copper foil and put it into the oven together with the winding reel to bake at a temperature of 60-80°C for 6-8 hours.
另一方面,本发明提供了一种可低温退火的电解铜箔,由上述的制备方法制备得到。On the other hand, the present invention provides an electrolytic copper foil that can be annealed at low temperature, which is prepared by the above preparation method.
优选地,所述电解铜箔中包含浓度为80-90g/L的铜离子、浓度为110-120g/L的硫酸和浓度为1.0-1.5mg/L的氯离子。Preferably, the electrolytic copper foil contains copper ions with a concentration of 80-90 g/L, sulfuric acid with a concentration of 110-120 g/L, and chloride ions with a concentration of 1.0-1.5 mg/L.
本发明还提供了一种上述的电解铜箔或上述的制备方法制备得到的电解铜箔在挠性覆铜板中的应用。The invention also provides an application of the above-mentioned electrolytic copper foil or the electrolytic copper foil prepared by the above-mentioned preparation method in a flexible copper-clad laminate.
相对于现有技术,本发明具有以下有益效果:Compared with the existing technology, the present invention has the following beneficial effects:
(1)本发明中电解铜箔的制备工艺在低温下退火,耗时短、耗能小;(1) The preparation process of the electrolytic copper foil in the present invention is annealed at low temperature, which is short in time and energy consumption;
(2)本发明通过调控生箔添加剂的种类和配比,可提供结晶细腻均匀、轮廓平缓、峰值稳定、铜瘤大小一致,且内部缺陷及杂质少的电解铜箔;通过调控粗固化添加剂和铜酸浓度,在电解铜箔表面得到VLP等级粗糙度的处理面;再通过两步低温处理,进一步释放电解铜箔内部的应力,使退火后电解铜箔具有较高抗拉强度、延伸率和耐弯折性等性能,可用于高频高速领域FCCL的加工。(2) By regulating the types and proportions of raw foil additives, the present invention can provide electrolytic copper foil with fine and uniform crystallization, gentle contours, stable peaks, uniform copper nodules, and few internal defects and impurities; by regulating the coarse curing additives and The concentration of cupric acid is used to obtain a VLP-level roughness treatment surface on the surface of the electrolytic copper foil; and then through two-step low-temperature treatment, the stress inside the electrolytic copper foil is further released, so that the annealed electrolytic copper foil has higher tensile strength, elongation and With its properties such as bending resistance, it can be used for processing FCCL in high-frequency and high-speed fields.
具体实施方式Detailed ways
下面通过具体实施例对本发明进行说明,以使本发明技术方案更易于理解、掌握,但本发明并不局限于此,描述的实施例仅是本发明一部分实施例,而不是全部的实施例。The present invention will be described below through specific embodiments to make the technical solutions of the present invention easier to understand and grasp. However, the present invention is not limited thereto. The described embodiments are only some of the embodiments of the present invention, not all of them.
在本文中所披露的范围的端点和任何值都不限于该精确的范围或值,这些范围或值应当理解为包含接近这些范围或值的值。对于数值范围来说,各个范围的端点值之间、各个范围的端点值和单独的点值之间,以及单独的点值之间可以彼此组合而得到一个或多个新的数值范围,这些数值范围应被视为在本文中具体公开。除非上下文另有明确指示,否则如本文所用的单数形式“一个”、“一种”和“所述”包括单数和复数指示物。通过端点表述的数值范围包括在对应范围内的所有数值和分数,以及所表述的端点。The endpoints of ranges and any values disclosed herein are not limited to the precise range or value, but these ranges or values are to be understood to include values approaching such ranges or values. For numerical ranges, the endpoint values of each range, the endpoint values of each range and individual point values, and the individual point values can be combined with each other to obtain one or more new numerical ranges. These values The scope shall be deemed to be specifically disclosed herein. As used herein, the singular forms "a," "an," and "the" include singular and plural referents unless the context clearly dictates otherwise. The recitation of numerical ranges by endpoints includes all numbers and fractions within the corresponding range and the recited endpoints.
基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其它实施例,都应当属于本发明保护的范围。下述实施例中所述实验方法,如无特殊说明,均为常规方法;所述试剂和材料,如无特殊说明,均可从商业途径获得。Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts should fall within the scope of protection of the present invention. The experimental methods described in the following examples are conventional methods unless otherwise specified; the reagents and materials described can be obtained from commercial sources unless otherwise specified.
实施例1一种可低温退火的电解铜箔的制备方法Embodiment 1 A method for preparing electrolytic copper foil that can be annealed at low temperature
步骤1、制液:将铜线加于溶铜罐中,加入纯水、氧气和稀硫酸,经搅拌、加热、反应生成硫酸铜溶液;Step 1. Liquid preparation: Add copper wire to a copper-melting tank, add pure water, oxygen and dilute sulfuric acid, stir, heat and react to generate a copper sulfate solution;
步骤2、电解:将步骤1生成的硫酸铜溶液经过过滤器过滤后,输送至高位罐后加入氯离子和添加剂获得电解液,接着将电解液输送至电解槽中进行电解生产生箔。电解条件为电流密度为62A/m2,电解液的流量为30m3/h。Step 2. Electrolysis: After filtering the copper sulfate solution generated in step 1 through a filter, transport it to a high-level tank, add chlorine ions and additives to obtain an electrolyte, and then transport the electrolyte to the electrolytic tank for electrolysis to produce foil. The electrolysis conditions are that the current density is 62A/m 2 and the electrolyte flow rate is 30 m 3 /h.
电解液中铜离子含量为85g/L,硫酸含量为115g/L,氯离子含量为1.0mg/L,添加剂总量18mg/L,电解液温度为48℃。The copper ion content in the electrolyte is 85g/L, the sulfuric acid content is 115g/L, the chloride ion content is 1.0mg/L, the total additive amount is 18mg/L, and the electrolyte temperature is 48°C.
所述添加剂为含有己基苄基铵盐(PPNI)、聚二硫二丙烷磺酸钠(SPS)、巯基咪唑丙磺酸钠(MESS)、羟乙基纤维素(HEC)、聚乙二醇(PEG)、四氢噻唑硫酮和聚乙烯亚胺的水溶液。其中,所述PPNI、SPS和MESS作为光亮剂,所述HEC和PEG作为走位剂,所述四氢噻唑硫酮和聚乙烯亚胺作为整平剂。所述整平剂、光亮剂和走位剂的质量比为1:1:1。The additives contain hexyl benzyl ammonium salt (PPNI), sodium polydisulfide propane sulfonate (SPS), sodium mercaptoimidazole propane sulfonate (MESS), hydroxyethyl cellulose (HEC), polyethylene glycol ( PEG), tetrahydrothiazolethione and polyethyleneimine in water. Among them, the PPNI, SPS and MESS are used as brighteners, the HEC and PEG are used as moving agents, and the tetrahydrothiazolethione and polyethyleneimine are used as leveling agents. The mass ratio of the leveling agent, brightening agent and positioning agent is 1:1:1.
所述HEC在20℃时2wt.%的水溶液中的粘度为500mPa.s,PEG分子量为5000Da;聚乙烯亚胺分子量为6000Da。The viscosity of the HEC in a 2wt.% aqueous solution at 20°C is 500 mPa.s, the molecular weight of PEG is 5000Da, and the molecular weight of polyethyleneimine is 6000Da.
PPNI的浓度为1.5mg/L,SPS的浓度为3.0mg/L,MESS的浓度为1.5mg/L;HEC的浓度为3.0mg/L,PEG的浓度为3.0mg/L;四氢噻唑硫酮的浓度为4.0mg/L,聚乙烯亚胺的浓度为2.0mg/L。The concentration of PPNI is 1.5 mg/L, the concentration of SPS is 3.0 mg/L, and the concentration of MESS is 1.5 mg/L; the concentration of HEC is 3.0 mg/L, and the concentration of PEG is 3.0 mg/L; tetrahydrothiazolethione The concentration of polyethylenimine is 4.0mg/L, and the concentration of polyethyleneimine is 2.0mg/L.
步骤3、将步骤2电解工序生产得到的生箔进行表面处理:Step 3. Surface-treat the raw foil produced by the electrolysis process in Step 2:
(1)酸洗:酸洗槽中硫酸浓度为145g/L,温度为35℃;(1) Pickling: The sulfuric acid concentration in the pickling tank is 145g/L, and the temperature is 35°C;
(2)粗化1:粗化槽中含有粗化液,粗化液中的铜离子浓度为13g/L,硫酸浓度为125g/L,钨酸钠浓度为60mg/L,粗化液温度为32℃;粗化2:粗化槽中铜离子浓度为13g/L,硫酸浓度为130g/L,温度为32℃;粗化3:粗化槽中铜离子浓度为14g/L,硫酸浓度为130g/L,温度为32℃;(2) Coarse 1: The roughening tank contains a roughening liquid. The copper ion concentration in the roughening liquid is 13g/L, the sulfuric acid concentration is 125g/L, the sodium tungstate concentration is 60mg/L, and the roughening liquid temperature is 32°C; Coarse 2: The copper ion concentration in the roughening tank is 13g/L, the sulfuric acid concentration is 130g/L, and the temperature is 32°C; Coarse 3: The copper ion concentration in the roughening tank is 14g/L, and the sulfuric acid concentration is 14g/L. 130g/L, temperature is 32℃;
(3)固化1:固化槽中铜离子浓度为52g/L,硫酸浓度为100g/L,温度为42℃;固化2:固化槽中铜离子浓度为52g/L,硫酸浓度为100g/L,温度为42℃;固化3:固化槽中铜离子浓度为52g/L,硫酸浓度为100g/L,温度为42℃;(3) Curing 1: The concentration of copper ions in the solidification tank is 52g/L, the concentration of sulfuric acid is 100g/L, and the temperature is 42°C; Curing 2: The concentration of copper ions in the solidification tank is 52g/L, and the concentration of sulfuric acid is 100g/L. The temperature is 42°C; Curing 3: The copper ion concentration in the curing tank is 52g/L, the sulfuric acid concentration is 100g/L, and the temperature is 42°C;
(4)水洗:采用超纯水,温度30℃,pH7.0;(4) Water washing: use ultrapure water, temperature 30°C, pH 7.0;
(5)防氧化:防氧化处理槽中镍的浓度为2.0g/L,锌浓度为4.0g/L,K4P2O7浓度为80g/L,pH值为10,温度为30℃;(5) Anti-oxidation: The concentration of nickel in the anti-oxidation treatment tank is 2.0g/L, the concentration of zinc is 4.0g/L, the concentration of K 4 P 2 O 7 is 80g/L, the pH value is 10, and the temperature is 30°C;
(6)水洗:采用超纯水,温度30℃,pH7.0;(6) Water washing: use ultrapure water, temperature 30°C, pH 7.0;
(7)钝化:钝化处理槽中铬浓度为2.2g/L,K4P2O7浓度为80g/L,pH为11,温度为30℃。(7) Passivation: The chromium concentration in the passivation treatment tank is 2.2g/L, the K 4 P 2 O 7 concentration is 80g/L, the pH is 11, and the temperature is 30°C.
(8)水洗:采用超纯水,温度30℃,pH7.0;(8) Water washing: use ultrapure water, temperature 30°C, pH 7.0;
(9)硅烷喷涂:γ-缩水甘油醚氧丙基三甲氧基硅烷偶联剂浓度为1.2g/L,pH为10,温度为30℃。(9) Silane spraying: The concentration of γ-glycidoxypropyltrimethoxysilane coupling agent is 1.2g/L, the pH is 10, and the temperature is 30°C.
步骤4、退火处理:包含1段退火和2段退火处理。所述1段退火是电解铜箔收卷过程中经过烘箱烘烤,所述烘烤温度130℃,时间10s;所述2段退火是电解铜箔收卷后,与收卷轴一起放入烤炉中烘烤,所述烘烤温度60℃,时间8h,然后在自然状态下冷却至室温,即得到所述的一种可低温退火的电解铜箔。Step 4. Annealing treatment: including 1-stage annealing and 2-stage annealing. The 1-stage annealing is the electrolytic copper foil being baked in the oven during the winding process. The baking temperature is 130°C and the time is 10 seconds. The 2-stage annealing is after the electrolytic copper foil is rolled up and put into the oven together with the winding reel. Medium baking, the baking temperature is 60° C. for 8 hours, and then cooled to room temperature in a natural state to obtain the electrolytic copper foil that can be annealed at low temperature.
实施例2一种可低温退火的电解铜箔的制备方法Example 2 A method for preparing electrolytic copper foil that can be annealed at low temperature
步骤1、制液:将铜线加于溶铜罐中,加入纯水、氧气和稀硫酸,经搅拌、加热、反应生成硫酸铜溶液;Step 1. Liquid preparation: Add copper wire to a copper-melting tank, add pure water, oxygen and dilute sulfuric acid, stir, heat and react to generate a copper sulfate solution;
步骤2、电解:将步骤1生成的硫酸铜溶液经过过滤器过滤后,输送至高位罐后加入氯离子和添加剂获得电解液,接着将电解液输送至电解槽中进行电解生产生箔。电解条件为电流密度为60A/m2,电解液的流量为32m3/h。Step 2. Electrolysis: After filtering the copper sulfate solution generated in step 1 through a filter, transport it to a high-level tank, add chlorine ions and additives to obtain an electrolyte, and then transport the electrolyte to the electrolytic tank for electrolysis to produce foil. The electrolysis conditions are that the current density is 60A/m 2 and the electrolyte flow rate is 32m 3 /h.
电解液中铜离子含量为80g/L,硫酸含量为110g/L,氯离子含量为1.0mg/L,添加剂总量30mg/L,电解液温度为50℃。The copper ion content in the electrolyte is 80g/L, the sulfuric acid content is 110g/L, the chloride ion content is 1.0mg/L, the total additive amount is 30mg/L, and the electrolyte temperature is 50°C.
所述添加剂为含有己基苄基铵盐(PPNI)、聚二硫二丙烷磺酸钠(SPS)、巯基咪唑丙磺酸钠(MESS)、羟乙基纤维素(HEC)、聚乙二醇(PEG)、四氢噻唑硫酮和聚乙烯亚胺的水溶液。其中,所述PPNI、SPS和MESS作为光亮剂,所述HEC和PEG作为走位剂,所述四氢噻唑硫酮和聚乙烯亚胺作为整平剂。所述整平剂、光亮剂和走位剂的质量比为0.8:1:2。The additives contain hexyl benzyl ammonium salt (PPNI), sodium polydisulfide propane sulfonate (SPS), sodium mercaptoimidazole propane sulfonate (MESS), hydroxyethyl cellulose (HEC), polyethylene glycol ( PEG), tetrahydrothiazolethione and polyethyleneimine in water. Among them, the PPNI, SPS and MESS are used as brighteners, the HEC and PEG are used as moving agents, and the tetrahydrothiazolethione and polyethyleneimine are used as leveling agents. The mass ratio of the leveling agent, brightening agent and positioning agent is 0.8:1:2.
所述HEC在20℃时2wt.%的水溶液中的粘度为500mPa.s,PEG分子量为6000Da;聚乙烯亚胺分子量为10000Da。The viscosity of the HEC in a 2 wt.% aqueous solution at 20° C. is 500 mPa.s, the molecular weight of PEG is 6000 Da, and the molecular weight of polyethyleneimine is 10000 Da.
PPNI的浓度为2.5mg/L,SPS的浓度为5.0mg/L,MESS的浓度为2.5mg/L;HEC的浓度为5.0mg/L,PEG的浓度为5.0mg/L;四氢噻唑硫酮的浓度为6.0mg/L,聚乙烯亚胺的浓度为4.0mg/L。The concentration of PPNI is 2.5mg/L, the concentration of SPS is 5.0mg/L, and the concentration of MESS is 2.5mg/L; the concentration of HEC is 5.0mg/L, the concentration of PEG is 5.0mg/L; tetrahydrothiazolethione The concentration of polyethylenimine is 6.0mg/L, and the concentration of polyethyleneimine is 4.0mg/L.
步骤3、将步骤2电解工序生产得到的生箔进行表面处理:Step 3. Surface-treat the raw foil produced by the electrolysis process in Step 2:
(1)酸洗:酸洗槽中硫酸浓度为140g/L,温度为40℃;(1) Pickling: The sulfuric acid concentration in the pickling tank is 140g/L and the temperature is 40°C;
(2)粗化1:粗化槽中含有粗化液,粗化液中的铜离子浓度为14g/L,硫酸浓度为130g/L,钨酸钠浓度为80mg/L,粗化液温度为35℃;粗化2:粗化槽中铜离子浓度为16g/L,硫酸浓度为150g/L,温度为30℃;粗化3:粗化槽中铜离子浓度为16g/L,硫酸浓度为120g/L,温度为30℃;(2) Coarse 1: The roughening tank contains a roughening liquid. The copper ion concentration in the roughening liquid is 14g/L, the sulfuric acid concentration is 130g/L, the sodium tungstate concentration is 80mg/L, and the roughening liquid temperature is 35°C; Coarse 2: The copper ion concentration in the roughening tank is 16g/L, the sulfuric acid concentration is 150g/L, and the temperature is 30°C; Coarse 3: The copper ion concentration in the roughening tank is 16g/L, and the sulfuric acid concentration is 16g/L. 120g/L, temperature is 30℃;
(3)固化1:固化槽中铜离子浓度为56g/L,硫酸浓度为90g/L,温度为46℃;固化2:固化槽中铜离子浓度为56g/L,硫酸浓度为90g/L,温度为46℃;固化3:固化槽中铜离子浓度为56g/L,硫酸浓度为90g/L,温度为46℃;(3) Curing 1: The copper ion concentration in the solidification tank is 56g/L, the sulfuric acid concentration is 90g/L, and the temperature is 46°C; Curing 2: The copper ion concentration in the solidification tank is 56g/L, and the sulfuric acid concentration is 90g/L. The temperature is 46°C; Curing 3: The copper ion concentration in the curing tank is 56g/L, the sulfuric acid concentration is 90g/L, and the temperature is 46°C;
(4)水洗:采用超纯水,温度25℃,pH6.8;(4) Water washing: use ultrapure water, temperature 25°C, pH 6.8;
(5)防氧化:防氧化处理槽中镍的浓度为1.5g/L,锌浓度为4.5g/L,K4P2O7浓度为100g/L,pH值为11,温度为25℃;(5) Anti-oxidation: The concentration of nickel in the anti-oxidation treatment tank is 1.5g/L, the concentration of zinc is 4.5g/L, the concentration of K 4 P 2 O 7 is 100g/L, the pH value is 11, and the temperature is 25°C;
(6)水洗:采用超纯水,温度25℃,pH6.8;(6) Water washing: use ultrapure water, temperature 25°C, pH 6.8;
(7)钝化:钝化处理槽中铬浓度为2.5g/L,K4P2O7浓度为70g/L,pH为12,温度为35℃。(7) Passivation: The chromium concentration in the passivation treatment tank is 2.5g/L, the K 4 P 2 O 7 concentration is 70g/L, the pH is 12, and the temperature is 35°C.
(8)水洗:采用超纯水,温度25℃,pH6.8;(8) Water washing: use ultrapure water, temperature 25°C, pH 6.8;
(9)硅烷喷涂:乙酰基三甲氧基硅烷浓度为1.0g/L,pH为12,温度为35℃。(9) Silane spraying: The concentration of acetyltrimethoxysilane is 1.0g/L, the pH is 12, and the temperature is 35°C.
步骤4、退火处理:包含1段退火和2段退火处理。所述1段退火是电解铜箔收卷过程中经过烘箱烘烤,所述烘烤温度140℃,时间5s;所述2段退火是电解铜箔收卷后,与收卷轴一起放入烤炉中烘烤,所述烘烤温度80℃,时间6h,然后在自然状态下冷却至室温,即得到所述的一种可低温退火的电解铜箔。Step 4. Annealing treatment: including 1-stage annealing and 2-stage annealing. The 1-stage annealing is the electrolytic copper foil being baked in the oven during the winding process. The baking temperature is 140°C and the time is 5 seconds. The 2-stage annealing is after the electrolytic copper foil is rolled up and put into the oven together with the winding reel. Medium baking, the baking temperature is 80° C. for 6 hours, and then cooled to room temperature in a natural state to obtain the electrolytic copper foil that can be annealed at low temperature.
实施例3一种可低温退火的电解铜箔的制备方法Embodiment 3 A method for preparing electrolytic copper foil that can be annealed at low temperature
步骤1、制液:将铜线加于溶铜罐中,加入纯水、氧气和稀硫酸,经搅拌、加热、反应生成硫酸铜溶液;Step 1. Liquid preparation: Add copper wire to a copper-melting tank, add pure water, oxygen and dilute sulfuric acid, stir, heat and react to generate a copper sulfate solution;
步骤2、电解:将步骤1生成的硫酸铜溶液经过过滤器过滤后,输送至高位罐后加入氯离子和添加剂获得电解液,接着将电解液输送至电解槽中进行电解生产生箔。电解条件为电流密度为60A/m2,电解液的流量为35m3/h。Step 2. Electrolysis: After filtering the copper sulfate solution generated in step 1 through a filter, transport it to a high-level tank, add chlorine ions and additives to obtain an electrolyte, and then transport the electrolyte to the electrolytic tank for electrolysis to produce foil. The electrolysis conditions are that the current density is 60A/m 2 and the electrolyte flow rate is 35m 3 /h.
电解液中铜离子含量为90g/L,硫酸含量为120g/L,氯离子含量为1.5mg/L,添加剂总量18mg/L,电解液温度为48℃。The copper ion content in the electrolyte is 90g/L, the sulfuric acid content is 120g/L, the chloride ion content is 1.5mg/L, the total additive amount is 18mg/L, and the electrolyte temperature is 48°C.
所述添加剂为含有己基苄基铵盐(PPNI)、聚二硫二丙烷磺酸钠(SPS)、巯基咪唑丙磺酸钠(MESS)、羟乙基纤维素(HEC)、聚乙二醇(PEG)、四氢噻唑硫酮和聚乙烯亚胺的水溶液。其中,所述PPNI、SPS和MESS作为光亮剂,所述HEC和PEG作为走位剂,所述四氢噻唑硫酮和聚乙烯亚胺作为整平剂。所述整平剂、光亮剂和走位剂的质量比为0.5:1:2。The additives contain hexyl benzyl ammonium salt (PPNI), sodium polydisulfide propane sulfonate (SPS), sodium mercaptoimidazole propane sulfonate (MESS), hydroxyethyl cellulose (HEC), polyethylene glycol ( PEG), tetrahydrothiazolethione and polyethyleneimine in water. Among them, the PPNI, SPS and MESS are used as brighteners, the HEC and PEG are used as moving agents, and the tetrahydrothiazolethione and polyethyleneimine are used as leveling agents. The mass ratio of the leveling agent, brightening agent and positioning agent is 0.5:1:2.
所述HEC在20℃时2wt.%的水溶液中的粘度为500mPa.s,PEG分子量为4000Da;聚乙烯亚胺分子量为4000Da。The viscosity of the HEC in a 2wt.% aqueous solution at 20°C is 500mPa.s, the molecular weight of PEG is 4000Da, and the molecular weight of polyethyleneimine is 4000Da.
PPNI的浓度为1.5mg/L,SPS的浓度为3.0mg/L,MESS的浓度为1.5mg/L;HEC的浓度为3.0mg/L,PEG的浓度为3.0mg/L;四氢噻唑硫酮的浓度为4.0mg/L,聚乙烯亚胺的浓度为2.0mg/L。The concentration of PPNI is 1.5 mg/L, the concentration of SPS is 3.0 mg/L, and the concentration of MESS is 1.5 mg/L; the concentration of HEC is 3.0 mg/L, and the concentration of PEG is 3.0 mg/L; tetrahydrothiazolethione The concentration of polyethylenimine is 4.0mg/L, and the concentration of polyethyleneimine is 2.0mg/L.
步骤3、将步骤2电解工序生产得到的生箔进行表面处理:Step 3. Surface-treat the raw foil produced by the electrolysis process in Step 2:
(1)酸洗:酸洗槽中硫酸浓度为150g/L,温度为30℃;(1) Pickling: The sulfuric acid concentration in the pickling tank is 150g/L, and the temperature is 30°C;
(2)粗化1:粗化槽中含有粗化液,粗化液中的铜离子浓度为12g/L,硫酸浓度为120g/L,钨酸钠浓度为70mg/L,粗化液温度为30℃;粗化2:粗化槽中铜离子浓度为12g/L,硫酸浓度为120g/L,温度为34℃;粗化3:粗化槽中铜离子浓度为12g/L,硫酸浓度为150g/L,温度为34℃;(2) Coarse 1: The roughening tank contains a roughening liquid. The copper ion concentration in the roughening liquid is 12g/L, the sulfuric acid concentration is 120g/L, the sodium tungstate concentration is 70mg/L, and the roughening liquid temperature is 30°C; Coarse 2: The copper ion concentration in the roughening tank is 12g/L, the sulfuric acid concentration is 120g/L, and the temperature is 34°C; Coarse 3: The copper ion concentration in the roughening tank is 12g/L, and the sulfuric acid concentration is 12g/L. 150g/L, temperature is 34℃;
(3)固化1:固化槽中铜离子浓度为50g/L,硫酸浓度为120g/L,温度为40℃;固化2:固化槽中铜离子浓度为50g/L,硫酸浓度为120g/L,温度为40℃;固化3:固化槽中铜离子浓度为50g/L,硫酸浓度为120g/L,温度为40℃;(3) Curing 1: The concentration of copper ions in the solidification tank is 50g/L, the concentration of sulfuric acid is 120g/L, and the temperature is 40°C; Curing 2: The concentration of copper ions in the solidification tank is 50g/L, and the concentration of sulfuric acid is 120g/L. The temperature is 40°C; Curing 3: The copper ion concentration in the curing tank is 50g/L, the sulfuric acid concentration is 120g/L, and the temperature is 40°C;
(4)水洗:采用超纯水,温度35℃,pH7.2;(4) Water washing: use ultrapure water, temperature 35°C, pH 7.2;
(5)防氧化:防氧化处理槽中镍的浓度为2.5g/L,锌浓度为3.5g/L,K4P2O7浓度为70g/L,pH值为10,温度为35℃;(5) Anti-oxidation: The concentration of nickel in the anti-oxidation treatment tank is 2.5g/L, the concentration of zinc is 3.5g/L, the concentration of K 4 P 2 O 7 is 70g/L, the pH value is 10, and the temperature is 35°C;
(6)水洗:采用超纯水,温度35℃,pH7.2;(6) Water washing: use ultrapure water, temperature 35°C, pH 7.2;
(7)钝化:钝化处理槽中铬浓度为2.0g/L,K4P2O7浓度为100g/L,pH为11,温度为25℃。(7) Passivation: The chromium concentration in the passivation treatment tank is 2.0g/L, the K 4 P 2 O 7 concentration is 100g/L, the pH is 11, and the temperature is 25°C.
(8)水洗:采用超纯水,温度35℃,pH7.2;(8) Water washing: use ultrapure water, temperature 35°C, pH 7.2;
(9)硅烷喷涂:γ-氨丙基三乙氧基硅烷浓度为1.5g/L,pH为9,温度为25℃。(9) Silane spraying: The concentration of γ-aminopropyltriethoxysilane is 1.5g/L, the pH is 9, and the temperature is 25°C.
步骤4、退火处理:包含1段退火和2段退火处理。所述1段退火是电解铜箔收卷过程中经过烘箱烘烤,所述烘烤温度135℃,时间10s;所述2段退火是电解铜箔收卷后,与收卷轴一起放入烤炉中烘烤,所述烘烤温度70℃,时间7h,然后在自然状态下冷却至室温,即得到所述的一种可低温退火的电解铜箔。Step 4. Annealing treatment: including 1-stage annealing and 2-stage annealing. The 1-stage annealing is the electrolytic copper foil being baked in the oven during the winding process. The baking temperature is 135°C and the time is 10 seconds. The 2-stage annealing is after the electrolytic copper foil is rolled up and put into the oven together with the winding reel. Medium baking, the baking temperature is 70° C. for 7 hours, and then cooled to room temperature in a natural state to obtain the electrolytic copper foil that can be annealed at low temperature.
对比例1Comparative example 1
与实施例1相比,区别仅在于:Compared with Example 1, the only difference is:
步骤2中,所述电解液中添加剂总量为24mg/L,其中整平剂、光亮剂和走位剂按照质量配比2:3:2的比例存在于电解液中。所述光亮剂PPNI的浓度为1.5mg/L,SPS的浓度为3.0mg/L,MESS的浓度为1.5mg/L;所述走位剂HEC的浓度为4.0mg/L,PEG的浓度为4.0mg/L;所述整平剂四氢噻唑硫酮的浓度为4.0mg/L,聚乙烯亚胺的浓度为2.0mg/L。In step 2, the total amount of additives in the electrolyte is 24 mg/L, in which leveling agents, brighteners and moving agents are present in the electrolyte in a mass ratio of 2:3:2. The concentration of the brightening agent PPNI is 1.5 mg/L, the concentration of SPS is 3.0 mg/L, and the concentration of MESS is 1.5 mg/L; the concentration of the moving agent HEC is 4.0 mg/L, and the concentration of PEG is 4.0 mg/L; the concentration of the leveling agent tetrahydrothiazolethione is 4.0 mg/L, and the concentration of polyethyleneimine is 2.0 mg/L.
其他步骤均与实施例一相同。Other steps are the same as in Example 1.
对比例2Comparative example 2
与实施例1相比,区别仅在于:Compared with Example 1, the only difference is:
步骤2中,所述电解液中的PPNI的浓度为1.0mg/L,SPS的浓度为4.0mg/L,MESS的浓度为1.0mg/L;所述HEC的浓度为3.0mg/L,PEG的浓度为3.0mg/L;所述四氢噻唑硫酮的浓度为3.0mg/L,聚乙烯亚胺的浓度为3.0mg/L。In step 2, the concentration of PPNI in the electrolyte is 1.0 mg/L, the concentration of SPS is 4.0 mg/L, and the concentration of MESS is 1.0 mg/L; the concentration of HEC is 3.0 mg/L, and the concentration of PEG is The concentration is 3.0 mg/L; the concentration of tetrahydrothiazolethione is 3.0 mg/L, and the concentration of polyethyleneimine is 3.0 mg/L.
其他步骤均与实施例一相同。Other steps are the same as in Example 1.
对比例3Comparative example 3
与实施例1相比,区别仅在于:Compared with Example 1, the only difference is:
步骤3中,粗化1过程中所述钨酸钠浓度为100mg/L。In step 3, the concentration of sodium tungstate in the roughening process 1 is 100 mg/L.
步骤4中,所述1段退火是电解铜箔收卷过程中经过烘箱烘烤,所述烘烤温度150℃,时间5s;所述2段退火是电解铜箔收卷后,与收卷轴一起放入烤炉中烘烤,所述烘烤温度100℃,时间6h,然后在自然状态下冷却至室温,即得到所述的一种可低温退火的电解铜箔。In step 4, the 1-stage annealing is done by oven baking during the winding process of the electrolytic copper foil. The baking temperature is 150°C and the time is 5 seconds; the 2-stage annealing is done after the electrolytic copper foil is rolled up, together with the winding reel. Put it into an oven and bake it at a baking temperature of 100°C for 6 hours, and then cool it to room temperature in a natural state to obtain the electrolytic copper foil that can be annealed at low temperature.
其他步骤均与实施例一相同。Other steps are the same as in Example 1.
效果例Effect example
按照《GB-T 5230-2020印制板用电解铜箔》对实施例1-3和对比例1-3得到的可低温退火的电解铜箔进行测试,得到下表的物理性能。可以看出,本发明实施例1-3的可低温退火的电解铜箔,常温抗拉强度≥400MPa,常温延伸率≥10.0%,高温抗拉强度≥260MPa,高温延伸率≥21.0%,处理面粗糙度Rz≤2.00μm,剥离强度≥0.80N/mm,耐折次数≥3000次。符合检测标准,可为FCCL厂家提供高延伸率、高耐弯折性、低翘曲度的电解铜箔原料。The low-temperature annealable electrolytic copper foils obtained in Examples 1-3 and Comparative Examples 1-3 were tested in accordance with "GB-T 5230-2020 Electrolytic Copper Foil for Printed Boards", and the physical properties in the table below were obtained. It can be seen that the low-temperature annealable electrolytic copper foil of Examples 1-3 of the present invention has a tensile strength at room temperature ≥ 400MPa, an elongation at room temperature ≥ 10.0%, a tensile strength at high temperature ≥ 260MPa, and an elongation at high temperature ≥ 21.0%. Roughness Rz≤2.00μm, peel strength ≥0.80N/mm, folding resistance ≥3000 times. It meets the testing standards and can provide FCCL manufacturers with electrolytic copper foil raw materials with high elongation, high bending resistance and low warpage.
表1电解铜箔的物理性能Table 1 Physical properties of electrolytic copper foil
最后应当说明的是,以上内容仅用以说明本发明的技术方案,而非对本发明保护范围的限制,本领域的普通技术人员对本发明的技术方案进行的简单修改或者等同替换,均不脱离本发明技术方案的实质和范围。Finally, it should be noted that the above content is only used to illustrate the technical solution of the present invention, but does not limit the protection scope of the present invention. Simple modifications or equivalent substitutions of the technical solution of the present invention by those of ordinary skill in the art do not deviate from the scope of the present invention. The essence and scope of the technical solution of the invention.
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