CN116755186A - Anti-reflection anti-dazzle film and preparation method thereof - Google Patents
Anti-reflection anti-dazzle film and preparation method thereof Download PDFInfo
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- CN116755186A CN116755186A CN202310651006.4A CN202310651006A CN116755186A CN 116755186 A CN116755186 A CN 116755186A CN 202310651006 A CN202310651006 A CN 202310651006A CN 116755186 A CN116755186 A CN 116755186A
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- 238000002360 preparation method Methods 0.000 title claims abstract description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 71
- 239000002245 particle Substances 0.000 claims abstract description 68
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 55
- 239000011347 resin Substances 0.000 claims abstract description 55
- 229920005989 resin Polymers 0.000 claims abstract description 55
- 238000012986 modification Methods 0.000 claims abstract description 51
- 230000004048 modification Effects 0.000 claims abstract description 51
- 229920000178 Acrylic resin Polymers 0.000 claims abstract description 49
- 239000011146 organic particle Substances 0.000 claims abstract description 47
- 239000011737 fluorine Substances 0.000 claims abstract description 38
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 38
- 239000010703 silicon Substances 0.000 claims abstract description 38
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 38
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 37
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 36
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 32
- 239000005543 nano-size silicon particle Substances 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 238000000576 coating method Methods 0.000 claims description 62
- 239000011248 coating agent Substances 0.000 claims description 60
- 239000007788 liquid Substances 0.000 claims description 59
- 239000002904 solvent Substances 0.000 claims description 34
- 239000002002 slurry Substances 0.000 claims description 27
- 238000001035 drying Methods 0.000 claims description 19
- 238000002156 mixing Methods 0.000 claims description 18
- 238000000227 grinding Methods 0.000 claims description 14
- 238000007865 diluting Methods 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 7
- 238000000016 photochemical curing Methods 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 4
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 claims description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 16
- 230000000694 effects Effects 0.000 abstract description 10
- 238000002310 reflectometry Methods 0.000 abstract description 6
- 239000000853 adhesive Substances 0.000 abstract description 5
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 106
- 239000010408 film Substances 0.000 description 41
- 230000000052 comparative effect Effects 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- 229910052681 coesite Inorganic materials 0.000 description 10
- 229910052906 cristobalite Inorganic materials 0.000 description 10
- 229910052682 stishovite Inorganic materials 0.000 description 10
- 229910052905 tridymite Inorganic materials 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- 230000002708 enhancing effect Effects 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 230000004313 glare Effects 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000003889 chemical engineering Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 208000003464 asthenopia Diseases 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- ZHPNWZCWUUJAJC-UHFFFAOYSA-N fluorosilicon Chemical compound [Si]F ZHPNWZCWUUJAJC-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000016776 visual perception Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
- G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/53—Base coat plus clear coat type
- B05D7/536—Base coat plus clear coat type each layer being cured, at least partially, separately
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
- C08J2301/08—Cellulose derivatives
- C08J2301/10—Esters of organic acids
- C08J2301/12—Cellulose acetate
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The application relates to an anti-reflection and anti-dazzle film and a preparation method thereof, wherein the anti-reflection and anti-dazzle film comprises: a transparent substrate layer; an anti-glare layer disposed on the transparent substrate layer; the anti-reflection layer is arranged on the anti-dazzle layer and is positioned at one side far away from the transparent substrate layer; wherein, micron-sized organic particles which are subjected to surface modification by acrylic resin are mixed in the anti-dazzle layer, and hollow nano silicon dioxide particles which are subjected to surface modification by fluorine-containing or silicon-containing resin are mixed in the anti-reflection layer. The anti-reflection anti-dazzle film has the advantages of good anti-dazzle effect, high transmittance and low reflectivity, good wear resistance and good adhesive force, and can effectively improve the final display effect of the display screen.
Description
Technical Field
The application relates to the technical field of optical films, in particular to an anti-reflection and anti-dazzle film and a preparation method thereof.
Background
With the rapid development of the display industry, the requirements of people on the display are higher and higher, and the liquid crystal display is popular for the masses due to the advantages of large visual area, good picture effect, low energy consumption and the like. The design of the lcd is also developing toward high definition and high contrast, but the external light source is easily affected by the display during use, and the external light source reflects on the surface of the display to generate glare, which affects the visual effect. Therefore, it is necessary to perform an antiglare treatment on the surface layer of the display screen to reduce the visual perception of the viewer by the glare, and conventionally, a means is adopted to coat an antiglare film on the surface of the liquid crystal display, and diffuse reflection is generated by irradiation of light on the surface of the antiglare film to control the degree of light scattering so as to inhibit the glare. Meanwhile, when the display works, the internal light source can generate strong light, so that eye fatigue is very easy to cause, and the anti-dazzle film can also reduce the influence of the strong light in the display screen or reduce the reflected light intensity.
However, since the antiglare film generally has low transmittance, the antiglare film is coated with an antireflection layer to reduce reflection of light, thereby effectively improving transmittance of the display. However, the anti-reflection film prepared by the prior art is generally poor in wear resistance, because the thickness of the anti-reflection coating is very thin to meet the anti-reflection requirement, and scratches are very easy to occur when a screen is wiped, so that the improvement of the scratch resistance of the surface layer of the screen plays an important role in improving the quality of display products.
In conclusion, the preparation of the anti-dazzle film for the anti-dazzle display screen has great significance and high transmittance.
Disclosure of Invention
The application aims to provide an anti-reflection anti-dazzle film and a preparation method thereof, which not only have anti-glare, high transmittance and low reflectivity performance, but also have good wear resistance and good adhesive force, and can effectively improve the display effect.
In order to achieve the above purpose, the application adopts the following technical scheme:
the present application provides an antireflection antiglare film comprising:
a transparent substrate layer;
an anti-glare layer disposed on the transparent substrate layer;
the anti-reflection layer is arranged on the anti-dazzle layer and is positioned at one side far away from the transparent substrate layer;
wherein, micron-sized organic particles which are subjected to surface modification by acrylic resin are mixed in the anti-dazzle layer, and hollow nano silicon dioxide particles which are subjected to surface modification by fluorine-containing or silicon-containing resin are mixed in the anti-reflection layer.
In a specific embodiment, the micron-sized organic particles have a particle size in the range of 1 μm to 5 μm, preferably 2 μm to 4 μm.
In a specific embodiment, the acrylic resin used in the micron-sized organic particles after surface modification of the acrylic resin is epoxy acrylic resin or methacrylate, and has a refractive index of 1.53-1.56.
In a specific embodiment, the hollow nano-silica particles have a particle size in the range of 50nm to 100nm.
In a specific embodiment, the fluorine-containing or silicon-containing resin used in the hollow nano-silica particles surface-modified with the fluorine-containing or silicon-containing resin is a fluorine-containing urethane acrylate resin or a silicon-containing urethane acrylate resin, and has a refractive index of 1.53 to 1.56.
In a specific embodiment, the anti-glare layer has a coating thickness of 3 μm to 7 μm, preferably 4 μm to 6 μm.
In a specific embodiment, the thickness of the anti-reflection layer is 80nm to 120nm, preferably 90nm to 110nm.
In particular, the application provides a preparation method of the anti-reflection and anti-dazzle film, which comprises the following steps:
preparation of anti-glare layer coating liquid:
diluting acrylic resin with a solvent to obtain a first modification liquid for standby, adding micron-sized organic particles into the first modification liquid, mixing and stirring to obtain a first slurry, drying and roasting the first slurry, grinding the first slurry to obtain micron-sized organic particles subjected to surface modification of the acrylic resin, and mixing the obtained micron-sized organic particles subjected to surface modification of the acrylic resin with a first photo-curing resin and a solvent in proportion to obtain an anti-glare layer coating liquid;
preparation of an anti-reflection layer coating liquid:
diluting fluorine modified resin or silicon modified resin with a solvent to obtain a second modification solution for later use, adding hollow nano silicon dioxide particles into the second modification solution, mixing and stirring to obtain a second slurry, drying and roasting the second slurry, grinding to obtain hollow nano silicon dioxide particles subjected to surface modification by fluorine-containing or silicon-containing resin, and mixing the obtained hollow nano silicon dioxide particles subjected to surface modification by fluorine-containing or silicon-containing resin with a second photo-curing resin and a solvent in proportion to obtain an anti-reflection layer coating solution;
preparation of an anti-reflection and anti-dazzle film:
and coating the anti-dazzle layer coating liquid on the transparent substrate layer, drying, irradiating with ultraviolet light to obtain an anti-dazzle hardening film, coating the anti-reflection layer coating liquid on the anti-dazzle layer of the anti-dazzle hardening film, drying, and irradiating with ultraviolet light to obtain the anti-reflection anti-dazzle film.
In a specific embodiment, the anti-glare layer coating liquid comprises the following components in percentage by weight:
first photo-curable resin: 20% -445%
And the micron-sized organic particles are subjected to surface modification by acrylic resin: 2 to 8 percent
Solvent: 50% -75%.
In a specific embodiment, the anti-reflection layer coating liquid comprises the following components in parts by weight:
second photo-curable resin: 1 to 3 percent of
Hollow nano silicon dioxide particles after surface modification by fluorine-containing or silicon-containing resin: 0.05 to 0.2 percent
Solvent: 96% -99%.
Compared with the prior art, the anti-reflection and anti-dazzle film and the preparation method thereof have the advantages that:
according to the anti-reflection anti-dazzle film, the anti-dazzle layer (AG layer) is coated on the surface of the transparent substrate layer, so that the anti-dazzle purpose is achieved, micron-sized organic particles are mixed in the anti-dazzle layer, the surface of the micron-sized organic particles is modified by the high-refractive-index acrylic resin, the high-refractive-index acrylic resin is grafted on the surface of the micron-sized organic particles, the compatibility of the micron-sized organic particles and the acrylic resin is improved, and the micron-sized organic particles can be uniformly dispersed in the anti-dazzle layer coating liquid on the premise that a dispersing agent is not needed to be additionally added, so that the problem of particle sedimentation in the coating process is avoided. Meanwhile, the high refractive index acrylic resin can reduce reflection of the anti-glare layer, so that the transmittance is improved, the haze of the anti-glare layer can be regulated and controlled through the addition amount of micron-sized organic particles, and the prepared product can meet the requirements of good anti-glare effect and excellent crystal point.
In addition, an antireflection layer (LR layer) is coated on the anti-dazzle layer, and in the anti-reflection layer, fluorine-containing or silicon-containing resin is grafted on the surface of hollow nano silicon dioxide particles through surface modification of fluorine-containing or silicon-containing resin, so that the refractive index of the anti-reflection layer can be reduced, the transmittance of the anti-reflection layer is improved, the fluorine-containing or silicon-containing resin on the surface of the silicon dioxide is exposed on the surface, the wear resistance and the surface smoothness of the anti-reflection layer can be improved, and the effects of reducing the overall reflectivity of the anti-reflection anti-dazzle film and enhancing the wear resistance are achieved. The organic particles modified by acrylic resin in the AG layer and the fluorine-containing or silicon-containing resin modified silica particles in the LR layer can also react, so that the adhesive force of the AG layer and the LR layer can be further enhanced, and the wear resistance of the anti-reflection anti-dazzle film can also be further enhanced. The anti-dazzle anti-reflection film not only has the performance advantages of anti-glare, high transmittance and low reflectivity, but also has good wear resistance and good adhesive force, and can effectively improve the final display effect of a display screen.
Drawings
Some specific embodiments of the application will be described in detail hereinafter by way of example and not by way of limitation with reference to the accompanying drawings. The same reference numbers will be used throughout the drawings to refer to the same or like parts or portions. It will be appreciated by those skilled in the art that the drawings are not necessarily drawn to scale. In the accompanying drawings:
fig. 1 is a schematic cross-sectional structure of an anti-reflection and anti-glare film according to an embodiment of the present application.
The reference numerals are explained as follows:
1. the transparent base material layer 2, the anti-dazzle layer 21, micron-sized organic particles modified by the surface of acrylic resin, 3, the anti-reflection layer 31, and hollow nano silicon dioxide particles modified by the surface of fluorine-containing or silicon-containing resin.
Detailed Description
The following description of the embodiments of the present application will be made apparent and fully in view of the accompanying drawings, in which some, but not all embodiments of the application are shown. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
In addition, the technical features of the different embodiments of the present application described below may be combined with each other as long as they do not collide with each other.
The present embodiment provides an antireflection antiglare film, as shown in fig. 1, comprising:
a transparent base material layer 1;
an anti-glare layer 2 provided on the transparent base layer 1;
an anti-reflection layer 3 disposed on the anti-glare layer 2 and located at a side away from the transparent substrate layer 1;
wherein, the anti-glare layer 2 is mixed with micron-sized organic particles 21 which are surface-modified by acrylic resin, and the anti-reflection layer 3 is mixed with hollow nano silicon dioxide particles 31 which are surface-modified by fluorine-containing or silicon-containing resin.
In one embodiment, the micron-sized organic particles 21 have a particle size ranging from 1 μm to 5 μm, preferably from 2 μm to 4 μm. The acrylic resin used in the micron-sized organic particles surface-modified with the acrylic resin is epoxy acrylic resin or methacrylate, and has a refractive index of 1.53 to 1.56.
The anti-dazzle layer (AG layer) is mixed with micron-sized organic particles, so that the anti-dazzle purpose can be achieved, the surface of the micron-sized organic particles is modified by the high-refractive-index acrylic resin, the high-refractive-index acrylic resin can be grafted on the surface of the micron-sized organic particles, the compatibility of the micron-sized organic particles and the acrylic resin is improved, the micron-sized organic particles can be uniformly dispersed in the anti-dazzle layer coating liquid on the premise that a dispersing agent is not required to be additionally added, and the problem of particle sedimentation in the coating process can be avoided. Meanwhile, the high refractive index acrylic resin can reduce reflection of the anti-glare layer, so that the transmittance is improved, the haze of the anti-glare layer can be regulated and controlled through the addition amount of micron-sized organic particles, and the prepared product can meet the requirements of good anti-glare effect and excellent crystal point.
In one embodiment, the hollow nano-silica particles have a particle size in the range of 50nm to 100nm. The fluorine-containing or silicon-containing resin used in the hollow nano silicon dioxide particles subjected to surface modification by the fluorine-containing or silicon-containing resin is fluorine-containing polyurethane acrylate resin or silicon-containing polyurethane acrylate resin, and the refractive index is 1.53-1.56.
The anti-reflection layer (LR layer) is formed by carrying out surface modification on the hollow nano silicon dioxide particles by fluorine-containing or silicon-containing resin, so that the surface of the particles is grafted with the fluorine-containing or silicon-containing resin, the refractive index of the anti-reflection layer can be reduced, the transmittance of the anti-reflection layer is improved, the fluorine-containing or silicon-containing resin on the surface of the silicon dioxide is exposed on the surface, the wear resistance and the surface smoothness of the anti-reflection layer can be improved, and the effects of reducing the overall reflectivity of the anti-reflection anti-dazzle film and enhancing the wear resistance are achieved.
In addition, the organic particles modified by acrylic resin in the AG layer and the fluorine-containing or silicon-containing resin modified silica particles in the LR layer can also react, the surfaces of the organic particles modified by acrylic resin are provided with hydroxyl groups, carboxyl groups and other groups, the surfaces of the fluorine-containing or silicon-containing resin modified silica particles in the LR layer are also provided with hydroxyl groups, carboxyl groups and other groups, and the two can generate esterification, condensation and other crosslinking reactions on the contact surface to consolidate the bottom layer, thereby enhancing interlayer adhesion and further enhancing the wear resistance of the anti-reflection anti-dazzle film. The anti-dazzle anti-reflection film not only has the performances of anti-glare, high transmittance and low reflectivity, but also has good wear resistance and good adhesive force, and can effectively improve the final display effect of a display screen.
In a preferred embodiment, the antiglare layer 2 is applied at a thickness of 3 μm to 7 μm, preferably 4 μm to 6 μm. The thickness of the anti-reflection layer 3 is 80nm to 120nm, preferably 90nm to 110nm.
In another embodiment, there is provided a method for preparing the anti-reflection and anti-dazzle film as described above, comprising the steps of:
preparation of anti-glare layer coating liquid:
diluting acrylic resin with a solvent to obtain a first modification liquid for standby, adding micron-sized organic particles into the first modification liquid, mixing and stirring to obtain a first slurry, drying and roasting the first slurry, grinding the first slurry to obtain micron-sized organic particles subjected to surface modification of the acrylic resin, and mixing the obtained micron-sized organic particles subjected to surface modification of the acrylic resin with a first photo-curing resin and a solvent in proportion to obtain an anti-glare layer coating liquid;
preparation of an anti-reflection layer coating liquid:
diluting fluorine modified resin or silicon modified resin with a solvent to obtain a second modification solution for later use, adding hollow nano silicon dioxide particles into the second modification solution, mixing and stirring to obtain a second slurry, drying and roasting the second slurry, grinding to obtain hollow nano silicon dioxide particles subjected to surface modification by fluorine-containing or silicon-containing resin, and mixing the obtained hollow nano silicon dioxide particles subjected to surface modification by fluorine-containing or silicon-containing resin with a second photo-curing resin and a solvent in proportion to obtain an anti-reflection layer coating solution;
preparation of an anti-reflection and anti-dazzle film:
and coating the anti-dazzle layer coating liquid on the transparent substrate layer, drying, irradiating with ultraviolet light to obtain an anti-dazzle hardening film, coating the anti-reflection layer coating liquid on the anti-dazzle layer of the anti-dazzle hardening film, drying, and irradiating with ultraviolet light to obtain the anti-reflection anti-dazzle film.
The anti-dazzle layer coating liquid and the anti-reflection layer coating liquid comprise the following components in percentage by weight: first photo-curable resin: 20% -45%; and the micron-sized organic particles are subjected to surface modification by acrylic resin: 2% -8%; solvent: 50% -75%, and the total components of the anti-dazzle layer coating liquid are 100%. The anti-reflection layer coating liquid comprises the following components in parts by weight: second photo-curable resin: 1% -3%; hollow nano silicon dioxide particles after surface modification by fluorine-containing or silicon-containing resin: 0.05 to 0.2 percent; solvent: 96% -99% of the total components of the anti-reflection layer coating liquid are 100%.
The anti-reflection and anti-glare film prepared in the following examples and the anti-reflection and anti-glare film prepared in the comparative example were combined to perform the test in terms of abrasion resistance, adhesion, water contact angle, fingerprint residue, reflectance, clarity, flash point, rainbow pattern, etc.
The transparent substrate layer selected in the examples of the present application was a korean dawn TAC substrate (trade name PG601, thickness 60 um).
Example 1
Step one: preparation of anti-glare layer coating liquid
Organic particle modification: and (3) diluting the sarumami CN104NS epoxy acrylic resin (refractive index is 1.558) with propylene glycol methyl ether solvent, preparing CN104NS modifying liquid according to the ratio of 1:9, adding GA004 particles (comprehensive grinding chemistry, particle size of 3.5 mu m) into the CN104NS modifying liquid, mixing, stirring at a high speed for 30min to obtain slurry, drying the slurry in a 100 ℃ oven for 2h, roasting in a 400 ℃ muffle furnace for 1h to obtain powder, and grinding to obtain GA004-A particles modified by the acrylic resin.
Preparing an anti-glare layer coating liquid: 5 parts by weight of a monomer resin (Changxing chemical EM 2280) and 30 parts by weight of an oligomer (Changxing chemical EM 61992, functional group: 10) were dissolved in 65 parts by weight of a butanone solvent, and then 2.8 parts by weight of the above-mentioned acrylic resin-modified GA004-A particles and 3 parts by weight of a 184 photoinitiator (Tianjin for a long time) were added to obtain an anti-glare layer coating liquid.
Step two: preparation of anti-reflection layer coating liquid
Hollow SiO2 particle modification: diluting Changxing 61998 fluorine modified acrylic resin by using butanone solvent, preparing 61998 modified liquid according to the ratio of 1:9, adding GA005 hollow SiO2 nano particles (Ji Yue organisms, particle size of 100 nm) into the 61998 modified liquid, mixing, stirring at high speed for 30min to obtain slurry, drying the slurry in a 100 ℃ oven for 2h, roasting in a 400 ℃ muffle furnace for 1h to obtain powder, and grinding to obtain fluorine modified GA005-F particles modified by the acrylic resin.
Preparing an anti-reflection layer coating liquid: 0.2 parts by weight of a monomer resin (Changxing chemical 221 CX) and 1.8 parts by weight of an oligomer (Nafimbria Kai 225 MK) were dissolved in 98% by weight of a MIBK solvent, and then 0.2 parts by weight of GA005-F particles and 3 parts by weight of 184 photoinitiator were added to obtain an antireflective layer coating liquid.
Step three: preparation of anti-reflection anti-dazzle film
The anti-glare layer coating solution was coated on a TAC substrate (Korea dawn PG601, 60 μm), dried in a circulation oven at 70℃for 2min, and then passed through a dose of about 400mJ/cm 2 Irradiating for 10s with ultraviolet light to obtain an AG hardened film; coating the AG layer with the anti-reflection coating solution, drying in a circulating oven at 70deg.C for 2min, and measuring about 500mJ/cm 2 The ultraviolet light is irradiated for 10s to prepare the anti-reflection anti-dazzle film.
Example 2
Step one: preparation of anti-glare layer coating liquid
Organic particle modification: diluting a long-standing chemical EM2260 (refractive index of 1.550) resin with a methyl isobutyl ketone solvent, preparing an EM2260 modified solution according to a ratio of 1:9, adding GA006 particles (Japanese ponding, particle size of 5 μm) into the EM2260 modified solution, mixing, stirring at a high speed for 30min to obtain a slurry, drying the slurry in a 100 ℃ oven for 2h, roasting in a 400 ℃ muffle furnace for 1h to obtain powder, and grinding to obtain GA006-A particles modified by acrylic resin.
Preparing an anti-glare layer coating liquid: 3 parts by weight of a monomer resin (Ruo chemical engineering 648) and 22 parts by weight of an oligomer (Ruo chemical engineering SD1110, functional group: 6) were dissolved in 75 parts by weight of a butyl acetate solvent, and then 1.5 parts by weight of the above-mentioned acrylic resin-modified GA006-A particles and 3 parts by weight of a 184 photoinitiator were added to obtain an anti-glare layer coating liquid.
Step two: preparation of anti-reflection layer coating liquid
Hollow SiO2 particle modification: and diluting fluorine-silicon modified acrylic resin (Ruo chemical FSP 8658) by using methyl isobutyl ketone solvent, wherein the ratio of the methyl isobutyl ketone solvent to the methyl isobutyl ketone solvent is 1:9, preparing FSP8658 modified liquid, adding GA007 hollow SiO2 nano particles (Shanghai gold side organisms, particle size of 50 nm) into the FSP8658 modified liquid, mixing, stirring at a high speed for 30min to obtain slurry, drying the slurry in a 100 ℃ oven for 2h, roasting in a muffle furnace for 1h at 400 ℃ to obtain powder, and grinding to obtain fluorine-silicon modified GA007-F particles modified by the acrylic resin.
Preparing an anti-reflection layer coating liquid: 0.3 parts by weight of a monomer resin (Changxing chemical EM 221) and 2.7 parts by weight of an oligomer (Nafimbria Kai 225 MK) were dissolved in 97% by weight of an ethyl acetate solvent, and then 0.05 parts by weight of GA007-F particles and 3 parts by weight of a 184 photoinitiator were added to obtain an anti-reflection layer coating liquid.
Step three: preparation of anti-reflection anti-dazzle film
The preparation method is the same as in example 1.
Example 3
Step one: preparation of anti-glare layer coating liquid
Organic particle modification: diluting the Changxing chemical EM2261 acrylic resin (refractive index is 1.536) with butanone solvent, preparing EM2261 modified liquid according to the ratio of 1:9, adding GA008 particles (comprehensive grinding chemical, particle size is 1 μm) into the EM2261 modified liquid, mixing, stirring at high speed for 30min to obtain slurry, drying the slurry in a 100 ℃ oven for 2h, roasting in a 400 ℃ muffle furnace for 1h to obtain powder, and grinding to obtain GA008-A particles modified by the acrylic resin.
Preparing an anti-glare layer coating liquid: 5 parts by weight of a monomer resin (Changxing chemical EM 2280) and 40 parts by weight of an oligomer (Changxing chemical EM 61992, functional group: 10) were dissolved in 55 parts by weight of a butyl acetate solvent, and then 4.5 parts by weight of the above-mentioned acrylic resin-modified GA008-A particles and 3 parts by weight of a 184 photoinitiator were added to obtain an anti-glare layer coating liquid.
Step two: preparation of anti-reflection layer coating liquid
Hollow SiO2 particle modification: and diluting silicon modified acrylic resin (Changxing chemical 6225) by using propylene glycol methyl ether acetate solvent, wherein the ratio of the propylene glycol methyl ether acetate solvent to the propylene glycol methyl ether acetate solvent is 1:9, preparing 6225 modified liquid, adding GA009 hollow SiO2 nano particles (Japanese Fuji with the particle size of 80 nm) into the 6225 modified liquid, mixing, stirring at a high speed for 30min to obtain slurry, drying the slurry in a 100 ℃ oven for 2h, roasting in a 400 ℃ muffle furnace for 1h to obtain powder, and grinding to obtain the GA009-S particles modified by the silicon modified acrylic resin.
Preparing an anti-reflection layer coating liquid: 0.1 parts by weight of a monomer resin and 0.9 parts by weight of an oligomer were dissolved in 99% by weight of an ethyl acetate solvent, and then 0.1 parts by weight of GA009-S particles and 3 parts by weight of 184 photoinitiator were added to obtain an anti-reflection layer coating solution.
Step three: preparation of anti-reflection anti-dazzle film
The preparation method is the same as in example 1.
Comparative example 1
The difference from example 1 is that the organic particles GA004 particles in step one were not subjected to the modification treatment of CN104 NS.
Comparative example 2
The difference from example 1 is that no organic particles GA004 particles were added in step one.
Comparative example 3
The difference from example 1 is that hollow SiO2 particles GA005 in the second step were not subjected to modification treatment.
Comparative example 4
The difference from example 1 is that hollow SiO2 particles GA005 were not added in the second step.
Comparative example 5
The difference from example 1 is that the particle diameter of the organic particles GA004 particles in the first step was 6. Mu.m.
Comparative example 6
The difference from example 1 is that the particle diameter of the organic particles GA004 particles in the first step was 0.5. Mu.m.
Comparative example 7
The difference from example 1 is that the hollow SiO2 particles GA005 in the second step had a particle diameter of 150nm.
Comparative example 8
The difference from example 1 is that the hollow SiO2 particles GA005 in the second step had a particle diameter of 40nm.
Performance tests were performed on the antireflection antiglare films prepared in the above examples and comparative examples, and the test data are shown in the following table:
remarks: in the above table, the way of evaluation of flash point and rainbow pattern, o represents excellent, ≡represents general, ×represents poor.
From the test data of the above examples and comparative examples, it can be seen that the high transmittance of the anti-reflection and anti-glare film of the present application is achieved by a reasonable anti-glare layer and anti-reflection layer. As can be seen from comparison of example 1 with comparative examples 1 to 4, the surface modification of the acrylic resin was performed on the micron-sized organic particles in the antiglare layer, and the surface modification of the fluorine-containing or silicon-containing resin was performed on the hollow nano silica particles in the antireflection layer, so that the abrasion resistance and adhesion of the antireflection antiglare film could be effectively improved.
As can be seen from comparing example 1 with comparative examples 5 and 6, the thickness of the antiglare layer and the particle diameter of the micron-sized organic particles therein need to be controlled within a certain range, so that the transmittance is improved while the reflectance is reduced, otherwise the transmittance is reduced, the reflectance is increased, and the abrasion resistance and hardness are correspondingly reduced.
Comparing example 1 with comparative examples 7 and 8, it was found that the thickness of the anti-reflective layer and the particle size of the hollow nano silica particles therein need to be controlled within a certain range, so as to improve the transmittance while reducing the reflectance, otherwise, the transmittance is reduced, the reflectance is increased, and the abrasion resistance is correspondingly reduced.
The above embodiments are only for illustrating the technical concept and features of the present application, and are intended to enable those skilled in the art to understand the present application and to implement the same, but are not intended to limit the scope of the present application, and all equivalent changes or modifications made according to the spirit of the present application should be included in the scope of the present application.
Claims (10)
1. An antireflection antiglare film, comprising:
a transparent base material layer (1);
an anti-glare layer (2) provided on the transparent base layer (1);
an anti-reflection layer (3) which is arranged on the anti-glare layer (2) and is positioned at one side far away from the transparent substrate layer (1);
wherein micron-sized organic particles (21) which are subjected to surface modification by acrylic resin are mixed in the anti-dazzle layer (2), and hollow nano silicon dioxide particles (31) which are subjected to surface modification by fluorine-containing or silicon-containing resin are mixed in the anti-reflection layer (3).
2. The antireflection antiglare film according to claim 1, wherein the micrometer-sized organic particles (21) have a particle diameter in the range of 1 μm to 5 μm, preferably 2 μm to 4 μm.
3. The antireflection antiglare film according to claim 1, wherein the acrylic resin used in the micrometer-sized organic particles (21) surface-modified with an acrylic resin is an epoxy acrylic resin or a methacrylate, and has a refractive index of 1.53 to 1.56.
4. The antireflection antiglare film according to claim 1, wherein the hollow nanosilica particles (31) have a particle diameter in the range of 50nm to 100nm.
5. The antireflection antiglare film according to claim 1, wherein the fluorine-containing or silicon-containing resin used in the hollow nano silica particles (31) surface-modified with the fluorine-containing or silicon-containing resin is a fluorine-containing urethane acrylate resin or a silicon-containing urethane acrylate resin, and has a refractive index of 1.53 to 1.56.
6. The antireflection antiglare film according to any one of claims 1 to 5, characterized in that the antiglare layer (2) has a coating thickness of 3 μm to 7 μm, preferably 4 μm to 6 μm.
7. The antireflection antiglare film according to any one of claims 1 to 5, characterized in that the antireflection layer (3) has a coating thickness of 80nm to 120nm, preferably 90nm to 110nm.
8. A method for producing the antireflection antiglare film according to any one of claims 1 to 7, comprising the steps of:
preparation of anti-glare layer coating liquid:
diluting acrylic resin with a solvent to obtain a first modification liquid for standby, adding micron-sized organic particles into the first modification liquid, mixing and stirring to obtain a first slurry, drying and roasting the first slurry, grinding the first slurry to obtain micron-sized organic particles subjected to surface modification of the acrylic resin, and mixing the obtained micron-sized organic particles subjected to surface modification of the acrylic resin with a first photo-curing resin and a solvent in proportion to obtain an anti-glare layer coating liquid;
preparation of an anti-reflection layer coating liquid:
diluting fluorine modified resin or silicon modified resin with a solvent to obtain a second modification solution for later use, adding hollow nano silicon dioxide particles into the second modification solution, mixing and stirring to obtain a second slurry, drying and roasting the second slurry, grinding to obtain hollow nano silicon dioxide particles subjected to surface modification by fluorine-containing or silicon-containing resin, and mixing the obtained hollow nano silicon dioxide particles subjected to surface modification by fluorine-containing or silicon-containing resin with a second photo-curing resin and a solvent in proportion to obtain an anti-reflection layer coating solution;
preparation of an anti-reflection and anti-dazzle film:
and coating the anti-dazzle layer coating liquid on the transparent substrate layer, drying, irradiating with ultraviolet light to obtain an anti-dazzle hardening film, coating the anti-reflection layer coating liquid on the anti-dazzle layer of the anti-dazzle hardening film, drying, and irradiating with ultraviolet light to obtain the anti-reflection anti-dazzle film.
9. The antireflection antiglare film according to claim 8, wherein the antiglare layer coating liquid comprises the following components in terms of weight ratio:
first photo-curable resin: 20 to 45 percent
And the micron-sized organic particles are subjected to surface modification by acrylic resin: 2 to 8 percent
Solvent: 50% -75%.
10. The antireflection antiglare film according to claim 8, wherein the antireflection layer coating liquid comprises the following components in terms of weight ratio:
second photo-curable resin: 1 to 3 percent of
Hollow nano silicon dioxide particles after surface modification by fluorine-containing or silicon-containing resin: 0.05 to 0.2 percent of solvent: 96% -99%.
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