CN116997624A - Inorganic particle dispersion liquid - Google Patents
Inorganic particle dispersion liquid Download PDFInfo
- Publication number
- CN116997624A CN116997624A CN202280021750.XA CN202280021750A CN116997624A CN 116997624 A CN116997624 A CN 116997624A CN 202280021750 A CN202280021750 A CN 202280021750A CN 116997624 A CN116997624 A CN 116997624A
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- Prior art keywords
- mass
- liquid
- particle dispersion
- inorganic fine
- inorganic
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- 239000010954 inorganic particle Substances 0.000 title claims abstract description 247
- 239000006185 dispersion Substances 0.000 title claims abstract description 246
- 239000007788 liquid Substances 0.000 title claims abstract description 239
- 239000002612 dispersion medium Substances 0.000 claims abstract description 180
- 239000010419 fine particle Substances 0.000 claims abstract description 118
- 239000000758 substrate Substances 0.000 claims abstract description 95
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 60
- 239000011248 coating agent Substances 0.000 claims abstract description 52
- 238000000576 coating method Methods 0.000 claims abstract description 51
- 238000009835 boiling Methods 0.000 claims abstract description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 59
- 238000000034 method Methods 0.000 claims description 52
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 36
- 239000004094 surface-active agent Substances 0.000 claims description 29
- 229910002808 Si–O–Si Inorganic materials 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000008119 colloidal silica Substances 0.000 claims description 8
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 6
- 125000003158 alcohol group Chemical group 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 abstract description 27
- 238000003860 storage Methods 0.000 abstract description 12
- 239000010410 layer Substances 0.000 description 52
- 239000000203 mixture Substances 0.000 description 37
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 26
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 24
- -1 tert-pentyl (1,1-dimethylpropyl) Chemical group 0.000 description 24
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 21
- 239000011521 glass Substances 0.000 description 19
- 239000002245 particle Substances 0.000 description 18
- 239000013523 DOWSIL™ Substances 0.000 description 16
- 229920013731 Dowsil Polymers 0.000 description 16
- 230000000873 masking effect Effects 0.000 description 16
- 239000000654 additive Substances 0.000 description 15
- 150000003377 silicon compounds Chemical class 0.000 description 15
- 239000000377 silicon dioxide Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 239000007787 solid Substances 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- 235000012239 silicon dioxide Nutrition 0.000 description 11
- 125000003545 alkoxy group Chemical group 0.000 description 10
- 239000012530 fluid Substances 0.000 description 10
- 239000011164 primary particle Substances 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 9
- 238000006460 hydrolysis reaction Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 230000003373 anti-fouling effect Effects 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 229940075614 colloidal silicon dioxide Drugs 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 5
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 5
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 5
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 239000013065 commercial product Substances 0.000 description 5
- 239000000539 dimer Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000005486 organic electrolyte Substances 0.000 description 5
- 125000000962 organic group Chemical group 0.000 description 5
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 5
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 4
- 229940054273 1-propoxy-2-propanol Drugs 0.000 description 4
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 4
- HHAPGMVKBLELOE-UHFFFAOYSA-N 2-(2-methylpropoxy)ethanol Chemical compound CC(C)COCCO HHAPGMVKBLELOE-UHFFFAOYSA-N 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 4
- BDLXTDLGTWNUFM-UHFFFAOYSA-N 2-[(2-methylpropan-2-yl)oxy]ethanol Chemical compound CC(C)(C)OCCO BDLXTDLGTWNUFM-UHFFFAOYSA-N 0.000 description 4
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- JDFDHBSESGTDAL-UHFFFAOYSA-N 3-methoxypropan-1-ol Chemical compound COCCCO JDFDHBSESGTDAL-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 4
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 4
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 3
- 229940093475 2-ethoxyethanol Drugs 0.000 description 3
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 3
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000002296 dynamic light scattering Methods 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 229940116333 ethyl lactate Drugs 0.000 description 3
- 238000010335 hydrothermal treatment Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical class COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 2
- GCYHRYNSUGLLMA-UHFFFAOYSA-N 2-prop-2-enoxyethanol Chemical compound OCCOCC=C GCYHRYNSUGLLMA-UHFFFAOYSA-N 0.000 description 2
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 101100284369 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) has-1 gene Proteins 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229960003237 betaine Drugs 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 229940117955 isoamyl acetate Drugs 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- AQIXEPGDORPWBJ-UHFFFAOYSA-N pentan-3-ol Chemical compound CCC(O)CC AQIXEPGDORPWBJ-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 2
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 2
- 150000003613 toluenes Chemical class 0.000 description 2
- HUZZQXYTKNNCOU-UHFFFAOYSA-N triethyl(methoxy)silane Chemical compound CC[Si](CC)(CC)OC HUZZQXYTKNNCOU-UHFFFAOYSA-N 0.000 description 2
- QYGBYAQGBVHMDD-XQRVVYSFSA-N (z)-2-cyano-3-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C/C1=CC=CS1 QYGBYAQGBVHMDD-XQRVVYSFSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
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- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
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- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
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- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
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- 150000001412 amines Chemical class 0.000 description 1
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- 230000015572 biosynthetic process Effects 0.000 description 1
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- ZPECUSGQPIKHLT-UHFFFAOYSA-N bis(ethenyl)-dimethoxysilane Chemical compound CO[Si](OC)(C=C)C=C ZPECUSGQPIKHLT-UHFFFAOYSA-N 0.000 description 1
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- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- JHIVVAPYMSGYDF-PTQBSOBMSA-N cyclohexanone Chemical class O=[13C]1CCCCC1 JHIVVAPYMSGYDF-PTQBSOBMSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
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- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
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- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
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- AEDZKIACDBYJLQ-UHFFFAOYSA-N ethane-1,2-diol;hydrate Chemical compound O.OCCO AEDZKIACDBYJLQ-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- DFJDZTPFNSXNAX-UHFFFAOYSA-N ethoxy(triethyl)silane Chemical compound CCO[Si](CC)(CC)CC DFJDZTPFNSXNAX-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
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- 238000007756 gravure coating Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 125000003010 ionic group Chemical group 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- XVTQAXXMUNXFMU-UHFFFAOYSA-N methyl 2-(3-oxo-2-pyridin-2-yl-1h-pyrazol-5-yl)acetate Chemical compound N1C(CC(=O)OC)=CC(=O)N1C1=CC=CC=N1 XVTQAXXMUNXFMU-UHFFFAOYSA-N 0.000 description 1
- NCWQJOGVLLNWEO-UHFFFAOYSA-N methylsilicon Chemical class [Si]C NCWQJOGVLLNWEO-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- VUIKYXBZSGOZQV-UHFFFAOYSA-M octadecanoate;tetramethylazanium Chemical compound C[N+](C)(C)C.CCCCCCCCCCCCCCCCCC([O-])=O VUIKYXBZSGOZQV-UHFFFAOYSA-M 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RIPZIAOLXVVULW-UHFFFAOYSA-N pentane-2,4-dione Chemical compound CC(=O)CC(C)=O.CC(=O)CC(C)=O RIPZIAOLXVVULW-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
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- 239000004033 plastic Substances 0.000 description 1
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- 239000004417 polycarbonate Substances 0.000 description 1
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- 239000004926 polymethyl methacrylate Substances 0.000 description 1
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- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229940096992 potassium oleate Drugs 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- MLICVSDCCDDWMD-KVVVOXFISA-M potassium;(z)-octadec-9-enoate Chemical compound [K+].CCCCCCCC\C=C/CCCCCCCC([O-])=O MLICVSDCCDDWMD-KVVVOXFISA-M 0.000 description 1
- JEVKEOBMAMOJLP-UHFFFAOYSA-M potassium;butane-1-sulfonate Chemical compound [K+].CCCCS([O-])(=O)=O JEVKEOBMAMOJLP-UHFFFAOYSA-M 0.000 description 1
- RLEFZEWKMQQZOA-UHFFFAOYSA-M potassium;octanoate Chemical compound [K+].CCCCCCCC([O-])=O RLEFZEWKMQQZOA-UHFFFAOYSA-M 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical group [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- UDWXLZLRRVQONG-UHFFFAOYSA-M sodium hexanoate Chemical compound [Na+].CCCCCC([O-])=O UDWXLZLRRVQONG-UHFFFAOYSA-M 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 229940045845 sodium myristate Drugs 0.000 description 1
- RYYKJJJTJZKILX-UHFFFAOYSA-M sodium octadecanoate Chemical compound [Na+].CCCCCCCCCCCCCCCCCC([O-])=O RYYKJJJTJZKILX-UHFFFAOYSA-M 0.000 description 1
- BYKRNSHANADUFY-UHFFFAOYSA-M sodium octanoate Chemical compound [Na+].CCCCCCCC([O-])=O BYKRNSHANADUFY-UHFFFAOYSA-M 0.000 description 1
- KVCGISUBCHHTDD-UHFFFAOYSA-M sodium;4-methylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1 KVCGISUBCHHTDD-UHFFFAOYSA-M 0.000 description 1
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 1
- FIWQZURFGYXCEO-UHFFFAOYSA-M sodium;decanoate Chemical compound [Na+].CCCCCCCCCC([O-])=O FIWQZURFGYXCEO-UHFFFAOYSA-M 0.000 description 1
- GUCVHDYRKMSBOJ-UHFFFAOYSA-M sodium;diethyl phosphate Chemical compound [Na+].CCOP([O-])(=O)OCC GUCVHDYRKMSBOJ-UHFFFAOYSA-M 0.000 description 1
- HHJJPFYGIRKQOM-UHFFFAOYSA-N sodium;oxido-oxo-phenylphosphanium Chemical compound [Na+].[O-][P+](=O)C1=CC=CC=C1 HHJJPFYGIRKQOM-UHFFFAOYSA-N 0.000 description 1
- JUQGWKYSEXPRGL-UHFFFAOYSA-M sodium;tetradecanoate Chemical compound [Na+].CCCCCCCCCCCCCC([O-])=O JUQGWKYSEXPRGL-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- OQTSOKXAWXRIAC-UHFFFAOYSA-N tetrabutan-2-yl silicate Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)OC(C)CC OQTSOKXAWXRIAC-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- BCLLLHFGVQKVKL-UHFFFAOYSA-N tetratert-butyl silicate Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C BCLLLHFGVQKVKL-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- FBGNFSBDYRZOSE-UHFFFAOYSA-N tris(ethenyl)-ethoxysilane Chemical compound CCO[Si](C=C)(C=C)C=C FBGNFSBDYRZOSE-UHFFFAOYSA-N 0.000 description 1
- JYTZMGROHNUACI-UHFFFAOYSA-N tris(ethenyl)-methoxysilane Chemical compound CO[Si](C=C)(C=C)C=C JYTZMGROHNUACI-UHFFFAOYSA-N 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Abstract
本发明提供能够形成具有高透光率和高涂膜强度(涂膜对基材的高粘附性)的涂膜并且具有良好的保存稳定性的无机微粒分散液。一种无机微粒分散液,所述无机微粒分散液包含:无机微粒、沸点大于等于100℃且小于190℃的液体分散介质A(其中,不包括水)、和沸点小于100℃的液体分散介质B,其中,将无机微粒分散液的总量设为100质量%时,液体分散介质A的含有率大于等于0.5质量%且小于15质量%。The present invention provides an inorganic fine particle dispersion capable of forming a coating film with high light transmittance and high coating film strength (high adhesion of the coating film to a substrate) and having good storage stability. An inorganic particle dispersion liquid, the inorganic particle dispersion liquid includes: inorganic particles, a liquid dispersion medium A with a boiling point greater than or equal to 100°C and less than 190°C (excluding water), and a liquid dispersion medium B with a boiling point less than 100°C , where, when the total amount of the inorganic fine particle dispersion liquid is 100 mass%, the content rate of the liquid dispersion medium A is 0.5 mass% or more and less than 15 mass%.
Description
技术领域Technical Field
本发明涉及无机微粒分散液。The present invention relates to an inorganic particle dispersion.
背景技术Background Art
以往,为了防止显示器的闪光等,在显示器表面上形成有减反射膜。作为减反射膜的材料,例如在专利文献1中记载了包含无机微粒链、无机微粒和液体分散介质的无机微粒分散液。Conventionally, an anti-reflection film is formed on the surface of a display in order to prevent display glare, etc. As a material of the anti-reflection film, for example, Patent Document 1 describes an inorganic particle dispersion containing inorganic particle chains, inorganic particles, and a liquid dispersion medium.
现有技术文献Prior art literature
专利文献Patent Literature
专利文献1:日本特开2006-327187号公报Patent Document 1: Japanese Patent Application Publication No. 2006-327187
发明内容Summary of the invention
发明所要解决的问题Problems to be solved by the invention
近年来,为了提高发电效率,在太阳能电池的保护玻璃的表面上形成有减反射膜,但是要求进一步提高太阳能电池的保护玻璃的透光率。In recent years, an anti-reflection film is formed on the surface of the protective glass of the solar cell in order to improve the power generation efficiency. However, it is required to further improve the light transmittance of the protective glass of the solar cell.
本发明的目的在于提供能够形成透光率更高的层的无机微粒分散液。An object of the present invention is to provide an inorganic fine particle dispersion capable of forming a layer having a higher light transmittance.
用于解决问题的手段Means used to solve problems
本发明人鉴于这样的背景而进行了深入研究,结果完成了本发明。The present inventors have conducted intensive studies in view of such background and have completed the present invention as a result.
即,本发明涉及以下内容,但不限于此。That is, the present invention relates to the following contents, but is not limited thereto.
[1][1]
一种无机微粒分散液,所述无机微粒分散液包含:An inorganic particle dispersion, comprising:
无机微粒、Inorganic particles,
沸点大于等于100℃且小于190℃的液体分散介质A(其中,不包括水)、和a liquid dispersion medium A (excluding water) having a boiling point of 100° C. or more and less than 190° C., and
沸点小于100℃的液体分散介质B,Liquid dispersion medium B with a boiling point less than 100°C,
其中,in,
将无机微粒分散液的总量设为100质量%时,液体分散介质A的含有率大于等于0.5质量%且小于15质量%。When the total amount of the inorganic fine particle dispersion is 100 mass %, the content of the liquid dispersion medium A is 0.5 mass % or more and less than 15 mass %.
以下,[2]~[14]各自为本发明的优选方式或实施方式。Hereinafter, [2] to [14] are each a preferred aspect or embodiment of the present invention.
[2][2]
如[1]所述的无机微粒分散液,其中,将无机微粒分散液的总量设为100质量%时,液体分散介质B的含有率为20质量%以上且85质量%以下。The inorganic fine particle dispersion according to [1], wherein the content of the liquid dispersion medium B is 20 mass % or more and 85 mass % or less, when the total amount of the inorganic fine particle dispersion is 100 mass %.
[3][3]
如[1]或[2]所述的无机微粒分散液,其中,液体分散介质B为醇。The inorganic fine particle dispersion according to [1] or [2], wherein the liquid dispersion medium B is alcohol.
[4][4]
如[1]~[3]中任一项所述的无机微粒分散液,其中,无机微粒分散液还包含水。The inorganic fine particle dispersion according to any one of [1] to [3], wherein the inorganic fine particle dispersion further contains water.
[5][5]
如[4]所述的无机微粒分散液,其中,将无机微粒分散液的总量设为100质量%时,水的含有率为5质量%以上且55质量%以下。The inorganic fine particle dispersion according to [4], wherein the content of water is 5 mass % or more and 55 mass % or less, when the total amount of the inorganic fine particle dispersion is 100 mass %.
[6][6]
如[1]~[5]中任一项所述的无机微粒分散液,其中,无机微粒分散液还包含烷氧基硅烷和/或其缩合物。The inorganic fine particle dispersion according to any one of [1] to [5], wherein the inorganic fine particle dispersion further contains alkoxysilane and/or a condensate thereof.
[7][7]
如[1]~[5]中任一项所述的无机微粒分散液,其中,无机微粒分散液还包含选自由烷氧基硅烷、多个Si-O-Si键线性地连接的烷氧基硅烷缩合物和多个Si-O-Si键三维地连接的烷氧基硅烷缩合物构成的组中的一种以上。The inorganic fine particle dispersion as described in any one of [1] to [5], wherein the inorganic fine particle dispersion further comprises one or more selected from the group consisting of alkoxysilane, alkoxysilane condensates in which a plurality of Si-O-Si bonds are linearly linked, and alkoxysilane condensates in which a plurality of Si-O-Si bonds are three-dimensionally linked.
[8][8]
如权利要求1~7中任一项所述的无机微粒分散液,其中,液体分散介质A为醇。The inorganic fine particle dispersion according to any one of claims 1 to 7, wherein the liquid dispersion medium A is an alcohol.
[9][9]
如[1]~[8]中任一项所述的无机微粒分散液,其中,无机微粒分散液还包含表面活性剂。The inorganic fine particle dispersion according to any one of [1] to [8], further comprising a surfactant.
[10][10]
如[1]~[8]中任一项所述的无机微粒分散液,其中,无机微粒分散液还包含表面活性剂,所述表面活性剂包含聚醚改性硅氧烷。The inorganic fine particle dispersion according to any one of [1] to [8], wherein the inorganic fine particle dispersion further comprises a surfactant, and the surfactant comprises a polyether-modified siloxane.
[11][11]
如[1]~[10]中任一项所述的无机微粒分散液,其中,无机微粒为胶态二氧化硅。The inorganic fine particle dispersion according to any one of [1] to [10], wherein the inorganic fine particles are colloidal silica.
[12][12]
如[1]~[11]中任一项所述的无机微粒分散液,其中,将无机微粒分散液的总量设为100质量%时,无机微粒的含有率为0.1质量%以上且10质量%以下。The inorganic fine particle dispersion according to any one of [1] to [11], wherein the content of the inorganic fine particles is 0.1% by mass or more and 10% by mass or less, based on 100% by mass of the total amount of the inorganic fine particle dispersion.
[13][13]
一种层叠体的制造方法,其中,所述层叠体的制造方法包含以下工序:A method for manufacturing a laminate, wherein the method for manufacturing the laminate comprises the following steps:
将[1]~[12]中任一项所述的无机微粒分散液涂布在基材上的工序(涂布工序);和A step of coating the inorganic fine particle dispersion according to any one of [1] to [12] on a substrate (coating step); and
从涂布在基材上的所述无机微粒分散液中除去液体分散介质A和液体分散介质B从而在基材上形成无机微粒层的工序(分散介质除去工序)。A step of removing the liquid dispersion medium A and the liquid dispersion medium B from the inorganic fine particle dispersion applied on the substrate to form an inorganic fine particle layer on the substrate (dispersion medium removal step).
[14][14]
如[13]所述的层叠体的制造方法,其中,在分散介质除去工序之后,还包含热处理工序。The method for producing a laminate according to [13], further comprising a heat treatment step after the dispersion medium removal step.
[15][15]
一种层叠体,其中,所述层叠体通过[13]或[14]所述的方法得到,并且所述层叠体包含基材和无机微粒层。A laminated body obtained by the method described in [13] or [14], wherein the laminated body comprises a substrate and an inorganic fine particle layer.
发明效果Effects of the Invention
根据本发明,能够提供能够形成具有高透光率和高涂膜强度(涂膜对基材的高粘附性)的涂膜并且具有良好的保存稳定性的无机微粒分散液。According to the present invention, it is possible to provide an inorganic fine particle dispersion which can form a coating film having high light transmittance and high coating film strength (high adhesion of the coating film to a substrate) and has good storage stability.
根据本发明,还能够提供具有高透光率和高涂膜强度(涂膜对基材的高粘附性)的层叠体。According to the present invention, it is also possible to provide a laminate having high light transmittance and high coating film strength (high adhesion of the coating film to the substrate).
具体实施方式DETAILED DESCRIPTION
以下,对本发明的一个实施方式详细地进行说明。Hereinafter, one embodiment of the present invention will be described in detail.
<无机微粒分散液><Inorganic fine particle dispersion>
本发明的无机微粒分散液包含:The inorganic microparticle dispersion of the present invention comprises:
无机微粒、Inorganic particles,
沸点大于等于100℃且小于190℃的液体分散介质A(其中,不包括水)、和a liquid dispersion medium A (excluding water) having a boiling point of 100° C. or more and less than 190° C., and
沸点小于100℃的液体分散介质B,Liquid dispersion medium B with a boiling point less than 100°C,
其中,in,
将无机微粒分散液的总量设为100质量%时,液体分散介质A的含有率大于等于0.5质量%且小于15质量%。When the total amount of the inorganic fine particle dispersion is 100 mass %, the content of the liquid dispersion medium A is 0.5 mass % or more and less than 15 mass %.
[无机微粒][Inorganic particles]
在本发明中,无机微粒可以为一次粒径为1nm以上且60nm以下的无机微粒X或者多个一次粒径为1nm以上且60nm以下的无机微粒连接而成的无机微粒Y。在此,“多个连接而成”的表述不仅包括以直线状连接的状态,还包括弯折地连接的状态和以环状连接的状态以及分支的状态。In the present invention, the inorganic particles may be inorganic particles X having a primary particle size of 1 nm or more and 60 nm or less, or inorganic particles Y formed by connecting a plurality of inorganic particles having a primary particle size of 1 nm or more and 60 nm or less. Here, the expression "plural connected" includes not only a state connected in a straight line, but also a state connected in a bent manner, a state connected in a ring shape, and a branched state.
无机微粒的一次粒径以通过利用透射型显微镜的观察而得到的50个以上的粒子的粒径的数量平均值进行评价。对于无机微粒Y中的“多个无机微粒连接而成”的状态,也能够通过利用透射型显微镜的观察来确定。The primary particle size of the inorganic fine particles is evaluated as the number average of particle sizes of 50 or more particles observed with a transmission microscope. The state of "a plurality of inorganic fine particles connected" in the inorganic fine particles Y can also be determined by observation with a transmission microscope.
作为无机微粒的材质,例如可以列举:氧化硅(二氧化硅)、氧化钛、氧化铝、氧化锌、氧化锡、碳酸钙、硫酸钡、滑石、高岭土等,可以使用一种或两种以上。从无机微粒分散液中的分散性的观点考虑,优选二氧化硅,在二氧化硅中进一步优选胶态二氧化硅和气相二氧化硅,特别优选胶态二氧化硅。胶态二氧化硅可以为以5重量%~50重量%、例如5重量%~40重量%、优选10重量%~30重量%的固体成分浓度包含胶体状二氧化硅粒子的无机微粒分散液。胶态二氧化硅可以使用分散在各种溶剂中的胶态二氧化硅,作为该溶剂,可以列举:As the material of the inorganic particles, for example, silicon oxide (silicon dioxide), titanium oxide, aluminum oxide, zinc oxide, tin oxide, calcium carbonate, barium sulfate, talc, kaolin, etc., one or more of which can be used. From the viewpoint of dispersibility in the inorganic particle dispersion, silicon dioxide is preferred, and colloidal silicon dioxide and fumed silicon dioxide are further preferred among silicon dioxides, and colloidal silicon dioxide is particularly preferred. Colloidal silicon dioxide can be an inorganic particle dispersion containing colloidal silicon dioxide particles at a solid content concentration of 5% to 50% by weight, for example, 5% to 40% by weight, and preferably 10% to 30% by weight. Colloidal silicon dioxide can be used as colloidal silicon dioxide dispersed in various solvents, and as the solvent, the following can be mentioned:
甲醇、乙醇、异丙醇、乙二醇、乙二醇单正丙醚等醇溶剂;Alcohol solvents such as methanol, ethanol, isopropanol, ethylene glycol, and ethylene glycol mono-n-propyl ether;
二甲基乙酰胺、N-甲基吡咯烷酮等酰胺溶剂;Amide solvents such as dimethylacetamide and N-methylpyrrolidone;
甲苯等芳香族溶剂;Aromatic solvents such as toluene;
甲乙酮、甲基异丁基甲酮、环己酮等酮溶剂;Ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone;
乙酸乙酯等酯溶剂;Ester solvents such as ethyl acetate;
水等,也可以将多种这些溶剂混合使用。Water, etc., and a plurality of these solvents may be used in mixture.
优选为甲醇、乙醇、异丙醇、乙二醇、乙二醇单正丙醚等醇溶剂和水,更优选为甲醇、乙醇、异丙醇和水,更优选为乙醇、异丙醇和水,更优选为水。Preferred are alcohol solvents such as methanol, ethanol, isopropanol, ethylene glycol, ethylene glycol mono-n-propyl ether and water, more preferred are methanol, ethanol, isopropanol and water, more preferred are ethanol, isopropanol and water, and more preferred is water.
无机微粒可以使用一次粒径为1nm以上且60nm以下的无机微粒X或者多个一次粒径为1nm以上且60nm以下的无机微粒连接而成的无机微粒Y。The inorganic fine particles may be inorganic fine particles X having a primary particle diameter of 1 nm to 60 nm, or inorganic fine particles Y in which a plurality of inorganic fine particles having a primary particle diameter of 1 nm to 60 nm are connected.
从兼具透射率和涂膜强度的观点考虑,无机微粒X的一次粒径优选为1nm以上且50nm以下,进一步优选为1nm以上且30nm以下,进一步优选为1nm以上且20nm以下,特别优选为3nm以上且10nm以下。From the viewpoint of achieving both transmittance and coating strength, the primary particle size of the inorganic fine particles X is preferably 1 nm to 50 nm, more preferably 1 nm to 30 nm, further preferably 1 nm to 20 nm, particularly preferably 3 nm to 10 nm.
从兼具透射率和涂膜强度的观点考虑,多个一次粒径为1nm以上且60nm以下的无机微粒连接而成的无机微粒Y的一次粒径优选为1nm以上且50nm以下,进一步优选为1nm以上且45nm以下,进一步优选为1nm以上且30nm以下,特别优选为5nm以上且20nm以下。From the perspective of both transmittance and coating strength, the primary particle size of the inorganic particle Y formed by connecting multiple inorganic particles with a primary particle size of 1 nm or more and 60 nm or less is preferably 1 nm or more and 50 nm or less, more preferably 1 nm or more and 45 nm or less, further preferably 1 nm or more and 30 nm or less, and particularly preferably 5 nm or more and 20 nm or less.
无机微粒Y的平均粒径优选为1nm~500nm,更优选为1nm~400nm,并且通过动态光散射法或西尔斯(Sears)法求出。利用动态光散射法的平均粒径的测定能够使用市售的粒度分布测定装置进行。西尔斯法为如下方法:其记载在Analytical Chemistry,第28卷,第1981-1983页,1956中,是适用于二氧化硅粒子的平均粒径的测定的分析方法,其中,由直至将pH=3的胶态二氧化硅分散液调节为pH=9所消耗的NaOH的量求出表面积,并由所求出的表面积计算出当量球直径。将以这样的方式求出的当量球直径作为平均粒径。The average particle size of the inorganic particles Y is preferably 1 nm to 500 nm, more preferably 1 nm to 400 nm, and is obtained by a dynamic light scattering method or a Sears method. The determination of the average particle size by the dynamic light scattering method can be carried out using a commercially available particle size distribution measuring device. The Sears method is a method as follows: It is described in Analytical Chemistry, Vol. 28, pp. 1981-1983, 1956, and is an analytical method for the determination of the average particle size of silica particles, wherein the surface area is obtained by adjusting the amount of NaOH consumed by the colloidal silica dispersion having a pH of 3 to a pH of 9, and the equivalent spherical diameter is calculated from the obtained surface area. The equivalent spherical diameter obtained in this way is taken as the average particle size.
另外,对一次粒径为1nm以上且60nm以下的无机微粒X与多个一次粒径为1nm以上且60nm以下的无机微粒连接而成的无机微粒Y的混合比没有特别限制,从透射率和涂膜强度的观点考虑,优选使用这两者,(无机微粒Y的质量)/[(无机微粒X的质量)+(无机微粒Y的质量)]的值优选为0.01以上且0.99以下,进一步优选为0.10以上且0.95以下,进一步优选为0.20以上且0.95以下,进一步优选为0.40以上且0.95以下,进一步优选为0.50以上且0.90以下,进一步优选为0.60以上且0.80以下。另外,作为无机微粒X,可以使用一种或两种以上的无机微粒,作为无机微粒Y,可以使用一种或两种以上的无机微粒。In addition, the mixing ratio of the inorganic particles Y formed by the inorganic particles X that is more than 1nm and less than 60nm and multiple primary particle diameters are connected to each other with more than 1nm and less than 60nm is not particularly limited to primary particle diameter, from the viewpoint of transmittance and coating strength, it is preferred to use the two, (the quality of inorganic particles Y)/[(the quality of inorganic particles X)+(the quality of inorganic particles Y)] is preferably more than 0.01 and less than 0.99, more preferably more than 0.10 and less than 0.95, more preferably more than 0.20 and less than 0.95, more preferably more than 0.40 and less than 0.95, more preferably more than 0.50 and less than 0.90, more preferably more than 0.60 and less than 0.80. In addition, as inorganic particles X, one or more inorganic particles can be used, as inorganic particles Y, one or more inorganic particles can be used.
对无机微粒的含有率没有特别限制,从所得到的涂膜的透明性和无机微粒分散液中的分散性的观点考虑,将无机微粒分散液的总重量设为100重量%时,无机微粒的含有率优选为0.1质量%以上且10重量%以下,更优选为0.1质量%以上且7.5重量%以下,进一步优选为0.2质量%以上且5.0重量%以下,特别优选为1质量%以上且5.0重量%以下。以下,有时将在将无机微粒分散液整体设为100质量%的情况下的无机微粒的含有率记载为“无机微粒分散液中的无机微粒的固体成分浓度”。另外,“无机微粒的含有率”是指无机微粒X的含有率与无机微粒Y的含有率的合计值。There is no particular restriction on the content of inorganic particles. Consider from the viewpoint of the transparency of the obtained coating and the dispersibility in the inorganic particle dispersion liquid, when the gross weight of the inorganic particle dispersion liquid is set to 100 weight %, the content of inorganic particles is preferably more than 0.1 mass % and less than 10 weight %, more preferably more than 0.1 mass % and less than 7.5 weight %, further preferably more than 0.2 mass % and less than 5.0 weight %, particularly preferably more than 1 mass % and less than 5.0 weight %. Below, sometimes the content of inorganic particles in the case where the inorganic particle dispersion liquid is set to 100 mass % as a whole is recorded as "the solid component concentration of inorganic particles in the inorganic particle dispersion liquid". In addition, "the content of inorganic particles" refers to the total value of the content of inorganic particles X and the content of inorganic particles Y.
从分散液中的分散性、涂覆和涂膜形成的观点考虑,可以对无机微粒分散液中的无机微粒实施了表面处理。作为表面处理的方法,能够使用公知的方法,可以列举利用适当的添加剂进行处理。无机微粒的表面处理例如能够通过将含有无机微粒、添加剂和溶剂的液体进行混合而进行。From the viewpoint of dispersibility, coating and film formation in the dispersion, the inorganic particles in the inorganic particle dispersion can be surface treated. As the surface treated method, known methods can be used, and suitable additives can be cited for processing. The surface treatment of inorganic particles can be carried out by mixing the liquid containing inorganic particles, additives and solvents.
作为无机微粒X,具体而言,例如可以列举:具有水分散液的形态的作为市售品的Snowtex(注册商标)ST-XS、ST-OXS、ST-NXS、ST-CXS、ST-S、ST-OS、ST-NS、ST-3O、ST-O、ST-N、ST-C、ST-AK、ST-5O-T、ST-O-4O、ST-N-4O、ST-CM、ST-3OL、ST-OL、ST-AK-L、ST-YL、ST-OYL、ST-AK-YL;具有甲醇分散液的形态的作为市售品的甲醇硅溶胶(注册商标)、MA-ST-M、MA-ST-L;具有异丙醇分散液的形态的作为市售品的IPA-ST、IPA-ST-L;具有乙二醇单丙醚分散液的形态的作为市售品的NPC-ST-30;具有甲苯分散液的形态的作为市售品的TOL-ST;具有2-丁酮分散液的形态的作为市售品的MEK-ST-40、MEK-ST-L、MEK-EC-2130Y、MEK-EC-2430Z、MEK-AC-2140Z、MEK-AC-4130Y、MEK-AC-5140Z;具有4-甲基-2-戊酮分散液的形态的MIBK-ST、MIBK-ST-L、MIBK-AC-2140Z、MIBK-SD-L;具有环己酮分散液的形态的CHO-ST-M;具有乙酸乙酯分散液的形态的作为市售品的EAC-ST和具有丙二醇1-单甲醚2-乙酸酯分散液的形态的PMA-ST等。其中,优选具有水分散液的形态的无机微粒,特别优选ST-OXS、ST-NXS、ST-CXS、ST-OS、ST-NS、ST-O、ST-N、ST-C、ST-O-4O、ST-N-4O、ST-CM、ST-OL和ST-OYL,更优选ST-OXS、ST-OS、ST-O、ST-O-4O、ST-OL、ST-OYL。Specific examples of the inorganic fine particles X include: commercially available Snowtex (registered trademark) ST-XS, ST-OXS, ST-NXS, ST-CXS, ST-S, ST-OS, ST-NS, ST-3O, ST-O, ST-N, ST-C, ST-AK, ST-5O-T, ST-O-4O, ST-N-4O, ST-CM, ST-3OL, ST-OL, ST-AK-L, ST-YL, ST-OYL, ST-AK-YL in the form of a methanol dispersion; commercially available methanol silica sol (registered trademark), MA-ST-M, MA-ST-L in the form of an isopropyl alcohol dispersion; commercially available IPA-ST, IPA-ST-L in the form of an ethylene glycol monopropyl ether dispersion. NPC-ST-30, a commercial product, in the form of a toluene dispersion; TOL-ST, a commercial product, in the form of a toluene dispersion; MEK-ST-40, MEK-ST-L, MEK-EC-2130Y, MEK-EC-2430Z, MEK-AC-2140Z, MEK-AC-4130Y, MEK-AC-5140Z, a commercial product, in the form of a 2-butanone dispersion; MIBK-ST, MIBK-ST-L, MIBK-AC-2140Z, MIBK-SD-L, in the form of a 4-methyl-2-pentanone dispersion; CHO-ST-M, in the form of a cyclohexanone dispersion; EAC-ST, a commercial product, in the form of an ethyl acetate dispersion; and PMA-ST, in the form of a propylene glycol 1-monomethyl ether 2-acetate dispersion. Among them, inorganic fine particles in the form of aqueous dispersion are preferred, with ST-OXS, ST-NXS, ST-CXS, ST-OS, ST-NS, ST-O, ST-N, ST-C, ST-O-4O, ST-N-4O, ST-CM, ST-OL and ST-OYL being particularly preferred, and ST-OXS, ST-OS, ST-O, ST-O-4O, ST-OL and ST-OYL being more preferred.
作为无机微粒Y,具体而言,例如可以列举:具有水分散液的形态的作为市售品的Snowtex(注册商标)ST-UP、ST-OUP、ST-PS-S、ST-PS-SO、ST-PS-M、ST-PS-MO;具有甲醇分散液的形态的作为市售品的MA-ST-UP;具有异丙醇分散液的形态的作为市售品的IPA-ST-UP和具有2-丁酮分散液的形态的作为市售品的MEK-ST-UP等。其中,优选具有水分散液的形态的无机微粒,特别优选ST-OUP、ST-PS-SO、ST-PS-MO,更优选ST-OUP。Specifically, inorganic fine particles Y include, for example, commercially available Snowtex (registered trademark) ST-UP, ST-OUP, ST-PS-S, ST-PS-SO, ST-PS-M, and ST-PS-MO in the form of aqueous dispersions; commercially available MA-ST-UP in the form of methanol dispersions; commercially available IPA-ST-UP in the form of isopropyl alcohol dispersions; and commercially available MEK-ST-UP in the form of 2-butanone dispersions. Among them, inorganic fine particles in the form of aqueous dispersions are preferred, with ST-OUP, ST-PS-SO, and ST-PS-MO being particularly preferred, and ST-OUP being more preferred.
对无机微粒X和无机微粒Y的合成方法没有特别限制,例如可以列举:金属醇盐的水解和/或其缩合、金属盐的加热分解、金属氧化物的粉碎和/或破碎、金属盐水溶液的沉淀、金属盐水溶液的水热处理等。There is no particular limitation on the method for synthesizing the inorganic particles X and Y. Examples thereof include hydrolysis and/or condensation of metal alkoxides, thermal decomposition of metal salts, pulverization and/or crushing of metal oxides, precipitation of metal salt aqueous solutions, and hydrothermal treatment of metal salt aqueous solutions.
从分散性的观点考虑优选的二氧化硅通过下述方法合成:利用离子交换树脂等对硅酸钠水溶液进行离子交换之后进行粒子生长和浓缩的方法(有时也被称为水玻璃法)、在硅酸钠水溶液中添加硫酸水溶液而进行中和之后进行粒子生长和浓缩的方法(有时也被称为沉降法)、将四氯化硅热分解的方法、将烷氧基硅烷进行水解和缩合的方法等公知的方法(有时也被称为溶胶凝胶法)。From the viewpoint of dispersibility, the preferred silica is synthesized by a method in which an aqueous sodium silicate solution is subjected to ion exchange using an ion exchange resin or the like, followed by particle growth and concentration (sometimes also referred to as a water glass method), a method in which an aqueous sulfuric acid solution is added to an aqueous sodium silicate solution to neutralize the solution, followed by particle growth and concentration (sometimes also referred to as a sedimentation method), a method in which silicon tetrachloride is thermally decomposed, a method in which an alkoxysilane is hydrolyzed and condensed, and other well-known methods (sometimes also referred to as a sol-gel method).
在通过对硅酸钠进行离子交换而合成的方法的情况下,从形成透光率高的无机微粒层的观点考虑,硅溶胶中的钠离子含量以Na2O量计优选为0.5重量%以下,更优选为0.05质量%以下,进一步优选为0.03重量%以下。In the case of the synthesis method by ion exchange of sodium silicate, the sodium ion content in the silica sol is preferably 0.5 wt% or less, more preferably 0.05 wt% or less, and further preferably 0.03 wt% or less in terms of Na2O amount, from the viewpoint of forming an inorganic fine particle layer with high light transmittance.
[液体分散介质A][Liquid dispersion medium A]
在本发明中,液体分散介质A为在大气压(1013.25hPa)下的沸点大于等于100℃且小于190℃的液体(其中,不包括水)。在将无机微粒分散液整体设为100质量%时,液体分散介质A的含有率大于等于0.5质量%且小于15质量%。In the present invention, the liquid dispersion medium A is a liquid (excluding water) having a boiling point of 100° C. or more and less than 190° C. at atmospheric pressure (1013.25 hPa). When the entire inorganic fine particle dispersion is 100% by mass, the content of the liquid dispersion medium A is 0.5% by mass or more and less than 15% by mass.
作为液体分散介质A的沸点的范围,优选大于等于115℃且小于190℃,优选大于等于125℃且小于190℃,进一步优选大于等于135℃且小于190℃,进一步优选大于等于150℃且小于190℃,进一步优选大于等于155℃且小于190℃,进一步优选大于等于155℃且小于180℃,进一步优选大于等于160℃且小于180℃,进一步优选大于等于170℃且小于180℃。The boiling point range of the liquid dispersion medium A is preferably 115° C. or higher and lower than 190° C., preferably 125° C. or higher and lower than 190° C., further preferably 135° C. or higher and lower than 190° C., further preferably 150° C. or higher and lower than 190° C., further preferably 155° C. or higher and lower than 190° C., further preferably 155° C. or higher and lower than 180° C., further preferably 160° C. or higher and lower than 180° C., further preferably 170° C. or higher and lower than 180° C.
作为液体分散介质A的含有率的下限,从通过使用液体分散介质A而抑制涂膜干燥时的无机微粒的凝聚、提高透射率和涂膜强度的方面考虑,在将无机微粒分散液整体设为100质量%时,优选包含0.7质量%以上的液体分散介质A,进一步优选包含0.8质量%以上的液体分散介质A。另外,作为液体分散介质A的含有率的上限,从在包含过量液体分散介质A的情况下由无机微粒分散液的凝胶化等导致的保存稳定性变差的方面考虑,在将无机微粒分散液整体设为100质量%时,优选包含13质量%以下的液体分散介质A,进一步优选包含12质量%以下的液体分散介质A,进一步优选包含8质量%以下的液体分散介质A,进一步优选包含5质量%以下的液体分散介质A,进一步优选包含3质量%以下的液体分散介质A。As the lower limit of the content of the liquid dispersion medium A, from the viewpoint of suppressing the aggregation of inorganic particles when the coating film is dried and improving the transmittance and coating film strength by using the liquid dispersion medium A, when the entire inorganic particle dispersion is 100 mass %, it is preferably contained 0.7 mass % or more of the liquid dispersion medium A, and more preferably contains 0.8 mass % or more of the liquid dispersion medium A. In addition, as the upper limit of the content of the liquid dispersion medium A, from the viewpoint of deterioration of the storage stability due to gelation of the inorganic particle dispersion when an excessive amount of the liquid dispersion medium A is contained, when the entire inorganic particle dispersion is 100 mass %, it is preferably contained 13 mass % or less of the liquid dispersion medium A, more preferably contains 12 mass % or less of the liquid dispersion medium A, more preferably contains 8 mass % or less of the liquid dispersion medium A, more preferably contains 5 mass % or less of the liquid dispersion medium A, and more preferably contains 3 mass % or less of the liquid dispersion medium A.
作为液体分散介质A,可以例示由下式规定的δtA为20Mpa0.5以上且40Mpa0.5以下的液体分散介质作为好的例子。As the liquid dispersion medium A, a liquid dispersion medium having a δtA defined by the following formula of 20 MPa 0.5 or more and 40 MPa 0.5 or less can be exemplified as a preferable example.
δtA={4(δDA-15.6)2+(δPA-16.0)2+(δHA-42.0)2}0.5 (1)δtA={4(δDA-15.6) 2 +(δPA-16.0) 2 +(δHA-42.0) 2 } 0.5 (1)
(式(1)中,δDA、δPA、δHA分别表示液体分散介质A的汉森溶解度参数中的分散项(Mpa0.5)、极性项(Mpa0.5)、氢键项(Mpa0.5)。)(In formula (1), δDA, δPA, and δHA represent the dispersion term (Mpa 0.5 ), polar term (Mpa 0.5 ), and hydrogen bonding term (Mpa 0.5 ) in the Hansen solubility parameters of the liquid dispersion medium A, respectively.)
上述δDA、δPA、δHA使用作为通常可以利用的市售软件的“HSPiP 5th 5.2.06”并应用该软件中的被称为Y-MB的方法计算。The above-mentioned δDA, δPA, and δHA were calculated using "HSPiP 5th 5.2.06" which is a generally available commercial software, and applying a method called Y-MB in the software.
作为δtA的优选范围,上限优选为39Mpa0.5以下,更优选为35.5Mpa0.5以下,进一步优选为34Mpa0.5以下。下限优选为25Mpa0.5以上,更优选为29Mpa0.5以上,进一步优选为30Mpa0.5以上。δtA在这样的范围内的液体分散介质A能够得到与二氧化硅粒子的高亲和性,涂覆性变得良好。As a preferred range of δtA, the upper limit is preferably 39Mpa 0.5 or less, more preferably 35.5Mpa 0.5 or less, and further preferably 34Mpa 0.5 or less. The lower limit is preferably 25Mpa 0.5 or more, more preferably 29Mpa 0.5 or more, and further preferably 30Mpa 0.5 or more. The liquid dispersion medium A having δtA within such a range can obtain a high affinity with the silica particles, and the coating property becomes good.
从涂覆性的观点考虑,液体分散介质A的分子量的下限优选为60以上,更优选为70以上,进一步优选为90以上,特别优选为100以上。上限优选为300以下,更优选为200以下,进一步优选为170以下,特别优选为140以下。From the viewpoint of coating properties, the lower limit of the molecular weight of the liquid dispersion medium A is preferably 60 or more, more preferably 70 or more, further preferably 90 or more, and particularly preferably 100 or more. The upper limit is preferably 300 or less, more preferably 200 or less, further preferably 170 or less, and particularly preferably 140 or less.
作为液体分散介质A的种类,例如可以列举:醚类、酯类、醇类、酮类、胺类、酰胺类、亚砜类等,但不限于此。作为液体分散介质A的具体例子,可以列举下述物质,但不限于此,Examples of the type of liquid dispersion medium A include, but are not limited to, ethers, esters, alcohols, ketones, amines, amides, and sulfoxides. Specific examples of the liquid dispersion medium A include, but are not limited to, the following substances:
乙酸2-甲氧基乙酯、4-甲基-2-戊酮、1-甲氧基-2-丙醇、4-乙基吗啉、乙酸异戊酯、丙二醇1-单甲醚2-乙酸酯、1-丙氧基-2-丙醇、N,N-二甲基甲酰胺、乙酸2-乙氧基乙酯、二甲基亚砜、二丙二醇二甲醚、2-Methoxyethyl acetate, 4-methyl-2-pentanone, 1-methoxy-2-propanol, 4-ethylmorpholine, isoamyl acetate, propylene glycol 1-monomethyl ether 2-acetate, 1-propoxy-2-propanol, N,N-dimethylformamide, 2-ethoxyethyl acetate, dimethyl sulfoxide, dipropylene glycol dimethyl ether,
乙酸正戊酯、乙酸正丙酯、乙酰乙酸乙酯、2-戊酮、3-戊酮、乙酰丙酮(2,4-戊二酮)、正丁醇、异丁醇、1-己醇、糠醇、2-甲基-2-丁醇、1-戊醇、3-戊醇、二丁醚、1,4-二氧杂环己烷、2-丁氧基乙醇(乙二醇单丁醚)、2-甲氧基乙醇(乙二醇单甲醚)、2-乙氧基乙醇(乙二醇单乙醚)、2-乙基己醇、N,N-二甲基乙酰胺、乳酸乙酯、二乙二醇乙基甲基醚、乙酸3-甲氧基丁酯、2-(丁基氨基)乙醇、2-(甲基氨基)乙醇、N-环己胺、1,2-丙二醇、3-甲氧基-3-甲基丁醇、丙二醇1-单丁醚、1-乙氧基-2-丙醇、3-甲氧基-1-丙醇、3-甲氧基-1-丁醇、乙二醇单叔丁醚、2-异丙氧基乙醇、2-丙氧基乙醇、2-异丁氧基乙醇、2-烯丙氧基乙醇、四氢糠醇、乙酸2-羟基乙酯、1-丁醇、n-Amyl acetate, n-propyl acetate, ethyl acetoacetate, 2-pentanone, 3-pentanone, acetylacetone (2,4-pentanedione), n-butanol, isobutanol, 1-hexanol, furfuryl alcohol, 2-methyl-2-butanol, 1-pentanol, 3-pentanol, dibutyl ether, 1,4-dioxane, 2-butoxyethanol (ethylene glycol monobutyl ether), 2-methoxyethanol (ethylene glycol monomethyl ether), 2-ethoxyethanol (ethylene glycol monoethyl ether), 2-ethylhexanol, N,N-dimethylacetamide, ethyl lactate, diethylene glycol Ethyl methyl ether, 3-methoxybutyl acetate, 2-(butylamino)ethanol, 2-(methylamino)ethanol, N-cyclohexylamine, 1,2-propylene glycol, 3-methoxy-3-methylbutanol, propylene glycol 1-monobutyl ether, 1-ethoxy-2-propanol, 3-methoxy-1-propanol, 3-methoxy-1-butanol, ethylene glycol mono-tert-butyl ether, 2-isopropoxyethanol, 2-propoxyethanol, 2-isobutoxyethanol, 2-allyloxyethanol, tetrahydrofurfuryl alcohol, 2-hydroxyethyl acetate, 1-butanol,
二乙二醇二甲醚、二乙二醇二乙醚、1,2-二乙氧基乙烷、Diethylene glycol dimethyl ether, diethylene glycol diethyl ether, 1,2-diethoxyethane,
1,2-二乙酰氧基丙烷、乙酸3-甲氧基-3-甲基丁酯。1,2-diacetoxypropane, 3-methoxy-3-methylbutyl acetate.
作为优选的液体分散介质A,可以列举与作为醇的液体分散介质、具有醚键的液体分散介质、具有酯键的液体分散介质中的任一种对应的液体分散介质。更优选可以列举与作为醇的液体分散介质、具有醚键的液体分散介质、具有酯键的液体分散介质中的任一种对应并且不含氮原子的液体分散介质。当使用这样的液体分散介质A时,涂覆性变得更良好。Preferred liquid dispersion medium A includes a liquid dispersion medium corresponding to any one of an alcohol liquid dispersion medium, a liquid dispersion medium having an ether bond, and a liquid dispersion medium having an ester bond. More preferably, a liquid dispersion medium corresponding to any one of an alcohol liquid dispersion medium, a liquid dispersion medium having an ether bond, and a liquid dispersion medium having an ester bond and containing no nitrogen atom can be included. When such a liquid dispersion medium A is used, coating properties become better.
作为无机微粒分散液的一个方式,优选液体分散介质A为醇。当液体分散介质A为醇时,涂覆时的无机微粒成分与后述的烷氧基硅烷和/或其缩合物(C)的相容性得到改善,涂覆性变得良好,能够得到具有高涂膜强度(涂膜对基材的高粘附性)的层叠体。As one embodiment of the inorganic particle dispersion, the liquid dispersion medium A is preferably an alcohol. When the liquid dispersion medium A is an alcohol, the compatibility of the inorganic particle component during coating with the alkoxysilane and/or its condensate (C) described later is improved, the coating property becomes good, and a laminate having a high coating film strength (high adhesion of the coating film to the substrate) can be obtained.
在液体分散介质A为醇的情况下,可以列举一元醇作为好的例子。另外,优选具有醚键、酯键中的任意一种以上的醇。当液体分散介质A为这样的醇时,无机微粒的分散和涂覆性变得良好。作为这样的具体例子,可以列举:1-甲氧基-2-丙醇、1-丙氧基-2-丙醇、糠醇、2-丁氧基乙醇(乙二醇单丁醚)、2-甲氧基乙醇(乙二醇单甲醚)、2-乙氧基乙醇(乙二醇单乙醚)、乳酸乙酯、3-甲氧基-3-甲基丁醇、丙二醇1-单丁醚、1-乙氧基-2-丙醇、3-甲氧基-1-丙醇、3-甲氧基-1-丁醇、乙二醇单叔丁醚、2-异丙氧基乙醇、2-丙氧基乙醇、2-异丁氧基乙醇、2-烯丙氧基乙醇、四氢糠醇、乙酸2-羟基乙酯,When the liquid dispersion medium A is an alcohol, monohydric alcohols can be cited as good examples. In addition, it is preferred to have an alcohol having any one or more of an ether bond and an ester bond. When the liquid dispersion medium A is such an alcohol, the dispersion and coating properties of the inorganic particles become good. As such specific examples, 1-methoxy-2-propanol, 1-propoxy-2-propanol, furfuryl alcohol, 2-butoxyethanol (ethylene glycol monobutyl ether), 2-methoxyethanol (ethylene glycol monomethyl ether), 2-ethoxyethanol (ethylene glycol monoethyl ether), ethyl lactate, 3-methoxy-3-methylbutanol, propylene glycol 1-monobutyl ether, 1-ethoxy-2-propanol, 3-methoxy-1-propanol, 3-methoxy-1-butanol, ethylene glycol mono-tert-butyl ether, 2-isopropoxyethanol, 2-propoxyethanol, 2-isobutoxyethanol, 2-allyloxyethanol, tetrahydrofurfuryl alcohol, 2-hydroxyethyl acetate,
更优选可以列举:More preferably, the following can be cited:
1-丙氧基-2-丙醇、2-丁氧基乙醇(乙二醇单丁醚)、2-乙氧基乙醇(乙二醇单乙醚)、乳酸乙酯、3-甲氧基-3-甲基丁醇、丙二醇1-单丁醚、1-乙氧基-2-丙醇、3-甲氧基-1-丙醇、3-甲氧基-1-丁醇、乙二醇单叔丁醚、2-异丙氧基乙醇、2-丙氧基乙醇、2-异丁氧基乙醇、四氢糠醇,1-propoxy-2-propanol, 2-butoxyethanol (ethylene glycol monobutyl ether), 2-ethoxyethanol (ethylene glycol monoethyl ether), ethyl lactate, 3-methoxy-3-methylbutanol, propylene glycol 1-monobutyl ether, 1-ethoxy-2-propanol, 3-methoxy-1-propanol, 3-methoxy-1-butanol, ethylene glycol monotert-butyl ether, 2-isopropoxyethanol, 2-propoxyethanol, 2-isobutoxyethanol, tetrahydrofurfuryl alcohol,
进一步优选可以列举:Further preferred examples include:
2-丁氧基乙醇(乙二醇单丁醚)、3-甲氧基-3-甲基丁醇、丙二醇1-单丁醚、3-甲氧基-1-丙醇、3-甲氧基-1-丁醇、乙二醇单叔丁醚、2-丙氧基乙醇、2-异丁氧基乙醇、四氢糠醇。2-Butoxyethanol (ethylene glycol monobutyl ether), 3-methoxy-3-methylbutanol, propylene glycol 1-monobutyl ether, 3-methoxy-1-propanol, 3-methoxy-1-butanol, ethylene glycol monotert-butyl ether, 2-propoxyethanol, 2-isobutoxyethanol, tetrahydrofurfuryl alcohol.
[液体分散介质B][Liquid dispersion medium B]
在本发明中,液体分散介质B为在大气压(1013.25hPa)下的沸点小于100℃的液体。In the present invention, the liquid dispersion medium B is a liquid having a boiling point of less than 100° C. at atmospheric pressure (1013.25 hPa).
作为液体分散介质B,可以例示由下式规定的δtB为15Mpa0.5以上且39Mpa0.5以下的液体分散介质作为好的例子。As the liquid dispersion medium B, a liquid dispersion medium having a δtB defined by the following formula of 15 MPa 0.5 or more and 39 MPa 0.5 or less can be exemplified as a preferable example.
δtB={4(δDB-15.6)2+(δPB-16.0)2+(δHB-42.0)2}0.5 (2)δtB={4(δDB-15.6) 2 +(δPB-16.0) 2 +(δHB-42.0) 2 } 0.5 (2)
(式中,δDB、δPB、δHB分别表示液体分散介质B的汉森溶解度参数中的分散项(Mpa0.5)、极性项(Mpa0.5)、氢键项(Mpa0.5)。)(Wherein, δDB, δPB, and δHB represent the dispersion term (Mpa 0.5 ), polar term (Mpa 0.5 ), and hydrogen bond term (Mpa 0.5 ) in the Hansen solubility parameters of the liquid dispersion medium B, respectively.)
上述δDB,δPB,δHB使用作为通常可以利用的市售软件的“HSPiP 5th 5.2.06”并应用该软件中的被称为Y-MB的方法计算。The above-mentioned δDB, δPB, and δHB are calculated using "HSPiP 5th 5.2.06" which is a generally available commercial software, and applying a method called Y-MB in the software.
作为δtB的优选范围,上限优选为32Mpa0.5以下,优选为31Mpa0.5以下,更优选为27Mpa0.5以下。下限优选为18Mpa0.5以上,更优选为23Mpa0.5以上,更优选为25Mpa0.5以上。δtB在这样的范围内的液体分散介质B能够得到与二氧化硅粒子的高亲和性,涂覆性变得良好。As a preferred range of δtB, the upper limit is preferably 32Mpa 0.5 or less, preferably 31Mpa 0.5 or less, and more preferably 27Mpa 0.5 or less. The lower limit is preferably 18Mpa 0.5 or more, more preferably 23Mpa 0.5 or more, and more preferably 25Mpa 0.5 or more. The liquid dispersion medium B with δtB within such a range can obtain a high affinity with the silica particles, and the coating property becomes good.
作为液体分散介质B的种类,例如可以列举醚类、酯类、醇类等,作为醚类,例如可以列举乙醚,作为酯类,例如可以列举乙酸甲酯和乙酸乙酯,作为醇类,例如可以列举甲醇、乙醇、叔丁醇、仲丁醇、异丙醇和正丙醇等。从无机微粒分散液中的无机微粒的分散性的观点考虑,优选为醇类,进一步优选为甲醇、乙醇和异丙醇,特别优选为乙醇和异丙醇,从安全性的观点考虑,进一步优选为乙醇。As the type of liquid dispersion medium B, for example, ethers, esters, alcohols, etc. can be listed, as ethers, for example, diethyl ether can be listed, as esters, for example, methyl acetate and ethyl acetate can be listed, as alcohols, for example, methanol, ethanol, tert-butyl alcohol, sec-butyl alcohol, isopropyl alcohol and n-propyl alcohol can be listed. From the viewpoint of dispersibility of inorganic particles in the inorganic particle dispersion, alcohols are preferred, methanol, ethanol and isopropyl alcohol are more preferred, ethanol and isopropyl alcohol are particularly preferred, and from the viewpoint of safety, ethanol is more preferred.
作为液体分散介质B的含有率,没有特别限制,从涂覆性、保存稳定性的观点考虑,在将无机微粒分散液整体设为100质量%时,优选包含20质量%以上的液体分散介质B,进一步优选包含30质量%以上的液体分散介质B,进一步优选包含40质量%以上的液体分散介质B,进一步优选包含60质量%以上的液体分散介质B,此外,优选包含95质量%以下的液体分散介质B,进一步优选包含90质量%以下的液体分散介质B,进一步优选包含85质量%以下的液体分散介质B,进一步优选包含80质量%以下的液体分散介质B。The content of the liquid dispersion medium B is not particularly limited. From the viewpoint of coating properties and storage stability, when the entire inorganic fine particle dispersion is 100% by mass, it is preferred that the content of the liquid dispersion medium B is 20% by mass or more, more preferably 30% by mass or more, more preferably 40% by mass or more, more preferably 60% by mass or more, and further preferably 95% by mass or less of the liquid dispersion medium B, more preferably 90% by mass or less of the liquid dispersion medium B, more preferably 85% by mass or less of the liquid dispersion medium B, and more preferably 80% by mass or less of the liquid dispersion medium B.
[水][water]
在本发明中,作为一个方式,无机微粒分散液优选包含水。作为水的含有率的下限,从涂覆性、保存稳定性的观点考虑,在将无机微粒分散液整体设为100质量%时,优选包含1质量%以上的水,进一步优选包含3质量%以上的水,进一步优选包含5质量%以上的水,进一步优选包含8质量%以上的水,进一步优选包含10质量%以上的水。另外,作为水的含有率的上限,从透射率的观点考虑,优选包含55质量%以下的水,进一步优选包含50质量%以下的水,进一步优选包含45质量%以下的水,进一步优选包含35质量%以下的水,进一步优选包含25质量%以下的水,进一步优选包含20质量%以下的水。In the present invention, as a mode, the inorganic particle dispersion preferably includes water. As the lower limit of the content of water, from the viewpoint of coating property and storage stability, when the inorganic particle dispersion is set to 100% by mass as a whole, it is preferred to include more than 1% by mass of water, further preferably include more than 3% by mass of water, further preferably include more than 5% by mass of water, further preferably include more than 8% by mass of water, further preferably include more than 10% by mass of water. In addition, as the upper limit of the content of water, from the viewpoint of transmittance, it is preferred to include less than 55% by mass of water, further preferably include less than 50% by mass of water, further preferably include less than 45% by mass of water, further preferably include less than 35% by mass of water, further preferably include less than 25% by mass of water, further preferably include less than 20% by mass of water.
[烷氧基硅烷和/或其缩合物(C)][Alkoxysilane and/or its condensate (C)]
在本发明中,作为一个方式,无机微粒分散液优选包含烷氧基硅烷和/或其缩合物(成分C)。成分C为烷氧基硅烷和/或其缩合物。作为烷氧基硅烷,可以列举四烷氧基硅烷。In one embodiment of the present invention, the inorganic fine particle dispersion preferably contains alkoxysilane and/or its condensate (component C). Component C is alkoxysilane and/or its condensate. Examples of the alkoxysilane include tetraalkoxysilane.
作为一个方式,四烷氧基硅烷由下式:Si(OR)4(式中,4个R各自独立地表示碳原子数为1~6的烷基)表示。作为一个方式,四烷氧基硅烷的缩合物由下式:SinOn-1(OR)2n+2(式中,各R各自独立地表示碳原子数为1~6的烷基。n为2~1000,作为一个方式,n为2~100)表示。作为烷氧基硅烷,可以列举四甲氧基硅烷、四乙氧基硅烷、四丙氧基硅烷、四丁氧基硅烷等,优选四甲氧基硅烷和四乙氧基硅烷。以下,有时将烷氧基硅烷记载为“成分C1”。烷氧基硅烷可以使用市售品。As one embodiment, tetraalkoxysilane is represented by the following formula: Si(OR) 4 (wherein, four Rs independently represent an alkyl group having 1 to 6 carbon atoms). As one embodiment, the condensate of tetraalkoxysilane is represented by the following formula: Si n O n-1 (OR) 2n+2 (wherein, each R independently represents an alkyl group having 1 to 6 carbon atoms. n is 2 to 1000, and as one embodiment, n is 2 to 100). Examples of alkoxysilanes include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, etc., preferably tetramethoxysilane and tetraethoxysilane. Hereinafter, alkoxysilane is sometimes described as "component C1". Commercially available alkoxysilanes can be used.
这些烷氧基硅烷的OR部位可以部分地进行了水解,可以进一步在该水解部分进行了缩合。The OR site of these alkoxysilanes may be partially hydrolyzed, and the hydrolyzed portion may be further condensed.
作为烷氧基硅烷的一个方式,可以列举由下式(1)表示的硅化合物。As one embodiment of the alkoxysilane, a silicon compound represented by the following formula (1) can be mentioned.
Si(Ra)q(Rb)4-q (1)Si(R a ) q (R b ) 4-q (1)
在式(1)中,Ra表示氢原子或非水解性的有机基团,Rb表示水解性基团。q表示0~2的整数。In the formula (1), Ra represents a hydrogen atom or a non-hydrolyzable organic group, Rb represents a hydrolyzable group, and q represents an integer of 0-2.
在本说明书中,“水解性”是指通过与水的反应而生成硅烷醇基的性质。In this specification, "hydrolyzable" means a property of generating a silanol group by reaction with water.
作为Ra的非水解性的有机基团,可以列举:甲基、乙基、正丙基、异丙基、正丁基、仲丁基、异丁基、叔丁基、叔戊基(1,1-二甲基丙基)、1,1-二甲基-3,3-二甲基丁基、庚基、辛基、壬基、癸基等碳原子数为1~10的烷基;环戊基、环己基等碳原子数为3~10的环烷基;乙烯基、烯丙基等碳原子数为2~10的烯基;乙叉基、丙叉基等碳原子数为2~10的烷叉基;苯基、萘基、蒽基等碳原子数为6~15的芳香族基团;等。Examples of the non-hydrolyzable organic group of Ra include alkyl groups having 1 to 10 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, tert-pentyl (1,1-dimethylpropyl), 1,1-dimethyl-3,3-dimethylbutyl, heptyl, octyl, nonyl and decyl; cycloalkyl groups having 3 to 10 carbon atoms, such as cyclopentyl and cyclohexyl; alkenyl groups having 2 to 10 carbon atoms, such as vinyl and allyl; alkylidene groups having 2 to 10 carbon atoms, such as ethylidene and propylidene; aromatic groups having 6 to 15 carbon atoms, such as phenyl, naphthyl and anthracenyl; and the like.
这些有机基团所含的氢原子可以被(甲基)丙烯酰氧基、环氧基、氨基、巯基、羟基、卤素原子、烷氧基、氟烷基、环氧丙氧基等取代。可以有机基团中的一个氢原子被取代,也可以有机基团中的两个以上的氢原子被取代。The hydrogen atoms contained in these organic groups may be substituted by (meth)acryloyloxy, epoxy, amino, mercapto, hydroxyl, halogen, alkoxy, fluoroalkyl, glycidoxy, etc. One hydrogen atom in the organic group may be substituted, or two or more hydrogen atoms in the organic group may be substituted.
作为Rb的水解性基团,可以列举:甲氧基、乙氧基、丙氧基等碳原子数为1~5的烷氧基。Examples of the hydrolyzable group of R b include alkoxy groups having 1 to 5 carbon atoms, such as methoxy, ethoxy, and propoxy.
q表示0~2的整数,优选为0或1。作为一个方式,q为0。作为一个方式,q为1。q represents an integer of 0 to 2, and is preferably 0 or 1. In one embodiment, q is 0. In one embodiment, q is 1.
由式(1)表示的硅化合物的水解性基团可以进行了水解,可以进一步在该水解部分进行了缩合。The hydrolyzable group of the silicon compound represented by the formula (1) may be hydrolyzed, and further condensed at the hydrolyzed portion.
作为由式(1)表示的硅化合物,可以列举:四甲氧基硅烷、四乙氧基硅烷、四正丙氧基硅烷、四异丙氧基硅烷、四正丁氧基硅烷、四异丁氧基硅烷、四仲丁氧基硅烷、四叔丁氧基硅烷等q为0的硅化合物;甲基三甲氧基硅烷、甲基三乙氧基硅烷、甲基三丙氧基硅烷、甲基三异丙氧基硅烷、乙基三甲氧基硅烷、乙基三乙氧基硅烷、丙基三甲氧基硅烷、丙基三乙氧基硅烷、丁基三甲氧基硅烷、丁基三乙氧基硅烷、苯基三甲氧基硅烷、苯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷等q为1的硅化合物;二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、二乙基二甲氧基硅烷、二乙基二乙氧基硅烷、甲基苯基二甲氧基硅烷、二乙烯基二甲氧基硅烷、二乙烯基二乙氧基硅烷等q为2的硅化合物;等。Examples of the silicon compound represented by formula (1) include silicon compounds wherein q is 0, such as tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-isopropoxysilane, tetra-n-butoxysilane, tetra-isobutoxysilane, tetra-sec-butoxysilane, and tetra-tert-butoxysilane; methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyltriisopropoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyltriisopropoxysilane, ethyl ...methyltriethoxysilane, methyltripropoxysilane, methyltriisopropoxysilane, ethyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, propyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyl Silicon compounds wherein q is 1, such as butyltriethoxysilane, butyltrimethoxysilane, butyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane; silicon compounds wherein q is 2, such as dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, methylphenyldimethoxysilane, divinyldimethoxysilane, divinyldiethoxysilane; etc.
无机微粒分散液可以仅含有一种由式(1)表示的硅化合物,也可以含有两种以上的由式(1)表示的硅化合物。另外,无机微粒分散液可以含有由式(1)表示的硅化合物并且含有三甲基甲氧基硅烷、三乙基甲氧基硅烷、三乙基甲氧基硅烷、三乙基乙氧基硅烷、三乙烯基甲氧基硅烷、三乙烯基乙氧基硅烷等q为3的硅化合物。The inorganic particle dispersion may contain only one silicon compound represented by formula (1), or may contain two or more silicon compounds represented by formula (1). In addition, the inorganic particle dispersion may contain a silicon compound represented by formula (1) and a silicon compound wherein q is 3 such as trimethylmethoxysilane, triethylmethoxysilane, triethylmethoxysilane, triethylethoxysilane, trivinylmethoxysilane, or trivinylethoxysilane.
烷氧基硅烷的缩合物(以下,有时记载为“成分C2”)能够通过使这些烷氧基硅烷单体进行水解和缩合反应而得到。对烷氧基硅烷的缩合物的聚合度没有特别限制。作为一个方式,烷氧基硅烷的缩合物的聚合度为2~1000,作为一个方式,烷氧基硅烷的缩合物的聚合度为2~100。以下,有时将聚合度为2~1000的烷氧基硅烷的缩合物记载为“成分C2-1”。作为一个方式,烷氧基硅烷的缩合物可以为二聚体~十聚体的低聚物。作为烷氧基硅烷的缩合物的一个方式,可以列举多个Si-O-Si键线性地连接的烷氧基硅烷缩合物(以下,有时记载为“成分C2-2”)。作为成分C2-2的一个方式,可以列举在该烷氧基硅烷缩合物的末端中的多于半数的末端为烷氧基的烷氧基硅烷缩合物。作为烷氧基硅烷的缩合物的一个方式,可以列举多个Si-O-Si键三维地连接的烷氧基硅烷缩合物(以下,有时记载为“成分C2-3”)。作为成分C2-3的一个方式,可以列举在该烷氧基硅烷缩合物的末端中的多于半数的末端为羟基的烷氧基硅烷缩合物。烷氧基硅烷的缩合物的平均粒径优选小于1μm。烷氧基硅烷的缩合物可以使用市售品。烷氧基硅烷的缩合物的上述OR部位可以部分地进行了水解,可以进一步在该水解部分进行了缩合。The condensate of alkoxysilane (hereinafter, sometimes described as "component C2") can be obtained by subjecting these alkoxysilane monomers to hydrolysis and condensation reaction. There is no particular limitation on the degree of polymerization of the condensate of alkoxysilane. As one embodiment, the degree of polymerization of the condensate of alkoxysilane is 2 to 1000, and as one embodiment, the degree of polymerization of the condensate of alkoxysilane is 2 to 100. Hereinafter, the condensate of alkoxysilane having a degree of polymerization of 2 to 1000 is sometimes described as "component C2-1". As one embodiment, the condensate of alkoxysilane may be an oligomer of a dimer to a decamer. As one embodiment of the condensate of alkoxysilane, an alkoxysilane condensate in which a plurality of Si-O-Si bonds are linearly connected (hereinafter, sometimes described as "component C2-2") can be listed. As one embodiment of component C2-2, an alkoxysilane condensate in which more than half of the ends of the alkoxysilane condensate are alkoxy groups can be listed. As one form of the condensate of alkoxysilane, an alkoxysilane condensate (hereinafter, sometimes described as "component C2-3") in which a plurality of Si-O-Si bonds are three-dimensionally connected can be cited. As one form of component C2-3, an alkoxysilane condensate in which more than half of the ends of the alkoxysilane condensate are hydroxyl groups can be cited. The average particle size of the condensate of alkoxysilane is preferably less than 1 μm. The condensate of alkoxysilane can use a commercial product. The above-mentioned OR portion of the condensate of alkoxysilane can be partially hydrolyzed, and the hydrolyzed portion can be further condensed.
作为烷氧基硅烷的缩合物的市售品,例如可以列举:作为四甲氧基硅烷的平均四聚体低聚物的Methyl Silicate 51;作为四甲氧基硅烷的平均七聚体低聚物的MethylSilicate 53A;作为四乙氧基硅烷的平均五聚体低聚物的Ethyl Silicate 40;作为四乙氧基硅烷的平均十聚体低聚物的Ethyl Silicate 48;作为四甲氧基硅烷低聚物与四乙氧基硅烷低聚物的混合物且作为平均十聚体低聚物的EMS-485(以上为Colcoat株式会社制造)。Examples of commercially available products of condensates of alkoxysilanes include: Methyl Silicate 51, which is an average tetramer oligomer of tetramethoxysilane; Methyl Silicate 53A, which is an average heptamer oligomer of tetramethoxysilane; Ethyl Silicate 40, which is an average pentamer oligomer of tetraethoxysilane; Ethyl Silicate 48, which is an average decamer oligomer of tetraethoxysilane; and EMS-485, which is a mixture of tetramethoxysilane oligomers and tetraethoxysilane oligomers and is an average decamer oligomer (all manufactured by Colcoat Co., Ltd.).
另外,作为烷氧基硅烷缩合物中的硅酸甲酯的水解缩合物的市售品,例如可以列举MS51、MS56、MS57、MS56S(以上为三菱化学株式会社制造),这些物质为多个Si-O-Si键线性地连接的缩合物且为在该缩合物的末端中的多于半数的末端为烷氧基的缩合物。In addition, as commercially available products of the hydrolysis condensate of methyl silicate among the alkoxysilane condensates, for example, MS51, MS56, MS57, and MS56S (all manufactured by Mitsubishi Chemical Corporation) can be cited, and these substances are condensates in which a plurality of Si-O-Si bonds are linearly connected and more than half of the terminals of the condensate are alkoxy groups.
另外,作为烷氧基硅烷缩合物中的硅酸乙酯的水解缩合物的市售品,例如可以列举HAS-1、HAS-6、HAS-10(以上为Colcoat株式会社制造),这些物质为多个Si-O-Si键线性地连接的缩合物且为在该缩合物的末端中的多于半数的末端为烷氧基的缩合物。In addition, commercially available products of the hydrolysis condensate of ethyl silicate among the alkoxysilane condensates include, for example, HAS-1, HAS-6, and HAS-10 (all manufactured by Colcoat Co., Ltd.), which are condensates in which multiple Si-O-Si bonds are linearly connected and more than half of the ends of the condensate are alkoxy groups.
烷氧基硅烷的缩合物的峰顶分子量优选为100~10000,优选为500~5000。作为一个方式,烷氧基硅烷的缩合物的峰顶分子量为500~2000。作为一个方式,烷氧基硅烷的缩合物的峰顶分子量为500~1000。The peak top molecular weight of the condensate of alkoxysilane is preferably 100 to 10000, more preferably 500 to 5000. In one embodiment, the peak top molecular weight of the condensate of alkoxysilane is 500 to 2000. In one embodiment, the peak top molecular weight of the condensate of alkoxysilane is 500 to 1000.
烷氧基硅烷的缩合物的峰顶分子量一般能够使用通过凝胶渗透色谱法测定的值。As the peak top molecular weight of the condensate of alkoxysilane, a value measured by gel permeation chromatography can generally be used.
无机微粒分散液可以单独包含烷氧基硅烷和单独包含其缩合物,也可以包含两者。无机微粒分散液可以仅含有一种成分C,也可以含有两种以上的成分C。The inorganic fine particle dispersion may contain alkoxysilane alone or a condensate thereof alone, or both. The inorganic fine particle dispersion may contain only one component C, or two or more components C.
对无机微粒分散液中的成分C的量没有特别限制,将无机微粒分散液的总重量设为100重量%时,成分C的量优选为0.001重量%~2重量%,更优选为0.005重量%~1重量%,进一步优选为0.01重量%~0.5重量%。以下,有时将成分C的含量记载为“分散液中的成分C的固体成分浓度”。The amount of component C in the inorganic fine particle dispersion is not particularly limited. When the total weight of the inorganic fine particle dispersion is set to 100 weight %, the amount of component C is preferably 0.001 weight % to 2 weight %, more preferably 0.005 weight % to 1 weight %, and further preferably 0.01 weight % to 0.5 weight %. Hereinafter, the content of component C may be described as "solid content concentration of component C in the dispersion".
无机微粒分散液可以仅包含烷氧基硅烷作为成分(C),也可以仅包含烷氧基硅烷的缩合物作为成分(C),还可以包含烷氧基硅烷和烷氧基硅烷的缩合物作为成分(C)。在无机微粒分散液包含烷氧基硅烷和烷氧基硅烷的缩合物的情况下,作为其组合,可以列举:式(1)的q为0的硅化合物与烷氧基硅烷的二聚体~十聚体的组合;式(1)的q为0的硅化合物与多个Si-O-Si键线性地连接的缩合物且该缩合物的末端中的多于半数的末端为烷氧基的缩合物的组合;式(1)的q为0的硅化合物与多个Si-O-Si键三维地连接的缩合物且该缩合物的末端中的多于半数的末端为羟基的缩合物的组合;式(1)的q为1的硅化合物与烷氧基硅烷的二聚体~十聚体的组合;式(1)的q为1的硅化合物与多个Si-O-Si键线性地连接的缩合物且该缩合物的末端中的多于半数的末端为烷氧基的缩合物的组合;式(1)的q为1的硅化合物与多个Si-O-Si键三维地连接的缩合物且该缩合物的末端中的多于半数的末端为羟基的缩合物的组合。The inorganic particle dispersion may contain only alkoxysilane as component (C), may contain only condensates of alkoxysilane as component (C), or may contain condensates of alkoxysilane and alkoxysilane as component (C). When the inorganic particle dispersion contains condensates of alkoxysilane and alkoxysilane, the combinations thereof include: a combination of a silicon compound in which q is 0 in formula (1) and a dimer to a decamer of alkoxysilane; a combination of a silicon compound in which q is 0 in formula (1) and a condensate in which a plurality of Si-O-Si bonds are linearly connected, and more than half of the ends of the condensate are alkoxy groups; a combination of a silicon compound in which q is 0 in formula (1) and a condensate in which a plurality of Si-O-Si bonds are three-dimensionally connected, and more than half of the ends of the condensate are alkoxy groups; A combination of condensates in which more than half of the terminals are hydroxyl groups; a combination of a silicon compound in which q is 1 in formula (1) and a dimer to a decamer of alkoxysilane; a combination of a silicon compound in which q is 1 in formula (1) and a condensate in which a plurality of Si-O-Si bonds are linearly connected, and more than half of the terminals of the condensate are alkoxy groups; a combination of a silicon compound in which q is 1 in formula (1) and a condensate in which a plurality of Si-O-Si bonds are three-dimensionally connected, and more than half of the terminals of the condensate are hydroxyl groups.
无机微粒分散液可以仅包含一种烷氧基硅烷作为成分(C),也可以包含两种以上的烷氧基硅烷作为成分(C)。The inorganic fine particle dispersion may contain only one kind of alkoxysilane as the component (C), or may contain two or more kinds of alkoxysilanes as the component (C).
无机微粒分散液可以仅包含一种烷氧基硅烷的缩合物作为成分(C),也可以包含两种以上的烷氧基硅烷的缩合物作为成分(C)。在无机微粒分散液包含两种以上的烷氧基硅烷的缩合物的情况下,作为其组合,可以列举:烷氧基硅烷的二聚体~十聚体与多个Si-O-Si键线性地连接的缩合物且该缩合物的末端中的多于半数的末端为烷氧基的缩合物的组合;烷氧基硅烷的二聚体~十聚体与多个Si-O-Si键三维地连接的缩合物且该缩合物的末端中的多于半数的末端为羟基的缩合物的组合;多个Si-O-Si键线性地连接的缩合物且该缩合物的末端中的多于半数的末端为烷氧基的缩合物与多个Si-O-Si键三维地连接的缩合物且该缩合物的末端中的多于半数的末端为羟基的缩合物的组合。The inorganic fine particle dispersion may contain only one condensate of alkoxysilane as component (C), or may contain condensates of two or more alkoxysilanes as component (C). When the inorganic fine particle dispersion contains condensates of two or more alkoxysilanes, the combination thereof may include: a combination of a dimer to a decamer of alkoxysilane and a condensate linearly connected to a plurality of Si-O-Si bonds, wherein more than half of the terminals of the condensate are alkoxy groups; a combination of a dimer to a decamer of alkoxysilane and a condensate three-dimensionally connected to a plurality of Si-O-Si bonds, wherein more than half of the terminals of the condensate are hydroxy groups; a combination of a condensate linearly connected to a plurality of Si-O-Si bonds, wherein more than half of the terminals of the condensate are alkoxy groups, and a condensate three-dimensionally connected to a plurality of Si-O-Si bonds, wherein more than half of the terminals of the condensate are hydroxy groups.
无机微粒分散液优选包含一种以上的烷氧基硅烷缩合物作为成分(C)。作为一个方式,作为烷氧基硅烷缩合物,优选多个Si-O-Si键线性地连接的烷氧基硅烷的缩合物。作为这样的烷氧基硅烷缩合物,可以列举由下式表示的烷氧基硅烷缩合物:SinOn-1(OR)2n+2(式中,各R各自独立地表示碳原子数为1~6的烷基。N表示2~1000)。这样的无机微粒分散液的涂膜强度更优异。在上式中,作为碳原子数为1~6的烷基,可以列举甲基、乙基、丙基、丁基、戊基、己基,优选可以列举甲基、乙基、丁基,更优选可以列举甲基、乙基。在上式中,n表示2~1000,n优选为3~100,n更优选为4~50,n更优选为6~30,n更优选为8~30。The inorganic particle dispersion preferably contains one or more alkoxysilane condensates as component (C). As one embodiment, as an alkoxysilane condensate, a condensate of an alkoxysilane in which multiple Si-O-Si bonds are linearly connected is preferred. As such an alkoxysilane condensate, an alkoxysilane condensate represented by the following formula can be cited: Si n O n-1 (OR) 2n+2 (wherein, each R independently represents an alkyl group having 1 to 6 carbon atoms. N represents 2 to 1000). The coating strength of such an inorganic particle dispersion is more excellent. In the above formula, as an alkyl group having 1 to 6 carbon atoms, methyl, ethyl, propyl, butyl, pentyl, and hexyl can be cited, preferably methyl, ethyl, and butyl can be cited, and more preferably methyl and ethyl can be cited. In the above formula, n represents 2 to 1000, n is preferably 3 to 100, n is more preferably 4 to 50, n is more preferably 6 to 30, and n is more preferably 8 to 30.
作为上述烷氧基硅烷缩合物的市售品的具体例子,可以列举下述物质,但不限于此:MS51、MS56、MS57、MS56S(以上为三菱化学株式会社制造)、HAS-1、HAS-6、HAS-10(以上为Colcoat株式会社制造)。Specific examples of commercially available products of the alkoxysilane condensate include, but are not limited to, MS51, MS56, MS57, MS56S (all manufactured by Mitsubishi Chemical Corporation), HAS-1, HAS-6, HAS-10 (all manufactured by Colcoat Corporation).
<成分C中的SiO2的重量的比例><Weight ratio of SiO2 in component C>
成分C中的SiO2的重量相对于无机微粒X与无机微粒Y的合计重量的比例优选为0.005~0.6,更优选为0.005~0.2,进一步优选为0.007~0.15,特别优选为0.01~0.12。The ratio of the weight of SiO 2 in component C to the total weight of the inorganic fine particles X and the inorganic fine particles Y is preferably 0.005 to 0.6, more preferably 0.005 to 0.2, further preferably 0.007 to 0.15, and particularly preferably 0.01 to 0.12.
作为制造无机微粒分散液时的原料液,可以使用包含成分C和溶剂的液体。在包含成分C的原料液中可以包含促进水解和脱水缩合、抑制缩合物的凝聚或控制与基材的粘附性等的添加剂。作为添加剂的一例,可以列举丙烯酸类-氨基甲酸酯树脂。As the raw material liquid when preparing the inorganic fine particle dispersion, a liquid containing component C and a solvent can be used. The raw material liquid containing component C may contain additives that promote hydrolysis and dehydration condensation, inhibit aggregation of condensates, or control adhesion to the substrate. As an example of the additive, an acrylic-urethane resin can be cited.
[表面活性剂][Surfactant]
作为一个方式,从涂膜的平滑性等观点考虑,无机微粒分散液优选包含表面活性剂。在无机微粒分散液包含表面活性剂的情况下,相对于100重量份的液体分散介质,表面活性剂的含量优选为0.01质量份以上且0.5重量份以下,作为进一步优选的一个方式,表面活性剂的含量为0.1质量份以上且0.45质量份以下,作为进一步优选的另一个方式,表面活性剂的含量大于0.3质量份且小于等于0.45质量份。对所使用的表面活性剂没有特别限制,例如可以列举:阴离子型表面活性剂、阳离子型表面活性剂、非离子型表面活性剂、两性表面活性剂等。作为优选的表面活性剂,可以列举非离子型表面活性剂。As a mode, from the viewpoints of the smoothness of the coating film, the inorganic particle dispersion preferably includes a surfactant. In the case where the inorganic particle dispersion includes a surfactant, relative to 100 parts by weight of a liquid dispersion medium, the content of the surfactant is preferably 0.01 parts by mass or more and 0.5 parts by mass or less, as a further preferred mode, the content of the surfactant is 0.1 parts by mass or more and 0.45 parts by mass or less, as a further preferred mode, the content of the surfactant is greater than 0.3 parts by mass and less than or equal to 0.45 parts by mass. There is no particular restriction on the surfactant used, for example, anionic surfactants, cationic surfactants, nonionic surfactants, amphoteric surfactants, etc. can be cited. As a preferred surfactant, a nonionic surfactant can be cited.
作为阴离子型表面活性剂,例如可以列举羧酸的碱金属盐,具体而言,可以列举:辛酸钠、辛酸钾、癸酸钠、己酸钠、肉豆蔻酸钠、油酸钾、硬脂酸四甲基铵、硬脂酸钠等。特别优选具有碳原子数为6~10的烷基链的羧酸的碱金属盐。Examples of the anionic surfactant include alkali metal salts of carboxylic acids, specifically sodium octanoate, potassium octanoate, sodium caprate, sodium caproate, sodium myristate, potassium oleate, tetramethylammonium stearate, sodium stearate, etc. Alkali metal salts of carboxylic acids having an alkyl chain having 6 to 10 carbon atoms are particularly preferred.
作为阳离子型表面活性剂,例如可以列举:十六烷基三甲基氯化铵、二(十八烷基)二甲基氯化铵、溴化-N-十八烷基吡啶十六烷基三乙基溴化等。Examples of the cationic surfactant include hexadecyltrimethylammonium chloride, dioctadecyldimethylammonium chloride, N-octadecylpyridinium bromide, Hexadecyltriethyl bromide wait.
作为非离子型表面活性剂,例如可以列举聚醚改性硅氧烷等。聚醚改性硅氧烷的主链的硅氧烷链可以为直链状或分支的结构,聚醚改性硅氧烷的侧链的醚链可以为直链状或分支的结构,聚醚改性硅氧烷的侧链的一部分可以被烷基等进行了改性。作为聚醚改性硅氧烷,可以使用市售品,例如可以列举:KF-6015、KF-6017、KF-6017P、KF-6028、KF-6028P、KF-6038、KF-6043、KF-6048(以上为信越化学工业株式会社制造);BYK-306、BYK-307、BYK-310、BYK-333、BYK-344、BYK-345、BYK-346、BYK-347、BYK-348、BYK-349、BYK-378(以上为毕克化学日本株式会社制造);DOWSIL(商标)501WAdditive、DOWSIL(商标)FZ-2104Fluid、DOWSIL(商标)FZ-2110、DOWSIL(商标)FZ-2123、DOWSIL(商标)FZ-2164、DOWSIL(商标)FZ-2191、DOWSIL(商标)FZ-5609Fluid、DOWSIL(商标)L-7001、DOWSIL(商标)L-7002、DOWSIL(商标)L-7604、DOWSIL(商标)SH3746Fluid、DOWSIL(商标)SH3771Fluid、DOWSIL(商标)SH8400Fluid、DOWSIL(商标)SF8410Fluid、DOWSIL(商标)SF8700Fluid、SYLGARD(商标)OFX-0309Fluid、XIAMETER(商标)OFX-0193Fluid、XIAMETER(商标)OFX-5211Fluid、DOWSIL(商标)Y-7006(以上为陶氏东丽株式会社制造)等。Examples of nonionic surfactants include polyether-modified siloxanes. The siloxane chain of the main chain of the polyether-modified siloxane may be a linear or branched structure, the ether chain of the side chain of the polyether-modified siloxane may be a linear or branched structure, and a portion of the side chain of the polyether-modified siloxane may be modified with an alkyl group or the like. Commercially available products may be used as polyether-modified siloxanes, examples of which include: KF-6015, KF-6017, KF-6017P, KF-6028, KF-6028P, KF-6038, KF-6043, KF-6048 (all manufactured by Shin-Etsu Chemical Co., Ltd.); BYK-306, BYK-307, BYK-310, BYK-333, BYK-344, BYK-345, BYK-346, BYK-347, BYK-348, BYK-349, BYK-378 (all manufactured by BYK Chemical Japan Co., Ltd.); DOWSIL (trademark) 501W Additive, DOWSIL (trademark) FZ-2104 Fluid, DOWSIL (trademark) FZ-2110, DOWSIL (trademark) FZ-2123, DOWSIL (trademark) FZ-2164 , DOWSIL (trademark) FZ-2191, DOWSIL (trademark) FZ-5609 Fluid, DOWSIL (trademark) L-7001, DOWSIL (trademark) L-7002, DOWSIL (trademark) L-7604, DOWSIL (trademark) SH3746 Fluid, DOWSIL (trademark) SH3771 Fluid, DOWSIL (trademark) SH8400 Fluid, DOWSIL (trademark) SF8410 Fluid, DOWSIL (trademark) SF8700 Fluid, SYLGARD (trademark) OFX-0309 Fluid, XIAMETER (trademark) OFX-0193 Fluid, XIAMETER (trademark) OFX-5211 Fluid, DOWSIL (trademark) Y-7006 (all manufactured by Dow Toray Industries, Ltd.), etc.
作为两性表面活性剂,例如可以列举:2-烷基-N-羧甲基-N-羟乙基咪唑啉甜菜碱、月桂酰胺基丙基甜菜碱等。Examples of the amphoteric surfactant include 2-alkyl-N-carboxymethyl-N-hydroxyethyl imidazoline Betaine, lauroyl propyl betaine, etc.
[其它成分][Other ingredients]
无机微粒分散液可以含有除无机微粒X和无机微粒Y以外的二氧化硅。无机微粒分散液可以包含有机电解质和添加剂。此外,根据用途和使用方法等,可以含有增稠剂、触变剂、消泡剂、光稳定剂、颜料、防霉剂、防尘剂、抗冻性能改善剂、耐候剂、紫外线稳定剂等。The inorganic particle dispersion may contain silicon dioxide in addition to the inorganic particles X and the inorganic particles Y. The inorganic particle dispersion may contain an organic electrolyte and an additive. In addition, depending on the purpose and the method of use, it may contain a thickener, a thixotropic agent, a defoaming agent, a light stabilizer, a pigment, a mildewproof agent, a dustproof agent, an antifreeze performance improver, a weathering agent, an ultraviolet stabilizer, etc.
在无机微粒分散液包含有机电解质的情况下,相对于100重量份的液体分散介质,有机电解质的含量通常为0.01重量份以下。本发明中的有机电解质是指具有电离性离子性基团的有机化合物(其中,不包括表面活性剂)。例如可以列举:对甲苯磺酸钠、苯磺酸钠、丁基磺酸钾、苯基次膦酸钠、二乙基磷酸钠等。该有机电解质优选为苯磺酸衍生物。In the case where the inorganic particle dispersion contains an organic electrolyte, the content of the organic electrolyte is usually less than 0.01 parts by weight relative to 100 parts by weight of the liquid dispersion medium. The organic electrolyte in the present invention refers to an organic compound having an ionizable ionic group (excluding surfactants). For example, sodium p-toluenesulfonate, sodium benzenesulfonate, potassium butylsulfonate, sodium phenylphosphinate, sodium diethyl phosphate, etc. The organic electrolyte is preferably a benzenesulfonic acid derivative.
在无机微粒分散液包含添加剂的情况下,例如能够利用适当的添加剂进行无机微粒的表面处理。作为添加剂,例如可以列举具有羟基、氧基、羰基、羧基、环氧基等极性基团的添加剂,能够经由这些极性基团与无机微粒氢键键合或共价键合。作为添加剂,例如可以例示:多元羧酸及其盐、高分子不饱和酸酯、改性或未改性的聚氨酯、改性或未改性的聚酯、改性或未改性的聚(甲基丙烯酸酯)、(甲基)丙烯酸类共聚物、聚氧化乙烯烷基磷酸酯以及作为成分(C)列举的烷氧基硅烷和烷氧基硅烷缩合物、丙烯酸类-氨基甲酸酯树脂。高分子的添加剂吸附在无机微粒的表面上,起到防止再凝聚的作用,因此优选具有锚固到粒子表面上的锚固部位的添加剂,可以列举末端改性型高分子、接枝型高分子、嵌段型高分子作为优选的结构。无机微粒的表面处理例如能够通过将含有无机微粒、添加剂和溶剂的液体进行混合而进行。In the case where the inorganic particle dispersion liquid contains additives, for example, the surface treatment of the inorganic particles can be performed using appropriate additives. As additives, for example, additives having polar groups such as hydroxyl, oxy, carbonyl, carboxyl, and epoxy groups can be listed, which can be hydrogen-bonded or covalently bonded to the inorganic particles via these polar groups. As additives, for example, polycarboxylic acids and their salts, polymer unsaturated acid esters, modified or unmodified polyurethanes, modified or unmodified polyesters, modified or unmodified poly (methacrylates), (meth) acrylic copolymers, polyoxyethylene alkyl phosphates, and alkoxysilanes and alkoxysilane condensates listed as component (C), acrylic-urethane resins can be exemplified. The polymer additives are adsorbed on the surface of the inorganic particles to prevent re-agglomeration, so it is preferred to have an additive with an anchoring site anchored to the particle surface, and terminal modified polymers, grafted polymers, and block polymers can be listed as preferred structures. The surface treatment of the inorganic particles can be performed, for example, by mixing a liquid containing inorganic particles, additives, and a solvent.
<无机微粒分散液的制造方法><Method for producing inorganic fine particle dispersion>
无机微粒分散液例如能够通过将下述[工序1]~[工序10]的工序的一部分或全部以任意的顺序组合而制备,但不限于这些方法。The inorganic fine particle dispersion can be prepared by combining part or all of the steps of [Step 1] to [Step 10] described below in any order, but the method is not limited to these methods.
[工序1]得到无机微粒X的分散液的工序。无机微粒X的分散液例如通过金属醇盐的水解和/或其缩合、金属盐的水解、金属氧化物的粉碎和/或破碎、金属盐水溶液的沉淀和金属盐水溶液的水热处理以及使无机微粒X混合到液体分散介质中并搅拌使其分散的处理而得到。另外,作为无机微粒X的分散液,也可以使用市售品。[Step 1] A step of obtaining a dispersion of inorganic particles X. The dispersion of inorganic particles X is obtained, for example, by hydrolysis and/or condensation of metal alkoxides, hydrolysis of metal salts, pulverization and/or crushing of metal oxides, precipitation of metal salt aqueous solutions, hydrothermal treatment of metal salt aqueous solutions, and mixing the inorganic particles X in a liquid dispersion medium and stirring to disperse them. In addition, as the dispersion of inorganic particles X, commercially available products can also be used.
[工序2]得到无机微粒Y的分散液的工序。无机微粒Y的分散液例如通过金属醇盐的水解和/或其缩合、金属盐的水解、金属氧化物的粉碎和/或破碎、金属盐水溶液的沉淀和金属盐水溶液的水热处理以及使无机微粒Y混合到液体分散介质中并搅拌使其分散的处理而得到。另外,作为无机微粒Y的分散液,也可以使用市售品。[Process 2] is a process for obtaining a dispersion of inorganic particles Y. The dispersion of inorganic particles Y is obtained by, for example, hydrolysis of metal alkoxides and/or condensation thereof, hydrolysis of metal salts, crushing and/or crushing of metal oxides, precipitation of metal salt aqueous solutions, hydrothermal treatment of metal salt aqueous solutions, and mixing of inorganic particles Y into a liquid dispersion medium and stirring to disperse the inorganic particles Y. In addition, as the dispersion of inorganic particles Y, commercially available products may also be used.
[工序3]得到第一分散液的工序。其中,第一分散液包含无机微粒X和第一液体分散介质。第一分散液可以根据需要含有无机微粒Y、液体分散介质A、液体分散介质B、水、成分C、表面活性剂或无机微粒分散液中所含的其它成分。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第一分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Process 3] A process for obtaining a first dispersion liquid. The first dispersion liquid comprises inorganic particles X and a first liquid dispersion medium. The first dispersion liquid may contain inorganic particles Y, liquid dispersion medium A, liquid dispersion medium B, water, component C, surfactant or other components contained in the inorganic particle dispersion liquid as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion liquid or a portion of the amount. The first dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
[工序4]得到第二分散液的工序。其中,第二分散液包含无机微粒Y和第二液体分散介质。第二分散液可以根据需要含有无机微粒X、液体分散介质A、液体分散介质B、水、成分C、表面活性剂或无机微粒分散液中所含的其它成分。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第二分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Process 4] A process for obtaining a second dispersion liquid. The second dispersion liquid comprises inorganic particles Y and a second liquid dispersion medium. The second dispersion liquid may contain inorganic particles X, liquid dispersion medium A, liquid dispersion medium B, water, component C, surfactant or other components contained in the inorganic particle dispersion liquid as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion liquid or a portion of the amount. The second dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
[工序5]得到第三分散液的工序。其中,第三分散液包含成分C和第三液体分散介质。第三分散液可以根据需要含有无机微粒X、无机微粒Y、液体分散介质A、液体分散介质B、水、表面活性剂或无机微粒分散液中所含的其它成分。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第三分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Step 5] A step of obtaining a third dispersion. The third dispersion comprises component C and a third liquid dispersion medium. The third dispersion may contain inorganic particles X, inorganic particles Y, liquid dispersion medium A, liquid dispersion medium B, water, a surfactant or other components contained in the inorganic particle dispersion as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion or a portion of the amount. The third dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
[工序6]得到第四分散液的工序。其中,第四分散液包含表面活性剂和第四液体分散介质。第四分散液可以根据需要含有无机微粒X、无机微粒Y、液体分散介质A、液体分散介质B、水、成分C或无机微粒分散液中所含的其它成分。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第四分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Step 6] A step of obtaining a fourth dispersion. The fourth dispersion comprises a surfactant and a fourth liquid dispersion medium. The fourth dispersion may contain inorganic particles X, inorganic particles Y, liquid dispersion medium A, liquid dispersion medium B, water, component C or other components contained in the inorganic particle dispersion as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion or a portion of the amount. The fourth dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
[工序7]得到第五分散液的工序。其中,第五分散液包含液体分散介质A和第五液体分散介质。第五分散液可以根据需要含有无机微粒X、无机微粒Y、液体分散介质B、水、成分C、表面活性剂或无机微粒分散液中所含的其它成分。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第五分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Step 7] A step of obtaining a fifth dispersion. The fifth dispersion comprises a liquid dispersion medium A and a fifth liquid dispersion medium. The fifth dispersion may contain inorganic particles X, inorganic particles Y, a liquid dispersion medium B, water, component C, a surfactant or other components contained in the inorganic particle dispersion as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion or a portion of the amount. The fifth dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
[工序8]得到第六分散液的工序。其中,第六分散液包含液体分散介质B和第六液体分散介质。第六分散液可以根据需要含有无机微粒X、无机微粒Y、液体分散介质A、水、成分C、表面活性剂或无机微粒分散液中所含的其它成分。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第六分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Step 8] A step of obtaining a sixth dispersion. The sixth dispersion comprises a liquid dispersion medium B and a sixth liquid dispersion medium. The sixth dispersion may contain inorganic particles X, inorganic particles Y, a liquid dispersion medium A, water, component C, a surfactant or other components contained in the inorganic particle dispersion as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion or a portion of the amount. The sixth dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
[工序9]得到第七分散液的工序。其中,第七分散液包含水和第七液体分散介质。第七分散液可以根据需要含有无机微粒X、无机微粒Y、液体分散介质A、液体分散介质B、成分C、表面活性剂或无机微粒分散液中所含的其它成分。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第七分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Step 9] A step of obtaining a seventh dispersion liquid. The seventh dispersion liquid comprises water and a seventh liquid dispersion medium. The seventh dispersion liquid may contain inorganic particles X, inorganic particles Y, liquid dispersion medium A, liquid dispersion medium B, component C, surfactants or other components contained in the inorganic particle dispersion liquid as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion liquid or a portion of the amount. The seventh dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
[工序10]得到第八分散液的工序。其中,第八分散液包含无机微粒分散液中所含的其它成分和第八液体分散介质。第八分散液可以根据需要含有无机微粒X、无机微粒Y、液体分散介质A、液体分散介质B、水、成分C或表面活性剂。在此情况下,这些成分的含量可以为无机微粒分散液中所含的全部量,也可以为一部分的量。第八分散介质可以包含单一的液体分散介质或多种液体分散介质等的混合物。[Step 10] A step of obtaining an eighth dispersion. The eighth dispersion comprises other components contained in the inorganic particle dispersion and an eighth liquid dispersion medium. The eighth dispersion may contain inorganic particles X, inorganic particles Y, liquid dispersion medium A, liquid dispersion medium B, water, component C or a surfactant as required. In this case, the content of these components may be the total amount contained in the inorganic particle dispersion or a portion of the amount. The eighth dispersion medium may comprise a single liquid dispersion medium or a mixture of multiple liquid dispersion media.
在上述[工序1]~[工序10]的工序和制备无机微粒分散液的其它任意的工序中,通过应用超声波分散、超高压分散等强分散方法,能够使无机微粒在无机微粒分散液中特别均匀地分散。In the above steps [Step 1] to [Step 10] and any other steps for preparing the inorganic fine particle dispersion, the inorganic fine particles can be dispersed particularly uniformly in the inorganic fine particle dispersion by applying a strong dispersion method such as ultrasonic dispersion or ultrahigh pressure dispersion.
为了实现更均匀的分散,优选在无机微粒分散液的制备中使用的无机微粒X的分散液、无机微粒Y的分散液、最终得到的无机微粒分散液中无机微粒为胶体状态。作为分散介质,可以使用水、挥发性有机溶剂。In order to achieve more uniform dispersion, the inorganic particles in the dispersion of inorganic particles X and inorganic particles Y used in the preparation of the inorganic particle dispersion and the inorganic particle dispersion finally obtained are preferably in a colloidal state. As the dispersion medium, water or a volatile organic solvent can be used.
另外,在上述[工序1]~[工序10]的工序和制备无机微粒分散液的其它任意的工序中,在无机微粒X的分散液、无机微粒Y的分散液或无机微粒X的分散液和无机微粒Y的分散液这两者为胶态氧化铝的情况下,为了使带正电的氧化铝粒子稳定,优选在胶态氧化铝中添加氯离子、硫酸根离子、乙酸根离子等阴离子作为抗衡阴离子。对胶态氧化铝的pH没有特别限制,从无机微粒分散液的稳定性的观点考虑,优选pH为2~6。In addition, in the above-mentioned steps [Step 1] to [Step 10] and any other steps for preparing the inorganic fine particle dispersion, when the dispersion of inorganic fine particles X, the dispersion of inorganic fine particles Y, or both the dispersion of inorganic fine particles X and the dispersion of inorganic fine particles Y are colloidal alumina, in order to stabilize the positively charged alumina particles, it is preferred to add anions such as chloride ions, sulfate ions, acetate ions, etc. to the colloidal alumina as counter anions. The pH of the colloidal alumina is not particularly limited, but from the viewpoint of the stability of the inorganic fine particle dispersion, the pH is preferably 2 to 6.
另外,在上述[工序1]~[工序10]的工序和制备无机微粒分散液的其它任意的工序中,在无机微粒X和无机微粒Y中的至少一者为氧化铝且无机微粒X或无机微粒Y的分散液或无机微粒分散液为胶体状态的情况下,优选在该分散液中添加氯离子、硫酸根离子、乙酸根离子等阴离子。In addition, in the above-mentioned steps [Step 1] to [Step 10] and any other steps for preparing the inorganic particle dispersion, when at least one of the inorganic particles X and the inorganic particles Y is aluminum oxide and the dispersion of the inorganic particles X or the inorganic particles Y or the inorganic particle dispersion is in a colloidal state, it is preferred to add anions such as chloride ions, sulfate ions, acetate ions, etc. to the dispersion.
另外,在上述[工序1]~[工序10]的工序和制备无机微粒分散液的其它任意的工序中,在无机微粒X的分散液、无机微粒Y的分散液或无机微粒X的分散液和无机微粒Y的分散液这两者为胶态二氧化硅的分散液的情况下,为了使带负电的二氧化硅粒子稳定,优选在胶态二氧化硅中添加铵离子、碱金属离子、碱土金属离子等阳离子作为抗衡阳离子。对胶态二氧化硅的pH没有特别限制。In addition, in the above-mentioned steps [Step 1] to [Step 10] and any other steps for preparing the inorganic fine particle dispersion, when the dispersion of inorganic fine particles X, the dispersion of inorganic fine particles Y, or both the dispersion of inorganic fine particles X and the dispersion of inorganic fine particles Y are dispersions of colloidal silica, in order to stabilize the negatively charged silica particles, cations such as ammonium ions, alkali metal ions, and alkaline earth metal ions are preferably added to the colloidal silica as counter cations. The pH of the colloidal silica is not particularly limited.
此外,在上述[工序1]~[工序10]的工序和制备无机微粒分散液的其它任意的工序中,在无机微粒X和无机微粒Y中的至少一者为二氧化硅且无机微粒X或无机微粒Y的分散液或无机微粒分散液为胶体状态的情况下,优选在该分散液中添加铵离子、碱金属离子、碱土金属离子等阳离子。In addition, in the above-mentioned steps [Step 1] to [Step 10] and any other steps for preparing the inorganic particle dispersion, when at least one of the inorganic particles X and the inorganic particles Y is silicon dioxide and the dispersion of the inorganic particles X or the inorganic particles Y or the inorganic particle dispersion is in a colloidal state, it is preferred to add cations such as ammonium ions, alkali metal ions, and alkaline earth metal ions to the dispersion.
作为在无机微粒分散液含有成分C的情况下的优选的一个方式,从长期稳定地保存管理涂布剂的观点考虑,可以列举如下方法:预先将无机微粒分散液分为下述A剂和B剂而制备,在即将涂覆之前将A剂和B剂混合,从而制备无机微粒分散液。As a preferred method when the inorganic particle dispersion contains component C, from the perspective of long-term stable storage and management of the coating agent, the following method can be listed: the inorganic particle dispersion is prepared in advance by dividing the inorganic particle dispersion into the following agent A and agent B, and the agent A and agent B are mixed immediately before coating to prepare the inorganic particle dispersion.
[A剂]:含有无机微粒和水,可以适当地含有液体分散介质A、液体分散介质B、表面活性剂和其它成分。[Agent A]: contains inorganic fine particles and water, and may appropriately contain liquid dispersion medium A, liquid dispersion medium B, a surfactant, and other components.
[B剂]:含有成分C,可以适当地含有液体分散介质A、液体分散介质B、水、表面活性剂和其它成分。[Agent B]: contains component C, and may appropriately contain liquid dispersion medium A, liquid dispersion medium B, water, a surfactant, and other components.
上述A剂含有无机微粒和水,可以适当地含有液体分散介质A、液体分散介质B、表面活性剂和其它成分。The agent A contains inorganic fine particles and water, and may contain a liquid dispersion medium A, a liquid dispersion medium B, a surfactant, and other components as appropriate.
在将A剂的总重量设为100质量%时,A剂中所含的无机微粒的含有率优选为0.2质量%以上且30重量%以下,更优选为0.3质量%以上且20重量%以下,进一步优选为0.5质量%以上且15重量%以下。When the total weight of Agent A is 100 mass %, the content of inorganic fine particles contained in Agent A is preferably 0.2 mass % to 30 mass %, more preferably 0.3 mass % to 20 mass %, and further preferably 0.5 mass % to 15 mass %.
在将A剂的总重量设为100质量%时,作为A剂中所含的水的含有率的下限,优选包含1质量%以上的水,进一步优选包含5质量%以上的水,进一步优选包含10质量%以上的水,进一步优选包含15质量%以上的水。When the total weight of Agent A is set to 100% by mass, as the lower limit of the water content contained in Agent A, it is preferably that it contains more than 1% by mass of water, more preferably that it contains more than 5% by mass of water, more preferably that it contains more than 10% by mass of water, and more preferably that it contains more than 15% by mass of water.
另外,作为A剂中所含的水的含有率的上限,优选包含90质量%以下的水,进一步优选包含80质量%以下的水,进一步优选包含60质量%以下的水,进一步优选包含50质量%以下的水,进一步优选包含40质量%以下的水,进一步优选包含30质量%以下的水。In addition, as the upper limit of the water content contained in Agent A, it is preferably 90% by mass or less of water, more preferably 80% by mass or less of water, more preferably 60% by mass or less of water, more preferably 50% by mass or less of water, more preferably 40% by mass or less of water, and more preferably 30% by mass or less of water.
上述B剂含有成分C,可以适当地含有液体分散介质A、液体分散介质B、水、表面活性剂和其它成分。关于B剂,也可以直接仅使用成分C作为B剂。另外,B剂可以为含有成分C并且适当地还含有液体分散介质A、液体分散介质B、水、表面活性剂和其它成分的组合物。The above-mentioned agent B contains component C and may contain liquid dispersion medium A, liquid dispersion medium B, water, a surfactant, and other components as appropriate. Regarding agent B, only component C may be used as agent B. In addition, agent B may be a composition containing component C and, as appropriate, further containing liquid dispersion medium A, liquid dispersion medium B, water, a surfactant, and other components.
B剂中所含的水的含有率优选小,在将B剂的总重量设为100质量%时,B剂中所含的水的含有率优选为5重量%以下,更优选为3重量%以下,更优选为1重量%以下,特别优选为0.8重量%以下。The water content in Agent B is preferably small. When the total weight of Agent B is set to 100% by weight, the water content in Agent B is preferably 5% by weight or less, more preferably 3% by weight or less, more preferably 1% by weight or less, and particularly preferably 0.8% by weight or less.
在B剂为如上所述的组合物的情况下,在将B剂的总重量设为100质量%时,成分C的含有率为0.002质量%~99.9质量%,更优选为0.5质量%~95质量%,更优选为1质量%~60质量%,更优选为3质量%~40质量%,更优选为3质量%~20质量%,更优选为3质量%~15质量%。When agent B is a composition as described above, when the total weight of agent B is set to 100 mass%, the content of component C is 0.002 mass% to 99.9 mass%, more preferably 0.5 mass% to 95 mass%, more preferably 1 mass% to 60 mass%, more preferably 3 mass% to 40 mass%, more preferably 3 mass% to 20 mass%, and more preferably 3 mass% to 15 mass%.
[层叠体的制造方法][Method for producing laminated body]
通过包含将无机微粒分散液涂布在基材上的工序(涂布工序)和接着通过适当的方法将液体分散介质从涂布在基材上的无机微粒分散液中除去而在基材上形成无机微粒层(以下,有时记载为“涂膜”)的工序(分散介质除去工序)的方法,能够得到包含基材和无机微粒层的层叠体。A laminate comprising a substrate and an inorganic particle layer can be obtained by a method comprising the steps of coating an inorganic particle dispersion on a substrate (coating step) and then removing a liquid dispersion medium from the inorganic particle dispersion coated on the substrate by an appropriate method to form an inorganic particle layer (hereinafter sometimes described as a "coating film") on the substrate (dispersion medium removal step).
<涂布在基材上的方法><Method of coating on substrate>
对将无机微粒分散液涂布在基材上的方法没有特别限制,例如可以列举:凹版涂布法、逆向涂布法、刷毛辊涂布法、喷涂法、辊舐涂布法、口模式涂布法、浸渍法、刮棒涂布法等。There is no particular limitation on the method for coating the inorganic fine particle dispersion on the substrate, and examples thereof include gravure coating, reverse coating, brush roller coating, spray coating, lick roller coating, die coating, dipping, and bar coating.
作为基材,可以列举塑料膜或片、玻璃板。作为塑料膜或片的具体例子,可以列举:聚对苯二甲酸乙二醇酯、聚乙烯、聚丙烯、玻璃纸、三乙酰纤维素、二乙酰纤维素、乙酰纤维素丁酸酯、聚甲基丙烯酸甲酯、聚碳酸酯、聚苯乙烯、MS树脂、SAN树脂、有机硅树脂等的膜或片。从透明性优异且无光学各向异性的观点考虑,优选包含三乙酰纤维素、聚对苯二甲酸乙二醇酯的膜或片、玻璃板。另外,也能够使用偏振板、扩散板、导光板、增亮膜、反射偏振板等光学用构件作为基材。基材可以具有包含紫外线固化性树脂等的硬涂层、含有导电性微粒等的防静电层作为表面层。As the substrate, plastic films or sheets, glass plates can be cited. As specific examples of plastic films or sheets, films or sheets of polyethylene terephthalate, polyethylene, polypropylene, cellophane, triacetyl cellulose, diacetyl cellulose, acetyl cellulose butyrate, polymethyl methacrylate, polycarbonate, polystyrene, MS resin, SAN resin, silicone resin, etc. can be cited. From the viewpoint of excellent transparency and no optical anisotropy, it is preferred to include films or sheets of triacetyl cellulose and polyethylene terephthalate, and glass plates. In addition, optical components such as polarizing plates, diffusion plates, light guide plates, brightness enhancement films, and reflective polarizing plates can also be used as substrates. The substrate can have a hard coating layer including ultraviolet curable resins, etc., and an antistatic layer containing conductive particles, etc. as a surface layer.
在玻璃为基材的情况下,对能够使用的玻璃的组成、制造方法等没有特别限制。能够使用钠玻璃、水晶玻璃、硼硅酸盐玻璃、石英玻璃、铝硅酸盐玻璃、硼酸盐玻璃、磷酸盐玻璃、无碱玻璃、与陶瓷的复合玻璃等。When glass is used as the substrate, there are no particular restrictions on the composition and manufacturing method of the glass that can be used. Soda glass, crystal glass, borosilicate glass, quartz glass, aluminosilicate glass, borate glass, phosphate glass, alkali-free glass, composite glass with ceramics, etc. can be used.
在将无机微粒分散液涂布到基材上之前,可以对基材的表面进行电晕处理、臭氧处理、等离子体处理、火焰处理、电子射线处理、锚固涂布处理、清洗处理等预处理。Before applying the inorganic fine particle dispersion onto the substrate, the surface of the substrate may be subjected to pretreatment such as corona treatment, ozone treatment, plasma treatment, flame treatment, electron beam treatment, anchor coating treatment, cleaning treatment, etc.
<除去液体分散介质的方法><Method for removing liquid dispersion medium>
通过从涂布在基材表面上的无机微粒分散液中除去液体分散介质(分散介质除去工序),能够在基材表面上形成无机微粒层。液体分散介质的除去例如能够在室温下自然干燥后通过常压或减压下的加热而进行。The inorganic particle layer can be formed on the surface of the substrate by removing the liquid dispersion medium from the inorganic particle dispersion applied on the surface of the substrate (dispersion medium removal step). The removal of the liquid dispersion medium can be performed, for example, by natural drying at room temperature and then heating under normal pressure or reduced pressure.
除去液体分散介质时的压力、加热温度能够根据所使用的材料(即,无机微粒X、无机微粒Y和液体分散介质)适当选择。例如,能够通常在50℃以上且120℃以下、优选在约60℃以上且约110℃以下的温度下进行干燥。在一个方式中,能够在50℃以上且80℃以下的温度下进行干燥,在一个方式中,能够在20℃以上且50℃以下的温度下进行干燥。The pressure and heating temperature when removing the liquid dispersion medium can be appropriately selected according to the materials used (i.e., inorganic particles X, inorganic particles Y and liquid dispersion medium). For example, it can be dried usually at a temperature of 50°C or more and 120°C or less, preferably at a temperature of about 60°C or more and about 110°C or less. In one embodiment, it can be dried at a temperature of 50°C or more and 80°C or less, and in one embodiment, it can be dried at a temperature of 20°C or more and 50°C or less.
在通过上述干燥而除去液体分散介质之后,可以进一步对在表面上形成有无机微粒层的基材进行热处理,从而提高基材与无机微粒层的粘附性(热处理工序)。对热处理方法没有特别限制。可以列举利用烘箱的加热、利用电磁波照射等的无机微粒层的局部加热等。After the liquid dispersion medium is removed by the above-mentioned drying, the substrate having the inorganic particle layer formed on the surface may be further subjected to heat treatment to improve the adhesion between the substrate and the inorganic particle layer (heat treatment step). There is no particular limitation on the heat treatment method. Examples include heating in an oven, local heating of the inorganic particle layer by electromagnetic wave irradiation, etc.
在上述干燥后进一步进行热处理的情况下(热处理工序),对其加热温度、气氛和加热时间没有特别限制。热处理温度优选为500℃以上且800℃以下。When heat treatment is further performed after the drying (heat treatment step), the heating temperature, atmosphere and heating time are not particularly limited. The heat treatment temperature is preferably 500° C. or higher and 800° C. or lower.
加热时的气氛优选为空气。加热时间优选为10分钟以下。The atmosphere during heating is preferably air, and the heating time is preferably 10 minutes or less.
在本发明的无机微粒分散液的一个实施方式中,无机微粒分散液的涂覆可以在该玻璃基材的制造中的淬火工序之前对玻璃基材进行,并对涂覆有无机微粒分散液的玻璃基材直接进行淬火。In one embodiment of the inorganic fine particle dispersion of the present invention, the inorganic fine particle dispersion may be applied to the glass substrate before the quenching step in the manufacture of the glass substrate, and the glass substrate coated with the inorganic fine particle dispersion may be directly quenched.
[层叠体][Laminated body]
在一个方式中,通过上述方法得到的包含基材和无机微粒层的层叠体的无机微粒层具有减反射功能。对无机微粒层的厚度没有特别限制。在一个方式中,无机微粒层的厚度为40nm以上且300nm以下,在另一方式中,无机微粒层的厚度为50nm以上且240nm以下,在又一方式中,无机微粒层的厚度为50nm以上且220nm以下,在又一方式中,无机微粒层的厚度为80nm以上为200nm以下,在另一方式中,无机微粒层的厚度为50nm以上且150nm以下,在另一方式中,无机微粒层的厚度为80nm以上且130nm以下。In one embodiment, the inorganic particle layer of the laminated body including the substrate and the inorganic particle layer obtained by the above method has an anti-reflection function. The thickness of the inorganic particle layer is not particularly limited. In one embodiment, the thickness of the inorganic particle layer is more than 40nm and less than 300nm, in another embodiment, the thickness of the inorganic particle layer is more than 50nm and less than 240nm, in another embodiment, the thickness of the inorganic particle layer is more than 50nm and less than 220nm, in another embodiment, the thickness of the inorganic particle layer is more than 80nm and less than 200nm, in another embodiment, the thickness of the inorganic particle layer is more than 50nm and less than 150nm, in another embodiment, the thickness of the inorganic particle layer is more than 80nm and less than 130nm.
无机微粒层的厚度优选为50nm以上且240nm以下,更优选为50nm以上且220nm以下,进一步优选为80nm以上且200nm以下。无机微粒层的厚度能够通过改变无机微粒分散液中的无机微粒X和无机微粒Y的量以及无机微粒分散液的涂布量而进行调节。The thickness of the inorganic particle layer is preferably 50 nm or more and 240 nm or less, more preferably 50 nm or more and 220 nm or less, and further preferably 80 nm or more and 200 nm or less. The thickness of the inorganic particle layer can be adjusted by changing the amount of the inorganic particle X and the inorganic particle Y in the inorganic particle dispersion and the coating amount of the inorganic particle dispersion.
在通过涂布无机微粒分散液而形成的无机微粒层上可以进一步形成包含含氟化合物等的防污层。作为防污层的形成方法,可以列举浸涂法。On the inorganic fine particle layer formed by coating the inorganic fine particle dispersion, an antifouling layer containing a fluorine-containing compound or the like may be further formed. As a method for forming the antifouling layer, a dip coating method may be mentioned.
以下,通过实施例和比较例对本发明更详细地说明,但是本发明不限于实施例。Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to the Examples.
所使用的主要材料如下所述。The main materials used are described below.
[基材][Base material]
载玻片(亚速旺株式会社制造;钠钙玻璃;透射率:89%;宽度26mm、长度76mm、厚度1.3mm)。将所述透射率为89%的载玻片称为基材-1。Slide glass (manufactured by Azowan Co., Ltd.; soda-lime glass; transmittance: 89%; width 26 mm, length 76 mm, thickness 1.3 mm) The slide glass having a transmittance of 89% is referred to as substrate-1.
载玻片(透射率:88.6%;宽度26mm、长度76mm、厚度1.3mm)。将所述透射率为88.6%的载玻片称为基材-2。Slide glass (transmittance: 88.6%; width 26 mm, length 76 mm, thickness 1.3 mm) The slide glass having a transmittance of 88.6% is referred to as substrate-2.
作为基材使用的载玻片的上述透过率的值通过在下述实施例的[透过率]一项中记载的方法测定。The transmittance value of the slide glass used as the substrate is measured by the method described in the section [Transmittance] of the following Examples.
[无机微粒][Inorganic particles]
使用以下的分散液作为无机微粒。The following dispersion liquid was used as the inorganic fine particles.
粒-1(无机微粒Y):Snowtex(注册商标)ST-OUP(日产化学工业株式会社制造;3个以上的粒径为5nm以上且20nm以下的粒子以链状连接而成的胶态二氧化硅微粒子链的水分散液;利用动态光散射法得到的平均粒径为40nm以上且300nm以下;固体成分浓度为15重量%)Particle-1 (inorganic fine particles Y): Snowtex (registered trademark) ST-OUP (manufactured by Nissan Chemical Industries, Ltd.; an aqueous dispersion of colloidal silica fine particle chains formed by three or more particles having a particle size of 5 nm or more and 20 nm or less connected in a chain; an average particle size of 40 nm or more and 300 nm or less as determined by a dynamic light scattering method; a solid content concentration of 15% by weight)
粒-2(无机微粒X):Snowtex(注册商标)ST-OXS(日产化学工业株式会社制造;胶态二氧化硅的水分散液;平均粒径为4nm以上且6nm以下;固体成分浓度为10重量%)Particle-2 (inorganic fine particles X): Snowtex (registered trademark) ST-OXS (manufactured by Nissan Chemical Industries, Ltd.; aqueous dispersion of colloidal silica; average particle size of 4 nm to 6 nm; solid content concentration of 10 wt%)
需要说明的是,表1-1、表1-2、表1-3中的无机微粒的添加量的数值为在将组合物总量(分散液总量)设为100质量%时的固体成分浓度的添加量。The numerical values of the addition amounts of the inorganic fine particles in Table 1-1, Table 1-2, and Table 1-3 are the addition amounts at the solid content concentration when the total amount of the composition (total amount of the dispersion) is 100% by mass.
[液体分散介质A][Liquid dispersion medium A]
作为液体分散介质A,使用以下的物质。As the liquid dispersion medium A, the following was used.
液A-1:乙酸2-甲氧基乙酯(沸点143℃)Liquid A-1: 2-methoxyethyl acetate (boiling point 143°C)
液A-2:4-甲基-2-戊酮(沸点116℃)Liquid A-2: 4-methyl-2-pentanone (boiling point 116°C)
液A-3:1-甲氧基-2-丙醇(沸点120℃)Liquid A-3: 1-methoxy-2-propanol (boiling point 120°C)
液A-4:4-乙基吗啉(沸点139℃)Liquid A-4: 4-ethylmorpholine (boiling point 139°C)
液A-5:乙酸异戊酯(沸点141℃)Liquid A-5: Isoamyl acetate (boiling point 141°C)
液A-6:丙二醇1-单甲醚2-乙酸酯(沸点146℃)Liquid A-6: Propylene glycol 1-monomethyl ether 2-acetate (boiling point 146°C)
液A-7:1-丙氧基-2-丙醇(沸点149℃)Liquid A-7: 1-propoxy-2-propanol (boiling point 149°C)
液A-8:N,N-二甲基甲酰胺(沸点153℃)Liquid A-8: N,N-dimethylformamide (boiling point 153°C)
液A-9:乙酸2-乙氧基乙酯(沸点156℃)Liquid A-9: 2-ethoxyethyl acetate (boiling point 156°C)
液A-10:二甲基亚砜(沸点189℃)Liquid A-10: dimethyl sulfoxide (boiling point 189°C)
液A-11:γ-丁内酯(沸点204℃)(比较例)Liquid A-11: γ-butyrolactone (boiling point 204°C) (Comparative Example)
液A-12:碳酸亚乙酯(沸点244℃)(比较例)Liquid A-12: Ethylene carbonate (boiling point 244°C) (Comparative Example)
液A-13:1,6-二乙酰氧基己烷(沸点260℃)(比较例)Liquid A-13: 1,6-diacetoxyhexane (boiling point 260°C) (Comparative Example)
液A-14:二丙二醇二甲醚(沸点175℃)Liquid A-14: dipropylene glycol dimethyl ether (boiling point 175°C)
液A-15:四氢糠醇(沸点176℃)Liquid A-15: Tetrahydrofurfuryl alcohol (boiling point 176°C)
液A-16:3-甲氧基-3-甲基丁醇(沸点174℃)Liquid A-16: 3-methoxy-3-methylbutanol (boiling point 174°C)
液A-17:3-甲氧基-1-丁醇(沸点158℃)Liquid A-17: 3-methoxy-1-butanol (boiling point 158°C)
液A-18:1-丁醇(沸点118℃)Liquid A-18: 1-butanol (boiling point 118°C)
[液体分散介质B][Liquid dispersion medium B]
液B-1:乙醇(沸点78℃)Liquid B-1: Ethanol (boiling point 78°C)
液B-2:异丙醇(沸点82℃)Liquid B-2: Isopropyl alcohol (boiling point 82°C)
[成分C、表面活性剂和其它成分等][Ingredient C, surfactant and other ingredients, etc.]
成分-1:BYK(注册商标)-349(毕克化学日本株式会社制造;聚醚改性硅氧烷)Component-1: BYK (registered trademark)-349 (manufactured by BYK Chemical Japan Co., Ltd.; polyether-modified siloxane)
成分-2:多个Si-O-Si键三维地连接的烷氧基硅烷缩合物的分散液(烷氧基硅烷缩合物的峰顶分子量为700;分散液中的烷氧基硅烷缩合物的含量为2重量%;烷氧基硅烷缩合物的末端中的多于半数的末端为羟基;包含丙烯酸类-氨基甲酸酯树脂作为添加剂)。以下,有时将成-2中的烷氧基硅烷缩合物称为“成分C-3”。Component-2: a dispersion of an alkoxysilane condensate in which a plurality of Si-O-Si bonds are three-dimensionally connected (the peak molecular weight of the alkoxysilane condensate is 700; the content of the alkoxysilane condensate in the dispersion is 2% by weight; more than half of the terminals of the alkoxysilane condensate are hydroxyl groups; an acrylic-urethane resin is contained as an additive). Hereinafter, the alkoxysilane condensate in Component-2 may be referred to as "Component C-3".
成分-3:Silquest(注册商标)A-187J(迈图高新材料日本有限责任公司制造;γ-环氧丙氧基丙基三甲氧基硅烷)Ingredient-3: Silquest (registered trademark) A-187J (manufactured by Momentive Advanced Materials Japan Co., Ltd.; γ-glycidoxypropyltrimethoxysilane)
成分-4:MKC Silicate(注册商标)MS56S(三菱化学株式会社制造;聚甲氧基硅氧烷)Ingredient-4: MKC Silicate (registered trademark) MS56S (manufactured by Mitsubishi Chemical Corporation; polymethoxysiloxane)
实施例和比较例中的包含玻璃基材和无机微粒层的层叠体通过如下所述的方法制作。The laminated bodies including the glass substrate and the inorganic fine particle layer in the examples and comparative examples were produced by the following method.
实施例1~29和比较例1~8Examples 1 to 29 and Comparative Examples 1 to 8
以成为表1-1、表1-2、表1-3中记载的成分比率的方式对无机微粒、液体分散介质A、液体分散介质B、水以及成分C、表面活性剂和其它成分等的混合物进行搅拌,从而制备了无机微粒分散液。接着,准备了利用掩蔽胶带对上述基材的单面侧进行了掩蔽处理的基材。在此,使用基材-1作为基材。The inorganic particle dispersion liquid was prepared by stirring a mixture of inorganic particles, liquid dispersion medium A, liquid dispersion medium B, water, component C, surfactant, and other components in a manner that the component ratios described in Table 1-1, Table 1-2, and Table 1-3 were obtained. Next, a substrate was prepared in which one side of the substrate was masked using a masking tape. Here, substrate-1 was used as the substrate.
使用微速浸渍涂布机MD-0408-01(SDI株式会社制造),对于上述进行了掩蔽处理的基材,将所制备的无机微粒分散液涂布在该基材的未进行掩蔽处理的面一侧。在涂布之后,将掩蔽胶带从基材上除去,在室温下自然干燥。对于所得到的基材,使用烘箱进行在空气下/100℃/3分钟的加热处理,然后使用马弗炉进行在空气下/700℃/2分钟的加热处理,由此在基材上形成无机微粒层,从而得到了包含基材和无机微粒层的层叠体。Using a micro-speed dip coater MD-0408-01 (manufactured by SDI Co., Ltd.), for the above-mentioned substrate subjected to masking treatment, the prepared inorganic particle dispersion is applied to the side of the substrate that is not subjected to masking treatment. After coating, the masking tape is removed from the substrate and dried naturally at room temperature. For the obtained substrate, an oven is used to perform a heat treatment at 100°C/3 minutes in air, and then a muffle furnace is used to perform a heat treatment at 700°C/2 minutes in air, thereby forming an inorganic particle layer on the substrate, thereby obtaining a laminate comprising a substrate and an inorganic particle layer.
实施例30~32Embodiments 30 to 32
以成为表1-4中记载的成分比率的方式对包含无机微粒、液体分散介质A、液体分散介质B和成分-1的混合物进行搅拌,然后添加成分-4并进行搅拌,由此制备了无机微粒分散液。而且,准备了利用掩蔽胶带对上述基材的单面侧进行了掩蔽处理的基材。在此,使用基材-2作为基材。The mixture containing inorganic particles, liquid dispersion medium A, liquid dispersion medium B and component-1 was stirred in a manner to form the component ratios described in Tables 1-4, and then component-4 was added and stirred, thereby preparing an inorganic particle dispersion liquid. In addition, a substrate having a single-sided side of the substrate masked by a masking tape was prepared. Here, substrate-2 was used as the substrate.
使用微速浸渍涂布机MD-0408-01(SDI株式会社制造),对于上述进行了掩蔽处理的基材,将所制备的无机微粒分散液立即涂布在该基材的未进行掩蔽处理的面一侧。在涂布后,将掩蔽胶带从基材上除去,在室温下自然干燥。对于所得到的基材,使用烘箱进行在空气下/100℃/3分钟的加热处理,然后使用马弗炉进行在空气下/700℃/2分钟的加热处理,由此在基材上形成无机微粒层,从而得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。Using a slow dip coater MD-0408-01 (manufactured by SDI Co., Ltd.), for the above-mentioned substrate subjected to masking treatment, the prepared inorganic particle dispersion is immediately applied to the side of the substrate that is not subjected to masking treatment. After coating, the masking tape is removed from the substrate and dried naturally at room temperature. For the obtained substrate, an oven is used to heat the substrate at 100°C for 3 minutes in air, and then a muffle furnace is used to heat the substrate at 700°C for 2 minutes in air, thereby forming an inorganic particle layer on the substrate, thereby obtaining a laminate comprising a substrate and an inorganic particle layer. The results are summarized and shown in Table 1-4.
实施例33Embodiment 33
以如下方式实施了无机微粒分散液(100.0质量%)的制备。以(无机微粒Y的质量)/[(无机微粒X的质量)+(无机微粒Y的质量)]的值为0.75且二氧化硅固体成分为2.59质量%的方式制备了包含粒-1和粒-2的混合物。对所得到的包含粒-1和粒-2的混合物、液体分散介质A(1.30质量%)、液体分散介质B(71.19质量%)和成分-1(0.25质量%)进行搅拌。接着,将成分-4(0.39质量%)与液体分散介质B(7.48质量%)的混合物添加到所得到的搅拌物中并进行搅拌,由此制备了无机微粒分散液(100.0质量%)。使用所得到的无机微粒分散液,通过与实施例30同样的方法得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。The preparation of inorganic particle dispersion (100.0 mass %) was implemented as follows. A mixture comprising grain-1 and grain-2 was prepared in a manner where the value of (mass of inorganic particle Y)/[(mass of inorganic particle X)+(mass of inorganic particle Y)] was 0.75 and the silica solid content was 2.59 mass %. The obtained mixture comprising grain-1 and grain-2, liquid dispersion medium A (1.30 mass %), liquid dispersion medium B (71.19 mass %) and component-1 (0.25 mass %) were stirred. Then, a mixture of component-4 (0.39 mass %) and liquid dispersion medium B (7.48 mass %) was added to the obtained agitator and stirred, thereby preparing an inorganic particle dispersion (100.0 mass %). Using the obtained inorganic particle dispersion, a laminate comprising a substrate and an inorganic particle layer was obtained by the same method as Example 30. The results are summarized and shown in Table 1-4.
实施例34Embodiment 34
以如下方式实施了无机微粒分散液(100.0质量%)的制备。以(无机微粒Y的质量)/[(无机微粒X的质量)+(无机微粒Y的质量)]的值为0.75且二氧化硅固体成分为2.59质量%的方式制备了包含粒-1和粒-2的混合物。将所得到的包含粒-1和粒-2的混合物与液体分散介质A(5.18质量%)、液体分散介质B(67.31质量%)和成分-1(0.25质量%)混合并进行搅拌。接着,将成分-4(0.39质量%)与液体分散介质B(7.48质量%)的混合物添加到所得到的搅拌物中并进行搅拌,由此制备了无机微粒分散液(100.0质量%)。使用所得到的无机微粒分散液,通过与实施例30同样的方法得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。The preparation of inorganic particle dispersion (100.0 mass %) was implemented as follows. A mixture comprising grain-1 and grain-2 was prepared in a manner where the value of (mass of inorganic particle Y)/[(mass of inorganic particle X)+(mass of inorganic particle Y)] was 0.75 and the silica solid content was 2.59 mass %. The obtained mixture comprising grain-1 and grain-2 was mixed with liquid dispersion medium A (5.18 mass %), liquid dispersion medium B (67.31 mass %) and component-1 (0.25 mass %) and stirred. Then, a mixture of component-4 (0.39 mass %) and liquid dispersion medium B (7.48 mass %) was added to the obtained agitator and stirred, thereby preparing an inorganic particle dispersion (100.0 mass %). Using the obtained inorganic particle dispersion, a laminate comprising a substrate and an inorganic particle layer was obtained by the same method as Example 30. The results are summarized and shown in Table 1-4.
实施例35Embodiment 35
以如下方式实施了无机微粒分散液(100.0质量%)的制备。以(无机微粒Y的质量)/[(无机微粒X的质量)+(无机微粒Y的质量)]的值为0.75且在将所得到的无机微粒分散液设为100.0质量%时二氧化硅固体成分为2.59质量%的方式称量粒-1和粒-2,并制备了它们的混合物。对所得到的包含粒-1和粒-2的混合物、液体分散介质A(10.35质量%)、液体分散介质B(62.14质量%)和成分-1(0.25质量%)进行搅拌。接着,将包含液体分散介质B(7.48质量%)和成分-4(0.39质量%)的混合物添加到所得到的搅拌物中并进行搅拌,由此制备了无机微粒分散液(100.0质量%)。使用所得到的无机微粒分散液,通过与实施例30同样的方法得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。The preparation of inorganic particle dispersion (100.0 mass %) was implemented as follows. The value of (mass of inorganic particle Y)/[(mass of inorganic particle X)+(mass of inorganic particle Y)] was 0.75 and the silica solid content was 2.59 mass % when the obtained inorganic particle dispersion was set to 100.0 mass %, and the particle-1 and particle-2 were weighed, and their mixture was prepared. The obtained mixture comprising particle-1 and particle-2, liquid dispersion medium A (10.35 mass %), liquid dispersion medium B (62.14 mass %) and component-1 (0.25 mass %) were stirred. Then, the mixture comprising liquid dispersion medium B (7.48 mass %) and component-4 (0.39 mass %) was added to the obtained agitator and stirred, thus preparing inorganic particle dispersion (100.0 mass %). Using the obtained inorganic particle dispersion, the laminated body comprising substrate and inorganic particle layer was obtained by the same method as Example 30. The results are summarized in Tables 1-4.
实施例36Embodiment 36
以成为表1-4中记载的成分比率的方式对包含无机微粒、液体分散介质A、液体分散介质B和成分-1的混合物进行搅拌,接着添加成分-4并进行搅拌,由此制备了无机微粒分散液。使用所得到的无机微粒分散液,通过与实施例30同样的方法得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。The mixture containing inorganic particles, liquid dispersion medium A, liquid dispersion medium B and component-1 was stirred in a manner to become the component ratio recorded in Table 1-4, and then component-4 was added and stirred, thereby preparing an inorganic particle dispersion liquid. Using the obtained inorganic particle dispersion liquid, a laminate containing a substrate and an inorganic particle layer was obtained by the same method as Example 30. The results are summarized and shown in Table 1-4.
实施例37Embodiment 37
以成为表1-4中记载的成分比率的方式对包含无机微粒、液体分散介质A、液体分散介质B和成分-1的混合物进行搅拌,接着添加成分-4并进行搅拌,由此制备了无机微粒分散液。而且,准备了利用掩蔽胶带对上述基材的单面侧进行了掩蔽处理的基材。在此,使用基材-2作为基材。The mixture containing inorganic particles, liquid dispersion medium A, liquid dispersion medium B and component-1 was stirred in a manner to form the component ratios described in Tables 1-4, and then component-4 was added and stirred to prepare an inorganic particle dispersion liquid. In addition, a substrate having a single-sided side of the substrate masked by a masking tape was prepared. Here, substrate-2 was used as the substrate.
使用微速浸渍涂布机MD-0408-01(SDI株式会社制造),对于上述进行了掩蔽处理的基材,将所制备的无机微粒分散液立即涂布在该基材的未进行掩蔽处理的面一侧。在涂布后,将掩蔽胶带从基材上除去,在室温下自然干燥。对于所得到的基材,使用烘箱进行在空气下/100℃/3分钟的加热处理,然后使用马弗炉进行在空气下/700℃/2分钟的加热处理,由此在基材上形成无机微粒层,从而得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。Using a micro-speed dip coater MD-0408-01 (manufactured by SDI Co., Ltd.), for the above-mentioned substrate subjected to masking treatment, the prepared inorganic particle dispersion is immediately applied to the side of the substrate that is not subjected to masking treatment. After coating, the masking tape is removed from the substrate and dried naturally at room temperature. For the obtained substrate, an oven is used to heat the substrate at 100°C for 3 minutes in air, and then a muffle furnace is used to heat the substrate at 700°C for 2 minutes in air, thereby forming an inorganic particle layer on the substrate, thereby obtaining a laminate comprising a substrate and an inorganic particle layer. The results are summarized and shown in Table 1-4.
实施例38Embodiment 38
以如下方式实施了无机微粒分散液(100.0质量%)的制备。以(无机微粒Y的质量)/[(无机微粒X的质量)+(无机微粒Y的质量)]的值为0.75且二氧化硅固体成分为2.59质量%的方式称量粒-1和粒-2,并制备了它们的混合物。将所得到的包含粒-1和粒-2的混合物与液体分散介质A(5.18质量%)、液体分散介质B(67.31质量%)和成分-1(0.25质量%)混合并进行搅拌。将包含液体分散介质B(7.48质量%)和成分-4(0.39质量%)的混合物添加到所得到的搅拌物中并进行搅拌,由此制备了无机微粒分散液(100.0质量%)。使用所得到的无机微粒分散液,通过与实施例30同样的方法得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。The preparation of inorganic particle dispersion (100.0 mass %) was implemented as follows. Grain-1 and grain-2 were weighed in a manner where the value of (mass of inorganic particle Y)/[(mass of inorganic particle X)+(mass of inorganic particle Y)] was 0.75 and the silicon dioxide solid content was 2.59 mass %, and their mixture was prepared. The obtained mixture comprising grain-1 and grain-2 was mixed with liquid dispersion medium A (5.18 mass %), liquid dispersion medium B (67.31 mass %) and component-1 (0.25 mass %) and stirred. A mixture comprising liquid dispersion medium B (7.48 mass %) and component-4 (0.39 mass %) was added to the obtained agitator and stirred, thereby preparing inorganic particle dispersion (100.0 mass %). Using the obtained inorganic particle dispersion, a laminate comprising a substrate and an inorganic particle layer was obtained by the same method as Example 30. The results are summarized and shown in Table 1-4.
实施例39Embodiment 39
以如下方式实施了无机微粒分散液(100.0质量%)的制备。以(无机微粒Y的质量)/[(无机微粒X的质量)+(无机微粒Y的质量)]的值为0.75且二氧化硅固体成分为2.59重量份的方式称量粒-1和粒-2,并制备了它们的混合物。将所得到的包含粒-1和粒-2的混合物与液体分散介质A(5.18质量%)和液体分散介质B(67.55质量%)混合并进行搅拌。将包含液体分散介质B(7.24质量%)、成分-1(0.25质量%)和成分-4(0.39质量%)的混合物添加到所得到的搅拌物中并进行搅拌,由此制备了无机微粒分散液(100.0质量%)。使用所得到的无机微粒分散液,通过与实施例30同样的方法得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。The preparation of inorganic particle dispersion (100.0 mass %) was implemented as follows. Grain-1 and grain-2 were weighed in a manner where the value of (mass of inorganic particle Y)/[(mass of inorganic particle X)+(mass of inorganic particle Y)] was 0.75 and the silicon dioxide solid content was 2.59 parts by weight, and their mixture was prepared. The obtained mixture comprising grain-1 and grain-2 was mixed with liquid dispersion medium A (5.18 mass %) and liquid dispersion medium B (67.55 mass %) and stirred. A mixture comprising liquid dispersion medium B (7.24 mass %), component-1 (0.25 mass %) and component-4 (0.39 mass %) was added to the obtained agitator and stirred, thereby preparing an inorganic particle dispersion (100.0 mass %). Using the obtained inorganic particle dispersion, a laminate comprising a substrate and an inorganic particle layer was obtained by the same method as Example 30. The results are summarized and shown in Table 1-4.
实施例40Embodiment 40
以如下方式实施了无机微粒分散液(100.0质量%)的制备。以(无机微粒Y的质量)/[(无机微粒X的质量)+(无机微粒Y的质量)]的值为0.75且二氧化硅固体成分为2.59质量%的方式称量粒-1和粒-2,并制备了它们的混合物。将所得到的包含粒-1和粒-2的混合物与液体分散介质A(1.43质量%)和液体分散介质B(29.20质量%)混合并进行搅拌。将包含液体分散介质A(3.75质量%)、液体分散介质B(45.59质量%)、成分-1(0.25质量%)和成分-4(0.39质量%)的混合物添加到所得到的搅拌物中并进行搅拌,由此制备了无机微粒分散液(100.0质量%)。使用所得到的无机微粒分散液,通过与实施例30同样的方法得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4中。The preparation of inorganic particle dispersion (100.0 mass %) was implemented as follows. Grain-1 and grain-2 were weighed in a manner such that the value of (mass of inorganic particle Y)/[(mass of inorganic particle X)+(mass of inorganic particle Y)] was 0.75 and the silicon dioxide solid content was 2.59 mass %, and their mixture was prepared. The obtained mixture comprising grain-1 and grain-2 was mixed with liquid dispersion medium A (1.43 mass %) and liquid dispersion medium B (29.20 mass %) and stirred. A mixture comprising liquid dispersion medium A (3.75 mass %), liquid dispersion medium B (45.59 mass %), component-1 (0.25 mass %) and component-4 (0.39 mass %) was added to the obtained agitator and stirred, thereby preparing inorganic particle dispersion (100.0 mass %). Using the obtained inorganic particle dispersion, a laminate comprising a substrate and an inorganic particle layer was obtained by the same method as Example 30. The results are summarized in Tables 1-4.
实施例41~48Embodiments 41 to 48
以成为表1-4和表1-5中记载的成分比率的方式对包含无机微粒、液体分散介质A、液体分散介质B和成分-1的混合物进行搅拌,然后添加成分-4并进行搅拌,由此制备了无机微粒分散液。而且,准备了利用掩蔽胶带对上述基材的单面侧进行了掩蔽处理的基材。在此,使用基材-2作为基材。The mixture containing inorganic particles, liquid dispersion medium A, liquid dispersion medium B and component-1 was stirred in a manner to form the component ratios described in Tables 1-4 and 1-5, and then component-4 was added and stirred to prepare an inorganic particle dispersion liquid. In addition, a substrate having a single-sided side of the substrate masked by a masking tape was prepared. Here, substrate-2 was used as the substrate.
使用微速浸渍涂布机MD-0408-01(SDI株式会社制造),对于上述进行了掩蔽处理的基材,将所制备的无机微粒分散液立即涂布在该基材的未进行掩蔽处理的面一侧。在涂布后,将掩蔽胶带从基材上除去,在室温下自然干燥。对于所得到的基材,使用烘箱进行在空气下/100℃/3分钟的加热处理,然后使用马弗炉进行在空气下/700℃/2分钟的加热处理,由此在基材上形成无机微粒层,从而得到了包含基材和无机微粒层的层叠体。将结果汇总示于表1-4和表1-5中。Using a slow dip coater MD-0408-01 (manufactured by SDI Co., Ltd.), for the above-mentioned substrate subjected to masking treatment, the prepared inorganic particle dispersion is immediately applied to the side of the substrate that is not subjected to masking treatment. After coating, the masking tape is removed from the substrate and dried naturally at room temperature. For the obtained substrate, an oven is used to heat the substrate at 100°C for 3 minutes in air, and then a muffle furnace is used to heat the substrate at 700°C for 2 minutes in air, thereby forming an inorganic particle layer on the substrate, thereby obtaining a laminate comprising a substrate and an inorganic particle layer. The results are summarized and shown in Tables 1-4 and 1-5.
实施例和比较例的评价通过以下方法进行。Evaluations of Examples and Comparative Examples were performed by the following methods.
[光谱透射率][Spectral transmittance]
使用紫外可见近红外分光光度计UV-3150(岛津制作所株式会社制造)测定了包含基材和无机微粒层的层叠体的总透光率。然后,由所得到的总透光率光谱读取波长为380nm以上且1100nm以下的区域中的总透光率的值,并计算出平均值。The total light transmittance of the laminate including the substrate and the inorganic fine particle layer was measured using an ultraviolet-visible-near-infrared spectrophotometer UV-3150 (manufactured by Shimadzu Corporation). Then, the total light transmittance value in the region of wavelengths of 380 nm or more and 1100 nm or less was read from the obtained total light transmittance spectrum, and the average value was calculated.
观测到相对于未涂覆基材,所得到的层叠体的光谱透射率增加。如下式所示定义谱透射率的增加量。The spectral transmittance of the resulting laminate was observed to increase relative to the uncoated substrate. The increase in spectral transmittance is defined as shown below.
[光谱透射率的增加量(%)][Increase in spectral transmittance (%)]
=[层叠体的光谱透射率(%)]-[未涂覆基材的光谱透射率(%)]=[spectral transmittance of the laminate (%)] - [spectral transmittance of the uncoated substrate (%)]
[涂膜强度](涂膜对基材的粘附性)[Coating strength] (Adhesion of the coating to the substrate)
将Cellotape(注册商标)LP-24(米其邦株式会社制造)粘贴在包含基材和无机微粒层的层叠体的存在无机微粒层的面上,并将其剥离。此时,如果Cellotape的胶糊成分转移到存在无机微粒层的面上,则可以说无机微粒层对基材的粘附极强,将在此情况下的评价记载为“◎”。另外,在Cellotape的胶糊成分未转移到存在无机微粒层的面上并且对基材照射光线而未产生无机微粒层特有的反射的情况下,无机微粒转移到Cellotape上,可以说无机微粒层对基材的粘附弱,将在此情况下的评价记载为“×”。此外,在Cellotape的胶糊成分未转移到存在无机微粒层的面上并且产生无机微粒层特有的反射的情况下,无机微粒层与基材粘附,但是可以说粘附不如“◎”的情况强,将在此情况下的评价记载为“〇”。Cellotape (registered trademark) LP-24 (manufactured by Michibon Co., Ltd.) is pasted on the surface of the laminated body including the substrate and the inorganic particle layer where the inorganic particle layer exists, and it is peeled off. At this time, if the adhesive component of Cellotape is transferred to the surface where the inorganic particle layer exists, it can be said that the inorganic particle layer adheres to the substrate very strongly, and the evaluation in this case is recorded as "◎". In addition, in the case where the adhesive component of Cellotape is not transferred to the surface where the inorganic particle layer exists and the substrate is irradiated with light without generating reflection peculiar to the inorganic particle layer, the inorganic particles are transferred to Cellotape, and it can be said that the inorganic particle layer adheres to the substrate weakly, and the evaluation in this case is recorded as "×". In addition, in the case where the adhesive component of Cellotape is not transferred to the surface where the inorganic particle layer exists and generates reflection peculiar to the inorganic particle layer, the inorganic particle layer adheres to the substrate, but it can be said that the adhesion is not as strong as the case of "◎", and the evaluation in this case is recorded as "○".
[无机微粒分散液的保存稳定性][Storage stability of inorganic fine particle dispersion]
在烘箱中在空气下/40℃下将实施例和比较例中的无机微粒分散液保存28天,确认无机微粒分散液的保存稳定性。结果,如果保持液态,则可以说保存稳定性良好,将在此情况下的评价记载为“〇”。另外,如果发生了凝胶化,则可以说保存稳定性不良,将在此情况下的评价记载为“×”。在表1-1、表1-2、表1-3、表1-4和表1-5中记载的实施例1~48(和比较例1~7)中,保存稳定性全部为“〇”。The inorganic particle dispersions in the embodiments and comparative examples were stored in an oven at 40°C in air for 28 days to confirm the storage stability of the inorganic particle dispersions. As a result, if the liquid state is maintained, it can be said that the storage stability is good, and the evaluation in this case is recorded as "0". In addition, if gelation occurs, it can be said that the storage stability is poor, and the evaluation in this case is recorded as "×". In the embodiments 1 to 48 (and comparative examples 1 to 7) described in Tables 1-1, 1-2, 1-3, 1-4, and 1-5, the storage stability is all "0".
[表1-5][Table 1-5]
产业实用性Industrial Applicability
根据本发明,能够提供能够形成具有高透光率和高涂膜强度(涂膜对基材的高粘附性)的涂膜并且具有良好的保存稳定性的无机微粒分散液。According to the present invention, it is possible to provide an inorganic fine particle dispersion which can form a coating film having high light transmittance and high coating film strength (high adhesion of the coating film to a substrate) and has good storage stability.
根据本发明,还能够提供具有高透光率和高涂膜强度(涂膜对基材的高粘附性)的层叠体。此外,本发明的涂膜通过涂膜中所含的二氧化硅上的硅烷醇基,涂膜表面的亲水性高,还兼具与水、雨水一起洗去污垢的防污性能。这些涂膜能够用作减反射膜、防污膜、防雾膜等,能够适当地用于以太阳能电池的保护玻璃的表面(太阳能电池保护玻璃)的减反射膜和防污膜、显示器用减反射膜、农业用薄膜(塑料大棚)的防雾膜等各种各样的膜、薄膜为代表的各种住宅设备机器部件、各种农业部件、各种工业部件、各种建材部件、家电设备的各种部件、各种汽车内饰件和外饰件等用途,在建筑建设产业、运输机械产业、电气电子产业、家庭用品等产业的各领域中具有高产业实用性。According to the present invention, it is also possible to provide a laminate with high light transmittance and high film strength (film to substrate high adhesion). In addition, the film of the present invention is by the silanol group on the silicon dioxide contained in the film, and the hydrophilicity of the film surface is high, and it also has the antifouling performance of washing away dirt with water and rainwater. These films can be used as anti-reflection film, anti-fouling film, anti-fouling film, etc., and can be appropriately used for various films such as anti-reflection film and anti-fouling film, anti-reflection film for display, anti-fog film of agricultural film (plastic greenhouse) on the surface of the protective glass of solar cells, various housing equipment machine parts, various agricultural parts, various industrial parts, various building materials parts, various parts of household appliances, various automotive interior parts and exterior parts, etc., in the fields of industries such as building construction industry, transportation machinery industry, electrical and electronic industry, household goods, there is high industrial practicality.
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CN1877369A (en) * | 2005-04-26 | 2006-12-13 | 住友化学株式会社 | Method for producing an antireflective layered material |
CN111032801A (en) * | 2017-08-31 | 2020-04-17 | 日挥触媒化成株式会社 | Coating composition for forming hard coat layer and optical member |
WO2020241745A1 (en) * | 2019-05-30 | 2020-12-03 | 出光興産株式会社 | Coating liquid, cured film, multilayer body provided with said cured film, lighting component provided with said multilayer body, display, lens, component for solar cells, antireflective film, lighting cover, and lighting device |
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CN1877369A (en) * | 2005-04-26 | 2006-12-13 | 住友化学株式会社 | Method for producing an antireflective layered material |
CN111032801A (en) * | 2017-08-31 | 2020-04-17 | 日挥触媒化成株式会社 | Coating composition for forming hard coat layer and optical member |
WO2020241745A1 (en) * | 2019-05-30 | 2020-12-03 | 出光興産株式会社 | Coating liquid, cured film, multilayer body provided with said cured film, lighting component provided with said multilayer body, display, lens, component for solar cells, antireflective film, lighting cover, and lighting device |
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