CN117069483A - Method for preparing high-performance ceramic by recycling ceramic casting film waste - Google Patents
Method for preparing high-performance ceramic by recycling ceramic casting film waste Download PDFInfo
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Abstract
Description
技术领域Technical field
本发明涉及一种制备高性能(包括力学性能和热导率等)陶瓷的方法,具体涉及一种陶瓷流延膜废料再利用制备高性能陶瓷的方法,属于陶瓷制备技术领域。The present invention relates to a method for preparing high-performance ceramics (including mechanical properties, thermal conductivity, etc.), specifically a method for preparing high-performance ceramics by reusing ceramic cast film waste, and belongs to the technical field of ceramic preparation.
背景技术Background technique
流延成型(tape casting)是一种制备陶瓷厚膜的重要工艺,能廉价快速地生产大面积陶瓷膜,且生产效率高,产品一致性好,性能稳定,易于实现连续化和自动化制备。流延成型技术可应用于陶瓷基片,LTCC,MTCC,HTCC等领域,包括高导热氮化铝,氮化硅等高导热散热基板,氮化铝,氧化铝等HTCC多层互联器件的电子封装领域,YAG多层复合陶瓷激光器,ZnO压敏陶瓷,多孔SiC陶瓷的成型制备等。Tape casting is an important process for preparing ceramic thick films. It can produce large-area ceramic films cheaply and quickly, with high production efficiency, good product consistency, stable performance, and easy to achieve continuous and automated preparation. Tape casting technology can be applied to ceramic substrates, LTCC, MTCC, HTCC and other fields, including high thermal conductivity heat dissipation substrates such as high thermal conductivity aluminum nitride and silicon nitride, and electronic packaging of HTCC multi-layer interconnect devices such as aluminum nitride and aluminum oxide. Fields, molding and preparation of YAG multilayer composite ceramic lasers, ZnO pressure-sensitive ceramics, porous SiC ceramics, etc.
尽管流延成型技术应用与不同领域,但是经过流延成型后的素坯膜均不可避免的进行切边等工艺操作,同时存在针眼,火山口等缺陷的流延素坯需要被剔除,存在极大的浪费。同时流延膜中往往添加了大量的有机物,诸如聚乙烯醇缩丁醛等大分子粘结剂,不易降解,直接废弃流延膜造成环境污染。此外采用液相烧结的陶瓷浆料中会添加一定的碱金属/碱土金属氧化物,稀土氧化物等,同样直接废弃在造成环境污染的同时会增加材料的制备成本。以往回收料利用,直接通过高温强力搅拌得到二次流延浆料,而其在实际生产制备过程中,该工艺操作困难,可行性不高。Although tape casting technology is used in different fields, the green film after tape casting inevitably undergoes trimming and other process operations. At the same time, the tape casting green films with defects such as pinholes and craters need to be removed, which is extremely problematic. Big waste. At the same time, a large amount of organic matter, such as macromolecular binders such as polyvinyl butyral, is often added to the cast film, which is not easy to degrade, and the cast film is directly discarded, causing environmental pollution. In addition, certain alkali metal/alkaline earth metal oxides, rare earth oxides, etc. will be added to the ceramic slurry that is liquid-phase sintering. Direct waste will also cause environmental pollution and increase the cost of material preparation. In the past, recycled materials were used to directly obtain secondary casting slurry through high-temperature and strong stirring. However, in the actual production and preparation process, this process is difficult to operate and the feasibility is not high.
发明内容Contents of the invention
针对上述问题,本发明提出处理及使用流延废料的方法,可以减少流延废料的浪费,使其作用最大化。具体地,本发明提出将回收料硬化处理,得到粉体后在进行二次浆料的制备,这样能够提高颗粒和溶剂的接触面积,使得有机物能够快速溶剂,陶瓷颗粒能够再次有效分散,从而实现二次浆料的快速制备。In view of the above problems, the present invention proposes a method for processing and using casting waste, which can reduce the waste of casting waste and maximize its effect. Specifically, the present invention proposes to harden the recycled material and prepare the secondary slurry after obtaining the powder. This can increase the contact area between the particles and the solvent, so that the organic matter can be quickly dissolved and the ceramic particles can be effectively dispersed again, thereby achieving Rapid preparation of secondary slurry.
一方面,本发明提供了一种陶瓷流延膜废料再利用制备高性能陶瓷的方法,包括:On the one hand, the present invention provides a method for reusing ceramic cast film waste to prepare high-performance ceramics, including:
(1)将陶瓷流延膜废料中残余溶剂进行挥发处理直至重量不再变化,得到待处理材料;(1) Evaporate the residual solvent in the ceramic cast film waste until the weight no longer changes, and obtain the material to be processed;
(2)将待处理材料先进行液氮脆断处理或硬化处理,再经破碎,得到颗粒原料;(2) The materials to be processed are first subjected to liquid nitrogen embrittlement treatment or hardening treatment, and then crushed to obtain granular raw materials;
(3)将所得颗粒原料和溶剂经过混合,得到混合浆料;(3) Mix the obtained granular raw materials and solvent to obtain a mixed slurry;
(4)将所得混合浆料经过流延成型,得到陶瓷流延膜;(4) The obtained mixed slurry is cast and molded to obtain a ceramic cast film;
(5)将所得陶瓷流延膜经过切边、叠层、金属化中至少一种工艺后,再经脱粘和烧结,得到高性能陶瓷。(5) The obtained ceramic cast film is subjected to at least one process of trimming, lamination, and metallization, and then debonding and sintering to obtain high-performance ceramics.
较佳的,步骤(1)中:所述流延膜废料包括陶瓷流延膜的边角料以及存在缺陷的陶瓷流延膜;所述陶瓷流延膜的主要成分包括氧化铝粉、氮化铝粉、氮化硅粉、硅粉和碳化硅粉。Preferably, in step (1): the cast film waste includes scraps of ceramic cast films and defective ceramic cast films; the main components of the ceramic cast film include alumina powder and aluminum nitride powder. , silicon nitride powder, silicon powder and silicon carbide powder.
所述挥发处理的温度为50~70℃,时间为12~24小时。The temperature of the volatilization treatment is 50-70°C, and the time is 12-24 hours.
较佳的,步骤(2)中:所述液氮脆断处理为将待处理材料充分浸渍液氮(温度为-196℃)之中,保持5~15s;Preferably, in step (2): the liquid nitrogen embrittlement treatment is to fully immerse the material to be treated in liquid nitrogen (temperature is -196°C) and maintain it for 5 to 15 seconds;
所述硬化处理为在鼓风干燥箱中、30~50℃下处理6~24小时。The hardening treatment is performed in a blast drying oven at 30-50°C for 6-24 hours.
较佳的,步骤(2)中:所述破碎为机械破碎;所述破碎后颗粒原料的粒径为0.1mm~2mm。Preferably, in step (2): the crushing is mechanical crushing; the particle size of the crushed raw material is 0.1 mm to 2 mm.
较佳的,步骤(3)中:所述溶剂选自乙醇、丁酮、乙酸乙酯和二甲苯中的至少一种;Preferably, in step (3): the solvent is selected from at least one of ethanol, butanone, ethyl acetate and xylene;
所述溶剂的加入量为颗粒原料的20~40wt%;The added amount of the solvent is 20-40wt% of the particle raw material;
所述混合的方式为球磨混合,所述球磨混合的转速为40~80转/每分钟,时间为48~72小时,球料比为(0.5~2):1,优选为1:1。The mixing method is ball mill mixing, the rotation speed of the ball mill mixing is 40 to 80 rpm, the time is 48 to 72 hours, and the ball to material ratio is (0.5 to 2):1, preferably 1:1.
较佳的,步骤(4)中:所述流延成型的参数包括:刮刀的高度为300~1200μm,干燥的温度为25~70℃。Preferably, in step (4): the parameters of the tape casting include: the height of the scraper is 300-1200 μm, and the drying temperature is 25-70°C.
较佳的,步骤(5)中:所述金属化的参数包括:流延膜经过冲孔后,采用Ag、W、Mo等金属浆料,通过丝网印刷技术得到金属层,并通过叠压成型完成金属化过程。Preferably, in step (5): the metallization parameters include: after the cast film is punched, metal slurries such as Ag, W, Mo, etc. are used to obtain the metal layer through screen printing technology, and the metal layer is obtained through lamination. Forming completes the metallization process.
较佳的,步骤(5)中:所述脱粘的参数包括:温度为600~900℃,保温时间为1~4小时;优选地,所述脱粘的升温速率范围为1~30℃/分钟;Preferably, in step (5): the debonding parameters include: the temperature is 600-900°C, and the holding time is 1-4 hours; preferably, the heating rate range of the debonding is 1-30°C/ minute;
当陶瓷流延膜废料中含有硅粉,经脱粘后,再经氮化处理;所述氮化处理的温度为1380~1450℃,时间为4~12小时,气氛为氮气或者氮/氢混合气;优选地,所述氮化处理的升温速率范围为1~30℃/分钟。When the ceramic cast film waste contains silicon powder, it is debonded and then nitrided; the temperature of the nitriding treatment is 1380-1450°C, the time is 4-12 hours, and the atmosphere is nitrogen or nitrogen/hydrogen mixture gas; preferably, the temperature rising rate of the nitriding treatment ranges from 1 to 30°C/minute.
较佳的,步骤(5)中:所述烧结的温度为1000~2100℃,时间为0.5~24小时;优选地,所述烧结的升温速率范围为1~30℃/分钟。Preferably, in step (5): the sintering temperature is 1000-2100°C and the time is 0.5-24 hours; preferably, the sintering temperature rise rate ranges from 1-30°C/minute.
另一方面,本发明提供了一种根据上述的方法制备的高性能陶瓷。On the other hand, the present invention provides a high-performance ceramic prepared according to the above method.
有益效果:Beneficial effects:
根据本发明,可利用陶瓷流延膜废料获得性能优异陶瓷材料,充分利用了原料,减少了浪费并避免了对环境的污染。According to the present invention, ceramic cast film waste can be used to obtain ceramic materials with excellent performance, making full use of raw materials, reducing waste and avoiding environmental pollution.
附图说明Description of the drawings
图1为实施例2获得再次流延膜的照片;Figure 1 is a photo of the re-cast film obtained in Example 2;
图2为实施例3烧结制备样品的SEM图。Figure 2 is an SEM image of the sample prepared by sintering in Example 3.
具体实施方式Detailed ways
以下通过下述实施方式进一步说明本发明,应理解,下述实施方式仅用于说明本发明,而非限制本发明。The present invention will be further described below through the following embodiments. It should be understood that the following embodiments are only used to illustrate the present invention but not to limit the present invention.
本发明涉及一种利用流延废料制备高性能陶瓷材料的方法,包括:将收集的陶瓷流延膜废料在50~70℃温度范围内进行真空烘干12~24小时后。将上述材料进行液氮脆断或者硬化处理后进行破碎,得到尺寸均匀的颗粒原料。然后添加溶剂,添加量为上述原料重量的20-40wt%,混合后球磨48~72h。将球磨后的浆料进行再次流延,得到性能均一的陶瓷流延膜。将所述陶瓷素坯依次进行切边或和叠层或和金属化等工艺,再进行脱粘和烧结步骤,最终制备出相应的陶瓷制品。The invention relates to a method for preparing high-performance ceramic materials using casting waste, which includes: vacuum drying the collected ceramic casting film waste in a temperature range of 50 to 70°C for 12 to 24 hours. The above materials are subjected to liquid nitrogen embrittlement or hardening treatment and then crushed to obtain granular raw materials with uniform size. Then add solvent in an amount of 20-40wt% of the weight of the above raw materials, mix and ball mill for 48-72 hours. The ball-milled slurry is cast again to obtain a ceramic cast film with uniform performance. The ceramic blank is sequentially subjected to processes such as edge trimming, lamination, or metallization, and then debonding and sintering steps are performed to finally prepare a corresponding ceramic product.
以下,示例性说明本发明的制备多种陶瓷材料的方法。In the following, the method for preparing various ceramic materials of the present invention is exemplified.
本发明中,采用多种陶瓷流延膜废料为原料。包括但不限于氧化铝、氮化铝、碳化硅、硅、氮化硅以及ZnO,YAG等流延膜,例如在制备高性能氮化硅陶瓷基板领域,原始流延膜废料选用硅粉体为原料,其粒径范围在0.5~15μm,在该范围内,硅粉可以完全氮化,从而保证在后期烧结时得到致密的氮化硅陶瓷材料,可以有效的提高材料热导率。硅粉体的氧含量范围可以为0.32~0.88wt%,从而可以有效的控制烧结样品中的晶格氧含量,优选采用高纯硅粉体作为原料,纯度可以为99.99%以上,从而可以提高材料的热导率。In the present invention, a variety of ceramic cast film waste materials are used as raw materials. Including but not limited to aluminum oxide, aluminum nitride, silicon carbide, silicon, silicon nitride, ZnO, YAG and other cast films. For example, in the field of preparing high-performance silicon nitride ceramic substrates, the original cast film waste is made of silicon powder. The particle size of the raw material ranges from 0.5 to 15 μm. Within this range, the silicon powder can be completely nitrided, thereby ensuring that dense silicon nitride ceramic materials are obtained during later sintering, which can effectively improve the thermal conductivity of the material. The oxygen content of silicon powder can range from 0.32 to 0.88wt%, which can effectively control the lattice oxygen content in the sintered sample. It is preferred to use high-purity silicon powder as the raw material, and the purity can be above 99.99%, which can improve the material quality. thermal conductivity.
称取一定重量的流延膜废料(避免污染材料),松散的放置于烘箱中进行干燥(即挥发处理,其温度在50-70℃,保温时间为12-24小时),直到材料重量不再变化。其中,干燥的目的是让残余溶剂充分挥发,起到两个作用,一是防止破碎时回收料粘连,导致无法充分颗粒化,其次是便于后期控制浆料固含量。Weigh a certain weight of cast film waste (to avoid contaminating the material), place it loosely in an oven for drying (i.e., volatilization treatment, the temperature is 50-70°C, and the holding time is 12-24 hours) until the material weight no longer Variety. Among them, the purpose of drying is to fully volatilize the residual solvent, which plays two roles. One is to prevent the recycled materials from adhering during crushing, resulting in insufficient granulation, and the other is to facilitate the later control of the solid content of the slurry.
将干燥后的废料充分接触液氮或经硬化处理,再进行破碎,得到颗粒尺寸小且均匀的颗粒状材料。所述硬化处理为在鼓风干燥箱中、30~50℃下处理6~24小时。其中,硬化的目的是让回收料中的有机物固化,不具备延展性,提高破碎效率。The dried waste material is fully exposed to liquid nitrogen or hardened, and then crushed to obtain granular materials with small and uniform particle size. The hardening treatment is performed in a blast drying oven at 30-50°C for 6-24 hours. Among them, the purpose of hardening is to solidify the organic matter in the recycled material, making it less ductile and improving the crushing efficiency.
按一定比例将破碎后的颗粒原料与溶剂混合均匀,经球磨后得到性质均一的陶瓷流延浆料。可以是以总配料质量100%计,将处理后粉状材料60~80%(质量百分比)、溶剂20~40%(质量百分比)均匀混合。The crushed granular raw materials and solvent are mixed evenly according to a certain proportion, and after ball milling, a ceramic casting slurry with uniform properties is obtained. It can be based on 100% of the total ingredients mass, 60-80% (mass percentage) of the processed powdery material and 20-40% (mass percentage) of the solvent are evenly mixed.
将混合浆料再次经由流延成型制得陶瓷流延膜。流延工艺按照原始流延膜的流延参数进行操作,包括脱泡,流延和干燥等步骤,得到性能稳定的流延膜素坯。The mixed slurry is cast again to prepare a ceramic cast film. The casting process is operated according to the casting parameters of the original cast film, including steps such as degassing, casting and drying, to obtain a cast film blank with stable performance.
将流延膜素坯进行排胶(低温排胶),得到排胶后的陶瓷坯体。排胶的温度可以为600-900℃(例如900℃)。保温时间可为1~4小时。低温排胶过程的升温速率范围可以为1~30℃/分钟,从而可以将有机物完全分解。降温速率范围可以为1~30℃/分钟或者随炉降温。低温排胶过程的气氛为根据材料体系的不同可选择真空、空气和惰性气体等。The cast film green body is debinded (low temperature debinding) to obtain a debinded ceramic body. The debinding temperature may be 600-900°C (eg 900°C). The holding time can be 1 to 4 hours. The temperature rise rate of the low-temperature debinding process can range from 1 to 30°C/minute, so that organic matter can be completely decomposed. The cooling rate can range from 1 to 30°C/minute or with furnace cooling. The atmosphere of the low-temperature debinding process can be vacuum, air, inert gas, etc. depending on the material system.
在可选的实施方式中当选择硅粉为原料制备氮化硅时,则将排胶后的坯体在一定温度下氮化,得到相应的氮化硅陶瓷坯体。氮化的温度可以为1380~1450℃。氮化反应时间可以为4~12小时。氮化反应过程的升温速率范围为1~30℃/分钟。氮化反应过程的气氛可以为氮气或者氮氢混合气,其中混合气体积比例可以是氮气:氢气=90:10。可以将排胶所得的坯体置于碳管炉中氮化,得到氮化后的氮化硅陶瓷坯体。另外,氮化反应过程的降温速率范围可以为1~30℃/分钟或者随炉降温。In an optional embodiment, when silicon powder is selected as the raw material to prepare silicon nitride, the debonded green body is nitrided at a certain temperature to obtain a corresponding silicon nitride ceramic green body. The temperature of nitriding can be 1380~1450℃. The nitriding reaction time can be 4 to 12 hours. The temperature rising rate of the nitriding reaction process ranges from 1 to 30°C/minute. The atmosphere of the nitriding reaction process can be nitrogen or a nitrogen-hydrogen mixed gas, where the volume ratio of the mixed gas can be nitrogen:hydrogen=90:10. The body obtained by debinding can be placed in a carbon tube furnace for nitriding to obtain a nitrided silicon nitride ceramic body. In addition, the cooling rate during the nitriding reaction process can range from 1 to 30°C/minute or can be lowered along with the furnace.
将陶瓷坯体置于一定温度下烧结。根据原料体系的不同,烧结的温度可以为1000~2100℃。烧结保温时间可以为0.5~24小时。其中升温速率范围可以为1~30℃/分钟。烧结气氛可以为氩气、氮气、氦气、空气、真空等中的至少一种,最终得到性能优异的陶瓷材料。另外,烧结的降温速率范围为1~30℃/分钟或者随炉降温。The ceramic body is sintered at a certain temperature. Depending on the raw material system, the sintering temperature can range from 1000 to 2100°C. The sintering heat preservation time can be 0.5 to 24 hours. The heating rate can range from 1 to 30°C/minute. The sintering atmosphere can be at least one of argon, nitrogen, helium, air, vacuum, etc., and finally a ceramic material with excellent performance is obtained. In addition, the sintering temperature reduction rate ranges from 1 to 30°C/min or with furnace cooling.
由此,得到高性能陶瓷材料。如制备的氮化硅陶瓷材料具有优异的力学性能和高的热导率,包括相对密度可达99%以上,并且具有高热导率(大于85W/(m·K))、高断裂韧性和高抗弯强度的特征。Thus, high-performance ceramic materials are obtained. For example, the prepared silicon nitride ceramic material has excellent mechanical properties and high thermal conductivity, including a relative density of more than 99%, and has high thermal conductivity (greater than 85W/(m·K)), high fracture toughness and high Characteristics of bending strength.
本发明通过对流延膜废料进行处理,最终制备出具有优异性能的陶瓷材料,工艺简单稳定,条件易于控制,同时能够将原料的使用率最大化,并减少了对环境的污染。The present invention finally prepares ceramic materials with excellent performance by processing cast film waste. The process is simple and stable, and the conditions are easy to control. At the same time, it can maximize the utilization rate of raw materials and reduce environmental pollution.
测试方法:Test Methods:
密度:采用排水法,利用阿基米德原理计算;Density: calculated using the drainage method and Archimedes' principle;
热导率:采用激光脉冲仪(LFA427 Nanoflash,NETZSCH Instruments Co.Ltd.,Selb,Germany)测试;Thermal conductivity: tested using a laser pulse meter (LFA427 Nanoflash, NETZSCH Instruments Co. Ltd., Selb, Germany);
断裂韧性:利用压痕法,采用Willson-wolpert 2100B(Instron,USA)维氏硬度计。Fracture toughness: Using indentation method, Willson-wolpert 2100B (Instron, USA) Vickers hardness tester was used.
下面进一步例举实施例以详细说明本发明。同样应理解,以下实施例只用于对本发明进行进一步说明,不能理解为对本发明保护范围的限制,本领域的技术人员根据本发明的上述内容作出的一些非本质的改进和调整均属于本发明的保护范围。下述示例具体的工艺参数等也仅是合适范围中的一个示例,即本领域技术人员可以通过本文的说明做合适的范围内选择,而并非要限定于下文示例的具体数值。The following further examples are given to illustrate the present invention in detail. It should also be understood that the following examples are only used to further illustrate the present invention and cannot be understood as limiting the scope of the present invention. Some non-essential improvements and adjustments made by those skilled in the art based on the above contents of the present invention all belong to the present invention. scope of protection. The specific process parameters in the following examples are only an example of the appropriate range, that is, those skilled in the art can make selections within the appropriate range through the description herein, and are not limited to the specific values exemplified below.
以下各实施例和对比例中,原始流延膜制备所需的主要原料中,Si粉体购自上海巷田纳米有限公司,中位粒径为5μm。Si3N4粉体购自于日本UBE,中位粒径为0.5μm。AlN粉体自于日本德山,中位粒径为0.5μm。Al2O3购自于上海丰禾,中位粒径为0.5μm。SiC,MgO和CaO购自秦皇岛一诺高新材料开发有限公司,纯度为99.9%。Y2O3以及镧系稀土氧化物购自上海跃凯金属材料有限公司,纯度为99.9%;鼓风干燥箱LC-223(上海爱斯佩克环境设备有限公司)。In the following examples and comparative examples, among the main raw materials required for the preparation of the original cast film, Si powder was purchased from Shanghai Xiangtian Nano Co., Ltd., with a median particle size of 5 μm. Si 3 N 4 powder was purchased from UBE, Japan, with a median particle size of 0.5 μm. AlN powder was obtained from Tokuyama, Japan, with a median particle size of 0.5 μm. Al 2 O 3 was purchased from Shanghai Fenghe, with a median particle size of 0.5 μm. SiC, MgO and CaO were purchased from Qinhuangdao Yinuo High-tech Materials Development Co., Ltd. with a purity of 99.9%. Y 2 O 3 and lanthanide rare earth oxides were purchased from Shanghai Yuekai Metal Materials Co., Ltd. with a purity of 99.9%; blast drying oven LC-223 (Shanghai Aspec Environmental Equipment Co., Ltd.).
实施例1:Example 1:
(1)将100g氧化铝流延膜废料置于55℃烘箱中干燥24小时后重量不在变化,为97.5g;(1) Place 100g of alumina cast film waste in a 55°C oven to dry for 24 hours. The weight does not change and is 97.5g;
(2)将所得材料置于40℃鼓风干燥箱中进行硬化处理12小时后,将最终获得材料置于破碎设备中,破碎30分钟后取出粉状材料。所得粉状材料的粒径为0.5-1mm;(2) Place the obtained material in a 40°C blast drying oven for hardening treatment for 12 hours, then place the final material in a crushing equipment, and take out the powdered material after crushing for 30 minutes. The particle size of the obtained powdery material is 0.5-1mm;
(3)称取上述80g粉状废料,加入24g溶剂(丁酮/乙醇=66/34wt%),搅拌均匀后进行球磨,转速为60转/每分钟,球磨48小时后得到混合浆料;(3) Weigh 80g of the above-mentioned powdery waste, add 24g of solvent (Methyl Keto/Ethanol = 66/34wt%), stir evenly and perform ball milling at a speed of 60 rpm. After ball milling for 48 hours, a mixed slurry is obtained;
(4)将混合浆料进行流延,干燥后的流延膜;(4) Cast the mixed slurry and dry the cast film;
(5)将所得流延膜进行切片叠层后,将陶瓷素坯置于碳管炉中,真空状态下,以10℃/分钟的升温速率升温至600℃排胶2小时后,采用空气气氛,以10℃/分钟的升温速率升温至1600℃烧结2h,得到致密的氧化铝陶瓷,材料相对密度和断裂韧性分别为98.25%和4.15±0.64MPa·m1/2。(5) After the obtained cast film is sliced and laminated, the ceramic blank is placed in a carbon tube furnace. Under vacuum, the temperature is raised to 600°C at a heating rate of 10°C/min. After debinding for 2 hours, the air atmosphere is used. , heated to 1600°C for 2 hours at a heating rate of 10°C/min and sintered to obtain a dense alumina ceramic. The relative density and fracture toughness of the material were 98.25% and 4.15±0.64MPa·m 1/2 respectively.
实施例2:Example 2:
(1)将100g氮化硅流延膜废料置于60℃真空烘箱中干燥24小时后重量不在变化,为98.0g;(1) Place 100g of silicon nitride cast film waste in a 60°C vacuum oven to dry for 24 hours. The weight does not change and is 98.0g;
(2)将材料置于40℃鼓风干燥箱中进行硬化处理12小时后,将最终获得材料置于破碎设备中,破碎30分钟后取出粉状材料。所得粉状材料的粒径为0.2-0.5mm;(2) Place the material in a 40°C blast drying oven for hardening treatment for 12 hours, then place the final material in a crushing equipment, and take out the powdered material after crushing for 30 minutes. The particle size of the obtained powdery material is 0.2-0.5mm;
(3)称取上述80g粉状废料,加入32g溶剂(丁酮/乙醇=66/34wt%),搅拌均匀后进行球磨,转速为60转/每分钟,球磨48小时后得到混合浆料;(3) Weigh 80g of the above-mentioned powdery waste, add 32g of solvent (Methyl Keto/Ethanol = 66/34wt%), stir evenly and perform ball milling at a speed of 60 rpm. After ball milling for 48 hours, a mixed slurry is obtained;
(4)将所得混合浆料进行流延,干燥后的流延膜;(4) Cast the obtained mixed slurry and dry the cast film;
(5)将所得流延膜进行切片叠层后,将陶瓷素坯置于碳管炉中,真空状态下,以10℃/分钟的升温速率升温至600℃排胶2小时后,采用氮气气氛,以10℃/分钟的升温速率升温至1800℃烧结2h,得到致密的氮化硅陶瓷,材料相对密度和断裂韧性分别为99.32%和6.35±0.64MPa·m1/2。(5) After slicing and laminating the obtained cast film, place the ceramic blank in a carbon tube furnace. Under vacuum, heat it to 600°C at a heating rate of 10°C/min. After debinding for 2 hours, use a nitrogen atmosphere. , heated to 1800°C for 2 hours at a heating rate of 10°C/min and sintered to obtain a dense silicon nitride ceramic. The relative density and fracture toughness of the material were 99.32% and 6.35±0.64MPa·m 1/2 respectively.
图1示出实施例2再次流延膜的光学照片,可以看出流延膜表面光滑,强度优异,便于卷曲保存。Figure 1 shows an optical photograph of the cast film again in Example 2. It can be seen that the surface of the cast film is smooth, has excellent strength, and is easy to curl and store.
实施例3:Example 3:
(1)将100g硅流延膜废料置于55℃真空烘箱中干燥48小时后重量不在变化,为97.8g;(1) Place 100g of silicon cast film waste in a 55°C vacuum oven to dry for 48 hours. The weight does not change and is 97.8g;
(2)将材料置于40℃鼓风干燥箱中进行硬化处理12小时后,将最终获得材料置于破碎设备中,破碎30分钟后取出粉状材料。所得粉状材料的粒径为0.5-1.5mm;(2) Place the material in a 40°C blast drying oven for hardening treatment for 12 hours, then place the final material in a crushing equipment, and take out the powdered material after crushing for 30 minutes. The particle size of the obtained powdery material is 0.5-1.5mm;
(3)称取上述80g粉状废料,加入16g溶剂(丁酮/乙醇=66/34wt%),搅拌均匀后进行球磨,转速为60转/每分钟,球磨72小时后得到混合浆料;(3) Weigh 80g of the above-mentioned powdery waste material, add 16g of solvent (Methyl Keto/Ethanol = 66/34wt%), stir evenly and perform ball milling at a speed of 60 rpm. After ball milling for 72 hours, a mixed slurry is obtained;
(4)将所得混合浆料进行流延,干燥后的流延膜;(4) Cast the obtained mixed slurry and dry the cast film;
(5)将所得流延膜进行切片叠层后,将陶瓷素坯置于碳管炉中,真空状态下,以10℃/分钟的升温速率升温至600℃排胶2小时后,采用氮气为保护气氛,以10℃/分钟的升温速率升温至1420℃氮化6h,得到氮化硅陶瓷坯体,氮化率达到96%,坯体相对密度为69.8%。气压烧结过程为在压力为0.6MPa的氮气氛下,10℃/min升温速率条件下,升温至1900℃,保温2h,之后随炉降温。材料相对密度和热导率分别为99.12%和85W/(m·K),断裂韧性和抗弯强度分别为7.95±0.29MPa·m1/2和821±10.2MPa。(5) After the obtained cast film is sliced and laminated, the ceramic blank is placed in a carbon tube furnace. Under vacuum, the temperature is raised to 600°C at a heating rate of 10°C/min. After debinding for 2 hours, nitrogen is used as the In a protective atmosphere, the temperature was raised to 1420°C and nitrided for 6 hours at a heating rate of 10°C/min to obtain a silicon nitride ceramic body with a nitridation rate of 96% and a relative density of 69.8%. The air pressure sintering process is to raise the temperature to 1900°C under a nitrogen atmosphere with a pressure of 0.6MPa and a heating rate of 10°C/min, hold the temperature for 2 hours, and then cool down with the furnace. The relative density and thermal conductivity of the material are 99.12% and 85W/(m·K) respectively, and the fracture toughness and flexural strength are 7.95±0.29MPa·m 1/2 and 821±10.2MPa respectively.
图2示实施例3中再次硅粉流延膜制备得到的氮化硅陶瓷显微结构,可以看出材料内部无明显气孔,晶粒尺寸大,是其具有高导热率高韧性的主要原因。Figure 2 shows the microstructure of the silicon nitride ceramic prepared by silicon powder casting film in Example 3. It can be seen that there are no obvious pores inside the material and the large grain size is the main reason for its high thermal conductivity and high toughness.
实施例4:Example 4:
(1)将100g碳化硅流延膜废料置于60℃真空烘箱中干燥24小时后重量不在变化,为95.0g;(1) Place 100g of silicon carbide cast film waste in a 60°C vacuum oven to dry for 24 hours. The weight does not change and is 95.0g;
(2)将材料置于40℃鼓风干燥箱中进行硬化处理24小时后,将最终获得材料置于破碎设备中,破碎30分钟后取出粉状材料。所得粉状材料的粒径为0.5-1mm;(2) Place the material in a 40°C blast drying oven for hardening treatment for 24 hours, then place the final material in the crushing equipment, and take out the powdered material after crushing for 30 minutes. The particle size of the obtained powdery material is 0.5-1mm;
(3)称取上述80g粉状废料,加入30g溶剂(丁酮),搅拌均匀后进行球磨,转速为60转/每分钟,球磨72小时后,得到混合浆料;(3) Weigh 80g of the above-mentioned powdery waste, add 30g of solvent (butanone), stir evenly and perform ball milling at a speed of 60 rpm. After ball milling for 72 hours, a mixed slurry is obtained;
(4)将所得混合浆料进行流延,干燥后的流延膜;(4) Cast the obtained mixed slurry and dry the cast film;
(5)将所得流延膜进行切片叠层后,将陶瓷素坯置于碳管炉中,真空状态下,以10℃/分钟的升温速率升温至900℃排胶2小时后,采用氩气气氛,以10℃/分钟的升温速率升温至2050℃烧结2h,得到致密的碳化硅陶瓷,材料相对密度和断裂韧性分别为98.5%和3.13±0.24MPa·m1/2。(5) After the obtained cast film is sliced and laminated, the ceramic blank is placed in a carbon tube furnace. Under vacuum, the temperature is raised to 900°C at a heating rate of 10°C/min. After debinding for 2 hours, argon gas is used. In the atmosphere, the temperature was raised to 2050°C for 2 hours at a heating rate of 10°C/min, and a dense silicon carbide ceramic was obtained. The relative density and fracture toughness of the material were 98.5% and 3.13±0.24MPa·m 1/2 respectively.
实施例5Example 5
本实施例5中高性能陶瓷的制备过程参见实施例2,区别仅在于:步骤(2)中,将所得材料置于液氮中15秒后,置于破碎设备中,破碎10分钟后取出粉状材料。所得粉状材料的粒径为0.1-0.3mm。The preparation process of high-performance ceramics in Example 5 is as shown in Example 2. The only difference is that in step (2), the obtained material is placed in liquid nitrogen for 15 seconds and then placed in a crushing equipment. After crushing for 10 minutes, the powder is taken out. Material. The particle size of the obtained powdery material is 0.1-0.3mm.
实施例6Example 6
本实施例6中高性能陶瓷的制备过程参见实施例2,区别仅在于:步骤(2)中,将材料置于30℃鼓风干燥箱中进行硬化处理12小时后,将最终获得材料置于破碎设备中,破碎30分钟后取出粉状材料。所得粉状材料的粒径为1.5-2mm;The preparation process of high-performance ceramics in Example 6 is similar to Example 2. The only difference is that in step (2), the material is placed in a 30°C blast drying oven for hardening treatment for 12 hours, and then the finally obtained material is placed in a crushing chamber. In the equipment, take out the powdery material after crushing for 30 minutes. The particle size of the obtained powdery material is 1.5-2mm;
实施例7Example 7
本实施例7中高性能陶瓷的制备过程参见实施例2,区别仅在于:步骤(2)中,将材料置于50℃鼓风干燥箱中进行硬化处理12小时后,将最终获得材料置于破碎设备中,破碎30分钟后取出粉状材料。所得粉状材料的粒径为0.5-0.9mm;The preparation process of high-performance ceramics in Example 7 is similar to that of Example 2. The only difference is that in step (2), the material is placed in a 50°C blast drying oven for hardening treatment for 12 hours, and then the final material is placed in a crusher. In the equipment, take out the powdery material after crushing for 30 minutes. The particle size of the obtained powdery material is 0.5-0.9mm;
实施例8Example 8
本实施例9中高性能陶瓷的制备过程参见实施例2,区别仅在于:步骤(2)中,将材料置于60℃鼓风干燥箱中进行硬化处理12小时后,将最终获得材料置于破碎设备中,破碎30分钟后取出颗粒状材料。颗粒尺寸为1.5-3mm;The preparation process of high-performance ceramics in Example 9 is similar to Example 2. The only difference is that in step (2), the material is placed in a 60°C blast drying oven for hardening treatment for 12 hours, and then the finally obtained material is placed in a crusher. In the equipment, the granular material is taken out after crushing for 30 minutes. Particle size is 1.5-3mm;
对比例1Comparative example 1
本对比例1中高性能陶瓷的制备过程参见实施例2,区别仅在于:步骤(2)中,将干燥后所得材料直接置于破碎设备中,破碎30分钟后,将最终获得材料置于破碎设备中,破碎30分钟后取出颗粒状材料。颗粒尺寸为3-5mm;The preparation process of high-performance ceramics in Comparative Example 1 is as shown in Example 2. The only difference is that in step (2), the dried material is directly placed in the crushing equipment. After crushing for 30 minutes, the final material is placed in the crushing equipment. Medium, take out the granular material after crushing for 30 minutes. Particle size is 3-5mm;
对比例2Comparative example 2
本对比例2中高性能陶瓷的制备过程参见实施例2,区别仅在于:步骤(2)中,将不经过干燥后的材料直接置于40℃烘箱中进行硬化处理12小时后,破碎30分钟后,由于溶剂未完全挥发,造成流延膜粘连,无法得到粉状原料。The preparation process of high-performance ceramics in Comparative Example 2 is as shown in Example 2. The only difference is that in step (2), the material without drying is directly placed in a 40°C oven for hardening treatment for 12 hours and then crushed for 30 minutes. , because the solvent is not completely evaporated, causing the cast film to stick, and powdery raw materials cannot be obtained.
表1为高性能陶瓷的制备及性能参数:Table 1 shows the preparation and performance parameters of high-performance ceramics:
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