CN116568391A - Particles and transparent coated substrate comprising the same - Google Patents
Particles and transparent coated substrate comprising the same Download PDFInfo
- Publication number
- CN116568391A CN116568391A CN202280008014.0A CN202280008014A CN116568391A CN 116568391 A CN116568391 A CN 116568391A CN 202280008014 A CN202280008014 A CN 202280008014A CN 116568391 A CN116568391 A CN 116568391A
- Authority
- CN
- China
- Prior art keywords
- particles
- mass
- coating
- dispersion
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 title claims abstract description 285
- 239000000758 substrate Substances 0.000 title claims abstract description 77
- 229910052751 metal Inorganic materials 0.000 claims abstract description 50
- 239000002184 metal Substances 0.000 claims abstract description 43
- 230000000844 anti-bacterial effect Effects 0.000 claims abstract description 41
- 230000000845 anti-microbial effect Effects 0.000 claims abstract description 33
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000010703 silicon Substances 0.000 claims abstract description 23
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 22
- 239000011800 void material Substances 0.000 claims abstract 2
- 238000000576 coating method Methods 0.000 claims description 138
- 239000011248 coating agent Substances 0.000 claims description 137
- 239000007787 solid Substances 0.000 claims description 74
- 238000000034 method Methods 0.000 claims description 26
- 229910052783 alkali metal Inorganic materials 0.000 claims description 15
- 150000001340 alkali metals Chemical class 0.000 claims description 15
- 238000001179 sorption measurement Methods 0.000 claims description 15
- 239000011159 matrix material Substances 0.000 claims description 9
- 239000008188 pellet Substances 0.000 claims description 9
- 229910052725 zinc Inorganic materials 0.000 claims description 9
- 239000011701 zinc Substances 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- 229910052709 silver Inorganic materials 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 125000000524 functional group Chemical group 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- 239000011135 tin Substances 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 150000002894 organic compounds Chemical class 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 239000011133 lead Substances 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- 229910052793 cadmium Inorganic materials 0.000 claims description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052753 mercury Inorganic materials 0.000 claims description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 239000008187 granular material Substances 0.000 claims 1
- 239000006185 dispersion Substances 0.000 description 114
- 239000010408 film Substances 0.000 description 77
- 239000000243 solution Substances 0.000 description 52
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 48
- 239000007864 aqueous solution Substances 0.000 description 46
- 239000007788 liquid Substances 0.000 description 46
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 44
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 44
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 40
- 239000011734 sodium Substances 0.000 description 31
- 238000004519 manufacturing process Methods 0.000 description 28
- 239000011259 mixed solution Substances 0.000 description 28
- 239000010410 layer Substances 0.000 description 24
- 229920005989 resin Polymers 0.000 description 23
- 239000011347 resin Substances 0.000 description 23
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 21
- 238000000108 ultra-filtration Methods 0.000 description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 20
- 239000007789 gas Substances 0.000 description 20
- 239000012528 membrane Substances 0.000 description 20
- 239000003960 organic solvent Substances 0.000 description 20
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- 229910004298 SiO 2 Inorganic materials 0.000 description 15
- 239000004115 Sodium Silicate Substances 0.000 description 14
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 14
- 229910001388 sodium aluminate Inorganic materials 0.000 description 14
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 14
- 229910052911 sodium silicate Inorganic materials 0.000 description 14
- 150000003961 organosilicon compounds Chemical class 0.000 description 13
- 239000003054 catalyst Substances 0.000 description 12
- 239000000377 silicon dioxide Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 239000000843 powder Substances 0.000 description 11
- 229910001961 silver nitrate Inorganic materials 0.000 description 11
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 10
- 150000001342 alkaline earth metals Chemical class 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 8
- 229920002284 Cellulose triacetate Polymers 0.000 description 8
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 8
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 8
- 239000003242 anti bacterial agent Substances 0.000 description 8
- 238000005342 ion exchange Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 7
- 239000000654 additive Substances 0.000 description 7
- 239000011247 coating layer Substances 0.000 description 7
- 239000003999 initiator Substances 0.000 description 7
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 6
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 6
- 241000894006 Bacteria Species 0.000 description 6
- 230000001678 irradiating effect Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 5
- 238000007611 bar coating method Methods 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000003729 cation exchange resin Substances 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000005871 repellent Substances 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 208000032544 Cicatrix Diseases 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- -1 mercapto, amino Chemical group 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 231100000241 scar Toxicity 0.000 description 3
- 230000037387 scars Effects 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- 241000588724 Escherichia coli Species 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- 241000191967 Staphylococcus aureus Species 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 239000003957 anion exchange resin Substances 0.000 description 2
- 239000004599 antimicrobial Substances 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 230000002688 persistence Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 210000002268 wool Anatomy 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- HQLKZWRSOHTERR-UHFFFAOYSA-N 2-Ethylbutyl acetate Chemical compound CCC(CC)COC(C)=O HQLKZWRSOHTERR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- GAYWTJPBIQKDRC-UHFFFAOYSA-N 8-trimethoxysilyloctyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCCCCCCOC(=O)C(C)=C GAYWTJPBIQKDRC-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 241000233866 Fungi Species 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- SQMPEDLNMHOSJK-UHFFFAOYSA-N OCC1(C(C=CC=C1)C(CC)=O)C Chemical compound OCC1(C(C=CC=C1)C(CC)=O)C SQMPEDLNMHOSJK-UHFFFAOYSA-N 0.000 description 1
- 239000001888 Peptone Substances 0.000 description 1
- 108010080698 Peptones Proteins 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 238000003917 TEM image Methods 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- IYYIVELXUANFED-UHFFFAOYSA-N bromo(trimethyl)silane Chemical compound C[Si](C)(C)Br IYYIVELXUANFED-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- DIJRHOZMLZRNLM-UHFFFAOYSA-N dimethoxy-methyl-(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](C)(OC)CCC(F)(F)F DIJRHOZMLZRNLM-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052730 francium Inorganic materials 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 235000013372 meat Nutrition 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011325 microbead Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000015097 nutrients Nutrition 0.000 description 1
- 235000016709 nutrition Nutrition 0.000 description 1
- 230000035764 nutrition Effects 0.000 description 1
- 235000019319 peptone Nutrition 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- HFQQZARZPUDIFP-UHFFFAOYSA-M sodium;2-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=CC=C1S([O-])(=O)=O HFQQZARZPUDIFP-UHFFFAOYSA-M 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- NPBFIVCLSIDQNN-UHFFFAOYSA-N triethyl(propyl)silane Chemical compound CCC[Si](CC)(CC)CC NPBFIVCLSIDQNN-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- RKLXSINPXIQKIB-UHFFFAOYSA-N trimethoxy(oct-7-enyl)silane Chemical compound CO[Si](OC)(OC)CCCCCCC=C RKLXSINPXIQKIB-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- QYJYJTDXBIYRHH-UHFFFAOYSA-N trimethoxy-[8-(oxiran-2-ylmethoxy)octyl]silane Chemical compound C(C1CO1)OCCCCCCCC[Si](OC)(OC)OC QYJYJTDXBIYRHH-UHFFFAOYSA-N 0.000 description 1
- WNWMJFBAIXMNOF-UHFFFAOYSA-N trimethyl(propyl)silane Chemical compound CCC[Si](C)(C)C WNWMJFBAIXMNOF-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/02—Making microcapsules or microballoons
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
- C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/14—Paints containing biocides, e.g. fungicides, insecticides or pesticides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Plant Pathology (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Manufacturing Of Micro-Capsules (AREA)
Abstract
Description
技术领域Technical Field
本发明的一个方式涉及颗粒及包含该颗粒的带透明覆膜基材。One embodiment of the present invention relates to particles and a transparent film-coated substrate including the particles.
背景技术Background Art
以往为了防止由玻璃或塑料等形成的片材或透镜等基材表面的反射,在其表面形成防反射膜。例如,通过涂布法、蒸镀法或CVD法等进行在玻璃或塑料基材表面形成氟树脂或氟化镁这样的低折射率物质的覆膜。然而,这些方法在成本上昂贵。因此,已知以下方法(例如参见日本特开平7-133105号公报)。在该方法中,通过将包含由二氧化硅和二氧化硅以外的无机氧化物形成的折射率1.36~1.44的复合氧化物胶体颗粒的涂布液涂布在基材表面,形成防反射膜。In the past, in order to prevent reflection on the surface of substrates such as sheets or lenses formed by glass or plastic, an anti-reflection film was formed on the surface. For example, a coating method, an evaporation method or a CVD method is used to form a coating of a low-refractive-index material such as a fluororesin or magnesium fluoride on the surface of a glass or plastic substrate. However, these methods are expensive in terms of cost. Therefore, the following method is known (for example, see Japanese Patent Publication No. 7-133105). In this method, a coating liquid containing composite oxide colloidal particles with a refractive index of 1.36 to 1.44 formed by inorganic oxides other than silicon dioxide is applied to the surface of the substrate to form an anti-reflection film.
此外,已知具有外壳及其内部的空腔的颗粒的制造方法(例如参见日本特开2001-233611号公报以及日本特开2013-226539号公报)。该颗粒具有比实心颗粒低的折射率。使用该颗粒形成的透明覆膜具有低折射率,防反射性能优异。In addition, a method for producing particles having a shell and a cavity therein is known (see, for example, Japanese Patent Publication No. 2001-233611 and Japanese Patent Publication No. 2013-226539). The particles have a lower refractive index than solid particles. The transparent coating formed using the particles has a low refractive index and excellent anti-reflection performance.
此外,已知通过在氧化铝和二氧化硅等无机氧化物颗粒或者氧化硅-氧化铝(シリカアルミナ)等复合氧化物颗粒上负载银或铜等金属成分来使这些颗粒具有抗菌性(例如参见日本特开平7-196424号公报以及日本特开2010-273698号公报)。进而,还已知具备防反射层和具有抗菌功能的层的防反射膜(参见日本特开平11-052105号公报)。In addition, it is known that inorganic oxide particles such as alumina and silica or composite oxide particles such as silica-alumina are loaded with metal components such as silver or copper to make these particles have antibacterial properties (see, for example, Japanese Patent Publication No. 7-196424 and Japanese Patent Publication No. 2010-273698). Furthermore, antireflection films having an antireflection layer and a layer having an antibacterial function are also known (see Japanese Patent Publication No. 11-052105).
发明内容Summary of the invention
发明要解决的技术问题Technical problem to be solved by the invention
相较于内部填满的颗粒,内部具有空腔的颗粒具有低折射率。因此,在将内部具有空腔的颗粒用于覆膜的情况下,覆膜的透明性和防反射性能提高。另外,需要透明性和防反射性能的部件中例如有智能手机、ATM和售票机等具有触摸面板的显示装置。这些表面可能被大肠杆菌或金黄色葡萄球菌等菌类或各种病毒污染。因此,从卫生的角度来看需要抗菌性。Compared with particles filled inside, particles with cavities inside have a low refractive index. Therefore, when particles with cavities inside are used for coating, the transparency and anti-reflection performance of the coating are improved. In addition, components requiring transparency and anti-reflection performance include display devices with touch panels such as smart phones, ATMs, and ticket machines. These surfaces may be contaminated by fungi such as Escherichia coli or Staphylococcus aureus or various viruses. Therefore, antibacterial properties are required from a hygienic point of view.
以往为了给覆膜赋予抗菌性,已知在覆膜表面涂覆抗菌剂。然而,例如在抗菌剂为有机类抗菌剂的情况下,抗菌剂的涂覆本身比较容易。但是,在该情况下,有覆膜被溶剂侵蚀的可能。此外,在对覆膜的固定性和耐擦伤性不良的情况下,抗菌性能的持续性不足。另一方面,在抗菌剂为无机类抗菌剂的情况下,由于抗菌剂存在于覆膜内,因此可以期待抗菌性能的持续性。然而,含有抗菌剂的覆膜(抗菌层)需要另行制造。但是,在分别制造防反射层和抗菌层的情况下,则最表面以外的层的效果可能不足,并且生产性降低,生产成本可能会提高。与此相对,当在一张覆膜中配合低折射率成分和抗菌成分的情况下,有防反射性能和抗菌性能不足、覆膜的透明性和强度不足的可能。In the past, in order to give antibacterial properties to the coating, it is known to apply an antibacterial agent on the surface of the coating. However, for example, when the antibacterial agent is an organic antibacterial agent, the coating of the antibacterial agent itself is relatively easy. However, in this case, there is the possibility that the coating is eroded by a solvent. In addition, in the case where the fixation and scratch resistance of the coating are poor, the persistence of the antibacterial performance is insufficient. On the other hand, in the case where the antibacterial agent is an inorganic antibacterial agent, since the antibacterial agent is present in the coating, the persistence of the antibacterial performance can be expected. However, the coating (antibacterial layer) containing the antibacterial agent needs to be manufactured separately. However, in the case where the anti-reflection layer and the antibacterial layer are manufactured separately, the effect of the layer outside the outermost surface may be insufficient, and productivity is reduced, and production costs may increase. In contrast, when a low refractive index component and an antibacterial component are combined in a coating, there is the possibility that the anti-reflection performance and antibacterial performance are insufficient, and the transparency and strength of the coating are insufficient.
因此,需要在用于覆膜时透明性和防反射性能高并且具有高抗菌性能的颗粒。Therefore, particles having high transparency and antireflection performance and high antibacterial performance when used for coating are required.
此外,要求使用该颗粒的带透明覆膜(防反射膜)基材的透明性和防反射性能高,具有足够的硬度和强度且具有高抗菌性能。Furthermore, a substrate with a transparent coating (anti-reflection film) using the particles is required to have high transparency and anti-reflection performance, sufficient hardness and strength, and high antibacterial performance.
解决技术问题的技术手段Technical means to solve technical problems
为了解决这样的技术问题,发明人发现了以下颗粒。In order to solve such technical problems, the inventors discovered the following particles.
本发明的一个方式所涉及的颗粒具有含硅外壳及其内侧的空腔。此外,所述颗粒以氧化物为基准含有0.5质量%~40质量%的抗菌性金属成分。所述颗粒中的空腔所占的比例(空隙率)为10%~90%。此外,颗粒中存在的空腔数量为一个的颗粒相对于全部颗粒的个数比例为80%以上。The particles involved in one embodiment of the present invention have a silicon-containing shell and a cavity inside thereof. In addition, the particles contain 0.5% to 40% by mass of an antibacterial metal component based on the oxide. The proportion of the cavity in the particles (porosity) is 10% to 90%. In addition, the number of particles with one cavity in the particles relative to the number of all particles is more than 80%.
所述颗粒具有低折射率,并且具有足够的硬度和强度、高分散性以及高抗菌性能。基于包含这样的颗粒的涂布液,能够得到在具有高透明性和防反射性能的同时还具有足够的硬度(铅笔硬度)和强度(耐擦伤性)以及高抗菌性能的透明覆膜。The particles have a low refractive index, sufficient hardness and strength, high dispersibility and high antibacterial properties. Based on a coating solution containing such particles, a transparent coating having high transparency and anti-reflection properties, sufficient hardness (pencil hardness) and strength (scratch resistance) and high antibacterial properties can be obtained.
有益效果Beneficial Effects
基于本发明的一个方式所涉及的颗粒,可以得到能够制造如下覆膜的涂布液。该覆膜在具有高透明性和防反射性能的同时,与基材的密合性优异。此外,该覆膜具有足够的硬度和强度以及高抗菌性能。Based on the particles involved in one embodiment of the present invention, a coating solution capable of manufacturing the following coating can be obtained. The coating has high transparency and anti-reflection performance, and excellent adhesion to the substrate. In addition, the coating has sufficient hardness and strength and high antibacterial performance.
具体实施方式DETAILED DESCRIPTION
本实施方式所涉及的颗粒(以下有时将本实施方式所涉及的颗粒简称为“颗粒”)以氧化物为基准含有0.5质量%~40质量%的抗菌性金属成分。颗粒的形状具有含硅外壳及其内侧的空腔。该颗粒中的空腔所占的比例(空隙率)为10%~90%。此外,存在于颗粒外壳内侧的空腔为一个的颗粒相对于全部颗粒的个数比例为80%以上。The particles involved in the present embodiment (hereinafter sometimes referred to as "particles") contain 0.5% to 40% by mass of antibacterial metal components based on oxides. The shape of the particles has a silicon-containing shell and a cavity inside thereof. The proportion of the cavity in the particles (porosity) is 10% to 90%. In addition, the number of particles having one cavity inside the particle shell relative to the total number of particles is 80% or more.
以氧化物为基准,当颗粒的抗菌性金属成分的含量在0.5质量%~40质量%的范围内时,通过将该颗粒用于覆膜,可以得到具有高抗菌性和高透明性以及防反射性能的覆膜。When the content of the antimicrobial metal component of the particles is in the range of 0.5 mass % to 40 mass % based on the oxide, a coating having high antimicrobial property, high transparency and antireflection performance can be obtained by using the particles for coating.
此处,在抗菌性金属成分的含量少于0.5质量%的情况下,有可能得不到足够的抗菌性能。相反,即使在抗菌性金属成分的含量大于40质量%的情况下,抗菌性能也不会进一步提高,根据情况抗菌性金属成分会变得不稳定,容易发生从颗粒脱离和变色等情况。此外,透明性和防反射性能有可能降低。该抗菌性金属成分的含量优选为1质量%~30质量%,较优选为3质量%~10质量%。Here, when the content of the antimicrobial metal component is less than 0.5 mass %, it is possible that sufficient antimicrobial performance cannot be obtained. On the contrary, even when the content of the antimicrobial metal component is greater than 40 mass %, the antimicrobial performance will not be further improved, and the antimicrobial metal component will become unstable according to the circumstances, and it is easy to separate from the particles and change color. In addition, transparency and anti-reflection performance are likely to decrease. The content of the antimicrobial metal component is preferably 1 mass % to 30 mass %, and more preferably 3 mass % to 10 mass %.
颗粒的外壳中含有硅。含硅物质优选为氧化物。作为含硅氧化物,举出包含铝、锆、钛、锌、锡和锑中的至少一种元素和硅的氧化物以及二氧化硅。这些氧化物可以为单一的,可以为混合物,也可以为复合氧化物。The outer shell of the particle contains silicon. The silicon-containing material is preferably an oxide. Examples of silicon-containing oxides include oxides containing at least one element of aluminum, zirconium, titanium, zinc, tin and antimony and silicon, and silicon dioxide. These oxides may be single, a mixture or a composite oxide.
通过在外壳中含有硅,在颗粒的折射率降低的同时,颗粒和基质形成成分的相溶性也提高。因此,能够形成反射率低的透明覆膜。并且,由于颗粒能够高分散在透明覆膜中,因此覆膜的强度提高。当将硅以二氧化硅表示时,颗粒中所含的硅含量优选为50质量%以上。该硅成分的含量较优选为75质量%以上,进一步优选为85质量%以上,特别优选为90质量%。By containing silicon in the shell, while the refractive index of the particles is reduced, the compatibility of the particles and the matrix forming components is also improved. Therefore, a transparent coating with low reflectivity can be formed. In addition, since the particles can be highly dispersed in the transparent coating, the strength of the coating is improved. When silicon is represented by silicon dioxide, the silicon content contained in the particles is preferably 50% by mass or more. The content of the silicon component is more preferably 75% by mass or more, more preferably 85% by mass or more, and particularly preferably 90% by mass.
颗粒的空隙率为10%~90%。此处,如果空隙率小于10%,则在将该颗粒用于覆膜的情况下,难以得到具有足够透明性和防反射性能的覆膜。相反,如果颗粒的空隙率大于90%,由于颗粒的结构过于“稀疏”,因此有可能不能维持其结构,即使能够维持结构,也有可能不能得到具有足够硬度和强度的覆膜。空隙率优选为13%~80%,较优选为20%~70%。The porosity of the particles is 10% to 90%. Here, if the porosity is less than 10%, it is difficult to obtain a coating having sufficient transparency and anti-reflection performance when the particles are used for coating. On the contrary, if the porosity of the particles is greater than 90%, the structure of the particles is too "sparse", so it is possible that the structure cannot be maintained, and even if the structure can be maintained, it is possible that a coating having sufficient hardness and strength cannot be obtained. The porosity is preferably 13% to 80%, and more preferably 20% to 70%.
空腔为一个的颗粒相对于全部颗粒的个数比例为80%以上。如果该个数比例小于80%,则在将该颗粒用于带覆膜基材的情况下,有可能透明性和防反射性能不足。个数比例优选为95%以上,较优选为99%以上,最优选为100%。The number ratio of particles having one cavity to all particles is 80% or more. If the number ratio is less than 80%, when the particles are used for a coated substrate, the transparency and anti-reflection performance may be insufficient. The number ratio is preferably 95% or more, more preferably 99% or more, and most preferably 100%.
此外,优选外壳内侧的空腔是沿着颗粒外形而成的形状。即,外壳的厚度越均匀越优选。在该情况下,虽然仍取决于外壳的厚度,但即使在对颗粒施加应力的情况下,也可以得到足够的硬度和强度。In addition, it is preferred that the cavity inside the shell is shaped along the particle shape. That is, the more uniform the thickness of the shell, the more preferred. In this case, although it still depends on the thickness of the shell, even when stress is applied to the particle, sufficient hardness and strength can be obtained.
具有抗菌性的金属成分优选包含选自于银、铜、锌、铅、锡、铋、镉、铬、汞、镍和钴中的元素。这些金属元素可以单独使用,也可以组合使用多种。较优选的金属元素为银、铜和锌,进一步优选的金属元素为银和锌。The metal component with antibacterial property preferably comprises an element selected from silver, copper, zinc, lead, tin, bismuth, cadmium, chromium, mercury, nickel and cobalt. These metal elements can be used alone or in combination. More preferred metal elements are silver, copper and zinc, and further preferred metal elements are silver and zinc.
颗粒的干燥品基于He气体吸附法的密度(A1)优选为1.95g/mL~3.50g/mL,颗粒的干燥品基于N2气体吸附法的密度(B1)优选为0.50g/mL~2.60g/mL。The density (A1) of the dry product of the particles based on the He gas adsorption method is preferably 1.95 g/mL to 3.50 g/mL, and the density (B1) of the dry product of the particles based on the N 2 gas adsorption method is preferably 0.50 g/mL to 2.60 g/mL.
该基于气体吸附法的密度通过以下方式得到。即,通过用蒸发仪使颗粒的分散液干燥而得到粉末。接着,使用通过将该粉末在空气中在105℃下进行热处理(干燥)而得的物质,利用干式自动密度计(マイクロメリティックス公司制造,AccuPyc1340TC),使用He气体或N2气体实施测定。由此得到上述基于气体吸附法的密度。此外,使用将上述通过用蒸发仪进行干燥而得到的粉末在空气中在400℃下进行热处理(烧制)而得的物质,通过实施同样测定而得到后述的密度(A2)和密度(B2)。The density based on the gas adsorption method is obtained in the following manner. That is, a powder is obtained by drying a dispersion of particles using an evaporator. Next, a substance obtained by heat-treating (drying) the powder in air at 105°C is used, and the measurement is performed using a dry automatic density meter (manufactured by Micromeritics, AccuPyc1340TC) using He gas or N2 gas. The above-mentioned density based on the gas adsorption method is thus obtained. In addition, a substance obtained by heat-treating (firing) the powder obtained by drying the above-mentioned powder using an evaporator at 400°C in air is used, and the density (A2) and density (B2) described later are obtained by performing the same measurement.
因测定中使用的气体种类不同而密度范围也不同,其详细理由尚不明确。然而,认为其原因是,基于颗粒表面的凹凸或细孔这样的颗粒表面状态,由气体种类的不同引起的吸附状态的不同作为数值表现出来。The density range varies depending on the type of gas used in the measurement, and the detailed reason is not clear. However, it is believed that the reason is that the difference in adsorption state caused by the difference in gas type is expressed as a numerical value based on the particle surface state such as unevenness or pores on the particle surface.
此处,如果密度(A1)小于1.95g/mL,则抗菌性金属成分较少,因此有可能得不到足够的抗菌性能。Here, if the density (A1) is less than 1.95 g/mL, the amount of the antimicrobial metal component is small, so that sufficient antimicrobial performance may not be obtained.
相反,如果密度(A1)大于3.50g/mL,则所负载的抗菌性金属成分会变得不稳定,因此容易发生抗菌性金属成分从颗粒脱离和变色等情况。此外,透明性、防反射性能、强度和密合性有可能降低。On the contrary, if the density (A1) is greater than 3.50 g/mL, the loaded antimicrobial metal component becomes unstable, and the antimicrobial metal component is easily separated from the particles and discolored, etc. In addition, the transparency, antireflection performance, strength and adhesion may be reduced.
此外,在密度(B1)小于0.50g/mL的颗粒中,难以维持外壳的结构。因此,难以得到这样的颗粒。In addition, in particles having a density (B1) of less than 0.50 g/mL, it is difficult to maintain the structure of the shell. Therefore, it is difficult to obtain such particles.
相反,如果密度(B1)大于2.60g/mL,则所负载的抗菌性金属成分会变得不稳定,因此容易发生抗菌性金属成分从颗粒脱离和变色等情况。此外,透明性、防反射性能、硬度和密合性有可能降低。On the contrary, if the density (B1) is greater than 2.60 g/mL, the loaded antimicrobial metal component becomes unstable, and the antimicrobial metal component is easily separated from the particles and discolored. In addition, the transparency, antireflection performance, hardness and adhesion may be reduced.
密度(A1)较优选为2.00g/mL~3.00g/mL,进一步优选为2.10g/mL~2.30g/mL。The density (A1) is more preferably 2.00 g/mL to 3.00 g/mL, and further preferably 2.10 g/mL to 2.30 g/mL.
密度(B1)较优选为0.80g/mL~2.10g/mL,进一步优选为0.90g/mL~1.50g/mL。The density (B1) is more preferably 0.80 g/mL to 2.10 g/mL, and further preferably 0.90 g/mL to 1.50 g/mL.
在400℃下热处理的颗粒基于He气体吸附法的密度(A2)优选为2.17g/mL以上。The density (A2) of the particles heat-treated at 400° C. based on a He gas adsorption method is preferably 2.17 g/mL or more.
此处,如果密度(A2)小于2.17g/mL,则抗菌性金属成分较少,因此有可能无法得到足够的抗菌性能。Here, if the density (A2) is less than 2.17 g/mL, the amount of the antimicrobial metal component is small, so that sufficient antimicrobial performance may not be obtained.
密度(A2)的上限没有特别设定。然而,如果密度(A2)过大,则根据抗菌性金属成分的种类,有形成的带透明覆膜基材的反射率和雾度变高且透射率、强度和密合性降低的可能。因此,例如,对于密度(A2)的上限而言,在抗菌性金属成分为银的情况下可以为3.70g/mL,在抗菌性金属成分为铜的情况下可以为3.50g/mL,在抗菌性金属成分为锌的情况下可以为3.20g/mL。The upper limit of density (A2) is not particularly set. However, if density (A2) is too large, then according to the type of antimicrobial metal component, the reflectivity and haze of the formed transparent film substrate may become higher and the transmittance, strength and adhesion may be reduced. Therefore, for example, for the upper limit of density (A2), when the antimicrobial metal component is silver, it can be 3.70g/mL, when the antimicrobial metal component is copper, it can be 3.50g/mL, and when the antimicrobial metal component is zinc, it can be 3.20g/mL.
密度(A2)较优选为2.20g/mL以上,进一步优选为2.24g/mL以上。The density (A2) is more preferably 2.20 g/mL or more, and further preferably 2.24 g/mL or more.
密度(A2)与在400℃下热处理的颗粒基于N2气体吸附法的密度(B2)的比值(A2/B2)优选为1.10以上。The ratio (A2/B2) of the density (A2) to the density (B2) of the particles heat-treated at 400°C based on a N2 gas adsorption method is preferably 1.10 or more.
此处,如果比值(A2/B2)小于1.10,则颗粒的折射率变高,因此覆膜的防反射性能有可能不足。Here, if the ratio (A2/B2) is less than 1.10, the refractive index of the particles becomes high, so the antireflection performance of the coating may be insufficient.
比值(A2/B2)的上限没有特别设定。然而,如果比值(A2/B2)过大,有可能难以维持外壳的结构。因此,比值(A2/B2)的上限例如为4.50。The upper limit of the ratio (A2/B2) is not particularly set. However, if the ratio (A2/B2) is too large, it may be difficult to maintain the structure of the housing. Therefore, the upper limit of the ratio (A2/B2) is, for example, 4.50.
比值(A2/B2)较优选为1.30以上,进一步优选为1.45以上。The ratio (A2/B2) is more preferably 1.30 or more, and further preferably 1.45 or more.
颗粒的平均粒径不受到特别限制,但在用于带透明覆膜基材的情况下,优选为20nm~180nm。当平均粒径在该范围内的情况下,颗粒可以稳定地存在。此外,在该情况下,在涂布液中以及在覆膜中颗粒的分散性均良好,可以得到透明性、硬度和强度高的覆膜。平均粒径较优选为30nm~120nm,进一步优选为40nm~110nm。The average particle size of the particles is not particularly limited, but when used for a substrate with a transparent coating, it is preferably 20nm to 180nm. When the average particle size is within this range, the particles can be stably present. In addition, in this case, the dispersibility of the particles in the coating liquid and in the coating is good, and a coating with high transparency, hardness and strength can be obtained. The average particle size is more preferably 30nm to 120nm, and more preferably 40nm to 110nm.
外壳的平均厚度优选为5nm~30nm。由此,由于能够稳定地维持外壳的结构,因此颗粒能够稳定地存在。此外,可以得到透明性、硬度和强度高的覆膜。此处,在外壳的平均厚度小于5nm的薄外壳的情况下,有可能无法维持颗粒的结构。相反,如果外壳的平均厚度大于30nm,尽管仍与抗菌性金属成分的种类和数量有关,但外壳的折射率有可能变得过高。外壳的平均厚度较优选为5nm~20nm,进一步优选为7nm~12nm。The average thickness of the shell is preferably 5nm to 30nm. Thus, since the structure of the shell can be stably maintained, the particles can exist stably. In addition, a coating with high transparency, hardness and strength can be obtained. Here, in the case of a thin shell with an average thickness of less than 5nm, it is possible that the structure of the particles cannot be maintained. On the contrary, if the average thickness of the shell is greater than 30nm, although it is still related to the type and quantity of the antibacterial metal component, the refractive index of the shell may become too high. The average thickness of the shell is more preferably 5nm to 20nm, and more preferably 7nm to 12nm.
以氧化物为基准,颗粒的碱金属含量优选小于1.00质量%。The alkali metal content of the particles is preferably less than 1.00 mass %, based on the oxide.
此处,如果颗粒的碱金属含量为1.00质量%以上,则颗粒彼此聚结,涂布液中以及覆膜中颗粒的分散性降低,有得不到足够的膜硬度、透明性不足的可能。碱金属含量较优选小于0.10质量%,进一步优选小于0.01质量%。最优选地,颗粒不含碱金属。另外,在颗粒中包含碱土金属的情况下,应将上述的“碱金属含量”理解为“碱金属和碱土金属的合计含量”。另外,碱金属表示Li、Na、K、Rb、Cs和Fr;碱土金属表示Be、Mg、Ca、Sr、Ba和Ra。Here, if the alkali metal content of the particles is 1.00% by mass or more, the particles agglomerate with each other, the dispersibility of the particles in the coating solution and the coating film decreases, and there is a possibility that sufficient film hardness and insufficient transparency cannot be obtained. The alkali metal content is preferably less than 0.10% by mass, and more preferably less than 0.01% by mass. Most preferably, the particles do not contain alkali metals. In addition, in the case where alkaline earth metals are contained in the particles, the above-mentioned "alkali metal content" should be understood as "the total content of alkali metals and alkaline earth metals". In addition, alkali metals represent Li, Na, K, Rb, Cs and Fr; alkaline earth metals represent Be, Mg, Ca, Sr, Ba and Ra.
本实施方式的颗粒也可以分散在有机溶剂和有机树脂等有机物中。在该情况下,优选使用有机硅化合物对颗粒进行表面处理。作为有机硅化合物,优选使用下述式(1)所示的有机硅化合物(n为1~3)。此处,在使用n为0的有机硅化合物的情况下,优选使用有机硅化合物的部分水解物。通过该表面处理,在颗粒中包含具有衍生自下述式(1)的有机硅化合物的官能团的有机化合物。该官能团为选自于烷基、环氧基、乙烯基、(甲基)丙烯酰氧基、巯基、氨基、苯基和苯基氨基中的至少一种。The particles of this embodiment can also be dispersed in organic substances such as organic solvents and organic resins. In this case, it is preferred to use an organosilicon compound to surface treat the particles. As the organosilicon compound, it is preferred to use an organosilicon compound represented by the following formula (1) (n is 1 to 3). Here, in the case of using an organosilicon compound in which n is 0, it is preferred to use a partial hydrolyzate of the organosilicon compound. Through this surface treatment, an organic compound having a functional group derived from the organosilicon compound of the following formula (1) is contained in the particles. The functional group is at least one selected from an alkyl group, an epoxy group, a vinyl group, a (meth)acryloyloxy group, a mercapto group, an amino group, a phenyl group and a phenylamino group.
Rn-SiX4-n···式(1)R n -SiX 4-n ···Formula (1)
(其中,式中,R为碳原子数1~10的未取代或取代烃基,可以彼此相同,也可以彼此不同。作为取代基,举出环氧基、乙烯基、(甲基)丙烯酰氧基、巯基、氨基和苯基氨基。X为碳原子数1~4的烷氧基、羟基、卤原子或氢原子,n表示0~3的整数。)(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, which may be the same as or different from each other. Examples of the substituent include epoxy, vinyl, (meth)acryloyloxy, mercapto, amino and phenylamino. X is an alkoxy, hydroxyl, halogen or hydrogen atom having 1 to 4 carbon atoms, and n represents an integer of 0 to 3.)
作为该有机硅化合物,具体而言,举出四甲氧基硅烷、四乙氧基硅烷、四异丙氧基硅烷、甲基三甲氧基硅烷、二甲基二甲氧基硅烷、苯基三甲氧基硅烷、二苯基二甲氧基硅烷、甲基三乙氧基硅烷、二甲基二乙氧基硅烷、苯基三乙氧基硅烷、二苯基二乙氧基硅烷、异丁基三甲氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三(β甲氧基乙氧基)硅烷、7-辛烯基三甲氧基硅烷、3,3,3-三氟丙基三甲氧基硅烷、甲基-3,3,3-三氟丙基二甲氧基硅烷、β-(3,4-环氧环己基)乙基三甲氧基硅烷、γ-环氧丙氧基(グリシドキシ)丙基三甲氧基硅烷、γ-环氧丙氧基丙基甲基二甲氧基硅烷、γ-环氧丙氧基丙基甲基二乙氧基硅烷、γ-环氧丙氧基丙基三乙氧基硅烷、8-环氧丙氧基辛基三甲氧基硅烷、γ-甲基丙烯酰氧基丙基甲基二甲氧基硅烷、γ-甲基丙烯酰氧基丙基三甲氧基硅烷、γ-甲基丙烯酰氧基丙基甲基二乙氧基硅烷、γ-甲基丙烯酰氧基丙基三乙氧基硅烷、γ-丙烯酰氧基丙基三甲氧基硅烷、8-甲基丙烯酰氧基辛基三甲氧基硅烷、N-β(氨基乙基)γ-氨基丙基甲基二甲氧基硅烷、N-β(氨基乙基)γ-氨基丙基三甲氧基硅烷、N-β(氨基乙基)γ-氨基丙基三乙氧基硅烷、γ-氨基丙基三甲氧基硅烷、γ-氨基丙基三乙氧基硅烷、N-苯基-γ-氨基丙基三甲氧基硅烷、γ-巯基丙基三甲氧基硅烷、3-巯基丙基甲基二甲氧基硅烷、3-异氰酸酯丙基三乙氧基硅烷、三甲基硅烷醇、正丙基三甲基硅烷、正丙基三乙基硅烷、对苯乙烯基三甲氧基硅烷、甲基三氯硅烷、甲基二氯硅烷、二甲基二氯硅烷、三甲基氯硅烷、苯基三氯硅烷、二苯基二氯硅烷、乙烯基三氯硅烷、三甲基溴硅烷以及二乙基硅烷等。Specific examples of the organic silicon compound include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, diphenyldimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, diphenyldiethoxysilane, isobutyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri(β-methoxyethoxy)silane, 7-octenyltrimethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, methyl-3,3,3-trifluoropropyldimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltriethoxysilane, 8-glycidoxyoctyltrimethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ- Methacryloxypropyl trimethoxysilane, γ-methacryloxypropyl methyldiethoxysilane, γ-methacryloxypropyl triethoxysilane, γ-acryloxypropyl trimethoxysilane, 8-methacryloxyoctyl trimethoxysilane, N-β (aminoethyl) γ-aminopropyl methyldimethoxysilane, N-β (aminoethyl) γ-aminopropyl trimethoxysilane, N-β (aminoethyl) γ-aminopropyl triethoxysilane, γ-aminopropyl trimethoxysilane, γ-amino Propyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-isocyanatepropyltriethoxysilane, trimethylsilanol, n-propyltrimethylsilane, n-propyltriethylsilane, p-phenylyltrimethoxysilane, methyltrichlorosilane, methyldichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, phenyltrichlorosilane, diphenyldichlorosilane, vinyltrichlorosilane, trimethylbromosilane and diethylsilane, etc.
在颗粒的表面处理中,准备包含颗粒以及水和醇中的至少一种的分散液。在该分散液中加入规定量的式(1)所示的有机硅化合物,同时根据需要添加水来水解有机硅化合物。以此方式进行颗粒的表面处理。该水解根据需要使用酸或碱作为水解用催化剂。此外,也可以根据需要在表面处理前和表面处理后中的至少一者通过离子交换或超滤等来减少杂质。In the surface treatment of particles, a dispersion containing particles and at least one of water and alcohol is prepared. A predetermined amount of the organosilicon compound represented by formula (1) is added to the dispersion, and water is added as needed to hydrolyze the organosilicon compound. The surface treatment of the particles is performed in this way. The hydrolysis uses an acid or a base as a hydrolysis catalyst as needed. In addition, impurities can be reduced by ion exchange or ultrafiltration or the like before and after the surface treatment as needed.
有机硅化合物优选作为Rn-SiO(4-n)/2(固体成分)以0.1质量%~30质量%存在于颗粒中。如果由有机硅化合物对颗粒进行表面处理,则颗粒与基质形成成分的相溶性提高。The organosilicon compound is preferably present in the particles at 0.1 mass % to 30 mass % as R n —SiO (4-n)/2 (solid content). When the particles are surface-treated with the organosilicon compound, the compatibility of the particles with the matrix-forming component is improved.
此处,如果有机硅化合物量小于0.1质量%,则不能充分得到其添加效果。即使有机硅化合物量大于30质量%,不仅颗粒的分散性不会进一步提高,还有可能得不到足够的抗菌性能。有机硅化合物量较优选为1质量%~25质量%,进一步优选为1质量%~20质量%,特别优选为1质量%~15质量%。Here, if the amount of the organosilicon compound is less than 0.1% by mass, the effect of its addition cannot be fully obtained. Even if the amount of the organosilicon compound is greater than 30% by mass, not only will the dispersibility of the particles not be further improved, but sufficient antibacterial performance may not be obtained. The amount of the organosilicon compound is more preferably 1% to 25% by mass, more preferably 1% to 20% by mass, and particularly preferably 1% to 15% by mass.
另外,颗粒的形状不受到特别限定。作为颗粒的形状,例如举出球状、椭球体(橄榄球)状、茧状、金平糖状、链状和骰子状。其中,由于球状颗粒在具有高分散性的同时可以均匀地分散在覆膜中,因此优选。In addition, the shape of the particles is not particularly limited. As the shape of the particles, for example, spherical, ellipsoidal (rugby) shape, cocoon shape, candy shape, chain shape and dice shape are cited. Among them, spherical particles are preferred because they can be evenly dispersed in the coating while having high dispersibility.
[带透明覆膜基材][Substrate with transparent coating]
本实施方式所涉及的带透明覆膜基材包含基材以及在该基材上形成的含有上述颗粒和基质的透明覆膜。基质作为除颗粒以外的固体成分而包含。作为基质,举出来自涂布液的树脂、聚合引发剂以及流平剂等添加剂。具体而言,在以公知方法将涂布液涂布在基材上后,通过进行干燥及紫外线照射,在基材上形成覆膜。在覆膜中,颗粒和基质形成成分的固体成分在涂布液中的比例直接变为覆膜中的颗粒成分和基质的比例。The transparent film-bearing substrate involved in this embodiment includes a substrate and a transparent film containing the above-mentioned particles and a matrix formed on the substrate. The matrix is included as a solid component other than the particles. As the matrix, additives such as resins, polymerization initiators and leveling agents from the coating liquid are cited. Specifically, after the coating liquid is applied to the substrate by a known method, a film is formed on the substrate by drying and ultraviolet irradiation. In the film, the ratio of the solid components of the particles and the matrix forming components in the coating liquid directly becomes the ratio of the particle component and the matrix in the film.
根据其用途,在该透明覆膜与基材之间还可以配置以往已知的硬涂层、防眩光层、高折射率层或导电性层等。作为这些层,还可以组合多个层。例如,在为了将带透明覆膜基材用于显示器而进一步降低带透明覆膜基材的反射率的情况下,使用硬涂层和高折射率层的组合或者硬涂层和防眩光层的组合。According to its use, a previously known hard coating layer, an anti-glare layer, a high refractive index layer or a conductive layer may be arranged between the transparent coating and the substrate. As these layers, a plurality of layers may be combined. For example, in order to further reduce the reflectivity of the transparent coating substrate for use in a display, a combination of a hard coating layer and a high refractive index layer or a combination of a hard coating layer and an anti-glare layer is used.
透明覆膜的膜厚度可以根据用途适当地选择。例如,如果透明覆膜是防反射膜,则透明覆膜的膜厚度优选为80nm~350nm。The film thickness of the transparent coating can be appropriately selected according to the application. For example, if the transparent coating is an antireflection film, the film thickness of the transparent coating is preferably 80 nm to 350 nm.
此处,如果透明覆膜的膜厚度小于80nm,则存在膜的强度和耐擦伤性不足的情况,同时因膜过薄而有时不能得到足够的防反射性能。相反,如果透明覆膜的膜厚度厚于350nm,则有防反射性能降低的情况。此外,在透明覆膜的收缩非常大的情况下,也有可能产生裂纹。该膜厚度较优选为85nm~220nm,进一步优选为90nm~110nm。Here, if the film thickness of the transparent coating is less than 80nm, the strength and scratch resistance of the film may be insufficient, and sufficient anti-reflection performance may not be obtained due to the thin film. On the contrary, if the film thickness of the transparent coating is thicker than 350nm, the anti-reflection performance may be reduced. In addition, cracks may also occur when the shrinkage of the transparent coating is very large. The film thickness is more preferably 85nm to 220nm, and more preferably 90nm to 110nm.
此外,带覆膜基材的反射率优选为2.0%以下,较优选为1.5%以下。Furthermore, the reflectance of the coated substrate is preferably 2.0% or less, more preferably 1.5% or less.
此外,带覆膜基材的雾度优选为3.0%以下,较优选为0.3%以下。The haze of the film-coated substrate is preferably 3.0% or less, more preferably 0.3% or less.
带覆膜基材的透光率优选为85.0%以上。The light transmittance of the film-coated substrate is preferably 85.0% or more.
此处,如果透光率小于85.0%,则在显示装置等中,图像的鲜明度可能变得不足。该透光率较优选为90.0%以上。Here, if the light transmittance is less than 85.0%, the image clarity may be insufficient in a display device, etc. The light transmittance is more preferably 90.0% or more.
覆膜的抗菌性试验按照JIS Z 2801进行。该抗菌活性值优选为2.0以上。如果抗菌活性值为2.0以上,则可以判断为覆膜具有抗菌性。该抗菌活性值较优选为4.0以上。The antibacterial activity test of the film is carried out in accordance with JIS Z 2801. The antibacterial activity value is preferably 2.0 or more. If the antibacterial activity value is 2.0 or more, it can be judged that the film has antibacterial properties. The antibacterial activity value is more preferably 4.0 or more.
覆膜的强度(耐擦伤性)通过使用#0000的钢丝绒(スチールウール)以载荷1000g/cm2实施滑动来进行评价。优选在该滑动次数为至少100次的时间点在膜表面未观察到条纹状的伤痕。对于该耐擦伤性,较优选在滑动次数为500次的时间点未观察到伤痕,进一步优选在滑动次数为1000次的时间点未观察到伤痕。The strength (scratch resistance) of the coating is evaluated by sliding with #0000 steel wool at a load of 1000 g/ cm2 . Preferably, no streak-like scratches are observed on the film surface when the sliding frequency is at least 100 times. For the scratch resistance, it is more preferred that no scratches are observed when the sliding frequency is 500 times, and it is further preferred that no scratches are observed when the sliding frequency is 1000 times.
覆膜的铅笔硬度优选为H以上。此处,如果覆膜的铅笔硬度小于H,则作为防反射膜的硬度不足。该铅笔硬度较优选为2H以上,进一步优选为4H以上。The pencil hardness of the coating is preferably H or higher. Here, if the pencil hardness of the coating is less than H, the hardness as an antireflection film is insufficient. The pencil hardness is more preferably 2H or higher, and further preferably 4H or higher.
作为基材,可以使用公知的基材。基材例如优选为玻璃、聚碳酸酯、丙烯酸树脂、聚对苯二甲酸乙二醇酯(PET)、三乙酰纤维素(TAC)、聚酰亚胺、聚甲基丙烯酸甲酯树脂(PMMA)和环烯烃聚合物(COP)等透明树脂基材。这些基材与由上述涂布液形成的透明覆膜的密合性优异。因此,通过使用这些基材,能够得到硬度和强度等优异的带覆膜基材。因此,可以合适地使用薄基材。基材的厚度不受到特别限制,但优选为10μm~100μm,较优选为20μm~80μm。As a substrate, a known substrate can be used. The substrate is preferably a transparent resin substrate such as glass, polycarbonate, acrylic resin, polyethylene terephthalate (PET), triacetyl cellulose (TAC), polyimide, polymethyl methacrylate resin (PMMA) and cycloolefin polymer (COP). These substrates have excellent adhesion to the transparent coating formed by the above-mentioned coating liquid. Therefore, by using these substrates, a coated substrate with excellent hardness and strength can be obtained. Therefore, a thin substrate can be used appropriately. The thickness of the substrate is not particularly limited, but is preferably 10 μm to 100 μm, more preferably 20 μm to 80 μm.
[颗粒的制造方法][Method for producing pellets]
本实施方式所涉及的颗粒的制造方法包括:制造具有含二氧化硅外壳及其内侧的空腔的第一颗粒的第一工序;以及在第一颗粒上负载抗菌性金属成分的第二工序。The method for producing particles according to the present embodiment includes: a first step of producing first particles having a shell containing silica and a cavity inside the shell; and a second step of supporting an antimicrobial metal component on the first particles.
此处,第一工序的第一颗粒也可以通过以往已知(例如日本特开2001-233611号公报、日本特开2013-226539号公报)的方法制造。第二工序的抗菌性金属成分可以通过作为盐酸盐、硝酸盐、硫酸盐以及乙酸盐这样的金属盐或者金属络合离子的溶液或者金属醇盐的溶液添加而负载在颗粒上。其中,在抗菌性金属成分为银的情况下,较优选使用硝酸银。在抗菌性金属成分为铜、锌和锡的情况下,较优选使用盐酸盐、硝酸盐、硫酸盐和乙酸盐。Here, the first particle of the first process can also be manufactured by the method known in the past (for example Japanese Patent Publication No. 2001-233611, Japanese Patent Publication No. 2013-226539). The antimicrobial metal component of the second process can be loaded on the particle by adding a solution of a metal salt or a metal complex ion such as hydrochloride, nitrate, sulfate and acetate or a solution of a metal alkoxide. Wherein, when the antimicrobial metal component is silver, silver nitrate is more preferably used. When the antimicrobial metal component is copper, zinc and tin, hydrochloride, nitrate, sulfate and acetate are more preferably used.
对于添加量,以使颗粒中的抗菌性金属成分以氧化物为基准最终为0.5质量%~40质量%的方式实施添加。添加时可以分别或同时添加多种抗菌性金属成分。此外,为了提高含量,可以分多次添加抗菌性金属成分。The amount of addition is such that the antimicrobial metal component in the particles is ultimately 0.5 mass % to 40 mass % based on the oxide. Multiple antimicrobial metal components may be added separately or simultaneously. In addition, the antimicrobial metal component may be added multiple times to increase the content.
只要抗菌性金属成分的含量最终成为所期望的含量,添加抗菌性金属成分时的条件就不受到特别限制。然而,第一颗粒的分散液的浓度以固体成分计优选为0.1质量%~10质量%。此外,添加抗菌性金属成分时的pH优选为6~13,较优选为8~10。此处,如果pH小于6,则颗粒会变得不稳定,有凝集的可能。相反,如果pH大于13,则可能发生颗粒自身的溶解,导致抗菌性金属成分的负载不足。此外,添加抗菌性金属成分时的温度优选低于溶剂的沸点。例如,在溶剂为水的情况下,该温度优选低于100℃,较优选为30℃~95℃。As long as the content of the antibacterial metal component eventually becomes the desired content, the conditions for adding the antibacterial metal component are not particularly limited. However, the concentration of the dispersion of the first particles is preferably 0.1% to 10% by mass in terms of solid content. In addition, the pH when the antibacterial metal component is added is preferably 6 to 13, and more preferably 8 to 10. Here, if the pH is less than 6, the particles will become unstable and may agglomerate. On the contrary, if the pH is greater than 13, dissolution of the particles themselves may occur, resulting in insufficient loading of the antibacterial metal component. In addition, the temperature when the antibacterial metal component is added is preferably lower than the boiling point of the solvent. For example, when the solvent is water, the temperature is preferably lower than 100°C, and more preferably 30°C to 95°C.
为了降低碱金属和碱土金属在颗粒中的含量,优选在第二工序后使用离子交换树脂或超滤膜来实施清洗。以氧化物为基准,该碱金属和碱土金属的合计含量优选小于1.0质量%。另外,为了达到该含量,预先使用碱金属和碱土金属较少的原料制造第一颗粒,也可以通过在第一工序中进行离子交换等来降低第一颗粒中的碱金属和碱土金属的含量。此外,在第二工序中,也可以使用包含碱金属和碱土金属的含量较少的抗菌性金属的材料(例如包含抗菌性金属成分的金属醇盐)。此外,也可以组合进行这些措施。In order to reduce the content of alkali metal and alkaline earth metal in the particle, it is preferred to use ion exchange resin or ultrafiltration membrane to implement cleaning after the second process. Based on oxide, the total content of the alkali metal and alkaline earth metal is preferably less than 1.0 mass %. In addition, in order to reach this content, the raw material with less alkali metal and alkaline earth metal is used in advance to manufacture the first particle, and the content of the alkali metal and alkaline earth metal in the first particle can also be reduced by ion exchange in the first process. In addition, in the second process, the material of the antibacterial metal (for example, the metal alkoxide comprising the antibacterial metal component) containing less content of alkali metal and alkaline earth metal can also be used. In addition, these measures can also be combined.
最终得到的颗粒可以作为水分散液来使用,也可以用有机溶剂置换后来使用,此外,也可以使其干燥后作为粉末来使用。The finally obtained particles may be used as an aqueous dispersion, may be used after replacement with an organic solvent, or may be used as a powder after drying.
[覆膜形成用涂布液][Coating liquid for film formation]
本实施方式的颗粒可以适用于覆膜形成用涂布液。该涂布液包含颗粒和基质形成成分。除此之外,该涂布液还可以包含有机溶剂、聚合引发剂、流平剂和表面活性剂等添加剂。The particles of this embodiment can be applied to a coating liquid for film formation. The coating liquid contains particles and a matrix-forming component. In addition, the coating liquid may also contain additives such as an organic solvent, a polymerization initiator, a leveling agent, and a surfactant.
相对于包含的颗粒以及基质形成成分等固体成分的合计量,涂布液中的颗粒的浓度以固体成分计优选为5质量%~95质量%。此处,如果颗粒的浓度小于5质量%,则有可能无法充分降低覆膜的折射率。相反,如果颗粒的浓度大于95质量%,则有在覆膜中产生裂纹的可能,有与基材的密合性不足的可能以及有硬度、强度、透明性和雾度等恶化的可能。该颗粒的浓度较优选为10质量%~85质量%,进一步优选为20质量%~70质量%。Relative to the total amount of solid components such as the particles and matrix-forming components included, the concentration of the particles in the coating solution is preferably 5% to 95% by mass in terms of solid components. Here, if the concentration of the particles is less than 5% by mass, it is possible that the refractive index of the coating film cannot be fully reduced. On the contrary, if the concentration of the particles is greater than 95% by mass, there is the possibility of cracks in the coating film, the possibility of insufficient adhesion to the substrate, and the possibility of deterioration of hardness, strength, transparency, and haze. The concentration of the particles is more preferably 10% to 85% by mass, and more preferably 20% to 70% by mass.
基质形成成分合适地为有机树脂类基质形成成分。作为有机树脂类基质形成成分,例如举出紫外线固化型树脂、热固化型树脂以及热塑性树脂等形成基质的成分。The matrix-forming component is preferably an organic resin matrix-forming component. Examples of the organic resin matrix-forming component include matrix-forming components such as ultraviolet curable resins, thermosetting resins, and thermoplastic resins.
作为紫外线固化型树脂,举出(甲基)丙烯酸类树脂、γ-缩水甘油醚氧类树脂、氨基甲酸酯类树脂以及乙烯基类树脂等。Examples of the ultraviolet curable resin include (meth)acrylic resins, γ-glycidyloxy resins, urethane resins, and vinyl resins.
作为热固化型树脂,举出氨基甲酸酯树脂、三聚氰胺树脂、硅树脂、缩丁醛树脂、反应性硅酮树脂、酚树脂、环氧树脂、不饱和聚酯树脂以及热固化型丙烯酸树脂等。Examples of the thermosetting resin include urethane resin, melamine resin, silicone resin, butyral resin, reactive silicone resin, phenol resin, epoxy resin, unsaturated polyester resin, and thermosetting acrylic resin.
作为热塑性树脂,举出聚酯树脂、聚碳酸酯树脂、聚酰胺树脂、聚苯醚(ポリフェニレンオキサイド)树脂、热塑性丙烯酸树脂、氯乙烯树脂、氟树脂、乙酸乙烯酯树脂以及硅酮橡胶等。Examples of the thermoplastic resin include polyester resin, polycarbonate resin, polyamide resin, polyphenylene ether resin, thermoplastic acrylic resin, vinyl chloride resin, fluororesin, vinyl acetate resin, and silicone rubber.
这些树脂可以是两种以上的共聚物或改性形式,也可以组合使用。此外,这些树脂也可以是乳液树脂、水溶性树脂或亲水性树脂。These resins may be copolymers or modified forms of two or more, or may be used in combination. In addition, these resins may also be emulsion resins, water-soluble resins or hydrophilic resins.
从颗粒的分散性和涂膜容易度的角度来看,形成这些树脂的成分优选为单体或低聚物。The components forming these resins are preferably monomers or oligomers from the viewpoints of particle dispersibility and ease of film coating.
相对于包含的颗粒以及基质形成成分等固体成分的合计量,涂布液中的基质形成成分的浓度以固体成分计优选为5质量%~95质量%。此处,如果基质形成成分的浓度小于5质量%,则难以形成覆膜。此外,即使得到覆膜,也有在覆膜中产生裂纹的可能,有与基材的密合性不足的可能以及有硬度、强度、透明性和雾度等恶化的可能。相反,如果基质形成成分的浓度大于95质量%,则由于颗粒的量少,因此有可能无法充分降低折射率。该基质形成成分的浓度较优选为15质量%~90质量%,进一步优选为30质量%~80质量%。Relative to the total amount of solid components such as the particles and matrix-forming components included, the concentration of the matrix-forming components in the coating solution is preferably 5% to 95% by mass in terms of solid components. Here, if the concentration of the matrix-forming components is less than 5% by mass, it is difficult to form a coating. In addition, even if a coating is obtained, there is also the possibility of cracks in the coating, the possibility of insufficient adhesion to the substrate, and the possibility of deterioration of hardness, strength, transparency and haze. On the contrary, if the concentration of the matrix-forming components is greater than 95% by mass, since the amount of particles is small, it is possible that the refractive index cannot be fully reduced. The concentration of the matrix-forming components is more preferably 15% to 90% by mass, and more preferably 30% to 80% by mass.
作为有机溶剂,使用可以均匀地分散颗粒并且可以溶解或分散基质形成成分和聚合引发剂等添加剂的有机溶剂。其中,优选亲水性溶剂和极性溶剂。作为亲水性溶剂,例如举出醇类、酯类、二醇类和醚类。作为极性溶剂,例如举出酯类和酮类。As the organic solvent, an organic solvent that can uniformly disperse particles and dissolve or disperse additives such as matrix-forming components and polymerization initiators is used. Among them, hydrophilic solvents and polar solvents are preferred. Examples of hydrophilic solvents include alcohols, esters, glycols, and ethers. Examples of polar solvents include esters and ketones.
作为醇类,举出甲醇、乙醇、丙醇、2-丙醇、丁醇、双丙酮醇、糠醇以及四氢糠醇等。Examples of the alcohols include methanol, ethanol, propanol, 2-propanol, butanol, diacetone alcohol, furfuryl alcohol, and tetrahydrofurfuryl alcohol.
作为酯类,举出乙酸甲酯、乙酸乙酯、乙酸异丙酯、乙酸丙酯、乙酸异丁酯、乙酸丁酯、乙酸异戊酯、乙酸戊酯、乙酸3-甲氧基丁酯、乙酸2-乙基丁酯、乙酸环己酯以及乙二醇单乙酸酯(エチレングリコールモノアセテート)等。Examples of the esters include methyl acetate, ethyl acetate, isopropyl acetate, propyl acetate, isobutyl acetate, butyl acetate, isopentyl acetate, pentyl acetate, 3-methoxybutyl acetate, 2-ethylbutyl acetate, cyclohexyl acetate, and ethylene glycol monoacetate.
作为二醇类,举出乙二醇以及己二醇等。Examples of the diols include ethylene glycol and hexylene glycol.
作为醚类,举出二乙醚、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丁醚、乙二醇异丙醚、二乙二醇单甲醚、二乙二醇单乙醚、丙二醇单甲醚、丙二醇单乙醚以及丙二醇单甲醚乙酸酯等。Examples of the ethers include diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol isopropyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, and propylene glycol monomethyl ether acetate.
作为酮类,举出丙酮、甲基乙基酮、甲基异丁基酮、丁基甲基酮、环己酮、甲基环己酮、二丙基酮、甲基戊基酮以及二异丁基酮等。Examples of the ketones include acetone, methyl ethyl ketone, methyl isobutyl ketone, butyl methyl ketone, cyclohexanone, methyl cyclohexanone, dipropyl ketone, methyl amyl ketone, and diisobutyl ketone.
作为极性溶剂,另外举出碳酸二甲酯以及甲苯等。Examples of the polar solvent include dimethyl carbonate and toluene.
这些可以单独使用,也可以将两种以上混合来使用。These may be used alone or in combination of two or more.
作为添加剂,可以任意使用以往可用于形成防反射膜的添加剂。例如,为了促进基质形成成分的聚合以及提高成膜性,使用聚合引发剂或流平剂等。As the additive, any additive that has been conventionally used for forming an antireflection film can be used. For example, a polymerization initiator or a leveling agent is used to promote polymerization of the matrix forming component and improve film-forming properties.
作为聚合引发剂,例如举出双(2,4,6-三甲基苯甲酰基)苯基氧化膦、双(2,6-二甲氧基苯甲酰基)2,4,4-三甲基-戊基氧化膦、2-羟甲基-2-甲基苯基-丙烷-1-酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、1-羟基环己基苯基酮以及2-甲基-1-[4-(甲硫基)苯基]-2-吗啉代丙烷-1-酮。Examples of the polymerization initiator include bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide, bis(2,6-dimethoxybenzoyl)2,4,4-trimethylpentylphosphine oxide, 2-hydroxymethyl-2-methylphenyl-propane-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexylphenyl ketone, and 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane-1-one.
作为流平剂,例如举出丙烯酸类流平剂、硅酮类流平剂和丙烯酸硅酮类流平剂。在这些流平剂中优选使用具有氟基的流平剂。As the leveling agent, for example, acrylic leveling agents, silicone leveling agents, and acrylic silicone leveling agents are mentioned. Among these leveling agents, a leveling agent having a fluorine group is preferably used.
关于这些添加剂在涂布液中的浓度,为了方便,将在覆膜化时作为固体成分包含的物质以基质形成成分而计入,在覆膜化后以基质而计入。Regarding the concentration of these additives in the coating liquid, for convenience, those contained as solid components during film formation are counted as matrix-forming components, and those contained as solid components after film formation are counted as matrix.
涂布液的固体成分浓度(相对于涂布液,将颗粒的固体成分和基质形成成分的固体成分合计后的固体成分的比例)优选为0.1质量%~100质量%。The solid content concentration of the coating liquid (the ratio of the solid content of the particles and the solid content of the matrix-forming component to the coating liquid) is preferably 0.1% by mass to 100% by mass.
此处,在涂布液的固体成分浓度小于0.1质量%的情况下,涂料的浓缩稳定性低,因此难以涂布,有可能难以得到均匀的覆膜。此外,在该情况下,由于雾度或外观变差,因此生产性和制造可靠性等有可能降低。涂布液的固体成分浓度为100质量%意味着涂布液中不存在有机溶剂。涂布液的固体成分浓度较优选为1质量%~50质量%。Here, when the solid content concentration of the coating liquid is less than 0.1% by mass, the concentration stability of the coating is low, so it is difficult to apply, and it may be difficult to obtain a uniform coating. In addition, in this case, due to the deterioration of haze or appearance, productivity and manufacturing reliability may be reduced. The solid content concentration of the coating liquid of 100% by mass means that there is no organic solvent in the coating liquid. The solid content concentration of the coating liquid is more preferably 1% to 50% by mass.
实施例Example
以下说明本实施方式的实施例。Examples of this embodiment are described below.
[实施例1][Example 1]
<第一颗粒的制造(第一工序)><Manufacturing of First Particles (First Step)>
将氧化硅-氧化铝溶胶(日挥触媒化成(株)制造,ファインカタロイドUSBB-120,平均粒径25nm,固体成分浓度23质量%)430g与纯水9.6kg混合,将得到的混合液加热至98℃。在该混合液中添加浓度1质量%的氢氧化钠水溶液,将pH调节至12.5。430 g of silica-alumina sol (manufactured by JGC Catalysts & Chemicals Co., Ltd., Fiberline USBB-120, average particle size 25 nm, solid content 23% by mass) was mixed with 9.6 kg of pure water, and the resulting mixed solution was heated to 98° C. A 1% by mass sodium hydroxide aqueous solution was added to the mixed solution to adjust the pH to 12.5.
在该混合液中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)10.2kg和铝酸钠水溶液(Al2O3浓度1.0质量%)10.2kg。然后,在该混合液(反应液)中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)37.5kg和铝酸钠水溶液(Al2O3浓度1.0质量%)12.5kg。在此期间,将反应液的温度保持在98℃。接着,通过用超滤膜清洗该反应液,得到固体成分浓度3质量%的氧化硅-氧化铝颗粒的分散液。10.2 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass %) and 10.2 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass %) were added to the mixed solution at the same time. Then, 37.5 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass %) and 12.5 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass %) were added to the mixed solution (reaction solution) at the same time. During this period, the temperature of the reaction solution was maintained at 98°C. Next, the reaction solution was washed with an ultrafiltration membrane to obtain a dispersion of silicon oxide-alumina particles having a solid content concentration of 3 mass %.
在该氧化硅-氧化铝颗粒的分散液50kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液10kg。然后,在该分散液中加入浓度10质量%的氢氧化钠水溶液131g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O含量为0.2质量%。A 35.5% by mass concentrated hydrochloric acid was added dropwise to 50 kg of the dispersion of the silica-alumina particles to adjust the pH to 1.0 and to perform a dealumination treatment. The dissolved aluminum salt was separated by an ultrafiltration membrane and washed to obtain 10 kg of a dispersion of silica particles with a solid content concentration of 5% by mass. Then, 131 g of a 10% by mass aqueous sodium hydroxide solution was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The Na 2 O content of the particles was 0.2% by mass.
<抗菌性金属成分的负载(第二工序)><Loading of Antimicrobial Metal Component (Second Step)>
接着,将用纯水稀释为1.5质量%的第一颗粒的水分散液500g调整为30℃,在该水分散液中花费30分钟边搅拌边添加1.0质量%的硝酸银水溶液70.8g,在95℃下实施3小时热处理。将热处理后的水分散液冷却至室温后,通过用超滤膜进行清洗并浓缩,得到固体成分浓度1.5质量%的二氧化硅类颗粒的水分散液。Next, 500 g of the aqueous dispersion of the first particles diluted with pure water to 1.5% by mass was adjusted to 30° C., 70.8 g of a 1.0% by mass silver nitrate aqueous solution was added to the aqueous dispersion while stirring for 30 minutes, and heat treatment was performed at 95° C. for 3 hours. After the heat-treated aqueous dispersion was cooled to room temperature, it was washed with an ultrafiltration membrane and concentrated to obtain an aqueous dispersion of silica particles having a solid content concentration of 1.5% by mass.
接着,对于该二氧化硅类颗粒的水分散液500g,使用阳离子交换树脂(三菱化学(株)制造,ダイヤイオンSK1B)200g实施3小时离子交换后,使用阴离子交换树脂(三菱化学(株)制造,ダイヤイオンSA20A)100g实施3小时离子交换。之后,通过使用阳离子交换树脂(三菱化学(株)制造,ダイヤイオンSK1B)100g在80℃下实施3小时离子交换,制造本实施方式的颗粒的水分散液160g。该分散液的固体成分浓度为5质量%,颗粒的Na2O含量为50ppm。Next, 500 g of the aqueous dispersion of the silica particles was subjected to ion exchange for 3 hours using 200 g of a cation exchange resin (manufactured by Mitsubishi Chemical Corporation, Diyion SK1B), and then subjected to ion exchange for 3 hours using 100 g of anion exchange resin (manufactured by Mitsubishi Chemical Corporation, Diyion SA20A). Thereafter, 160 g of an aqueous dispersion of the particles of the present embodiment was produced by subjecting the dispersion to ion exchange for 3 hours at 80°C using 100 g of a cation exchange resin (manufactured by Mitsubishi Chemical Corporation, Diyion SK1B). The solid content concentration of the dispersion was 5% by mass, and the Na 2 O content of the particles was 50 ppm.
用以下方法对颗粒实施测定。颗粒的各制造工序中的特征和性状如表1所示(对于以下实施例也相同。另外,比较例的特征和性状如表2所示)。The pellets were measured by the following methods. The characteristics and properties of the pellets in each production process are shown in Table 1 (the same applies to the following examples. In addition, the characteristics and properties of the comparative examples are shown in Table 2).
通过图像分析法测定颗粒的物理性质。The physical properties of the particles were determined by image analysis.
具体而言,首先,将颗粒的分散液稀释至0.01质量%后,在电子显微镜用铜元件的胶棉膜(コロジオン膜)上使其干燥。接着,用场发射型透射电子显微镜((株)日立ハイテクノロジーズ制造,HF5000)以100万倍的倍率对由此得到的粉末拍摄照片。对于得到的照片投影图(SEM图像,TEM照片)的任意1000个颗粒,通过以下的方法(1)~方法(4)对各项目进行测定。Specifically, first, the dispersion of particles was diluted to 0.01% by mass and then dried on a collodion film of a copper element for an electron microscope. Then, the powder obtained was photographed at a magnification of 1 million times using a field emission transmission electron microscope (manufactured by Hitachi High-Tech Nologis, HF5000). For any 1,000 particles of the obtained photographic projection (SEM image, TEM photograph), each item was measured by the following methods (1) to (4).
(1)粒径(1) Particle size
从SEM图像的图像处理中求出颗粒面积,根据该面积求出圆当量直径(円相当径)。将该圆当量直径的平均值作为粒径。The particle area was obtained from the image processing of the SEM image, and the circle equivalent diameter (circular equivalent diameter) was obtained from the area. The average value of the circle equivalent diameter was taken as the particle size.
(2)外壳厚度(2) Shell thickness
对于外壳的内侧具有空腔的颗粒,根据TEM照片求出其外壳厚度,将其平均值作为外壳厚度。For particles having a cavity inside the outer shell, the outer shell thickness was determined from the TEM photograph, and the average value was taken as the outer shell thickness.
(3)空隙率(3) Porosity
使用针对外壳的内侧具有空腔的颗粒求出的粒径和在上述(2)中求出的外壳厚度来求出各个颗粒的体积。接着,计算颗粒内部体积占颗粒总体积的比例,将其平均值作为空隙率。The volume of each particle is determined using the particle diameter determined for particles having a cavity inside the shell and the shell thickness determined in (2) above. Next, the ratio of the particle internal volume to the total particle volume is calculated, and the average value is taken as the porosity.
(4)空腔为一个的颗粒相对于全部颗粒的比例(4) The ratio of particles with one cavity to all particles
根据TEM照片测定颗粒内的空腔个数,求出空腔为一个的颗粒相对于全部颗粒的比例。The number of cavities in the particles was measured from the TEM images, and the ratio of particles with one cavity to all particles was determined.
(5)抗菌性金属元素、构成外壳的硅以外的金属元素、碱金属和碱土金属的含量(5) Content of antimicrobial metal elements, metal elements other than silicon constituting the outer shell, alkali metals, and alkaline earth metals
对于颗粒中的抗菌性金属元素(Ag、Cu、Zn、Pb、Sn、Bi、Cd、Cr、Hg、Ni和Co)的含量、构成外壳的硅以外的金属元素(Al、Zr、Ti、Zn、Sn和Sb)、碱金属的含量以及碱土金属的含量,如下进行测定。即,使用氢氟酸溶解颗粒,加热除去氢氟酸后,根据需要加入纯水,由此得到溶液。对得到的溶液,使用ICP电感耦合等离子体发射光谱质谱仪(ICP誘導結合プラズマ発光分光質量分析装置)((株)岛津制造所制造,ICPM-8500)实施测定。The content of antibacterial metal elements (Ag, Cu, Zn, Pb, Sn, Bi, Cd, Cr, Hg, Ni and Co) in the particles, the metal elements other than silicon constituting the shell (Al, Zr, Ti, Zn, Sn and Sb), the content of alkali metals and the content of alkaline earth metals are measured as follows. That is, the particles are dissolved with hydrofluoric acid, and after heating to remove the hydrofluoric acid, pure water is added as needed to obtain a solution. The obtained solution is measured using an ICP inductively coupled plasma emission spectrometer (ICP induction coupling plasma emission spectrometer mass spectrometer) (manufactured by Shimadzu Corporation, ICPM-8500).
(6)二氧化硅含量(6) Silica content
在120℃下将颗粒的分散液干燥12小时,通过使用荧光X射线分析装置((株)日立ハイテクサイエンス制造,EA600VX)对由此得到的粉末进行测定,求出二氧化硅(SiO2)的含量。The particle dispersion was dried at 120° C. for 12 hours, and the powder obtained was measured using a fluorescent X-ray analyzer (manufactured by Hitachi High-Tech Science & Technology Co., Ltd., EA600VX) to determine the content of silicon dioxide (SiO 2 ) therein.
(7)基于He气体吸附法求出的密度(A1)和基于N2气体吸附法求出的密度(B1)(7) Density (A1) obtained by He gas adsorption method and density (B1) obtained by N2 gas adsorption method
将颗粒的分散液用蒸发仪使其干燥后,在105℃下使其干燥。将由此得到的粉末装入池(セル)中,利用干式自动密度计(マイクロメリティックス公司制造,AccuPyc1340TC),使用He气体或N2气体在测定次数10次、气体导入压力134kPa的条件下进行测定。The particle dispersion was dried using an evaporator and then dried at 105° C. The powder obtained was placed in a cell and measured using a dry automatic density meter (manufactured by Micromeritics, AccuPyc1340TC) using He gas or N 2 gas at a gas introduction pressure of 134 kPa and 10 measurements.
(8)400℃热处理品基于He气体吸附法求出的密度(A2);以及密度(A2)与基于N2气体吸附法求出的密度(B2)的比值(A2/B2)(8) Density (A2) of the product heat-treated at 400°C obtained by the He gas adsorption method; and the ratio (A2/B2) of the density (A2) to the density (B2) obtained by the N2 gas adsorption method.
将颗粒的分散液用蒸发仪使其干燥后,在空气中在400℃下进行1小时热处理(烧制)。将由此得到的粉末装入池中,利用干式自动密度计(マイクロメリティックス公司制造,AccuPyc1340TC),使用He气体或N2气体在测定次数10次、气体导入压力134kPa的条件下进行测定,由此求出比值(A2/B2)。The dispersion of particles was dried by an evaporator and then heat treated (fired) at 400°C for 1 hour in air. The powder thus obtained was placed in a cell and measured using a dry automatic density meter (manufactured by Micromeritics, AccuPyc1340TC) using He gas or N2 gas at a gas introduction pressure of 134 kPa and 10 measurements to determine the ratio (A2/B2).
(9)具有官能团的有机化合物(9) Organic compounds with functional groups
对于颗粒中所含的官能团的有无及其种类,通过以下方法求出。The presence or absence and type of functional groups contained in the particles were determined by the following method.
首先,将颗粒的分散液用蒸发仪使其干燥后,在105℃下使其干燥。对于由此得到的粉末,使用傅立叶变换型红外光谱仪(FT-IR)(日本分光(株)制造,FT/IR-6100),利用漫反射法,将波数区域设为700cm-1~4000cm-1,作为检测器使用TGS,将分辨率设为4.0cm-1并将累计次数设为50次,进行测定。通过该测定检出峰,参照有机化合物的光谱数据库SDBS(https://sdbs.db.aist.go.jp(National Institute of Advanced Industrial Scienceand Technology,2021.01))确定官能团。First, the dispersion of the particles was dried with an evaporator and then dried at 105°C. The powder thus obtained was measured using a Fourier transform infrared spectrometer (FT-IR) (manufactured by JASCO Corporation, FT/IR-6100) using a diffuse reflectance method with the wave number range set to 700cm -1 to 4000cm -1 , TGS as a detector, the resolution set to 4.0cm -1 and the cumulative number set to 50 times. The peaks were detected by this measurement, and the functional groups were determined with reference to the spectral database of organic compounds SDBS (https://sdbs.db.aist.go.jp (National Institute of Advanced Industrial Science and Technology, 2021.01)).
然而,对于该颗粒,未观察到由官能团产生的峰。这是由于在其它实施例中未实施基于3-甲基丙烯酰氧基丙基三甲氧基硅烷等有机硅化合物的颗粒表面处理。However, no peaks derived from the functional groups were observed for these particles. This is because the particle surface treatment with an organic silicon compound such as 3-methacryloxypropyltrimethoxysilane was not performed in other examples.
<覆膜形成用涂布液的制造><Manufacturing of coating liquid for forming a coating film>
通过使用超滤膜将颗粒的水分散液160g的溶剂置换为乙醇,得到固体成分浓度5质量%的颗粒的乙醇分散液。该颗粒的Na2O含量为50ppm。The solvent of 160 g of the aqueous dispersion of particles was replaced with ethanol using an ultrafiltration membrane to obtain an ethanol dispersion of particles having a solid content concentration of 5% by mass. The Na 2 O content of the particles was 50 ppm.
通过在该颗粒的乙醇分散液96g中混合基质形成成分和有机溶剂,制造固体成分浓度4质量%的覆膜形成用涂布液。所使用的基质形成成分为:二季戊四醇六丙烯酸酯(共荣公司化学(株)制造,DPE-6A,固体成分浓度100质量%)2.30g、1,6-己二醇二丙烯酸酯(新中村化学(株)制造,A-HD-N,固体成分浓度100质量%)0.58g、拒水性材料用反应性硅油(信越化学(株)制造,X-22-174DX,固体成分浓度100质量%)0.19g、硅酮改性聚氨基甲酸酯丙烯酸酯(日本合成化学工业(株)制造,紫光UT-4314,固体成分浓度30质量%)0.43g以及光聚合引发剂(IGM Resins B.V.制造,Omnirad TPO,固体成分浓度100质量%)0.14g。所使用的有机溶剂为:异丙醇50.2g、甲基异丁基酮30.1g以及异丙氧基乙醇(イソプロピルグリコール)20.1g。A coating liquid for forming a film having a solid content concentration of 4% by mass was prepared by mixing a matrix-forming component and an organic solvent with 96 g of the ethanol dispersion of the particles. The matrix-forming components used were: 2.30 g of dipentaerythritol hexaacrylate (DPE-6A manufactured by Kyoei Chemical Co., Ltd., solid content concentration 100% by mass), 0.58 g of 1,6-hexanediol diacrylate (A-HD-N manufactured by Shin-Nakamura Chemical Co., Ltd., solid content concentration 100% by mass), 0.19 g of reactive silicone oil for water-repellent material (X-22-174DX manufactured by Shin-Etsu Chemical Co., Ltd., solid content concentration 100% by mass), 0.43 g of silicone-modified polyurethane acrylate (Ultraviolet UT-4314 manufactured by Nippon Synthetic Chemical Co., Ltd., solid content concentration 30% by mass), and 0.14 g of a photopolymerization initiator (Omnirad TPO manufactured by IGM Resins B.V., solid content concentration 100% by mass). The organic solvent used was 50.2 g of isopropyl alcohol, 30.1 g of methyl isobutyl ketone, and 20.1 g of isopropoxyethanol.
<带覆膜基材的制造><Manufacturing of Film-Coated Substrate>
在TAC膜(パナック(株)制造,FT-PB80UL-M,厚度80μm,折射率1.51)上通过棒涂法(#18)涂布硬涂涂料(日挥触媒化成(株)制造,ELCOM HP-1004),并将涂布的涂料在80℃下使其干燥120秒。然后,通过照射300mJ/cm2的紫外线使涂布后干燥的涂料固化,由此制造硬涂膜。硬涂膜的膜厚度为8μm。A hard coating material (ELCOM HP-1004 manufactured by JGC Catalysts & Chemicals Co., Ltd.) was applied to a TAC film (FT-PB80UL-M manufactured by Panac Co., Ltd., thickness 80 μm, refractive index 1.51) by a bar coating method (#18), and the applied coating material was dried at 80°C for 120 seconds. Then, the applied and dried coating material was cured by irradiating ultraviolet rays at 300 mJ/ cm2 , thereby manufacturing a hard coating film. The film thickness of the hard coating film was 8 μm.
接着,在制造了硬涂膜的TAC膜上通过棒涂法(#4)涂布所制造的涂布液,并将涂布的涂料在80℃下使其干燥120秒。然后,在N2气氛下,通过照射400mJ/cm2的紫外线使涂料固化,由此制造带覆膜基材。Next, the prepared coating liquid was applied to the TAC film having the hard coating film by bar coating (#4), and the applied coating was dried at 80° C. for 120 seconds. Then, the coating was cured by irradiating 400 mJ/cm 2 of ultraviolet light in a N 2 atmosphere, thereby producing a coated substrate.
对带覆膜基材实施关于以下项目的测定。测定结果如表3所示(以下实施例和比较例也相同)。The following items were measured on the film-coated substrate. The measurement results are shown in Table 3 (the same applies to the following Examples and Comparative Examples).
(10)外观(10) Appearance
通过目视确认得到的带覆膜基材,由此确认有无异物缺陷。The obtained film-coated substrate was visually inspected to check whether there were defects caused by foreign matter.
没有发现异物缺陷:◎No foreign matter defects found: ◎
少量发现异物缺陷:〇A small amount of foreign matter defects were found: 0
大量发现异物缺陷:△A large number of foreign body defects were found: △
整体存在异物缺陷:×Overall foreign body defects: ×
(11)膜厚度、反射率(11) Film thickness and reflectivity
使用椭圆偏振计(エリプソメーター)(ULVAC公司制造,EMS-1)测定带覆膜基材的膜厚度和波长550nm的反射率。The film thickness of the film-coated substrate and the reflectivity at a wavelength of 550 nm were measured using an ellipsometer (EMS-1 manufactured by ULVAC).
(12)雾度、总透光率(12) Haze, total light transmittance
使用雾度计(スガ試験機(株)制造)测定带覆膜基材的雾度和总透光率。The haze and total light transmittance of the film-coated substrate were measured using a haze meter (manufactured by Suga Testing Instruments Co., Ltd.).
(13)抗菌性试验(13) Antibacterial test
抗菌性试验按照JIS Z 2801进行。通过下述式(2)求出抗菌活性值。The antibacterial test was conducted in accordance with JIS Z 2801. The antibacterial activity value was calculated by the following formula (2).
Q=Ut-At····式(2)Q=Ut-At ····Formula (2)
(其中,Q表示抗菌活性值,Ut表示无加工试验片24小时后每1cm2的活菌数的对数值的平均值,At表示抗菌加工试验片24小时后每1cm2的活菌数的对数值的平均值)。(where Q represents the antibacterial activity value, Ut represents the average value of the logarithmic value of the number of viable bacteria per 1 cm2 of the untreated test piece after 24 hours, and At represents the average value of the logarithmic value of the number of viable bacteria per 1 cm2 of the antibacterial treated test piece after 24 hours).
试验菌使用金黄色葡萄球菌(Staphylococcus aureuse NBRC 12732)和大肠杆菌(Escherichia coli NBRC3972)。作为营养,使用1/20浓度的营养肉汤(肉提取物150mg/L+蛋白胨250mg/L)。Staphylococcus aureus (NBRC 12732) and Escherichia coli (NBRC3972) were used as test bacteria, and nutrient broth (meat extract 150 mg/L + peptone 250 mg/L) at a concentration of 1/20 was used as nutrition.
在测定时,将0.4mL菌液分别滴加至切成5cm见方的带覆膜基材和无加工膜上,并用4cm见方的PE膜将其覆盖,由此制造试验片。将试验片上的试验菌在35℃±1℃、相对湿度90%以上的条件下培养24小时。然后,对试验片上的试验菌进行清洗回收后,测定每1cm2的活菌数。During the measurement, 0.4 mL of bacterial solution was dripped onto a 5 cm square substrate with a film and a non-processed film, and then covered with a 4 cm square PE film to prepare a test piece. The test bacteria on the test piece were cultured for 24 hours at 35°C ± 1°C and a relative humidity of 90% or more. Then, the test bacteria on the test piece were washed and recovered, and the number of viable bacteria per 1 cm2 was measured.
(14)耐擦伤性的测定(14) Determination of scratch resistance
使用#0000钢丝绒,以载荷1000g/cm2实施100次滑动。对滑动后的带覆膜基材的表面进行目视观察,按照以下标准进行评价。Using #0000 steel wool, sliding was performed 100 times at a load of 1000 g/cm 2. The surface of the film-coated substrate after sliding was visually observed and evaluated according to the following criteria.
评价标准:Evaluation criteria:
没有发现条纹状伤痕:◎No streak scars were found:◎
少量发现条纹状伤痕:○A few streaky scars were found: ○
大量发现条纹状伤痕:△A large number of stripe-shaped scars were found: △
整个表面都已被刮擦:×The entire surface is scratched: ×
(15)密合性(15) Adhesion
通过在带覆膜基材的表面上用刀以纵横1mm的间隔划出11条平行的伤痕,制造100个方格。将透明胶带(セロファンテープ)粘贴在其上,然后将透明胶带剥离。之后,数出覆膜没有剥离而残留的方格数。通过将该方格数分类为以下3个级别来评价密合性。100 squares were made by using a knife to make 11 parallel scratches at intervals of 1 mm vertically and horizontally on the surface of the film-coated substrate. A cellofilm tape was pasted on it, and then the cellofilm tape was peeled off. After that, the number of squares remaining without peeling off the film was counted. The adhesion was evaluated by classifying the number of squares into the following three levels.
残留方格数为95个以上:◎The number of remaining squares is 95 or more: ◎
残留方格数为90~94个:〇The number of remaining squares is 90 to 94: 0
残留方格数为85~89个:△The number of remaining squares is 85 to 89: △
残留方格数为84个以下:×The number of remaining squares is less than 84: ×
[实施例2][Example 2]
以与实施例1相同的方式得到固体成分浓度5质量%的颗粒的乙醇分散液128g。在其中添加3-甲基丙烯酰氧基丙基三甲氧基硅烷(信越化学工业(株)制造,KBM-503)0.32g,在30℃下进行24小时热处理。之后,用蒸发仪将溶剂置换为甲基异丁基酮(MIBK),由此制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。128 g of an ethanol dispersion of particles having a solid content concentration of 5% by mass was obtained in the same manner as in Example 1. 0.32 g of 3-methacryloxypropyltrimethoxysilane (KBM-503 manufactured by Shin-Etsu Chemical Co., Ltd.) was added thereto, and heat-treated at 30°C for 24 hours. Thereafter, the solvent was replaced with methyl isobutyl ketone (MIBK) using an evaporator, thereby producing an MIBK dispersion of particles having a solid content concentration of 5% by mass. The Na 2 O content of the particles was 50 ppm. Next, a coating solution and a coated substrate were produced in the same manner as in Example 1, except that the MIBK dispersion of particles was used, and various properties were evaluated.
[实施例3][Example 3]
在第二工序中,除了使用硝酸银水溶液7.8g以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2 except that 7.8 g of an aqueous silver nitrate solution was used. The Na 2 O content of the particles was 50 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1 except that a MIBK dispersion of particles was used, and various properties were evaluated.
[实施例4][Example 4]
在第二工序中,除了使用硝酸银水溶液920g以及添加时间为90分钟以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2, except that 920 g of the silver nitrate aqueous solution was used and the addition time was 90 minutes. The Na 2 O content of the particles was 50 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1, except that the MIBK dispersion of particles was used, and various properties were evaluated.
[实施例5][Example 5]
<第一颗粒的制造(第一工序)><Manufacturing of First Particles (First Step)>
将二氧化硅溶胶(日挥触媒化成(株)制造,カタロイドSI-550,平均粒径5nm,SiO2浓度20.5质量%)10g与纯水10.0kg混合,将得到的混合液加热至50℃。在该混合液中添加浓度1质量%的氢氧化钠水溶液,将pH调节至10.5。10 g of silica sol (manufactured by JGC Catalysts & Chemicals Co., Ltd., Catalog SI-550, average particle size 5 nm, SiO2 concentration 20.5 mass %) was mixed with 10.0 kg of pure water, and the resulting mixed solution was heated to 50° C. A 1 mass % sodium hydroxide aqueous solution was added to the mixed solution to adjust the pH to 10.5.
在该混合液中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)7.9kg和铝酸钠水溶液(Al2O3浓度1.0质量%)7.9kg。然后,在该混合液(反应液)中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)51.8kg和铝酸钠水溶液(Al2O3浓度1.0质量%)17.1kg。在此期间,将反应液的温度保持在50℃。接着,通过用超滤膜清洗该反应液,得到固体成分浓度3质量%的氧化硅-氧化铝颗粒的分散液。7.9 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass %) and 7.9 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass %) were added to the mixed solution at the same time. Then, 51.8 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass %) and 17.1 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass %) were added to the mixed solution (reaction solution) at the same time. During this period, the temperature of the reaction solution was maintained at 50°C. Next, the reaction solution was washed with an ultrafiltration membrane to obtain a dispersion of silicon oxide-alumina particles having a solid content concentration of 3 mass %.
在该氧化硅-氧化铝颗粒的分散液50kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液18kg。然后,在该分散液中加入浓度10质量%的氢氧化钠水溶液236g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O含量为0.3质量%。A 35.5% by mass concentrated hydrochloric acid was added dropwise to 50 kg of the dispersion of the silica-alumina particles to adjust the pH to 1.0 and to perform a dealumination treatment. The dissolved aluminum salt was separated by an ultrafiltration membrane and washed to obtain 18 kg of a dispersion of silica particles with a solid content concentration of 5% by mass. Then, 236 g of a 10% by mass aqueous sodium hydroxide solution was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The Na 2 O content of the particles was 0.3% by mass.
在第二工序中,除了使用用纯水稀释为1.5质量%的第一颗粒以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为90ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5% by mass was prepared in the same manner as in Example 2 except that the first particles diluted with pure water to 1.5% by mass were used. The Na 2 O content of the particles was 90 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1 except that the MIBK dispersion of particles was used, and various properties were evaluated.
[实施例6][Example 6]
<第一颗粒的制造(第一工序)><Manufacturing of First Particles (First Step)>
将二氧化硅溶胶(日挥触媒化成(株)制造,カタロイドSI-50,平均粒径25nm,SiO2浓度48质量%)10g与纯水5.0kg混合,将得到的混合液加热至98℃。在该混合液中添加浓度1质量%的氢氧化钠水溶液,将pH调节至12.5。10 g of silica sol (manufactured by JGC Catalysts & Chemicals Co., Ltd., Catalog SI-50, average particle size 25 nm, SiO2 concentration 48 mass %) was mixed with 5.0 kg of pure water, and the resulting mixed solution was heated to 98° C. A 1 mass % sodium hydroxide aqueous solution was added to the mixed solution to adjust the pH to 12.5.
在该混合液中同时添加硅酸钠水溶液(SiO2浓度1.5质量%)65kg和铝酸钠水溶液(Al2O3浓度0.5质量%)65kg。然后,在该混合液(反应液)中同时添加硅酸钠水溶液(SiO2浓度1.5质量%)37kg和铝酸钠水溶液(Al2O3浓度0.5质量%)12kg。在此期间,将反应液的温度保持在98℃。接着,通过用超滤膜清洗该反应液,得到固体成分浓度3质量%的氧化硅-氧化铝颗粒的分散液。65 kg of sodium silicate aqueous solution (SiO 2 concentration 1.5 mass%) and 65 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 0.5 mass%) were added to the mixed solution at the same time. Then, 37 kg of sodium silicate aqueous solution (SiO 2 concentration 1.5 mass%) and 12 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 0.5 mass%) were added to the mixed solution (reaction solution) at the same time. During this period, the temperature of the reaction solution was maintained at 98°C. Next, the reaction solution was washed with an ultrafiltration membrane to obtain a dispersion of silicon oxide-alumina particles having a solid content concentration of 3 mass%.
在该氧化硅-氧化铝颗粒的分散液50kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液5kg。然后,在该分散液中加入浓度10质量%的氢氧化钠水溶液66g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O含量为0.2质量%。A 35.5% by mass concentrated hydrochloric acid was added dropwise to 50 kg of the dispersion of the silica-alumina particles to adjust the pH to 1.0 and to perform a dealumination treatment. The dissolved aluminum salt was separated by an ultrafiltration membrane and washed to obtain 5 kg of a dispersion of silica particles with a solid content concentration of 5% by mass. Then, 66 g of a 10% by mass aqueous sodium hydroxide solution was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The Na 2 O content of the particles was 0.2% by mass.
在第二工序中,除了使用用纯水稀释为1.5质量%的第一颗粒以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为30ppm。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2 except that the first particles diluted with pure water to 1.5 mass % were used. The Na 2 O content of the particles was 30 ppm.
<涂布液和带覆膜基材的制造><Manufacturing of coating liquid and film-coated substrate>
通过在颗粒的MIBK分散液32g中混合基质形成成分和有机溶剂,得到固体成分浓度4质量%的涂布液。所使用的基质形成成分为:二季戊四醇六丙烯酸酯4.61g、1,6-己二醇二丙烯酸酯1.15g、拒水性材料用反应性硅油0.38g、硅酮改性聚氨基甲酸酯丙烯酸酯0.85g以及光聚合引发剂0.29g。所使用的有机溶剂为:异丙醇80.4g、甲基异丁基酮48.2g以及异丙氧基乙醇32.1g。接着,除了使用该涂布液以外,以与实施例1相同的方式制造带覆膜基材,评价各特性。A coating solution with a solid content concentration of 4% by mass was obtained by mixing a matrix-forming component and an organic solvent in 32 g of a MIBK dispersion of particles. The matrix-forming components used were: 4.61 g of dipentaerythritol hexaacrylate, 1.15 g of 1,6-hexanediol diacrylate, 0.38 g of reactive silicone oil for water-repellent material, 0.85 g of silicone-modified polyurethane acrylate, and 0.29 g of a photopolymerization initiator. The organic solvent used was: 80.4 g of isopropyl alcohol, 48.2 g of methyl isobutyl ketone, and 32.1 g of isopropoxyethanol. Next, a coated substrate was prepared in the same manner as in Example 1, except that the coating solution was used, and various properties were evaluated.
[实施例7][Example 7]
<第一颗粒的制造(第一工序)><Manufacturing of First Particles (First Step)>
将氧化硅-氧化铝溶胶(日挥触媒化成(株)制造,ファインカタロイドUSBB-120)313g与纯水29.7kg混合,将得到的混合液加热至98℃。在该混合液中添加浓度1质量%的氢氧化钠水溶液,将pH调节至12.5。313 g of silica-alumina sol (Finka Taloid USBB-120 manufactured by JGC Catalysts & Chemicals Co., Ltd.) was mixed with 29.7 kg of pure water, and the resulting mixed solution was heated to 98° C. A 1 mass % sodium hydroxide aqueous solution was added to the mixed solution to adjust the pH to 12.5.
在该混合液中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)30.0kg和铝酸钠水溶液(Al2O3浓度1.0质量%)30.0kg。然后,在该混合液(反应液)中同时添加硅酸钠水溶液(SiO2浓度1.5质量%)70.0kg和铝酸钠水溶液(Al2O3浓度0.5质量%)23.3kg。在此期间,将反应液的温度保持在98℃。接着,通过用超滤膜清洗该反应液,得到固体成分浓度3质量%的氧化硅-氧化铝颗粒的分散液。30.0 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass %) and 30.0 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass %) were added to the mixed solution at the same time. Then, 70.0 kg of sodium silicate aqueous solution (SiO 2 concentration 1.5 mass %) and 23.3 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 0.5 mass %) were added to the mixed solution (reaction solution) at the same time. During this period, the temperature of the reaction solution was maintained at 98°C. Next, the reaction solution was washed with an ultrafiltration membrane to obtain a dispersion of silicon oxide-alumina particles having a solid content concentration of 3 mass %.
在该氧化硅-氧化铝颗粒的分散液50kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液9kg。然后,在该分散液中加入浓度10质量%的氢氧化钠水溶液118g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O含量为0.1质量%。A 35.5% by mass concentrated hydrochloric acid was added dropwise to 50 kg of the dispersion of the silica-alumina particles to adjust the pH to 1.0 and to perform a dealumination treatment. The dissolved aluminum salt was separated by an ultrafiltration membrane and washed to obtain 9 kg of a dispersion of silica particles with a solid content concentration of 5% by mass. Then, 118 g of a 10% by mass aqueous sodium hydroxide solution was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The Na 2 O content of the particles was 0.1% by mass.
在第二工序中,除了使用用纯水稀释为1.5质量%的第一颗粒以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为30ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5% by mass was prepared in the same manner as in Example 2 except that the first particles diluted with pure water to 1.5% by mass were used. The Na 2 O content of the particles was 30 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1 except that the MIBK dispersion of particles was used, and various properties were evaluated.
[实施例8][Example 8]
<第一颗粒的制造(第一工序)><Manufacturing of First Particles (First Step)>
将二氧化硅溶胶(日挥触媒化成(株)制造,カタロイドSI-50)63g与纯水29.9kg混合,将得到的混合液加热至98℃。在该混合液中添加浓度1质量%的氢氧化钠水溶液,将pH调节至12.5。63 g of silica sol (CATALYDO SI-50 manufactured by JGC Catalysts & Chemicals Co., Ltd.) and 29.9 kg of pure water were mixed and the resulting mixed solution was heated to 98° C. A 1% by mass sodium hydroxide aqueous solution was added to the mixed solution to adjust the pH to 12.5.
在该混合液中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)10.7kg和铝酸钠水溶液(Al2O3浓度1.0质量%)10.7kg。然后,在该混合液(反应液)中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)86kg和铝酸钠水溶液(Al2O3浓度1.0质量%)28.6kg。在此期间,将反应液的温度保持在98℃。接着,通过用超滤膜清洗该反应液,得到固体成分浓度3质量%的氧化硅-氧化铝颗粒的分散液。10.7 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass %) and 10.7 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass %) were added to the mixed solution at the same time. Then, 86 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass %) and 28.6 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass %) were added to the mixed solution (reaction solution) at the same time. During this period, the temperature of the reaction solution was maintained at 98°C. Next, the reaction solution was washed with an ultrafiltration membrane to obtain a dispersion of silicon oxide-alumina particles having a solid content concentration of 3 mass %.
在该氧化硅-氧化铝颗粒的分散液40kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液13kg。然后,在该分散液中添加浓度10质量%的氢氧化钠水溶液170g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O含量为0.2质量%。A 35.5% by mass concentrated hydrochloric acid was added dropwise to 40 kg of the dispersion of the silica-alumina particles to adjust the pH to 1.0 and to perform a dealumination treatment. The dissolved aluminum salt was separated by an ultrafiltration membrane and washed to obtain 13 kg of a dispersion of silica particles with a solid content concentration of 5% by mass. Then, 170 g of a 10% by mass aqueous sodium hydroxide solution was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The Na 2 O content of the particles was 0.2% by mass.
在第二工序中,除了使用用纯水稀释为1.5质量%的第一颗粒以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为0.018质量%。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2 except that the first particles diluted with pure water to 1.5 mass % were used. The Na 2 O content of the particles was 0.018 mass %.
<涂布液和带覆膜基材的制造><Manufacturing of coating liquid and film-coated substrate>
通过在颗粒的MIBK分散液56g中混合基质形成成分和有机溶剂,制造固体成分浓度4质量%的涂布液。所使用的基质形成成分为:二季戊四醇六丙烯酸酯3.74g、1,6-己二醇二丙烯酸酯0.94g、拒水性材料用反应性硅油0.31g、硅酮改性聚氨基甲酸酯丙烯酸酯0.69g以及光聚合引发剂0.23g。所使用的有机溶剂为:异丙醇69.0g、甲基异丁基酮41.4g以及异丙氧基乙醇27.6g。接着,除了使用该涂布液以外,以与实施例1相同的方式制造带覆膜基材,评价各特性。A coating solution with a solid content concentration of 4% by mass was prepared by mixing a matrix-forming component and an organic solvent in 56 g of a MIBK dispersion of particles. The matrix-forming components used were: 3.74 g of dipentaerythritol hexaacrylate, 0.94 g of 1,6-hexanediol diacrylate, 0.31 g of reactive silicone oil for water-repellent materials, 0.69 g of silicone-modified polyurethane acrylate, and 0.23 g of a photopolymerization initiator. The organic solvents used were: 69.0 g of isopropyl alcohol, 41.4 g of methyl isobutyl ketone, and 27.6 g of isopropoxyethanol. Next, a coated substrate was prepared in the same manner as in Example 1, except that the coating solution was used, and each property was evaluated.
[实施例9][Example 9]
<第一颗粒的制造(第一工序)><Manufacturing of First Particles (First Step)>
将二氧化硅溶胶(日挥触媒化成(株)制造,カタロイドSI-50)52g与纯水4.9kg混合,将得到的混合液加热至98℃。在该混合液中添加浓度1质量%的氢氧化钠水溶液,将pH调节至12.5。52 g of silica sol (CATALYDO SI-50 manufactured by JGC Catalysts & Chemicals Co., Ltd.) and 4.9 kg of pure water were mixed and the resulting mixed solution was heated to 98° C. A 1% by mass sodium hydroxide aqueous solution was added to the mixed solution to adjust the pH to 12.5.
在该混合液中同时添加硅酸钠水溶液(SiO2浓度1.0质量%)77kg和铝酸钠水溶液(Al2O3浓度0.3质量%)86kg。然后,在该混合液(反应液)中同时添加硅酸钠水溶液(SiO2浓度1.0质量%)92kg和铝酸钠水溶液(Al2O3浓度0.3质量%)34kg。在此期间,将反应液的温度保持在98℃。接着,通过用超滤膜清洗该反应液,得到固体成分浓度3质量%的氧化硅-氧化铝颗粒的分散液。77 kg of sodium silicate aqueous solution (SiO 2 concentration 1.0 mass %) and 86 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 0.3 mass %) were added to the mixed solution at the same time. Then, 92 kg of sodium silicate aqueous solution (SiO 2 concentration 1.0 mass %) and 34 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 0.3 mass %) were added to the mixed solution (reaction solution) at the same time. During this period, the temperature of the reaction solution was maintained at 98°C. Next, the reaction solution was washed with an ultrafiltration membrane to obtain a dispersion of silicon oxide-alumina particles having a solid content concentration of 3 mass %.
在该氧化硅-氧化铝颗粒的分散液50kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液9kg。然后,在该分散液中添加浓度10质量%的氢氧化钠水溶液118g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O含量为0.2质量%。A 35.5% by mass concentrated hydrochloric acid was added dropwise to 50 kg of the dispersion of the silica-alumina particles to adjust the pH to 1.0 and to perform a dealumination treatment. The dissolved aluminum salt was separated by an ultrafiltration membrane and washed to obtain 9 kg of a dispersion of silica particles with a solid content concentration of 5% by mass. Then, 118 g of a 10% by mass aqueous sodium hydroxide solution was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The Na 2 O content of the particles was 0.2% by mass.
在第二工序中,除了使用用纯水稀释为1.5质量%的第一颗粒以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为40ppm。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2 except that the first particles diluted with pure water to 1.5 mass % were used. The Na 2 O content of the particles was 40 ppm.
<涂布液和带覆膜基材的制造><Manufacturing of coating liquid and film-coated substrate>
通过在颗粒的MIBK分散液64g中混合基质形成成分和有机溶剂,制造固体成分浓度4质量%的涂布液。所使用的基质形成成分为:二季戊四醇六丙烯酸酯3.46g、1,6-己二醇二丙烯酸酯0.86g、拒水性材料用反应性硅油0.29g、硅酮改性聚氨基甲酸酯丙烯酸酯0.64g以及光聚合引发剂0.22g。所使用的有机溶剂为:异丙醇65.3g、甲基异丁基酮39.2g以及异丙氧基乙醇26.1g。接着,除了使用该涂布液以外,以与实施例1相同的方式制造带覆膜基材,评价各特性。A coating solution with a solid content concentration of 4% by mass was prepared by mixing a matrix-forming component and an organic solvent in 64 g of a MIBK dispersion of particles. The matrix-forming components used were: 3.46 g of dipentaerythritol hexaacrylate, 0.86 g of 1,6-hexanediol diacrylate, 0.29 g of reactive silicone oil for water-repellent material, 0.64 g of silicone-modified polyurethane acrylate, and 0.22 g of a photopolymerization initiator. The organic solvent used was: 65.3 g of isopropyl alcohol, 39.2 g of methyl isobutyl ketone, and 26.1 g of isopropoxyethanol. Next, a coated substrate was prepared in the same manner as in Example 1, except that the coating solution was used, and each property was evaluated.
[实施例10][Example 10]
在第二工序中,使用阳离子交换树脂100g对二氧化硅类颗粒的水分散液500g进行3小时离子交换。然而,之后并未实施使用阴离子交换树脂进行离子交换且并未实施使用阳离子交换树脂再次进行离子交换。除此之外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为0.09质量%。接着,除了使用颗粒的MIBK分散液以外,以与实施例2相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, 500 g of the aqueous dispersion of silica particles was subjected to ion exchange for 3 hours using 100 g of a cation exchange resin. However, ion exchange was not performed using an anion exchange resin and ion exchange was not performed again using a cation exchange resin. In addition, a MIBK dispersion of particles having a solid content concentration of 5% by mass was prepared in the same manner as in Example 2. The Na 2 O content of the particles was 0.09% by mass. Next, a coating solution and a coated substrate were prepared in the same manner as in Example 2 except that the MIBK dispersion of particles was used, and each property was evaluated.
[实施例11][Example 11]
在第二工序中,除了使用硝酸银水溶液42.5g以外,以与实施例1相同的方式得到颗粒的水分散液。该颗粒的Na2O含量为60ppm。然后,除了在以与实施例1相同的方式制造的固体成分浓度5质量%的颗粒的乙醇分散液中添加3-甲基丙烯酰氧基丙基三甲氧基硅烷1.92g以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, an aqueous dispersion of particles was obtained in the same manner as in Example 1 except that 42.5 g of an aqueous silver nitrate solution was used. The Na 2 O content of the particles was 60 ppm. Then, a MIBK dispersion of particles having a solid content concentration of 5% by mass was prepared in the same manner as in Example 2 except that 1.92 g of 3-methacryloxypropyltrimethoxysilane was added to the ethanol dispersion of particles having a solid content concentration of 5% by mass prepared in the same manner as in Example 1. The Na 2 O content of the particles was 50 ppm. Next, a coating liquid and a coated substrate were prepared in the same manner as in Example 1 except that the MIBK dispersion of particles was used, and various properties were evaluated.
[实施例12][Example 12]
在以与实施例1相同的方式制造的氧化硅-氧化铝颗粒的分散液50kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。将溶解的铝盐用超滤膜分离,实施清洗后,再次滴加浓度35.5质量%的浓盐酸,使pH为0.3,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液10kg。然后,在该分散液中加入浓度10质量%的氢氧化钠水溶液131g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O含量为0.2质量%,Al2O3含量为0.00质量%。To 50 kg of a dispersion of silicon oxide-alumina particles prepared in the same manner as in Example 1, concentrated hydrochloric acid at a concentration of 35.5% by mass was added dropwise to adjust the pH to 1.0, and a dealumination treatment was performed. The dissolved aluminum salt was separated with an ultrafiltration membrane, and after washing, concentrated hydrochloric acid at a concentration of 35.5% by mass was added dropwise again to adjust the pH to 0.3, and a dealumination treatment was performed. By separating the dissolved aluminum salt with an ultrafiltration membrane and washing, 10 kg of a dispersion of silicon dioxide particles with a solid content concentration of 5% by mass was obtained. Then, 131 g of a sodium hydroxide aqueous solution with a concentration of 10% by mass was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The particles had a Na 2 O content of 0.2% by mass and an Al 2 O 3 content of 0.00% by mass.
在第二工序中,除了在用纯水稀释为1.5质量%的第一颗粒中添加硝酸银水溶液14.2g以外,以与实施例1相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为30ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5% by mass was prepared in the same manner as in Example 1, except that 14.2 g of an aqueous silver nitrate solution was added to the first particles diluted to 1.5% by mass with pure water. The Na 2 O content of the particles was 30 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1, except that the MIBK dispersion of particles was used, and various properties were evaluated.
[实施例13][Example 13]
在第二工序中,除了代替硝酸银水溶液而使用硝酸铜水溶液132.8g以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2, except that 132.8 g of a copper nitrate aqueous solution was used instead of the silver nitrate aqueous solution. The Na 2 O content of the particles was 50 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1, except that a MIBK dispersion of particles was used, and various properties were evaluated.
[实施例14][Example 14]
在第二工序中,除了代替硝酸银水溶液而使用硝酸锌水溶液130.3g以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2, except that 130.3 g of a zinc nitrate aqueous solution was used instead of the silver nitrate aqueous solution. The Na 2 O content of the particles was 50 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1, except that a MIBK dispersion of particles was used, and various properties were evaluated.
[实施例15][Example 15]
<涂布液和带覆膜基材的制造><Manufacturing of coating liquid and film-coated substrate>
通过在由实施例9制造的颗粒的MIBK分散液64g中混合基质形成成分和有机溶剂,制造固体成分浓度4质量%的涂布液。所使用的基质形成成分为:二季戊四醇六丙烯酸酯3.11g、1,6-己二醇二丙烯酸酯0.77g、氟类树脂(ダイキン工業(株)制造,オプツールDAC-HP,固体成分浓度20质量%)2.16g、氟类添加剂(DIC(株)制造,メガファックF477,有效成分100%)0.48g以及光聚合引发剂0.22g。所使用的有机溶剂为:异丙醇65.3g、甲基异丁基酮39.2g以及异丙氧基乙醇24.8g。接着,除了使用该涂布液以外,以与实施例1相同的方式制造带覆膜基材,评价各特性。A coating liquid having a solid content concentration of 4% by mass was prepared by mixing a matrix-forming component and an organic solvent in 64 g of the MIBK dispersion of particles prepared in Example 9. The matrix-forming components used were: 3.11 g of dipentaerythritol hexaacrylate, 0.77 g of 1,6-hexanediol diacrylate, 2.16 g of a fluorine-based resin (manufactured by DIC Corporation, Optur DAC-HP, solid content concentration 20% by mass), 0.48 g of a fluorine-based additive (manufactured by DIC Corporation, Megaphage F477, active ingredient 100%), and 0.22 g of a photopolymerization initiator. The organic solvent used was: 65.3 g of isopropyl alcohol, 39.2 g of methyl isobutyl ketone, and 24.8 g of isopropoxyethanol. Next, a coated substrate was prepared in the same manner as in Example 1 except that this coating liquid was used, and various properties were evaluated.
[实施例16][Example 16]
<高折射率层形成用涂布液的制造><Manufacturing of coating liquid for forming high refractive index layer>
通过在二氧化钛类溶胶(日挥触媒化成(株)制造,ELCOM V-9108,粒径15nm,固体成分浓度30.5质量%)26g中混合基质形成成分和有机溶剂,得到固体成分浓度5质量%的高折射率层形成用涂布液。所使用的基质形成成分为:二季戊四醇六丙烯酸酯1.44g、1,6-己二醇二丙烯酸酯0.36g以及光聚合引发剂0.1g。所使用的有机溶剂为丙二醇单甲醚172g。A coating liquid for forming a high refractive index layer having a solid content concentration of 5% by mass was obtained by mixing a matrix-forming component and an organic solvent in 26 g of a titanium dioxide-based sol (manufactured by JGC Catalysts & Chemicals Co., Ltd., ELCOM V-9108, particle size 15 nm, solid content concentration 30.5% by mass). The matrix-forming component used was 1.44 g of dipentaerythritol hexaacrylate, 0.36 g of 1,6-hexanediol diacrylate, and 0.1 g of a photopolymerization initiator. The organic solvent used was 172 g of propylene glycol monomethyl ether.
<带覆膜基材的制造><Manufacturing of Film-Coated Substrate>
在以与实施例1相同的方式制造的具有硬涂膜的TAC膜的硬涂层上通过棒涂法(#8)涂布上述高折射率层形成用涂布液,并将涂布的涂料在80℃下使其干燥120秒。然后,通过照射1200mJ/cm2的紫外线使涂布后干燥的涂料固化,由此在硬涂层上制造高折射率层。高折射率层的膜厚度为220nm。The coating liquid for forming a high refractive index layer was applied by a bar coating method (#8) on the hard coating layer of the TAC film having a hard coating film produced in the same manner as in Example 1, and the applied coating was dried at 80° C. for 120 seconds. Then, the dried coating after application was cured by irradiating 1200 mJ/cm 2 of ultraviolet rays, thereby producing a high refractive index layer on the hard coating layer. The film thickness of the high refractive index layer was 220 nm.
接着,在具有高折射率层的TAC膜的高折射率层上通过棒涂法(#4)涂布由实施例9制造的涂布液,并将涂布的涂料在80℃下使其干燥120秒。之后,在N2气氛下,通过照射400mJ/cm2的紫外线使涂料固化,由此制造带覆膜基材,评价各特性。Next, the coating liquid prepared in Example 9 was applied to the high refractive index layer of the TAC film having a high refractive index layer by a bar coating method (#4), and the applied coating was dried at 80° C. for 120 seconds. Thereafter, the coating was cured by irradiating 400 mJ/cm 2 of ultraviolet rays in a N 2 atmosphere to prepare a coated substrate, and various properties were evaluated.
[实施例17][Example 17]
<防眩光层形成用涂布液的制造><Manufacturing of Anti-glare Layer-Forming Coating Liquid>
通过在二氧化硅粉末(日挥触媒化成(株)制造,二氧化硅微珠P-500)10g中混合基质形成成分和有机溶剂,得到固体成分浓度35质量%的防眩光层形成用涂布液。所使用的基质形成成分为:二季戊四醇六丙烯酸酯30.2g、1,6-己二醇二丙烯酸酯7.6g以及光聚合引发剂1.9g。所使用的有机溶剂为丙二醇单甲醚78.2g。A coating liquid for forming an anti-glare layer having a solid content concentration of 35% by mass was obtained by mixing a matrix-forming component and an organic solvent in 10 g of silica powder (manufactured by JGC Catalysts & Chemicals Co., Ltd., silica microbeads P-500). The matrix-forming component used was 30.2 g of dipentaerythritol hexaacrylate, 7.6 g of 1,6-hexanediol diacrylate, and 1.9 g of a photopolymerization initiator. The organic solvent used was 78.2 g of propylene glycol monomethyl ether.
<带覆膜基材(17)的制造><Manufacturing of coated substrate (17)>
在以与实施例1相同的方式制造的具有硬涂膜的TAC膜的硬涂层上通过棒涂法(#9)涂布上述防眩光层形成用涂布液,并将涂布的涂料在80℃下使其干燥120秒。然后,通过照射800mJ/cm2的紫外线使涂布后干燥的涂料固化,由此在硬涂层上制造防眩光层。The anti-glare layer-forming coating liquid was applied by a bar coating method (#9) on the hard coating layer of the TAC film having a hard coating film produced in the same manner as in Example 1, and the applied coating was dried at 80° C. for 120 seconds. Then, the applied and dried coating was cured by irradiating ultraviolet rays at 800 mJ/cm 2 , thereby producing an anti-glare layer on the hard coating layer.
接着,在具有防眩光层的TAC膜的防眩光层上通过棒涂法(#4)涂布由实施例9制造的涂布液,并将涂布的涂料在80℃下使其干燥120秒。之后,在N2气氛下,通过照射400mJ/cm2的紫外线使涂料固化,由此制造带覆膜基材,评价各特性。Next, the coating solution prepared in Example 9 was applied to the anti-glare layer of the TAC film having an anti-glare layer by a bar coating method (#4), and the applied coating was dried at 80° C. for 120 seconds. Thereafter, the coating was cured by irradiating 400 mJ/cm 2 of ultraviolet light in a N 2 atmosphere to prepare a coated substrate, and various properties were evaluated.
[比较例1][Comparative Example 1]
在第二工序中,除了未使用硝酸银水溶液以及在颗粒的乙醇分散液128g中添加3-甲基丙烯酰氧基丙基三甲氧基硅烷0.34g以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2, except that the silver nitrate aqueous solution was not used and 0.34 g of 3-methacryloxypropyltrimethoxysilane was added to 128 g of the ethanol dispersion of particles. The Na 2 O content of the particles was 50 ppm. Next, a coating liquid and a coated substrate were prepared in the same manner as in Example 1, except that the MIBK dispersion of particles was used, and various properties were evaluated.
[比较例2][Comparative Example 2]
通过将二氧化硅溶胶(日挥触媒化成(株)制造,カタロイドSI-45P,粒径60nm,固体成分浓度40.5质量%)用纯水稀释,得到固体成分浓度5质量%的二氧化硅溶胶10kg。然后,在该二氧化硅溶胶中添加浓度10质量%的氢氧化钠水溶液131g,通过在高压釜中进行195℃、24小时热处理,得到第一二氧化硅类颗粒的水分散液。该二氧化硅类颗粒的Na2O浓度为0.2质量%。另外,该二氧化硅类颗粒为内部没有空腔的所谓“实心颗粒”。Silica sol (produced by JGC Catalysts & Chemicals Co., Ltd., Catalog SI-45P, particle size 60 nm, solid content concentration 40.5 mass %) was diluted with pure water to obtain 10 kg of silica sol having a solid content concentration of 5 mass %. Then, 131 g of a sodium hydroxide aqueous solution having a concentration of 10 mass % was added to the silica sol, and heat-treated in an autoclave at 195° C. for 24 hours to obtain an aqueous dispersion of first silica particles. The Na 2 O concentration of the silica particles was 0.2 mass %. The silica particles were so-called "solid particles" having no cavities inside.
在第二工序中,除了使用用纯水稀释为1.5质量%的第一二氧化硅类颗粒以外,以与实施例2相同的方式制造固体成分浓度5质量%的二氧化硅类颗粒的MIBK分散液。该颗粒的Na2O含量为80ppm。接着,除了使用二氧化硅类颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of silica particles having a solid content concentration of 5% by mass was prepared in the same manner as in Example 2, except that the first silica particles diluted with pure water to 1.5% by mass were used. The Na 2 O content of the particles was 80 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1, except that the MIBK dispersion of silica particles was used, and various properties were evaluated.
[比较例3][Comparative Example 3]
<银纳米颗粒的制造><Production of Silver Nanoparticles>
在30质量%的柠檬酸钠水溶液729g中,一边鼓入氮气一边添加25质量%的硫酸铁(II)65g。实施搅拌30分钟后,在其中一次性添加10质量%的硝酸银24g,实施搅拌6小时。在5000rpm下实施10分钟离心分离,回收沉淀物,将回收的沉淀物用超声波使其悬浮在纯水270g中,由此得到银纳米颗粒的水分散液。然后,通过使用超滤膜将银纳米颗粒的水分散液200g的溶剂置换为IPA,制造固体成分浓度5.0质量%的银纳米颗粒的IPA分散液。该银纳米颗粒的粒径为10nm,Na2O浓度为0ppm。另外,表2所示的颗粒性状是将比较例1中制造的颗粒和银纳米颗粒以质量比95.4:4.6混合时的性状。然而,对于外壳的厚度和空隙率的测定,仅以外壳的内侧具有空腔的颗粒为对象。另外,对在比较例1中制造的颗粒和银纳米颗粒的混合比进行调整,以使混合品的表观空隙率和抗菌性金属量与实施例2的颗粒相当。65 g of 25% iron (II) sulfate was added to 729 g of 30% sodium citrate aqueous solution while nitrogen was blown in. After stirring for 30 minutes, 24 g of 10% silver nitrate was added at once and stirred for 6 hours. Centrifugation was performed at 5000 rpm for 10 minutes to recover the precipitate, and the recovered precipitate was suspended in 270 g of pure water by ultrasonic wave to obtain an aqueous dispersion of silver nanoparticles. Then, the solvent of 200 g of the aqueous dispersion of silver nanoparticles was replaced with IPA by using an ultrafiltration membrane to prepare an IPA dispersion of silver nanoparticles with a solid content concentration of 5.0% by mass. The particle size of the silver nanoparticles was 10 nm and the Na 2 O concentration was 0 ppm. In addition, the particle properties shown in Table 2 are the properties when the particles manufactured in Comparative Example 1 and the silver nanoparticles are mixed at a mass ratio of 95.4:4.6. However, for the determination of the thickness and porosity of the shell, only the particles having cavities on the inner side of the shell are used as the object. In addition, the mixing ratio of the particles produced in Comparative Example 1 and the silver nanoparticles was adjusted so that the apparent porosity and the amount of antimicrobial metal of the mixed product were equivalent to those of the particles of Example 2.
<涂布液和带覆膜基材的制造><Manufacturing of coating liquid and film-coated substrate>
除了使用将不含抗菌性金属成分的比较例1中制造的颗粒的MIBK分散液91.6g和银纳米颗粒的IPA分散液4.4g混合而成的溶液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。A coating solution and a film-coated substrate were prepared in the same manner as in Example 1, except that a solution obtained by mixing 91.6 g of the MIBK dispersion of particles produced in Comparative Example 1 not containing an antimicrobial metal component and 4.4 g of the IPA dispersion of silver nanoparticles was used, and various properties were evaluated.
[比较例4][Comparative Example 4]
在第二工序中,除了使用硝酸银水溶液2120g以及添加时间为90分钟以外,以与实施例2相同的方式制造固体成分浓度5质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为50ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5 mass % was prepared in the same manner as in Example 2, except that 2120 g of the silver nitrate aqueous solution was used and the addition time was 90 minutes. The Na 2 O content of the particles was 50 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1, except that the MIBK dispersion of particles was used, and various properties were evaluated.
[比较例5][Comparative Example 5]
<第一颗粒的制造(第一工序)><Manufacturing of First Particles (First Step)>
将氧化硅-氧化铝溶胶(日挥触媒化成(株)制造,ファインカタロイドUSBB-120)188g与纯水89.8kg混合,将得到的混合液加热至98℃。在该混合液中添加浓度1质量%的氢氧化钠水溶液,将pH调节至12.5。188 g of silica-alumina sol (Finka Taloid USBB-120 manufactured by JGC Catalysts & Chemicals Co., Ltd.) was mixed with 89.8 kg of pure water, and the resulting mixed solution was heated to 98° C. A 1 mass % sodium hydroxide aqueous solution was added to the mixed solution to adjust the pH to 12.5.
在该混合液中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)23.0kg和铝酸钠水溶液(Al2O3浓度1.0质量%)23.0kg。然后,在该混合液(反应液)中同时添加硅酸钠水溶液(SiO2浓度3.0质量%)15.0kg和铝酸钠水溶液(Al2O3浓度1.0质量%)5.0kg。在此期间,将反应液的温度保持在98℃。接着,通过用超滤膜清洗该反应液,得到固体成分浓度3质量%的氧化硅-氧化铝颗粒的分散液。23.0 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass%) and 23.0 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass%) were added to the mixed solution at the same time. Then, 15.0 kg of sodium silicate aqueous solution (SiO 2 concentration 3.0 mass%) and 5.0 kg of sodium aluminate aqueous solution (Al 2 O 3 concentration 1.0 mass%) were added to the mixed solution (reaction solution) at the same time. During this period, the temperature of the reaction solution was maintained at 98°C. Next, the reaction solution was washed with an ultrafiltration membrane to obtain a dispersion of silicon oxide-alumina particles having a solid content concentration of 3 mass%.
在该氧化硅-氧化铝颗粒的分散液50kg中滴加浓度35.5质量%的浓盐酸,使pH为1.0,进行脱铝处理。通过将溶解的铝盐用超滤膜分离,实施清洗,得到固体成分浓度5质量%的二氧化硅类颗粒的分散液9kg。然后,在该分散液中添加浓度10质量%的氢氧化钠水溶液118g。通过将该分散液在高压釜中进行195℃、24小时热处理,得到第一颗粒的水分散液。该颗粒的Na2O浓度为0.1质量%。A 35.5% by mass concentrated hydrochloric acid was added dropwise to 50 kg of the dispersion of the silica-alumina particles to adjust the pH to 1.0 and to perform a dealumination treatment. The dissolved aluminum salt was separated by an ultrafiltration membrane and washed to obtain 9 kg of a dispersion of silica particles with a solid content concentration of 5% by mass. Then, 118 g of a 10% by mass aqueous sodium hydroxide solution was added to the dispersion. The dispersion was heat treated in an autoclave at 195°C for 24 hours to obtain an aqueous dispersion of the first particles. The Na 2 O concentration of the particles was 0.1% by mass.
在第二工序中,除了使用用纯水稀释为1.5质量%的第一颗粒以外,以与实施例2相同的方式制造固体成分浓度5.0质量%的颗粒的MIBK分散液。该颗粒的Na2O含量为40ppm。接着,除了使用颗粒的MIBK分散液以外,以与实施例1相同的方式制造涂布液和带覆膜基材,评价各特性。In the second step, a MIBK dispersion of particles having a solid content concentration of 5.0 mass% was prepared in the same manner as in Example 2 except that the first particles diluted with pure water to 1.5 mass% were used. The Na 2 O content of the particles was 40 ppm. Next, a coating liquid and a film-coated substrate were prepared in the same manner as in Example 1 except that the MIBK dispersion of particles was used, and various properties were evaluated.
[表1][Table 1]
[表2][Table 2]
[表3][Table 3]
Claims (9)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-012264 | 2021-01-28 | ||
JP2021012264A JP7625427B2 (en) | 2021-01-28 | 2021-01-28 | Particles containing an antibacterial metal component and having cavities inside a shell containing silicon, and substrate with a transparent coating containing said particles |
PCT/JP2022/001267 WO2022163397A1 (en) | 2021-01-28 | 2022-01-17 | Particles, and substrate with transparent coating film containing said particles |
Publications (1)
Publication Number | Publication Date |
---|---|
CN116568391A true CN116568391A (en) | 2023-08-08 |
Family
ID=82654643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202280008014.0A Pending CN116568391A (en) | 2021-01-28 | 2022-01-17 | Particles and transparent coated substrate comprising the same |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7625427B2 (en) |
KR (1) | KR20230132854A (en) |
CN (1) | CN116568391A (en) |
TW (1) | TW202239707A (en) |
WO (1) | WO2022163397A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024142616A1 (en) * | 2022-12-28 | 2024-07-04 | 大日本印刷株式会社 | Antiviral optical film, polarizing plate, surface plate, image display panel, and image display device using said antiviral optical film |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002050594A (en) | 2000-08-04 | 2002-02-15 | Fuso Chemical Co Ltd | Colloidal silica slurry |
JP2003206204A (en) | 2001-12-28 | 2003-07-22 | Mitsubishi Chemicals Corp | Silica gel for antimicrobial carrier and antimicrobial agent |
JP2005255532A (en) | 2004-03-09 | 2005-09-22 | Mitsubishi Chemicals Corp | Antibacterial, insect repellent, repellent |
JP5284632B2 (en) | 2007-12-12 | 2013-09-11 | 日揮触媒化成株式会社 | Conductive fibrous hollow silica fine particle dispersoid and process for producing the same |
JP2013082599A (en) | 2011-10-13 | 2013-05-09 | Nagoya Institute Of Technology | Hollow silica nanoparticle complexed with nanoparticle and production method thereof |
TWI555638B (en) | 2012-08-09 | 2016-11-01 | 王子控股股份有限公司 | Antibacterial transparent film and antibacterial adhesive sheet |
CN107456930A (en) | 2016-06-03 | 2017-12-12 | 南京理工大学 | One-step synthesis method inlays the SiO of Ag nano particles2Nanocapsule and preparation method thereof |
CN107999743A (en) | 2017-11-29 | 2018-05-08 | 北京化大宏博应用技术研究院有限公司安庆分公司 | A kind of coated with silica Nano silver grain of multi-level hollow-core construction and its synthetic method, application |
CN114174871B (en) * | 2019-07-30 | 2023-11-10 | 东山薄膜株式会社 | Anti-reflective film |
-
2021
- 2021-01-28 JP JP2021012264A patent/JP7625427B2/en active Active
-
2022
- 2022-01-17 KR KR1020237028651A patent/KR20230132854A/en active Pending
- 2022-01-17 CN CN202280008014.0A patent/CN116568391A/en active Pending
- 2022-01-17 WO PCT/JP2022/001267 patent/WO2022163397A1/en active Application Filing
- 2022-01-25 TW TW111103057A patent/TW202239707A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP7625427B2 (en) | 2025-02-03 |
KR20230132854A (en) | 2023-09-18 |
TW202239707A (en) | 2022-10-16 |
JP2022115605A (en) | 2022-08-09 |
WO2022163397A1 (en) | 2022-08-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103492914B (en) | Antireflective layered material | |
JP5078620B2 (en) | Hollow silica fine particles, composition for forming transparent film containing the same, and substrate with transparent film | |
JP5558414B2 (en) | Method for manufacturing antireflection laminate | |
JP5064649B2 (en) | Anti-reflection laminate | |
CN101089056B (en) | Paint for transparent film and transparent film coated substrate | |
CN1989070B (en) | Silica-based fine particles, method for production thereof, coating for forming coating film and base material having coating film formed thereon | |
JP5378771B2 (en) | Base material with antireflection film and coating liquid for forming antireflection film | |
JP5757673B2 (en) | Substrate with transparent film and paint for forming transparent film | |
JP6986339B2 (en) | Antireflection film forming composition, antireflection film and its forming method | |
JP7360294B2 (en) | Particles containing silica and having a cavity inside an outer shell, a method for producing the same, a coating liquid containing the particles, and a substrate with a transparent coating containing the particles | |
CN101225263A (en) | Coating material for forming transparent film and base material with transparent film | |
JP6016548B2 (en) | Coating liquid for forming transparent film and substrate with transparent film | |
JP2008291174A (en) | Coating material for forming transparent coating film and substrate with transparent film | |
KR101877810B1 (en) | Coating solution for forming transparent film and substrate coated by transparent film | |
JP2009066965A (en) | Transparent coat applied base material, and transparent coat forming paint | |
CN1214299A (en) | Anti-fog and anti-reflection optical products | |
CN1972866B (en) | Method for producing silica-based microparticles, coating material for coating film formation, and substrate coated with coating film | |
JP2009160755A (en) | Transparently coated base material | |
CN116568391A (en) | Particles and transparent coated substrate comprising the same | |
JP2008291175A (en) | Coating material for forming transparent coating film and substrate with transparent film | |
JP2009275135A (en) | Resin-coated metal oxide particle, method for producing it, application liquid for forming transparent coating film, and base material with transparent coating film | |
JP5782916B2 (en) | Antireflection film composition containing modified hollow silica fine particles and antireflection film using the same | |
CN100519414C (en) | Applying fluid for forming transparent coating film and base material with transparent coating film, and display device | |
JP2022089560A (en) | Modified hollow particles and their manufacturing method | |
CN116724362A (en) | Dispersion liquid of chain-shaped particles and manufacturing method thereof, coating material for film formation, and manufacturing method of film-coated substrate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |