CN116802237A - 用于增材制造韧性物体的可辐射固化组合物 - Google Patents
用于增材制造韧性物体的可辐射固化组合物 Download PDFInfo
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- CN116802237A CN116802237A CN202280010695.4A CN202280010695A CN116802237A CN 116802237 A CN116802237 A CN 116802237A CN 202280010695 A CN202280010695 A CN 202280010695A CN 116802237 A CN116802237 A CN 116802237A
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Abstract
本发明公开了一种粘度为4000cp或更低的液体可辐射固化组合物,其包含组分a)20‑60重量%的一种或多种低聚物、预聚物或聚合物,其在主链中含有多个酯键、至少一个或多个氨基甲酸酯基团和至少两个烯属不饱和基团,所述烯属不饱和基团可在自由基、阴离子、亲核试剂或它们的组合存在下与组合物中的其他组分形成聚合物交联网络,组分b)30‑90重量%的一种或多种含有一个烯属不饱和基团的单体,所述烯属不饱和基团能够在自由基、阴离子、亲核试剂或它们的组合存在下与组合物中的其他组分形成聚合物交联网络,组分c)0.01‑10重量%的一种或多种光引发剂,当用光化辐射照射时其能够产生自由基,和组分d)0‑40重量%的一种或多种添加剂,所述添加剂选自填料、颜料、热稳定剂、UV光稳定剂、UV光吸收剂、自由基抑制剂或作为加工助剂的低聚物,所述低聚物不同于组分a)中的低聚物。
Description
本发明涉及适用于增材制造方法以获得具有高韧性(toughness)的三维物体的液体可辐射固化组合物。
A.说明
通过辐射固化方法(即UV照射)逐层凝固(solidification)液体聚合物树脂材料来增材制造三维塑料物体几年来作为vat光聚合已被人们所熟知。通常,用于固化方法的辐射源可以是激光写入(也称为立体光刻或SLA)、数字投影图像(也称为数字光处理或DLP)和/或掩模立体光刻(mSLA或LCD技术)。在这些方法中,通过计算机辅助设计(CAD)软件生成二维横截面切片或图案,随后根据预期物体的预成型二维横截面层,通过液体树脂的原位固化(凝固)实现三维结构的形成。连续的重复过程后,将获得三维结构,即生坯。经过一系列洗涤和后固化(热和UV)过程后,生坯将被转化为具有最终机械和热性能的制品。
在过去,vat光聚合通常与“刚性”和“脆性”零件的生产有关。这种脆性阻碍了vat光聚合材料更广泛的应用,特别是对功能性最终用途部件的应用。随着材料和打印技术的快速发展,目前,vat光聚合技术正朝着直接制造功能性最终用途部件的方向发展。主要挑战之一是用于vat光聚合的高性能材料的可用性有限,这些材料具有高韧性和高耐久性,如综述文章Polymer Chemistry(2016),7,257-286中所述。需要高韧性,以确保坚硬且刚性的3D打印物品也难以断裂(断裂前吸收更多能量)并且相对“柔韧”,类似于ABS、聚碳酸酯或聚丙烯的机械性能。一般来说,韧性的树脂需要中等至高的机械应力才能变形(例如≥30MPa),并且在断裂前可以是柔韧的或以更高的应变变形(例如断裂伸长率≥30%或甚至≥50-80%)。根据综述文章,获得高韧性的方法有几种,即,使用合适的单体,使用添加剂如无机二氧化硅颗粒和橡胶添加剂,设计相分离网络和使用链转移剂来调节网络。
基于这种策略,在以下现有技术参考文献中已经进行了多种尝试,以获得韧性的光聚合物树脂配制物。WO2006107759A2和US7211368B2公开了基于氨基甲酸酯丙烯酸酯低聚物、反应性溶剂、交联剂、抗成核剂的韧性和硬质树脂配制物,以及基于氨基甲酸酯丙烯酸酯低聚物、丙烯酸酯单体和聚合改性剂的韧性树脂配制物。然而,这些树脂仍然相当脆。
US20180194885A1公开了至少一种(甲基)丙烯酸酯单体或低聚物与至少一种单官能的(甲基)丙烯酸酯单体的组合的用途,所述单官能的(甲基)丙烯酸酯单体包含具有稠合或缩合的至少三个环的多环部分(例如包含三环癸基或二环戊二烯基或三环-[3,2,1,0]-癸烷基团),以便在不牺牲断裂伸长率的情况下改善性能。这种树脂的韧性还可以进一步提高。
US10239255B2公开了包含反应性低聚物的自由基可聚合液体的用途,所述反应性低聚物是多官能甲基丙烯酸酯低聚物和多官能丙烯酸酯低聚物与单官能单体的组合。
EP3292157B1公开了使用磺酸酯来调节自由基聚合体系,其导致形成经调节的聚合物网络。这些加成断裂链转移剂(AFCT)、酯活化的乙烯基磺酸酯的加入,能够缩短聚合物链而不抑制聚合过程或损害速度。这提高了韧性,但是打印的材料仍然是易碎的。
在Polymer Chemistry(2016)7,2009-20和Angewandte Chemie Internationaledition(2018)57,9165中已经证明了这种快速形成的经调节的甲基丙烯酸酯网络产生用于vat光聚合的韧性材料。尽管产生了韧性材料,但存在一些与现有技术中提出的方法相关的限制或挑战,例如材料的毒性或延展性不令人满意。仍然非常需要获得韧性材料的替代途径。
因此,本发明的目的是提供一种适用于增材制造应用的液体可辐射固化组合物,其提供增材制造物品的足够程度的韧性,并且其中在固化后可以实现使样品变形的中等至高机械应力,同时仍然保持断裂前以较高应变变形的柔韧性(flexibility)和能力。
本发明的目的是通过一种适用于增材制造方法的液体可辐射固化组合物来实现的,该组合物包含:
组分a)20-60重量%的一种或多种低聚物、预聚物或聚合物,其在主链中含有多个酯键、至少一个氨基甲酸酯基团和至少两个烯属不饱和基团,所述烯属不饱和基团可在自由基、阴离子、亲核试剂或它们的组合存在下与组合物中的其他组分形成聚合物交联网络,
组分b)30-90重量%的一种或多种含有一个烯属不饱和基团的单体,所述烯属不饱和基团能够在自由基、阴离子、亲核试剂或它们的组合存在下与组合物中的其他组分形成聚合物交联网络,
组分c)0.01-10重量%的一种或多种光引发剂,当用光化辐射照射时其能够产生自由基,
组分d)0-40重量%的一种或多种添加剂,所述添加剂选自填料、颜料、热稳定剂、UV光稳定剂、UV光吸收剂、自由基抑制剂或作为加工助剂的低聚物,所述低聚物不同于组分a)中的低聚物,
条件是组分b)不同于形成组分a)的低聚物/预聚物/聚合物的单体,并且所述组合物在25℃下的粘度不大于4000cp。
使用配备有锥板(2°)的旋转流变仪在25℃下测量粘度,并在1Hz剪切速率下获得读数,
组分a)至d)的总和等于100重量%。
根据本发明的液体可辐射固化组合物的粘度优选在25℃下小于3000cp,更优选在25℃下小于2000cp。如上所述,使用配备有锥板(2°)的旋转流变仪测量粘度,并在1Hz剪切速率下获得读数。
术语“烯属不饱和基团”是指乙烯基、烯丙基、衣康酸酯基或(甲基)丙烯酸酯基。
术语“(甲基)丙烯酸酯基团”是指甲基丙烯酸酯基团、丙烯酸酯基团或两者的混合。
根据本发明的可辐射固化液体树脂组合物的组分a)在主链中具有多个酯键、至少一个或多个氨基甲酸乙酯基团和至少两个烯属不饱和基团。
组分a)的低聚物、预聚物或聚合物中的酯键通过脂族或芳族酸或酸酐或它们的混合物与多元醇混合物反应以形成聚酯多元醇而获得。
多元醇混合物优选包含至少一种具有至少三个羟基部分的多元醇,其浓度为脂族或芳族酸或酸酐与多元醇的反应混合物的至少3mol%。
脂族或芳族酸或酸酐优选地选自琥珀酸、己二酸、癸二酸、邻苯二甲酸、对苯二甲酸、间苯二甲酸、偏苯三酸、均苯四甲酸及其酸酐或酯及它们的混合物。其他选择包括四氢邻苯二甲酸、六氢邻苯二甲酸、六氢对苯二甲酸、二氯邻苯二甲酸和四氯邻苯二甲酸、内亚甲基四氢邻苯二甲酸(endomethylene tetrahydrophthalic acid)、戊二酸、1,4-环己烷二羧酸,及其酸酐或酯(如果可以获得的话)。
多元醇混合物优选地选自乙二醇、二甘醇、三甘醇、四甘醇、1,2-丙二醇和1,3-丙二醇、双丙甘醇、聚丙二醇、1,4-丁二醇和2,3-丁二醇、1,6-己二醇、新戊二醇、三羟甲基丙烷、三(β-羟乙基)异氰尿酸酯、季戊四醇、甘露醇和山梨醇。
反应产物产生聚酯-多元醇前体。这种聚酯多元醇前体含有羟基,该羟基与异氰酸酯官能化的(甲基)丙烯酸酯反应,以形成基于聚酯的氨基甲酸酯(甲基)丙烯酸酯低聚物、预聚物或聚合物。在自由基存在下,基于聚酯的氨基甲酸乙酯(甲基)丙烯酸酯形成聚合物共价键,导致网络形成。基于聚酯的氨基甲酸乙酯(甲基)丙烯酸酯低聚物、预聚物或聚合物优选地根据EP1323758B1中描述的方法制备。
与聚酯多元醇前体反应的异氰酸酯官能化的(甲基)丙烯酸酯是二异氰酸酯与具有至少一个烯属不饱和基团的一种羟基官能化物质的反应产物。二异氰酸酯可以是脂族、(环)脂族或环状脂族(cycloaliphatic)结构,优选地选自亚乙基二异氰酸酯、三亚甲基二异氰酸酯、1,6-六亚甲基二异氰酸酯(HMDI)、四亚甲基二异氰酸酯、六亚甲基二异氰酸酯、3,3,5-三甲基-1-异氰酸酯-3-异氰酸酯甲基环己烷(IPDI)、2,2,4-三甲基己烷二异氰酸酯、2,4,4-三甲基六亚甲基二异氰酸酯(TMDI)、降冰片烷二异氰酸酯及它们的混合物。
具有至少一个烯属不饱和基团的羟基官能化的材料选自丙烯酸4-羟丁酯、丙烯酸2-羟乙酯、甲基丙烯酸2-羟乙酯、丙烯酸羟丙酯、甲基丙烯酸羟丙酯、甘油单甲基丙烯酸酯或它们的混合物。
可选地,异氰酸酯官能化的(甲基)丙烯酸酯可以直接选自2-甲基丙烯酰氧基乙基异氰酸酯、2-丙烯酰氧基乙基异氰酸酯、2-(2-甲基丙烯酰氧基乙氧基)乙基异氰酸酯和1,1-(双丙烯酰氧基甲基)乙基异氰酸酯。
优选地,组分a)的重均分子量为4000g/mol-20000g/mol,更优选4000-10000g/mol。
通过凝胶渗透色谱(GPC)测定重均分子量(Mw),使用四氢呋喃(THF)作为洗脱剂,采用PS/DVB(聚苯乙烯二乙烯基苯)柱(尺寸:4.6mm内径(I.D.)×15cm,粒径:3μm)和PS/DVB(聚苯乙烯二乙烯基苯)保护柱(尺寸:4.6mm内径×2cm,粒径:4μm),在温度40℃,流速0.35mL/min下,使用折射率检测器。在THF中样品浓度为5-6 10mg/mL,进样量为20μL。相对于聚苯乙烯标准品计算重均分子量。
最优选地,组分a)是根据EP1323758B1中描述的方法制备的基于聚酯的氨基甲酸酯丙烯酸酯低聚物,其重均分子量为4000-10000g/mol。
组分b):如上所述,根据本发明的可辐射固化的液体树脂组合物包含30-90重量%的一种或多种单体,每种单体含有一个烯属不饱和基团,该基团能够在自由基、阴离子、亲核试剂或它们的组合存在下与组合物中的其他组分形成聚合物交联网络。
优选地,根据本发明的可辐射固化的液体树脂组合物包含40-80重量%的组分b)。
根据本发明的可辐射固化液体树脂组合物的组分b)优选是具有一个(甲基)丙烯酸酯基团的单体。如本文所用,术语(甲基)丙烯酸酯是指丙烯酸或甲基丙烯酸的酯以及丙烯酸或甲基丙烯酸的衍生物的酯。出于参考目的,本文中术语“单体”是指单官能和多官能低分子量(甲基)丙烯酸酯结构。
组分b)中具有至少一个(甲基)丙烯酸酯基团的单体还包含选自C2-C30直链、环状、支链、脂族、芳族、脂环族、环状脂族的烃基。
更优选地,烃基带有选自羟基、羧基、氨基甲酸酯基或脲基的极性官能团。
发现额外的极性官能团具有有利的效果:(i)粘度降低,改善打印加工性,和(ii)链相互作用增强,改善固化制品的韧性。
优选地,组分b)的重均分子量为100-600g/mol,更优选100-400g/mol。
通过凝胶渗透色谱(GPC)测定重均分子量(Mw),使用四氢呋喃(THF)作为洗脱剂,采用PS/DVB(聚苯乙烯二乙烯基苯)柱(尺寸:4.6mm内径×15cm,粒径:3μm)和PS/DVB(聚苯乙烯二乙烯基苯)保护柱(尺寸:4.6mm内径×2cm,粒径:4μm),在温度40℃,流速0.35mL/min下,使用折射率检测器。在THF中样品浓度为5-6 10mg/mL,进样量为20μL。相对于聚苯乙烯标准品计算重均分子量。
最优选地,组分b)选自丙烯酸4-羟丁酯、丙烯酸2-羟乙酯、甲基丙烯酸2-羟乙酯、丙烯酸羟丙酯、甲基丙烯酸羟丙酯、丙烯酸β-羧乙酯、甘油单甲基丙烯酸酯或琥珀酸单-2-(丙烯酰氧基)乙酯、丙烯酸四氢糠基酯、甲基丙烯酸四氢糠基酯、丙烯酸异冰片酯、甲基丙烯酸异冰片酯、环三羟甲基丙烷缩甲醛丙烯酸酯、环三羟甲基丙烷缩甲醛甲基丙烯酸酯、3,3,5-三甲基环己基丙烯酸酯、3,3,5-三甲基环己基甲基丙烯酸酯、4-叔丁基环己基丙烯酸酯、乙氧基化苯基单丙烯酸酯、乙氧基化苯基单甲基丙烯酸酯、丙烯酸2-乙基己酯或丙烯酸2-(2-乙氧基-乙氧基)乙酯、丙烯酸2-[[(丁氨基)羰基]氧基]乙酯、丙烯酸环己酯、甲基丙烯酸环己酯、丙烯酸苯氧乙酯、甲基丙烯酸苯氧乙酯、聚(乙二醇)甲基丙烯酸酯及它们的混合物。
根据本发明的液体可辐射固化树脂组合物中的组分c)是光引发剂,优选为自由基光引发剂。
更优选地,自由基光引发剂是芳族酮型光引发剂或氧化膦型光引发剂。
芳族酮型光引发剂优选地选自1-羟基环己基苯基酮、2-羟基-l-(4-(4-(2-羟基-2-甲基丙酰基)苄基)苯基-2-甲基丙烷-1-酮、2-羟基-2-甲基-l-苯基丙酮、2-羟基-2-甲基-1-(4-异丙基苯基)丙酮、低聚(2-羟基-2-甲基-1-(4-(1-甲基乙烯基)苯基)丙酮、2-羟基-2-甲基-1-(4-十二烷基苯基)丙酮、2-羟基-2-甲基-l-[(2-羟基乙氧基)苯基]丙酮、二苯酮、取代的二苯酮、2,2-二甲氧基-1,2-二苯基乙酮或它们的混合物。
膦型光引发剂优选地选自二苯基(2,4,6-三甲基苯甲酰基)氧化膦(TPO)、苯基双(2,4,6-三甲基苯甲酰基)氧化膦(BAPO)或苯基(2,4,6-三甲基苯甲酰基)次膦酸乙酯(TPO-L)或它们的混合物。
加入到液体可固化配制物中的光引发剂的量为总液体配制物重量的0.01%至10%。当用光化辐射照射时,光引发剂能够产生自由基。优选地,照射所述光引发剂的光化辐射源是汞灯、LED源或甚至是发射波长在230nm至600nm之间的LCD源。
根据本发明的液体、可辐射固化的树脂组合物可以包含一种或多种添加剂,其选自填料、颜料、热稳定剂、UV光稳定剂、UV光吸收剂、自由基抑制剂或作为加工助剂的附加低聚物,所述低聚物不同于组分a)中的低聚物。
填料可以是无机或有机颗粒或两者的混合物。优选地,填料是选自二氧化硅、氧化铝、氧化锆、二氧化钛或它们的混合物的纳米尺寸至微米尺寸的无机颗粒。在填料包括有机颗粒的情况下,这种纳米尺寸至微米尺寸的有机颗粒选自聚(甲基丙烯酸甲酯)、聚乙烯醇、聚(丁酸乙烯酯)、聚酰胺、聚酰亚胺或它们的混合物。
UV光吸收剂优选地选自2-异丙基硫杂蒽酮、1-苯基偶氮-2-萘酚以及荧光增白剂,例如2,5-双-(5-叔丁基-2-苯并噁唑基)噻吩、4,4'-双(2-甲氧基苯乙烯基)-1,1'-联苯。在一些实施方案中,光稳定剂选自2,2,6,6-四甲基-4-哌啶醇;二(2,2,6,6-四甲基-4-哌啶基)癸二酸酯;二(1,2,2,6,6-五甲基-4-哌啶基)癸二酸酯和1,2,2,6,6-五甲基-4-哌啶基癸二酸甲酯;癸二酸、双(2,2,6,6-四甲基-1-(辛氧基)-4-哌啶基)酯;双(1,2,2,6,6-五甲基-4-哌啶基)-[[3,5-双(1,1-二甲基乙基)-4-羟基苯基]甲基]丙二酸丁酯或它们的混合物。
可以加入聚合或自由基抑制剂以及稳定剂来提供另外的热稳定性。合适的自由基抑制剂是甲氧基氢醌(MEHQ)或各种芳基化合物,如丁基化羟基甲苯(BHT)。
在本发明的另一方面,组分d)下的额外低聚物不同于组分a)的低聚物、聚合物或预聚物。选择这些额外的低聚物以提高固化速度或降低液体可辐射固化组合物的粘度,从而增强根据本发明的液体可辐射固化组合物的可加工性。除此之外,额外的低聚物还可以通过例如升高所形成的聚合物交联网络的玻璃化转变温度(Tg)、升高增材制造的三维物体的热变形温度(HDT)和/或增大增材制造的三维物体的抗冲击性能来改善所形成的聚合物网络。
进一步优选的是,根据本发明的液体可辐射固化组合物具有特定的组分a)与组分b)的重量比。组分a)的低聚物/预聚物/聚合物与组分b)的单体的重量比范围为20:80至60:40(组分a)/组分b),前提是液体可辐射固化组合物在25℃下的粘度保持在4000cp以下。
根据本发明的树脂组合物特别适合用于增材制造方法中。这种增材制造方法通常包括沉积或分层(layering),以及辐射所述组合物的重复步骤,以形成三维物体。
辐射可以由UV或DLP光学引擎提供。在本发明的优选实施方案中,固化每层液体可辐射固化组合物所需的总光化辐射剂量大于每层100μm层厚度30mJ/cm2。对于100μm层厚的打印设置,总光化辐射剂量可高达600mJ/cm2。更优选地,如果在100μm层厚度处总光化辐射在30mJ/cm2和120mJ/cm2之间。对于光强度为10mW/cm2的商用DLP 3D打印机,每层30mJ/cm2相当于每层固化的总辐射过程为3秒。当使用其他层厚度打印设置(例如10μm、20μm和50μm)时,固化每层液体可辐射固化组合物所需的总光化辐射剂量必须相应地缩放。
术语“DLP”或“数字光处理”是指一种增材制造方法,其中借助于基于使用数字微镜装置的光学微机电技术的DLP显示装置,通过使用光化照射将液体可辐射固化树脂固化成固体物体来形成三维物体。
使用根据本发明的液体可辐射固化组合物的增材制造方法可包括额外的方法步骤,如清洁、洗涤、超声处理、额外剂量的辐射、加热、抛光、涂覆或它们的组合。
出乎意料地发现,根据本发明的液体、可辐射固化的树脂组合物获得具有中等至高拉伸强度和高断裂伸长率的三维物体。这导致高拉伸韧性(源自根据ASTM D638标准拉伸测试方法测量的应力-应变曲线)。
图1是拉伸强度与断裂伸长率的关系图。曲线下的阴影面积决定了被测样品的拉伸韧性。如图1所示,拉伸韧性是指从拉伸试验机获得的应力-应变曲线下的面积。在完成打印和成功的后固化过程后,树脂组合物的机械性能如极限拉伸强度和断裂伸长率分别在25.0-60.0MPa和30.0%-165.0%的范围内。这种高性能材料特性还与优异的加工性能相结合。这种独特的组合将产生极限拉伸强度和断裂伸长率,这将导致根据ASTM D638标准测试方法测量的拉伸韧性>15J/m3。
因此,本发明还包括通过使用根据本发明的液体可辐射固化组合物的增材制造方法生成的三维物体。使用根据本发明的液体可辐射固化组合物打印的这种三维物体表现出根据ASTM D638测量的至少15J/m3的拉伸韧性。
总的来说,极限拉伸强度、断裂伸长率由应力-应变曲线决定,而拉伸韧性由应力-应变曲线的积分决定。值得注意的是,拉伸韧性高度依赖于拉伸强度和拉伸变形。使用根据本发明的液体可辐射固化组合物打印的三维物体的拉伸韧性可以在15J/m3至100J/m3的范围内。更优选地,在15J/m3至50J/m3之间。最优选地,在15J/m3至35J/m3之间。
在本发明的另一方面,通过使用根据本发明的液体可辐射固化组合物的增材制造方法生成的三维物体表现出各向同性行为。三维物体可以在诸如XY方向、YZ方向、XZ方向、Z方向和其他定制方向的各方向上打印,其中相对于X、Y和Z平面中的任何一个选择角度。根据本发明的这一方面,通过ASTM D638方法确定的物体在XY方向(平行于构建平台(buildplatform))和Z方向(垂直于构建平台)上的拉伸强度、断裂伸长率和拉伸韧性应该彼此相差不超过20%。
实施例
在以下实施例中更详细地说明了本发明的主题,但本发明的主题不受这些实施例的任何限制。
通过在混合设备中混合下表中提到的成分来制备液体可辐射固化树脂组合物。根据EP1323758B1中描述的方法制备在以下实施例中用作组分a)的基于聚酯的氨基甲酸酯丙烯酸酯低聚物(表中称为丙烯酸酯化聚酯低聚物(acrylated polyester oligomer))。这种基于聚酯的氨基甲酸酯丙烯酸酯低聚物的分子量为6300g/mol,丙烯酸酯官能度大于2.5,在40℃下的粘度约为2800cp,在25℃下约为39000cp。
使用配备有锥板(2°)的旋转流变仪测量粘度,并在1Hz剪切速率下获得读数。除非另有说明,粘度是在25℃的温度下测量的。
这样制备的树脂组合物用于通过DLP 3D打印方法产生拉伸样品,光化辐射在每100微米层厚度30mJ/cm2和140mJ/cm2之间。
根据ASTM D638测量的样品的应力-应变曲线下的面积确定拉伸韧性(见图1)。
表1总结了用于单体的缩写。
表2和表3总结了3D打印样品的树脂组合物和性质。
表1.单体的缩写
缩写 | 说明 |
IBoA | 丙烯酸异冰片酯 |
2-HEA | 丙烯酸2-羟乙酯 |
2-HEMA | 甲基丙烯酸2-羟乙酯 |
2-BACOEA | 2-[[(丁氨基)羰基]氧基]丙烯酸乙酯 |
TMCHA | 3,3,5-三甲基环己基丙烯酸酯 |
CTFA | 环三羟甲基丙烷缩甲醛丙烯酸酯 |
A-LEN-10 | 乙氧基化的邻苯基苯酚丙烯酸酯 |
GLYFOMA | 甘油缩甲醛丙烯酸酯 |
BAPO | 苯基双(2,4,6-三甲基苯甲酰基)氧化膦 |
TCDDA | 三环癸烷二甲醇二丙烯酸酯 |
TPGDA | 三丙二醇二丙烯酸酯 |
实施例1
组合物1A、1B、1C、1D和1E是比较例,其中组分a)低于或超过本发明组合物范围的重量%。组合物1F和1G以根据本发明的范围包含组分a),但是组合物b)是两种单体的混合物,一种单体具有一个烯属不饱和基团,一种单体具有两个烯属不饱和基团。
表2.用于3D打印的液体可辐射固化树脂组合物
实施例1A、1B、1C显示了<50cp的低粘度树脂和适印性(printability),然而,这些样品的拉伸韧性低于15J/m3。
实施例1D和1E显示组合物导致47400cp和21600cp的粘度,远远超过25℃下4000cp的粘度。由于实施例1D和1E中给出的组合物不能通过DLP 3D打印机打印,因此不能测量实施例1D和1E的拉伸性能。超过根据本发明的组分a)给出的重量范围会显著影响组合物的拉伸韧性或粘度。
实施例1F和1G证明了根据本发明,使用具有两个烯属不饱和基团而不是仅一个烯属不饱和基团的组分b)的单体的效果。即使配制物也含有具有一个烯属不饱和基团的组分b),加入具有两个烯属不饱和基团的单体导致拉伸韧性低于15J/m3。
实施例2
表3:用于3D打印的液体可辐射固化树脂的组合物
根据本发明的组合物2F、2G、2H、2I、2J和2K均显示出超过15J/m3的拉伸韧性。这些样品的粘度低于4000cp。
实施例3
对于通过使用根据本发明的液体可辐射固化组合物的增材制造方法形成的三维物体,由ASTM D638方法确定的XY方向(平行于构建平台)和Z方向(垂直于构建平台)的拉伸强度、断裂伸长率和拉伸韧性彼此相差不超过20%。
表4.显示各向同性行为的打印的三维物体的组合物
表4中所示的结果描述了使用根据本发明的液体可辐射固化组合物的打印的三维物体的各向同性行为。从表4可以看出,打印的样品在XY方向和Z方向上的拉伸强度、断裂伸长率和拉伸韧性相差都小于20%。
Claims (14)
1.液体可辐射固化组合物,其包含:
组分a)20-60重量%的一种或多种低聚物、预聚物或聚合物,其在主链中含有多个酯键、至少一个氨基甲酸酯基团和至少两个烯属不饱和基团,所述烯属不饱和基团可在自由基、阴离子、亲核试剂或它们的组合存在下与组合物中的其他组分形成聚合物交联网络,
组分b)30-90重量%的一种或多种含有一个烯属不饱和基团的单体,所述烯属不饱和基团能够在自由基、阴离子、亲核试剂或它们的组合存在下与组合物中的其他组分形成聚合物交联网络,
组分c)0.01-10重量%的一种或多种光引发剂,当用光化辐射照射时其能够产生自由基,
组分d)0-40重量%的一种或多种添加剂,所述添加剂选自填料、颜料、热稳定剂、UV光稳定剂、UV光吸收剂、自由基抑制剂或作为加工助剂的低聚物,所述低聚物不同于组分a)中的低聚物,
条件是组分b)不同于形成组分a)的低聚物/预聚物/聚合物的单体,并且所述组合物在25℃下的粘度不大于4000cp。
2.根据权利要求1所述的液体可辐射固化组合物,其特征在于,所述组合物在25℃下的粘度小于3000cp。
3.根据前述权利要求中任一项所述的液体可辐射固化组合物,其特征在于,组分a)的低聚物、预聚物或聚合物中的酯键是通过使脂族或芳族酸或酸酐或它们的混合物与多元醇混合物反应以形成聚酯多元醇而获得的。
4.根据权利要求3所述的液体可辐射固化组合物,其特征在于,所述多元醇混合物包含至少一种具有至少三个羟基部分的多元醇,其浓度为脂族或芳族酸或酸酐与多元醇的反应混合物的至少3mol%。
5.根据权利要求3和4所述的液体可辐射固化组合物,其特征在于,所述脂族或芳族酸或酸酐选自琥珀酸、己二酸、癸二酸、邻苯二甲酸、对苯二甲酸、间苯二甲酸、偏苯三酸、均苯四酸及其酸酐或酯及它们的混合物。
6.根据权利要求3和4所述的液体可辐射固化组合物,其特征在于,所述多元醇混合物选自乙二醇、二甘醇、三甘醇、四甘醇、1,2-丙二醇和1,3-丙二醇、双丙甘醇、聚丙二醇、1,4-丁二醇和2,3-丁二醇、1,6-己二醇、新戊二醇、三羟甲基丙烷、三(β-羟乙基)异氰尿酸酯、季戊四醇、甘露醇和山梨醇。
7.根据权利要求3-6中任一项所述的液体可辐射固化组合物,其特征在于,组分a)是通过使聚酯多元醇与异氰酸酯官能化的(甲基)丙烯酸酯反应以形成基于聚酯的氨基甲酸酯(甲基)丙烯酸酯而获得的。
8.根据前述权利要求中任一项所述的液体可辐射固化组合物,其特征在于,组分b)中的单体的至少一个烯属不饱和基团是(甲基)丙烯酸酯官能团,并且组分b)中的单体还包含选自C2-C30直链、环状、支链、脂族、芳族、脂环族或环状脂族基团的烃基。
9.根据权利要求8所述的液体可辐射固化组合物,其特征在于,组分b)中的一种或多种单体包含带有选自羟基、羧基、氨基甲酸酯基或脲基的极性官能团的烃基。
10.根据权利要求1-9中任一项所述的液体可辐射固化性组合物,其特征在于,组分a)与组分b)的重量比为20:80-60:40。
11.根据权利要求1-10所述的液体可辐射固化组合物在增材制造方法中的用途,所述增材制造方法包括沉积或分层,以及辐射所述组合物的重复步骤,以形成三维物体。
12.根据权利要求11所述的液体可辐射固化组合物的用途,其特征在于,所述增材制造方法包括清洁、洗涤、超声处理、额外剂量的辐射、加热、抛光、涂覆或它们的组合的额外步骤。
13.使用根据权利要求1-10中任一项所述的液体可辐射固化组合物通过增材制造方法形成的三维物体,其特征在于,根据ASTM D638测量,所述三维物体具有至少15J/m3的拉伸韧性。
14.根据权利要求13所述的三维物体,其特征在于,根据ASTM D638测量,所述三维物体在XY方向和Z方向上的拉伸强度和断裂伸长率彼此相差不超过20%。
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CN112105332A (zh) * | 2018-06-29 | 2020-12-18 | 3M创新有限公司 | 包含使用聚碳酸酯二醇制备的聚氨酯甲基丙烯酸酯聚合物的光致聚合型组合物、制品和方法 |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112105332A (zh) * | 2018-06-29 | 2020-12-18 | 3M创新有限公司 | 包含使用聚碳酸酯二醇制备的聚氨酯甲基丙烯酸酯聚合物的光致聚合型组合物、制品和方法 |
WO2020064522A1 (en) * | 2018-09-24 | 2020-04-02 | Basf Se | Photocurable composition for use in 3d printing |
CN111349196A (zh) * | 2018-12-21 | 2020-06-30 | 义获嘉伟瓦登特公司 | 用于通过立体光刻制备具有断裂韧性的牙科部件的组合物 |
Non-Patent Citations (1)
Title |
---|
SHAO GUANGBIN等: "Rapid 3D Printing Magnetically Active Microstructures with High Solid Loading", 《ADVANCED ENGINEERING MATERIALS》, vol. 22, no. 3, 31 March 2020 (2020-03-31), pages 1900911 * |
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