CN117074149A - Multifunctional vacuum sample cleaning device and how to use it - Google Patents
Multifunctional vacuum sample cleaning device and how to use it Download PDFInfo
- Publication number
- CN117074149A CN117074149A CN202311251639.2A CN202311251639A CN117074149A CN 117074149 A CN117074149 A CN 117074149A CN 202311251639 A CN202311251639 A CN 202311251639A CN 117074149 A CN117074149 A CN 117074149A
- Authority
- CN
- China
- Prior art keywords
- sample
- cleaning
- plasma
- cleaning device
- ultraviolet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/34—Purifying; Cleaning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/44—Sample treatment involving radiation, e.g. heat
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2202—Preparing specimens therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Molecular Biology (AREA)
- Biomedical Technology (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Cleaning In General (AREA)
Abstract
本发明公开了一种多功能真空样品清洗装置,包括:清洗箱体;真空泵组;等离子组件,利用等离子体处理样品表面并经真空泵组带走样品污物,形成等离子清洗模式;灯光组件,包括紫外模块和加热模块;其中,紫外模块对样品表面进行紫外辐照并经真空泵组带走样品污物,形成紫外清洗模式;加热模块加热腔室使样品表面污染物挥发并经真空泵组带走样品污物,形成加热清洗模式;其中,将样品置于腔室内后,通过组合等离子清洗模式、紫外清洗模式、加热清洗模式中的任一种或多种,以供样品在单一区域内实现多功能清洗。本发明还涉及一种多功能真空样品清洗装置的使用方法。本发明通用性强,能够有效降低制样时间和成本,优化样品制备程序,提高效率。
The invention discloses a multifunctional vacuum sample cleaning device, which includes: a cleaning box; a vacuum pump set; a plasma component, which uses plasma to treat the sample surface and takes away sample dirt through the vacuum pump set to form a plasma cleaning mode; and a lighting component, which includes UV module and heating module; among them, the UV module irradiates the sample surface with UV rays and takes away the sample contaminants through the vacuum pump set, forming a UV cleaning mode; the heating module heats the chamber to volatilize the contaminants on the sample surface and takes away the sample through the vacuum pump set dirt to form a heating cleaning mode; in which, after the sample is placed in the chamber, any one or more of the plasma cleaning mode, ultraviolet cleaning mode, and heating cleaning mode are combined to allow the sample to achieve multi-functionality in a single area Clean. The invention also relates to a method of using a multifunctional vacuum sample cleaning device. The invention has strong versatility, can effectively reduce sample preparation time and cost, optimize sample preparation procedures, and improve efficiency.
Description
技术领域Technical field
本发明涉及电子显微镜清洗技术领域,具体涉及一种多功能真空样品清洗装置以及一种使用多功能真空样品清洗装置的使用方法。The invention relates to the technical field of electron microscope cleaning, and in particular to a multifunctional vacuum sample cleaning device and a method of using the multifunctional vacuum sample cleaning device.
背景技术Background technique
在电镜分析系统中,包括透射电镜分析、扫描电镜分析等,其对样品要求较高,样品和样品杆端部在样品制备、装样过程中或多或少会吸附空气中的有机物和气体分子,如若这些污染物随样品和样品杆带入到透射电镜/扫描电镜真空腔室中,则会影响电镜成像清晰度,甚至污染物会影响镜筒的真空度,对电镜物镜、极靴,光阑和灯丝造成污染,缩短电镜使用寿命。因而在样品进电镜前,需对样品进行预先清洗,但目前市面上产品比较单一,即设备通常只具备单一的清洗功能,如果需要进行多种清洗模式,则需要在不同设备之间流转,这就不可避免会出现操作麻烦、成本增加、多种设备占用空间大等问题,可见只有单一清洗功能的设备通用性差,并不能够满足不同样品的不同清洗要求,延长了制样时间,增加成本。In the electron microscopy analysis system, including transmission electron microscopy analysis, scanning electron microscopy analysis, etc., it has high requirements on samples. The sample and the end of the sample rod will more or less absorb organic matter and gas molecules in the air during the sample preparation and loading process. , if these contaminants are brought into the transmission electron microscope/scanning electron microscope vacuum chamber with the sample and sample rod, it will affect the clarity of the electron microscope imaging, and even the contaminants will affect the vacuum degree of the lens barrel, which will affect the electron microscope objective lens, pole piece, light The lantern and filament cause pollution and shorten the service life of the electron microscope. Therefore, the sample needs to be pre-cleaned before entering the electron microscope. However, the products currently on the market are relatively single, that is, the equipment usually only has a single cleaning function. If multiple cleaning modes are required, they need to be transferred between different equipment. This Problems such as troublesome operation, increased costs, and large space occupied by multiple devices are inevitable. It can be seen that equipment with only a single cleaning function has poor versatility and cannot meet the different cleaning requirements of different samples, prolonging the sample preparation time and increasing costs.
因此,有必要提供一种新方式来解决上述技术问题。Therefore, it is necessary to provide a new way to solve the above technical problems.
发明内容Contents of the invention
针对现有技术的不足之处,本发明的目的在于提供一种多功能真空样品清洗装置,形成集等离子清洗、紫外清洗和加热真空脱附清洗三种清洗模式于一体的多功能清洗装置,通用性强,能够有效降低制样时间和成本,优化样品制备程序,提高效率。In view of the shortcomings of the existing technology, the purpose of the present invention is to provide a multifunctional vacuum sample cleaning device to form a multifunctional cleaning device that integrates three cleaning modes: plasma cleaning, ultraviolet cleaning and heated vacuum desorption cleaning. It is universal. It has strong performance and can effectively reduce sample preparation time and cost, optimize sample preparation procedures and improve efficiency.
本发明的技术方案概述如下:The technical solution of the present invention is summarized as follows:
一种多功能真空样品清洗装置,包括:A multifunctional vacuum sample cleaning device, including:
清洗箱体,其内形成有一腔室,用以放置样品;The cleaning box has a chamber formed in it for placing the sample;
真空泵组,其与所述清洗箱体安装并与所述腔室连通,用于对所述腔室进行抽真空;A vacuum pump set, which is installed with the cleaning box and communicates with the chamber, and is used to evacuate the chamber;
等离子组件,其安装于所述清洗箱体一侧并与所述腔室连通;且所述等离子组件利用等离子体处理样品表面并经所述真空泵组带走样品污物,形成等离子清洗模式;A plasma component is installed on one side of the cleaning box and communicates with the chamber; and the plasma component uses plasma to treat the sample surface and takes away sample dirt through the vacuum pump group to form a plasma cleaning mode;
灯光组件,其安装于所述清洗箱体顶部并伸入所述腔室内;且所述灯光组件包括紫外模块和加热模块;其中,A lighting assembly is installed on the top of the cleaning box and extends into the chamber; and the lighting assembly includes a UV module and a heating module; wherein,
所述紫外模块对样品表面进行紫外辐照并经所述真空泵组带走样品污物,形成紫外清洗模式;The ultraviolet module irradiates the surface of the sample with ultraviolet radiation and takes away sample dirt through the vacuum pump unit to form an ultraviolet cleaning mode;
所述加热模块加热所述腔室使样品表面污染物挥发并经所述真空泵组带走样品污物,形成加热清洗模式;The heating module heats the chamber to volatilize contaminants on the sample surface and take away the sample contaminants through the vacuum pump group, forming a heating cleaning mode;
其中,将样品置于所述腔室内后,通过组合所述等离子清洗模式、所述紫外清洗模式、所述加热清洗模式中的任一种或多种,以供样品在单一区域内实现多功能清洗。Wherein, after the sample is placed in the chamber, any one or more of the plasma cleaning mode, the ultraviolet cleaning mode, and the heating cleaning mode are combined so that the sample can achieve multiple functions in a single area. Clean.
优选的,所述腔室内设置有可抽拉式支架组件,所述支架组件包括至少三组水平导轨,用以放置托盘以形成多个样品存放区。Preferably, a pull-out bracket assembly is provided in the chamber, and the bracket assembly includes at least three sets of horizontal guide rails for placing trays to form multiple sample storage areas.
优选的,所述等离子组件与所述真空泵组连接于所述清洗箱体不同侧;其中,Preferably, the plasma component and the vacuum pump set are connected to different sides of the cleaning box; wherein,
所述等离子组件与所述腔室连通处位于所述支架组件上侧;The communication point between the plasma component and the chamber is located on the upper side of the bracket component;
所述真空泵组与所述腔室连通处靠近所述支架组件底部。The communication point between the vacuum pump set and the chamber is close to the bottom of the bracket assembly.
优选的,所述灯光组件还包括:Preferably, the lighting assembly further includes:
灯座,其与所述清洗箱体安装并形成所述清洗箱体的顶部饰面;A lamp holder, which is installed with the cleaning box and forms the top finish of the cleaning box;
灯板,其与所述灯座安装并位于所述灯座下方,且所述紫外模块和加热模块与所述灯板固定;A lamp panel, which is installed with the lamp holder and located below the lamp holder, and the ultraviolet module and heating module are fixed to the lamp panel;
灯罩,其与所述灯板固定并罩设于所述紫外模块和加热模块外侧,并用以引导所述紫外模块与加热模块的灯光的出射方向。A lampshade is fixed to the lamp panel and is provided outside the ultraviolet module and the heating module, and is used to guide the emission direction of the light from the ultraviolet module and the heating module.
优选的,所述灯光组件位于所述支架组件正上方,所述灯罩引导所述紫外模块与加热模块的灯光的垂直照射于所述支架组件。Preferably, the light assembly is located directly above the bracket assembly, and the lampshade guides the vertical illumination of light from the ultraviolet module and the heating module to the bracket assembly.
优选的,所述灯光组件的光线覆盖面积大于所述支架组件上表面面积。Preferably, the light coverage area of the light assembly is larger than the upper surface area of the bracket assembly.
优选的,所述清洗箱体上设置有至少一样品杆安装口,其位于与所述等离子组件相对的一侧,所述样品杆安装口其与所述腔室连通,用以插接透射电镜样品杆。Preferably, the cleaning box is provided with at least one sample rod mounting port, which is located on the side opposite to the plasma component. The sample rod mounting port is connected to the chamber and is used to plug in a transmission electron microscope. Sample rod.
优选的,还包括:排气组件,其与所述清洗箱体连接并连通至所述腔室内,且所述排气组件与所述真空泵组位于所述清洗箱体的同一侧。Preferably, it further includes: an exhaust assembly connected to the cleaning box and communicated into the chamber, and the exhaust assembly and the vacuum pump set are located on the same side of the cleaning box.
优选的,所述清洗箱体还配有第一法兰、第二法兰、第三法兰和第四法兰;其中,所述第一法兰用以与所述等离子组件对接;所述第二法兰用以连接所述排气组件和所述腔室;所述第三法兰用以连接所述真空泵组和所述腔室;所述第四法兰用以与一真空计连接。Preferably, the cleaning box is further equipped with a first flange, a second flange, a third flange and a fourth flange; wherein the first flange is used to dock with the plasma component; the The second flange is used to connect the exhaust assembly and the chamber; the third flange is used to connect the vacuum pump set and the chamber; the fourth flange is used to connect with a vacuum gauge. .
本发明还提供一种多功能真空样品清洗装置的使用方法,应用于如上所述的多功能真空样品清洗装置,包括步骤:The present invention also provides a method of using a multifunctional vacuum sample cleaning device, which is applied to the multifunctional vacuum sample cleaning device as described above, including the steps:
步骤一、将样品放置于所述清洗箱体的腔室后,选择清洗装置的清洗模式;其中,所述清洗模式至少包括等离子清洗模式、紫外清洗模式和加热清洗模式;Step 1: After placing the sample in the chamber of the cleaning box, select the cleaning mode of the cleaning device; wherein the cleaning mode at least includes a plasma cleaning mode, an ultraviolet cleaning mode and a heating cleaning mode;
步骤二、启动清洗装置:Step 2. Start the cleaning device:
当清洗装置处于等离子清洗模式下时,等离子组件产生的等离子体进入腔室内,使样品表面残留的有机污染物分解并被真空泵组抽出;When the cleaning device is in the plasma cleaning mode, the plasma generated by the plasma component enters the chamber, causing the residual organic pollutants on the sample surface to decompose and be extracted by the vacuum pump unit;
当清洗装置处于紫外清洗模式下时,紫外模块提供两种波段紫外光同时辐照腔室,腔室内产生高浓度高活性氧自由基,样品表面污染物和氧自由基反应分解并被真空泵组抽出去除;When the cleaning device is in the ultraviolet cleaning mode, the ultraviolet module provides two bands of ultraviolet light to irradiate the chamber at the same time. High concentrations of highly active oxygen radicals are generated in the chamber. The contaminants on the sample surface react with the oxygen radicals to decompose and are pumped out by the vacuum pump unit. remove;
当清洗装置处于加热清洗模式下时,加热模块发出来的光波对腔室进行加热,使样品的温度升高将其表面附着的有机物和水分挥发,并被真空泵组抽出;When the cleaning device is in the heating cleaning mode, the light waves emitted by the heating module heat the chamber, causing the temperature of the sample to rise, volatilizing the organic matter and moisture attached to the surface, and being pumped out by the vacuum pump unit;
步骤三、待样品清洗完成后,关闭清洗装置。Step 3: After the sample cleaning is completed, close the cleaning device.
相比现有技术,本发明的有益效果在于:Compared with the existing technology, the beneficial effects of the present invention are:
本发明提供一种多功能真空样品清洗装置,其通过设置真空泵组、等离子组件、紫外模块和加热模块,形成集等离子清洗、紫外清洗和加热真空脱附清洗三种清洗模式于一体的多功能清洗装置,即能够在同一个腔室内执行等离子清洗和或紫外清洗和/或加热真空脱附清洗,能够根据不同电镜对样品的要求选择对应的清洗模式或组合清洗模式,有效减少样品附着的污染物,减轻甚至消除样品显微成像过程中的积碳影响,提高样品制备质量,且通用性强,能够有效降低制样时间和成本,优化样品制备程序,提高效率;并且,同时,可对样品进行真空储存,有效保证样品质量。The present invention provides a multifunctional vacuum sample cleaning device, which is provided with a vacuum pump group, a plasma component, an ultraviolet module and a heating module to form a multifunctional cleaning device that integrates three cleaning modes: plasma cleaning, ultraviolet cleaning and heated vacuum desorption cleaning. The device can perform plasma cleaning, or UV cleaning, and/or heated vacuum desorption cleaning in the same chamber, and can select the corresponding cleaning mode or combined cleaning mode according to the requirements of different electron microscopes for samples, effectively reducing the contaminants attached to the sample. , reduce or even eliminate the impact of carbon deposition during the sample microscopic imaging process, improve the quality of sample preparation, and have strong versatility, which can effectively reduce sample preparation time and cost, optimize sample preparation procedures, and improve efficiency; and, at the same time, samples can be processed Vacuum storage effectively ensures sample quality.
上述说明仅是本发明技术方案的概述,为了能够更清楚了解本发明的技术手段,并可依照说明书的内容予以实施,以下以本发明的较佳实施例并配合附图详细说明如后。本发明的具体实施方式由以下实施例及其附图详细给出。The above description is only an overview of the technical solutions of the present invention. In order to have a clearer understanding of the technical means of the present invention and implement them according to the contents of the description, the preferred embodiments of the present invention are described in detail below with reference to the accompanying drawings. Specific embodiments of the present invention are given in detail by the following examples and accompanying drawings.
附图说明Description of the drawings
此处所说明的附图用来提供对本发明的进一步理解,构成本申请的一部分,本发明的示意性实施例及其说明用于解释本发明,并不构成对本发明的不当限定。在附图中:The drawings described here are used to provide a further understanding of the present invention and constitute a part of this application. The illustrative embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the attached picture:
图1为本发明中多功能真空样品清洗装置整体结构示意图图一;Figure 1 is a schematic diagram of the overall structure of the multifunctional vacuum sample cleaning device in the present invention;
图2为本发明中多功能真空样品清洗装置整体结构示意图图二;Figure 2 is a schematic diagram of the overall structure of the multifunctional vacuum sample cleaning device in the present invention; Figure 2;
图3为本发明中多功能真空样品清洗装置的爆炸结构图;Figure 3 is an exploded structural view of the multifunctional vacuum sample cleaning device of the present invention;
图4为本发明中清洗箱体与等离子组件、灯光组件的装配关系示意图;Figure 4 is a schematic diagram of the assembly relationship between the cleaning box, the plasma component and the lighting component in the present invention;
图5为本发明中灯光组件的整体结构示意图;Figure 5 is a schematic diagram of the overall structure of the lighting assembly in the present invention;
图6为本发明中灯光组件的爆炸结构示意图;Figure 6 is a schematic diagram of the exploded structure of the lighting assembly in the present invention;
图7为本发明中紫外模块、加热模块与灯板的安装位置关系示意图;Figure 7 is a schematic diagram of the installation position relationship between the ultraviolet module, the heating module and the light panel in the present invention;
图8为本发明中紫外模块的爆炸结构示意图;Figure 8 is a schematic diagram of the exploded structure of the ultraviolet module in the present invention;
图9为本发明中加热模块的结构示意图;Figure 9 is a schematic structural diagram of the heating module in the present invention;
图10为本发明中清洗箱体的门体的安装结构示意图;Figure 10 is a schematic diagram of the installation structure of the door of the cleaning box in the present invention;
图11为本发明中清洗箱体的支架组件的结构示意图。Figure 11 is a schematic structural diagram of the bracket assembly of the cleaning box in the present invention.
图中:1、清洗装置;In the picture: 1. Cleaning device;
10、清洗箱体;11、腔室;12、样品杆安装口;13、第一法兰;14、第二法兰;15、第三法兰;16、第四法兰;17、支架组件;171、水平导轨;172、托盘;173、通风槽;18、门体;181、玻璃面板;10. Cleaning box; 11. Chamber; 12. Sample rod installation port; 13. First flange; 14. Second flange; 15. Third flange; 16. Fourth flange; 17. Bracket assembly ; 171. Horizontal guide rail; 172. Tray; 173. Ventilation slot; 18. Door body; 181. Glass panel;
20、等离子组件;21、等离子接口;22、等离子外壳;20. Plasma components; 21. Plasma interface; 22. Plasma shell;
30、灯光组件;31、紫外模块;311、托板组件;3111、托板;3112、支柱;312、UV灯管组件;3121、弯折部;3122、连接部;32、加热模块;321、卤素灯座;3211、插头;322、卤素灯泡;33、灯座;331、安装孔;332、安装止口;34、灯板;341、方孔;35、接线盒;36、灯罩;361、反光板;362、防护板;3621、透光孔;30. Lighting component; 31. UV module; 311. Pallet component; 3111. Pallet; 3112. Pillar; 312. UV lamp component; 3121. Bending part; 3122. Connection part; 32. Heating module; 321. Halogen lamp holder; 3211, plug; 322, halogen bulb; 33, lamp holder; 331, mounting hole; 332, mounting stop; 34, lamp panel; 341, square hole; 35, junction box; 36, lampshade; 361, Reflective plate; 362, protective plate; 3621, light-transmitting hole;
40、排气组件;41、排气阀;40. Exhaust assembly; 41. Exhaust valve;
50、真空计。50. Vacuum gauge.
具体实施方式Detailed ways
下面将结合本发明实施方式中的附图,对本发明实施方式中的技术方案进行清楚、完整的描述,显然,所描述的实施方式仅仅是本发明一部分实施方式,而不是全部的实施方式。基于本发明中的实施方式,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of the present invention.
在附图中,为清晰起见,可对形状和尺寸进行放大,并将在所有图中使用相同的附图标记来指示相同或相似的部件。In the drawings, the shapes and dimensions may be exaggerated for clarity, and the same reference numbers will be used throughout the drawings to refer to the same or similar parts.
在下列描述中,诸如中心、厚度、高度、长度、前部、背部、后部、左边、右边、顶部、底部、上部、下部等用词是相对于各附图中所示的构造进行定义的,特别地,“高度”相当于从顶部到底部的尺寸,“宽度”相当于从左边到右边的尺寸,“深度”相当于从前到后的尺寸,它们是相对的概念,因此有可能会根据其所处不同位置、不同使用状态而进行相应地变化,所以,也不应当将这些或者其他的方位用于解释为限制性用语。In the following description, terms such as center, thickness, height, length, front, back, rear, left, right, top, bottom, upper, lower, etc. are defined with respect to the configuration shown in the respective figures. , in particular, "height" is equivalent to the size from top to bottom, "width" is equivalent to the size from left to right, and "depth" is equivalent to the size from front to back. They are relative concepts, so it may be based on It changes accordingly in different locations and usage conditions, so these or other directions should not be interpreted as restrictive terms.
涉及附接、联接等的术语(例如,“连接”和“附接”)是指这些结构通过中间结构彼此直接或间接固定或附接的关系、以及可动或刚性附接或关系,除非以其他方式明确地说明。Terms referring to attachment, coupling, and the like (e.g., "connected" and "attached") mean that structures are in a fixed or attached relationship, directly or indirectly, to each other through intervening structures, and are movable or rigid attachments or relationships, unless Otherwise stated explicitly.
实施例1Example 1
本发明实施例提供一种多功能真空样品清洗装置1,结合图1-图11所示,包括:An embodiment of the present invention provides a multifunctional vacuum sample cleaning device 1, as shown in Figures 1 to 11, including:
清洗箱体10,其内形成有一腔室11,用以放置待清洗样品;The cleaning box 10 has a chamber 11 formed in it for placing the sample to be cleaned;
真空泵组,其与所述清洗箱体10安装并与所述腔室11连通,用于对所述腔室11进行抽真空;A vacuum pump set is installed with the cleaning box 10 and communicates with the chamber 11, and is used to evacuate the chamber 11;
等离子组件20,其安装于所述清洗箱体10一侧并与所述腔室11连通;且所述等离子组件20利用等离子体处理样品表面并经所述真空泵组带走样品污物,形成等离子清洗模式;The plasma component 20 is installed on one side of the cleaning box 10 and communicates with the chamber 11; and the plasma component 20 uses plasma to process the sample surface and takes away sample dirt through the vacuum pump group to form plasma. cleaning mode;
灯光组件30,其安装于所述清洗箱体10顶部并伸入所述腔室11内;且所述灯光组件30包括紫外模块31和加热模块32;其中,The lighting assembly 30 is installed on the top of the cleaning box 10 and extends into the chamber 11; and the lighting assembly 30 includes a UV module 31 and a heating module 32; wherein,
所述紫外模块31对样品表面进行紫外辐照并经所述真空泵组带走样品污物,形成紫外清洗模式;The ultraviolet module 31 irradiates the sample surface with ultraviolet radiation and takes away the sample dirt through the vacuum pump group to form an ultraviolet cleaning mode;
所述加热模块32加热所述腔室11使样品表面污染物挥发并经所述真空泵组带走样品污物,形成加热清洗模式;The heating module 32 heats the chamber 11 to volatilize the sample surface contaminants and take away the sample contaminants through the vacuum pump group, forming a heating cleaning mode;
其中,将样品置于所述腔室11内后,通过组合所述等离子清洗模式、所述紫外清洗模式、所述加热清洗模式中的任一种或多种,以供样品在单一区域内实现多功能清洗。After the sample is placed in the chamber 11, any one or more of the plasma cleaning mode, the ultraviolet cleaning mode, and the heating cleaning mode are combined so that the sample can be cleaned in a single area. Multifunctional cleaning.
具体的,所述等离子清洗模式、所述紫外清洗模式以及所述加热清洗模式均可被单独控制;因此,将样品放置于腔室内后,可以仅选择等离子清洗模式或紫外清洗模式或加热清洗模式,即执行单一的清洗模式;也可以组合不同的清洗模式,例如组合等离子清洗模式和紫外清洗模式,或组合紫外清洗模式和加热清洗模式,或组合等离子清洗模式和加热清洗模式,或组合等离子清洗模式、紫外清洗模式和加热清洗模式多种清洗方式,从而达到多功能清洗效果。Specifically, the plasma cleaning mode, the ultraviolet cleaning mode and the heating cleaning mode can all be controlled individually; therefore, after placing the sample in the chamber, only the plasma cleaning mode or the ultraviolet cleaning mode or the heating cleaning mode can be selected. , that is, executing a single cleaning mode; you can also combine different cleaning modes, such as combining plasma cleaning mode and UV cleaning mode, or combining UV cleaning mode and heating cleaning mode, or combining plasma cleaning mode and heating cleaning mode, or combining plasma cleaning mode, UV cleaning mode and heating cleaning mode to achieve multi-functional cleaning effects.
该清洗装置1可用于各种扫描电镜、聚焦离子束显微镜、透射电镜样品杆清洗并具备恒温真空样品储存等功能;该清洗装置1由一套真空样品腔室11和三种清洗功能部件组成,以实现至少三种清洗模式:The cleaning device 1 can be used for cleaning various scanning electron microscopes, focused ion beam microscopes, and transmission electron microscope sample rods and has functions such as constant temperature vacuum sample storage; the cleaning device 1 consists of a set of vacuum sample chambers 11 and three cleaning functional components. To achieve at least three cleaning modes:
等离子清洗模式,利用等离子体来达到常规清洗方法无法达到的效果;等离子体是物质的一种状态,也叫做物质的第四态;对气体施加足够的能量使之离化便成为等离子状态。等离子体的“活性”组分包括:离子、电子、活性基团、激发态的核素(亚稳态)、光子等;通过利用这些活性组分的性质来处理样品表面,除去样品及样品杆上的污染,防止碳沉积以降低图像分辨率及对样品微区分析造成误判,从而实现清洁等目的。Plasma cleaning mode uses plasma to achieve effects that conventional cleaning methods cannot achieve; plasma is a state of matter, also called the fourth state of matter; applying enough energy to gas to ionize it becomes a plasma state. The "active" components of plasma include: ions, electrons, active groups, excited nuclide (metastable state), photons, etc.; by utilizing the properties of these active components to treat the sample surface, the sample and sample rod are removed Contamination on the surface prevents carbon deposition from reducing image resolution and causing misjudgment in sample micro-area analysis, thereby achieving cleaning and other purposes.
紫外清洗模式,本发明中的紫外模块31两种特殊波段紫外光同时辐照所述腔室11,腔室11内产生高浓度高活性氧自由基,样品表面污染物和氧自由基反应分解去除;具体的,通过产生185nm和254nm高强度UV光分解有机分子(污染物),185nm的光可以将氧分子O2转变成活性的O3臭氧分子,254nm的光同时激发表面的有机分子,使其更容易被臭氧分子吸收并分解,从而实现清洁等目的。In the ultraviolet cleaning mode, the ultraviolet module 31 in the present invention irradiates the chamber 11 with two special bands of ultraviolet light at the same time. A high concentration of highly active oxygen free radicals are generated in the chamber 11, and the pollutants on the sample surface and the oxygen free radicals are decomposed and removed by reaction. ; Specifically, by generating high-intensity UV light of 185nm and 254nm to decompose organic molecules (pollutants), the 185nm light can convert oxygen molecules O2 into active O3 ozone molecules, and the 254nm light simultaneously excites organic molecules on the surface, making It is more easily absorbed and decomposed by ozone molecules, allowing for cleaning and other purposes.
加热清洗模式,腔室11升温迅速,最高可加热至150℃,搭配真空泵组抽真空,可使样品表面污染物快速挥发去除,从而实现清洁等目的;加热清洗能够完美地保存材料的固有形态,又改良其物理性能,使其适合在电镜下观察成像;优选的,所述加热模块32配置有高精度温控器,以将温度精度控制在±1℃。In the heating cleaning mode, the chamber 11 heats up quickly and can be heated up to 150°C. When used with a vacuum pump unit, contaminants on the surface of the sample can be quickly evaporated and removed, thereby achieving cleaning and other purposes; heating cleaning can perfectly preserve the inherent shape of the material. Its physical properties are also improved to make it suitable for observation and imaging under an electron microscope; preferably, the heating module 32 is equipped with a high-precision temperature controller to control the temperature accuracy within ±1°C.
本发明通过设置真空泵组、等离子组件20、紫外模块31和加热模块32,形成集等离子清洗、紫外清洗和加热真空脱附清洗三种清洗模式于一体的多功能清洗装置1,即能够在同一个腔室11内执行等离子清洗和或紫外清洗和/或加热真空脱附清洗,能够根据不同电镜对样品的要求选择对应的清洗模式或组合清洗模式,有效减少样品附着的污染物,减轻甚至消除样品显微成像过程中的积碳影响,提高样品制备质量,且通用性强,能够有效降低制样时间和成本,优化样品制备程序,提高效率;同时可对样品进行真空储存,有效保证样品质量。The present invention forms a multifunctional cleaning device 1 that integrates three cleaning modes: plasma cleaning, ultraviolet cleaning and heated vacuum desorption cleaning by arranging a vacuum pump group, a plasma component 20, an ultraviolet module 31 and a heating module 32, that is, it can be used in the same Plasma cleaning, ultraviolet cleaning, and/or heated vacuum desorption cleaning are performed in the chamber 11. Corresponding cleaning modes or combined cleaning modes can be selected according to the requirements of different electron microscopes for samples, effectively reducing contaminants attached to the sample, and reducing or even eliminating the sample. The impact of carbon deposition during the microscopic imaging process improves the quality of sample preparation, and is highly versatile. It can effectively reduce sample preparation time and cost, optimize sample preparation procedures, and improve efficiency. At the same time, samples can be stored in vacuum to effectively ensure sample quality.
在一实施例中,如图9和图10所示,所述清洗箱体10内设置有可抽拉式支架组件17,所述支架组件17包括至少三组水平导轨171,用以放置托盘172以形成多个样品存放区。In one embodiment, as shown in FIGS. 9 and 10 , a pull-out bracket assembly 17 is provided in the cleaning box 10 . The bracket assembly 17 includes at least three sets of horizontal guide rails 171 for placing the tray 172 to form multiple sample storage areas.
进一步地,支架组件17的前后侧壁为贯穿设置,左右侧壁上开设有通风槽173,该设置有利于腔室11内气体流动以提高清洗效果。Furthermore, the front and rear side walls of the bracket assembly 17 are arranged through, and ventilation slots 173 are provided on the left and right side walls. This arrangement is conducive to the flow of gas in the chamber 11 to improve the cleaning effect.
在一实施例中,所述等离子组件20与所述真空泵组连接于所述清洗箱体10不同侧;其中,In one embodiment, the plasma component 20 and the vacuum pump set are connected to different sides of the cleaning box 10; wherein,
所述等离子组件20连接至所述清洗箱体10靠近顶部位置,所述真空泵组连接至所述清洗箱体10靠近底部位置;具体为,The plasma component 20 is connected to the cleaning box 10 near the top, and the vacuum pump group is connected to the cleaning box 10 near the bottom; specifically,
所述等离子组件20与所述腔室11连通处位于所述支架组件17上侧;The communication point between the plasma component 20 and the chamber 11 is located on the upper side of the bracket component 17;
所述真空泵组与所述腔室11连通处靠近所述支架组件17底部。The communication point between the vacuum pump set and the chamber 11 is close to the bottom of the bracket assembly 17 .
该设置有利于增加等离子气体与置于支架组件17上的样品的接触面,从而提高等离子清洗效果。This arrangement is conducive to increasing the contact surface between the plasma gas and the sample placed on the bracket assembly 17, thereby improving the plasma cleaning effect.
进一步地,结合图1-图4所示,所述等离子组件20包括电感耦合等离子源。其中,新型电感耦合等离子源(I CP),其粒子密度远高于传统的电容耦合技术(CCP),通过产生高浓度氧自由基高效去除样品表面碳氢污染物;且Downstream(顺流等离子体)清洗方式,样品表面无损清洗,最大程度保持样品表面原始形貌。Further, as shown in FIGS. 1-4 , the plasma component 20 includes an inductively coupled plasma source. Among them, the new inductively coupled plasma source (ICP), whose particle density is much higher than that of the traditional capacitively coupled plasma technology (CCP), can efficiently remove hydrocarbon contaminants on the sample surface by generating high concentrations of oxygen radicals; and Downstream (downstream plasma) ) cleaning method, non-destructive cleaning of the sample surface, maintaining the original morphology of the sample surface to the greatest extent.
进一步地,所述等离子组件20包括等离子接口21和等离子外壳22;其中,所述等离子外壳22用以容纳等离子体,所述等离子接口21设于所述等离子外壳22端部,用以与清洗箱体10侧壁连接,以将等离子体定向输送至所述腔室11内。Further, the plasma component 20 includes a plasma interface 21 and a plasma shell 22; wherein, the plasma shell 22 is used to accommodate plasma, and the plasma interface 21 is provided at an end of the plasma shell 22 to communicate with the cleaning box. The side walls of the body 10 are connected to directionally deliver plasma into the chamber 11 .
等离子清洗模式的工作原理包括:将样品放置于清洗箱体10的腔室11内,等离子源在等离子外壳22中产生等离子体后,通过真空泵组抽气产生的负压使得等离子体经等离子接口21顺流到腔室11内,与样品表面残留的有机污染物发生化学反应,生成CO2、CO及H2O并被真空泵组抽出,减少电镜样品积碳,提高成像分辨率及衬度。The working principle of the plasma cleaning mode includes: placing the sample in the chamber 11 of the cleaning box 10 , after the plasma source generates plasma in the plasma shell 22 , the negative pressure generated by pumping the vacuum pump group causes the plasma to pass through the plasma interface 21 It flows downstream into the chamber 11 and reacts chemically with the organic pollutants remaining on the surface of the sample to generate CO 2 , CO and H 2 O, which are pumped out by the vacuum pump group to reduce carbon deposition on the electron microscope sample and improve imaging resolution and contrast.
在一实施例中,结合图5-图9所示,所述灯光组件30还包括:In one embodiment, as shown in Figures 5-9, the lighting assembly 30 further includes:
灯座33,其与所述清洗箱体10安装并形成所述清洗箱体10的顶部饰面;The lamp holder 33 is installed with the cleaning box 10 and forms the top finish of the cleaning box 10;
灯板34,其与所述灯座33安装并位于所述灯座33下方,且所述紫外模块31和加热模块32与所述灯板34固定;The lamp panel 34 is installed with the lamp holder 33 and located below the lamp holder 33, and the UV module 31 and the heating module 32 are fixed to the lamp panel 34;
接线盒35,其与所述灯板34固定连接,用以形成所述灯光组件30的布线空间;A junction box 35 is fixedly connected to the light panel 34 to form a wiring space for the light assembly 30;
灯罩36,其与所述灯板34固定并罩设于所述紫外模块31和加热模块32外侧,并用以引导所述紫外模块31与加热模块32的灯光的出射方向。The lampshade 36 is fixed to the lamp panel 34 and covers the outside of the ultraviolet module 31 and the heating module 32, and is used to guide the emission direction of the light from the ultraviolet module 31 and the heating module 32.
具体的,灯座33表面设置有安装孔331,灯座33通过该安装孔331与清洗箱体10固定,且所述灯座33朝向清洗箱体10一侧表面形成有安装止口332,该安装止口332与所述清洗箱体10上部敞口形状相适配,当灯光组件30安装至清洗箱体10上时,该安装止口332伸入敞口内以形成密封;所述灯板34通过紧固件与所述灯座33固定连接,且所述灯板34中间开设有方孔341,其位置与所述接线盒35相对应,以便于线束穿设;灯罩36的设置一方面可以保护紫外模块31和加热模块32,另一方面能够实现紫外模块31和加热模块32的光线的定向出射,即紫外模块31和加热模块32固定在灯板34上,实现垂直照射样品,精准控制,可快速清洗、去除样品表面污染物。Specifically, a mounting hole 331 is provided on the surface of the lamp holder 33, and the lamp holder 33 is fixed to the cleaning box 10 through the mounting hole 331, and a mounting stop 332 is formed on the surface of the lamp holder 33 facing the cleaning box 10. The installation stop 332 is adapted to the shape of the upper opening of the cleaning box 10. When the light assembly 30 is installed on the cleaning box 10, the installation stop 332 extends into the opening to form a seal; the light panel 34 It is fixedly connected to the lamp holder 33 through fasteners, and a square hole 341 is opened in the middle of the lamp plate 34, and its position corresponds to the junction box 35 to facilitate the wiring harness; on the one hand, the lampshade 36 can be provided Protecting the UV module 31 and the heating module 32, on the other hand, it can realize the directional emission of the light from the UV module 31 and the heating module 32, that is, the UV module 31 and the heating module 32 are fixed on the lamp panel 34 to achieve vertical illumination of the sample and precise control. It can quickly clean and remove contaminants on the sample surface.
进一步地,如图4所示,所述灯光组件30位于所述支架组件17正上方,所述灯罩36引导所述紫外模块31与加热模块32的灯光的垂直照射于所述支架组件17。Further, as shown in FIG. 4 , the light assembly 30 is located directly above the bracket assembly 17 , and the lampshade 36 guides the vertical illumination of the light from the ultraviolet module 31 and the heating module 32 to the bracket assembly 17 .
进一步地,所述灯光组件30的光线覆盖面积大于所述支架组件17上表面面积,即通过增大灯光组件30的覆盖面以增强清洗速率和清洗效果。Furthermore, the light coverage area of the light assembly 30 is larger than the upper surface area of the bracket assembly 17 , that is, the cleaning rate and cleaning effect are enhanced by increasing the coverage area of the light assembly 30 .
进一步地,所述加热模块分布于所述紫外模块外周侧。Further, the heating modules are distributed on the outer peripheral side of the ultraviolet module.
在一实施例中,所述紫外模块31包括托板组件311以及与所述托板组件311安装的UV灯管组件312;其中,In one embodiment, the UV module 31 includes a bracket assembly 311 and a UV lamp assembly 312 installed with the bracket assembly 311; wherein,
所述托板组件311包括至少四支柱3112,用以与所述灯板34固定连接;所述UV灯管组件312呈S型弯折设置于所述托板组件311下方。The support plate assembly 311 includes at least four pillars 3112 for fixed connection with the lamp panel 34; the UV lamp assembly 312 is bent in an S-shape and is disposed below the support plate assembly 311.
具体的,本实施例中,托板组件311包括一托板3111以及位于托板3111两侧边缘处的四支柱3112;其中,UV灯管组件312包括弯折部3121和连接部3122,所述弯折部3121呈S型迂回折弯设置于托板3111下侧,所述连接部3122延伸至所述托板3111上侧;一方面该设置使得UV灯管组件312能够卡接在托板3111上,安装方便快捷,另一方面,便于连接部3122与控制电路连接。Specifically, in this embodiment, the supporting plate assembly 311 includes a supporting plate 3111 and four pillars 3112 located at both edges of the supporting plate 3111; wherein, the UV lamp assembly 312 includes a bending portion 3121 and a connecting portion 3122. The bending portion 3121 is bent in an S-shape on the lower side of the supporting plate 3111, and the connecting portion 3122 extends to the upper side of the supporting plate 3111; on the one hand, this arrangement enables the UV lamp assembly 312 to be clamped on the supporting plate 3111 on the other hand, it is convenient to connect the connecting part 3122 to the control circuit.
进一步地,托板3111相对的两侧分别设置两所述支柱3112,该支柱3112一端与所述托板3111固定,另一端与所述灯板34固定,以便于将紫外模块31安装至所述接线盒35下侧,且具备良好的稳固性。Further, two pillars 3112 are respectively provided on opposite sides of the supporting plate 3111. One end of the pillars 3112 is fixed to the supporting plate 3111, and the other end is fixed to the light panel 34, so as to facilitate the installation of the ultraviolet module 31 on the supporting plate 3111. The lower side of the junction box 35 has good stability.
紫外清洗模式的工作原理包括:将样品放置于清洗箱体10的腔室11内,UV灯管组件312提供两种特殊波段紫外光同时辐照腔室11,腔室11内产生高浓度高活性氧自由基,样品表面污染物和氧自由基反应分解并被真空泵组抽出去除,从而实现清洁目的。The working principle of the UV cleaning mode includes: placing the sample in the chamber 11 of the cleaning box 10, the UV lamp assembly 312 provides two special band ultraviolet lights to simultaneously irradiate the chamber 11, and a high concentration and high activity is generated in the chamber 11 Oxygen free radicals, sample surface contaminants and oxygen free radicals react and decompose and are removed by the vacuum pump unit to achieve cleaning purposes.
在一实施例中,所述加热模块32包括至少四卤素灯,且所述卤素灯包括卤素灯座321和卤素灯泡322;其中,In one embodiment, the heating module 32 includes at least four halogen lamps, and the halogen lamps include a halogen lamp holder 321 and a halogen bulb 322; wherein,
所述卤素灯座321端部形成有插头3211,用以与所述灯板34连接;A plug 3211 is formed on the end of the halogen lamp holder 321 for connection with the lamp panel 34;
所述卤素灯泡322与所述卤素灯座321连接,利用卤素灯泡322发出来的光波对所述腔室11内的待清洗样品进行加热。The halogen bulb 322 is connected to the halogen lamp holder 321, and the light waves emitted by the halogen bulb 322 are used to heat the sample to be cleaned in the chamber 11.
卤素灯的出光更集中,光型更聚光,且光型无明显的明暗区域,能够快速升温。The light output of halogen lamps is more concentrated, the light pattern is more concentrated, and the light pattern has no obvious light and dark areas, and can heat up quickly.
进一步地,所述灯板34相对的两侧分别安装两所述卤素灯。Further, two halogen lamps are respectively installed on opposite sides of the lamp panel 34 .
真空加热清洗的工作原理为:将样品放置在清洗箱体10的腔室11内,卤素灯发出来的光波对腔室11进行加热,使电镜样品的温度升高,使电镜样品表面附着的有机物和水分挥发,生成CO2、CO及H2O并被真空泵组抽出,减少电镜样品积碳,提高成像分辨率及衬度。The working principle of vacuum heating cleaning is as follows: the sample is placed in the chamber 11 of the cleaning box 10, and the light waves emitted by the halogen lamp heat the chamber 11 to increase the temperature of the electron microscope sample and remove the organic matter attached to the surface of the electron microscope sample. and water volatilizes to generate CO 2 , CO and H 2 O, which are pumped out by the vacuum pump group to reduce carbon deposits on electron microscope samples and improve imaging resolution and contrast.
在一实施例中,所述接线盒35外覆盖有反光材料,用以调整光线路径。In one embodiment, the junction box 35 is covered with reflective material to adjust the light path.
进一步地,所述灯罩36包括反光板361和防护板362;其中,Further, the lampshade 36 includes a reflective plate 361 and a protective plate 362; wherein,
所述反光板361与所述灯板34固定连接并围挡于所述紫外模块31和所述加热模块32的外周侧,起到防尘作用的同时保证紫外模块31和加热模块32垂直照射腔室11;The reflective plate 361 is fixedly connected to the lamp panel 34 and surrounds the outer peripheral side of the ultraviolet module 31 and the heating module 32 to prevent dust while ensuring that the ultraviolet module 31 and the heating module 32 illuminate the cavity vertically. Room 11;
所述防护板362安装于所述反光板361下侧,且所述防护板362上形成有若干透光孔3621,以便于所述紫外模块31和所述加热模块32的光线透过。The protective plate 362 is installed on the lower side of the reflective plate 361 , and a plurality of light-transmitting holes 3621 are formed on the protective plate 362 to facilitate the transmission of light from the ultraviolet module 31 and the heating module 32 .
其中,反光板361用以使卤素灯的灯光反射到样品上,加快升温。Among them, the reflective plate 361 is used to reflect the light of the halogen lamp onto the sample to accelerate the temperature rise.
在一实施例中,如图2和图3所示,还包括:排气组件40,其与所述清洗箱体10连接并连通至所述腔室11内;且所述排气组件40与所述真空泵组位于所述清洗箱体10的同一侧。进一步地,排气组件40与真空泵组位于同一水平线上。具体的,所述排气组件40包括一排气阀41,用以控制所述排气组件40工作状态,当清洗装置1在完成清洗工作后,可将排气组件40的排气阀41打开,即可将腔室11内部的空气排出到腔室11外。In one embodiment, as shown in Figures 2 and 3, it also includes: an exhaust assembly 40, which is connected to the cleaning box 10 and communicates with the chamber 11; and the exhaust assembly 40 and The vacuum pump set is located on the same side of the cleaning box 10 . Further, the exhaust assembly 40 and the vacuum pump unit are located on the same horizontal line. Specifically, the exhaust assembly 40 includes an exhaust valve 41 to control the working state of the exhaust assembly 40. When the cleaning device 1 completes the cleaning work, the exhaust valve 41 of the exhaust assembly 40 can be opened. , the air inside the chamber 11 can be discharged to the outside of the chamber 11 .
在一实施例中,如图1和图3所示,所述清洗箱体10上设置有至少一样品杆安装口12,其位于与所述等离子组件20相对的一侧,所述样品杆安装口12其与所述腔室11连通,用以插接透射电镜样品杆。通过在清洗箱体10上预留专门接口,方便透射电镜样品杆接入,以使得在一台机器上实现扫描电镜和透射电镜两类仪器样品的高效清洗。In one embodiment, as shown in Figures 1 and 3, the cleaning box 10 is provided with at least one sample rod mounting port 12, which is located on the side opposite to the plasma assembly 20. The sample rod is installed The port 12 is connected with the chamber 11 and is used for inserting the transmission electron microscope sample rod. By reserving a special interface on the cleaning box 10 to facilitate the access of the transmission electron microscope sample rod, efficient cleaning of samples from both scanning electron microscopes and transmission electron microscopes can be achieved on one machine.
在一实施例中,如图2和图3所示,所述清洗箱体10还配置有真空计50,其位于所述清洗箱体10侧壁上并与所述腔室11连通,用以对所述腔室11的真空度进行测量。具体的,真空计50用于实时监测腔室11内的真空度数值,并与气路系统形成反馈系统,控制腔室11内的气体流量,并且,由于腔室11与等离子组件20、紫外模块31、加热模块32连通,从而通过真空计50可监测整个清洗箱体10内的真空度数值。In one embodiment, as shown in FIGS. 2 and 3 , the cleaning box 10 is also equipped with a vacuum gauge 50 , which is located on the side wall of the cleaning box 10 and communicates with the chamber 11 . The vacuum degree of the chamber 11 is measured. Specifically, the vacuum gauge 50 is used to monitor the vacuum degree value in the chamber 11 in real time, and form a feedback system with the gas circuit system to control the gas flow in the chamber 11. Moreover, since the chamber 11 is connected with the plasma component 20 and the ultraviolet module 31. The heating module 32 is connected, so that the vacuum degree value in the entire cleaning box 10 can be monitored through the vacuum gauge 50 .
在一实施例中,结合图1-图3、图10所示,清洗箱体10还配有第一法兰13、第二法兰14、第三法兰15和第四法兰16;其中,第一法兰13用以与等离子接口21对接;第二法兰14用以连接所述排气组件40和所述腔室11;第三法兰15用以连接所述真空泵组和所述腔室11;第四法兰16用以连接所述真空计50与所述腔室11。In one embodiment, as shown in Figures 1-3 and 10, the cleaning box 10 is also equipped with a first flange 13, a second flange 14, a third flange 15 and a fourth flange 16; wherein , the first flange 13 is used to dock with the plasma interface 21; the second flange 14 is used to connect the exhaust assembly 40 and the chamber 11; the third flange 15 is used to connect the vacuum pump group and the Chamber 11; the fourth flange 16 is used to connect the vacuum gauge 50 and the chamber 11.
进一步地,本发明中的清洗装置1还包括真空储存功能,其中,真空储存的工作原理为:将电镜样品/透射电镜样品杆放置于清洗箱体10的腔室11内,利用真空泵组对腔室11进行抽真空,同时将电镜样品/透射电镜样品杆表面残留气体及污染物抽走,实现对电镜样品和透射电镜样品杆的真空储存。Furthermore, the cleaning device 1 in the present invention also includes a vacuum storage function. The working principle of the vacuum storage is: place the electron microscope sample/transmission electron microscope sample rod in the chamber 11 of the cleaning box 10, and use a vacuum pump set to clean the chamber. The chamber 11 is evacuated, and at the same time, the residual gas and contaminants on the surface of the electron microscope sample/transmission electron microscope sample rod are removed, thereby realizing vacuum storage of the electron microscope sample and the transmission electron microscope sample rod.
在一实施例中,清洗箱体10采用焊接、拼接两种方式的组合结构,腔室11主体采用焊接结构,气密性好。In one embodiment, the cleaning box 10 adopts a combined structure of welding and splicing, and the main body of the chamber 11 adopts a welded structure, which has good air tightness.
进一步地,所述清洗箱体10还设置有一门体18,用以打开和关闭所述腔室11;其中,所述门体18与所述清洗箱体10之间采用O形密封圈进行密封。Furthermore, the cleaning box 10 is also provided with a door 18 for opening and closing the chamber 11; wherein, an O-ring is used to seal the door 18 and the cleaning box 10. .
进一步地,所述门体18包括一玻璃面板181,以便于观察所述腔室11内样品的清洗状态和清洗过程,其中,玻璃面板181采用石英玻璃。Further, the door 18 includes a glass panel 181 to facilitate observation of the cleaning status and cleaning process of the sample in the chamber 11 , wherein the glass panel 181 is made of quartz glass.
实施例2Example 2
本发明实施例还提供一种多功能真空样品清洗装置1的使用方法,应用于如实施例1所述的多功能真空样品清洗装置1,包括步骤:The embodiment of the present invention also provides a method of using a multifunctional vacuum sample cleaning device 1, which is applied to the multifunctional vacuum sample cleaning device 1 described in Embodiment 1, including the steps:
步骤一、将样品放置于所述清洗箱体10的腔室11后,选择清洗装置1的清洗模式;其中,所述清洗模式至少包括等离子清洗模式、紫外清洗模式和加热清洗模式;Step 1: After placing the sample in the chamber 11 of the cleaning box 10, select the cleaning mode of the cleaning device 1; wherein the cleaning mode at least includes a plasma cleaning mode, an ultraviolet cleaning mode and a heating cleaning mode;
步骤二、启动清洗装置1:Step 2. Start the cleaning device 1:
当清洗装置1处于等离子清洗模式下时,等离子组件20产生的等离子体进入腔室11内,使样品表面残留的有机污染物分解并被真空泵组抽出;When the cleaning device 1 is in the plasma cleaning mode, the plasma generated by the plasma component 20 enters the chamber 11 to decompose the organic pollutants remaining on the surface of the sample and be pumped out by the vacuum pump unit;
当清洗装置1处于紫外清洗模式下时,紫外模块31提供两种波段紫外光同时辐照腔室11,腔室11内产生高浓度高活性氧自由基,样品表面污染物和氧自由基反应分解并被真空泵组抽出去除;When the cleaning device 1 is in the ultraviolet cleaning mode, the ultraviolet module 31 provides two bands of ultraviolet light to simultaneously irradiate the chamber 11. A high concentration of highly active oxygen radicals are generated in the chamber 11, and the pollutants on the sample surface react and decompose with the oxygen radicals. and be extracted and removed by the vacuum pump unit;
当清洗装置1处于加热清洗模式下时,加热模块32发出来的光波对腔室11进行加热,使样品的温度升高将其表面附着的有机物和水分挥发,并被真空泵组抽出;When the cleaning device 1 is in the heating cleaning mode, the light waves emitted by the heating module 32 heat the chamber 11, causing the temperature of the sample to increase and the organic matter and moisture attached to the surface to volatilize, and be pumped out by the vacuum pump unit;
步骤三、待样品清洗完成后,关闭清洗装置1。Step 3: After the sample cleaning is completed, close the cleaning device 1.
尽管本发明的实施方案已公开如上,但其并不仅限于说明书和实施方式中所列运用,它完全可以被适用于各种适合本发明的领域,对于熟悉本领域的人员而言,可容易地实现另外的修改,因此在不背离权利要求及等同范围所限定的一般概念下,本发明并不限于特定的细节和这里示出与描述的图例。Although the embodiments of the present invention have been disclosed above, they are not limited to the applications listed in the description and embodiments. They can be applied to various fields suitable for the present invention. For those familiar with the art, they can easily Additional modifications may be made and the invention is therefore not limited to the specific details and illustrations shown and described herein without departing from the general concept defined by the claims and their equivalent scope.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311251639.2A CN117074149A (en) | 2023-09-26 | 2023-09-26 | Multifunctional vacuum sample cleaning device and how to use it |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311251639.2A CN117074149A (en) | 2023-09-26 | 2023-09-26 | Multifunctional vacuum sample cleaning device and how to use it |
Publications (1)
Publication Number | Publication Date |
---|---|
CN117074149A true CN117074149A (en) | 2023-11-17 |
Family
ID=88702569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202311251639.2A Pending CN117074149A (en) | 2023-09-26 | 2023-09-26 | Multifunctional vacuum sample cleaning device and how to use it |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN117074149A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5510624A (en) * | 1995-09-01 | 1996-04-23 | The University Of Chicago | Simultaneous specimen and stage cleaning device for analytical electron microscope |
CN111272792A (en) * | 2020-03-24 | 2020-06-12 | 深圳市速普仪器有限公司 | Electron microscope sample pretreatment equipment |
CN112397415A (en) * | 2019-08-16 | 2021-02-23 | 株式会社斯库林集团 | Heat treatment apparatus and cleaning method for heat treatment apparatus |
CN114226360A (en) * | 2021-12-15 | 2022-03-25 | 中国科学院大连化学物理研究所 | Pretreatment device for electron microscope sample and sample rod |
CN221100232U (en) * | 2023-09-26 | 2024-06-07 | 屹东光学技术(苏州)有限公司 | Multifunctional vacuum sample cleaning device |
-
2023
- 2023-09-26 CN CN202311251639.2A patent/CN117074149A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5510624A (en) * | 1995-09-01 | 1996-04-23 | The University Of Chicago | Simultaneous specimen and stage cleaning device for analytical electron microscope |
CN112397415A (en) * | 2019-08-16 | 2021-02-23 | 株式会社斯库林集团 | Heat treatment apparatus and cleaning method for heat treatment apparatus |
CN111272792A (en) * | 2020-03-24 | 2020-06-12 | 深圳市速普仪器有限公司 | Electron microscope sample pretreatment equipment |
CN114226360A (en) * | 2021-12-15 | 2022-03-25 | 中国科学院大连化学物理研究所 | Pretreatment device for electron microscope sample and sample rod |
CN221100232U (en) * | 2023-09-26 | 2024-06-07 | 屹东光学技术(苏州)有限公司 | Multifunctional vacuum sample cleaning device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN221100232U (en) | Multifunctional vacuum sample cleaning device | |
CN110323118B (en) | Substrate rack and substrate processing system and method | |
JP4553995B2 (en) | Remote microwave plasma equipment | |
TW567517B (en) | Dielectric barrier excimer lamp and ultraviolet light beam irradiating apparatus with the lamp | |
KR920004171B1 (en) | Dry etching apparatus | |
CN1311531C (en) | Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method | |
KR100377095B1 (en) | Semiconductor fabrication apparatus using low energy plasma | |
US8507854B2 (en) | Particle beam microscopy system and method for operating the same | |
KR20090096307A (en) | Ultraviolet irradiation unit and ultraviolet irradiation processing apparatus | |
JP6197641B2 (en) | Vacuum ultraviolet irradiation treatment equipment | |
CN103733296A (en) | Ion beam device | |
CN117074149A (en) | Multifunctional vacuum sample cleaning device and how to use it | |
KR102375576B1 (en) | Substrate processing apparatus and substrate processing method | |
WO2022233343A1 (en) | Method and device for manufacturing hydrophilic substrate | |
JP2000066003A (en) | Method for cleaning optical parts | |
CN215693177U (en) | Microwave cracking treatment equipment for waste gas treatment | |
CN219424115U (en) | Photooxidation waste gas treatment device | |
JPH01205532A (en) | Optical pumping process apparatus | |
JP2004267951A (en) | Cleaning device and cleaning method | |
CN218282995U (en) | Perovskite solar cell surface treatment equipment | |
CN112820813A (en) | Oven and LED wafer for visible light communication | |
CN108380569A (en) | High concentration OH free radical generating means | |
CN213193729U (en) | Biological safety cabinet with external shading structure | |
CN211536938U (en) | Microwave electrodeless ultraviolet lamp with high practicability | |
JP2013140912A (en) | Excimer irradiation apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |