CN116641041A - Gas distribution device - Google Patents

Abstract

The present invention provides a gas distribution apparatus comprising: the integrated manifold is in the shape of a polyhedron, the polyhedron comprises a plurality of air inlet surfaces and an output surface, a plurality of first air inlets and a plurality of output ports are respectively arranged on each of the air inlet surfaces and the output surface, and a plurality of mutually independent air passages are arranged in the integrated manifold so that each first air inlet on the air inlet surface is communicated with one output port on the output surface.

Description

A gas distribution device

technical field

The invention relates to semiconductor process equipment, in particular to a gas distribution device.

Background technique

Semiconductor thin film deposition process such as ALD process, during the ALD deposition process, a chemical precursor material is injected into the deposition chamber, diffused to the wafer surface through the gas phase, a part of the chemical precursor material will be adsorbed on the wafer surface, and the remaining chemical precursor material The precursor material is then expelled from the deposition chamber. After the deposition chamber is purged and cleaned by inert gas, another chemical precursor material is injected into the deposition chamber, diffused to the surface of the wafer through the gas phase and adsorbed on the surface, and then there is a surface reaction between the two chemical precursor materials, Thin-film species, reaction by-products and remaining chemical precursor materials are expelled from the deposition chamber. ALD deposition is performed through repeated cycles of the above process to achieve thin film deposition. The main physical and chemical phenomena are surface adsorption and surface chemical reaction.

However, in the prior art, the equipment used for deposition reaction can usually only be equipped with a manifold or valve block that can enter one reaction gas. If it is necessary to add input gas, the layout of pipelines and valves is huge and complicated, which cannot meet the needs of diversification. process requirements.

In order to overcome the above-mentioned defects in the existing technology, a gas distribution device is urgently needed in this field, which is used to integrate the intake of various reactive gases and inert gases, solve the defect that the deposition equipment is not easy to expand due to space limitations, and meet the requirements of the process reaction Usage requirements.

Contents of the invention

A brief summary of one or more aspects is presented below to provide a basic understanding of these aspects. This summary is not an exhaustive overview of all contemplated aspects and is intended to neither identify key or critical elements of all aspects nor attempt to delineate the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description that is presented later.

In order to overcome the above-mentioned defects in the prior art, the present invention provides a gas distribution device, comprising: an integrated manifold in the shape of a multi-faceted cube, the multi-faced cube includes a plurality of inlet faces and an output face, each of the inlet faces A plurality of first air inlets and a plurality of output ports are respectively provided on the surface and the output surface, and a plurality of mutually independent air passages are arranged inside the integrated manifold so that each first air inlet on the air inlet surface The air port communicates with an output port on the output face.

In an embodiment, preferably, the multi-faceted cube further includes a valve body surface provided with a plurality of valve ports, and each of the first air inlet and the output port is connected to the corresponding valve port through the respective air channels, The valve port is provided with a multi-way valve block, which is used to control the connection and shutdown of each first air inlet and the corresponding output port.

In an embodiment, preferably, the position of the valve body surface on the multi-sided cube is adjacent to the inlet surface and the output surface.

In one embodiment, preferably, the same gas inlet surface is used to input the same type of gas, and different types of gases are input into the integrated manifold through different gas inlet surfaces. Reactive gases and inert gases.

In an embodiment, preferably, different first air inlets on the air inlet surface are used to input different gases.

In an embodiment, preferably, the integrated manifold is integrally formed or assembled from multiple parts.

In one embodiment, preferably, the gas distribution device further includes an adapter block, and the adapter block is provided with an input surface for connecting with the output surface of the integrated manifold, and the input surface of the adapter block The gas input port on the surface is in one-to-one correspondence with the output port on the integrated manifold and is installed in a butt joint seal. The outer surface of the adapter block is also provided with one or more chamber output ports and bypass gas extraction ports. Multiple gas pipelines are arranged inside the connection block so that one or more gas outlets communicate with one or more chamber outlets or bypass suction ports.

In one embodiment, preferably, the gas distribution device further includes a plurality of adapter blocks, the gas input port, the chamber output port, the bypass gas inlet, and the respective internal gas pipelines of the plurality of adapter blocks Connectivity is different.

In one embodiment, preferably, a sealing ring is provided between the gas input port on the input surface of the adapter block and the gas output port on the integrated manifold.

In an embodiment, optionally, the shape of the integrated manifold and the adapter block are both cuboid.

Description of drawings

The above-mentioned features and advantages of the present invention can be better understood after reading the detailed description of the embodiments of the present disclosure in conjunction with the following drawings. In the drawings, components are not necessarily drawn to scale, and components with similar related properties or characteristics may have the same or similar reference numerals.

FIG. 1 is a schematic diagram of the device structure of a gas distribution device according to an embodiment of the present invention;

2A is a perspective view of the device structure of the integrated manifold in the gas distribution device according to an embodiment of the present invention;

2B is an isometric view of the device structure of the integrated manifold in the gas distribution device according to an embodiment of the present invention;

Fig. 3 is a device structure diagram of an adapter block in a gas distribution device according to an embodiment of the present invention; and

Fig. 4 is an exploded view of the device structure of the gas distribution device according to an embodiment of the present invention.

For clarity, a brief description of the reference numbers is given below:

101 Integrated Manifold

102 The first air intake surface

103 Second air intake surface

104 transfer block

200 Integrated Manifold

201 The first air intake surface

2011 first air intake

202 output side

2021 outlet

203 valve decent

2031 valve port

204 Second air intake surface

2041 Second air intake

300 transfer block

301 input surface

302 gas input port

303 chamber outlet

304 bypass air inlet

401 Integrated Manifold

402 sealing ring

403 transfer block

Detailed ways

The implementation of the present invention is illustrated by specific specific examples below, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Although the description of the invention will be presented in conjunction with a preferred embodiment, it is not intended that the features of the invention be limited to that embodiment only. On the contrary, the purpose of introducing the invention in conjunction with the embodiments is to cover other options or modifications that may be extended based on the claims of the present invention. The following description contains numerous specific details in order to provide a thorough understanding of the present invention. The invention may also be practiced without these details. Also, some specific details will be omitted from the description in order to avoid obscuring or obscuring the gist of the present invention.

In the description of the present invention, it should be noted that unless otherwise specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connected, or integrally connected; it can be mechanically connected or electrically connected; it can be directly connected or indirectly connected through an intermediary, and it can be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.

In addition, "up", "down", "left", "right", "top", "bottom", "horizontal", and "vertical" used in the following descriptions should be understood The orientation shown in the figure. The relative terms are used for convenience of description only, and do not imply that the device described therein must be manufactured or operated in a specific orientation, and thus should not be construed as limiting the present invention.

It can be understood that although the terms "first", "second", "third", etc. may be used herein to describe various components, regions, layers and/or sections, these components, regions, layers and/or sections It should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers and/or sections. Thus, a first component, region, layer and/or section discussed below could be termed a second component, region, layer and/or section without departing from some embodiments of the present invention.

In order to overcome the above-mentioned defects in the prior art, there is an urgent need for a gas distribution device in this field, which is used to integrate the intake of various reactive gases and inert gases. The cost of consumables solves the defect that deposition equipment is not easy to expand due to space limitations, and meets the needs of process reactions.

FIG. 1 is a schematic diagram of a device structure of a gas distribution device according to an embodiment of the present invention.

Please refer to FIG. 1 , the gas distribution device provided by the present invention includes: an integrated manifold 101 in the shape of a multi-faceted cube.

2A is a perspective view of the device structure of the integrated manifold in the gas distribution device according to an embodiment of the present invention.

Referring to FIG. 2A, in the gas distribution device provided by the present invention, the integrated manifold 200 in the shape of a multi-sided cube may include a plurality of inlet surfaces and an output surface 202. For example, in this embodiment, the plurality of inlet surfaces may be It is the first air intake surface 201 and the second air intake surface 204, and the first air intake surface 201, the second air intake surface 204, and the output surface 202 are respectively provided with a plurality of first air intake ports 2011 and second air intake surfaces. Inlet 2041 and a plurality of output ports 2021, the interior of the integrated manifold 200 is provided with a plurality of mutually independent air passages so that each first air inlet 2011 or second air inlet 2041 on the air inlet surface is connected with An output port 2021 on the output surface is connected.

Preferably, in an embodiment, the first air inlet 2011 and the second air inlet 2041 correspond to the output port 2021 one by one, and each air inlet is independently output by the integrated manifold 200 .

2B is an isometric view of the device structure of the integrated manifold in the gas distribution device according to an embodiment of the present invention.

2A and FIG. 2B may be combined with reference to FIG. 1 , in this embodiment, the four first air inlets 2011 on the first air intake surface 201 of the integrated manifold 200 are connected to the four first air inlets 2011 on the second air intake surface 204 Each of the four second air inlets 2041 of the integrated manifold 200 communicates with the respective one-to-one corresponding output ports 2021 through the air channels inside the integrated manifold 200. Therefore, it can be seen from FIG. 2B that there are a total of 8 output ports in this embodiment. Mouth 2021.

Further, in a preferred embodiment, referring to FIG. 2A , the integrated manifold 200 in the shape of a multi-sided cube in the gas distribution device provided by the present invention may also include a valve body surface 203 provided with a plurality of valve ports 2031 , each The first air inlet 2011, the second air inlet 2041 and the output port 2021 are all connected to the corresponding valve port 2031 through their respective air passages, and the valve port is provided with a multi-way valve block, the multi-way valve block diagram Not shown in 2A, it is used to control the connection and shutdown of each air inlet and the corresponding output port.

Preferably, as shown in FIGS. 2A and 2B , the position of the valve body surface 203 on the multi-sided cube is adjacent to the inlet surface 201 and the output surface 202 . Under this setting, taking the single-way air channel as an example, the first air inlet 2011 on the first air inlet surface 201 can be easily connected to the valve port 2031 on the valve body surface 203 through the air channel, and then the valve port 2031 is connected to the valve port 2031 by the air channel. The channel is connected to the output port 2021 of the output surface 202, so that the connection and closure of each first air inlet 2011 and the corresponding output port 2021 can be controlled by a valve block arranged on the valve port 2031 . Similar settings can also be made for the second air inlet 2041 .

It is easy to understand that, because of the independence of the internal air passage structure of the integrated manifold 200, the integrated manifold 200 can be integrally formed, or assembled from multiple components.

In a preferred embodiment, the same gas inlet surface is used to input the same type of gas, and different types of gases are input into the integrated manifold through different gas inlet surfaces, and the different types of gases include the reactions used in the semiconductor thin film deposition process gases and inert gases.

Returning to FIG. 1, in this embodiment, the reaction gas such as the precursor gas in the ALD process can be input through four first gas inlets on the first gas inlet surface 102, and the inert gas can all be input through the second gas inlet Face 103 input.

Under such a setting, the positions of the input surfaces of different types of gases are different, and the output pipelines of the same type of gases are concentrated on the same surface and face the same direction, which can facilitate the unified arrangement of heating belts, insulation cotton, etc., saving materials and occupancy space.

At the same time, different air inlets on the air inlet face are used to input different gases. For example, the four gas inlets on the first gas inlet surface 102 in the embodiment of FIG. 1 can be used to input four different reaction gases, so as to meet the requirements of the process.

As shown in FIG. 1 , in an embodiment, the gas distribution device provided by the present invention further includes an adapter block 104 .

Fig. 3 is a schematic diagram of the device structure of the adapter block in the gas distribution device according to an embodiment of the present invention.

Please refer to FIG. 3 , the adapter block 300 is provided with an input surface 301 for butt joint installation with the output surface of the integrated manifold, and the gas input port 302 on the input surface of the adapter block 300 is connected to the integrated manifold. The output ports on the tubes are one-to-one corresponding and butt-tightly installed, and the outer surface of the adapter block 300 is also provided with one or more chamber output ports 303 and bypass air suction ports 304 .

It is easy to understand that the gas that enters the adapter block 300 through the gas input port 302 can be output to the reaction chamber through the chamber output port 303 , or can be output to the suction end pipeline of the bypass through the bypass gas extraction port 304 .

As shown in FIG. 3 , multiple gas pipelines are provided inside the adapter block 300 so that one or more gas outlets 302 communicate with one or more chamber outlets 303 or bypass suction ports 304, so that The reaction gas is delivered into the reaction chamber through the adapter block or exhausted by bypass.

Fig. 4 is an exploded view of the device structure of the gas distribution device according to an embodiment of the present invention.

As shown in Figure 4, in one embodiment, in the gas distribution device provided by the present invention, between the gas input port on the input surface of the adapter block 403 and the output port on the integrated manifold 401 The sealing ring 402 ensures the sealing of the connection.

At the same time, preferably, the gas distribution device provided by the present invention can be provided with a plurality of adapter blocks, the gas input port, the chamber output port, the bypass gas inlet, and the respective internal ports of the plurality of adapter blocks The connection relationship of the gas pipeline is different.

For example, the gas input port of the adapter block can be designed according to the actual needs, and the matching integrated manifold has several outlets, and several gas input ports are designed on the adapter block.

For another example, for several reactive gases or inert gases that will not react, they can be combined into one way and fed into the chamber or bypassed for pumping. For various gases that will react, and the current adapter block is only equipped with a chamber output port and a bypass suction port, that is, when there is only one outlet into the chamber and one side suction, it can be used according to the actual situation. Just use the adapter block that meets the requirements and replace it as needed.

In addition, in the gas distribution device provided by the present invention, the confluence of various gases only occurs at the position of the adapter block, so the contamination of the reactants will only occur at the position of the adapter block, and the replacement and installation of the adapter block Very convenient, you can easily remove pollutants, improve the convenience of process operation.

It should be noted that the above description about the adapter block is only used as an illustration of a preferred embodiment of the present invention, and is not used to limit the protection scope of the present invention. In the gas distribution device provided by the present invention, the adapter block and the sealing ring structure may not be provided, and the output of various gases is directly connected to the inlet chamber and the bypass suction pipeline through the output of the integrated manifold.

In the above embodiments, the shape of the integrated manifold and the adapter block of the gas distribution device provided by the present invention are both cuboid. It is easy to understand that the specific shape of the rectangular parallelepiped here is only an exemplary illustration, and a polyhedral integrated manifold can be provided according to actual needs, so that the same type of gas can be arranged on the same side for input.

It can be seen from the above description that in the structure of the gas distribution device provided by the present invention, the input positions of different reaction gases can be arranged together, which facilitates the arrangement of device accessories such as heating belts. At the same time, the gas distribution device can make the pipeline arrangement of the deposition equipment regular, even if more preparations are made for subsequent use possibilities, the expansion design is convenient and the space occupation is limited, and the gas distribution device is an integrated Block structure, if the gas needs to be heated, it only needs to add limited heating rods, thermocouples or insulation cotton at the centralized input, which saves equipment consumables and reduces process costs.

The previous description of the present disclosure is provided to enable any person skilled in the art to make or use the present disclosure. Various modifications to the present disclosure will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other variations without departing from the spirit or scope of the present disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. A gas distribution device, comprising: an integrated manifold shaped as a multifaceted cube, said multifaceted cube comprising a plurality of inlet faces and an output face, each of said inlet face and said output face is respectively provided with A plurality of first air inlets and a plurality of output ports, the interior of the integrated manifold is provided with a plurality of mutually independent air passages so that each first air inlet on the air inlet surface is connected to the output surface connected to one of the output ports. 2. The gas distribution device according to claim 1, wherein the multi-faceted cube further comprises a valve body surface provided with a plurality of valve ports, and each of the first air inlet and the output port passes through a respective The air channel of the valve is connected to the corresponding valve port, and the valve port is provided with a multi-way valve block, which is used to control the connection and shutdown of each of the first air inlets and the corresponding output port. 3. The gas distribution device of claim 2, wherein said valve body face is located on said multi-sided cube adjacent to said inlet face and said outlet face. 4. The gas distribution device according to claim 1, wherein the same air intake surface is used to input the same type of gas, and different types of gases are input into the integrated manifold through different air intake surfaces, and the different types of gases are input into the integrated manifold through different air intake surfaces. The gases used include reactive gases and inert gases used in semiconductor thin film deposition processes. 5. The gas distribution device according to claim 1, wherein different first air inlets on the air inlet surface are used to input different gases. 6. The gas distribution device according to claim 1, wherein the integrated manifold is integrally formed or assembled from multiple parts. 7. The gas distribution device according to claim 1, characterized in that, the gas distribution device further comprises an adapter block, and the adapter block is provided with an interface for connecting with the output surface of the integrated manifold. The input surface of the installation, the gas input port on the input surface of the adapter block is in one-to-one correspondence with the output port on the integrated manifold and is butt-jointed and sealed, and the outer surface of the adapter block is also provided with There are one or more chamber outlets and bypass gas outlets, and multiple gas pipelines are arranged inside the adapter block so that one or more of the gas outlets can be connected with one or more chamber outlets or bypasses. The exhaust port is connected. 8. The gas distribution device according to claim 7, characterized in that, the gas distribution device further comprises a plurality of transfer blocks, the gas input port and the chamber output port of the plurality of transfer blocks 1. The communication relationship between the bypass gas inlet and the respective internal gas pipelines is different. 9. The gas distribution device according to claim 7, wherein a sealing ring is provided between the gas input port on the input surface of the adapter block and the output port on the integrated manifold . 10. The gas distribution device according to claim 7, wherein the shape of the integrated manifold and the adapter block are both cuboid.