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CN117276151A - A method and equipment for arranging bulk materials - Google Patents

A method and equipment for arranging bulk materials Download PDF

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Publication number
CN117276151A
CN117276151A CN202311073284.2A CN202311073284A CN117276151A CN 117276151 A CN117276151 A CN 117276151A CN 202311073284 A CN202311073284 A CN 202311073284A CN 117276151 A CN117276151 A CN 117276151A
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wafer
assembly
transfer
transfer device
rotation
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吴云松
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Shenzhen Dacheng Automation Equipment Co ltd
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Shenzhen Dacheng Automation Equipment Co ltd
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Priority to CN202311073284.2A priority Critical patent/CN117276151A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67796Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with angular orientation of workpieces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67271Sorting devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

本发明公开了一种散料排列方法及设备,其设备包括供料装置、顶升装置、转料装置、料板组件、第一旋转转移装置、第二旋转转移装置和相机组件。其方法包括以下步骤:将盛放晶片的膜片放置在供料装置上,相机组件对晶片拍照定位,供料装置带动膜片移动;顶升装置将处于取料位的晶片顶起,第一旋转转移装置抓取处于取料位的晶片并转动至第一转接位;转料装置接取晶片并将晶片转动至第二转接位,转料装置还可以带动晶片自转;第二旋转转移装置接取第二转接位的晶片,然后转动至放料位并放在料板组件上。本发明能够在膜片上的晶片转移到料板上时快速地对散乱的晶片进行排列,且排列后晶片方向指向同一方向。

The invention discloses a bulk material arrangement method and equipment. The equipment includes a feeding device, a lifting device, a material transferring device, a material plate assembly, a first rotation transfer device, a second rotation transfer device and a camera assembly. The method includes the following steps: placing the diaphragm containing the wafer on the feeding device, the camera component takes pictures of the wafer and positions it, and the feeding device drives the diaphragm to move; the lifting device lifts up the wafer at the material picking position. The rotation transfer device grabs the wafer at the pickup position and rotates it to the first transfer position; the transfer device receives the wafer and rotates the wafer to the second transfer position. The transfer device can also drive the wafer to rotate; the second rotation transfer The device receives the wafer at the second transfer position, then rotates to the discharge position and places it on the material plate assembly. The invention can quickly arrange the scattered wafers when the wafers on the diaphragm are transferred to the material plate, and the directions of the wafers after the arrangement point to the same direction.

Description

一种散料排列方法及设备A method and equipment for arranging bulk materials

技术领域Technical field

本发明涉晶片生产技术领域,具体涉及一种散料排列方法及设备。The invention relates to the technical field of wafer production, and specifically relates to a bulk material arrangement method and equipment.

背景技术Background technique

晶片是LED最主要的原物料之一,是LED的发光部件,LED最核心的部分,晶片的好坏将直接决定LED的性能。由于晶片都是大批量生产的,为了能够提高生产效率,生产后的晶片散乱地放置在膜片上,但是在用于LED封装前,晶片来料,需整齐排列在料板上。The chip is one of the most important raw materials of LED. It is the light-emitting component of LED and the core part of LED. The quality of the chip will directly determine the performance of LED. Since wafers are produced in large quantities, in order to improve production efficiency, the produced wafers are placed randomly on the diaphragm. However, before being used for LED packaging, the incoming wafers need to be neatly arranged on the material board.

市场上也有一些排列设备,如公开号为CN209658148U的专利文件公开了一种晶片全自动排列机,该排列机通过振动出料部件的震动盘、直震组件、分料组件将晶片自动输出,然后,移载部件的真空吸盘组件、Z轴机械手组件、Y轴机械手组件联合运行,将振动出料部件自动输出的晶片移载到输出部件的晶片排列板上。但是这样的排列设备只能将晶片成排陈列的进行排列,然而晶片的排列还需要将晶片按同一方向进行排列,现有的排列设备不能实现这样的功能。最重要的是,振动盘出料方式受制于物料的一致性和公差,在做越来越小的物料的时候,经常会运行不顺畅,卡料,物料的通过性非常不好,不能够连续生产,效率低,并且由于物料越小振动盘的精度要求越高,成本就越贵。There are also some alignment equipment on the market. For example, the patent document with the publication number CN209658148U discloses a fully automatic wafer alignment machine. The alignment machine automatically outputs the wafers by vibrating the vibration plate of the discharging component, the direct vibration component, and the material distribution component, and then , the vacuum suction cup assembly, Z-axis manipulator assembly, and Y-axis manipulator assembly of the transfer part operate jointly to transfer the wafers automatically output by the vibrating discharging part to the wafer arrangement plate of the output part. However, such an arrangement equipment can only arrange the wafers in rows. However, the arrangement of the wafers also requires the wafers to be arranged in the same direction. The existing arrangement equipment cannot achieve such a function. The most important thing is that the discharging method of the vibrating plate is subject to the consistency and tolerance of the material. When processing smaller and smaller materials, it often runs unsmoothly, causing material jams. The passage of the material is very poor and cannot be continuous. The production efficiency is low, and because the smaller the material, the higher the accuracy requirements of the vibration plate, the more expensive the cost.

发明内容Contents of the invention

为了克服现有技术的不足,本发明提供一种散料排列方法及设备,能够快速对散乱的晶片进行排列,以避开采用振动盘上料方式来实现散料重排,能够达到高速,稳定,低成本三个方面的优势。In order to overcome the shortcomings of the existing technology, the present invention provides a bulk material arrangement method and equipment that can quickly arrange scattered wafers to avoid using a vibrating plate loading method to achieve bulk material rearrangement, and can achieve high speed and stability. , low cost and three advantages.

本发明提供如下技术方案:The present invention provides the following technical solutions:

一种散料排列方法,包括如下步骤:A bulk material arrangement method includes the following steps:

S1,将盛放晶片的膜片放置在供料装置上,采用相机组件对膜片上的晶片拍照定位,并将晶片的定位信息发送至供料装置,供料装置根据晶片的定位信息带动膜片移动至取料位;S1, place the diaphragm containing the wafer on the feeding device, use the camera component to take pictures and position the wafer on the diaphragm, and send the positioning information of the wafer to the feeding device. The feeding device drives the diaphragm according to the positioning information of the wafer. The piece moves to the material picking position;

S2,采用顶升装置吸附处于取料位的晶片周围的膜片,并将处于取料位的晶片顶起,接着采用第一旋转转移装置抓取处于取料位的晶片,然后转动至第一转接位;S2, use a lifting device to absorb the diaphragm around the wafer in the material picking position, and lift the wafer in the material picking position, then use the first rotation transfer device to grab the wafer in the material picking position, and then rotate to the first transfer bit;

S3,采用转料装置接取旋转转移装置上转动至第一转接位的晶片,然后转料装置将晶片转动至第二转接位,其中,采用相机组件对晶片的方向进行拍照定位,并将晶片方向的定位信息发送至转料装置中设置的自转组件上,自转组件根据晶片方向的定位信息带动晶片转动,放置晶片转动至第二转接位时,晶片的方向始终指向某一方向;S3, use a transfer device to receive the wafer that has been rotated to the first transfer position on the rotary transfer device, and then the transfer device rotates the wafer to the second transfer position, in which a camera assembly is used to take pictures and position the direction of the wafer, and The positioning information of the wafer direction is sent to the rotation component provided in the transfer device. The rotation component drives the wafer to rotate according to the positioning information of the wafer direction. When the wafer is placed and rotated to the second transfer position, the direction of the wafer always points in a certain direction;

S4,采用第二旋转转移装置接取第二转接位的晶片,然后转动至放料位,然后采用料板组件接取放料位的晶片;S4, use the second rotation transfer device to receive the wafer at the second transfer position, then rotate it to the discharge position, and then use the material plate assembly to receive the wafer at the discharge position;

S5,重复上述步骤,将膜片上的若干晶片依次转移至料板组件中,得到排列整齐且晶片方向指向同一方向的晶片料板。S5, repeat the above steps, transfer several wafers on the diaphragm to the material plate assembly in sequence, and obtain a wafer material plate that is neatly arranged and the wafer directions point in the same direction.

本发明还提供如下技术方案:一种散料排列设备,包括:The invention also provides the following technical solution: a bulk material arrangement equipment, including:

供料装置,包括膜片承载组件、第一X轴平移组件和第一Y轴平移组件,所述膜片承载组件用于固定膜片,所述第一X轴平移组件、第一Y轴平移组件分别用于带动膜片承载组件沿X轴、Y轴方向移动;The feeding device includes a diaphragm carrying component, a first X-axis translation component and a first Y-axis translation component. The diaphragm carrying component is used to fix the diaphragm. The first X-axis translation component, the first Y-axis translation component The components are respectively used to drive the diaphragm carrying component to move along the X-axis and Y-axis directions;

顶升装置,包括吸附组件和顶针组件,所述顶针组件用于顶起膜片上的晶片,所述吸附组件用于吸附顶针组件所要顶起的晶片周围的部分膜片;The lifting device includes an adsorption assembly and an ejection pin assembly. The ejection pin assembly is used to lift the wafer on the diaphragm. The adsorption assembly is used to adsorb part of the diaphragm around the wafer to be lifted by the ejection pin assembly;

转料装置,包括公转组件和自转组件,所述公转组件将晶片从第一转接位转动至第二转接位,所述自转组件用于调整晶片的方向;The material transfer device includes a revolution component and a rotation component. The revolution component rotates the wafer from the first transfer position to the second transfer position. The rotation component is used to adjust the direction of the wafer;

料板组件,包括料板及驱动料板沿X轴、Y轴方向移动的第二X轴平移组件和第二Y轴平移组件;The material plate component includes a material plate and a second X-axis translation component and a second Y-axis translation component that drive the material plate to move along the X-axis and Y-axis directions;

第一旋转转移装置,用于接取膜片上处于取料位的晶片并转移至第一转接位;The first rotary transfer device is used to receive the wafer at the material pickup position on the diaphragm and transfer it to the first transfer position;

第二旋转转移装置,用于转料装置上处于第二转接位的晶片并转移至放料位;a second rotary transfer device, used to transfer the wafers in the second transfer position on the transfer device to the discharge position;

相机组件,用于对晶片的方向及位置信息进行拍照定位。The camera component is used to take pictures and position the direction and position information of the chip.

作为上述技术方案的进一步改进,所述公转组件包括公转主轴以及驱动所述公转主轴旋转的公转驱动组件。As a further improvement of the above technical solution, the revolving assembly includes a revolving main shaft and a revolving driving assembly that drives the revolving main shaft to rotate.

作为上述技术方案的进一步改进,所述自转组件包括固定座,所述固定座上安装有多个用于吸取晶片的治具以及驱动所述治具转动的自转驱动组件,所述固定座与所述公转主轴固定连接。As a further improvement of the above technical solution, the rotation assembly includes a fixed base. A plurality of jigs for sucking wafers and a rotation driving assembly for driving the rotation of the jigs are installed on the fixed base. The fixed base is connected to the fixed base. The above-mentioned revolving spindle is fixedly connected.

作为上述技术方案的进一步改进,多个所述治具以所述公转主轴为中心线环形阵列设置。As a further improvement of the above technical solution, a plurality of the jigs are arranged in an annular array with the revolution spindle as the center line.

作为上述技术方案的进一步改进,所述转料装置还包括升降组件,所述升降组件用于驱动所述公转组件升降。As a further improvement of the above technical solution, the material transfer device further includes a lifting component, which is used to drive the revolution component to lift.

作为上述技术方案的进一步改进,所述膜片承载组件包括膜片安装框、支撑框和锁定组件,所述支撑框上设置有用于放置膜片安装框的端面,所述端面的一侧设置有固定挡边,所述锁定组件可受控驱使膜片安装框抵靠固定挡边。As a further improvement of the above technical solution, the diaphragm carrying assembly includes a diaphragm installation frame, a support frame and a locking assembly. The support frame is provided with an end surface for placing the diaphragm installation frame, and one side of the end surface is provided with Fixed rib, the locking component can controllably drive the diaphragm mounting frame against the fixed rib.

作为上述技术方案的进一步改进,所述吸附组件包括吸附头及吸附头升降机构,所述顶针组件包括顶针和顶针升降机构,所述吸附头上设置有顶针穿孔,所述顶针位于所述顶针穿孔中。As a further improvement of the above technical solution, the adsorption assembly includes an adsorption head and an adsorption head lifting mechanism. The ejection pin assembly includes an ejection pin and an ejection pin lifting mechanism. The adsorption head is provided with an ejection pin perforation, and the ejection pin is located in the ejection pin perforation. middle.

作为上述技术方案的进一步改进,所述第一旋转转移装置和第二旋转转移装置均包括工作件和旋转驱动组件,所述工作件与所述旋转驱动组件的输出轴相连接,所述旋转驱动组件用于驱动所述工作件转动。As a further improvement of the above technical solution, the first rotation transfer device and the second rotation transfer device each include a workpiece and a rotation drive assembly. The workpiece is connected to the output shaft of the rotation drive assembly. The rotation drive assembly The assembly is used to drive the workpiece to rotate.

作为上述技术方案的进一步改进,所述相机组件包括第一相机,所述第一相机用于拍照定位膜片上晶片的位置以及晶片的排列方向。As a further improvement of the above technical solution, the camera assembly includes a first camera, which is used to take pictures of the position of the wafer on the positioning diaphragm and the arrangement direction of the wafer.

本发明的有益效果是:在晶片从膜片转移到料板上的过程中,根据相机组件对晶片拍照定位得到的信息,通过转料装置中的自转组件带动晶片转动一定角度,从而使每个晶片在转移后晶片方向均指向同一方向,这样即可得到排列整齐的晶片。且本发明的晶片转移速度快,工作效率高,自动化运行,降低了人工成本The beneficial effects of the present invention are: during the process of transferring the wafer from the diaphragm to the material plate, based on the information obtained by the camera component taking pictures and positioning the wafer, the rotation component in the material transfer device drives the wafer to rotate at a certain angle, so that each After the wafer is transferred, the wafer directions all point in the same direction, so that neatly arranged wafers can be obtained. Moreover, the wafer transfer speed of the present invention is fast, the work efficiency is high, the operation is automated, and the labor cost is reduced.

附图说明Description of the drawings

下面结合附图和实施例对本发明进一步说明。The present invention will be further described below in conjunction with the accompanying drawings and examples.

图1是本发明的散料排列设备的装配示意图;Figure 1 is a schematic assembly diagram of the bulk material arrangement equipment of the present invention;

图2是本发明的散料排列设备中供料装置的结构示意图;Figure 2 is a schematic structural diagram of the feeding device in the bulk material arrangement equipment of the present invention;

图3是本发明的散料排列设备中顶升装置的结构示意图;Figure 3 is a schematic structural diagram of the lifting device in the bulk material arrangement equipment of the present invention;

图4是本发明的散料排列设备中顶升装置的爆炸视图;Figure 4 is an exploded view of the lifting device in the bulk material arrangement equipment of the present invention;

图5是本发明的散料排列设备中顶针与吸附头装配示意图;Figure 5 is a schematic diagram of the assembly of the ejector pin and the adsorption head in the bulk material arrangement equipment of the present invention;

图6是本发明的散料排列设备中第一旋转转移装置的结构示意图;Figure 6 is a schematic structural diagram of the first rotation transfer device in the bulk material arrangement equipment of the present invention;

图7是本发明的散料排列设备中转料装置第一视角的结构示意图;Figure 7 is a schematic structural diagram of the material transfer device of the bulk material arrangement equipment of the present invention from a first perspective;

图8是本发明的散料排列设备中转料装置第二视角的结构示意图;Figure 8 is a schematic structural diagram of the material transfer device of the bulk material arrangement equipment of the present invention from a second perspective;

图9是本发明的散料排列设备中转料装置第三视角的结构示意图。Figure 9 is a schematic structural diagram of the material transfer device of the bulk material arrangement equipment of the present invention from a third perspective.

附图标记:1、机架;2、供料装置;3、顶升装置;4、第一相机;5、第一旋转转移装置;6、第三相机;7、转料装置;8、第二旋转转移装置;9、第二相机;10、第四相机;11、料板安装位;21、第一Y轴平移组件;22、第一X轴平移组件;23、支撑架;24、支撑框;25、固定挡边;26、膜片安装框;27、锁定组件;31、支撑座;32、吸附组件;321、吸附头;322、吸附头升降连接板;323、吸附头升降驱动组件;324、顶针穿孔;33、顶针组件;331、顶针;332、顶针固定座;333、顶针升降连接板;334、顶针升降驱动组件;51、摆臂;52、第一吸附治具;53、旋转驱动组件;54、升降驱动组件;71、底座;72、公转组件;721、公转驱动电机;722、公转主轴;723、固定座;73、自转组件;731、自转驱动电机;732、第二吸附治具;74、转料升降组件;741、升降电机;742、凸轮机构。Reference signs: 1. Frame; 2. Feeding device; 3. Lifting device; 4. First camera; 5. First rotating transfer device; 6. Third camera; 7. Transfer device; 8. Two rotation transfer devices; 9. Second camera; 10. Fourth camera; 11. Material plate mounting position; 21. First Y-axis translation component; 22. First X-axis translation component; 23. Support frame; 24. Support Frame; 25. Fixed rib; 26. Diaphragm installation frame; 27. Locking component; 31. Support base; 32. Adsorption component; 321. Adsorption head; 322. Adsorption head lifting connection plate; 323. Suction head lifting drive assembly ;324. Ejector perforation; 33. Ejector assembly; 331. Ejector; 332. Ejector holder; 333. Ejector lifting connecting plate; 334. Ejector lifting drive assembly; 51. Swing arm; 52. First adsorption fixture; 53. Rotary drive component; 54. Lift drive component; 71. Base; 72. Revolution component; 721. Revolution drive motor; 722. Revolution spindle; 723. Fixed base; 73. Rotation component; 731. Rotation drive motor; 732. Second Adsorption fixture; 74. Material transfer lifting component; 741. Lifting motor; 742. Cam mechanism.

具体实施方式Detailed ways

以下将结合实施例和附图对本发明的构思、具体结构及产生的技术效果进行清楚、完整地描述,以充分地理解本发明的目的、特征和效果。显然,所描述的实施例只是本发明的一部分实施例,而不是全部实施例,基于本发明的实施例,本领域的技术人员在不付出创造性劳动的前提下所获得的其他实施例,均属于本发明保护的范围。另外,专利中涉及到的所有联接/连接关系,并非单指构件直接相接,而是指可根据具体实施情况,通过添加或减少联接辅件,来组成更优的联接结构。本发明创造中的各个技术特征,在不互相矛盾冲突的前提下可以交互组合。The concept, specific structure and technical effects of the present invention will be clearly and completely described below in conjunction with the embodiments and drawings to fully understand the purpose, features and effects of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, other embodiments obtained by those skilled in the art without exerting creative efforts are all protection scope of the present invention. In addition, all the connections/connection relationships involved in the patent do not only refer to the direct connection of components, but refer to the fact that a better connection structure can be formed by adding or reducing connection auxiliary parts according to the specific implementation conditions. Various technical features in the invention can be combined interactively without conflicting with each other.

本发明的实施例包括一种散料排列设备,参照图1,所述散料排列设备包括机架1、供料装置2、顶升装置3、转料装置7、料板组件、第一旋转转移装置5、第二旋转转移装置8和相机组件。晶片放置在供料装置2上,然后通过第一转移装置将晶片转移到转料装置7,转料装置7将晶片方向进行调整后,第二转移装置将晶片转移到料板组件上,重复上述操作,能够得到排列整齐的晶片料板。The embodiment of the present invention includes a bulk material arrangement equipment. Referring to Figure 1, the bulk material arrangement equipment includes a frame 1, a feeding device 2, a lifting device 3, a material transfer device 7, a material plate assembly, a first rotating Transfer device 5, second rotation transfer device 8 and camera assembly. The wafer is placed on the feeding device 2, and then the wafer is transferred to the transfer device 7 through the first transfer device. After the transfer device 7 adjusts the direction of the wafer, the second transfer device transfers the wafer to the material plate assembly, and repeats the above operation, a neatly arranged wafer blank can be obtained.

具体的实施例中,参照图2,所述供料装置2包括膜片承载组件、第一X轴平移组件22和第一Y轴平移组件21,所述膜片承载组件包括支撑架23、支撑框24、膜片安装框26和锁定组件27,所述膜片安装框26可以采用圆形、矩形或其他形状的环形框,这里优选圆形的环形框,膜片安装框26用于固定膜片,所述第一Y轴平移组件21固定安装在机架1上,第一X轴平移组件22的固定端与第一Y轴平移组件21的活动端固定连接,支撑架23与第一X轴平移组件22的活动端连接,另外,所述支撑框24固定连接在支撑架23上,且所述支撑框24上设置有用于放置膜片安装框26的端面,所述端面的一侧设置有固定挡边25,所述锁定组件27可受控驱使膜片安装框26抵靠固定挡边25。In a specific embodiment, referring to Figure 2, the feeding device 2 includes a diaphragm carrying component, a first X-axis translation component 22 and a first Y-axis translation component 21. The diaphragm carrying component includes a support frame 23, a support Frame 24, diaphragm installation frame 26 and locking assembly 27. The diaphragm installation frame 26 can be a circular, rectangular or other shaped annular frame. A circular annular frame is preferred here. The diaphragm installation frame 26 is used to fix the diaphragm. piece, the first Y-axis translation component 21 is fixedly installed on the frame 1, the fixed end of the first X-axis translation component 22 is fixedly connected to the movable end of the first Y-axis translation component 21, and the support frame 23 is connected to the first X-axis translation component 21. The movable end of the shaft translation assembly 22 is connected. In addition, the support frame 24 is fixedly connected to the support frame 23, and the support frame 24 is provided with an end face for placing the diaphragm mounting frame 26. One side of the end face is provided with There is a fixed rib 25, and the locking assembly 27 can controllably drive the diaphragm mounting frame 26 against the fixed rib 25.

在本实施例中,在盛放有晶片的膜片安装在所述膜片安装框26上,然后膜片安装框26放置在支撑框24上的端面,此时通过锁定组件27的活动端伸出驱使膜片安装框26与固定挡边25抵持,从而实现膜片安装框26的固定。然后通过第一Y轴平移组件21的运行带动第一X轴平移组件22及膜片安装框26沿Y轴方向移动,通过第一X轴平移组件22的运行带动膜片安装框26沿X轴方向移动,从而调整膜片安装框26的位置,使待取的晶片移动至取料位。In this embodiment, the diaphragm holding the wafer is installed on the diaphragm mounting frame 26, and then the diaphragm mounting frame 26 is placed on the end face of the support frame 24. At this time, the movable end of the locking component 27 extends The movement forces the diaphragm mounting frame 26 to resist against the fixed rib 25, thereby achieving the fixation of the diaphragm mounting frame 26. Then, the operation of the first Y-axis translation component 21 drives the first X-axis translation component 22 and the diaphragm mounting frame 26 to move along the Y-axis direction, and the operation of the first X-axis translation component 22 drives the diaphragm mounting frame 26 along the X-axis. direction, thereby adjusting the position of the diaphragm mounting frame 26 so that the wafer to be picked up moves to the picking position.

具体的实施例中,参照图3、图4和图5,所述顶升装置3包括支撑座31、吸附组件32和顶针组件33,进一步的,所述顶针组件33包括顶针331、顶针固定座332和顶针升降机构,顶针升降机构包括顶针升降连接板333和顶针升降驱动组件334,所述顶针升降驱动组件334安装在支撑座31上,顶针升降连接板333滑动连接于支撑座31上,顶针升降连接板333的底端与顶针升降驱动组件334的活动端连接,顶针升降连接板333的顶端与顶针固定座332连接,顶针升降驱动组件334运行时带动顶针固定座332及顶针固定座332上的顶针331升降,顶针331位于取料位的正下方,顶针331向上移动时刺穿膜片并将膜片上处于取料位的晶片向上顶起,以便于第一旋转转移装置5的取料。更进一步的,所述吸附组件32包括吸附头321及吸附头升降机构,吸附头升降机构包括吸附头升降连接板322和吸附头升降驱动组件323,所述吸附头升降驱动组件323安装在支撑座31上,吸附头升降连接板322滑动连接于支撑座31上,吸附头升降连接板322的底端与吸附头升降驱动组件323的活动端连接,吸附头升降连接板322的顶端与吸附头321连接,吸附头升降驱动组件323运行时带动吸附头321升降,所述吸附头321上设置有顶针穿孔324,所述顶针331位于所述顶针穿孔324中,便于顶针331的升降;所述吸附头321上位于顶针穿孔324的四周设置吸附孔,在顶针331向上移动之前,吸附头升降机构带动吸附头321向上移动,通过吸附头321的吸附孔可吸附取料位的晶片周围的部分膜片,从而使顶针331穿刺膜片顶起晶片的过程更加稳定。In a specific embodiment, referring to Figures 3, 4 and 5, the lifting device 3 includes a support base 31, an adsorption assembly 32 and an ejector pin assembly 33. Further, the ejector pin assembly 33 includes an ejector pin 331, an ejector pin fixing seat. 332 and an ejection pin lifting mechanism. The ejection pin lifting mechanism includes an ejection pin lifting connection plate 333 and an ejection pin lifting driving assembly 334. The ejection pin lifting driving assembly 334 is installed on the support base 31. The ejection pin lifting connection plate 333 is slidingly connected to the support base 31. The ejection pin The bottom end of the lifting connecting plate 333 is connected to the movable end of the ejection pin lifting driving assembly 334, and the top end of the ejecting pin lifting connecting plate 333 is connected to the ejecting pin fixing base 332. When the ejecting pin lifting driving assembly 334 is running, it drives the ejecting pin fixing base 332 and the ejecting pin fixing base 332 to move upward. The ejector pin 331 rises and falls, and the ejector pin 331 is located directly below the material picking position. When the ejector pin 331 moves upward, it pierces the diaphragm and pushes up the wafer on the diaphragm at the material picking position, so as to facilitate the material picking of the first rotary transfer device 5 . Furthermore, the adsorption assembly 32 includes an adsorption head 321 and an adsorption head lifting mechanism. The adsorption head lifting mechanism includes an adsorption head lifting connecting plate 322 and an adsorption head lifting drive assembly 323. The adsorption head lifting drive assembly 323 is installed on the support base. 31, the adsorption head lifting connection plate 322 is slidingly connected to the support base 31, the bottom end of the adsorption head lifting connection plate 322 is connected to the movable end of the adsorption head lifting drive assembly 323, and the top end of the adsorption head lifting connection plate 322 is connected to the adsorption head 321 connection, the adsorption head lifting drive assembly 323 drives the adsorption head 321 to rise and fall during operation. The adsorption head 321 is provided with an ejection pin perforation 324, and the ejection pin 331 is located in the ejection pin perforation 324 to facilitate the lifting and lowering of the ejection pin 331; the adsorption head 321 is provided with adsorption holes around the ejection pin perforation 324. Before the ejection pin 331 moves upward, the adsorption head lifting mechanism drives the adsorption head 321 to move upward. Part of the diaphragm around the wafer at the material pickup position can be adsorbed through the adsorption holes of the adsorption head 321. Therefore, the process of the ejector pin 331 piercing the diaphragm and lifting up the wafer is more stable.

具体的实施例中,所述第一旋转转移装置5和第二旋转转移装置8的结构相同,本实施例中以第一旋转转移装置5为例,参照图6,所述第一旋转转移装置5工作件、旋转驱动组件53和升降驱动组件54,所述工作件包括摆臂51和第一吸附治具52,所述摆臂51成四角星形状,第一吸附治具52有四个且分别安装在摆臂51的四个角端,所述旋转驱动组件53的输出轴与摆臂51的中心点连接,这样旋转驱动组件53可驱动摆臂51转动,在其中一个第一吸附治具52吸取取料位的晶片时,旋转驱动组件53运行驱使摆臂51转动180°,将晶片转移至第一转接位,此时另一个第一吸附治具52位于取料位的晶片的正上方,便于对下一颗晶片的取料。进一步的,所述升降驱动组件54的活动端与摆臂51连接,升降驱动组件54可带动摆臂51上下移动,摆臂51向下移动时便于第一吸附治具52取料或放料,摆臂51向上移动后再进行转动,避免晶片的转移过程遇到阻碍物。In a specific embodiment, the first rotation transfer device 5 and the second rotation transfer device 8 have the same structure. In this embodiment, the first rotation transfer device 5 is taken as an example. Referring to Figure 6, the first rotation transfer device 5 work piece, rotation drive assembly 53 and lifting drive assembly 54. The work piece includes a swing arm 51 and a first adsorption fixture 52. The swing arm 51 is in the shape of a four-pointed star. The first adsorption fixture 52 has four and They are respectively installed at the four corner ends of the swing arm 51. The output shaft of the rotary drive assembly 53 is connected to the center point of the swing arm 51, so that the rotary drive assembly 53 can drive the swing arm 51 to rotate, and one of the first adsorption fixtures 52 absorbs the wafer from the material pickup position, the rotation drive assembly 53 operates to drive the swing arm 51 to rotate 180° to transfer the wafer to the first transfer position. At this time, another first adsorption fixture 52 is located in front of the wafer at the material pickup position. Above, it is convenient to pick up the next wafer. Further, the movable end of the lifting drive assembly 54 is connected to the swing arm 51. The lifting drive assembly 54 can drive the swing arm 51 to move up and down. When the swing arm 51 moves downward, it is convenient for the first adsorption fixture 52 to pick up or discharge materials. The swing arm 51 moves upward and then rotates to avoid obstacles in the transfer process of the wafer.

具体的实施例中,参照图7-图9,所述转料装置7包括底座71、自转组件73、公转组件72和转料升降组件74,所述转料升降组件74包括安装于底座71上的升降电机741,所述升降电机741通过凸轮机构742带动所述公转组件72升降,从而带动自转组件73同步升降。具体的,所述自转组件73四组自转驱动电机731和第二吸附治具732,所述第二吸附治具732与自转驱动电机731主轴连接;所述公转组件72包括固定座723、公转主轴722以及驱动所述公转主轴722旋转的公转驱动电机721,四组自转驱动电机731和第二吸附治具732环形阵列设置在固定座723上,所述固定座723与所述公转主轴722连接,所述公转主轴722旋转时带动所述固定座723同步旋转,从而带动固定座723上的第二吸附治具732公转。In a specific embodiment, referring to FIGS. 7-9 , the material transferring device 7 includes a base 71 , a rotation component 73 , a revolution component 72 and a material transferring lifting component 74 . The material transferring lifting component 74 includes a rotating material installed on the base 71 The lifting motor 741 drives the revolution component 72 to rise and fall through the cam mechanism 742, thereby driving the rotation component 73 to rise and fall synchronously. Specifically, the rotation assembly 73 has four sets of rotation drive motors 731 and a second adsorption fixture 732. The second adsorption fixture 732 is connected to the spindle of the rotation drive motor 731; the revolution assembly 72 includes a fixed seat 723 and a revolution spindle. 722 and the revolution drive motor 721 that drives the revolution spindle 722 to rotate. Four sets of rotation drive motors 731 and the second adsorption fixture 732 are arranged in an annular array on the fixed seat 723. The fixed seat 723 is connected to the revolution spindle 722. When the revolution main shaft 722 rotates, the fixed base 723 is driven to rotate synchronously, thereby driving the second adsorption fixture 732 on the fixed base 723 to revolve.

当所述第一旋转转移装置5将晶片转移到第一转接位时,升降驱动组件54带动摆臂51向下移动,然后转料升降组件74带动第二吸附治具732向上移动(微调),第二吸附治具732吸取第一吸附治具52上的晶片后向下移动,然后公转驱动电机721带动固定座723转动180°,使晶片位于第二转接位,在这过程中,自转驱动电机731带动第二吸附治具732自转,自转的角度根据相机组件对晶片拍照定位的信息确定,这样使每颗晶片转移至第二转接位时,每颗晶片的方向始终指向同一方向,然后再第二旋转转移装置8将晶片转移至料板上按矩形阵列方式排列后,每个晶片的方向同样指向同一方向,从而使晶片从膜片上转移到料板上后排列整齐,便于LED的封装工作。When the first rotation transfer device 5 transfers the wafer to the first transfer position, the lift drive assembly 54 drives the swing arm 51 to move downward, and then the transfer lift assembly 74 drives the second adsorption fixture 732 to move upward (fine adjustment) , the second adsorption jig 732 absorbs the wafer on the first adsorption jig 52 and moves downward, and then the revolution drive motor 721 drives the fixed base 723 to rotate 180°, so that the wafer is located in the second transfer position. During this process, the rotation The drive motor 731 drives the second adsorption fixture 732 to rotate. The angle of rotation is determined based on the information of the camera component taking pictures and positioning the wafer. In this way, when each wafer is transferred to the second transfer position, the direction of each wafer always points in the same direction. Then the second rotation transfer device 8 transfers the wafers to the material plate and arranges them in a rectangular array. The direction of each wafer also points to the same direction, so that the wafers are transferred from the diaphragm to the material plate and arranged neatly, which is convenient for LEDs. packaging work.

具体的实施例中,所述料板组件(未图示)安装在机架1上的料板安装位11,具体的,所述料板组件包括料板、第二X轴平移组件和第二Y轴平移组件,所述料板与第二X轴平移组件的活动端连接,所述第二X轴平移组件的固定端与第二Y轴平移组件的活动端连接,通过第二Y轴平移组件的运行带动第二X轴平移组件及料板沿Y轴方向移动,通过第二X轴平移组件的运行带动料板沿X轴方向移动,从而调整料板上晶片放置位的位置。In a specific embodiment, the material plate assembly (not shown) is installed at the material plate installation position 11 on the frame 1. Specifically, the material plate assembly includes a material plate, a second X-axis translation component and a second Y-axis translation assembly, the material plate is connected to the movable end of the second X-axis translation assembly, and the fixed end of the second X-axis translation assembly is connected to the movable end of the second Y-axis translation assembly. Through the second Y-axis translation The operation of the component drives the second X-axis translation component and the material plate to move along the Y-axis direction. The operation of the second X-axis translation component drives the material plate to move along the X-axis direction, thereby adjusting the position of the chip placement position on the material plate.

具体的实施例中,参照图1,所述相机组件包括第一相机4和第二相机9,所述第一相机4位于取料位的正上方,用于对膜片上的晶片进行拍照定位,得到晶片的位置,便于第一X轴平移组件22和第一Y轴平移组件21带动膜片安装框26移动,从而带动晶片移动至取料位;另外,第一相机4还可以对取料位的晶片进行拍照定位,得到晶片的方向,从而使转接装置中的自转组件73带动晶片自转一定角度,使位于第二转接位的晶片的方向始终指向同一方向。所述第二相机9用于对料板上方第二旋转转移装置8上处于放料位的晶片进行拍照定位,得到晶片的位置信息,同时对料盘进行拍照定位,得到晶片放置位的位置信息,便于第二X轴平移组件和第二Y轴平移组件带动料板移动,使料板上的晶片放置位移动至放料位的正下方,第二旋转转移装置8中的升降驱动组件54带动晶片下降,第二旋转转移装置8将晶片放在料板上的晶片放置位中。In a specific embodiment, referring to Figure 1, the camera assembly includes a first camera 4 and a second camera 9. The first camera 4 is located directly above the material pickup position and is used to take pictures and position the wafer on the diaphragm. , obtain the position of the wafer, so that the first X-axis translation component 22 and the first Y-axis translation component 21 can drive the diaphragm mounting frame 26 to move, thereby driving the wafer to move to the material picking position; in addition, the first camera 4 can also capture the material The wafer in the second transfer position is photographed and positioned to obtain the direction of the wafer, so that the rotation component 73 in the transfer device drives the wafer to rotate at a certain angle, so that the direction of the wafer in the second transfer position always points in the same direction. The second camera 9 is used to take pictures and position the wafers in the discharge position on the second rotation transfer device 8 above the material plate to obtain the position information of the wafers, and at the same time take pictures and position the material tray to obtain the position information of the wafer placement position. , so that the second X-axis translation component and the second Y-axis translation component can drive the material plate to move, so that the wafer placement position on the material plate moves to directly below the material discharge position, and the lift drive component 54 in the second rotation transfer device 8 drives The wafer descends, and the second rotation transfer device 8 places the wafer in the wafer placement position on the material plate.

优选的实施例中,参照图1,所述相机组件还包括第三相机6,所述第三相机6位于第一转接位的正上方,用于拍照定位处于第一转接位的晶片的方向,相对于采用第一相机4拍照定位晶片的方向而言,采用第三相机6可以省去晶片在第一旋转转移装置5带动下旋转180°的参数计算。In the preferred embodiment, referring to Figure 1, the camera assembly further includes a third camera 6, which is located directly above the first transfer position and is used to take pictures and position the wafer in the first transfer position. Compared with the direction in which the wafer is positioned by taking pictures with the first camera 4, using the third camera 6 can save the parameter calculation of rotating the wafer by 180° driven by the first rotation transfer device 5.

优选的实施例中,参照图1,所述相机组件还包括第四相机10,所述第四相机10位于第一旋转转移装置5带动晶片转动90°后位置的正下方,相对于第一相机4和第三相机6而言,采用第三相机6可以从晶片的下方对晶片拍照定位,当晶片的方向从上方观测不到时,采用第四相机10便可以解决该问题。In the preferred embodiment, referring to Figure 1, the camera assembly also includes a fourth camera 10, which is located directly below the position after the first rotation transfer device 5 drives the wafer to rotate 90°, relative to the first camera 4 and the third camera 6, the third camera 6 can be used to take pictures and position the wafer from the bottom of the wafer. When the direction of the wafer cannot be observed from above, the fourth camera 10 can be used to solve this problem.

本发明的实施例还包括一种散料排列方法,包括如下步骤:Embodiments of the present invention also include a bulk material arrangement method, which includes the following steps:

S1,将盛放晶片的膜片放置在供料装置2的膜片安装框26上,通过锁定组件27对其固定,然后采用第一相机4对膜片上的晶片拍照定位,并将晶片的定位信息发送至处理器,处理器根据晶片的定位信息驱使第一X轴平移组件22和第一Y轴平移组件21运行,以带动膜片移动使晶片移动至取料位;S1, place the diaphragm containing the wafer on the diaphragm installation frame 26 of the feeding device 2, fix it through the locking assembly 27, and then use the first camera 4 to take pictures and position the wafer on the diaphragm, and position the wafer. The positioning information is sent to the processor, and the processor drives the first X-axis translation component 22 and the first Y-axis translation component 21 to operate according to the positioning information of the wafer to drive the diaphragm to move the wafer to the material pickup position;

S2,采用顶升装置3的吸附头321吸附处于取料位的晶片周围的部分膜片,然后顶升装置3中的顶针331向上移动将处于取料位的晶片顶起,接着采用第一旋转转移装置5中的第一吸附治具52吸取处于取料位的晶片,然后第一旋转转移装置5将晶片转动180°至第一转接位;S2, use the adsorption head 321 of the lifting device 3 to suck part of the diaphragm around the wafer at the picking position, and then move the ejector pin 331 in the lifting device 3 upward to lift the wafer at the picking position, and then use the first rotation The first adsorption jig 52 in the transfer device 5 absorbs the wafer at the material pickup position, and then the first rotation transfer device 5 rotates the wafer 180° to the first transfer position;

S3,采用转料装置7中的第二吸附治具732接取第一旋转转移装置5上转动至第一转接位的晶片,然后转料装置7的公转组件72将晶片转动至第二转接位,在公转组件72带动晶片从第一转接位转动至第二转接位的过程中,采用第一相机4、第三相机6或第四相机10对晶片的方向进行拍照定位,并将晶片方向的定位信息发送处理器,处理器驱使自转组件73中的自转驱动电机731运行,带动晶片转动一定角度,使晶片转动至第二转接位时,晶片的方向始终指向同一方向;S3, use the second adsorption fixture 732 in the transfer device 7 to receive the wafer rotated to the first transfer position on the first rotation transfer device 5, and then the revolution component 72 of the transfer device 7 rotates the wafer to the second transfer position. When the revolution assembly 72 drives the wafer to rotate from the first transfer position to the second transfer position, the first camera 4, the third camera 6 or the fourth camera 10 is used to take pictures and position the direction of the wafer, and The positioning information of the wafer direction is sent to the processor, and the processor drives the rotation drive motor 731 in the rotation assembly 73 to run, driving the wafer to rotate at a certain angle, so that when the wafer rotates to the second transfer position, the direction of the wafer always points in the same direction;

S4,采用第二旋转转移装置8接取第二转接位的晶片,然后转动180°至放料位,采用第二相机9对放料位的晶片以及料板进行拍照定位,并将定位信息发送至处理器,处理器驱使料板组件中的第二X轴平移组件和第二Y轴平移组件移动,使料板上的晶片放置位移动至放料位的下方以接取晶片;S4, use the second rotation transfer device 8 to receive the wafer at the second transfer position, then rotate 180° to the discharge position, use the second camera 9 to take pictures and position the wafer and material plate at the discharge position, and store the positioning information Sent to the processor, the processor drives the second X-axis translation component and the second Y-axis translation component in the material plate assembly to move, so that the chip placement position on the material plate moves to below the material placement position to receive the chip;

S5,重复上述步骤,将膜片上的若干晶片依次转移至料板上,得到排列整齐且晶片方向指向同一方向的晶片料板。S5, repeat the above steps, transfer several wafers on the diaphragm to the material board in sequence, and obtain a wafer material board that is neatly arranged and the wafer directions point in the same direction.

以上是对本发明的较佳实施进行了具体说明,但本发明创造并不限于所述实施例,熟悉本领域的技术人员在不违背本发明精神的前提下还可做出种种的等同变形或替换,这些等同的变形或替换均包含在本申请权利要求所限定的范围内。The above is a detailed description of the preferred implementation of the present invention, but the present invention is not limited to the embodiments. Those skilled in the art can also make various equivalent modifications or substitutions without violating the spirit of the present invention. , these equivalent modifications or substitutions are included in the scope defined by the claims of this application.

Claims (10)

1. A method of bulk material alignment, comprising the steps of:
s1, placing a membrane for containing a wafer on a feeding device, photographing and positioning the wafer on the membrane by adopting a camera assembly, sending positioning information of the wafer to the feeding device, and driving the membrane to move to a material taking position by the feeding device according to the positioning information of the wafer;
s2, adsorbing a membrane around the wafer at the material taking position by adopting a jacking device, jacking the wafer at the material taking position, grabbing the wafer at the material taking position by adopting a first rotary transfer device, and rotating to a first transfer position;
s3, a transfer device is adopted to receive the wafer which rotates to a first transfer position on the rotary transfer device, then the transfer device rotates the wafer to a second transfer position, wherein a camera component is adopted to take a picture to position the direction of the wafer, positioning information of the direction of the wafer is sent to a rotation component arranged in the transfer device, the rotation component drives the wafer to rotate according to the positioning information of the direction of the wafer, and when the wafer is placed to rotate to the second transfer position, the direction of the wafer always points to a certain direction;
s4, a second rotary transfer device is adopted to receive the wafer at a second transfer position, then the wafer is rotated to a material placing position, and then a material plate assembly is adopted to receive the wafer at the material placing position;
s5, repeating the steps, and sequentially transferring a plurality of wafers on the membrane to the material plate assembly to obtain the wafer material plates which are orderly arranged and have the wafer directions pointing to the same direction.
2. A bulk material arranging apparatus, comprising:
the feeding device comprises a diaphragm bearing assembly, a first X-axis translation assembly and a first Y-axis translation assembly, wherein the diaphragm bearing assembly is used for fixing a diaphragm, and the first X-axis translation assembly and the first Y-axis translation assembly are respectively used for driving the diaphragm bearing assembly to move along the X-axis direction and the Y-axis direction;
the jacking device comprises an adsorption assembly and a thimble assembly, wherein the thimble assembly is used for jacking up a wafer on the membrane, and the adsorption assembly is used for adsorbing part of the membrane around the wafer to be jacked up by the thimble assembly;
the material transferring device comprises a revolution assembly and a rotation assembly, wherein the revolution assembly rotates the wafer from a first transferring position to a second transferring position, and the rotation assembly is used for adjusting the direction of the wafer;
the material plate assembly comprises a material plate, a second X-axis translation assembly and a second Y-axis translation assembly, wherein the second X-axis translation assembly and the second Y-axis translation assembly drive the material plate to move along the X-axis and Y-axis directions;
the first rotary transfer device is used for receiving the wafer at the receiving position on the membrane and transferring the wafer to the first transfer position;
the second rotary transfer device is used for transferring the wafer at the second transfer position on the transfer device to the discharge position;
and the camera component is used for photographing and positioning the direction and position information of the wafer.
3. The bulk cargo arraying device according to claim 2, characterised in that said revolution assembly comprises a revolution main shaft and a revolution driving assembly driving the revolution main shaft to rotate.
4. The bulk cargo arranging apparatus according to claim 3, wherein the rotation assembly comprises a fixing base, a plurality of jigs for sucking wafers and a rotation driving assembly for driving the jigs to rotate are mounted on the fixing base, and the fixing base is fixedly connected with the revolution main shaft.
5. The bulk cargo arranging apparatus according to claim 4, wherein a plurality of the jigs are arranged in a circular array with the revolution main shaft as a center line.
6. The bulk material alignment apparatus of claim 5, wherein the transfer device further comprises a lifting assembly for driving the revolution assembly to lift.
7. The bulk material alignment apparatus of claim 2, wherein the film carrier assembly comprises a film mounting frame, a support frame, and a locking assembly, the support frame being provided with an end surface for receiving the film mounting frame, one side of the end surface being provided with a fixed flange, the locking assembly being controllable to urge the film mounting frame against the fixed flange.
8. The bulk cargo arranging apparatus according to claim 2, wherein the suction assembly comprises a suction head and a suction head lifting mechanism, the ejector pin assembly comprises ejector pins and an ejector pin lifting mechanism, ejector pin perforations are provided on the suction head, and the ejector pins are located in the ejector pin perforations.
9. The bulk material alignment apparatus of claim 2, wherein the first and second rotary transfer devices each comprise a work piece and a rotary drive assembly, the work piece being coupled to an output shaft of the rotary drive assembly, the rotary drive assembly being configured to drive the work piece in rotation.
10. The bulk material alignment apparatus of claim 2, wherein the camera assembly includes a first camera for photographing a position of the wafer on the positioning film and an alignment direction of the wafer.
CN202311073284.2A 2023-08-23 2023-08-23 A method and equipment for arranging bulk materials Pending CN117276151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311073284.2A CN117276151A (en) 2023-08-23 2023-08-23 A method and equipment for arranging bulk materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311073284.2A CN117276151A (en) 2023-08-23 2023-08-23 A method and equipment for arranging bulk materials

Publications (1)

Publication Number Publication Date
CN117276151A true CN117276151A (en) 2023-12-22

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202311073284.2A Pending CN117276151A (en) 2023-08-23 2023-08-23 A method and equipment for arranging bulk materials

Country Status (1)

Country Link
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