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CN116482893A - Color filter substrate and manufacturing method thereof, display panel, and display device - Google Patents

Color filter substrate and manufacturing method thereof, display panel, and display device Download PDF

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Publication number
CN116482893A
CN116482893A CN202310485832.6A CN202310485832A CN116482893A CN 116482893 A CN116482893 A CN 116482893A CN 202310485832 A CN202310485832 A CN 202310485832A CN 116482893 A CN116482893 A CN 116482893A
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electrode
light
area
magnetic fluid
color
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CN116482893B (en
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张建英
康报虹
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HKC Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12Fingerprints or palmprints
    • G06V40/13Sensors therefor
    • G06V40/1318Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Human Computer Interaction (AREA)
  • Multimedia (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本公开涉及一种彩膜基板及其制作方法、显示面板及装置,彩膜基板的感光显示区具有设置有色阻部的色阻区及位于相邻色阻区之间的间隔区,在感光显示区的至少部分间隔区为具有水平排布第一区和第二区的调整间隔区;第一区设置有第一电极,第二区设置有遮光磁性流体,遮光磁性流体的填充厚度小于平坦层和衬底之间的厚度;第一电极具有通电和断电状态,遮光磁性流体用于在第一电极处于断电状态时完全覆盖第二区,遮光磁性流体还用于在第一电极处于通电状态时受到来自第一电极的磁场作用以进行流动,使得第二区的至少部分未被遮光磁性流体覆盖。该方案可提高屏下感光效果。

The present disclosure relates to a color film substrate and a manufacturing method thereof, a display panel and a device. The photosensitive display area of the color film substrate has a color resistance area provided with a color resistance part and an interval area between adjacent color resistance areas. At least part of the interval area in the photosensitive display area is an adjustment interval area with a first area and a second area arranged horizontally; the first area is provided with a first electrode, and the second area is provided with a light-shielding magnetic fluid. The filling thickness of the light-shielding magnetic fluid is less than the thickness between the flat layer and the substrate; The second region is fully covered in the electric state, and the light-shielding magnetic fluid is also used to flow under the action of the magnetic field from the first electrode when the first electrode is in the electrified state, so that at least part of the second region is not covered by the light-shielding magnetic fluid. This solution can improve the photosensitive effect under the screen.

Description

彩膜基板及其制作方法、显示面板、显示装置Color filter substrate and manufacturing method thereof, display panel, and display device

技术领域technical field

本公开属于显示技术领域,具体涉及一种彩膜基板、彩膜基板的制作方法、显示面板及显示装置。The disclosure belongs to the field of display technology, and in particular relates to a color filter substrate, a manufacturing method of the color filter substrate, a display panel, and a display device.

背景技术Background technique

屏下感光技术(例如:屏下摄像技术或屏下指纹技术)是实现手机等显示装置全面屏的关键,但与感光元件(例如:摄像头或指纹传感器)对应的显示面板的透光性难以满足高清摄像和高精指纹识别需求,致使屏下感光技术差,容易出现摄像头成像质量差或指纹识别不灵敏的情况。Under-screen photosensitive technology (such as under-screen camera technology or under-screen fingerprint technology) is the key to realizing a full-screen display device such as a mobile phone, but the light transmittance of the display panel corresponding to the photosensitive element (such as a camera or fingerprint sensor) is difficult to meet the requirements of high-definition photography and high-precision fingerprint recognition, resulting in poor under-screen photosensitive technology, which is prone to poor camera imaging quality or insensitive fingerprint recognition.

发明内容Contents of the invention

本公开的目的在于提供一种彩膜基板、彩膜基板的制作方法、显示面板及显示装置,能够在实现全面屏的同时,可提高屏下感光效果。The purpose of the present disclosure is to provide a color filter substrate, a manufacturing method of the color filter substrate, a display panel and a display device, which can realize a full screen and improve the photosensitive effect under the screen.

本公开第一方面提供了一种彩膜基板,包括衬底,所述衬底的显示区包括与感光元件对应的感光显示区,所述感光显示区具有多个间隔设置的色阻区及位于相邻所述色阻区之间的间隔区,所述感光显示区的色阻区上设置有色阻部,The first aspect of the present disclosure provides a color filter substrate, including a substrate, the display area of the substrate includes a photosensitive display area corresponding to a photosensitive element, the photosensitive display area has a plurality of color-resisting areas arranged at intervals and a spacer area between adjacent color-resisting areas, and a color-resisting part is arranged on the color-resisting area of the photosensitive display area,

所述感光显示区的至少部分间隔区为调整间隔区,所述调整间隔区设置有调整结构,且所述彩膜基板还包括平坦层,所述平坦层形成在所述色阻部和所述调整结构远离所述衬底的一侧;At least a part of the interval area of the photosensitive display area is an adjustment interval area, and the adjustment interval area is provided with an adjustment structure, and the color filter substrate further includes a flat layer, and the flat layer is formed on the side of the color resist part and the adjustment structure away from the substrate;

所述调整间隔区包括水平排布的第一区和第二区,所述调整结构包括位于所述第一区的第一电极和至少部分位于所述第二区的遮光磁性流体,所述遮光磁性流体在所述第二区的填充厚度小于所述平坦层和所述衬底之间的厚度;The adjustment interval area includes a first area and a second area arranged horizontally, the adjustment structure includes a first electrode located in the first area and a light-shielding magnetic fluid at least partially located in the second area, and the filling thickness of the light-shielding magnetic fluid in the second area is smaller than the thickness between the planar layer and the substrate;

其中,在所述第一电极处于断电状态时,所述遮光磁性流体完全覆盖所述第二区;在所述第一电极处于通电状态时,所述遮光磁性流体受到所述第一电极的磁场作用以进行流动,使得至少部分所述第二区未被所述遮光磁性流体覆盖。Wherein, when the first electrode is in a power-off state, the light-shielding magnetic fluid completely covers the second region; when the first electrode is in a power-on state, the light-shielding magnetic fluid flows under the action of the magnetic field of the first electrode, so that at least part of the second region is not covered by the light-shielding magnetic fluid.

本公开第二方面提供了一种前述任一项的彩膜基板的制作方法,所述制作方法包括:The second aspect of the present disclosure provides a method for manufacturing the color filter substrate according to any one of the foregoing, the method comprising:

提供衬底,所述衬底的显示区包括用于与感光元件相对的感光显示区,所述感光显示区具有多个间隔设置的色阻区及位于相邻所述色阻区之间的间隔区,所述感光显示区的至少部分间隔区为调整间隔区,所述调整间隔区包括水平排布的第一区和第二区;A substrate is provided, the display area of the substrate includes a photosensitive display area opposite to the photosensitive element, the photosensitive display area has a plurality of color-resistive areas arranged at intervals and a spacer between adjacent color-resistive areas, at least part of the spacer of the photosensitive display area is an adjustment spacer, and the adjustment spacer includes a first area and a second area arranged horizontally;

在所述调整间隔区上形成电极组,所述电极组至少包括位于所述第一区的第一电极;An electrode group is formed on the adjustment interval region, the electrode group includes at least a first electrode located in the first region;

在未形成有所述电极组的间隔区上形成有遮光部;a light shielding portion is formed on the spacer region where the electrode group is not formed;

在所述调整间隔区上形成有遮光磁性流体,所述遮光磁性流体的至少部分位于所述第二区;A light-shielding magnetic fluid is formed on the adjustment spacer, at least part of the light-shielding magnetic fluid is located in the second zone;

在所述色阻区上形成色阻部;forming a color-resist portion on the color-resist area;

在所述色阻部、所述遮光部、所述第一电极及所述遮光磁性流体远离所述衬底的一侧形成平坦层,所述平坦层与所述色阻部、所述遮光部、所述第一电极相接触,并与所述遮光磁性流体之间具有间隔。A planar layer is formed on the side of the color-resistor, the light-shielding part, the first electrode, and the light-shielding magnetic fluid away from the substrate, the planar layer is in contact with the color-resistor, the light-shielding part, and the first electrode, and has a gap with the light-shielding magnetic fluid.

本公开第三方面提供了一种显示面板,包括上述任一项所述的彩膜基板及与所述彩膜基板对盒设置的阵列基板。A third aspect of the present disclosure provides a display panel, including the color filter substrate described in any one of the above and an array substrate arranged in a box with the color filter substrate.

本公开第四方面提供了一种显示装置,包括前述所述的显示面板及感光元件,所述感光元件设于所述阵列基板背离所述彩膜基板的一侧,并与所述感光显示区对应设置。A fourth aspect of the present disclosure provides a display device, including the above-mentioned display panel and a photosensitive element, the photosensitive element is disposed on the side of the array substrate away from the color filter substrate, and is disposed corresponding to the photosensitive display area.

本公开方案具有以下有益效果:The disclosed scheme has the following beneficial effects:

本公开通过对调整结构的第一电极的状态(包括通电状态和未通电状态,未通电状态即为断电状态)进行调整,从而可改变遮光磁性流体在调整间隔区的位置,继而使得调整间隔区的第二区在遮光和透光状态之间进行调整,以适配感光元件的工作状态,比如,在感光元件启动时,第一电极处于通电状态,遮光磁性流体在第一电极所产生的磁场作用下发生聚集,这样使得第二区的至少部分未被遮光磁性流体覆盖,未被遮光磁性流体覆盖的第二区可允许光线透过,这样增加了屏下感光元件启动时对应区域的透光率,确保屏下感光效果,且在感光元件未启动时,第一电极处于断电状态,则遮光磁性流体完全覆盖第二区,以避免光线从第二区透过,这样提高了屏下感光元件未启动时对应区域的遮光效果,从而可提高整体显示效果。The disclosure adjusts the state of the first electrode of the adjustment structure (including the energized state and the non-energized state, and the non-energized state is the power-off state), thereby changing the position of the light-shielding magnetic fluid in the adjustment spacer, and then adjusting the second area of the adjustment spacer between light-shielding and light-transmitting states to adapt to the working state of the photosensitive element. Covered by magnetic fluid, the second area not covered by the light-shielding magnetic fluid can allow light to pass through, which increases the light transmittance of the corresponding area when the photosensitive element under the screen is activated, ensuring the photosensitive effect under the screen, and when the photosensitive element is not activated, the first electrode is in a power-off state, and the light-shielding magnetic fluid completely covers the second area to prevent light from passing through the second area. This improves the shading effect of the corresponding area when the photosensitive element under the screen is not activated, thereby improving the overall display effect.

此外,本方案的调整结构通过利用电极与遮光磁性流体之间磁性配合关系,来调整遮光磁性流体在调整间隔区之间的位置,这种磁性配合方式在实现遮光和透光之间切换的同时,还可简化调整结构的设计,降低设计成本。In addition, the adjustment structure of this solution adjusts the position of the light-shielding magnetic fluid between the adjustment intervals by using the magnetic cooperation relationship between the electrodes and the light-shielding magnetic fluid. This magnetic cooperation method can not only realize the switch between light-shielding and light-transmitting, but also simplify the design of the adjustment structure and reduce the design cost.

本公开的其他特性和优点将通过下面的详细描述变得显然,或部分地通过本公开的实践而习得。Other features and advantages of the present disclosure will become apparent from the following detailed description, or in part, be learned by practice of the present disclosure.

应当理解的是,以上的一般描述和后文的细节描述仅是示例性和解释性的,并不能限制本公开。It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present disclosure.

附图说明Description of drawings

此处的附图被并入说明书中并构成本说明书的一部分,示出了符合本公开的实施例,并与说明书一起用于解释本公开的原理。显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the disclosure and together with the description serve to explain the principles of the disclosure. Apparently, the drawings in the following description are only some embodiments of the present disclosure, and those skilled in the art can obtain other drawings according to these drawings without creative efforts.

图1为本公开实施例一提到的彩膜基板中各区的位置关系示意图。FIG. 1 is a schematic diagram of the positional relationship of various regions in the color filter substrate mentioned in Embodiment 1 of the present disclosure.

图2为本公开实施例一提到的彩膜基板的截面示意图。FIG. 2 is a schematic cross-sectional view of the color filter substrate mentioned in Embodiment 1 of the present disclosure.

图3为本公开实施例一提到的彩膜基板中各结构的平面排布示意图。FIG. 3 is a schematic planar arrangement diagram of various structures in the color filter substrate mentioned in Embodiment 1 of the present disclosure.

图4为本公开实施例提到的阵列基板与集成电路和柔性电路板的位置关系示意图。FIG. 4 is a schematic diagram of the positional relationship between the array substrate, the integrated circuit and the flexible circuit board mentioned in the embodiment of the present disclosure.

图5为本公开实施例包括实施例一所提到的彩膜基板的显示装置在感光元件未启动时的截面示意图。5 is a schematic cross-sectional view of a display device including the color filter substrate mentioned in Embodiment 1 when the photosensitive element is not activated according to an embodiment of the present disclosure.

图6为本公开实施例包括实施例一所提到的彩膜基板的显示装置在感光元件启动时的截面示意图。6 is a schematic cross-sectional view of a display device including the color filter substrate mentioned in Embodiment 1 when the photosensitive element is activated according to an embodiment of the present disclosure.

图7为本公开实施例一所提到的彩膜基板与阵列基板在非显示区的连接关系示意图。FIG. 7 is a schematic diagram of the connection relationship between the color filter substrate and the array substrate in the non-display area mentioned in Embodiment 1 of the present disclosure.

图8为本公开实施例二所提到的彩膜基板的制作方法的流程示意图。FIG. 8 is a schematic flow chart of the manufacturing method of the color filter substrate mentioned in the second embodiment of the present disclosure.

图9至图13分别为本公开实施例二中执行完不同步骤后的结构示意图。9 to 13 are schematic structural diagrams after different steps are executed in Embodiment 2 of the present disclosure.

图14为本公开实施例三提到的彩膜基板在第一电极处于断电状态时的截面示意图。14 is a schematic cross-sectional view of the color filter substrate mentioned in Embodiment 3 of the present disclosure when the first electrode is in a power-off state.

图15为本公开实施例三提到的彩膜基板在第一电极处于通电状态时的截面示意图。FIG. 15 is a schematic cross-sectional view of the color filter substrate mentioned in Embodiment 3 of the present disclosure when the first electrode is in a energized state.

图16为本公开实施例包括实施例三所提到的彩膜基板的显示装置在感光元件未启动时的截面示意图。16 is a schematic cross-sectional view of a display device including the color filter substrate mentioned in the third embodiment of the present disclosure when the photosensitive element is not activated.

图17为本公开实施例包括实施例三所提到的彩膜基板的显示装置在感光元件启动时的截面示意图。17 is a schematic cross-sectional view of a display device including the color filter substrate mentioned in Embodiment 3 when the photosensitive element is activated according to an embodiment of the present disclosure.

图18为本公开实施例四中执行完步骤S1092之后的结构示意图。FIG. 18 is a schematic structural diagram after step S1092 is executed in Embodiment 4 of the present disclosure.

图19和图20分别为本公开实施例五提到的不同方案下的彩膜基板在第一电极处于断电状态时的截面示意图。19 and 20 are schematic cross-sectional views of the color filter substrate under the different schemes mentioned in Embodiment 5 of the present disclosure when the first electrode is in a power-off state.

图21和图22分别为本公开实施例包括实施例五所提到的不同方案下的彩膜基板的显示装置在感光元件未启动时的截面示意图。FIG. 21 and FIG. 22 are schematic cross-sectional views of a display device including a color filter substrate under different schemes mentioned in Embodiment 5 of the present disclosure when the photosensitive element is not activated.

图23和图24分别为本公开实施例包括实施例五所提到的不同方案下的彩膜基板的显示装置在感光元件启动时的截面示意图。FIG. 23 and FIG. 24 are schematic cross-sectional views of a display device including a color filter substrate under different schemes mentioned in Embodiment 5 of the present disclosure when the photosensitive element is activated.

图25为本公开实施例五提到的彩膜基板中各结构的平面排布示意图。FIG. 25 is a schematic planar arrangement diagram of various structures in the color filter substrate mentioned in Embodiment 5 of the present disclosure.

图26为本公开实施例五所提到的彩膜基板与阵列基板在非显示区的连接关系示意图。FIG. 26 is a schematic diagram of the connection relationship between the color filter substrate and the array substrate in the non-display area mentioned in Embodiment 5 of the present disclosure.

图27为本公开实施例六中执行完步骤S1022之后的结构示意图。FIG. 27 is a schematic structural diagram after step S1022 is executed in Embodiment 6 of the present disclosure.

附图标记说明:Explanation of reference signs:

1、彩膜基板;10、衬底;11、色阻部;12、遮光部;13、遮光磁性流体;14、第一电极;140、第一转接部;15、平坦层;16、导电胶;17、透光流体;18、第二电极;180、第二转接部;19、各向异性导电胶;2、感光元件;3、阵列基板;31、导电连接点;310、第一导电连接点;311、第二导电连接点;32、电极信号线;4、集成电路;5、柔性电路板;6、磁性驱动件;7、封框胶;8、背光模组;91、上偏光片;92、下偏光片;A、显示区;A1、感光显示区;A2、主显示区;B、非显示区;B1、绑定区;Y、第一方向;X、第二方向;S、空腔、Z、厚度方向。1. Color film substrate; 10. Substrate; 11. Color resistance part; 12. Shading part; 13. Shading magnetic fluid; 14. First electrode; 140. First transfer part; 15. Flat layer; 16. Conductive adhesive; 17. Light-transmitting fluid; 1. Second conductive connection point; 32. Electrode signal line; 4. Integrated circuit; 5. Flexible circuit board; 6. Magnetic driver; 7. Sealant; 8. Backlight module; 91. Upper polarizer; 92. Lower polarizer;

具体实施方式Detailed ways

现在将参考附图更全面地描述示例实施方式。然而,示例实施方式能够以多种形式实施,且不应被理解为限于在此阐述的范例;相反,提供这些实施方式使得本公开将更加全面和完整,并将示例实施方式的构思全面地传达给本领域的技术人员。Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art.

此外,所描述的特征、结构或特性可以以任何合适的方式结合在一个或更多实施例中。在下面的描述中,提供许多具体细节从而给出对本公开的实施例的充分理解。然而,本领域技术人员将意识到,可以实践本公开的技术方案而没有特定细节中的一个或更多,或者可以采用其它的方法、组元、装置、步骤等。在其它情况下,不详细示出或描述公知方法、装置、实现或者操作以避免模糊本公开的各方面。Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the present disclosure. However, those skilled in the art will appreciate that the technical solutions of the present disclosure may be practiced without one or more of the specific details, or other methods, components, means, steps, etc. may be employed. In other instances, well-known methods, apparatus, implementations, or operations have not been shown or described in detail to avoid obscuring aspects of the present disclosure.

下面结合附图和具体实施例对本公开作进一步详述。在此需要说明的是,下面所描述的本公开各个实施例中所涉及的技术特征只要彼此之间未构成冲突就可以相互组合。下面通过参考附图描述的实施例是示例性的,旨在用于解释本公开,而不能理解为对本公开的限制。The present disclosure will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted here that the technical features involved in the various embodiments of the present disclosure described below may be combined with each other as long as they do not constitute conflicts with each other. The embodiments described below by referring to the figures are exemplary and are intended to explain the present disclosure and should not be construed as limiting the present disclosure.

此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本公开的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first" and "second" may explicitly or implicitly include one or more of these features. In the description of the present disclosure, "plurality" means two or more, unless otherwise specifically defined.

在本公开中,除非另有明确的规定和限定,术语“连接”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本公开中的具体含义。In the present disclosure, unless otherwise clearly specified and limited, the term "connection" and other terms should be understood in a broad sense, for example, it may be a fixed connection, a detachable connection, or an integral body; it may be a mechanical connection or an electrical connection; it may be a direct connection or an indirect connection through an intermediary, and it may be the internal communication of two elements or the interaction relationship between two elements. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present disclosure according to specific situations.

实施例一Embodiment one

本公开实施例提供了一种彩膜基板,可以应用于液晶显示面板中,但不限于此,也可应用于COE技术(即:滤色片放置在薄膜封装上的技术)的面板中,视具体情况而定。Embodiments of the present disclosure provide a color filter substrate, which can be applied to liquid crystal display panels, but is not limited thereto, and can also be applied to panels with COE technology (that is, the technology in which color filters are placed on thin film packaging), depending on specific conditions.

结合图1和图2所示,本实施例的彩膜基板1可包括衬底10和色阻层,衬底10可包括显示区A和环绕显示区A设置的非显示区B,进一步地,衬底10的显示区A可包括多个间隔设置的色阻区以及位于相邻色阻区之间的间隔区,色阻层可包括多个间隔设置的色阻部11,每个色阻部11对应形成在一色阻区上,此色阻部11用于使得包括本实施例彩膜基板1的显示面板实现彩色显示。As shown in FIG. 1 and FIG. 2 , the color filter substrate 1 of this embodiment may include a substrate 10 and a color-resist layer. The substrate 10 may include a display area A and a non-display area B arranged around the display area A. Further, the display area A of the substrate 10 may include a plurality of color-resist areas arranged at intervals and a spacer area between adjacent color-resist areas. The color-resist layer may include a plurality of color-resist parts 11 arranged at intervals. 1 display panel for color display.

举例而言,彩膜基板1的多个色阻部11可包括多种颜色,例如:红色、绿色、蓝色等等,但不限于此,可根据实际显示需求设计色阻部11的颜色。For example, the plurality of color-resisting portions 11 of the color filter substrate 1 may include multiple colors, such as red, green, blue, etc., but not limited thereto, and the color of the color-resisting portions 11 may be designed according to actual display requirements.

其中,由于彩膜基板1在第一方向Y(可理解为列方向)上相邻两行色阻区之间的间隔区通常用于与阵列基板3(如图4所示)上的行间隙(图中未示出)对应,在第二方向X(可理解为行方向)上相邻两列色阻区之间的间隔区通常用于与阵列基板3上的列间隙(图中未示出)对应,此行间隙主要用于排布扫描线和晶体管(图中未示出)等结构,列间隙主要用于排布数据线(图中未示出)等结构,因此,阵列基板3的列间隙小于其行间隙,对应地,参考图3所示,彩膜基板1中在第一方向Y上相邻两行色阻区之间的间隔h1大于在第二方向X上相邻两列色阻区之间的间隔h2。Wherein, since the color filter substrate 1 in the first direction Y (which can be understood as the column direction), the space between two adjacent rows of color-resist regions is generally used to correspond to the row gap (not shown in the figure) on the array substrate 3 (as shown in FIG. Therefore, the column gap of the array substrate 3 is smaller than the row gap. Correspondingly, as shown in FIG.

应当理解的是,第一方向Y与第二方向X相交,进一步地,可相互垂直。It should be understood that the first direction Y intersects with the second direction X, and further, may be perpendicular to each other.

具体地,在第一方向Y上相邻两行色阻区之间的间隔h1与在第二方向X上相邻两列色阻区之间的间隔h2比值为10倍左右,比如:在第一方向Y上相邻两行色阻区之间的间隔h1可为100μm级,在第二方向X上相邻两列色阻区之间的间隔h2可为10um级,但应当理解的是,在第一方向Y上相邻两行色阻区之间的间隔h1不限于100μm级,在第二方向X上相邻两列色阻区之间的间隔h2不限于10um级,可在其取值左右进行浮动,只要能够实现显示面板的设计需求即可。Specifically, the ratio of the interval h1 between two adjacent rows of color-resist regions in the first direction Y to the interval h2 between two adjacent rows of color-resist regions in the second direction X is about 10 times. For example, the interval h1 between two adjacent rows of color-resist regions in the first direction Y can be on the order of 100 μm, and the interval h2 between two adjacent rows of color-resist regions on the second direction X can be on the order of 10 μm. However, it should be understood that the interval h1 between two adjacent rows of color-resist regions in the first direction Y is not limited to 100 μm. The interval h2 between two adjacent columns of color-resist regions in the second direction X is not limited to 10um, and can be fluctuated around its value, as long as the design requirements of the display panel can be met.

在本实施例中,为了实现全面屏,可采用屏下感光技术,结合图1、图3和图5所示,可将衬底10的显示区A中与感光元件2对应的区域定义为感光显示区A1,此感光显示区A1具有多个间隔设置的色阻区及位于相邻色阻区之间的间隔区,感光显示区A1的色阻区上设置有色阻部11,也就是说,此感光显示区A1除了用于实现感光功能,还可用于实现显示功能。In this embodiment, in order to realize a full screen, an under-screen photosensitive technology can be used. As shown in FIG. 1 , FIG. 3 and FIG. 5 , the area corresponding to the photosensitive element 2 in the display area A of the substrate 10 can be defined as a photosensitive display area A1. function.

此外,结合图1、图3和图5所示,衬底10的显示区A中未与感光元件2对应的区域可定义为主显示区A2,主显示区A2可与感光显示区A1相邻,主显示区A2也具有多个间隔设置的色阻区及位于相邻色阻区之间的间隔区,且主显示区A2的色阻区上也设置有色阻部11,也就是说,此主显示区A2用于实现显示功能。In addition, as shown in FIG. 1 , FIG. 3 and FIG. 5 , the area of the display area A of the substrate 10 that does not correspond to the photosensitive element 2 can be defined as the main display area A2, which can be adjacent to the photosensitive display area A1, and the main display area A2 also has a plurality of color-resist areas arranged at intervals and spacers between adjacent color-resist areas, and the color-resist area of the main display area A2 is also provided with a color-resist portion 11, that is, the main display area A2 is used to realize the display function.

其中,主显示区A2中色阻部11的分布密度可与感光显示区A1中色阻部11的分布密度相等,这样在保证显示区A整体显示均匀的同时,还可降低设计成本。Wherein, the distribution density of the color-resistors 11 in the main display area A2 can be equal to the distribution density of the color-resistors 11 in the photosensitive display area A1, so as to ensure uniform display of the display area A as a whole and reduce the design cost.

此外,如图1所示,主显示区A2可环绕感光显示区A1整圈设置,但不限于此,也可感光显示区A1的至少部分边界与非显示区B相接,其余部分边界与主显示区A2相接等,具体视显示产品需求而定。In addition, as shown in Figure 1, the main display area A2 can be arranged around the photosensitive display area A1, but it is not limited thereto. At least part of the border of the photosensitive display area A1 can be connected to the non-display area B, and the rest of the border can be connected to the main display area A2, etc., depending on the display product requirements.

应当理解的是,主显示区A2的显示面积通常大于感光显示区A1的显示面积,以在实现屏下感光技术的同时,提高整个显示区A的显示效果。It should be understood that the display area of the main display area A2 is usually larger than the display area of the photosensitive display area A1, so as to improve the display effect of the entire display area A while realizing the under-screen photosensitive technology.

在本实施例中,为了增加屏下感光元件2启动时对应区域(感光显示区A1)处的透光率,结合图2和图3所示,可在感光显示区A1的至少部分间隔区上设置有调整结构,设置有调整结构的间隔区可定义为调整间隔区;应当理解的是,主显示区A2的间隔区以及感光显示区A1中未设置有调整结构的间隔区均设置有遮光部12,此遮光部12的材料可为绝缘树脂材料,具体可为黑色绝缘树脂材料。In this embodiment, in order to increase the light transmittance at the corresponding area (photosensitive display area A1) when the photosensitive element 2 under the screen is activated, as shown in FIG. 2 and FIG. 3 , an adjustment structure can be provided on at least part of the interval area of the photosensitive display area A1, and the interval area provided with the adjustment structure can be defined as an adjustment interval area; it should be understood that both the interval area of the main display area A2 and the interval area not provided with the adjustment structure in the photosensitive display area A1 are provided with a light shielding part 12, and the material of the light shielding part 12 can be insulating resin material, specifically black insulating resin material.

在本实施例中,调整间隔区可包括水平排布的第一区和第二区,结合图2和图3所示,调整结构可包括遮光磁性流体13及第一电极14,第一电极14位于第一区,遮光磁性流体13的至少部分位于第二区,其中,遮光磁性流体13具有流动性,为了避免遮光磁性流体13从彩膜基板1流出,还可在制作完调整结构之后制作一层平坦层15,如图2所示,也就是说,彩膜基板1还可包括平坦层15,此平坦层15形成在色阻部11和调整结构远离衬底10的一侧。In this embodiment, the adjustment interval area may include a first area and a second area arranged horizontally. As shown in FIG. 2 and FIG. 3 , the adjustment structure may include a light-shielding magnetic fluid 13 and a first electrode 14, the first electrode 14 is located in the first area, and at least part of the light-shielding magnetic fluid 13 is located in the second area, wherein the light-shielding magnetic fluid 13 has fluidity. 15 , the flat layer 15 is formed on the side of the color resist portion 11 and the adjustment structure away from the substrate 10 .

参考图2所示,遮光磁性流体13在第二区的填充厚度小于平坦层15和衬底10之间的厚度,以能够使得遮光磁性流体13在平坦层15和衬底10之间进行流动。其中,第一电极14具有通电和断电状态,如图5所示,遮光磁性流体13用于在第一电极14处于断电状态时完全覆盖第二区,如图6所示,遮光磁性流体13还用于在第一电极14处于通电状态时受到来自第一电极14的磁场作用以进行流动,使得第二区的至少部分未被遮光磁性流体13覆盖。Referring to FIG. 2 , the filling thickness of the light-shielding magnetic fluid 13 in the second region is smaller than the thickness between the planar layer 15 and the substrate 10 , so that the light-shielding magnetic fluid 13 can flow between the planar layer 15 and the substrate 10 . Wherein, the first electrode 14 has power-on and power-off states. As shown in FIG. 5, the light-shielding magnetic fluid 13 is used to completely cover the second area when the first electrode 14 is in the power-off state. As shown in FIG.

本公开通过对调整结构中第一电极14的状态(包括通电状态和未通电状态,未通电状态即为断电状态)进行调整,从而可改变遮光磁性流体13在调整间隔区的位置,继而使得调整间隔区的第二区在遮光和透光状态之间进行调整,以适配感光元件2的工作状态,比如,如图6所示,在感光元件2启动时,第一电极14处于通电状态,遮光磁性流体13在第一电极14所产生的磁场作用下发生聚集,这样使得第二区的至少部分未被遮光磁性流体13覆盖,未被遮光磁性流体13覆盖的第二区可允许光线透过,这样增加了屏下感光元件2启动时对应区域的透光率,确保屏下感光效果,且如图5所示,在感光元件2未启动时,第一电极14处于断电状态,则遮光磁性流体13完全覆盖第二区,以避免光线从第二区透过,这样提高了屏下感光元件2未启动时对应区域的遮光效果,从而可提高整体显示效果。The present disclosure adjusts the state of the first electrode 14 in the adjustment structure (including the energized state and the non-energized state, and the non-energized state is the power-off state), thereby changing the position of the light-shielding magnetic fluid 13 in the adjustment space, and then adjusting the second area of the adjustment space between the light-shielding and light-transmitting states to adapt to the working state of the photosensitive element 2. For example, as shown in FIG. Aggregation occurs under the action, so that at least part of the second area is not covered by the light-shielding magnetic fluid 13, and the second area not covered by the light-shielding magnetic fluid 13 can allow light to pass through, which increases the light transmittance of the corresponding area when the photosensitive element 2 under the screen is activated, and ensures the photosensitive effect under the screen. effect, which can improve the overall display effect.

此外,本方案的调整结构通过利用电极与遮光磁性流体13之间磁性配合关系,来调整遮光磁性流体13在调整间隔区之间的位置,这种磁性配合方式在实现遮光和透光之间切换的同时,还可简化调整结构的设计,降低设计成本。In addition, the adjustment structure of this solution adjusts the position of the light-shielding magnetic fluid 13 between the adjustment intervals by using the magnetic cooperation relationship between the electrodes and the light-shielding magnetic fluid 13. This magnetic cooperation method can simplify the design of the adjustment structure and reduce the design cost while realizing the switch between light-shielding and light-transmitting.

在本实施例中,第一电极14可完全覆盖第一区,即:第一区可理解为调整间隔区中用于形成第一电极14的区域,遮光磁性流体13完全位于第二区并能够在第二区上流动,即:第二区可理解为调整间隔区中用于填充遮光磁性流体13的区域。In this embodiment, the first electrode 14 can completely cover the first area, that is, the first area can be understood as the area for forming the first electrode 14 in the adjustment space, and the light-shielding magnetic fluid 13 is completely located in the second area and can flow on the second area, that is, the second area can be understood as the area for filling the light-shielding magnetic fluid 13 in the adjustment space.

其中,第一电极14可为非透明导电体,这样可保证在感光元件2未开启时的遮光效果,即:调整结构中除了被遮光磁性流体13覆盖的区域可实现遮光功能,第一电极14所在的位置也实现遮光功能。Wherein, the first electrode 14 can be a non-transparent conductor, which can ensure the light-shielding effect when the photosensitive element 2 is not turned on, that is, the light-shielding function can be realized in the adjustment structure except the area covered by the light-shielding magnetic fluid 13, and the position where the first electrode 14 is located also realizes the light-shielding function.

举例而言,在第一电极14通电产生磁场时,如图6所示,遮光磁性流体13可向靠近第一电极14的方向聚集,也就是说,第一电极14在通电时与遮光磁性流体13之间产生有磁吸力,以吸引遮光磁性流体13向其所在方向聚集。且第一电极14可为金属导电体,比如:铁、铜、铝等非透明导电体中的一种,以增强其在处于通电状态时产生的磁场,从而更好地向第一电极14所在的位置聚集,以使第二区中尽可能多的区域未被遮光磁性流体13覆盖,从而可提高透光率,继而可提高感光元件2的感光效果。For example, when the first electrode 14 is energized to generate a magnetic field, as shown in FIG. 6 , the light-shielding magnetic fluid 13 can gather toward the direction close to the first electrode 14, that is, a magnetic attraction force is generated between the first electrode 14 and the light-shielding magnetic fluid 13 to attract the light-shielding magnetic fluid 13 to gather in its direction. And the first electrode 14 can be a metal conductor, such as: one of non-transparent conductors such as iron, copper, aluminum, etc., to enhance the magnetic field generated when it is in an energized state, so as to better gather to the position where the first electrode 14 is located, so that as many areas as possible in the second zone are not covered by the light-shielding magnetic fluid 13, thereby improving the light transmittance, and then improving the photosensitive effect of the photosensitive element 2.

在本实施例中,在第一电极14处于断电状态时:如图2所示,遮光磁性流体13与平坦层15之间为空腔S,以保证遮光磁性流体13的流动性,应当理解的是,在将图2所示的彩膜基板1倒置并与阵列基板3对盒后,若第一电极14处于断电状态,则遮光磁性流体13在自身重力的作用下会积聚在平坦层15上,如图5所示,此时,遮光磁性流体13与衬底10之间为空腔S;且在第一电极14处于通电状态时:第二区未被遮光磁性流体13覆盖的区域与平坦层15之间为空腔S,此空腔S无遮光物,应当理解的是,在将图2所示的彩膜基板1倒置并与阵列基板3对盒后,若第一电极14处于通电状态,则在自身重力作用下积聚在平坦层15上的遮光磁性流体会向靠近第一电极14侧聚集,使得第二区的部分和平坦层之间无遮光磁性流体13填充,即:未填充遮光磁性流体13的区域为空腔S,如图6所示,可以更好地使光线穿过,进而达到增加透光率的目的,以保证屏下感光元件2的感光质量,例如,在感光元件2为摄像头时,可提高屏下摄像头的成像质量。In this embodiment, when the first electrode 14 is in the power-off state: as shown in FIG. 2, there is a cavity S between the light-shielding magnetic fluid 13 and the flat layer 15 to ensure the fluidity of the light-shielding magnetic fluid 13. It should be understood that after the color filter substrate 1 shown in FIG. Between the first electrode 14 and the substrate 10 is a cavity S; and when the first electrode 14 is in an energized state: between the area of the second area not covered by the light-shielding magnetic fluid 13 and the flat layer 15 is a cavity S, and the cavity S has no light-shielding object. It should be understood that after the color filter substrate 1 shown in FIG. There is no light-shielding magnetic fluid 13 filled between the part of the area and the flat layer, that is, the area not filled with light-shielding magnetic fluid 13 is a cavity S, as shown in FIG. 6, which can better allow light to pass through, thereby achieving the purpose of increasing light transmittance, so as to ensure the photosensitive quality of the photosensitive element 2 under the screen. For example, when the photosensitive element 2 is a camera, the imaging quality of the camera under the screen can be improved.

其中,由于前述提到在第一方向Y上相邻两行色阻区之间的间隔h1大于在第二方向X上相邻两列色阻之间的间隔h2,因此,为了降低调整结构的加工难度,可将调整结构设置在感光显示区A1中在第一方向Y上相邻两行色阻区之间的间隔区上,也就是说,调整间隔区位于在第一方向Y上相邻两行色阻区之间。Wherein, as mentioned above, the interval h1 between two adjacent rows of color-resist regions in the first direction Y is larger than the interval h2 between two adjacent rows of color-resist regions in the second direction X, therefore, in order to reduce the processing difficulty of the adjustment structure, the adjustment structure can be arranged on the interval region between two adjacent rows of color-resist regions in the first direction Y in the photosensitive display area A1, that is, the adjustment interval region is located between two adjacent rows of color-resist regions in the first direction Y.

此外,由于在第一方向Y上相邻两行色阻区之间的间隔较大,因此,可将调整间隔区中较大的面积设计为供遮光磁性流体13流动的区域,即:可设计更大面积的第二区,这样在感光元件2启动时,还可使得调整结构能够形成更大面积的透光区域(即:在感光元件2启动时第二区中未被遮光磁性流体13覆盖的区域),从而可提高调整结构的透光率,继而提高感光元件2的感光效果。In addition, because the interval between the two adjacent color resistance areas in the first direction Y is large, the larger area in the adjustment interval area can be designed to the area where the optical magnetic fluid 13 flows, that is, the second zone of the larger area can be designed. In this way, the adjustment structure can form a larger area of light transmittance (that is, when the light sensing element 2 starts, The area that is not covered by light magnetic fluid 13) can improve the light transmission rate of the adjustment structure, and then improve the sensitivity of the sensitivity component 2.

示例地,结合图2和图3所示,调整结构中第一电极14与遮光磁性流体13在第一方向Y上水平排布,也可理解为,调整间隔区的第一区与第二区在第一方向Y上水平排布,这样可增大第一电极14的面积,以在第一电极14通电时能够产生更强的磁场,从而能够驱动遮光磁性流体13快速且稳定地聚集到指定位置,保证感光效果。For example, as shown in FIG. 2 and FIG. 3 , in the adjustment structure, the first electrode 14 and the light-shielding magnetic fluid 13 are arranged horizontally in the first direction Y. It can also be understood that the first area and the second area of the adjustment spacer are arranged horizontally in the first direction Y, so that the area of the first electrode 14 can be increased, so that a stronger magnetic field can be generated when the first electrode 14 is energized, so that the light-shielding magnetic fluid 13 can be quickly and stably gathered to a designated position to ensure the photosensitive effect.

进一步地,结合图2和图3所示,第二区在第一方向Y上的相对两侧均设置有第一区,每个第一区上均形成有第一电极14,位于第二区在第一方向Y上相对两侧的第一电极14与位于第二区在第二方向X上相对两侧的遮光部12围成用于容纳遮光磁性流体13的腔体,通过利用遮光部12与第一电极14共同围成用于容纳遮光磁性流体13的腔体,这样可适当减少电极的面积,从而可降低在感光元件2启动时的电损耗。Further, as shown in FIG. 2 and FIG. 3 , the second area is provided with a first area on opposite sides in the first direction Y, and a first electrode 14 is formed on each first area. The first electrodes 14 located on the opposite sides of the second area in the first direction Y and the light shielding parts 12 located on the opposite sides of the second area in the second direction X form a cavity for containing the light-shielding magnetic fluid 13. By using the light-shielding part 12 and the first electrode 14 to jointly form a cavity for containing the light-shielding magnetic fluid 13, the area of the electrodes can be appropriately reduced. Electric consumption at the time of activation of the photosensitive element 2 can be reduced.

但应当理解的是,本实施例不限于仅在第二区的第一方向Y上相对两侧设置第一区,第一区也可环绕第二区的四周设置,换言之,第一电极14也可为环状电极,环状电极完全环绕第二区,以形成用于容纳遮光磁性流体13的腔体,此腔体密封性更好,此外,这样在制作完第一电极14时,即可直接向第一电极14自身围成的腔体内填充遮光磁性流体13。However, it should be understood that this embodiment is not limited to only setting the first area on opposite sides of the second area in the first direction Y, the first area can also be arranged around the second area, in other words, the first electrode 14 can also be a ring electrode, and the ring electrode completely surrounds the second area to form a cavity for containing the light-shielding magnetic fluid 13, and the cavity is better sealed.

举例而言,如图2所示,本实施例的第一电极14在厚度方向Z上的两端分别与衬底10和平坦层15相接触,此时,第一电极14的厚度即可理解为整个调整结构的厚度。For example, as shown in FIG. 2 , both ends of the first electrode 14 in the thickness direction Z of this embodiment are in contact with the substrate 10 and the flat layer 15 respectively. At this time, the thickness of the first electrode 14 can be understood as the thickness of the entire adjustment structure.

其中,结合图3、图4及图7所示,第一电极14整体可在第二方向X上延伸,且第一电极14的一部分可延伸至衬底10的非显示区B并形成第一转接部140,此第一转接部140可通过导电胶16与阵列基板3上的导电连接点31相导通,导电连接点31可与阵列基板3上位于非显示区B外围的电极信号线32相接,最终通过阵列基板3上绑定区B1(此绑定区B1为非显示区B的一部分)的集成电路4或是FPC(柔性电路板5)等提供电压控制信号。3, 4 and 7, the first electrode 14 as a whole can extend in the second direction X, and a part of the first electrode 14 can extend to the non-display area B of the substrate 10 to form a first transition portion 140. The first transition portion 140 can be connected to the conductive connection point 31 on the array substrate 3 through the conductive glue 16. The conductive connection point 31 can be connected to the electrode signal line 32 on the periphery of the non-display area B on the array substrate 3, and finally through the binding area B1 on the array substrate 3. The area B1 is a part of the non-display area B) to provide voltage control signals to the integrated circuit 4 or FPC (flexible printed circuit board 5 ).

在本实施例中,第二区在第一方向Y上的相对两侧的第一电极14可共同控制,以写入相同的电压,即:位于第二区在第一方向Y上的这两个第一电极14可通过导电胶16与阵列基板3上的同一导电连接点31相导通,这样可降低阵列基板3的设计难度以及集成电路4和FPC的控制难度。In this embodiment, the first electrodes 14 on opposite sides of the second region in the first direction Y can be controlled together to write the same voltage, that is, the two first electrodes 14 located in the second region in the first direction Y can be connected to the same conductive connection point 31 on the array substrate 3 through the conductive glue 16, which can reduce the design difficulty of the array substrate 3 and the control difficulty of the integrated circuit 4 and FPC.

此外,位于第二区相对两侧的第一电极14共同控制,这样使得在感光元件2启动时调整结构中位于第二区相对两侧的第一电极14的电压可相同,产生相同的磁场,这样在感光元件2启动时遮光磁性流体13可分别向两侧的第一电极14移动,以使得调整结构的中间区域未被遮光磁性流体13覆盖,即:使得调整结构的中间区域为透光区,这样可使得光线更均匀地透过调整结构入射至感光元件2处,提高感光效果。In addition, the first electrodes 14 located on the opposite sides of the second area are jointly controlled, so that when the photosensitive element 2 is started, the voltages of the first electrodes 14 located on the opposite sides of the second area in the adjustment structure can be the same to generate the same magnetic field, so that when the photosensitive element 2 is started, the light-shielding magnetic fluid 13 can move to the first electrodes 14 on both sides, so that the middle area of the adjustment structure is not covered by the light-shielding magnetic fluid 13, that is, the middle area of the adjustment structure is a light-transmitting area, so that light can pass through the adjustment structure more uniformly and enter the photosensitive element 2, improving Photosensitive effect.

但不限于此,位于第二区在第一方向Y上的这两个第一电极14也可独立控制,这两个第一电极14可写入相同的电压,也可写入不相同的电压,视具体情况而定;具体地,两个第一电极14的第一转接部140可通过各向异性导电胶与阵列基板3上的不同导电连接点31相导通,每个导电连接点31可分别与阵列基板3上位于非显示区B的一条电极信号线32相接。But not limited thereto, the two first electrodes 14 located in the second area in the first direction Y can also be independently controlled, and the two first electrodes 14 can be written with the same voltage or different voltages, depending on the specific circumstances; specifically, the first transfer portion 140 of the two first electrodes 14 can be connected to different conductive connection points 31 on the array substrate 3 through an anisotropic conductive glue, and each conductive connection point 31 can be respectively connected to an electrode signal line 32 located in the non-display area B on the array substrate 3.

此外,如图3所示,第一电极14和与其相邻且位于感光显示区A1的多个色阻部11相贴合,也就是说,调整结构在第二方向X上的尺寸可对应多个色阻部11,这样可增大感光元件2启动时调整结构的透光面积,从而提高透光率。In addition, as shown in FIG. 3 , the first electrode 14 is attached to a plurality of color-resisting parts 11 adjacent to it and located in the photosensitive display area A1, that is, the size of the adjustment structure in the second direction X can correspond to a plurality of color-resisting parts 11, which can increase the light transmission area of the adjustment structure when the photosensitive element 2 is activated, thereby increasing the light transmittance.

在本实施例中,遮光磁性流体13可为黑色磁性油墨,此黑色磁性油墨包括60%~80%的颜料、15%~35%的连接料、5%的添加料,进一步地,黑色磁性油墨由60%~80%的颜料、15%~35%的连接料、5%的添加料组成;黑色磁性油墨中颜料占主体,使得黑色磁性油墨呈现黑色及具有磁性,颜料占比过多会影响黑色磁性油墨整体的流动性,占比过少则黑色磁性油墨磁性特征不显著,导致电极通电后无法精确的控制黑色磁性油墨产生流动变化;混合连接料后使得颜料受到磁场影响后有较好的流动性,连接料占比过多,同比颜料占比下降,会导致黑色磁性油墨无法被磁场控制,连接料占比过少,使得黑色磁性油墨在去除磁场后无法快速的流动恢复至初始状态。添加料起到润滑作用,和连接料一起使得颜料不出现团聚现象。In this embodiment, the light-shielding magnetic fluid 13 can be black magnetic ink, which includes 60% to 80% of pigment, 15% to 35% of binder, and 5% of additive. Further, the black magnetic ink is composed of 60% to 80% of pigment, 15% to 35% of binder, and 5% of additive. The magnetic characteristics are not obvious, which leads to the inability to accurately control the flow changes of the black magnetic ink after the electrodes are energized; after mixing the binder, the pigment has better fluidity after being affected by the magnetic field. The proportion of the binder is too large, and the proportion of the pigment is lower than that of the same period last year. The black magnetic ink cannot be controlled by the magnetic field, and the proportion of the binder is too small, so that the black magnetic ink cannot quickly flow back to the initial state after the magnetic field is removed. The additive acts as a lubricant, and together with the linking material, the pigment does not agglomerate.

举例而言,黑色磁性油墨中的颜料为氧化铁黑(Fe3O4)或氧化铁棕(Fe2O3)的一种,该颜料为磁性颜料,其颗粒为小于1um的针状结晶,该颜料可在磁场中均匀排列;连接料为醇酸树脂、聚氨基甲酸醋、环氧树脂、丙烯酞胺、聚醋酸乙烯醋、氯乙烯一醋酸共聚物、聚乙烯醇缩丁醛、聚乙烯乙醚、硝基纤维素、聚氨醋树脂等合成树脂中的一种,用于保证黑色磁性油墨的流动性和附着力;添加料为硅烷或铁酸脂类物质的一种,用于保证磁性颜料在连接料中均匀的分散。For example, the pigment in the black magnetic ink is a kind of iron oxide black (Fe3O4) or iron oxide brown (Fe2O3). The pigment is a magnetic pigment, and its particles are needle-shaped crystals smaller than 1um. The fluidity and adhesion; the additive is a kind of silane or ferrite lipid, which is used to ensure the uniform dispersion of magnetic pigments in the binder.

在本公开实施例中,如图2所示,遮光磁性流体13在调整间隔区中第二区的填充厚度d1与平坦层15和衬底10之间厚度d的比值范围为1/3~2/3,换言之,遮光磁性流体13在制作过程中的填充厚度d1与第一电极14的厚度d的比值范围为1/3~2/3,比如:1/3、1/2、2/3等,其中,遮光磁性流体13填充过少则使得调整结构无法在感光元件2未启动时起到良好的遮光效果,填充过多则会导致调整结构在感光元件2启动时透光面积较小的情况。In the embodiment of the present disclosure, as shown in FIG. 2 , the ratio of the filling thickness d1 of the second region of the light-shielding magnetic fluid 13 in the adjustment gap to the thickness d between the flat layer 15 and the substrate 10 is in the range of 1/3-2/3. The adjustment structure cannot achieve a good light-shielding effect when the photosensitive element 2 is not activated, and too much filling will result in a small light transmission area of the adjustment structure when the photosensitive element 2 is activated.

在本公开实施例中,如图2所示,第一电极14的宽度w范围可为0.5μm至2μm,比如:0.5μm、1μm、1.5μm、2μm等,这样在保证感光元件2启动时第一电极14所产生的磁场强度,以使遮光磁性流体13快速向靠近第一电极14所在的位置聚集,使得调整间隔区中第二区的至少部分未被遮光磁性流体13覆盖的同时,还可减少第一电极14占据调整间隔区过多的面积,即:减小调整间隔区中第一区的占比,增大第二区的占比,继而可提高第二区中未被遮光磁性流体13覆盖的区域面积,提高了调整结构在感光元件2启动时的透光率。In the embodiment of the present disclosure, as shown in FIG. 2 , the width w of the first electrode 14 can range from 0.5 μm to 2 μm, such as: 0.5 μm, 1 μm, 1.5 μm, 2 μm, etc., so as to ensure the strength of the magnetic field generated by the first electrode 14 when the photosensitive element 2 is activated, so that the light-shielding magnetic fluid 13 quickly gathers to the position close to the first electrode 14, so that at least part of the second area in the adjustment interval is not covered by the light-shielding magnetic fluid 13, and at the same time, the occupation of the first electrode 14 can be reduced. The area with too many areas, that is, reducing the proportion of the first area in the adjustment interval area and increasing the proportion of the second area can then increase the area of the area not covered by the light-shielding magnetic fluid 13 in the second area, and improve the light transmittance of the adjustment structure when the photosensitive element 2 is started.

应当理解的是,本实施例的彩膜基板1主要应用状态为水平放置(即:与衬底10平行)状态或者小角度倾斜放置(与衬底10具有较小夹角)状态,以保证遮光磁性流体13在第一电极14未通电(即:处于断电状态)时能够完全覆盖第二区,从而保证在感光元件2未开启时调整结构具有良好的遮光性能。It should be understood that the main application state of the color filter substrate 1 in this embodiment is the state of being placed horizontally (that is, parallel to the substrate 10 ) or inclined at a small angle (with a small angle with the substrate 10 ), so as to ensure that the light-shielding magnetic fluid 13 can completely cover the second area when the first electrode 14 is not powered (that is, in a power-off state), thereby ensuring that the adjusted structure has good light-shielding performance when the photosensitive element 2 is not turned on.

实施例二Embodiment two

基于实施例一提到的彩膜基板1的结构,本实施例二提供了一种彩膜基板1的制作方法,应当理解的是,彩膜基板1的具体结构可参考实施一所描述的内容,在此不作重复限定。下面结合附图可对本实施例一的彩膜基板1的制作方法进行详细说明。Based on the structure of the color filter substrate 1 mentioned in the first embodiment, the second embodiment provides a method for manufacturing the color filter substrate 1. It should be understood that the specific structure of the color filter substrate 1 can refer to the content described in the first embodiment, and will not be repeatedly limited here. The manufacturing method of the color filter substrate 1 of the first embodiment will be described in detail below with reference to the accompanying drawings.

如图8所示,彩膜基板1的制作方法可包括:As shown in FIG. 8 , the manufacturing method of the color filter substrate 1 may include:

步骤S100、提供衬底10;Step S100, providing a substrate 10;

步骤S102、在衬底10的调整间隔区上形成电极组,电极组至少包括位于第一区的第一电极14,参考图9所示;Step S102, forming an electrode group on the adjusted interval region of the substrate 10, the electrode group includes at least the first electrode 14 located in the first region, as shown in FIG. 9;

步骤S104、在未形成有电极组的间隔区上形成有遮光部12,参考图10所示;Step S104, forming a light-shielding portion 12 on the spacer where no electrode group is formed, as shown in FIG. 10 ;

步骤S106、在调整间隔区上形成有遮光磁性流体13,遮光磁性流体13的至少部分位于第二区,参考图10所示;Step S106, forming a light-shielding magnetic fluid 13 on the adjustment interval area, at least part of the light-shielding magnetic fluid 13 is located in the second area, as shown in FIG. 10 ;

步骤S108、在色阻区上形成色阻部11,参考图11所示;Step S108, forming a color-resist portion 11 on the color-resist area, as shown in FIG. 11 ;

步骤S110、在色阻部11、遮光部12、第一电极14及遮光磁性流体13远离衬底10的一侧形成平坦层15,平坦层15与色阻部11、遮光部12、第一电极14相接触,并与遮光磁性流体13之间具有间隔,参考图2所示。Step S110, forming a planar layer 15 on the side of the color-resistor 11, the light-shielding part 12, the first electrode 14, and the light-shielding magnetic fluid 13 away from the substrate 10, the planar layer 15 is in contact with the color-resistor 11, the light-shielding part 12, and the first electrode 14, and has a gap with the light-shielding magnetic fluid 13, as shown in FIG. 2 .

其中,在步骤S102中,当仅在第二区的第一方向Y上相对两侧形成第一电极14时,可先执行步骤S104,以使遮光部12与第一电极14先围成用于容纳遮光磁性流体13的腔体,然后再执行步骤S106,即:向遮光部12与第一电极14围成的腔体内填充遮光磁性流体13。Wherein, in step S102, when the first electrodes 14 are only formed on opposite sides in the first direction Y of the second area, step S104 may be performed first, so that the light shielding portion 12 and the first electrode 14 firstly form a cavity for containing the light shielding magnetic fluid 13, and then step S106 is performed, that is, filling the light shielding magnetic fluid 13 into the cavity surrounded by the light shielding portion 12 and the first electrode 14.

应当理解的是,在步骤S102中,在第二区的四周形成环状且呈封闭状的第二电极时,可先执行步骤S104,再执行步骤S106,但不限于此,也可先执行步骤S106,再执行步骤S104,视具体情况而定。It should be understood that, in step S102, when a ring-shaped and closed second electrode is formed around the second region, step S104 may be performed first, and then step S106 may be performed, but not limited thereto, step S106 may also be performed first, and then step S104 may be performed, depending on the specific circumstances.

此外,还需说明的是,步骤S108可在步骤S104和步骤S106之后执行,但不限于此,也可在步骤S104和步骤S106之前执行,视具体情况而定。In addition, it should be noted that step S108 may be performed after step S104 and step S106, but is not limited thereto, and may also be performed before step S104 and step S106, depending on specific circumstances.

在本实施例中,在步骤S110之前,彩膜基板1的制作方法还包括:步骤S1091,在衬底10远离遮光磁性流体13的一侧设置磁性驱动件6,磁性驱动件6向遮光磁性流体13提供磁斥力,以驱动遮光磁性流体13向远离衬底10的方向移动,使得遮光磁性流体13移动至其远离衬底10的表面与第一电极14远离衬底10的表面相平齐,参考图12所示;应当理解的是,在执行步骤S110,以在色阻部11、遮光部12、第一电极14及遮光磁性流体13远离衬底10的一侧形成平坦层15时,磁性驱动件6未被撤除,磁性驱动件6仍然提供磁斥力以保持遮光磁性流体13处于悬浮状态,以与第一电极14远离衬底10的表面相平齐,参考图13所示。此外,在步骤S110之后,彩膜基板1的制作方法还包括:步骤S111,撤除磁性驱动件6的磁斥力,以形成如图2所示的彩膜基板。In this embodiment, before step S110, the manufacturing method of the color filter substrate 1 further includes: step S1091, disposing a magnetic driver 6 on the side of the substrate 10 away from the light-shielding magnetic fluid 13, the magnetic driver 6 provides magnetic repulsion to the light-shielding magnetic fluid 13, so as to drive the light-shielding magnetic fluid 13 to move away from the substrate 10, so that the light-shielding magnetic fluid 13 moves to the surface far away from the substrate 10 and the surface of the first electrode 14 away from the substrate 10 is flush, as shown in FIG. 12; it should be understood; What is more, when performing step S110 to form the flat layer 15 on the side of the color resister 11, the light-shielding portion 12, the first electrode 14 and the light-shielding magnetic fluid 13 away from the substrate 10, the magnetic driving member 6 is not removed, and the magnetic driving member 6 still provides magnetic repulsion to keep the light-shielding magnetic fluid 13 in a suspended state, so as to be flush with the surface of the first electrode 14 away from the substrate 10, as shown in FIG. 13 . In addition, after step S110 , the manufacturing method of the color filter substrate 1 further includes: step S111 , removing the magnetic repulsion force of the magnetic driving member 6 to form the color filter substrate as shown in FIG. 2 .

通过此制作方式制作的彩膜基板1,可在第一电极14处于断电状态时:遮光磁性流体13与平坦层15之间为空腔S,以保证遮光磁性流体13的流动性;在第一电极14处于通电状态时:第二区未被遮光磁性流体13覆盖的区域与平坦层15之间为空腔S,此空腔S可以更好地使光线穿过,以提高感光效果。The color filter substrate 1 produced by this manufacturing method can form a cavity S between the light-shielding magnetic fluid 13 and the flat layer 15 when the first electrode 14 is in a power-off state to ensure the fluidity of the light-shielding magnetic fluid 13; when the first electrode 14 is in an electrified state: a cavity S is formed between the area of the second area not covered by the light-shielding magnetic fluid 13 and the flat layer 15, and the cavity S can better allow light to pass through to improve the photosensitive effect.

其中,当遮光磁性流体13填充后,根据填充量可知其重力N的大小,磁性驱动件6加电对遮光磁性流体13产生斥力M,此M>N,遮光磁性流体13整体便会克服所受重力呈上升状态,待遮光磁性流体13表面和第一电极14表面平齐时,更改磁性驱动件6的加电状况,使其对遮光磁性流体13产生斥力N,此时遮光磁性流体13便处于悬浮状态,以保持与第一电极14远离衬底10的表面相平齐,遮光磁性流体13上升速度及时间可由磁性驱动件6产生的不同斥力控制。Wherein, when the light-shielding magnetic fluid 13 is filled, the magnitude of its gravity N can be known according to the filling amount. The magnetic driving member 6 generates a repulsive force M to the light-shielding magnetic fluid 13 when the power is applied. If M>N, the light-shielding magnetic fluid 13 as a whole will overcome the gravitational force and rise. The electrode 14 is flush with the surface away from the substrate 10 , and the rising speed and time of the light-shielding magnetic fluid 13 can be controlled by the different repulsive forces generated by the magnetic driving member 6 .

实施例三Embodiment Three

实施三与实施例二的区别点在于:本实施例三中的调整结构除了包括第一电极14和遮光磁性流体13之外,调整结构还可包括透光流体17,在第一电极14处于断电状态时:遮光磁性流体13与平坦层15之间充满透光流体17,如图14所示;在第一电极14处于通电状态时:第二区未被遮光磁性流体13覆盖的区域与平坦层15之间充满透光流体17,如图15所示。The difference between the implementation of the three and the embodiment 2 is that the adjustment structure of this embodiment 3 In addition to the first electrode 14 and the oblong magnetic fluid 13, the adjustment structure can also include the light transmittance 17. When the first electrode 14 is in the power disconnection state: the obligatory magnetic fluid 13 and the flat layer 15 are full of transparent fluid 17, as shown in Figure 14; : In the second area, the area that is not covered by light magnetic fluid 13 and the flat layer 15 is full of light transmittance, as shown in Figure 15.

本实施例中,通过设置透光流体17可确保遮光磁性流体13在感光元件2处于开启状态时聚集在第一电极14侧,如图17所示,避免或缓解部分遮光磁性流体13未移动致使调整结构的第二区透过率下降的情况出现,此外,还可使得具有此调整结构的彩膜基板1的制备工艺更易实现,即:简化调整结构上平坦层15的制备工艺。In this embodiment, by setting the light-transmitting fluid 17, it is possible to ensure that the light-shielding magnetic fluid 13 gathers on the side of the first electrode 14 when the photosensitive element 2 is in the open state, as shown in FIG. 17 , avoiding or alleviating the situation that the part of the light-shielding magnetic fluid 13 does not move, resulting in a decrease in the transmittance of the second region of the adjustment structure. In addition, it can also make the preparation process of the color filter substrate 1 with this adjustment structure easier to realize, that is, simplify the preparation process of the flat layer 15 on the adjustment structure.

举例而言,本实施例的透光流体17可为透明树脂颗粒,此透明树脂颗粒主要成分为绝缘、透明状的聚碳酸酯颗粒,其质量轻于遮光磁性流体13。当感光元件2启动工作时,第一电极14通电,遮光磁性流体13受磁力影响向第一电极14侧聚集,透明树脂颗粒为绝缘物质不向两侧的第一电极14聚集,因遮光磁性流体13的移动致使透明树脂颗粒向第二区的中间区移动,如图17所示,进而进一步推动遮光磁性流体13向两侧的第一电极14移动,达到增加透光率的目的,以保证屏下感光元件2的感光质量,例如,在感光元件2为摄像头时,可提高屏下摄像头的成像质量。当第一电极14不通电时,因为遮光磁性流体13的质量大于透明树脂颗粒,遮光磁性流体13下落至调整结构的底部,透明树脂颗粒移动至调整结构的顶部,以此实现应用彩膜基板1的显示面板正常工作状态下遮光的作用。For example, the light-transmitting fluid 17 of this embodiment can be transparent resin particles, and the main component of the transparent resin particles is insulating and transparent polycarbonate particles, which are lighter than the light-shielding magnetic fluid 13 . When the photosensitive element 2 starts to work, the first electrode 14 is energized, and the light-shielding magnetic fluid 13 is affected by the magnetic force and gathers toward the first electrode 14. The transparent resin particles are insulating materials and do not gather to the first electrodes 14 on both sides. The movement of the light-shielding magnetic fluid 13 causes the transparent resin particles to move to the middle area of the second area, as shown in FIG. 2 When it is a camera, it can improve the imaging quality of the camera under the screen. When the first electrode 14 is not energized, because the mass of the light-shielding magnetic fluid 13 is greater than that of the transparent resin particles, the light-shielding magnetic fluid 13 falls to the bottom of the adjustment structure, and the transparent resin particles move to the top of the adjustment structure, thereby realizing the light-shielding effect of the display panel using the color filter substrate 1 under normal working conditions.

应当理解的是,由于透光流体17的质量轻于遮光磁性流体13,因此,在将彩膜基板1对盒设置在阵列基板3的上方时,具体地,在平坦层15位于衬底10靠近阵列基板3的一侧时,在第一电极14处于断电状态(即:感光元件2未启动)时,透光流体17会位于遮光磁性流体13与衬底10之间,如图16所示。It should be understood that since the light-transmitting fluid 17 is lighter than the light-shielding magnetic fluid 13, when the color filter substrate 1 pair is placed above the array substrate 3, specifically, when the flat layer 15 is located on the side of the substrate 10 close to the array substrate 3, and when the first electrode 14 is in a power-off state (that is, the photosensitive element 2 is not activated), the light-transmitting fluid 17 will be located between the light-shielding magnetic fluid 13 and the substrate 10, as shown in FIG. 16 .

应当理解的是,本实施例三除了前面提到的与实施例一不同,其余均可参考实施例一的内容,在此不作重复限定。It should be understood that, except for the above-mentioned difference between the third embodiment and the first embodiment, the content of the first embodiment can be referred to, and no repeated limitations are made here.

实施例四Embodiment Four

基于实施例三提到的彩膜基板1的结构,本实施例四提供了一种彩膜基板1的制作方法,应当理解的是,彩膜基板1的具体结构可参考实施三所描述的内容,在此不作重复限定。Based on the structure of the color filter substrate 1 mentioned in the third embodiment, the fourth embodiment provides a method for manufacturing the color filter substrate 1. It should be understood that the specific structure of the color filter substrate 1 can refer to the content described in the third embodiment, and no repeated limitations are made here.

此外,本实施例四的彩膜基板1的制作方法与本实施例二的彩膜基板1的制作方法的主要区别在于:本实施例四在步骤S110之前,彩膜基板1的制作方法不包括步骤S1091,而是包括:步骤S1092,在遮光磁性流体13远离衬底10的一侧填充透光流体17,如图18所示,透光流体17与第一电极14远离衬底10的表面相平齐,然后再制作平坦层15,这样制作完的平坦层15与色阻部11、遮光部12、第一电极14、透光流体17均相接触,参考图14所示。In addition, the main difference between the manufacturing method of the color filter substrate 1 of the fourth embodiment and the manufacturing method of the color filter substrate 1 of the second embodiment is that the manufacturing method of the color filter substrate 1 of the fourth embodiment does not include step S1091 before step S110, but includes: step S1092, filling the transparent fluid 17 on the side of the light-shielding magnetic fluid 13 away from the substrate 10, as shown in FIG. , the planar layer 15 fabricated in this way is in contact with the color resist portion 11 , the light shielding portion 12 , the first electrode 14 , and the light-transmitting fluid 17 , as shown in FIG. 14 .

本实施例通过先在遮光磁性流体13远离衬底10的一侧填充透光流体17,再制作平坦层15,这样可使得彩膜基板1的制备工艺更易实现,即:简化调整结构上平坦层15的制备工艺。In this embodiment, the light-shielding magnetic fluid 13 is first filled with the light-transmitting fluid 17 on the side away from the substrate 10, and then the flat layer 15 is made, which makes the preparation process of the color filter substrate 1 easier to realize, that is, simplifies the preparation process of the flat layer 15 on the adjustment structure.

应当理解的是,本实施例四除了前面提到的与实施例二不同,其余均可参考实施例二的内容,在此不作重复限定。It should be understood that, except for the difference between Embodiment 4 and Embodiment 2 mentioned above, the content of Embodiment 2 can be referred to for the rest, and no repeated limitations are made here.

实施例五Embodiment five

本实施例五与实施例一或实施例三的主要区别在于:参考图19或图20所示,本实施例五的调整结构还可包括第二电极18,此第二电极18位于第二区,且为透明导电体的第二电极18,第二电极18与第一电极14水平间隔排布,这样可使第一电极14和第二电极18可独立控制,其中,第二电极18形成在衬底10上,第二电极18的厚度小于第一电极14的厚度,遮光磁性流体13的至少部分填充在第二电极18与平坦层15之间。The main difference between the fifth embodiment and the first or third embodiment is that, as shown in FIG. 19 or FIG. 20 , the adjustment structure of the fifth embodiment can also include a second electrode 18, which is located in the second area and is a second electrode 18 of a transparent conductor. The second electrode 18 and the first electrode 14 are horizontally spaced apart, so that the first electrode 14 and the second electrode 18 can be independently controlled. The second electrode 18 is formed on the substrate 10. At least part of 13 is filled between the second electrode 18 and the planarization layer 15 .

本实施例的第二电极18能够在第一电极14处于断电状态时处于通电状态,第二电极18能够在第一电极14处于通电状态时处于断电状态,也就是说,在感光元件2未启动时,第一电极14处于断电状态,第二电极18处于通电状态,遮光磁性流体13在第二电极18处于通电状态时受到来自第二电极18的磁场作用以进行流动,使得遮光磁性流体13完全覆盖第二区,参考图21所示(或参考图22所示);在感光元件2启动时,在感光元件2启动时,第一电极14处于通电状态,遮光磁性流体13在第一电极14所产生的磁场作用下发生聚集,这样使得第二区的至少部分未被遮光磁性流体13覆盖,参考图23所示(或参考图24所示)此外,由于第二电极18为透明导电体,未被遮光磁性流体13覆盖的第二区以及第二电极18可允许光线透过,这样增加了屏下感光元件2启动时对应区域的透光率。The second electrode 18 of this embodiment can be in the power-on state when the first electrode 14 is in the power-off state, and the second electrode 18 can be in the power-off state when the first electrode 14 is in the power-on state. 22); when the photosensitive element 2 is started, the first electrode 14 is in a energized state, and the light-shielding magnetic fluid 13 gathers under the magnetic field effect produced by the first electrode 14, so that at least part of the second area is not covered by the light-shielding magnetic fluid 13, as shown in Figure 23 (or shown in Figure 24). 2 The light transmittance of the corresponding area when starting up.

本实施例中,通过设置第二电极18可确保在感光元件2未启动(即:不工作)时,遮光磁性流体13在不同使用环境下均能够完全覆盖第二区,起到遮光作用,也就是说,本实施例的彩膜基板1的使用环境不限于水平放置、小角度倾斜等使用环境状态,也可使用在竖直使用环境或大角度倾斜使用环境,即:本实施例的彩膜基板1、具有此彩膜基板1的显示面板的适用范围更广泛。In this embodiment, by setting the second electrode 18, it can be ensured that when the photosensitive element 2 is not activated (i.e. not working), the light-shielding magnetic fluid 13 can completely cover the second area under different usage environments to play a light-shielding effect. That is to say, the usage environment of the color filter substrate 1 of this embodiment is not limited to the usage environment conditions such as horizontal placement and small-angle inclination, but can also be used in a vertical usage environment or a large-angle tilt usage environment.

举例而言,此遮光磁性流体13可在第二电极18产生的磁场驱动下向靠近第二电极18所在的位置聚集,使得第二电极18、第二电极18与第一电极14之间的间隙均被遮光磁性流体13完全覆盖,即:第二区完全被遮光磁性流体13覆盖,也就是说,第二电极18在通电时与遮光磁性流体13之间产生有磁吸力,以吸引遮光磁性流体13向其所在方向聚集。For example, the light-shielding magnetic fluid 13 can be driven by the magnetic field generated by the second electrode 18 to gather toward the position close to the second electrode 18, so that the second electrode 18, the gap between the second electrode 18 and the first electrode 14 are all completely covered by the light-shielding magnetic fluid 13, that is, the second area is completely covered by the light-shielding magnetic fluid 13, that is, when the second electrode 18 is electrified, a magnetic attraction is generated between the light-shielding magnetic fluid 13 to attract the light-shielding magnetic fluid 13 to gather in its direction.

此外,还需说明的是,在本实施例的彩膜基板1在处于水平放置或小角度倾斜等使用环境状态时,第二电极18在感光元件2未启动时也可不通电,此时,第二电极18、第二电极18与第一电极14之间的间隙在衬底10上的正投影均被遮光磁性流体13在衬底10上的正投影完全覆盖,在本实施例的彩膜基板1在处于竖直放置或大角度倾斜等使用环境状态时,第二电极18在感光元件2未启动时则需要通电,以保证第二电极18、第二电极18与第一电极14之间的间隙均被遮光磁性流体13完全覆盖。In addition, it should be noted that when the color filter substrate 1 of this embodiment is placed horizontally or tilted at a small angle, the second electrode 18 may not be energized when the photosensitive element 2 is not activated. 8 When the photosensitive element 2 is not activated, it needs to be energized to ensure that the second electrode 18 and the gap between the second electrode 18 and the first electrode 14 are completely covered by the light-shielding magnetic fluid 13 .

其中,如图25所示,第一电极14与第二电极18之间的间隙h3范围为0.5μm至1.5μm,比如:0.5μm、0.75μm、1μm、1.25μm、1.5μm等,这样在保证第一电极14和第二电极18之间的间隙满足独立控制且容易加工的同时,还可在第二电极18通电时使得第二电极18与第一电极14之间的间隙被遮光磁性流体13完全覆盖,保证遮光效果。Wherein, as shown in FIG. 25 , the gap h3 between the first electrode 14 and the second electrode 18 ranges from 0.5 μm to 1.5 μm, such as: 0.5 μm, 0.75 μm, 1 μm, 1.25 μm, 1.5 μm, etc., so that while ensuring that the gap between the first electrode 14 and the second electrode 18 meets independent control and is easy to process, the gap between the second electrode 18 and the first electrode 14 can be completely covered by the light-shielding magnetic fluid 13 when the second electrode 18 is energized. Cover to ensure shading effect.

示例地,第二电极18的厚度范围可为0.5μm至1μm,比如:0.5μm、0.6μm、0.7μm、0.8μm、0.9μm、1μm等,这样在保证其透光性的同时,还可保证在感光元件2未启动时第二电极18所产生的磁场强度,以使遮光磁性流体13快速向靠近第二电极18所在的位置聚集,使得第二电极18、第二电极18与第一电极14之间的间隙均被遮光磁性流体13完全覆盖,保证调整结构在感光元件2未启动时的遮光效果。For example, the thickness range of the second electrode 18 can be 0.5 μm to 1 μm, such as: 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, 1 μm, etc., so that while ensuring its light transmittance, it can also ensure the strength of the magnetic field generated by the second electrode 18 when the photosensitive element 2 is not activated, so that the light-shielding magnetic fluid 13 quickly gathers to the position close to the second electrode 18, so that the second electrode 18, the second electrode 18 and the first electrode 1 The gaps between 4 are completely covered by the light-shielding magnetic fluid 13 to ensure the light-shielding effect of the adjustment structure when the photosensitive element 2 is not activated.

示例地,如图26所示,第二电极18的一部分可延伸至衬底10的非显示区B并形成第二转接部180,此第二电极18的第二转接部180和第一电极14的第一转接部140分别与阵列基板3中对应位置的导电连接点31连接,其中,第二转接部180和第一转接部140间隔设置,以使得第二转接部180和第一转接部140可相互独立控制。For example, as shown in FIG. 26 , a part of the second electrode 18 may extend to the non-display area B of the substrate 10 and form a second transition portion 180. The second transition portion 180 of the second electrode 18 and the first transition portion 140 of the first electrode 14 are respectively connected to the conductive connection points 31 at corresponding positions in the array substrate 3. The second transition portion 180 and the first transition portion 140 are spaced apart so that the second transition portion 180 and the first transition portion 140 can be controlled independently of each other.

其中,如图26所示,第一转接部140与第二转接部180的厚度可相等,以便于在彩膜基板1与阵列基板3对盒设置后,第一转接部140、第二转接部180可同时通过各向异性导电胶19与阵列基板3对应位置的第一导电连接点310、第二导电连接点311连接。Wherein, as shown in FIG. 26 , the thickness of the first transition part 140 and the second transition part 180 can be equal, so that after the color filter substrate 1 and the array substrate 3 are arranged in a box, the first transition part 140 and the second transition part 180 can be connected to the first conductive connection point 310 and the second conductive connection point 311 at the corresponding position of the array substrate 3 through the anisotropic conductive glue 19 at the same time.

需要说明的是,如图25所示,第一电极14与第二电极18在第二方向X上整体的延伸长度可相等。It should be noted that, as shown in FIG. 25 , the overall extension lengths of the first electrode 14 and the second electrode 18 in the second direction X may be equal.

在本实施例中,第一电极14不限于实施例一中提到的非透明导电体,也可为可为透明导电体,此第一电极14可与本实施例的第二电极18同层设置,此同层设置指的是第一电极14与第二电极18采用相同的透明导电材料,并采用同一道掩膜工序制作而成,这样可减少掩膜工序,从而降低成本。In this embodiment, the first electrode 14 is not limited to the non-transparent conductor mentioned in Embodiment 1, and may also be a transparent conductor. The first electrode 14 and the second electrode 18 of this embodiment can be arranged on the same layer. The arrangement on the same layer means that the first electrode 14 and the second electrode 18 are made of the same transparent conductive material, and are manufactured by the same masking process, which can reduce the masking process, thereby reducing costs.

需要说明的是,由于第一电极14的宽度较小,在第一方向Y上相邻两行色阻区之间的间隔较大,具体参考实施例一中提到的第一电极14的宽度范围为0.5μm至2μm,在第一方向Y上相邻两行色阻区之间的间隔可为100μm级,因此,在第一电极14为透明导电体时,第一电极14对调整结构的遮光性能的影响较小,可忽略不计。It should be noted that since the width of the first electrode 14 is small, the distance between two adjacent rows of color-resist regions in the first direction Y is relatively large. Specifically, referring to the width range of the first electrode 14 mentioned in Embodiment 1 is 0.5 μm to 2 μm, the distance between two adjacent rows of color-resist regions in the first direction Y can be on the order of 100 μm. Therefore, when the first electrode 14 is a transparent conductor, the influence of the first electrode 14 on the light-shielding performance of the adjustment structure is small and negligible.

应当理解的是,本实施例五除了前面提到的与实施例一和实施例三不同,其余均可参考实施例一或实施例三的内容,在此不作重复限定。It should be understood that, except for the aforementioned differences between Embodiment 1 and Embodiment 3, the fifth embodiment can refer to the content of Embodiment 1 or Embodiment 3, and will not be repeatedly limited here.

实施例六Embodiment six

基于实施例五提到的彩膜基板1的结构,本实施例六提供了一种彩膜基板1的制作方法,应当理解的是,彩膜基板1的具体结构可参考实施五所描述的内容,在此不作重复限定。Based on the structure of the color filter substrate 1 mentioned in the fifth embodiment, the sixth embodiment provides a method for manufacturing the color filter substrate 1. It should be understood that the specific structure of the color filter substrate 1 can refer to the content described in the fifth embodiment, and no repeated limitations are made here.

此外,本实施例六的彩膜基板1的制作方法与本实施例二和本实施例四的彩膜基板1的制作方法的主要区别在于:步骤S102具体包括:In addition, the main difference between the manufacturing method of the color filter substrate 1 in the sixth embodiment and the manufacturing methods of the color filter substrate 1 in the second embodiment and the fourth embodiment is that step S102 specifically includes:

步骤S1021,在调整间隔区的第一区上形成第一电极14;Step S1021, forming the first electrode 14 on the first region of the adjustment interval region;

步骤S1022,在调整间隔区的第二区上形成第二电极18,第二电极18与第一电极14间隔排布,参考图27所示。Step S1022 , forming the second electrode 18 on the second area of the adjusted spacing area, the second electrode 18 is arranged at intervals with the first electrode 14 , as shown in FIG. 27 .

其中,在第一电极14为非透明导电体,第二电极18为透明导电体时,可先执行步骤S1021,再执行步骤S1022;也可先执行步骤S1022,再执行步骤S1021。Wherein, when the first electrode 14 is a non-transparent conductor and the second electrode 18 is a transparent conductor, step S1021 can be executed first, and then step S1022 can be executed; or step S1022 can be executed first, and then step S1021 can be executed.

此外,在第一电极14和第二电极18均为透明导电体时,步骤S1021与步骤S1022可同时执行,比如:可先在衬底10上形成透明导电层,然后对透明导电层进行图案化处理,以形成如图27所示的结构。In addition, when the first electrode 14 and the second electrode 18 are both transparent conductors, step S1021 and step S1022 can be performed simultaneously, for example, a transparent conductive layer can be formed on the substrate 10 first, and then the transparent conductive layer can be patterned to form the structure shown in FIG. 27 .

应当理解的是,本实施例六除了前面提到的与实施例二和实施例四不同,其余均可参考实施例二或实施例四的内容,在此不作重复限定。It should be understood that, except for the above-mentioned differences between Embodiment 6 and Embodiment 2 and Embodiment 4, the content of Embodiment 2 or Embodiment 4 can be referred to for the rest, and no repeated limitations are made here.

实施例七Embodiment seven

本公开实施例七提供了一种显示面板,其包括实施例一、实施例三或实施例五所描述的彩膜基板1以及与彩膜基板1对盒设置的阵列基板3。Embodiment 7 of the present disclosure provides a display panel, which includes the color filter substrate 1 described in Embodiment 1, Embodiment 3 or Embodiment 5, and an array substrate 3 arranged in a box with the color filter substrate 1 .

应当理解的是,彩膜基板1的显示区A和非显示区B即可理解为整个显示面板的显示区A和非显示区B。It should be understood that the display area A and the non-display area B of the color filter substrate 1 can be understood as the display area A and the non-display area B of the entire display panel.

举例而言,此显示面板可为液晶显示面板,即:参考图5、图16、图21或图22所示,显示面板除了包括对盒设置的彩膜基板1、阵列基板3,还可包括填充在彩膜基板1和阵列基板3之间的液晶层(图中未示出)、环绕液晶层设置的封框胶7以及上偏光片91和下偏光片92,此封框胶7设于彩膜基板1和阵列基板3之间,并位于显示面板的非显示区B,此上偏光片91可位于彩膜基板1远离阵列基板3的一侧,下偏光片92可位于阵列基板3远离彩膜基板1的一侧。For example, the display panel can be a liquid crystal display panel, that is, as shown in FIG. 5 , FIG. 16 , FIG. 21 or FIG. 22 , in addition to the color filter substrate 1 and the array substrate 3 arranged in opposite boxes, the display panel can also include a liquid crystal layer (not shown in the figure) filled between the color filter substrate 1 and the array substrate 3 , a sealant 7 arranged around the liquid crystal layer, and an upper polarizer 91 and a lower polarizer 92. The sealant 7 is arranged between the color filter substrate 1 and the array substrate 3 and is located in the non-display area B of the display panel. The upper polarizer 91 can be located on the side of the color filter substrate 1 away from the array substrate 3 , and the lower polarizer 92 can be located on the side of the array substrate 3 away from the color filter substrate 1 .

下面以实施例五所描述的彩膜基板1为例进行说明。The following takes the color filter substrate 1 described in the fifth embodiment as an example for illustration.

如图26所示,在非显示区B中:阵列基板3设置有与第一电极14的第一转接部140对应的第一导电连接点310,与第二电极18的第二转接部180对应的第二导电连接点311,此第一导电连接点310和第二导电连接点311间隔设置,且第一导电连接点310和第二导电连接点311上可涂覆有各向异性导电胶19(各向异性导电胶19上下导通、左右不导通),以与第一转接部140和第二转接部180电性连接。As shown in FIG. 26 , in the non-display area B: the array substrate 3 is provided with a first conductive connection point 310 corresponding to the first transition portion 140 of the first electrode 14, and a second conductive connection point 311 corresponding to the second transition portion 180 of the second electrode 18. The first conductive connection point 310 and the second conductive connection point 311 are arranged at intervals, and the first conductive connection point 310 and the second conductive connection point 311 can be coated with an anisotropic conductive adhesive 19 (the anisotropic conductive adhesive 19 leads up and down. conduction, left and right non-conduction), so as to be electrically connected with the first transition part 140 and the second transition part 180.

参考图4所示,显示面板还可包括用于产生控制信号的柔性电路板5和集成电路4,此柔性电路板5或集成电路4可与阵列基板3中位于非显示区B的绑定区B1进行绑定,其中,第一导电连接点310和第二导电连接点311分别通过独立的控制信号线与集成电路4或柔性电路板5连接,柔性电路板5、集成电路4产生的控制信号经由阵列基板3外围(位于非显示区B)的控制信号线传递至对应导电连接点31,实现对第一电极14和第二电极18的控制。As shown in FIG. 4 , the display panel can also include a flexible circuit board 5 and an integrated circuit 4 for generating control signals. The flexible circuit board 5 or integrated circuit 4 can be bound to the binding area B1 located in the non-display area B of the array substrate 3, wherein the first conductive connection point 310 and the second conductive connection point 311 are respectively connected to the integrated circuit 4 or the flexible circuit board 5 through independent control signal lines. Control of the first electrode 14 and the second electrode 18 .

此外,若在调整结构的第一电极14设置两个且分别独立控制时,则阵列基板3上第一导电连接点310也可设置两个,并分别通过独立的控制信号线与集成电路4或柔性电路板5连接,若在调整结构的第一电极14设置两个且分别共同控制时,则阵列基板3上第一导电连接点310也可设置两个且串联,以通过同一条控制信号线与集成电路4或柔性电路板5连接。In addition, if there are two first electrodes 14 for adjusting the structure and they are independently controlled, then two first conductive connection points 310 can also be set on the array substrate 3 and connected to the integrated circuit 4 or flexible circuit board 5 through independent control signal lines, respectively;

实施例八Embodiment eight

本公开实施例八还提供了一种显示装置,参考图5、图16、图21或图22所示,其包括实施例七所描述的显示面板及感光元件2,感光元件2设于阵列基板3背离彩膜基板1的一侧,并与感光显示区A1对应设置。Embodiment 8 of the present disclosure also provides a display device, as shown in FIG. 5 , FIG. 16 , FIG. 21 or FIG. 22 , which includes the display panel described in Embodiment 7 and the photosensitive element 2 . The photosensitive element 2 is arranged on the side of the array substrate 3 away from the color filter substrate 1 and is arranged corresponding to the photosensitive display area A1.

此感光元件2可为摄像头,但不限于此,也可为面部识别传感器或指纹识别传感器等等,视具体情况而定。The photosensitive element 2 can be a camera, but is not limited thereto, and can also be a face recognition sensor or a fingerprint recognition sensor, etc., depending on specific circumstances.

以感光元件2为摄像头为例进行说明,在摄像头启动时,通过第一电极14与遮光磁性流体13之间的配合(通过第二电极18、第一电极14及遮光磁性流体13之间的配合),以使调整结构的大部分处于透光状态,这样增加了屏下摄像头启动时对应区域的透光率,确保屏下摄像头的成像质量,且在摄像头未启动时,通过第一电极14与遮光磁性流体13之间的配合(通过第二电极18、第一电极14及遮光磁性流体13之间的配合),以使调整结构整体处于遮光状态,这样提高了屏下摄像头未启动时对应区域的遮光效果,从而可提高整体的显示效果。Taking the photosensitive element 2 as a camera as an example, when the camera is started, through the cooperation between the first electrode 14 and the light-shielding magnetic fluid 13 (through the cooperation between the second electrode 18, the first electrode 14 and the light-shielding magnetic fluid 13), most of the adjustment structure is in a light-transmitting state, which increases the light transmittance of the corresponding area when the camera under the screen is started, and ensures the imaging quality of the camera under the screen. Coordination between the first electrode 14 and the light-shielding magnetic fluid 13), so that the adjustment structure is in a light-shielding state as a whole, which improves the light-shielding effect of the corresponding area when the camera under the screen is not activated, thereby improving the overall display effect.

应当理解的是,在此显示面板为液晶显示面板时,参考图5、图16、图21或图22所示,显示装置还可包括背光模组8,此背光模组8可位于阵列基板3远离彩膜基板1的一侧,以提供显示光源。It should be understood that, when the display panel is a liquid crystal display panel, as shown in FIG. 5, FIG. 16, FIG. 21 or FIG. 22, the display device may further include a backlight module 8, and the backlight module 8 may be located on the side of the array substrate 3 away from the color filter substrate 1 to provide a display light source.

在本说明书的描述中,参考术语“示例地”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本公开的至少一个实施例或示例中。在本说明书中,对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外,在不相互矛盾的情况下,本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。In the description of this specification, a description referring to the term "exemplarily" and the like means that a specific feature, structure, material or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present disclosure. In this specification, the schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the described specific features, structures, materials or characteristics may be combined in any suitable manner in any one or more embodiments or examples. In addition, those skilled in the art can combine and combine different embodiments or examples and features of different embodiments or examples described in this specification without conflicting with each other.

尽管上面已经示出和描述了本公开的实施例,可以理解的是,上述实施例是示例性的,不能理解为对本公开的限制,本领域的普通技术人员在本公开的范围内可以对上述实施例进行变化、修改、替换和变型,故但凡依本公开的权利要求和说明书所做的变化或修饰,皆应属于本公开专利涵盖的范围之内。Although the embodiments of the present disclosure have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be construed as limitations on the present disclosure. Those skilled in the art can change, modify, replace and modify the above embodiments within the scope of the present disclosure, so any changes or modifications made according to the claims and description of the present disclosure should fall within the scope covered by the patent of the present disclosure.

Claims (13)

1.一种彩膜基板,包括衬底,所述衬底的显示区包括与感光元件对应的感光显示区,所述感光显示区具有多个间隔设置的色阻区及位于相邻所述色阻区之间的间隔区,所述感光显示区的色阻区上设置有色阻部,其特征在于,1. A color filter substrate, comprising a substrate, the display area of the substrate includes a photosensitive display area corresponding to the photosensitive element, the photosensitive display area has a plurality of spaced apart color resistance areas and a spacer area between adjacent color resistance areas, the color resistance area of the photosensitive display area is provided with a color resistance part, it is characterized in that, 所述感光显示区的至少部分间隔区为调整间隔区,所述调整间隔区设置有调整结构,且所述彩膜基板还包括平坦层,所述平坦层设置于所述色阻部和所述调整结构远离所述衬底的一侧;At least a part of the interval area of the photosensitive display area is an adjustment interval area, and the adjustment interval area is provided with an adjustment structure, and the color filter substrate further includes a flat layer, and the flat layer is arranged on the side of the color resist part and the adjustment structure away from the substrate; 所述调整间隔区包括水平排布的第一区和第二区,所述调整结构包括位于所述第一区的第一电极和至少部分位于所述第二区的遮光磁性流体,所述遮光磁性流体在所述第二区的填充厚度小于所述平坦层和所述衬底之间的厚度;The adjustment interval area includes a first area and a second area arranged horizontally, the adjustment structure includes a first electrode located in the first area and a light-shielding magnetic fluid at least partially located in the second area, and the filling thickness of the light-shielding magnetic fluid in the second area is smaller than the thickness between the planar layer and the substrate; 其中,在所述第一电极处于断电状态时,所述遮光磁性流体完全覆盖所述第二区;在所述第一电极处于通电状态时,所述遮光磁性流体受到所述第一电极的磁场作用以进行流动,使得至少部分所述第二区未被所述遮光磁性流体覆盖。Wherein, when the first electrode is in a power-off state, the light-shielding magnetic fluid completely covers the second region; when the first electrode is in a power-on state, the light-shielding magnetic fluid flows under the action of the magnetic field of the first electrode, so that at least part of the second region is not covered by the light-shielding magnetic fluid. 2.根据权利要求1所述的彩膜基板,其特征在于,所述调整间隔区设置在第一方向上相邻两行所述色阻区之间,2 . The color filter substrate according to claim 1 , wherein the adjustment interval area is arranged between two adjacent rows of the color resistance areas in the first direction, 其中,所述第一区与第二区在第一方向上水平排布,所述第一电极完全覆盖所述第一区,所述遮光磁性流体完全位于所述第二区并能够在所述第二区上流动。Wherein, the first area and the second area are arranged horizontally in the first direction, the first electrode completely covers the first area, and the light-shielding magnetic fluid is completely located in the second area and can flow on the second area. 3.根据权利要求2所述的彩膜基板,其特征在于,3. The color filter substrate according to claim 2, characterized in that, 所述第一电极的宽度范围为0.5μm至2μm;和/或The first electrode has a width ranging from 0.5 μm to 2 μm; and/or 所述第一电极和与其相邻且位于所述感光显示区的多个色阻部相贴合;和/或The first electrode is attached to a plurality of color-resisting parts adjacent to it and located in the photosensitive display area; and/or 所述第二区在第一方向上的相对两侧均设置有所述第一区,每个所述第一区上均设置有所述第一电极,且各所述第一区上的第一电极共同控制或相互独立控制;和/或The second area is provided with the first area on opposite sides in the first direction, each of the first areas is provided with the first electrode, and the first electrodes on each of the first areas are controlled jointly or independently; and/or 所述遮光磁性流体为黑色磁性油墨,所述黑色磁性油墨包括60%~80%的颜料、15%~35%的连接料、5%的添加料;和/或The light-shielding magnetic fluid is black magnetic ink, and the black magnetic ink includes 60% to 80% of pigments, 15% to 35% of binders, and 5% of additives; and/or 所述遮光磁性流体在所述第二区的填充厚度与所述平坦层和所述衬底之间厚度的比值范围为1/3~2/3。The ratio of the filling thickness of the light-shielding magnetic fluid in the second region to the thickness between the planar layer and the substrate ranges from 1/3 to 2/3. 4.根据权利要求2所述的彩膜基板,其特征在于,4. The color filter substrate according to claim 2, characterized in that, 所述衬底的显示区还包括与所述感光显示区相邻的主显示区,所述主显示区具有多个间隔设置的色阻区及位于相邻所述色阻区之间的间隔区,所述主显示区的色阻区上设置有色阻部,所述感光显示区中除了所述调整间隔区之外的其他间隔区以及所述主显示区的间隔区均设置有遮光部,其中,The display area of the substrate also includes a main display area adjacent to the light-sensitive display area, the main display area has a plurality of color-resist areas arranged at intervals and spacers between adjacent color-resist areas, color-resist parts are arranged on the color-resist areas of the main display area, and light-shielding parts are provided in other space areas in the light-sensitive display area except for the adjustment space area and the space areas of the main display area, wherein, 所述主显示区中色阻部的分布密度与所述感光显示区中色阻部的分布密度相等;和/或The distribution density of the color-resisting parts in the main display area is equal to the distribution density of the color-resisting parts in the photosensitive display area; and/or 所述第二区在第一方向上的相对两侧均设置有所述第一区,每个所述第一区上均形成有所述第一电极,位于所述第二区在第一方向上相对两侧的第一电极与位于所述第二区在第二方向上相对两侧的遮光部围成用于容纳遮光磁性流体的腔体,所述第二方向与所述第一方向相交。The second area is provided with the first area on opposite sides in the first direction, each of the first areas is formed with the first electrode, the first electrodes located on the opposite sides of the second area in the first direction and the light shielding parts located on the opposite sides of the second area in the second direction enclose a cavity for containing the light-shielding magnetic fluid, and the second direction intersects the first direction. 5.根据权利要求1所述的彩膜基板,其特征在于,5. The color filter substrate according to claim 1, characterized in that, 在所述第一电极处于断电状态时,所述遮光磁性流体与所述平坦层之间为空腔;在所述第一电极处于通电状态时,所述第二区未被所述遮光磁性流体覆盖的区域与所述平坦层之间为空腔;或When the first electrode is in a power-off state, there is a cavity between the light-shielding magnetic fluid and the flat layer; when the first electrode is in a power-on state, there is a cavity between the area of the second region not covered by the light-shielding magnetic fluid and the flat layer; or 所述调整结构还包括透光流体,在所述第一电极处于断电状态时,所述遮光磁性流体与所述平坦层之间充满所述透光流体;在所述第一电极处于通电状态时,所述第二区未被所述遮光磁性流体覆盖的区域与所述平坦层之间充满所述透光流体。The adjustment structure further includes a light-transmitting fluid. When the first electrode is in a power-off state, the light-shielding magnetic fluid and the flat layer are filled with the light-transmitting fluid; when the first electrode is in a power-on state, the light-transmitting fluid is filled between the area of the second region not covered by the light-shielding magnetic fluid and the flat layer. 6.根据权利要求2至5中任一项所述的彩膜基板,其特征在于,所述调整结构还包括位于所述第二区且为透明导电体的第二电极,所述第二电极与所述第一电极水平间隔排布,所述第二电极形成在所述衬底上,所述第二电极的厚度小于所述第一电极的厚度,至少部分所述遮光磁性流体填充在所述第二电极与所述平坦层之间;6. The color filter substrate according to any one of claims 2 to 5, wherein the adjustment structure further comprises a second electrode located in the second region and being a transparent conductor, the second electrode is arranged horizontally at intervals from the first electrode, the second electrode is formed on the substrate, the thickness of the second electrode is smaller than the thickness of the first electrode, and at least part of the light-shielding magnetic fluid is filled between the second electrode and the flat layer; 其中,在所述第一电极处于断电状态时,所述第二电极处于通电状态,所述遮光磁流体完全覆盖所述第二电极;在所述第一电极处于通电状态时,所述第二电极处于断电状态。Wherein, when the first electrode is in the power-off state, the second electrode is in the power-on state, and the light-shielding magnetic fluid completely covers the second electrode; when the first electrode is in the power-on state, the second electrode is in the power-off state. 7.根据权利要求6所述的彩膜基板,其特征在于,7. The color filter substrate according to claim 6, characterized in that, 所述第一电极为非透明导电体;或The first electrode is a non-transparent conductor; or 所述第一电极为透明导电体,所述第一电极与所述第二电极同层设置。The first electrode is a transparent conductor, and the first electrode and the second electrode are arranged on the same layer. 8.根据权利要求6所述的彩膜基板,其特征在于,所述第二电极的厚度范围为0.5μm至1μm;和/或8. The color filter substrate according to claim 6, wherein the second electrode has a thickness ranging from 0.5 μm to 1 μm; and/or 所述第一电极与所述第二电极之间的间隙范围为0.5μm至1.5μm;和/或The gap between the first electrode and the second electrode ranges from 0.5 μm to 1.5 μm; and/or 所述第一电极的一部分延伸至所述衬底的非显示区并形成第一转接部,所述第二电极的一部分延伸至所述衬底的非显示区并形成第二转接部,所述第一转接部与所述第二转接部间隔设置且厚度相等。A part of the first electrode extends to the non-display area of the substrate and forms a first transition part, a part of the second electrode extends to the non-display area of the substrate and forms a second transition part, and the first transition part and the second transition part are arranged at intervals and have the same thickness. 9.一种如权利要求1所述的彩膜基板的制作方法,其特征在于,所述制作方法包括:9. A manufacturing method of the color filter substrate according to claim 1, characterized in that the manufacturing method comprises: 提供衬底,所述衬底的显示区包括用于与感光元件相对的感光显示区,所述感光显示区具有多个间隔设置的色阻区及位于相邻所述色阻区之间的间隔区,所述感光显示区的至少部分间隔区为调整间隔区,所述调整间隔区包括水平排布的第一区和第二区;A substrate is provided, the display area of the substrate includes a photosensitive display area opposite to the photosensitive element, the photosensitive display area has a plurality of color-resistive areas arranged at intervals and a spacer between adjacent color-resistive areas, at least part of the spacer of the photosensitive display area is an adjustment spacer, and the adjustment spacer includes a first area and a second area arranged horizontally; 在所述调整间隔区上形成电极组,所述电极组至少包括位于所述第一区的第一电极;An electrode group is formed on the adjustment interval region, the electrode group includes at least a first electrode located in the first region; 在未形成有所述电极组的间隔区上形成有遮光部;a light shielding portion is formed on the spacer region where the electrode group is not formed; 在所述调整间隔区上形成有遮光磁性流体,所述遮光磁性流体的至少部分位于所述第二区;A light-shielding magnetic fluid is formed on the adjustment spacer, at least part of the light-shielding magnetic fluid is located in the second zone; 在所述色阻区上形成色阻部;forming a color-resist portion on the color-resist area; 在所述色阻部、所述遮光部、所述第一电极及所述遮光磁性流体远离所述衬底的一侧形成平坦层,所述平坦层与所述色阻部、所述遮光部、所述第一电极相接触,并与所述遮光磁性流体之间具有间隔。A planar layer is formed on the side of the color-resistor, the light-shielding part, the first electrode, and the light-shielding magnetic fluid away from the substrate, the planar layer is in contact with the color-resistor, the light-shielding part, and the first electrode, and has a gap with the light-shielding magnetic fluid. 10.根据权利要求9所述的制作方法,其特征在于,在所述调整间隔区上形成电极组的步骤,包括:10. The manufacturing method according to claim 9, characterized in that the step of forming an electrode group on the adjustment spacer includes: 在所述调整间隔区的第一区上形成第一电极;forming a first electrode on a first region of the adjustment spacer; 在所述调整间隔区的第二区上形成第二电极,所述第二电极与所述第一电极间隔排布。A second electrode is formed on the second region of the adjustment interval region, and the second electrode is spaced apart from the first electrode. 11.根据权利要求9或10所述的制作方法,其特征在于,11. The preparation method according to claim 9 or 10, characterized in that, 在所述色阻部、所述遮光部、所述第一电极及所述遮光磁性流体远离所述衬底的一侧形成平坦层的步骤之前,所述制作方法还包括:在所述衬底远离所述遮光磁性流体的一侧设置磁性驱动件,所述磁性驱动件向所述遮光磁性流体提供磁斥力,以驱动所述遮光磁性流体向远离所述衬底的方向移动,使得所述遮光磁性流体移动至其远离所述衬底的表面与所述第一电极远离所述衬底的表面相平齐,且在所述色阻部、所述遮光部、所述第一电极及所述遮光磁性流体远离所述衬底的一侧形成平坦层的步骤之后,所述制作方法还包括:撤除所述磁性驱动件的磁斥力;或Before the step of forming a flat layer on the side of the color-resisting part, the light-shielding part, the first electrode, and the light-shielding magnetic fluid far away from the substrate, the manufacturing method further includes: setting a magnetic driver on a side of the substrate far away from the light-shielding magnetic fluid, and the magnetic driving part provides a magnetic repulsion force to the light-shielding magnetic fluid to drive the light-shielding magnetic fluid to move away from the substrate, so that the light-shielding magnetic fluid moves until the surface far away from the substrate is flush with the surface of the first electrode far away from the substrate. . After the step of forming a planar layer on the side of the first electrode and the light-shielding magnetic fluid away from the substrate, the manufacturing method further includes: removing the magnetic repulsion force of the magnetic driving member; or 在所述色阻部、所述遮光部、所述第一电极及所述遮光磁性流体远离所述衬底的一侧形成平坦层的步骤之前,所述制作方法还包括在所述遮光磁性流体远离所述衬底的一侧填充透光流体,所述透光流体与所述第一电极远离所述衬底的表面相平齐。Before the step of forming a planar layer on the side of the color-resisting part, the light-shielding part, the first electrode, and the light-shielding magnetic fluid away from the substrate, the manufacturing method further includes filling a light-transmitting fluid on the side of the light-shielding magnetic fluid away from the substrate, and the light-transmitting fluid is flush with the surface of the first electrode away from the substrate. 12.一种显示面板,其特征在于,包括如权利要求1至8中任一项所述的彩膜基板及与所述彩膜基板对盒设置的阵列基板。12 . A display panel, characterized by comprising the color filter substrate according to any one of claims 1 to 8 and an array substrate arranged in a box with the color filter substrate. 13 . 13.一种显示装置,其特征在于,包括如权利要求12所述的显示面板及感光元件,所述感光元件设于所述阵列基板背离所述彩膜基板的一侧,并与所述感光显示区对应设置。13. A display device, characterized by comprising the display panel according to claim 12 and a photosensitive element, the photosensitive element is disposed on the side of the array substrate away from the color filter substrate, and is disposed corresponding to the photosensitive display area.
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