CN117420083B - Online monitoring device and method for trace products of plasma erosion - Google Patents
Online monitoring device and method for trace products of plasma erosion Download PDFInfo
- Publication number
- CN117420083B CN117420083B CN202311743392.6A CN202311743392A CN117420083B CN 117420083 B CN117420083 B CN 117420083B CN 202311743392 A CN202311743392 A CN 202311743392A CN 117420083 B CN117420083 B CN 117420083B
- Authority
- CN
- China
- Prior art keywords
- light intensity
- trace
- light
- experimental
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003628 erosive effect Effects 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000012806 monitoring device Methods 0.000 title claims abstract description 9
- 239000002184 metal Substances 0.000 claims abstract description 22
- 238000004458 analytical method Methods 0.000 claims abstract description 15
- 238000012544 monitoring process Methods 0.000 claims abstract description 14
- 238000012545 processing Methods 0.000 claims abstract description 14
- 230000005855 radiation Effects 0.000 claims abstract description 9
- 239000013307 optical fiber Substances 0.000 claims description 24
- 230000005284 excitation Effects 0.000 claims description 10
- 239000000523 sample Substances 0.000 claims description 8
- 238000004364 calculation method Methods 0.000 claims description 7
- 238000004020 luminiscence type Methods 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 claims description 4
- 230000003595 spectral effect Effects 0.000 abstract description 12
- 238000001228 spectrum Methods 0.000 abstract description 6
- 238000012360 testing method Methods 0.000 abstract description 6
- 238000013461 design Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract 1
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 9
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 9
- NMFHJNAPXOMSRX-PUPDPRJKSA-N [(1r)-3-(3,4-dimethoxyphenyl)-1-[3-(2-morpholin-4-ylethoxy)phenyl]propyl] (2s)-1-[(2s)-2-(3,4,5-trimethoxyphenyl)butanoyl]piperidine-2-carboxylate Chemical compound C([C@@H](OC(=O)[C@@H]1CCCCN1C(=O)[C@@H](CC)C=1C=C(OC)C(OC)=C(OC)C=1)C=1C=C(OCCN2CCOCC2)C=CC=1)CC1=CC=C(OC)C(OC)=C1 NMFHJNAPXOMSRX-PUPDPRJKSA-N 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 230000004907 flux Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000000835 fiber Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 1
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 1
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
- G01N9/24—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity by observing the transmission of wave or particle radiation through the material
Landscapes
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Plasma Technology (AREA)
Abstract
一种等离子体侵蚀痕量产物在线监测装置及方法,涉及等离子体光谱测试技术领域,解决的技术问题为“如何进行等离子体推进器工部件侵蚀痕量产物监测”,该装置包括金属屏蔽罩,以及设置于所述金属屏蔽罩内部的第一凸透镜、第一反射镜、分光棱镜、第二凸透镜、光栅以及第二反射镜,以及设置于所述金属屏蔽罩外部的光电倍增管和分析处理设备;所述金属屏蔽罩侧壁上固定有入射光狭缝和出射光狭缝,所述出射光狭缝与所述光电倍增管连接,所述光电倍增管与所述分析处理设备连接;该装置及方法设计了光谱仪设备对痕量产物谱线光强进行监测,建立痕量物质辐射谱线强度和光强信号波动关系,以获得痕量产物绝对密度,可靠性高,监测灵敏。
A plasma erosion trace product online monitoring device and method, relating to the field of plasma spectrum testing technology, solving the technical problem of "how to monitor the erosion trace products of plasma thruster components", the device comprises a metal shielding cover, and a first convex lens, a first reflector, a dichroic prism, a second convex lens, a grating and a second reflector arranged inside the metal shielding cover, and a photomultiplier tube and an analysis and processing device arranged outside the metal shielding cover; an incident light slit and an exit light slit are fixed on the side wall of the metal shielding cover, the exit light slit is connected to the photomultiplier tube, and the photomultiplier tube is connected to the analysis and processing device; the device and method design a spectrometer device to monitor the light intensity of the trace product spectral line, establish the relationship between the intensity of the trace material radiation spectral line and the light intensity signal fluctuation, so as to obtain the absolute density of the trace product, with high reliability and sensitive monitoring.
Description
技术领域Technical Field
本发明涉及等离子体光谱测试技术领域。The invention relates to the technical field of plasma spectrum testing.
背景技术Background technique
等离子体推进器是电推进系统核心设备,其承担着卫星推进与姿态调控的重要作用,其性能状态直接决定了推进系统的状态。Plasma thruster is the core equipment of electric propulsion system. It plays an important role in satellite propulsion and attitude control. Its performance status directly determines the status of the propulsion system.
等离子体推进器传统寿命考核测试成本高昂,且需要大量的时间,不利于工程单位快速迭代优化设计。实际上,有研究表明,等离子体推进器寿命失效的原因主要是部件侵蚀,例如,空心阴极发射体侵蚀和霍尔推力器壁面侵蚀导致推力器失效。因此,监测等离子体推进器部件侵蚀痕量产物是评估等离子体推进器寿命的有效的手段,而发射光谱方法具备原位、即时、无侵扰的特点,其可用于等离子体推进器部件侵蚀痕量产物的监测。实际上,等离子体侵蚀痕量产物密度相比于推力器主体放电工质密度而言,其数量级要低数倍,需要设计光谱仪设备,使其具备监测痕量产物的能力。Traditional life assessment tests for plasma thrusters are costly and time-consuming, which is not conducive to rapid iteration and optimization of designs by engineering units. In fact, studies have shown that the main cause of life failure of plasma thrusters is component erosion. For example, hollow cathode emitter erosion and Hall thruster wall erosion lead to thruster failure. Therefore, monitoring trace products of erosion of plasma thruster components is an effective means to evaluate the life of plasma thrusters. The emission spectroscopy method has the characteristics of in-situ, immediate, and non-intrusive, and can be used to monitor trace products of erosion of plasma thruster components. In fact, the density of trace products of plasma erosion is several times lower than the density of the discharge working fluid of the thruster body, and it is necessary to design a spectrometer device to enable it to monitor trace products.
然而,现有的其他领域的光谱测定方法所测的信号具有强信号的特征,其不涉及对痕量物质的弱信号的测试与分析,故而不适用于等离子体推进器寿命评估中痕量弱信号的采集,若直接应用存在无法测得痕量产物信号的问题。However, the signals measured by existing spectral measurement methods in other fields have the characteristics of strong signals, and do not involve the testing and analysis of weak signals of trace substances. Therefore, they are not suitable for the collection of trace weak signals in plasma thruster life assessment. If directly applied, there is a problem of not being able to measure trace product signals.
因此,如何解决等离子体推进器工部件侵蚀痕量产物监测的问题,成为本领域亟待解决的技术问题。Therefore, how to solve the problem of monitoring trace corrosion products of plasma thruster components has become a technical problem that needs to be solved urgently in this field.
发明内容Summary of the invention
为了解决上述技术问题,本发明提供了一种等离子体侵蚀痕量产物在线监测装置及方法,该装置设计了光谱仪设备对痕量产物谱线光强进行监测,建立痕量物质辐射谱线强度和光强信号波动关系,以获得痕量产物绝对密度,可靠性高,监测灵敏。In order to solve the above technical problems, the present invention provides an online monitoring device and method for trace products of plasma erosion. The device is designed with a spectrometer to monitor the light intensity of the trace product spectral lines, establishes the relationship between the intensity of the trace substance radiation spectral lines and the light intensity signal fluctuation, so as to obtain the absolute density of the trace product, with high reliability and sensitive monitoring.
一种等离子体侵蚀痕量产物在线监测装置,包括金属屏蔽罩,以及设置于所述金属屏蔽罩内部的第一凸透镜、第一反射镜、分光棱镜、第二凸透镜、光栅以及第二反射镜,以及设置于所述金属屏蔽罩外部的光电倍增管和分析处理设备;A plasma erosion trace product online monitoring device comprises a metal shield, and a first convex lens, a first reflector, a beam splitter, a second convex lens, a grating and a second reflector arranged inside the metal shield, and a photomultiplier tube and an analysis and processing device arranged outside the metal shield;
所述金属屏蔽罩侧壁上固定有入射光狭缝和出射光狭缝,所述出射光狭缝与所述光电倍增管连接,所述光电倍增管与所述分析处理设备连接;所述第一凸透镜靠近所述入射光狭缝设置于所述金属屏蔽罩内,所述第一反射镜与所述第一凸透镜对应设置;An incident light slit and an exit light slit are fixed on the side wall of the metal shield, the exit light slit is connected to the photomultiplier tube, and the photomultiplier tube is connected to the analysis and processing equipment; the first convex lens is arranged in the metal shield close to the incident light slit, and the first reflector is arranged corresponding to the first convex lens;
所述入射光狭缝收集到的等离子体辐射光依次经过所述第一凸透镜、所述第一反射镜、所述分光棱镜、所述第二凸透镜、所述光栅以及所述第二反射镜,并经所述出射光狭缝入射至所述光电倍增管,所述光电倍增管将获取到的实验光强信息传输至所述分析处理设备;The plasma radiation light collected by the incident light slit passes through the first convex lens, the first reflector, the beam splitter, the second convex lens, the grating and the second reflector in sequence, and is incident on the photomultiplier tube through the exit light slit, and the photomultiplier tube transmits the acquired experimental light intensity information to the analysis and processing equipment;
所述分析处理设备包括如下模块:The analysis and processing device includes the following modules:
光强采集模块,用于采集痕量产物波长范围内的实验光强信息;Light intensity acquisition module, used to collect experimental light intensity information within the wavelength range of trace products;
波动误差计算模块,用于基于所述实验光强计算实验光强波动导致的波动误差;A fluctuation error calculation module, used for calculating the fluctuation error caused by the experimental light intensity fluctuation based on the experimental light intensity;
关系建立模块,用于建立理论光强与所述实验光强的关系;A relationship building module, used to establish the relationship between the theoretical light intensity and the experimental light intensity;
痕量产物密度计算模块,用于基于所述波动误差以及所述理论光强与所述实验光强的关系,计算痕量产物的密度;A trace product density calculation module, used to calculate the density of the trace product based on the fluctuation error and the relationship between the theoretical light intensity and the experimental light intensity;
其中,所述理论光强通过如下公式表示:Wherein, the theoretical light intensity is expressed by the following formula:
Imodel=ε×ne×ni×Qi;Imodel=ε× ne × ni × Qi ;
其中,ε为入射光狭缝接收到等离子体辐射的光比例,ne为电子密度,ni为痕量产物密度,Qi为激发速率系数,Imodel表示理论上痕量产物发光的强度,即理论光强。Among them, ε is the proportion of light radiated by the plasma received by the incident light slit, ne is the electron density, ni is the trace product density, Qi is the excitation rate coefficient, and Imodel represents the theoretical intensity of the trace product luminescence, that is, the theoretical light intensity.
进一步地,所述入射光狭缝宽度为25um。Furthermore, the incident light slit width is 25 um.
进一步地,所述入射光狭缝外接SMA接头,所述SMA接头连接光纤,所述光纤另外一侧用于接收等离子体区域辐射的光,所述光纤为芯心为1000um的高透深紫外光纤。Furthermore, the incident light slit is externally connected to an SMA connector, the SMA connector is connected to an optical fiber, the other side of the optical fiber is used to receive light radiated from the plasma region, and the optical fiber is a high-transmittance deep ultraviolet optical fiber with a core of 1000um.
进一步地,所述装置还包括光栅角度调控部件,所述光栅角度调控部件设于所述金属屏蔽罩与入射光狭缝的所述侧壁相邻的侧壁,所述光栅角度调控部件与所述光栅连接。Furthermore, the device also includes a grating angle control component, which is disposed on a side wall of the metal shielding cover adjacent to the side wall of the incident light slit, and the grating angle control component is connected to the grating.
一种等离子体侵蚀痕量产物在线监测方法,应用上述装置,包括如下步骤:An online monitoring method for trace products of plasma erosion, using the above device, comprises the following steps:
采集痕量产物波长范围内的实验光强信息;Collect experimental light intensity information within the wavelength range of trace products;
基于所述实验光强计算实验光强波动导致的波动误差;Calculating a fluctuation error caused by fluctuations in the experimental light intensity based on the experimental light intensity;
建立理论光强与所述实验光强的关系;Establishing the relationship between the theoretical light intensity and the experimental light intensity;
基于所述波动误差以及所述理论光强与所述实验光强的关系,计算痕量产物的密度。Based on the fluctuation error and the relationship between the theoretical light intensity and the experimental light intensity, the density of the trace product is calculated.
进一步地,采集痕量产物波长范围内的实验光强信息时,在连续时间采集预设次数,所述预设次数为100次。Furthermore, when collecting experimental light intensity information within the wavelength range of trace products, a preset number of times is collected in a continuous time, and the preset number of times is 100 times.
进一步地,所述痕量产物波长范围为:波长中心为250nm,范围是1nm的区域。Furthermore, the wavelength range of the trace product is: the wavelength center is 250nm and the range is 1nm.
进一步地,所述痕量产物的密度通过如下公式计算:Further, the density of the trace product is calculated by the following formula:
ni=erro2/(ε×ne×Qi);n i =erro 2 /(ε× ne ×Q i );
其中,ε为入射光狭缝接收到等离子体辐射的光比例,ne为电子密度,ni为痕量产物密度,Qi为激发速率系数,erro为波动误差。Among them, ε is the proportion of light radiated by the plasma received by the incident light slit, ne is the electron density, ni is the trace product density, Qi is the excitation rate coefficient, and erro is the fluctuation error.
进一步地,ε为0.01,ne取空心阴极设备探针测量电子密度值,值为1011cm-3;Furthermore, ε is 0.01, and n e is the electron density value measured by the probe of the hollow cathode device, which is 10 11 cm -3 ;
所述激发速率系数表示如下:The excitation rate coefficient is expressed as follows:
Qi=2.56×10-8×Te (0.193)×exp(-3.93/Te); Qi = 2.56 × 10-8 × Te (0.193) × exp (-3.93/ Te );
其中,Te取空心阴极设备探针测量电子温度值,值为3eV。Here, Te is the electron temperature value measured by the probe of the hollow cathode device, which is 3eV.
本发明提供的等离子体侵蚀痕量产物在线监测装置及方法,至少包括如下有益效果:The device and method for online monitoring of trace products of plasma erosion provided by the present invention have at least the following beneficial effects:
(1)设计了光谱仪设备对痕量产物谱线光强进行监测,等离子体辐射光进入装置内部后,经分光棱镜和光栅两次分光以及发散汇聚后,被光电倍增管接收,在连续时间内多次接收被测量的光谱强度,建立痕量物质辐射谱线强度和光强信号波动关系,以获得痕量产物绝对密度,相较于传统测试方法,该监测方法可靠性高,监测灵敏;(1) A spectrometer was designed to monitor the light intensity of the trace product spectrum. After the plasma radiation light enters the device, it is split twice by the beam splitter and grating, and then diverges and converges before being received by the photomultiplier tube. The measured spectral intensity is received multiple times in a continuous period of time, and the relationship between the intensity of the trace substance radiation spectrum and the light intensity signal fluctuation is established to obtain the absolute density of the trace product. Compared with traditional testing methods, this monitoring method has high reliability and sensitive monitoring.
(2)在连续时间内多次接收被测量的光谱强度,能够更好地衡量痕量产物光强的波动性。(2) Receiving the measured spectral intensity multiple times in a continuous period of time can better measure the volatility of the trace product light intensity.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
图1为本发明提供的等离子体侵蚀痕量产物在线监测装置一种实施例的光路图;FIG1 is a light path diagram of an embodiment of an online monitoring device for plasma erosion trace products provided by the present invention;
图2为等离子体侵蚀痕量产物在线监测方法一种实施例的流程图;FIG2 is a flow chart of an embodiment of an online monitoring method for trace products of plasma erosion;
附图标记:1-金属屏蔽罩,2-入射光狭缝,3-第一凸透镜,4-第一反射镜,5-分光棱镜,6-第二凸透镜,7-光栅,8-第二反射镜,9-出射光狭缝,10-光电倍增管,11-精密机械步进调控台。Figure numerals: 1-metal shielding cover, 2-incident light slit, 3-first convex lens, 4-first reflector, 5-beam splitter prism, 6-second convex lens, 7-grating, 8-second reflector, 9-exit light slit, 10-photomultiplier tube, 11-precision mechanical stepping control console.
具体实施方式Detailed ways
为了更好的理解上述技术方案,下面将结合说明书附图以及具体的实施方式对上述技术方案做详细的说明。In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.
下面详细描述本申请的实施例,所述实施例的实例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件,下面通过参考附图的实施例是示例性的,旨在用于解释本申请,而不能理解为对本申请的限制。The embodiments of the present application are described in detail below. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements with the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present application, but should not be construed as limitations on the present application.
在本申请的描述中,需要说明的是,术语“中心”、“纵向”、“横向”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。In the description of the present application, it should be noted that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请中“多个”的含义是两个或两个以上,除非另有明确具体的限定。In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.
在本申请中,除非另有明确的规定和限定,“安装”、“相连”、“连接”“连通”等术语应做广义理解,例如,可以是机械连接,也可以是电连接,可以是直接连接,也可以是通过中间媒介间接连接,还可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。In this application, unless otherwise clearly specified and limited, the terms such as "installed", "connected", "connected", "connected" and "connected" should be understood in a broad sense, for example, it can be a mechanical connection or an electrical connection, it can be a direct connection or an indirect connection through an intermediate medium, it can also be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.
实施例一:Embodiment 1:
参见图1,在一些实施例中,提供一种等离子体侵蚀痕量产物在线监测装置,包括金属屏蔽罩1,以及设置于所述金属屏蔽罩1内部的第一凸透镜3、第一反射镜4、分光棱镜5、第二凸透镜6、光栅7以及第二反射镜8,以及设置于所述金属屏蔽罩1外部的光电倍增管10和分析处理设备;Referring to FIG. 1 , in some embodiments, there is provided an online monitoring device for trace products of plasma erosion, comprising a metal shield 1, and a first convex lens 3, a first reflector 4, a beam splitter prism 5, a second convex lens 6, a grating 7 and a second reflector 8 arranged inside the metal shield 1, and a photomultiplier tube 10 and an analysis and processing device arranged outside the metal shield 1;
所述金属屏蔽罩1侧壁上固定有入射光狭缝2和出射光狭缝9,所述出射光狭缝9与所述光电倍增管10连接,所述光电倍增管10与所述分析处理设备连接;入射光狭缝2用于将收集等离子体辐射光。所述第一凸透镜3靠近所述入射光狭缝2设置于所述金属屏蔽罩1内,所述第一反射镜4与所述第一凸透镜3对应设置;An incident light slit 2 and an exit light slit 9 are fixed on the side wall of the metal shield 1. The exit light slit 9 is connected to the photomultiplier tube 10, and the photomultiplier tube 10 is connected to the analysis and processing equipment; the incident light slit 2 is used to collect plasma radiation light. The first convex lens 3 is arranged in the metal shield 1 close to the incident light slit 2, and the first reflector 4 is arranged corresponding to the first convex lens 3;
所述入射光狭缝2前接SMA905接头的光纤,光纤另一端放置在待监测区域收集等离子体辐射出来的光,而后从入射光狭缝2依次经过所述第一凸透镜3、所述第一反射镜4、所述分光棱镜5、所述第二凸透镜6、所述光栅7以及所述第二反射镜8,并经所述出射光狭缝9入射至所述光电倍增管10,所述光电倍增管10将获取到的实验光强信息传输至所述分析处理设备。The incident light slit 2 is connected to an optical fiber with an SMA905 connector in front, and the other end of the optical fiber is placed in the monitored area to collect the light radiated by the plasma. The light then passes through the first convex lens 3, the first reflector 4, the beam splitter prism 5, the second convex lens 6, the grating 7 and the second reflector 8 in sequence from the incident light slit 2, and is incident on the photomultiplier tube 10 through the exit light slit 9. The photomultiplier tube 10 transmits the acquired experimental light intensity information to the analysis and processing equipment.
所述分析处理设备包括如下模块:The analysis and processing device includes the following modules:
光强采集模块,用于采集痕量产物波长范围内的实验光强信息;Light intensity acquisition module, used to collect experimental light intensity information within the wavelength range of trace products;
波动误差计算模块,用于基于所述实验光强计算实验光强波动导致的波动误差;A fluctuation error calculation module, used for calculating the fluctuation error caused by the experimental light intensity fluctuation based on the experimental light intensity;
关系建立模块,用于建立理论光强与所述实验光强的关系;A relationship building module, used to establish the relationship between the theoretical light intensity and the experimental light intensity;
痕量产物密度计算模块,用于基于所述波动误差以及所述理论光强与所述实验光强的关系,计算痕量产物的密度。The trace product density calculation module is used to calculate the density of the trace product based on the fluctuation error and the relationship between the theoretical light intensity and the experimental light intensity.
优选的,所述第一反射镜4的法向与来自所述第一凸透镜3的入射光束成45度角。Preferably, the normal direction of the first reflector 4 forms an angle of 45 degrees with the incident light beam from the first convex lens 3 .
优选的,所述入射光狭缝2宽度为25um,所述入射光狭缝2外接SMA接头,所述SMA接头用于插入光纤,所述光纤另外一侧用于接收等离子体区域辐射的光,所述光纤为芯心为1000um的高透深紫外光纤。需要说明的是,狭缝的大小会影响分辨率和光通量,一般而言,狭缝越小分辨率越高,但光通量就越小,光通道小会让信号强度降低,设备难以测得。故而,为了兼顾分辨率和光通量,选择了25um的尺寸。Preferably, the incident light slit 2 has a width of 25um, and the incident light slit 2 is externally connected to an SMA connector, and the SMA connector is used to insert an optical fiber, and the other side of the optical fiber is used to receive light radiated from the plasma region, and the optical fiber is a high-transmittance deep ultraviolet optical fiber with a core of 1000um. It should be noted that the size of the slit will affect the resolution and luminous flux. Generally speaking, the smaller the slit, the higher the resolution, but the smaller the luminous flux. A small optical channel will reduce the signal strength and make it difficult for the device to measure. Therefore, in order to take into account both resolution and luminous flux, a size of 25um was selected.
所述装置还包括光栅7角度调控部件,所述光栅7角度调控部件设于所述金属屏蔽罩1与入射光狭缝2的所述侧壁相邻的侧壁,所述光栅7角度调控部件与所述光栅7连接。The device further comprises a grating 7 angle control component, wherein the grating 7 angle control component is disposed on a side wall of the metal shielding cover 1 adjacent to the side wall of the incident light slit 2 , and the grating 7 angle control component is connected to the grating 7 .
优选的,光栅7角度调控部件为精密机械步进调控台11,所述精密机械步进调控台11与所述光栅7连接,用于控制所述光栅7的角度。Preferably, the angle control component of the grating 7 is a precision mechanical stepping control platform 11 , and the precision mechanical stepping control platform 11 is connected to the grating 7 for controlling the angle of the grating 7 .
工作时,经所述入射光狭缝2收集到的光束传播至第一凸透镜3,第一凸透镜3将光纤汇聚,光纤变为平行光;再入射至所述第一反射镜4,光束经三角形第一反射镜4传播方向改变90度,并入射至分光棱镜5,所述光束经所述分光棱镜5发生色散,分光棱镜5的作用为将复色光分解为单色光,再入射至所述第二凸透镜6,第二凸透镜6将光束汇聚;所述光束经所述第二凸透镜6汇聚入射至所述光栅7进行分光,经分光棱镜5和光栅7两次分光的光束,进一步传播至第二反射镜8;光束被出射光狭缝9接收,并入射到光电倍增管10探测器上,转化为可分析处理的电信号。光电倍增管10接收到的光的波段与光栅7偏转角度相关,光栅7偏转角度可由精密机械步进调控台11控制。至此,等离子体辐射出的光经分光后被光电倍增管10接收。During operation, the light beam collected by the incident light slit 2 propagates to the first convex lens 3, which converges the optical fiber and converts it into parallel light; then it is incident on the first reflector 4, and the propagation direction of the light beam changes by 90 degrees through the triangular first reflector 4, and is incident on the beam splitter prism 5, and the light beam is dispersed by the beam splitter prism 5, and the function of the beam splitter prism 5 is to decompose the complex light into monochromatic light, and then it is incident on the second convex lens 6, and the second convex lens 6 converges the light beam; the light beam is converged by the second convex lens 6 and incident on the grating 7 for splitting, and the light beam split twice by the beam splitter prism 5 and the grating 7 is further propagated to the second reflector 8; the light beam is received by the exit light slit 9, and is incident on the detector of the photomultiplier tube 10, and is converted into an electrical signal that can be analyzed and processed. The wavelength band of the light received by the photomultiplier tube 10 is related to the deflection angle of the grating 7, and the deflection angle of the grating 7 can be controlled by the precision mechanical stepping control table 11. At this point, the light radiated by the plasma is received by the photomultiplier tube 10 after splitting.
以上为监测装置通用性描述,现结合具体应用场景,以航天电推进空心阴极设备发射体侵蚀痕量产物B原子谱线的监测为例,进一步说明前述装置的实施与方法的应用。The above is a general description of the monitoring device. Now, combined with specific application scenarios, taking the monitoring of B atomic spectral lines of trace products of emitter erosion in aerospace electric propulsion hollow cathode equipment as an example, the implementation of the aforementioned device and the application of the method are further explained.
航天电推进空心阴极设备侵蚀产物B原子典型波长为249.68nm和249.77nm。因此光谱仪系统需要提取波长中心为250nm范围是1nm的区域的谱线。通过调整精密机械步进调控台11,控制光栅7的角度,可实现上述目的。The typical wavelengths of the B atoms of the erosion products of the hollow cathode equipment of aerospace electric propulsion are 249.68nm and 249.77nm. Therefore, the spectrometer system needs to extract the spectrum line in the region with a wavelength center of 250nm and a range of 1nm. The above purpose can be achieved by adjusting the precision mechanical stepping control table 11 to control the angle of the grating 7.
等离子体辐射的光进入光谱仪系统是通过光纤导光完成的。光纤一端通过光纤耦合器固定再真空罐中监测电推进空心阴极设备发光区域,另一端固定在过真空光纤馈通法兰上。真空罐外用一根光纤,光纤一侧连接在过真空光纤馈通法兰上,另一侧旋拧在光谱仪入射狭缝SMA接口处。优选的,光纤选择芯心为1000um的高透深紫外光纤。需要说明的是,痕量产物的信号出现的波长的位置为紫外信号,若采用非紫外光纤则会因为光纤的原因降低信号,会使本来就很弱的信号还损失一部分,信号更弱难以测得。而芯心为1000um能够增加光通量,以便于提高信号的信噪比。The light radiated by the plasma enters the spectrometer system through optical fiber light guidance. One end of the optical fiber is fixed in the vacuum tank through a fiber coupler to monitor the light-emitting area of the electric propulsion hollow cathode device, and the other end is fixed on the through-vacuum fiber feedthrough flange. An optical fiber is used outside the vacuum tank, one side of the optical fiber is connected to the through-vacuum fiber feedthrough flange, and the other side is screwed on the SMA interface of the spectrometer entrance slit. Preferably, the optical fiber selects a high-transmittance deep ultraviolet optical fiber with a core of 1000um. It should be noted that the wavelength position of the signal of the trace product is the ultraviolet signal. If a non-ultraviolet optical fiber is used, the signal will be reduced due to the optical fiber, which will cause the already weak signal to lose part, and the signal will be weaker and difficult to measure. The core of 1000um can increase the light flux, so as to improve the signal-to-noise ratio of the signal.
至此,电推进空心阴极设备等离子体辐射的复色光,经光谱仪系统处理,被光电倍增管10探测并接收。控制光电倍增管10设置,可实现连续时间采集。优选的,等离子体空心阴极设备在一个工况下,连续时间采集100次,以衡量痕量产物光强的波动性。At this point, the complex light radiated by the plasma of the electric propulsion hollow cathode device is processed by the spectrometer system and detected and received by the photomultiplier tube 10. The photomultiplier tube 10 is controlled to achieve continuous time acquisition. Preferably, the plasma hollow cathode device is continuously collected 100 times under one working condition to measure the volatility of the light intensity of the trace product.
实施例二:Embodiment 2:
参见图2,在一些实施例中,提供一种等离子体侵蚀痕量产物在线监测方法,应用上述装置,包括如下步骤:Referring to FIG. 2 , in some embodiments, a method for online monitoring of trace products of plasma erosion is provided, using the above-mentioned device, comprising the following steps:
S1、采集痕量产物波长范围内的实验光强信息;S1. Collecting experimental light intensity information within the wavelength range of trace products;
S2、基于所述实验光强计算实验光强波动导致的波动误差;S2. calculating a fluctuation error caused by fluctuations in the experimental light intensity based on the experimental light intensity;
S3、建立理论光强与所述实验光强的关系;S3, establishing the relationship between the theoretical light intensity and the experimental light intensity;
S4、基于所述波动误差以及所述理论光强与所述实验光强的关系,计算痕量产物的密度。S4. Calculate the density of the trace product based on the fluctuation error and the relationship between the theoretical light intensity and the experimental light intensity.
具体地,步骤S1中,采集痕量产物波长范围内的实验光强信息时,在连续时间采集预设次数,所述预设次数为100次。Specifically, in step S1, when collecting experimental light intensity information within the wavelength range of trace products, a preset number of times is collected in a continuous time, and the preset number of times is 100 times.
采集过程中,采集痕量产物波长范围内的实验光强信息是通过调整光栅7角度实现的。所述痕量产物波长范围为:波长中心为250nm,范围是1nm的区域。During the collection process, the experimental light intensity information within the wavelength range of the trace product is collected by adjusting the angle of the grating 7. The wavelength range of the trace product is: the wavelength center is 250nm, and the range is 1nm.
步骤S3中,所述理论光强通过如下公式表示:In step S3, the theoretical light intensity is expressed by the following formula:
Imodel=ε×ne×ni×Qi;Imodel=ε× ne × ni × Qi ;
其中,ε为入射光狭缝接收到等离子体辐射的光比例,ne为电子密度,ni为痕量产物密度,Qi为激发速率系数,Imodel表示理论上痕量产物发光的强度,即理论光强。Among them, ε is the proportion of light radiated by the plasma received by the incident light slit, ne is the electron density, ni is the trace product density, Qi is the excitation rate coefficient, and Imodel represents the theoretical intensity of the trace product luminescence, that is, the theoretical light intensity.
步骤S4中,所述痕量产物的密度通过如下公式计算:In step S4, the density of the trace product is calculated by the following formula:
ni=erro2/(ε×ne×Qi);n i =erro 2 /(ε× ne ×Q i );
其中,ε为入射光狭缝接收到等离子体辐射的光比例,ne为电子密度,ni为痕量产物密度,Qi为激发速率系数。Among them, ε is the proportion of light radiated by the plasma received by the incident light slit, ne is the electron density, ni is the trace product density, and Qi is the excitation rate coefficient.
作为一种较优的实施方式,ε为0.01,ne取空心阴极设备探针测量电子密度值,值为1011cm-3;As a preferred implementation, ε is 0.01, and n e is the electron density value measured by the probe of the hollow cathode device, which is 10 11 cm -3 ;
所述激发速率系数表示如下:The excitation rate coefficient is expressed as follows:
Qi=2.56×10-8×Te (0.193)×exp(-3.93/Te); Qi = 2.56 × 10-8 × Te (0.193) × exp (-3.93/ Te );
其中,Te取空心阴极设备探针测量电子温度值,值为3eV。Here, Te is the electron temperature value measured by the probe of the hollow cathode device, which is 3eV.
具体的推导计算过程如下:The specific derivation and calculation process is as follows:
识别痕量产物光谱,并将其光强记为Ii(i=1-100)。The trace product spectrum was identified and its intensity was recorded as I i (i=1-100).
实验光强波动导致的误差通过如下公式表示:The error caused by the experimental light intensity fluctuation is expressed by the following formula:
erro=( Ii-Ii’)/ Ii’,i=1-100;erro=(I i -I i ')/I i ',i=1-100;
其中,Ii’为实验多次采集平均值,erro为实验光强波动导致的误差。Among them, I i ' is the average value of multiple experimental acquisitions, and erro is the error caused by experimental light intensity fluctuations.
再计算理论上痕量产物发光的强度如下:The theoretical luminescence intensity of the trace product is calculated as follows:
Imodel=ε×ne×ni×Qi;I model =ε×n e ×n i ×Q i ;
其中,ε为入射光狭缝接收到等离子体辐射的光比例,由光纤与辐射光的几何光学关系决定,ne为电子密度,ni为痕量产物密度,Qi为激发速率系数, Imodel表示理论上痕量产物发光的强度。Among them, ε is the proportion of light radiated by the plasma received by the incident light slit, which is determined by the geometric optical relationship between the optical fiber and the radiated light, ne is the electron density, ni is the trace product density, Qi is the excitation rate coefficient, and Imodel represents the theoretical intensity of the trace product luminescence.
在本实施例中,ε为0.01,ne取空心阴极设备探针测量电子密度值,其值为1011cm-3,Te取空心阴极设备探针测量电子温度值,其值得为3eV。Qi为2.56×10-8×Te (0.193)×exp(-3.93/Te)。In this embodiment, ε is 0.01, ne is the electron density value measured by the hollow cathode device probe, which is 10 11 cm -3 , Te is the electron temperature value measured by the hollow cathode device probe, which is 3 eV. Qi is 2.56×10 -8 × Te (0.193) ×exp(-3.93/ Te ).
实验光强波动和实验光强绝对强度的关系为:The relationship between the experimental light intensity fluctuation and the absolute intensity of the experimental light intensity is:
erro=1./sqrt(Imodel);erro = 1./sqrt(I model );
erro=1./sqrt(ε×ne×ni×Qi);erro = 1./sqrt(ε×ne×ni×Qi ) ;
erro=( Ii-Ii’)/ Ii’, i=1-100;erro=(I i -I i ')/I i ', i=1-100;
从而得到痕量产物的密度表示如下:The density of the trace product is expressed as follows:
ni=erro2/(ε×ne×Qi)。n i =erro 2 /(ε× ne ×Q i ).
本实施例提供的等离子体侵蚀痕量产物在线监测装置及方法,设计了光谱仪设备对痕量产物谱线光强进行监测,等离子体辐射光进入装置内部后,经分光棱镜和光栅两次分光以及发散汇聚后,被光电倍增管接收,在连续时间内多次接收被测量的光谱强度,建立痕量物质辐射谱线强度和光强信号波动关系,以获得痕量产物绝对密度,相较于传统测试方法,该监测方法可靠性高,监测灵敏;在连续时间内多次接收被测量的光谱强度,能够更好地衡量痕量产物光强的波动性。The plasma erosion trace product online monitoring device and method provided in the present embodiment are designed with a spectrometer device to monitor the trace product spectral line light intensity. After the plasma radiation light enters the interior of the device, it is split twice by a beam splitter prism and a grating and diverged and converged before being received by a photomultiplier tube. The measured spectral intensity is received multiple times in a continuous time, and a relationship between the trace substance radiation spectral line intensity and the light intensity signal fluctuation is established to obtain the trace product absolute density. Compared with the traditional testing method, the monitoring method has high reliability and sensitive monitoring. The measured spectral intensity is received multiple times in a continuous time, which can better measure the volatility of the trace product light intensity.
尽管已描述了本发明的优选实施例,但本领域内的技术人员一旦得知了基本创造性概念,则可对这些实施例作出另外的变更和修改。所以,所附权利要求意欲解释为包括优选实施例以及落入本发明范围的所有变更和修改。显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。Although preferred embodiments of the present invention have been described, additional changes and modifications may be made to these embodiments by those skilled in the art once the basic inventive concepts are known. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications that fall within the scope of the present invention. Obviously, those skilled in the art may make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311743392.6A CN117420083B (en) | 2023-12-19 | 2023-12-19 | Online monitoring device and method for trace products of plasma erosion |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311743392.6A CN117420083B (en) | 2023-12-19 | 2023-12-19 | Online monitoring device and method for trace products of plasma erosion |
Publications (2)
Publication Number | Publication Date |
---|---|
CN117420083A CN117420083A (en) | 2024-01-19 |
CN117420083B true CN117420083B (en) | 2024-04-09 |
Family
ID=89527055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202311743392.6A Active CN117420083B (en) | 2023-12-19 | 2023-12-19 | Online monitoring device and method for trace products of plasma erosion |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN117420083B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN118090517B (en) * | 2024-04-19 | 2024-07-30 | 哈尔滨工业大学 | Optical monitoring method for erosion products on the wall of Hall thruster channel |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2003232523A1 (en) * | 2002-06-19 | 2004-01-06 | The Australian National University | A plasma beam generator |
JP2006145295A (en) * | 2004-11-17 | 2006-06-08 | Varian Inc | Trace-amount gas detection by real-time gas chromatography mass spectrometry |
WO2007007003A2 (en) * | 2005-07-12 | 2007-01-18 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method for plasma treatment of gas effluents |
JP2007315945A (en) * | 2006-05-26 | 2007-12-06 | Nippon Steel Corp | Method and apparatus for analyzing component of molten metal in refining furnace |
WO2012096592A1 (en) * | 2011-07-18 | 2012-07-19 | Закрытое Акционерное Общество "Техмаш" | Method for producing a ponderomotive effect and "annihilation" propulsors |
WO2015062445A1 (en) * | 2013-10-30 | 2015-05-07 | 清华大学 | Spectrum analysis system |
CN106442697A (en) * | 2016-11-24 | 2017-02-22 | 哈尔滨工业大学 | A Method for Measuring Corrosion Products of Hollow Cathode |
CN107228829A (en) * | 2017-06-07 | 2017-10-03 | 哈尔滨工业大学 | The on-Line Monitor Device and method of electronics and atomic parameter in a kind of krypton working medium hall thruster discharge channel |
CN107228830A (en) * | 2017-06-05 | 2017-10-03 | 哈尔滨工业大学 | A kind of optical monitoring system of electric thruster hollow cathode corrosion product |
WO2020117354A2 (en) * | 2018-09-28 | 2020-06-11 | Phase Four, Inc. | Optimized rf-sourced gridded ion thruster and components |
CN113804671A (en) * | 2021-10-20 | 2021-12-17 | 苏州灵析精密仪器有限公司 | A high-sensitivity Raman spectroscopy detection system |
WO2023238928A1 (en) * | 2022-06-10 | 2023-12-14 | 国立大学法人北海道大学 | Plasma measurement device |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4416522B2 (en) * | 2004-01-26 | 2010-02-17 | キヤノン株式会社 | Spectrometer |
US7791260B2 (en) * | 2006-07-26 | 2010-09-07 | The Regents Of The University Of Michigan | Gas-fed hollow cathode keeper and method of operating same |
FR2938066B1 (en) * | 2008-11-06 | 2010-12-17 | Centre Nat Rech Scient | SYSTEM AND METHOD FOR QUANTITATIVE ANALYSIS OF THE ELEMENTARY COMPOSITION OF LASER-INDUCED PLASMA SPECTROSCOPY MATERIAL (LIBS) |
US20150128560A1 (en) * | 2013-10-04 | 2015-05-14 | The Regents Of The University Of California | Magnetically shielded miniature hall thruster |
JP6388491B2 (en) * | 2014-05-02 | 2018-09-12 | 三菱重工業株式会社 | Plasma generator and plasma propulsion device equipped with measuring device |
GB2583897A (en) * | 2019-04-05 | 2020-11-18 | Servomex Group Ltd | Glow plasma stabilisation |
-
2023
- 2023-12-19 CN CN202311743392.6A patent/CN117420083B/en active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2003232523A1 (en) * | 2002-06-19 | 2004-01-06 | The Australian National University | A plasma beam generator |
JP2006145295A (en) * | 2004-11-17 | 2006-06-08 | Varian Inc | Trace-amount gas detection by real-time gas chromatography mass spectrometry |
WO2007007003A2 (en) * | 2005-07-12 | 2007-01-18 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method for plasma treatment of gas effluents |
JP2007315945A (en) * | 2006-05-26 | 2007-12-06 | Nippon Steel Corp | Method and apparatus for analyzing component of molten metal in refining furnace |
WO2012096592A1 (en) * | 2011-07-18 | 2012-07-19 | Закрытое Акционерное Общество "Техмаш" | Method for producing a ponderomotive effect and "annihilation" propulsors |
WO2015062445A1 (en) * | 2013-10-30 | 2015-05-07 | 清华大学 | Spectrum analysis system |
CN106442697A (en) * | 2016-11-24 | 2017-02-22 | 哈尔滨工业大学 | A Method for Measuring Corrosion Products of Hollow Cathode |
CN107228830A (en) * | 2017-06-05 | 2017-10-03 | 哈尔滨工业大学 | A kind of optical monitoring system of electric thruster hollow cathode corrosion product |
CN107228829A (en) * | 2017-06-07 | 2017-10-03 | 哈尔滨工业大学 | The on-Line Monitor Device and method of electronics and atomic parameter in a kind of krypton working medium hall thruster discharge channel |
WO2020117354A2 (en) * | 2018-09-28 | 2020-06-11 | Phase Four, Inc. | Optimized rf-sourced gridded ion thruster and components |
CN113804671A (en) * | 2021-10-20 | 2021-12-17 | 苏州灵析精密仪器有限公司 | A high-sensitivity Raman spectroscopy detection system |
WO2023238928A1 (en) * | 2022-06-10 | 2023-12-14 | 国立大学法人北海道大学 | Plasma measurement device |
Non-Patent Citations (3)
Title |
---|
An optical emission spectroscopy method for determining the electron temperature and density in low-temperature xenon plasma by using a collisional-radiative model considering the hyperfine structure of emission line into metastable state;Yan-Fei Wang 等;《Spectrochimica Acta Part B: Atomic Spectroscopy》;20230818;第208卷;1-13 * |
棱镜-光栅-棱镜成像光谱仪光谱分辨率研究;姚鑫;朱文章;厦门理工学院学报;20161030;24(05);79-83 * |
聚焦磁场及发散磁场对霍尔推力器壁面侵蚀的影响研究;丁永杰 等;推进技术;20150531;36(05);795-800 * |
Also Published As
Publication number | Publication date |
---|---|
CN117420083A (en) | 2024-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Van de Sanden et al. | A combined Thomson–Rayleigh scattering diagnostic using an intensified photodiode array | |
CN201096521Y (en) | Non-contact type plasma temperature and electron density measuring apparatus | |
US8508740B2 (en) | Optical multi-pass cell | |
US20120176600A1 (en) | Gas Sensing System Employing Raman Scattering | |
CN117420083B (en) | Online monitoring device and method for trace products of plasma erosion | |
Carlstrom et al. | Initial operation of the divertor Thomson scattering diagnostic on DIII-D | |
CN100534009C (en) | Test device for the influence of atmospheric turbulence on space laser communication | |
CN103411940A (en) | Detection method and test device for catalytic properties of heatproof material based on emission spectrum | |
Schlösser et al. | Design implications for laser raman measurement systems for tritium sample-analysis, accountancy or process-control applications | |
CN112557269A (en) | Probing type receiving and transmitting integrated optical fiber dust concentration measuring device and method | |
CN109087719A (en) | Main steam line leakage monitoring system in a kind of containment | |
CN112730383B (en) | A Fiber Array LIBS Detection System for Online Detection | |
Calligaro et al. | An external milli-beam for archaeometric applications on the AGLAE IBA facility of the Louvre museum | |
CN110057779B (en) | Method and device for measuring gas concentration based on automatic temperature compensation TDLAS technology | |
Johnson et al. | Multipulse thomson scattering system for the national spherical torus experiment | |
CN117042273B (en) | Two-dimensional plasma velocity measurement system and method based on super-resolution spectrometer | |
CN100590429C (en) | A Fixed Element Channel Spectrometer for Isomorphic X-ray Fluorescence Spectrometer | |
CN116313167A (en) | Quantitative diagnosis method and system for atomic reaction of nuclear fusion device | |
CN109724696B (en) | Detection system for spectral resolution of Rowland grating spectrometer | |
CN110988968B (en) | Multichannel X-ray optical machine energy spectrum measuring system and measuring method | |
GB2494734A (en) | Apparatus and method for measuring particle size distribution by light scattering | |
Kumar et al. | Design of multipulse Thomson scattering diagnostic for SST-1 tokamak | |
Zhai et al. | Performance of the Thomson scattering diagnostic on Helical Symmetry Experiment | |
CN108279215B (en) | Photoelectric gas detection device and working method thereof | |
EP3891775A1 (en) | Method for determining a pressure at a sample surface |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |